Electrophoretic display device and manufacturing method thereof

TWI942619BActive Publication Date: 2026-10-11TPK TOUCH SOLUTIONS (XIAMEN) INC
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Patent Information

Application Number
TW114149495
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Filing Date
2025-12-16
Publication Date
2026-10-11
Estimated Expiration
2045-12-15

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    Figure TWG2TB001915796_003
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Abstract

A method for manufacturing an electrophoretic display device includes: forming a silicone resin layer on a first surface of a light guide plate using a slit coating process, wherein the glue supply pressure of the slit coating process is 0.2~0.6MPa, and the viscosity of the silicone resin layer is 4500~17000cps; irradiating the silicone resin layer with ultraviolet light, wherein the energy intensity of the ultraviolet light is 1000~1200mW / cm2, the irradiation time is 10~30 seconds, and the total irradiation energy is 10000~30000mJ / cm2; disposing a touch sensing layer on the silicone resin layer, such that the silicone resin layer is located between the touch sensing layer and the light guide plate, wherein the touch sensing layer is bonded to a cover plate, and the touch sensing layer is located between the silicone resin layer and the cover plate; forming an acrylic resin layer on a second surface of the light guide plate, wherein the first surface is opposite to the second surface; and disposing an electrophoretic display on the acrylic resin layer, such that the acrylic resin layer is located between the electrophoretic display and the light guide plate.
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Claims

1. A method for manufacturing an electrophoretic display device, comprising: forming a silicone resin layer on a first surface of a light guide plate using a slit coating process, wherein the adhesive supply pressure of the slit coating process is 0.2 MPa to 0.6 MPa, and the viscosity of the silicone resin layer is 4500 cps to 17000 cps; irradiating the silicone resin layer with ultraviolet light, wherein the energy intensity of the ultraviolet light is 1000 mW / cm² to 1200 mW / cm², and the irradiation time is 10 seconds to 30 seconds, and the total energy of the irradiation is 10000 to 30000 mJ / cm²; and disposing a touch-sensing layer on the silicone resin layer, such that the silicone resin layer is located between the touch-sensing layer and the light guide plate, wherein the touch-sensing layer is bonded to a cover plate, and the touch-sensing layer is located between the silicone resin layer and the cover plate; An acrylic resin layer is formed on a second surface of the light guide plate, wherein the first surface is opposite to the second surface; and an electrophoretic display is disposed on the acrylic resin layer, such that the acrylic resin layer is located between the electrophoretic display and the light guide plate.

2. The method for manufacturing an electrophoretic display device as claimed in claim 1, wherein the step of forming the acrylic resin layer is performed after the step of forming the silicone resin layer.

3. The method for manufacturing an electrophoretic display device as claimed in claim 1, wherein the silicone resin layer is a fluorinated silicone resin layer.

4. The method for manufacturing an electrophoretic display device as claimed in claim 1, wherein the line speed of the slit coating process is from 15 mm / s to 54 mm / s.

5. The method for manufacturing an electrophoretic display device as claimed in claim 1, wherein a vertical distance between a coating head in the slit coating process and the first surface of the light guide plate is 50 mm to 300 mm.

6. A method for manufacturing an electrophoretic display device as claimed in claim 1, wherein the silicone resin layer comprises a silicone resin, and the number average molecular weight of the silicone resin is between 25,000 Daltons and 70,000 Daltons.

7. The method for manufacturing an electrophoretic display device as claimed in claim 1, wherein the step of forming the silicone resin layer forms a horn-shaped structure at each of the two ends of the silicone resin layer, and the thickness of the horn-shaped structure accounts for 17% to 27% of the total thickness of the silicone resin layer.

8. A method for manufacturing an electrophoretic display device as claimed in claim 7, wherein a vertical projection of the light guide plate onto a surface of the touch sensing layer falls entirely within the area of ​​the touch sensing layer, the area of ​​the vertical projection is smaller than the area of ​​the surface of the touch sensing layer, and the step of setting the touch sensing layer causes the horn-shaped structure of the silicone resin layer to expand outward and support an edge of the touch sensing layer.

9. An electrophoretic display device, comprising: A cover plate; A touch-sensing layer is disposed under the cover plate; an optical module is located under the touch-sensing layer and includes: a light guide plate having a first surface and a second surface facing each other, wherein the first surface faces the touch-sensing layer; a silicone resin layer is located on the first surface, wherein the silicone resin layer has an upper portion and a lower portion, and the upper portion has a first vertical projection area on the light guide plate that is larger than the lower portion has a second vertical projection area on the light guide plate; an acrylic resin layer is located on the second surface; a light source is disposed on one side of the light guide plate; and an electrophoretic display is located under the optical module.

10. The electrophoretic display device as claimed in claim 9, wherein the upper portion contacts the touch sensing layer and the lower portion contacts the light guide plate, and the first vertical projection area is 103% to 112% of the second vertical projection area.

Citation Information

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