Compound, polymer, composition, film-forming composition, method for forming pattern, method for forming insulating film and method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof

Abstract

This invention provides compounds, polymers, compositions, resist composition, pattern forming methods, insulating film forming methods, and compound manufacturing methods that provide resists with excellent exposure sensitivity. It also provides methods for producing iodine-containing vinyl polymers (iodine-containing hydroxystyrene) and their acetylated derivatives in high yield without requiring expensive reagents or stringent conditions. A compound having one or more halogens, one or more hydrophilic groups or one decomposable group, and unsaturated double bonds. A method for manufacturing the aforementioned iodine-containing vinyl monomer comprising the following steps a) and b): a) preparing an iodine-containing alcoholic matrix having the general structure represented by formula (1-1): (The variable region in formula (1-1) is defined as described in the specification.); and b) dehydrating the aforementioned iodine-containing alcoholic matrix to obtain an iodine-containing vinyl monomer having the general structure represented by formula (1): (The variable region in formula (1) is defined as described in the specification.).

Description

Compound, polymer, composition, film-forming composition, pattern forming method, insulating film forming method, and method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof The present invention relates to compounds, polymers, compositions, film-forming compositions, patterning methods, insulating film forming methods, and methods for producing compounds. Furthermore, the present invention relates to methods for producing iodine-containing vinyl polymers and acetylated derivatives thereof. In recent years, advancements in lithography technology have led to a rapid increase in the miniaturization of semiconductors (patterns) and pixels in the manufacturing of semiconductor devices and liquid crystal displays. To achieve pixel miniaturization, the wavelength of the exposure light source has generally been shortened. Specifically, ultraviolet light, typically g-rays and i-rays, has traditionally been used. However, exposure techniques using far-ultraviolet light, such as KrF excimer lasers (248nm) and ArF excimer lasers (193nm), are now becoming the focus of mass production. Furthermore, the introduction of extreme ultraviolet (EUV) lithography (13.5nm) is also underway. Electron beams (EB) are also used to form fine patterns. Conventional resist materials are polymeric resists capable of forming amorphous films. Examples include polymethyl methacrylate, polyhydroxystyrene, or polyalkyl methacrylates containing acid-dissociable groups (e.g., see Non-Patent Document 1). Conventionally, line patterns of approximately 10 to 100 nm are formed by applying a solution of these resist compositions onto a substrate and irradiating the resulting resist film with ultraviolet light, far ultraviolet light, electron beams, or extreme ultraviolet light. In addition, the reaction mechanism of lithography performed by electron beam or extreme ultraviolet light is different from that of general photolithography (Non-patent Document 2, Non-patent Document 3). In addition, in lithography performed by electron beam or extreme ultraviolet light, the goal is to form fine patterns of several nm to tens of nm. If the size of the resist pattern becomes smaller, a resist composition with higher sensitivity to the exposure light source is required. In particular, in lithography performed by extreme ultraviolet light, from the perspective of processing volume, further high sensitivity is sought. As a resist material to improve the above-mentioned problems, a resist composition containing a metal complex of titanium, tin, hafnium or zirconium has been proposed (for example, refer to Patent Document 1). Furthermore, if the size of the resist pattern is reduced in this manner, a resist composition having higher sensitivity to the exposure light source is sought. As a raw monomer for such a resist composition, iodine-containing 4-hydroxystyrene has been proposed (for example, see Patent Documents 2-3). However, no method for synthesizing iodine-containing hydroxystyrene and its acetylated derivatives is disclosed. On the other hand, many methods for synthesizing hydroxystyrenes and their acetylated derivatives that do not contain iodine are known (e.g., Patent Documents 4 to 6). However, these methods generally require expensive reagents, harsh conditions, and have low yields. Furthermore, if these synthetic methods are applied to hydroxystyrenes and their acetylated derivatives that contain iodine, the yields generally become even lower. [Prior Art Documents] [Patent Documents] [Patent Document 1] Japanese Patent Application Publication No. 2015-108781 [Patent Document 2] US Patent Application Publication No. 2019 / 0187342 [Patent Document 3] WO2019 / 187881 [Patent Document 4] US Patent Application No. 4,316,995 [Patent Document 5] US Patent Application No. 5,274,060 [Patent Document 6] WO2005 / 097719 [Non-Patent Document] [Non-Patent Document 1] Okazaki Shinji, and 8 others, "40 Years of Lithography," S&T Publishing, December 9, 2016 [Non-Patent Document 2] H. Yamamoto, et al., Jpn. J. Appl. Phys. 46, L142 (2007) [Non-Patent Document 3] H. Yamamoto, et al., J. Vac. Sci. Technol. b 23, 2728 (2005) [Problems to be Solved by the Invention] However, conventionally developed film-forming compositions have a problem of insufficient sensitivity to exposure light sources in forming finer line patterns. In order to solve these problems, the object of the present invention is to provide a compound, a polymer, a composition, a resist composition, a pattern forming method, a method for forming an insulating film, and a method for producing the compound that can obtain a resist having excellent exposure sensitivity. Furthermore, as mentioned above, there is currently no known method for producing iodine-containing hydroxystyrene and its acetylated derivatives. Generally speaking, expensive reagents and harsh conditions are required, and the yield is low. To solve these problems, the present invention aims to provide a method for producing iodine-containing vinyl polymers (iodine-containing hydroxystyrene) and their acetylated derivatives in high yields without requiring expensive reagents or harsh conditions. [Means for Solving the Problems] The present inventors have conducted intensive research to address the aforementioned issues and have discovered that compounds having specific structures, or polymers containing such compounds as structural units, can improve the exposure sensitivity of resist compositions, thereby completing the present invention. Specifically, the present invention is as follows. [1] A compound having one or more halogens and an unsaturated double bond. [2] The compound as described in [1] above, having one or more hydrophilic groups or one decomposable group. [3] The compound as described in [1] or [2] above, represented by the following formula (1). (In formula (1), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group, and the aforementioned L 1 The ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group of Y may also have a substituent. Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate group, a nitro group, an amino group, a carboxyl group, a mercapto group, an ether group, a thioether group, a phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group. The alkoxy group, ester group, carbonate group, amino group, ether group, thioether group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, and phosphate group of Y may also have a substituent. R a 、R b , and R c Each of the above-mentioned Z is independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, A is an organic group having 1 to 30 carbon atoms, Z is independently an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, or a carbonate group, and the alkoxy group, ester group, acetal group, carboxyalkoxy group, or carbonate group of Z may also have a substituent, p is an integer greater than 1, m is an integer greater than 1, n is an integer greater than 0, and r is an integer greater than 0. ) [4] The compound described in [3] above is represented by the following formula (1a): (In formula (1a), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1). [5] The compound described in [3] above is represented by the following formula (1b): (In formula (1b), X, L 1, Y, A, Z, p, m, n, and r are the same as those in formula (1), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least one of them is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent.) [6] The compound as described in any one of the above [3] to [5], wherein n + r is an integer greater than 1. [7] The compound as described in any one of the above [3] to [6], wherein Y is each independently a group represented by the following formula (Y-1). (In formula (Y-1), L 2 A base that is cleaved by the action of acid or alkali, R 2 is a linear, branched or cyclic aliphatic group having 1 to 30 carbon atoms, an aromatic group having 1 to 30 carbon atoms, a linear, branched or cyclic aliphatic group containing heteroatoms having 1 to 30 carbon atoms, or an aromatic group containing heteroatoms having 1 to 30 carbon atoms, wherein the aforementioned R 2 The aliphatic group, aromatic group, aliphatic group containing heteroatoms, and aromatic group containing heteroatoms may further have substituents.) [8] The compound as described in any one of the above [3] to [7], wherein A is an aromatic ring. [9] The compound as described in any one of the above [3] to [7], wherein A is an alicyclic structure.

[10] The compound as described in any one of the above [3] to [9], wherein A is a heterocyclic structure.

[11] The compound as described in any one of the above [3] to

[10] , wherein n is 2 or more.

[12] The compound as described in any one of the above [1] to

[11] , wherein it contains a functional group that improves the solubility in alkaline developer by the action of an acid or a base.

[13] The compound as described in any one of the above [3] to

[12] , wherein X is I, and L 1is a single bond.

[14] A compound as described in any one of the above [3] to

[12] , wherein X is an aromatic group formed by introducing one or more F, Cl, Br or I groups into the aromatic group.

[15] A compound as described in any one of the above [3] to

[12] , wherein X is an alicyclic group formed by introducing one or more F, Cl, Br or I groups into the alicyclic group.

[16] A composition, wherein, relative to the total amount of the compound described in any one of the above [1] to

[15] , a compound represented by formula (1C) is contained in an amount of not less than 1 mass ppm and not more than 10 mass %: (In formula (1C), formula (1C1), and formula (1C2), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1), Rsub represents formula (1C1) or formula (1C2), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least any one of them is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, p-1 is an integer greater than 0, and * is a bonding site with an adjacent structural unit. )

[17] A composition comprising the compound as described in [1] to

[15] above, and a compound represented by formula (1D) containing 1 mass ppm or more and 10 mass % or less of the compound relative to the compound. (In formula (1D), formula (1D1), or formula (1D2), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1), Rsub2 represents formula (1D1) or formula (1D2), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least any one of them is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, n2 represents an integer from 0 to 4, p-1 represents an integer from 0 to 0, and * represents a bonding site with an adjacent structural unit. )

[18] A composition comprising 1 ppm by mass or more and 10% by mass or less of a compound represented by formula (1E) relative to the compound described in any one of items [3] to

[15] . (In formula (1E), X is independently F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group, and the aforementioned L 1 The ether group, ester group, thioether group, amine group, thioester group, acetal group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group of Y may also have a substituent. Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or a phosphate group. The alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, and phosphate group of Y may also have a substituent. R a 、R b , and R c are each independently H, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; 1 , Y, R a 、R b 、R c, A and Z do not include I, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0.)

[19] A composition comprising a compound as described in any one of the above [1] to

[15] , wherein the amount of impurities containing K is 1 mass ppm or less relative to the above compound, as converted to the element.

[20] A composition as described in the above

[19] , wherein the amount of peroxide is 10 mass ppm or less relative to the above compound.

[21] A composition as described in the above

[19] or

[20] , wherein the amount of impurities containing one or more elements selected from the group consisting of Mn, Al, Si, and Li is 1 mass ppm or less relative to the above compound, as converted to the element.

[22] A composition as described in any one of the above

[19] to

[21] , wherein the amount of compounds containing phosphorus is 10 mass ppm or less relative to the above compound.

[23] The composition as described in any one of the above

[19] to

[22] , wherein the amount of maleic acid is 10 ppm by mass or less relative to the above compound.

[24] A polymer comprising a structural unit derived from the compound as described in any one of the above [1] to

[15] .

[25] The polymer as described in the above

[24] , further comprising a structural unit represented by the following formula (C6): (In formula (C6), X C61 is a hydroxyl group or a halogen group, R C61 are each independently an alkyl group having 1 to 20 carbon atoms, and * represents a bonding site with an adjacent structural unit. )

[26] A film-forming composition comprising a compound as described in any one of the aforementioned [1] to

[15] , or a polymer as described in the aforementioned

[24] or

[25] .

[27] A film-forming composition as described in the aforementioned

[26] , further comprising an acid generator, a base generator or a base compound.

[28] A method for forming a resist pattern, comprising the steps of forming a resist film on a substrate using a film-forming composition comprising a compound as described in any one of the aforementioned [1] to

[15] or a polymer as described in the aforementioned

[24] or

[25] , exposing the resist film to form a pattern, and developing the resist film after the exposure.

[29] A method for forming an insulating film, comprising the method as described in the aforementioned

[28] .

[30] A method for producing a compound represented by the following formula (0), comprising a double bond introduction step of introducing an unsaturated double bond into a substituent Q in a compound represented by the following formula (S1). (In formula (S1), X 0is an organic group with 1 to 30 carbon atoms, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amine group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, and a phosphate group in Y may also have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, an aldehyde group, a carboxyl group, or a ketone group, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. (In formula (0), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y are each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amino group, ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group of Y may also have a substituent; R a 、R b , and R cEach of them is independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, A is an organic group having 1 to 30 carbon atoms, Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. )

[31] A method for producing a compound as described in

[30] above, wherein the compound represented by the aforementioned formula (S1) is a compound represented by the following formula (SA1), and the method comprises the steps shown in A1 below and the steps shown in A2 below. A1) A step of obtaining a compound represented by the following formula (SA2) using the compound represented by the aforementioned formula (SA1) and the compound represented by the following formula (RM1) or malononitrile A2) A step of using formula (SA2) and a fluoride source to obtain a compound represented by formula (1) (In formulas (SA1), (RM1) and (SA2), X 0 、L 1 , Y, A, Z, p, m', n, r are the same as those in formula (S1) and (0), Q 1 is an aldehyde or a ketone, LG is a group selected from a hydroxyl group, an alkoxy group, a carbonate group, an acetal group, and a carboxyl group, wherein the alkoxy group, the carbonate group, the acetal group, and the carboxyl group are aliphatic groups or aromatic groups that may have a substituent having 1 to 60 carbon atoms, and R 3 is a hydrogen group, or a carboxyl group or an ester group which may have a substituent having 1 to 60 carbon atoms, R 4 is a hydrogen group, R 5 、R 6are each independently H, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, and XA is a group selected from a hydrogen group or a halogen group.)

[32] The method for producing the compound as described in the aforementioned

[31] , wherein in the step shown in the aforementioned A2, the compound represented by the formula (SA2) is subjected to a decarboxylation reaction using the aforementioned fluoride source at a temperature below 100°C.

[33] The method for producing the compound as described in the aforementioned

[31] or

[32] , wherein in the step shown in the aforementioned A1, a reducing agent is further used to obtain the compound represented by the aforementioned formula (SA2).

[34] The method for producing the compound as described in any one of the aforementioned

[30] to

[33] , wherein in the aforementioned formula (S1), A is benzene, toluene, or a heteroaromatic ring.

[35] A method for producing a compound represented by the following formula (1), comprising the steps of forming a compound represented by the following formula (SB1) by at least one of the compounds represented by the following formula (SB2A) and the following formula (SB3A) obtained through the steps represented by the following steps B1A and at least one of the steps B2A and B3A, and the step of introducing a double bond by introducing an unsaturated double bond into a substituent Qb of the compound represented by the formula (SB1). B1A) A step of preparing the following substrate SB1A comprising one or more amino groups and a core B having an aldehyde group or a ketone group. B2A) A step of obtaining a compound represented by the following formula (SB2A) by introducing iodine into the core B. B3A) A step of obtaining a compound represented by the following formula (SB3A) by substituting an amino group with a halogen group by a Sandmeier reaction. (In formula (1), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group, and the aforementioned L 1 The ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group of Y may also have a substituent. Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate group, a nitro group, an amino group, a carboxyl group, a mercapto group, an ether group, a thioether group, a phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group. The alkoxy group, ester group, carbonate group, amino group, ether group, thioether group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, and phosphate group of Y may also have a substituent. R a 、R b , and R c are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, A is an organic group having 1 to 30 carbon atoms, Z is each independently an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, or a carbonate group, and the alkoxy group, ester group, acetal group, carboxyalkoxy group, or carbonate group of the aforementioned Z may also have a substituent, p is an integer of 1 or greater, m is an integer of 1 or greater, n is an integer of 0 or greater, and r is an integer of 0 or greater. In formulas (SB1A), (SB2A), (SB3A), and (SB1), Zb represents a hydrogen group or an amino group which may have a substituent and includes a hydrocarbon group having 1 to 30 carbon atoms, rb represents an integer of 1 or greater, Qb, L 1b 、X b1 , B, pb, mb' are synonymous with Q, L, X, A, p, m in formula (1). B2 It represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more and no more than five substituents selected from the group consisting of I, F, Cl, and Br.)

[36] The production method described in

[35] above, wherein the step of introducing a double bond uses an organic phosphorus compound and a base.

[37] The production method of the compound described in

[30] above, which comprises a halogen introduction step of introducing a halogen atom by reacting a halogenating agent with the compound represented by the above formula (S1).

[38] The production method of the compound described in any one of

[30] to

[34] above, wherein the compound represented by the above formula (SA1) is at least one of the compounds represented by the following formula (SB2A) and the following formula (SB3A) obtained by the step represented by B1A below, and at least one of the steps represented by B2A and B3A below. B1A) Step of preparing the following substrate SB1A comprising one or more amino groups and a core B having an aldehyde group or a ketone group; B2A) Step of obtaining a compound represented by the following formula (SB2A) in which iodine is introduced into the core B; B3A) Step of obtaining a compound represented by the following formula (SB3A) in which the amino group is substituted with a halogen group by a Sandmeier reaction; In formulas (SB1A), (SB2A), (SB3A), and (SA1A), Zb represents a hydrogen group or an amino group which may have a substituent and which includes a hydrocarbon group which may have a substituent having 1 to 30 carbon atoms, rb represents an integer greater than 1, and Qb, L 1b 、X b1, B, pb, mb' are synonymous with Q, L, X, A, p, m in formula (1). B2 It represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more and no more than five substituents selected from the group consisting of I, F, Cl, and Br.)

[39] A method for producing a compound as described in the aforementioned

[36] , wherein, in the step shown in the aforementioned B2A, at least an iodine source and an oxidizing agent are used to introduce iodine into the aforementioned mother nucleus B.

[40] A method for producing a compound as described in the aforementioned

[30] , wherein the compound represented by the aforementioned formula (SA1) is a compound produced by the step shown in the following B1B, and at least any one of the steps shown in the following B2B and B3B. B1B) A step of preparing the following substrate SB1B comprising a mother nucleus B having one or more amino groups and an aldehyde group or a ketone group, B2B) A step of obtaining a compound represented by formula (SB2B) in which iodine is introduced into the mother nucleus B, B3B) A step of obtaining a compound represented by formula (SB3B) in which the amino group is substituted with a halogen group. In formulas (SB1B), (SB2B), (SB3B), and (SA1B), Zb represents a hydrogen group or an amino group which may have a substituent and which includes a hydrocarbon group which may have a substituent having 1 to 30 carbon atoms, rb represents an integer greater than 1, and Qb, L 1b 、X b1 , B, pb, mb' are synonymous with Q, L, X, A, p, m in formula (1). B2 represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more and no more than five substituents selected from the group consisting of I, F, Cl, and Br.)

[41] The method for producing the compound as described in the aforementioned

[40] , further comprising the following step as shown in B4a: B4a) Wittig step.

[42] The method for producing the compound as described in the aforementioned

[38] or the aforementioned

[41] , wherein in the step as shown in the aforementioned B2B, at least an iodine source and an oxidizing agent are used to introduce iodine into the aforementioned parent nucleus B.

[43] The method for producing the compound as described in any one of the aforementioned

[40] to the aforementioned

[42] , wherein the aforementioned parent nucleus B has an aromatic ring structure which may have a heteroatom.

[44] A method for producing a compound represented by the following formula (1), comprising a halogen introduction step of introducing a halogen atom by reacting a halogenating agent with the compound represented by the following formula (S1), and a double bond introduction step of introducing an unsaturated double bond into the substituent Q, wherein the step of introducing the double bond uses an organic phosphorus compound and a base. (In formula (S1), X 0 is an organic group with 1 to 30 carbon atoms, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amine group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, and a phosphate group in Y may also have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, an aldehyde group, a carboxyl group, or a ketone group, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. (In formula (1), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y are each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amino group, ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group of Y may also have a substituent; R a 、R b , and R c are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; p is an integer greater than 1, m is an integer greater than 1, n is an integer greater than 0, and r is an integer greater than 0. Furthermore, the present inventors, as a result of actively examining the above-mentioned problems, have found that by following specific steps, a method for producing iodine-containing vinyl polymers and their acetylated derivatives in high yields can be provided without requiring expensive reagents or harsh conditions, thereby completing the present invention. That is, the present invention is as follows.

[45] A method for producing iodine-containing vinyl monomers, comprising the following steps a) and b), a) a step of preparing an iodine-containing alcoholic substrate having a general structure represented by formula (1-1): (In formula (1-1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 At least one of them is iodine, R 6 ~R 10 One of them is OH or OCH 3); and b) dehydrating the aforementioned alcoholic substrate containing iodine to obtain a vinyl monomer containing iodine having a general structure represented by formula (1): (In formula (1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 8 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 At least one of the monomers is iodine).

[46] The method for producing an iodine-containing vinyl monomer as described in the aforementioned

[45] , wherein the step of preparing an iodine-containing alcoholic substrate having a general structure represented by formula (1-1) comprises the following steps c) and d), c) a step of preparing an iodine-containing ketone substrate having a general structure represented by formula (1-2); (In formula (1-2), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 at least one of which is iodine); and d) reducing the aforementioned iodine-containing ketone substrate to obtain an iodine-containing alcoholic substrate having a general structure represented by the aforementioned formula (1-1).

[47] The method for producing an iodine-containing vinyl monomer as described in the aforementioned

[45] , wherein the aforementioned step of preparing an iodine-containing alcoholic substrate having a general structure represented by the formula (1-1) includes the following steps e) and f), e) a step of preparing an alcoholic substrate having a general structure represented by the formula (1-3); (In formula (1-3), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH, R 6 ~R 10 One of them is OH or OCH 3); and f) a step of introducing iodine into the aforementioned alcoholic substrate to obtain an iodine-containing alcoholic substrate having the general structure represented by the aforementioned formula (1-1).

[48] The method for producing an iodine-containing vinyl monomer as described in the aforementioned

[46] , wherein the step of preparing an iodine-containing ketone substrate having the general structure represented by the aforementioned formula (1-2) includes the following steps g) and h), g) a step of preparing a ketone substrate having the general structure represented by the aforementioned formula (1-4); (In formula (1-4), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH); and h) a step of introducing iodine into the aforementioned ketonic substrate to obtain an iodine-containing ketonic substrate having a general structure represented by formula (1-2).

[49] The method for producing an iodine-containing vinyl monomer as described in

[47] above, wherein the step of preparing the alcoholic substrate having a general structure represented by formula (1-3) includes the following steps i) and j), i) a step of preparing a ketonic substrate having a general structure represented by formula (1-4); (In formula (1-4), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH); and j) reducing the aforementioned ketone substrate to obtain an alcohol substrate having a general structure represented by formula (1-3).

[50] A method for producing an iodine-containing acetylated vinyl monomer, comprising the following steps k) and l), k) preparing an iodine-containing vinyl monomer having a general structure represented by formula (1): (In formula (1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 8 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 and 1) acetylation of the aforementioned iodine-containing vinyl monomer to obtain an iodine-containing acetylated vinyl monomer having a general structure represented by formula (2): (In formula (2), R 16 ~R 20 Each is independently H, OH, OCH 3. OAc, halogen or linear or branched alkyl, R 6 ~R 8 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 16 ~R 20 At least one of them is OAc, R 16 ~R 20

[51] A method for preparing an alcoholic substrate containing iodine, comprising the following steps c) and d): c) preparing a ketonic substrate containing iodine having a general structure represented by formula (1-2); (In formula (1-2), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 and d) reducing the aforementioned iodine-containing ketone substrate to obtain an iodine-containing alcohol substrate having a general structure represented by formula (1-1): (In formula (1-1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 At least one of them is iodine, R 6 ~R 10 One of them is OH or OCH 3).

[52] A method for preparing an alcoholic matrix containing iodine, comprising the following steps e) and f): e) a step of preparing an alcoholic matrix having a general structure represented by formula (1-3); (In formula (1-3), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH, R 6 ~R 10 One of them is OH or OCH 3); and f) introducing iodine into the aforementioned alcoholic matrix to obtain an iodine-containing alcoholic matrix having a general structure represented by formula (1-1): (In formula (1-1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5 At least one of them is iodine, R 6 ~R 10 One of them is OH or OCH 3).

[53] A method for preparing a ketone substrate containing iodine, comprising the following steps g) and h): g) a step of preparing a ketone substrate having a general structure represented by formula (1-4); (In formula (1-4), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of which is OH); and h) introducing iodine into the aforementioned ketone substrate to obtain a ketone substrate containing iodine having a general structure represented by formula (1-2); (In formula (1-2), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, R 1 ~R 5

[54] A method for preparing an alcoholic substrate, comprising the following steps i) and j), i) preparing a ketone substrate having a general structure represented by formula (1-4); (In formula (1-4), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of which is OH); and j) reducing the aforementioned ketone substrate to obtain an alcohol substrate having a general structure represented by formula (1-3); (In formula (1-3), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH, R 6 ~R 10 One of them is OH or OCH 3). [Effects of the Invention] According to the present invention, a compound, a polymer, a composition, a resist composition, a pattern forming method, a method for forming an insulating film, and a method for producing the compound can be provided, which can provide a resist having excellent exposure sensitivity. Furthermore, the present invention provides a method for producing iodine-containing vinyl polymers and their acetylated derivatives in high yield without requiring expensive reagents or harsh conditions. ≪First Embodiment≫ The following describes the first embodiment of the present invention (hereinafter referred to as "this embodiment" in some cases). Note that this embodiment is provided as an example to illustrate the present invention, and the present invention is not limited to this embodiment alone. In this specification, the terms have the following meanings. "(Meth)acrylate" means at least one selected from acrylate, halogenated acrylate, and methacrylate. Halogenated acrylate refers to an acrylate in which the methyl group of methacrylate is substituted with a halogen. Other terms containing the character "(meth)" are to be interpreted in the same manner as for (meth)acrylate. "(Co)polymer" means at least one selected from a single polymer and a copolymer. [Compound (A)] The compound described in this embodiment (hereinafter, also referred to as "compound (A)") has one or more halogens and an unsaturated double bond. In addition, compound (A) may further have one or more hydrophilic groups or one decomposable group. From the perspective of the roughness of the pattern, it is preferred to have one or more hydrophilic groups or one decomposable group. That is, the compound described in this embodiment has one or more halogens, one or more hydrophilic groups or one decomposable group, and an unsaturated double bond. In addition, compound (A) may further have one or more hydrophilic groups or one decomposable group. As halogens, I, F, Cl, and Br can be mentioned. Among these, from the perspective of the sensitization effect produced by EUV or the reduction of the roughness of the pattern, I, F, or Br is preferred, I or F is more preferred, and I is even more preferred. The number of halogens is preferably an integer of 1 to 5, more preferably an integer of 2 to 4, and even more preferably 2 or 3. A "hydrophilic group" refers to a group that, by bonding to an organic compound, increases the compound's affinity for water. Examples of hydrophilic groups include hydroxyl, nitro, amino, carboxyl, mercapto, phosphino, phosphonic acid, phosphoric acid, ether, thioether, urethane, urea, amide, and imide groups. Among these, hydroxyl and carboxyl groups are preferred, with hydroxyl groups being even more preferred, due to their EUV sensitization effects and reduced pattern roughness. The number of hydrophilic groups is preferably an integer of 1 to 5, more preferably an integer of 1 to 3, even more preferably 1 or 2, and particularly preferably 2. The term "degradable group" refers to a group that decomposes in the presence of an acid or base, or by exposure to radiation, electron beams, extreme ultraviolet (EUV), or light sources such as ArF and KrF. While the degradable group is not particularly limited, for example, the acid-dissociable functional groups described in International Publication No. WO2013 / 024778 can be used. Among the degradable groups, hydrolyzable groups are preferred. A "hydrolyzable group" refers to a group that hydrolyzes in the presence of an acid or base. Examples of hydrolyzable groups include alkoxy groups, ester groups, acetal groups, and carbonate groups. The number of degradable groups is preferably an integer of 1 to 5, more preferably an integer of 1 to 3, even more preferably 1 or 2, and particularly preferably 2. The unsaturated double bond is preferably a polymerizable unsaturated double bond. As the group having an unsaturated double bond, there is no particular limitation, but for example, vinyl, isopropenyl, (meth)acryloyl, halogenated acryloyl, etc. can be mentioned. As halogenated acryloyl, for example, α-fluoroacryloyl, α-chloroacryloyl, α-bromoacryloyl, α-iodoacryloyl, α, β-dichloroacryloyl and α, β-diiodoacryloyl can be mentioned. Among these unsaturated double bonds, isopropenyl and vinyl groups are preferred. The number of unsaturated double bonds is preferably an integer of 1 to 3, more preferably an integer of 1 to 2, and even more preferably 1. The compound (A) described in this embodiment is preferably represented by the following formula (1). Compound (A) preferably contains a functional group that enhances solubility in alkaline developer solutions by the action of an acid or a base. Among the following Z, Y, and X, one preferably contains a functional group that enhances solubility in alkaline developer solutions by the action of an acid or a base. In formula (1), X is each independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br. Among these, X is preferably each independently I, F, Cl, or Br, more preferably each independently I, F, or Br, even more preferably each independently I or F, and even more preferably each independently I. In this embodiment, unless otherwise specified, "substituted" means that one or more hydrogen atoms in a functional group are replaced by a substituent. "Substituents" are not particularly limited, but examples thereof include halogen atoms, hydroxyl groups, carboxyl groups, cyano groups, nitro groups, mercapto groups, heterocyclic groups, alkyl groups having 1 to 30 carbon atoms, aryl groups having 6 to 30 carbon atoms, alkoxy groups having 1 to 30 carbon atoms, alkenyl groups having 2 to 30 carbon atoms, alkynyl groups having 2 to 30 carbon atoms, acyl groups having 1 to 30 carbon atoms, and amino groups having 0 to 30 carbon atoms. Alkyl groups may be linear, branched, or cyclic aliphatic hydrocarbon groups. Examples of alkyl groups having 1 to 30 carbon atoms include, but are not limited to, methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, n-pentyl, n-hexyl, n-dodecyl, and pentyl. Examples of aryl groups having 6 to 30 carbon atoms include, but are not limited to, phenyl, naphthyl, biphenyl, anthracenyl, pyrenyl, and perylenyl. Examples of alkenyl groups having 2 to 30 carbon atoms include, but are not limited to, ethynyl, propenyl, butynyl, and pentynyl. Examples of alkynyl groups having 2 to 30 carbon atoms include, but are not limited to, acetylene and ethynyl. Examples of alkoxy groups having 1 to 30 carbon atoms include, but are not limited to, methoxy, ethoxy, propoxy, butoxy, and pentyloxy. The "organic group having 1 to 30 carbon atoms and having one or more and no more than five substituents selected from the group consisting of I, F, Cl, and Br" is not particularly limited, but includes monoiodophenyl, diiodophenyl, triiodophenyl, tetraiodophenyl, pentaiodophenyl, monoiodohydroxyphenyl, diiodohydroxyphenyl, triiodohydroxyphenyl, monoiodoacetyloxyphenyl, diiodoacetyloxyphenyl, triiodoacetyloxyphenyl, monoiodo-t-butoxycarbonylphenyl, diiodo-t-butoxycarbonylphenyl, triiodo-t-butoxycarbonylphenyl, monoiododihydroxyphenyl, diiododihydroxyphenyl, triiododihydroxyphenyl, monoiododiacetyloxyphenyl, diiododiacetyloxyphenyl, triiododiacetyloxyphenyl, monoiodo-di-t-butoxycarbonylphenyl, diiodo-di-t-butoxycarbonylphenyl, triiodo-di-t-butoxycarbonylphenyl, monoiodotrihydroxyphenyl, phenyl, diiodotrihydroxyphenyl, monoiodotriacetyloxyphenyl, diiodotriacetyloxyphenyl, monoiodo-tri-t-butoxycarbonylphenyl, diiodo-tri-t-butoxycarbonylphenyl, monoiodonaphthyl, diiodonaphthyl, triiodonaphthyl, tetraiodonaphthyl, pentaiodonaphthyl, monoiodohydroxynaphthyl, diiodohydroxynaphthyl, triiodhydroxynaphthyl, monoiodoacetyloxynaphthyl, diiodoacetyloxynaphthyl, triiodoacetyloxynaphthyl, monoiodo- t-Butoxycarbonylnaphthyl, diiodo-t-butoxycarbonylnaphthyl, triiodo-t-butoxycarbonylnaphthyl, monoiododihydroxynaphthyl, diiododihydroxynaphthyl, triiododihydroxynaphthyl, monoiododiethoxynaphthyl, diiododiethoxynaphthyl, triiododiethoxynaphthyl, monoiodo-di-t-butoxycarbonylnaphthyl, diiodo-di-t-butoxycarbonylnaphthyl, triiodo-di-t-butoxycarbonylnaphthyl, Monoiodotrihydroxynaphthyl, diiodotrihydroxynaphthyl, monoiodotriacetyloxynaphthyl, diiodotriacetyloxynaphthyl, monoiodo-tri-t-butoxycarbonylnaphthyl, diiodo-tri-t-butoxycarbonylnaphthyl, monoiodoadamantyl, diiodoadamantyl, triiodoadamantyl, monoiodohydroxyadamantyl, diiodohydroxynaphthyl, monoiodoacetyloxynaphthyl, diiodoacetyloxyadamantyl, monoiodo-t-butoxycarbonyladamantyl, diiodo-t-butoxycarbonyladamantyl, triiodo-t-butoxycarbonyladamantyl, Monoiodinated dihydroxyadamantyl, monoiodinated diacetyloxyadamantyl, monoiodinated di-t-butoxycarbonyl adamantyl, monoiodinated cyclohexyl, diiodinated cyclohexyl, triiodinated cyclohexyl, monoiodinated hydroxycyclohexyl, diiodinated hydroxynaphthyl, monoiodinated acetyloxynaphthyl, diiodinated acetyloxycyclohexyl, monoiodinated t-butoxycarbonylcyclohexyl, diiodinated t-butoxycarbonylcyclohexyl, triiodinated t-butoxycarbonylcyclohexyl, monoiodinated dihydroxycyclohexyl, monoiodinated diacetyloxycyclohexyl, monoiodinated di-t-butoxycarbonylcyclohexyl, Monobromophenyl, dibromophenyl, tribromophenyl, tetrabromophenyl, pentabromophenyl, monobromohydroxyphenyl, dibromohydroxyphenyl, tribromohydroxyphenyl, monobromoacetyloxyphenyl, dibromoacetyloxyphenyl, tribromoacetyloxyphenyl, monobromo-t-butoxycarbonylphenyl, dibromo-t-butoxycarbonylphenyl, tribromo-t-butoxycarbonylphenyl, monobromodihydroxyphenyl, dibromodihydroxyphenyl, tribromodihydroxyphenyl, monobromodiacetyloxyphenyl, dibromodiacetyloxyphenyl, tribromodiacetyloxyphenyl, monobromodi-t-butoxycarbonylphenyl, dibromodi-t-butoxycarbonylphenyl, tribromodi-t-butoxycarbonylphenyl, Monobromotrihydroxyphenyl, dibromotrihydroxyphenyl, monobromotriacetyloxyphenyl, dibromotriacetyloxyphenyl, monobromotri-t-butoxycarbonylphenyl, dibromotri-t-butoxycarbonylphenyl, monobromoadamantyl, dibromoadamantyl, tribromoadamantyl, monobromohydroxyadamantyl, dibromohydroxynaphthyl, monobromoacetyloxynaphthyl, dibromoacetyloxyadamantyl, monobromo-t-butoxycarbonyladamantyl, dibromo-t-butoxycarbonyladamantyl, tribromo-t-butoxycarbonyladamantyl, monobromodihydroxyadamantyl, monobromodiacetyloxyadamantyl, monobromo-di-t-butoxycarbonyladamantyl, Monofluorophenyl, difluorophenyl, trifluorophenyl, tetrafluorophenyl, pentafluorophenyl, monofluorohydroxyphenyl, difluorohydroxyphenyl, trifluorohydroxyphenyl, monofluoroacetyloxyphenyl, difluoroacetyloxyphenyl, trifluoroacetyloxyphenyl, monofluoro-t-butoxycarbonylphenyl, difluoro-t-butoxycarbonylphenyl, trifluoro-t-butoxycarbonylphenyl, monofluorodihydroxyphenyl, difluorodihydroxyphenyl, trifluorodihydroxyphenyl, monofluorodiacetyloxyphenyl, difluorodiacetyloxyphenyl, trifluorodiacetyloxyphenyl, monofluorodi-t-butoxycarbonylphenyl, difluorodi-t-butoxycarbonylphenyl, trifluorodi-t-butoxycarbonylphenyl, Monofluorotrihydroxyphenyl, difluorotrihydroxyphenyl, monofluorotriacetyloxyphenyl, difluorotriacetyloxyphenyl, monofluorotri-t-butoxycarbonylphenyl, difluorotri-t-butoxycarbonylphenyl, monofluoroadamantyl, difluoroadamantyl, trifluoroadamantyl, monofluorohydroxyadamantyl, difluorohydroxynaphthyl, monofluoroacetyloxynaphthyl, difluoroacetyloxyadamantyl, monofluoro-t-butoxycarbonyladamantyl, difluoro-t-butoxycarbonyladamantyl, trifluoro-t-butoxycarbonyladamantyl, monofluorodihydroxyadamantyl, monofluorodiacetyloxyadamantyl, monofluoro-di-t-butoxycarbonyladamantyl, Monochlorophenyl, dichlorophenyl, trichlorophenyl, tetrachlorophenyl, pentachlorophenyl, monochlorohydroxyphenyl, dichlorohydroxyphenyl, trichlorohydroxyphenyl, monochloroacetyloxyphenyl, dichloroacetyloxyphenyl, trichloroacetyloxyphenyl, monochloro-t-butoxycarbonylphenyl, dichloro-t-butoxycarbonylphenyl, trichloro-t-butoxycarbonylphenyl, monochlorodihydroxyphenyl, dichlorodihydroxyphenyl, trichlorodihydroxyphenyl, monochlorodiacetyloxyphenyl, dichlorodiacetyloxyphenyl, trichlorodiacetyloxyphenyl, monochlorodi-t-butoxycarbonylphenyl, dichlorodi-t-butoxycarbonylphenyl, trichlorodi-t-butoxycarbonylphenyl, Monochlorotrihydroxyphenyl, dichlorotrihydroxyphenyl, monochlorotriacetyloxyphenyl, dichlorotriacetyloxyphenyl, monochlorotris-t-butoxycarbonylphenyl, dichlorotris-t-butoxycarbonylphenyl, monochloroadamantyl, dichloroadamantyl, trichloroadamantyl, monochlorohydroxyadamantyl, dichlorohydroxynaphthyl, monochloroacetyloxynaphthyl, dichloroacetyloxyadamantyl, monochloro-t-butoxycarbonyladamantyl, dichloro-t-butoxycarbonyladamantyl, trichloro-t-butoxycarbonyladamantyl, monochlorodihydroxyadamantyl, monochlorodiacetyloxyadamantyl, monochlorodi-t-butoxycarbonyladamantyl, and the like. For example, X is an aromatic group, and one or more F, Cl, Br or I groups may be introduced into the aromatic group. Examples of such aromatic groups include groups having a benzene ring such as a phenyl group having 1 to 5 halogen atoms, or groups having a heteroaromatic ring such as furan, thiophene, or pyridine having 1 to 5 halogen atoms. Examples include phenyl groups having 1 to 5 I groups, phenyl groups having 1 to 5 F groups, phenyl groups having 1 to 5 Cl groups, phenyl groups having 1 to 5 Br groups, naphthyl groups having 1 to 5 F groups, naphthyl groups having 1 to 5 Cl groups, and groups having 1 to 5 Br groups. naphthyl having 1 to 5 I's, phenol having 1 to 4 F's, phenol having 1 to 4 Cl's, phenol having 1 to 4 Br's, phenol having 1 to 4 I's, furanyl having 1 to 3 F's, furanyl having 1 to 3 Cl's, furanyl having 1 to 3 Br's, furanyl having 1 to 3 I's, thienyl having 1 to 3 F's, thienyl having 1 to 3 Cl's, thienyl having 1 to 3 Br's , thienyl with 1 to 3 I, pyridyl with 1 to 4 F, pyridyl with 1 to 4 Cl, pyridyl with 1 to 4 Br, pyridyl with 1 to 4 I, benzothiazolyl with 1 to 5 F, benzothiazolyl with 1 to 5 Cl, benzothiazolyl with 1 to 5 Br, benzothiazolyl with 1 to 5 I, benzimidazolyl with 1 to 4 F, benzimidazolyl with 1 to 4 Cl oxazolyl, a benzimidazolyl having 1 to 4 Br groups, a benzimidazolyl having 1 to 4 I groups, a benzoxazolyl having 1 to 4 F groups, a benzoxazolyl having 1 to 4 Cl groups, a benzoxazolyl having 1 to 4 Br groups, a benzoxazolyl having 1 to 4 I groups, a benzothiophenyl having 1 to 4 F groups, a benzothiophenyl having 1 to 4 Cl groups, a benzothiophenyl having 1 to 4 Br groups, or a benzothiophenyl having 1 to 4 I groups. Furthermore, X is an alicyclic group and may be a group in which one or more F, Cl, Br, or I groups are introduced into the alicyclic group. Examples of such alicyclic groups include adamantyl groups having 1 to 3 halogens, adamantyl groups having 1 to 3 F groups, adamantyl groups having 1 to 3 Cl groups, adamantyl groups having 1 to 3 Br groups, adamantyl groups having 1 to 3 I groups, cyclopentyl groups having 1 to 3 F groups, cyclopentyl groups having 1 to 3 Cl groups, cyclopentyl groups having 1 to 3 Br groups, cyclopentyl groups having 1 to 3 I groups, bicycloundecyl groups having 1 to 3 F groups, bicycloundecyl groups having 1 to 3 Cl groups, bicycloundecyl groups having 1 to 3 Br groups, bicycloundecyl groups having 1 to 3 I groups, norbornyl groups having 1 to 3 F groups, norbornyl groups having 1 to 3 Cl groups, norbornyl groups having 1 to 3 Br groups, and norbornyl groups having 1 to 3 I groups. L 1is a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group. 1 Preferably it is a single bond. 1 The ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphine group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphoric acid group may also have a substituent. Examples of such substituents are as described above. m is an integer of 1 or greater, preferably an integer of 1 or greater and 5 or less, more preferably an integer of 2 or greater and 4 or less, and even more preferably 2 or 3. Each of the Y groups is independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate group, a nitro group, an amino group, a carboxyl group, a mercapto group, an ether group, a sulfide group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group. The alkoxy group, ester group, carbonate group, amino group, ether group, sulfide group, phosphino group, phosphonic acid group, urethane group, urea group, an amide group, an imide group, and a phosphate group of the aforementioned Y group may have a substituent. For example, the Y group may be composed of an alkoxy group [* 3 -OR 2 ]、ester group[* 3 -O-(C=O)-R 2 or* 3 -(C=O)-OR 2 ]、acetal group[* 3 -O-(C(R 21 ) 2)-OR 2 (R 21 are each independently H, or a hydrocarbon group having 1 to 10 carbon atoms. )], carboxyalkoxy [* 3 -OR 22 -(C=O)-OR 2 (R 22 is a divalent hydrocarbon group having 1 to 10 carbon atoms. )], and a carbonate group [* 3-O-(C=O)-OR 2 ] is at least one group selected from the group consisting of. From the perspective of high sensitivity, the ester group is preferably a tertiary ester group. In addition, in the formula, * 3 It is the site that bonds to A. Among these, Y is preferably a tertiary ester group, acetal group, carbonate group, or carboxyalkoxy group from the perspective of high sensitivity, more preferably an acetal group, carbonate group, or carboxyalkoxy group, and even more preferably an acetal group or carboxyalkoxy group. Furthermore, from the perspective of producing a polymer of stable quality by free radical polymerization, an ester group, carboxyalkoxy group, and carbonate group are preferred. Y is preferably each independently a group represented by the following formula (Y-1). In formula (Y-1), L 2 A group that is cleaved by the action of an acid or a base. Examples of the group that is cleaved by the action of an acid or a base include an ester group [* 1 -O-(C=O)-* 2 or* 1 -(C=O)-O-* 2 ]、acetal group[* 1 -O-(C(R 21 ) 2)-O-* 2 (R 21 are each independently H, or a hydrocarbon group having 1 to 10 carbon atoms. )], carboxyalkoxy [* 1 -OR 22 -(C=O)-O-* 2 (R 22 is a divalent hydrocarbon group having 1 to 10 carbon atoms. )], and a carbonate group [* 1 -O-(C=O)-O-* 2 ] is at least one divalent linking group selected from the group consisting of ester groups. From the perspective of high sensitivity, ester groups are preferably tertiary ester groups. In addition, in the formula, * 1 is the bonding site with A, 2 For R 2 Among these, L 2 From the viewpoint of high sensitivity, it is preferred to be a tertiary ester group, an acetal group, a carbonate group or a carboxyl alkoxy group, more preferred to be an acetal group, a carbonate group or a carboxyl alkoxy group, and even more preferred to be an acetal group or a carboxyl alkoxy group. Furthermore, from the viewpoint of producing a polymer of stable quality by free radical polymerization, an ester group, a carboxyl alkoxy group and a carbonate group are preferred. In addition, as other effects, when the compound (A) of the present embodiment is used as a polymerization unit of a copolymer, in order to achieve the purpose of controlling the polymerizability of the resin and making the degree of polymerization within the desired range, Y is preferably a group represented by formula (Y-1). Since compound A has an X group, the influence of the active species on the polymer formation reaction becomes greater, and it becomes difficult to control as desired, and since the hydrophilic group in compound A has a group represented by formula (Y-1) as a protecting group, the deviation of the copolymer formed from the hydrophilic group can be controlled and the hindrance of polymerization can be suppressed. R 2 is a linear, branched or cyclic aliphatic group having 1 to 30 carbon atoms, an aromatic group having 6 to 30 carbon atoms, a linear, branched or cyclic aliphatic group containing heteroatoms having 1 to 30 carbon atoms, or a linear, branched or cyclic aromatic group containing heteroatoms having 1 to 30 carbon atoms, wherein the aforementioned R 2 The aliphatic group, aromatic group, aliphatic group containing heteroatoms, and aromatic group containing heteroatoms may further have a substituent. In addition, as the substituent here, the aforementioned ones can be used, but preferably, a linear, branched or cyclic aliphatic group having 1 to 20 carbon atoms, or an aromatic group having 6 to 20 carbon atoms. Among these, R 2 Preferably it is an aliphatic group. 2 The aliphatic group in is preferably a branched or cyclic aliphatic group. The aliphatic group preferably has 1 to 20 carbon atoms, more preferably 3 to 10 carbon atoms, and even more preferably 4 to 8 carbon atoms. The aliphatic group is not particularly limited, but examples thereof include methyl, isopropyl, sec-butyl, tert-butyl, isobutyl, cyclohexyl, methylcyclohexyl, and adamantyl. Among these, tert-butyl, cyclohexyl, and adamantyl are preferred. L 2 If * 1 -(C=O)-O-* 2When a carboxyalkoxy group is cleaved by acid or base, a carboxylic acid group is formed. The difference in solubility and dissolution rate between the cleaved and non-cleaved areas during development is increased, thereby improving resolution. This is particularly advantageous because residue at the bottom of fine line patterns is suppressed. Specific examples of Y include the following: Each independently represents a group represented by any one of the following formulae (Y-1-1) to (Y-1-7). Examples of alkoxy groups that can be used as Y include those with 1 or more carbon atoms. From the perspective of solubility of the resulting resin after combining with other monomers, alkoxy groups with 2 or more carbon atoms are preferred, and alkoxy groups with 3 or more carbon atoms or having a cyclic structure are particularly preferred. Specific examples of alkoxy groups that can be used as Y include the following, but are not limited thereto. As amino groups and amide groups that can be used as Y, primary amino groups, secondary amino groups, tertiary amino groups, groups with quaternary ammonium salt structures, and amide groups having substituents can be suitably used. Specific examples of amino groups or amide groups that can be used include the following, but are not limited thereto. n is an integer of 0 or greater, preferably an integer of 1 or greater, more preferably an integer of 1 or greater and 5 or less, even more preferably an integer of 1 or greater and 3 or less, further more preferably 1 or 2, and particularly preferably 2. R a 、R b , and R c Each of the following is independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent. Substituents for the organic group having 1 to 60 carbon atoms are not particularly limited, but examples thereof include I, F, Cl, Br, and other substituents. Other substituents are not particularly limited, but examples thereof include hydroxyl groups, alkoxy groups, ester groups, acetal groups, carbonate groups, nitro groups, amino groups, carboxyl groups, mercapto groups, ether groups, sulfide groups, phosphino groups, phosphonic acid groups, urethane groups, urea groups, amide groups, imide groups, and phosphoric acid groups. Among these, alkoxy groups, ester groups, carbonate groups, amino groups, ether groups, sulfide groups, phosphino groups, phosphonic acid groups, urethane groups, urea groups, amide groups, imide groups, and phosphoric acid groups may further have a substituent. Examples of the substituents herein include linear, branched, or cyclic aliphatic groups having 1 to 20 carbon atoms and aromatic groups having 6 to 20 carbon atoms. R a 、R b , and R c In the formula (a), the organic group which may have a substituent preferably has 1 to 30 carbon atoms. The organic group having 1 to 60 carbon atoms which may have a substituent is not particularly limited, but examples thereof include linear or branched aliphatic hydrocarbon groups having 1 to 60 carbon atoms, alicyclic hydrocarbon groups having 4 to 60 carbon atoms, and aromatic groups which may contain heteroatoms having 6 to 60 carbon atoms. The linear or branched aliphatic hydrocarbon group having 1 to 60 carbon atoms is not particularly limited, but examples thereof include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, n-dodecyl, pentyl, and 2-ethylhexyl. The alicyclic hydrocarbon group is not particularly limited, but examples thereof include cyclohexyl, cyclododecyl, dicyclopentyl, tricyclodecyl, and adamantyl. Furthermore, aromatic groups that may contain heteroatoms, such as benzothiazolyl, benzotriazolyl, and benzodiazolyl, may also be appropriately selected. Furthermore, combinations of these organic groups may be selected. The aromatic group which may contain a heteroatom having 6 to 60 carbon atoms is not particularly limited, but examples thereof include phenyl, naphthyl, biphenyl, anthracenyl, pyrenyl, benzothiazolyl, benzotriazolyl, and benzodiazolyl. Among these organic groups having 1 to 60 carbon atoms which may have a substituent, a methyl group is preferred from the viewpoint of producing a polymer having stable quality. R a In the case of an organic group having 1 to 8 carbon atoms, or a group selected from F, Cl, and I, n and r are preferably 0 or greater. A is an organic group having 1 to 30 carbon atoms. A may be a monocyclic or polycyclic organic group, and may have a substituent. A is preferably an aromatic ring which may have a substituent. A preferably has 6 to 14 carbon atoms, more preferably 6 to 10 carbon atoms. A is preferably a group represented by any one of the following formulas (A-1) to (A-4), more preferably a group represented by the following formulas (A-1) to (A-2), and even more preferably a group represented by the following formula (A-1). A may be an alicyclic structure that may have a substituent. The term "alicyclic structure" herein refers to a saturated or unsaturated carbon ring that is not aromatic. Examples of the aforementioned alicyclic structure include saturated or unsaturated carbon rings having 3 to 30 carbon atoms, preferably saturated or unsaturated carbon rings having 3 to 20 carbon atoms. Examples of the aforementioned alicyclic structure include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, cycloeicosyl, cyclopropenyl, cyclobutenyl, cyclopentenyl, cyclohexenyl, cycloheptenyl, cyclooctenyl, cyclopentadienyl, cyclooctadienyl, adamantyl, bicycloundecyl, decahydronaphthyl, norbornyl, norbornadienyl, cubane, umbelliferyl, and arbutane. In addition, A may be a heterocyclic structure that may have a substituent. The heterocyclic structure is not particularly limited, but examples thereof include cyclic nitrogen-containing structures such as pyridine, piperidine, piperidone, benzothiazole, and benzotriazole, triazines, cyclic urethane structures, cyclic ureas, cyclic amides, cyclic imides, cyclic ethers such as furan, pyran, and dioxolanes, and alicyclic groups having polylactone structures such as caprolactone, butyrolactone, nonanolactone, decanolactone, undecalactone, bicyclic undecalactone, and phthalolactone. p is an integer greater than or equal to 1, preferably an integer greater than or equal to 1 and less than or equal to 3, more preferably an integer greater than or equal to 1 and less than or equal to 2, and even more preferably 1. Each Z is independently an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, or a carbonate group. These groups may also have a substituent. Examples of the substituent include a hydrocarbon group having 1 to 60 carbon atoms which may have a substituent. r is an integer greater than 0, preferably an integer greater than 0 and less than 2, more preferably an integer greater than 0 and less than 1, and even more preferably 0. The Z system includes, for example, alkoxy [* 3 -OR 2 ]、ester group[* 3 -O-(C=O)-R 2 or* 3 -(C=O)-OR 2 ]、acetal group[* 3 -O-(C(R 21 ) 2)-OR 2 (R 21 are each independently H, or a hydrocarbon group having 1 to 10 carbon atoms. )], carboxyalkoxy [* 3 -OR 22 -(C=O)-OR 2 (R 22 is a divalent hydrocarbon group having 1 to 10 carbon atoms. )], and a carbonate group [* 3 -O-(C=O)-OR 2 ] is at least one group selected from the group consisting of. From the perspective of high sensitivity, the ester group is preferably a tertiary ester group. In addition, in the formula, * 3 The site that bonds to A. Among these, Z is preferably a tertiary ester group, acetal group, carbonate group, or carboxyalkoxy group from the perspective of high sensitivity, more preferably an acetal group, carbonate group, or carboxyalkoxy group, and even more preferably an acetal group or carboxyalkoxy group. Furthermore, from the perspective of producing a polymer of stable quality by free radical polymerization, an ester group, carboxyalkoxy group, and carbonate group are preferred. As described above, n is an integer greater than or equal to 0, and r is an integer greater than or equal to 0, but at least one of n or r may be an integer greater than or equal to 1. That is, n+r may be an integer greater than or equal to 1. Among the above compounds (A), the compound represented by the following formula (1a) is preferred. (In formula (1a), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1). Examples of the compound (A) described in this embodiment (particularly the compound represented by formula (1a)) include compounds having the structures shown below. Among the above compounds (A), the compound represented by the following formula (1b) is preferred from the viewpoint of further improving the sensitivity. (In formula (1b), X, L 1 , Y, A, Z, p, m, n, and r are the same as those in formula (1), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least one of them is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent. ) R a1 、R b1 , and R c1 The organic group having 1 to 60 carbon atoms and the organic group having a substituent group are the same as the aforementioned R a 、R b , and R c The organic group having 1 to 60 carbon atoms and optionally having a substituent has the same definition. a1 It is preferably an organic group having 1 to 60 carbon atoms which may have a substituent, and more preferably a methyl group. b1 , and R c1 H is preferred. Examples of the compound (A) described in this embodiment (particularly the compound represented by formula (1b)) include compounds having the structures shown below. The above compound (A) may be, for example, a compound represented by the following formula (1C). Although not particularly limited, as described below, the compound represented by the following formula (1C) is preferably used in combination with a compound (A) other than the compound. (In formula (1C), formula (1C1), and formula (1C2), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1), Rsub represents formula (1C1) or formula (1C2), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least one of them is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, p-1 is an integer greater than 0, and * represents the site of bonding with each formula. In the composition containing the compound (A) described in this embodiment, when a compound represented by formula (1C) is used, the composition may contain a compound represented by the following formula (1C) and a compound (A) other than the compound. In this case, the composition is preferably prepared in such a manner that the compound represented by formula (1C) is in the range of 1 mass ppm to 10 mass % relative to the total amount of compound (A), more preferably in the range of 1 mass ppm to 5 mass %, still more preferably in the range of 1 mass ppm to 3 mass %, and particularly preferably in the range of 1 mass ppm to 1 mass %. In the resin form after forming a resin containing the starting material of the composition prepared in this manner, since the site containing X and the site composed of Y or Z are densely present in the adjacent area, it becomes the starting point for improving sensitivity. In addition, since the solubility in the resin is locally increased, the residue defects after development in the lithography process are reduced. Examples of the compound (A) described in this embodiment (particularly, the compound represented by formula (1C)) include compounds having the structures shown below. Furthermore, the compound (A) of this embodiment can also be used in combination with a compound represented by the following formula (1D), for example. (In formula (1D), formula (1D1), or formula (1D2), X, L 1 , Y, A, Z, p, m, n, and r are the same as those defined in formula (1), Rsub2 represents formula (1D1) or formula (1D2), R a1 、R b1 , and R c1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, R a1 、R b1 , and R c1 At least one of the following is I, F, Cl, or Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, n2 represents an integer from 0 to 4, p-1 represents an integer from 0 to 0, and * represents a bonding site with an adjacent structural unit. When a compound represented by formula (1D) is used in a composition containing compound (A) of this embodiment, the composition may contain a compound represented by formula (1D) below and a compound (A) other than the compound. In this case, the composition is preferably prepared so that the compound represented by formula (1D) is in a range of 1 mass ppm to 10 mass % relative to the total amount of compound (A), more preferably in a range of 1 mass ppm to 5 mass %, even more preferably in a range of 1 mass ppm to 3 mass %, and particularly preferably in a range of 1 mass ppm to 1 mass %. In the case of forming a resin containing the starting materials of the composition prepared in this manner, the resin form is formed by having a site containing X and a site composed of Y or Z coexist at a high density in the adjacent area, which serves as a starting point for improved sensitivity. In addition, since the solubility in the resin is locally increased, the residual defects after development in the lithography process can be reduced. Examples of the compound (A) described in this embodiment (particularly, the compound represented by formula (1D)) include compounds having the structures shown below. The composition containing the compound (A) of this embodiment may contain a compound represented by the following formula (1E). When using this compound, the composition containing the compound (A) of this embodiment preferably contains the compound represented by formula (1E) in an amount ranging from 1 mass ppm to 10 mass % relative to the total amount of the compound (A), more preferably ranging from 1 mass ppm to 5 mass %, even more preferably ranging from 1 mass ppm to 3 mass %, and particularly preferably ranging from 1 mass ppm to 1 mass %. Compositions prepared in this manner tend to have improved stability. The reason for this is not clear, but it is speculated that the iodine-containing compound (A) and the iodine-free compound (1E) produce an equilibrium reaction of iodine atoms, resulting in stabilization. In this case, the aforementioned composition preferably contains a compound (1E) having a structure obtained by removing the iodine atom from the compound exemplified as the compound (A) above. The composition prepared in this manner has improved stability, thereby improving not only its storage stability but also the formation of a resin with stable properties, imparting stable resist properties, and reducing residue defects after development in the lithography process. The method of using the compound represented by formula (1E) in a composition containing compound (A) in an amount ranging from 1 mass ppm to 10 mass % relative to compound (A) is not particularly limited, but includes methods of adding compound (1E) to compound (A) and methods of generating compound (1E) as a by-product during the production of compound (A). (In formula (1E), X is independently F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group, and the aforementioned L 1 The ether group, ester group, thioether group, amine group, thioester group, acetal group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group of Y may also have a substituent. Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or a phosphate group. The alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, and phosphate group of Y may also have a substituent. R a 、R b , and R c are each independently H, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; 1 , Y, R a 、R b 、R c , A and Z do not contain 1, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. ) If the compound represented by formula (1E) is contained in an amount greater than 10% by mass relative to compound (A), the sensitivity improvement effect when a polymer containing compound (A) is formed and used for lithography purposes may be reduced. On the other hand, when the amount is less than 1 ppm, the effect of improving the stability over time may not be fully demonstrated. In order to further improve the effect of stability over time, m' of the compound represented by formula (1E) is preferably 0. Examples of the compound (1E) described in this embodiment include compounds having the structures shown below. [Method for producing compound (A)] The compound represented by formula (1) can be produced by various publicly known synthesis methods. As an example of a synthesis method, although not particularly limited, it can be synthesized by introducing a halogen group such as I, F, Cl, or Br into an aromatic aldehyde derivative containing a hydroxyl group, and then converting the aldehyde group to a vinyl group. As other examples of synthesis methods, a method of reacting iodine chloride in an organic solvent by iodination of a hydroxybenzaldehyde derivative (e.g., JP-A-2012-180326) or a method of dropping iodine into an aqueous phenolic base solution under alkaline conditions in the presence of β-cyclodextrin (JP-A-63-101342 and JP-A-2003-64012) can be appropriately selected. In this embodiment, particularly when the purpose is to introduce multiple iodine groups, an iodination reaction using iodine chloride in an organic solvent is preferably used. Compound (A) of this embodiment can be synthesized by converting the aldehyde site of the synthesized iodinated hydroxybenzaldehyde derivative to a vinyl group. Suitable methods for converting the aldehyde site to a vinyl group include the Wittig reaction (e.g., Synthetic Communications; Vol. 22; nb. 4; 1992, p. 513, Synthesis; Vol. 49; nb. 23; 2017, p. 5217) and methods involving the reaction of malonic acid with a base (e.g., Tetrahedron; Vol. 46; nb. 40; 2005, p. 6893, Tetrahedron; Vol. 63; nb. 4; 2007, p. 900, and US2004 / 118673). As a method for synthesizing the compound (A) of this embodiment, for example, the method described in the aforementioned reference materials can be suitably used, but the present invention is not limited thereto. The following is a method for producing a compound represented by formula (0). The compound represented by formula (0) includes both compounds that do not contain halogen and compounds that contain halogen. For example, for a compound represented by formula (0) that does not contain halogen and has an amino group or the like as a substitution for the halogen, a halogen can be introduced into the compound represented by formula (1) by a Sandmeier reaction or the like. The method for producing a compound represented by formula (0) described in this embodiment preferably includes a step of introducing an unsaturated double bond into the substituent Q of the compound represented by formula (S1) below (hereinafter also referred to as the "double bond introduction step"). In addition, the production method may also include a step of reacting a halogenating agent into the compound represented by formula (S1) below to introduce a halogen atom (hereinafter also referred to as the "halogen introduction step"). In addition, in the production method, the order of the halogen introduction step and the double bond introduction step is not particularly limited, and either step may be performed first. By using this method to produce the compound represented by formula (0), it is possible to produce the compound with relatively high yield and stability, and efficiently even at unsaturated double bond sites (and, in the case of halogen, halogen groups) which have low stability and require care during handling. Furthermore, when a halogen introduction step is included, even if the halogen group is an atom with a large atomic radius such as iodine, the desired compound can still be produced with relatively high yield and stability. (In formula (0), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y are each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amino group, ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group of Y may also have a substituent; R a 、R b , and R c are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. (In formula (S1), X 0 is an organic group with 1 to 30 carbon atoms, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amine group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, and a phosphate group in Y may also have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, an aldehyde group, a carboxyl group, or a ketone group, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. Furthermore, Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, an aldehyde group, a carboxyl group, or a ketone group. In the case of an aldehyde group or a carboxyl group, the carbon number refers to the total carbon number including the carbon atoms of these functional groups. From the perspective of preventing side reactions, Q is preferably an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, preferably a hydroxymethyl group. As the step of introducing a halogen atom (halogen introduction step), the aforementioned methods for introducing a halogen group can be cited. Furthermore, the halogenating agent is not particularly limited, but examples thereof include iodinating agents such as iodine chloride, iodine, and N-iodosuccinimide, fluorinating agents such as potassium fluoride and tetramethylammonium fluoride, chlorinating agents such as sulfinyl chloride and dichloromethyl methyl ether, and bromine molecules, carbon tetrabromide, and N-bromosuccinimide. Among these, iodinating agents are preferred, and iodine chloride agents are even more preferred. The ratio of the halogenating agent to the compound represented by formula (S1) in the step of introducing halogen atoms is preferably 1.2 molar times or more, more preferably 1.5 molar times or more, and even more preferably 2.0 molar times or more. The reaction temperature in the step of introducing halogen atoms is not particularly limited, but is preferably 40 to 80° C. The reaction time is not particularly limited, but is preferably 1 to 3 hours. When Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, the production method described in this embodiment may also include, after the halogen atom introduction step, a step of oxidizing the alcohol to introduce an aldehyde group. The oxidizing agent used for the oxidation is not particularly limited as long as it can introduce an aldehyde; examples include manganese dioxide and chromium trioxide. The reaction temperature in the aldehyde group introduction step is not particularly limited, but is preferably 10 to 40°C. The reaction time is not particularly limited, but is preferably 1 to 6 hours. The step of introducing an unsaturated double bond into the substituent Q (double bond introduction step) is the same as described above, and the unsaturated double bond can be introduced by a Wittig reaction, a method of reacting malonic acid in the presence of a base, or the like. The solvent used in the reaction can be any commonly available solvent. For example, alcohols, ethers, hydrocarbons, and halogen-based solvents can be suitably used, as long as they do not hinder the reaction. Multiple solvents can also be mixed and used, as long as they do not hinder the reaction. Since water can interfere with the reaction, a dehydrated solvent is preferably used. The reaction temperature and reaction time depend on the substrate concentration and the catalyst used. However, generally, the reaction temperature can be -20°C to 100°C, the reaction time can be 1 to 10 hours, and the pressure can be normal pressure, reduced pressure, or increased pressure. Furthermore, the reaction can be carried out by a batch, semi-batch, or continuous method, as appropriate. In addition, a polymerization inhibitor may be added to a series of reactions. Generally, commercially available products can be used. Examples include 2,2,6,6-tetramethyl-4-hydroxypiperidin-1-oxyl free radical, N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, N-nitroso-N-(1-naphthyl)hydroxylamine ammonium salt, N-nitrosodiphenylamine, N-nitroso-N-methylaniline, nitrosonaphthol, p-nitrosophenol, N,N'-dimethyl-p-nitrosoaniline and other nitroso compounds, phenothiazine, methylene blue, 2-mercaptobenzimidazole and other sulfur-containing compounds, N,N'-diphenyl-p-phenylenediamine, N-phenylenediamine, etc. Amines such as hydroxy-N'-isopropyl-p-phenylenediamine, 4-hydroxydiphenylamine, and hydroxyaniline, quinones such as hydroxyquinoline, hydroquinone, methylhydroquinone, p-benzoquinone, and hydroquinone monomethyl ether, phenols such as p-methoxyphenol, 2,4-dimethyl-6-t-butylphenol, catechol, 3-s-butylcatechol, and 2,2-methylenebis-(6-t-butyl-4-methylphenol), imides such as N-hydroxyphthalimide, oximes such as cyclohexane oxime and p-benzoquinone dioxime, and dialkylthiodipropionate are added in an amount of, for example, 0.001 to 10 parts by mass, preferably 0.01 to 1 part by mass, relative to 100 parts by mass of the (meth)acrylic compound represented by general formula (b). The compound represented by formula (0) obtained by the reaction can be isolated and purified as the desired high-purity monomer by a publicly known purification method such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, etc., or by a combination of these methods. [Method for producing compound of formula (0)] As a preferred method for producing compound of formula (0), the compound represented by formula (S1) can be selected as a compound represented by formula (SA1) below, and the method comprises the following steps A1 and A2. A1) A step of obtaining a compound represented by formula (SA2) below using the compound represented by formula (SA1) above and a compound represented by formula (RM1) below or malononitrile. A2) A step of using formula (SA2) and a fluoride source to obtain a compound represented by formula (0) below. (In formulas (SA1), (RM1) and (SA2), X 0 、L 1 , Y, A, Z, p, m', n, r are the same as those in formula (S1) and (0), Q 1 is an aldehyde or a ketone, LG is a group selected from a hydroxyl group, an alkoxy group, a carbonate group, an acetal group, and a carboxyl group, wherein the alkoxy group, the carbonate group, the acetal group, and the carboxyl group are aliphatic groups or aromatic groups that may have a substituent having 1 to 60 carbon atoms, and R 3 is a hydrogen group, or a carboxyl group or an ester group which may have a substituent having 1 to 60 carbon atoms, R 4 is a hydrogen group, R 5 、R 6 are each independently H, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, and XA is a group selected from hydrogen and halogen. 3 It can also form a ring structure by bonding with LG.) As described above, step A1 is a step for obtaining a compound represented by formula (SA2) using a compound represented by formula (SA1) and a compound represented by formula (RM1) or malononitrile. Specific examples of the compound represented by formula (RM1) include maleic acid, dimethyl maleate, diethyl maleate, dipropyl maleate, isopropyl maleate, maleate derivatives such as maleic acid, anhydrous maleic acid, and acetate derivatives such as ethyl acetate, propyl acetate, butyl acetate, α-chloroethyl acetate, α-chloropropyl acetate, and α-chlorobutyl acetate. RM1 is preferably a derivative selected from malonic acid, a malonate derivative, an acetic acid derivative, and an acetate derivative. As step A1, a method commonly used for the Knefelnager reaction or the Doebner reaction can be used. For example, the conditions described in Journal of Molecular Catalysis B: Enzymatic, 82, 92-95; 2012, Tetrahedron Letters, 46(40), 6893-6896; 2005 can be used. Specifically, by reacting a compound represented by formula (RM1) or malononitrile with a base in a solvent, a compound represented by formula (SA2) can be obtained. In addition to the base, an acid can also be used in combination. As the base, various known compounds can be used. For example, nitrogen-containing cyclic compounds containing structures such as pyridine, piperidine, pyrrolidine, oxadiazole, triazole, and morpholine, and nitrogen-containing compounds such as tertiary amines such as tributylamine, trimethylamine, and trihydroxyethylamine can be preferably used. The acid that can be used in combination with the base is not particularly limited, but a weak acid such as acetic acid or propionic acid is preferably used in combination. The balance between acidity and alkalinity of the reaction system is not particularly limited. However, when the compound of this embodiment in which m is an integer of 1 or greater is the target compound, the reaction is preferably carried out under acidic conditions. In Step A1, when LG is an alkoxy group, carbonate group, acetal group, or carboxyl group, it is preferred to further perform a reaction to convert LG to a hydroxyl group by hydrolysis or the like to obtain a compound represented by Formula (SA3). The hydrolysis or other treatment is not particularly limited as long as it can convert the LG group to a hydroxyl group. However, as an example of reaction conditions, the deprotection reaction can be carried out using an acid such as hydrochloric acid, sulfuric acid, or p-toluenesulfonic acid as a catalyst and at a temperature such as reflux. Alternatively, the deprotection reaction can be carried out using an inorganic base such as sodium hydroxide or potassium hydroxide, or an organic base such as a tertiary amine, in a solvent such as toluene or xylene under reflux. (In formula (SA3), X 0 、L 1 , Y, A, Z, p, m', n, r are the same as those in formula (S1) and (0), R 5 、R 6 are each independently H, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent. In step A1, a reducing agent may be further used to obtain the compound represented by formula (SA2). Using a reducing agent to obtain the compound represented by formula (SA2) allows the use of RM1, which has a higher stability, which is advantageous in terms of conversion rate and purity. Various substances can be used as the reducing agent. As the reducing agent, various reducing agents that function under the reaction conditions of this embodiment can be used. Suitable reducing agents are not limited, but include metal hydrides and metal aluminum hydride compounds. Specifically, examples include borane dimethyl sulfide, diisobutylaluminum hydride, sodium borohydride, lithium borohydride, potassium borohydride, zinc borohydride, lithium tri-s-butylborohydride, potassium tri-s-butylborohydride, lithium triethylborohydride, lithium aluminum hydride, lithium tri-t-butoxyaluminum hydride, and sodium bis(methoxyethoxy)aluminum hydride. The amount of the reducing agent used can be appropriately determined depending on the substrate, reducing agent, and reaction conditions. While not particularly limited, it is generally preferably 1 to 500 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 10 to 200 parts by mass from the perspective of yield. In the compound represented by the above formula (S1), A is preferably benzene, toluene, or a heteroaromatic ring from the viewpoint of the stability of the X group in the resin, the effect of improving the lithographic performance per mass unit relative to the sensitivity improvement due to the X group, and the effect of solubility in the developer of the resin when mixed as a constituent unit of the copolymer in the lithographic resin or the effect of suppressing the crystallinity of part of the resin matrix. As the reaction solvent for the deprotection reaction, various solvents can be used. There are no particular limitations on the solvent as long as it is a solvent that dissolves the compound of the above formula (SA2). Suitable solvents include methanol, ethanol, propanol, butanol, alcoholic solvents, ketone solvents such as cyclohexanone, cyclopentanone, MEK, and MIBK, chain or cyclic ester solvents such as ethyl acetate, butyl acetate, ethyl propionate, isobutyl propionate, ethyl lactate, and γ-butyrolactone, ether solvents such as diethyl ether, ethylene glycol solvents such as diethylene glycol, PGMEA, and PGME, aromatic solvents such as toluene and benzene, amide solvents such as DMF, and water. As described above, step A2 is to use a fluoride source to remove the carboxyl group of the compound represented by (SA2), or to introduce R 5As the fluoride source, various fluoride-generating compounds can be used, and suitable examples include salts of quaternary amines such as tetrabutylamine fluoride, tetramethylamine fluoride, and tetrahydroxyethylamine fluoride with fluorides, salts of metal cations such as tetramethylaluminum with fluorides, salts of phosphonium such as tetraoctadecylphosphonium with fluorides, and alkali metal fluoride salts such as KF and NaF. Step A2 is to use a fluoride source at a low temperature below 100°C to perform a decarboxylation reaction on the compound described in formula (SA2) or formula (SA3) to obtain the compound described in formula (1). 1 Regarding the selection of the X group, for the structure of formula (SA2) which may be deteriorated or decomposed at high temperature, the compound represented by formula (1) can be obtained by a reaction temperature of 80°C or below, or 60°C or below, preferably 50°C or below. A polymerization inhibitor may also be added to the series of reactions in step A2. Generally, commercially available products can be used. Examples include 2,2,6,6-tetramethyl-4-hydroxypiperidin-1-oxyl free radical, N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, N-nitroso-N-(1-naphthyl)hydroxylamine ammonium salt, N-nitrosodiphenylamine, N-nitroso-N-methylaniline, nitrosonaphthol, p-nitrosophenol, N,N'-dimethyl-p-nitrosoaniline and other nitroso compounds, phenothiazine, methylene blue, sulfur-containing compounds such as 2-mercaptobenzimidazole, N,N'-diphenyl-p-phenylenediamine, N-phenylenediamine, and the like. Amines such as hydroxy-N'-isopropyl-p-phenylenediamine, 4-hydroxydiphenylamine, and hydroxyaniline, quinones such as hydroxyquinoline, hydroquinone, methylhydroquinone, p-benzoquinone, and hydroquinone monomethyl ether, phenols such as p-methoxyphenol, 2,4-dimethyl-6-t-butylphenol, catechol, 3-s-butylcatechol, and 2,2-methylenebis-(6-t-butyl-4-methylphenol), imides such as N-hydroxyphthalimide, oximes such as cyclohexane oxime and p-benzoquinone dioxime, and dialkylthiodipropionate are added in an amount of, for example, 0.001 to 10 parts by mass, preferably 0.01 to 1 part by mass, relative to 100 parts by mass of the (meth)acrylic compound represented by general formula (b). The method for producing a compound represented by the following formula (1) comprises the steps of forming a compound represented by the following formula (SB1) by obtaining at least one of the compounds represented by the following formula (SB2A) and the following formula (SB3A) through the step represented by the following step B1A and at least one of the steps represented by the following steps B2A and B3A, and the step of introducing an unsaturated double bond into the substituent Qb of the compound represented by the following formula (SB1). B1A) The step of preparing the following substrate SB1A comprising a core B having one or more amino groups and an aldehyde group or a ketone group. B2A) The step of obtaining a compound represented by the following formula (SB2A) in which iodine is introduced into the core B. B3A) The step of obtaining a compound represented by the following formula (SB3A) in which the amino group is substituted with a halogen group by a Sandmeier reaction. (In formula (1), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphine group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group, and the aforementioned L 1 The ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group of Y may also have a substituent. Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate group, a nitro group, an amino group, a carboxyl group, a mercapto group, an ether group, a thioether group, a phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, or phosphate group. The alkoxy group, ester group, carbonate group, amino group, ether group, thioether group, phosphino group, phosphonic acid group, urethane group, urea group, amide group, imide group, and phosphate group of Y may also have a substituent. R a 、R b , and R care each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent, A is an organic group having 1 to 30 carbon atoms, Z is each independently an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, or a carbonate group, and the alkoxy group, ester group, acetal group, carboxyalkoxy group, or carbonate group of the aforementioned Z may also have a substituent, p is an integer of 1 or greater, m is an integer of 1 or greater, n is an integer of 0 or greater, and r is an integer of 0 or greater. In formulas (SB1A), (SB2A), (SB3A), and (SB1), Zb represents a hydrogen group or an amino group which may have a substituent and includes a hydrocarbon group having 1 to 30 carbon atoms, rb represents an integer of 1 or greater, Qb, L 1b 、X b1 , B, pb, mb' are synonymous with Q, L, X, A, p, m in formula (1). B2 represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br. The step of introducing a double bond may also use an organophosphorus compound and a base in combination. Examples of organophosphorus compounds include phosphorus oxyacids, alkylated phosphorus oxyacids, and phosphates. Examples of phosphorus oxyacids include phosphoric acid and pyrophosphoric acid, examples of alkylated phosphorus oxyacids include dimethylphosphonic acid and triethyl phosphate, and examples of phosphates include diammonium hydrogen phosphate. However, the present invention is not limited to these examples. Furthermore, not only one organophosphorus compound may be used, but also two or more may be used in combination. Examples of the base include alkali metal hydrides such as potassium hydride and sodium hydride, alkali metal carbonates such as potassium carbonate and cesium carbonate, quaternary ammonium salts (tetramethylammonium hydroxide), alkoxides (sodium ethoxide, potassium t-butoxide (t-BuOK)), metal amides (lithium diisopropylamide (LDA), potassium hexamethyldisilazane (KHMDS), lithium 2,2,6,6-tetramethylpiperidinium (LiTMP), metal alkyls (alkyl lithium, alkyl aluminum), pyridines (pyridine, DMAP), and organic bases such as non-pyridine heterocyclic amines (DBU, DBN, imidazole). As another preferred method for obtaining the compound represented by the above formula (SA1), a method comprising the following steps may be selected: step (B1A) of preparing a starting compound (SB1A), wherein the starting compound (SB1A) has an aromatic core B as A, and has at least one amino group on the core B, and has at least one group selected from an aldehyde group, a ketone group, and a carboxyl group as an alcohol group or a carbonyl group; step (B2A) of obtaining a compound of formula (SB2A) by introducing iodine into the core B; and step (B3A) of further obtaining a compound of formula (SB3A) by replacing the amino group with a halogen group by a Sandmeier reaction, which step comprises step (B1A) and at least one of step (B2A) or step (B3A). In formulas (SB1A), (SB2A), (SB3A), and (SA1A), Zb represents a hydrogen group or an amino group which may have a substituent and which includes a hydrocarbon group which may have a substituent having 1 to 30 carbon atoms, rb represents an integer greater than 1, Qb, L 1b 、X b1 , B, pb, mb' are synonymous with Q, L, X, A, p, m in formula (1). B2 represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br. That is, in the method for producing the compound represented by the above formula (SA1), the compound represented by the above formula (SA1) is preferably at least one of the compounds represented by formula (SB2A) and formula (SB3A) obtained by the step represented by B1A, and at least one of the steps represented by B2A and B3A. B1A) A step of preparing a substrate SB1A comprising a core B having one or more amino groups and an alcohol group, an aldehyde group, or a ketone group. B2A) A step of obtaining the compound represented by formula (SB2A) in which iodine is introduced into the core B. B3A) A step of obtaining the compound represented by formula (SB3A) in which the amino group is substituted with a halogen group by a Sandmeier reaction. In this production method, the double bond introduction step (step B1A) and the halogen introduction step (step B2A or B3A) are sequentially performed. In the method described in step (B2A), the iodination introduction reaction of the compound represented by formula (SB1A) (formulated SB1A) can be carried out by reacting at least an iodinating agent with the compound represented by formula (SB1A). For example, the target compound can be obtained by using publicly known iodine introduction reaction conditions using methods described in non-patent literature such as Adv. Synth. Catal. 2007, 349, 1159-1172, Organic Letters; Vol. 6; (2004); p.2785-2788, US Pat. No. 5300506, US Pat. No. 5434154, US Pat. No. 2009 / 281114, EP Pat. No. 1439164, and WO Pat. No. 2006 / 101318. Examples of usable iodinating agents include iodine compounds, iodine monochloride, N-iodosuccinimide, benzyltrimethylammonium iodide, tetraethylammonium iodide, tetra-n-butylammonium iodide, lithium iodide, sodium iodide, potassium iodide, 1-chloro-2-iodoethane, silver iodofluoride, tert-butyl hypoiodide, 1,3-diiodo-5,5-dimethylhydantoin, iodine-morpholine complex, trifluoroacetyl hypoiodide, iodine-iodic acid, iodine-periodic acid, iodine-hydrogen peroxide, 1-iodoheptafluoropropane, triphenylphosphate-methyl iodide, iodine-thallium(I) acetate, 1-chloro-2-iodoethane, and iodine-copper(II) acetate, but are not limited thereto. In the iodination reaction, one or more additives may be added for the purpose of promoting the reaction or suppressing the formation of by-products. Examples of the additives include acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, p-toluenesulfonic acid, ferric chloride, aluminum chloride, copper chloride, antimony pentachloride, silver sulfate, silver nitrate, and silver trifluoroacetate; bases such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, calcium carbonate, sodium bicarbonate, and potassium bicarbonate; oxidants such as ammonium cerium (IV) nitrate and sodium peroxodisulfate; inorganic compounds such as sodium chloride, potassium chloride, mercury (II) oxide, and cerium oxide; organic compounds such as acetic anhydride; and porous substances such as zeolites. In step (B2A), it is preferred to use at least an iodine source and an oxidizing agent to introduce iodine into the parent nucleus B. From the perspective of reaction efficiency and purity improvement, it is preferred to use an iodine source and an oxidizing agent. As an iodine source, for example, the iodizing agent mentioned above can be mentioned. As an oxidizing agent, for example, iodic acid, hydrogen peroxide, and specific additives (hydrochloric acid, sulfuric acid, nitric acid, p-toluenesulfonic acid, etc.) can be mentioned. From the perspective of solubility in developer solutions, the core B in the matrix SB1A preferably has an aromatic ring structure that may have a heteroatom. Furthermore, from the perspective of balancing solubility in developer solutions with the sensitivity-enhancing effect, the aromatic ring structure of the core B preferably comprises at least one of furan, thiophene, pyrrole, and indole. The reaction of step (B2A) can be carried out in a solvent-free manner. However, examples of usable reaction solvents include halogen-based solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; alkyl-based solvents such as hexane, cyclohexane, heptane, pentane, and octane; aromatic hydrocarbon-based solvents such as benzene and toluene; alcohol solvents such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, and 2-butanol; ether-based solvents such as diethyl ether, diisopropyl ether, and tetrahydrofuran; acetic acid, dimethylformamide, dimethylsulfoxide, and water. The reaction temperature of step (B2A) is not particularly limited and may be any temperature from the freezing point to the boiling point of the solvent used in the reaction, but is particularly preferably 0°C to 150°C. The iodine substitution reaction carried out on the compound represented by formula (SB1A) in step (B2A) can be carried out by reacting at least an iodinating agent with the compound represented by formula (SB1A). For example, the target compound can be obtained by using the Sandmeier reaction described in Chemistry - A European Journal, 24(55), 14622-14626; 2018, Synthesis (2007)(1), 81-84, etc. under publicly known iodine substitution reaction conditions. (Method for producing a compound represented by formula (1C)) As an example of a method for producing a compound represented by formula (1C), the aforementioned method for producing a compound represented by formula (1) is used. In the case where R is a hydrogen group, the compound represented by formula (1) obtained by the aforementioned method can be catalyzed by catalyzing the compound 2 represented by formula (1). The easiest method for catalyzing the compound 2 represented by formula (1) is to catalyze the compound 2 under high temperature or alkaline conditions using the active methylene site formed by the detachment of the R group as a starting point. The compound represented by the above formula (SA1) can also be produced by a production method comprising the steps shown below in B1B and at least one of the steps shown below in B2B and B3B. B1B) A step of preparing the following substrate SB1B comprising one or more amino groups and a core B having an aldehyde group or a ketone group; B2B) A step of obtaining a compound represented by formula (SB2B) in which iodine is introduced into the core B; B3B) A step of obtaining a compound represented by formula (SB3B) in which the amino group is substituted with a halogen group. In formulas (SB1B), (SB2B), (SB3B), and (SA1B), Zb represents a hydrogen group or an amino group which may have a substituent and which includes a hydrocarbon group which may have a substituent having 1 to 30 carbon atoms, rb represents an integer greater than 1, and Qb, L 1b 、X b1 , B, pb, mb' are the same as Q, L, X, A, p, m in formula (1). B2 represents I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br. The method for producing the compound represented by the above formula (SA1) may further include the step shown in B4a below. Including the step shown in B4a below is preferred due to the reaction purity of the compound formed. B4a) Wittig step The Wittig step is a step of forming an alkene by the Witting reaction. Although not limited to this step, it is a step of forming an alkene from a carbonyl site having an aldehyde or ketone using a phosphorus ylide. As the phosphorus ylide, triphenylalkylphosphine bromide such as triphenylmethylphosphine bromide that can form a stable phosphorus ylide can be used. As the phosphorus ylide, a phosphonium salt can be reacted with a base to form a phosphorus ylide in the reaction system, and then used in the above reaction. As the base system, those known to the public can be used, for example, an alkali metal salt of an alkoxide can be suitably used. In the step B2B, at least an iodine source and an oxidant may be used to introduce iodine into the core B. From the viewpoint of reaction efficiency and purity, it is preferred to use an iodine source and an oxidant. From the viewpoint of balancing the solubility in the developer and the sensitivity-enhancing effect, the mother nucleus B preferably has an aromatic ring structure which may have a heteroatom. The method for producing a compound represented by the following formula (1) comprises a halogen introduction step of introducing a halogen atom by reacting a halogenating agent with the compound represented by the following formula (S1), and a double bond introduction step of introducing an unsaturated double bond into the substituent Q. In the double bond introduction step, an organophosphorus compound and a base may also be used. (In formula (S1), X 0 is an organic group with 1 to 30 carbon atoms, L 1are each independently a single bond, an ether group, an ester group, a thioether group, an amine group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y is each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amine group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amine group, ether group, thioether group, phosphino group, phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, and a phosphate group in Y may also have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; Q is an organic group having 1 to 30 carbon atoms and containing a hydroxyl group, an aldehyde group, a carboxyl group, or a ketone group, p is an integer greater than 1, m' is an integer greater than 0, n is an integer greater than 0, and r is an integer greater than 0. (In formula (1), X is independently I, F, Cl, Br, or an organic group having 1 to 30 carbon atoms and having one or more but no more than five substituents selected from the group consisting of I, F, Cl, and Br, L 1 are each independently a single bond, an ether group, an ester group, a thioether group, an amino group, a thioester group, an acetal group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; Y are each independently a hydroxyl group, an alkoxy group, an ester group, an acetal group, a carbonate group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group; the alkoxy group, ester group, carbonate group, amino group, ether group, a thioether group, a phosphino group, a phosphonic acid group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group of Y may also have a substituent; R a 、R b , and R c are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms which may have a substituent; A is an organic group having 1 to 30 carbon atoms; Z is each independently an alkoxy group, an ester group, an acetal group, or a carbonate group; p is an integer greater than 1, m is an integer greater than 1, n is an integer greater than 0, and r is an integer greater than 0. The compound of this embodiment is preferably purified after obtaining a crude product through the above-described reaction to remove any remaining metal impurities. Specifically, from the perspective of preventing resin deterioration over time and ensuring storage stability, and further from the perspective of improving production yield due to process compatibility or defects in the semiconductor manufacturing process after resinification, it is preferable to avoid the presence of residual metal impurities originating from metal components used as reaction aids during the compound's production steps or from the reactor or other manufacturing equipment used in the production process. The residual amount of the aforementioned metal impurities is preferably less than 1 ppm, more preferably less than 100 ppb, even more preferably less than 50 ppb, even more preferably less than 10 ppb, and most preferably less than 1 ppb, relative to the resin. In particular, for metals classified as transition metals, such as Fe, Ni, Sb, W, and Al, residual amounts exceeding 1 ppm may interact with the compounds of this embodiment, potentially causing material degradation or deterioration over time. Furthermore, when the resulting compound is used to create a resin for semiconductor manufacturing, the residual metal content may not be sufficiently reduced, potentially leading to defects or performance degradation caused by residual metals from semiconductor manufacturing processes, leading to reduced yields. The purification method, while not particularly limited, includes the steps of dissolving the compound of this embodiment in a solvent to obtain a solution (S), and contacting the obtained solution (S) with an acidic aqueous solution to extract impurities from the compound of this embodiment (a first extraction step). The solvent used in the step of obtaining the solution (S) comprises an organic solvent that is not miscible with water. According to the aforementioned purification method, the content of various metals that may be contained as impurities in the resin can be reduced. More specifically, the compound of this embodiment is dissolved in an organic solvent that is not miscible with water to obtain a solution (S), and the solution (S) can be further contacted with an acidic aqueous solution for extraction. In this way, the metals contained in the solution (S) are transferred to the aqueous phase, and the organic phase and the aqueous phase are separated to obtain a resin with a reduced metal content. The solvent used in the purification method, which is not miscible with water, is not particularly limited, but preferably is an organic solvent that is safely applicable to semiconductor manufacturing processes. Specifically, it is an organic solvent whose solubility in water at room temperature is less than 30%, more preferably less than 20%, and particularly preferably less than 10%. The amount of the organic solvent used is preferably 1 to 100 times the mass of the total amount of the resin used. Specific examples of solvents that are not miscible with water include, but are not limited to, ethers such as diethyl ether and diisopropyl ether, esters such as ethyl acetate, n-butyl acetate, and isoamyl acetate, ketones such as methyl ethyl ketone, methyl isobutyl ketone, ethyl isobutyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, and 2-pentanone; glycol ether acetates such as ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), and propylene glycol monoethyl ether acetate; aliphatic hydrocarbons such as n-hexane and n-heptane; aromatic hydrocarbons such as toluene and xylene; and halogenated hydrocarbons such as methylene chloride and chloroform. Among these, toluene, 2-heptanone, cyclohexanone, cyclopentanone, methyl isobutyl ketone, propylene glycol monomethyl ether acetate, and ethyl acetate are preferred, methyl isobutyl ketone, ethyl acetate, cyclohexanone, and propylene glycol monomethyl ether acetate are more preferred, and methyl isobutyl ketone and ethyl acetate are even more preferred. Since the compounds in this embodiment have higher saturated solubility and lower boiling points than methyl isobutyl ketone and ethyl acetate, they can reduce the load in industrial solvent removal steps such as distillation or drying. These solvents can be used individually or in combination of two or more. The acidic aqueous solution used in the above-mentioned purification method can be appropriately selected from aqueous solutions of commonly known organic or inorganic compounds dissolved in water. Although not limited to the following, examples include aqueous solutions of inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid dissolved in water, or aqueous solutions of organic acids such as acetic acid, propionic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, tartaric acid, citric acid, methanesulfonic acid, phenolsulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid dissolved in water. These acidic aqueous solutions can be used individually or in combination of two or more. Among these acidic aqueous solutions, preferably, one or more inorganic acid aqueous solutions selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid and phosphoric acid, or one or more organic acid aqueous solutions selected from the group consisting of acetic acid, propionic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, tartaric acid, citric acid, methanesulfonic acid, phenolsulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid, more preferably, aqueous solutions of carboxylic acids such as sulfuric acid, nitric acid, and acetic acid, oxalic acid, tartaric acid, and citric acid, more preferably, aqueous solutions of sulfuric acid, oxalic acid, tartaric acid, and citric acid, and even more preferably, aqueous solutions of oxalic acid. Polyvalent carboxylic acids such as oxalic acid, tartaric acid, and citric acid coordinate to metal ions and, due to the chelating effect, are believed to have a tendency to more effectively remove metals. In addition, according to the purpose of the purification method in this embodiment, the water used here is preferably water with a low metal content, for example, preferably, ion exchange water is used. The pH of the acidic aqueous solution used in the purification method is not particularly limited, but considering the effect on the resin, it is preferred to adjust the acidity of the aqueous solution. The pH is generally in the range of 0 to 5, preferably 0 to 3. The amount of the acidic aqueous solution used in the purification method is not particularly limited, but it is preferably adjusted from the perspective of reducing the number of extractions for metal removal and considering the overall liquid volume to ensure operability. From these perspectives, the amount of the acidic aqueous solution used is preferably 10-200% by mass, more preferably 20-100% by mass, relative to 100% by mass of the solution (S). In the purification method, the metal components can be extracted from the resin in the solution (S) by bringing the acidic aqueous solution into contact with the solution (S). In the above-mentioned purification method, the above-mentioned solution (S) may further contain an organic solvent optionally mixed with water. In the case of containing an organic solvent optionally mixed with water, the addition amount of the above-mentioned resin can be increased. In addition, there is a tendency to improve the liquid separation and to perform purification with high kettle efficiency. The method of adding the organic solvent optionally mixed with water is not particularly limited. For example, any of the methods of adding to a solution containing an organic solvent in advance, adding to water or an acidic aqueous solution in advance, and adding after bringing the solution containing an organic solvent into contact with water or an acidic aqueous solution can be used. Among these, the method of adding to a solution containing an organic solvent in advance is preferred from the perspective of operability and ease of management of the addition amount. The organic solvent optionally mixed with water used in the purification method is not particularly limited, but preferably is an organic solvent that is safely applicable to semiconductor manufacturing processes. The amount of the organic solvent optionally mixed with water used is not particularly limited as long as the solution phase and the aqueous phase are separated. However, it is preferably 0.1 to 100 times by mass, more preferably 0.1 to 50 times by mass, and even more preferably 0.1 to 20 times by mass relative to the total amount of the resin used. Specific examples of organic solvents optionally mixed with water used in the purification method include, but are not limited to, ethers such as tetrahydrofuran and 1,3-dioxolane; alcohols such as methanol, ethanol, and isopropanol; ketones such as acetone and N-methylpyrrolidone; and aliphatic hydrocarbons such as glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether (PGME), and propylene glycol monoethyl ether. Among these, N-methylpyrrolidone and propylene glycol monomethyl ether are preferred, and N-methylpyrrolidone and propylene glycol monomethyl ether are even more preferred. These solvents may be used alone or in combination of two or more. The temperature during the extraction process is generally 20-90°C, preferably 30-80°C. The extraction process is performed, for example, by stirring to thoroughly mix the solution and then allowing it to stand. This transfers the metal components contained in the solution (S) to the aqueous phase. Furthermore, this process reduces the acidity of the solution, thereby suppressing deterioration of the resin. The mixed solution is separated into a solution phase containing the resin and solvent and an aqueous phase by standing. The solution phase is then recovered by decantation or the like. While the standing time is not particularly limited, it is preferably adjusted to achieve better separation of the solution phase containing the solvent and the aqueous phase. Typically, the standing time is at least 1 minute, preferably at least 10 minutes, and more preferably at least 30 minutes. The extraction process may be performed only once, but repeated mixing, standing, and separation steps may also be effective. The above-mentioned purification method preferably includes, after the first extraction step, a step of further contacting the solution phase containing the resin with water to extract impurities from the resin (a second extraction step). Specifically, for example, after the above-mentioned extraction treatment using an acidic aqueous solution, it is preferred that the solution phase containing the resin and solvent extracted and recovered by the aqueous solution is further subjected to an extraction treatment using water. The above-mentioned extraction treatment using water is not particularly limited, but for example, it can be performed by thoroughly mixing the solution phase with water by stirring, etc., and then allowing the resulting mixed solution to stand. Since the mixed solution after standing is separated into the solution phase containing the resin and solvent and the aqueous phase, the solution phase can be recovered by decantation, etc. In addition, for the purpose of this embodiment, the water used here is preferably water with a low metal content, for example, ion-exchanged water is preferred. The extraction treatment can be performed only once, but it is also effective to repeat the mixing, standing, and separation operations multiple times. Furthermore, the ratio of the two substances used in the extraction treatment, or the conditions such as temperature and time are not particularly limited, but may be the same as those in the above-mentioned contact treatment with the acidic aqueous solution. The water that may be mixed into the solution containing the resin and the solvent thus obtained can be easily removed by applying a vacuum distillation operation, etc. In addition, the concentration of the resin can be adjusted to any desired concentration by adding a solvent to the above solution as needed. The method for purifying the compound described in this embodiment can also be purified by passing the solution obtained by dissolving the aforementioned resin in a solvent through a filter. According to the method for purifying the substance described in this embodiment, the content of various metal components in the aforementioned resin can be significantly reduced. The amount of such metal components can be measured by the method described in the examples described later. In addition, the so-called "passing through" in this embodiment means that the aforementioned solution passes from the outside of the filter through the inside of the filter and then moves to the outside of the filter again. For example, it excludes the state in which the aforementioned solution is only in contact with the surface of the filter, or the state in which the aforementioned solution is in contact with the surface while moving to the outside of the ion exchange resin (that is, the state in which only contact is performed). [Filter refining step (liquid passing step)] In the filter passing step in the present embodiment, the filter used to remove the metal content in the aforementioned solution containing the resin and the solvent can be a filter that is generally sold on the market for liquid filtration. Although the filtration accuracy of the filter is not particularly limited, the nominal pore size of the filter is preferably less than 0.2 μm, more preferably less than 0.2 μm, further preferably less than 0.1 μm, further preferably less than 0.1 μm, and further preferably less than 0.05 μm. In addition, although the lower limit of the nominal pore size of the filter is not particularly limited, it is generally 0.005 μm. The so-called nominal pore size here is the pore size in name that indicates the separation performance of the filter, for example, the pore size determined by the test method determined by the filter manufacturer, such as the bubble point test, mercury intrusion test, standard particle supplement test, etc. When using a commercially available product, it is the value recorded in the manufacturer's catalog. By setting the nominal pore size to 0.2 μm or less, the metal content of the solution after passing through the filter once can be effectively reduced. In this embodiment, in order to further reduce the content of each metal component in the solution, the filter passing step can be performed two or more times. Filters can be hollow gauze filters, membrane filters, pleated membrane filters, and filters filled with filter materials such as non-woven fabric, cellulose, and diatomaceous earth. Among these, the filter is preferably one or more selected from the group consisting of hollow gauze filters, membrane filters, and pleated membrane filters. Hollow gauze filters are particularly preferred due to their high filtration accuracy and larger filtration area compared to other filter types. Examples of materials for the aforementioned filters include polyolefins such as polyethylene and polypropylene, polyethylene resins to which functional groups having ion exchange properties have been imparted by graft polymerization, polar group-containing resins such as polyamide, polyester, and polyacrylonitrile, and fluororesins such as fluorinated polyethylene (PTFE). Among these, the filter material is preferably one or more selected from the group consisting of polyamide, polyolefin resin, and fluororesin. Furthermore, polyamide is particularly preferred for its effectiveness in reducing heavy metals such as chromium. Furthermore, to prevent metal leaching from the filter material, filters made of materials other than sintered metal are preferred. Examples of polyamide filters (hereinafter referred to as trademarks) include, but are not limited to, the Polyfix nylon series manufactured by Kitz Micro Filter Co., Ltd., Ultipleat P-Nylon 66 and Ultipor N66 manufactured by Pall Corporation, and LifeASSURE PSN and LifeASSURE EF series manufactured by 3M Co., Ltd. Examples of polyolefin filters include, but are not limited to, Ultipleat PE Kleen and IonKleen manufactured by Pall Corporation, and Protego series, Microgard Plus HC10, and Optimizer D manufactured by Entegris Corporation. Examples of polyester filters include, but are not limited to, Geraflow DFE manufactured by Central Filter Industries, Ltd. and PLEATS PMC manufactured by Nihon Filter Co., Ltd. Examples of polyacrylonitrile filters, although not limited to the following, include ultrafilters AIP-0013D, ACP-0013D, and ACP-0053D manufactured by Advantech Toyo Co., Ltd. Examples of fluororesin filters, although not limited to the following, include Emflon HTPFR manufactured by Nippon Pall Co., Ltd. and LifeASSURE FA series manufactured by 3M Co., Ltd. These filters may be used individually or in combination of two or more. Furthermore, the filter may also contain an ion exchanger such as a cation exchange resin, or a cationic charge regulator that generates a zeta potential in the organic solvent solution being filtered. Examples of filters containing ion exchangers, although not limited to the following, include the Protego series manufactured by Entegris Co., Ltd. and the KURANGRAFT series manufactured by Kurafuki Textile Processing Co., Ltd. Furthermore, examples of filters containing a substance having a positive zeta potential, such as a polyamide polyamine epichlorohydrin cationic resin (hereinafter referred to as a trademark), although not limited to the following, include Zeta Plus 40QSH or Zeta Plus 020GN manufactured by 3M Co., Ltd., or the LifeASSURE EF series. [Application of Compound (A)] Compound (A) described in this embodiment can be added directly or as a polymer to a film-forming composition to enhance sensitivity to exposure light. Compound (A) or its polymer is preferably used in a photoresist. [Composition] The composition of this embodiment comprises compound (A). The content of compound (A) in this embodiment is preferably 90% by mass or more, more preferably 95% by mass or more, and even more preferably 99% by mass or more. As another preferred embodiment of the composition of this embodiment, it is preferred to contain at least a compound represented by formula (1) other than formula (1C) and a compound represented by formula (1C) as compound (A). The proportion of the monomer represented by formula (1C) relative to the monomer represented by formula (1) is preferably a small amount of 1 mass ppm or more and 10 mass % or less, more preferably 20 mass ppm or more and 2 mass % or less, and more preferably 50 mass ppm or more and 1 mass % or less. By keeping the content of the compound represented by formula (1C) within the stated range, the interactions between the resins during resinification can be reduced. By suppressing the crystallinity resulting from the interactions between the resins after film formation using the resin, the local solubility in the developer during development at the molecular scale of several nanometers to tens of nanometers is reduced. This also suppresses degradation of pattern quality, such as line edge roughness and residue defects, in patterns formed in a series of lithographic processes including exposure, post-exposure baking, and development, thereby further improving resolution. Regarding the effects of such lithographic performance, the compounds represented by formula (1) and the compounds represented by formula (1C) have a parent nucleus A introduced with a halogen element, especially iodine or fluorine. Compared with the compounds having a hydroxystyrene skeleton without the introduction of iodine, the hydrophilicity is shifted and the polarization in the polar part is increased. Therefore, the influence is greater in the compound represented by formula (1C). In the composition of this embodiment, the content of impurities including K (potassium), calculated as the element, is preferably 1 mass ppm or less, more preferably 0.5 mass ppm or less, even more preferably 0.1 mass ppm or less, and even more preferably 0.005 mass ppm or less relative to compound (A). In the composition of this embodiment, the concentration of one or more elemental impurities selected from the group consisting of Mn (manganese), Al (aluminum), Si (silicon), and Li (lithium) (preferably one or more elemental impurities selected from the group consisting of Mn and Al) is preferably 1 ppm or less, more preferably 0.5 ppm or less, and even more preferably 0.1 ppm or less, relative to compound (A), calculated as the element. The amounts of K, Mn, Al, etc. are measured by inorganic elemental analysis (IPC-AES / IPC-MS). An example of an inorganic elemental analysis device is the "AG8900" manufactured by Agilent Technologies Japan, Ltd. In the composition of this embodiment, the content of the phosphorus-containing compound relative to compound (A) is preferably 10 ppm or less, more preferably 8 ppm or less, and even more preferably 5 ppm or less. In the composition of this embodiment, the amount of maleic acid relative to compound (A) is preferably 10 ppm or less, more preferably 8 ppm or less, and even more preferably 5 ppm or less. The amounts of phosphorus-containing compounds and maleic acid are calculated by gas chromatography-mass spectrometry (GC-MS) based on the area fraction of the GC spectrum and the peak intensity ratio between the target peak and the reference peak. In the composition of this embodiment, the peroxide content relative to compound (A) is preferably 10 ppm by mass or less, more preferably 1 ppm or less, and even more preferably 0.1 ppm or less. The amount of peroxide is determined by the ammonium thioferrocyanate method (hereinafter referred to as the AFTA method), which involves adding trichloroacetic acid to a sample, followed by the addition of ammonium iron (II) sulfate and potassium thiocyanate. A calibration curve is generated using known peroxides as standard substances, and the absorbance at a wavelength of 480 μm is measured for quantification. In the composition of this embodiment, the water content is preferably 100,000 ppm or less, more preferably 20,000 ppm or less, even more preferably 1,000 ppm or less, even more preferably 500 ppm or less, and even more preferably 100 ppm or less relative to compound (A). The water content is measured by the Karl Fischer method (Karl Fischer water content analyzer). [Polymer (A)] The polymer (A) of this embodiment comprises structural units derived from the aforementioned compound (A). The inclusion of structural units derived from the compound (A) enhances the polymer (A)'s sensitivity to the exposure light source when incorporated into a resist composition. In particular, even when using extreme ultraviolet light as the exposure light source, the polymer (A) exhibits sufficient sensitivity and can successfully form fine line patterns with narrow line widths. Furthermore, conventional resist compositions may lose sensitivity to exposure light sources over time due to storage, which has been a challenge in their practical use in semiconductor manufacturing. However, the polymer (A) of this embodiment improves the stability of the resist composition and suppresses the loss of sensitivity to exposure light sources even during long-term storage. The polymer (A) of this embodiment includes a structural unit derived from the compound (A). The structural unit derived from the compound (A) is a structural unit represented by the following formula (4). In formula (4), X, L 1 , Y, R a 、R b 、R c , A, Z, p, m, n, and r are the same as those defined in formula (1). Polymer (A) can be obtained by polymerizing compound (A) of this embodiment, or by copolymerizing compound (A) with other monomers. Polymer (A) can be used, for example, as a material for forming a lithographic film. As the structural unit derived from the compound (A), a structural unit represented by the following formula (5) is preferred. In formula (5), X, L 1 , Y, A, p, m and n are the same as those defined in formula (1). As the structural unit derived from the compound (A), a structural unit represented by the following formula (6) is more preferred. In formula (6), X, L 1 , Y, R a1 、R b1 、R c1 , A, Z, p, m, n and r are the same as those defined in formula (1b). The amount of the constituent units derived from compound (A) relative to the total amount of the monomer components of the polymer (A) is preferably 5 mol% or more, more preferably 8 mol% or more, and even more preferably 10 mol% or more. Furthermore, the amount of the constituent units derived from compound (A) relative to the total amount of the monomer components of the polymer (A) is 100 mol% or less, preferably 80 mol% or less, more preferably 50 mol% or less, and even more preferably 30 mol% or less. In a preferred embodiment of the polymer of this embodiment, the polymer (A) preferably contains at least a compound represented by formula (1) other than formula (1C) and a compound represented by formula (1C) as a monomer represented by compound (A). The monomer represented by formula (1C) is preferably contained in a small amount of 10 ppm to 10% by mass relative to the monomer represented by formula (1), more preferably 20 ppm to 2% by mass, and even more preferably 50 ppm to 1% by mass. By setting the content of the compound represented by formula (1C) within the range described above, the interaction between the resins during resinification can be reduced. By suppressing the crystallinity caused by the interaction between the resins after film formation using the resin, the local solubility in the developer at the molecular level of several nanometers to tens of nanometers is reduced. This suppresses the degradation of pattern quality such as line edge roughness and residue defects in the pattern formed in the lithographic process of exposure, post-exposure baking, and development, thereby further improving resolution. Regarding these lithographic performance effects, the compounds represented by formula (1) and formula (1C) having a halogen element, especially an iodine or fluorine-introduced mother nucleus A, have a greater effect on the monomer represented by formula (1C) than the compounds having a hydroxystyrene skeleton without iodine or the like, because the hydrophilicity is shifted and the polarization in the polar site is increased. The other monomer copolymerized with compound (A) preferably comprises an aromatic compound as a polymerized unit, wherein the aromatic compound has an unsaturated double bond as a substituent and contains a polymerized unit having a functional group that improves solubility in an alkaline developer by the action of an acid or a base. Although not particularly limited, other monomers include, for example, those described in International Publication No. WO2016 / 125782, International Publication No. WO2015 / 115613, Japanese Patent Application Laid-Open No. 2015 / 117305, International Publication No. WO2014 / 175275, and Japanese Patent Application Laid-Open No. 2012 / 162498, or compounds represented by the following formula (C1) or formula (C2). Among these, compounds represented by the following formula (C1) or formula (C2) are preferred. From the perspective of the quality of the pattern shape after exposure and development in the lithography process, especially from the perspective of roughness and pattern collapse suppression, when the unexposed part during exposure is subjected to alkali development, the dissolution rate R of the resin forming the convex part of the pattern in the alkali developer is min , and the dissolution rate R of the resin in the alkaline developer that becomes the concave portion of the pattern when the exposed portion is subjected to alkali development during exposure max The difference is preferably greater than three digits. The presence or absence of a protecting group increases the difference in dissolution rate. Furthermore, a higher rate of removal of the protecting group during post-exposure baking (PEB) and development is preferred. From these viewpoints, the other monomers copolymerized with compound (A) in polymer (A) preferably have a structural unit represented by the following formula (C1). In formula (C1), R C11 is H or methyl, R C12 is H or an alkyl group with 1 to 4 carbon atoms, R C13 Department and R C13 The carbon atoms to which the bond is attached are collectively a cycloalkyl group or a heterocycloalkyl group having 4 to 20 carbon atoms. * represents a bonding site with an adjacent constituent unit. R C12 Preferably, it is H or an alkyl group with 1 to 3 carbon atoms, R C13 The better series and R C13 The carbon atoms to which they are bonded are collectively cycloalkyl or heterocycloalkyl with 4 to 10 carbon atoms. C13 The cycloalkyl group or heterocycloalkyl group may have a substituent (for example, an oxy group). The amount of the structural unit represented by formula (C1) relative to the total amount of the monomer components of the polymer (A) is preferably 5 mol% or more, more preferably 10 mol% or more, and even more preferably 20 mol% or more. Furthermore, the amount of the structural unit represented by formula (C1) relative to the total amount of the monomer components of the polymer (A) is preferably 90 mol% or less, more preferably 80 mol% or less, and even more preferably 70 mol% or less. In polymer (A), other monomers copolymerized with compound (A) are preferably the constituent units represented by the following formula (C2) from the perspective of the quality of the pattern shape after exposure and development in the lithography process, especially from the perspective of roughness and suppression of pattern collapse. In formula (C2), R C21 is H or methyl, R C22 and R C23 are each independently an alkyl group having 1 to 4 carbon atoms, C24 is an alkyl group having 1 to 4 carbon atoms or a cycloalkyl group having 5 to 20 carbon atoms, R C22 、R C23 , and R C24 Two or three of them may form an alicyclic structure with 3 to 20 carbon atoms together with the carbon atoms to which they are bonded. * represents the bonding site with the adjacent constitutional unit. R C22 Preferably, it is an alkyl group with 1 to 3 carbon atoms, R C24 is a cycloalkyl group having 5 to 10 carbon atoms. C22 、R C23 , and R C24 The alicyclic structure may include multiple rings such as adamantyl, etc. In addition, the alicyclic structure may have a substituent (eg, a hydroxyl group, an alkyl group). The amount of the structural unit represented by formula (C2) relative to the total amount of the monomer components of the polymer (A) is preferably 5 mol% or more, more preferably 10 mol% or more, and even more preferably 20 mol% or more. Furthermore, the amount of the structural unit represented by formula (C2) relative to the total amount of the monomer components of the polymer (A) is preferably 80 mol% or less, more preferably 60 mol% or less, and even more preferably 40 mol% or less. Examples of the monomer raw material for the structural unit represented by formula (C2) include, but are not limited to, 2-methyl-2-(meth)acryloyloxyadamantane, 2-ethyl-2-(meth)acryloyloxyadamantane, 2-isopropyl-2-(meth)acryloyloxyadamantane, 2-n-propyl-2-(meth)acryloyloxyadamantane, 2-n-butyl-2-(meth)acryloyloxyadamantane, 1-methyl-1-(meth)acryloyloxycyclopentane, 1-ethyl-1-(meth)acryloyloxy Cyclopentane, 1-methyl-1-(methyl)acryloyloxycyclohexane, 1-ethyl-1-(methyl)acryloyloxycyclohexane, 1-methyl-1-(methyl)acryloyloxycycloheptane, 1-ethyl-1-(methyl)acryloyloxycycloheptane, 1-methyl-1-(methyl)acryloyloxycyclooctane, 1-ethyl-1-(methyl)acryloyloxycyclooctane, 2-ethyl-2-(methyl)acryloyloxydecahydro-1,4:5,8-dimethylnaphthalene, and 2-ethyl-2-(methyl)acryloyloxynorbornane. Commercially available products can be used as these monomers. In the polymer (A), the other monomer copolymerized with the compound (A) preferably has a structural unit represented by the following formula (C3). In formula (C3), R C31 is H or methyl, and m, A, and * are as defined in the above formula (4). In the polymer (A), the other monomer copolymerized with the compound (A) preferably has a structural unit represented by the following formula (C4). In formula (C4), B represents an organic group having 5 to 30 carbon atoms and containing an aromatic ring, and R C31 , m, and * are as defined in the above formula (C3). In the polymer (A), the other monomer to be copolymerized with the compound (A) preferably has a structural unit represented by the following formula (C5). In formula (C5), B' represents an organic group having 5 to 30 carbon atoms and containing an aromatic ring, and R C31 , m, and * are as defined in the above formula (C3). In the polymer (A), the other monomers copolymerized with the compound (A) are preferably the structural units represented by the following formula (C6) from the perspective of exposure sensitivity in the lithography process, exposure in the pattern formation after development, the quality of the pattern shape, and especially from the perspective of roughness and suppression of pattern collapse. In formula (C6), X C61 is a hydroxyl group or a halogen group, R C61Each of them is independently an alkyl group having 1 to 20 carbon atoms, and * is a bonding site with an adjacent constitutional unit. X C61 Preferably, it is F, Cl, Br, or I, more preferably, it is Cl or I, and even more preferably, it is I. C61 Preferred is an alkyl group having 1 to 4 carbon atoms, and more preferred is a methyl group. The amount of the structural unit represented by formula (C6) relative to the total amount of the monomer components of the polymer (A) is preferably 20 mol% or more, more preferably 30 mol% or more, and even more preferably 40 mol% or more. Furthermore, the amount of the structural unit represented by formula (C6) relative to the total amount of the monomer components of the polymer (A) is preferably 80 mol% or less, more preferably 70 mol% or less, and even more preferably 60 mol% or less. The monomer raw materials for the structural unit represented by formula (C6) are not limited, but examples thereof include methyl 2-chloroacrylate, ethyl 2-chloroacrylate, butyl 2-chloroacrylate, methyl 2-bromoacrylate, ethyl 2-bromoacrylate, butyl 2-bromoacrylate, methyl 2-iodoacrylate, ethyl 2-iodoacrylate, and butyl 2-iodoacrylate. Commercially available monomers can be used. Next, the method for producing polymer (A) is described. The polymerization reaction is carried out by dissolving the monomers that will become the constituent units in a solvent and adding a polymerization initiator while heating or cooling. The reaction conditions can be arbitrarily set according to the type of polymerization initiator, the initiation method such as heat or light, the temperature, pressure, concentration, solvent, additives, etc. Examples of the polymerization initiator include free radical polymerization initiators such as azobisisobutyronitrile and peroxides, and anionic polymerization initiators such as alkyl lithium and Grignard reagents. Generally, commercially available solvents can be used as the solvent used in the polymerization reaction. For example, various solvents such as alcohols, ethers, hydrocarbons, and halogen-based solvents can be used as appropriate, as long as they do not hinder the reaction. Multiple solvents may also be mixed and used, as long as they do not hinder the reaction. The polymer (A) obtained by the polymerization reaction can be purified by publicly known methods. Specifically, it can be purified by combining ultrafiltration, crystallization, microfiltration, acid washing, washing with water having a conductivity of 10 mS / m or less, and extraction. [Film-forming composition] The film-forming composition of this embodiment comprises a compound (A) or a polymer (A), and is a composition particularly suitable for use in lithography. Although not particularly limited, the composition can be used for lithography film formation, for example, for resist film formation (i.e., "resist composition"). In addition, the composition can be used for upper film formation (i.e., "upper film formation composition"), intermediate layer formation (i.e., "intermediate layer formation composition"), lower film formation (i.e., "lower film formation composition"), etc. The composition of this embodiment can form a film with high sensitivity and can also impart a good resist pattern shape. The film-forming composition of this embodiment can also be used as a composition for forming optical parts using lithography technology. In addition to being used in the form of films or sheets, optical parts can be used as plastic lenses (prism lenses, biconvex lenses, microlenses, Fresnel lenses, viewing angle control lenses, contrast enhancement lenses, etc.), phase difference films, films for electromagnetic wave shielding, prisms, optical fibers, solder resists for flexible printed wiring, plating resists, interlayer insulating films for multilayer printed wiring boards, photosensitive optical waveguides, liquid crystal displays, organic electroluminescent (EL) displays, optical semiconductor (LED) elements, solid-state imaging elements, organic thin-film solar cells, dye-sensitized solar cells, and organic thin-film transistors (TFTs). The aforementioned composition can be suitably used as an embedding film and a flattening film on a photodiode, which is a component of a solid-state imaging element that particularly requires a high refractive index, a flattening film before and after a color filter, a microlens, and a flattening film and conformal film on a microlens. The film-forming composition of this embodiment comprises a compound (A) or a polymer (A), and may also comprise other components such as a base material (B), a solvent (S), an acid generator (C), and an acid diffusion controller (E) as needed. Each component is described below. [Substrate (B)] In this embodiment, the term "substrate (B)" refers to a compound (including a resin) other than compound (A) or polymer (A), and is suitable as a substrate for a resist for g-line, i-line, KrF excimer laser (248 nm), ArF excimer laser (193 nm), extreme ultraviolet (EUV) lithography (13.5 nm), or electron beam (EB) (for example, a lithography substrate or a resist substrate). Such substrates are not particularly limited and can be used as the substrate (B) in this embodiment. Examples of the substrate (B) include phenol novolac resins, cresol novolac resins, hydroxystyrene resins, (meth)acrylic resins, hydroxystyrene-(meth)acrylic copolymers, cycloolefin-maleic anhydride copolymers, cycloolefins, vinyl ether-maleic anhydride copolymers, and inorganic resist materials containing metal elements such as titanium, tin, hafnium, or zirconium, as well as derivatives thereof. Among them, from the perspective of the shape of the obtained resist pattern, preferred are phenol novolac resin, cresol novolac resin, hydroxystyrene resin, (meth)acrylic resin, hydroxystyrene-(meth)acrylic copolymer, and inorganic resist materials having metal elements such as titanium, tin, hafnium or zirconium, as well as their derivatives. The derivatives are not particularly limited, but include, for example, those having dissociative groups or crosslinking groups introduced therein. The derivatives having dissociative groups or crosslinking groups introduced therein can undergo dissociation or crosslinking reactions by the action of light or acid. The term "dissociative group" refers to a functional group that produces an alkali-soluble group, such as a group that changes solubility after cleavage. Examples of alkali-soluble groups are not particularly limited, but include phenolic hydroxyl groups, carboxyl groups, sulfonic acid groups, and hexafluoroisopropanol groups. Phenolic hydroxyl groups and carboxyl groups are preferred, with phenolic hydroxyl groups being particularly preferred. The term "crosslinkable group" refers to a group that undergoes crosslinking in the presence or absence of a catalyst. Examples of crosslinkable groups include, but are not limited to, alkoxy groups having 1 to 20 carbon atoms, groups containing an allyl group, groups containing a (meth)acryl group, groups containing an epoxy(meth)acryl group, groups containing a hydroxyl group, groups containing a urethane(meth)acryl group, groups containing a glycidyl group, and groups containing a vinylphenylmethyl group. [Solvent (S)] As the solvent in this embodiment, any publicly known solvent can be appropriately used as long as it can dissolve at least the compound (A) or the polymer (A). The solvent is not particularly limited, but examples thereof include ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-propyl ether acetate, and ethylene glycol mono-n-butyl ether acetate; ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; propylene glycol monoalkyl ether acetates such as propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, propylene glycol mono-n-propyl ether acetate, and propylene glycol mono-n-butyl ether acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether (PGME) and propylene glycol monoethyl ether; lactic acid esters such as methyl lactate, ethyl lactate, n-propyl lactate, n-butyl lactate, and n-amyl lactate; methyl acetate, ethyl acetate, n-propyl acetate, n-butyl acetate, and n- Aliphatic carboxylic acid esters such as amyl acetate, n-hexyl acetate, methyl propionate, ethyl propionate, etc.; methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, butyl 3-methoxy-3-methylpropionate, butyl 3-methoxy-3-methylbutyrate Other esters such as methyl acetylacetate, methyl pyruvate, and ethyl pyruvate; aromatic hydrocarbons such as toluene and xylene; ketones such as acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, cyclopentanone (CPN), and cyclohexanone (CHN); amides such as N,N-dimethylformamide, N-methylacetamide, N,N-dimethylacetamide, and N-methylpyrrolidone; and lactones such as γ-lactone. The solvent used in this embodiment is preferably a safe solvent, more preferably at least one selected from PGMEA, PGME, CHN, CPN, 2-heptanone, anisole, butyl acetate, and ethyl lactate, and even more preferably at least one selected from PGMEA, PGME, CHN, CPN, and ethyl lactate. The solid content concentration in the film-forming composition of this embodiment is not particularly limited, but is preferably 1 to 80 mass %, more preferably 1 to 50 mass %, further preferably 2 to 40 mass %, and further preferably 2 to 10 mass % relative to the total mass of the film-forming composition. [Acid Generator (C)] The film-forming composition of this embodiment preferably contains one or more acid generators (C) that directly or indirectly generate an acid upon exposure to radiation. The radiation is at least one selected from the group consisting of visible light, ultraviolet light, excimer lasers, electron beams, extreme ultraviolet light (EUV), X-rays, and ion beams. The acid generator (C) is not particularly limited; for example, those described in International Publication No. WO2013 / 024778 can be used. The acid generators (C) may be used alone or in combination of two or more. The amount of the acid generator (C) added is preferably 0.001 to 49% by mass, more preferably 1 to 40% by mass, even more preferably 3 to 30% by mass, and even more preferably 10 to 25% by mass relative to the total mass of the solid component. Using the acid generator (C) within the aforementioned range tends to result in high sensitivity and a pattern profile with low edge roughness. In this embodiment, if the acid is generated within the system, the method for generating the acid is not particularly limited. Using an excimer laser instead of ultraviolet rays such as g-rays and i-rays allows for even finer processing. Using electron beams, extreme ultraviolet rays, X-rays, or ion beams as high-energy rays allows for even finer processing. [Acid diffusion controller (E)] The film-forming composition of this embodiment may also contain an acid diffusion controller (E). The acid diffusion controller (E) controls the diffusion of the acid generated by the acid generator by radiation irradiation in the resist film and prevents adverse chemical reactions generated in the unexposed area. By using the acid diffusion controller (E), there is a tendency to improve the storage stability of the composition of this embodiment. In addition, by using the acid diffusion controller (E), while improving the resolution of the film formed using the composition of this embodiment, it is also possible to suppress the line width change of the resist pattern caused by the change of the shelf time before radiation irradiation and the shelf time after radiation irradiation, and there is a tendency to become one with excellent process stability. As the acid diffusion controller (E), although it is not particularly limited, radiation-decomposable alkaline compounds such as alkaline compounds containing nitrogen atoms, alkaline coronium compounds, and alkaline iodonium compounds can be cited. The acid diffusion controller (E) is not particularly limited, but for example, those described in International Publication No. WO2013 / 024778 can be used. The acid diffusion controller (E) can be used alone or in combination of two or more. The amount of the acid diffusion controller (E) blended is preferably 0.001 to 49% by mass, more preferably 0.01 to 10% by mass, even more preferably 0.01 to 5% by mass, and even more preferably 0.01 to 3% by mass, relative to the total mass of the solid content. When the amount of the acid diffusion controller (E) blended is within the aforementioned range, it tends to prevent degradation of resolution, pattern shape, dimensional fidelity, and the like. Furthermore, even if the standby time from electron beam irradiation to post-irradiation heating is prolonged, degradation of the shape of the upper layer of the pattern can be suppressed. Furthermore, when the amount of the acid diffusion controller (E) blended is 10% by mass or less, it tends to prevent degradation of sensitivity, developability of unexposed areas, and the like. Furthermore, by using such an acid diffusion controller, the storage stability of the resist composition and the resolution are improved, while also suppressing the line width variation of the resist pattern caused by variations in the storage time before and after radiation irradiation, thereby tending to result in excellent process stability. [Other components (F)] The film-forming composition of this embodiment may contain one or more crosslinking agents, dissolution promoters, dissolution control agents, sensitizers, surfactants, organic carboxylic acids, phosphorus oxyacids, or derivatives thereof as other components (F), as needed. (Crosslinking Agent) The film-forming composition of this embodiment may also contain a crosslinking agent. The crosslinking agent is capable of crosslinking at least one of the compound (A), the polymer (A), and the substrate (B). The crosslinking agent is preferably an acid crosslinking agent that can crosslink the substrate (B) intramolecularly or intermolecularly in the presence of an acid generated by the acid generator (C). Examples of such acid crosslinking agents include compounds having one or more groups capable of crosslinking the substrate (B) (hereinafter referred to as "crosslinking groups"). Examples of the crosslinking group include (i) hydroxyl groups, hydroxyalkyl groups (alkyl groups having 1 to 6 carbon atoms), alkoxy groups (alkyl groups having 1 to 6 carbon atoms), acetyloxy groups (alkyl groups having 1 to 6 carbon atoms), and groups derived therefrom; (ii) carbonyl groups, such as formyl groups and carboxyl groups (alkyl groups having 1 to 6 carbon atoms), and groups derived therefrom; (iii) dimethylaminomethyl groups, diethylaminomethyl groups, dihydroxymethylaminomethyl groups, dihydroxyethyl groups, and the like. (iv) groups containing a nitrogen group such as aminomethyl and morpholinylmethyl; (v) groups containing a glycidyl group such as glycidyl ether, glycidyl ester, and glycidylamino; (v) groups derived from aromatic groups such as allyloxy (alkyl groups with 1 to 6 carbon atoms) such as benzyloxymethyl and phenoxymethyl, and aralkyloxy (alkyl groups with 1 to 6 carbon atoms); (vi) groups containing polymerizable multiple bonds such as vinyl and isopropenyl. The crosslinking group of the crosslinking agent in this embodiment is preferably a hydroxyalkyl group or an alkoxyalkyl group, with an alkoxymethyl group being particularly preferred. The crosslinking agent having a crosslinkable group is not particularly limited, but for example, the acid crosslinking agents described in International Publication No. WO2013 / 024778 can be used. The crosslinking agents may be used alone or in combination of two or more. In the present embodiment, the amount of the crosslinking agent blended is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, and further preferably 20% by mass or less, based on the total mass of the solid content. (Dissolution Accelerator) A dissolution accelerator is a component that improves the solubility of a solid component in a developer solution when the solid component has low solubility, and also has the effect of appropriately increasing the dissolution rate of the aforementioned compound during development. Low molecular weight dissolution accelerators are preferred, and examples include low molecular weight phenolic compounds. Examples of low molecular weight phenolic compounds include bisphenols and tris(hydroxyphenyl)methane. These dissolution accelerators can be used alone or in combination of two or more. The amount of the dissolution promoter added is appropriately adjusted depending on the type of solid component used, but is preferably 0-49 mass % of the total mass of the solid component, more preferably 0-5 mass %, even more preferably 0-1 mass %, and particularly preferably 0 mass %. (Dissolution Control Agent) A dissolution control agent is a component that controls the solubility of a solid component in a developer solution when it is too soluble, thereby appropriately reducing the dissolution rate during development. Such a dissolution control agent is preferably one that does not chemically change during the resist film sintering, radiation irradiation, and development steps. The dissolution control agent is not particularly limited, but includes, for example, aromatic hydrocarbons such as phenanthrene, anthracene, and acenaphthene; ketones such as acetophenone, diphenyl ketone, and phenylnaphthyl ketone; and sulfides such as methylphenyl sulfide, diphenyl sulfide, and dinaphthyl sulfide. These dissolution control agents may be used alone or in combination of two or more. The amount of the dissolution control agent added is appropriately adjusted depending on the type of compound used. However, 0 to 49 mass % of the total mass of the solid component is preferred, 0 to 5 mass % is more preferred, 0 to 1 mass % is even more preferred, and 0 mass % is particularly preferred. (Sensitizer) A sensitizer absorbs the energy of irradiated radiation and transfers this energy to the acid generator (C), thereby increasing the amount of acid generated and improving the apparent sensitivity of the resist. Examples of such sensitizers include diphenyl ketones, bisacetyl groups, pyrenes, phenothiazines, and fluorenes, but are not particularly limited. These sensitizers may be used alone or in combination of two or more. The amount of the sensitizer blended is appropriately adjusted depending on the type of compound used, but is preferably 0-49 mass % of the total mass of the solid component, more preferably 0-5 mass %, even more preferably 0-1 mass %, and particularly preferably 0 mass %. (Surfactant) A surfactant is a component that improves the coating properties of the composition of this embodiment and the developability of stripes and resists. The surfactant may be any of anionic surfactants, cationic surfactants, nonionic surfactants, or amphoteric surfactants. As a preferred surfactant, a nonionic surfactant can be mentioned. The nonionic surfactant has good affinity with the solvent used to manufacture the composition of this embodiment, and can further improve the effect of the composition of this embodiment. Examples of nonionic surfactants include polyoxyethylene higher alkyl ethers, polyoxyethylene higher alkylphenyl ethers, higher fatty acid diesters of polyethylene glycol, etc., but are not particularly limited. Examples of commercially available surfactants include Eftop (manufactured by JEMCO), Megafac (manufactured by Dai Nippon Printing Chemicals Co., Ltd.), FLUORAD (manufactured by Sumitomo 3M Co., Ltd.), AsahiGuard, Surflon (all manufactured by Asahi Glass Co., Ltd.), PEPOL (manufactured by Toho Chemical Co., Ltd.), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), and Horipro (manufactured by Kyoeisha Oil and Fat Chemical Co., Ltd.). The amount of surfactant added is appropriately adjusted depending on the type of solid component used, but is preferably 0-49 mass % of the total mass of the solid component, more preferably 0-5 mass %, even more preferably 0-1 mass %, and particularly preferably 0 mass %. (Organic carboxylic acid or phosphorus oxygen-containing acid or its derivative) For the purpose of preventing sensitivity degradation or improving the resist pattern shape, shelf stability, etc., it can further contain organic carboxylic acid or phosphorus oxygen-containing acid or its derivative as an optional component. In addition, organic carboxylic acid or phosphorus oxygen-containing acid or its derivative can be used in combination with an acid diffusion controller or can be used alone. As organic carboxylic acids, for example, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, salicylic acid, etc. are more suitable. As phosphorus oxygen-containing acid or its derivative, phosphoric acid or its ester derivatives such as phosphoric acid, di-n-butyl phosphate, diphenyl phosphate, phosphonic acid, dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, dibenzyl phosphonate, etc., phosphonic acid or its ester derivatives, phosphonic acid, phenylphosphonic acid, etc., phosphonic acid and its ester derivatives. Among these, phosphonic acid is particularly preferred. The organic carboxylic acid, phosphorus oxyacid, or derivative thereof may be used alone or in combination of two or more. The amount of the organic carboxylic acid, phosphorus oxyacid, or derivative thereof added is appropriately adjusted depending on the type of compound used. However, it is preferably 0 to 49% by mass of the total solid content, more preferably 0 to 5% by mass, even more preferably 0 to 1% by mass, and particularly preferably 0% by mass. [Other Additives] In addition, one or more additives other than the above-mentioned components may be incorporated into the composition of this embodiment as needed. Examples of such additives include dyes, pigments, and adhesion aids. For example, incorporation of dyes or pigments is preferred because they visualize the latent image of the exposed portion and mitigate the effects of haloing during exposure. In addition, incorporation of adhesion aids is preferred because they improve adhesion to the substrate. Other additives include halo inhibitors, storage stabilizers, defoaming agents, shape modifiers, and more specifically, 4-hydroxy-4'-methylchalcone. In the composition of this embodiment, the total amount of the optional component (F) can be set at 0 to 99 mass % of the total mass of the solid content, preferably 0 to 49 mass %, more preferably 0 to 10 mass %, even more preferably 0 to 5 mass %, even more preferably 0 to 1 mass %, and particularly preferably 0 mass %. [Method for forming a resist pattern] The method for forming a resist pattern of the present embodiment includes the steps of forming a resist film on a substrate using a film-forming composition containing a compound (A) or a polymer (A), performing pattern exposure on the resist film, and performing a developing treatment on the resist film after the exposure. The coating method used in the resist film formation step is not particularly limited, but examples include spin coaters, dip coaters, and roll coaters. The substrate is not particularly limited, but examples include silicon wafers, metals, plastics, glass, and ceramics. After forming the resist film, it may be heat-treated at a temperature of approximately 50°C to 200°C. The thickness of the resist film is not particularly limited, but for example, is 50 nm to 1 μm. During the exposure step, exposure can be performed through a specific mask pattern, or shot exposure can be performed without a mask. The thickness of the coating is, for example, 0.1 to 20 μm, preferably 0.3 to 2 μm. During exposure, light of various wavelengths can be used, such as ultraviolet rays, X-rays, etc. For example, far ultraviolet rays, extreme ultraviolet rays (wavelength 13 nm), X-rays, electron beams, etc. such as F2 excimer lasers (wavelength 157 nm), ArF excimer lasers (wavelength 193 nm), or KrF excimer lasers (wavelength 248 nm) can be appropriately selected as light sources. Among these, extreme ultraviolet rays are preferred. In addition, exposure conditions such as the exposure amount are appropriately selected based on the blending composition of the above-mentioned resins and / or compounds, the types of various additives, etc. In this embodiment, to stably form fine, high-precision patterns, it is preferred to heat-treat the film at a temperature of 50-200°C for at least 30 seconds after exposure. Temperatures below 50°C may increase sensitivity variations depending on the substrate type. Development is then performed using an alkaline developer, typically at 10-50°C for 10-200 seconds, preferably at 20-25°C for 15-90 seconds, to form a specific resist pattern. The alkaline developer is typically an alkaline aqueous solution containing, for example, an alkali metal hydroxide, ammonia, alkylamines, alkanolamines, heterocyclic amines, tetraalkylammonium hydroxides, choline, 1,8-diazabicyclo-[5.4.0]-7-undecene, 1,5-diazabicyclo-[4.3.0]-5-nonene, or the like dissolved in an amount of 1 to 10% by mass, preferably 1 to 3% by mass. A water-soluble organic solvent or surfactant may also be added to the developer containing the alkaline aqueous solution as appropriate. The composition of this embodiment can also be used as a composition for forming optical components using lithography technology. In addition to being used in the form of films or sheets, optical components can be used as plastic lenses (prism lenses, biconvex lenses, microlenses, Fresnel lenses, viewing angle control lenses, contrast enhancement lenses, etc.), phase difference films, films for electromagnetic wave shielding, prisms, optical fibers, solder resists for flexible printed wiring, plating resists, interlayer insulating films for multilayer printed wiring boards, photosensitive optical waveguides, liquid crystal displays, organic electroluminescent (EL) displays, optical semiconductor (LED) elements, solid-state imaging elements, organic thin-film solar cells, dye-sensitized solar cells, and organic thin-film transistors (TFTs). The aforementioned composition can be suitably used as an embedding film and a flattening film on a photodiode, which is a component of a solid-state imaging element that particularly requires a high refractive index, a flattening film before and after a color filter, a microlens, and a flattening film and conformal film on a microlens. In addition, the composition of this embodiment can be used as a patterning material for lithography purposes. As a lithography process, it can be used in various applications such as semiconductors, liquid crystal display panels or OLED display panels, power supply devices, CCDs or other sensors. In particular, in the integrated circuit of semiconductors or devices, the composition of this embodiment can be suitably used for the purpose of forming device elements on a silicon wafer, forming a pattern on the upper side of an insulating layer such as a silicon oxide film or other oxide film based on the pattern formed using the composition of this embodiment, and further laminating a metal film or semiconductor material based on the formed insulating film pattern to form a circuit pattern, so as to construct a semiconductor element or other device. Second Embodiment The second embodiment of the present invention will be described below. This second embodiment relates to a method for producing an iodine-containing vinyl monomer having formula (1) described below, preferably iodine-containing hydroxystyrene. The production method of the second embodiment can be utilized as the method for producing the compound of the first embodiment. [Method for producing an iodine-containing vinyl monomer represented by formula (1)] The second embodiment is a method for producing an iodine-containing vinyl monomer represented by the following formula (1), preferably a method for producing iodine-containing hydroxystyrene. (In formula (1), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 8 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, and at least one of them is iodine). Examples of hydroxystyrenes produced by the method of this embodiment include, but are not limited to, iodine-containing 2-hydroxystyrene, iodine-containing 3-hydroxystyrene, iodine-containing 4-hydroxystyrene, iodine-containing 3-methoxy-4-hydroxystyrene, iodine-containing 3,5-dimethoxy-4-hydroxystyrene, iodine-containing 2,3-dihydroxystyrene, iodine-containing 2,4-dihydroxystyrene, iodine-containing 2,5-dihydroxystyrene, iodine-containing 2,6-dihydroxystyrene, iodine-containing 3,4-dihydroxystyrene, iodine-containing 3,5-dihydroxystyrene, iodine-containing 2,3,4-trihydroxystyrene, iodine-containing 2,4,6-trihydroxystyrene, iodine-containing 3,4,5-trihydroxystyrene, and iodine-containing α-cyano-4-hydroxystyrene. At least one iodine group, preferably two or more, is introduced. At least one OH group, preferably two or more, is introduced. Specific examples of hydroxystyrene produced by the method of this embodiment are shown below, although not limited thereto. (Iodine-Containing Alcoholic Matrix) The iodine-containing alcoholic matrix used in the present invention has the formula (1-1): (In formula (1-1), R 1 ~R 5Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 At least one of them is OH, and at least one is iodine, R 6 ~R 10 One of them is OH or OCH 3) An alcoholic matrix containing iodine. Examples of suitable iodine-containing alcoholic substrates include, but are not limited to, iodine-containing 2-(1-hydroxyethyl)phenol, iodine-containing 3-(1-hydroxyethyl)phenol, iodine-containing 4-(1-hydroxyethyl)phenol, iodine-containing 4-(1-hydroxyethyl)-1-methoxyphenol, iodine-containing 4-(1-hydroxyethyl)-2,6-dimethoxyphenol, iodine-containing 3-(1-hydroxyethyl)benzene-1,2-diol, iodine-containing 4-(1-hydroxyethyl)benzene- 1,3-diol, iodine-containing 2-(1-hydroxyethyl)benzene-1,4-diol, iodine-containing 6-(1-hydroxyethyl)benzene-1,5-diol, iodine-containing 4-(1-hydroxyethyl)benzene-1,2-diol, iodine-containing 5-(1-hydroxyethyl)benzene-1,3-diol, iodine-containing 4-(1-hydroxyethyl)benzene-1,2,3-triol, iodine-containing 2-(1-hydroxyethyl)benzene-1,3,5-triol, iodine-containing 5-(1-hydroxyethyl)benzene Benzene-1,2,3-triol, iodine-containing 2-(1-cyano-1-hydroxyethyl)phenol, or iodine-containing 2-(2-hydroxyphenyl)ethanol, iodine-containing 2-(3-hydroxyphenyl)ethanol, iodine-containing 2-(4-hydroxyphenyl)ethanol, iodine-containing 2-(3-methoxy-4-hydroxyphenyl)ethanol, iodine-containing 2-(3,5-dimethoxy-4-hydroxyphenyl)ethanol, iodine-containing 2-(2,3-dihydroxyphenyl)ethanol, iodine-containing 2-(2,4-dihydroxyphenyl)ethanol Ethanol, iodinated 2-(2,5-dihydroxyphenyl)ethanol, iodinated 2-(2,6-dihydroxyphenyl)ethanol, iodinated 2-(3,4-dihydroxyphenyl)ethanol, iodinated 2-(3,5-dihydroxyphenyl)ethanol, iodinated 2-(2,3,4-trihydroxyphenyl)ethanol, iodinated 2-(2,4,6-trihydroxyphenyl)ethanol, iodinated 2-(3,4,5-trihydroxyphenyl)ethanol, and iodinated 1-cyano-2-(4-hydroxyphenyl)ethanol. At least one iodine group is introduced, preferably two or more. At least one OH group is introduced, preferably two or more. OH groups may also be substituted with OMe. Specific examples of the iodine-containing alcoholic matrix used in the present invention are as follows, although not limited thereto. These iodine-containing alcoholic substrates can be obtained by various methods. However, from the viewpoint of the availability of raw materials and yield, they are preferably obtained by the method described below. The method for producing the iodine-containing vinyl monomer represented by formula (1) comprises: a) preparing an iodine-containing alcoholic substrate having formula (1-1); and b) dehydrating the iodine-containing alcoholic substrate. As solvents that can be used in the dehydration step, various solvents can be used, including polar aprotic solvents and protic polar solvents. A single protic polar solvent or a single polar aprotic solvent can be used. Furthermore, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and nonpolar solvents can be used. Polar aprotic solvents or mixtures thereof are preferred. While the solvent is effective, it is not a required component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, catalyst, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. As the catalyst that can be used in the dehydration step, system can use the various catalysts that play a role under the reaction conditions of this embodiment.Acid catalyst system is preferred.As the example of suitable acid catalyst, though not limited, for example, can enumerate the mineral acid of hydrochloric acid, sulfuric acid, phosphoric acid, hydrobromic acid, hydrofluoric acid etc., or the organic acid of oxalic acid, malonic acid, succinic acid, adipic acid, sebacic acid, citric acid, fumaric acid, maleic acid, formic acid, p-toluenesulfonic acid, methanesulfonic acid, trifluoroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, naphthalenesulfonic acid, naphthalenedisulfonic acid etc., or the solid acid of Lewis acid, silicotungstic acid, phosphotungstic acid, silicomolybdic acid or phosphomolybdic acid etc. of zinc chloride, aluminum chloride, ferric chloride, boron trifluoride etc.These acid catalyst systems can be used alone or in combination of more than two kinds. Among these, organic acids and solid acids are preferred from a manufacturing perspective. From a manufacturing perspective such as ease of availability and ease of handling, hydrochloric acid or sulfuric acid is preferred. The amount of catalyst used can be appropriately determined based on the substrate, catalyst, and reaction conditions. Although not particularly limited, the amount is generally 0.0001 to 100 parts by mass relative to 100 parts by mass of the reaction raw materials. From a yield perspective, the amount is preferably 0.001 to 10 parts by mass. As the polymerization inhibitor that can be used in the dehydration step, various polymerization inhibitors that are effective under the reaction conditions of this embodiment can be used. Although the polymerization inhibitor is effective, it is not an essential component. Examples of suitable polymerization inhibitors include, but are not limited to, hydroquinone, hydroquinone monomethyl ether, 4-tert-butylcatechol, phenothiazine, N-oxyl radical (nitrogen oxide) inhibitors, such as Prostab (registered trademark) 5415 (bis(1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl) sebacate commercially available from Ciba Specialty Chemicals, Tarrytown, NY, CAS# 2516-92-9), 4-hydroxy-TEMPO (4-hydroxy-2,2,6,6-tetramethylpiperidin-1-yloxyl commercially available from TCI, CAS# 2226-96-2), and Uvinul (registered trademark) 4040P (BASF Corp., Worcester, KY). The amount of the polymerization inhibitor used can be appropriately determined depending on the substrate, catalyst, reaction conditions, and other factors. However, it is generally preferably 0.0001 to 100 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 0.001 to 10 parts by mass from the perspective of yield. As polymerization inhibitors that can be used in the dehydration step, various polymerization inhibitors that are effective under the reaction conditions of this embodiment can be used. Although polymerization inhibitors are effective, they are not essential components. It is also effective to use a polymerization retarder in combination with a polymerization inhibitor. Polymerization retarders are well known in the technical field of the present invention. Although they delay the polymerization reaction, they cannot completely prevent the polymerization of compounds. Generally speaking, retarders are aromatic nitro compounds such as dinitro-o-cresol (DNOC) and dinitrobutylphenol (DNBP). The preparation method of polymerization retarder is a general method and is well known in the technical field (for example, see the specification of U.S. Patent No. 6,339,177; Park et al., Polymer (Korea) (1988), 12 (8), 710-19), and its use in the control of styrene polymerization has been well documented (for example, see Bushby et al., Polymer (1998), 39 (22), 5567-5571). The amount of the polymerization inhibitor used can be appropriately set depending on the substrate, catalyst, reaction conditions, etc., and is not particularly limited. However, in general, it is preferably 0.0001 to 100 parts by mass relative to 100 parts by mass of the reaction raw materials. From the perspective of yield, it is preferably 0.001 to 10 parts by mass. (Reaction Conditions) An iodine-containing alcoholic substrate of formula (1-1), a catalyst, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction can be carried out using a batch, semi-batch, or continuous method, as appropriate. The reaction temperature is not particularly limited. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of catalyst, and the desired yield. Generally speaking, a temperature of 0°C to 200°C is more suitable. From the perspective of yield, a temperature of 10°C to 190°C is more preferred, 25°C to 150°C is more preferred, and 50°C to 100°C is even more preferred. In reactions using 1-(4-hydroxy-3,5-diiodophenyl)ethanol as a substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of catalyst, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. In reactions under high pressure, although not limited, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 1-(4-hydroxy-3,5-diiodophenyl)ethanol as a substrate, the preferred reaction pressure is from reduced pressure to normal pressure, with reduced pressure being preferred. From the perspective of reaction rate, it is preferable to remove low-boiling-point products such as water and methanol from the reaction system while maintaining the reaction system. Removal of low-boiling-point products can be carried out using any suitable method known to the public. For example, evaporation can be used, preferably under reduced pressure. There are no specific restrictions on reaction time. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of catalyst, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 1-(4-hydroxy-3,5-diiodophenyl)ethanol as the substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is completed, separation and purification can be carried out using suitable methods known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent is then removed by evaporation under reduced pressure, and the product is recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to separate and purify the desired high-purity monomer. [Method for producing an iodine-containing alcoholic substrate represented by formula (1-1) (I)] The iodine-containing ketone substrate used in the production of formula (1-1) is a substrate having formula (1-2) (In formula (1-2), R 1 ~R 5 Each is independently H, OH, OCH 3. Halogen or linear or branched alkyl, R 7 、R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 1 ~R 5 A ketonic substrate containing iodine (at least one of which is OH and at least one of which is iodine). Examples of suitable iodine-containing ketone substrates include, but are not limited to, iodine-containing 2-hydroxyphenylmethyl ketone, iodine-containing 3-hydroxyphenylmethyl ketone, iodine-containing 4-hydroxyphenylmethyl ketone, iodine-containing 3-methoxy-4-hydroxyphenylmethyl ketone, iodine-containing 3,5-dimethoxy-4-hydroxyphenylmethyl ketone, iodine-containing 2,3-dihydroxyphenylmethyl ketone, iodine-containing 2,4-dihydroxyphenylmethyl ketone, iodine-containing 2,5-dihydroxyphenylmethyl ketone, iodine-containing 2,6-dihydroxyphenylmethyl ketone, iodine-containing 3,4-dihydroxyphenylmethyl ketone, iodine-containing 3,5-dihydroxyphenylmethyl ketone, iodine-containing 2,3,4-trihydroxyphenylmethyl ketone, iodine-containing 2,4,6-trihydroxyphenylmethyl ketone, iodine-containing 3,4,5-trihydroxyphenylmethyl ketone, and iodine-containing 4-hydroxyphenyl α-cyanomethyl ketone. At least one iodine group is introduced, and preferably two or more are introduced. At least one OH group is introduced, preferably two or more. Specific examples of the iodine-containing ketone matrix used in the present invention are as follows, although not limited thereto. These iodine-containing ketone substrates can be obtained by various methods. However, from the viewpoint of the availability of raw materials and yield, they are preferably obtained by the method described below. The method for preparing the iodine-containing alcoholic substrate represented by formula (1-1) comprises: c) preparing an iodine-containing ketone substrate represented by formula (1-2); and d) reducing the iodine-containing ketone substrate. As solvents that can be used in the reduction step, various solvents including polar aprotic solvents and protic polar solvents can be used. A single protic polar solvent or a single polar aprotic solvent can be used. In addition, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and non-polar solvents can be used. Polar aprotic solvents or mixtures thereof are preferred. From the perspective of suppressing side reactions, mixtures of polar aprotic solvents and polar protic solvents are preferred. As polar protic solvents, alcoholic solvents such as water, methanol, ethanol, propanol, and butanol are even more preferred. Although the solvent is effective, it is not an essential component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, catalyst, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. As the reducing agent that can be used in the reduction step, a variety of reducing agents that function under the reaction conditions of this embodiment can be used. Suitable reducing agents include, but are not limited to, metal hydrides and metal aluminum hydride compounds, such as borane dimethyl sulfide, diisobutylaluminum hydride, sodium borohydride, lithium borohydride, potassium borohydride, zinc borohydride, lithium tri-s-butylborohydride, potassium tri-s-butylborohydride, lithium triethylborohydride, lithium aluminum hydride, lithium tri-t-butoxyaluminum hydride, and sodium bis(methoxyethoxy)aluminum hydride. The amount of the reducing agent used can be appropriately determined depending on the substrate, reducing agent, and reaction conditions. While not particularly limited, it is generally preferably 1 to 500 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 10 to 200 parts by mass from the perspective of yield. As a quenching agent, various quenching agents that function under the reaction conditions of this embodiment can be used. The so-called quenching agent has the function of inactivating the reducing agent. Although the quenching agent is effective, it is not an essential component. Suitable quenching agents are not limited, but include ethanol, ammonium chloride water, water, hydrochloric acid, and sulfuric acid. The amount of the quenching agent used can be appropriately set according to the amount of the reducing agent used. Although not particularly limited, in general, it is more preferably 1 to 500 parts by mass relative to 100 parts by mass of the reducing agent. From the perspective of yield, it is preferably 50 to 200 parts by mass. (Reaction Conditions) An iodine-containing ketone substrate of formula (1-2), a reducing agent, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction can be carried out using a batch, semi-batch, or continuous method, as appropriate. The reaction temperature is not particularly limited. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of reducing agent, and the desired yield. Generally, a temperature of 0°C to 200°C is suitable. From the perspective of yield, a temperature of 0°C to 100°C is preferred, 0°C to 70°C is more preferred, and 0°C to 50°C is even more preferred. In reactions using 4'-hydroxy-3',5'-diiodoacetophenone as a substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of reducing agent, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. In reactions under high pressure, although not limited, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 4'-hydroxy-3',5'-diiodoacetophenone as a substrate, the preferred reaction pressure is reduced pressure to normal pressure, with reduced pressure being preferred. There are no particular restrictions on reaction time. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of reducing agent, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 4'-hydroxy-3',5'-diiodoacetophenone as a substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is complete, separation and purification can be carried out using any suitable method known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent can then be removed by evaporation under reduced pressure, and the product recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to isolate and purify the desired high-purity compound. [Method for producing an iodine-containing alcoholic substrate represented by formula (1-1) (II)] The alcoholic substrate used in the production of formula (1-1) has the formula (1-3) (In formula (1-3), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 6 ~R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is OH, R 6 ~R 10 One of them is OH or OCH 3) alcoholic matrix. Examples of suitable alcoholic substrates include, but are not limited to, 2-(1-hydroxyethyl)phenol, 3-(1-hydroxyethyl)phenol, 4-(1-hydroxyethyl)phenol, 4-(1-hydroxyethyl)-1-methoxyphenol, 4-(1-hydroxyethyl)-2,6-dimethoxyphenol, 3-(1-hydroxyethyl)benzene-1,2-diol, 4-(1-hydroxyethyl)benzene-1,3-diol, 2-(1-hydroxyethyl)benzene-1,4-diol, 6-(1-hydroxyethyl)benzene-1,5-diol, 4-(1-hydroxyethyl)benzene-1,2-diol, 5-(1-hydroxyethyl)benzene-1,3-diol, 4-(1-hydroxyethyl)benzene-1,2,3-triol, 2-(1-hydroxyethyl)benzene-1,3,5-triol, 5 ...5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 5-(1-hydroxyethyl)benzene-1,5-diol, 1-cyano-2-(4-hydroxyphenyl)ethanol. At least one OH group is introduced, preferably two or more. OH groups may also be replaced by OMe. Specific examples of the alcoholic substrate used in this embodiment are as follows, although not limited thereto. These alcoholic substrates can be obtained by various methods, but are preferably obtained by the method described below from the viewpoint of the availability of raw materials and yield. The method for preparing the iodine-containing alcoholic matrix represented by formula (1-1) comprises: e) preparing an alcoholic matrix having formula (1-3); and f) introducing iodine into the alcoholic matrix. As solvents that can be used in the iodine introduction step, various solvents can be used, including polar aprotic solvents and protic polar solvents. A single protic polar solvent or a single polar aprotic solvent can be used. Furthermore, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and nonpolar solvents can be used. Polar protic solvents or mixtures thereof are preferred. From the perspective of suppressing side reactions, mixtures of polar protic solvents and water are preferred. While the solvent is effective, it is not an essential component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, catalyst, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. (Reaction Conditions) An alcoholic substrate having formula (1-3), a catalyst, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction can be carried out using a batch, semi-batch, or continuous method, as appropriate. The reaction temperature is not particularly limited. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of catalyst, and the desired yield. Generally, a temperature of 0°C to 200°C is suitable. From the perspective of yield, a temperature of 0°C to 100°C is preferred, more preferably 0°C to 70°C, and even more preferably 0°C to 50°C. In reactions using 1-(4-hydroxyphenyl)ethanol as the substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of catalyst, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. Although not limited to high-pressure reactions, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 1-(4-hydroxyphenyl)ethanol as a substrate, the preferred reaction pressure is from reduced pressure to normal pressure, with reduced pressure being preferred. There are no particular restrictions on the reaction time. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of catalyst, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 1-(4-hydroxyphenyl)ethanol as the substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is complete, separation and purification can be carried out using any suitable method known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent can then be removed by evaporation under reduced pressure, and the product recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to isolate and purify the desired high-purity compound. [Method for producing iodine-containing ketone substrate represented by formula (1-2)] The ketone substrate used in the production of formula (1-2) has the formula (1-4): (In formula (1-4), R 11 ~R 15 Each is independently H, OH, OCH 3 or linear or branched alkyl, R 7 ~R 8 and R 10 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 11 ~R 15 At least one of them is a ketone substrate (OH). Examples of suitable ketone substrates include, but are not limited to, 2-hydroxyphenyl methyl ketone, 3-hydroxyphenyl methyl ketone, 4-hydroxyphenyl methyl ketone, 3-methoxy-4-hydroxyphenyl methyl ketone, 3,5-dimethoxy-4-hydroxyphenyl methyl ketone, 2,3-dihydroxyphenyl methyl ketone, 2,4-dihydroxyphenyl methyl ketone, 2,5-dihydroxyphenyl methyl ketone, 2,6-dihydroxyphenyl methyl ketone, 3,4-dihydroxyphenyl methyl ketone, 3,5-dihydroxyphenyl methyl ketone, 2,3,4-trihydroxyphenyl methyl ketone, 2,4,6-trihydroxyphenyl methyl ketone, 3,4,5-trihydroxyphenyl methyl ketone, and 4-hydroxyphenyl α-cyanomethyl ketone. Specific examples of the ketone substrate used in this embodiment are as follows, although not limited thereto. These ketonic substrates can be obtained in a number of ways. The method for producing the iodine-containing ketone substrate represented by formula (1-2) comprises: g) preparing a ketone substrate having formula (1-4); and h) introducing iodine into the ketone substrate. As solvents that can be used in the iodine introduction step, various solvents can be used, including polar aprotic solvents and protic polar solvents. A single protic polar solvent or a single polar aprotic solvent can be used. Furthermore, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and nonpolar solvents can be used. Polar protic solvents or mixtures thereof are preferred. From the perspective of suppressing side reactions, mixtures of polar protic solvents and water are preferred. While the solvent is effective, it is not an essential component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, catalyst, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. (Reaction Conditions) A ketonic substrate having formula (1-4), a catalyst, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction can be carried out using a batch, semi-batch, or continuous method, as appropriate. The reaction temperature is not particularly limited. The preferred range varies depending on the substrate concentration, the stability of the product, the choice of catalyst, and the desired yield. Generally, a temperature of 0°C to 200°C is suitable. From the perspective of yield, a temperature of 0°C to 100°C is preferred, 0°C to 70°C is more preferred, and 0°C to 50°C is even more preferred. For reactions using 4'-hydroxyacetophenone as the substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of catalyst, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. In reactions under high pressure, although not limited, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 4'-hydroxyacetophenone as the substrate, the preferred reaction pressure is from reduced pressure to normal pressure, with reduced pressure being preferred. There are no particular restrictions on reaction time. The preferred range varies depending on the substrate concentration, the stability of the product, the choice of catalyst, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 4'-hydroxyacetophenone as the substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is complete, separation and purification can be carried out using any suitable method known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent can then be removed by evaporation under reduced pressure, and the product recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to isolate and purify the desired high-purity compound. [Method for producing the alcoholic substrate represented by formula (1-3)] The ketone substrate used in the production of formula (1-3) is a ketone substrate having the aforementioned formula (1-4). The method for producing the alcoholic substrate represented by formula (1-3) comprises the steps of i) preparing a ketone substrate represented by formula (1-4); and j) reducing the ketone substrate. As solvents that can be used in the reduction step, various solvents including polar aprotic solvents and protic polar solvents can be used. A single protic polar solvent or a single polar aprotic solvent can be used. In addition, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and non-polar solvents can be used. Polar aprotic solvents or mixtures thereof are preferred. From the perspective of suppressing side reactions, mixtures of polar aprotic solvents and polar protic solvents are preferred. As polar protic solvents, alcoholic solvents such as water, methanol, ethanol, propanol, and butanol are even more preferred. Although the solvent is effective, it is not an essential component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, reducing agent, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. As the reducing agent, various reducing agents that function under the reaction conditions of this embodiment can be used. Suitable reducing agents include, but are not limited to, metal hydrides and metal aluminum hydride compounds, such as borane dimethyl sulfide, diisobutylaluminum hydride, sodium borohydride, lithium borohydride, potassium borohydride, zinc borohydride, lithium tri-s-butylborohydride, potassium tri-s-butylborohydride, lithium triethylborohydride, lithium aluminum hydride, lithium tri-t-butoxyaluminum hydride, and sodium bis(methoxyethoxy)aluminum hydride. The amount of the reducing agent used can be appropriately determined depending on the substrate, reducing agent, and reaction conditions. While not particularly limited, it is generally preferably 1 to 500 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 10 to 200 parts by mass from the perspective of yield. As a quenching agent, various quenching agents that function under the reaction conditions of this embodiment can be used. The so-called quenching agent has the function of inactivating the reducing agent. Although the quenching agent is effective, it is not an essential component. Suitable quenching agents are not limited, but include ethanol, ammonium chloride water, water, hydrochloric acid, and sulfuric acid. The amount of the quenching agent used can be appropriately set according to the amount of the reducing agent used. Although not particularly limited, in general, it is more preferably 1 to 500 parts by mass relative to 100 parts by mass of the reducing agent. From the perspective of yield, it is preferably 50 to 200 parts by mass. (Reaction Conditions) A ketonic substrate having formula (1-4), a reducing agent, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction can be carried out using a batch, semi-batch, or continuous method, as appropriate. The reaction temperature is not particularly limited. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of reducing agent, and the desired yield. Generally, a temperature of 0°C to 200°C is suitable. From the perspective of yield, a temperature of 0°C to 100°C is preferred, 0°C to 70°C is more preferred, and 0°C to 50°C is even more preferred. For reactions using 4'-hydroxyacetophenone as the substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of reducing agent, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. In reactions under high pressure, although not limited, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 4'-hydroxyacetophenone as a substrate, the preferred reaction pressure is from reduced pressure to normal pressure, with reduced pressure being preferred. There are no particular restrictions on the reaction time. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of reducing agent, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 4'-hydroxyacetophenone as the substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is complete, separation and purification can be carried out using suitable methods known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent is then removed by evaporation under reduced pressure, and the product is recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to isolate and purify the desired high-purity compound. [Method for producing iodine-containing acetylated vinyl monomer represented by formula (2)] This embodiment is a method for producing an iodine-containing acetylated vinyl monomer represented by formula (2) (In formula (2), R 16 ~R 20 Each is independently H, OH, OCH 3. OAc, halogen or linear or branched alkyl, R 6 ~R 8 Each is independently H, OH, OCH 3. Halogen or cyano, only, R 16 ~R 20 A method for producing an iodine-containing acetylated vinyl monomer (wherein at least one of the monomers is OAc and at least one of the monomers is iodine), specifically, a method for producing iodine-containing acetyloxystyrene. Examples of the iodine-containing acetylated vinyl monomer produced by the method of this embodiment include, but are not limited to, iodine-containing 2-acetyloxystyrene, iodine-containing 3-acetyloxystyrene, iodine-containing 4-acetyloxystyrene, iodine-containing 3-methoxy-4-acetyloxystyrene, iodine-containing 3,5-dimethoxy-4-acetyloxystyrene, iodine-containing 2,3-acetyloxystyrene, iodine-containing 2, 4-acetyloxystyrene, iodine-containing 2,5-acetyloxystyrene, iodine-containing 2,6-acetyloxystyrene, iodine-containing 3,4-acetyloxystyrene, iodine-containing 3,5-acetyloxystyrene, iodine-containing 2,3,4-triacetyloxystyrene, iodine-containing 2,4,6-triacetyloxystyrene, iodine-containing 3,4,5-triacetyloxystyrene, iodine-containing α-cyano-4-acetyloxystyrene. At least one iodine group is introduced, preferably two or more. At least one OAc group is introduced, preferably two or more. Specific examples of the iodine-containing acetylated vinyl monomer produced by the method of this embodiment are shown below, although not limited thereto. (In the formula, Ac represents an acetyl group.) The method for producing an iodine-containing acetylated vinyl monomer (iodine-containing acetyloxystyrene) represented by formula (2) comprises: k) a step of preparing an iodine-containing vinyl monomer (iodine-containing hydroxystyrene) having formula (1); and l) a step of acetylation of the aforementioned iodine-containing hydroxystyrene. As solvents that can be used in the acetylation step, various solvents can be used, including polar aprotic solvents and protic polar solvents. A single protic polar solvent or a single polar aprotic solvent can be used. Furthermore, mixtures of polar aprotic solvents, mixtures of protic polar solvents, mixtures of polar aprotic solvents and protic polar solvents, and mixtures of aprotic or protic solvents and nonpolar solvents can be used. Polar aprotic solvents or mixtures thereof are preferred. While the solvent is effective, it is not a required component. Suitable polar aprotic solvents are not limited, but include ether solvents such as diethyl ether, tetrahydrofuran, dimethoxyethane, diglyme, and triethylene glycol; ester solvents such as ethyl acetate and γ-butyrolactone; nitrile solvents such as acetonitrile; hydrocarbon solvents such as toluene and hexane; amide solvents such as N,N-dimethylformamide, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, hexamethylphosphatamide, and hexamethylphosphite triamide; and dimethylsulfoxide. Dimethylsulfoxide is preferred. Suitable protic polar solvents include, but are not limited to, water, alcoholic solvents such as methanol, ethanol, propanol, and butanol, dipropylene glycol methyl ether, diethylene glycol methyl ether, 2-butoxyethanol, ethylene glycol, 2-methoxyethanol, propylene glycol methyl ether, n-hexanol, and n-butanol. The amount of the solvent used can be appropriately determined depending on the substrate, catalyst, and reaction conditions. While not particularly limited, it is generally preferably 0 to 10,000 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 100 to 2,000 parts by mass from the perspective of yield. As the acetylating agent, various acetylating agents that are effective under the reaction conditions of this embodiment can be used. Examples of suitable acetylating agents are not limited thereto, but include acetic anhydride, acetyl halides, and acetic acid, with acetic anhydride being preferred. As the catalyst that can be used in the acetylation step, various acetylation catalysts that play a role under the reaction conditions of this embodiment can be used. Acid catalysts or base catalysts are preferred. As examples of suitable acid catalysts, although not limited, for example, inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid, hydrobromic acid, and hydrofluoric acid can be enumerated, or organic acids such as oxalic acid, malonic acid, succinic acid, adipic acid, sebacic acid, citric acid, fumaric acid, maleic acid, formic acid, p-toluenesulfonic acid, methanesulfonic acid, trifluoroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, naphthalenesulfonic acid, and naphthalenedisulfonic acid, or solid acids such as Lewis acid, silicotungstic acid, phosphotungstic acid, silicomolybdic acid, or phosphomolybdic acid of zinc chloride, aluminum chloride, iron chloride, and boron trifluoride can be enumerated. These acid catalysts can be used alone or in combination of two or more. Among these, from the viewpoint of manufacturing, organic acid and solid acid are preferably used. From the viewpoint of the ease of obtaining and the ease of operation, hydrochloric acid or sulfuric acid are preferably used. As the example of suitable alkaline catalyst, although it is not limited, the example of the catalyst containing amine is pyridine and ethylenediamine, and the example of the alkaline catalyst of non-amine is metal salt and especially preferably potassium salt or acetate. As the catalyst that is suitable for, although it is not limited, potassium acetate, potassium carbonate, potassium hydroxide, sodium acetate, sodium carbonate, sodium hydroxide and magnesium oxide can be enumerated. The alkaline catalyst system of the non-amine of this embodiment is all sold on the market by, for example, EMScience company (Gibbstown) or Aldrich company (Aldrich) (Milwaukee). The amount of catalyst used can be appropriately set according to the substrate, catalyst, reaction conditions, etc., and is not particularly limited. However, in general, it is more preferably 1 to 5000 parts by mass relative to 100 parts by mass of the reaction raw materials. From the perspective of yield, it is preferably 50 to 3000 parts by mass. As the polymerization inhibitor that can be used in the acetylation step, various polymerization inhibitors that are effective under the reaction conditions of this embodiment can be used. Although the polymerization inhibitor is effective, it is not an essential component. Examples of suitable polymerization inhibitors include, but are not limited to, hydroquinone, hydroquinone monomethyl ether, 4-tert-butylcatechol, phenothiazine, N-oxyl radical (nitrogen oxide) inhibitors, for example, Prostab (registered trademark) 5415 (bis(1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl) sebacate commercially available from Ciba Specialty Chemicals, Tarrytown, NY, CAS# 2516-92-9), 4-hydroxy-TEMPO (4-hydroxy-2,2,6,6-tetramethylpiperidin-1-yloxyl commercially available from TCI, CAS# 2226-96-2), and Uvinul (registered trademark) 4040P (BASF Corp., Worcester, KY). The amount of the polymerization inhibitor used can be appropriately determined depending on the substrate, catalyst, reaction conditions, and other factors. However, it is generally preferably 0.0001 to 100 parts by mass per 100 parts by mass of the reaction raw materials, and preferably 0.001 to 10 parts by mass from the perspective of yield. As polymerization inhibitors that can be used in the acetylation step, various polymerization inhibitors that are effective under the reaction conditions of this embodiment can be used. Although polymerization inhibitors are effective, they are not essential components. It is also effective to use a polymerization retarder in combination with the polymerization inhibitor. Polymerization retarders are well known in the art of the present invention. Although they delay the polymerization reaction, they cannot completely prevent the polymerization of compounds. Generally, retarders are aromatic nitro compounds such as dinitro-o-cresol (DNOC) and dinitrobutylphenol (DNBP). The preparation method of polymerization retarder is a general method and is well known in the art (for example, see U.S. Patent No. 6,339,177; Park et al., Polymer (Korea) (1988), 12 (8), 710-19). Its use in the control of styrene polymerization has been well documented (for example, see Bushby et al., Polymer (1998), 39 (22), 5567-5571). The amount of the polymerization inhibitor used can be appropriately set depending on the substrate, catalyst, reaction conditions, etc., and is not particularly limited. However, in general, it is preferably 0.0001 to 100 parts by mass relative to 100 parts by mass of the reaction raw materials. From the perspective of yield, it is preferably 0.001 to 10 parts by mass. (Reaction Conditions) Iodine-containing hydroxystyrene of formula (1), a catalyst, and a solvent are added to a reactor to form a reaction mixture. Any suitable reactor may be used. The reaction may be carried out using a batch, semi-batch, or continuous method, as appropriate. There are no particular restrictions on the reaction temperature. The preferred range varies depending on the substrate concentration, the stability of the resulting product, the choice of catalyst, and the desired yield. Generally speaking, a temperature of 0°C to 200°C is more suitable. From the perspective of yield, a temperature of 10°C to 190°C is more preferred, 25°C to 150°C is more preferred, and 50°C to 100°C is even more preferred. In reactions using 4-hydroxy-3,5-diiodostyrene as the substrate, the preferred temperature range is 0°C to 100°C. The reaction pressure is not particularly limited. The preferred range varies depending on the concentration of the substrate, the stability of the product formed, the choice of catalyst, and the desired yield. The pressure can be adjusted by using an inert gas such as nitrogen and a suction pump. In reactions under high pressure, although not limited, conventional pressure reactors including oscillation vessels, rocker vessels, and stirred autoclaves can be used. In reactions using 4-hydroxy-3,5-diiodostyrene as a substrate, the preferred reaction pressure is from reduced pressure to normal pressure, with reduced pressure being preferred. There are no specific restrictions on reaction time. The preferred range varies depending on the substrate concentration, the stability of the product, the choice of catalyst, and the desired yield. However, most reactions are run for less than 6 hours, typically ranging from 15 to 600 minutes. For reactions using 4-hydroxy-3,5-diiodostyrene as the substrate, the preferred reaction time range is 15 to 600 minutes. After the reaction is completed, separation and purification can be carried out using suitable methods known to the public. For example, the reaction mixture can be poured onto ice water and extracted with a solvent such as ethyl acetate or diethyl ether. The solvent is then removed by evaporation under reduced pressure, and the product is recovered. Separation and purification methods well known in the art of the present invention can be used, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, activated carbon, or a combination of these methods, to separate and purify the desired high-purity monomer. The production method of this embodiment allows the production of iodine-containing hydroxystyrene and its acetylated derivatives in high yield using low-cost raw materials, mild conditions, and high yields. The obtained iodine-containing hydroxystyrene and its acetylated derivatives are suitable for use as raw material monomers for resist compositions for extreme ultraviolet lithography. They are also useful in a variety of industrial applications, including various semiconductor materials and electronic materials. [Example 1] The present invention will be described in further detail below with reference to Examples and Comparative Examples. However, the present invention is not limited to these Examples. [Measurement method] [Nuclear magnetic resonance (NMR)] The structure of the compound was confirmed by NMR measurement using a nuclear magnetic resonance device "Advance 600II spectrometer" (product name, manufactured by Bruker) under the following conditions. 1 H-NMR measurement] Frequency: 400 MHz Solvent: CDCl 3, or d 6-DMSO Internal standard: TMS Assay temperature: 23°C [ 13 C-NMR measurement] Frequency: 500 MHz Solvent: CDCl 3, or d 6-DMSO Internal standard: TMS Measurement temperature: 23°C [Inorganic Element Content] The metal content contained in the compounds prepared in Examples and Comparative Examples was measured using an inorganic element analysis (ICP-AES / ICP-MS) apparatus "AG8900" (product name, manufactured by Agilent Technologies Japan, Ltd.). [Organic Impurity Content] The organic impurity content in the compounds prepared in Examples and Comparative Examples was calculated by gas chromatography-mass spectrometry (GC-MS) from the area fraction of the GC spectrum and the peak intensity ratio between the target peak and the reference peak. Example A1: Synthesis of Compound A1 Represented by Formula (M1): A 200 mL glass flask was used as a reaction vessel. 4.96 g (40 mmol) of 4-hydroxybenzyl alcohol was dissolved in butanol as a solvent. A 20% by mass aqueous solution of iodine chloride (81.2 g, 100 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the 4-hydroxybenzyl alcohol and iodine chloride to react. Aqueous sodium thiosulfate solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 12.1 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 4-hydroxy-3,5-diiodobenzyl alcohol. Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) and stirred, and then a 50% by mass solution of the synthesized 4-hydroxy-3,5-diiodobenzyl alcohol dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 4-hydroxy-3,5-diiodobenzaldehyde. A solution of dimethyl malonate (5.3 g, 40 mmol) and the entire amount of the synthesized 4-hydroxy-3,5-diiodobenzaldehyde was prepared in DMF. A solution of ethylenediamine (0.3 g) dissolved in DMF was then added dropwise, stirring for 1 hour. The mixture was then stirred for 6 hours while maintaining the liquid temperature at 150°C in an oil bath. Ethyl acetate and water were then added, followed by a 2 mol / L aqueous HCl solution, and the pH was adjusted to below 4. The organic phase was then separated by a liquid separation procedure. The resulting organic phase was further washed with a 2 mol / L aqueous sodium carbonate solution, water, and saline, in that order, and then purified by filtration. The solvent was then distilled off from the organic phase to obtain 8.1 g of Compound A1 (4-hydroxy-3,5-diiodostyrene (the compound represented by the following formula (M1))). The inorganic element content and organic impurity content were determined by the above-described methods. The results are shown in Table 1. Example A2: Synthesis of Compound A2 Represented by Formula (M2): In a 2-L flask, 400 mL of dichloromethane, 41 g of the obtained Compound A1, 16.2 g of triethylamine, and 0.7 g of N-(4-pyridyl)dimethylamine (DMAP) were dissolved in a nitrogen stream. 33.6 g of di-tert-butyl dicarbonate was dissolved in 100 mL of dichloromethane and added dropwise to the 2-L flask while stirring. The mixture was then stirred at room temperature for 3 hours. The organic phase was then washed three times with 100 mL of water, and the solvent was distilled off. The original components were removed by silica gel chromatography using dichloromethane / hexane. The solvent was further distilled off to obtain 4.5 g of the target compound A1 substituted with a BOC group (the compound represented by Formula (M2), hereinafter also referred to as "Compound A2"). The inorganic element content and organic impurity content were determined by the above method. The results are shown in Table 1. Example A3: Synthesis of Compound A3 Represented by Formula (M3): In a 2-L flask, 400 mL of dichloromethane, 41 g of the obtained Compound A1, 16.2 g of triethylamine, and 0.7 g of N-(4-pyridyl)dimethylamine (DMAP) were dissolved in a nitrogen stream. 20.7 g of dimethyl dicarbonate was dissolved in 100 mL of dichloromethane and added dropwise to the 2-L flask while stirring. The mixture was then stirred at room temperature for 3 hours. The organic phase was then washed three times with 100 mL of water, and the solvent was distilled off. The original components were removed by silica gel chromatography using dichloromethane / hexane. The solvent was further distilled off to obtain 4.5 g of the target compound A1 substituted with a BOC group (the compound represented by Formula (M3), hereinafter also referred to as "Compound A3"). The inorganic element content and organic impurity content were determined by the above method. The results are shown in Table 1. Example A4: Synthesis of Compound A4 Represented by Formula (M4): In a 2-L flask, 400 mL of dichloromethane, 41 g of the obtained Compound A1, 16.2 g of triethylamine, and 0.7 g of N-(4-pyridyl)dimethylamine (DMAP) were dissolved in a nitrogen stream. 20.7 g of dibenzyl dicarbonate was dissolved in 100 mL of dichloromethane and added dropwise to the 2-L flask while stirring. The mixture was then stirred at room temperature for 3 hours. The organic phase was then washed three times with 100 mL of water, and the solvent was distilled off. The original components were removed by silica gel chromatography using dichloromethane / hexane. The solvent was further distilled off to obtain 4.5 g of the target compound A1 substituted with a BOC group (the compound represented by Formula (M4), hereinafter also referred to as "Compound A4"). The inorganic element content and organic impurity content were determined by the above method. The results are shown in Table 1. Example A5: Synthesis of Compound A5 Represented by Formula (M5): A 200 mL glass flask was used as a reaction vessel. 5.6 g (40 mmol) of 3,4-dihydroxybenzyl alcohol was dissolved in butanol as a solvent. A 20% by mass aqueous iodine chloride solution (81.2 g, 100 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the 3,4-dihydroxybenzyl alcohol and iodine chloride to react. A sodium thiosulfate solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 11.3 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 3,4-dihydroxy-2,5-diiodobenzyl alcohol. Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) was added and stirred, and then a 50% by mass solution of the synthesized 3,4-dihydroxy-2,5-diiodobenzyl alcohol dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 3,4-dihydroxy-2,5-diiodobenzaldehyde. A solution of dimethyl malonate (5.3 g, 40 mmol) and the entire amount of the synthesized 3,4-dihydroxy-2,5-diiodobenzaldehyde was prepared in DMF. A solution of ethylenediamine (0.3 g) dissolved in DMF was then added dropwise, stirring for 1 hour. The mixture was then stirred for 6 hours while maintaining the liquid temperature at 150°C in an oil bath. Ethyl acetate and water were then added, followed by a 2 mol / L aqueous HCl solution, and the pH was adjusted to below 4. The organic phase was then separated by a separation process. The resulting organic phase was washed sequentially with a 2 mol / L aqueous sodium carbonate solution, water, and saline, followed by purification by filtration. The solvent was then distilled off from the organic phase, yielding 7.8 g of Compound A5 (3,4-dihydroxy-2,5-diiodostyrene (the compound represented by the following formula (M5))). The inorganic element content and organic impurity content were determined by the above method. The results are shown in Table 1. Example A6: Synthesis of Compound A6 Represented by Formula (M6): A 200 mL glass flask was used as a reaction vessel. 5.6 g (40 mmol) of 3,5-dihydroxybenzyl alcohol was dissolved in butanol as a solvent. A 20% by mass aqueous iodine chloride solution (105.6 g, 130 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the 3,5-dihydroxybenzyl alcohol and iodine chloride to react. A sodium thiosulfate solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 14.4 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 3,5-dihydroxy-2,4,6-triiodobenzyl alcohol. Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) and stirred, and then a 50% by mass solution of the synthesized 3,5-dihydroxy-2,4,6-triiodobenzyl alcohol dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 3,5-dihydroxy-2,4,6-triiodobenzaldehyde. A solution of dimethyl malonate (5.3 g, 40 mmol) and the entire amount of the synthesized 3,4-dihydroxy-2,5-diiodobenzaldehyde was prepared in DMF. A solution of ethylenediamine (0.3 g) dissolved in DMF was then added dropwise, stirring for 1 hour. The mixture was then stirred for 6 hours while maintaining the liquid temperature at 150°C in an oil bath. Ethyl acetate and water were then added, followed by a 2 mol / L aqueous HCl solution, and the pH was adjusted to below 4. The organic phase was then separated by a separation process. The resulting organic phase was washed sequentially with a 2 mol / L aqueous sodium carbonate solution, water, and saline, followed by purification by filtration. The solvent was then distilled off from the organic phase to obtain 9.8 g of Compound A6 (3,5-dihydroxy-2,4,6-triiodostyrene (the compound represented by the following formula (M6))). The inorganic element content and organic impurity content were determined by the above method. The results are shown in Table 1. Example A7: Synthesis of Compound A7 Represented by Formula (M7) In a 200 mL container equipped with a stirrer, cooling tube, and burette, 4.61 g (12.4 mmol) of Compound A1 obtained in Example A1 and 2.42 g (12.4 mmol) of tert-butyl bromoacetate were added to 100 mL of acetone. Potassium carbonate (1.71 g (12.4 mmol)) and 18-crown-6 (IUPAC name: 1,4,7,10,13,16-hexaoxacyclooctadecane) were then added. The mixture was stirred under reflux for 3 hours to allow the reaction to proceed, yielding a reaction solution. The reaction solution was then concentrated, and 100 g of pure water was added to the concentrate to precipitate the reaction product. After cooling to room temperature, the solid was separated by filtration. The resulting solid was filtered, dried, and then purified by column chromatography to yield 3.2 g of Compound A7 (the compound represented by Formula (M7)). In addition, the inorganic element content and organic impurity content were measured by the above method, and the results are shown in Table 1. Example A8: Synthesis of Compound A8 Represented by Formula (M8) 3,5-diiodo-4-hydroxybenzaldehyde was obtained by the same steps as those described in Example A1. Specifically, the following method was used. (Step 1) Iodination Reaction: Using a 200 mL glass flask as a reaction vessel, 5.52 g (40 mmol) of 4-hydroxybenzyl alcohol was dissolved in butanol as a solvent. A 20% by mass aqueous solution of iodine chloride (81.2 g, 100 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the 4-hydroxybenzyl alcohol and iodine chloride to react. Aqueous sodium thiosulfate solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 15.3 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 4-hydroxy-3,5-diiodobenzyl alcohol. (Step 2) Oxidation reaction: Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) and stirred, and then a 50% by mass solution of the synthesized 4-hydroxy-3,5-diiodobenzyl alcohol dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 14.5 g of 4-hydroxy-3,5-diiodobenzaldehyde. (Step 3) Malonic Acid Addition Reaction: Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 14.6 g (38 mmol) of 3,5-diiodo-4-hydroxybenzaldehyde was mixed with dimethyl malonate (10.6 g, 80 mmol), piperidine (3.4 g, 40 mmol), acetic acid (2.4 g, 40 mmol), and benzene 40 mL, and the mixture was reacted under reflux for 3 hours. The obtained reaction solution was washed with 20 mL of a 5% by mass HCl aqueous solution and then diluted with 5% NaHCO The obtained organic phase was dried over magnesium sulfate and then concentrated under reduced pressure to obtain 15.8 g of the reaction product M8-CINMe. (Step 4) Hydrolysis Reaction: Using a 1 L eggplant-shaped flask connected to a reflux line, 38 mmol of the product M8-CINMe obtained above was supplemented with hydrochloric acid (6N, 131 mL) and acetic acid (131 mL) and refluxed for 48 hours. After adding 500 mL of 6 M NaOH aq., the mixture was extracted with 250 mL of ethyl acetate, and the organic phase containing ethyl acetate was recovered. The resulting organic phase was dehydrated with magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain 15.2 g of the cinnamic acid derivative M8-CINMe. (Step 5) Decarboxylation Reaction: Using a 1 L eggplant flask, a solution of 40 mmol of the cinnamic acid derivative M8-CIN prepared by the above method dissolved in 40 mL of dimethylsulfoxide was slowly added at 10°C with a solution of 0.13 g (0.4 mmol) of tetrabutylammonium fluoride trihydrate dissolved in 20 mL of dimethylsulfoxide. The mixture was then heated to 40°C and stirred for 12 hours. The resulting reaction solution was washed three times with 20 mL of pure water, dried over magnesium sulfate, and the filtrate was filtered and concentrated under reduced pressure to obtain 14.4 g of the compound (M8-OH) represented by the formula (M8-OH). (Step 6) Acetyl Protecting Group Introduction Reaction: Using a 1 L eggplant-shaped flask, 6.1 g (60 mmol) of acetic anhydride, 6.0 g (60 mmol) of triethylamine, 0.8 g (6 mmol) of DMAP, and 350 mL of a solvent (dichloromethane) were placed in a 1 L eggplant-shaped flask at 4°C with ice water and stirred to dissolve the mixture. A solution of compound M8-OH (14.4 g, 37 mmol) was dissolved in 50 mL of dichloromethane while cooling the mixture to 4°C. This solution was then added to the solution in the 1 L eggplant-shaped flask over 30 minutes. The mixture was then stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain a reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to separate 14.8 g of the target compound A8 represented by formula (M8). The yield was 90% by mass. 1 The following peaks were observed during H-NMR measurement, confirming the chemical structure described above. δ (ppm) (d6-DMSO): 2.3 (3H, -CH3), 7.7 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) Example A9: Synthesis of Compound A9 Represented by Formula (M9) Compound A9 represented by Formula (M9) was synthesized by the method described below. (Step 1) A 200 mL glass flask was used as a reaction container, and 5.52 g (40 mmol) of 3,4-dihydroxybenzaldehyde was dissolved in methanol as a solvent. Then, a 20% by mass aqueous solution of iodine chloride (81.2 g, 100 mmol) was added dropwise under ice cooling for 60 minutes. Furthermore, under ice cooling, 4.90 g (20 mmol) of a 71.9% by mass aqueous solution of iodic acid was added dropwise at a liquid temperature of 8°C or less for 30 minutes. Thereafter, the mixture was stirred at 40°C for 3 hours to react 3,4-dihydroxybenzaldehyde with iodine chloride. After adding an aqueous solution of sodium thiosulfate to the reaction solution after the reaction and stirring for 1 hour, the liquid temperature was cooled to 10°C. The precipitate precipitated by cooling was separated by filtration, washed, and dried to obtain 15.3 g of a white object. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), and the result confirmed the presence of 2,5-diiodo-3,4-dihydroxybenzaldehyde. (Step 2) Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 15.3 g (39 mmol) of 2,5-diiodo-3,4-dihydroxybenzaldehyde was mixed with malononitrile (3.97 g, 60 mmol), piperidine (3.4 g, 40 mmol), acetic acid (2.4 g, 40 mmol), and benzene (40 mL). The mixture was reacted under reflux for 3 hours. The resulting reaction solution was washed with 20 mL of a 5% by mass aqueous HCl solution and then with a 5% aqueous NaHCO3 solution. The resulting organic phase was dried over magnesium sulfate and concentrated under reduced pressure to obtain the reaction product represented by the following formula: M9-CN. (Step 3) Using a 1 L eggplant-shaped flask connected to a reflux tube, 39 mmol of the product M9-CN obtained above was supplemented with hydrochloric acid (6 N, 131 mL) and acetic acid (131 mL), and refluxed for 48 hours. After adding 500 mL of 6 M NaOH aq., the mixture was extracted with 250 mL of ethyl acetate, and the organic phase containing ethyl acetate was recovered. The obtained organic phase was dehydrated with magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain 16.4 g (38 mmol) of the cinnamic acid derivative represented by (M9-CA) below. (Step 4) Decarboxylation Reaction: Using a 1 L eggplant flask, a solution of 38 mmol of the cinnamic acid derivative M9-CA prepared by the above method dissolved in 40 mL of dimethylsulfoxide was slowly added at 10°C with a solution of 0.13 g (0.4 mmol) of tetrabutylammonium fluoride trihydrate dissolved in 20 mL of dimethylsulfoxide. The mixture was then heated to 40°C and stirred for 12 hours. The resulting reaction solution was washed three times with 20 mL of pure water, dried over magnesium sulfate, and the filtrate obtained after filtration was concentrated under reduced pressure to obtain 14.4 g (37 mmol) of the compound (M9-OH) represented by the formula (M9-OH). (Step 5) Acetyl Protecting Group Introduction Reaction: Using a 1 L eggplant flask, 6.1 g (60 mmol) of acetic anhydride, 6.0 g (60 mmol) of triethylamine, 0.8 g (6 mmol) of DMAP, and 350 mL of a solvent (dichloromethane) were placed in a 1 L eggplant flask at 4°C with ice water and stirred to dissolve the mixture. A solution of compound M9-OH (14.4 g, 37 mmol) was dissolved in 50 mL of dichloromethane while cooling the mixture to 4°C. This solution was then added to the solution in the 1 L eggplant flask over 30 minutes. The mixture was then stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain a reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to separate 16.5 g of the target compound A9 represented by the compound formula (M9). The yield was 88% by mass. 1 The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 7.4 (1H, Ph), 7.4 (1H, -CH=), 5.6 (1H, =CH2), 5.7 (1H, =CH2) Example A10: Synthesis of Compound A10 Represented by Formula (M10) Compound A10 represented by Formula (M10) was synthesized by the method described below. (Step 1) A 200 mL glass flask was used as a reaction vessel, and 5.52 g (40 mmol) of 3,5-dihydroxybenzaldehyde was dissolved in methanol as a solvent. Then, a 20% by mass aqueous solution of iodine chloride (121.8 g, 150 mmol) was added dropwise under ice cooling for 90 minutes. Furthermore, 7.45 g (30 mmol) of a 71.9% by mass aqueous solution of iodic acid was added dropwise under ice cooling at a liquid temperature of 8°C or below for 30 minutes. Thereafter, the mixture was stirred at 40°C for 3 hours to react 3,5-dihydroxybenzaldehyde with iodine chloride. After adding a sodium thiosulfate aqueous solution to the reaction solution after the reaction and stirring for 1 hour, the liquid temperature was cooled to 10°C. The precipitate precipitated by cooling was separated by filtration, washed, and dried to obtain 20.1 g of a white object. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), and the result confirmed the presence of 2,4,6-triiodo-3,5-dihydroxybenzaldehyde. (Step 2) Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 20.1 g (39 mmol) of 2,4,6-triiodo-3,5-dihydroxybenzaldehyde was mixed with malonic acid (15.6 g, 150 mmol), piperidine (12.8 g, 150 mmol), acetic acid (90 g, 150 mmol), and benzene 40 mL, and the mixture was reacted under reflux for 3 hours. The obtained reaction solution was washed with 20 mL of a 5% by mass HCl aqueous solution and then diluted with 5% NaHCO The obtained organic phase was dried over magnesium sulfate and then concentrated under reduced pressure to obtain 20.6 g of a cinnamic acid derivative (M10-CA). (Step 3) Decarboxylation Reaction: Using a 1 L eggplant flask, a solution of 20.6 g (37 mmol) of the cinnamic acid derivative M10-CA prepared by the above method in 40 mL of dimethylsulfoxide was slowly added at 10°C to a solution of 0.13 g (0.4 mmol) of tetrabutylammonium fluoride trihydrate in 20 mL of dimethylsulfoxide. The mixture was stirred, then heated to 40°C and stirred for 12 hours. The resulting reaction solution was washed three times with 20 mL of pure water, dried over magnesium sulfate, and the filtrate obtained after filtration was concentrated under reduced pressure to obtain 18.0 g (35 mmol) of the compound (M10-OH) represented by the formula (M10-OH). (Step 4) Acetyl Protecting Group Introduction Reaction: A 1 L eggplant-shaped flask was placed at 4°C with ice water. Acetic anhydride (6.1 g, 60 mmol), triethylamine (6.0 g, 60 mmol), DMAP (0.8 g, 6 mmol), and a solvent (dichloromethane) (350 mL) were stirred and dissolved to prepare a reaction solution. While cooling with ice at 4°C, a solution of compound M10-OH (18.0 g, 35 mmol) prepared in the previous step was dissolved in 50 mL of dichloromethane. This solution was added to the solution prepared in the 1 L eggplant-shaped flask over 30 minutes. The reaction was then stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain a reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to isolate 20.3 g of the target compound M10. The yield was 85% by mass. The above-mentioned determination conditions were used 1The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 7.4 (1H, -CH=), 5.6 (1H, =CH2), 5.7 (1H, =CH2) Example A11 and Example A12: Synthesis of Compound A11 Represented by Formula (M11) and Compound A12 Represented by Formula (M12) Compound A11 represented by Formula (M11) and Compound A12 represented by Formula (M12) were synthesized by the method described below. (Step 1) Iodination Reaction: A 200 mL glass flask was used as a reaction vessel. 5.45 g (40 mmol) of 4-hydroxybenzyl alcohol was dissolved in butanol as a solvent. A 20% by mass aqueous solution of iodine chloride (40.6 g, 50 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the 4-hydroxybenzaldehyde and iodine chloride to react. A sodium thiosulfate aqueous solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 10.3 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 4-hydroxy-3-iodobenzyl alcohol. (Step 2) Oxidation reaction: Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) and stirred, and then a 50% by mass solution of the synthesized 4-hydroxy-3-iodobenzyl alcohol dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 14.5 g of 4-hydroxy-3-iodobenzaldehyde. (Step 3) Malonic Acid Addition Reaction: Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 14.6 g (38 mmol) of 4-iodo-3-hydroxybenzaldehyde was mixed with dimethyl malonate (10.6 g, 80 mmol), piperidine (3.4 g, 40 mmol), acetic acid (2.4 g, 40 mmol), and benzene (40 mL). The mixture was reacted under reflux for 3 hours. The resulting reaction solution was washed with 20 mL of a 5% aqueous HCl solution and then with a 5% aqueous NaHCO solution. The resulting organic phase was dried over magnesium sulfate and concentrated under reduced pressure to obtain 13.4 g of the reaction product, M11-CINMe. (Step 4) Hydrolysis Reaction: Using a 1 L eggplant-shaped flask connected to a reflux line, the product M11-CINMe13.4 (37 mmol) obtained above was supplemented with hydrochloric acid (6 N, 131 mL) and acetic acid (131 mL). The reaction was refluxed for 48 hours. After adding 500 mL of 6 M NaOH aq., the product was extracted with 250 mL of ethyl acetate, and the organic phase containing ethyl acetate was recovered. The organic phase was dehydrated with magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain 0.4 g of the cinnamic acid derivative MA11-CA1. (Step 5) Decarboxylation reaction: Using a 1L eggplant-shaped flask, a solution of cinnamic acid derivative MA11-CA10.4 (36 mmol) prepared by the above method dissolved in 40 mL of dimethylsulfoxide was slowly added at 10°C to a solution of 0.13 g (0.4 mmol) of tetrabutylammonium fluoride trihydrate dissolved in 20 mL of dimethylsulfoxide and stirred. The mixture was then heated to 40°C and stirred for 12 hours. The obtained reaction solution was washed three times with 20 mL of pure water and dried over magnesium sulfate. The filtrate obtained after filtration was concentrated under reduced pressure to obtain 8.6 g of compound (A11) represented by formula (M11). The above-mentioned determination conditions were also used. 1 The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 2.3 (3H, -CH3), 7.7 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) (Step 6) Acetyl Protecting Group Introduction Reaction: Using a 1 L eggplant flask, 6.1 g (60 mmol) of acetic anhydride, 6.0 g (60 mmol) of triethylamine, 0.8 g (6 mmol) of DMAP, and 350 mL of a solvent (dichloromethane) were placed in a 1 L eggplant flask at 4°C with ice water and stirred to dissolve the mixture. Under ice cooling at 4°C, 8.6 g (36 mmol) of Compound A11 prepared in the previous step was dissolved in 50 mL of dichloromethane to prepare a solution of Compound A11. This solution was added to the solution prepared in the 1 L eggplant flask over 30 minutes. The reaction was then stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain a reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to separate 10.0 g of the target compound A12 represented by formula (M12). The yield was 88% by mass. 1The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 2.3 (3H, -CH3), 7.7 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) Examples A13 and A14: Synthesis of Compound A13 and Compound A14 Represented by Formula (M13) and Formula (M14) Compound A13 represented by Formula (M13) and Compound A14 represented by Formula (M14) were synthesized by the method described below. (Step 1) A 200 mL glass flask was used as a reaction container, and 5.52 g (40 mmol) of 3,4-dihydroxybenzaldehyde was dissolved in methanol as a solvent. Then, a 20% by mass aqueous solution of iodine chloride (40.6 g, 50 mmol) was added dropwise under ice cooling for 60 minutes. Furthermore, 2.45 g (10 mmol) of a 71.9% by mass aqueous solution of iodic acid was added dropwise under ice cooling at a liquid temperature of 8°C or below for 30 minutes. Thereafter, the mixture was stirred at 40°C for 3 hours to react 3,4-dihydroxybenzaldehyde with iodine chloride. After adding an aqueous solution of sodium thiosulfate to the reaction solution after the reaction and stirring for 1 hour, the liquid temperature was cooled to 10°C. The precipitate precipitated by cooling was separated by filtration, washed, and dried to obtain 10.2 g of a white object. The white substance was further analyzed by liquid chromatography-mass spectrometry (LC-MS) using silica gel chromatography, and the result confirmed the presence of 2-iodo-3,4-dihydroxybenzaldehyde. (Step 2) Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 10.3 g (39 mmol) of 2-iodo-3,4-dihydroxybenzaldehyde was mixed with malononitrile (3.97 g, 60 mmol), piperidine (3.4 g, 40 mmol), acetic acid (2.4 g, 40 mmol), and benzene 40 mL, and the mixture was reacted under reflux for 3 hours. The obtained reaction solution was washed with 20 mL of a 5% by mass HCl aqueous solution and then diluted with 5% by mass NaHCO The obtained organic phase was dried over magnesium sulfate and then concentrated under reduced pressure to obtain 11.9 g of the reaction product (M13-CINMe). (Step 3) Using a 1 L eggplant-shaped flask connected to a reflux tube, hydrochloric acid (6 N, 131 mL) and acetic acid (131 mL) were added to the product 11.9 g (38 mmol) obtained above, and refluxed for 48 hours. After adding 500 mL of 6 M NaOH aq., the mixture was extracted with 250 mL of ethyl acetate, and the organic phase containing ethyl acetate was recovered. The obtained organic phase was dehydrated with magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain 11.6 g of the cinnamic acid derivative (M13-CA). (Step 4) Decarboxylation reaction: Using a 1L eggplant-shaped flask, a solution of 0.023g (0.4mmol) of potassium fluoride trihydrate dissolved in 4mL of acetic acid and 16mL of dimethylsulfoxide was slowly added at 10°C to a solution of 11.6g (38mmol) of the cinnamic acid derivative prepared by the above method dissolved in 40mL of dimethylsulfoxide and stirred, and then the temperature was raised to 40°C and stirred for 12 hours. The obtained reaction solution was washed three times with 20mL of pure water, dried with magnesium sulfate, and the filtrate obtained after filtration was concentrated under reduced pressure to obtain 9.1g of compound A13 represented by formula (M13). The above-mentioned determination conditions were also used. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of Compound A13. δ (ppm) (d6-DMSO): 9.5 (1H, OH), 9.6 (1H, OH), 7.0 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) (Step 5) Acetyl Protecting Group Introduction Reaction: Using a 1 L eggplant flask, 6.1 g (60 mmol) of acetic anhydride, 6.0 g (60 mmol) of triethylamine, 0.8 g (6 mmol) of DMAP, and 350 mL of a solvent (dichloromethane) were placed in a 1 L eggplant flask at 4°C with ice water and stirred to dissolve the mixture. A solution of Compound A13 (9.1 g, 35 mmol) was dissolved in 50 mL of dichloromethane under ice cooling at 4°C. This solution was added to the solution in the 1 L eggplant flask over 30 minutes. The mixture was stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain a reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to separate 12.1 g of the target compound A14 represented by the formula (M14). 1H-NMR analysis revealed the following peaks, confirming the chemical structure of Compound A14. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 7.7 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) Examples A15 and A16: Synthesis of Compounds A15 and A16 Represented by Formula (M15) and (M16) Compound A15 represented by Formula (M15) and Compound A16 represented by Formula (M16) were synthesized by the method described below. (Step 1) Formation of 4-iodo-3,5-dihydroxybenzaldehyde A 200 mL glass flask was used as a reaction vessel, and 5.52 g (40 mmol) of 3,5-dihydroxybenzaldehyde was dissolved in methanol as a solvent. Then, a 20% by mass aqueous solution of iodine chloride (40.6 g, 50 mmol) was added dropwise under ice cooling for 60 minutes. Furthermore, under ice cooling, 2.45 g (10 mmol) of a 71.9% by mass aqueous solution of iodic acid was added dropwise at a liquid temperature of 8°C or less for 30 minutes. Thereafter, the mixture was stirred at 40°C for 3 hours to allow 3,5-dihydroxybenzaldehyde to react with iodine chloride. After adding a sodium thiosulfate aqueous solution to the reaction solution and stirring for 1 hour, the liquid temperature was cooled to 10°C. The precipitate precipitated by cooling was separated by filtration, washed, and dried to obtain 10.2 g of a white object. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), and the result confirmed the presence of 4-iodo-3,5-dihydroxybenzaldehyde. (Step 2) Formation of Cinnamic Acid Derivative Structure Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 10.3 g (39 mmol) of 4-iodo-3,5-dihydroxybenzaldehyde was mixed with malonic acid (6.24 g, 60 mmol), piperidine (3.4 g, 40 mmol), acetic acid (2.4 g, 40 mmol), and benzene 40 mL, and the mixture was reacted under reflux for 3 hours. The obtained reaction solution was washed with 20 mL of a 5% by mass HCl aqueous solution and then diluted with 5% NaHCO The obtained organic phase was dried over magnesium sulfate and then concentrated under reduced pressure to obtain 11.7 g of a reaction product (M15-CA) containing a cinnamic acid derivative. (Step 3) Decarboxylation reaction: Using a 1L eggplant-shaped flask, 11.7 g (38 mmol) of the cinnamic acid derivative (M15-CA) prepared by the above method was dissolved in 40 mL of dimethylsulfoxide. A solution of 0.13 g (0.4 mmol) of tetrabutylammonium fluoride trihydrate dissolved in 20 mL of dimethylsulfoxide was slowly added at 10°C and stirred. The temperature was raised to 40°C and stirred for 12 hours. The obtained reaction solution was washed three times with 20 mL of pure water, dried with magnesium sulfate, and the filtrate obtained after filtration was concentrated under reduced pressure to obtain 9.4 g of the compound (A15) represented by the formula (M15). The above-mentioned determination conditions were also used. 1 The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 11.6 (2H, OH), 6.0 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) (Step 4) Acetyl Protecting Group Introduction Reaction: Using a 1 L eggplant flask, 6.1 g (60 mmol) of acetic anhydride, 6.0 g (60 mmol) of triethylamine, 0.8 g (6 mmol) of DMAP, and 350 mL of a solvent (dichloromethane) were placed in a 1 L eggplant flask at 4°C with ice water and stirred to dissolve the mixture. A solution of Compound A15 (9.4 g, 36 mmol) was dissolved in 50 mL of dichloromethane while cooling the mixture to 4°C. This solution was then added to the solution in the 1 L eggplant flask over 30 minutes. The mixture was then stirred at 4°C for 2 hours to allow the reaction to proceed fully. The mixture was then washed thoroughly with 400 mL of ice water and 400 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtrate was concentrated under reduced pressure to obtain the reaction product. The product was further purified by column chromatography and the developing solvent was distilled off to separate the target compound A16, 12.3 g. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of Compound A16. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 6.7 (2H, Ph), 6.7 (1H, -CH=), 5.3 (1H, =CH2), 5.7 (1H, =CH2) Synthesis Example ACL1: Synthesis of Compound MCL1 Represented by Formula (MCL1) Compound MCL1 represented by Formula (MCL1) was synthesized by the method described below. (Step 1) Diiodination of 4-hydroxyacetophenone A 200 mL glass flask was used as a reaction vessel. After dissolving 6.1 g (45 mmol) of 4-hydroxyacetophenone in butanol as a solvent, a 20% by mass aqueous solution of iodine chloride (81.2 g, 100 mmol) was added dropwise at 50°C for 60 minutes. The mixture was stirred at 50°C for 2 hours to allow 4-hydroxyacetophenone to react with iodine chloride. A sodium thiosulfate aqueous solution was added to the reaction solution after the reaction and stirred for 1 hour. The solution was then cooled to 10°C. The precipitate separated by cooling was filtered, washed, and dried to obtain 16.3 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), and the result confirmed the presence of 4-hydroxy-3,5-diiodoacetophenone. (Raw material acetophenone derivative) Mw387.94, (Step 2) Introduce a chlorine group at the α position into a flask. Stir 0.6 g (6.1 mmol) of CuCl, 1.3 g (13 mmol) of triethylamine, 5.2 g (34 mmol) of POCl3 (phosphorus oxychloride (V)), and 15 mL of heptane at 25°C, add 16.3 g (42 mmol) of 4-hydroxy-3,5-diiodoacetophenone prepared in step 1 and dissolve it. After heating the solution to 100°C and reacting for 20 hours, cool it to 45°C, and drop 25 mL of pure water to terminate the reaction. After removing the water layer, perform liquid separation, wash with pure water (10 mL) and saturated brine (10 mL), and then add magnesium sulfate for dehydration. The compound described in formula (MCL1) is obtained by concentrating the filtrate after filtration. The above-mentioned determination conditions are also used. 1 The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 9.6 (1H, -OH), 7.5 (2H, Ph), 5.4 (1H, =CH2), 5.7 (1H, =CH2) (Target) Mw406.39 Synthesis Example AD1: Synthesis of Compound MD1 Represented by Formula (MD1) Compound MD1 represented by Formula (MD1) was synthesized by the method described below. Add 15.6 g of 1-(4-hydroxy-3,5-diiodophenyl)ethanol, 0.12 g of concentrated sulfuric acid, 0.04 g of 4-hydroxy-2,2,6,6-tetramethylpiperidinyl 1-oxyl radical, and 1.60 mL of DMSO to the reactor and begin stirring. Then, using a Dean-Stark filter and a capacitor, adjust the pressure to reflux at 120°C and begin flowing air into the reaction solution at a flow rate of 1 mL / min. Water recovered in the Dean-Stark filter was appropriately discharged from the system. The reactor was then immersed in a 90°C water bath and stirred continuously for 30 hours. The reactor was then immersed in a 25°C water bath and the reaction solution was cooled. While vigorously stirring, the reaction solution was slowly added to 400 g of a 0.1% by mass sodium bisulfite aqueous solution and mixed. The precipitate was separated by filtration using a suction filter, squeezed, and washed with 200 mL of a 33.3% by volume methanol aqueous solution. The obtained precipitate was generated by column chromatography, and only the main component was separated. The solvent was distilled off by evaporation, and the solid obtained was vacuum dried at 40°C to obtain 9.7g of a white object. The yield was 66%. The results of liquid chromatography-mass spectrometry (LC-MS) analysis showed that the molecular weight was 743.9, and it was confirmed to be compound MD1 represented by formula (MD1). The above-mentioned determination conditions were also used. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of compound MD1. δ (ppm) (d6-DMSO): 9.6 (2H, OH), 7.5 (2H, Ph), 7.9 (2H, Ph), 3.5 (1H, -CH-), 1.3 (3H, -CH3), 4.9 (1H, =CH2), 5.3 (1H, =CH2) Synthesis Example AD2: Synthesis of Compound MD2 Represented by Formula (MD2) Compound MD2 represented by Formula (MD2) was synthesized by the method described below. Add 15.6 g of 1-(4-hydroxy-3,5-diiodophenyl)ethanol, 0.12 g of concentrated sulfuric acid, 0.2 g of 4-methoxyphenol, and 150 mL of toluene to a reactor and begin stirring. Then, using a Dean-Stark filter and a capacitor, reflux at 113°C while introducing air at a rate of 1 mL / min into the reaction solution. Water recovered in the Dean-Stark filter was appropriately discharged from the system. The reactor was then immersed in a 90°C water bath and stirred continuously for 30 hours. The reactor was then immersed in a 25°C water bath to cool the reaction solution. While vigorously stirring, the reaction solution was slowly added to 400 g of a 0.1% by mass sodium bisulfite aqueous solution and mixed. The precipitate was separated by filtration using a suction filter, squeezed, and washed with 200 mL of a 33.3% by volume methanol aqueous solution. The resulting precipitate was separated by column chromatography to isolate the main component. The solvent was then removed by evaporation, and the resulting solid was vacuum-dried at 40°C to yield 5.9 g of a white substance. The yield was 41%. Analysis by liquid chromatography-mass spectrometry (LC-MS) determined the molecular weight to be 743.89, confirming it to be compound MD2 represented by formula (MD2). The above-mentioned determination conditions were used 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of compound MD2. δ (ppm) (d6-DMSO): 9.6 (2H, OH), 7.5 (2H, Ph), 7.6 (2H, Ph), 2.3 (2H, -CH2-), 2.6 (2H, -CH2-), 4.9 (1H, =CH2), 5.3 (1H, =CH2) Synthesis Example AD3: Synthesis of Compound MD3 Represented by Formula (MD3) Compound MD3 represented by Formula (MD3) was synthesized by the method described below. The following steps were performed using compound MD1 synthesized above. In a 1-L eggplant flask, 1.57 g of acetic anhydride, 1.53 g of triethylamine, 0.19 g of DMAP, and 35 mL of solvent (dichloromethane) were placed and stirred to dissolve in a 1-L eggplant flask at 4°C with ice water to prepare a reaction solution. While cooling with ice at 4°C, 10 mmol of compound MD1 (7.43 g) prepared in the previous step was dissolved in 10 mL of dichloromethane to prepare a solution of compound MD1. This solution was added to the solution prepared in the 1-L eggplant flask over 30 minutes. The reaction was then stirred at 4°C for 2 hours to allow for sufficient reaction. The mixture was then washed thoroughly with 40 mL of ice water and 40 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain the reaction product. The product was further purified using a column chromatography column, and the developing solvent was distilled off to isolate 6.7 g of the target compound MD3. The above-mentioned determination conditions were used 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of compound MD3. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 7.7 (2H, Ph), 8.0 (2H, Ph), 1.3 (3H, -CH3), 3.4 (1H, -CH-), 4.9 (1H, =CH2), 5.3 (1H, =CH2) Synthesis Example AD4: Synthesis of Compound MD4 Represented by Formula (MD4) Compound MD4 represented by Formula (MD4) was synthesized by the method described below. The following steps were performed using compound MD2 synthesized above. In a 1-L eggplant flask, 1.57 g of acetic anhydride, 1.53 g of triethylamine, 0.19 g of DMAP, and 35 mL of solvent (dichloromethane) were placed and stirred to dissolve in a 1-L eggplant flask at 4°C with ice water to prepare a reaction solution. While cooling with ice at 4°C, 7.43 g (10 mmol) of compound MD2 prepared in the previous step was dissolved in 10 mL of dichloromethane to prepare a solution of compound MD2. This solution was added to the solution prepared in the 1-L eggplant flask over 30 minutes. The reaction was then stirred at 4°C for 2 hours to allow for sufficient reaction. The mixture was then washed thoroughly with 40 mL of ice water and 40 mL of brine. The resulting organic phase was dried over magnesium sulfate, and the filtered filtrate was concentrated under reduced pressure to obtain the reaction product. The product was further purified using a column chromatography column, and the solvent was distilled off to isolate 7.1 g of the target compound MD4. The above-mentioned determination conditions were used 1H-NMR analysis revealed the following peaks, confirming the chemical structure of compound MD4. δ (ppm) (d6-DMSO): 2.3 (6H, -CH3), 7.7 (4H, Ph), 2.6 (2H, -CH2-), 2.3 (2H, -CH2), 5.0 (1H, =CH2), 5.3 (1H, =CH2) Example AH1: Synthesis of the compound represented by formula (MH1) (Step 1) A 200 mL glass flask was used as a reaction vessel. After adding 6.24 g (44 mmol) of BF3·OEt2 complex to 4.28 g (40 mmol) of 3-pyridinecarboxaldehyde, 2,2,6,6-tetramethylhexahydropyridylmagnesium chloride lithium chloride complex (100 mL, 44 mmol, 1.2 M / THF) was added at -40°C. After stirring for 30 minutes, 1 was dissolved in 80 mL of THF. 2 (20 g, 80 mmol) solution was slowly added dropwise, and the temperature was raised to 25°C and stirred. After washing with 180 mL of 4Cl saturated aqueous solution, the 2SO The product was washed with 40 mL of aqueous solution and extracted with diethyl ether. After drying by adding sodium sulfate, the obtained diethyl ether solution was concentrated and purified by silica gel chromatography to obtain 5.7 g of the target product, 2-iodo-3-pyridinecarboxaldehyde. (Step 2) Wittig placed 6.4 g (16.8 mmol) of methyltriphenylphosphonium bromide and 20 mL of toluene in a 200 mL glass flask as a reaction vessel and dissolved them. A KTB solution was prepared by dissolving 2.2 g (19.6 mmol) of potassium tert-butoxide in 9 mL of THF. This KTB solution was then added dropwise to the toluene solution in an ice bath while maintaining the temperature below 0°C. The mixture was then stirred for 30 minutes. Furthermore, a solution of 4.66 g (20.0 mmol) of 2-iodo-3-pyridinecarboxaldehyde in 15 mL of toluene was added dropwise while maintaining the temperature below 0°C. The mixture was then stirred for 4 hours. The mixture was then washed with 10 mL of water, 10 mL of 10% sodium bisulfite solution, 10 mL of 5% sodium bicarbonate solution, and 10 mL of pure water, in that order. 8.1 g of the target compound, 3-vinyl-2-iodopyridine represented by formula (MH1), was separated by silica gel column. 1H-NMR analysis revealed the following peaks, confirming the chemical structure of the compound represented by formula (MH1). δ (ppm) (d6-DMSO): 8.0 (1H, Pyridine), 7.4 (1H, Pyridine), 7.2 (1H, Pyridine), 7.1 (1H, -CH=), 5.9 (1H, =CH2), 5.4 (1H, =CH2) Example AH2: Synthesis of the compound represented by formula (MH2) (Step 1) A 200 mL glass flask was used as a reaction vessel. 4.56 g (40 mmol) of 5-oxobutylene-3-carboxaldehyde was dissolved in 20 mL of THF. Then, a lithium diisopropylamide / THF solution (22 mL, 44 mmol, 2 mol / L) was added at -40°C. After stirring for 30 minutes, a solution of I2 (20 g, 80 mmol) dissolved in 80 mL of THF was slowly added dropwise. The mixture was then heated to 25°C and stirred. 3 mL of isopropyl alcohol was then slowly added dropwise and stirred for another 30 minutes. Afterwards, NH After washing with 180 mL of 4Cl saturated aqueous solution, the 2SO The product was washed with 40 mL of aqueous solution and extracted with diethyl ether. After drying by adding sodium sulfate, the obtained diethyl ether solution was concentrated and purified by silica gel chromatography to obtain 6.7 g of the target compound represented by formula (MH2-AL). (Step 2) Wittig placed 6.4 g (16.8 mmol) of methyltriphenylphosphonium bromide and 20 mL of toluene in a 200 mL glass flask as a reaction vessel and dissolved them. A KTB solution was prepared by dissolving 2.2 g (19.6 mmol) of potassium tert-butoxide in 9 mL of THF. This KTB solution was then added dropwise to the toluene solution in an ice bath while maintaining the temperature below 0°C. The mixture was then stirred for 30 minutes. Furthermore, a solution of 4.8 g (20.0 mmol) of 2-iodo-5-oxobutyl-3-carboxaldehyde in 15 mL of toluene was added dropwise while maintaining the temperature below 0°C. The mixture was then stirred for 4 hours. The mixture was then washed with 10 mL of water, 10 mL of 10% sodium bisulfite solution, 10 mL of 5% sodium bicarbonate solution, and 10 mL of pure water, in that order. 8.1 g of the target compound represented by formula (MH2) was separated by silica gel column. 1H-NMR analysis revealed the following peaks, confirming the chemical structure of the compound represented by formula (MH2). δ (ppm) (d6-DMSO): 4.9 (1H, -CH(I)-), 2.93 (1H, -CH(C)), 4.4 (2H, -CH2-O), 5.7 (1H, -CH=), 5.0 (1H, =CH2), 5.1 (1H, =CH2) Synthesis Example B1: Synthesis of 1,3-divinylbenzene (Malonate Addition Reaction Step) Using a 200 mL eggplant flask connected to a Dean-Stark reflux tube, 5.36 g (40 mmol) of 1,3-benzenedicarboxylic acid aldehyde was mixed with malonic acid (10.4 g, 100 mmol), piperidine (6.8 g, 80 mmol), acetic acid (4.8 g, 80 mmol), and benzene 80 mL, and the mixture was reacted under reflux for 3 hours. The obtained reaction solution was washed with 40 mL of a 5% by mass HCl aqueous solution and then diluted with 5% NaHCO The obtained organic phase was dried over magnesium sulfate and then concentrated under reduced pressure to obtain 8.3 g of a reaction product containing a cinnamic acid derivative. (Decarboxylation reaction step) Using a 1L eggplant flask, 8.3g (38mmol) of the cinnamic acid derivative prepared by the above method was dissolved in 40mL of dimethylsulfoxide. Then, 0.13g (0.4mmol) of tetrabutylammonium fluoride trihydrate was slowly added to the solution at 10°C and stirred. The mixture was then heated to 40°C and stirred for 12 hours. The obtained reaction solution was washed three times with 20mL of pure water, dried with magnesium sulfate, and the filtrate obtained after filtration was concentrated under reduced pressure to obtain 4.8g of 1,3-divinylbenzene. The above-mentioned determination conditions were also used. 1 The following peaks were observed during H-NMR measurement, confirming the following chemical structure. δ (ppm) (d6-DMSO): 7.2 (1H, Ph), 7.5 (2H, Ph), 6.7 (1H, Ph), 6.7 (2H, -CH=), 5.3 (2H, =CH2), 5.7 (2H, =CH2) Synthesis Example B2: Synthesis of 1,4-divinylbenzene 4.7 g of 1,4-divinylbenzene was obtained by the same method as in the Synthesis Example of 1,3-divinylbenzene, except that 5.36 g of 1,4-benzenedicarboxaldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1The following peaks were observed during H-NMR measurement, confirming the following chemical structure: δ (ppm) (d6-DMSO): 7.3 (4H, Ph), 6.7 (2H, -CH=), 5.3 (2H, =CH2), 5.7 (2H, =CH2) Synthesis Example B3 Synthesis of 4-vinylbiphenyl 5.7 g of 4-vinylbiphenyl was obtained by the same method as in the synthesis example of 1,3-divinylbenzene, except that 7.3 g of 4-phenylbenzaldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of 4-vinylbiphenyl. δ (ppm) (d6-DMSO): 7.4 (1H, Ph), 7.5 (4H, Ph), 7.6 (2H, Ph), 7.8 (2H, Ph), 6.7 (2H, -CH=), 5.3 (2H, =CH2), 5.7 (2H, =CH2) Synthesis Example B4 Synthesis of 2-vinylfuran 3.1 g of 2-vinylfuran was obtained by the same method as in the synthesis example of 1,3-divinylbenzene, except that 3.9 g of 2-furanaldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1 The following peaks were observed during H-NMR measurement, confirming the chemical structure of 2-vinylfuran. δ (ppm) (d6-DMSO): 7.7 (1H, -CH=), 6.5 (1H, -CH=), 7.0 (1H, -CH=), 6.6 (1H, -CH=), 5.8, 5.4 (1H, =CH2) Synthesis Example B5 Synthesis of 2-vinylthiophene 3.5 g of 2-vinylthiophene was obtained by the same method as in the synthesis example of 1,3-divinylbenzene, except that 4.5 g of thiophene-2-aldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of 2-vinylthiophene. δ (ppm) (d6-DMSO): 7.7 (1H, -CH=), 7.0 (1H, -CH=), 7.0 (1H, -CH=), 6.6 (1H, -CH=), 5.4 (1H, =CH2), 5.9 (1H, =CH2) Synthesis Example B6 Synthesis of 3-vinylfuran 2.6 g of 3-vinylfuran was obtained by the same method as in the synthesis example of 1,3-divinylbenzene, except that 3.9 g of 3-furanaldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of 3-vinylfuran. δ (ppm) (d6-DMSO): 7.3 (1H, -CH=), 8.2 (1H, -CH=), 6.8 (1H, -CH=), 7.1 (1H, -CH=), 5.9 (1H, =CH2), 5.4 (1H, =CH2) Synthesis Example B7 Synthesis of 3-vinylthiophene 2.9 g of 3-vinylthiophene was obtained by the same method as in the synthesis example of 1,3-divinylbenzene, except that 4.5 g of thiophene-3-aldehyde was used instead of 1,3-benzenedicarboxaldehyde. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of 3-vinylthiophene. δ (ppm) (d6-DMSO): 7.8 (1H, -CH=), 7.7 (1H, -CH=), 7.2 (1H, -CH=), 7.1 (1H, -CH=), 5.4 (1H, =CH2), 5.9 (1H, =CH2) Example AZ1: Synthesis of Compound AZ1 Represented by Formula (MZ1): A 200 mL glass flask was used as a reaction vessel. 4.9 g (40 mmol) of cumene was dissolved in butanol as a solvent. A 20% by mass aqueous solution of iodine chloride (121.8 g, 150 mmol) was then added dropwise at 50°C over 60 minutes. The mixture was then stirred at 50°C for 2 hours to allow the cumene and iodine chloride to react. A sodium bisulfate aqueous solution was added to the reaction solution, stirred for 1 hour, and then cooled to 10°C. The precipitate formed upon cooling was filtered, washed, and dried to obtain 16.3 g of a white substance. A sample of the white substance was analyzed by liquid chromatography-mass spectrometry (LC-MS), confirming the presence of 2,4,6-triiodoisopropylbenzene. Add MnO to dichloromethane solvent 2 (3.4 g, 40 mmol) was added and stirred, and a 50% by mass solution of the synthesized 2,4,6-triiodoisopropylbenzene dissolved in dichloromethane was added dropwise while stirring for 1 hour. After stirring at room temperature for 4 hours, the reaction solution was filtered and separated, and the solvent was distilled off to obtain 16.1 g (31 mmol) of 2,4,6-triiodoisopropylbenzene. A 500 mL glass flask equipped with a Dean-Stark tube was used as a reaction vessel. The entire amount of the obtained 2,4,6-triiodo-1'-hydroxyisopropylbenzene was dissolved in toluene. 0.6 g (6 mmol) of concentrated sulfuric acid was then added dropwise while stirring. The mixture was then allowed to react under reflux for 4 hours, yielding 13.3 g of compound AZ1 (α-methyl-2,4,6-triiodostyrene (compound represented by formula (MZ1))). The inorganic element content and organic impurity content were determined using the above method, and the results are shown in Table 1. Example AZ2: Synthesis of Compound AZ2 Represented by Formula (MZ2) A 200 mL glass flask was used as a reaction vessel, and MeCN (80 mL) and p-Toluenesulfonic acid・H 2O (22.82 g, 120 mmol), 2,4,6-triaminophenyl-1-ethanone 3.3 g (20 mmol). After the obtained suspension solution was cooled to 0-5 ° C, NaNO A solution of 2 (4.14 g, 60 mmol) dissolved in water (9 mL) and a solution of KI (12.5 g, 75 mmol) dissolved in water (9 mL) were stirred at 0-5°C for 10 minutes, then warmed to room temperature and stirred at the same temperature for 2 hours. Water (350 mL) was added to the reaction solution, and 1M NaHCO 3 aqueous solution was adjusted to pH 9. 2M Na 2S 2O 3 aqueous solution (40 mL) and extracted with EtOAc. The obtained organic layer was concentrated under reduced pressure and purified by silica gel chromatography (n-hexane: EtOAc = 10:1) to obtain 8.5 g of 2',4',6'-triiodoacetophenone (yield 86%). Step 2: Styrenation Reaction: Place 6.4 g (16.8 mmol) of methyltriphenylphosphonium bromide and 20 mL of toluene in a 200 mL glass flask as a reaction vessel and dissolve them. Prepare a KTB solution by dissolving 2.2 g (19.6 mmol) of potassium tert-butoxide in 9 mL of THF. This KTB solution is then added dropwise to the toluene solution in an ice bath while maintaining the temperature below 0°C. Stirring is then continued for 30 minutes. Furthermore, a solution of 8.5 g (17.1 mmol) of 2',4',6'-triiodoacetophenone in 15 mL of toluene is added dropwise while maintaining the temperature below 0°C. Stirring is then continued for 4 hours. The mixture is then washed with 10 mL of water, 10 mL of 10% sodium bisulfite solution, 10 mL of 5% sodium bicarbonate solution, and 10 mL of pure water, in that order. 5.9 g of the target compound AZ2 (2,4,6-triiodophenyl-1-isopropene (compound represented by formula (MZ2))) was separated by silica gel column. 1 The following peaks were observed during H-NMR analysis, confirming the chemical structure of 2,4,6-triiodophenyl-1-isopropene. δ (ppm) (d6-DMSO): 7.9 (2H, Ph), 2.1 (1H, -CH=), 5.1 (2H, =CH2) Example AZ3: Synthesis of compound AZ3 represented by formula (MZ3) Step 1: Sandmeier (Synthesis of 4'-iodoacetophenone) A 200 mL glass flask was used as a reaction vessel, and MeCN (80 mL) was added. p-Toluenesulfonic acid・H 2O (11.41 g, 60 mmol), 4'-aminoacetophenone (2.70 g, 20 mmol). After the obtained suspension solution was cooled to 0-5°C, NaNO A solution of 2 (2.76 g, 40 mmol) dissolved in water (6 mL) and a solution of KI (8.3 g, 50 mmol) dissolved in water (6 mL) were stirred at 0-5°C for 10 minutes, then warmed to room temperature and stirred at the same temperature for 2 hours. Water (350 mL) was added to the reaction solution, and 1M NaHCO 3 aqueous solution was adjusted to pH 9. 2M Na 2S 2O 3 aqueous solution (40 mL) and extracted with EtOAc. The obtained organic layer was concentrated under reduced pressure and purified by silica gel chromatography (n-hexane: EtOAc = 10:1) to obtain 4.38 g of 4'-iodoacetophenone (yield 89%). Step 2: Styrenation Reaction: Place 6.4 g (16.8 mmol) of methyltriphenylphosphonium bromide and 20 mL of toluene in a 200 mL glass flask as a reaction vessel and dissolve them. Prepare a KTB solution by dissolving 2.2 g (19.6 mmol) of potassium tert-butoxide in 9 mL of THF. This KTB solution is then added dropwise to the toluene solution in an ice bath while maintaining the temperature below 0°C. Stirring is then continued for 30 minutes. Furthermore, a solution of 4.2 g (17.1 mmol) of 4'-iodoacetophenone in 15 mL of toluene is added dropwise while maintaining the temperature below 0°C. Stirring is then continued for 4 hours. The mixture is then washed with 10 mL of water, 10 mL of 10% sodium bisulfite solution, 10 mL of 5% sodium bicarbonate solution, and 10 mL of pure water, in that order. 3.1 g of the target compound, 1-iodo-4-isopropenylbenzene, is isolated using a silica gel column. The above-mentioned determination conditions were used 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of compound AZ3. δ (ppm) (d6-DMSO): 7.3 (2H, Ph), 7.7 (2H, Ph), 2.1 (3H, -CH3), 5.1 (1H, =CH2), 5.3 (1H, =CH2) Example AZ4: Synthesis of compound MZ4 represented by formula (MZ4) The same method was used to separate 2.9 g of the target compound 1-iodo-2-isopropenylbenzene except that 2'-aminoacetophenone (2.70 g, 20 mmol) was used instead of 4'-aminoacetophenone in Example AZ3. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of compound AZ4. δ (ppm) (d6-DMSO): 7.7 (1H, Ph), 7.5 (1H, Ph), 7.4 (1H, Ph), 7.1 (1H, Ph), 2.1 (3H, -CH3), 5.1 (2H, =CH2) Example AZ5: Synthesis of compound MZ5 represented by formula (MZ5) The same method was used to separate 2.6 g of the target compound 1-iodo-3-isopropenylbenzene except that 3'-aminoacetophenone (2.70 g, 20 mmol) was used instead of 4'-aminoacetophenone in Example AZ3. 1 The following peaks were observed during H-NMR measurement, confirming the chemical structure. δ (ppm) (d6-DMSO): 7.7 (2H, Ph), 7.0 (1H, Ph), 6.8 (1H, Ph), 2.1 (1H, -CH=), 5.0 (1H, =CH2), 5.3 (1H, =CH2) Example AZ6: Synthesis of compound MZ6 represented by formula (MZ6) Step 1: Sandmeier (Synthesis of 2',6'-diiodoacetophenone) A 200 mL glass flask was used as a reaction vessel, and MeCN (80 mL) was added. p-Toluenesulfonic acid・H 2O (11.41 g, 60 mmol), 2',6'-diaminoacetophenone (3.0 g, 20 mol). After the obtained suspension solution was cooled to 0-5°C, NaNO A solution of 2 (5.52 g, 80 mmol) dissolved in water (6 mL) and a solution of KI (16.6 g, 100 mmol) dissolved in water (12 mL) were stirred at 0-5°C for 10 minutes, then warmed to room temperature and stirred at the same temperature for 2 hours. Water (350 mL) was added to the reaction solution, and 1M NaHCO 3 aqueous solution was adjusted to pH 9. 2M Na 2S 2O 3 aqueous solution (40 mL), and then extracted with EtOAc. The obtained organic layer was concentrated under reduced pressure and purified by silica gel chromatography (n-hexane: EtOAc = 10:1) to obtain 6.7 g of 2',6'-diiodoacetophenone. (Yield 90%) Step 2: Wittig A 200 mL glass flask was used as a reaction vessel, and 6.4 g (16.8 mmol) of methyltriphenylphosphonium bromide and 20 mL of toluene were placed and dissolved. After preparing a KTB solution by dissolving 2.2 g (19.6 mmol) of potassium tert-butoxide in 9 mL of THF, the KTB solution was added dropwise to the toluene solution in an ice bath while adjusting the temperature to below 0°C, and the mixture was stirred for 30 minutes while maintaining the original state. While further adjusting the temperature to below 0°C, a solution of 6.7 g (18.0 mmol) of 4'-iodoacetophenone dissolved in 15 mL of toluene was added dropwise, and the mixture was stirred for 4 hours while maintaining the original state. After that, the mixture was further washed with 10 mL of water, 10 mL of 10% sodium bisulfite water, 10 mL of 5% sodium bicarbonate water, and 10 mL of pure water in that order. 6.3 g of the target 1,3-diiodo-2-isopropenylbenzene was separated by a silica gel column. The above-mentioned determination conditions were also used. 1 H-NMR analysis revealed the following peaks, confirming the chemical structure of 1,3-diiodo-2-isopropenylbenzene. δ (ppm) (d6-DMSO): 7.7 (2H, Ph), 6.8 (1H, Ph), 2.1 (1H, -CH=), 5.1 (1H, =CH2), 5.2 (1H, =CH2) Example AZ7: Synthesis of compound MZ7 represented by formula (MZ7) Step 1: Iodine source + oxidant / methanol (diiodination) Dissolve 4.0 g (29.6 mmol) of 4-aminoacetophenone in 20 mL of toluene and add NaHCO 37.6 g (90 mmol) / 100 mL of water, then add I2 18.0 g (70.8 mmol) and stir at 25 ° C for 20 hours. Then, add Na 2SO ...

Claims

1. A compound having one or more halogens and unsaturated double bonds, represented by the following formula (1): (In formula (1), X is each independently I, F, or an organic group having one or more but no more than five substituents selected from the group formed by I and F, having a carbon number of 1 to 30; L1 is each independently a single bond, ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphono group, phosphonic acid group, ethyl carbamate group, ureo group, amide group, amide group, or phosphate group; the aforementioned ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphono group, phosphonic acid group, ethyl carbamate group, ureo group, amide group, amide group, or phosphate group may also have substituents.) The Y group can be independently composed of hydroxyl, alkoxy, ester, acetal, carboxyalkoxy, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups of Y can also have substituents. Ra, Rb, and Rc can each be independently composed of H, I, F, Cl, or Br, or can have substituents of 1 to 60 carbon atoms. A is a heterocyclic structure with 3 to 5 carbon atoms. Each of the Z groups is independently an alkoxy group, ester group, acetal group, carboxyalkoxy group, or carbonate group. The aforementioned alkoxy, ester, acetal, carboxyalkoxy, or carbonate groups of Z can also have substituents, where p is an integer of 1 or more, m is an integer of 1 or more, n is an integer of 0 or more, and r is an integer of 0 or more.

2. The compound described in claim 1 has one or more hydrophilic groups or one decomposable group.

3. The compound described in claim 1 is represented by the following formula (1a): (in formula (1a), X, L1, Y, A, Z, p, m, n, and r are the same as defined in formula (1)).

4. The compound described in claim 1 is represented by the following formula (1b): (in formula (1b), X, L1, Y, A, Z, p, m, n, and r are the same as defined in formula (1), Ra1, Rb1, and Rc1 are each independently H, I, F, Cl, Br, or an organogroup having 1 to 60 carbon atoms that may have a substituent, and at least one of Ra1, Rb1, and Rc1 is I, F, Cl, Br, or an organogroup having 1 to 60 carbon atoms that may have a substituent).

5. The compound as described in claim 1, wherein, n + r is an integer greater than or equal to 1.

6. The compound as described in claim 1, wherein, Each of the Y groups is independently represented by the following formula (Y-1): (In formula (Y-1), L2 is a group that is cleaved by the action of an acid or base, and R2 is a straight-chain, branched or cyclic aliphatic group with 1 to 30 carbon atoms, an aromatic group with 1 to 30 carbon atoms, a straight-chain, branched or cyclic aliphatic group containing heteroatoms with 1 to 30 carbon atoms, or an aromatic group containing heteroatoms with 1 to 30 carbon atoms. The aforementioned aliphatic group, aromatic group, aliphatic group containing heteroatoms, and aromatic group containing heteroatoms of R2 may also have substituents).

7. The compound as described in claim 1, wherein, n is 2 or more.

8. The compound as described in claim 1, wherein, It contains functional groups that enhance the solubility of alkaline developing solutions through the action of acids or bases.

9. The compound as described in claim 1, wherein, X is I, and L1 is a single bond.

10. The compound as described in claim 1, wherein, X is an aromatic group formed by introducing one or more F or I groups into an aromatic group.

11. The compound as described in claim 1, wherein, X is an alicyclic group formed by introducing one or more F or I groups into an alicyclic group.

12. A composition wherein, Of the compounds described in any one of claims 1 to 11, there are compounds represented by formula (1C) that contain more than 1 ppm by mass and less than 10% by mass: (In formula (1C), formula (1C1), and formula (1C2), X, L1, Y, A, Z, p, m, n, and r are the same as defined in formula (1), Rsub represents formula (1C1) or formula (1C2), Ra1, Rb1, and Rc1 are each independently H, I, F, Cl, Br, or an organogroup with 1 to 60 carbon atoms that may have substituents, at least one of Ra1, Rb1, and Rc1 is I, F, Cl, Br, or an organogroup with 1 to 60 carbon atoms that may have substituents, p-1 is an integer greater than or equal to 0, and * is a bonding site with an adjacent constituent unit).

13. A composition comprising the compound described in claims 1 to 11, and a compound represented by formula (1D) containing 1 ppm to 10 % by mass relative to the compound: (in formula (1D), formula (1D1), or formula (1D2), X, L1, Y, A, Z, p, m, n, and r are the same as defined in formula (1), Rsub2 represents formula (1D1) or formula (1D2), Ra1, Rb1, and Rc1 are each independently H, I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms that may have substituents, at least one of Ra1, Rb1, and Rc1 is I, F, Cl, Br, or an organic group having 1 to 60 carbon atoms that may have substituents, n2 represents an integer of 0 to 4, p-1 is an integer of 0 or more, and * is a bonding site with an adjacent constituent unit).

14. A composition wherein, Compared to the compounds described in any one of claims 1 to 11, compounds containing 1 ppm to 10% by mass of the compound represented by formula (1E): (In formula (1E), X is each independently F, or an organogroup having 1 to 30 carbon atoms of 1 to 5 substituents selected from the group formed by F; L1 is each independently a single bond, ether, ester, thioether, amino, thioester, acetal, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amideimino, or phosphate group; the aforementioned ether, ester, thioether, amino, thioester, acetal, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amideimino, or phosphate group may also have substituents.) The Y group consists of hydroxyl, alkoxy, ester, acetal, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups of Y can also have substituents. Ra, Rb, and Rc groups consist of H, F, Cl, Br, or can have substituents of 1 to 60 carbon atoms. A is a heterocyclic structure with 3 to 5 carbon atoms. The Z group consists of alkoxy, ester, acetal, or carbonate groups. However, X, L1, Y, Ra, Rb, Rc, A, and Z do not contain I. p is an integer greater than or equal to 1, m' is an integer greater than or equal to 0, n is an integer greater than or equal to 0, and r is an integer greater than or equal to 0.

15. A composition comprising a compound as described in any one of claims 1 to 11, wherein the impurity containing K, in elemental terms, is less than 1 ppm by mass relative to the aforementioned compound.

16. The components as described in claim 15, wherein, The peroxide system is less than 10 ppm by mass relative to the aforementioned compounds.

17. The components as described in claim 15, wherein, Impurities containing one or more elements selected from the group consisting of Mn, Al, Si, and Li, in elemental terms, are less than 1 ppm by mass relative to the aforementioned compound.

18. The components as described in claim 15, wherein, The phosphorus-containing compounds are those with a mass concentration of less than 10 ppm relative to the aforementioned compounds.

19. The composition described in claim 15, wherein maleic acid is present in a concentration of 10 ppm by mass relative to the aforementioned compound.

20. A polymer comprising constituent units derived from any one of the compounds described in claims 1 to 11.

21. The polymer as described in claim 20, wherein, It further includes the constituent units represented by the following formula (C6): (in formula (C6), XC61 is a hydroxyl group or a halogen group, RC61 is an alkyl group with 1 to 20 carbon atoms, and * is the bonding site with the adjacent constituent unit).

22. A composition for film formation, comprising a compound as described in any one of claims 1 to 11, or a polymer as described in claims 20 or 21.

23. The film-forming composition as described in claim 22, wherein, It may further include acid-generating agents, base-generating agents, or base compounds.

24. A method for forming a resist pattern, comprising the steps of forming a resist film on a substrate by means of a film-forming composition comprising a compound as described in any one of claims 1 to 11 or a polymer as described in claims 20 or 21, forming a pattern on the resist film by exposure, and developing the resist film after exposure.

25. A method for forming an insulating film, comprising the method described in claim 24.

26. A method for manufacturing a compound represented by the following formula (0), comprising, in a compound represented by the following formula (S1), a step of introducing an unsaturated double bond into the double bond of a substituent Q: (In formula (S1), X0 is an organic group having 1 to 30 carbon atoms, and L1 are each independently a single bond, ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphono group, phosphonic acid group, ethyl carbamate group, urea group, amide group, amide imine group, or phosphate group, Y is composed of hydroxyl, alkoxy, ester, acetal, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups of Y may also have substituents. A is a heterocyclic structure with 3 to 5 carbon atoms. Z is composed of alkoxy, ester, acetal, or carbonate groups. Q has an organic group with hydroxyl, aldehyde, carboxyl, or ketone groups and 1 to 30 carbon atoms. p is an integer greater than or equal to 1, m' is an integer greater than or equal to 0, n is an integer greater than or equal to 0, and r is an integer greater than or equal to 0. (In formula (0),) The X group consists of individual groups I and F, or an organogroup with 1 to 30 carbon atoms selected from the group consisting of I and F, comprising one to five substituents. The L1 group consists of individual groups consisting of single bonds, ether groups, ester groups, thioether groups, amino groups, thioester groups, acetal groups, phosphono groups, phosphonic acid groups, ethyl carbamate groups, urea groups, amide groups, amide groups, or phosphate groups. The Y group consists of individual groups consisting of hydroxyl, alkoxy, ester, acetal, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups in the Y group may also have substituents. Ra, Rb, and Rc are each independently H, I, F, Cl, Br, or may have an organic group with 1 to 60 carbon atoms that can have substituents; A is a heterocyclic structure with 3 to 5 carbon atoms; Z are each independently alkoxy, ester, acetal, or carbonate; p is an integer greater than or equal to 1; m' is an integer greater than or equal to 0; n is an integer greater than or equal to 0; and r is an integer greater than or equal to 0.

27. A method for manufacturing the compound as described in claim 26, wherein, The compound represented by the aforementioned formula (S1) is the compound represented by the following formula (SA1), and it includes the steps shown in A1 and A2 below: A1) Using the compound represented by the aforementioned formula (SA1), and the compound represented by the following formula (RM1) or malononitrile, to obtain the compound represented by the following formula (SA2) A2) Using formula (SA2) and a fluoride source to make it into formula (0) (In formulas (SA1), (RM1) and (SA2), X0, L1, Y, A, Z, p, m', n, r are the same as defined in formulas (S1) and (0), Q1 is an aldehyde or ketone, LG is a group selected from hydroxyl, alkoxy, carbonate, acetal, and carboxyl groups, wherein the alkoxy, carbonate, acetal, and carboxyl groups are aliphatic or aromatic groups that may have substituents having 1 to 60 carbon atoms, R3 is a hydrogen group, or a carboxyl or ester group with substituents having 1 to 60 carbon atoms; R4 is a hydrogen group; R5 and R6 are each independently H, F, Cl, or Br, or organic groups with substituents having 1 to 60 carbon atoms; XA is a group selected from hydrogen groups and halogen groups.

28. A method for manufacturing the compound as described in claim 27, wherein, in the step shown in A2 above, the compound represented by formula (SA2) is decarboxylated at a temperature below 100°C using the aforementioned fluoride source.

29. A method for manufacturing the compound as described in claim 27, wherein, In step A1 above, a reducing agent is further used to obtain the compound represented by the aforementioned formula (SA2).

30. A method for manufacturing a compound represented by formula (1) comprising the steps of forming a compound represented by formula (SB1) by at least one of the compounds represented by formula (SB2A) and formula (SB3A) obtained by at least one of the steps shown in B1A and B2A and B3A, and introducing an unsaturated double bond into the substituent Qb of the compound represented by formula (SB1): B1A) preparing a matrix B comprising one or more amino groups and a parent nucleus B having an aldehyde or ketone group; B2A) obtaining a compound represented by formula (SB2A) in which iodine is introduced into the aforementioned parent nucleus B; B3A) obtaining a compound represented by formula (SB3A) in which the amino group is replaced with a halogen group by a Sandmeyer reaction (in formula (1)). The X group consists of individual I and F groups, or an organogroup with 1 to 30 carbon atoms selected from the group formed by I and F, consisting of one to five substituents. The L1 group consists of individual single bonds, ether groups, ester groups, thioether groups, amino groups, thioester groups, acetal groups, phosphono groups, phosphonic acid groups, ethyl carbamate groups, urea groups, amide groups, amide groups, or phosphate groups. The aforementioned ether, ester, thioether, amino, thioester, acetal, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups of the L1 group may also have substituents. The Y group can be independently composed of hydroxyl, alkoxy, ester, acetal, carboxyalkoxy, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups of Y can also have substituents. Ra, Rb, and Rc can each be independently composed of H, I, F, Cl, or Br, or can have substituents of 1 to 60 carbon atoms. A is a heterocyclic structure with 3 to 5 carbon atoms. Z is independently alkoxy, ester, acetal, carboxyalkoxy, or carbonate. The aforementioned alkoxy, ester, acetal, carboxyalkoxy, or carbonate groups of Z may also have substituents. p is an integer of 1 or more, m is an integer of 1 or more, n is an integer of 0 or more, and r is an integer of 0 or more. In formulas (SB1A), (SB2A), (SB3A), and (SB1), Zb represents a hydrogen group or an amino group that may have substituents, which may contain a hydrocarbon group having 1 to 30 carbon atoms. rb represents an integer of 1 or more. Qb, L1b, Xb1, B, pb, and mb' are each synonymous with Q, L, X, A, p, and m in formula (1).XB2 series represents I, F, Cl, Br, or an organogroup having 1 to 30 carbon atoms of one to five substituents selected from the group consisting of I, F, Cl, and Br.

31. The manufacturing method as described in claim 30, wherein, The process of introducing double bonds involves the use of organophosphorus compounds and bases.

32. A method for manufacturing the compound as described in claim 26, wherein, The method includes a halogen introduction step, which involves reacting a halogenating agent with the compound represented by the above formula (S1) to introduce halogen atoms.

33. A method for manufacturing the compound as described in claim 26, wherein, The compound represented by the aforementioned formula (SA1) is at least one of the compounds represented by the following formulas (SB2A) and (SB3A) obtained by at least one of the steps shown in B1A and B2A and B3A: B1A) preparing a matrix B containing one or more amino groups and a parent nucleus B having an aldehyde or ketone group; B2A) obtaining a compound represented by the following formula (SB2A) by introducing iodine into the aforementioned parent nucleus B; B3A) obtaining a compound represented by the following formula (SB3A) by replacing the amino group with a halogen group by the Sandmeier reaction. (In formulas (SB1A), (SB2A), and (SB3A)...) Zb represents a hydrogen group or an amino group that may have substituents, which is a hydrocarbon group containing substituents having 1 to 30 carbon atoms; rb represents an integer of 1 or more; Qb, L1b, Xb1, B, pb, and mb' are each synonyms of Q, L1, X0, A, p, and m in formula (S1); Xb2 represents I, F, Cl, Br, or an organogroup having 1 to 30 carbon atoms and 1 to 5 substituents selected from the group consisting of I, F, Cl, and Br.

34. A method for manufacturing the compound as described in claim 31, wherein, In step B2A above, at least an iodine source and an oxidant are used to introduce iodine into the aforementioned parent nucleus B.

35. A method for manufacturing the compound as described in claim 26, wherein, The compound represented by the aforementioned formula (SA1) is a compound produced by the steps shown in B1B below, and at least one of the steps shown in B2B and B3B below: B1B) preparing a matrix SB1B comprising one or more amino groups and a parent nucleus B having an aldehyde or ketone group; B2B) obtaining a compound represented by formula (SB2B) by introducing iodine into the parent nucleus B; B3B) obtaining a compound represented by formula (SB3B) by replacing the amino group with a halogen group. (In formulas (SB1B), (SB2B), and (SB3B)...) Zb represents a hydrogen group or an amino group that can have substituents, which is a hydrocarbon group containing substituents having 1 to 30 carbon atoms; rb represents an integer of 1 or more; Qb, L1b, Xb1, B, pb, and mb are each synonyms of Q, L1, X0, A, p, and m in formula (S1); Xb2 represents I, F, Cl, Br, or an organogroup having 1 to 30 carbon atoms and 1 to 5 substituents selected from the group consisting of I, F, Cl, and Br.

36. A method for manufacturing the compound as described in claim 35, wherein, It further includes the steps shown in B4a below: B4a) Wittig step.

37. The method for manufacturing the compound as described in claim 33, wherein, in the step shown in B2B above, at least an iodine source and an oxidizing agent are used to introduce iodine into the aforementioned parent nucleus B.

38. A method for manufacturing a compound represented by formula (1) below, comprising a halogen introduction step of reacting a halogenating agent with the compound represented by formula (S1) below to introduce halogen atoms, and a double bond introduction step of introducing an unsaturated double bond into a substituent Q, wherein, The step of introducing double bonds involves the use of organophosphorus compounds and bases. In formula (S1), X0 is an organic group with 1 to 30 carbon atoms, L1 is a single bond, ether group, ester group, thioether group, amino group, thioester group, acetal group, phosphono group, phosphonic acid group, ethyl carbamate group, urea group, amide group, amide group, or phosphate group, and Y is a hydroxyl group, alkoxy group, ester group, acetal group, carbonate group, nitro group, amino group, carboxyl group, mercapto group, ether group, thioether group, phosphono group, phosphonic acid group, ethyl carbamate group, urea group, amide group, amide group, or phosphate group. The aforementioned alkoxy group, ester group, carbonate group, amino group, ether group, thioether group, phosphono group, phosphonic acid group, ethyl carbamate group, urea group, amide group, amide group, and phosphate group may also have substituents. A is a heterocyclic structure with 3 to 5 carbon atoms, Z is an alkoxy, ester, acetal, or carbonate group, Q is an organic group with hydroxyl, aldehyde, carboxyl, or ketone groups and 1 to 30 carbon atoms, p is an integer greater than or equal to 1, m' is an integer greater than or equal to 0, n is an integer greater than or equal to 0, and r is an integer greater than or equal to 0. (In formula (1), X is an organic group with 1 to 30 carbon atoms, which is I or F, or has 1 to 5 substituents selected from the group formed by I and F, L1 is an organic group with 1 to 30 carbon atoms, which is a single bond, ether, ester, thioether, amino, thioester, acetal, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amideimino, or phosphate group.) The Y group consists of hydroxyl, alkoxy, ester, acetal, carbonate, nitro, amino, carboxyl, mercapto, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, or phosphate groups. The aforementioned alkoxy, ester, carbonate, amino, ether, thioether, phosphono, phosphonic acid, ethyl carbamate, urea, amide, amide, and phosphate groups of Y may also have substituents. Ra, Rb, and Rc groups are each independently H, I, F, Cl, Br, or may have substituents of 1 to 60 carbon atoms. A is a heterocyclic structure with 3 to 5 carbon atoms. The Z group consists of each independently alkoxy, ester, acetal, or carbonate group. p is an integer greater than or equal to 1, m is an integer greater than or equal to 1, n is an integer greater than or equal to 0, and r is an integer greater than or equal to 0.