Substrate processing apparatus and substrate processing system

Abstract

A substrate processing apparatus includes a loading and unloading unit having a first side surface for loading and unloading a container holding a substrate via the first side surface, and a second side surface opposite to the first side surface; a substrate transport unit extending along a first direction perpendicular to the second side surface; and a plurality of batch processing units adjacent to each other along a longitudinal direction of the substrate transport unit. Each of the plurality of batch processing units includes a processing container configured to hold and process a plurality of substrates, a gas supply unit configured to supply a gas to the processing container, and an exhaust unit configured to exhaust the gas from the processing container. The gas supply unit and the exhaust unit are disposed on one side of the processing container.

Description

Substrate processing equipment This disclosure relates to a substrate processing apparatus. In a vertical heat treatment apparatus configured to process multiple substrates in batch processing, there is a known configuration in which multiple processing modules are provided relative to a loading module (for example, see Japanese Patent Publication No. 2020-113746). This disclosure provides a technique that can reduce the installation area of ​​a substrate processing apparatus containing multiple batch processing units and facilitate the maintenance of multiple batch processing units. According to one embodiment of the present disclosure, a substrate processing apparatus includes a loading and unloading unit having a first side surface through which a container for receiving a substrate is loaded and unloaded, and a second side surface opposite to the first side surface; a substrate transport unit extending along a first direction perpendicular to the second side surface; and a plurality of batch processing units adjacent to each other along a longitudinal direction of the substrate transport unit, wherein each of the plurality of batch processing units includes a processing container configured to receive and process a plurality of substrates, a gas supply unit configured to supply a gas to the processing container, and an exhaust unit configured to exhaust the gas inside the processing container, and the gas supply unit and the exhaust unit are disposed on one side of the processing container. The objectives and advantages of this embodiment will be achieved by means of the elements and combinations specifically pointed out in the claims. It should be understood that the above general description and the following detailed description are exemplary and explanatory, and not intended to limit the claimed invention. Non-limiting exemplary embodiments of the present disclosure will now be described with reference to the accompanying drawings. In each drawing, the same or corresponding components or parts are represented by the same or corresponding reference numerals, and redundant descriptions of the same or corresponding components or parts will be omitted. In this specification, the X-axis, Y-axis, and Z-axis directions are mutually perpendicular directions. The X-axis and Y-axis directions are horizontal directions, while the Z-axis direction is a vertical direction. [Substrate Processing Apparatus] A substrate processing apparatus 1 according to an embodiment will be described with reference to Figures 1 to 9. Figures 1 to 3 are perspective views showing the substrate processing apparatus 1 according to the embodiment, and respectively show views of the substrate processing apparatus 1 viewed from different directions. Figures 4 to 8 are schematic diagrams showing the loading and unloading unit 2, and show internal views of the loading and unloading unit 2 viewed from above. In Figures 5 to 7, the positions of the components in the loading and unloading unit 2 before component movement are indicated by single-point chain lines. Figure 9 is a schematic diagram showing the substrate transport unit 3 and the batch processing unit 4, and shows internal views of the substrate transport unit 3 and the batch processing unit 4 viewed from the rear. In Figure 9, the scaffold 5 is omitted. The substrate processing equipment 1 includes a loading and unloading unit 2, a substrate transport unit 3, multiple batch processing units 4, and a scaffold 5. The loading and unloading unit 2 includes a front surface 2a through which the cassette C is loaded and unloaded, and a rear surface 2b opposite to the front surface 2a. The front surface 2a is located on the negative side of the loading and unloading unit 2 along the Y-axis. The rear surface 2b is located on the positive side of the loading and unloading unit 2 along the Y-axis. The cassette C is a container that can hold multiple substrates W (25 substrates W in this example). For example, the cassette C is a front-opening unified pod (FOUP). For example, the substrate W is a semiconductor wafer. For example, the interior of the loading and unloading unit 2 is in an atmospheric environment. The loading and unloading unit 2 includes a loading port 21, a loader 22, a storage rack 23, a cassette transport unit 24, and a channel forming section 25. Loading ports 21 are located on the positive side along the X-axis and the negative side along the Y-axis of the loading and unloading unit 2. In this example, two loading ports 21 are provided along the X-axis. The cartridge C is placed or disposed on the loading ports 21. The cartridge C is loaded and unloaded relative to the loading ports 21. Loading ports 21 can be provided in multiple stages along the vertical direction (or the Z-axis direction). There is no particular limitation on the number of loading ports 21. Loader 22 is located on the positive side of loading and unloading unit 2 along the X-axis and the positive side along the Y-axis. Loader 22 is provided along the X-axis. Loader 22 is adjacent to substrate transport unit 3. The cartridge C is placed on loader 22. Loader 22 has a cover opening and closing mechanism (not shown) for opening and closing the cover of cartridge C. Loaders 22 can be provided in multiple stages along the Z-axis. The number of loaders 22 is not particularly limited. In this example, multiple storage racks 23 are provided in the loading and unloading unit 2. The storage racks 23 temporarily store cassettes C containing unprocessed substrates W, empty cassettes C containing removed substrates W, or similar items. For example, the storage racks 23 are configured to flip via hinges. The storage racks 23 can be provided in multiple stages along the Z-axis. The storage racks 23 can be positioned above or below the loader 22. There is no particular limitation on the number of storage racks 23. The cartridge transport unit 24 transports cartridges C between the loading port 21, the loader 22, and the storage rack 23. There is no particular limitation on the number of cartridge transport units 24. The channel forming section 25 forms a channel P that penetrates the loading and unloading unit 2 and connects the front surface 2a and the rear surface 2b. Channel P connects to the lower maintenance area B1, which will be described later. By forming channel P, the operator can enter and exit the lower maintenance area B1 from the front surface 2a side of the loading and unloading unit 2. Channel P is formed as needed to enable maintenance of the batch processing unit 4 or similar devices. The passage forming part 25 includes removable doors 251a and 251b, a front door 252, a rear door 253, and brackets 254a to 254d. Removable doors 251a and 251b are detachably connected to one side of the front surface 2a of the loading and unloading unit 2. Removable doors 251a and 251b are removed when forming the channel P and are installed to form the wall surface of the channel P. The front door 252 is located on the negative side of the loading and unloading unit 2 along the X-axis and the negative side of the Y-axis. The front door 252 is rotatable about a rotation axis located on the positive side of the loading and unloading unit 2 along the X-axis and extending in the Z-axis direction. When forming the passage P, the front door 252 rotates clockwise to form the wall surface of the passage P. The front door 252 has a small viewing window (not shown) for flipping up the storage rack 23. The rear door 253 is located on the negative side of the loading and unloading unit 2 along the X-axis and the positive side along the Y-axis. The rear door 253 is rotatable about a rotation axis located on the negative side of the loading and unloading unit 2 along the X-axis and extending in the Z-axis direction. When forming the channel P, the rear door 253 rotates clockwise to form the wall surface of the channel P. Brackets 254a and 254b are configured to extend from the front door 252 along the positive side of the Y-axis. Each bracket 254a and 254b supports a storage rack 23. Brackets 254a and 254b are connected to the front door 252. Brackets 254a and 254b are rotatable about a rotation axis located on the negative side of the loading and unloading unit 2 along the Y-axis and extending in the Z-axis direction. When the passage P is formed, brackets 254a and 254b rotate toward the front door 252 and are fixed in place. Brackets 254c and 254d are configured to extend from the rear door 253 along the negative side of the Y-axis. Each bracket 254c and 254d supports a storage rack 23. Brackets 254c and 254d are connected to the rear door 253. Brackets 254c and 254d are rotatable about a rotation axis located on the positive side of the loading and unloading unit 2 along the Y-axis and extending in the Z-axis direction. When the passage P is formed, brackets 254c and 254d rotate toward the rear door 253 and are fixed in place. When passage P is formed, the operator first removes the removable doors 251a and 251b, as shown in Figure 5. Next, the operator flips up the storage rack 23 located on the front surface 2a side through the small window of the front door 252. Then, as shown in Figure 6, the operator rotates the brackets 254a and 254b toward the front door 252 through the small window of the front door 252 and secures the brackets 254a and 254b to the front door 252. Next, as shown in Figure 7, the operator rotates the front door 252 clockwise to open it into the loading and unloading unit 2. Next, the operator flips up the storage rack 23 located on the rear surface 2b side, rotates the brackets 254c and 254d toward the rear door 253, secures the brackets 254c and 254d to the rear door 253, and rotates the rear door 253 clockwise to open it into the loading and unloading unit 2. Furthermore, the operator connects the disassembled removable door 251a to the front door 252 at the positive side along the Y-axis direction, and connects the disassembled removable door 251b to the rear door 253 at the negative side along the Y-axis direction. Thus, a passage P is formed having the front door 252, the rear door 253, and the removable doors 251a and 251b as its wall surfaces. A substrate transport unit 3 is configured on the loading and unloading unit 2, located on the positive side along the Y-axis. The substrate transport unit 3 extends along a first direction (or the Y-axis direction) perpendicular to the rear surface 2b of the loading and unloading unit 2. The substrate transport unit 3 is mounted on the floor F. One substrate transport unit 3 is shared with multiple batch processing units 4. That is, multiple batch processing units 4 share a common substrate transport unit 3. The substrate transport unit 3 includes a substrate transport device 31. The substrate transport device 31 transports substrates W between the loading and unloading unit 2 and each of the multiple batch processing units 4. The substrate transport device 31 includes multiple picks 31p. In this case, the substrate transport device 31 can transport multiple substrates W simultaneously. Therefore, it is possible to reduce the time required to transport substrates W. The number of picks 31p is not particularly limited. The substrate transport unit 3 has a flat upper surface 3a. An operator can sit or stand on the upper surface 3a. A first upper maintenance area A1 is formed above the substrate transport unit 3. The first upper maintenance area A1 is a maintenance area located at a higher position on the substrate processing equipment 1, and the operator can enter and leave the first upper maintenance area A1. In the first upper maintenance area A1, the operator can easily perform maintenance work on multiple batch processing units 4 arranged in the front-to-back direction. Multiple batch processing units 4 are arranged on the negative side of the substrate transport unit 3 along the X-axis. The multiple batch processing units 4 are arranged adjacent to each other along the longitudinal direction (or Y-axis direction) of the substrate transport unit 3. In the illustrated example, four batch processing units 4 are arranged adjacent to each other along the longitudinal direction of the substrate transport unit 3. Each batch processing unit 4 processes multiple substrates W (e.g., 25 to 150 substrates W) by batch processing. Each batch processing unit 4 has an inert gas environment, such as a nitrogen environment. In this case, it is possible to reduce the oxidation of the substrates W in the batch processing unit 4. Each batch processing unit 4 includes a heat treatment unit 41, a loading unit 42, a gas supply unit 43, an exhaust unit 44, a processing module control unit 45, a forced air cooling unit 46, a gas control unit 47, and a floor box 48. The heat treatment unit 41 performs a predetermined heat treatment on a plurality of substrates W. The heat treatment unit 41 includes a processing container 411 and a heater 412. The processing container 411 houses the substrate holder 414. The substrate holder 414 secures the substrate W in a roughly horizontal position at predetermined intervals along the vertical direction. The substrate holder 414 is made of a heat-resistant material, such as quartz, silicon carbide, or a similar material. The processing container 411 is provided with a gas inlet port 411a and an exhaust port 411b. Gas inlet port 411a introduces gas into processing container 411. Gas inlet port 411a is located on the negative side of processing container 411 along the X-axis direction. The location of gas inlet port 411a is preferably the same as that of multiple batch processing units 4. In this case, the pipe length between gas supply unit 43 and gas inlet port 411a can be the same across multiple batch processing units 4, and the processing variations caused by different batch processing units 4 can be reduced. Exhaust port 411b discharges gas from the processing container 411. Exhaust port 411b is located on the negative side of the processing container 411 along the X-axis. That is, exhaust port 411b is located on the same side as gas inlet port 411a. Preferably, the location of exhaust port 411b is the same as that of the multiple batch processing units 4. In this case, the exhaust volume or exhaust rate among the multiple batch processing units 4 can be made the same, and the processing variations caused by different batch processing units 4 can be reduced. Heater 412 has a cylindrical shape, for example, it is disposed around processing container 411. Heater 412 may have a shape other than cylindrical. Heater 412 heats substrate W housed within processing container 411. Baffle 415 is provided below processing container 411. Baffle 415 is configured to move horizontally between a position where baffle 415 closes the opening at the lower end of processing container 411 and a position where baffle 415 does not close the opening at the lower end of processing container 411. Baffle 415 closes the opening at the lower end of processing container 411 until substrate holder 414 is unloaded from processing container 411 and another substrate holder 414 is loaded into processing container 411. Loading unit 42 is disposed below heat treatment unit 41. Loading unit 42 is mounted on floor F via floor box 48. Floor box 48 may have an integrated configuration in which floor box 48 is integrated into loading unit 42. Loading unit 42 transports substrate W contained within processing container 411 between loading unit 42 and substrate transport unit 3. In loading unit 42, substrate holder 414 is placed on cover 417 via heat insulation cylinder 416. Cover 417 is supported on lifting mechanism (not shown). Lifting mechanism lifts cover 417 to load substrate holder 414 into or unload it from processing container 411. For example, lifting mechanism includes ball screw. Loading unit 42 also serves as space for cooling substrate W processed in heat treatment unit 41. A gas supply unit 43 is disposed on one side of the heat treatment unit 41, opposite to the side of the substrate transport unit 3. The gas supply unit 43 supplies processing gas to the gas inlet port 411a. The gas supply unit 43 is preferably disposed on the same side as the gas inlet port 411a. Therefore, the pipe length between the gas supply unit 43 and the gas inlet port 411a can be reduced. This can potentially achieve benefits such as reducing the number of pipe components and pipe heaters used, reducing the power consumption of the pipe heaters, reducing the cleaning scope during maintenance, reducing the risk of impurities entering the processing container 411, or similar benefits. The gas supply unit 43 is disposed on the exhaust unit 44. The gas supply unit 43 is disposed at approximately the same height as the processing container 411. For example, the gas supply unit 43 includes a flow controller, a switching valve, or the like. The exhaust unit 44 and the gas supply unit 43 are disposed on the same side. The exhaust unit 44 is preferably disposed on the same side as the exhaust port 411b. The exhaust unit 44 is disposed at a different height from the gas supply unit 43, for example, below the gas supply unit 43. The exhaust unit 44 has an inverted L-shape in a plan view viewed along a first direction (or the Y-axis direction). A lower maintenance area B1 is formed between the exhaust unit 44 and the loading unit 42. The lower maintenance area B1 is a maintenance area located at a lower position of the substrate processing equipment 1, and an operator can enter and exit the lower maintenance area B1. In the lower maintenance area B1, the operator can easily perform maintenance work on multiple batch processing units 4 arranged in a front-to-back direction. The gas inlet port 411a and the exhaust port 411b are disposed on the same side of the processing container 411 (i.e., on one side of the lower maintenance area B1). Therefore, in the lower maintenance area B1, the operator can simultaneously perform maintenance work on both the gas inlet port 411a and the exhaust port 411b. On the other hand, with the gas inlet port 411a and the exhaust port 411b located on opposite sides of the processing container 411, it is difficult for the operator to perform maintenance work on both the gas inlet port 411a and the exhaust port 411b simultaneously in the lower maintenance area B1. One end of the exhaust unit 44 is connected to the exhaust port 411b, and the other end of the exhaust unit 44 extends downward and penetrates the floor F to connect with an exhaust system (not shown) located below the floor F. The exhaust system exhausts and depressurizes the interior of the processing container 411 via the exhaust port 411b and the exhaust unit 44. For example, the exhaust system includes a vacuum pump, valves, or the like. The exhaust unit 44 has a flat upper surface 44a. An operator can sit or stand on the upper surface 44a. A second upper maintenance area A2 is formed above the exhaust unit 44. The second upper maintenance area A2 is a maintenance area located at a higher position on the substrate processing equipment 1, and an operator can enter and exit the second upper maintenance area A2. In the second upper maintenance area A2, the operator can easily perform maintenance work on multiple batch processing units 4 arranged in the front-to-back direction. The forced air cooling unit 46 is a device for generating coolant to supply to the heater 412, and for example, includes a heat exchanger, blower, valve, pipe, or the like. For example, the coolant is air. A forced air cooling unit 46 is positioned on the positive side of the heat treatment unit 41 along the X-axis. Coolant from the forced air cooling unit 46 is supplied to the space between the processing container 411 and the heater 412. Therefore, the processing container 411 can be cooled in a short time. The processing module control unit 45 and the gas control unit 47 are disposed on the ceiling of the heat treatment unit 41. The processing module control unit 45 and the gas control unit 47 control the operation of each part of the batch processing unit 4. For example, each of the processing module control unit 45 and the gas control unit 47 includes various controllers or the like. Scaffold 5 is positioned on the positive side of the substrate transport unit 3 along the X-axis. Scaffold 5 extends along a first direction (or the Y-axis direction). Scaffold 5 is detachably connected to the substrate transport unit 3. For example, scaffold 5 is made of stainless steel, such as SUS304 or similar, aluminum or similar materials. Scaffold 5 includes a support member 51, a base plate 52, and a fence 53. The support member 51 supports the base plate 52, and the base plate 52 is supported on the support member 51, so that the upper surface of the base plate 52 coincides with the upper surface 3a of the substrate transport unit 3. The area (or region) above the base plate 52 and the area (or region) above the substrate transport unit 3 together constitute a first upper maintenance area A1. The fence 53 is positioned on the positive side of the base plate 52 along the X-axis. By providing the fence 53, the operator can more safely perform maintenance work on each part of the batch processing unit 4 in the first upper maintenance area A1. The width of the first upper maintenance area A1 (i.e., the sum of the length of the substrate transport unit 3 in the X-axis direction and the length of the base plate 52 in the X-axis direction) can be the length through which the heater 412 can pass. In the case where the heater 412 is cylindrical, for example, the width of the first upper maintenance area A1 can be greater than the diameter of the heater 412. In this case, the operation of replacing the heater 412 can be easily performed. For example, the width of the first upper maintenance area A1 is 1000 mm, and the diameter of the heater 412 is 800 mm. As described above, according to the substrate processing apparatus 1, since multiple batch processing units 4 are provided relative to one substrate transport unit 3, the installation area of ​​the substrate processing apparatus 1 can be reduced compared to the case where only one batch processing unit 4 is provided relative to one substrate transport unit 3. Therefore, it is possible to improve the productivity per unit area. Furthermore, the substrate processing apparatus 1 includes a first upper maintenance area A1 formed above the substrate transport unit 3, a second upper maintenance area A2 formed above the exhaust unit 44, and a lower maintenance area B1 formed between the loading unit 42 and the exhaust unit 44. Therefore, the operator can easily perform maintenance work on each part of the batch processing unit 4 from multiple directions. Furthermore, according to the substrate processing apparatus 1, the gas inlet port 411a and the exhaust port 411b are located on the same side of the processing container 411 (i.e., one side of the lower maintenance area B1). Therefore, the operator in the lower maintenance area B1 can simultaneously perform maintenance work on both the gas inlet port 411a and the exhaust port 411b. [Modification of the substrate processing apparatus] The modified substrate processing apparatus 1A according to the embodiment will be described with reference to FIGS. 10 to 13. FIGS. 10 and 11 are perspective views showing the modified substrate processing apparatus 1A according to the embodiment, showing views of the substrate processing apparatus 1A viewed from different directions. FIG. 12 is an exploded perspective view of the gate 6 connected to the exhaust unit 44. FIG. 13 is a perspective view showing the gate 6 connected to the exhaust unit 44. In addition to the components of substrate processing apparatus 1, substrate processing apparatus 1A includes a fence 6 and trapezoidal frames 7 and 8. Hereinafter, substrate processing apparatus 1A will be described mainly with reference to the differences from substrate processing apparatus 1. A barrier 6 is provided for each batch processing unit 4. The length of each barrier 6 along the Y-axis direction may be the same as or approximately the same as the length of the corresponding batch processing unit 4 along the Y-axis direction. Each barrier 6 is disposed on the exhaust unit 44 of the corresponding batch processing unit 4 on the negative side along the X-axis direction. Each barrier 6 is detachably connected to the upper part of the side surface of the exhaust unit 44 of the corresponding batch processing unit 4 on the negative side along the X-axis direction. Each barrier 6 includes a spacer 61, a barrier body 62, a fixing member 63, and a connector 64. Spacer 61 is sandwiched between the side surface of exhaust unit 44 and the fence body 62. The height of the upper surface 61a of spacer 61 may be the same as or approximately the same as the height of the upper surface 44a of exhaust unit 44. In this case, the length of the upper surface 44a of exhaust unit 44 in the X-axis direction is increased by an amount corresponding to the length of spacer 61 in the X-axis direction. For example, spacer 61 is made of stainless steel, such as SUS304 or similar, aluminum or similar. Spacer 61 may be omitted. The fence body 62 is configured such that its lower end is below the upper surface 44a of the exhaust unit 44, while its upper end is above the upper surface 44a of the exhaust unit 44. The fence body 62 prevents the operator from falling from the second upper maintenance area A2. For example, the fence body 62 is made of stainless steel, such as SUS304 or similar, or aluminum or similar. The fastener 63 fixes the spacer 61 and the fence body 62 to the upper part of the side surface of the exhaust unit 44 along the negative side of the X-axis direction. Connector 64 connects adjacent fence bodies 62 in the Y-axis direction. For example, connector 64 includes a metal plate and screws. In this case, the length of the fence body 62 in the Y-axis direction can vary depending on the number of batch processing units 4. The trapezoidal frame 7 is detachably connected to the scaffold 5. The trapezoidal frame 7 is used when the operator enters or exits the first upper maintenance area A1. The trapezoidal frame 7 has a platform (or pace) 71 and a ladder 72. Platform 71 has a base plate 71a, a fixed fence 71b, and a movable fence 71c. A base plate 71a is disposed at the end of the base plate 52 on the positive side along the Y-axis. For example, the base plate 71a is detachably connected to the support member 51 of the scaffold 5. The base plate 71a can be detachably connected to the side surface of the base plate transport unit 3 on the positive side along the Y-axis. For example, the base plate 71a is fixed by a metal plate and screws. The height of the upper surface of the base plate 71a can be the same as or approximately the same as the height of the upper surface of the base plate 52. The fixed fence 71b is positioned on the base plate 71a on the negative side along the X-axis and the positive side along the Y-axis. The fixed fence 71b prevents the operator from falling off the base plate 71a. A movable barrier 71c is positioned on the positive side of the base plate 71a along the X-axis. The movable barrier 71c prevents the operator from falling off the base plate 71a. The movable barrier 71c can be opened and closed. The movable barrier 71c is opened when the operator enters or leaves the base plate 71a. For example, the movable barrier 71c can open inwards. For example, the movable barrier 71c can be configured to close automatically. The ladder 72 includes a pair of supports (or posts) 72a and 72b, multiple rungs 72c, and a pair of handrails 72d and 72e. The brackets 72a and 72b are arranged in parallel to each other. The upper ends of the brackets 72a and 72b are detachably connected to the base plate 71a of the platform 71. Multiple steps 72c bridge the pair of supports 72a and 72b by extending between them. Multiple steps 72c are arranged at predetermined intervals along the direction of extension of each support 72a and 72b. Handrail 72d is fixed to bracket 72a. Handrail 72e is fixed to bracket 72b. Handrails 72d and 72e are respectively installed on both sides of multiple steps 72c. The trapezoidal frame 8 is detachably connected to the exhaust unit 44. The trapezoidal frame 8 is used when the operator enters and exits the second upper maintenance area A2. The trapezoidal frame 8 has a platform 81 and a ladder 82. Platform 81 has a base plate 81a, a fixed fence 81b, and a movable fence 81c. A base plate 81a is disposed at the end of the exhaust unit 44 on the positive side along the Y-axis. For example, the base plate 81a is detachably connected to the exhaust unit 44. For example, the base plate 81a is fixed by a metal plate and screws. The height of the upper surface of the base plate 81a may be the same as or approximately the same as the height of the upper surface 44a of the exhaust unit 44. Fixed fence 81b is installed on the positive side of the base plate 81a along the X-axis and the positive side along the Y-axis. Fixed fence 81b prevents the operator from falling off the base plate 81a. A movable barrier 81c is positioned on the negative side of the base plate 81a along the X-axis. The movable barrier 81c prevents the operator from falling off the base plate 81a. The movable barrier 81c can be opened and closed. The movable barrier 81c is opened when the operator enters or leaves the base plate 81a. For example, the movable barrier 81c can open inwards. For example, the movable barrier 81c can be configured to close automatically. The ladder 82 includes a pair of supports 82a and 82b, multiple rungs 82c, and a pair of handrails 82d and 82e. The brackets 82a and 82b are arranged in parallel to each other. The upper ends of the brackets 82a and 82b are detachably connected to the base plate 81a of the platform 81. Multiple steps 82c bridge the pair of supports 82a and 82b by extending between them. Multiple steps 82c are arranged at predetermined intervals along the direction of extension of each support 82a and 82b. Handrail 82d is fixed to bracket 82a. Handrail 82e is fixed to bracket 82b. Handrails 82d and 82e are respectively installed on both sides of multiple steps 82c. [Heater Replacement Method] A method for replacing the heater 412 in the substrate processing apparatus 1 will be described with reference to Figures 14 to 17. Figures 14 to 17 are perspective views illustrating an example of the heater replacement method. Hereinafter, a method for installing the heater 412 into the batch processing unit 4A located closest to the loading and unloading unit 2 will be described. First, as shown in Figure 14, the operator removes the forced air cooling device 46 of the batch processing unit 4A and installs the first track 91, the second track 92, and the connector 93. A first track 91 is mounted along the Y-axis on the upper surface 3a of the substrate transport unit 3 and the upper surface of the base plate 52. The first track 91 is mounted to extend from its positive end along the Y-axis to the negative end along the Y-axis of both the substrate transport unit 3 and the base plate 52. The first track 91 can be divided into multiple segments along its length. In this case, the length of the first track 91 can be adjusted according to the number of batch processing units 4. When the first track 91 is divided into multiple segments, the length of each segment of the first track 91 can be the same as or approximately the same as the length of one batch processing unit 4 along the Y-axis. The first track 91 may include a rotating component (not shown) that moves the heater 412 by sliding it along the first track 91. For example, the rotating component can be a roller, ball roller, or similar. Multiple rotating components can be spaced apart along the longitudinal direction of the first track 91. The second track 92 is mounted from the upper surface of the base plate 52 along the X-axis direction to the interior of the batch processing unit 4A via the upper surface 3a of the substrate transport unit 3. The second track 92 may include a rotating component (not shown) that moves the heater 412 by sliding it along the second track 92. For example, the rotating component may be a roller, ball bearing, or the like. Multiple rotating components may be spaced apart along the longitudinal direction of the second track 92. The connector 93 is connected to the end of the substrate transport unit 3 and the base plate 52 along the positive side of the Y-axis. The height of the upper surface of the connector 93 may be the same as or approximately the same as the height of the upper surface 3a of the substrate transport unit 3 and the upper surface of the base plate 52. A track 93a connected to the first track 91 is provided on the upper surface of the connector 93. The base frame 94, which will be described later, is connected to the connector 93. Next, the operator moves the transport cart (not shown) containing the heater 412 to the rear surface of the substrate processing equipment 1. Then, the operator transfers the heater 412 from the transport cart to the base frame 94. Next, the operator operates a stop (not shown) to secure the heater 412 to the base frame 94. Next, as shown in Figure 15, the operator uses a lift (not shown) to raise the base frame 94, where the heater 412 is placed, to the height of the connector 93. Then, the operator connects the base frame 94 to the connector 93. Next, as shown in Figure 16, the operator (OP) releases the stop and moves the heater 412, which is placed on the base frame 94, by sliding the heater 412 along the first track 91 to the side of the batch processing unit 4A. After the heater 412 has slid and moved to the side of the batch processing unit 4A, the heater 412 can rotate horizontally. For example, the heater 412 can be rotated horizontally if the angle of the heater 412 when sliding and moving along the first track 91 is different from the angle of the heater 412 when sliding and moving along the second track 92. Next, as shown in Figure 17, the operator OP moves the heater 412 into the batch processing unit 4A by sliding it along the second track 92. After the heater 412 has slid and moved into the batch processing unit 4A, it can be rotated horizontally. The angle of the heater 412 during its sliding and moving along the second track 92 differs from the angle of the heater 412 when it is fixed inside the batch processing unit 4A; for example, the heater 412 can be rotated horizontally. The operator OP then secures the heater 412 within the batch processing unit 4A. For example, the heater 412 is secured using fasteners such as screws or similar fasteners. As described above, heater 412 is connected to batch processing unit 4A. Heater 412 can be removed from batch processing unit 4A by a procedure reversed from the method of connecting heater 412 to batch processing unit 4A. Furthermore, heaters 412 in other batch processing units 4B, 4C, and 4D can also be replaced using a similar method. Additionally, in substrate processing apparatus 1A, heater 412 can be replaced using the same method used to replace heaters 412 in substrate processing apparatus 1. In the above embodiments, the front surface 2a is an example of a first side surface, and the rear surface 2b is an example of a second side surface. The embodiments disclosed herein are illustrative and non-limiting in all respects. Various changes, modifications, omissions, and substitutions may be made in the above embodiments without departing from the scope and spirit of this disclosure, which includes the appended claims. Although the embodiments describe a scenario where channel P is formed in the loading and unloading unit 2 as required, this disclosure is not limited to this scenario. For example, a permanent channel may be formed in the loading and unloading unit 2. Although the embodiments describe the case where one substrate processing device 1 is mounted on the floor F, this disclosure is not limited to this case. For example, multiple substrate processing devices 1 may be mounted on the floor F. Figure 18 is a perspective view showing a configuration in which multiple substrate processing devices 1 are arranged adjacent to each other along the X-axis. In Figure 18, the X-axis, Y-axis, and Z-axis directions are described with reference to the lower right of the paper. As shown in Figure 18, when multiple substrate processing devices 1 are arranged adjacent to each other along the X-axis, the width of the upper maintenance area can be ensured by sharing a first upper maintenance area A1 and a second upper maintenance area A2 between two adjacent substrate processing devices 1. The width of the shared upper maintenance area can be the length through which the heater 412 can pass. For example, if the heater 412 is cylindrical, the width of the shared upper maintenance area is greater than the diameter of the heater 412. In this case, the operation of replacing the heater 412 can be easily performed. For example, the width of the shared upper maintenance area is 1000 mm, and for example, the diameter of the heater 412 is 800 mm. In the shared upper maintenance area, the operation of replacing the heater 412 of one of the two adjacent substrate processing devices 1, as well as the maintenance work of the gas supply unit 43 of the other of the two adjacent substrate processing devices 1, can be performed. Furthermore, the height of the upper surface 44a of the exhaust unit 44 is preferably the same as the height of the upper surface 3a of the substrate transport unit 3. In this case, as shown in FIG18, there is no step between the upper surface 44a of the exhaust unit 44 and the upper surface 3a of the substrate transport unit 3 between two adjacent substrate processing devices 1. Therefore, when the operator performs maintenance work on each part of the batch processing unit 4 in the first upper maintenance area A1 and the second upper maintenance area A2, it is possible to improve work efficiency. When the heights of the upper surface 44a of the exhaust unit 44 and the upper surface 3a of the substrate transport unit 3 are different, it is preferable to place a plate-like component on the lower upper surface of the exhaust unit 44 and the substrate transport unit 3 so as to align the upper surfaces of the exhaust unit 44 and the substrate transport unit 3 to the same height. In addition, when multiple substrate processing devices 1 are arranged side by side along the X-axis direction, a gap can be provided between the substrate transport unit 3 and the exhaust unit 44 to install the exhaust system. Figure 19 is a perspective view showing a first modification in which multiple substrate processing devices 1 are arranged adjacent to each other. Figure 20 is a perspective view showing a second modification in which multiple substrate processing devices 1 are arranged adjacent to each other. Figure 21 is a perspective view showing a third modification in which multiple substrate processing devices 1 are arranged adjacent to each other. In Figures 19 to 21, the X-axis, Y-axis, and Z-axis directions are illustrated with reference to the lower right corner of the paper. As shown in Figures 19 to 21, when multiple substrate processing devices 1 are arranged adjacent to each other along the X-axis, a gap G may be formed between two adjacent substrate processing devices 1, between the upper surface 44a of the exhaust unit 44 and the upper surface 3a of the substrate transport unit 3. For example, the gap G is in the range of greater than or equal to 30 mm and less than or equal to 50 mm, and is very small. In the first to third modifications, a plate-shaped member 10 extending along the Y-axis is provided between two adjacent substrate processing devices 1, on the upper surface 44a of the exhaust unit 44 and the upper surface 3a of the substrate transport unit 3, to fill the gap G. In this case, it is possible to prevent parts or the like from falling off during maintenance. For example, the length of the plate-shaped member 10 along the Y-axis may be the same as the length of the upper surface 44a of the exhaust unit 44 along the Y-axis. For example, the length of the plate-shaped member 10 along the Y-axis may be the same as the length of the upper surface 3a of the substrate transport unit 3 along the Y-axis. As shown in Figure 19, the plate-shaped component 10 may have a planar shape covering a portion of the upper surface 44a of the exhaust unit 44 and a portion of the upper surface 3a of the substrate transport unit 3. The length of the plate-shaped component 10 along the X-axis may be shorter than the sum of the lengths of the upper surface 44a of the exhaust unit 44 and the upper surface 3a of the substrate transport unit 3 along the X-axis. As shown in Figure 20, the plate-shaped component 10 may have a planar shape that covers the entire upper surface 44a of the exhaust unit 44 and the entire upper surface 3a of the substrate transport unit 3. In this case, no step is created by the thickness of the plate-shaped component 10. Therefore, in the shared upper maintenance area, it is possible to prevent the operator from tripping over the step. As shown in Figure 21, when viewed from the Y-axis direction, the plate-shaped member 10 has a T-shape. The plate-shaped member 10 includes a horizontal portion 101 and a vertical portion 102. The horizontal portion 101 has a planar shape extending along the Y-axis direction to fill the gap G. The horizontal portion 101 covers at least a portion of the upper surface 44a of the exhaust unit 44 and at least a portion of the upper surface 3a of the substrate transport unit 3. The vertical portion 102 has a planar shape that extends from the lower surface of the horizontal portion 101 along the negative side of the Z-axis direction. The vertical portion 102 extends along the Y-axis direction and mates with the gap G. In this case, positional errors of the plate-shaped member 10 along the X-axis direction can be prevented. The length of the vertical portion 102 along the X-axis direction can be the same as or shorter than the width of the gap G. According to this disclosure, the installation area of ​​a substrate processing device containing multiple batch processing units can be reduced, and maintenance of multiple batch processing units can be facilitated. While certain embodiments have been described, these embodiments are presented by way of example only and are not intended to limit the scope of this disclosure. In fact, the embodiments described herein can be embodied in various other forms. Furthermore, various omissions, substitutions, and changes may be made to the form of the embodiments described herein without departing from the spirit of this disclosure. The appended claims and their equivalents are intended to cover such forms or modifications falling within the scope and spirit of this disclosure. 1: Substrate processing equipment 1A: Substrate processing equipment 10: Plate-shaped component 101: Horizontal part 102: Vertical part 2: Loading and unloading unit 2a: Front surface 2b: Rear surface 21: Loading port 22: Loader 23: Storage rack 24: Chronograph transport unit 25: Channel forming part 251a: Detachable door 251b: Detachable door 252: Front door 253: Rear door 254a: Bracket 254b: Bracket 254c: Bracket 254d: Bracket 3: Substrate transport unit 3a: Upper surface 31: Substrate transport device 31p: Pickup device 4: Batch processing unit 4A: Batch processing unit 4B: Batch processing unit 4C: Batch processing unit 4D: Batch processing unit 41: Heat treatment unit 411: Processing container 411a: Gas inlet port 411b: Exhaust port 412: Heater 414: Substrate holder 415: Baffle 416: Heat insulation cylinder 417: Cover 42: Loading unit 43: Gas supply unit 44: Exhaust unit 44a: Upper Surface 45: Processing module control unit 46: Forced air cooling unit 47: Gas control unit 48: Floor box 5: Scaffold 51: Support 52: Base plate 53: Fence 6: Fence 61: Spacer 61a: Upper surface 62: Fence body 63: Fixing element 64: Connector 7: Trapezoidal frame 71: Platform 71a: Base plate 71b: Fixed fence 71c: Movable fence 72: Ladder 72a: Bracket 72b: Bracket 72c: Step 72d: Handrail 72e: Handrail Hand 8: Trapezoidal frame 81: Platform 81a: Base plate 81b: Fixed fence 81c: Movable fence 82: Ladder 82a: Support 82b: Support 82c: Steps 82d: Handrail 82e: Handrail 91: First track 92: Second track 93: Connector 93a: Track 94: Base frame A1: First upper maintenance area A2: Second upper maintenance area B1: Lower maintenance area C: Chiller F: Floor G: Lower maintenance area OP: Operator P: Passage W: Base plate Figure 1 is a perspective view (part 1) showing a substrate processing apparatus according to an embodiment; Figure 2 is a perspective view (part 2) showing the substrate processing apparatus according to the embodiment; Figure 3 is a perspective view (part 3) showing the substrate processing apparatus according to the embodiment; Figure 4 is a schematic diagram (part 1) showing a loading and unloading unit; Figure 5 is a schematic diagram (part 2) showing the loading and unloading unit; Figure 6 is a schematic diagram (part 3) showing the loading and unloading unit; Figure 7 is a schematic diagram (part 4) showing the loading and unloading unit; Figure 8 is a schematic diagram (part 5) showing the loading and unloading unit; Figure 9 is a schematic diagram showing a substrate transport unit and a batch processing unit; Figure 10 is a perspective view (part 1) showing a modified substrate processing apparatus according to the embodiment; Figure 11 is a perspective view (part 2) showing a modified substrate processing apparatus according to the embodiment; Figure 12 is an exploded perspective view of a grille installed in an exhaust unit; Figure 13 is a perspective view showing a grille installed in the exhaust unit; Figure 14 is a perspective view (part 1) showing an example of a heater replacement method; Figure 15 is a perspective view (part 2) showing the same example of the heater replacement method; Figure 16 is a perspective view (part 3) showing the same example of the heater replacement method; Figure 17 is a perspective view (part 4) showing the same example of the heater replacement method; Figure 18 is a perspective view showing an arrangement of multiple substrate processing devices adjacent to each other; Figure 19 is a perspective view showing a first modification of the arrangement of multiple substrate processing devices adjacent to each other; Figure 20 is a perspective view showing a second modification of the arrangement of multiple substrate processing devices adjacent to each other; and Figure 21 is a perspective view showing a third modification of the arrangement of multiple substrate processing devices adjacent to each other. 1: Substrate processing equipment 2: Loading and unloading unit 2a: Front surface 2b: Back surface 21: Loading Port 4: Batch processing unit 43: Gas Supply Unit 44: Exhaust Unit 44a: Upper surface 45: Processing Module Control Unit 47: Gas Control Unit 5: Scaffolding 53: Fence A2: Second Upper Maintenance Area C: Cartridge F: Floor P: Channel

Claims

1. A substrate processing apparatus, comprising: a loading and unloading system including a loader and having a first surface and a second surface, wherein a container for receiving a plurality of substrates is loaded and unloaded via the first surface, the second surface being opposite to the first surface; a substrate transport system extending longitudinally in a first horizontal direction perpendicular to the second surface; a plurality of batch processing units adjacent to each other along the longitudinal direction of the substrate transport system, wherein the substrate transport system includes a substrate transport device configured to transport the plurality of substrates between the loading and unloading system and each of the plurality of batch processing units, and each of the plurality of batch processing units includes: a processing container including an inlet port, an outlet port, and a holder for holding the plurality of substrates, and configured to process the plurality of substrates contained within the processing container; a loading mechanism including a lift disposed below the processing container and configured to transport the plurality of substrates contained within the processing container to and from the substrate transport system. A gas supply system including a switching valve configured to supply gas to the processing container via the inlet port, and an exhaust system including a vacuum pump configured to exhaust the gas from the processing container to the outside of the processing container via the exhaust port; a first maintenance area formed between the exhaust system and the loading mechanism and configured for operator access to maintain the plurality of batch processing units; and a passage connecting to the first maintenance area and extending through the loading and unloading system to connect the first surface and the second surface of the loading and unloading system and to allow the operator to enter and exit the first maintenance area through one side of the first surface of the loading and unloading system, wherein: The processing container has a first side adjacent to the substrate transport system and a second side opposite to the first side. The gas supply system and the exhaust system are adjacent to the second side of the processing container. The loading and unloading system includes a first door and a second door. The first door is rotatable about a first rotation axis and opens a portion of the first surface when it is in an open position. The second door is rotatable about a second rotation axis and opens a portion of the second surface when it is in an open position. The first door in the open position and the second door in the open position respectively form wall surfaces defining the channel.

2. The substrate processing apparatus as claimed in claim 1, wherein the gas supply system and the exhaust system are disposed at different height positions.

3. The substrate processing apparatus as claimed in claim 1, wherein the upper surface of one of the substrate transport systems and the upper surface of one of the exhaust systems are located at the same height.

4. The substrate processing apparatus as described in any one of claims 1 to 3, wherein: The exhaust system has an inverted L-shape in one of the plan views viewed from the first horizontal direction to form the first maintenance area between the exhaust system and the loading mechanism.

5. The substrate processing apparatus as claimed in claim 1, wherein the first door in one of the first doors in a closed position and the second door in one of the second doors in a closed position respectively close the channel.

6. The substrate processing apparatus as claimed in claim 1 further comprises: a fence disposed on the exhaust system and extending above an upper surface of the exhaust system.

7. The substrate processing apparatus as claimed in claim 1, further comprising: a scaffold disposed on the substrate transport system; and a second maintenance area configured for the operator to access and maintain the plurality of batch processing units, wherein: The scaffold includes a support member, a base plate, and a fence. The base plate is supported on the support member, and the fence is disposed on the support member and located above the base plate. The fence extends upward from an upper surface of the substrate transport system, and the second maintenance area is formed by an area above the base plate and an area above the substrate transport system.

8. The substrate processing apparatus as claimed in claim 7, wherein an upper surface of the substrate coincides with the upper surface of the substrate transport system.

9. The substrate processing apparatus as claimed in claim 7 further includes: a third maintenance area formed above the exhaust system and configured for the operator to enter and exit to maintain the plurality of batch processing units.

10. The substrate processing apparatus as described in claim 1, wherein: When the first door is opened to the open position, the first door rotates about the first rotation axis toward the interior of the loading and unloading system, and when the second door is opened to the open position, the second door rotates about the second rotation axis toward the interior of the loading and unloading system.

11. The substrate processing apparatus as claimed in claim 1, wherein the substrate transport device is configured to transport the plurality of substrates simultaneously between the loading and unloading system and each of the plurality of batch processing units.

12. The substrate processing apparatus as claimed in claim 1, wherein the first maintenance area is configured for the operator to enter and exit to maintain the gas supply system and the exhaust system.

13. The substrate processing apparatus as claimed in claim 1, wherein when the wall surfaces defining the channel are formed, the first door and the second door rotate in the same direction to their respective open positions.

14. A substrate processing system comprising: a plurality of substrate processing devices arranged adjacent to each other along a second horizontal direction perpendicular to the first horizontal direction, wherein: Each of the plurality of substrate processing devices is configured in accordance with claim 9, and the second maintenance area and the third maintenance area are shared between two adjacent substrate processing devices in the plurality of substrate processing devices.

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