3D interposer with through glass vias – method of increasing adhesion between copper and glass surfaces and articles therefrom

TWI939408BActive Publication Date: 2026-09-21CORNING INC
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Patent Information

Application Number
TW110142175
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-11-16
Filing Date
2021-11-12
Publication Date
2026-09-21
Estimated Expiration
2041-11-11

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Abstract

In some embodiments, the method includes forming a pilot hole or damage track through a laminated glass structure using a laser. The laminated glass structure includes a first layer and a second layer adjacent to the first layer. The first layer is formed of a first glass composition. The second layer is formed of a second glass composition different from the first glass composition. After forming the pilot hole, the laminated glass structure is exposed to etching conditions in which the first glass composition is etched at a first etch rate and the second glass composition is etched at a second etch rate, wherein the first etch rate is different from the second etch rate, to form an etched hole.
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Citation Information

Patent Citations

  • 3D interposer with through glass vias – method of increasing adhesion between copper and glass surfaces and articles therefrom

    TW202028146A

  • Method for producing glass substrate with through-electrode, and glass substrate

    WO2016051781A1

  • Method for producing glass substrate, and plate-like glass

    WO2016063460A1