Substrate processing equipment and recovery ring

TWI942307BActive Publication Date: 2026-10-11GRAND PLASTIC TECH
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Patent Information

Application Number
TW114120395
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Filing Date
2025-05-29
Publication Date
2026-10-11
Estimated Expiration
2045-05-28

Smart Images

  • Figure TWG2TB001915484_001
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    Figure TWG2TB001915484_002
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    Figure TWG2TB001915484_003
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Abstract

This application provides a substrate processing apparatus and a recovery ring. The recovery ring includes: a pair of annular sidewalls, a bottom wall, a shielding wall, and a drain pipe. The bottom wall is laterally connected to the pair of annular sidewalls. The inner sidewall, connected to the bottom wall and the pair of annular sidewalls, defines a receiving cavity for containing process liquid. The outer sidewall, connected to the bottom wall and the pair of annular sidewalls, serves as a stop structure for another recovery ring below, for introducing another process liquid into that other recovery ring. The shielding wall is disposed on the outer sidewall and located at the junction of the bottom wall and the pair of annular sidewalls, for guiding the other process liquid flowing along the outer sidewall to drip vertically into the other recovery ring below. The drain pipe passes through the bottom wall and communicates with the receiving cavity for discharging the process liquid from the receiving cavity.
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Claims

1. A substrate processing apparatus, comprising: A rotary table for supporting a substrate; A liquid supply device is disposed above the rotary table for applying multiple process liquids to the substrate; The system includes a liquid recovery assembly disposed on the outside of the rotary table. The liquid recovery assembly comprises a plurality of recovery rings arranged sequentially from top to bottom and movable relative to the rotary table to collect corresponding process liquids. At least one of the recovery rings includes: a pair of concentrically arranged and spaced apart annular sidewalls; a bottom wall laterally connecting the pair of annular sidewalls, wherein the inner sidewall of the bottom wall connected to the pair of annular sidewalls defines a receiving cavity for receiving a process liquid, and wherein the outer sidewall of the bottom wall connected to the pair of annular sidewalls serves as a stop structure for another recovery ring below, for guiding another process liquid into the other recovery ring; a baffle wall disposed on the outer sidewall and located at the junction of the bottom wall and the pair of annular sidewalls, for guiding the other process liquid flowing along the outer sidewall to drip vertically into the other recovery ring below; and a drain pipe penetrating the bottom wall and communicating with the receiving cavity for discharging the process liquid in the receiving cavity.

2. The substrate processing apparatus of claim 1, wherein the shielding wall extends longitudinally from the bottom wall in a direction away from the pair of annular sidewalls.

3. The substrate processing apparatus of claim 2, wherein the at least one recycling ring further includes an inclined wall connected to the lower end of the shielding wall and together with the shielding wall forming a barbed structure.

4. The substrate processing apparatus of claim 3, wherein the inclined wall is continuously formed within the range where the drain pipe is correspondingly provided, and terminates at a position spaced a distance from the drain pipe.

5. The substrate processing apparatus of claim 1, wherein the drain pipe extends vertically through the other recycling ring located below it, and the at least one recycling ring further includes a leak-proof cover surrounding the drain pipe and disposed at the junction of the drain pipe and the other recycling ring.

6. A recovery ring disposed outside a rotary table for collecting process liquid splashed from the rotary table, wherein the recovery ring comprises: A pair of concentrically arranged and spaced apart annular sidewalls; A bottom wall laterally connects the pair of annular sidewalls, wherein the inner sidewall connecting the bottom wall and the pair of annular sidewalls defines a receiving cavity for receiving a process liquid, and wherein the outer sidewall connecting the bottom wall and the pair of annular sidewalls serves as a stop structure for another recovery ring below, for guiding another process liquid into the other recovery ring; a shielding wall is disposed on the outer sidewall and located at the junction of the bottom wall and the pair of annular sidewalls, for guiding the other process liquid flowing along the outer sidewall to drip vertically into the other recovery ring below; And a row of liquid pipes that penetrate the bottom wall and communicate with the receiving cavity to discharge the process liquid in the receiving cavity.

7. The recycling ring as claimed in claim 6, wherein the shielding wall extends longitudinally from the bottom wall in a direction away from the pair of annular sidewalls.

8. The recycling ring of claim 6, wherein the at least one recycling ring further includes an inclined wall connected to the lower end of the shielding wall and together with the shielding wall forming a barbed structure.

9. The recovery ring as claimed in claim 8, wherein the inclined wall is continuously formed within the area where the drain pipe is correspondingly provided, and terminates at a position spaced a distance from the drain pipe.

10. The recycling ring of claim 6, wherein the drain pipe extends vertically through the other recycling ring located below it, and the at least one of the recycling rings further includes a leak-proof cap surrounding the drain pipe and disposed at the junction of the drain pipe and the other recycling ring.

Citation Information

Patent Citations

  • Single-wafer wet processing equipment

    CN111900102A