Composition, film and display device

TWI940810BActive Publication Date: 2026-10-01SUMITOMO CHEM CO LTD +1
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Patent Information

Application Number
TW112122321
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2022-07-21
Filing Date
2023-06-15
Publication Date
2026-10-01
Estimated Expiration
2043-06-14

AI Technical Summary

Technical Problem

Existing curable resin compositions for forming wavelength conversion films in display devices do not achieve optimal pattern formability and light-emitting properties, particularly when incorporating quantum dots.

Method used

A composition comprising quantum dots and a specific vinyl copolymer with narrow molecular weight distribution, containing tellurium compounds, and having a defined acid value, which includes structural units derived from (meth)acrylic acid, (meth)acrylates with and without carboxyl groups, and an ultraviolet curable functional group, along with optional additives like polymerizable compounds and solvents.

Benefits of technology

The composition enables the formation of films with excellent pattern formability and light-emitting properties, including reduced aggregation and improved quantum yield and external quantum efficiency, while maintaining good appearance and stability.

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Abstract

The present invention provides a composition comprising quantum dots (A) and a vinyl copolymer (B), wherein the vinyl copolymer (B) has constituent units derived from (meth)acrylic acid, constituent units derived from (meth)acrylates having carboxyl groups, and constituent units derived from (meth)acrylates without carboxyl groups, and contains tellurium compounds, and has a molecular weight distribution of less than 2.0 and an acid value of 100 mgKOH / g to 150 mgKOH / g.
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Description

Composition, film, and display device The present invention relates to a composition, a film formed from the composition, and a display device including the film. As a curable resin composition for forming a cured film such as a wavelength conversion film included in a display device, a composition containing quantum dots is known (Patent Document 1). [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Application Laid-Open No. 2016-71362 [Problems to be solved by the invention] One object of the present invention is to provide a composition containing quantum dots that can form a film having excellent patterning properties and luminescence properties. Another object of the present invention is to provide a film formed from the composition and a display device including the film. [Means for Solving the Problem] The present invention provides the following compositions, films, and display devices. [1] A composition comprising quantum dots (A) and a vinyl copolymer (B), wherein the vinyl copolymer (B) comprises constituent units derived from (meth)acrylic acid, constituent units derived from (meth)acrylates having carboxyl groups, and constituent units derived from (meth)acrylates not having carboxyl groups, contains a tellurium compound, and has a molecular weight distribution of 2.0 or less and an acid value of 100 mgKOH / g to 150 mgKOH / g. [2] A composition as described in [1], wherein the vinyl copolymer (B) comprises constituent units derived from monomers represented by formula (I), formula (II), and formula (III), [Chemical 1] [In formula (I), X 1 represents a hydrogen atom or a methyl group] [Chemistry 2] [In formula (II), X 2 represents a hydrogen atom or a methyl group; Y 1 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; Y 2 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms] [Chemical 3] [In formula (III), X 3 represents a hydrogen atom or a methyl group; R 1 represents a linear, branched, or cyclic hydrocarbon group having 1 to 30 carbon atoms]. [3] The composition according to [1] or [2], wherein the vinyl copolymer (B) further contains a structural unit having an ultraviolet curable functional group. [4] The composition according to any one of [1] to [3], wherein the weight average molecular weight per mol of ethylenically unsaturated bonds of the vinyl copolymer (B), i.e., the ethylenically unsaturated bond equivalent, exceeds 1000 and is 8000 or less. [5] The composition according to any one of [1] to [4], wherein the content of the tellurium compound in the vinyl copolymer (B) exceeds 0 ppm and is 350 ppm or less in terms of metallic tellurium. [6] The composition according to any one of [1] to [5], further comprising a polymerizable compound (C) and a polymerization initiator (D). [7] The composition according to any one of [1] to [6], further comprising a solvent (E). [8] The composition as described in any one of [1] to [7], wherein the quantum dot (A) is at least one selected from the group consisting of a compound of a Group 12 element and a Group 16 element, a compound of a Group 13 element and a Group 15 element, a compound of a Group 13 element and a Group 16 element, and a compound of a Group 14 element and a Group 16 element. [9] The composition as described in any one of [1] to [8], wherein the content of the quantum dot (A) is 50 parts by mass to 350 parts by mass relative to 100 parts by mass of the vinyl copolymer (B).

[10] A film formed from the composition as described in any one of [1] to [9].

[11] A display device comprising the film as described in

[10] . [Effects of the Invention] Provided are a composition containing quantum dots, a film formed from the composition, and a display device including the film. The composition is a composition that can form a film having good pattern formability and light-emitting properties. <Composition> The composition of the present invention (hereinafter referred to as the "composition") comprises quantum dots (A) and a specific vinyl copolymer (B) described below. The composition may further comprise other components such as a polymerizable compound (C), a polymerization initiator (D), and a solvent (E). The composition may be a curable composition that cures by light irradiation or heat. By means of the composition of the present invention, a film having good pattern forming properties and luminescent properties can be formed. The composition is preferably a film that can well form a line and space pattern having a width of 20 μm. The composition is preferably a film that can form a film having a good quantum yield QY and / or external quantum efficiency EQE, and more preferably a film that can form a film having a good quantum yield QY and external quantum efficiency EQE. Furthermore, by means of the composition of the present invention, a film having good pattern forming properties and luminescent properties and a good appearance can be formed. The so-called good appearance refers to a state in which condensates are not present on the coating film or are sufficiently reduced. Specifically, it refers to a state in which no foreign matter is confirmed when the appearance is evaluated by the method described in the embodiments described later. In this specification, the following terms have the following meanings. "(Meth)acrylic acid" refers to at least one of acrylic acid and methacrylic acid. Similarly, "(meth)acryloyloxy" refers to at least one of acryloxy and methacryloyloxy, and "(meth)acryloyl" refers to at least one of acryloxy and methacryloyl. "(Meth)acrylate" refers to an ester compound in which the hydrogen atom of the carboxyl group of (meth)acrylic acid is substituted with a hydrocarbon group. A "vinyl copolymer" is a copolymer of two or more vinyl monomers. A "vinyl monomer" is a monomer having a polymerizable vinyl group (ethylenically unsaturated double bond), including monomers having a (meth)acryloyl group and monomers having an allyl group. The term "blue" refers to all light perceived as blue (all light having intensity in the blue wavelength region, for example, between 380 nm and 495 nm), and is not limited to light of a single wavelength. The term "green" refers to all light perceived as green (all light having intensity in the green wavelength region, for example, between 495 nm and 585 nm), and is not limited to light of a single wavelength. The term "red" refers to all light perceived as red (all light having intensity in the red wavelength region, for example, between 585 nm and 780 nm), and is not limited to light of a single wavelength. The term "yellow" refers to all light perceived as yellow (all light having intensity in the yellow wavelength region, for example, between 560 nm and 610 nm), and is not limited to light of a single wavelength. The components contained or possibly contained in the composition are described below. In addition, the compounds exemplified as the components contained or possibly contained in the composition in this specification may be used alone or in combination of two or more unless otherwise specified. [1] Quantum Dots (A) Quantum Dots (A) are light-emitting semiconductor microparticles with a particle size of 1 nm to 100 nm. They utilize the band gap of the semiconductor to absorb ultraviolet light or visible light (e.g., blue light) and emit light. Quantum Dots (A) preferably emit green or red light, and more preferably absorb blue light and emit green or red light. The emission spectrum of the quantum dots (A) emitting green light preferably includes a peak with a maximum value in the wavelength range of 500 nm to 560 nm, more preferably in the wavelength range of 520 nm to 545 nm, and even more preferably in the wavelength range of 525 nm to 535 nm. This further improves the green light emission characteristics of the display device. The peak preferably has a full width at half maximum of 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm. This further improves the green light emission characteristics of the display device. The emission spectrum of quantum dots (A) emitting red light preferably includes a peak with a maximum in the wavelength range of 610 nm to 750 nm, more preferably in the wavelength range of 620 nm to 650 nm, and even more preferably in the wavelength range of 625 nm to 645 nm. This further improves the red light emission characteristics of the display device. The peak preferably has a full width at half maximum of 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm. This further improves the red light emission characteristics of the display device. The emission spectrum of quantum dots (A) can be measured according to the method described in the Examples section below. The quantum dots (A) may be composed of, for example, a semiconductor material containing one or more elements selected from the group consisting of Group 2 elements, Group 11 elements, Group 12 elements, Group 13 elements, Group 14 elements, Group 15 elements, and Group 16 elements of the periodic table. Specific examples of semiconductor materials that can constitute quantum dots include: SnS 2. Compounds of Group 14 elements and Group 16 elements such as SnS, SnSe, SnTe, PbS, PbSe, PbTe; Compounds of Group 13 elements and Group 15 elements such as GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, InGaN, InGaP; Ga 2O 3. Ga 2S 3. Ga 2Se 3. Ga 2Te 3.In 2O 3.In 2S 3.In 2Se 3.In 2Te 3. Compounds of Group 13 elements such as AgInGaS and Group 16 elements; Compounds of Group 12 elements such as ZnO, ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, CdTe, HgO, HgS, HgSe, HgTe, ZnSTe, ZnSeS, ZnSeTe, CdSTe, CdSeTe, HgSTe, HgSeS, HgSeTe, etc. and Group 16 elements; As 2O 3. As 2S 3. As 2Se 3. As 2Te 3. Sb 2O 3. Sb 2S 3. Sb 2Se 3. Sb 2Te 3. Bi 2O 3. Bi 2S 3. Bi 2Se 3. Bi 2Te Compounds of Group 15 elements such as MgS, MgSe, MgTe, CaS, CaSe, CaTe, SrS, SrSe, SrTe, BaS, BaSe, BaTe and other Group 16 elements; Simple substances of Group 14 elements, Group 15 elements or Group 16 elements such as Si and Ge. Among them, in terms of a tendency to have good luminescence properties, the quantum dots (A) are preferably at least one selected from the group consisting of compounds of Group 12 elements and Group 16 elements, compounds of Group 13 elements and Group 15 elements, compounds of Group 13 elements and Group 16 elements, and compounds of Group 14 elements and Group 16 elements. When quantum dots (A) contain S or Se, those surface-modified with metal oxides or organic materials can be used. Using surface-modified quantum dots prevents the absorption of S or Se by reactive components contained or potentially contained in the composition. Furthermore, quantum dots (A) can be combined with the aforementioned compounds to form a core-shell structure. Examples of such combinations include microparticles with a CdSe core and a ZnS shell, or microparticles with an InP core and a ZnSeS shell. The energy state of quantum dots (A) depends on their size, allowing for flexible selection of emission wavelengths by varying their particle size. Furthermore, the narrow spectral width of light emitted from quantum dots (A) facilitates the development of a wide color gamut for display devices. Furthermore, quantum dots (A) have a high responsiveness, which also improves the efficiency of primary light utilization. The composition may contain two or more types of quantum dots (A). For example, the composition may contain only one type of quantum dot (A) that absorbs primary light and emits green light, or a combination of two or more types. The composition may contain only one type of quantum dot (A) that absorbs primary light and emits red light, or a combination of two or more types. The content of the quantum dots (A) in the composition relative to the total solid content of the composition is, for example, 1% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, and further preferably 20% by mass or more, and is, for example, 60% by mass or less, preferably 50% by mass or less, and more preferably 40% by mass or less. The total solids content of a composition refers to the total amount of components in the composition after removing the solvent (E). The solids content of a composition can be measured using known analytical methods such as liquid chromatography or gas chromatography. The solids content of each component can also be calculated based on the blending process during composition preparation. The content of the quantum dots (A) in the composition relative to 100 parts by mass of the vinyl copolymer (B) is, for example, 50 parts by mass or more, preferably 55 parts by mass or more, more preferably 60 parts by mass or more, and further preferably 70 parts by mass or more, and is, for example, 350 parts by mass or less, preferably 250 parts by mass or less, more preferably 200 parts by mass or less, and further preferably 150 parts by mass or less. When the composition contains two or more quantum dots (A), the content or amount of the quantum dots (A) refers to the total content or amount of the two or more quantum dots (A). The same applies to components other than the quantum dots (A) that are or may be contained in the composition. [2] Organic Ligand (G) The composition may further contain an organic ligand (G), and the quantum dot (A) may also be present in the composition in a state coordinated with the organic ligand (G). The organic ligand (G) is, for example, an organic compound having a polar group that exhibits coordination ability with the quantum dot (A). The organic ligand (G) may, for example, be coordinated to the surface of the quantum dot (A). The composition may contain one or more organic ligands (G). In the composition, the organic ligand (G) preferably has at least a portion of its molecules coordinated to the quantum dots (A), and may have all or substantially all of its molecules coordinated to the quantum dots (A). Inclusion of an organic ligand (G) coordinated to the quantum dots (A) is advantageous from the perspective of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film. The polar group of the organic ligand (G) is, for example, selected from a thiol group (-SH), a carboxyl group (-COOH), and an amino group (-NH 2) at least one group selected from the group consisting of: (i) a ligand (G) having a polar group selected from this group; (ii) a ligand (G) having a polar group selected from this group; (iii) a ligand (G) having a polar group selected from the group consisting of: (i) a ligand (G) having a polar group selected from the group consisting of: (ii) a ligand (G) having a polar group selected from the group consisting of: (iii) a ligand (G) having a polar group selected from the group consisting of: (iv) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (i) a ligand (G) having a polar group selected from the group consisting of: (i) a ligand (G) having a polar group selected from the group consisting of: (i) a ligand (G) having a polar group selected from the group consisting of: (ii) a ligand (G) having a polar group selected from the group consisting of: (iii) a ligand (G) having a polar group selected from the group consisting of: (iv) a ligand (G) having a polar group selected from the group consisting of: (iv) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (v) a ligand (G) having a polar group selected from the group consisting of: (i ... The organic ligand (G) may be, for example, an organic compound represented by the following formula (x). A -R X (x) Where, X A is the polar group, R X It is a monovalent hydrocarbon group that may contain heteroatoms (N, O, S, halogen atoms, etc.). The hydrocarbon group may have one or more unsaturated bonds such as carbon-carbon double bonds. The hydrocarbon group may have a linear, branched, or cyclic structure. The number of carbon atoms in the hydrocarbon group may be, for example, 1 to 40, or 1 to 30. The methylene group in the hydrocarbon group may be substituted with -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, or -NH-. Base R XA polar group may also be included. Specific examples of the polar group include polar group X A The description of . As a polar group X having a carboxyl group A Specific examples of the organic ligand include formic acid, acetic acid, propionic acid, and other saturated or unsaturated fatty acids. Specific examples of saturated or unsaturated fatty acids include saturated fatty acids such as butyric acid, valeric acid, caproic acid, caprylic acid, capric acid, lauric acid, myristic acid, pentadecanoic acid, palmitic acid, margaric acid, stearic acid, arachidic acid, behenic acid, and lignoceric acid; monounsaturated fatty acids such as myristoleic acid, palmitoleic acid, oleic acid, icosenoic acid, erucic acid, and nervonic acid; linoleic acid, α-linolenic acid, γ-linolenic acid, stearidonic acid, dihomo-γ-linolenic acid, arachidonic acid, eicosatetraenoic acid, docosadienoic acid, adrenic acid, and linoleic acid. polyunsaturated fatty acids such as docosatetraenoic acid (docosatetraenoic acid) and others. Having a thiol group or an amine group as the polar group X A Specific examples of the organic ligand include the above-exemplified organic ligands having a carboxyl group as a polar group X A An organic ligand formed by replacing the carboxyl group of an organic ligand with a thiol group or an amine group. In addition to the above, examples of the organic ligand represented by the formula (x) include compound (G-1) and compound (G-2). [Compound (G-1)] Compound (G-1) is a compound having a first functional group and a second functional group. The first functional group is a carboxyl group (-COOH), and the second functional group is a carboxyl group or a thiol group (-SH). Compound (G-1) can serve as a ligand coordinated to quantum dots (A) due to its presence of a carboxyl group and / or a thiol group. The composition may contain only one compound (G-1) or two or more. An example of compound (G-1) is a compound represented by the following formula (G-1a): Compound (G-1) may be an acid anhydride of the compound represented by formula (G-1a). [Chemistry 4] [Where R B Represents a divalent hydrocarbon group; when there are multiple R B In the case of , these may be the same or different; the hydrocarbon group may have more than one substituent; in the case of multiple substituents, these may be the same or different, and these may be bonded to each other to form a ring together with the atoms to which they are bonded; -CH contained in the hydrocarbon group 2- can be substituted with -O-, -S-, or -SO 2-, -CO-, and -NH-; p represents an integer of 1 to 10] As R B Examples of the divalent hydrocarbon group include chain hydrocarbon groups, alicyclic hydrocarbon groups, and aromatic hydrocarbon groups. Examples of the chain hydrocarbon group include linear or branched alkanediyl groups, which usually have a carbon number of 1 or more and 50 or less, preferably 1 or more and 20 or less, and more preferably 1 or more and 10 or less. Examples of the alicyclic hydrocarbon group include monocyclic or polycyclic cycloalkanediyl groups, which usually have a carbon number of 3 or more and 50 or less, preferably 3 or more and 20 or less, and more preferably 3 or more and 10 or less. Examples of the aromatic hydrocarbon group include monocyclic or polycyclic arenediyl groups, which usually have a carbon number of 6 or more and 20 or less. Examples of the substituent that the hydrocarbon group may have include an alkyl group having 1 to 50 carbon atoms, a cycloalkyl group having 3 to 50 carbon atoms, an aryl group having 6 to 20 carbon atoms, a carboxyl group, an amino group, and a halogen atom. The substituent that the hydrocarbon group may have is preferably a carboxyl group, an amino group, or a halogen atom. The -CH contained in the hydrocarbon group When 2- is substituted with at least one of -O-, -CO- and -NH-, -CH 2- is preferably at least one of -CO- and -NH-, more preferably -NH-. p is preferably 1 or 2. Examples of the compound represented by formula (G-1a) include compounds represented by the following formulas (1-1) to (1-9). [Chemistry 5] Specific examples of the compound represented by formula (G-1a) by chemical name include mercaptoacetic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, 4-mercaptobutyric acid, mercaptosuccinic acid, mercaptostearic acid, mercaptooctanoic acid, 4-mercaptobenzoic acid, 2,3,5,6-tetrafluoro-4-mercaptobenzoic acid, L-cysteine, N-acetyl-L-cysteine, 3-methoxybutyl 3-mercaptopropionate, and 3-mercapto-2-methylpropionic acid. Among them, 3-mercaptopropionic acid and mercaptosuccinic acid are preferred. Another example of compound (G-1) is a polycarboxylic acid compound, preferably a compound (G-1b) among the compounds represented by formula (G-1a) above, wherein -SH in formula (G-1a) is substituted with a carboxyl group (-COOH). Examples of the compound (G-1b) include the following compounds: succinic acid, glutaric acid, adipic acid, octafluoroadipic acid, azelaic acid, dodecanedioic acid, tetradecanedioic acid, hexadecanedioic acid, heptadecanedioic acid, octadecanedioic acid, nonadecanedioic acid, dodecafluorooctanedioic acid, 3-ethyl-3-methylglutaric acid, hexafluoroglutaric acid, trans-3-hexenedioic acid, sebacic acid, hexadecanedicarboxylic acid, acetylene dicarboxylic acid, trans-guanosine, 1,3-adamantanedicarboxylic acid, bicyclo[2.2.2]octane-1,4-dicarboxylic acid, cis-4-cyclohexene-1,2-dicarboxylic acid, 1,1-cyclopropanedicarboxylic acid, 1,1-cyclobutanedicarboxylic acid, cis-1,3-cyclohexanedicarboxylic acid or trans-1,3-cyclohexanedicarboxylic acid, cis-1 ,4-cyclohexanedicarboxylic acid or trans-1,4-cyclohexanedicarboxylic acid, 1,1-cyclopentanediacetic acid, 1,2,3,4-cyclopentanetetracarboxylic acid, decahydro-1,4-naphthalene dicarboxylic acid, 2,3-norbornane dicarboxylic acid, 5-norbornene-2,3-dicarboxylic acid, phthalic acid, 3-fluorophthalic acid, isophthalic acid, tetrafluoroisophthalic acid, terephthalic acid, tetrafluoroterephthalic acid, 2,5-dimethylterephthalic acid, 2,6-naphthalene dicarboxylic acid, 2,3-naphthalene dicarboxylic acid, 1,4-naphthalene dicarboxylic acid, 1,1'-ferrocenedicarboxylic acid, 2,2'-biphenyl dicarboxylic acid, 4,4'-biphenyl dicarboxylic acid, 2,5-furan dicarboxylic acid, diphenylmethane Ketone-2,4'-dicarboxylic acid monohydrate, benzophenone-4,4'-dicarboxylic acid, 2,3-pyrazinedicarboxylic acid, 2,3-pyridinedicarboxylic acid, 2,4-pyridinedicarboxylic acid, 3,5-pyridinedicarboxylic acid, 2,5-pyridinedicarboxylic acid, 2,6-pyridinedicarboxylic acid, 3,4-pyridinedicarboxylic acid, pyrazole-3,5-dicarboxylic acid monohydrate, 4,4'-stilbene dicarboxylic acid, anthraquinone-2,3-dicarboxylic acid, 4-(carboxymethyl)benzoic acid, chelidonic acid monohydrate, azobenzene-4,4'-dicarboxylic acid, azobenzene-3,3'-dicarboxylic acid, chlorobridgeic acid, 1H-imidazole-4,5-dicarboxylic acid, 2,2-bis(4-carboxyphenyl)hexafluoropropane , 1,10-bis(4-carboxyphenoxy)decane, dipropylmalonic acid, dithiodiglycolic acid, 3,3'-dithiodipropionic acid, 4,4'-dithiodibutyric acid, 4,4'-dicarboxydiphenyl ether, 4,4'-dicarboxydiphenylsulfone, ethylene glycol bis(4-carboxyphenyl) ether, 3,4-ethylenedioxythiophene-2,5-dicarboxylic acid, 4,4'-isopropylidenediphenoxyacetic acid, 1,3-acetonedicarboxylic acid, methylenedisalicylic acid, 5,5'-thiodisalicylic acid, tris(2-carboxyethyl)isocyanurate, tetrafluorosuccinic acid, α,α,α',α'-tetramethyl-1,3-benzenedipropionic acid, 1,3,5-benzenetricarboxylic acid, etc. From the perspective of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, the molecular weight of compound (G-1) is preferably 3000 or less, more preferably 2500 or less, even more preferably 2000 or less, even more preferably 1000 or less, particularly preferably 800 or less, and most preferably 500 or less. The molecular weight of compound (G-1) is generally 100 or greater. The molecular weight may be a number average molecular weight or a weight average molecular weight. In this case, the number average molecular weight and the weight average molecular weight are respectively the number average molecular weight and the weight average molecular weight based on standard polystyrene measured by gel permeation chromatography (GPC). When the composition contains compound (G-1), the content ratio of compound (G-1) to quantum dots (A) in the composition is preferably 0.001 or more, more preferably 0.01 or more, and even more preferably 0.02 or more, and is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.45 or less, in terms of mass ratio. When the content ratio is within this range, it is advantageous from the perspective of improving the stability and dispersibility of the quantum dots (A) and the light-emitting properties of the film. When the composition contains compound (G-1), from the viewpoint of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, the content of compound (G-1) in the composition is preferably 0.1% by mass or more, more preferably 0.2% by mass or more, further preferably 0.5% by mass or more, and is preferably 20% by mass or less, more preferably 10% by mass or less, and further preferably 8% by mass or less, relative to the total solid content of the composition. [Compound (G-2)] Compound (G-2), unlike compound (G-1), comprises a polyalkylene glycol structure and has a polar group at a molecular terminal. The molecular terminal is preferably the terminus of the longest carbon chain (carbon atoms in the carbon chain may be substituted with other atoms such as oxygen atoms) in compound (G-2). The composition may contain only one compound (G-2) or two or more. The composition may contain compound (G-1) or compound (G-2), or may contain compound (G-1) and compound (G-2). Furthermore, a compound containing a polyalkylene glycol structure and having the first and second functional groups is considered compound (G-1). The polyalkylene glycol structure refers to a structure represented by the following formula (n is an integer of 2 or greater). [Chemistry 6] Where R C The alkylene group includes, for example, an ethylene group and a propylene group. Specific examples of the compound (G-2) include polyalkylene glycol compounds represented by the following formula (G-2a). [Chemistry 7] In formula (G-2a), X is a polar group, Y is a monovalent group, and Z is C is a divalent group or a trivalent group. n is an integer greater than 2. m is 1 or 2. C It is an alkylene group. The polar group X is preferably selected from thiol group (-SH), carboxyl group (-COOH) and amino group (-NH 2) at least one group selected from the group consisting of. Polar groups selected from this group are advantageous in terms of improving coordination with the quantum dots (A). From the perspective of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, the polar group X is more preferably at least one group selected from the group consisting of a thiol group and a carboxyl group. The group Y is a monovalent group. The group Y is not particularly limited, and examples thereof include monovalent hydrocarbon groups which may have substituents (N, O, S, halogen atoms, etc.). The -CH 2- may be substituted by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, -NH-, etc. The number of carbon atoms in the hydrocarbon group is, for example, 1 to 12. The hydrocarbon group may also have an unsaturated bond. Examples of the group Y include an alkyl group having a linear, branched, or cyclic structure and having 1 to 12 carbon atoms; and an alkoxy group having a linear, branched, or cyclic structure and having 1 to 12 carbon atoms. The number of carbon atoms in the alkyl group and the alkoxy group is preferably 1 to 8, more preferably 1 to 6, and even more preferably 1 to 4. The -CH 2- may be substituted by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, -NH-, etc. Among them, the group Y is preferably a linear or branched alkoxy group having 1 to 4 carbon atoms, more preferably a linear alkoxy group having 1 to 4 carbon atoms. The group Y may include a polar group. Examples of the polar group include a thiol group (-SH), a carboxyl group (-COOH), and an amino group (-NH 2) at least one group selected from the group consisting of: As described above, compounds comprising a polyalkylene glycol structure and having the first and second functional groups belong to compound (G-1). The polar group is preferably located at the end of group Y. Base Z Cis a divalent group or a trivalent group. C There are no particular limitations, and examples thereof include divalent or trivalent hydrocarbon groups that may contain heteroatoms (N, O, S, halogen atoms, etc.). The number of carbon atoms in the hydrocarbon group is, for example, 1 to 24. The hydrocarbon group may also have an unsaturated bond. The divalent group Z C Examples include alkylene groups having a linear, branched, or cyclic structure with a carbon number of 1 or more and 24 or less; and alkenylene groups having a linear, branched, or cyclic structure with a carbon number of 1 or more and 24 or less. The carbon number of the alkyl and alkenylene groups is preferably 1 or more and 12 or less, more preferably 1 or more and 8 or less, and even more preferably 1 or more and 4 or less. The -CH 2- may be substituted by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, -NH-, etc. C Examples of the divalent group Z can be cited from the group C A radical formed by removing a hydrogen atom from a . Base Z C Can have a branched structure. C A branch chain different from the branch chain including the polyalkylene glycol structure represented by the above formula (G-2a) may have a polyalkylene glycol structure different from the polyalkylene glycol structure represented by the above formula (G-2a). Among them, the base Z C A linear or branched alkylene group having 1 to 6 carbon atoms is preferred, and a linear alkylene group having 1 to 4 carbon atoms is more preferred. R C It is an alkylene group, preferably a linear or branched alkylene group having 1 to 6 carbon atoms, more preferably a linear alkylene group having 1 to 4 carbon atoms. n in formula (G-2a) is an integer of 2 or greater, preferably 2 or greater and 540 or less, more preferably 2 or greater and 120 or less, and still more preferably 2 or greater and 60 or less. The molecular weight of compound (G-2) can be, for example, approximately 150 to 10,000. From the perspective of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, it is preferably 150 to 5,000, and more preferably 150 to 4,000. This molecular weight may be either a number average molecular weight or a weight average molecular weight. In this case, the number average molecular weight and the weight average molecular weight are, respectively, the number average molecular weight and the weight average molecular weight measured by GPC in terms of standard polystyrene. When the composition contains compound (G-2), the content ratio of compound (G-2) to quantum dots (A) in the composition is preferably 0.001 or more, more preferably 0.01 or more, and even more preferably 0.1 or more, and is preferably 2 or less, more preferably 1.5 or less, and even more preferably 1 or less, in terms of mass ratio. If the content ratio is within this range, it is advantageous from the viewpoint of improving the stability and dispersibility of the quantum dots (A) and the light-emitting properties of the film. When the composition contains compound (G-2), from the viewpoint of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, the content of compound (G-2) in the composition is preferably 0.1% by mass or more, more preferably 1% by mass or more, further preferably 2% by mass or more, and is preferably 40% by mass or less, more preferably 20% by mass or less, further preferably 15% by mass or less, and further preferably 12% by mass or less, relative to the total solid content of the composition. When the composition contains an organic ligand (G), the content ratio of the organic ligand (G) to the quantum dots (A) in the composition is preferably 0.001 or greater, more preferably 0.01 or greater, and even more preferably 0.02 or greater, and is preferably 1 or less, more preferably 0.8 or less, and even more preferably 0.5 or less, by mass. This content ratio is advantageous from the perspective of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film. The content of the organic ligand (G) described herein refers to the total content of all organic ligands contained in the composition. From the viewpoint of improving the stability and dispersibility of the quantum dots (A) and the luminescent properties of the film, the total content of the quantum dots (A) and the organic ligand (G) in the composition is preferably 10% by mass or more, more preferably 12% by mass or more, and further preferably 15% by mass or more, and is preferably 75% by mass or less, more preferably 70% by mass or less, and further preferably 65% ​​by mass or less, relative to the total amount of the solid components of the composition. [3] Vinyl copolymer (B) The vinyl copolymer (B) comprises a structural unit (B-1) derived from (meth)acrylic acid (hereinafter also referred to as "monomer (b-1)"), a structural unit (B-2) derived from a (meth)acrylate having a carboxyl group (hereinafter also referred to as "monomer (b-2)"), and a structural unit (B-3) derived from a (meth)acrylate not having a carboxyl group (hereinafter also referred to as "monomer (b-3)"). The composition may contain two or more vinyl copolymers (B). The vinyl copolymer (B) further satisfies the following requirements: - contains a tellurium compound - has a molecular weight distribution of 2.0 or less - has an acid value of 100 mgKOH / g or more and 150 mgKOH / g or less. A composition containing the vinyl copolymer (B) can form a film with excellent pattern formability and luminescence properties. One major reason for the improved pattern formability is the narrow molecular weight distribution of the vinyl copolymer (B). It is believed that this narrow molecular weight distribution allows for clear boundaries between pattern areas and spatial areas during development, even with fine pattern shapes. A narrow molecular weight distribution is also advantageous in terms of improving the solvent resistance and heat resistance of films formed from the composition, as well as the pot life (stability over time) of the composition. Another major factor contributing to the formation of films with excellent luminescence properties is that the vinyl copolymer (B) contains a tellurium compound. By including a composition containing a vinyl copolymer (B), the dispersibility of the quantum dots (A) in the composition and the film formed therefrom can be improved, thereby improving the luminescence properties of the film. Furthermore, since the dispersibility of the quantum dots (A) can be improved, the content of the quantum dots (A) in the composition and the film formed therefrom can be increased (increasing the concentration of the quantum dots (A)). This means that even with a reduced film thickness, equivalent or better luminescence properties can be achieved. The main reasons for improving the dispersibility of the quantum dots (A) include: the acid value of the vinyl copolymer (B) being within the aforementioned range, the narrow molecular weight distribution of the vinyl copolymer (B), and the specific structure of the vinyl copolymer (B) and the monomer types comprising it. Furthermore, the composition containing the vinyl copolymer (B) can improve the dispersibility of the quantum dots (A), thereby forming a film having little or no aggregates and having an excellent appearance. The monomer (b-1) which is one of the monomers forming the vinyl copolymer (B) is (meth)acrylic acid, which is represented by the following formula (I). In the formula (I), X 1 represents a hydrogen atom or a methyl group. [Chemistry 8] The monomer (b-2) which is another monomer forming the vinyl copolymer (B) is a (meth)acrylate having a carboxyl group, and examples thereof include monomers represented by the following formula (II). [Chemistry 9] In formula (II), X 2 represents a hydrogen atom or a methyl group. 1 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms. 2 represents a linear, branched, or cyclic hydrocarbon group having 1 or more and 6 or less carbon atoms. 2- may be substituted by -C(=O)-, -O-, -S-, -NH-, or the like. Y The carbon number of the hydrocarbon group represented by 1 is preferably 1 or more and 4 or less, more preferably 1 or more and 3 or less. 1 represents a hydrocarbon group and Y Examples of the hydrocarbon group represented by 2 include an alkylene group, a divalent aromatic group, and a divalent alicyclic group, each of which is independently listed. Specific examples of the monomer represented by formula (II) include 2-methacryloyloxyethylsuccinic acid, 2-acryloyloxyethylsuccinic acid, mono-2-(methacryloyloxy)ethyl phthalate, mono-2-(acryloyloxy)ethyl phthalate, 2-(methacryloyloxy)ethyl hexahydrophthalate, and 2-(acryloyloxy)ethyl hexahydrophthalate. The monomer (b-3) which is another monomer constituting the vinyl copolymer (B) is a (meth)acrylate having no carboxyl group, and examples thereof include monomers represented by the following formula (III). [Chemistry 10] In formula (III), X 3 represents a hydrogen atom or a methyl group. 1 represents a linear, branched, or cyclic hydrocarbon group having 1 or more and 30 or less carbon atoms. 2- can be substituted by -C(=O)-, -O-, -S-, -NH-, etc. The number of carbon atoms in the hydrocarbon group represented by 1 is preferably 1 or more and 20 or less, more preferably 1 or more and 12 or less, and still more preferably 1 or more and 6 or less. Examples of the hydrocarbon group represented by 1 include an alkyl group, a monovalent aromatic group, and a monovalent alicyclic group, each of which is independently listed. Specific examples of the monomer (b-3) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0](meth)acrylate, 2,6 ] decane-8-yl ester (in the technical field, it is commonly known as "dicyclopentanyl (meth)acrylate"; in addition, it is sometimes called "tricyclodecyl (meth)acrylate"), tricyclo[5.2.1.0 2,6 ] (Meth)acrylates such as decen-8-yl ester (commonly known as "dicyclopentenyl (meth)acrylate" in the technical field), dicyclopentanyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, adamantyl (meth)acrylate, allyl (meth)acrylate, propargyl (meth)acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate, and benzyl (meth)acrylate; (meth)acrylates containing hydroxyl groups such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate, etc. From the viewpoint of improving the patterning properties and light-emitting properties of the film, the vinyl copolymer (B) preferably has structural units derived from monomers represented by formula (I), formula (II), and formula (III). The content of the structural units (B-1) derived from the monomer (b-1) in the vinyl copolymer (B) is preferably 2 mol% or more, more preferably 5 mol% or more, and even more preferably 10 mol% or more, and is preferably 60 mol% or less, more preferably 50 mol% or less, and even more preferably 40 mol% or less, based on 100 mol% of all the structural units. The content of the structural units (B-2) derived from the monomer (b-2) is preferably 1 mol% or more, more preferably 2 mol% or more, even more preferably 5 mol% or more, and is preferably 50 mol% or less, more preferably 40 mol% or less, and even more preferably 30 mol% or less, based on 100 mol% of all the structural units. The content of the structural unit (B-3) derived from the monomer (b-3) in 100 mol% of all the structural units is preferably 10 mol% or more, more preferably 20 mol% or more, further preferably 30 mol% or more, and is preferably 97 mol% or less, more preferably 90 mol% or less, further preferably 85 mol% or less. The vinyl copolymer (B) may further contain a structural unit (B-4) having a UV-curable functional group. The inclusion of structural unit (B-4) can further improve the film's solvent resistance and heat resistance. Examples of UV-curable functional groups include ethylenically unsaturated bonds, preferably ethylenically unsaturated double bonds. Preferred UV-curable functional groups include ethylenically unsaturated bonds such as (meth)acryloyl, vinyl, and allyl groups. Structural unit (B-4) preferably has a UV-curable functional group in a side chain. The vinyl copolymer (B) having the structural unit (B-4) can be produced by reacting, for example, a compound (b-4) having both an epoxy group and a UV-curable functional group in its molecule with the carboxyl groups of the structural unit (B-1) and / or the structural unit (B-2) of the vinyl polymer having the structural units (B-1) to (B-3) in the presence of a reaction catalyst and a polymerization inhibitor, typically at a temperature of about 80°C to 130°C, thereby converting at least a portion of the structural units (B-1) and / or (B-2) into the structural unit (B-4). According to this method, the reaction between the carboxyl group and the epoxy group forms the structural unit (B-4) having the UV-curable functional group introduced into the side chain. Examples of compounds (b-4) having both an epoxy group and a UV-curable functional group within the molecule include glycidyl (meth)acrylate, 4-glycidyloxybutyl (meth)acrylate, and 3,4-epoxycyclohexylmethyl (meth)acrylate. Examples of reaction catalysts include tertiary amines such as triethylamine, quaternary ammonium salts such as triethylbenzylammonium chloride, imidazole compounds such as 2-ethyl-4-methylimidazole, and phosphorus compounds such as triphenylphosphine. Examples of polymerization inhibitors include oxygen, p-methoxyphenol (methoquinone), hydroquinone, trimethylhydroquinone, N-nitrosophenylhydroxylamine, 2,2,6,6-tetramethylpiperidinyl-1-oxyl, and derivatives of 2,2,6,6-tetramethylpiperidinyl-1-oxyl. The weight average molecular weight per mol of ethylenically unsaturated bonds of the vinyl copolymer (B), i.e., the ethylenically unsaturated bond equivalent, is preferably greater than 1000, more preferably 2000 or greater, and even more preferably 3000 or greater, and is preferably 8000 or less, more preferably 6000 or less, and even more preferably 4000 or less. When the ethylenically unsaturated bond equivalent falls within this range, it is advantageous in further improving the solvent resistance and heat resistance of the film. The ethylenically unsaturated bond equivalent of the vinyl copolymer (B) can be measured according to the method described in the Examples section below. The vinyl copolymer (B) may contain structural units other than the structural units (B-1) to (B-4). However, from the viewpoint of improving the patterning properties and light-emitting properties of the film, the total content of the structural units (B-1) to (B-4) is preferably 80 mol% or more, more preferably 90 mol% or more, further preferably 95 mol% or more, and particularly preferably 100 mol% based on 100 mol% of all the structural units. The vinyl copolymer (B) contains a tellurium compound. The tellurium compound is usually a compound derived from a chain transfer agent described later used in the preparation of the vinyl copolymer (B). The content of the tellurium compound in the vinyl copolymer (B) is usually more than 0 ppm, preferably more than 10 ppm, more preferably more than 20 ppm, and usually less than 350 ppm, preferably less than 200 ppm, more preferably less than 100 ppm, calculated as metallic tellurium. The ppm mentioned here is a mass reference. The tellurium compound content within the above range is advantageous in obtaining a film with good pattern formability and luminescent properties, and is particularly advantageous in obtaining a film with good luminescent properties. The content of the tellurium compound in the vinyl copolymer (B) can be measured according to the method described in the Example column described later. The molecular weight distribution of the vinyl copolymer (B) is 2.0 or less, preferably 1.9 or less, more preferably 1.8 or less, further preferably 1.7 or less, further preferably 1.6 or less, and particularly preferably 1.55 or less. Regarding the molecular weight distribution, the smaller the value, the narrower the molecular weight distribution, and the more uniform the molecular weight of the copolymer. When the value is 1.0, the width of the molecular weight distribution is the narrowest. That is, the lower limit of the molecular weight distribution is 1.0. The molecular weight distribution within the above range is advantageous in obtaining a film with good pattern formability and luminescence properties, and furthermore, it can be advantageous in improving the dispersibility of the quantum dots (A), the solvent resistance and heat resistance of the film, and the pot life (stability over time) of the composition. The vinyl copolymer (B) having a molecular weight distribution within the above range can be suitably manufactured, for example, by the method described below. The molecular weight distribution of the vinyl copolymer (B) is represented by Mw / Mn, where the weight average molecular weight (Mw) and the number average molecular weight (Mn) are represented by Mn. The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the vinyl copolymer (B) can be measured according to the method described in the Examples section below. The weight average molecular weight (Mw) of the vinyl copolymer (B) is, for example, 3,000 to 20,000. From the perspective of improving the patterning properties and luminescent properties of the film, it is preferably 4,500 or more, more preferably 6,000 or more. It is also preferably 14,000 or less, more preferably 9,500 or less. The Mw of the vinyl copolymer (B) can be adjusted by appropriately combining reaction conditions such as the selection of raw materials used, the charging method, and the reaction temperature and time. The acid value of the vinyl copolymer (B) is 100 mgKOH / g or higher and 150 mgKOH / g or lower, preferably 105 mgKOH / g or higher, more preferably 120 mgKOH / g or higher, and even more preferably 130 mgKOH / g or higher, and preferably 145 mgKOH / g or lower, more preferably 140 mgKOH / g or lower. An acid value within this range is advantageous in obtaining a film with excellent pattern formability and light-emitting properties, and is particularly advantageous in obtaining a film with excellent pattern formability. The acid value of the vinyl copolymer (B) is measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the vinyl copolymer (B) and can be measured according to the method described in the Examples section below. The acid value of the vinyl copolymer (B) can be controlled, for example, by adjusting the content of the structural unit (B-1) and / or the structural unit (B-2) in the vinyl copolymer (B). The vinyl copolymer (B) may be a random copolymer or a block copolymer. From the perspective of obtaining a film with good patterning properties and luminescence properties, and further from the perspective of improving the dispersibility of the quantum dots (A), the solvent resistance and heat resistance of the film, and the pot life (temporal stability) of the composition, the vinyl copolymer (B) is preferably a block copolymer. As block copolymers, block copolymers having A blocks and B blocks can be cited. When a block contains two or more constituent units, the block may be contained in any of the forms of random copolymerization and block copolymerization. In one embodiment, the vinyl copolymer (B) is preferably a block copolymer having no blocks other than the A block and the B block. By arranging the constituent units (B-1) and the constituent units (B-2) in different blocks, there is a tendency to further improve the pattern forming properties and luminescent properties of the film, or further improve the dispersibility of the quantum dots (A), the solvent resistance and heat resistance of the film, and the pot life (stability over time) of the composition. From this perspective, preferred block copolymers include those in which the A block contains the structural unit (B-1) but does not contain the structural unit (B-2), and the B block contains the structural unit (B-2) but does not contain the structural unit (B-1). The structural unit (B-3) is preferably contained in both the A block and the B block. Furthermore, the A block and / or the B block may contain the structural unit (B-4). In the vinyl copolymer (B) comprising an A block comprising the structural units (B-1) and the structural units (B-3), and a B block comprising the structural units (B-2) and the structural units (B-3), the content of the structural unit (B-1) in the A block (when the A block further comprises the structural unit (B-4), the total content together with the content of the structural unit) is preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 15 mol% or more, and is preferably 60 mol% or less, more preferably 50 mol% or less, further preferably 40 mol% or less, based on 100 mol% of all the structural units in the A block. The content of the structural unit (B-2) in the B block (when the B block further contains the structural unit (B-4), the total content together with the content of the structural unit) is preferably 10 mol% or more, more preferably 15 mol% or more, and is preferably 80 mol% or less, more preferably 75 mol% or less, and further preferably 70 mol% or less, based on 100 mol% of all the structural units in the B block. The proportion of all the constituent units of the A block in all the constituent units of the vinyl copolymer (B) is, for example, 30 mol% or more, preferably 40 mol% or more, more preferably 50 mol% or more, further preferably 60 mol% or more, and is, for example, 90 mol% or less, preferably 85 mol% or less, more preferably 80 mol% or less. The vinyl copolymer (B) can be produced, for example, by free radical polymerization. Among these, living radical polymerization is preferred because it allows for precise control of molecular weight distribution and facilitates production of a polymer with a uniform composition. Living radical polymerization using an organotellurium compound as a chain transfer agent is more preferred. Examples of such living radical polymerization methods include those described in International Publication Nos. 2004 / 14848, 2004 / 14962, 2004 / 072126, and 2004 / 096870. Examples of the living radical polymerization method using an organic tellurium compound include the following methods (a) to (d). (a) Monomers are polymerized using an organic tellurium compound represented by formula (T1). (b) Monomers are polymerized using a mixture of an organic tellurium compound represented by formula (T1) and an azo polymerization initiator. (c) Monomers are polymerized using a mixture of an organic tellurium compound represented by formula (T1) and an organic ditelluride compound represented by formula (T2). (d) Monomers are polymerized using a mixture of an organic tellurium compound represented by formula (T1), an azo polymerization initiator, and an organic ditelluride compound represented by formula (T2). A -Te-CZ B Z C Z D (T1) Z A -Te-Te-Z A (T2) In formula (T1) and formula (T2), Z A represents an alkyl group, an aryl group or an aromatic heterocyclic group having 1 to 8 carbon atoms. B and Z C Each independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. D It represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. Examples of the organotellurium compound represented by formula (T1) include ethyl 2-methyl-2-n-butyltelluryl propionate, ethyl 2-n-butyltelluryl propionate, (2-hydroxyethyl)-2-methyl-methyltelluryl propionate, and organotellurium compounds described in International Publication Nos. 2004 / 14848, 2004 / 14962, 2004 / 072126, and 2004 / 096870. Examples of the organic ditelluride compound represented by formula (T2) include dimethyl ditelluride and dibutyl ditelluride. The azo polymerization initiator can be used without particular limitation as long as it is an azo polymerization initiator commonly used in radical polymerization. Examples thereof include 2,2'-azobis(isobutyronitrile) (AIBN), 2,2'-azobis(2,4-dimethylvaleronitrile) (ADVN), 1,1'-azobis(1-cyclohexanecarbonitrile) (ACHN), and 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile) (V-70). The living radical polymerization reaction can be carried out by mixing the monomers with the organotellurium compound of formula (T1) in a container purged with an inert gas. Depending on the type of monomer, an azo polymerization initiator and / or an organic ditelluride compound of formula (T2) may be further added for the purpose of promoting the reaction, controlling the molecular weight and molecular weight distribution, etc., and heating may be performed as needed. Examples of the inert gas include nitrogen, argon, and helium, with argon and nitrogen being preferred. The amount of monomer used in methods (a), (b), (c), and (d) can be adjusted appropriately based on the physical properties of the desired vinyl copolymer (B). The polymerization reaction of living radical polymerization can be carried out in the absence of a solvent, but it can also be carried out by using an aprotic solvent or a protic solvent commonly used in radical polymerization and stirring the mixture. Examples of aprotic solvents include anisole, benzene, toluene, propylene glycol monomethyl ether acetate, ethyl acetate, tetrahydrofuran (THF), etc. In addition, examples of protic solvents include water, methanol, 1-methoxy-2-propanol, etc. The solvent can be used alone or in combination of two or more. The amount of solvent used can be adjusted appropriately, for example, preferably 0.01 mL or more and 50 mL or less relative to 1 g of monomer. The reaction temperature and reaction time can be adjusted appropriately according to the molecular weight or molecular weight distribution of the vinyl copolymer (B) to be obtained, usually at a temperature above 0°C and below 150°C, with stirring for 1 minute or more and 100 hours or less. After the polymerization reaction is completed, the target vinyl copolymer (B) can be isolated from the reaction mixture by removing the solvent and residual monomers by conventional separation and purification means. The vinyl copolymer (B) obtained by the polymerization reaction has a growth end of -TeZ A (Where Z A The tellurium atoms are removed from the growth terminals by separation and purification after the polymerization reaction. Even after the tellurium atoms are removed, tellurium compounds derived from the chain transfer agent may remain in the vinyl copolymer (B). The vinyl copolymer (B) having the structural unit (B-4) can be obtained by preparing a vinyl polymer having the structural units (B-1) to (B-3), and then reacting the vinyl polymer with the compound (b-4) having both an epoxy group and a UV-curable functional group in the molecule. The content of the vinyl copolymer (B) in the composition is, for example, 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, and for example, 80% by mass or less, preferably 70% by mass or less, more preferably 60% by mass or less, and even more preferably 55% by mass or less, relative to the total solids content of the composition. When the content of the vinyl copolymer (B) is within this range, the dispersibility of the quantum dots (A), the solvent resistance and heat resistance of the film, and the pot life (stability over time) of the composition tend to be improved. This also tends to improve the patterning properties and luminescence characteristics of the film, and further, the dispersibility of the quantum dots (A), the solvent resistance and heat resistance of the film, and the pot life (stability over time) of the composition tend to be improved. In the composition, the mass ratio (solid content ratio) of the vinyl copolymer (B) to the polymerizable compound (C) described below is, for example, 1 or more, preferably 1.5 or more, and more preferably 2 or more from the viewpoint of film patterning properties and light emitting properties. [4] Polymerizable compound (C) The composition may further contain a polymerizable compound (C). The polymerizable compound (C) is a compound that can be polymerized by active free radicals, acids, etc. generated from the polymerization initiator (D) described below. Examples of the polymerizable compound (C) include photopolymerizable compounds such as compounds having ethylenically unsaturated bonds, for example, (meth)acrylate compounds. Another example of the polymerizable compound (C) is a thermally polymerizable compound. The composition may also contain two or more polymerizable compounds (C). The polymerizable compound (C) is preferably a photopolymerizable compound having three or more ethylenically unsaturated bonds in the molecule. The weight average molecular weight of the polymerizable compound (C) is preferably 150 or more, more preferably 250 or more, and preferably 2900 or less, more preferably 1500 or less. Examples of photopolymerizable compounds having three or more ethylenically unsaturated bonds in the molecule include compounds (Ca) having three or more ethylenically unsaturated bonds in the molecule and having an acidic functional group, and compounds (Cb) having three or more ethylenically unsaturated bonds in the molecule and not having an acidic functional group. The polymerizable compound (C) preferably comprises at least one of the compound (Ca) and the compound (Cb). It may also comprise two or more compounds (Ca), two or more compounds (Cb), or at least one of the compound (Ca) and at least one of the compound (Cb). Examples of the acidic functional group include carboxyl groups, sulfonic acid groups, and phosphoric acid groups. Among these, the acidic functional group is preferably a carboxyl group. By including the compound (Ca) in the polymerizable compound (C), the dispersion of the quantum dots (A) in the composition can be improved, thereby enhancing the luminescence properties of the film. Furthermore, by including the compound (Ca) in the polymerizable compound (C), the curability and heat resistance of the composition can be enhanced. The ethylenically unsaturated bond of compound (Ca) is preferably a (meth)acryloyloxy group. The number of ethylenically unsaturated bonds in one molecule of compound (Ca) is preferably 3 or more and 5 or less, more preferably 3. The number of acidic functional groups in one molecule of compound (Ca) is 1 or more. When compound (Ca) has two or more acidic functional groups, each acidic functional group may be different or the same, and preferably has at least one carboxyl group. Examples of the compound (Ca) include compounds obtained by polybasic acid modification of compounds having three or more (meth)acryloyloxy groups and hydroxyl groups, such as pentaerythritol tri(meth)acrylate or dipentaerythritol penta(meth)acrylate. Examples of such compounds include compounds obtained by monoesterifying pentaerythritol tri(meth)acrylate with a dibasic acid (e.g., succinic acid, maleic acid) or its anhydride, and compounds obtained by monoesterifying dipentaerythritol penta(meth)acrylate with a dibasic acid (e.g., succinic acid, maleic acid) or its anhydride. The ethylenically unsaturated bond contained in the compound (Cb) is preferably a (meth)acryloyloxy group. The number of ethylenically unsaturated bonds contained in one molecule of the compound (Cb) is preferably 3 or more and 6 or less. Examples of the compound (Cb) include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, tetrapentaerythritol nona(meth)acrylate, tris(2-(meth)acryloyloxyethyl) isocyanurate, ethylene glycol-modified pentaerythritol tetra(meth)acrylate, ethylene glycol-modified dipentaerythritol hexa(meth)acrylate, propylene glycol-modified pentaerythritol tetra(meth)acrylate, propylene glycol-modified dipentaerythritol hexa(meth)acrylate, caprolactone-modified pentaerythritol tetra(meth)acrylate, and caprolactone-modified dipentaerythritol hexa(meth)acrylate. Among them, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like are preferred. When the composition contains a polymerizable compound (C), the content of the polymerizable compound (C) in the composition is preferably 5% by mass or more, more preferably 7% by mass or more, and even more preferably 10% by mass or more, and is preferably 60% by mass or less, more preferably 45% by mass or less, and even more preferably 30% by mass or less, relative to the total solid content of the composition. When the content of the polymerizable compound (C) is within this range, the developability of the composition and the solvent resistance of the resulting film tend to be improved. [5] Polymerization initiator (D) The composition may further contain a polymerization initiator (D). The polymerization initiator (D) is a compound that can generate active free radicals, acids, etc. by the action of light or heat to initiate polymerization of the polymerizable compound (C). The composition may contain one or more polymerization initiators (D). Examples of the polymerization initiator (D) include: photopolymerization initiators such as oxime compounds, phenylalkyl ketone compounds, biimidazole compounds, triazine compounds, and acylphosphine compounds; and thermal polymerization initiators such as azo compounds and organic peroxides. An example of an oxime compound is an oxime compound having a first molecular structure represented by the following formula (1). Hereinafter, this oxime compound is also referred to as "oxime compound (1)". [Chemistry 11] From the perspective of improving the light-emitting properties of the film, it is advantageous to include an oxime compound (1) as a polymerization initiator (D). One reason for this effect is presumably that, due to the unique molecular structure of the oxime compound (1), the absorption wavelength of the oxime compound (1) changes significantly before and after the cleavage (decomposition) of the oxime compound (1), which is necessary for the initiation of photopolymerization, and thus the oxime compound (1) has a high ability to initiate photoradical polymerization. In formula (1), R 1 Represents R 11 , OR 11 、COR 11 SR 11 、CONR 12 R 13 or CN. R 11 、R 12 and R 13Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 11 、R 12 or R 13 The hydrogen atoms of the groups represented by can be 21 、COR 21 SR 21 NR 22 Ra 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms, or COOR 21 Replace. R 21 、R 22 and R 23 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 21 、R 22 or R 23 The hydrogen atoms of the groups represented by may be substituted by CN, halogen atoms, hydroxyl groups or carboxyl groups. 11 、R 12 、R 13 、R 21 、R 22 or R 23 When the group represented by has an alkylene moiety, the alkylene moiety can be represented by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted more than 1 time and less than 5 times. 24 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 11 、R 12 、R 13 、R 21 、R 22 or R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 12 With R 13 and R 22 With R 23 They can form a ring together. * represents a bond to the second molecular structure, which is another molecular structure other than the first molecular structure of the oxime compound (1). As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Examples of the alkyl group having 1 to 20 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl, t-pentyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, t-octyl, nonyl, isononyl, decyl, isodecyl, undecyl, dodecyl, tetradecyl, hexadecyl, octadecyl, eicosyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, and cyclohexylethyl. As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Examples of the aryl group having 6 to 30 carbon atoms include phenyl, tolyl, xylyl, ethylphenyl, naphthyl, anthracenyl, phenanthrenyl, and phenyl substituted with one or more of the above alkyl groups, biphenyl, naphthyl, and anthracenyl. As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Examples of the aralkyl group having 7 to 30 carbon atoms include benzyl, α-methylbenzyl, α,α-dimethylbenzyl, and phenylethyl. As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Examples of the heterocyclic group having 2 or more and 20 carbon atoms represented by alkyl include pyridyl, pyrimidinyl, furyl, thienyl, tetrahydrofuranyl, dioxolanyl, benzoxazol-2-yl, tetrahydropyranyl, pyrrolidinyl, imidazolidinyl, pyrazolidinyl, tetrahydrothiazolyl, isotetrahydrothiazolyl, oxazolidinyl, isoxazolidinyl, piperidinyl, piperazinyl, and morpholinyl, and preferably a 5- to 7-membered heterocyclic ring. R in formula (1) 12 With R 13 and R 22 With R 23 can form a ring together, which means R 12 With R 13 and R 22 With R 23 They can form a ring together with the nitrogen atom, carbon atom or oxygen atom to which they are connected. 12 With Ra 13 and Ra 22 With Ra 23 Examples of the ring that can be formed together include a cyclopentane ring, a cyclohexane ring, a cyclopentene ring, a benzene ring, a piperidine ring, a morpholine ring, a lactone ring, and a lactamide ring, and a 5- to 7-membered ring is preferred. As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 and R 23 Examples of the halogen atom which may be present as a substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. R in formula (1) 1 Preferably R 11 , more preferably an alkyl group having 1 to 20 carbon atoms, further preferably an alkyl group having 1 to 10 carbon atoms, further more preferably an alkyl group having 1 to 6 carbon atoms. An example of a second molecular structure linked to the first molecular structure represented by formula (1) is the structure represented by the following formula (2). The second molecular structure refers to a molecular structure portion other than the first molecular structure possessed by the oxime compound (1). The bond represented by "*" in formula (2) is directly bonded to the bond represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (2), the benzene ring having "-*" in formula (2) is directly bonded to the carbonyl group having "-*" in formula (1). [Chemistry 12] In formula (2), R 2 and R 3 R 11 , OR 11 SR 11 、COR 11 、CONR 12 R 13 NR 12 COR 11 , OCOR 11 、COOR 11 SCOR 11 , OCSR 11 、COSR 11 , CSOR 11 , CN or halogen atoms. 2 When there are multiple R 3 When , these may be the same or different. 11 、R 12 and R 13s and t each independently represent an integer of 0 or more and 4 or less. L represents a sulfur atom, CR 31 R 32 , CO or NR 33 . R 31 、R 32 and R 33 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or an aralkyl group having 7 to 30 carbon atoms. 31 、R 32 or R 33 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 31 、R 32 and R 33 Each of R can independently form a ring together with an adjacent benzene ring. 4 represents a hydroxyl group, a carboxyl group, or a group represented by the following formula (2-1). [Chemistry 13] (In formula (2-1), L 1 Indicates -O-, -S-, and -NR 22 -、-NR 22 CO-, -SO 2-, -CS-, -OCO- or -COO-; R 22 Means the same as above; L 2 represents a group formed by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms, a group formed by removing v hydrogen atoms from an aryl group having 6 to 30 carbon atoms, a group formed by removing v hydrogen atoms from an aralkyl group having 7 to 30 carbon atoms, or a group formed by removing v hydrogen atoms from a heterocyclic group having 2 to 20 carbon atoms; in L 2When the group represented by has an alkylene moiety, the alkylene moiety can be represented by -O-, -S-, -COO-, -OCO-, -NR 22 -、-NR 22 COO-、-OCONR 22 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted 1 or more times and 5 or less times, and the alkylene portion may be branched or cyclic; R 4a Indicates OR 41 SR 41 、CONR 42 R 43 NR 42 COR 43 , OCOR 41 、COOR 41 SCOR 41 , OCSR 41 、COSR 41 , CSOR 41 , CN or halogen atoms; In the presence of multiple R 4a When R 41 、R 42 and R 43 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or an aralkyl group having 7 to 30 carbon atoms, and in R 41 、R 42 and R 43 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 42 With R 43They may form a ring together; v represents an integer of 1 to 3 inclusive) * represents a bond with the first molecular structure of the oxime compound (1). R in formula (2) 11 、R 12 、R 13 、R 21 、R 22 、R 23 、R 24 、R 31 、R 32 and R 33 And R in the formula (2-1) 22 、R 41 、R 42 and R 43 Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, and the aralkyl group having 7 to 30 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as the example. R in formula (2) 11 、R 12 、R 13 、R 21 、R 22 、R 23 、R 24And R in the formula (2-1) 22 Examples of heterocyclic groups having 2 or more and 20 or less carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as the example. R in formula (2) 31 、R 32 and R 33 can independently form a ring with an adjacent benzene ring means R 31 、R 32 and R 33 Each of them can independently form a ring together with an adjacent benzene ring and the nitrogen atom to which it is connected. 31 、R 32 and R 33 Examples of rings that can be formed together with an adjacent benzene ring and Ra in formula (1) 12 With Ra 13 and Ra 22 With Ra 23 The examples of rings that can be formed together are the same. L in the formula (2-1) 2 It represents a group formed by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. Examples of the group formed by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms include, for example, a methylene group, an ethylene group, a propylene group, a methylethylene group, a butylene group, a 1-methylpropylene group, a 2-methylpropylene group, a 1,2-dimethylpropylene group, a 1,3-dimethylpropylene group, a 1-methylbutylene group, a 2-methylbutylene group, a 3-methylbutylene group, a 4-methylbutylene group, a 2,4-dimethylbutylene group, a 1,3-dimethylbutylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group, a nonylene group, a decylene group, a dodecylene group, a tridecylene group, a tetradecyl group, a pentadecyl group, an ethane-1,1-diyl group, and a propane-2,2-diyl group. Examples of the group formed by removing v hydrogen atoms from an aryl group having 6 to 30 carbon atoms include, for example, arylene groups such as 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, 2,6-naphthylene, 1,4-naphthylene, 2,5-dimethyl-1,4-phenylene, diphenylmethane-4,4'-diyl, 2,2-diphenylpropane-4,4'-diyl, diphenylsulfide-4,4'-diyl, and diphenylsulfone-4,4'-diyl when v is 1. Examples of the group formed by removing v hydrogen atoms from an aralkyl group having 7 to 30 carbon atoms include, when v is 1, a group represented by the following formula (a) and a group represented by the following formula (b). [Chemistry 14] [In formula (a) and formula (b), L 3 and L 5 represents an alkylene group having 1 to 10 carbon atoms, L 4 and L 6 represents a single bond or an alkylene group having 1 to 10 carbon atoms] Examples of the alkylene group having 1 to 10 carbon atoms include a methylene group, an ethylene group, a propylene group, a methylethylene group, a butylene group, a 1-methylpropylene group, a 2-methylpropylene group, a 1,2-dimethylpropylene group, a 1,3-dimethylpropylene group, a 1-methylbutylene group, a 2-methylbutylene group, a 3-methylbutylene group, a 4-methylbutylene group, a 2,4-dimethylbutylene group, a 1,3-dimethylbutylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group, a nonylene group, and a decylene group. Examples of the group formed by removing v hydrogen atoms from a heterocyclic group having 2 or more and 20 carbon atoms include, for example, when v is 1, divalent heterocyclic groups such as 2,5-pyridinediyl, 2,6-pyridinediyl, 2,5-pyrimidinediyl, 2,5-thiophenediyl, 3,4-tetrahydrofurandiyl, 2,5-tetrahydrofurandiyl, 2,5-furandiyl, 3,4-thiazolediyl, 2,5-benzofurandiyl, 2,5-benzothiophenediyl, N-methylindole-2,5-diyl, 2,5-benzothiazolediyl, and 2,5-benzoxazolediyl. As R in formula (2) 2 and R 3 , and R in the formula (2-1) 4a Examples of the halogen atom represented by include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. From the viewpoint of solubility in the solvent (E) and / or developability of the composition, a preferred example of the structure represented by formula (2) is a structure represented by the following formula (2a). [Chemistry 15] [In formula (2a), L' represents a sulfur atom or NR 50 , R 50 represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, R 2 、R 3 、R 4 , s and t have the same meanings as above] From the same viewpoint as described above, another preferred example of the structure represented by formula (2) is the structure represented by the following formula (2b). [Chemistry 16] [In formula (2b), R 44 represents a hydroxyl group, a carboxyl group, or a group represented by the following formula (2-2); [Chemistry 17] (In formula (2-2), L 11 Indicates -O- or *-OCO-, * indicates ​​with L 12 The bonding bond, L 12 represents an alkylene group having 1 to 20 carbon atoms, which may be interrupted by 1 to 3 -O- groups, and R 44a Indicates OR 55 or COOR 55 , R 55 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms)] R 44 Preferred is a group represented by formula (2-2). In this case, it is advantageous in terms of the solubility of the oxime compound (1) in the solvent (E) and the developability of the composition. L 12 The carbon number of the alkylene group represented by is preferably 1 or more and 10 or less, more preferably 1 or more and 4 or less. 44a Preferred is a hydroxyl group or a carboxyl group, and more preferred is a hydroxyl group. The method for producing the oxime compound (1) having the second molecular structure represented by formula (2) is not particularly limited, and it can be produced, for example, by the method described in Japanese Patent Application Laid-Open No. 2011-132215. Another example of a second molecular structure linked to the first molecular structure represented by formula (1) is the structure represented by the following formula (3). The bond represented by "*" in formula (3) is directly bonded to the bond represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (3), the benzene ring having "-*" in formula (3) is directly bonded to the carbonyl group having "-*" in formula (1). [Chemistry 18] In formula (3), R 5 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 5 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 5 The hydrogen atoms of the groups represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atom, or COOR 21 Replace. R 21 、R 22 and R 23 Means the same as above. 21 、R 22 or R 23 The hydrogen atom of the group represented by may be substituted by CN, a halogen atom, a hydroxyl group or a carboxyl group. 21 、R 22 and R 23When the group represented by has an alkylene moiety, the alkylene moiety can be represented by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted more than 1 time and less than 5 times. 24 Means the same as above. 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 With R 23 Can form a ring together. 6 、R 7 、R 8 and R 9 R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom. 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the groups represented by can be 21 、COR 21 SR 21 NR 22 Ra 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms, or COOR 21 Replace. R 6 With R 7 、R 7 With R 8 and R 8 With R 9 They can form a ring together. * represents a bond with the first molecular structure of the oxime compound (1). R in formula (3) 5 、R 21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, the aralkyl group having 7 to 30 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as the example. R in formula (3) 22 With R 23 Can form a ring together means R 22 With R 23 Together with the nitrogen atom, carbon atom or oxygen atom to which it is connected, they can form a ring. 22 With R 23 Examples of rings that can be formed together and for Ra in formula (1) 12 With Ra 13 and Ra 22 With Ra 23 The examples of rings that can be formed together are the same. As R in formula (3) 6 、R 7 、R 8 and R 9 The halogen atom represented by R 5 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including the hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. From the viewpoint of solubility in the solvent (E) and / or developability of the composition, in a preferred embodiment, R 5 It is a group represented by the following formula (3-1). [Chemistry 19] [In formula (3-1), Z represents a group formed by removing one hydrogen atom from an alkyl group having 1 to 20 carbon atoms, a group formed by removing one hydrogen atom from an aryl group having 6 to 30 carbon atoms, a group formed by removing one hydrogen atom from an aralkyl group having 7 to 30 carbon atoms, or a group formed by removing one hydrogen atom from a heterocyclic group having 2 to 20 carbon atoms. When the group represented by Z has an alkylene moiety, the alkylene moiety may be -O-, -S-, -COO-, -OCO-, -NR- 24 -、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted 1 or more and 5 or less times, and the alkylene portion may be branched or cyclic, R 21 、R 22 and R 24 Meanings the same as above] From the same viewpoint as above, Z in formula (3-1) is preferably a methylene group, an ethylene group or a phenylene group. From the same viewpoint as above, R in formula (3-1) is preferably 21 and R 22 Preferably, it is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 30 carbon atoms, more preferably a methyl group, an ethyl group or a phenyl group. 7 For nitro. The method for producing the oxime compound (1) having the second molecular structure represented by formula (3) is not particularly limited, and it can be produced, for example, by the methods described in Japanese Patent Application Laid-Open Nos. 2000-80068 and 2011-178776. Another example of a second molecular structure linked to the first molecular structure represented by formula (1) is the structure represented by the following formula (4). The bond represented by "*" in formula (4) is directly bonded to the bond represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (4), the benzene ring having "-*" in formula (4) is directly bonded to the carbonyl group having "-*" in formula (1). [Chemistry 20] In formula (4), R 71 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 71 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 71 The hydrogen atoms of the groups represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atom, or COOR 21 Replace. R 21 、R 22 and R 23 Means the same as above. 21 、R 22 or R 23 The hydrogen atom of the group represented by may be substituted by CN, a halogen atom, a hydroxyl group or a carboxyl group. 21 、R 22 and R 23 When the group represented by has an alkylene moiety, the alkylene moiety can be represented by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted more than 1 time and less than 5 times. 24 Means the same as above. 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 With R 23 Can form a ring together. 72 、R 73 and three R's 74 R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom. 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the groups represented by can be 21 、COR 21 SR 21 NR 22 Ra 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms, or COOR 21 Replace. R 72With R 73 and two R 74 They can form a ring together. * represents a bond with the first molecular structure of the oxime compound (1). R in formula (4) 71 、R 21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, the aralkyl group having 7 to 30 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as the example. R in formula (4) 22 With R 23 Can form a ring together means R 22 With R 23 Together with the nitrogen atom, carbon atom or oxygen atom to which it is connected, they can form a ring. 22 With R 23 Examples of rings that can be formed together and for Ra in formula (1) 12 With Ra 13 and Ra 22 With Ra 23 The examples of rings that can be formed together are the same. As R in formula (4) 72 、R 73 and R 74 The halogen atom represented by R 71 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including the hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. The method for producing the oxime compound (1) having the second molecular structure represented by formula (4) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601. Another example of a second molecular structure linked to the first molecular structure represented by formula (1) is a structure represented by the following formula (5). The bond represented by "*" in formula (5) is directly bonded to the bond represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (5), the pyrrole ring having "-*" in formula (5) is directly bonded to the carbonyl group having "-*" in formula (1). [Chemistry 21] In formula (5), R 81 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 81 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 81The hydrogen atoms of the groups represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atoms, or COOR 21 Replace. R 21 、R 22 and R 23 Means the same as above. 21 、R 22 or R 23 The hydrogen atoms of the groups represented by may be substituted by CN, halogen atoms, hydroxyl groups or carboxyl groups. 21 、R 22 and R 23 When the group represented by has an alkylene moiety, the alkylene moiety can be represented by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted more than 1 time and less than 5 times. 24 Means the same as above. 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 With R 23 Can form a ring together. 82 、R 83 、R 84 、R 85 and R 86 R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61, OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom. 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the groups represented by can be 21 、COR 21 SR 21 NR 22 Ra 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms, or COOR 21 Replace. R 83 With R 84 、R 84 With R 85 and R 85 With R 86 They can form a ring together. * represents a bond with the first molecular structure of the oxime compound (1). R in formula (5) 81 、R 21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, the aralkyl group having 7 to 30 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as the example. R in formula (5) 22 With R 23 Can form a ring together means R 22 With R 23 Together with the nitrogen atom, carbon atom or oxygen atom to which it is connected, they can form a ring. 22 With R 23 Examples of rings that can be formed together and for Ra in formula (1) 12 With Ra 13 and Ra 22 With Ra 23 The examples of rings that can be formed together are the same. As R in formula (5) 82 、R 83 、R 84 、R 85 and R 86 The halogen atom represented by R 81 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including the hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. The method for producing the oxime compound (1) having the second molecular structure represented by formula (5) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601. Another example of a second molecular structure linked to the first molecular structure represented by formula (1) is the structure represented by the following formula (6). The bond represented by "*" in formula (6) is directly bonded to the bond represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (6), the benzene ring having "-*" in formula (6) is directly bonded to the carbonyl group having "-*" in formula (1). [Chemistry 22] In formula (6), the four R 91 、R 92 、R 93 、R 94 、R 95 、R 96 and R 97 R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom. 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the groups represented by can be 21 、COR 21 SR 21 NR 22 Ra 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms, or COOR 21 Replace. R 21 、R 22 and R 23 Means the same as above. 92 With R 93 、R 94 With R 95 、R 95 With R 96 and R 96 With R 97 They can form a ring together. * represents a bond with the first molecular structure of the oxime compound (1). R in formula (6) 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, the aralkyl group having 7 to 30 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 and R 23 Same as the example. R in formula (6) 22 With R 23 Can form a ring together means R 22 With R 23 Together with the nitrogen atom, carbon atom or oxygen atom to which it is connected, they can form a ring. 22 With R 23 Examples of rings that can be formed together and for Ra in formula (1) 12 With Ra 13 and Ra 22 With Ra 23 The examples of rings that can be formed together are the same. As R in formula (6) 91 、R 92 、R 93 、R 94 、R 95 、R 96 and R 97 The halogen atom represented by R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including the hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. The method for producing the oxime compound (1) having the second molecular structure represented by formula (6) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601. Other examples of the photopolymerization initiator include other photopolymerization initiators other than the oxime compound (1). Examples of other photopolymerization initiators include oxime compounds other than the oxime compound (1), alkyl phenone compounds, biimidazole compounds, triazine compounds, and acylphosphine compounds. Examples of oxime compounds other than the oxime compound (1) include oxime compounds having a partial structure represented by the following formula (d1): * represents a bonding bond. [Chemistry 23] Examples of the oxime compound having a partial structure represented by formula (d1) include N-benzyloxy-1-(4-phenylthiophenyl)butane-1-one-2-imine, N-benzyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, N-benzyloxy-1-(4-phenylthiophenyl)-3-cyclopentylpropane-1-one-2-imine, N-acetyloxy-1-[9-ethyl-6-(2-methylbenzyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetyloxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4-dioxetane]-1-yl]-1-[4-phenylthiophenyl)-3-cyclopentylpropane-1-one-2-imine]ethane-1-imine,

[0014] N-acetyloxy-1-[9-ethyl-6-(2-methylbenzyl)-9H-carbazol-3-yl]-3-cyclopentylpropane-1-imine, N-benzyloxy-1-[9-ethyl-6-(2-methylbenzyl)-9H-carbazol-3-yl]-3-cyclopentylpropane-2-imine; compounds described in Japanese Patent Application Laid-Open No. 2011-132215, International Publication No. 2008 / 78678, International Publication No. 2008 / 78686, and International Publication No. 2012 / 132558, etc. Commercially available products such as Irgacure (registered trademark) OXE01, Irgacure OXE02, and Irgacure OXE03 (all manufactured by BASF); and N-1919, NCI-930, and NCI-831 (all manufactured by ADEKA) can also be used. Among them, the oxime compound having a partial structure represented by formula (d1) is preferably at least one selected from the group consisting of N-benzoyloxy-1-(4-phenylthiophenyl)butane-1-one-2-imine, N-benzoyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, and N-benzoyloxy-1-(4-phenylthiophenyl)-3-cyclopentylpropane-1-one-2-imine, and more preferably N-benzoyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine. The alkyl phenone compound is a compound having a partial structure represented by the following formula (d2) or a partial structure represented by the following formula (d3). In these partial structures, the benzene ring may have a substituent. [Chemistry 24] Examples of the compound having a structure represented by formula (d2) include 2-methyl-2-morpholino-1-(4-methylthiophenyl)propane-1-one, 2-dimethylamino-1-(4-morpholinophenyl)-2-benzylbutane-1-one, and 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholino)phenyl]butane-1-one. Commercially available products such as OMNIRAD (registered trademark) 369, OMNIRAD 907, and OMNIRAD 379 (all manufactured by IGM Resins) can also be used. Examples of the compound having a structure represented by formula (d3) include 2-hydroxy-2-methyl-1-phenylpropane-1-one, 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]propane-1-one, 1-hydroxycyclohexylphenyl ketone, oligomers of 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propane-1-one, α,α-diethoxyacetophenone, and benzyl dimethyl ketal. From the viewpoint of sensitivity, the alkyl phenone compound is preferably a compound having a structure represented by formula (d2). Examples of the biimidazole compound include compounds represented by formula (d5). [Chemistry 25] [In formula (d5), R E ~R J represents an aryl group having 6 or more and 10 or less carbon atoms which may have a substituent] Examples of the aryl group having 6 to 10 carbon atoms include phenyl, toluyl, xylyl, ethylphenyl, and naphthyl, with phenyl being preferred. Examples of the substituent include halogen atoms and alkoxy groups having 1 to 4 carbon atoms. Examples of the halogen atom include fluorine, chlorine, bromine, and iodine atoms, with chlorine being preferred. Examples of the alkoxy group having 1 to 4 carbon atoms include methoxy, ethoxy, propoxy, and butoxy, with methoxy being preferred. Examples of the biimidazole compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (see, for example, Japanese Patent Laid-Open No. 06-75372 and Japanese Patent Laid-Open No. 06-75373), 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole, Imidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(dialkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole (see, for example, Japanese Patent Publication No. 48-38403 and Japanese Patent Application Laid-Open No. 62-174204), and imidazole compounds in which the phenyl groups at the 4,4',5,5'-positions are substituted with carboalkoxy groups (see, for example, Japanese Patent Application Laid-Open No. 7-10913). Among these, compounds represented by the following formula or mixtures thereof are preferred. [Chemistry 26] Examples of the triazine compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[ 2-(5-methylfuran-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-triazine, etc. Among them, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine is preferred. Examples of the acylphosphine compound include bis(2,4,6-trimethylbenzyl)phenylphosphine oxide and (2,4,6-trimethylbenzyl)diphenylphosphine oxide. Commercially available products such as OMNIRAD (registered trademark) 819 (manufactured by IGM Resins) can also be used. Other examples of photopolymerization initiators other than the oxime compound (1) include: benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; benzophenone compounds such as benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, and 4,4'-bis(diethylamino)benzophenone; quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone, and camphorquinone; 10-butyl-2-chloroacridone, benzoyl, methyl phenylglyoxylate, and titanocene compounds. When the composition contains a polymerization initiator (D), the content of the polymerization initiator (D) in the composition is preferably 0.1 parts by mass or more and preferably 300 parts by mass or less, and more preferably 200 parts by mass or less, relative to 100 parts by mass of the polymerizable compound (C). Furthermore, the content of the polymerization initiator (D) in the composition is preferably 0.1 parts by mass or more, more preferably 0.5 parts by mass or more, and preferably 30 parts by mass or less, and more preferably 20 parts by mass or less, relative to 100 parts by mass of the combined amount of the vinyl copolymer (B) and the polymerizable compound (C). When the content of the polymerization initiator (D) is within this range, the composition tends to be highly sensitive, resulting in a shortened exposure time, and thus, the film productivity tends to be improved. [6] Polymerization initiator (D1) The composition may further contain a polymerization initiator (D) and a polymerization initiator (D1). The polymerization initiator (D1) is a compound or a sensitizer for promoting the polymerization of the polymerizable compound (C) initiated by the polymerization initiator (D). Examples of the polymerization initiator (D1) include photopolymerization initiators such as amine compounds, alkoxyanthracene compounds, thioxanthone compounds, and carboxylic acid compounds, and thermal polymerization initiators. The composition may also contain two or more polymerization initiators (D1). Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isopentyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, and 4,4'-bis(ethylmethylamino)benzophenone. Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dibutoxyanthracene. Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone. Examples of the carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid. When the composition contains a polymerization initiator (D1), the content of the polymerization initiator (D1) in the composition is preferably 0.1 parts by mass or more and preferably 300 parts by mass or less, and more preferably 200 parts by mass or less, per 100 parts by mass of the polymerizable compound (C). Furthermore, the content of the polymerization initiator (D1) in the composition is preferably 0.1 parts by mass or more, more preferably 1 part by mass or more, and preferably 30 parts by mass or less, and more preferably 20 parts by mass or less, per 100 parts by mass of the combined amount of the vinyl copolymer (B) and the polymerizable compound (C). When the content of the polymerization initiator (D1) is within this range, the composition can achieve further enhanced sensitivity. [7] Solvent (E) The composition may contain one or more solvents (E). The solvent (E) is preferably a solvent that dissolves the vinyl copolymer (B), the polymerizable compound (C) and the polymerization initiator (D). Examples of the solvent (E) include: ester solvents (solvents containing -COO- but not -O- in the molecule), ether solvents (solvents containing -O- but not -COO- in the molecule), ether ester solvents (solvents containing -COO- and -O- in the molecule), ketone solvents (solvents containing -CO- but not -COO- in the molecule), alcohol solvents (solvents containing OH but not -O-, -CO- and COO- in the molecule), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, etc. Examples of the ester solvent include methyl lactate, ethyl lactate, n-butyl lactate, methyl 2-hydroxyisobutyrate, ethyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, isopropyl butyrate, ethyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetylacetate, ethyl acetylacetate, cyclohexanol acetate, and γ-butyrolactone. Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenethyl ether, and methyl anisole. Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate. Examples of the ketone solvent include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, and isophorone. Examples of alcohol solvents include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerol. Examples of aromatic hydrocarbon solvents include benzene, toluene, xylene, and mesitylene. Examples of amide solvents include N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone. The solvent (E) preferably comprises one or more selected from the group consisting of propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 4-hydroxy-4-methyl-2-pentanone, and aromatic hydrocarbon solvents. The solvent (E) is a component other than solid components. For example, the solvent contained in the dispersion of quantum dots (A) or the solution of vinyl copolymer (B) is also included in the solvent (E). The content of the solvent (E) in the composition is the ratio of the total mass of all solvents contained in the composition to the total amount of the composition. Relative to the total amount of the composition, it is, for example, 40% by mass or more, preferably 55% by mass or more, and for example, 95% by mass or less, preferably 90% by mass or less. In other words, the solid content of the composition is, for example, 5% by mass or more, preferably 10% by mass or more, and for example, 60% by mass or less, preferably 45% by mass or less. When the content of the solvent (E) is within the above range, the flatness of the composition layer during coating tends to be improved, and a film of appropriate thickness tends to be easily formed. [8] Light scattering agent (F) The composition may further contain a light scattering agent (F). A film formed from the composition may exhibit light scattering properties. The composition may also contain two or more light scattering agents (F). From the perspective of improving the luminescent properties of the film, the composition preferably further contains a light scattering agent (F). Examples of the light scattering agent (F) include inorganic particles such as metal or metal oxide particles and glass particles. Examples of metal oxides include TiO 2. SiO 2. BaTiO 3. ZnO, etc., in terms of efficient light scattering, TiO is preferred. 2. The particle size of the light scattering agent (F) is, for example, about 0.03 μm or more, preferably 0.05 μm or more, and, for example, about 20 μm or less, preferably 1 μm or less, and more preferably 0.5 μm or less. As the light scattering agent (F), a light scattering agent previously dispersed in part or all of the solvent (E) using a dispersant can also be used. As the dispersing agent, a commercially available product can be used. Examples of commercially available products include: DISPERBYK-101, 102, 103, 106, 107, 108, 109, 110, 111, 116, 118, 130, 140, 154, 161, 162, 163, 164, 165, 166, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 192, 2000, 2001 manufactured by BYK-Chemie Japan , 2020, 2025, 2050, 2070, 2095, 2150, 2155; ANTI-TERRA-U, U100, 203, 204, 250; BYK-P104, P104S, P105, 220S, 6919; BYK-LPN6919, 21116; LACTIMON, LACTIMON-WS; Bykumen, etc. SOLSPERSE manufactured by Lubrizol of Japan - 3000, 9000, 13000, 13240, 13650, 13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 76500, etc. EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401, 4402, 4403, 4406, 4408, 4300, 4310, 4320, 4330, 4340, 450, 451, 453, 4540, 4550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 7554, 1101, 120, 150, 1501, 1502, 1503, etc. manufactured by BASF; Ajisper PA111, PB711, PB821, PB822, PB824, etc. manufactured by Fine-Techno. When the composition contains a light scattering agent (F), the content of the light scattering agent (F) in the composition is, for example, 0.001 mass % or more and 50 mass % or less relative to the total solid content of the composition. From the viewpoint of improving the light scattering ability and luminescent properties of the film, the content is preferably 1 mass % or more, more preferably 2 mass % or more, and even more preferably 3 mass % or more, and is preferably 30 mass % or less, more preferably 20 mass % or less, even more preferably 15 mass % or less, and even more preferably 10 mass % or less. [9] Antioxidant (H) The composition may further contain an antioxidant (H). The antioxidant (H) is not particularly limited as long as it is an antioxidant commonly used in industry, and phenolic antioxidants, phosphorus-based antioxidants, phosphorus / phenol composite antioxidants, and sulfur-based antioxidants can be used. The composition may also contain two or more antioxidants (H). Phosphorus / phenol complex antioxidants are compounds having one or more phosphorus atoms and a phenol structure in each molecule. From the perspective of the developability of the composition and the luminescent properties of the film, the antioxidant (H) preferably includes a phosphorus / phenol complex antioxidant. Examples of phenolic antioxidants include Irganox (registered trademark) 1010 (Irganox 1010: pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, manufactured by BASF), Irganox 1076 (Irganox 1076: octadecyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, manufactured by BASF), Irganox 1330 (Irganox 1330: 3,3',3'',5,5',5''-hexa-tert-butyl-α,α',α''-(mesitylene-2,4,6-triyl)tri-p-cresol, manufactured by BASF), Irganox 3114 (Irganox 1330: octadecyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, manufactured by BASF), and Irganox 1330. 3114: 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, manufactured by BASF (BASF) Co., Ltd.), Irganox 3790: 1,3,5-tris((4-tert-butyl-3-hydroxy-2,6-xylyl)methyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, manufactured by BASF (BASF) Co., Ltd.), Irganox 1035: thiodiethylene bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], manufactured by BASF (BASF) Co., Ltd.), Irganox 1135: 1135: 3,5-bis(1,1-dimethylethyl)-4-hydroxy-C7-C9 side chain alkyl ester of phenylpropionic acid, manufactured by BASF), Irganox 1520L (4,6-bis(octylthiomethyl)-o-cresol, manufactured by BASF), Irganox 3125 (Irganox 3125, manufactured by BASF), Irganox 565 (2,4-bis(n-octylthio)-6-(4-hydroxy-3',5'-di-tert-butylanilino)-1,3,5-triazine, manufactured by BASF), Adekastab AO-80 (registered trademark) AO-80: 3,9-bis(2-(3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy)-1,1-dimethylethyl)-2,4,8,10-tetraoxaspiro(5,5) Undecane, manufactured by ADEKA Co., Ltd., Sumilizer (registered trademark) BHT, Sumilizer GA-80, Sumilizer GS (all manufactured by Sumitomo Chemical Co., Ltd.), Cyanox 1790 (registered trademark), manufactured by Cytec Co., Ltd., Vitamin E (manufactured by Eisai Co., Ltd.), etc. Examples of phosphorus-based antioxidants include Irgafos (registered trademark) 168 (Irgafos 168: tris(2,4-di-tert-butylphenyl)phosphite, manufactured by BASF), Irgafos 12 (Irgafos 12: tris[2-[[2,4,8,10-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphin-6-yl]oxy]ethyl]amine, manufactured by BASF), and Irgafos 38 (Irgafos 38: Bis(2,4-bis(1,1-dimethylethyl)-6-methylphenyl)ethyl phosphite, manufactured by BASF (BASF), Adekastab (registered trademark) 329K, Adekastab PEP36, Adekastab PEP-8 (all manufactured by ADEKA (ADEKA)), Sandstab P-EPQ (manufactured by Clariant), Weston (registered trademark) 618, Weston 619G (all manufactured by GE), Ultranox 626 (manufactured by GE), etc. Examples of the phosphorus / phenol composite antioxidant include Sumilizer (registered trademark) GP (6-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-tert-butyldibenzo[d,f][1.3.2]dioxaphosphapin) (manufactured by Sumitomo Chemical Co., Ltd.). Examples of the sulfur-based antioxidant include dialkyl thiodipropionate compounds such as dilauryl thiodipropionate, dimyristyl thiodipropionate, and distearyl thiodipropionate; and β-alkylmercaptopropionate compounds of polyhydric alcohols such as tetrakis[methylene(3-dodecylthio)propionate]methane. When the composition contains an antioxidant (H), the content of the antioxidant (H) in the composition is, for example, 1 part by mass or more and 50 parts by mass or less relative to 100 parts by mass of the vinyl copolymer (B). From the viewpoint of the luminescent properties and heat resistance of the film, the content is preferably 5 parts by mass or more, more preferably 7 parts by mass or more, and is preferably 40 parts by mass or less, more preferably 30 parts by mass or less.

[10] Leveling agent (I) The composition may further contain a leveling agent (I). Examples of the leveling agent (I) include silicone surfactants, fluorine surfactants, and silicone surfactants having fluorine atoms. These surfactants may also have a polymerizable group in the side chain. From the perspective of the developability of the composition and the luminescent properties of the film, the leveling agent (I) is preferably a fluorine surfactant. The composition may also contain two or more leveling agents (I). Examples of silicone-based surfactants include surfactants having a siloxane bond in the molecule. Specific examples include Toray silicone DC3PA, Toray silicone SH7PA, Toray silicone DC11PA, Toray silicone SH21PA, Toray silicone SH28PA, Toray silicone SH29PA, Toray silicone SH30PA, Toray silicone SH8400 (trade name; Toray Dow Corning) and Toray silicone SH8400. (manufactured by Corning Co., Ltd.), KP321, KP322, KP323, KP324, KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 and TSF4460 (manufactured by Momentive Performance Materials Japan Co., Ltd.), etc. Examples of fluorine-based surfactants include surfactants having a fluorine-carbon chain in the molecule. Specific examples include Fluorad (registered trademark) FC430, Fluorad FC431 (manufactured by Sumitomo 3M Co., Ltd.), Megafac (registered trademark) F142D, Megafac F171, Megafac F172, Megafac F173, Megafac F177, Megafac F183, Megafac F554, Megafac F575, Megafac R30 ...142D, Megafac F171, Megafac F172, Megafac Megafac RS-718-K (manufactured by DIC Corporation of China), Eftop (registered trademark) EF301, Eftop EF303, Eftop EF351, Eftop EF352 (manufactured by Mitsubishi Materials Electronics Co., Ltd.), Surflon (registered trademark) S381, Surflon S382, Surflon SC101, Surflon SC105 (manufactured by Asahi Glass Co., Ltd.), and E5844 (manufactured by Daikin Fine Chemical Laboratories Co., Ltd.), etc. Examples of silicone-based surfactants containing fluorine atoms include those containing a siloxane bond and a fluorocarbon chain in the molecule. Specific examples include Megafac (registered trademark) R08, Megafac BL20, Megafac F475, Megafac F477, and Megafac F443 (manufactured by DIC Corporation). When the composition includes a leveling agent (I), the content of the leveling agent (I) in the composition is, for example, 0.001 mass % or more, preferably 0.005 mass % or more, more preferably 0.01 mass % or more, and further preferably 0.05 mass % or more, and is, for example, 1.0 mass % or less, preferably 0.75 mass % or less, and more preferably 0.5 mass % or less, relative to the total amount of the composition. When the content of the leveling agent (I) is within this range, the flatness of the film can be further improved.

[11] Other components The composition may further include polymerization inhibitors, fillers, other polymer compounds, adhesion promoters, light stabilizers, chain transfer agents and other additives known in the art as needed. <Method for Producing the Composition> The composition can be produced by a method comprising the step of mixing predetermined components and, if necessary, other components. The method for producing the composition may further comprise the step of preparing the vinyl copolymer (B). <Film and Its Manufacturing Method> The film of the present invention is formed from the composition of the present invention. This film can be used as a wavelength conversion layer in a display device, for example. The film can be provided on a substrate by, for example, the following methods: Method a, which comprises applying the composition to a substrate and then drying it; or Method b, which comprises producing the film by applying the composition to a support and then drying it, then peeling the film from the support and attaching it to the substrate via an adhesive layer. In one embodiment, the composition is a non-curable resin composition R1. A film formed of the resin composition R1 can be formed by, for example, applying the composition to a substrate or a support and then drying the resulting film. In other embodiments, the composition is a curable resin composition R2 that further includes a polymerizable compound (D) and a polymerization initiator (E). The vinyl copolymer (B) contained in the curable resin composition R2 may be curable or non-curable. A film formed from the curable resin composition R2 is a cured film. This cured film can be obtained by applying the curable resin composition R2 to a substrate or support, drying it, and then curing it using light and / or heat. One embodiment of the curable resin composition R2 is a photocurable resin composition R3 that includes a photopolymerizable compound and a photopolymerization initiator. The film may be provided on the entire surface of the substrate or may be provided in a pattern on a portion of the substrate. Examples of methods for forming the film in a pattern on the substrate include photolithography, inkjet printing, and printing. Examples of printing methods include stencil printing, screen printing, and printing and coating using an applicator. Examples of substrates include glass plates such as quartz glass, borosilicate glass, aluminosilicate glass, and soda-lime glass coated with silica; resin plates such as polycarbonate, polymethyl methacrylate, and polyethylene terephthalate; silicon; substrates with thin films of aluminum, silver, or a silver / copper / palladium alloy formed thereon; and components included or potentially included in a display device. Examples of components included or potentially included in a display device include a primary light source (e.g., a blue light source), a light guide plate, a diffusion film (diffusing layer), a light reflecting member (e.g., a reflective film), a brightness enhancement member, a prism, a barrier layer, and a protective layer (overcoat). A patterned film formed from the resin composition R1 can be formed on a substrate, for example, in the following manner. First, the resin composition R1 is applied to the substrate through a mask to form a patterned composition layer. Examples of methods for applying the resin composition include spin coating, slit coating, and slit and spin coating. Next, a film is obtained by drying the composition layer (removing volatile components such as solvents). As drying methods, heat drying, reduced pressure drying or a combination thereof can be cited. The temperature during heat drying is preferably 30°C or higher, more preferably 50°C or higher, and preferably 250°C or lower, more preferably 235°C or lower. The heating time is preferably 10 seconds or higher, more preferably 30 seconds or higher, and preferably 180 minutes or lower, more preferably 90 minutes or lower. In the case of reduced pressure drying, it is preferably carried out at a pressure of 50 Pa or higher and 150 Pa or lower. With regard to the drying of the composition layer, for example, it can be carried out in multiple stages by implementing a plurality of drying steps with different drying temperatures. A patterned cured film formed from the photocurable resin composition R3 can be formed on a substrate using photolithography, for example, as follows. First, the photocurable resin composition R3 is applied to the substrate and then heated and dried (prebaked) and / or dried under reduced pressure to remove volatile components such as the solvent, thereby forming a composition layer. The coating method can be the same as described above. The temperature during heat drying is preferably 30°C or higher, more preferably 50°C or higher, and preferably 120°C or lower, more preferably 110°C or lower. The heating time is preferably 10 seconds or longer, more preferably 30 seconds or longer, and preferably 60 minutes or shorter, more preferably 30 minutes or shorter. When drying under reduced pressure, it is preferably performed at a pressure of 50 Pa to 150 Pa and within a temperature range of 20°C to 25°C. Next, the composition layer is exposed through a photomask for forming the desired pattern. The light source used for exposure is preferably one that generates light with a wavelength of 250 nm to 450 nm. For example, depending on the absorption wavelength of the photopolymerization initiator, a bandpass filter can be used to selectively extract light near 436 nm, 408 nm, or 365 nm from the light of this wavelength. Specific light sources include mercury lamps, light-emitting diodes, metal halide lamps, and halogen lamps. In order to uniformly irradiate the entire exposure surface with parallel light and accurately align the photomask with the substrate on which the composition layer is formed, it is preferred to use an exposure device such as a mask aligner or a stepper. After exposure, the composition layer is cured by polymerization of the vinyl copolymer (B) and the photopolymerizable compound contained therein. The exposed composition layer is brought into contact with a developer for development, whereby the unexposed portions of the composition layer are dissolved in the developer and removed, thereby obtaining a patterned cured film. Examples of the developer include aqueous solutions or organic solvents of alkaline compounds such as potassium hydroxide, sodium bicarbonate, sodium carbonate, and tetramethylammonium hydroxide. The concentration of the alkaline compound in the aqueous solution is preferably 0.01% by mass or more, more preferably 0.03% by mass or more, and preferably 10% by mass or less, more preferably 5% by mass or less. Examples of the organic solvent include the same as those described for solvent (E). The developer may also contain a surfactant. The development method may be any of a coating method, an immersion method, and a spray method. Furthermore, during development, the substrate may be tilted at any angle. The patterned film obtained by development is preferably further heated (post-baked). The heating temperature is preferably 150°C or higher, more preferably 160°C or higher, and preferably 250°C or lower, more preferably 235°C or lower. The heating time is preferably 1 minute or longer, more preferably 10 minutes or longer, and preferably 120 minutes or lower, more preferably 60 minutes or lower. Heating after development allows polymerization of unreacted vinyl copolymer (B), photopolymerizable compounds, etc. contained in the film, thereby obtaining a cured film with even better chemical resistance. Even when development is not performed, it is preferred to further heat (post-bake) the exposed composition layer. On the other hand, as a method for forming a cured film on the entire surface of a substrate, there is a method of applying a curable resin composition to a substrate, drying it as needed to form a composition layer, and heating and / or exposing the entire surface of the composition layer. The thickness of the film is, for example, 1 μm or more, preferably 1.5 μm or more, more preferably 2 μm or more, and, for example, 20 μm or less, preferably 18 μm or less, more preferably 14 μm or less, and even more preferably 12 μm or less. If the film thickness is too small, when the film serving as the wavelength conversion layer is irradiated with primary light, the proportion of the primary light that is not fully absorbed or scattered by the film and passes through the film tends to increase. The shape and size of the patterned film are not particularly limited. For example, the patterned film has a square shape when viewed from above. The film of one embodiment is a wavelength conversion layer that absorbs primary light from a primary light source and emits green light. Preferably, the film converts the wavelength of blue light, which is the primary light, to that of green light. The green light emitted by this wavelength conversion layer preferably includes a peak with a maximum wavelength in the range of 500 nm to 560 nm, more preferably in the range of 520 nm to 545 nm, and even more preferably in the range of 525 nm to 535 nm. The full width at half maximum of this peak is preferably 15 nm or greater, preferably 80 nm or less, more preferably 60 nm or less, even more preferably 50 nm or less, and particularly preferably 45 nm or less. The film in another embodiment is a wavelength conversion layer that absorbs primary light from a primary light source and emits red light. Preferably, the film converts the wavelength of the blue primary light into the wavelength of red light. The red light emitted by this wavelength conversion layer preferably includes a peak with a maximum in the wavelength range of 610 nm to 750 nm, more preferably in the wavelength range of 620 nm to 650 nm, and even more preferably in the wavelength range of 625 nm to 645 nm. The full width at half maximum of this peak is preferably 15 nm or greater and preferably 80 nm or less, more preferably 60 nm or less, even more preferably 50 nm or less, and particularly preferably 45 nm or less. <Display Device> The display device of the present invention includes at least a light source and the film described above. Examples of the display device include liquid crystal display devices, organic electroluminescence (EL) display devices, and inorganic EL display devices. Specific examples include display devices described in Japanese Patent Application Publication Nos. 2006-309219, 2006-310303, 2013-15812, 2009-251129, and 2014-2363. A display device according to one embodiment includes a backlight serving as a blue light source and multiple patterns disposed on the viewing side of the backlight. The multiple patterns may be red, green, and white (transparent, achromatic) patterns, and at least one of the red and green patterns may be the film of the present invention. The red or green colored pattern containing quantum dots has the function of converting the wavelength of incident light and emitting it. [Example] The present invention will be described in more detail below with reference to Examples. "%" and "parts" in the Examples are by mass % and by mass unless otherwise specified. <Measurement and Evaluation> (1) Measurement of Film Thickness The film thickness was measured using a film thickness measuring device (DEKTAK XT; manufactured by Bruker). (2) Measurement of the luminescence spectrum of quantum dots (A) An absolute PL quantum yield measuring instrument ("C9920-02" manufactured by Hamamatsu Photonics, excitation light 450 nm, room temperature, atmospheric conditions) was used, and a dispersion of quantum dots (A) diluted to an absorbance of 0.4 at a wavelength of 450 nm was used as the measurement sample. (3) Measurement of Molecular Weight and Molecular Weight Distribution of Vinyl Copolymer (B) Gel permeation chromatography (GPC) was performed using a high performance liquid chromatograph (Tosoh, model: HLC-8320) under the following conditions. A calibration curve (calibration curve) was prepared using the following standard substances to measure the weight average molecular weight (Mw) and number average molecular weight (Mn). Molecular weight distribution (Mw / Mn) was calculated based on these measured values. Measurement sample: Carboxyl groups of vinyl copolymer (B) methylated using a trimethylsilyldiazomethane-hexane solution (concentration: 0.6 mol / L). Sample concentration: 10 mg / mL. Sample injection volume: 10 μL. Flow rate: 0.35 mL / min. Column: TSKgel SuperMultipore HZ-H (φ4.6 mm × 150 mm) (Tosoh Corporation), 2 columns. Column temperature: 40°C. Mobile phase: Tetrahydrofuran (THF). Detector: Differential refractive index detector. Standard material: Polystyrene (TSK Standard, Tosoh Corporation). (4) Determination of the Ethylene Unsaturated Bond Equivalent of the Ethylene Copolymer (B) The weight average molecular weight per mole of ethylenically unsaturated bonds, i.e., the ethylenically unsaturated bond equivalent, is determined based on the following formula. Ethylene Unsaturated Bond Equivalent [g / mol] = W [g] / M [mol] Wherein, W represents the mass [g] of the ethylenically unsaturated copolymer (B), and M represents the molar number [mol] of ethylenically unsaturated double bonds contained in W [g] of the ethylenically unsaturated copolymer (B). M is determined as follows: the number of ethylenically unsaturated double bonds contained per 1 g of the copolymer is measured according to the iodine value test method described in Japanese Industrial Standards (JIS) 0070:1992. (5) Determination of acid value of vinyl copolymer (B) The test sample (vinyl copolymer) was dissolved in THF, and a few drops of phenolphthalein ethanol solution were added as an indicator. Neutralization titration was performed using a 0.1 mol / L potassium hydroxide / 2-propanol solution. The acid value (Av) was calculated using the following formula: Av = 56.11 × Vs × 0.1 × f / w Av: acid value [mgKOH / g] Vs: amount of 0.1 mol / L potassium hydroxide / 2-propanol solution required for titration [mL] f: titer of 0.1 mol / L potassium hydroxide / propanol solution w: mass of the test sample [g] (calculated as solid content) (6) Tellurium Compound Content in Vinyl Copolymer (B) A weighed sample (vinyl copolymer) was mixed with concentrated nitric acid and ultrapure water, and then irradiated with microwaves for ashing (decomposition of the vinyl polymer). The tellurium content in the ashing solution was measured by inductively coupled plasma / mass spectrometry (ICP / MS), and the amount of tellurium compound relative to the vinyl copolymer was calculated as metal equivalent (mass ppm). (7) Determination of Solid Content of Vinyl Copolymer (B) Solution: Approximately 1 g of the vinyl copolymer (B) solution was weighed in an aluminum cup, dried at 180°C for 1 hour, and then the mass was measured. The solid content (mass %) of the vinyl copolymer (B) solution was calculated based on the mass loss. (8) Evaluation of the Pattern Formability of the Film The composition was applied by spin coating onto a 5 cm square glass substrate (Eagle XG; manufactured by Corning) so that the thickness after baking was 6.0 μm. The composition layer was then pre-baked at 100°C for 3 minutes in a clean oven to obtain a composition layer. After cooling, the gap between the substrate on which the composition layer was formed and the quartz glass mask was set to 150 μm. The film was exposed to light at 200 mJ / cm in an atmospheric environment using an exposure machine (TME-150RSK; manufactured by Topcon Co., Ltd.). 2 Light irradiation was performed with an exposure dose (based on a wavelength of 365 nm). A mask for forming a 1:1 line-and-space pattern of 20 μm was used. The composition layer after light irradiation was immersed in an aqueous solution containing 0.14% nonionic surfactant and 0.048% potassium hydroxide at 25°C for 20 seconds, rinsed with water, and then post-baked in an oven at 180°C for 30 minutes. This produced a pattern including a cured film with a line-and-space pattern (10 lines and spaces each) with a line width of 20 μm. The obtained patterns were observed using a microscope (1000x magnification; VHX-2000; manufactured by KEYENCE Co., Ltd.), and the pattern formability was evaluated according to the following evaluation criteria. The results are shown in Table 4. A: Pattern formed linearly according to the mask. B: Other than A (there are areas where spaces are not properly formed, where the line pattern is not properly formed, or where there are areas where the pattern collapses, etc.) (9) Evaluation of the Luminescent Properties of the Film (9-1) Quantum Yield QY The composition was applied by spin coating onto a 5 cm square glass substrate (Eagle XG; manufactured by Corning) to a thickness of 6 μm after baking. The composition layer was then pre-baked at 100°C for 3 minutes in a clean oven to obtain a composition layer. The substrate with the composition layer formed thereon was exposed to light at 200 mJ / cm in an atmospheric environment using an exposure machine (TME-150RSK; manufactured by Topcon). 2 The substrate was irradiated with an exposure dose of 100 nm (365 nm reference), developed, and then baked at 180°C for 30 minutes to obtain a substrate with a cured film. The quantum yield QY was measured using a PL quantum yield measuring device (automatic control electric monochromatic light source type, C9920-02G; manufactured by Hamamatsu Photonics). The measuring unit uses an integrating sphere unit, and a substrate sample with a cured film cut into 1 cm square is placed in the integrating sphere. The reflected light obtained by irradiating the excitation light from directly above the sample is measured to obtain the luminous efficiency. A xenon lamp is used as the light source, and light with a wavelength of 450 nm is used as the excitation light. Based on the QY obtained in Comparative Example 1, the relative value [%] when the ΔQY of Comparative Example 1 is set to 100% is calculated according to the following formula. The results are shown in Table 4. ΔQY [%] = (QY of the embodiment or comparative example being the object / QY of Comparative Example 1) × 100 (9-2) External quantum efficiency EQE A substrate having a cured film is obtained in the same manner as in (9-1). A light diffuser is arranged as a backlight on a backlight in which a blue light emitting diode (LED) lamp having a peak wavelength of 450 nm is used as a point light source. The backlight is placed with the light diffuser facing upward, and a spectroradiometer ("SR-UL1R" manufactured by Topcon Co., Ltd.) is set at a height of 60 cm from the surface of the light diffuser. A substrate having a cured film made of the composition is arranged on the diffuser. In this state, the backlight is turned on, and the luminous intensity L of the cured film is measured as the integrated radiant flux in the wavelength range of 480 nm to 780 nm for the light emitted from the cured film. g 〔W・sr -1 ・m -2 ・nm -1 Next, a 5 cm square glass substrate (Eagle XG; manufactured by Corning) was placed on the diffuser plate, the backlight was turned on, and the luminous intensity L of the backlight was measured as the cumulative radiant flux in the wavelength range of 380 nm to 480 nm. f 〔W・sr -1 ・m -2 ・nm -1 The luminous intensity was measured using the spectroradiometer ("SR-UL1R" manufactured by Topcon Co., Ltd.). The external quantum efficiency EQE was calculated using the following formula: EQE [%] = luminous intensity of the cured film / luminous intensity of the backlight = L g / L f The EQE obtained in Comparative Example 1 was used as a reference, and the relative value (%), ΔEQE, was calculated using the following formula, with the ΔEQE of Comparative Example 1 set to 100%. The results are shown in Table 4. ΔEQE (%) = (EQE of the Example or Comparative Example being tested / EQE of Comparative Example 1) × 100 (10) Evaluation of Film Appearance A substrate having a cured film was obtained in the same manner as in (9-1). The obtained cured film was observed using a microscope (500x magnification; VHX-2000; manufactured by KEYENCE Co., Ltd.) and its appearance was evaluated according to the following evaluation criteria. The results are shown in Table 4. A: No abnormality was observed. B: The presence of aggregates was observed. <Preparation Example 1: Preparation of Quantum Dot (A1) Dispersion> A toluene dispersion a of quantum dots (A1) (green-emitting InP / ZnSeS quantum dots) containing oleic acid as the organic ligand (G1) was prepared. The emission spectrum of these quantum dots was measured, revealing a green emission peak with a maximum wavelength of 530 nm and a full width at half maximum of 42 nm. After removing toluene from the toluene dispersion a by vacuum distillation, 70 parts of cyclohexyl acetate (E2) were added to 30 parts of the total amount of quantum dots (A1) and organic ligand (G1) to obtain quantum dot (A1) dispersion b. The composition of quantum dot (A1) dispersion b is shown in Table 1. [Table 1] The composition ratio of quantum dots (A1) to organic ligand (G1) was determined by thermogravimetry-differential thermal analysis (TG-DTA) of the mixture after toluene removal, and the residual amount when heated to 550°C at a heating rate of 5°C / min was calculated as the weight of the organic ligand (G1). <Synthesis Examples 1 to 7: Synthesis of Vinyl Copolymers (B1) to (B7)> In a nitrogen-purged glove box, monomers ((b-1) to (b-3)) previously purged with nitrogen, ethyl 2-methyl-2-n-butyltellanyl-propionate (BTEE), dibutylditelluride (DBDT), 2,2'-azobis(isobutyronitrile) (AIBN), and propylene glycol monomethyl ether acetate (PGMEA) were reacted to obtain copolymers having the compositions shown in Table 2. After completion of the reaction, the reaction mixture was diluted with THF and poured into heptane under stirring. The precipitated polymer was filtered by suction, dried, and then dissolved in PGMEA to obtain solutions of vinyl copolymers (B1) to (B7), respectively. The solid content of the solution of the vinyl copolymer (B1) to the vinyl copolymer (B7) was 40% by mass. Table 2 shows the weight average molecular weight (Mw), molecular weight distribution (Mw / Mn), acid value, and tellurium compound content of the obtained vinyl copolymers (B1) to (B7). [Table 2] <Synthesis Examples 8-12: Synthesis of Vinyl Copolymers (B8)-(B12)> In a nitrogen-purged glove box, monomers ((b-1)-(b-3)), BTEE, DBDT, AIBN, and PGMEA, which had previously been purged with nitrogen, were reacted to obtain a copolymer intermediate having the composition shown in Table 3. After completion of the reaction, the reaction solution was diluted with THF and poured into stirred heptane. The precipitated polymer was filtered by suction and dried to obtain a copolymer intermediate. Next, the obtained copolymer intermediate, the monomers (b-4) of the types and molar ratios listed in Table 3, triethylamine (molar ratio: 0.20 per mol of monomer (b-4), and PGMEA were mixed under atmospheric pressure and stirred at 120°C for 7 hours to react, thereby obtaining solutions of vinyl copolymers (B8) to (B12), respectively. The solids content of the solutions of vinyl copolymers (B8) to (B12) was 40% by mass. Table 3 shows the weight average molecular weight (Mw), molecular weight distribution (Mw / Mn), ethylenically unsaturated bond equivalent, acid value, and tellurium compound content of the obtained vinyl copolymers (B8) to (B12). <Synthesis Example 13: Synthesis of Vinyl Copolymer (B13)> In a nitrogen-purged glove box, monomers ((b-1) to (b-3)) previously purged with nitrogen, BTEE, DBDT, AIBN, and PGMEA were reacted to obtain a copolymer intermediate having the composition shown in Table 3. After completion of the reaction, the reaction solution was diluted with THF and poured into stirred heptane. The precipitated polymer was filtered by suction and dried to obtain a copolymer intermediate. Next, under a nitrogen atmosphere, the obtained copolymer intermediate, the monomers (b-4) of the types and molar ratios listed in Table 3, triethylamine (molar ratio: 0.20 per mol of monomer (b-4), 2,2,6,6-tetramethylpiperidinyl-1-oxyl (0.1 parts by mass per 100 parts by mass of the copolymer intermediate), and PGMEA were mixed and stirred at 120°C for 7 hours to react to obtain a solution of vinyl copolymer (B13). The solids content of the vinyl copolymer (B13) solution was 40% by mass. [Table 3] The abbreviations in Tables 2 and 3 have the following meanings: MAA: methacrylic acid MMA: methyl methacrylate BMA: butyl methacrylate MOESA: 2-methacryloyloxyethylsuccinate MOEBDA: mono-2-(methacryloyloxy)ethyl phthalate GMA: glycidyl methacrylate ECHMA: 3,4-epoxycyclohexylmethyl methacrylate ECHAA: 3,4-epoxycyclohexylmethyl acrylate 4HBAGE: 4-hydroxybutyl glycidyl acrylate <Examples 1 to 8, Comparative Examples 1 to 5> Compositions were prepared by mixing the components listed in Table 4 with the quantum dot (A1) dispersion b in the amounts listed in Table 4. In Table 4, the percentages of components other than the solvent (E) are expressed as solids equivalents. The compositions of Examples 1 to 8 and Comparative Examples 1 to 5 were identical, except that the vinyl copolymer (B) was replaced with the substance listed in Table 4 (one of the vinyl copolymers (B1) to (B10)). Table 4 shows the evaluation results of patterning properties, luminescence properties, and appearance of films formed from the compositions of Examples 1 to 8 and Comparative Examples 1 to 5. For Comparative Examples 2 and 3, luminescence properties could not be evaluated due to poor patterning properties. Regarding patterning properties, in Comparative Example 2, the cured film remained in areas where spaces should have been formed. In Comparative Example 3, the cured film in areas where lines should have been formed partially disappeared due to development. [Table 4] The details of the component abbreviations shown in Table 4 are as follows. Organic ligand (G1): Oleic acid polymerizable compound (C1): Carboxyl group-containing polyfunctional (meth)acrylate (trade name "Aronix M-510" manufactured by Toagosei Co., Ltd.) Polymerization initiator (D1): Irgacure (registered trademark) OXE-02 manufactured by BASF. Light scattering agent (F1): The composition was prepared by mixing 10 parts (based on solid content) of the vinyl copolymer (B) with 30 parts of PGMEA to 60 parts of titanium oxide particles, and thoroughly dispersing the titanium oxide particles using a bead mill. The number of parts of light scattering agent (F1) listed in Table 4 refers to the number of parts of titanium oxide particles. Antioxidant (H1): Sumitomo Chemical Co., Ltd., trade name "Sumilizer GP" Leveling agent (I1): Polyether-modified silicone oil (Toray Dow Corning Co., Ltd., trade name "Toray silicone SH8400") Solvent (E1): Propylene glycol monomethyl ether acetate (PGMEA) Solvent (E2): Cyclohexyl acetate none none

Claims

1. A composition comprising quantum dots (A) and a vinyl copolymer (B), wherein, The vinyl copolymer (B) has constituent units derived from (meth)acrylic acid, constituent units derived from (meth)acrylates having carboxyl groups, and constituent units derived from (meth)acrylates without carboxyl groups, and contains tellurium compounds, and has a molecular weight distribution of less than 2.0, an acid value of 100 mgKOH / g to 150 mgKOH / g, and the content of the tellurium compounds in the vinyl copolymer (B) is more than 0 ppm and less than 200 ppm when converted to metallic tellurium.

2. The composition as claimed in claim 1, wherein the vinyl copolymer (B) has constituent units derived from monomers represented by formulas (I), (II) and (III), in formula (I) X1 representing a hydrogen atom or a methyl group, in formula (II) X2 representing a hydrogen atom or a methyl group; Y1 representing a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; Y2 representing a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms, in formula (III) X3 representing a hydrogen atom or a methyl group; and R1 representing a linear, branched, or cyclic hydrocarbon group having 1 to 30 carbon atoms.

3. The composition as claimed in claim 1, wherein the vinyl copolymer (B) further comprises a constituent unit having a UV-curable functional group.

4. The composition as claimed in claim 1, wherein the weight average molecular weight of each mole of vinyl unsaturated bond of the vinyl copolymer (B), i.e., the vinyl unsaturated bond equivalent, is greater than 1,000 and less than 8,000.

5. The composition as described in claim 1, further comprising a polymerizable compound (C) and a polymerization initiator (D).

6. The composition as described in claim 1, further comprising a solvent (E).

7. The composition as claimed in claim 1, wherein the quantum dot (A) is at least one selected from the group consisting of compounds of Group 12 and Group 16 elements, compounds of Group 13 and Group 15 elements, compounds of Group 13 and Group 16 elements, and compounds of Group 14 and Group 16 elements.

8. The composition as claimed in claim 1, wherein the content of said quantum dot (A) is 50 to 350 parts by mass relative to 100 parts by mass of said vinyl copolymer (B).

9. A membrane formed from any one of claims 1 to 8.

10. A display device comprising the film as described in claim 9.

Citation Information

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