Gas flow regulating device

TWI940988BActive Publication Date: 2026-10-01GLOBAL PRECISE INSTRUMENT CORP
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Patent Information

Application Number
TW113144824
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Filing Date
2024-11-21
Publication Date
2026-10-01
Estimated Expiration
2044-11-20

AI Technical Summary

Technical Problem

Existing semiconductor manufacturing processes generate chemical waste gases that continue to consume energy and resources even when production equipment is idle, violating environmental regulations and lacking energy efficiency.

Method used

A gas flow regulating device that adjusts inert gas flow rates based on the operating status of production machines, using a controller, valve, and flow meter to optimize gas delivery to waste gas treatment units, reducing energy consumption and emissions.

Benefits of technology

Reduces energy and resource consumption, enhances industrial efficiency, and complies with environmental regulations by optimizing gas flow during idle operations.

✦ Generated by Eureka AI based on patent content.

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Abstract

A gas flow regulating device includes a controller, a valve, an inlet pipe, an outlet pipe, and a flow meter. The valve adjusts the cross-sectional area of ​​its outlet according to the flow regulating control signal. The flow meter calculates a flow rate value from the inlet pipe and transmits it to the controller. When the controller receives an idle operation signal from the production machine, it transmits the flow regulating control signal to the valve based on the idle operation signal and the flow rate value to reduce the cross-sectional area of ​​the valve's outlet. During the process of reducing the cross-sectional area of ​​the valve's outlet, the controller simultaneously determines whether a preset idle flow rate value has been reached based on the flow rate value transmitted by the flow meter.
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Citation Information

Patent Citations

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    CN118068870B

  • Plasma processing equipment

    JP2008187063A

  • Gasification supply device for raw materials and its automatic pressure regulating device

    TWI355470B

  • Gas flow regulating device

    TWM666586U

  • Method of manufacturing semiconductor device, display method, non-transitory computer-readable recording medium and substrate processing apparatus

    US20240006184A1