Methods for manufacturing polymers, photosensitive resin compositions, cured products, and monomer compounds and their manufacturing methods

Abstract

This invention provides a polymer that can form a cured product with excellent solvent resistance and storage stability even under low-temperature curing conditions, a photosensitive resin composition containing the above polymer, and a cured product thereof. This invention is a polymer characterized by having a structural unit (A) represented by the following formula (1) (where X represents a hydrogen atom or a methyl group; L represents a linear or branched divalent organic group; and Y represents an organic group that decomposes due to acid or heat, forming an vinyl ether group on the polymer side chain).

Description

Polymers and their manufacturing methods, photosensitive resin compositions, cured products, and monomeric compounds and their manufacturing methods This invention relates to a polymer and its manufacturing method, a photosensitive resin composition, a cured product, and a monomer compound and its manufacturing method. Specifically, this invention relates to a polymer, a photosensitive resin composition, a cured product, and a monomer compound and its manufacturing method that can form a cured product with excellent solvent resistance and storage stability even under low-temperature curing conditions. For photosensitive resin compositions, research is underway on various applications, such as color filters, inks, printing plates, printed wiring boards, semiconductor components, photoresists, organic insulating films, and organic protective films used in liquid crystal displays or solid-state imaging devices, as well as in various applications in motors and electronic devices. Research is being conducted to develop resins or resin compositions with superior properties required for each application. In recent years, with the continuous development of miniaturization, thinning, and energy efficiency in optical components and motors and electronic devices, higher quality performance is required for the various components used. To meet these requirements, research is being conducted on resins or photosensitive resin compositions used as materials for various components. To date, various resin or photosensitive resin compositions have been developed to meet diverse requirements (Patent Documents 1-7). For example, Patent Document 1 describes a photocurable composition containing "a compound having specific groups such as (meth)acrylic and acetal or hemiacetal groups" and a "photopolymerization initiator." This photocurable composition exhibits sufficient photocurability, can obtain high-resolution patterns by photolithography, and also has excellent thermal decomposition properties during firing. For example, Patent Document 2 describes a photosensitive resin composition that has high sensitivity and can produce a hardened film with high transparency and excellent resistance to ITO sputtering. The photosensitive resin composition contains a polymer with a weight average molecular weight greater than 1000, a photoacid generator, and a solvent. The polymer contains monomer units with residues that can generate carboxyl or phenolic hydroxyl groups due to acid, and monomer units with 3 to 16 carbon groups having ethylene unsaturated bonds at the end. Furthermore, for example, Patent Document 3 discloses a resin composition containing an alkali-soluble resin and an alkaline compound, wherein the alkali-soluble resin has a structure derived from vinyl ether compounds, and the resin composition exhibits excellent storage stability. Patent Document 4 discloses a negative inhibitor composition, which contains at least one component having an acetal-protected vinyl ether structure within the molecule. Furthermore, Patent Documents 5-7 disclose a polyfunctional (meth)acrylate having an acetal structure. [Prior Art Documents] [Patent Documents] [Patent Document 1] Japanese Patent Application Publication No. 2003-195497 [Patent Document 2] Japanese Patent Application Publication No. 2011-209682 [Patent Document 3] Japanese Patent Application Publication No. 2018-53031 [Patent Document 4] Japanese Patent Application Publication No. 2002-148805 [Patent Document 5] Japanese Patent Application Publication No. 2003-201267 [Patent Document 6] Japanese Patent Application Publication No. 2007-45924 [Patent Document 7] Japanese Patent Application Publication No. 2013-10726 As mentioned above, although various studies have been conducted on resins or photosensitive resin compositions to date, if photosensitive resin compositions containing conventional resins are used together with pigments, for example, as raw materials for color filters, there is a problem that the pigments may leach from the raw materials into the cleaning solvent during the manufacturing process of the color filter. Therefore, there is a need to further improve the solvent resistance of resins. Furthermore, in recent years, especially in color filter applications, the increasing quality and expanding applications of color LCD displays have led to a strong demand for higher performance in display panels, such as higher brightness and higher contrast. However, in the manufacturing of color filters, if the post-curing process (exposed and developed material) is carried out at temperatures exceeding 200°C, yellowing and other discoloration occur in the resulting cured material, preventing the desired color from being fully achieved. Additionally, high-temperature curing processes can also lead to excessive reactions and the generation of byproducts, degrading the properties of the substrate or cured film. To suppress these excessive reactions and efficiently obtain color filters with the desired properties, the curing reaction should proceed sufficiently even under relatively low heating conditions below 200°C. Moreover, if the curable resin composition can be cured at relatively low temperatures, the manufacturing efficiency of color filters can also be improved. On the other hand, resins that readily undergo curing reactions even under relatively low heating conditions are generally highly reactive and therefore have the problem of low storage stability. The present invention was made in view of the above-mentioned situation, and its object is to provide a polymer that can form a cured product with excellent solvent resistance and excellent storage stability even under low-temperature curing conditions, a photosensitive resin composition containing the above polymer, and a cured product thereof. Furthermore, the object is to provide a monomer compound that can be used to manufacture the above polymer, and a method for manufacturing the above polymer and monomer compound. After conducting various studies on polymers that can be used in photosensitive resin compositions, the inventors discovered that by preparing polymers with specific structures, crosslinking reactions can proceed well even under low-temperature curing conditions below 160°C, providing cured products with excellent solvent resistance and resins with excellent storage stability, thus completing this invention. That is, the present invention provides the following type of invention. [1] A polymer, characterized in that it has a structural unit (A) represented by the following formula (1). (In the formula, X represents a hydrogen atom or a methyl group. L represents a divalent organic group that is straight or branched. Y represents an organic group that decomposes due to acid or heat and generates an ethylene ether group on the side chain of the polymer.) [2] The polymer as described in [1] above, wherein the structural unit (A) is represented by the following formula (1-1). (In the formula, X represents a hydrogen atom or a methyl group. R) 1 Represents a divalent organic group, whether linear or branched. R 2 [3] The polymer of [1] or [2] above further has an acid-containing structural unit (B). [4] The polymer of any one of [1] to [3] above further has a structural unit (C) in the main chain, which has a ring structure. [5] A polymer solution, characterized in that it contains the polymer of any one of [1] to [4] above and a polar solvent. [6] A polymer solution, characterized in that it contains the polymer of any one of [1] to [4] above or the polymer solution of [5] above, and an alkaline dispersant and / or an alkaline compound. [7] A pigment dispersion, characterized in that it contains the polymer solution of [6] above and a pigment. [8] A photosensitive resin composition, characterized in that it contains a polymer of any one of [1] to [4] above, a polymer solution of [5] above, a polymer solution of [6] above, or a pigment dispersion of [7] above, a polymeric compound, and a photopolymerization initiator and / or a photoacid generator. [9] The photosensitive resin composition of [8] above is used to form a color filter.

[10] A cured material, characterized in that it is formed by curing the photosensitive resin composition of [8] or [9] above.

[11] A method for manufacturing a polymer having a structural unit (A) represented by the following formula (1) and an acid-containing structural unit (B), characterized in that the manufacturing method includes a step (P-1) of polymerizing a monomer component, the monomer component comprising a monomer containing a group that can generate an ethylene ether group due to acid or heat and an acid-containing monomer. (In the formula, X represents a hydrogen atom or a methyl group. L represents a linear or branched divalent organic group. Y represents an organic group that decomposes due to acid or heat to generate an ethylene ether group on the side chain of the polymer.)

[12] A method for manufacturing a polymer having a structural unit (A) represented by the following formula (1) and an acid-containing structural unit (B), characterized in that the manufacturing method includes the following steps: Step (Q-1): polymerizing a monomer component containing a monomer containing a monomer that generates an ethylene ether group due to acid or heat and a monomer containing a hydroxyl group; Step (Q-2): reacting an acid-containing compound with the polymer obtained in step (Q-1). (In the formula, X represents a hydrogen atom or a methyl group. L represents a straight-chain or branched divalent organic group. Y represents an organic group that decomposes due to acid or heat to form an ethylene ether group on the polymer side chain.)

[13] A monomeric compound characterized by being represented by the following formula (a). (where R) 7 Represents a hydrogen atom or a methyl group. R 8 Represents a divalent organic group, whether linear or branched. R 9 Organic groups having 1 to 20 carbon atoms (excluding groups containing (meth)acrylic acid).)

[14] A method for manufacturing a monomeric compound represented by the following formula (a-1), characterized in that: the manufacturing method includes a step of reacting a (meth)acrylate compound containing an ethylene ether group with a carboxylic acid compound, wherein in the reaction step, the amount of the carboxylic acid compound used is 1 equivalent or more relative to 1 equivalent of the ethylene ether group of the (meth)acrylate compound containing an ethylene ether group. (where R) 7 Represents a hydrogen atom or a methyl group. R 8 Represents a divalent organic group, whether linear or branched. R 10 Represents an organic group containing a hydrogen atom or 1 to 20 carbon atoms (excluding groups containing (meth)propenyl groups). The polymer and photosensitive resin composition of this invention exhibits excellent storage stability and can be fully cured even under low-temperature curing conditions, providing cured products with excellent solvent resistance. The polymer and photosensitive resin composition of this invention are widely applicable to various applications such as optical components, motor / electronic components, and display devices. The present invention will now be described in detail. Furthermore, combinations of two or more of the preferred embodiments of the present invention described below also constitute preferred embodiments of the present invention. Additionally, in this specification, "(meth)acrylate" means "acrylate and / or methacrylate", and "(meth)acrylic acid" means "acrylic acid and / or methacrylic acid". 1. Polymer The polymer of the present invention is characterized in that it has a structural unit (A) represented by the following formula (1). (In the formula, X represents a hydrogen atom or a methyl group. L represents a linear or branched divalent organic group. Y represents an organic group that decomposes due to acid or heat, forming an vinyl ether group on the polymer side chain.) The polymer of this invention possesses the aforementioned structural unit (A), and even under low-temperature curing conditions, it can form a cured product with excellent solvent resistance and excellent storage stability. This is believed to be due to the presence of a group that decomposes upon contact with acid or heat to generate vinyl ether groups. Therefore, during curing, vinyl ether groups are generated, allowing cationic polymerization via these groups to fully initiate the crosslinking reaction of the polymer. Furthermore, during storage, the vinyl ether groups, which are the curing reactive groups, are protected, thus inhibiting the self-crosslinking reaction of the polymer and resulting in excellent storage stability. The polymer of this invention will be described in detail below. (1) Structural unit (A) The polymer of the present invention has a structural unit (A) represented by the above formula (1). In addition, in this specification, "structural unit" means a repeating (structural) unit in the structure of the polymer. In formula (1) above, X represents a hydrogen atom or a methyl group. For the polymer to exhibit high hydrophilicity and excellent developability, X is preferably a hydrogen atom. In formula (1) above, L represents a linear or branched divalent organic group. Examples of divalent organic groups represented by L include linear or branched divalent hydrocarbon groups with substituents. Examples of divalent hydrocarbon groups, whether straight-chain or branched, include divalent aliphatic hydrocarbon groups. These aliphatic hydrocarbon groups can be saturated or unsaturated. Examples of divalent saturated aliphatic hydrocarbon groups include methylene, ethyl, propyl, isopropyl, butyl, isobutyl, t-butylene, pentylene, neoopentylene group, hexamethylene, heptylene, octylene, 2-ethylhexylene, nonylene, decylene, undecylene, and dodecylene. The number of carbon atoms in these saturated aliphatic hydrocarbon groups is preferably 1 to 10, more preferably 2 to 4. Examples of the aforementioned divalent unsaturated aliphatic hydrocarbon groups include vinyl, propenyl, isopropenyl, butenyl, butadienylene, pentenylene, hexenylene, and heptenylene, as well as ethynyl, propynyl, 1-butynyl, and 2-butynyl. The number of carbon atoms in these unsaturated aliphatic hydrocarbon groups is preferably 1 to 10, more preferably 2 to 4. In terms of imparting flexibility to the side chain, the aforementioned divalent aliphatic hydrocarbon group is preferably a divalent saturated aliphatic hydrocarbon group. Regarding the aforementioned divalent hydrocarbon group, at least one atom constituting the hydrocarbon group may also be substituted with an oxygen atom, a sulfur atom, a nitrogen atom, or a halogen atom. Furthermore, the aforementioned hydrocarbon group may also have substituents such as alkoxy groups. As the aforementioned straight-chain or branched divalent organic group, examples preferably include the aforementioned straight-chain or branched divalent hydrocarbon group, or a group containing the aforementioned straight-chain or branched divalent hydrocarbon group and -O-, -COO-, -CO-, -NH-, -S-, -SO-, -SO- 2- Isovalent groups. Regarding divalent hydrocarbon groups containing the above-mentioned straight-chain or branched groups and -O-, -COO-, -CO-, -NH-, -S-, -SO-, -SO- The divalent hydrocarbon group or bond may contain only one type or more types. For good copolymerization, the bond is preferably selected from at least one type of bond in the group consisting of -O-, -COO- and -CO-, and more preferably from at least one type of bond in the group consisting of -O- and -COO-. The divalent organogroup represented by L above is preferably -COO-R. 1 - (R) 1 This represents a divalent organic group, either linear or branched. (The group is represented by ). As mentioned above, R... 1 The straight-chain or branched divalent organic group represented is preferably a straight-chain or branched divalent hydrocarbon group, or a group containing the above-mentioned straight-chain or branched divalent hydrocarbon group and -O-, -COO-, -CO-, -NH-, -S-, -SO-, -SO 2-Isobonded bases, among which, better example-R 3 - (O-R) 4 )n-(where R 3 and R 4 They can be the same or different, representing divalent saturated aliphatic hydrocarbon groups. n represents an integer greater than or equal to 0. The group represented by ) . The above R 3 and R 4 The divalent saturated aliphatic hydrocarbon group represented is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 2 carbon atoms. The above n is preferably an integer from 0 to 10, and more preferably 1. The number of carbons in the divalent organic group represented by L is preferably 1 to 20, more preferably 1 to 10, and even more preferably 5. In the above formula (1), Y represents the property that it will decompose due to acid or heat, forming an ethylene ether group (-O-CH=CH) on the polymer side chain. 2) Organic groups. Examples of such organic groups include groups that have undergone acetal protection of the vinyl ether group. Examples of such acetal-protected groups include those containing -O-CH(CH) 3) A group with an -O- linker, preferably -O-CH(CH) 3) -O-R 2 The group represented. If the above polymer has this group, then -O-R 2 It can be released due to acid or heat, forming vinyl ether groups (-O-CH=CH) on the side chains of the above polymers. 2). Here, R is preferred. 2 Organic groups representing carbon numbers from 1 to 20. As mentioned above, R 2 The organic group represented is preferably a monovalent hydrocarbon group with substituents. Examples of monovalent hydrocarbon groups include chain-like hydrocarbon groups or hydrocarbon groups containing cyclic structures. Examples of aliphatic hydrocarbon groups that form the aforementioned chain structure include methyl, ethyl, n-propyl, isopropyl, n-butyl, tributyl, dibutyl, pentyl, isopentyl, neopentyl, hexyl, 2-methylpentyl, 3-methylpentyl, 2,2-dimethylbutyl, 2,3-dimethylbutyl, heptyl, 2-methylhexyl, 3-methylhexyl, 2,2-dimethylpentyl, 2,3-dimethylpentyl, 2,4-dimethylpentyl, 3-ethylpentyl, 2,2,3-trimethylbutyl, octyl, methylheptyl, dimethylhexyl, 2-ethylhexyl, 3-ethylhexyl, trimethylpentyl, 3-ethyl-2-methylpentyl, 2-ethyl-3-methylpentyl, 2,2,3-methylpentyl, 2,2,3-methylhex ... Alkyl groups including 3-tetramethylbutyl, nonyl, methyl octyl, 3,7-dimethyl octyl, dimethyl heptyl, 3-ethyl heptyl, 4-ethyl heptyl, trimethylhexyl, 3,3-diethylpentyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecanyl, eicosyl, etc.; vinyl, n-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 1-pentenyl, 2-pentenyl, 2-methyl-1-butenyl, 2-methyl-2-butenyl, 3-methyl-1-butenyl, 1-hexenyl, 2-hexenyl, 1-heptenyl, 2-heptenyl, 1-octenyl, and 2-octenyl, etc. Examples of hydrocarbon groups containing a cyclic structure include hydrocarbon groups with a cyclic structure or hydrocarbon groups having both cyclic and chain structures. Examples of hydrocarbon groups with the aforementioned cyclic structure include alicyclic hydrocarbon groups and aromatic hydrocarbon groups. Examples of alicyclic hydrocarbon groups include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and cyclododecyl cycloalkyl groups. Examples of aromatic hydrocarbon groups include aryl groups such as phenyl and naphthyl groups. The hydrocarbon groups having cyclic and chain structures mentioned above can be exemplified by hydrocarbon groups composed of combinations of cyclic and chain structures, such as benzyl, phenethyl, biphenyl, tolyl, xylyl, etc. The number of carbon atoms in the aforementioned monovalent hydrocarbon group is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 3. Furthermore, regarding the aforementioned monovalent hydrocarbon group, at least one atom constituting the hydrocarbon group may also be substituted with an oxygen atom, a sulfur atom, a nitrogen atom, or a halogen atom. Also, the aforementioned monovalent hydrocarbon group may have substituents such as alkoxy, amide, or amino groups. When the aforementioned substituent contains a carbon atom, the number of carbon atoms in the substituent is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 6. Regarding its good low-temperature hardening properties, the aforementioned R... 2 The organogroup represented is preferably -R 5(However, this excludes groups containing carbonyl groups.) or -CO-R 6 It is better to use -CO-R 6 Additionally, R in the formula... 5 and R 6 The same or different, representing an organic group, preferably a hydrocarbon group, or a group containing a hydrocarbon group and at least one bond selected from the group consisting of -O- and -COO-, more preferably an aliphatic hydrocarbon group, or a group containing an aliphatic hydrocarbon group and at least one bond selected from the group consisting of -O- and -COO-, and even more preferably an alkyl group. The above R 6 The number of carbon atoms in the represented organic group is preferably 1 to 19, more preferably 1 to 10, even more preferably 1 to 5, and most preferably 3. By controlling the number of carbon atoms within the above range, both storage stability and low-temperature curing properties can be achieved. In terms of good low-temperature hardening properties, the above-mentioned structural unit (A) is preferably the structural unit represented by the following formula (1-1). (In the formula, X represents a hydrogen atom or a methyl group. R) 1 Represents a divalent organic group, whether linear or branched. R 2 (This refers to an organic group with 1 to 20 carbon atoms.) In the above equation (1-1), R 1 and R 2 Respectively with the above R 1 and R 2 same. A polymer having the above-described structural unit (A) can be obtained, for example, by polymerizing a monomeric component containing a monomer into which the above-described structural unit (A) can be introduced. There is no particular limitation on the monomer into which the above-described structural unit (A) can be obtained by polymerization of a polymer having the above-described structural unit (A), and for example, a monomer represented by the following formula (2) can be used. CH 2 = CXL - Y (2) (In the formula, X, L and Y are the same as X, L and Y in formula (1).) Among them, the monomer represented by the above formula (2) is preferably the monomer compound represented by the following formula (a) in terms of excellent synthetic stability. (where R) 7 Represents a hydrogen atom or a methyl group. R 8 Represents a divalent organic group, whether linear or branched. R 9 (This refers to an organic group with 1 to 20 carbon atoms.) In equation (a) above, R 8 The linear or branched divalent organogroup represented is preferably R in formula (1-1) above. 1 The group representing the same linear or branched divalent organic group. Furthermore, as R... 9 The organic group represented by the carbon number 1 to 20 is preferably the same as R in the above formula (1-1). 2 The group representing the same organic group having 1 to 20 carbon atoms. As the aforementioned R... 9 The organic group represented is preferably -CO-R. 6 In this formula, R 6 Preferably, it is a hydrocarbon group, and more preferably, a chain-like saturated hydrocarbon group. The above R... 6 The number of carbons in the represented organic group is preferably 1 to 19, more preferably 1 to 10, even more preferably 1 to 5, and most preferably 3. Specific examples of the monomeric compounds represented by formula (a) above include 2-(2-(1-acetoxyethoxy)ethoxy)ethyl(meth)acrylate, 2-(2-(1-isopropoxyethoxy)ethoxy)ethyl(meth)acrylate, 2-(2-(1-ethoxyethoxy)ethoxy)ethyl(meth)acrylate, 2-(2-(1-propoxyethoxy)ethoxy)ethyl(meth)acrylate, 2-(2-(1-butoxyethoxy)ethoxy)ethyl(meth)acrylate, and so on. From a synthetic point of view, 2-(2-(1-propoxyethoxy)ethoxy)ethyl methacrylate and 2-(2-(1-butoxyethoxy)ethoxy)ethyl methacrylate are preferred, with 2-(2-(1-butoxyethoxy)ethoxy)ethyl methacrylate being the most preferred. Only one of the above monomeric compounds may be used, or two or more may be used. Furthermore, among the monomeric compounds represented by formula (a) above, R in formula (a) above... 7 R represents a hydrogen atom or a methyl group. 8 R represents a divalent organic group, whether linear or branched. 9 Novel compounds are those that represent an organic group having 1 to 20 carbon atoms (excluding groups containing (meth)acrylic acid). Such novel monomeric compounds are also part of this invention. The polymer may have only one of the above structural units (A), or it may have two or more. Regarding good low-temperature curing properties, the content of the above-mentioned structural unit (A) relative to 100% by mass of the total structural units of the above-mentioned polymer is preferably 1 to 100% by mass, more preferably 5 to 50% by mass, and even more preferably 10 to 40% by mass. (2) Structural Unit (B) The polymer of the present invention preferably further comprises a structural unit (B) containing an acid group. By having the above-mentioned structural unit (B), during curing, vinyl ether groups can be easily generated from the above-mentioned structural unit (A), and the cationic polymerization of vinyl ether groups can proceed more easily. Furthermore, the reaction of vinyl ether groups with acid groups facilitates the self-crosslinking reaction of the polymer, resulting in a more robust cured product. In addition, the polymer becomes alkali-soluble, and its developability becomes better. Examples of the above-mentioned acid groups include carboxyl groups, phenolic hydroxyl groups, carboxylic anhydride groups, phosphate groups, sulfonic acid groups, etc., functional groups that can undergo neutralization reactions with alkaline water. Only one of these groups may be present, or two or more may be present. Among these, the carboxyl group or carboxylic anhydride group is preferred for further improving developability, and the carboxyl group is more preferred. Polymers having the aforementioned acid-containing structural unit (B) can be obtained by methods 1) or 2) below. 1) Polymerizing a monomer component containing an acid-containing monomer. 2) Polymerizing a monomer component containing a hydroxyl-containing monomer to obtain a precursor polymer (base polymer), and then reacting the hydroxyl groups of the precursor polymer (base polymer) with a polybasic acid or polybasic anhydride to introduce acid groups. These methods can also be combined. In the method described in 1) above, a structural unit derived from an acid-containing monomer can be obtained as the aforementioned structural unit (B). Examples of the acid-containing monomer include compounds having both the acid group and a polymerizable double bond (carbon-carbon double bond) within the molecule. Examples of the polymerizable double bond include (meth)acrylonitrile, vinyl, allyl, and methylallyl. (Methacritrile) is preferred. Specific examples of the aforementioned monomers containing acid groups include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, cinnamic acid, and vinylbenzoic acid; unsaturated polycarboxylic acids such as maleic acid, fumaric acid, itconic acid, citraconic acid, and mesocarboxylic acid; long-chain unsaturated monocarboxylic acids such as β-carboxyethyl (meth)acrylate, mono(2-acryloxyethyl) succinate, and mono(2-methacryloxyethyl) succinate, where the unsaturated group and carboxyl group are elongated; unsaturated anhydrides such as maleic anhydride and itconic anhydride; and unsaturated compounds containing phosphate groups such as Light ester P-1M (manufactured by Kyoei Chemicals). Among these, from the viewpoint of versatility and availability, carboxylic acid monomers (unsaturated monocarboxylic acids, unsaturated polycarboxylic acids, long-chain unsaturated monocarboxylic acids, and unsaturated anhydrides) are preferred. In terms of reactivity and alkali solubility, the aforementioned monomers containing acid groups are preferably unsaturated monocarboxylic acids, and even more preferably (meth)acrylic acid. In method 2) above, after preparing a precursor polymer (prepolymer) containing hydroxyl groups, a polybasic acid or polybasic anhydride is reacted with the hydroxyl groups to introduce acid groups (carboxyl groups), thereby producing a polymer with a structural unit (B) containing acid groups. If a polymer with structural units containing acid groups is produced by this method, the acid groups will be located relatively far from the polymer backbone, making the cross-linking reaction easier during polymer curing and further improving curability. In method 2) above, a structural unit containing carboxyl groups, produced by reacting a structural unit from a hydroxyl-containing monomer with a polybasic acid or polybasic anhydride, can be obtained as the aforementioned structural unit (B). As the aforementioned hydroxyl-containing monomer, examples include monomeric compounds identical to those described later as monomers forming structural unit (D). As the aforementioned polybasic acid or polybasic anhydride, examples include compounds identical to those described later as compounds containing acid groups. Specific reaction methods will be described later in the section on polymer manufacturing methods. Furthermore, in the method described in 2) above, epoxy groups can also be used instead of the aforementioned hydroxyl groups. That is, the following method can also be used: after preparing a polymer with epoxy groups in advance, the acid group of the monomer containing acid groups is subjected to an addition reaction with the aforementioned epoxy groups, thereby opening the epoxy group ring, and reacting the polybasic acid or polybasic acid anhydride with the hydroxyl group generated at this time to produce a carboxyl group. Examples of epoxy-containing monomers used in preparing the above-mentioned epoxy-containing polymers include glycidyl methacrylate, β-methyl glycidyl methacrylate, β-ethyl glycidyl methacrylate, vinyl benzyl glycidyl ether, allyl glycidyl ether, methyl (3,4-epoxycyclohexyl) methacrylate, and vinyl cyclohexene oxide. Among these, glycidyl methacrylate and methyl (3,4-epoxycyclohexyl) methacrylate are preferred, and glycidyl methacrylate is even more preferred. The polymer may have only one of the above structural units (B), or it may have two or more. The proportion of the above-mentioned structural unit (B) relative to 100% by mass of the total structural units of the above-mentioned polymer is preferably 0 to 80% by mass, and in terms of good reproducibility, it is more preferably 3 to 80% by mass relative to 100% by mass of the total structural units of the above-mentioned polymer, even more preferably 5 to 45% by mass, and even more preferably 10 to 30% by mass. (3) Structural Unit (C) Preferably, the polymer described above is a polymer having a ring structure in the main chain. Having a ring structure in the main chain improves the heat resistance of the polymer. Examples of such ring structures include amide rings, tetrahydrofuran rings, and lactone rings. Thus, the polymer preferably further has a structural unit (C) in the main chain, which has a ring structure. Monomers capable of incorporating the aforementioned structural unit (C) can include, for example, monomers having an intramolecular ring structure containing double bonds, monomers that undergo cyclization polymerization to form polymers with a ring structure in the main chain, and monomers that form a ring structure after polymerization. From the viewpoint of good heat resistance, solvent resistance, hardness, and pigment dispersibility, monomers preferably selected from at least one monomer chosen from the group consisting of N-substituted maleamide monomers, dialkyl-2,2'-(oxidimethylene)diacrylate monomers, and α-(unsaturated alkoxyalkyl)acrylate monomers. For superior solvent resistance, N-substituted maleamide monomers are more preferred. The aforementioned structural unit (C) can be said to originate from a monomer capable of incorporating the aforementioned structural unit (C). Examples of N-substituted maleimide monomers include N-cyclohexylmaleimide, N-phenylmaleimide, N-methylmaleimide, N-ethylmaleimide, N-isopropylmaleimide, N-tert-butylmaleimide, N-dodecylmaleimide, N-benzylmaleimide, and N-naphthylmaleimide. One or more of these monomers may be used. From the viewpoints of transparency, heat resistance, and suppression of water spots, N-phenylmaleimide, N-benzylmaleimide, and N-cyclohexylmaleimide are preferred, with N-benzylmaleimide being particularly suitable. Examples of the aforementioned N-benzylmaleimide include benzylmaleimide; alkyl-substituted benzylmaleimide such as p-methylbenzylmaleimide and p-butylbenzylmaleimide; phenolic hydroxy-substituted benzylmaleimide such as p-hydroxybenzylmaleimide; and halogen-substituted benzylmaleimide such as o-chlorobenzylmaleimide, o-dichlorobenzylmaleimide, and p-dichlorobenzylmaleimide. Examples of dialkyl-2,2'-(oxadimethyl)diacrylate monomers include, for instance, dimethyl-2,2'-[oxadimethyl]bis-2-acrylate, diethyl-2,2'-[oxadimethyl]bis-2-acrylate, di(n-propyl)-2,2'-[oxadimethyl]bis-2-acrylate, di(isopropyl)-2,2'-[oxadimethyl]bis-2-acrylate, di(n-butyl)-2,2'-[oxadimethyl]bis-2-acrylate, and di(isopropyl)-2,2'-[oxadimethyl]bis-2-acrylate. Di(tributyl)-2,2'-[oxobis(methylene)]bis-2-acrylate, di(tributyl)-2,2'-[oxobis(methylene)]bis-2-acrylate, di(tripentyl)-2,2'-[oxobis(methylene)]bis-2-acrylate, di(stearyl)-2,2'-[oxobis(methylene)]bis-2-acrylate, di(lauryl)-2,2'-[oxobis(methylene)]bis-2-acrylate, di(2-ethylhexyl)-2,2'-[oxobis(methylene)]bis-2-acrylate, etc. Among these, dimethyl-2,2'-[oxobis(methylene)]bis-2-acrylate is preferred from the viewpoints of transparency, dispersibility, and ease of industrial acquisition. Examples of α-(unsaturated alkoxyalkyl) acrylate monomers include, for instance, α-(allyloxymethyl) acrylate monomers. Specific examples of the aforementioned α-(allyloxymethyl)acrylate monomers include α-allyloxymethacrylic acid; methyl α-allyloxymethacrylate, ethyl α-allyloxymethacrylate, n-propyl α-allyloxymethacrylate, isopropyl α-allyloxymethacrylate, n-butyl α-allyloxymethacrylate, dibutyl α-allyloxymethacrylate, tributyl α-allyloxymethacrylate, n-pentyl α-allyloxymethacrylate, dipentyl α-allyloxymethacrylate, tripentyl α-allyloxymethacrylate, n-hexyl α-allyloxymethacrylate, dihexyl α-allyloxymethacrylate, n-heptyl α-allyloxymethacrylate, n-octyl α-allyloxymethacrylate, dioctyl α-allyloxymethacrylate, trioctyl α-allyloxymethacrylate, 2-ethylhexyl α-allyloxymethacrylate, and capryl α-allyloxymethyl α-methacrylate. acrylate), α-allyloxymethacrylate nonyl ester, α-allyloxymethacrylate decyl ester, α-allyloxymethacrylate undecyl ester, α-allyloxymethacrylate lauryl ester, α-allyloxymethacrylate tridecyl ester, α-allyloxymethacrylate tetradecyl ester, α-allyloxymethacrylate pentadecyl ester, α-allyloxymethacrylate hexadecyl ester, α-allyloxymethacrylate heptadecanyl ester, α-allyloxymethacrylate octadecyl ester, α-allyloxymethacrylate nonadecanyl ester, α-allyloxymethacrylate ecicoacrylate, α-allyloxymethacrylate hexadecyl ester, α-allyloxymethacrylate Alkyl-(α-allyloxymethyl)acrylate monomers such as triazomethicone; alkoxyalkyl-(α-allyloxymethyl)acrylate monomers such as α-allyloxymethacrylate methoxyethoxyethyl ester, α-allyloxymethacrylate methoxyethoxyethyl ester, α-allyloxymethacrylate methoxyethoxyethoxyethyl ester, α-allyloxymethacrylate 3-methoxybutyl ester, α-allyloxymethacrylate ethoxyethyl ester, α-allyloxymethacrylate ethoxyethoxyethyl ester, α-allyloxymethacrylate phenoxyethyl ester, and α-allyloxymethacrylate phenoxyethoxyethyl ester.α-Allyloxymethacrylate hydroxyethyl ester, α-Allyloxymethacrylate hydroxypropyl ester, α-Allyloxymethacrylate hydroxybutyl ester, α-Allyloxymethacrylate fluoroethyl ester, α-Allyloxymethacrylate difluoroethyl ester, α-Allyloxymethacrylate chloroethyl ester, α-Allyloxymethacrylate dichloroethyl ester, α-Allyloxymethacrylate bromoethyl ester, α-Allyloxymethacrylate dibromoethyl ester, α-Allyloxymethacrylate vinyl ester, α-Allyloxymethacrylate allyl ester, α-Allyloxymethacrylate methylallyl ester, α-Allyloxymethacrylate crotonyl ester, α-Allyloxymethacrylate propargyl ester, α-Allyloxymethacrylate cyclopentyl ester, α-Allyloxymethacrylate cyclohexyl ester, α-Allyloxymethacrylate 4-methylcyclohexyl ester, α-Allyloxymethyl The monomers include 4-tertiary butylcyclohexyl acrylate, tricyclodecane α-allyloxymethacrylate, isoborneol α-allyloxymethacrylate, adamantane α-allyloxymethacrylate, dicyclopentadienyl α-allyloxymethacrylate, phenyl α-allyloxymethacrylate, methyl α-allyloxymethacrylate, dimethyl α-allyloxymethacrylate, trimethyl α-allyloxymethacrylate, 4-tertiary butylphenyl α-allyloxymethacrylate, benzyl α-allyloxymethacrylate, diphenyl methyl α-allyloxymethacrylate, diphenyl ethyl α-allyloxymethacrylate, triphenyl methyl α-allyloxymethacrylate, cinnamon α-allyloxymethacrylate, naphthyl α-allyloxymethacrylate, and anthracene α-allyloxymethacrylate. Among these, alkyl-(α-allyloxymethyl)acrylate monomers are more suitable. As a monomer of the aforementioned alkyl-(α-allyloxymethyl)acrylate series, methyl α-allyloxymethacrylate (also known as meth-(α-allyloxymethyl)acrylate) is particularly suitable from the viewpoints of transparency or dispersibility and ease of industrial acquisition. The aforementioned α-(unsaturated alkoxyalkyl) acrylate monomers can be manufactured, for example, by the manufacturing method disclosed in International Publication No. 2010 / 114077. Furthermore, 2-(hydroxyalkyl)acrylate can be used as a monomer capable of incorporating the aforementioned structural unit (C). 2-(hydroxyalkyl)acrylate can react with (meth)acrylic acid to form an lactone ring structure in the main chain. Examples of 2-(hydroxyalkyl)acrylates include 2-(1-hydroxyalkyl)acrylates and 2-(2-hydroxyalkyl)acrylates. More specifically, examples include methyl 2-(1-hydroxymethyl)acrylate, ethyl 2-(1-hydroxymethyl)acrylate, isopropyl 2-(1-hydroxymethyl)acrylate, n-butyl 2-(1-hydroxymethyl)acrylate, tributyl 2-(1-hydroxymethyl)acrylate, and 2-ethylhexyl 2-(1-hydroxymethyl)acrylate. Among these, methyl 2-(1-hydroxymethyl)acrylate and ethyl 2-(1-hydroxymethyl)acrylate are preferred. The polymer may have only one of the above structural units (C), or it may have two or more. The proportion of the above-mentioned structural unit (C) relative to 100% by mass of the total structural units of the above-mentioned polymer is preferably 0 to 50% by mass, more preferably 1 to 50% by mass, even more preferably 1.5 to 20% by mass, and even more preferably 2 to 15% by mass. (4) Structural Unit (D) The polymer described above may also have other structural units (D) besides the structural units (A), (B), and (C) described above. Examples of other structural units (D) may be derived from the following monomers: hydroxyl-containing monomers such as 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl methacrylate, 2,3-hydroxypropyl methacrylate, and hydroxyalkyl methacrylates. Methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, dibutyl methacrylate, n-pentyl methacrylate, diamyl methacrylate, n-hexyl methacrylate, 2-ethylhexyl methacrylate, isodecanyl methacrylate, tridecyl methacrylate, octyl methacrylate, isooctyl methacrylate, lauryl methacrylate, octadecyl methacrylate, benzyl methacrylate, propyl methacrylate Phenyl acrylate, isocamphene acrylate, adamantane acrylate, tricyclodecane acrylate, cyclohexyl acrylate, dicyclopentane acrylate, 4-(1-methoxy)ethoxycyclohexyl acrylate, 2-methoxyethyl acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, N,N-dimethylaminoethyl acrylate, 1,4-dioxaspiro[4,5]dec-2-ylmethacrylic acid, methacrylic acid Methacrylate monomers such as porphyrin, 4-(meth)propenylated methyl-2-methyl-2-ethyl-1,3-dioxolane, 4-(meth)propenylated methyl-2-methyl-2-isobutyl-1,3-dioxolane, 4-(meth)propenylated methyl-2-methyl-2-cyclohexyl-1,3-dioxolane, and 4-(meth)propenylated methyl-2,2-dimethyl-1,3-dioxolane; aromatic vinyl monomers such as styrene, vinyltoluene, α-methylstyrene, and methoxystyrene. Monomers containing epoxy groups, such as glycidyl methacrylate, β-methyl glycidyl methacrylate, β-ethyl glycidyl methacrylate, vinyl benzyl glycidyl ether, allyl glycidyl ether, (3,4-epoxycyclohexyl) methyl methacrylate, and vinyl cyclohexane; (meth)acrylamide derivatives, such as N,N-dimethyl (meth)acrylamide and N-hydroxymethyl (meth)acrylamide; macromonomers with (meth)acrylyl groups at the single end of the polymer molecular chain, such as polystyrene, polymethacrylate, polyethylene oxide, polypropylene oxide, polysiloxane, polycaprolactone, and polycaprolactone; conjugated dienes such as 1,3-butadiene, isoprene, and chloroprene; vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl benzoate. Ethyl vinyl ethers include methyl vinyl ether, ethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, 2-ethylhexyl vinyl ether, n-nonyl vinyl ether, lauryl vinyl ether, cyclohexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, methoxyethoxyethyl vinyl ether, methoxy polyethylene glycol vinyl ether, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, and other vinyl ethers; N-vinylpyrrolidone, N-vinylcaprolactone, N-vinylimidazolium, N-vinyl... N-vinyl compounds such as porphyrin and N-vinylacetamide; styrene derivatives such as vinyltoluene and styrene; and unsaturated isocyanates such as ethyl isocyanate and allyl isocyanate. Preferably, the above-mentioned structural unit (D) is a structural unit of at least one monomer selected from the group consisting of hydroxyl-containing monomers, (meth)acrylate monomers and styrene derivatives. The polymer may have only one of the above structural units (D) or more than two. The proportion of the aforementioned structural unit (D) relative to 100% by mass of the total structural units of the polymer is preferably 0-99% by mass, more preferably 1-99% by mass, even more preferably 2-80% by mass, and even more preferably 10-70% by mass. When the polymer contains two or more of the aforementioned structural units (D), the proportion of each structural unit (D) can be appropriately set according to the uses and purposes of the polymer according to the present invention. The preferred acid value of the above-mentioned polymer is 10–200 mg KOH / g. For better developability, the preferred acid value is 20–150 mg KOH / g, and even more preferably 50–130 mg KOH / g. The above acid value is determined by neutralization titration using potassium hydroxide (KOH) solution, and represents the acid value per 1g of resin solids. The weight-average molecular weight of the above-mentioned polymer is preferably 1,000 to 100,000. Regarding good low-temperature curing properties, the weight-average molecular weight of the above-mentioned polymer is more preferably 3,000 to 50,000, and even more preferably 5,000 to 20,000. The above-mentioned weight-average molecular weight is a value that can be determined by gel permeation chromatography (GPC) using the method described in the examples. The vinyl ether equivalent of the above-mentioned polymer is preferably 200–50,000 g / mol. For improved curability and storage stability, the vinyl ether equivalent is more preferably 300–10,000 g / mol, and even more preferably 400–2,000 g / mol. Here, the vinyl ether group refers to the vinyl ether group formed when all acetal bonds in the polymer are deprotected, and is a vinyl ether group potentially present in the polymer. The aforementioned vinyl ether equivalent refers to the mass of the solid content of the polymer solution per 1 mol of vinyl ether groups. The mass of the solid content of the polymer solution refers to the mass of the monomer components constituting the polymer. The vinyl ether equivalent can be obtained by dividing the mass (g) of the polymer solid content of the polymer solution by the number of vinyl ether groups (mol) of the polymer. Alternatively, it can be determined using titration, elemental analysis, NMR, IR, or differential scanning calorimetry. The polymers described above may also have polymerizable double bonds in their side chains. The presence of polymerizable double bonds in the side chains improves the curability of the polymers. Examples of such polymerizable double bonds include those described above. Of particular, (meth)acrylic acid groups are preferred in terms of reactivity. When the polymer has polymerizable double bonds in its side chains, the double bond equivalent is preferably 400–50,000 g / mol. Regarding improved hardening properties, the double bond equivalent is more preferably 500–10,000 g / mol, and even more preferably 600–2,000 g / mol. Here, "double bond" refers to a double bond with free radical polymerizability. That is, it is a polymerizable double bond represented by a (meth)acrylic acid group. For example, double bonds formed by the addition of tetrahydrophthalic anhydride to a p-hydroxyl group are not reactive and are therefore not included in the calculation of double bond equivalent. The aforementioned double bond equivalent refers to the mass of the solid content of the polymer solution per 1 mol of double bonds in the aforementioned polymer. The mass of the solid content of the polymer solution refers to the mass of the monomer components constituting the polymer. The aforementioned double bond equivalent can be obtained by dividing the mass (g) of the polymer solid content of the polymer solution by the amount of double bonds (mol) in the polymer. Furthermore, it can be determined using various analytical methods such as titration, elemental analysis, NMR, IR, or differential scanning calorimetry. 2. Method for Manufacturing the Polymer Regarding the method for manufacturing the polymer of the present invention, there are no particular limitations if the aforementioned polymer can be obtained. For example, a known method can be used to polymerize a monomeric component containing monomers into which the aforementioned structural unit (A) and desired structural units (B), (C), and (D) can be incorporated. The amount of each monomer can be appropriately adjusted in such a way that the content of each structural unit in the polymer is within a desired range. There are no particular limitations on the methods used to polymerize the monomer components described above; commonly used methods such as total polymerization, solution polymerization, and emulsion polymerization can be used. Solution polymerization is preferred due to its industrial advantages and ease of adjusting molecular weight and other structural aspects. Regarding the polymerization mechanism of the monomer components, polymerization methods based on free radical polymerization, anionic polymerization, cationic polymerization, and coordination polymerization can be used; however, free radical polymerization is preferred due to its industrial advantages. Furthermore, the molecular weight of the polymer obtained by polymerizing the monomer components can be controlled by adjusting the amount or type of polymerization initiator, the polymerization temperature, and the type or amount of chain transfer agent. Examples of polymerization initiators include peroxides or azo compounds, which are commonly used as polymerization initiators. Examples of chain transfer agents include alkyl thiols, mercaptocarboxylic acids, mercaptocarboxylic acid esters, and other compounds with thiol groups, which are commonly used as chain transfer agents. Only one of these compounds may be used, or two or more may be used in combination. Furthermore, the amount of these compounds added can be appropriately set according to known methods. Examples of solvents used in the above polymerization include aromatic hydrocarbon solvents such as toluene, xylene, and benzene; aliphatic hydrocarbon solvents such as hexane, pentane, heptane, and cyclohexane; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; halogenated hydrocarbon solvents such as chlorobenzene, dichloromethane, chloroform, and 1,2-dichloroethane; nitrile solvents such as acetonitrile, propionitrile, and valerate; ester solvents such as methyl acetate, ethyl acetate, isopropyl acetate, and butyl acetate; and dimethyl methacrylate. Acetamide solvents such as DMF, dimethylacetamide, and N-methylpyrrolidone; ether solvents such as diethyl ether, diisopropyl ether, 1,2-dimethoxyethane (DME), 1,4-dioxane, tetrahydrofuran (THF), tetrahydropiperanan (THP), methyl phenyl ether, diethylene glycol dimethyl ether (diethylene glycol dimethyl ether), diethylene glycol ethyl ether (carbidol), cyclopentyl methyl ether (CPME), propylene glycol monomethyl ether acetate, and propylene glycol monomethyl ether; fluorinated solvents such as perfluorohexane, perfluorocyclohexane, pentafluorobenzene, and octafluorotoluene; and DMSO and methane nitrate. Only one or more of these solvents may be used. There is no particular limitation on the amount of the above solvents used, and they can be appropriately set using known methods. Regarding the polymerization conditions described above, the polymerization temperature can be appropriately set according to the type or amount of monomer used, the type or amount of polymerization initiator, etc., for example, preferably 40-130°C, more preferably 50-120°C. Similarly, the polymerization time can also be appropriately set, for example, preferably 1-15 hours, more preferably 2-11 hours. As a method for manufacturing the above-mentioned polymer, it is preferred to include a step of polymerizing a monomer component, which comprises a monomer (a) containing a group that can generate an ethylene ether group due to acid or heat and a monomer (b) containing an acid group. Furthermore, a method for manufacturing a polymer having a structural unit (A) represented by the above formula (1) and a structural unit (B) containing an acid group (polymer manufacturing method 1) is also one of the present inventions. This manufacturing method includes a step (P-1) of polymerizing a monomer unit, which comprises a monomer containing a group that can generate an ethylene ether group due to acid or heat and a monomer containing an acid group. Step (P-1) As the monomer having a group that can generate an ethylene ether group due to acid or heat, the monomer that can incorporate the structural unit (A) can be taken as an example, and preferably the monomer compound represented by the above formula (a) can be taken as an example. As the monomer containing the acid group, the same as those mentioned above can be taken as an example. The polymerization in step (P-1) described above can be carried out using the same method as the polymerization method described above. In the above polymerization, additives such as polymerization initiators and chain transfer agents, or solvents, may also be used appropriately. The polymerization in step (P-1) described above is preferably carried out in the presence of a basic compound. Polymerizing the monomer components in the presence of a basic compound allows the formation of vinyl ether groups in monomer (a) to be suppressed by the acidic groups in the acid-containing monomer units, thus ensuring the smooth progress of the target polymerization reaction. Furthermore, since the acidity of the reaction system is neutralized, the formation of vinyl ether groups is suppressed, thereby inhibiting gelation and yielding a polymer with excellent storage stability. Additionally, to further improve the storage stability of the obtained polymer, a basic compound can be added after polymerization. Examples of the aforementioned basic compounds include: ammonia; primary amines such as methylamine; secondary amines such as dimethylamine; tertiary amines such as triethylamine and diethylmethylamine; aliphatic amines such as dimethylethanolamine, n-butylamine, and diethylamine; cyclic aliphatic amines such as cyclohexylamine; and piperidine. Phosphorus, N-ethylpiperidine, N-ethyl Heterocyclic amines such as porphyrin and pyridine; aromatic amines such as benzylamine, N-toluidine, and N,N-dimethylamine; tetraalkylammonium halides such as tetramethylammonium chloride and tetraethylammonium chloride; tetraalkylammonium organic acid salts such as tetramethylammonium acetate; tetraalkylammonium inorganic acid salts such as tetramethylammonium bisulfate and tetraethylammonium bisulfate; (hydroxy)alkylammonium hydroxides such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, and monohydroxyethyltrimethylammonium hydroxide; hydroxides of alkali metals such as sodium and potassium; hydroxides of transition metals such as barium, strontium, calcium, and lanthanum; [Pt(NH4+)2] 3) 6](OH) 4. Free salts of tertiary amines, etc. Among them, secondary amines, tertiary amines, and heterocyclic amines are preferred in terms of inhibiting deprotection, with tertiary amines being more preferred. Furthermore, the boiling point of the aforementioned alkaline compound is preferably 20–220°C, more preferably 30°C–150°C, and even more preferably 50°C–100°C. If the boiling point of the aforementioned alkaline compound is the same as or lower than the firing temperature after the coating is formed, the alkaline compound will volatilize during firing, causing the neutralized side-chain carboxylates to become carboxylic acids. These carboxylic acids can then promote the cationic polymerization of vinyl ethers or facilitate cross-linking through acetalization with the side-chain carboxylic acids. In the above step (P-1), there is no particular limitation on the amount of basic compound used, as long as it can suppress the formation of vinyl ether groups. For example, it is more preferably 0.5 to 10 equivalents relative to 1 equivalent of the monomer containing acid groups, more preferably 0.8 to 2 equivalents, and even more preferably 0.9 to 1.2 equivalents. Furthermore, a method for manufacturing a polymer having the structural unit (A) represented by the above formula (1) and the structural unit (B) containing an acid group (polymer manufacturing method 2) is also one of the present invention. The manufacturing method includes the following steps: Step (Q-1): polymerizing a monomer component containing a monomer containing a monomer that generates an ethylene ether group due to acid or heat and a monomer containing a hydroxyl group, and Step (Q-2): reacting the compound containing the acid group with the polymer obtained in Step (Q-1) above. Step (Q-1) In the above-mentioned polymer manufacturing method 2, firstly, a monomer component is polymerized, which includes a monomer (a) containing an ethylene ether group that can be generated by acid or heat and a hydroxyl-containing monomer. As for the monomers containing groups that can generate vinyl ether groups due to acid or heat, and the monomers containing hydroxyl groups in step (Q-1) above, the same as those described above can be used. The polymerization reaction in step (Q-1) above can be carried out using the same method as the polymerization method described above. Furthermore, in the above polymerization, the above-mentioned polymerization initiators, chain transfer agents, additives, or solvents can also be used. Step (Q-2): In method 2 for manufacturing the polymer described above, the acid-containing compound is then reacted with the polymer obtained in step (Q-1). By reacting the polymer with the acid-containing compound, the hydroxyl groups of the polymer react with the acid groups of the acid-containing compound, thereby adding the acid-containing compound. The aforementioned acid-containing compounds are preferably polybasic acids or polybasic acid anhydrides, such as carboxylic acids like succinic acid, maleic acid, phthalic acid, tetrahydrophthalic acid, and trimellitic acid; and carboxylic anhydrides like succinic anhydride, maleic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, isconic anhydride, and 1,2,4-trimethylcarboxylic anhydride. Among these, carboxylic anhydrides are preferred for their higher addition reactivity, and succinic anhydride is even more preferred. The amount of the aforementioned acid-containing compounds used can be appropriately determined according to the intended use, purpose, and desired acid value of the obtained polymer. The reaction of the polymer with the acid-containing compound in step (Q-2) is preferably carried out in the presence of a basic compound. Although an acid group may be generated at the end of the polymer due to the addition reaction of the acid-containing compound, it will be immediately neutralized by the basic compound. Therefore, in the polymer obtained, the vinyl ether group, which may be generated by acid or heat, is easily protected, and the reaction between polymers can be inhibited, thus improving the synthesis and storage stability of the polymer. As an example of the aforementioned basic compound, a compound identical to the aforementioned basic compound can be cited. In step (Q-2) above, there is no particular limitation on the amount of the alkaline compound used, as long as it can suppress the formation of vinyl ether groups. For example, relative to the amount of the constituent unit 1 containing acid groups used in step (Q-1) above, it is preferably 0.5 to 10 equivalents, more preferably 0.8 to 2 equivalents, and even more preferably 0.9 to 1.2 equivalents. Furthermore, when manufacturing polymers with polymerizable double bonds in the side chains, for example, polymerizable double bonds can be introduced into the polymer side chains by performing an addition reaction between (meth)acrylic acid and epoxy groups after step (Q-1). Alternatively, polymerizable double bonds can be introduced into the polymer side chains by performing an addition reaction between an unsaturated isocyanate and a hydroxyl group, instead of (meth)acrylic acid. Alternatively, polymerizable double bonds can be introduced into the side chains of a polymer by reacting an epoxy-containing compound with an acid group. For example, after preparing a polymer (base polymer) with an acid group, the aforementioned epoxy-containing monomer can be reacted with the acid group, and a polymerizable double bond can be introduced by utilizing the addition reaction of epoxy group cleavage. There are no particular limitations on the addition reactions of the aforementioned (meth)acrylic acid, unsaturated isocyanates, and epoxy-containing compounds, and they can be carried out using known methods. Furthermore, commonly used catalysts or solvents can also be used in the above addition reactions. In the above-described polymer manufacturing method, as mentioned above, an alkaline compound is preferred. However, the alkaline compound may remain after polymer manufacturing. Furthermore, in this invention, a polymer solution containing the above-described polymer and the alkaline compound is also a preferred form. This polymer solution exhibits good storage stability. Additionally, the above-described polymer solution may further contain the polar solvent described later. In addition to the reaction steps described above, the method for manufacturing the polymer may also include other steps. Examples of these other steps include ripening, neutralization, dilution, drying, concentration, and purification. These steps can be carried out using known methods. 3. Method for manufacturing monomeric compounds As a monomer into which the above structural unit (A) can be incorporated, a method for manufacturing the monomeric compound represented by the above formula (a) will be described. For example, a method for manufacturing the above monomeric compound may be a reaction of a carboxylic acid compound or an alcohol compound with a (meth)acrylate compound containing an vinyl ether group. Examples of the (meth)acrylate compounds containing vinyl ether groups include, for example, the compounds represented by the following formula (3). 2 = C(R) 11 ) - COO - R 12 -O-CH=CH 2(3) (where R) 11 Represents a hydrogen atom or a methyl group. R 12 Represents a divalent organic group that is either linear or branched. As R in the above formula (3). 12 The organic group represented can be exemplified by R in formula (a) above. 8 The groups represented are the same as the organic groups. Specifically, examples of the (meth)acrylate compounds containing vinyl ether groups include, for example, 2-(2-vinyloxyethoxy)ethyl acrylate and 2-(2-vinyloxyethoxy)ethyl methacrylate. Examples of the aforementioned carboxylic acid compounds include, for example, aliphatic carboxylic acids such as acetic acid, propionic acid, butyric acid, valeric acid, hexanoic acid, enanthic acid, heptylic acid, octanoic acid, lauric acid, myristic acid, palmitic acid, and stearic acid; monocarboxylic acid compounds such as β-carboxyethyl (meth)acrylate, mono(2-acryloxyethyl) succinate, and mono(2-methacryloxyethyl) succinate; and dicarboxylic acid compounds such as oxalic acid, malonic acid, succinic acid, tartaric acid, malic acid, maleic acid, gluconic acid, fumaric acid, phthalic acid, isophthalic acid, p-phthalic acid, and 5-norcamphenic acid. Among these, monocarboxylic acids are preferred for ease of copolymerization, aliphatic carboxylic acids and formic acid are more preferred, and acetic acid, propionic acid, butyric acid, and formic acid are even more preferred. Furthermore, from the perspective of improving hardening properties and storage stability after polymerization, propionic acid and butyric acid are even better, with butyric acid being the best. Examples of the aforementioned alcohol compounds include, for instance, monoalcohols with 1 to 10 carbon atoms, such as methanol, ethanol, propanol, isopropanol, butanol, pentanol, hexanol, isobutanol, isoamyl alcohol, propylene glycol monomethyl ether, and propylene glycol monobutyl ether; and polyols with 1 to 10 carbon atoms, such as polyethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, tetraethylene glycol, and polypropylene glycol. Among these, monoalcohols are preferred for ease of copolymerization of the product, and ethanol, isopropanol, and propylene glycol monomethyl ether are even more preferred. The aforementioned carboxylic acid compounds and alcohol compounds may be used individually or in combination of two or more. Among them, carboxylic acid compounds are preferred in terms of better storage stability. Furthermore, in terms of easily combining storage stability and low-temperature hardening properties, the aforementioned carboxylic acid compounds and alcohol compounds are preferably compounds with 1 to 19 carbon atoms, more preferably compounds with 1 to 10 carbon atoms, even more preferably compounds with 1 to 5 carbon atoms, and most preferably compounds with 4 carbon atoms. In the above reaction, it is preferable to mix 1 equivalent or more of a carboxylic acid compound or alcohol compound relative to 1 equivalent of the (meth)acrylate compound containing an ethylene ether group, more preferably 1 to 20 equivalents, even more preferably 1.1 to 10 equivalents, and even more preferably 1.2 to 2 equivalents. By using 1 equivalent or more, the reaction matrix itself acts as a self-catalyst, thereby promoting the reaction. The above reaction is not particularly limited and can be carried out by known methods such as mixing the components and heating. Furthermore, while a solvent is not required in the above reaction, it may be used. Examples of solvents used in the above reactions include aromatic hydrocarbons such as benzene, toluene, and xylene; aliphatic hydrocarbons such as pentane, hexane, cyclohexane, and heptane; ethers such as diethyl ether and diisopropyl ether; ketones such as acetone and methyl ethyl ketone; polar solvents such as dimethylformamide and dimethyl sulfoxide; halogenated hydrocarbons such as chloroform, methylene chloride, dichloroethane, and chlorobenzene; esters such as ethyl acetate; ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, and diethylene glycol diethyl ether; and ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, and propylene glycol monomethyl ether acetate, etc., one or two of these types. In the above reaction, known additives such as catalysts and polymerization inhibitors may also be added. Examples of catalysts mentioned above include aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, trichloroacetic acid, dichloroacetic acid, pyruvic acid, and glycolic acid; aliphatic polycarboxylic acids such as oxalic acid, maleic acid, butanone, malonic acid, fumaric acid, tartaric acid, and citric acid; aromatic carboxylic acids such as benzoic acid and p-phthalic acid; aromatic sulfonic acids or their salts such as benzenesulfonic acid, p-toluenesulfonic acid, pyridinium salt of p-toluenesulfonic acid, and quinolinium salt of p-toluenesulfonic acid; sulfates such as sodium sulfate, potassium sulfate, magnesium sulfate, calcium sulfate, nickel sulfate, copper sulfate, and zirconium sulfate; hydrogen sulfates such as sodium bisulfate and potassium bisulfate; mineral acids such as sulfuric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid, phosphoric acid, and polyphosphate; and phosphomolybdic acid, phosphotungstomolybdic acid, and silicotungstomolybdic acid. Heteropoly acids such as acid; acid catalysts as described in paragraph

[0043] of Japanese Patent Application Publication No. 2003-201267, as well as unsaturated compounds containing phosphate groups such as 2-methacryloxyethyl phosphate and 2-acryloxyethyl phosphate, and commercially available products such as Light ester P-1M and Light ester P-2M (manufactured by Kyoesha Chemical). Only one of the above catalysts may be used, or two or more may be used in combination. The amount of the catalyst used is preferably 0.001 to 10 parts by mass, more preferably 0.005 to 1 part by mass, and even more preferably 0.008 to 0.05 parts by mass, relative to 100 parts by mass of the (meth)acrylate compound containing vinyl ether groups. In terms of speed of reaction, p-toluenesulfonic acid is preferably used as the catalyst in the above reaction. Examples of polymerization inhibitors include quinone-based polymerization inhibitors such as hydroquinone, methoxyhydroquinone, benzoquinone, and p-tert-butylcatechol; alkylphenol-based polymerization inhibitors such as 2,2'-methylene-bis(4-methyl-tert-butylphenol), 2,6-bis-tert-butylphenol, 2,4-bis-tert-butylphenol, 2-tert-butyl-4,6-dimethylphenol, 2,6-bis-tert-butyl-4-methylphenol, and 2,4,6-tri-tert-butylphenol; and alkylation. Amine polymerization inhibitors such as diphenylamine, N,N'-diphenyl-p-phenylenediamine, and phenanthrene; N-oxyl radicals such as 4-hydroxy-2,2,6,6-tetramethylpiperidine-N-oxy radical; and copper dithiocarbamate polymerization inhibitors such as copper dimethyldithiocarbamate, copper diethyldithiocarbamate, and copper dibutyldithiocarbamate. Only one of these can be used, or two or more can be used in combination. Regarding the amount of the above-mentioned polymerization inhibitor used, it is preferably 0.001 to 10 parts by mass relative to 100 parts by mass of the above-mentioned (meth)acrylate compound containing vinyl ether group, more preferably 0.005 to 1 part by mass, and even more preferably 0.01 to 0.5 parts by mass. There are no particular limitations on the reaction conditions. For example, the reaction temperature is preferably 0–100°C, more preferably 10–80°C, and even more preferably 20–60°C. As for the reaction time, it is preferably 0.1–20 hours, more preferably 1–15 hours, and even more preferably 2–12 hours. In addition to the reaction steps described above, the method for producing the aforementioned monomeric compounds may further include other steps such as a purification step. These other steps can be carried out using known methods. As a purification step, acid-base extraction is preferred. Unreacted carboxylic acid compounds or alcohols are separated from the aqueous layer using an alkaline aqueous solution, and the oil layer is concentrated, thereby efficiently purifying the target compound. After the synthesis of the aforementioned monomeric compounds, a basic compound may be added to improve their storage stability. Examples of such basic compounds include those described above. The monomeric compounds described above can be manufactured using the above-described manufacturing method. Among these monomeric compounds, the monomeric compound represented by the following formula (a-1) is preferably manufactured by the following method, which includes a step of reacting a (meth)acrylate compound containing an vinyl ether group with a carboxylic acid compound. In the above reaction step, the amount of the carboxylic acid compound used is at least one equivalent relative to one equivalent of the vinyl ether group in the (meth)acrylate compound containing the vinyl ether group. This method of manufacturing the above formula (a-1) is a novel manufacturing method and is one aspect of the present invention. (where R) 7 Represents a hydrogen atom or a methyl group. R 8 Represents a divalent organic group, whether linear or branched. R 10 Represents an organic group containing a hydrogen atom or 1 to 20 carbon atoms (excluding groups containing (meth)propenyl groups). As R 10 The organic groups representing carbon numbers from 1 to 20, excluding those containing (meth)propenyl groups, can also include those mentioned above. 6 The same group that represents the organic group. 4. Polymer Solution The above-mentioned polymer is preferably prepared into a polymer solution together with a polar solvent. Adding a polar solvent to the above-mentioned polymer to prepare a polymer solution improves the storage stability of the polymer. While the reason for the improved storage stability of the above-mentioned polymer due to the addition of a polar solvent is unclear, it is believed to be due to the interaction with the acetal structure, which inhibits the deprotection of the acetal group, thus maintaining solvent resistance and simultaneously improving storage stability. Furthermore, the above-mentioned polymer and the polymer solution containing a polar solvent are also part of this invention. Examples of the aforementioned polar solvents include protic polar solvents and aprotic polar solvents. Examples of protic polar solvents include water, alcohol-based solvents, amine-based solvents, and phenol-based solvents. Among these, alcohol-based solvents are preferred as protic polar solvents. As preferred solvents for the aforementioned alcohol-based systems, saturated alcohols are preferred, including monofunctional alcohols (monols), polyols, and glycol monoethers. Specific examples of such alcohol-based solvents include methanol, ethanol, 1-propanol, 1-butanol, 1-pentanol, 1-hexanol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monophenyl ether, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monomethyl ether, triethylene glycol monobutyl ether, tripropylene glycol, and tripropylene glycol monobutyl ether, etc. Secondary alcohols such as isopropanol, 2-butanol, 2-pentanol, 3-pentanol, 2-hexanol, cyclohexanol, 2-heptanol, 3-heptanol, propylene glycol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol monophenyl ether, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, or tripropylene glycol monomethyl ether; and tertiary alcohols such as tertiary butanol, tertiary pentanol, and tertiary hexanol. Among these, secondary or tertiary alcohols are preferred for suppressing the deprotection of the acetal group and for reducing the viscosity of the polymer solution. Regarding the carbon number of the aforementioned alcohol solvents, in terms of their relatively low boiling point and ease of removal by heating, it is preferably 1 to 10, more preferably 2 to 8, and even more preferably 3 to 6. As the above-mentioned alcohol solvent, propylene glycol monomethyl ether is particularly preferred. Examples of amine solvents used include diethyleneamine, dimethylamine, and oleylamine. Examples of phenolic solvents include kappaphenol, cresol, o-cresol, m-cresol, p-cresol, and succinate. As the aforementioned aprotic solvent, ether-based solvents, ether acetate-based solvents, and amide-based solvents are preferred. Among these, amide-based solvents are more preferably the aprotic solvents mentioned above. Examples of ether solvents used in the above-mentioned applications include tetrahydrofuran, dialkyl, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and diethylene glycol ethyl methyl ether. Examples of solvents that can be used as ether acetates include one or two types of ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, and propylene glycol monomethyl ether acetate. Examples of amide-based solvents include N,N-diethylmethylamide, N,N-dimethylmethylamide, N,N-dimethylacetamide, N-methylpyrrolidone, and tetramethylurea. From the viewpoint of compatibility with copolymers, N,N-dimethylmethylamide is more suitable. The aforementioned polar solvent is preferably at least one solvent selected from the group consisting of alcohol solvents, ether solvents and amide solvents, and more preferably at least one solvent selected from the group consisting of alcohol solvents and amide solvents. In terms of being easily removed by heating and having a certain boiling point, and being able to easily form a flat film, the boiling point of the above-mentioned polar solvent is preferably 70-180°C, more preferably 100-170°C, and even more preferably 110-160°C. The aforementioned polymer solution may also contain one or more polar solvents. The content of the aforementioned polar solvents in the polymer solution is preferably 10% by mass or more, more preferably 30% by mass or more, and even more preferably 40% by mass or more, relative to 100% by mass of the polymer solids content. Furthermore, for ease of concentration adjustment in the resin composition, the content of the aforementioned polar solvents is preferably 1000% by mass or less, more preferably 300% by mass or less, and even more preferably 200% by mass or less, relative to 100% by mass of the polymer solids content. The aforementioned polymer solution can be prepared by mixing a polymer purified from a polymerization solution containing the polymer obtained during polymerization with the aforementioned polar solvent, or by adding the aforementioned polar solvent to a polymerization solution containing the aforementioned polymer. When the aforementioned polar solvent is added to a polymerization solution containing the aforementioned polymer, the polymer solution may also contain the polymerization solvent. The aforementioned polymer solution may also contain other components besides the aforementioned polymer and polar solvent. 5. Polymer Solution The above-mentioned polymer or polymer solution can be prepared into a polymer solution together with an alkaline dispersant and / or an alkaline compound. The above-mentioned polymer solution exhibits excellent storage stability. Furthermore, such a polymer solution containing the above-mentioned polymer or polymer solution and an alkaline dispersant and / or an alkaline compound is also one aspect of the present invention. Furthermore, the neutralization of the polymer or alkaline dispersant by the alkaline compound is also one of the preferred embodiments of the present invention. Examples of alkaline compounds mentioned above include those described above. Alkaline compounds can also be residues left over from the use of polymers in manufacturing processes, as described above. As the aforementioned alkaline dispersant, a polymeric dispersant having alkaline functional groups is preferred. The aforementioned polymeric dispersant having alkaline functional groups can also be neutralized by the aforementioned alkaline compound, as described above, and may also include, for example, neutralized amine salts. Examples of alkaline dispersants include Disperbyk (registered trademark) – 108, 110, 111, 116, 130, 140, 154, 161, 162, 163, 164, 165, 166, 167, 168, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 2070, 2095, 2150, 2155, 2163, 2164, etc. (the above are BYK-Chemie) (Made in Japan by a company), SOLSPERSE (registered trademark) - 3000, 9000, 13000, 13240, 13650, 13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 3350 0, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 56000, 76500, etc. (the above are manufactured by Lubrizol Corporation of Japan), AJISPER (registered trademark) PA111, PB711, PB821, PB822, PB824, etc. (the above are manufactured by Ajinomoto Fine-Techno Corporation), DISPARLON (registered trademark) 1831, 1850, 1860, DA-703-50, DA-7301, DA-325, DA234, etc. (the above are manufactured by Kusumoto Kasei Corporation). Regarding good dispersion stability, the content of the alkaline dispersant in the polymer solution is preferably 1-50% by mass, more preferably 3-45% by mass, and even more preferably 5-35% by mass, out of 100% by weight of the total solids content of the polymer solution. Furthermore, in this specification, "total solids content" refers to the total amount of components that form the hardened material (excluding solvents or hardening catalysts that volatilize during the formation of the hardened material). The content of the alkaline compound in the polymer solution, in terms of good storage stability, is preferably 1 to 50% by mass, more preferably 3 to 45% by mass, and even more preferably 5 to 35% by mass of the total solid content of the polymer solution (100% by mass). Furthermore, the content of the polymer in the polymer solution is preferably 5-80% by mass, more preferably 10-75% by mass, and even more preferably 15-70% by mass, out of 100% by mass of the total solid content of the polymer solution. Furthermore, regarding the superior storage stability of the polymer in the above-mentioned polymer solution, the epoxy equivalent is preferably 1000 g / mol or more, more preferably 5000 g / mol or more, and even more preferably does not contain epoxy groups. The above-mentioned epoxy equivalent can be obtained by dividing the mass (g) of the polymer solids component by the number of moles (mol) of epoxy groups contained in the polymer. Furthermore, the content of the aforementioned polar solvent in the polymer solution is preferably 10 to 1000 parts by mass, more preferably 20 to 800 parts by mass, and even more preferably 30 to 600 parts by mass, relative to 100 parts by mass of the total solid content of the polymer solution. There is no particular limitation on the method for preparing the above-mentioned polymer solution. A known mixing method can be used to mix the components contained in the above-mentioned polymer solution. 6. Pigment Dispersion: The polymer solution described above may further contain pigment. Furthermore, this pigment dispersion containing the polymer solution and pigment is also part of the present invention. The pigment dispersion described above exhibits excellent storage stability. There are no particular limitations on the aforementioned colorant, and known pigments and dyes can be cited. Regarding the content of the aforementioned colorant in the colorant dispersion, in order to adequately meet the requirements of high color purity or high brightness in recent years, it is preferably 1 to 80% by mass of 100% by mass of the total solid content of the colorant dispersion, more preferably 5 to 70% by mass, and even more preferably 10 to 60% by mass. The content of the polymer or alkaline dispersant in the pigment dispersion is preferably within the same range as the content of the polymer or alkaline dispersant in the polymer solution. The above-mentioned pigment dispersion may further contain a solvent, such as the polymerization solvent of the above-mentioned polymer or the above-mentioned polar solvent. Regarding good storage stability, the amount of the solvent in the pigment dispersion is preferably 10 to 1000 parts by mass relative to 100 parts by mass of the total solid content of the pigment dispersion, more preferably 30 to 300 parts by mass, and even more preferably 40 to 200 parts by mass. There is no particular limitation on the method for preparing the above-mentioned pigment dispersion. It can be prepared by mixing and dispersing the components contained in the above-mentioned pigment dispersion using known mixing and dispersion methods. 7. Photosensitive resin composition Furthermore, a photosensitive resin composition containing the above-mentioned polymer, polymer solution, polymer solution or pigment dispersion, polymeric compound, photopolymerization initiator and / or photoacid generator is also one aspect of the present invention. Because the photosensitive resin composition of the present invention contains the above-mentioned polymer, it exhibits excellent storage stability, and even under low-temperature curing conditions, it can form a cured product with excellent solvent resistance. Regarding the content of the aforementioned polymer, it is preferably 5 to 80% by mass, more preferably 10 to 75% by mass, and even more preferably 15 to 70% by mass, relative to 100% by mass of the total solid content of the aforementioned photosensitive resin composition. When the above-mentioned photosensitive resin composition contains the above-mentioned polymer solution, the content of the above-mentioned polar solvent is preferably 10 to 1000 parts by mass relative to 100 parts by mass of the total solid content of the above-mentioned photosensitive resin composition, more preferably 30 to 300 parts by mass, and even more preferably 40 to 200 parts by mass. When the above-mentioned photosensitive resin composition contains the above-mentioned pigment dispersion, the content of the above-mentioned alkaline dispersant in 100% by mass of the total solid content of the above-mentioned photosensitive resin composition is preferably 1 to 50% by mass, more preferably 3 to 45% by mass, and even more preferably 5 to 35% by mass. When the above-mentioned photosensitive resin composition contains the above-mentioned pigment dispersion, the content of the above-mentioned pigment in 100% by mass of the total solid content of the above-mentioned photosensitive resin composition is preferably 1 to 80% by mass, more preferably 5 to 70% by mass, and even more preferably 10 to 60% by mass. (Polymerizable compounds) The aforementioned polymerizable compounds are low-molecular-weight compounds with polymerizable unsaturated bonds (also known as polymerizable unsaturated groups) that can be polymerized by irradiation with active energy lines such as free radicals, electromagnetic waves (e.g., infrared rays, ultraviolet rays, X-rays, etc.), and electron rays. Examples include monofunctional compounds with one polymerizable unsaturated group in the molecule and polyfunctional compounds with two or more polymerizable unsaturated groups. Examples of the aforementioned monofunctional compounds include N-substituted maleamide monomers; (meth)acrylates; (meth)acrylic acids; unsaturated monocarboxylic acids; unsaturated polycarboxylic acids; unsaturated monocarboxylic acids with chain elongation between the unsaturated group and the carboxyl group; unsaturated anhydrides; aromatic vinyl groups; conjugated dienes; vinyl esters; vinyl ethers; N-vinyl compounds; and unsaturated isocyanates. Furthermore, monomers containing active methylene or active methine groups may also be used. Examples of such multifunctional compounds include the following compounds: ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, butanediol di(meth)acrylate, hexanediol di(meth)acrylate, cyclohexanediethanol di(meth)acrylate, bisphenol A epoxy alkyl di(meth)acrylate, bisphenol F epoxy alkyl di(meth)acrylate, and other difunctional (meth)acrylate compounds; Trimethylolpropane tri(meth)acrylate, di(trimethylolpropane)tetra(meth)acrylate, glycerol tri(meth)acrylate, neopentyltetra(meth)acrylate, neopentyltetra(meth)acrylate, dinepentyltetra(meth)acrylate, dinepentyltetra(meth)acrylate, trinepentyltetra(meth)acrylate, trinepentyltetra(meth)acrylate, trimethylolpropane tri(meth)acrylate, ethylene oxide addition trimethylolpropane tri(meth)acrylate, ethylene oxide addition di(trimethylolpropane)tetra(meth)acrylate, ethylene oxide addition neopentyltetra(meth)acrylate, ethylene oxide addition dinepentyltetra(meth)acrylate, propylene oxide addition trimethylolpropane tri(meth)acrylate Acrylates, propylene oxide addition to di(trimethylolpropane)tetra(meth)acrylate, propylene oxide addition to neopentyltetra(meth)acrylate, propylene oxide addition to dinepentyltetra(hexa(meth)acrylate), polycaprolactone addition to trimethylolpropane tri(meth)acrylate, polycaprolactone addition to di(trimethylolpropane)tetra(meth)acrylate, polycaprolactone addition to neopentyltetra(meth)acrylate, polycaprolactone addition to dinepentyltetra(hexa(meth)acrylate), dinepentyltetraacrylate succinic acid modified product, neopentyltetraacrylate triacrylate succinic acid modified product, dinepentyltetraacrylate phthalic acid modified product, neopentyltetraacrylate triacrylate phthalic acid modified product, and the following formulas: The indicated compound is a polyfunctional (meth) acrylate compound with three or more functions, such as a modified version of neopentyl tert-6 acrylate. Polyfunctional vinyl ethers include ethylene glycol diethylene ether, diethylene glycol diethylene ether, polyethylene glycol diethylene ether, propylene glycol diethylene ether, butanediol diethylene ether, hexanediol diethylene ether, bisphenol A epoxy diethylene ether, bisphenol F epoxy diethylene ether, trimethylolpropane triethylene ether, ditrimethylolpropane tetraethylene ether, glycerol triethylene ether, neopentyl tetraethylene ether, dinepentyl tetraethylene ether, dinepentyl tetraethylene ether, ethylene oxide addition trimethylolpropane triethylene ether, ethylene oxide addition ditrimethylolpropane tetraethylene ether, ethylene oxide addition neopentyl tetraethylene ether, and ethylene oxide addition dinepentyl tetraethylene ether. (Meth)acrylates containing vinyl ether groups include 2-vinyloxyethyl acrylate, 3-vinyloxypropyl acrylate, 1-methyl-2-vinyloxyethyl acrylate, 2-vinyloxypropyl acrylate, 4-vinyloxybutyl acrylate, 4-vinyloxycyclohexyl acrylate, 5-vinyloxypentyl acrylate, 6-vinyloxyhexyl acrylate, 4-vinyloxymethylcyclohexyl acrylate, p-vinyloxymethylphenyl methacrylate, 2-(vinyloxyethoxy)ethyl acrylate, and 2-(vinyloxyethoxyethoxyethoxy)ethyl acrylate. Polyfunctional allyl ethers include ethylene glycol diallyl ether, diethylene glycol diallyl ether, polyethylene glycol diallyl ether, propylene glycol diallyl ether, butanediol diallyl ether, hexanediol diallyl ether, bisphenol A epoxy diallyl ether, bisphenol F epoxy diallyl ether, trimethylolpropane triallyl ether, ditrimethylolpropane tetraallyl ether, glycerol triallyl ether, neopentyltetral tetraallyl ether, dinepentyltetral pentaallyl ether, dinepentyltetral hexallyl ether, ethylene oxide addition trimethylolpropane triallyl ether, ethylene oxide addition ditrimethylolpropane tetraallyl ether, ethylene oxide addition neopentyltetral tetraallyl ether, and ethylene oxide addition dinepentyltetral hexallyl ether. Allyl methacrylates and other allyl-containing methacrylates; polyfunctional isocyanates containing (meth)acrylic groups, such as tris(acryloxyethyl)triisocyanate, tris(methacryloxyethyl)triisocyanate, alkylene oxide addition tris(acryloxyethyl)triisocyanate, alkylene oxide addition tris(methacryloxyethyl)triisocyanate; polyfunctional isocyanates containing allyl groups, such as triallyl isocyanate; polyfunctional amine esters (meth)acrylates obtained by reacting polyfunctional isocyanates such as methylbenzene diisocyanate, isoflavone diisocyanate, xylylene diisocyanate with hydroxyl-containing (meth)acrylates such as 2-hydroxyethyl methacrylate and 2-hydroxypropyl methacrylate; polyfunctional aromatic vinyl esters, such as divinylbenzene. These polymeric compounds can be used alone or in combination of two or more. Among the aforementioned polymeric compounds, from the viewpoint of further improving the curability of the aforementioned photosensitive resin composition, multifunctional polymeric compounds are preferred. The number of functions in the aforementioned multifunctional polymeric compounds is preferably 3 or more, more preferably 4 or more. Furthermore, the number of functions is preferably 10 or less, more preferably 8 or less. The molecular weight of the aforementioned polymeric compounds is not particularly limited, but from a processing viewpoint, for example, it is preferably 2000 or less. Among the aforementioned multifunctional polymerizable compounds, from the viewpoints of reactivity, economy, and availability, compounds containing (meth)acrylic groups, such as multifunctional (meth)acrylate compounds, multifunctional amine (meth)acrylate compounds, and triisocyanate compounds containing (meth)acrylic groups, are preferred, with multifunctional (meth)acrylate compounds being even more preferred. By containing compounds with (meth)acrylic groups, the photosensitivity and curing properties of the aforementioned photosensitive resin composition are superior, resulting in cured products with higher hardness and transparency. As for the aforementioned multifunctional polymerizable compounds, multifunctional (meth)acrylate compounds with three or more functions are even more preferred. The content of the aforementioned polymeric compound relative to 100% by mass of the total solid content of the aforementioned photosensitive resin composition is preferably 5-60% by mass, more preferably 10-50% by mass, and even more preferably 15-40% by mass. (Photopolymerization initiator) Specific examples of the above-mentioned photopolymerization initiators include 2-methyl-1-[4-(methylthio)phenyl]-2- 1-Linylpropane-1-one ("IRGACURE 907", manufactured by BASF), 2-benzyl-2-dimethylamino-1-(4-) 2-Dimethylamino-2-(4-methyl-benzyl)-1-(4-) amine ketal compounds such as lin-4-yl-phenyl)-butane-1-one ("IRGACURE 379", manufactured by BASF); benzil ketal compounds such as 2,2-dimethoxy-1,2-diphenylethane-1-one ("IRGACURE 651", manufactured by BASF) and methyl phenylglyoxylate ("DAROCUR MBF", manufactured by BASF); 1-hydroxy-cyclohexyl-phenyl-one ("IRGACURE 184", manufactured by BASF), 2-hydroxy-2-methyl-1-phenyl-propane-1-one ("DAROCUR 1173", manufactured by BASF), 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propane-1-one ("IRGACURE 2959", manufactured by BASF), 2-hydroxy-1-{4-yl-phenyl-butane-1-one, etc. In addition to hydrogen ketone compounds such as [4-(2-hydroxy-2-methyl-propionic)-benzyl]-phenyl]-2-methyl-propane-1-one ("IRGACURE 127", manufactured by BASF) and [1-hydroxy-cyclohexyl-phenyl-one + diphenyl ketone] ("IRGACURE 500", manufactured by BASF), other alkyl phenyl ketones exemplified in paragraphs

[0084] to

[0086] of Japanese Patent Application Publication No. 2013-227485 can also be cited. alkylphenone compounds; 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(O-benzoyloxime) ("OXE01", manufactured by BASF), ethanone, 1-[9-ethyl-6-(2-tolyl)-9H-carbazole-3-yl]-, 1-(O-acetyloyl)- oxime esters including xime ("OXE02", manufactured by BASF), 1,2-octanedione, 1-[4-(phenylthio)-,2-,(O-benzoxime)], acetone ("OXE03", manufactured by BASF), 1-[9-ethyl-6-(2-tolyl)-9H-carbazole-3-yl]-,1-(O-acetyloxime) ("OXE04", manufactured by BASF); diphenyl ketone compounds; benzoin compounds; 9-oxothioides. (thioxanthone) compounds; halomethylated trimethylolamine compounds; halomethylated diazole compounds; biimidazole compounds; titanium dioxide compounds; benzoate compounds; acridine compounds, etc.; phosphine oxide compounds, etc. Among them, ketamine compounds and oxime ester compounds are preferred. Only one of the above photopolymerization initiators can be used, or two or more can be used in combination. The content of the aforementioned photopolymerization initiator relative to 100% by mass of the total solid content of the aforementioned photosensitive resin composition is preferably 0.3 to 20% by mass, more preferably 0.5 to 10% by mass, and even more preferably 1 to 8% by mass. (Photoacid Generator) Furthermore, the above-mentioned photosensitive resin composition may also contain a photoacid generator. By containing a photoacid generator, cationic polymerization can be carried out to form a cured material with superior solvent resistance. The photoacid generator used in this invention is a compound that generates both acid and free radicals simultaneously upon exposure to light. Examples of photoacid generators include compounds that generate acid upon exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, electron beams, and X-rays. Specifically, known compounds include onium salt compounds, sulfonate compounds, sulfonate ester compounds, quinonediazide compounds, sulfonimide compounds, and diazomethane compounds. Preferably, the photoacid generator is selected from at least one compound chosen from the group consisting of onium salt compounds, sulfonimide compounds, and diazomethane compounds; more preferably, it is an onium salt compound; and even more preferably, it is a triarylsulfuron salt. Specific examples of the photoacid generator include the compounds described in paragraphs

[0112] to

[0117] of Japanese Patent Application Publication No. 2021-39186. The content of the aforementioned photoacid generator is not particularly limited if it is within the range that can exert the effect of the present invention, and can be set appropriately. For example, relative to 100% by mass of the total solid content of the photosensitive resin composition of the present invention, it is preferably 0.3 to 20% by mass, more preferably 0.5 to 10% by mass, and even more preferably 1 to 8% by mass. Furthermore, the aforementioned photosensitive resin composition may also contain other components besides those mentioned above, as needed. Examples of such other components include solvents; pigments (pigments, dyes); dispersants; heat resistance enhancers; leveling agents; developing aids; inorganic microparticles such as silica microparticles; coupling agents such as silane-based, aluminum-based, and titanium-based agents; fillers; thermosetting resins such as phenolic resins and polyvinyl phenol; curing aids such as polyfunctional thiol compounds; plasticizers; polymerization inhibitors; ultraviolet absorbers; antioxidants; matting agents; defoamers; antistatic agents; slip agents; surface modifiers; hygroscopic agents; hygroscopic aids; quinone diazide compounds; polyphenolic compounds; cationic polymerizable compounds; and hot acid generators. Only one of these components may be used, or two or more may be used in combination. These other components can be appropriately selected from those known to the public, and their usage amounts can also be appropriately set. For example, when the above-mentioned photosensitive resin composition is used for color filter applications, the photosensitive resin composition preferably contains a colorant. Furthermore, in terms of the potential for crosslinking with vinyl ether groups or promoting cationic polymerization, the aforementioned photosensitive resin composition preferably contains a polyfunctional thiol compound. Examples of such polyfunctional thiol compounds include tris(3-mercaptopropoxy)ethyl triisocyanate, trimethylolpropane tri-3-mercaptopropionate, neopentyltetrol tetra-3-mercaptopropionate and dinepentyltetrol tetra-3-mercaptopropionate, neopentyltetrol tetra(3-mercaptobutyrate), 1,4-bis(3-mercaptobutoxy)butane, 1,3,5-triazinane-2,4,6-trione, and trimethylolpropane tris(3-mercaptobutyrate). <Preparation of Photosensitive Resin Composition> There are no particular limitations on the method for preparing the photosensitive resin composition of the present invention; any known method may be used, such as a method that uses various mixers or dispersers to mix and disperse the aforementioned components. The mixing and dispersion steps are not particularly limited and can be performed using known methods. Furthermore, other steps that are typically performed may also be included. When the photosensitive resin composition contains pigments, it is preferable to prepare it using a known pigment dispersion treatment step. 8. The method for obtaining a hardened product using the photosensitive resin composition of the present invention is not particularly limited, and any known method may be used. For example, the photosensitive resin composition coated or formed on the substrate may be hardened by heating or irradiating with active energy rays such as ultraviolet light or a combination thereof to obtain a hardened product. As a method for manufacturing the above-mentioned hardened material, a preferred method may include the following steps: Step (1): applying the above-mentioned photosensitive resin composition onto a substrate to form a coating film; Step (2): irradiating the formed coating film with light; Step (3): developing to remove the unirradiated portions; and Step (4): heating the irradiated coating film. There are no particular restrictions on the substrates mentioned above; any appropriate selection can be made according to the purpose or use. For example, substrates made of various materials such as glass plates and plastic plates can be used. In step (1) above, there are no particular limitations on the method for forming a coating film by coating the above-mentioned photosensitive resin composition; known methods such as spin coating, slot coating, roller coating, and cast coating can be used. In the above manufacturing method, it is preferable to coat the above-mentioned photosensitive resin composition onto the substrate and then dry the coating to form a coating film. The drying can be carried out by known methods, such as using a heated plate, an IR oven, or a convection oven. Regarding the drying conditions, appropriate selection can be made according to the boiling point of the solvent component, the type of curing component, the film thickness, and the performance of the dryer, etc. Generally, a temperature of 50 to 160°C for 10 to 300 seconds is more suitable. In step (2) above, there are no particular limitations on the method of irradiating the formed coating film, and known methods can be used. Examples of light sources for irradiation include xenon lamps, halogen lamps, tungsten filament lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arc lamps, fluorescent lamps, argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium-cadmium lasers, semiconductor lasers, and other laser light sources. When irradiating the above-mentioned coating, irradiation can also be performed through a photomask. A photomask with light-blocking parts formed according to the target pattern can be used. In step (3) above, following the light exposure step, the unexposed portions are removed by developing with a developing solution. The exposed portions harden due to light exposure, and the hardened material is insoluble or poorly soluble in the developing solution. On the other hand, the unexposed portions dissolve in the developing solution and can be removed by developing, resulting in a patterned hardened film. The developing process can usually be performed at a developing temperature of 10–50°C using methods such as immersion developing, spray developing, brush developing, or ultrasonic developing. The developer used in step (3) above is not particularly limited to any solution that can dissolve the photosensitive resin composition. Organic solvents or alkaline aqueous solutions, or mixtures thereof, can generally be used. Furthermore, when using an alkaline aqueous solution as the developer, it is preferable to rinse with water after development. Examples of organic solvents or alkaline aqueous solutions include those described in Japanese Patent Application Publication No. 2015-157909. In step (4) above, it is preferable to heat the developed coating at a temperature below 150°C. In the post-curing step (post-curing step) after photoexposedness in step (4) above, the heating temperature is preferably below 130°C, and more preferably below 120°C. The photosensitive resin composition of the present invention exhibits good curing reaction even at relatively low temperatures, and can form a cured product with excellent solvent resistance. As a lower limit for the heating temperature, it is preferably above 70°C, and more preferably above 80°C, in terms of maintaining curability. There are no particular restrictions on the heating time in the above heating steps; for example, it is suitable to set it to 5 to 60 minutes. Furthermore, there are no particular restrictions on the heating method; for example, known heating machines such as heating plates, convection ovens, and high-frequency heating machines can be used. When the hardened material obtained by the above manufacturing method is a hardened film, the film thickness is preferably 0.1 to 50 μm, more preferably 0.5 to 40 μm, and even more preferably 1 to 30 μm in order to fully exert the characteristics of a protective film. The cured product obtained by the above manufacturing method exhibits excellent solvent resistance. Furthermore, this cured product, obtained by curing the above-mentioned photosensitive resin composition, is also part of the present invention. 9. Applications The polymer and photosensitive resin compositions of this invention exhibit excellent storage stability, forming cured products with excellent solvent resistance even under low-temperature curing conditions. Therefore, they are suitable for applications requiring stable storage or high solvent resistance. The polymer and photosensitive resin compositions of this invention are suitable for use as optical materials, preferably as resists. The curable resin compositions of this invention are suitable for both negative and positive applications. The polymer and photosensitive resin composition of this invention are applicable, for example, to various optical components or constituent components of motors and electronic devices, such as color filters, black matrices, photo spacers, black column spacers, inks, printing plates, printed wiring boards, semiconductor elements, photoresists, insulating films, films, and organic protective films in liquid crystal, organic EL, quantum dot, micro-light-emitting diode liquid crystal display devices, solid-state imaging elements, and touch panel display devices. Preferably, it is used for color filter formation. [Example] The present invention is further described in detail below with reference to specific embodiments, but the present invention is not limited to these embodiments. Furthermore, unless otherwise specified, "parts" means "parts by mass" and "%" means "% by mass". The various evaluation methods used in this embodiment are as follows. < 1 ¹H-NMR determination > For the obtained monomeric compounds, the following conditions were used for determination. 1 H-NMR determination. Apparatus: Agilent Technologies nuclear magnetic resonance apparatus (600MHz). Solvent: dichloroform. Sample preparation: Dissolve several mg to tens of mg of the obtained monomer compound in the solvent. <Acid Value> Weigh 3g of polymer solution precisely and dissolve it in a mixture of 90g acetone and 10g water. Titrate using a 0.1N KOH aqueous solution as the titrant. The titration was performed using an automatic titration apparatus (trade name: COM-555, manufactured by Hiranuma Sangyo Co., Ltd.). The acid value (mgKOH / g) per 1g of solids was determined from the acid value and solids content of the polymer solution. The solids content of the polymer solution was determined as follows: Weigh approximately 1g of polymer solution into an aluminum cup, add approximately 3g of acetone to dissolve it, and allow it to air dry at room temperature. Then, using a hot air dryer (trade name: PHH-101, manufactured by Espec Co., Ltd.), dry it under vacuum at 140°C for 1.5 hours, then cool it in the desiccator and measure its mass. Calculate the solids content (mass %) of the polymer solution from the amount of mass reduction. <Ethylene Ether Equivalent> is obtained by dividing the mass (g) of the polymer solids by the number of moles (mol) of the potential ethylene ether groups contained in the polymer. <Epoxy Equivalent> is obtained by dividing the mass (g) of the polymer solids by the number of moles (mol) of epoxy groups in the polymer. <Double bond equivalent> is obtained by dividing the mass (g) of the polymer solids by the amount of double bonds (mol) in the polymer. <Weight-average molecular weight> Polystyrene was used as a standard and tetrahydrofuran was used as the precipitate. The weight-average molecular weight of the polymer was determined by GPC (gel permeation chromatography) using an HLC-8220GPC (manufactured by Tosoh Corporation) and a TSKgel SuperHZM-M (manufactured by Tosoh Corporation) column. <Storage Stability (Viscosity Change Rate)> (Polymers) The viscosity of the polymer was measured at 25°C using a viscometer (VISCOMETER TV-100, manufactured by Toki Sangyo Co., Ltd.). The viscosity change rate is the rate of change in viscosity of the polymer solution after storage at 40°C for one week, representing the percentage (%) of the viscosity after storage when the initial viscosity is 100%. The smaller the viscosity change rate, the better the storage stability of the polymer. (Photosensitive Resin Compositions) The viscosity of the photosensitive resin composition was measured at 25°C using a viscometer (VISCOMETER TV-100, manufactured by Toki Sangyo Co., Ltd.). The viscosity change rate is the rate of change in viscosity of the photosensitive resin composition after storage at 40°C for one month, representing the percentage (%) of the viscosity after storage when the initial viscosity is 100%. The smaller the viscosity change rate, the better the storage stability of the photosensitive resin composition. <Solvent Resistance> The photosensitive resin composition was spin-coated onto a 5cm square glass substrate, dried at 90°C for 2 minutes, exposed to 100mJ using a high-pressure mercury lamp, and then heat-treated at 90°C for 30 minutes (post-curing) to obtain a cured film with a thickness of 2μm. The cured film was then immersed in 20g of propylene glycol monomethyl ether at 30°C for 5 minutes. The absorbance of the immersion solution after removing the cured film was measured using a UV3100 spectrophotometer (Shimadzu Corporation). A higher absorbance value indicates more pigment precipitated into the immersion solution, and a lower solvent resistance rating for the photosensitive resin composition. <Developability> A photosensitive resin composition was coated onto a 10cm square glass substrate using a spin coating method. After heat treatment (90°C, 3 minutes), the coating was viewed through a photomask with 30μm equally spaced lines and spaces at a distance of 50μm. A UV aligner (manufactured by Dai Nippon Research Corporation, trade name "MA-1100") equipped with a 2.0kW ultra-high pressure mercury lamp was used, with a power of 60mJ / cm². 2 Exposure was performed at an exposure level of (365nm illuminance conversion). A 0.05% potassium hydroxide aqueous solution was spread using a spin developer to dissolve and remove the unexposed portions. The remaining exposed portions were then rinsed with pure water for 10 seconds to develop the coating. This process was used to evaluate the developability. Specifically, a surface roughness meter (manufactured by Ryoka Systems Inc., trade name "VertScan2.0") was used to observe the development time of the coated film after development through the photomask, and the time required for the unexposed portions to flow away was taken as the development time. (Manufacturing Example 1) The monomer compound (A-1) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropping tank inlet. 100.0 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate and 60.0 parts of acetic acid were added, and the mixture was heated to 60°C and reacted for 12 hours. After the reaction, the reaction vessel was cooled, diluted with ethyl acetate, and the contents were transferred to a separatory funnel. The mixture was washed twice with sodium carbonate aqueous solution and twice with water, and the oil layer was removed. The water in the oil layer was adsorbed using magnesium sulfate, and the magnesium sulfate was removed by filtration. The ethyl acetate in the oil layer was then removed using an evaporator, thereby obtaining the monomer compound (A-1). 1 After H-NMR confirmed the obtained monomer compound, the results confirmed the disappearance of the peak from ethylene ether near 6.5 ppm, and the integral value confirmed the formation of monomer compound (A-1). (Manufacturing Example 2) The monomer compound (A-2) was synthesized by changing 60.0 parts of acetic acid in Manufacturing Example 1 to 90.0 parts of isopropanol, and the rest of the operation was the same as in Manufacturing Example 1, and the monomer compound (A-2) was obtained. (Manufacturing Example 3) The monomer compound (A-3) was synthesized by changing 60.0 parts of acetic acid to 46.0 parts of ethanol in Manufacturing Example 1, except that the rest of the operation was the same as in Manufacturing Example 1, and the monomer compound (A-3) was obtained. (Manufacturing Example 4) Monomer compound (A-4) was prepared by adding 30.0 parts of acetic acid and 0.01 parts of p-toluenesulfonic acid to a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. The mixture was stirred and heated to 30°C to form a homogeneous mixture. Then, while monitoring the heating process, 100.0 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise. After the addition was complete, the reaction was carried out at 30°C for 3 hours to obtain monomer compound (A-4). 1 After H-NMR confirmed the obtained monomer compound, the results confirmed the disappearance of the peak from ethylene ether near 6.5 ppm, and the integral value confirmed the formation of monomer compound (A-4). (Manufacturing Example 5) The monomer compound (A-5) was synthesized by changing 30.0 parts of acetic acid in Manufacturing Example 4 to 30.0 parts of isopropanol, and the rest of the operation was the same as in Manufacturing Example 4, and the monomer compound (A-5) was obtained. (Manufacturing Example 6) The monomer compound (A-6) was synthesized by changing 30.0 parts of acetic acid in Manufacturing Example 4 to 23.0 parts of ethanol, and the rest of the operation was the same as in Manufacturing Example 4, and the monomer compound (A-6) was obtained. (Manufacturing Example 7) The monomer compound (A-7) was synthesized by changing the acetic acid from 30.0 parts to 32.2 parts in Manufacturing Example 4 and changing 2-(2-ethyleneoxyethoxy)ethyl methacrylate to 2-(2-ethyleneoxyethoxy)ethyl acrylate. All other operations were the same as in Manufacturing Example 4 to obtain the monomer compound (A-7). (Manufacturing Example 8) The monomer compound (A-8) was synthesized by changing 32.2 parts of acetic acid in Manufacturing Example 7 to 39.8 parts of propionic acid, and the rest of the operation was the same as in Manufacturing Example 7, and the monomer compound (A-8) was obtained. (Manufacturing Example 9) The monomer compound (A-9) was synthesized by changing 32.2 parts of acetic acid in Manufacturing Example 7 to 47.3 parts of butyric acid, except that the rest of the operation was the same as in Manufacturing Example 7, and the monomer compound (A-9) was obtained. (Manufacturing Example 10) In a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet, 107.6 parts of lauric acid and 0.01 parts of p-toluenesulfonic acid were added, stirred, and heated to 50°C to prepare a homogeneous mixture. Then, while monitoring the heat, 100.0 parts of 2-(2-ethyleneoxyethoxy)ethyl acrylate were added dropwise. After the addition was complete, the reaction was carried out at 50°C for 3 hours to obtain the monomer compound (A-10). 1After H-NMR confirmed the obtained monomer compound, the results confirmed the disappearance of the peak from ethylene ether near 6.5 ppm, and the integral value confirmed the formation of the monomer compound (A-10). [Table 1] Additionally, the records in Table 1 indicate the following. VEEM: 2-(2-Ethyleneoxyethoxy)ethyl methacrylate VEEA: 2-(2-Ethyleneoxyethoxy)ethyl acrylate AcOH: Acetic acid PA: Propionic acid BA: Butyric acid LA: Lauric acid IPA: Isopropanol EtOH: Ethanol PTSA: p-Toluenesulfonic acid AEEM: 2-(2-(1-acetoxyethoxy)ethoxy)ethyl methacrylate IEEM: 2-(2-(1-isopropoxyethoxy)ethoxy)ethyl methacrylate EEEM: 2-(2-(1-ethoxyethoxy)ethoxy)ethyl methacrylate AEEA: 2-(2-(1-acetoxyethoxy)ethoxy)ethyl methacrylate PEEA: 2-(2-(1-propoxyethoxy)ethoxy)ethyl methacrylate BEEA: 2-(2-(1-butoxyethoxy)ethoxy)ethyl methacrylate LEEA: 2-(2-(1-laurooxyethoxy)ethoxy)ethyl methacrylate In Examples 1-3, by using one or more equivalents of a carboxylic acid compound or alcohol compound relative to one equivalent of a (meth)acrylate compound containing an ethylene ether group, and as described above, the reaction matrix itself acts as a self-catalyst to promote the reaction, thereby enabling the synthesis of acetal-protected monomer compounds without a catalyst. Furthermore, in Examples 4-10, the same synthesis can be performed even when using an acid catalyst. (Example 1) Polymer (B-1) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 146.7 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, as the dropper (A), 25.0 parts of propylene glycol monomethyl ether acetate, 23.1 parts of acetic acid, and 0.01 parts of p-toluenesulfonic acid were added to a beaker and stirred to prepare a homogeneous mixture. Then, while maintaining heat, 76.9 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the mixture. After the dropwise addition was completed, the mixture was stirred at 30°C for 3 hours. Then, 0.39 parts of triethylamine and 2.9 parts of di-2-ethylhexyl peroxide (PEROYL OPP, manufactured by Nippon Oil Co., Ltd.) were added to form the dropping tank (A). 1.0 part of n-dodecyl mercaptan and 59.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker and stirred to form the dropping tank (B). Once the reaction tank reached 60°C, polymerization was carried out by dropwise addition over 3 hours from the dropping tank while maintaining this temperature. After the dropwise addition was completed, the mixture was also aged at 60°C for 6 hours. Then, it was cooled to room temperature to obtain polymer (B-1). The various properties of the obtained polymer are shown in Table 2. (Example 2) Polymer (B-2) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 133.0 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 50°C. Meanwhile, 42.9 parts of propylene glycol monomethyl ether acetate, 100.0 parts of 2-(2-(1-isopropoxyethoxy)ethoxy)ethyl methacrylate, and 2.0 parts of 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile) (Fujifilm and Kazumitsu Pure Chemicals Co., Ltd., V-70) were mixed in a beaker to form dropper (A). 2.0 parts of n-dodecyl mercaptan and 58.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (B). Once the reaction vessel reached 50°C, polymerization was carried out by dripping the polymer from the dropper over a period of 3 hours while maintaining this temperature. After the dripping was completed, the mixture was aged at 50°C for 7 hours. Then, it was cooled to room temperature to obtain polymer (B-2). The various properties of the obtained polymer are shown in Table 2. (Example 3) Polymer (B-3) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 109.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, a dropper was prepared by mixing 100.0 parts of propylene glycol monomethyl ether acetate, 100.0 parts of 2-(2-(1-ethoxyethoxy)ethoxy)ethyl methacrylate, and 3.5 parts of n-dodecyl mercaptan in a beaker. An initiator tank was prepared by mixing 2.0 parts of 2,2'-azobis(2,4-dimethylpentanones) (Fujifilm Wako Pure Chemical Industries Co., Ltd., V-65) and 28.0 parts of propylene glycol monomethyl ether acetate in a beaker. After the reaction vessel reached 60°C, polymerization was carried out by dripping the polymer from the dropper tank over a period of 3 hours while maintaining this temperature. The starting agent tank contained 30 portions, divided into six batches for polymerization initiation: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five portions were added to each batch in the reaction tank. After the addition was complete, the reaction tank was heated to 70°C and matured for 10 hours. Then, it was cooled to room temperature to obtain polymer (B-3). The various properties of the obtained polymer are shown in Table 2. (Example 4) The polymer (B-4) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 115.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, 2.0 parts of N-benzylmaleimide, 38.0 parts of cyclohexyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of propylene glycol monomethyl ether acetate, and 2.0 parts of n-dodecyl mercaptan were mixed in a beaker to form dropper (A). In dropper (B), 60.0 parts of propylene glycol monomethyl ether acetate, 6.9 parts of acetic acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and mixed to form a homogeneous mixture. Then, while maintaining heat, 23.1 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the above mixture. After the dripping is completed, stir at 30°C for 3 hours, add 0.12 parts of triethylamine, and use the mixture after stirring as the dripping tank (B). 2.9 parts of 2-ethylhexyl peroxide dicarbonate (PEROYL (registered trademark) OPP, manufactured by Nippon Oil Co., Ltd.) and 27.1 parts of propylene glycol monomethyl ether acetate were mixed in a beaker as an initiator tank. After the reaction tank reached a temperature of 60°C, polymerization was carried out by dripping the initiator from drop tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches of 5 parts each, added to the reaction tank at 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. After the dripping was completed, the mixture was aged at 60°C for 6 hours. Then, after cooling to room temperature, 11.5 parts of succinic anhydride, 11.7 parts of triethylamine, and 29.6 parts of propylene glycol monomethyl ether acetate were added to the reaction tank, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-4). The various properties of the obtained polymer are shown in Table 2. (Example 5) The polymer (B-5) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 146.0 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. On the other hand, 20.0 parts of cyclohexyl methacrylate, 40.0 parts of 2-hydroxyethyl methacrylate, 2.0 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) (V-65 manufactured by Fujifilm and Kazumitsu Pure Chemicals Co., Ltd.), and 40.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form a dropper (A). In a dropper (B), 46.5 parts of propylene glycol monomethyl ether acetate, 9.2 parts of isopropanol, and 0.003 parts of p-toluenesulfonic acid were added to the beaker and stirred to form a homogeneous mixture. Next, while monitoring the heating process, 30.8 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the above mixture. After the addition was complete, the mixture was stirred at 30°C for 3 hours, and then 0.16 parts of triethylamine and 3.5 parts of n-dodecyl mercaptan were added to prepare a dropping tank (B). Once the temperature of the reaction tank reached 60°C, polymerization was carried out by adding the mixture dropwise from dropping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. After the addition was complete, the temperature was raised to 70°C and allowed to mature for 10 hours. Then, after cooling to room temperature, 15.4 parts of succinic anhydride, 15.6 parts of triethylamine, and 42.1 parts of propylene glycol monomethyl ether acetate were added to the reaction tank, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-5). The various properties of the obtained polymer are shown in Table 2. (Example 6) The polymer (B-6) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 160.8 parts of propylene glycol monomethyl ether acetate were added, and after stirring and mixing, nitrogen substitution was performed. Then, the mixture was heated to 50°C. On the other hand, 15.0 parts of 2-(2-(1-acetoxyethoxy)ethoxy)ethyl methacrylate, 70.0 parts of methyl methacrylate, 15.0 parts of methacrylic acid, 2.0 parts of 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile) (V-70 manufactured by Fujifilm and Kazumitsu Pure Chemicals Co., Ltd.), and 15.0 parts of propylene glycol monomethyl ether acetate were stirred and mixed in a beaker to form a dropper (A). 2.0 parts of n-dodecyl mercaptan and 58.0 parts of propylene glycol monomethyl ether acetate were added to a beaker and stirred and mixed to form a dropper (B). After the temperature of the reaction tank reached 50°C, polymerization was carried out by dripping from the dripping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. After the dripping was completed, the temperature was maintained at 50°C for 7 hours for curing. Then, the mixture was cooled to room temperature to obtain polymer (B-6). The various properties of the obtained polymer are shown in Table 2. (Example 7) The polymer (B-7) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 190.8 parts of propylene glycol monomethyl ether acetate and 14.3 parts of triethylamine were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, 10.0 parts of N-phenylmaleimide, 50.0 parts of cyclohexyl methacrylate, 10.0 parts of 2-hydroxyethyl methacrylate, 10.0 parts of acrylic acid, 20.0 parts of 2-(2-(1-ethoxyethoxy)ethoxy)ethyl methacrylate, 20.0 parts of propylene glycol monomethyl ether acetate, and 4.0 parts of n-dodecyl mercaptan were mixed in a beaker to form a dropper. 2.9 parts of di-2-ethylhexyl peroxide (PEROYL (registered trademark) OPP manufactured by Nippon Oil Company) and propylene glycol monomethyl ether acetate were also prepared. 27.1 parts of ether acetate were mixed in a beaker as the initiator tank. After the reaction tank reached a temperature of 60°C, polymerization was carried out by dripping the initiator from the dropper tank over a period of 3 hours while maintaining this temperature. The initiator tank consisted of 30 parts, divided into six batches of 5 parts each, added to the reaction tank at 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours of polymerization initiation. After the dripping was completed, the mixture was also aged at 60°C for 6 hours. Then, it was cooled to room temperature to obtain polymer (B-7). The various properties of the obtained polymer are shown in Table 2. (Example 8) The polymer (B-8) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 172.6 parts of propylene glycol monomethyl ether acetate and 23.9 parts of triethylamine were added, and after nitrogen substitution, the mixture was heated to 50°C. Meanwhile, 5.0 parts of N-cyclohexylmaleimide, 20.0 parts of methacrylic acid, 20.0 parts of propylene glycol monomethyl ether acetate, and 3.0 parts of n-dodecyl mercaptan were mixed in a beaker to form dropper (A). In dropper (B), 15.0 parts of propylene glycol monomethyl ether acetate, 17.3 parts of acetic acid, and 0.006 parts of p-toluenesulfonic acid were added to the beaker and stirred to form a homogeneous mixture. Then, while maintaining heat, 57.7 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the mixture. After the dripping was completed, the mixture was stirred at 30°C for 3 hours to prepare a dripping tank (B). 2.0 parts of 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile) (Fujifilm and Koko Pure Chemical Industries, Ltd., V-70) and 28.0 parts of propylene glycol monomethyl ether acetate were prepared and mixed as an initiator tank. Once the reaction tank temperature reached 50°C, polymerization was carried out by dripping the initiator from dripping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours, with 5 parts added to each batch. After the dripping was completed, the mixture was also aged at 50°C for 7 hours. Then, it was cooled to room temperature to obtain polymer (B-8). The various properties of the obtained polymer are shown in Table 2. (Example 9) The polymer (B-9) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 145.8 parts of propylene glycol monomethyl ether acetate were added and nitrogen-substituted, and then heated to 60°C. On the other hand, 10.0 parts of N-benzylmaleimide, 30.0 parts of cyclohexyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 2.0 parts of 2,2'-azobis(2,4-dimethylpentanonitrile) (V-65 manufactured by Fujifilm and Kazumitsu Pure Chemicals Co., Ltd.), and 30.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form a dropper (A). In a dropper (B), 57.5 parts of propylene glycol monomethyl ether acetate, 6.9 parts of acetic acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and mixed to form a homogeneous mixture. Next, while monitoring the heating process, 23.1 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the mixture. After the addition was complete, the mixture was stirred at 30°C for 3 hours, and then 0.10 parts of diethylmethylamine and 2.5 parts of n-dodecyl mercaptan were added to form a dropping tank (B). Once the temperature of the reaction tank reached 60°C, polymerization was carried out by adding the polymer dropwise from dropping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. After the addition was complete, the temperature was raised to 70°C and allowed to mature for 10 hours. Then, after cooling to room temperature, 7.7 parts of succinic anhydride, 6.7 parts of diethylmethylamine, and 21.8 parts of propylene glycol monomethyl ether acetate were added to the reaction tank, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-9). The various properties of the obtained polymer are shown in Table 2. (Example 10) The polymer (B-10) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 228.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. On the other hand, 15.0 parts of cyclohexyl methacrylate, 55.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of 2-(2-(1-acetoxyethoxy)ethoxy)ethyl methacrylate, 2.9 parts of di-2-ethylhexyl peroxide (PEROYL (registered trademark) OPP) manufactured by Nippon Oil Co., Ltd., and 30.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form a dropper (A). 2.5 parts of n-dodecyl mercaptan and 57.5 parts of propylene glycol monomethyl ether acetate were added to a beaker and mixed by stirring to form a dropper (B). After the reaction tank temperature reached 60°C, polymerization was carried out by dripping from drop tanks (A) and (B) over a period of 3 hours while maintaining this temperature. After dripping, the temperature was maintained at 60°C for 6 hours of curing. Then, the mixture was cooled to room temperature, and 26.2 parts of 2-methacryloxyethyl isocyanate, 16.8 parts of triethylamine, and 0.2 parts of ANTAGE W400 were added. An oxygen / nitrogen MIX gas with an oxygen concentration adjusted to 7% was used for foaming at 20 ml / min, and the reaction was carried out simultaneously at 90°C for 2 hours. Then, after cooling to room temperature, 16.6 parts of succinic anhydride were added, and the reaction was carried out at 50°C for 1 hour. After the reaction was completed, the mixture was cooled to room temperature to obtain polymer (B-10). The various properties of the obtained polymer are shown in Table 2. (Example 11) The polymer (B-11) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 263.7 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. On the other hand, 15.0 parts of N-benzylmaleimide, 15.0 parts of cyclohexyl methacrylate, 25.0 parts of glycidyl methacrylate, 20.0 parts of 2-hydroxyethyl methacrylate, 25.0 parts of 2-(2-(1-isopropoxyethoxy)ethoxy)ethyl methacrylate, 3.0 parts of n-dodecyl mercaptan, and 25.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form a dropper. Prepare a starter tank by mixing 2.0 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) (Fujifilm and Koko Pure Chemical Industries, Ltd., V-65) and 28.0 parts of propylene glycol monomethyl ether acetate in a beaker. After the reaction tank reaches a temperature of 60°C, maintain this temperature while adding the starter dropwise over a period of 3 hours. The starter tank contains 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours, with 5 parts added to each batch. After the dropwise addition is complete, raise the reaction tank temperature to 70°C and allow it to mature for 10 hours. Then, cool to room temperature, add 5.1 parts of acrylic acid, 12.2 parts of triethylamine, and 0.2 parts of ANTAGE W400. Use an oxygen / nitrogen mix gas with an oxygen concentration adjusted to 7% to foam at 20 ml / min, and simultaneously react at 110°C for 7 hours. Then, after cooling to room temperature, 12.0 parts of succinic anhydride were added, and the reaction was carried out at 50°C for 1 hour. After the reaction was completed, the mixture was cooled to room temperature to obtain polymer (B-11). The various properties of the obtained polymer are shown in Table 2. (Example 12) The polymer (B-12) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 215.7 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, 5.0 parts of N-phenylmaleimide, 5.0 parts of cyclohexyl methacrylate, 35.0 parts of glycidyl methacrylate, 35.0 parts of 2-hydroxyethyl methacrylate, and 5.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (A). In dropper (B), 68.0 parts of propylene glycol monomethyl ether acetate, 3.7 parts of ethanol, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and stirred to form a homogeneous mixture. Then, while maintaining heat, 16.3 parts of 2-(2-ethyleneoxyethoxy)ethyl methacrylate were added dropwise to the mixture. After the dripping was completed, the mixture was stirred at 30°C for 3 hours. Then, 0.08 parts of triethylamine and 2.0 parts of n-dodecyl mercaptan were added to prepare the dripping tank (B). 2.0 parts of 2,2'-azobis(2,4-dimethylpentanonitrile) (Fujifilm Wako Pure Chemical Industries Co., Ltd., V-65) and 28.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker as the initiator tank. Once the reaction tank reached a temperature of 60°C, the mixture was dripped from the dripping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five parts of each batch were added to the reaction tank. After the dripping was completed, the reaction tank was heated to 70°C and allowed to mature for 10 hours. Then, after cooling to room temperature, 14.0 parts of methacrylic acid, 26.9 parts of triethylamine, and 0.2 parts of ANTAGE W400 were added. An oxygen / nitrogen mix gas with an oxygen concentration adjusted to 7% was used for foaming at 20 ml / min, and the reaction was carried out at 110°C for 7 hours. After cooling to room temperature, 26.6 parts of succinic anhydride were added, and the reaction was carried out at 50°C for 1 hour. After the reaction was completed, the mixture was cooled to room temperature to obtain polymer (B-12). The various properties of the obtained polymer are shown in Table 2. (Example 13) The polymer (B-13) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 145.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, 2.0 parts of N-benzylmaleimide, 38.0 parts of cyclohexyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of propylene glycol monomethyl ether acetate, and 2.0 parts of n-dodecyl mercaptan were mixed in a beaker to form dropper (A). In dropper (B), 30.0 parts of propylene glycol monomethyl ether acetate, 7.3 parts of acetic acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and mixed to form a homogeneous mixture. Then, while maintaining heat, 22.7 parts of 2-(2-ethyleneoxyethoxy)ethyl acrylate were added dropwise to the above mixture. After the dripping was completed, the mixture was stirred at 30°C for 3 hours, and then 0.12 parts of triethylamine were added. This mixture was then used as the dripping tank (B). 2.0 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) (Fujifilm Wako Pure Chemical Industries Co., Ltd., V-65) and 28.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker and used as the initiator tank. Once the reaction tank reached a temperature of 60°C, the mixture was dripped from the dripping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five parts of each batch were added to the reaction tank. After the dripping was completed, the temperature was raised to 70°C and the mixture was allowed to mature for 6 hours. Then, after cooling to room temperature, 11.5 parts of succinic anhydride, 11.7 parts of triethylamine, and 29.6 parts of propylene glycol monomethyl ether acetate were added to the reaction vessel, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-13). The various properties of the obtained polymer are shown in Table 2. (Example 14) The polymer (B-14) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 145.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. Meanwhile, 2.0 parts of N-benzylmaleimide, 38.0 parts of cyclohexyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of propylene glycol monomethyl ether acetate, and 2.0 parts of n-dodecyl mercaptan were mixed in a beaker to form dropper (A). In dropper (B), 30.0 parts of propylene glycol monomethyl ether acetate, 8.5 parts of propionic acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and mixed to form a homogeneous mixture. Then, while maintaining heat, 21.5 parts of 2-(2-ethoxyethoxy)ethyl acrylate were added dropwise to the above mixture. After the dripping was completed, the mixture was stirred at 30°C for 3 hours, and then 0.12 parts of triethylamine were added. This mixture was then used as the dripping tank (B). 2.0 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) (Fujifilm Wako Pure Chemical Industries Co., Ltd., V-65) and 28.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker and used as the initiator tank. Once the reaction tank reached a temperature of 60°C, the mixture was dripped from the dripping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five parts of each batch were added to the reaction tank. After the dripping was completed, the temperature was raised to 70°C and the mixture was allowed to mature for 6 hours. Then, after cooling to room temperature, 11.5 parts of succinic anhydride, 11.7 parts of triethylamine, and 29.6 parts of propylene glycol monomethyl ether acetate were added to the reaction vessel, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-14). The various properties of the obtained polymer are shown in Table 2. (Example 15) The polymer (B-15) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 146.8 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. On the other hand, 2.0 parts of N-benzylmaleimide, 35.5 parts of cyclohexyl methacrylate, 1.0 part of methyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of propylene glycol monomethyl ether acetate, and 2.0 parts of n-dodecyl mercaptan were mixed in a beaker as a dropper (A). In a dropper (B), 28.5 parts of propylene glycol monomethyl ether acetate, 10.1 parts of butyric acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker and mixed to form a homogeneous mixture. Next, while monitoring the heating process, 21.4 parts of 2-(2-ethyleneoxyethoxy)ethyl acrylate were added dropwise to the above mixture. After the addition was complete, the mixture was stirred at 30°C for 3 hours, and then 0.12 parts of triethylamine were added. This mixture was then used as the dropping tank (B). 2.0 parts of 2,2'-azobis(2,4-dimethylpentanonitrile) (V-65 manufactured by Fujifilm and Koko Pure Chemical Industries, Ltd.) and 28.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker as the initiator tank. Once the reaction tank reached a temperature of 60°C, the mixture was added dropwise from dropping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five parts of each batch were added to the reaction tank. After the addition was complete, the temperature was raised to 70°C and the mixture was allowed to mature for 6 hours. Then, after cooling to room temperature, 11.5 parts of succinic anhydride, 11.7 parts of triethylamine, and 29.6 parts of propylene glycol monomethyl ether acetate were added to the reaction vessel, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-15). The various properties of the obtained polymer are shown in Table 2. (Example 16) The polymer (B-16) was synthesized in a reaction vessel equipped with a thermometer, a stirrer, a gas inlet pipe, a cooling pipe, and a dropper inlet. 159.8 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 60°C. On the other hand, 2.0 parts of N-benzylmaleimide, 22.5 parts of cyclohexyl methacrylate, 1.0 part of methyl methacrylate, 30.0 parts of 2-hydroxyethyl methacrylate, 30.0 parts of propylene glycol monomethyl ether acetate, and 2.0 parts of n-dodecyl mercaptan were mixed in a beaker as a dropper (A). In a dropper (B), 15.5 parts of propylene glycol monomethyl ether acetate, 23.1 parts of lauric acid, and 0.002 parts of p-toluenesulfonic acid were added to the beaker, and the mixture was heated to 50°C and stirred to prepare a homogeneous mixture. Next, while monitoring the heating process, 21.4 parts of 2-(2-ethyleneoxyethoxy)ethyl acrylate were added dropwise to the above mixture. After the addition was complete, the mixture was stirred at 50°C for 3 hours, and then 0.12 parts of triethylamine were added. This mixture was then used as the dropping tank (B). 2.0 parts of 2,2'-azobis(2,4-dimethylpentanonitrile) (V-65 manufactured by Fujifilm and Kazumitsu Pharmaceutical Co., Ltd.) and 28.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker as the initiator tank. Once the reaction tank reached a temperature of 60°C, polymerization was carried out by adding the initiator dropwise from dropping tanks (A) and (B) over a period of 3 hours while maintaining this temperature. The initiator tank contained 30 parts, divided into six batches: 0 minutes, 30 minutes, 1 hour, 1.5 hours, 2 hours, and 2.5 hours. Five parts of each batch were added to the reaction tank. After the addition was complete, the temperature was raised to 70°C and the mixture was allowed to mature for 6 hours. Then, after cooling to room temperature, 11.5 parts of succinic anhydride, 11.7 parts of triethylamine, and 29.6 parts of propylene glycol monomethyl ether acetate were added to the reaction vessel, and the reaction was carried out at 50°C for 1 hour. After the reaction, the mixture was cooled to room temperature to obtain polymer (B-16). The various properties of the obtained polymer are shown in Table 2. (Comparative Example 1) Polymer (B-17) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 143.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 70°C. Meanwhile, 28.0 parts of 3-carboxylated alkyl methacrylate, 12.8 parts of azobisisobutyronitrile, and 72.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (A), and 72.0 parts of 4-(1-methoxy)ethoxycyclohexyl methacrylate and 18.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (B). After the reaction vessel reached 70°C, polymerization was carried out by dripping from droppers (A) and (B) over a period of 3 hours while maintaining this temperature. After the dripping was completed, the mixture was also aged at 70°C for 7 hours. The polymer (B-17) was then cooled to room temperature. The various properties of the obtained polymer are shown in Table 2. (Comparative Example 2) Polymer (B-18) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 143.3 parts of propylene glycol monomethyl ether acetate and 10.8 parts of triethylamine were added, and after nitrogen substitution, the mixture was heated to 70°C. Meanwhile, 28.0 parts of 3-carboxylated alkyl methacrylate, 12.8 parts of azobisisobutyronitrile, and 72.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (A), and 72.0 parts of 4-(1-methoxy)ethoxycyclohexyl methacrylate and 18.0 parts of propylene glycol monomethyl ether acetate were mixed in a beaker to form dropper (B). After the reaction vessel reached 70°C, polymerization was carried out by dripping from droppers (A) and (B) over a period of 3 hours while maintaining this temperature. After the dripping was completed, the mixture was also aged at 70°C for 7 hours. The polymer (B-18) was then cooled to room temperature. The various properties of the obtained polymer are shown in Table 2. (Comparative Example 3) Polymer (B-19) was synthesized in a reaction vessel equipped with a thermometer, stirrer, gas inlet pipe, cooling pipe, and dropper inlet. 105.3 parts of propylene glycol monomethyl ether acetate were added, and after nitrogen substitution, the mixture was heated to 70°C. Meanwhile, 76.4 parts of cyclohexyl methacrylate, 14.7 parts of glycidyl methacrylate, 8.9 parts of methacrylic acid, 50.0 parts of propylene glycol monomethyl ether acetate, and 2.7 parts of tributyl peroxyisobutyrate (ARKEMA Yoshitomi Co., Ltd. "LUPEROX (registered trademark) 11") were mixed in a beaker to form dropper (A). 2.0 parts of n-dodecyl mercaptan and 78 parts of propylene glycol monomethyl ether acetate were mixed in a dropper (B). After the reaction vessel reached 70°C, polymerization was carried out by dripping the polymer from the dropper over a period of 3 hours while maintaining this temperature. After the dripping was completed, the temperature was maintained at 70°C for 30 minutes, and then increased to 80°C for 180 minutes to obtain polymer (B-19). The various physical properties of the obtained polymer are shown in Table 2. [Table 2] Additionally, the entries in Table 2 represent the following: BzMI: N-benzylmaleimide; PMI: N-phenylmaleimide; CHMI: N-cyclohexylmaleimide; CHMA: cyclohexyl methacrylate; MMA: methyl methacrylate; HEMA: 2-hydroxyethyl methacrylate; MECMA: 4-(1-methoxy)ethoxycyclohexyl methacrylate; AA: acrylic acid; MAA: methacrylate; AMAA: 3-carboxylic acid alkyl methacrylate; GMA: glycidyl methacrylate; MOI: 2-methacryloxyethyl isocyanate; SAH: succinic anhydride; OPP: di-2-ethylhexyl peroxide (manufactured by Nippon Oil Company, "PEROYL (registered trademark) OPP"); V70: 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile) (manufactured by Fujifilm and Wako Pure Chemical Industries Co., Ltd., V-70). V65: 2,2'-Azobis(2,4-dimethylvalerate) (V-65 manufactured by Fujifilm and Koei Pure Chemical Industries, Ltd.) AIBN: Azobisisobutyronitrile L11: Tributyl peroxyisobutyrate (LUPEROX 11 manufactured by ARKEMA Yoshitomi) TEA: Triethylamine DEMA: Diethylmethylamine (Preparation of photosensitive resin composition) Based on the solid content, 35 parts of polymer (B-1), 30 parts of pigment dispersion 1, 30 parts of dipentylenetetramethyl acrylate (DPHA), and 5 parts of IRGACURE (registered trademark) OXE02 (manufactured by BASF Japan) were added, and a diluent (propylene glycol monomethyl ether acetate) was further added to achieve a solid content concentration (non-volatile component) of 20% by mass. The mixture was stirred to obtain the photosensitive resin composition (C-1). (Preparation of Pigment Dispersion 1) 12.9 parts of propylene glycol monomethyl ether acetate, 0.4 parts of DISPARLON DA-7301 as an alkaline dispersant, 2.25 parts of CIPigment Green 58 as a pigment and 1.5 parts of CIPigment yellow 138 as pigments were mixed and dispersed in a paint shaker for 3 hours to obtain pigment dispersion 1 (solid content 22% by mass). Except for the blending methods shown in Table 3, all other photosensitive resin compositions (C-2) to (C-19) were obtained in the same manner as in Example 1. The developability, solvent resistance, and storage stability of the obtained photosensitive resin compositions were evaluated using the methods described above. The results are shown in Table 3. [Table 3] From Tables 2 and 3, it can be confirmed that compared to the polymers of Comparative Examples 1-3, the polymers of Examples 4-16 have faster development speeds and improved solvent resistance. The acetal monomer units of the polymers of Examples 4-16 have PEG chains, resulting in high hydrophilicity and thus improved development speed. On the other hand, although Comparative Examples 1 and 2 have alicyclic structures in the acetal monomer units or acid-containing monomer units of the polymer backbone, their high hydrophobicity or steric hindrance leads to slow development speeds and difficulties in crosslinking reactions, resulting in deteriorating solvent resistance. Furthermore, in Comparative Example 3, the high reactivity of acid groups with epoxy groups results in poor storage stability of the polymer or photosensitive resin composition, leading to fewer unreacted acid groups during development and thus a slower development speed. Additionally, the crosslinking reaction of acid epoxy groups, compared to reactions such as cationic polymerization of vinyl ethers, results in lower crosslinking density during curing, thus also leading to deteriorating solvent resistance. Compared to Comparative Examples 1-3, Examples 1-16 demonstrated good storage stability. The storage stability of Examples 11 and 12 was lower than the other examples, likely because they were resins with epoxy groups in the side chains and contained a neutralized amount of triethylamine (a basic compound). On the other hand, the comparative examples exhibited poor storage stability because when vinyl ethers were copolymerized with monomers forming an alicyclic backbone, detachment during storage was easy, leading to crosslinking of the vinyl ether groups. Conversely, in examples with straight or branched chains, the vinyl ethers did not easily detach during storage, exhibiting good stability. Furthermore, they detached completely during low-temperature firing, resulting in high reactivity of the detached vinyl ethers and good solvent resistance, thus overcoming the trade-off between storage stability and solvent resistance. Moreover, in Comparative Example 1, since it lacked a basic compound that neutralized the acid-containing monomer units, the protecting groups of the vinyl ether continuously detached during polymer solution storage, leading to vinyl ether group regeneration and crosslinking. Therefore, compared to Comparative Example 2, its storage stability deteriorated. It is believed that Example 6 also suffers from poorer preservation stability than other examples for the same reason. Furthermore, while Examples 1-3 showed good solvent resistance and storage stability compared to Comparative Examples 1-3, the development speed was noticeably slower. This is believed to be due to the absence of acid-containing monomer units in the polymers. Also, compared to Examples 2, 3, 5, 7, 11, and 12, Examples 1, 4, 8, 9, 10, 13, 14, 15, and 16 showed smaller viscosity changes and better storage stability. This is because the stability of AEEM, AEEA, PEEA, BEEA, and LEEA was better than that of the polymers with IEEM or EEEM; therefore, carboxylic acids are preferred over alcohols for protecting vinyl ether monomers. Compared to Example 4, the development speed of Example 13 was confirmed to be faster. This is believed to be due to the decrease in the glass transition temperature (Tg) of the resin caused by changing from VEEM to VEEA. Furthermore, Example 15, compared to Example 14, was confirmed to be identical. However, compared to Example 13, Example 14 showed the same solvent resistance, but a smaller viscosity change rate and better storage stability. This is believed to be due to the longer molecular chain of the carboxylic acid compound forming the acetal monomer unit, which is more effective in inhibiting the release of the carboxylic acid compound, thus improving storage stability. On the other hand, Example 16, compared to Example 15, showed the same storage stability, but deteriorated solvent resistance. This is believed to be because while a longer molecular chain of the carboxylic acid compound is more effective in inhibiting the release of the carboxylic acid compound, a longer molecular chain reduces the crosslinking density during thermosetting, thus decreasing solvent resistance. Therefore, butyric acid with 4 carbon atoms is the optimal carboxylic acid. (Confirmation of the Influence of Diluents) To investigate the influence of diluents on the storage stability of the polymer, the following procedures were performed. Storage stability was evaluated using a polymer solution of 74 parts (20 parts solids, 54 parts volatiles) of polymer (B-15) with 26 parts diluent added. The storage stability was evaluated by the increase in weight-average molecular weight (WMB) before and after storage at 40°C for one week. The WMB was determined using the method described above. Table 4 shows the WMB after storage (%) with the WMB as 100% of the original WMB. A smaller WMB increase indicates better storage stability. Five diluents were used: propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, dimethylformamide, diethylene glycol ethyl methyl ether, and 1-butanol. The evaluation results are shown in Table 4. [Table 4] Table 4 shows that the rate of change of the weight-average molecular weight of the polymers in Examples 17, 18, 19, and 20 is smaller than that in Example 21. Therefore, it is believed that adding alcohol solvents, ether solvents, or amide solvents to the polymers can improve their storage stability. Furthermore, the rate of change of the weight-average molecular weight increases sequentially from Examples 17, 18, 19, and 20. Therefore, it is believed that the order of improvement in storage stability is ether solvents, alcohol solvents, and amide solvents. Also, comparing Example 18 with Example 19, it is evident that the rate of change of the weight-average molecular weight is smaller. Therefore, among alcohol solvents, secondary alcohol solvents are considered more suitable for improving storage stability than primary solvents. (Confirmation of the Influence of Dispersants) To investigate the effect of adding dispersants on the storage stability of polymers, the following procedures were performed. Storage stability was evaluated using polymer solutions containing 90 parts by weight of polymer (B-5) or polymer (B-11) with 10 parts by weight of the amine dispersant Disperbyk-164 (amine value 18 mg KOH / g, solids content 60%, manufactured by BYK-Chemie). The storage stability was evaluated by the change in acid value after storage at 40°C for one week. The acid value was determined using the method described above. A smaller change in acid value indicated better storage stability of the polymer. The evaluation results are shown in Table 5. Furthermore, the change in acid value was also evaluated for polymers (B-5) and (B-11) in the same manner for reference. [Table 5] According to Table 5, the resin solutions of Examples 22-25 showed smaller changes in acid value and superior storage stability compared to the resin solutions of Comparative Examples 4-5. Comparing Examples 22 and 23 containing polymer (B-5) with Examples 24 and 25 containing polymer (B-11), the resin solutions of the examples containing polymer (B-5) showed smaller changes in acid value regardless of the presence or absence of an amine dispersant. Considering these results, it can be concluded that a lower amount of epoxy groups in the resin results in better storage stability. Furthermore, comparing Example 22 and Example 23, it is evident that the resin solution of Example 22, containing an amine dispersant, exhibits a smaller change in acid value and superior storage stability. This is believed to be due to the inhibition of acetal deprotection caused by the addition of the amine dispersant. On the other hand, comparing Example 24 and Example 25, it is evident that the resin solution of Example 24, containing an amine dispersant, exhibits a larger change in acid value. This tendency can also be observed in the comparison between Comparative Example 4 and Comparative Example 5. Based on these results, it is believed that amine dispersants reduce the storage stability of resins containing epoxy groups. This is believed to be due to the promotion of the reaction between acid groups and epoxy groups by the addition of amine dispersants. From the above, it is clear that the polymers of the examples exhibit excellent storage stability, and when a composition containing an amine dispersant is prepared, the amount of epoxy groups is low, resulting in even better storage stability. Furthermore, comparing Example 23, Example 25, and Comparative Example 5, since the acid value changes increase sequentially, it is evident that in the absence of an amine dispersant, the amount of epoxy groups is low, resulting in even better storage stability. none none

Claims

1. A photosensitive resin composition, characterized in that it contains a polymer solution or pigment dispersion, a polymerizable compound, and a photopolymerization initiator and / or a photoacid generator, wherein the polymer solution comprises a polymer having a structural unit (A) represented by the following formula (1) and a structural unit (B) containing an acid group, and an alkaline dispersant or alkaline compound, wherein the content of the alkaline dispersant or alkaline compound is 1 to 50% by mass of 100% of the total solid content of the polymer solution (where X represents a hydrogen atom or a methyl group, L represents a linear or branched divalent organic group, and Y represents an organic group that decomposes due to acid or heat to generate an ethylene ether group on the polymer side chain), and the pigment dispersion contains the polymer solution and the pigment.

2. The photosensitive resin composition as claimed in claim 1, wherein, The structural unit (A) is represented by the following formula (1-1), (where X represents a hydrogen atom or a methyl group, R1 represents a straight-chain or branched divalent organic group, and R2 represents an organic group with 1 to 20 carbon atoms).

3. The photosensitive resin composition as claimed in claim 1, wherein, The polymer further has a structural unit (C) in the main chain, which has a ring structure.

4. The photosensitive resin composition of claim 1 is used to form a color filter.

5. A cured material, characterized in that it is formed by curing the photosensitive resin composition of any one of claims 1 to 4.

6. A method for manufacturing a polymer having a structural unit (A) represented by the following formula (1) and an acid-containing structural unit (B), characterized in that: the manufacturing method includes a step (P-1) of polymerizing a monomer component in the presence of an alkaline compound, the monomer component comprising a monomer containing a group that can generate an ethylene ether group due to acid or heat and an acid-containing monomer, the amount of the alkaline compound used being 0.5 to 10 equivalents relative to 1 equivalent of the acid-containing monomer, (where X represents a hydrogen atom or a methyl group, L represents a linear or branched divalent organic group, and Y represents an organic group that can decompose due to acid or heat to generate an ethylene ether group on the side chain of the polymer).

7. A method for manufacturing a polymer having a structural unit (A) represented by the following formula (1) and an acid-containing structural unit (B), characterized in that the manufacturing method comprises the following steps: Step (Q-1): polymerizing a monomeric component comprising a monomer containing a monomer that generates an ethylene ether group due to acid or heat and a monomer containing a hydroxyl group; Step (Q-2): reacting an acid-containing compound with the polymer obtained in step (Q-1) in the presence of an alkaline compound, wherein the amount of the alkaline compound used is 0.5 to 10 equivalents relative to the acid-containing structural unit 1 (where X represents a hydrogen atom or a methyl group, L represents a linear or branched divalent organic group, and Y represents an organic group that decomposes due to acid or heat to generate an ethylene ether group on the side chain of the polymer).

8. A monomeric compound, characterized in that it is represented by the following formula (a), (where R7 represents a hydrogen atom or a methyl group, R8 represents a group represented by -R3-O-R4-, R3 and R4 may be the same or different, representing a divalent saturated aliphatic hydrocarbon group, and R9 represents an organic group having 1 to 20 carbon atoms (but excluding groups containing (meth)propenyl)).

9. A method for manufacturing a monomeric compound, the monomeric compound being represented by the following formula (a-1), characterized in that: the manufacturing method includes the step of reacting a (meth)acrylate compound containing an vinyl ether group with a carboxylic acid compound, wherein in the reaction step, the amount of the carboxylic acid compound used is more than one equivalent relative to the vinyl ether group of the (meth)acrylate compound containing an vinyl ether group (wherein, R7 represents a hydrogen atom or a methyl group, R8 represents a group represented by -R3-O-R4-, R3 and R4 may be the same or different, representing a divalent saturated aliphatic hydrocarbon group, and R10 represents a hydrogen atom or an organic group having 1 to 20 carbon atoms (excluding groups containing (meth)acrylate)).