Substrate container

Abstract

A substrate container includes a housing defining an internal space and a cleaning fluid distribution system. The housing includes a front opening, a bottom wall, and a rear wall. The cleaning fluid distribution system receives a cleaning gas flow and includes an inlet and a network of separate gas distribution devices configured to distribute the cleaning gas flow into the internal space. It also includes a supply line connected to the inlet and configured to distribute the cleaning gas supply to the network of separate gas distribution devices. A method of cleaning an open substrate container includes supplying a cleaning gas flow to an inlet of a cleaning fluid distribution system and dividing the cleaning gas supply to the network of separate gas distribution devices to distribute the cleaning gas flow into the internal space.

Description

Technical Field

[0001] This invention generally relates to a substrate container with a front opening for processing semiconductor devices. More specifically, this invention relates to a cleaning gas distribution system and method for distributing cleaning gas into the interior of the substrate container. Prior Technology

[0002] Substrates in wafer form can be processed to form semiconductor devices. The wafer substrate (or simply substrate) undergoes a series of process steps. Exemplary process steps may include (but are not limited to) material layer deposition, doping, etching, or causing chemical or physical reactions in the substrate material. A substrate container is used to store and transport wafers in process between process steps within a manufacturing facility. During some process steps, the substrate is processed by processing equipment in a clean environment (e.g., a cleanroom). During processing, such as during a cleaning process, gases must be introduced into and removed from the substrate container, which is such as a front-opening wafer transfer cassette (FOUP), thus requiring the FOUP to have one or more locations where gases can enter or exit. The substrate can be transferred from the substrate container to a processing tool via an Equipment Front-End Module (EFEM). The EFEM typically includes a load port for receiving the substrate container, a transfer unit, a frame or "small environment," and a fan filter unit for generating airflow within the EFEM.

[0003] In use, the substrate container is docked at a load port, and the EFEM door is open. The door then detaches from the substrate container, allowing a transfer unit housed within the EFEM to access the substrate contained within for processing. An airflow introduced by the fan filter unit flows through the EFEM from its top to its bottom. When the front opening of the substrate container interfaces with the load port opening of the EFEM, some gas flowing through the EFEM and passing through the load port opening may be unintentionally introduced into the interior of the container, potentially interfering with the cleaning capability of the substrate container by temporarily increasing the relative humidity and / or oxygen level within its microenvironment. This could be undesirable. Summary of the Invention

[0004] This invention relates to a system for distributing cleaning gas to a wafer or photomask carrier container, such as a FOUP or cassette (e.g., a photomask cassette) used in semiconductor manufacturing. More specifically, this invention relates to a cleaning fluid distribution system within a FOUP or photomask cassette, for distributing a cleaning gas flow from a common input port to a plurality of discrete input cleaning ports to a network of separate gas distribution devices within the interior space of the substrate container.

[0005] In at least one example embodiment, a substrate container includes a housing defining an internal space, wherein the housing includes a front opening, a first sidewall, a second sidewall, a rear wall, and a bottom wall, the bottom wall including a front edge extending along the front opening of the housing between the first sidewall and the second sidewall. The substrate container also includes a cleaning fluid distribution system configured to receive a cleaning gas flow, wherein the cleaning fluid distribution system includes an inlet configured to receive the cleaning gas flow and a network configured to distribute the cleaning gas flow to separate gas distribution devices within the internal space. The cleaning fluid distribution system further includes a supply line connected to the inlet, the supply line being configured to distribute the cleaning gas flow to the network of separate gas distribution devices. According to at least one example embodiment, the supply line includes a first flow path leading to one of the networks of separate gas distribution devices and a second flow path leading to the other of the networks of separate gas distribution devices. In one embodiment, one of the networks of the gas distribution device is a first gas distribution device provided closer to the rear wall, and the other of the network of the gas distribution device is a second gas distribution device, wherein the second gas distribution device is provided closer to the front opening, and wherein the first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and the second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device. It should be understood that the second gas distribution device may also be provided at other locations within the substrate container, for example, behind or near another gas distribution device, and is not limited to the above embodiments. According to at least one other example embodiment, the cleaning fluid distribution system further includes a manifold substrate provided on the bottom wall, the manifold substrate receiving the cleaning gas flow from the inlet to divide the cleaning gas flow to the network of the gas distribution device, wherein the manifold substrate may be configured to divide the second flow path to at least a left second flow path and a right second flow path to supply the portion of the cleaning gas flow to the second gas distribution device.

[0006] In at least one embodiment, a method for cleaning a substrate container when a front opening is open includes: supplying a cleaning gas flow to an inlet of a cleaning fluid distribution system at least partially disposed within the substrate container via an inlet port disposed in a wall of the substrate container; and dividing the cleaning gas via a supply line of the cleaning fluid distribution system to supply to a network of separate gas distribution devices for distributing the cleaning gas flow to an interior space of the substrate container, wherein the supply line includes at least a first flow path to one of the networks of gas distribution devices and at least a second flow path to the other of the networks of separate gas distribution devices. In one embodiment, the method further includes providing a first portion of the cleaning gas flow via the first flow path to a first gas distribution device and a second portion of the cleaning gas flow via the second flow path to a second gas distribution device. Simple Explanation of the Diagram

[0007] The following figures will provide a better understanding of the described features, characteristics, and advantages of both a substrate container and a method for cleaning a substrate container:

[0008] Figure 1 is a front perspective view of one of the substrate containers according to at least one example embodiment.

[0009] Figure 2 is an exploded view of one of the substrate containers according to at least one example embodiment.

[0010] Figures 3A to 3C are schematic diagrams of a substrate container with a cleaning fluid distribution system configured to divide the supply of cleaning gas according to different embodiments.

[0011] Figure 4A is a rear perspective view of a substrate container of a cleaning fluid distribution system configured to distribute the supply of cleaning gas, according to at least one example embodiment.

[0012] Figure 4B is a top side cross-sectional view of one of the substrate containers of Figure 4A according to at least one example embodiment.

[0013] Figure 5A is a rear perspective view of a substrate container of a cleaning fluid distribution system configured to use a manifold substrate to divide the supply of cleaning gas, according to at least one example embodiment.

[0014] Figure 5B is a schematic diagram of one of the manifold substrates of Figure 5A configured to divide the supply of cleaning gas according to different embodiments.

[0015] Figure 5C is a bottom side view of one of the substrate containers of Figure 5A according to at least one example embodiment.

[0016] Figure 6 is a flowchart of a method for cleaning a substrate container according to at least one example embodiment, the method comprising dividing the supply of cleaning gas to a network of separate gas distribution devices.

[0017] While the invention may be modified and alternatively made in various ways, its details have been shown by way of example in the accompanying drawings and will be described in detail. However, it should be understood that the purpose is to limit the nature of the invention to the specific illustrative embodiments described. Rather, the purpose is to cover all modifications, equivalents, and alternatives that fall within the spirit and scope of the invention. Implementation

[0018] As used herein, the term "network of gas distribution devices" means a network comprising a plurality of separate and distinct gas distribution devices connected together by at least one supply line. The term "gas distribution device" means a device comprising at least one gas distribution surface, and is any combination of a plurality of gas distribution surfaces provided at certain specific locations within a substrate container; for example, a front gas distribution device comprises all gas distribution surfaces provided at the front of the substrate container. The term "gas distribution surface" means a structural portion of a gas distribution device that distributes a portion of the cleaning gas from the gas distribution device into an internal space, wherein the gas distribution device may comprise multiple gas distribution surfaces. The term "supply line" means a pipe, conduit, or fitting connected to an inlet port for receiving cleaning gas and used to divide and supply the cleaning gas to the input cleaning port of the gas distribution device and / or the gas distribution surface. That is, the supply line can be used to supply cleaning gas to a single input cleaning port of a gas distribution device / gas distribution surface or to supply cleaning gas along multiple input cleaning ports of a gas distribution device / gas distribution surface. The term "conduit" or "pipeline" refers to a structure used to distribute cleaning gas fluid through a network of gas distribution devices and includes conduits, pipes, piping, passages, connectors, valves, controllers, and similar structures that can be used to set / adjust gas fluid through the network of gas distribution devices.

[0019] As used herein, although the terms "front" and "rear" and "right" and "left" are used to describe various elements, the elements are not limited by these terms. Rather, the terms are used only to distinguish one element from another. Conversely, the terms are interpreted broadly to include any positional relationship between elements, including front, rear, side, top, bottom, or any combination thereof, without departing from the scope of the invention.

[0020] As used in this specification and the accompanying claims, the singular forms “a,” “an,” and “the” include plural indicators unless otherwise expressly stated. As used in this specification and the accompanying claims, the term “or” is generally used to mean “and / or” unless otherwise expressly stated.

[0021] The following detailed description should be read with reference to the accompanying drawings, in which similar elements in different drawings are numbered the same. The detailed description and drawings, which are not necessarily drawn to scale, depict illustrative embodiments and are not intended to limit the scope of the invention. The depicted illustrative embodiments are intended to be exemplary only. Selected features of any illustrative embodiment may be incorporated into an additional embodiment unless expressly stated otherwise.

[0022] This invention generally relates to a cleaning fluid distribution system for a substrate container having a front opening for accessing an internal space of the substrate container. More specifically, the invention relates to a cleaning fluid distribution system configured to distribute a cleaning gas flow into an internal space of the substrate container by dividing a cleaning gas flow from a common source to a network of discrete input cleaning ports to supply separate gas distribution devices. In some embodiments, the cleaning fluid distribution system may be configured to prevent gas from entering the front opening of the substrate container when open or to serve as an outlet when the substrate container is closed to facilitate the discharge of cleaning gas from the substrate container.

[0023] Substrates in wafer form can be processed to form semiconductor devices. A substrate container is a container used to carry the substrate during processing. The substrate can be stored in a substrate container before and during different processing steps. The substrate container is accessed through a front opening of the substrate container. The substrate container can be, for example, a front-opening wafer transfer cassette (FOUP). In one embodiment, the substrate container can be a container for a photomask, such as a photomask cassette. In this embodiment, a container body may be included as at least part of an outer box configured to accommodate an inner box, wherein the cleaning fluid distribution system includes a fluid distribution system substrate configured to provide cleaning gas to an interior space of the outer box.

[0024] Figures 1 and 2 illustrate a substrate container 1 according to one embodiment of the present invention. Figure 1 is a front perspective view of the substrate container 1, and Figure 2 illustrates the substrate container with the door removed (e.g., open). As shown in Figure 1, the substrate container 1 includes a front door 4 and a housing 6. The front door 4 is received within a front opening 12 of the housing 6, blocking the front opening 12.

[0025] Figure 2 illustrates a substrate container 1 with the front door 4 removed (e.g., opened). As shown in Figure 2, a housing 6 defines an internal space 8 of the substrate container, in which substrates are stored. The substrate container 1 can be accessed by moving (e.g., opening, removing) the door 4. For example, the door 4 in Figure 1 is received in the housing 6 by inserting the door 4 into the housing 6. In one embodiment, one or more of the door 4 and the housing 6 may include a locking mechanism (not shown) to prevent accidental removal of the door 4.

[0026] As further shown in Figure 2, the housing 6 includes a first sidewall 14, a second sidewall 16, a rear wall 18, a top wall 20, and a bottom wall 22. The first sidewall 14 is opposite to the second sidewall 16, and the top wall 20 is opposite to the bottom wall 22. The first sidewall 14 may refer to the left side, and the second sidewall 16 may refer to the right side. The top wall 20 and the bottom wall 22 each extend between the first sidewall 14 and the second sidewall 16. The housing 6 includes a front edge extending between the opposing walls. The bottom wall 22 includes a front edge 24A extending along the front opening 12. The front edge 24A also extends between the first sidewall 14 and the second sidewall 16 of the housing 6. The first sidewall 14 includes a front edge 24B extending along the front opening 12. The front edge 24B of the first sidewall 14 also extends between the top wall 20 and the bottom wall 22 of the housing 6. As shown in Figure 2, in one embodiment, the front edges 24A and 24B are each directly adjacent to the front opening 12.

[0027] The substrate container 1 may include a device hook 26 located on the top wall 20 of the housing 6. In one embodiment, the device hook 26 allows a standard automated accessory (not shown) (such as (but not limited to) an automated arm) for moving the substrate container 1 to be attached to the substrate container 1. For example, the automated arm can be used to move the substrate container 1 between different processing devices. In one embodiment, the substrate container 1 may include one or more handles (not shown) to allow a user (e.g., a technician, etc.) to manually move the substrate container 1.

[0028] The substrate container 1 may include a plurality of shelves 28 for holding substrates (not shown) within the interior space 8. A portion of the shelf 28 on the second sidewall 16, shown in FIG. 2, has a configuration similar to that of the portion on the shelf 28 on the first sidewall 14 (e.g., a slot in the substrate container). Each shelf 28 is sized to hold one substrate (not shown) within the interior space 8. For example, in one embodiment, the shelf 28 is sized to hold a substrate of a specific size (e.g., a 150 mm wafer, a 200 mm wafer, etc.).

[0029] The substrate container 1 may include a plurality of inlet cleaning ports and / or outlet cleaning ports (e.g., 30A, 30B, 30C, etc. in FIG. 2) on its bottom wall 22, corresponding to the inlet and / or outlet of the substrate container 1. The plurality of inlet cleaning ports (and outlet cleaning ports) may be connected to a cleaning fluid distribution system, as discussed further below. Each of the plurality of inlet cleaning ports has an opening facing the internal space 8 of the substrate container. At least one outlet port may be provided for venting gas from the internal space 8 to the outside of the substrate container 1 and may be located in the bottom wall between the inlet and the second sidewall. It should be understood that the inlet cleaning ports and / or outlet cleaning ports may also be provided at different locations along the housing 6, such as in the rear wall 18; in this embodiment, the inlet cleaning ports and / or outlet cleaning ports correspond to the inlet and outlet of the substrate container.

[0030] The substrate container 1 also includes at least one inlet, such as an inlet port, for receiving a cleaning gas stream from a cleaning gas supply system. The cleaning gas supply system typically delivers a cleaning gas that is an inert gas. The cleaning gas may include (for example, but not limited to) one or more of nitrogen, clean dry air (CDA), and ultra-clean dry air (xCDA).

[0031] In one embodiment, the inlet port is connected to a cleaning fluid distribution system for supplying cleaning gas to the inlet cleaning port to distribute the cleaning gas into the internal space 8. When the substrate container 1 is open, the cleaning fluid distribution system can be used to distribute the cleaning gas into the internal space 8 to reduce the entry of external environmental elements (e.g., gases, particles, moisture, etc.) into the substrate container 1 through the front opening 12. For example, the supplied cleaning gas is configured to flow out of the internal space 8 through the front opening 12, which helps to minimize any inward fluid entering the internal space 8 through the front opening 12.

[0032] Conversely, when door 4 is received within front opening 12 and substrate container 1 is closed, cleaning gas can continue to be supplied to the interior space 8 of substrate container 1. The cleaning gas can also be discharged to the outside of substrate container 1 through a cleaning fluid distribution system, which, as described herein according to various embodiments, can serve as an inlet and an outlet or only as an outlet, depending on the configuration and the required application. A positive pressure within the interior space 8 generates a diffusion gradient, promoting the flow of cleaning gas from the interior space through one or more outlets and out of the substrate container.

[0033] Figure 3A schematically illustrates one embodiment of a cleaning fluid distribution system 340. The cleaning fluid distribution system 340 is connected to an inlet port 305 to receive cleaning gas from a cleaning supply system. The cleaning fluid distribution system 340 further includes a network for distributing the cleaning gas flow to a network of separate gas distribution devices 350 within the internal space 8. A supply line 360 ​​connected to the inlet is used to divide the cleaning gas flow to the network of separate gas distribution devices 350. For example, in one embodiment, the supply line includes at least one first flow path 360A connected to a first gas distribution device 350A and at least one second flow path 360B connected to a second gas distribution device 350B. However, it should be understood that, for cleaning operations of the substrate container, the supply line 360 ​​may be divided into any number of different flow paths as needed, for example, an additional third, fourth, etc., flow paths to supply cleaning gas to separate and / or identical gas distribution devices in the substrate container 1. That is, the supply line 360 ​​is configured to receive the supply of cleaning gas from a common input port (e.g., a cleaning gas source) and distribute the supply of cleaning gas to a plurality of discrete input cleaning ports for supplying a plurality of gas distribution devices 350.

[0034] The network of separate gas distribution devices includes a plurality of separate and distinct gas distribution devices 350, which are connected together by at least one supply line 360. Therefore, the network of separate gas distribution devices includes separate gas distribution devices 350 and associated conduits connecting the separate distribution devices for distributing cleaning gas fluid to the interior of the substrate container 1.

[0035] Gas distribution device 350 is a device separate from and distinct from other gas distribution devices in the network. Each gas distribution device includes at least one gas distribution surface and is a combination of any of a plurality of gas distribution surfaces 351A, 351B, and 351C provided at certain specific locations within the substrate container. For example, a front gas distribution device includes any and all of the gas distribution surfaces 351A and 351B provided in front of the substrate container. That is, the gas distribution device is a combination of any or all of a plurality of gas distribution surfaces provided at a specific location within the substrate container, wherein the gas distribution surface is a structural part of the gas distribution device that distributes a portion of the cleaning gas from the gas distribution device into the internal space. It should be understood that the gas distribution surfaces 351A, 351B, and 351C are connected to at least one input cleaning port and include structures for distributing cleaning gas into the internal space, such as diffusers, manifolds, films, portions with slits or nozzles, portions made of porous materials, or similar structures and combinations thereof capable of guiding cleaning gas into the interior of the substrate container.

[0036] For example, in one embodiment, a first gas distribution device 350A is located in the section following the FOUP, for example, closer to the rear wall 18, and may include at least one gas distribution surface 351A, 351B, such as a first and / or second diffuser connected to at least one input cleaning port. A second gas distribution device 350B may be located in the section preceding the FOUP, for example, closer to the front opening 12, and may include at least one gas distribution surface 351C, comprising a plurality of openings arranged along the length of one of the gas distribution surfaces between the first and second sidewalls, or extending vertically along one of the front edges of one of the first or second sidewalls, for example, connected to a top / bottom manifold and / or a right / left manifold of at least one other input cleaning port. A supply line 360 ​​is divided into a first flow path 360A to supply at least a portion of the cleaning gas flow to the input cleaning port of the first gas distribution device 350A and a second flow path 360B to supply at least another portion of the cleaning gas flow to the input cleaning port of the second gas distribution device 350B. It should be understood that the first and second gas distribution devices are not necessarily located in the rear and front sections, but are provided by way of example and can be provided in different (or the same) locations within the interior space of the substrate container.

[0037] The amount of cleaning gas supplied to the first flow path 360A and the second flow path 360B to supply separate gas distribution devices 350A and 350B can be configured in various ways. For example, in one embodiment, a valve can be provided in the supply line and, for example, configured with a predetermined opening size, to divide the supply of cleaning gas to the first flow path 360A and the second flow path 360B to supply a predetermined amount of cleaning gas to the separate gas distribution devices 350A and 350B. The valve may include a needle valve, ball valve, butterfly valve, check valve, or similar valve structure, used to set the flow rate of cleaning gas to different and separate gas distribution devices. It should be understood that the amount of cleaning gas can also be configured as needed using an orifice, a spring-loaded diverter, or by having one of the first or second flow paths have a pipe / conduit with a smaller or larger cross-sectional area to divide the supply of cleaning gas into appropriate / predetermined amounts to supply to the gas distribution devices, for example, the division / supply of cleaning gas is based on the network pressure differential. It should also be understood that the amount of cleaning gas can be set to each separate gas distribution surface 351A, 351B, 351C. In other words, the supply of cleaning gas from a single inlet port is divided and set so that a predetermined amount of cleaning gas is supplied to a plurality of discrete input cleaning ports for supplying gas distribution devices and / or gas distribution surfaces respectively.

[0038] Figure 3B illustrates another embodiment of the cleaning fluid distribution system 340, wherein the inlet includes at least two inlet ports 305A and 305B. In the embodiment of Figure 3B, the cleaning fluid distribution system 340 is connected to the two inlet ports 305A and 305B to receive cleaning gas from the cleaning gas supply system. The cleaning fluid distribution system further includes a network for distributing the cleaning gas to one of separate gas distribution devices 350 within the interior space 8. However, in this embodiment, the supply line 360 ​​is connected to the two inlet ports 305A and 305B such that the supply of cleaning gas is combined and then divided to at least one first flow path 360A connected to a first gas distribution device 350A and a second flow path 360B connected to a second gas distribution device 350B. It should be understood that the supply of cleaning gas may be mixed / combined from the conduits of the supply lines from the inlet ports 305A and 305B, or (for example) mixed using an inline mixer, and then divided / separated into different flow paths 360A and 360B. As discussed above, the first gas distribution device 350A and the second gas distribution device 350B each include at least one gas distribution surface for distributing cleaning gas into the interior of the substrate container.

[0039] The amount of cleaning gas supplied to the first flow path 360A and the second flow path 360B to supply separate gas distribution devices 350A and 350B can be configured in various ways. For example, in one embodiment, a valve can be provided upstream and / or downstream of the mixing / combination of the cleaning gas supply from inlet ports 305A and 305B and configured to divide the cleaning gas supply into predetermined amounts of cleaning gas for the separate gas distribution devices 350A and 350B and / or separate gas distribution surfaces 351A, 351B, and 351C. In other words, the supply of cleaning gas from the two inlet ports 305A and 305B is divided and configured such that predetermined amounts of cleaning gas are supplied to a plurality of discrete input cleaning ports for supplying separate gas distribution devices and / or separate gas distribution surfaces, respectively.

[0040] Figure 3C illustrates another embodiment of the cleaning fluid distribution system 340, wherein the inlet includes at least two inlet ports 305A and 305B, each inlet port being used individually to supply different networks of separate gas distribution devices. That is, the cleaning fluid distribution system 340 includes at least two networks of separate gas distribution devices 350 for distributing cleaning gas flows into the internal space 8. In this embodiment, the cleaning fluid distribution system 340 includes at least two separate supply lines 360 and 370, each separately connected to inlet ports 305A and 305B. The first supply line 360 ​​connected to inlet port 305A is used to divide the supply of cleaning gas from inlet port 305A to at least one first flow path 360A connected to a first gas distribution device 350A having one of gas distribution surfaces 351A and 351B, and a second flow path 360B connected to a second gas distribution device 350B having at least one gas distribution surface 351C. A second supply line 370 connected to inlet port 305B is used to distribute the supply of cleaning gas from inlet port 305B to at least one first flow path 370A connected to a third gas distribution device 350C having at least two gas distribution surfaces 351D, 351E, and a second flow path 370B connected to a fourth gas distribution device 350D having at least one gas distribution surface 351F.

[0041] The first and second flow paths of at least two networks supplying cleaning gas to separate gas distribution devices 350A, 350B, 350C, and 350D can be configured in various ways. For example, in one embodiment, valves can be provided in supply lines 360 and 370 and configured to divide the supply of cleaning gas into predetermined amounts for separate gas distribution devices 350A, 350B, 350C, and 350D and / or separate gas distribution surfaces 351A, 351B, 351C, 351D, 351E, and 351F. In other words, the supply of cleaning gas from inlet ports 305A and 305B is each separately supplied to a separate supply line, wherein each separate supply line is used to divide and configure the predetermined amounts of cleaning gas supplied to a plurality of discrete input cleaning ports for supply to separate gas distribution devices.

[0042] It should be understood that although Figures 3A to 3C show supply lines 360 (or 370) branched before the separate gas distribution devices, the supply lines can be divided into any number of different flow paths, which can be used to separately supply cleaning gas to any of the gas distribution devices and / or gas distribution surfaces, provided that a predetermined amount of cleaning gas fluid can be configured to be divided and / or distributed to the respective gas distribution devices, for example, to deliver equal amounts of cleaning gas fluid to all gas distribution devices in the network or more cleaning gas fluid to one of the gas distribution devices as needed. It should also be understood that inlet cleaning ports can be provided at different locations along the substrate container. For example, the bottom wall of the substrate container may include a rear inlet cleaning port for introducing a second cleaning gas flow, wherein the rear inlet cleaning port is positioned closer to the rear wall than the front opening, or the bottom wall may include a second inlet cleaning port for introducing a second cleaning gas flow, wherein the second inlet cleaning port is positioned closer to the front opening than the rear wall, or at other locations along the substrate container. In other embodiments, inlet cleaning ports (and / or outlet cleaning ports) may be provided on the bottom wall of the substrate container, wherein if multiple inlet ports are provided, the cleaning gases may be combined before the cleaning gases are supplied to the cleaning fluid distribution system.

[0043] Although a FOUP has been described above, it should be understood that any of the embodiments discussed herein can also be used to distribute cleaning gas into an internal space within a photomask box, for example, within an outer box of a photomask box.

[0044] For example, Figures 4A and 4B illustrate another embodiment in which a supply line is provided for distributing the supply of cleaning gas to separate gas distribution devices and / or separate gas distribution surfaces. In this embodiment, a second flow path of the supply line is provided after the first flow path.

[0045] Figure 4A shows the rear side of the substrate container 400. A housing 406 defines an internal space 408 within the substrate container, in which a substrate (not shown) is stored. The housing 406 includes a first sidewall 414, a second sidewall 416, a rear wall 418, a top wall 420, and a bottom wall 422. The first sidewall 414 is opposite to the second sidewall 416, and the top wall 420 is opposite to the bottom wall 422. The first sidewall 414 may refer to the left side, and the second sidewall 416 may refer to the right side. The top wall 420 and the bottom wall 422 each extend between the first sidewall 414 and the second sidewall 416. The substrate container 400 may also include a carrier plate 423, which provides a substrate to which the housing 406 can be attached.

[0046] A cleaning fluid distribution system may be contained within or connected to the housing 406 of the substrate container 400, for example, located between the housing 406 and the carrier plate 423, or at least partially disposed between the housing 406 and the carrier plate 423. The cleaning fluid distribution system is connected to at least one inlet port, which is connected to a cleaning gas supply system for supplying cleaning gas to a network of separate gas distribution devices. The cleaning fluid distribution system includes at least one supply line connected to at least one inlet cleaning port 430A, 430B on the bottom wall 422. The supply line includes a first flow path 460A connected to one of the inlet cleaning ports 430A, 430B for supplying cleaning gas to a rear gas distribution device 450A, 450B, wherein the rear gas distribution device may include at least two tubular diffusers. The rear gas distribution devices 450A, 450B include a plurality of openings for distributing cleaning gas at a rear portion of the substrate container 400. At least one of the rear gas distribution devices 450A and 450B also includes an opening at its top, closer to the top wall 420 of the substrate container 400, forming an input cleaning port connected to a second flow path 460B for supplying cleaning gas to another gas distribution device, such as a second gas distribution device. In this embodiment, the second flow path 460B is connected to a front gas distribution device, which includes at least one gas distribution surface, such as a top manifold 450C provided near the top wall 420 of the substrate container 400.

[0047] As shown in Figure 4B, the second flow path 460B includes a pipe, channel, or path provided along a top portion of the top wall 420 closer to the substrate container 400 for supplying at least a portion of the cleaning gas supplied to the first flow path 460A, which is then distributed to the front gas distribution device. For example, the amount of cleaning gas supplied to the front gas distribution device can be configured to have a predetermined amount of cleaning gas fluid by sizing the cross-sectional area of ​​the second flow path 460B, for example, where the flow rate is proportional to the cross-sectional area, and / or by configuring the size, for example, the diameter, of the plurality of openings of the rear gas distribution devices 450A, 450B, such that a predetermined amount of cleaning gas is supplied through the second flow path 460B depending on the supply pressure (e.g., differential pressure). That is, the first gas distribution device is supplied with cleaning gas to distribute a predetermined amount of cleaning gas through the openings of the rear gas distribution devices 450A, 450B, while the remaining amount of cleaning gas is supplied to the second gas distribution device via the second flow path 460B for distribution through the gas distribution surface of the second (front) gas distribution device. It should be understood that although the description herein relates to a top manifold and diffuser, any of the gas distribution surfaces may be any structure for distributing cleaning gas to the interior of the substrate container 400, including (but not limited to) top / bottom / side manifolds, top / bottom / side diffusers, top / bottom / side films, top / bottom / side surfaces with slits or nozzles, or top / bottom / side surfaces made of porous materials. It should also be understood that the supply lines may include valves or other structures for setting the amount of cleaning gas supplied to the first gas distribution device and / or the second gas distribution device.

[0048] Figure 5A illustrates another embodiment and shows the rear side of the substrate container 500. A housing 506 defines the internal space of the substrate container, in which a substrate (not shown) is stored. The housing 506 includes a first sidewall 514, a second sidewall 516, a rear wall 518, a top wall 520, and a bottom wall 522. The first sidewall 514 is opposite to the second sidewall 516, and the top wall 520 is opposite to the bottom wall 522. The first sidewall 514 may refer to the left side, and the second sidewall 516 may refer to the right side. The top wall 520 and the bottom wall 522 each extend between the first sidewall 514 and the second sidewall 516. The substrate container 500 may also include a carrier plate 523, which provides a substrate to which the housing 506 can be attached.

[0049] A cleaning fluid distribution system may be contained within or connected to the housing 506 of the substrate container 500, for example, located between the housing 506 and the carrier plate 523, or at least partially located between the housing 506 and the carrier plate 523. The cleaning fluid distribution system 540 is connected to at least one inlet port 505, which is connected to a cleaning gas supply system for supplying cleaning gas to a network of separate gas distribution devices. The cleaning fluid distribution system 540 includes at least one supply line connected to at least one cleaning port on the bottom wall 522. In this embodiment, the cleaning fluid distribution system 540 includes a manifold substrate 560 provided on the bottom wall 522, the manifold substrate 560 being configured to distribute cleaning gas flows to a network of gas distribution devices.

[0050] As shown in Figure 5B, the manifold base 560 is connected to a network of separate gas distribution devices 550. The manifold base 560 includes a first flow path 560A connected to an inlet cleaning port for supplying cleaning gas to a first gas distribution device, and a second flow path 560B connected to an inlet cleaning port for supplying cleaning gas to a second gas distribution device. The first gas distribution device may be a rear gas distribution device 550A, which may include rear left and right diffusers 550A and 550B, and the second gas distribution device may be a front gas distribution device, which may include a front manifold 550C and left and right manifolds 550D and 550E for distributing cleaning gas into the interior of the substrate container at a front side of the substrate container. The cleaning fluid distribution system 540 is configured in such a manner that the supply lines can be adjusted to set the amount of cleaning gas flowing to at least one of the front and rear gas distribution devices, and / or can also be configured to adjust the amount of cleaning gas to the separate gas distribution surfaces of the front and / or rear gas distribution devices. It should be understood that the first and second gas distribution devices are not necessarily located in the rear and front sections, but are provided by way of example and can be provided in different (or the same) locations within the interior space of the substrate container.

[0051] For example, in this embodiment, an inlet supply line valve 580 can be adjusted to set the amount of cleaning gas supplied to the front gas distribution device and the rear gas distribution device. That is, by adjusting the supply line valve 580, a pressure difference can be generated to divide the supply of cleaning gas to the first flow path 560A and the second flow path 560B to set the amount of cleaning gas supplied to the front gas distribution device and the rear gas distribution device, which is necessary for cleaning the substrate container.

[0052] In addition to controlling the amount of cleaning gas to the upstream gas distribution device by setting the supply line valve 580, the amount of cleaning gas to the separate gas distribution surfaces 550C, 550D, and 550E of the upstream gas distribution device can be adjusted using a plurality of adjustable valves 585A, 585B, 585C, and 585D. For example, adjustable valve 585A can be configured to control a certain amount of cleaning gas to the upstream right (e.g., right side) manifold 550E, adjustable valves 585B and 585C can be configured to control a certain amount of cleaning gas to the upstream manifold 550C, and adjustable valve 585D can be configured to control a certain amount of cleaning gas to the upstream left (e.g., left side) manifold 550D. Therefore, the manifold base 560 can be used to distribute the cleaning gas from the supply line to the network of the separate gas distribution devices and / or the separate gas distribution surfaces by setting the adjustable valves 580, 585A, 585B, 585C, and 585D. In other words, the supply of cleaning gas from a single inlet port is divided and configured so that a predetermined amount of cleaning gas is supplied to a plurality of discrete inlet cleaning ports for separate supply to separate gas distribution devices 550.

[0053] As shown in Figure 5C, the inlet port connected to the cleaning fluid distribution system 540 can be provided in multiple locations. For example, although Figure 5A generally shows inlet port 505 provided below the manifold substrate 560 for supplying cleaning gas to the self-cleaning gas distribution system, it should be understood that the cleaning gas can be supplied to several inlet ports (or outlet ports) 505A, 505B, 505C, 505D provided through the carrier plate 523, depending on the nature of the application / dating configuration of the substrate container. It should be understood that the cleaning gas from inlet ports 505A, 505B, 505C, 505D can be combined before being supplied to the manifold substrate 560 or provided / combined as needed to supply different cleaning gas fluid distribution systems in the substrate container.

[0054] It should be understood that any combination of different structures can be used to control or set the amount of cleaning gas, allowing the pressure drop or flow rate to be set based on energy conservation. For example, an orifice can be placed in either the first flow path and / or the second flow path to generate a pressure difference to set the amount of cleaning gas supplied to any of the front gas distribution device and / or the rear gas distribution device and / or the separate gas distribution surfaces. Alternatively, or in addition to this structure, the cross-sectional areas of the various pipes in the first flow path and / or the second flow path can be sized to set the amount of cleaning gas divided between the front gas distribution device and the rear gas distribution device and / or the gas distribution surfaces of the front and rear gas distribution devices. Therefore, the cleaning fluid distribution system 540 is configured such that, by adjusting and / or setting the different components of the cleaning fluid distribution system 540 in an appropriate manner, the cleaning gas can be divided and supplied to different gas distribution devices and / or gas distribution surfaces.

[0055] Figure 6 illustrates one operation process 600 for supplying cleaning fluid to a substrate container according to at least one example embodiment.

[0056] Operation flow 600 may include one or more operations, actions, or functions depicted by one or more blocks 610, 620, 630, and 640. Although illustrated as discrete blocks, the various blocks may be divided into additional blocks, combined into fewer blocks, or eliminated, depending on the desired implementation. As a non-limiting example, according to one or more exemplary embodiments described herein, the description of method 600 corresponding to its description in FIG. 6 and performed by one or more of the devices or components described in the above embodiments relates to supplying cleaning fluid in a substrate container. Process flow 600 may begin at block 610.

[0057] Block 610 may refer to the supply of a cleaning gas stream to the interior of a container via an inlet cleaning port connected to a cleaning fluid distribution system at least partially disposed within a substrate container. The substrate container may be a wafer or photomask container (e.g., a FOUP or photomask enclosure). The cleaning gas stream may comprise one or more of nitrogen, clean dry air (CDA), ultra-clean dry air (xCDA), a gas for conditioning a container environment, or any other suitable gas stream. Block 610 may be followed by Block 620.

[0058] Block 620 may refer to dividing the cleaning gas supply to a network of separate gas distribution devices to distribute the cleaning gas flow to the interior space of the substrate container via a supply line of a cleaning fluid distribution system. In one embodiment of block 630, dividing the cleaning gas includes dividing the supply line into a first flow path for supplying cleaning gas to at least one of the networks of gas distribution devices and a second flow path for supplying cleaning gas to the network of gas distribution devices. The amount of cleaning gas supplied to the first flow path and the second flow path may be based on several predetermined operating conditions. For example, in one embodiment, one or more sensors may be used to detect at least one environmental condition inside the substrate container during a predetermined time period. At least one environmental condition may include relative humidity (%RH), pressure (e.g., absolute pressure), oxygen level, temperature, the presence of a measured airborne molecular contaminant, the presence of a measured one or more volatile organic compounds, etc. Blocks 620 / 630 may be followed by block 640.

[0059] Block 640 may refer to, during a predetermined time period, based on at least one detected environmental condition, setting up a first portion or amount of cleaning gas flow via a first flow path to a first distribution device and setting up a second portion or amount of cleaning gas flow via a second flow path to a second gas distribution device.

[0060] In at least one embodiment, the amount of purge gas supplied to the pre- and / or post-gas distribution devices can be obtained or determined by, for example, achieving a desired (predetermined or optimal) environmental response (e.g., within the container). The desired environmental response may include adjusting one or more of the following within the container: relative humidity (%RH), oxygen level, temperature, presence of a measured airborne molecular contaminant, and / or presence of one or more measured volatile organic compounds, to their respective predetermined threshold levels. The desired environmental response may also include generating a desired pressure (e.g., absolute pressure) within the container. The environmental response can be detected or measured by sensors within the container, and the detected data can be communicated to the outside of the container, such as a controller.

[0061] The controller analyzes the environmental response and determines the amount of purge gas required to supply to the front gas distribution device (and / or the front gas distribution surface) and the rear gas distribution device to achieve the applicable operating scenario. In one embodiment, the controller's analysis of the environmental response and determination of the amount of purge gas required to achieve the applicable operating scenario can be achieved through design of experiments (DOE), trained neural networks, modeling, etc.

[0062] The amount of cleaning gas supplied to at least one pre-distribution and / or post-distribution device can be set by installing valves in the supply lines of the cleaning fluid distribution system. Valves may include needle valves, ball valves, butterfly valves, check valves, or similar structures, which can be used to control the airflow to different and separate gas distribution devices. It should be understood that the cleaning gas flow can also be set using an orifice, spring-loaded diverter, or by sizing a pipe / conduit of one of the first or second flow paths to have a cross-sectional area for supplying a predetermined amount of cleaning gas, and applying a supply pressure to divide the cleaning gas supply as needed. In one embodiment, once the amount of cleaning gas supplied to the network of gas distribution devices is set, the amount of cleaning gas supplied (e.g., by valves) is not further adjusted until necessary, such as by passive control. state

[0063] Any of patterns 1 to 17 may be combined with any of patterns 18 and 19.

[0064] 1. A substrate container comprising: a housing defining an interior space, the housing including a front opening, a first sidewall, a second sidewall, a rear wall, and a bottom wall, the bottom wall including a front edge extending along the front opening of the housing between the first sidewall and the second sidewall; and a cleaning fluid distribution system configured to receive a cleaning gas flow, the cleaning fluid distribution system including: an inlet configured to receive the cleaning gas flow; and a network of separate gas distribution devices for distributing the cleaning gas flow to the interior space, wherein the cleaning fluid distribution system further includes a supply line connected to the inlet, the supply line configured to distribute the cleaning gas flow to the network of separate gas distribution devices.

[0065] Version 2. The substrate container of Version 1, wherein the supply line includes a first flow path leading to one of the networks of separate gas distribution devices and a second flow path leading to the other of the networks of separate gas distribution devices.

[0066] Version 3. The substrate container as in Version 2, wherein one of the networks of the gas distribution device is provided in a first gas distribution device closer to the rear wall and the other of the network of the gas distribution device is provided in a second gas distribution device in the internal space of the substrate container, and wherein the first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and the second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device.

[0067] Version 4. The substrate container of Version 3, wherein the first flow path of the supply line to the first gas distribution device has a cross-sectional area that is either smaller or larger than the second flow path of the supply line to the second gas distribution device, or includes an orifice, a spring-loaded diverter or valve to guide fluid to the second flow path of the supply line to the second gas distribution device.

[0068] Version 5. The substrate container of Version 3, wherein the second flow path is provided at the end of the first gas distribution device opposite to the inlet, after the first flow path.

[0069] State 6. A substrate container as in State 6, wherein the second flow path is provided at the top portion of one of the substrate containers to supply the cleaning gas to the second gas distribution device.

[0070] Format 7. The substrate container of Format 6, wherein the second gas distribution device includes a gas distribution surface, the gas distribution surface including a plurality of openings arranged along a length of the gas distribution surface between the first sidewall and the second sidewall, or wherein the front gas distribution device includes a gas distribution surface extending vertically along a front edge of a first sidewall or a front edge of a second sidewall.

[0071] 8. A substrate container of any of the states 1 to 3, wherein the cleaning fluid distribution system further includes a manifold substrate provided on the bottom wall, the manifold substrate receiving the cleaning gas flow from the inlet to distribute the cleaning gas flow to the network of the gas distribution device.

[0072] Version 9. The substrate container of Version 8, wherein the manifold substrate is configured to divide the second flow path into at least a left second flow path and a right second flow path to supply the portion of the cleaning gas flow to the second gas distribution device.

[0073] Sample 10. The substrate container of Sample 9, wherein the manifold substrate includes a plurality of adjustable valves for distributing at least one portion of the cleaning gas flow in the first flow path to the first gas distribution device and distributing the portion of the cleaning gas flow in the second flow path to the second gas distribution device.

[0074] 11. A substrate container of any of the states 1 to 9, wherein one of the networks of the gas distribution device includes a gas distribution surface comprising a porous material.

[0075] Format 12. A substrate container of any of Formats 1 to 11, wherein the cleaning fluid distribution system is attached to one of the inlet cleaning ports in the bottom wall of the housing.

[0076] Format 13. A substrate container of any of Formats 1 to 12, wherein one of the networks of the gas distribution device includes a gas distribution surface comprising a plurality of openings arranged along the length of one of the gas distribution surfaces between the first sidewall and the second sidewall of the housing.

[0077] 14. A substrate container of any of the states 1 to 13, further comprising: an outlet port for discharging gas from the internal space, the outlet port being disposed in the bottom wall between the inlet and the second sidewall.

[0078] Format 15. A substrate container of any of Formats 1 to 14, wherein the bottom wall includes a rear inlet cleaning port for introducing a second cleaning gas flow into the interior space through the cleaning fluid distribution system, the rear inlet cleaning port being positioned closer to the rear wall than the front opening.

[0079] Format 16. A substrate container of any of Formats 1 to 14, wherein the bottom wall includes a second inlet cleaning port for introducing a second cleaning gas flow into the interior space through the cleaning fluid distribution system, the second inlet cleaning port being positioned closer to the front opening than the rear wall.

[0080] 17. A substrate container of any of the states 1 to 16, further comprising: a door configured to be received within the front opening defined by the housing to close the interior space.

[0081] Format 18. A substrate container of any of Formats 1 to 17, wherein the inlet of the cleaning fluid distribution system includes a first inlet and a second inlet, wherein the supply line is configured to combine the cleaning gas flow from the first inlet and the second inlet and then divide the cleaning gas flow to the network of separate gas distribution devices.

[0082] 19. A method for cleaning an opened substrate container, comprising: supplying a cleaning gas flow to an inlet of a cleaning fluid distribution system at least partially disposed within the substrate container via an inlet cleaning port disposed in a wall of the substrate container; dividing the cleaning gas via a supply line of the cleaning fluid distribution system to supply to a network of separate gas distribution devices for distributing the cleaning gas flow to an interior space of the substrate container, wherein the supply line includes a first flow path to one of the networks of the gas distribution devices and a second flow path to the other of the networks of the gas distribution devices.

[0083] Version 20. The method of Version 19 further includes providing a first portion of the cleaning gas flow to a first gas distribution device via the first flow path and a second portion of the cleaning gas flow to a second gas distribution device via the second flow path.

[0084] Therefore, several illustrative embodiments of the invention have been described, and those skilled in the art will readily understand that other embodiments can be made and used within the scope of the appended claims. Many advantages of the invention covered herein have been set forth in the foregoing description. However, it should be understood that the invention is merely illustrative in many respects. Changes may be made to details, particularly in the shape, size, and arrangement of parts, without departing from the scope of the invention. Of course, the scope of the invention is defined in the language expressed in the appended claims.

[0085] 1:Substrate container 4: Front Gate 6: Shell 8: Interior Space 12: Front opening 14: First sidewall 16: Second sidewall 18: Rear wall 20: Top Wall 22:Bottom wall 24A: Leading edge 24B: Leading edge 26: Equipment hook 28: Shelf 30A: Inlet cleaning port and / or outlet cleaning port 30B: Inlet cleaning port and / or outlet cleaning port 30C: Inlet cleaning port and / or outlet cleaning port 305: Entrance Port 305A: Port 305B: Port of Entry 340: Cleaning fluid distribution system 350A: First gas distribution device 350B: Second Gas Distribution Device 350C: Third Gas Distribution Device 351A: Gas distribution surface 351B: Gas distribution surface 351C: Gas Distribution Surface 351D: Gas Distribution Surface 351E: Gas Distribution Surface 351F: Gas distribution surface 360: Supply Pipeline 360A: First flow path 360B: Second Flow Path 370: Supply pipeline 370A: First flow path 370B: Second Flow Path 400:Substrate container 406: Casing 408: Interior Space 414: First sidewall 416: Second sidewall 418: Rear wall 420: Top Wall 422: Bottom wall 423: Carrier board 430A: Inlet cleaning port 430B: Inlet cleaning port 450A: Rear Gas Distribution Device 450B: Rear Gas Distribution Device 450C: Top Manifold 460A: First flow path 460B: Second flow path 500:Substrate container 505: Port of Entry 505A: Port 505B: Port of Entry 505C: Port 505D: Port of Entry 506: Casing 514: First sidewall 516: Second sidewall 518: Rear wall 520: Top Wall 522: Bottom wall 523: Carrier board 540: Cleaning fluid distribution system 550A: Rear Left Diffuser 550B: Rear right diffuser 550C: Front manifold / separate gas distribution surface 550D: Left manifold / separate gas distribution surface 550E: Right manifold / separate gas distribution surface 560: Manifold base 560A: First flow path 560B: Second Flow Path 580: Inlet supply line valve 585A: Adjustable valve 585B: Adjustable valve 585C: Adjustable valve 585D: Adjustable valve 600: Operation Procedure / Processing Flow 610: Square 620: Square 630: Square 640: Square

Claims

1. A substrate container, comprising: A housing defining an interior space, the housing including a front opening, a first sidewall, a second sidewall, a rear wall, and a bottom wall, the bottom wall including a front edge extending along the front opening of the housing between the first sidewall and the second sidewall, wherein a plurality of inlet cleaning ports are provided on the bottom wall of the housing and each has an opening facing the interior space of the substrate container; a cleaning fluid distribution system disposed on the housing, wherein the cleaning fluid distribution system is attached to the exterior of the bottom wall of the housing, the cleaning fluid distribution system being configured to receive a cleaning gas flow, wherein the cleaning fluid distribution system includes: A plurality of inlet ports configured to receive the cleaning gas flow from outside the substrate container; and a flow path communicating with the plurality of inlet ports and the plurality of inlet cleaning ports, wherein each of the plurality of inlet ports is connected to each of the plurality of inlet cleaning ports via the flow path; and a plurality of gas distribution devices for distributing the cleaning gas flow into the interior space, wherein the plurality of inlet cleaning ports are configured to each supply the cleaning gas flow from the flow path through the opening toward the interior space to the plurality of gas distribution devices.

2. The substrate container of claim 1, wherein the plurality of gas distribution devices are each a tubular diffuser.

3. The substrate container of claim 1, wherein the plurality of gas distribution devices further includes a network of gas distribution devices.

4. The substrate container of claim 3, wherein one of the networks of the gas distribution device is provided in a first gas distribution device closer to the rear wall, and the other of the network of the gas distribution device is provided in a second gas distribution device in the interior space of the substrate container, wherein a first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and a second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device.

5. The substrate container of claim 4, wherein the first flow path to the first gas distribution device has a cross-sectional area that is either smaller or larger than the second flow path to the second gas distribution device, or includes an orifice, a spring-loaded diverter, or a valve to direct fluid to the second flow path to the second gas distribution device.

6. The substrate container of claim 1, wherein the at least one gas distribution device includes a gas distribution surface, the gas distribution surface including a plurality of openings disposed along one length of the gas distribution surface.

7. The substrate container of claim 1, wherein the cleaning fluid distribution system further includes a manifold substrate provided on the bottom wall and disposed outside the housing, and the manifold substrate contains the flow path, wherein the manifold substrate receives the cleaning gas flow from the plurality of inlets.

8. The substrate container of claim 7, wherein the flow path includes at least one left flow path and one right flow path, and the manifold substrate is configured to divide the cleaning gas flow to the at least one left flow path and one right flow path to supply a portion of the cleaning gas flow to the plurality of gas distribution devices.

9. The substrate container of claim 1, wherein the plurality of gas distribution devices includes a gas distribution surface having one of the porous materials.

10. The substrate container of claim 1, further comprising: One of the outlet ports for discharging gas from the interior space is located in the bottom wall between one of the plurality of inlet ports and the second sidewall.

11. The substrate container as claimed in claim 1, wherein, The plurality of inlet cleaning ports on the bottom wall include a rear inlet cleaning port for introducing a cleaning gas flow from one of the cleaning fluid distribution systems into the interior space, the rear inlet cleaning port being positioned closer to the rear wall than the front opening.

12. The substrate container of claim 1, wherein the plurality of inlet cleaning ports on the bottom wall includes a second inlet cleaning port for introducing a second cleaning gas flow from one of the cleaning fluid distribution systems into the interior space, the second inlet cleaning port being positioned closer to the front opening than the rear wall.

13. The substrate container of claim 1, further comprising: A door, configured to be received within the front opening defined by the housing to enclose the interior space.

14. The substrate container of claim 1, wherein each of the plurality of inlet cleaning ports is configured to receive a predetermined amount of the cleaning gas flow from each of the plurality of inlet ports.

15. The substrate container of claim 1, wherein the cleaning gas stream received by the fluid distribution system comprises nitrogen, clean dry air (CDA) and ultra-clean dry air (xCDA).

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