Resistor composition, resistor pattern formation method, and compound

Abstract

An inhibitor composition comprising a resin component (A1) having a structural unit (a0) derived from a compound of the general formula (a0-1). In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms. Rpg is an acid-dissociable group of the general formula (a0-pg). A is a cyclic olefin having only one carbon-carbon unsaturated bond in its ring skeleton. Ra 01 represents a hydrogen atom or a hydrocarbon group with a monovalent charge of 1 to 20 carbon atoms. m1 represents an integer from 0 to 20. m2 represents an integer from 1 to 20. * represents a bond.

Description

Resist composition, resist pattern forming method, and compound The present invention relates to a resist composition, a resist pattern forming method, and a compound. This application claims priority based on Japanese Patent Application No. 2022-080807, filed in Japan on May 17, 2022, the contents of which are incorporated herein by reference. In recent years, due to the advancement of lithography technology, the miniaturization of patterns in the manufacture of semiconductor devices and liquid crystal display devices has been rapidly progressing. As a method of miniaturization, the wavelength of the exposure light source is generally shortened (higher energy) as a method. Resist materials are required to have high lithographic properties, such as sensitivity to these exposure light sources and resolution sufficient to reproduce fine-scale patterns. Conventionally, chemically amplified resist compositions containing a base component whose solubility in a developer solution is altered by the action of an acid and an acid generator component that generates acid upon exposure have been used as resist materials to meet these requirements. For example, Patent Document 1 discloses a resist composition containing a cobalt-based acid generator having an electron-withdrawing group in the cation portion. It is disclosed that this resist composition can achieve high sensitivity. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-227734 [Problems to be solved by the invention] With the advancement of lithography technology and the expansion of its application areas, the miniaturization of patterns has rapidly progressed. Consequently, in the manufacture of semiconductor devices and other applications, technologies are being sought that can form fine patterns with precise shapes. For example, in lithography using EUV or EB, the goal is to create fine patterns measuring tens of nanometers. The present invention has been made in view of the above circumstances, and its object is to provide a resist composition that achieves high sensitivity when forming a resist pattern, a resist pattern forming method using the resist composition, and a compound useful as a raw material for a base material component used in the resist composition. [Means for Solving the Problem] To solve the above-mentioned problems, the present invention adopts the following configuration. Specifically, a first aspect of the present invention is a resist composition that generates an acid upon exposure and changes its solubility in a developer by the action of the acid. The resist composition comprises a resin component (A1) whose solubility in a developer changes by the action of the acid. The resin component (A1) has a structural unit (a0) derived from a compound represented by the following general formula (a0-1). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Rpg is an acid-dissociable group represented by the following general formula (a0-pg)]. [wherein, A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. Ra 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different. * denotes a bonding point]. The second aspect of the present invention is a method for forming a resist pattern, comprising: forming a resist film on a support using the resist composition of the first aspect, exposing the resist film, and developing the exposed resist film to form a resist pattern. The third aspect of the present invention is a compound represented by general formula (a0-1). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Rpg is an acid-dissociable group represented by the following general formula (a0-pg)]. [wherein, A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. Ra 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different. * indicates a bonding point. [Effects of the Invention] According to the present invention, there are provided a resist composition that achieves high sensitivity when forming a resist pattern, a resist pattern forming method using the resist composition, and a compound useful as a raw material for a base material component used in the resist composition. In this specification and the scope of the present patent application, the term "aliphatic" is a relative concept relative to aromatic, and is defined to mean a group, compound, etc. that does not have aromatic properties. "Alkyl", unless otherwise specified, is defined as a monovalent saturated hydrocarbon group including linear, branched and cyclic groups. The same applies to the alkyl group in the alkoxy group. "Alkylene", unless otherwise specified, is defined as a divalent saturated hydrocarbon group including linear, branched and cyclic groups. "Halogen atom" includes, for example, fluorine atom, chlorine atom, bromine atom and iodine atom. The term "structural unit" refers to a monomer unit (monomeric unit) that constitutes a polymer compound (resin, polymer, copolymer). The case recorded as "may have a substituent" includes the case where a hydrogen atom (-H) is substituted by a monovalent group and the case where a methylene atom (-CH 2-) Both cases of substitution with a divalent group. "Exposure" is defined as a concept that includes all exposure to radiation. An "acid-decomposable group" is a group having acid-decomposable properties, in which at least a portion of the bonds in the structure of the acid-decomposable group can be cleaved by the action of an acid. Examples of acid-decomposable groups whose polarity increases by the action of an acid include groups that decompose to produce polar groups by the action of an acid. Examples of polar groups include carboxyl groups, hydroxyl groups, amino groups, sulfonic acid groups (-SO 3H) etc. More specifically, examples of the acid-decomposable group include groups in which the aforementioned polar groups are protected by an acid-dissociable group (e.g., groups in which the hydrogen atom of an OH-containing polar group is protected by an acid-dissociable group). The term "acid-dissociable group" refers to either: (i) an acid-dissociable group whose bond with an atom adjacent to the acid-dissociable group is cleaved by the action of an acid, or (ii) a group whose bond with an atom adjacent to the acid-dissociable group is cleaved by the action of an acid, thereby undergoing a decarbonation reaction. The acid-dissociable group constituting the acid-dissociable group must be less polar than the polar group formed by dissociation of the acid-dissociable group. Therefore, when the acid-dissociable group dissociates by the action of an acid, a more polar group than the acid-dissociable group is formed, thereby increasing the polarity. Consequently, the polarity of component (A1) as a whole increases. This increased polarity also alters the solubility in the developer: solubility increases in alkaline developers and decreases in organic developers. The so-called "base component" is an organic compound with film-forming ability. Organic compounds used as base components are broadly divided into non-polymers and polymers. Non-polymers generally have a molecular weight of 500 or more and less than 4000 (hereinafter referred to as "low-molecular-weight compounds"). Hereinafter, "resins," "high-molecular-weight compounds," or "polymers" refer to polymers with a molecular weight of 1000 or more. The molecular weight of polymers is defined as the weight-average molecular weight calculated as polystyrene, as determined by GPC (gel permeation chromatography). The term "derived structural unit" refers to a structural unit formed by multiple bonds between carbon atoms, for example, a structural unit formed by the cleavage of an ethylene double bond. In "acrylate", the hydrogen atom bonded to the carbon atom at the α position may be substituted by a substituent. The substituent (R αx ), is an atom or group other than a hydrogen atom. In addition, it is defined as also including a substituent (R αx ) is substituted with a substituent containing an ester bond to form an itaconic acid diester, or a substituent (R αxα-hydroxy acrylates substituted with a hydroxyalkyl group or a group modifying the hydroxyl group. Furthermore, the carbon atom at the α-position of an acrylate refers to the carbon atom to which the carbonyl group of the acrylic acid is bonded, unless otherwise specified. Hereinafter, acrylates in which the hydrogen atom bonded to the α-position carbon atom is replaced with a substituent may be referred to as α-substituted acrylates. The so-called "derivatives" are defined as the concepts including those in which the hydrogen atom at the α position of the target compound is replaced with other substituents such as alkyl groups, alkyl halides, etc., and such derivatives. Examples of such derivatives include those in which the hydrogen atom at the α position of the target compound can be replaced with a substituent and the hydrogen atom of the hydroxyl group of the target compound is replaced with an organic group; and those in which the hydrogen atom at the α position of the target compound can be replaced with a substituent and a substituent other than the hydroxyl group is bonded. In addition, the so-called α position refers to the first carbon atom adjacent to the functional group unless otherwise specified. As the substituent for replacing the hydrogen atom at the α position of hydroxystyrene, examples include R αx The same ones. Throughout this specification and the scope of this patent application, chemical formulae may contain asymmetric carbon atoms, and enantiomers or diastereomers may exist. In such cases, a single chemical formula represents such isomers. These isomers may be used alone or as a mixture. (Resist Composition) The resist composition of this embodiment generates acid upon exposure, and its solubility in a developer changes due to the action of the acid. This resist composition contains a base component (A) (hereinafter also referred to as "component (A)") whose solubility in a developer changes due to the action of the acid. In the resist composition of this embodiment, component (A) may generate acid upon exposure, or component (A) and an additive component may generate acid upon exposure. Specifically, the resist composition of this embodiment may be (1) further containing an acid generator component (B) (hereinafter referred to as "component (B)") that generates acid upon exposure; (2) component (A) is a component that generates acid upon exposure; or (3) component (A) is a component that generates acid upon exposure and further contains component (B). That is, in the cases (2) and (3) above, component (A) becomes a "base component that generates acid upon exposure and changes its solubility in a developer solution by the action of the acid." In the case where component (A) is a base component that generates acid upon exposure and changes its solubility in a developer solution by the action of the acid, component (A1) described later is preferably a resin that generates acid upon exposure and changes its solubility in a developer solution by the action of the acid. As such a resin, a polymer compound having a structural unit that generates an acid upon exposure can be used. As the structural unit that generates an acid upon exposure, a known one can be used. Among the above-mentioned resist compositions, the resist composition of this embodiment is preferably the one described in (1). That is, the resist composition of this embodiment is preferably the one containing the components (A) and (B). When a resist film is formed using the resist composition of this embodiment and selectively exposed, an acid is generated from, for example, component (B) in the exposed portion of the resist film. This acid changes the solubility of component (A) in the developer solution. On the other hand, the solubility of component (A) in the developer solution in the unexposed portion of the resist film remains unchanged, resulting in a difference in solubility in the developer solution between the exposed and unexposed portions. Consequently, when the resist film is developed, if the resist composition is positive-working, the exposed portion of the resist film is dissolved and removed, forming a positive-working resist pattern. If the resist composition is negative-working, the unexposed portion of the resist film is dissolved and removed, forming a negative-working resist pattern. The resist composition of this embodiment can be a positive resist composition or a negative resist composition. Furthermore, the resist composition of this embodiment can be used in an alkali development process using an alkali developer during the development process for forming the resist pattern, or in a solvent development process using a developer containing an organic solvent (organic developer). <Component (A)> In the resist composition of this embodiment, component (A) includes a resin component (A1) (hereinafter referred to as "component (A1)") whose solubility in a developer solution is altered by the action of an acid. By using component (A1), the polarity of the substrate component changes before and after exposure, thereby achieving good development contrast not only in alkaline development processes but also in solvent development processes. As component (A), other high molecular weight compounds and / or low molecular weight compounds may also be used in combination with component (A1). In the resist composition of this embodiment, the component (A) may be used alone or in combination of two or more. Component (A1) is a resin component whose solubility in a developer solution changes due to the action of an acid. Component (A1) comprises a structural unit (a0) derived from a compound represented by the following general formula (a0-1). Component (A1) may optionally comprise other structural units in addition to structural unit (a0). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Rpg is an acid-dissociable group represented by the following general formula (a0-pg)]. [wherein, A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. Ra 01is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different. * denotes a bonding point]. In the aforementioned formula (a0-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. As R, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms is preferred. From the perspective of industrial availability, a hydrogen atom, a methyl group, or a trifluoromethyl group is more preferred, a hydrogen atom or a methyl group is further preferred, and a methyl group is particularly preferred. In the aforementioned formula (a0-1), Rpg is an acid-dissociable group represented by the aforementioned formula (a0-pg). That is, the structural unit (a0) includes an acid-dissociable group whose polarity is increased by the action of an acid. Specifically, the acid-dissociable group Rpg is bonded to the carbonyloxy group in the formula (a0-1) to form an acid-dissociable group. Therefore, the carbon atom (C) forming the ring skeleton of the cyclic olefin A that is bonded to the carbonyloxy group in the formula (a0-1) A ) is a secondary carbon atom, the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is at the carbon atom (C A ) adjacent to the carbon atom (C A ) of the carbon atom (C α ), and carbon atoms (C α ) adjacent to the carbon atom (C A ) of the carbon atom (C β ) is formed between carbon atoms (C A ) is a tertiary carbon atom, the position of the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is not particularly limited. From the perspective of improving acid dissociation, the carbon atom (C A ) is a tertiary carbon atom, the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is formed at the carbon atom (C α ) and carbon atom (C β ) is preferably formed between. In the aforementioned formula (a0-pg), A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring backbone. The cyclic olefin in A may be a polycyclic group or a monocyclic group. The cyclic olefin as a monocyclic group is preferably a group formed by removing one hydrogen atom from a monocyclic olefin. The monocyclic olefin is preferably one having 3 to 6 carbon atoms, and specific examples include cyclopentene and cyclohexene. The cyclic olefin as a polycyclic group is preferably a group formed by removing one hydrogen atom from a polycyclic olefin. The polycyclic alkane is preferably one having 7 to 12 carbon atoms, and specific examples include adamantene, norbornene, isobornene, tricyclodecene, and tetracyclododecene. Among them, the cyclic olefin in A is preferably a monocyclic cyclic olefin, more preferably a group formed by removing one hydrogen atom from a monocyclic olefin, and even more preferably a group formed by removing one hydrogen atom from cyclopentene or cyclohexene. In the above formula (a0-pg), as Ra 01 The monovalent hydrocarbon group having 1 to 20 carbon atoms includes, for example, a chain alkyl group, a chain alkenyl group, and the like. As Ra 01 The chain alkyl group in the group may be either linear or branched. Linear alkyl groups preferably have 1 to 20 carbon atoms, more preferably 1 to 15, and most preferably 1 to 10. Specifically, examples include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl. Branched alkyl groups preferably have 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10. Specific examples include isopropyl, isobutyl, tert-butyl, isopentyl, neopentyl, 1,1-diethylpropyl, and 2,2-dimethylbutyl. As Ra 01 The chain alkenyl group in the group may be linear or branched, preferably having 2 to 20 carbon atoms, more preferably 2 to 10 carbon atoms, and even more preferably 2 to 5 carbon atoms. Examples of linear alkenyl groups include ethenyl, propenyl (allyl), and butynyl. Examples of branched alkenyl groups include 1-methylvinyl, 2-methylvinyl, 1-methylpropenyl, and 2-methylpropenyl. Among them, as Ra 01 , preferably a chain alkyl group having 1 to 20 carbon atoms, more preferably a chain alkyl group having 1 to 20 carbon atoms, further preferably a chain alkyl group having 1 to 10 carbon atoms, and further preferably a chain alkyl group having 1 to 5 carbon atoms. In the aforementioned formula (a0-pg), m1 is preferably 0 to 10, more preferably 0 to 5, even more preferably 0 to 2, and may be 0. In the aforementioned formula (a0-pg), m2 is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 or 2, and may be 1. However, in the aforementioned formula (a0-pg), m1 + m2 ≦ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). In the above formula (a0-pg), from the viewpoint of achieving high sensitivity, it is preferred that an iodine atom is bonded to at least one of the carbon atoms of the carbon-carbon unsaturated bond constituting the ring skeleton of the cyclic olefin A, and the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is bonded to the carbon atom (C A ) adjacent to the carbon atom (C A ) of the carbon atom (C α ), and carbon atoms (C α ) adjacent to the carbon atom (C A ) of the carbon atom (C β ) and, with carbon atoms (C α ) and carbon atoms (C β ) is preferably bonded with an iodine element. From the perspective of achieving high sensitivity and improving the stability of the component (A1) in the resist film, the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is preferably bonded with an iodine element at least one of the carbon atoms (C α ) and carbon atom (C β ) and between carbon atoms (C β ) is bonded with iodine. β ) is bonded with an iodine element, the stability of the carbon cation formed by the dissociation of the cyclic olefin A by the action of the acid is improved, so the deprotection rate of the structural unit (a0) is increased, and high sensitivity is easily achieved. In the above formula (a0-pg), when m1 is an integer greater than 2, the plural number Ra 01 They can be the same or different. In this embodiment, the structural unit (a0) may be a structural unit derived from a compound represented by the following general formula (a0-t1) (hereinafter also referred to as "structural unit (a0-t1)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C t For the tertiary carbon atom. Ra t1 It is a linear or branched alkyl group with 1 to 12 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different]. In the aforementioned formula (a0-t1), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-t1), A, Ra 01 , m1 and m2, respectively, with the above formula (a0-pg) in A, Ra 01 , m1 and m2 are the same. In the above formula (a0-t1), as Ra t1 Examples of the straight-chain alkyl group having 1 to 12 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl. Straight-chain alkyl groups having 1 to 5 carbon atoms are preferred, with methyl, ethyl, or butyl being more preferred, and methyl or ethyl being even more preferred. In the above formula (a0-t1), as Ra t1 Examples of the branched-chain alkyl group having 1 to 12 carbon atoms include isopropyl, isobutyl, tert-butyl, isopentyl, neopentyl, 1,1-diethylpropyl, and 2,2-dimethylbutyl. Branched-chain alkyl groups having 3 to 5 carbon atoms are preferred, and isopropyl is even more preferred. In this embodiment, the structural unit (a0-t1) is preferably a structural unit derived from a compound represented by the following general formula (a0-t1-1) (hereinafter also referred to as "structural unit (a0-t1-1)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C t It is a tertiary carbon atom. 1 and C 2 Each is independently a carbon atom in A that constitutes a carbon-carbon unsaturated bond of a cyclic olefin. t1 It is a linear or branched alkyl group with 1 to 12 carbon atoms. t2 It is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m11 is an integer from 0 to 20. m12 is an integer from 0 to 19. However, m11 + m12 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). When m11 is an integer greater than 2, the plural Ra 01 They may be the same or different]. In the aforementioned formula (a0-t1-1), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-t1-1), A and Ra 01 , respectively with A and Ra in the above formula (a0-pg) 01 In the above formula (a0-t1-1), Ra t1 and Ra in the above formula (a0-t1) t1 same. In the above formula (a0-t1-1), Ra t2 The monovalent hydrocarbon group having 1 to 20 carbon atoms and Ra in the above formula (a0-1) 01 The carbon number of the monovalent hydrocarbon group in the group is the same as that of the group with 1 to 20 carbon atoms. t2 , preferably a hydrogen atom. In the aforementioned formula (a0-t1-1), m11 is preferably 0 to 10, more preferably 0 to 5, even more preferably 0 to 2, and may be 0. In the aforementioned formula (a0-t1-1), m12 is preferably 0 to 10, even more preferably 0 to 5, even more preferably 0 or 1, and may be 0. However, in the aforementioned formula (a0-t1-1), m11 + m12 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). In this embodiment, the structural unit (a0) may be a structural unit derived from a compound represented by the following general formula (a0-s1) (hereinafter also referred to as "structural unit (a0-s1)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C s It is a secondary carbon atom. 1 and C 2 Each is independently a carbon atom in A that constitutes a carbon-carbon unsaturated bond of a cyclic olefin. s1 and Ra s2 Each is independently a hydrogen atom, an iodine atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m21 is an integer from 0 to 20. m22 is an integer from 0 to 20. However, m21 + m22 ≦ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). In addition, when m22 is 0, Ra s1 and Ra s2 At least one of them is an iodine atom. When m21 is an integer greater than 2, the plural Ra 01 They may be the same or different]. In the aforementioned formula (a0-s1), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-s1), A and Ra 01 , respectively with A and Ra in the above formula (a0-pg) 01 same. In the above formula (a0-s1), Ra s1 and Ra s2 The monovalent hydrocarbon group having 1 to 20 carbon atoms and Ra in the above formula (a0-1) 01 The carbon number of the monovalent hydrocarbon group is the same as that of the monovalent hydrocarbon group with 1 to 20 carbon atoms. s1 and Ra s2 One of them is an iodine atom, and the other is preferably a hydrogen atom or a monovalent hydrocarbon group with 1 to 20 carbon atoms, with Ra s1 is a hydrogen atom or a monovalent hydrocarbon group with 1 to 20 carbon atoms, Ra s2 It is preferably an iodine atom, with Ra s2 is a monovalent hydrocarbon group with 1 to 20 carbon atoms, Ra s2 It is preferably an iodine atom. In the aforementioned formula (a0-s1), m21 is preferably 0 to 10, more preferably 0 to 5, even more preferably 0 to 2, and may be 0. In the aforementioned formula (a0-s1), m22 is preferably 0 to 10, even more preferably 0 to 5, even more preferably 0 or 1, and may be 0. However, in the aforementioned formula (a0-s1), m21 + m22 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). In this embodiment, the structural unit (a0-s1) may be a structural unit derived from a compound represented by the following general formula (a0-s1-1) (hereinafter also referred to as "structural unit (a0-s1-1)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C s It is a secondary carbon atom. 1 and C 2 Each is independently a carbon atom in A that constitutes a carbon-carbon unsaturated bond of a cyclic olefin. s11 It is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m21 is an integer from 0 to 20. m22 is an integer from 0 to 19. However, m21 + m22 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). When m21 is an integer greater than 2, the plural number Ra 01 They may be the same or different]. In the aforementioned formula (a0-s1-1), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-s1-1), A and Ra 01 , respectively with A and Ra in the above formula (a0-pg) 01 In the aforementioned formula (a0-s1-1), m21 and m22 are respectively the same as m21 and m22 in the aforementioned formula (a0-s1). In the above formula (a0-s1-1), Ra s11 The monovalent hydrocarbon group having 1 to 20 carbon atoms and Ra in the above formula (a0-1) 01 The carbon number of the monovalent hydrocarbon group in the group is the same as that of the group with 1 to 20 carbon atoms. s11 Preferably, the alkyl group is a chain alkyl group having 1 to 10 carbon atoms, more preferably a straight-chain alkyl group having 1 to 5 carbon atoms or a branched-chain alkyl group having 3 to 5 carbon atoms, and still more preferably a straight-chain alkyl group having 1 to 3 carbon atoms. In this embodiment, the structural unit (a0-s1) may be a structural unit derived from a compound represented by the following general formula (a0-s1-2) (hereinafter also referred to as "structural unit (a0-s1-2)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C s It is a secondary carbon atom. 1 and C 2 Each is independently a carbon atom in A that constitutes a carbon-carbon unsaturated bond of a cyclic olefin. s21 It is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m21 is an integer from 0 to 20. m22 is an integer from 0 to 19. However, m21 + m22 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). When m21 is an integer greater than 2, the plural number Ra 01 They may be the same or different]. In the aforementioned formula (a0-s1-2), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-s1-2), A and Ra 01 , respectively with A and Ra in the above formula (a0-pg) 01 In the aforementioned formula (a0-s1-2), m21 and m22 are respectively the same as m21 and m22 in the aforementioned formula (a0-s1). In the above formula (a0-s1-2), Ra s21The monovalent hydrocarbon group having 1 to 20 carbon atoms and Ra in the above formula (a0-1) 01 The carbon number of the monovalent hydrocarbon group in the group is the same as that of the group with 1 to 20 carbon atoms. s21 , preferably a hydrogen atom. In this embodiment, the structural unit (a0-s1) may be a structural unit derived from a compound represented by the following general formula (a0-s1-3) (hereinafter also referred to as "structural unit (a0-s1-3)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. C s It is a secondary carbon atom. 1 and C 2 Each is independently a carbon atom in A that constitutes a carbon-carbon unsaturated bond of a cyclic olefin. s31 and Ra s32 Each is independently a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m31 is an integer from 0 to 20. m32 is an integer from 1 to 20. However, m31 + m32 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). When m31 is an integer greater than 2, the plural number Ra 01 They may be the same or different]. In the aforementioned formula (a0-s1-3), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formula (a0-s1-3), A and Ra 01 , respectively with A and Ra in the above formula (a0-pg) 01 same. In the aforementioned formula (a0-s1-3), m31 is preferably 0 to 10, more preferably 0 to 5, even more preferably 0 to 2, and may be 0. In the aforementioned formula (a0-s1-3), m32 is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 or 2, and may be 1. However, in the aforementioned formula (a0-s1-3), m31 + m32 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 3). Specific examples of the structural unit (a0) are shown below. α represents a hydrogen atom, a methyl group or a trifluoromethyl group. The structural unit (a0) contained in component (A1) may be one or more. The proportion of the structural unit (a0) in component (A1) relative to the total of all structural units constituting component (A1) (100 mol%) is preferably 40-80 mol%, more preferably 45-75 mol%, even more preferably 50-70 mol%, and particularly preferably 55-65 mol%. If the content of the structural unit (a0) is at least the lower limit of the preferred range, it is easier to increase sensitivity and suppress film reduction. On the other hand, by setting it below the upper limit, it is easier to achieve a balance with other structural units. Component (A1) may optionally contain other structural units in addition to the aforementioned structural unit (a0). Examples of such other structural units include a structural unit (a1) containing an acid-decomposable group whose polarity is increased by the action of an acid (excluding those corresponding to structural unit (a0)); a structural unit (a10) represented by the general formula (a10-1) described below; a structural unit (a2) containing a lactone-containing cyclic group; and a structural unit (a8) derived from a compound represented by the general formula (a8-1) described below. Regarding structural unit (a1): Structural unit (a1) is a structural unit containing an acid-decomposable group whose polarity increases with the action of an acid. However, structural units corresponding to structural unit (a0) are removed from structural unit (a1). Examples of acid-dissociable groups include those that have been proposed as base resins for chemically amplified resist compositions. Specifically, examples of acid-dissociable groups proposed as base resins for chemically amplified resist compositions include the "acetal-type acid-dissociable group," "tertiary alkyl ester-type acid-dissociable group," and "tertiary alkyloxycarbonyl acid-dissociable group" described below. Acetal-type acid-dissociable group: Examples of the acid-dissociable group for protecting the carboxyl group or hydroxyl group among the aforementioned polar groups include acid-dissociable groups represented by the following general formula (a1-r-1) (hereinafter sometimes referred to as "acetal-type acid-dissociable group"). [where Ra' 1 、Ra' 2 is a hydrogen atom or an alkyl group. 3 is a hydrocarbon group, Ra' 3 Also available with Ra' 1 、Ra' 2 Any one of them is bonded to form a ring]. In formula (a1-r-1), Ra' 1 and Ra' 2 Among them, at least one is preferably a hydrogen atom, and both are more preferably hydrogen atoms. 1 or Ra' 2 When the alkyl group is an alkyl group, examples thereof include the same alkyl groups as those listed as substituents that may be bonded to the carbon atom at the α-position in the description of the α-substituted acrylates. Alkyl groups having 1 to 5 carbon atoms are preferred. Specifically, linear or branched alkyl groups are preferred. More specifically, methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups are preferred. Methyl or ethyl groups are more preferred, and methyl groups are particularly preferred. In formula (a1-r-1), as Ra' 3 Examples of the hydrocarbon group include linear or branched alkyl groups, or cyclic hydrocarbon groups. The linear alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. Specifically, examples include methyl, ethyl, n-propyl, n-butyl, and n-pentyl groups. Among these, methyl, ethyl, or n-butyl groups are preferred, with methyl or ethyl groups being even more preferred. The branched alkyl group preferably has 3 to 10 carbon atoms, more preferably 3 to 5 carbon atoms. Specifically, examples include isopropyl, isobutyl, tert-butyl, isopentyl, neopentyl, 1,1-diethylpropyl, and 2,2-dimethylbutyl, with isopropyl being preferred. Ra' 3 In the case of a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be a polycyclic or monocyclic group. Aliphatic hydrocarbon groups that are monocyclic groups are preferably groups formed by removing one hydrogen atom from a monocyclic alkane. Monocyclic alkanes preferably have 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. Aliphatic hydrocarbon groups that are polycyclic groups are preferably groups formed by removing one hydrogen atom from a polycyclic alkane, and specific examples include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. Ra' 3In the case where a cyclic hydrocarbon group becomes an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be a monocyclic or polycyclic ring. The number of carbon atoms in the aromatic ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Specific examples of aromatic rings include aromatic hydrocarbon rings of benzene, naphthalene, anthracene, phenanthrene, etc.; aromatic heterocycles in which a portion of the carbon atoms constituting the aforementioned aromatic hydrocarbon rings are substituted by heteroatoms, etc. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, nitrogen atoms, etc. Examples of aromatic heterocycles include pyridine rings, thiophene rings, etc. As Ra' 3 Specific examples of the aromatic hydrocarbon group in the formula include a group formed by removing one hydrogen atom from the aforementioned aromatic hydrocarbon ring or aromatic heterocycle (aryl or heteroaryl); a group formed by removing one hydrogen atom from an aromatic compound containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and a group formed by replacing one hydrogen atom of the aforementioned aromatic hydrocarbon ring or aromatic heterocycle with an alkylene group (e.g., arylalkyl groups such as benzyl, phenethyl, 1-naphthylmethyl, 2-naphthylmethyl, 1-naphthylethyl, and 2-naphthylethyl). The alkylene group bonded to the aforementioned aromatic hydrocarbon ring or aromatic heterocycle preferably has 1 to 4 carbon atoms, more preferably 1 to 2 carbon atoms, and particularly preferably 1 carbon atom. Ra' 3 The cyclic hydrocarbon group in the cyclic hydrocarbon group may also have a substituent. Examples of such substituents include -R P1 、-R P2 -OR P1 、-R P2 -CO-R P1 、-R P2 -CO-OR P1 、-R P2 -O-CO-R P1 、-R P2 -OH, -R P2 -CN or -R P2 -COOH ((hereinafter these substituents are also collectively referred to as "Ra x5”) etc. Here, R P1 is a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. P2 is a single bond, a divalent chain saturated hydrocarbon group with 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group with 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group with 6 to 30 carbon atoms. P1 and R P2 Some or all of the hydrogen atoms in chain saturated hydrocarbon groups, aliphatic cyclic saturated hydrocarbon groups, and aromatic hydrocarbon groups may be substituted with fluorine atoms. The above-mentioned aliphatic cyclic hydrocarbon groups may have one or more of the above-mentioned substituents, or may have one or more of each of a plurality of the above-mentioned substituents. Examples of monovalent chain saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl. Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl; and polycyclic aliphatic saturated hydrocarbon groups such as bicyclo[2.2.2]octyl, tricyclo[5.2.1.02,6]decyl, tricyclo[3.3.1.13,7]decyl, tetracyclo[6.2.1.13,6.02,7]dodecyl, and adamantyl. Examples of monovalent aromatic hydrocarbon groups having 6 to 30 carbon atoms include groups formed by removing one hydrogen atom from an aromatic hydrocarbon ring such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene. Ra' 3 With Ra' 1 、Ra' 2 When any of them are bonded to form a ring, the cyclic group is preferably a 4- to 7-membered ring, more preferably a 4- to 6-membered ring. Specific examples of the cyclic group include tetrahydropyranyl and tetrahydrofuranyl. Tertiary alkyl ester type acid-dissociable groups: Among the aforementioned polar groups, acid-dissociable groups for protecting carboxyl groups include those represented by the following general formula (a1-r-2). Furthermore, among the acid-dissociable groups represented by the following formula (a1-r-2), those composed of alkyl groups are sometimes referred to as "tertiary alkyl ester type acid-dissociable groups" for convenience. [where Ra' 4 ~Ra' 6 are hydrocarbon groups, Ra' 5 、Ra' 6 They may also be bonded to form a ring]. As Ra' 4 Examples of the hydrocarbon group include linear or branched alkyl groups, chain or cyclic alkenyl groups, chain alkynyl groups, or cyclic hydrocarbon groups. 4 The linear or branched alkyl group, cyclic hydrocarbon group (monocyclic aliphatic hydrocarbon group, polycyclic aliphatic hydrocarbon group, aromatic hydrocarbon group) in the formula (R) may be exemplified by the aforementioned Ra' 3 The same. Ra' 4 The chain or cyclic alkenyl group in the present invention is preferably an alkenyl group having 2 to 10 carbon atoms. 5 、Ra' 6 The hydrocarbon group can be exemplified by the aforementioned Ra' 3 The same ones. Ra' 5 With Ra' 6 In the case of mutually bonding to form a ring, the following general formula (a1-r2-1), the following general formula (a1-r2-2), and the following general formula (a1-r2-3) are more suitable examples. On the other hand, Ra' 4 ~Ra' 6 In the case where the groups are not bonded to each other and are independently hydrocarbon groups, the groups represented by the following general formula (a1-r2-4) are more suitable examples. [In formula (a1-r2-1), Ra' 10 Ra' represents a linear or branched alkyl group with 1 to 12 carbon atoms, which may be partially substituted with a halogen atom or a heteroatom-containing group. 11 Indicates that Ra' 10 The carbon atoms to which they are bonded together form an aliphatic cyclic group. In formula (a1-r2-2), Ya is a carbon atom. Xa is a group that together with Ya forms a cyclic hydrocarbon group. Some or all of the hydrogen atoms in this cyclic hydrocarbon group may be substituted. 101~Ra 103 Each independently represents a hydrogen atom, a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all of the hydrogen atoms in the chain saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group may be substituted. 101 ~Ra 103 Two or more of them are bonded to each other to form a cyclic structure. In formula (a1-r2-3), Yaa is a carbon atom. Xaa is a group that forms an aliphatic cyclic group together with Yaa. Ra 104 is an aromatic hydrocarbon group which may have a substituent. 12 and Ra' 13 Each independently represents a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms in the chain saturated hydrocarbon group may be substituted. 14 is a hydrocarbon group which may have a substituent. * represents a bonding site (hereinafter, the same)]. In the above formula (a1-r2-1), Ra' 10 It is a linear or branched alkyl group having 1 to 12 carbon atoms, a portion of which may be substituted with a halogen atom or a group containing a heteroatom. As Ra' 10 The linear alkyl group in the group has 1 to 12 carbon atoms, preferably 1 to 10 carbon atoms, and particularly preferably 1 to 5 carbon atoms. 10 The branched alkyl group in the above Ra' 3 The same ones. Ra' 10 The alkyl group in the above may also be partially substituted by a halogen atom or a group containing a heteroatom. For example, a part of the hydrogen atoms constituting the alkyl group may be substituted by a halogen atom or a group containing a heteroatom. In addition, a part of the carbon atoms (methylene, etc.) constituting the alkyl group may be substituted by a group containing a heteroatom. Examples of the heteroatom mentioned here include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of the group containing a heteroatom include (-O-), -C(=O)-O-, -OC(=O)-, -C(=O)-, -OC(=O)-O-, -C(=O)-NH-, -NH-, -S-, and -S(=O). 2-, -S(=O) 2-O- etc. In formula (a1-r2-1), Ra' 11 (with Ra' 10 The carbon atoms bonded together form an aliphatic cyclic group) as Ra' in formula (a1-r-1) 3 The groups listed above as monocyclic or polycyclic aliphatic hydrocarbon groups (alicyclic hydrocarbon groups) are preferred. Among them, monocyclic alicyclic hydrocarbon groups are preferred, and specifically, cyclopentyl and cyclohexyl are more preferred. In the formula (a1-r2-2), the cyclic hydrocarbon group formed by Xa and Ya can be exemplified by Ra' in the aforementioned formula (a1-r-1). 3 The cyclic monovalent hydrocarbon group (alicyclic hydrocarbon group) in the above is formed by removing one or more hydrogen atoms. The cyclic hydrocarbon group formed by Xa and Ya may also have a substituent. Examples of such substituents include the above-mentioned Ra' 3 The cyclic hydrocarbon group in the formula (a1-r2-2) may have the same substituents. 101 ~Ra 103 The monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms in the group may be exemplified by methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, etc. 101 ~Ra 103 The monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms in the group may be exemplified by monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl; and polycyclic aliphatic saturated hydrocarbon groups such as bicyclo[2.2.2]octyl, tricyclo[5.2.1.02,6]decyl, tricyclo[3.3.1.13,7]decyl, tetracyclo[6.2.1.13,6.02,7]dodecyl, and adamantyl. 101 ~Ra 103 Among them, from the viewpoint of ease of synthesis, a hydrogen atom and a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms are preferred, among which a hydrogen atom, a methyl group and an ethyl group are more preferred, and a hydrogen atom is particularly preferred. As the above Ra 101 ~Ra 103 The substituents of the chain saturated hydrocarbon group or the aliphatic cyclic saturated hydrocarbon group shown in FIG. 1 include the substituents of Ra x5 The same basis. As through Ra 101 ~Ra 103 The carbon-carbon double bond-containing group formed by two or more mutually bonded groups forming a cyclic structure may be exemplified by cyclopentenyl, cyclohexenyl, methylcyclopentenyl, methylcyclohexenyl, cyclopentylidenevinyl, cyclohexylidenevinyl, etc. Among these, cyclopentenyl, cyclohexenyl, and cyclopentylidenevinyl are preferred from the viewpoint of ease of synthesis. In formula (a1-r2-3), the aliphatic cyclic group formed by Xaa and Yaa serves as Ra' in formula (a1-r-1). 3 The groups listed above as monocyclic or polycyclic aliphatic hydrocarbon groups are preferred. In formula (a1-r2-3), as Ra 104 The aromatic hydrocarbon group in the formula (A) may be a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 5 to 30 carbon atoms. 104 , a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 6 to 15 carbon atoms is preferred, a group formed by removing one or more hydrogen atoms from benzene, naphthalene, anthracene or phenanthrene is more preferred, a group formed by removing one or more hydrogen atoms from benzene, naphthalene or anthracene is even more preferred, a group formed by removing one or more hydrogen atoms from benzene or naphthalene is particularly preferred, and a group formed by removing one or more hydrogen atoms from benzene is most preferred. As Ra in formula (a1-r2-3) 104 Examples of the substituent that may be possessed include a methyl group, an ethyl group, a propyl group, a hydroxyl group, a carboxyl group, a halogen atom, an alkoxy group (such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group), and an alkyloxycarbonyl group. In formula (a1-r2-4), Ra' 12 and Ra' 13 Each is independently a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms. 12 and Ra' 13 The monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms may be exemplified by the above-mentioned Ra 101 ~Ra 103 The carbon number of the monovalent chain saturated hydrocarbon group is the same as that of the chain saturated hydrocarbon group. Some or all of the hydrogen atoms in the chain saturated hydrocarbon group may be substituted. 12 and Ra' 13 Among them, hydrogen atoms and alkyl groups having 1 to 5 carbon atoms are preferred, alkyl groups having 1 to 5 carbon atoms are more preferred, methyl groups and ethyl groups are further preferred, and methyl groups are particularly preferred. 12 and Ra' 13 When the chain saturated hydrocarbon group shown in FIG. 1 is substituted, the substituents thereof include, for example, the same as Ra x5 The same basis. In formula (a1-r2-4), Ra' 14 is a hydrocarbon group which may have a substituent. 14 The hydrocarbon group in the group may be, for example, a linear or branched alkyl group, or a cyclic hydrocarbon group. Ra' 14 The linear alkyl group in the group preferably has 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. Specific examples include methyl, ethyl, n-propyl, n-butyl, and n-pentyl. Among these, methyl, ethyl, and n-butyl are preferred, and methyl or ethyl is even more preferred. Ra' 14 The branched alkyl group preferably has 3 to 10 carbon atoms, more preferably 3 to 5. Specifically, examples include isopropyl, isobutyl, tert-butyl, isopentyl, neopentyl, 1,1-diethylpropyl, and 2,2-dimethylbutyl, with isopropyl being preferred. Ra' 14 In the case of a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be a polycyclic or monocyclic group. Aliphatic hydrocarbon groups that are monocyclic groups are preferably groups formed by removing one hydrogen atom from a monocyclic alkane. Monocyclic alkanes preferably have 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. Aliphatic hydrocarbon groups that are polycyclic groups are preferably groups formed by removing one hydrogen atom from a polycyclic alkane, and specific examples include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. As Ra' 14The aromatic hydrocarbon group in the group may be exemplified by Ra 104 The aromatic hydrocarbon groups in are the same. 14 , preferably, a group formed by removing one or more hydrogen atoms from an aromatic hydrocarbon ring having 6 to 15 carbon atoms, more preferably, a group formed by removing one or more hydrogen atoms from benzene, naphthalene, anthracene or phenanthrene, still more preferably, a group formed by removing one or more hydrogen atoms from benzene, naphthalene or anthracene, particularly preferably, a group formed by removing one or more hydrogen atoms from naphthalene or anthracene, and most preferably, a group formed by removing one or more hydrogen atoms from naphthalene. As Ra' 14 The substituents that can be possessed include Ra 104 The substituents that may be possessed are the same. Ra' in formula (a1-r2-4) 14 When it is a naphthyl group, the position where it is bonded to the tertiary carbon atom in the aforementioned formula (a1-r2-4) can be either the 1st position or the 2nd position of the naphthyl group. 14 When it is an anthracene group, the position where it bonds to the tertiary carbon atom in the aforementioned formula (a1-r2-4) may be any of the 1-position, 2-position or 9-position of the anthracene group. Specific examples of the group represented by the above formula (a1-r2-1) are given below. Specific examples of the group represented by the above formula (a1-r2-2) are given below. Specific examples of the group represented by the above formula (a1-r2-3) are given below. Specific examples of the group represented by the above formula (a1-r2-4) are given below. Tertiary alkyloxycarbonyl acid-dissociative group: As the acid-dissociative group for protecting the hydroxyl group in the aforementioned polar group, there can be exemplified an acid-dissociative group represented by the following general formula (a1-r-3) (hereinafter sometimes referred to as "tertiary alkyloxycarbonyl acid-dissociative group" for convenience). [where Ra' 7 ~Ra' 9 alkyl groups, respectively]. In formula (a1-r-3), Ra' 7 ~Ra' 9 The alkyl groups each preferably have 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms. Furthermore, the total number of carbon atoms in the alkyl groups is preferably 3 to 7, more preferably 3 to 5 carbon atoms, and most preferably 3 to 4 carbon atoms. Secondary alkyl ester type acid-dissociable group: Among the aforementioned polar groups, examples of the acid-dissociable group for protecting the carboxyl group include acid-dissociable groups represented by the following general formula (a1-r-4). [where Ra' 10 is a hydrocarbon group. 11a and Ra' 11b Each independently represents a hydrogen atom, a halogen atom or an alkyl group. 12 is a hydrogen atom or a hydrocarbon group. 10 With Ra' 11a or Ra' 11b , can also bond with each other to form a ring. Ra' 11a or Ra' 11b With Ra' 12 , can also bond with each other to form a ring]. In the formula, as Ra' 10 and Ra' 12 The hydrocarbon group in the above Ra' can be exemplified. 3 The same. In the formula, as Ra' 11a and Ra' 11b The alkyl group in the above Ra' can be exemplified. 1 The alkyl groups in the formula are the same. 10 and Ra' 12 The hydrocarbon group in, and Ra' 11a and Ra' 11b The alkyl group in may also have a substituent. As such a substituent, for example, Ra x5 wait. Ra' 10 With Ra' 11a or Ra' 11b, may also be bonded to each other to form a ring. The ring may be polycyclic or monocyclic, alicyclic or aromatic. The alicyclic and aromatic rings may also contain heteroatoms. As Ra' 10 With Ra' 11a or Ra' 11b The ring formed by mutual bonding is preferably a monocyclic olefin, a ring formed by replacing a portion of the carbon atoms of a monocyclic olefin with a heteroatom (oxygen atom, sulfur atom, etc.), or a monocyclic diene. Cycloolefins having 3 to 6 carbon atoms are preferred, and cyclopentene or cyclohexene is preferred. Ra' 10 With Ra' 11a or Ra' 11b The ring formed by mutual bonding may also be a condensed ring. Specific examples of such condensed rings include dihydroindene and the like. Ra' 10 With Ra' 11a or Ra' 11b The ring formed by mutual bonding may also have a substituent. As such a substituent, for example, Ra x5 wait. Ra' 11a or Ra' 11b With Ra' 12 , can also be bonded to each other to form a ring, as the ring, can be exemplified by Ra' 10 With Ra' 11a or Ra' 11b The rings formed by mutual bonding are the same. Specific examples of the group represented by the above formula (a1-r-4) are given below. Examples of the structural unit (a1) include a structural unit derived from an acrylate in which the hydrogen atom bonded to the carbon atom at the α-position may be substituted with a substituent, a structural unit derived from an acrylamide, a structural unit derived from hydroxystyrene or a hydroxystyrene derivative in which at least a portion of the hydrogen atoms in the hydroxy group are protected by a substituent containing the aforementioned acid-decomposable group, and a structural unit derived from vinylbenzoic acid or a vinylbenzoic acid derivative in which at least a portion of the hydrogen atoms in the -C(=O)-OH group are protected by a substituent containing the aforementioned acid-decomposable group. Among the above structural units (a1), preferred are those derived from an acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α position may be substituted with a substituent. Preferred specific examples of the structural unit (a1) include those represented by the following general formula (a1-1) or (a1-2). [Wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Va 1 It is a divalent hydrocarbon group which may have an ether bond. a1 is an integer between 0 and 2. 1 Wa is an acid-dissociable group represented by the above general formula (a1-r-1) or (a1-r-2). 1 n a2 +1-valent hydrocarbon group, n a2 is an integer from 1 to 3, Ra 2 is an acid-dissociable group represented by the above general formula (a1-r-1) or (a1-r-3). In the aforementioned formula (a1-1), the alkyl group having 1 to 5 carbon atoms in R is preferably a linear or branched alkyl group having 1 to 5 carbon atoms. Specific examples include methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl. A halogenated alkyl group having 1 to 5 carbon atoms is a group in which some or all of the hydrogen atoms in the aforementioned alkyl group having 1 to 5 carbon atoms are replaced with halogen atoms. Fluorine atoms are particularly preferred as the halogen atom. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. From the perspective of industrial availability, a hydrogen atom or a methyl group is most preferred. In the above formula (a1-1), Va 1 The divalent hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. As Va 1 The aliphatic hydrocarbon group of the divalent hydrocarbon group in the formula (I) may be saturated or unsaturated, but saturated is generally preferred. More specifically, the aliphatic hydrocarbon group may be a straight-chain or branched aliphatic hydrocarbon group, or an aliphatic hydrocarbon group containing a ring in the structure. The aforementioned linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferred, and specifically, a methylene group [-CH 2-], ethylidene [-(CH 2) 2-], trimethylene [-(CH 2) 3-], tetramethylene [-(CH 2) 4-], pentamethylene [-(CH 2) 5-] etc. The aforementioned branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. As the branched aliphatic hydrocarbon group, a branched alkylene group is preferred, and specifically, -CH(CH 3)-、-CH(CH 2CH 3)-、 -C(CH 3) 2-、-C(CH 3) (CH 2CH 3)-、-C(CH 3) (CH 2CH 2CH 3)-、-C(CH 2CH 3) 2-alkylmethylene; -CH(CH 3) CH 2-, -CH(CH 3)CH(CH 3)-、-C(CH 3) 2CH 2-、-CH(CH 2CH 3) CH 2-, -C(CH 2CH 3) 2-CH 2-alkyl ethylidene; -CH(CH 3) CH 2CH 2-、 -CH 2CH(CH 3) CH 2-alkyltrimethylene; -CH(CH 3) CH 2CH 2CH 2-、-CH 2CH(CH 3) CH 2CH The alkyl group in the alkyl alkylene group is preferably a linear alkyl group having 1 to 5 carbon atoms. Examples of the aforementioned aliphatic hydrocarbon group containing a ring in its structure include alicyclic hydrocarbon groups (groups formed by removing two hydrogen atoms from an aliphatic hydrocarbon ring), groups formed by an alicyclic hydrocarbon group bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups formed by an alicyclic hydrocarbon group existing in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the aforementioned linear or branched aliphatic hydrocarbon group include the same as those described above for the linear or branched aliphatic hydrocarbon groups. The aforementioned alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, more preferably 3 to 12 carbon atoms. The aforementioned alicyclic hydrocarbon group may be polycyclic or monocyclic. Monocyclic alicyclic hydrocarbon groups are preferably those formed by removing two hydrogen atoms from a monocycloalkane. The monocycloalkane preferably has 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic alicyclic hydrocarbon group is preferably a group formed by removing two hydrogen atoms from a polycycloalkane. The polycycloalkane preferably has 7 to 12 carbon atoms. Specific examples include adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. As Va 1The aromatic hydrocarbon group of the divalent hydrocarbon group is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 12. However, the number of carbon atoms in this number does not include the number of carbon atoms in the substituent. Specific examples of the aromatic ring in the aromatic hydrocarbon group include aromatic hydrocarbon rings of benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene; and aromatic heterocyclic rings in which a portion of the carbon atoms constituting the aromatic hydrocarbon rings are substituted with heteroatoms. Examples of heteroatoms in the aromatic heterocyclic ring include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of the aromatic hydrocarbon group include a group formed by removing two hydrogen atoms from the aforementioned aromatic hydrocarbon ring (arylene group); a group formed by removing one hydrogen atom from the aforementioned aromatic hydrocarbon ring (aryl group) in which one hydrogen atom is substituted with an alkylene group (for example, a group formed by further removing one hydrogen atom from an aryl group in an arylalkyl group such as benzyl, phenethyl, 1-naphthylmethyl, 2-naphthylmethyl, 1-naphthylethyl, or 2-naphthylethyl). The number of carbon atoms in the aforementioned alkylene group (the alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. In the above formula (a1-1), Ra 1 It is an acid-dissociable group represented by the above formula (a1-r-1) or (a1-r-2). In the above formula (a1-2), Wa 1 of n a2 The hydrocarbon group with a valence of +1 may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group means a hydrocarbon group that is not aromatic and may be saturated or unsaturated, with saturation being generally preferred. Examples of the aforementioned aliphatic hydrocarbon group include a straight-chain or branched aliphatic hydrocarbon group, an aliphatic hydrocarbon group containing a ring in its structure, or a group formed by combining a straight-chain or branched aliphatic hydrocarbon group and an aliphatic hydrocarbon group containing a ring in its structure. a2 +1 valence, 2~4 valences are better, 2 or 3 valences are even better. In the above formula (a1-2), Ra 2 It is an acid-dissociable group represented by the above general formula (a1-r-1) or (a1-r-3). Specific examples of the structural unit (a1) are shown below. α represents a hydrogen atom, a methyl group or a trifluoromethyl group. The structural unit (a1) contained in the component (A1) may be one or two or more. As the structural unit (a1), the structural unit represented by the aforementioned formula (a1-1) is more preferred because it can more easily improve the characteristics (CDU, etc.) in lithography using electron beams or EUV. [Where, Ra 1 " is an acid-dissociable group represented by the general formula (a1-r2-1), (a1-r2-3) or (a1-r2-4). * indicates a bonding site]. In the above formula (a1-1-1), R, Va 1 and n a1 and R, Va in the above formula (a1-1) 1 and n a1 The acid-dissociable groups represented by general formula (a1-r2-1), (a1-r2-3), or (a1-r2-4) are as described above. However, from the perspective of improving reactivity for EB or EUV applications, it is preferred that the acid-dissociable groups be cyclic groups, and the acid-dissociable groups represented by general formula (a1-r2-1) are particularly preferred. When component (A1) contains structural units (a1), the proportion of structural units (a1) in component (A1) is preferably 5 to 95 mol%, more preferably 10 to 90 mol%, even more preferably 30 to 70 mol%, and particularly preferably 40 to 60 mol%, relative to the total of all structural units constituting component (A1) (100 mol%). By setting the proportion of structural units (a1) to be above the lower limit of the aforementioned preferred range, lithographic properties such as sensitivity, CDU, resolution, and roughness improvement are improved. On the other hand, if the proportion is below the upper limit of the aforementioned preferred range, a balance is achieved with other structural units, resulting in favorable lithographic properties. Regarding the structural unit (a10): The structural unit (a10) is a structural unit represented by the following general formula (a10-1) (except for those corresponding to the structural unit (a1)). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. x1 Wa is a single bond or a divalent linking group. x1 It is an aromatic hydrocarbon group which may have a substituent. ax1 is an integer greater than 1]. In the aforementioned formula (a10-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. As R, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms is preferred. From the perspective of industrial availability, a hydrogen atom, a methyl group, or a trifluoromethyl group is more preferred, a hydrogen atom or a methyl group is further preferred, and a hydrogen atom is particularly preferred. In the above formula (a10-1), Ya x1 is a single bond or a divalent linking group. x1 The divalent linking group in is not particularly limited, but suitable examples include a divalent hydrocarbon group which may have a substituent and a divalent linking group containing a heteroatom. As Ya x1 , a single bond, an ester bond [-C(=O)-O-, -OC(=O)-], an ether bond (-O-), a linear or branched alkylene group, or a combination thereof is preferred, and a single bond, an ester bond [-C(=O)-O-, -OC(=O)-] is more preferred. In the above formula (a10-1), Wa x1 is an aromatic hydrocarbon group which may have a substituent. x1 The aromatic hydrocarbon group in the above-mentioned group may be exemplified by removing the aromatic ring which may have a substituent (n ax1 +1) hydrogen atoms. The aromatic ring here is not particularly limited as long as it is a cyclic conjugated system with 4n+2 π electrons. The number of carbon atoms in the aromatic ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which a portion of the carbon atoms constituting the aforementioned aromatic hydrocarbon rings are substituted by heteroatoms. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, and the like. Specific examples of the aromatic heterocycle include pyridine rings, thiophene rings, and the like. In addition, Wa x1 The aromatic hydrocarbon group in the formula (n) can also be removed from an aromatic compound containing an aromatic ring which may have two or more substituents (e.g., biphenyl, fluorene, etc.). ax1 +1) hydrogen atoms. x1 , to remove from benzene, naphthalene, anthracene or biphenyl (n ax1+1) hydrogen atoms, preferably, the radical is formed by removing (n ax1 +1) hydrogen atoms, preferably, the radical is formed by removing (n ax1 +1) hydrogen atoms is preferred. Wa x1 The aromatic hydrocarbon group in the above may or may not have a substituent. As the above substituent, for example, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, etc. can be exemplified. As the above substituent, the alkyl group, the alkoxy group, the halogen atom, the halogenated alkyl group can be exemplified by the same as Ya x1 The substituents of the cyclic alicyclic hydrocarbon group in are the same as those listed above. The aforementioned substituents are preferably linear or branched alkyl groups having 1 to 5 carbon atoms, more preferably linear or branched alkyl groups having 1 to 3 carbon atoms, further preferably ethyl or methyl, and particularly preferably methyl. x1 The aromatic hydrocarbon group in the group preferably has no substituent. In the above formula (a10-1), n ax1 It is an integer of 1 or greater, preferably an integer of 1 to 10, more preferably an integer of 1 to 5, further preferably 1, 2 or 3, and particularly preferably 1 or 2. Specific examples of the structural unit (a10) represented by the above formula (a10-1) are shown below. α represents a hydrogen atom, a methyl group or a trifluoromethyl group. The structural unit (a10) contained in component (A1) may be one or more. When component (A1) contains structural unit (a10), the ratio of structural unit (a10) in component (A1) is preferably 20-60 mol%, more preferably 25-55 mol%, even more preferably 30-50 mol%, and particularly preferably 35-45 mol%, relative to the total of all structural units constituting component (A1) (100 mol%). By setting the ratio of structural unit (a10) to above the lower limit, it is easier to improve sensitivity. On the other hand, by setting it below the upper limit, it is easier to achieve a balance with other structural units. Regarding structural unit (a2): Component (A1) may further include structural unit (a2) containing a lactone-containing cyclic group (excluding components that conform to structural unit (a1)). The lactone-containing cyclic group in structural unit (a2) is effective in improving the adhesion of the resist film to the substrate when component (A1) is used in the formation of a resist film. Furthermore, the inclusion of structural unit (a2) improves lithographic properties by, for example, appropriately adjusting the acid diffusion length, improving the adhesion of the resist film to the substrate, and appropriately adjusting the solubility during development. The term "lactone-containing cyclic group" refers to a cyclic group containing a ring (lactone ring) containing -OC(=O)- in its ring skeleton. Counting the lactone ring as the first ring, a group consisting solely of the lactone ring is called a monocyclic group, while a group containing other ring structures is called a polycyclic group regardless of their structure. The lactone-containing cyclic group may be a monocyclic group or a polycyclic group. Any lactone-containing cyclic group in the structural unit (a2) may be used without particular limitation. Specifically, the groups represented by the following general formulas (a2-r-1) to (a2-r-7) are exemplified. [where Ra' 21 Each is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR", -OC(=O)R", a hydroxyalkyl group, or a cyano group; R" is a hydrogen atom, an alkyl group, or a cyclic group containing a lactone; A" is an alkylene group having 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom, which may contain an oxygen atom (-O-) or a sulfur atom (-S-); n' is an integer from 0 to 2, and m' is 0 or 1. * indicates a bonding site (hereinafter, the same)]. In the above general formulas (a2-r-1) to (a2-r-7), as Ra' 21 The alkyl group in is preferably an alkyl group having 1 to 6 carbon atoms. The alkyl group is preferably linear or branched. Specifically, methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, neopentyl, hexyl, etc. are exemplified. Among these, methyl or ethyl are preferred, and methyl is particularly preferred. As Ra' 21 The alkoxy group in the alkoxy group is preferably an alkoxy group having 1 to 6 carbon atoms. The alkoxy group is preferably a straight chain or a branched chain. Specifically, the aforementioned Ra' 21 The alkyl group mentioned in the example is a group formed by linking an alkyl group with an oxygen atom (-O-). 21 The halogen atom in is preferably a fluorine atom. 21The halogenated alkyl group may be exemplified by the aforementioned Ra' 21 A group in which some or all of the hydrogen atoms of the alkyl group are replaced by the aforementioned halogen atoms. The halogenated alkyl group is preferably a fluorinated alkyl group, and particularly preferably a perfluoroalkyl group. Ra' 21 In -COOR" and -OC(=O)R", R" is a hydrogen atom, an alkyl group, or a cyclic group containing a lactone. The alkyl group in R" may be any of linear, branched, and cyclic, preferably having 1 to 15 carbon atoms. When R" is a linear or branched alkyl group, preferably 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and particularly preferably methyl or ethyl. When R" is a cyclic alkyl group, preferably 3 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. Examples include groups formed by removing one or more hydrogen atoms from a monocycloalkane, which may be unsubstituted or substituted with a fluorine atom or a fluorinated alkyl group; and groups formed by removing one or more hydrogen atoms from a polycycloalkane such as a bicycloalkane, a tricycloalkane, or a tetracycloalkane. More specifically, examples include groups formed by removing one or more hydrogen atoms from monocyclic alkanes such as cyclopentane and cyclohexane; and groups formed by removing one or more hydrogen atoms from polycyclic alkanes such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. Examples of the lactone-containing cyclic group in R" include the same groups as those represented by the aforementioned general formulas (a2-r-1) to (a2-r-7). As Ra' 21 The hydroxyalkyl group in the alkyl group preferably has 1 to 6 carbon atoms. Specifically, the aforementioned Ra' 21 A group in which at least one hydrogen atom of an alkyl group is replaced by a hydroxy group. As Ra' 21 Among the above, each independently a hydrogen atom or a cyano group is preferred. In the aforementioned general formulas (a2-r-2), (a2-r-3), and (a2-r-5), the alkylene group having 1 to 5 carbon atoms in A" is preferably a linear or branched alkylene group, and examples thereof include methylene, ethylene, n-propylene, and isopropylene. Specific examples of the alkylene group containing an oxygen atom or a sulfur atom include -O- or -S- groups at the end of the aforementioned alkylene group or between carbon atoms, such as -O-CH 2-、-CH 2-O-CH 2-、-S-CH 2-、 -CH 2-S-CH As A", an alkylene group having 1 to 5 carbon atoms or -O- is preferred, an alkylene group having 1 to 5 carbon atoms is more preferred, and a methylene group is most preferred. Specific examples of the groups represented by general formulae (a2-r-1) to (a2-r-7) are given below. As the structural unit (a2), a structural unit derived from an acrylic acid ester in which the hydrogen atom bonded to the carbon atom at the α position may be substituted with a substituent is preferred. The structural unit (a2) is preferably a structural unit represented by the following general formula (a2-1). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. 21 is a single bond or a divalent linking group. 21 is -O-, -COO-, -CON(R')-, -OCO-, -CONHCO- or -CONHCS-, R' represents a hydrogen atom or a methyl group. 21 When it is -O-, Ya 21 Not for -CO-. Ra 21 is a cyclic group containing lactone]. In the aforementioned formula (a2-1), R is the same as described above. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. In view of industrial availability, a hydrogen atom or a methyl group is particularly preferred. In the above formula (a2-1), as Ya 21 The divalent linking group in is not particularly limited, but preferably includes a divalent hydrocarbon group which may have a substituent, a divalent linking group containing a heteroatom, and the like. As Ya 21 , preferably a single bond, an ester bond [—C(═O)—O—], an ether bond (—O—), a linear or branched alkylene group, or a combination thereof. In the above formula (a2-1), Ya 21 is a single bond, La 21 -COO- or -OCO- is preferred. In the above formula (a2-1), Ra 21 It is a cyclic group containing lactone. 21The lactone-containing cyclic group in the present invention is preferably exemplified by the groups represented by the aforementioned general formulas (a2-r-1) to (a2-r-7). The structural unit (a2) contained in the component (A1) may be one or more. When the component (A1) contains the structural unit (a2), the ratio of the structural unit (a2) is preferably 1 to 20 mol%, more preferably 1 to 15 mol%, and even more preferably 1 to 10 mol%, relative to the total of all structural units constituting the component (A1) (100 mol%). If the ratio of the structural unit (a2) is set to a preferred lower limit or above, the effects of containing the structural unit (a2) can be fully achieved through the above-mentioned effects. If it is below the upper limit, a balance can be achieved with other structural units, resulting in various good lithography properties. Regarding structural unit (a8): Structural unit (a8) is a structural unit derived from a compound represented by the following general formula (a8-1), except for those corresponding to structural unit (a0). [W 2 It is a group containing a polymerizable group. x2 is a single bond or (n ax2 +1) valence linking group. x2 With W 2 A condensed ring can also be formed. 1 R is a fluorinated alkyl group having 1 to 12 carbon atoms. 2 R is an organic group having 1 to 12 carbon atoms which may have a fluorine atom or a hydrogen atom. 2 And Ya x2 They can also bond with each other to form a ring structure. ax2 is an integer from 1 to 3]. The so-called W 2 The "polymerizable group" in the group containing a polymerizable group refers to a group that enables the compound having the polymerizable group to be polymerized by free radical polymerization, for example, a group containing multiple bonds between carbon atoms such as ethylenic double bonds. The group containing a polymerizable group may be a group consisting of only a polymerizable group or a group consisting of a polymerizable group and other groups other than the polymerizable group. Examples of other groups other than the polymerizable group include a divalent hydrocarbon group which may have a substituent, a divalent linking group containing a heteroatom, and the like. As a group containing a polymerizable group, a more suitable example is a group having the chemical formula: C(R X11 ) (R X12 )=C(R X13 )-Ya x0 - shown in this chemical formula. X11 、R X12 and R X13 are respectively a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Ya x0 It is a single bond or a divalent linking group. As Ya x2 With W 2 The condensed ring formed can be exemplified by W 2 Polymerization group and Ya x2 The condensed ring formed, W 2 Other groups other than the polymerizing group at the site and Ya x2 The condensed ring formed. x2 With W 2 The formed condensed ring may also have a substituent. Specific examples of the structural unit (a8) are shown below. α represents a hydrogen atom, a methyl group or a trifluoromethyl group. Among the above examples, the structural unit (a8) is preferably at least one selected from the group consisting of the structural units represented by chemical formulas (a8-1-01) to (a8-1-04), (a8-1-06), (a8-1-08), (a8-1-09) and (a8-1-10), and is even more preferably at least one selected from the group consisting of the structural units represented by chemical formulas (a8-1-01) to (a8-1-04) and (a8-1-09). The structural unit (a8) contained in component (A1) may be one type or two or more types. The proportion of the structural unit (a8) in component (A1) is preferably 50 mol% or less, and more preferably 0 to 30 mol% relative to the total of all structural units constituting component (A1) (100 mol%). The (A1) component contained in the resist composition may be used alone or in combination of two or more. In the resist composition of this embodiment, the (A1) component may be exemplified by a polymer compound having a repeating structure of the structural unit (a0). Among the above, the polymer compound having a repeating structure of the structural unit (a0) and the structural unit (a10) is more preferably exemplified as the (A1) component. In the polymer compound having a repeating structure of structural units (a0) and structural units (a10), the ratio of structural units (a0) relative to the total of all structural units constituting the polymer compound (100 mol%) is preferably 40 to 80 mol%, more preferably 45 to 75 mol%, even more preferably 50 to 70 mol%, and particularly preferably 55 to 65 mol%. Furthermore, the ratio of structural units (a10) in the polymer compound is preferably 20 to 60 mol%, more preferably 25 to 55 mol%, even more preferably 30 to 50 mol%, and particularly preferably 35 to 45 mol%, relative to the total of all structural units constituting the polymer compound (100 mol%). The (A1) component can be produced by dissolving the monomers from which each structural unit is derived in a polymerization solvent, adding a free radical polymerization initiator such as azobisisobutyronitrile (AIBN), dimethyl azobisisobutyrate (such as V-601, etc.) thereto and polymerizing. Alternatively, the (A1) component can be produced by dissolving the monomers from which the structural unit (a0) is derived and the monomers from which the structural unit (a0) is derived as needed (for example, structural unit (a10)) are derived in a polymerization solvent, adding the free radical polymerization initiator as described above and polymerizing, and then performing a deprotection reaction. In addition, during the polymerization, for example, HS-CH 2-CH 2-CH 2-C(CF 3) 2-OH chain transfer agent, introducing -C(CF 3) Thus, the copolymer containing a hydroxyalkyl group in which a portion of the hydrogen atoms of the alkyl group are replaced by fluorine atoms is effective in reducing development defects or LER (line edge roughness: uneven concavity and convexity of the line sidewall). The weight average molecular weight (Mw) of the component (A1) (based on polystyrene conversion obtained by gel permeation chromatography (GPC)) is not particularly limited, but is preferably 1,000 to 50,000, more preferably 2,000 to 30,000, and even more preferably 3,000 to 20,000. If the Mw of the component (A1) is below the preferred upper limit of this range, the solubility in the resist solvent is sufficient for use as a resist. If it is above the preferred lower limit of this range, the dry etching resistance or the cross-sectional shape of the resist pattern is good. The dispersion degree (Mw / Mn) of the component (A1) is not particularly limited, but is preferably 1.0 to 4.0, more preferably 1.0 to 3.0, and particularly preferably 1.0 to 2.0. In addition, Mn represents the number average molecular weight. Regarding Component (A2): The resist composition of this embodiment may also use, as component (A), a base component (hereinafter referred to as "component (A2)") that is different from component (A1) and whose solubility in the developer solution is altered by the action of an acid. Component (A2) is not particularly limited and may be selected from among a number of conventionally known base components for chemically amplified resist compositions. Component (A2) may be used alone, either as a high molecular weight compound or a low molecular weight compound, or in combination of two or more. The proportion of component (A1) in component (A) relative to the total mass of component (A) is preferably 25% by mass or greater, more preferably 50% by mass or greater, even more preferably 75% by mass or greater, and may be 100% by mass. When this proportion is 25% by mass or greater, it is easy to form a resist pattern having various excellent lithographic properties, such as high sensitivity, improved resolution, and improved roughness. In the resist composition of this embodiment, the content of the component (A) can be adjusted according to the thickness of the resist film to be formed. ≪Acid Generator Component (B)≫ The resist composition of this embodiment preferably further contains an acid generator component (B) that generates an acid by exposure. Component (B) is not particularly limited, and any acid generator proposed so far for chemically enhanced resist compositions can be used. Examples of such acid generators include onium salt acid generators such as iodonium salts or coronium salts, oxime sulfonate acid generators; diazomethane acid generators such as dialkyl or diaryl sulfonyl diazomethanes and poly (bissulfonyl) diazomethanes; nitrobenzyl sulfonate acid generators, iminosulfonate acid generators, disulfonium acid generators, and the like. As onium salt acid generators, there can be exemplified compounds represented by the following general formula (b-1) (hereinafter also referred to as "component (b-1)"), compounds represented by the following general formula (b-2) (hereinafter also referred to as "component (b-2)"), or compounds represented by the following general formula (b-3) (hereinafter also referred to as "component (b-3)"). As onium salt acid generators, there can be exemplified compounds represented by the following general formula (b-1) (hereinafter also referred to as "component (b-1)"), compounds represented by the following general formula (b-2) (hereinafter also referred to as "component (b-2)"), or compounds represented by the following general formula (b-3) (hereinafter also referred to as "component (b-3)"). [Where R 101 and R 104 ~R 108 Each independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent. 104 With R 105 They can also bond with each other to form a ring structure. 102 Y is a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. 101 It is a divalent linking group or single bond containing an oxygen atom. 101 ~V 103 Each independently represents a single bond, an alkylene group or a fluorinated alkylene group. 101 ~L 102 Each independently represents a single bond or an oxygen atom. 103 ~L 105 Each independently is a single bond, -CO- or -SO 2-. m is an integer greater than 1, M' m+ is an m-valent onium cation]. {Anion part} ・In the anion formula (b-1) of the component (b-1), R 101 It is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent. Cyclic group optionally having a substituent: The cyclic group is preferably a cyclic hydrocarbon group. The cyclic hydrocarbon group may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group refers to a hydrocarbon group that is not aromatic. Furthermore, an aliphatic hydrocarbon group is preferably a saturated hydrocarbon group. R 101The aromatic hydrocarbon group in R is a hydrocarbon group having an aromatic ring. The number of carbon atoms in the aromatic hydrocarbon group is preferably 3 to 30, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, the number of carbon atoms in the aromatic hydrocarbon group does not include the number of carbon atoms in the substituent. 101 Specifically, the aromatic ring possessed by the aromatic hydrocarbon group in the present invention includes benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or an aromatic heterocycle in which a portion of the carbon atoms constituting these aromatic rings are substituted with heteroatoms. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, and the like. 101 Specific examples of the aromatic hydrocarbon group in the group include groups formed by removing one hydrogen atom from the aforementioned aromatic ring (aryl groups: for example, phenyl, naphthyl, etc.), and groups formed by replacing one hydrogen atom of the aforementioned aromatic ring with an alkylene group (for example, benzyl, phenethyl, 1-naphthylmethyl, etc.). The number of carbon atoms in the aforementioned alkylene group (the alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. R 101 The cyclic aliphatic hydrocarbon group in the formula (a) may include an aliphatic hydrocarbon group containing a ring in its structure. Examples of such aliphatic hydrocarbon groups containing a ring in their structure include alicyclic hydrocarbon groups (groups formed by removing one hydrogen atom from an aliphatic hydrocarbon ring), groups formed by an alicyclic hydrocarbon group bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups formed by an alicyclic hydrocarbon group existing in the middle of a linear or branched aliphatic hydrocarbon group. The aforementioned alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, more preferably 3 to 12. The aforementioned alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. Monocyclic alicyclic hydrocarbon groups are preferably groups formed by removing one or more hydrogen atoms from a monocycloalkane. Such monocycloalkane preferably has 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic alicyclic hydrocarbon group is preferably a group formed by removing one or more hydrogen atoms from a polycyclic alkane, and the polycyclic alkane is preferably one having 7 to 30 carbon atoms. Among these, the polycyclic alkane is preferably a polycyclic alkane having a cross-linked ring system, such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane; and a polycyclic alkane having a condensed ring system, such as a cyclic group having a steroid skeleton. Among them, as R 101 The cyclic aliphatic hydrocarbon group in the group is preferably a group formed by removing one or more hydrogen atoms from a monocycloalkane or a polycycloalkane, more preferably a group formed by removing one hydrogen atom from a polycycloalkane, further preferably an adamantyl group or a norbornyl group, and particularly preferably an adamantyl group. The linear aliphatic hydrocarbon group that can be bonded to the alicyclic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6, even more preferably 1 to 4, and most preferably 1 to 3. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferred, and specifically, a methylene group [-CH 2-], ethylidene [-(CH 2) 2-], trimethylene [-(CH 2) 3-], tetramethylene [-(CH 2) 4-], pentamethylene [-(CH 2) 5-], etc. The branched aliphatic hydrocarbon group that can be bonded to the alicyclic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6, even more preferably 3 or 4, and most preferably 3. As the branched aliphatic hydrocarbon group, a branched alkylene group is preferred, and specifically, -CH(CH 3)-、-CH(CH 2CH 3)-、-C(CH 3) 2-, -C(CH 3)(CH 2CH 3)-、-C(CH 3)(CH 2CH 2CH 3)-、-C(CH 2CH 3) 2-alkylmethylene; -CH(CH 3) CH 2-、-CH(CH 3)CH(CH 3)-、 -C(CH 3) 2CH 2-、-CH(CH 2CH 3) CH 2-、-C(CH 2CH 3) 2-CH 2-alkyl ethylidene; -CH(CH 3) CH 2CH 2-、-CH 2CH(CH 3) CH 2-alkyltrimethylene; -CH(CH 3) CH 2CH 2CH 2-、 -CH 2CH(CH 3) CH 2CH The alkyl group in the alkyl alkylene group is preferably a linear alkyl group having 1 to 5 carbon atoms. Again, R 101 The cyclic hydrocarbon group in the formula may also contain heteroatoms such as heterocycles. Specifically, the cyclic groups containing lactone represented by the aforementioned general formulas (a2-r-1) to (a2-r-7), the cyclic groups containing -SO represented by the following general formulas (b5-r-1) to (b5-r-4), 2-cyclic group, other heterocyclic groups represented by the following chemical formulas (r-hr-1) to (r-hr-16). Where * represents Y bonded to formula (b-1) 101 The bond. [Wherein, Rb' 51 Each is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR", -OC(=O)R", a hydroxyalkyl group or a cyano group; R" is a hydrogen atom, an alkyl group, a cyclic group containing a lactone, or a cyclic group containing -SO 2-cyclic group; B" is an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom, an oxygen atom or a sulfur atom; n' is an integer from 0 to 2. * indicates a bonding site]. In the aforementioned general formulas (b5-r-1) and (b5-r-2), B" is an alkylene group having 1 to 5 carbon atoms, which may contain an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom. B" is preferably an alkylene group having 1 to 5 carbon atoms or -O-, more preferably an alkylene group having 1 to 5 carbon atoms, and even more preferably a methylene group. In the above general formulas (b5-r-1) to (b5-r-4), Rb' 51Each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR", -OC(=O)R", a hydroxyalkyl group or a cyano group, wherein each independently represents a hydrogen atom or a cyano group. Specific examples of the groups represented by general formulae (b5-r-1) to (b5-r-4) are given below: "Ac" in the formula represents an acetyl group. As R 101 As for the substituents in the cyclic group, there can be exemplified an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, a nitro group, and the like. As for the alkyl group as a substituent, an alkyl group having 1 to 5 carbon atoms is preferred. As for the alkoxy group as a substituent, an alkoxy group having 1 to 5 carbon atoms is preferred. As for the halogen atom as a substituent, a fluorine atom, a bromine atom, and an iodine atom are preferred. As for the halogenated alkyl group as a substituent, there can be exemplified an alkyl group having 1 to 5 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an n-butyl group, a tert-butyl group, etc., in which part or all of the hydrogen atoms are replaced by the aforementioned halogen atom. As for the carbonyl group as a substituent, it is a group that replaces the methylene group (-CH 2-) basis. R 101 The cyclic hydrocarbon group in the group may also be a condensed ring group comprising a condensed ring formed by condensation of an aliphatic hydrocarbon ring and an aromatic ring. As the aforementioned condensed ring, for example, one in which one or more aromatic rings are condensed on a polycyclic alkane having a cross-linked ring system. As specific examples of the aforementioned cross-linked ring system polycyclic alkanes, bicycloalkanes such as bicyclo[2.2.1]heptane (norbornane) and bicyclo[2.2.2]octane may be cited. As the aforementioned condensed ring, a group comprising a condensed ring formed by condensation of two or three aromatic rings on a bicycloalkane is preferred, and a group comprising a condensed ring formed by condensation of two or three aromatic rings on a bicyclo[2.2.2]octane is even more preferred. As R 101 Specific examples of the condensed ring group in the formula (r-br-1) to (r-br-2) are shown below. In the formula, * represents Y bonded to the formula (b-1). 101 The bond. As R 101 The substituents that the condensed cyclic group may have include, for example, alkyl, alkoxy, halogen atom, alkyl halide, hydroxyl, carbonyl, nitro, aromatic hydrocarbon group, alicyclic hydrocarbon group, etc. As the substituents of the condensed cyclic group, alkyl, alkoxy, halogen atom, alkyl halide, etc., the alkyl, alkoxy, halogen atom, alkyl halide, etc., can be exemplified by the same R 101The substituents of the cyclic group in are the same as those exemplified above. Examples of the aromatic hydrocarbon group as a substituent of the aforementioned condensed cyclic group include groups formed by removing one hydrogen atom from an aromatic ring (aryl groups: for example, phenyl, naphthyl, etc.), groups formed by replacing one hydrogen atom of the aforementioned aromatic ring with an alkylene group (for example, arylalkyl groups such as benzyl, phenethyl, 1-naphthylmethyl, 2-naphthylmethyl, 1-naphthylethyl, 2-naphthylethyl, etc.), and heterocyclic groups represented by the above formulas (R-HR-1) to (R-HR-6). Examples of the alicyclic hydrocarbon group as a substituent of the aforementioned condensed cyclic group include a group formed by removing one hydrogen atom from a monocyclic alkane such as cyclopentane or cyclohexane; a group formed by removing one hydrogen atom from a polycyclic alkane such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane; a lactone-containing cyclic group represented by the aforementioned general formulas (a2-r-1) to (a2-r-7); a -SO-containing cyclic group represented by the aforementioned general formulas (b5-r-1) to (b5-r-4) 2-cyclic group; the heterocyclic group represented by the above formulas (r-hr-7) to (r-hr-16), etc. A chain alkyl group which may have a substituent: As R 101 The chain alkyl group may be straight-chain or branched. A straight-chain alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15, and most preferably 1 to 10 carbon atoms. A branched-chain alkyl group preferably has 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10 carbon atoms. Specific examples include 1-methylethyl, 1-methylpropyl, 2-methylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, and 4-methylpentyl. A chain alkenyl group which may have a substituent: as R 101 The chain alkenyl group may be straight-chain or branched, preferably having 2 to 10 carbon atoms, more preferably 2 to 5, even more preferably 2 to 4, and particularly preferably 3. Examples of straight-chain alkenyl groups include ethenyl, propenyl (allyl), and butynyl. Examples of branched alkenyl groups include 1-methylethenyl, 2-methylethenyl, 1-methylpropenyl, and 2-methylpropenyl. Among the chain alkenyl groups mentioned above, straight-chain alkenyl groups are preferred, ethenyl and propenyl are more preferred, and ethenyl is particularly preferred. As R 101 The substituents in the chain alkyl or alkenyl groups include, for example, alkoxy groups, halogen atoms, halogenated alkyl groups, hydroxyl groups, carbonyl groups, nitro groups, amino groups, the above R 101 The cyclic base, etc. In formula (b-1), Y 101 It is a single bond or a divalent linking group containing an oxygen atom. 101 In the case of a divalent linking group containing an oxygen atom, the Y 101 It may also contain atoms other than oxygen atoms. Examples of atoms other than oxygen atoms include carbon atoms, hydrogen atoms, sulfur atoms, nitrogen atoms, etc. Examples of divalent linking groups containing oxygen atoms include linking groups represented by the following general formulas (y-al-1) to (y-al-7). In addition, in the following general formulas (y-al-1) to (y-al-7), the same as R in the above formula (b-1) 101 The bond is V' in the following general formula (y-al-1) to (y-al-7) 101 . [Where, V' 101 is a single bond or an alkylene group with 1 to 5 carbon atoms, V' 102 is a divalent saturated hydrocarbon group having 1 to 30 carbon atoms]. V' 102 The divalent saturated hydrocarbon group is preferably an alkylene group having 1 to 30 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, and even more preferably an alkylene group having 1 to 5 carbon atoms. As V' 101 and V' 102 The alkylene in V' can be a straight chain alkylene or a branched chain alkylene, with a straight chain alkylene being preferred. 101 and V' 102 Specifically, the alkylene group in the alkylene group may be exemplified by methylene [-CH 2-];-CH(CH 3)-、-CH(CH 2CH 3)-、-C(CH 3) 2-, -C(CH 3)(CH 2CH 3)-、-C(CH 3)(CH 2CH 2CH 3)-、 -C(CH 2CH 3) 2-alkylmethylene; ethylene [-CH 2CH 2-]; -CH(CH 3) CH 2-、-CH(CH 3)CH(CH 3)-、-C(CH 3) 2CH 2-, -CH(CH 2CH 3) CH 2-alkyl ethylidene; trimethylene (n-propylidene) [-CH 2CH 2CH 2-];-CH(CH 3) CH 2CH 2-、-CH 2CH(CH 3) CH 2-Alkyl trimethylene; tetramethylene [-CH 2CH 2CH 2CH 2-]; -CH(CH 3) CH 2CH 2CH 2-、-CH 2CH(CH 3) CH 2CH 2-Alkyltetramethylene; Pentamethylene [-CH 2CH 2CH 2CH 2CH 2-] etc. Again, V' 101 or V' 102The methylene group in the aforementioned alkylene group may be substituted by a divalent aliphatic cyclic group having 5 to 10 carbon atoms. The aliphatic cyclic group is selected from Ra' in the aforementioned formula (a1-r-1). 3 Preferably, the divalent group is a cyclic aliphatic hydrocarbon group (monocyclic aliphatic hydrocarbon group, polycyclic aliphatic hydrocarbon group) obtained by further removing one hydrogen atom, and more preferably, a cyclohexylene group, a 1,5-adamantylene group or a 2,6-adamantylene group. In formula (b-1), V 101 is a single bond, an alkylene group or a fluorinated alkylene group. 101 The alkylene and fluorinated alkylene preferably have 1 to 4 carbon atoms. 101 A single bond or a linear fluorinated alkylene group having 1 to 4 carbon atoms is preferred. In formula (b-1), R 102 R is a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. 102 A fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms is preferred, and a fluorine atom is more preferred. As a specific example of the anion part represented by the above formula (b-1), for example, Y 101 When Y is a single bond, examples thereof include fluorinated alkylsulfonate anions such as trifluoromethanesulfonate anion and perfluorobutanesulfonate anion; 101 In the case of a divalent linking group containing an oxygen atom, an anion represented by any one of the following formulae (an-1) to (an-3) can be given. [Where, R” 101 R" is an aliphatic cyclic group which may have a substituent, a monovalent heterocyclic group represented by the above chemical formulas (R-HR-1) to (R-HR-6), a condensed cyclic group represented by the above formula (R-Br-1) or (R-Br-2), a chain alkyl group which may have a substituent, or an aromatic cyclic group which may have a substituent. 102 An aliphatic cyclic group which may have a substituent, a condensed cyclic group represented by the aforementioned formula (r-br-1) or (r-br-2), a lactone-containing cyclic group represented by the aforementioned general formulas (a2-r-1), (a2-r-3) to (a2-r-7), or a -SO-containing cyclic group represented by the aforementioned general formulas (b5-r-1) to (b5-r-4). 2-cyclic group. R" 103 V" is an aromatic cyclic group which may have a substituent, an aliphatic cyclic group which may have a substituent, or a chain alkenyl group which may have a substituent. 101 is a single bond, an alkylene group having 1 to 4 carbon atoms, or a fluorinated alkylene group having 1 to 4 carbon atoms. 102 is a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. v" is independently an integer of 0 to 3, q" is independently an integer of 0 to 20, and n" is 0 or 1]. R” 101 , R” 102 and R” 103 The aliphatic cyclic group which may have a substituent is used as R in the above formula (b-1) 101 The cyclic aliphatic hydrocarbon group in the formula (b-1) is preferably exemplified by the group shown above. As the substituent, the substituents may be substituted for R 101 The substituents of the cyclic aliphatic hydrocarbon groups in the formula (I) are the same. R” 101 and R” 103 The aromatic cyclic group which may have a substituent is used as R in the above formula (b-1) 101 The aromatic hydrocarbon groups in the cyclic hydrocarbon groups are preferably the groups exemplified above. As the substituents mentioned above, the substituents that can replace R in the formula (b-1) are exemplified below. 101 The substituents of the aromatic hydrocarbon groups are the same. R” 101 The chain alkyl group which may have a substituent. As R in the above formula (b-1) 101 The chain alkyl groups exemplified in the following are preferred. 103 The chain alkenyl group which may have a substituent is used as R in the above formula (b-1) 101 The groups exemplified for the chain alkenyl group in are preferred. ・In the anion formula (b-2) of component (b-2), R 104 、R 105Each independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include R in formula (b-1): 101 The same. However, R 104 、R 105 They may also bond with each other to form a ring. 104 、R 105 Preferably, the chain alkyl group may have a substituent, and more preferably, a linear or branched alkyl group, or a linear or branched fluorinated alkyl group. The number of carbon atoms in the chain alkyl group is preferably 1 to 10, more preferably 1 to 7, and even more preferably 1 to 3. 104 、R 105 The number of carbon atoms in the chain alkyl group is preferably as small as possible within the above range for reasons of good solubility in the resist solvent. 104 、R 105 The more hydrogen atoms in the chain alkyl group are replaced by fluorine atoms, the stronger the acid strength becomes. In addition, the transparency to high-energy light or electron beams below 250nm is improved, which is preferred. The ratio of fluorine atoms in the chain alkyl group, that is, the fluorination rate, is preferably 70-100%, more preferably 90-100%, and most preferably a perfluoroalkyl group in which all hydrogen atoms are replaced by fluorine atoms. In formula (b-2), V 102 、V 103 Each independently represents a single bond, an alkylene group, or a fluorinated alkylene group, and examples thereof include V in formula (b-1): 101 In formula (b-2), L 101 , L 102 Each is independently a single bond or an oxygen atom. ・In the anion formula (b-3) of component (b-3), R 106 ~R 108 Each independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include R in formula (b-1): 101In formula (b-3), L 103 ~L 105 Each independently is a single bond, -CO- or -SO 2-. Among the above, the anion portion of the component (B) is preferably the anion of the component (b-1). {Cation moiety} In the above formula (b-1), formula (b-2), and formula (b-3), M' m+ represents an m-valent onium cation. Among them, a sirconium cation and an iodonium cation are preferred. m is an integer greater than 1. As a preferred cationic portion ((M' m+ ) 1 / m ) Examples include organic cations represented by the following general formulas (ca-1) to (ca-3). [Where R 201 ~R 207 Each independently represents an aryl group, an alkyl group or an alkenyl group which may have a substituent. 201 ~R 203 、R 206 ~R 207 They may also bond with each other and the sulfur atom in the formula to form a ring. 208 ~R 209 Each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. 210 is an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a -SO group which may have a substituent 2-cyclic group. 201 represents -C(=O)- or -C(=O)-O-]. In the above general formulas (ca-1) to (ca-3), R 201 ~R 207 The aryl group in the formula (R) may be an unsubstituted aryl group having 6 to 20 carbon atoms, preferably a phenyl group or a naphthyl group. 201 ~R 207 The alkyl group in the group is preferably a chain or cyclic alkyl group with 1 to 30 carbon atoms. 201 ~R 207 The alkenyl group in the group preferably has 2 to 10 carbon atoms. 201 ~R 207 and R 210 Possible substituents include, for example, an alkyl group, a halogen atom, a halogenated alkyl group, a carbonyl group, a cyano group, an amino group, an aryl group, and groups represented by the following general formulas (ca-r-1) to (ca-r-7). [Wherein, R' 201 Each is independently a hydrogen atom, a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent]. Cyclic group optionally having a substituent: The cyclic group is preferably a cyclic hydrocarbon group. The cyclic hydrocarbon group may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group refers to a hydrocarbon group that is not aromatic. Furthermore, an aliphatic hydrocarbon group may be saturated or unsaturated, with saturated hydrocarbon groups being generally preferred. R' 201 The aromatic hydrocarbon group in is a hydrocarbon group having an aromatic ring. The number of carbon atoms in the aromatic hydrocarbon group is preferably 3 to 30, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, the number of carbon atoms in this group does not include the number of carbon atoms in the substituent. R' 201 Specifically, the aromatic ring possessed by the aromatic hydrocarbon group in the present invention includes benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or an aromatic heterocycle in which a portion of the carbon atoms constituting these aromatic rings are substituted with heteroatoms. Examples of heteroatoms in the aromatic heterocycle include oxygen atoms, sulfur atoms, nitrogen atoms, and the like. 201 Specific examples of the aromatic hydrocarbon group in the alkylene group include groups formed by removing one hydrogen atom from the aforementioned aromatic ring (aryl groups such as phenyl and naphthyl), and groups formed by replacing one hydrogen atom of the aforementioned aromatic ring with an alkylene group (arylalkyl groups such as benzyl, phenethyl, 1-naphthylmethyl, 2-naphthylmethyl, 1-naphthylethyl, and 2-naphthylethyl). The number of carbon atoms in the aforementioned alkylene group (the alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1. R' 201 The cyclic aliphatic hydrocarbon group in the formula (a) may include an aliphatic hydrocarbon group containing a ring in its structure. Examples of such aliphatic hydrocarbon groups containing a ring in their structure include alicyclic hydrocarbon groups (groups formed by removing one hydrogen atom from an aliphatic hydrocarbon ring), groups formed by an alicyclic hydrocarbon group bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups formed by an alicyclic hydrocarbon group existing in the middle of a linear or branched aliphatic hydrocarbon group. The aforementioned alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, more preferably 3 to 12. The aforementioned alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. Monocyclic alicyclic hydrocarbon groups are preferably groups formed by removing one or more hydrogen atoms from a monocycloalkane. Such monocycloalkane preferably has 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic alicyclic hydrocarbon group is preferably a group formed by removing one or more hydrogen atoms from a polycyclic alkane, and the polycyclic alkane is preferably one having 7 to 30 carbon atoms. Among these, the polycyclic alkane is preferably a polycyclic alkane having a cross-linked ring system, such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane; and a polycyclic alkane having a condensed ring system, such as a cyclic group having a steroid skeleton. Among them, as R' 201 The cyclic aliphatic hydrocarbon group is preferably a group formed by removing one or more hydrogen atoms from a monocycloalkane or a polycycloalkane, more preferably a group formed by removing one hydrogen atom from a polycycloalkane, particularly preferably adamantyl or norbornyl, and most preferably adamantyl. The linear or branched aliphatic hydrocarbon group that can be bonded to the alicyclic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms. As the linear aliphatic hydrocarbon group, a linear alkylene group is preferred, and specifically, a methylene group [-CH 2-], ethylidene [-(CH 2) 2-], trimethylene [-(CH 2) 3-], tetramethylene [-(CH 2) 4-], pentamethylene [-(CH 2) 5-] etc. As the branched aliphatic hydrocarbon group, a branched alkylene group is preferred, and specifically, -CH(CH 3)-、-CH(CH 2CH 3)-、 -C(CH 3) 2-、-C(CH 3) (CH 2CH 3)-、-C(CH 3)(CH 2CH 2CH 3)-、 -C(CH 2CH 3) 2-alkylmethylene; -CH(CH 3) CH 2-, -CH(CH 3)CH(CH 3)-、-C(CH 3) 2CH 2-、-CH(CH 2CH 3) CH 2-, -C(CH 2CH 3) 2-CH 2-alkyl ethylidene; -CH(CH 3) CH 2CH 2-、 -CH 2CH(CH 3) CH 2-alkyltrimethylene; -CH(CH 3) CH 2CH 2CH 2-、-CH 2CH(CH 3) CH 2CH The alkyl group in the alkyl alkylene group is preferably a linear alkyl group having 1 to 5 carbon atoms. Again, R' 201 The cyclic hydrocarbon group in the above formula may also contain heteroatoms such as heterocycles. Specifically, examples include the cyclic groups containing lactone represented by the aforementioned general formulas (a2-r-1) to (a2-r-7), the cyclic groups containing -SO represented by the aforementioned general formulas (b5-r-1) to (b5-r-4), 2-cyclic group, and other heterocyclic groups represented by the above chemical formulas (R-HR-1) to (R-HR-16). As R' 201 As for the substituents in the cyclic group, there can be exemplified an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, a carbonyl group, a nitro group, and the like. As for the alkyl group as a substituent, an alkyl group having 1 to 5 carbon atoms is preferred, and a methyl group, an ethyl group, a propyl group, an n-butyl group, and a tert-butyl group are the most preferred. As for the alkoxy group as a substituent, an alkoxy group having 1 to 5 carbon atoms is preferred, and a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group are more preferred, and a methoxy group and an ethoxy group are the most preferred. As for the halogen atom as a substituent, a fluorine atom is preferred. As for the halogenated alkyl group as a substituent, there can be exemplified an alkyl group having 1 to 5 carbon atoms, such as a group in which one of the hydrogen atoms of a methyl group, an ethyl group, a propyl group, an n-butyl group, and a tert-butyl group are partially or completely substituted by the aforementioned halogen atom. As for the carbonyl group as a substituent, a methylene group (-CH 2-) basis. A chain alkyl group which may have a substituent: as R' 201 The chain alkyl group may be straight-chain or branched. A straight-chain alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. A branched-chain alkyl group preferably has 3 to 20 carbon atoms, more preferably 3 to 15 carbon atoms, and most preferably 3 to 10 carbon atoms. Specifically, examples include 1-methylethyl, 1-methylpropyl, 2-methylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, and 4-methylpentyl. A chain alkenyl group which may have a substituent: as R' 201 The chain alkenyl group may be either linear or branched, preferably having 2 to 10 carbon atoms, more preferably 2 to 5 carbon atoms, even more preferably 2 to 4 carbon atoms, and particularly preferably 3 carbon atoms. Examples of linear alkenyl groups include ethenyl, propenyl (allyl), and butynyl. Examples of branched alkenyl groups include 1-methylethenyl, 2-methylethenyl, 1-methylpropenyl, and 2-methylpropenyl. Among the chain alkenyl groups mentioned above, linear alkenyl groups are preferred, ethenyl and propenyl are more preferred, and ethenyl is particularly preferred. As R' 201The substituents in the chain alkyl or alkenyl groups include, for example, alkoxy, halogen atoms, halogenated alkyl, hydroxyl, carbonyl, nitro, amino, the above R' 201 The cyclic base, etc. R' 201 In addition to the above-mentioned cyclic group which may have a substituent, chain alkyl group which may have a substituent, or chain alkenyl group which may have a substituent, examples of the cyclic group which may have a substituent or chain alkyl group which may have a substituent include the same acid-dissociable groups as those represented by the above formula (a1-r-2). Among them, R' 201 A cyclic group which may have a substituent is preferred, and a cyclic hydrocarbon group which may have a substituent is more preferred. More specifically, for example, a phenyl group, a naphthyl group, a group formed by removing one or more hydrogen atoms from a polycyclic alkane; a cyclic group containing lactone represented by the aforementioned general formulas (a2-r-1) to (a2-r-7); a cyclic group containing -SO represented by the aforementioned general formulas (b5-r-1) to (b5-r-4) 2-cyclic groups are preferred. In the above general formulas (ca-1) to (ca-3), R 201 ~R 203 、R 206 ~R 207 , when they form a ring together with the sulfur atom in the formula, they may be separated by heteroatoms such as sulfur atoms, oxygen atoms, nitrogen atoms, or carbonyl groups, -SO-, -SO 2-、-SO 3-, -COO-, -CONH- or -N(R N )- (The R N is an alkyl group having 1 to 5 carbon atoms) or the like. The ring formed is a ring containing one sulfur atom in its ring skeleton, preferably a 3-10 membered ring, and particularly preferably a 5-7 membered ring. Specific examples of the ring formed include a thiophene ring, a thiazole ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthrene ring, a phenanthracene ring, a thiophene ... thiol ring, tetrahydrothiophenium ring, tetrahydrothiopyranium ring, etc. R 208 ~R 209Each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. When the alkyl group is an alkyl group, they may be bonded to each other to form a ring. R 210 is an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a -SO group which may have a substituent 2-cyclic group. As R 210 The aryl group in the formula (R) may be an unsubstituted aryl group having 6 to 20 carbon atoms, preferably a phenyl group or a naphthyl group. 210 The alkyl group in the group is preferably a chain or cyclic alkyl group with 1 to 30 carbon atoms. 210 The alkenyl group in the group preferably has 2 to 10 carbon atoms. 210 The optionally substituted -SO 2-cyclic group, containing -SO 2-" is preferred, and the group represented by the above general formula (b5-r-1) is more preferred. Specific examples of the cation represented by the above formula (ca-1) are shown below. As more suitable cations represented by the aforementioned formula (ca-1), specifically, cations represented by the following chemical formulas can be exemplified. [In the formula, g1, g2, and g3 represent the number of repetitions, g1 is an integer from 1 to 5, g2 is an integer from 0 to 20, and g3 is an integer from 0 to 20]. [Where, R” 201 is a hydrogen atom or a substituent, and the substituent is the same as the aforementioned R 201 ~R 207 and R 210 ~R 212 The substituents which may be possessed are the same as those mentioned above]. Specific examples of suitable cations represented by the above formula (ca-2) include diphenyliodonium cations and bis(4-tert-butylphenyl)iodonium cations. As more suitable cations represented by the aforementioned formula (ca-3), specifically, cations represented by the following formulas (ca-3-1) to (ca-3-6) can be exemplified. In the resist composition of this embodiment, component (B) may be used alone or in combination of two or more. When the resist composition contains component (B), the content of component (B) in the resist composition is preferably less than 50 parts by mass, more preferably 5 to 40 parts by mass, and even more preferably 10 to 40 parts by mass relative to 100 parts by mass of component (A). By making the content of component (B) within the aforementioned preferred range, pattern formation can be fully performed. In addition, when the components of the resist composition are dissolved in an organic solvent, a uniform solution is easily obtained, which is preferred as the storage stability of the resist composition is good. <Other Components> The resist composition of this embodiment may further contain other components in addition to the above-mentioned components (A) and (B). Examples of other components include the following components (D), (E), (F), and (S). ≪Alkali component (D)≫ The resist composition of this embodiment may further contain, in addition to component (A), an alkaline component (component (D)) that captures the acid generated by exposure (i.e., controls the diffusion of the acid). Component (D) acts as a quencher (acid diffusion controller) that captures the acid generated by exposure in the resist composition. Component (D) includes, for example, a photodisintegration base (D1) (hereinafter referred to as "component (D1)") that decomposes and loses its acid diffusion control property due to exposure, and a nitrogen-containing organic compound (D2) (hereinafter referred to as "component (D2)") that does not conform to the (D1) component. Among these, a photodisintegration base (component (D1)) is preferred because it is easy to improve the properties of high sensitivity, reduced roughness, and suppression of coating defects. Regarding component (D1), by defining the resist composition containing component (D1), the contrast between the exposed and unexposed areas of the resist film can be further improved during resist pattern formation. Component (D1) is not particularly limited as long as it decomposes upon exposure and loses its acid diffusion control properties. Preferably, it is one or more compounds selected from the group consisting of a compound represented by the following general formula (d1-1) (hereinafter referred to as "component (d1-1)"), a compound represented by the following general formula (d1-2) (hereinafter referred to as "component (d1-2)"), and a compound represented by the following general formula (d1-3) (hereinafter referred to as "component (d1-3)"). Components (d1-1) to (d1-3) decompose and lose their acid diffusion control properties (basicity) in the exposed areas of the resist film, thus not functioning as a quencher. Instead, they function as a quencher in the unexposed areas of the resist film. [Where, Rd 1 ~Rd 4is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent. However, Rd in formula (d1-2) is defined as 2 The carbon atom adjacent to the sulfur atom in the Yd is not bonded to a fluorine atom. 1 is a single bond or a divalent linking group. m is an integer greater than 1, M m+ Each is independently an m-valent organic cation]. {Component (d1-1)} ・・In the anion part formula (d1-1), Rd 1 is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include the same as those of R' 201 Among them, as Rd 1 , preferably an aromatic hydrocarbon group which may have a substituent, an aliphatic cyclic group which may have a substituent, or a chain alkyl group which may have a substituent. As substituents which these groups may have, there can be exemplified hydroxyl groups, side oxygen groups, alkyl groups, aryl groups, fluorine atoms, fluorinated alkyl groups, lactone-containing cyclic groups represented by the above general formulas (a2-r-1) to (a2-r-7), ether bonds, ester bonds, or combinations thereof. When an ether bond or an ester bond is included as a substituent, an alkyl group may be interposed, and as a substituent in this case, a linking group represented by the above formulas (y-al-1) to (y-al-5) is preferred. In addition, Rd 1 When the aromatic hydrocarbon group, aliphatic cyclic group or chain alkyl group in the formula (y-a1) to (y-a1-7) has a linking group as a substituent, the Rd in the formula (d3-1) is bonded to 1 The carbon atoms of the aromatic hydrocarbon group, aliphatic cyclic group or chain alkyl group are V' in the above general formula (y-a1-1) to (y-a1-7). 101. As the aforementioned aromatic hydrocarbon group, phenyl, naphthyl, and a polycyclic structure containing a bicyclooctane skeleton (a polycyclic structure containing a bicyclooctane skeleton and a ring structure other than the bicyclooctane skeleton) are more suitable examples. As the aforementioned aliphatic cyclic group, a group formed by removing one or more hydrogen atoms from a polycyclic alkane such as adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc. is more preferred. As the aforementioned chain alkyl group, a group having 1 to 10 carbon atoms is preferred. Specifically, examples include straight-chain alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl; and branched-chain alkyl groups such as 1-methylethyl, 1-methylpropyl, 2-methylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, and 4-methylpentyl. When the aforementioned chain alkyl group is a fluorinated alkyl group having a fluorine atom or a fluorinated alkyl group as a substituent, the number of carbon atoms in the fluorinated alkyl group is preferably 1 to 11, more preferably 1 to 8, and even more preferably 1 to 4. The fluorinated alkyl group may also contain atoms other than fluorine atoms. Examples of atoms other than fluorine atoms include oxygen atoms, sulfur atoms, and nitrogen atoms. Preferred specific examples of the anion portion of the component (d1-1) are shown below. ・・In the cationic formula (d1-1), M m+ It is an organic cation with a valence of m. m+ Suitable organic cations include those represented by the aforementioned general formulas (ca-1) to (ca-5), with those represented by the aforementioned general formula (ca-1) being more preferred, and those represented by the aforementioned formulas (ca-1-1) to (ca-1-70) being even more preferred. Component (d1-1) may be used alone or in combination of two or more. {(d1-2) component} ・・In the anion part formula (d1-2), Rd 2 is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include the aforementioned R' 201 The same. However, it is defined as Rd 2 The carbon atom adjacent to the S atom in the Rd is not bonded to a fluorine atom (not fluorine substituted). As a result, the anion of the (d1-2) component becomes a moderate weak acid anion, and the quenching ability of the (D) component is improved. 2, preferably a chain alkyl group which may have a substituent, or an aliphatic cyclic group which may have a substituent. As a chain alkyl group, the number of carbon atoms is preferably 1 to 10, and more preferably 3 to 10. As an aliphatic cyclic group, a group formed by removing one or more hydrogen atoms from adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc. (which may have a substituent); a group formed by removing one or more hydrogen atoms from camphor, etc. is more preferred. Rd 2 The hydrocarbon group may also have a substituent, and examples of the substituent include Rd 1 The substituents that the hydrocarbon group (aromatic hydrocarbon group, aliphatic cyclic group, chain alkyl group) may have are the same. Preferred specific examples of the anion portion of the component (d1-2) are shown below. ・・In the cationic formula (d1-2), M m+ is an organic cation with a valence of m, and M in the above formula (d1-1) m+ The components (d1-2) may be used alone or in combination of two or more. {(d1-3) component} ・・In the anion part formula (d1-3), Rd 3 is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include the aforementioned R' 201 The same, preferably a fluorine-containing cyclic group, chain alkyl group, or chain alkenyl group. Among them, preferably a fluorinated alkyl group, and the same as the above Rd 1 More preferably, the fluorinated alkyl groups are the same as those of the alkyl groups of In formula (d1-3), Rd 4 is a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, and examples thereof include the aforementioned R' 201 Among them, alkyl, alkoxy, alkenyl, and cyclic groups which may have substituents are preferred. 4 The alkyl group in Rd is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, and specifically includes methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, neopentyl, etc. 4 A portion of the hydrogen atoms of the alkyl group may be substituted by a hydroxyl group, a cyano group, etc. 4 The alkoxy group in the group is preferably an alkoxy group having 1 to 5 carbon atoms. Specific examples of the alkoxy group having 1 to 5 carbon atoms include methoxy, ethoxy, n-propoxy, iso-propoxy, n-butoxy, and tert-butoxy. Among them, methoxy and ethoxy are preferred. Rd 4 The alkenyl group in the above R' 201 The alkenyl groups in the group are the same, and vinyl, propenyl (allyl), 1-methylpropenyl, and 2-methylpropenyl are preferred. These groups may further have an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms as a substituent. Rd 4 The cyclic group in the above R' can be exemplified by 201 The cyclic groups in Rd are the same, and preferably are alicyclic groups formed by removing one or more hydrogen atoms from cycloalkanes such as cyclopentane, cyclohexane, adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, or aromatic groups such as phenyl and naphthyl. 4 When it is an alicyclic group, the resist composition dissolves well in an organic solvent, thereby improving the lithography properties. 4 When the group is an aromatic group, the resist composition has excellent light absorption efficiency in lithography using EUV or the like as an exposure light source, and the sensitivity or lithography characteristics become good. In formula (d1-3), Yd 1 Is a single bond or a divalent linking group. 1 The divalent linking group in is not particularly limited, but examples thereof include divalent hydrocarbon groups (aliphatic hydrocarbon groups, aromatic hydrocarbon groups) which may have substituents, and divalent linking groups containing heteroatoms. Examples of such groups include the same as those in the above formula (a2-1) regarding Ya. 21 The divalent hydrocarbon group which may have a substituent and the divalent linking group containing a heteroatom are the same as those mentioned in the description of the divalent linking group in . 1 The alkylene group is preferably a carbonyl group, an ester bond, an amide bond, an alkylene group, or a combination thereof. As the alkylene group, a linear or branched alkylene group is more preferred, and a methylene group or an ethylene group is even more preferred. Preferred specific examples of the anion portion of the component (d1-3) are shown below. ・・In the cationic formula (d1-3), M m+ is an organic cation with a valence of m, and M in the above formula (d1-1) m+ The components (d1-3) may be used alone or in combination of two or more. As for the component (D1), only any one of the components (d1-1) to (d1-3) mentioned above may be used, or two or more components may be used in combination. When the resist composition contains the component (D1), the content of the component (D1) in the resist composition is preferably 0.5 to 20 parts by mass, more preferably 1 to 15 parts by mass, and even more preferably 2 to 8 parts by mass relative to 100 parts by mass of the component (A1). If the content of the component (D1) is above the preferred lower limit, it is particularly easy to obtain good lithography characteristics and resist pattern shapes. On the other hand, if it is below the upper limit, the sensitivity can be well maintained and the output is also excellent. Preparation of Component (D1): The preparation methods of the aforementioned components (d1-1) and (d1-2) are not particularly limited and can be prepared by known methods. Furthermore, the preparation method of component (d1-3) is not particularly limited and can be prepared, for example, in the same manner as described in US Pat. No. 2012-0149916. ・Regarding the component (D2), as the component (D), a nitrogen-containing organic compound component that does not conform to the above-mentioned component (D1) (hereinafter referred to as "component (D2)") may also be contained. As the component (D2), there is no particular limitation as long as it functions as an acid diffusion controller and does not conform to the component (D1), and any known component may be used. Among them, aliphatic amines are preferred, and secondary aliphatic amines or tertiary aliphatic amines are particularly preferred. The so-called aliphatic amine is an amine having one or more aliphatic groups, and the aliphatic group preferably has 1 to 12 carbon atoms. Examples of aliphatic amines include ammonia NH An amine (alkylamine or alkylolamine) or a cyclic amine in which at least one of the three hydrogen atoms is substituted with an alkyl group or hydroxyalkyl group having 12 or less carbon atoms. Specific examples of alkylamines and alkylolamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, and tri-n-dodecylamine; and alkylolamines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, and tri-n-octanolamine. Among these, trialkylamines having 5 to 10 carbon atoms are more preferred, and tri-n-pentylamine or tri-n-octylamine is particularly preferred. Examples of cyclic amines include heterocyclic compounds containing nitrogen atoms as heteroatoms. Such heterocyclic compounds may be monocyclic (aliphatic monocyclic amines) or polycyclic (aliphatic polycyclic amines). Examples of aliphatic monocyclic amines include piperidine, piperidine, As the aliphatic polycyclic amine, those having 6 to 10 carbon atoms are preferred, and specific examples include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo[2.2.2]octane. Examples of other aliphatic amines include tris-(2-methoxymethoxyethyl)amine, tris-{2-(2-methoxyethoxy)ethyl}amine, tris-{2-(2-methoxyethoxymethoxy)ethyl}amine, tris-{2-(1-methoxyethoxy)ethyl}amine, tris-{2-(1-ethoxyethoxy)ethyl}amine, tris-{2-(1-ethoxypropoxy)ethyl}amine, tris-[2-{2-(2-hydroxyethoxy)ethoxy}ethyl]amine, and triethanolamine triacetate. Triethanolamine triacetate is preferred. Furthermore, aromatic amines may be used as component (D2). Examples of aromatic amines include 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole, or derivatives thereof, tribenzylamine, 2,6-diisopropylaniline, N-tert-butoxycarbonylpyrrolidine, and 2,6-di-tert-butylpyridine. Component (D2) may be used alone or in combination of two or more. When the resist composition contains component (D2), the content of component (D2) is generally in the range of 0.01 to 5 parts by mass per 100 parts by mass of component (A1). By setting the content within this range, the resist pattern shape and stability over time are improved. ≪At least one compound (E) selected from the group consisting of organic carboxylic acids, phosphorus oxyacids, and their derivatives≫ The resist composition of this embodiment may contain, as an optional component, at least one compound (E) selected from the group consisting of organic carboxylic acids, phosphorus oxyacids, and their derivatives (hereinafter referred to as "component (E)") for the purpose of preventing sensitivity degradation or improving the resist pattern shape and stability over time. Specific examples of organic carboxylic acids include acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid, with salicylic acid being preferred. Examples of phosphorus oxyacids include phosphoric acid, phosphonic acid, and phosphinic acid, with phosphonic acid being particularly preferred. Derivatives of phosphorus oxyacids include esters formed by replacing the hydrogen atoms of the aforementioned oxyacids with hydrocarbon groups. Examples of the aforementioned hydrocarbon groups include alkyl groups having 1 to 5 carbon atoms and aryl groups having 6 to 15 carbon atoms. As derivatives of phosphoric acid, phosphate esters such as di-n-butyl phosphate and diphenyl phosphate can be exemplified. As derivatives of phosphonic acid, phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate can be exemplified. As derivatives of phosphinic acid, phosphinic acid esters or phenylphosphinic acid can be exemplified. In the resist composition of this embodiment, component (E) can be used alone or in combination of two or more. In the case where the resist composition contains component (E), the content of component (E) is preferably 0.01 to 5 parts by mass, and more preferably 0.05 to 3 parts by mass, relative to 100 parts by mass of component (A). By setting it within the above range, sensitivity and micro-imaging characteristics are improved. ≪Fluorine additive component (F)≫ The resist composition of this embodiment may also contain a fluorine additive component (hereinafter referred to as "(F) component") as a hydrophobic resin. The (F) component is used to impart water repellency to the resist film and can improve the lithography characteristics by being used as a resin different from the (A) component. As the (F) component, for example, the fluorine-containing polymer compounds described in Japanese Patent Application Publication No. 2010-002870, Japanese Patent Application Publication No. 2010-032994, Japanese Patent Application Publication No. 2010-277043, Japanese Patent Application Publication No. 2011-13569, and Japanese Patent Application Publication No. 2011-128226 can be used. More specifically, as the (F) component, a polymer having a structural unit (f1) represented by the following general formula (f1-1) can be exemplified. The polymer is preferably a polymer (homopolymer) composed solely of the structural unit (f1) represented by the following formula (f1-1); a copolymer of the structural unit (f1) and the aforementioned structural unit (a1); a copolymer of the structural unit (f1) and a structural unit derived from acrylic acid or methacrylic acid, and the aforementioned structural unit (a1); and more preferably a copolymer of the structural unit (f1) and the aforementioned structural unit (a1). The structural unit (a1) copolymerized with the structural unit (f1) is preferably a structural unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate or a structural unit derived from 1-methyl-1-adamantyl (meth)acrylate, and more preferably a structural unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate. [wherein, R is the same as above, Rf 102 and Rf 103 Each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf 102 and Rf 103 Can be the same or different. 1 is an integer from 0 to 5, Rf 101 is an organic group containing fluorine atoms]. In formula (f1-1), R bonded to the carbon atom at the α position is the same as described above. As R, a hydrogen atom or a methyl group is preferred. In formula (f1-1), as Rf 102 and Rf 103 The halogen atom of Rf is preferably a fluorine atom. 102 and Rf 103The alkyl group having 1 to 5 carbon atoms in Rf is the same as the alkyl group having 1 to 5 carbon atoms in Rf, and preferably methyl or ethyl. 102 and Rf 103 Specifically, the halogenated alkyl group having 1 to 5 carbon atoms can be exemplified by a group in which a portion or all of the hydrogen atoms of the alkyl group having 1 to 5 carbon atoms are replaced by halogen atoms. As the halogen atom, a fluorine atom is preferably used. 102 and Rf 103 , preferably a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 5 carbon atoms, more preferably a hydrogen atom, a fluorine atom, a methyl group, or an ethyl group, and even more preferably a hydrogen atom. 1 It is an integer of 0-5, preferably an integer of 0-3, and more preferably 1 or 2. In formula (f1-1), Rf 101 It is an organic group containing fluorine atoms, preferably a hydrocarbon group containing fluorine atoms. The hydrocarbon group containing fluorine atoms may be any of linear, branched or cyclic, preferably having 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and particularly preferably 1 to 10 carbon atoms. In addition, the hydrocarbon group containing fluorine atoms is preferably one in which more than 25% of the hydrogen atoms in the hydrocarbon group are fluorinated, more preferably more than 50% are fluorinated, and particularly preferably more than 60% are fluorinated, as it improves the hydrophobicity of the resist film during immersion exposure. Among them, as Rf 101 , preferably a fluorinated hydrocarbon group having 1 to 6 carbon atoms, trifluoromethyl, -CH 2-CF 3. -CH 2-CF 2-CF 3. -CH(CF 3) 2. -CH 2-CH 2-CF 3. -CH 2-CH 2-CF 2-CF 2-CF 2-CF 3. Special. The weight-average molecular weight (Mw) of the component (F) (based on polystyrene conversion by gel permeation chromatography) is preferably 1,000 to 50,000, more preferably 5,000 to 40,000, and most preferably 10,000 to 30,000. A weight-average molecular weight below the upper limit of this range provides sufficient solubility in resist solvents for use as a resist. A weight-average molecular weight above the lower limit of this range provides excellent hydrophobicity of the resist film. The dispersion ratio (Mw / Mn) of the component (F) is preferably 1.0 to 5.0, more preferably 1.0 to 3.0, and most preferably 1.0 to 2.5. In the resist composition of this embodiment, component (F) may be used alone or in combination of two or more. When the resist composition contains component (F), the content of component (F) is preferably 0.5 to 10 parts by mass, and more preferably 1 to 10 parts by mass, relative to 100 parts by mass of component (A). ≪Organic solvent component (S)≫ The resist composition of this embodiment can be manufactured by dissolving the resist material in an organic solvent component (hereinafter referred to as "(S) component"). As the (S) component, any component that can be made into a uniform solution of the various components to be dissolved can be used, and any one that has been previously known as a solvent for a chemically enhanced resist composition can be appropriately selected for use. In the resist composition of this embodiment, the (S) component can be used alone or as a mixed solvent of two or more. Among them, PGMEA, PGME, γ-butyrolactone, EL, and cyclohexanone are preferred. Furthermore, as the (S) component, a mixed solvent formed by mixing PGMEA and a polar solvent is also preferred. The blending ratio (mass ratio) thereof can be appropriately determined in consideration of the compatibility between PGMEA and the polar solvent. Furthermore, as the (S) component, a mixed solvent of at least one selected from PGMEA and EL and γ-butyrolactone is also preferred. In this case, as a mixing ratio, the mass ratio of the former to the latter is preferably 70:30~95:5. The amount of the (S) component used is not particularly limited, and is appropriately set according to the coating film thickness so that it can be applied to a substrate, etc. In general, the (S) component is used in such a way that the solid content concentration of the resist composition becomes 0.1~20% by mass, preferably 0.2~15% by mass. The resist composition of this embodiment may further contain miscible additives as desired, such as additive resins, dissolution inhibitors, plasticizers, stabilizers, colorants, anti-halation agents, dyes, etc. for improving the properties of the resist film. The resist composition of this embodiment can be prepared by dissolving the resist material in the (S) component and then removing impurities using a polyimide porous membrane, a polyamideimide porous membrane, or the like. For example, the resist composition can be filtered using a filter comprising a polyimide porous membrane, a filter comprising a polyamideimide porous membrane, or a filter comprising a polyimide porous membrane and a polyamideimide porous membrane. Examples of the polyimide porous membrane and the polyamideimide porous membrane include those described in Japanese Patent Application Laid-Open No. 2016-155121. The resist composition of the present embodiment described above includes a resin component (A1) having a structural unit (a0) derived from a compound represented by the general formula (a0-1). The structural unit (a0) is bonded to a cyclic olefin A as an acid-dissociable group on the carbonyloxy group in the formula (a0-1) to form an acid-dissociable group. At least one iodine atom (I) is bonded to the cyclic olefin A. The iodine atom has a large absorption of EUV with a wavelength of 13.5 nm. In addition, the cyclic olefin A has a carbon-carbon unsaturated bond in the ring skeleton. Therefore, the stability of the carbon cation formed by the dissociation of the cyclic olefin A by the action of the acid is easily improved. In particular, the carbon atom (C A ) adjacent to the carbon atom (C A ) of the carbon atom (C α ), and carbon atoms (C α ) adjacent to the carbon atom (C A ) of the carbon atom (C β ) between the formation, the stability of the above-mentioned carbon cation is likely to be improved. Combining the above-mentioned effects, it is speculated that the resist composition of this embodiment can achieve high sensitivity. (Resist Pattern Formation Method) The resist pattern formation method of the second aspect of the present invention comprises the following steps: forming a resist film on a support using the resist composition of the first aspect of the present invention, exposing the resist film to light, and developing the exposed resist film to form a resist pattern. As one embodiment of the resist pattern formation method, for example, the resist pattern formation method performed as follows can be exemplified. First, the resist composition of the above-described embodiment is applied to a support using a spin coater or other device. The resist composition is then baked (post-application bake (PAB)) at a temperature of, for example, 80-150°C for 40-120 seconds, preferably 60-90 seconds, to form a resist film. Next, the resist film is selectively exposed using an exposure device such as an electron beam lithography device or an ArF exposure device, either by exposure through a mask having a predetermined pattern (mask pattern) or by direct electron beam irradiation without passing through the mask pattern. The resist film is then baked (post-exposure bake (PEB)) at a temperature of, for example, 80-150°C for 40-120 seconds, preferably 60-90 seconds. The resist film is then developed. The development process is performed using an alkaline developer in the case of an alkali development process, or using a developer containing an organic solvent (organic developer) in the case of a solvent development process. After the development process, a cleaning process is preferably performed. For the cleaning process, pure water is preferably used for alkali development, while for solvent development, a cleaning solution containing an organic solvent is preferably used. In the case of solvent development, after the development or cleaning process, a supercritical fluid may be used to remove the developer or cleaning solution adhered to the pattern. After the development or cleaning process, drying is performed. Furthermore, a baking process (post-baking) may be performed after the development process, depending on the circumstances. The support is not particularly limited and any conventionally known substrate can be used. Examples include substrates for electronic components or substrates on which a predetermined wiring pattern is formed. More specifically, examples include silicon wafers, substrates made of metals such as copper, chromium, iron, and aluminum, or glass substrates. Materials for the wiring pattern include copper, aluminum, nickel, and gold. The wavelength used for exposure is not particularly limited, and ArF excimer laser, KrF excimer laser, F 2. It is carried out by radiation such as excimer laser, EUV (extreme ultraviolet), VUV (vacuum ultraviolet), EB (electron beam), X-ray, soft X-ray, etc. The exposure method of the resist film can be a normal exposure (dry exposure) performed in an inert gas such as air or nitrogen, or a liquid immersion exposure (Liquid Immersion Lithography). Liquid immersion exposure is an exposure method in which the space between the resist film and the lens at the lowest position of the exposure device is pre-filled with a solvent (liquid immersion medium) having a refractive index greater than that of air, and exposure is performed in this state (immersion exposure). As the liquid immersion medium, a solvent having a refractive index greater than that of air and smaller than that of the resist film to be exposed is preferred, and examples thereof include water, a fluorine-based inert liquid, a silicon-based solvent, a hydrocarbon-based solvent, etc. As the liquid immersion medium, water is preferably used. Examples of the alkaline developer used for development in the alkaline development process include, for example, a 0.1-10% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). The organic solvent contained in the organic developer used for development in the solvent development process can be any organic solvent that can dissolve component (A) (component (A) before exposure) and can be appropriately selected from known organic solvents. Specifically, examples include polar solvents such as ketone solvents, ester solvents, alcohol solvents, nitrile solvents, amide solvents, and ether solvents, as well as hydrocarbon solvents. Examples of the ester solvent include methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, isoamyl acetate, amyl acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, ethyl-3-ethoxypropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, methyl formate, ethyl formate, butyl formate, propyl formate, ethyl lactate, butyl lactate, propyl lactate, butyl butyrate, methyl 2-hydroxyisobutyrate, isoamyl acetate, isobutyl isobutyrate, and butyl propionate. Examples of the nitrile solvent include acetonitrile, propionitrile, valeronitrile, and butyronitrile. The organic developer may optionally contain known additives. Examples of such additives include surfactants. Surfactants are not particularly limited, but examples thereof include ionic or nonionic fluorine-based and / or silicon-based surfactants. The development treatment can be carried out by a known development method, for example, a method of immersing the support in a developer for a certain period of time (immersion method), a method of piling up the developer on the surface of the support by utilizing surface tension and allowing it to remain stationary for a certain period of time (puddle method), a method of spraying the developer on the surface of the support (spray method), a method of continuously releasing the developer at a certain speed while scanning the developer release nozzle on a support rotating at a certain speed (dynamic distribution method), etc. The organic solvent contained in the cleaning solution used for the post-development cleaning process in the solvent development process can be appropriately selected from the organic solvents listed above as organic developers that are difficult to dissolve the resist pattern. Typically, at least one solvent selected from hydrocarbon solvents, ketone solvents, ester solvents, alcohol solvents, amide solvents, and ether solvents is used. Any one of these organic solvents may be used alone, or two or more may be used in combination. Furthermore, the organic solvent may be mixed with organic solvents other than those listed above or with water. The cleaning treatment (cleaning treatment) using a cleaning liquid can be carried out by a known cleaning method. Examples of such cleaning methods include a method of continuously releasing the cleaning liquid onto a support rotating at a constant speed (spin coating method), a method of immersing the support in the cleaning liquid for a predetermined period of time (immersion method), and a method of spraying the cleaning liquid onto the surface of the support (spray method). According to the resist pattern forming method of the present embodiment described above, since the resist composition is used, it is estimated that high sensitivity can be achieved during resist pattern formation. The resist composition of the above-described embodiment and the various materials used in the resist patterning method of the above-described embodiment (e.g., resist solvent, developer, cleaning solution, antireflective film-forming composition, topcoat layer-forming composition, etc.) preferably do not contain impurities such as metals, halogen-containing metal salts, acids, bases, or components containing sulfur or phosphorus atoms. Examples of metal atom-containing impurities include Na, K, Ca, Fe, Cu, Mn, Mg, Al, Cr, Ni, Zn, Ag, Sn, Pb, Li, or salts thereof. The impurity content of these materials is preferably 200 ppb or less, more preferably 1 ppb or less, even more preferably 100 ppt (parts per trillion) or less, and particularly preferably 10 ppt or less. It is most preferred that the impurities are substantially free (below the detection limit of the measuring device). (Compound) The compound of this embodiment is represented by the following general formula (a0-1). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Rpg is an acid-dissociable group represented by the following general formula (a0-pg)]. [wherein, A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. Ra 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different]. The compound of this embodiment is the same as the compound from which the structural unit (a0) of the component (A1) of the resist composition of the first aspect is derived. The compound of this embodiment is preferably at least one selected from the group consisting of the compounds represented by the aforementioned general formula (a0-t1) and the compounds represented by the aforementioned general formula (a0-s1), more preferably at least one selected from the group consisting of the compounds represented by the aforementioned general formula (a0-t1-1), the compounds represented by the aforementioned general formula (a0-s1-1), the compounds represented by the aforementioned general formula (a0-s1-2), and the compounds represented by the aforementioned general formula (a0-s1-3), still more preferably at least one selected from the group consisting of the compounds represented by the aforementioned general formula (a0-t1-1), the compounds represented by the aforementioned general formula (a0-s1-1), and the compounds represented by the aforementioned general formula (a0-s1-2), and particularly preferably at least one selected from the group consisting of the compounds represented by the aforementioned general formula (a0-t1-1) and the compounds represented by the aforementioned general formula (a0-s1-1). (Method for producing compounds) Although the method for producing the compounds of this embodiment is not particularly limited, for example, a compound represented by the following general formula (m0-al) (hereinafter also referred to as "compound (m0-al)") is reacted with a compound represented by the following general formula (m0-ah) (hereinafter also referred to as "compound (m0-ah)") to obtain a compound represented by the following general formula (m0-1) (hereinafter also referred to as "compound (m0-1)"). [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. A is a cyclic olefin having only one carbon-carbon unsaturated bond in the ring skeleton. Ra 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms. m1 is an integer from 0 to 20. m2 is an integer from 1 to 20. However, m1 + m2 ≤ (the total number of carbon atoms constituting the ring skeleton of the cyclic olefin in A - 1). When m1 is an integer greater than 2, the plural Ra 01 They may be the same or different. Xh is Cl or Br]. In the aforementioned formulas (m0-ah) and (m0-1), R is the same as R in the aforementioned formula (a0-1). In the aforementioned formulas (m0-al) and (m0-1), A, Ra 01 , m1 and m2, respectively, with the above formula (a0-pg) in A, Ra 01 , m1 and m2 are the same. In the above formula (m0-ah), Xh is preferably Cl. Compound (m0-1) contains an acid-decomposable group whose polarity increases due to the action of an acid. Specifically, the carbonyloxy group in formula (m0-1) bonds to the cyclic olefin A as an acid-dissociable group (Rpg in the aforementioned formula (a0-1)), thereby forming an acid-decomposable group. Therefore, the carbon atom (C) forming the ring skeleton of the cyclic olefin A that is bonded to the carbonyloxy group in formula (m0-1) is A ) is a secondary carbon atom, the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is at the carbon atom (C A ) adjacent to the carbon atom (C A ) of the carbon atom (C α ), and carbon atoms (C α ) adjacent to the carbon atom (C A ) of the carbon atom (C β ) is formed between carbon atoms (C A ) is a tertiary carbon atom, the position of the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is not particularly limited. From the perspective of improving acid dissociation, the carbon atom (C A ) is a tertiary carbon atom, the carbon-carbon unsaturated bond contained in the ring skeleton of the cyclic olefin A is formed at the carbon atom (C α ) and carbon atom (C β ) is preferably formed between. The above-mentioned compound (m0-al) and the above-mentioned compound (m0-ah) may be commercially available ones or those synthesized by a known production method. The reaction solvent used in reacting the compound (m0-al) and the compound (m0-ah) is any solvent that can dissolve the compound (m0-al) and the compound (m0-ah) and does not react with them. Examples thereof include dichloromethane, dichloroethane, chloroform, tetrahydrofuran, N,N-dimethylformamide, acetonitrile, propionitrile, N,N'-dimethylacetamide, and dimethylsulfoxide. The reaction of the above-mentioned compound (m0-al) and the above-mentioned compound (m0-ah) can also be carried out in the presence of a base such as triethylamine, pyridine, or 4-dimethylaminopyridine. In the reaction of the compound (m0-al) and the compound (m0-ah), the amount of compound (m0-ah) added is preferably 1.00 to 1.70 equivalents relative to compound (m0-al), and more preferably 1.20 to 1.50 equivalents. The reaction time of the reaction varies depending on the types of compound (m0-al) and compound (m0-ah), but is preferably 1 to 10 hours, and more preferably 3 to 5 hours. The reaction temperature of the reaction varies depending on the reaction temperature of compound (m0-al) and compound (m0-ah), and the types of compound (m0-al) and compound (m0-ah), but is preferably -10 to 50°C, and more preferably 20 to 30°C. After the reaction is completed, the compound (m0-1) in the reaction solution can be isolated and purified. For isolation and purification, conventionally known methods can be used, for example, concentration, solvent extraction, distillation, crystallization, recrystallization, chromatography, etc. can be appropriately combined. The structure of the compound (m0-1) obtained as described above can be determined by 1 H-nuclear magnetic resonance (NMR) spectroscopy, 13 C-NMR spectroscopy, 19 The identification can be carried out by general organic analysis methods such as F-NMR spectroscopy, infrared absorption (IR) spectroscopy, mass spectrometry (MS), elemental analysis, and X-ray crystallography. The compound of this embodiment is useful for producing a polymer compound having the aforementioned structural unit (a0) (the resin component (A1) in the aforementioned first aspect). <Polymer Compound> The polymer compound of this embodiment has a structural unit (a0) derived from the compound represented by the aforementioned compound (a0-1). That is, the polymer compound of this embodiment is the same as the resin component (A1) in the aforementioned first embodiment. [Example] Hereinafter, the present invention will be further described in detail with reference to examples, but the present invention is not limited to these examples. <Compound Synthesis> [Synthesis Example 1: Synthesis of Monomer (m01)] 20.0 g of 1-methyl-3-iodo-2-cyclohexene-1-ol, 12.8 g of triethylamine, 1.0 g of 4-dimethylaminopyridine, and 200.0 g of dichloromethane were placed in a three-necked flask and stirred. 11.4 g of methacrylic acid chloride was added and stirred for 2 hours. 200.0 g of water was added, and after completion of the reaction, the organic layer was concentrated using a rotary evaporator to obtain 16.2 g of Monomer (m01). The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.24 (3H, s), 1.65 (2H, m), 1.83 (2H, m), 1.96 (2H, m), 2.01 (3H, s), 6.40 (2H, m), 6.48 (1H, s) [Synthesis Example 2: Synthesis of Monomer (m02)] Monomer (m02) was obtained in the same manner as in Synthesis Example 1 except that 1-methyl-3-iodo-2-cyclopenten-1-ol was used instead of 1-methyl-3-iodo-2-cyclohexen-1-ol. The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.24 (3H, s), 2.09 (2H, m), 2.31 (2H, m), 2.01 (3H, s), 6.40 (2H, m), 6.48 (1H, m) [Synthesis Example 3: Synthesis of Monomer (m03)] Monomer (m03) was obtained in the same manner as in Synthesis Example 1 except that 2-methyl-3-iodo-2-cyclohexen-1-ol was used instead of 1-methyl-3-iodo-2-cyclohexen-1-ol. The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.65 (2H, m), 1.79 (3H, s), 1.89 (2H, m), 1.96 (2H, m), 2.01 (3H, s), 5.13 (1H,t), 6.40 (1H, m), 6.48 (1H, m) [Synthesis Example 4: Synthesis of Monomer (m04)] Monomer (m04) was obtained in the same manner as in Synthesis Example 1 except that 3-iodo-2-cyclohexen-1-ol was used instead of 1-methyl-3-iodo-2-cyclohexen-1-ol. The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.65 (2H, m), 1.89 (2H, m), 1.96 (2H, m), 2.01 (3H, s), 5.13 (1H,dd), 6.40 (2H, m), 6.48 (1H, m) [Synthesis Example 5: Synthesis of Monomer (m05)] 20.0 g of 3-iodo-5,5-dimethyl-2-cyclohexen-1-one, 35.8 g of cerium chloride 7-hydrate, and 200 g of methanol were placed in a three-necked flask and stirred. 3.9 g of sodium borohydride was added under ice-cooling. After stirring for 2 hours, 200 g of saturated aqueous ammonium chloride and 200 g of dichloromethane were added, and only the organic layer was recovered. The organic layer was concentrated using a rotary evaporator to obtain 15.2 g of compound (m05-pre) (3-iodo-5,5-dimethyl-2-cyclohexen-1-ol). 15.0 g of compound (m05-pre), 8.6 g of triethylamine, 0.7 g of 4-dimethylaminopyridine, and 150.0 g of dichloromethane were placed in a three-necked flask and stirred. 7.7 g of methacryloyl chloride was added and stirred for 2 hours. 200.0 g of water was added to complete the reaction, and then the organic layer was concentrated using a rotary evaporator to obtain 15.0 g of compound (m05). The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=0.94 (6H, s), 1.78 (2H, m), 1.85 (2H, m), 2.01 (3H, s), 5.13 (1H,dd), 6.40 (2H, m), 6.48 (1H, m) [Synthesis Example 6: Synthesis of Monomer (m06)] Monomer (m06) was obtained in the same manner as in Synthesis Example 1 except that 2-iodo-2-cyclohexen-1-ol was used instead of 1-methyl-3-iodo-2-cyclohexen-1-ol. The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.65 (2H, m), 1.89 (2H, m), 2.01 (3H, s), 2.06 (2H, m), 5.13 (1H,t), 6.40 (2H, m), 6.48 (1H, m) [Synthesis Example 7: Synthesis of Monomer (m07)] 50.0 g of 4-hydroxy-2-cyclohexen-1-one, 35.8 g of imidazole, 137.9 g of triphenylphosphine, and 500.0 g of dichloromethane were placed in a three-necked flask and stirred. 133.4 g of iodine was added in an ice bath. After stirring for 8 hours, 500.0 g of water was added, and only the organic layer was recovered. The organic layer was dehydrated with magnesium sulfate, concentrated on a rotary evaporator, and purified by silica gel column chromatography to obtain 23.6 g of compound (m07-pre) (4-iodo-2-cyclohexen-1-ol). 20.0 g of compound (m07-pre), 12.6 g of triethylamine, 1.1 g of 4-dimethylaminopyridine, and 200.0 g of dichloromethane were placed in a three-necked flask and stirred. 12.1 g of methacryloyl chloride was added and stirred for 2 hours. 200.0 g of water was added to complete the reaction, and then the organic layer was concentrated using a rotary evaporator to obtain 19.6 g of compound (m07). The obtained compound was subjected to NMR analysis, and its structure was determined based on the following results. 1 H-NMR (dmso-d6, 400 MHz): δ (ppm)=1.89 (2H, m), 2.01 (3H, s), 2.19 (2H, m), 4.52 (1H, m), 5.13 (1H,dd), 5.59 (2H, m), 6.40 (1H, m), 6.48 (1H, m) <Production of polymer compounds> The polymer compounds (A1-1) to (A1-9) used in this example were obtained by free radical polymerization of monomers derived from the structural units constituting each polymer compound at a specified molar ratio, followed by a deprotection reaction. The weight average molecular weight (Mw) and molecular weight dispersion (Mw / Mn) of each obtained polymer compound were determined by GPC (standard polystyrene conversion). In addition, the molecular weight of each obtained polymer compound was determined by carbon 13 nuclear magnetic resonance spectroscopy (600 MHz_ 13 C-NMR) to determine the copolymer composition ratio (the ratio (molar ratio) of each structural unit in the structural formula). Polymer compound (A1-1): weight average molecular weight (Mw) 7300, molecular weight dispersion (Mw / Mn) 1.73, l / m = 70 / 30. Polymer compound (A1-2): weight average molecular weight (Mw) 7200, molecular weight dispersion (Mw / Mn) 1.71, l / m = 60 / 40. Polymer compound (A1-3): weight average molecular weight (Mw) 6900, molecular weight dispersion (Mw / Mn) 1.68, l / m = 50 / 50. Polymer compound (A1-4): weight average molecular weight (Mw) 7200, molecular weight dispersion (Mw / Mn) 1.69, l / m = 60 / 40. Polymer compound (A1-5): weight average molecular weight (Mw) 7000, molecular weight dispersion (Mw / Mn) 1.71, l / m = 60 / 40. Polymer compound (A1-6): weight average molecular weight (Mw) 6900, molecular weight dispersion (Mw / Mn) 1.70, l / m = 60 / 40. Polymer compound (A1-7): weight average molecular weight (Mw) 7500, molecular weight dispersion (Mw / Mn) 1.67, l / m = 60 / 40. Polymer compound (A1-8): weight average molecular weight (Mw) 6800, molecular weight dispersion (Mw / Mn) 1.70, l / m = 60 / 40. Polymer compound (A1-9): weight average molecular weight (Mw) 7300, molecular weight dispersion (Mw / Mn) 1.72, l / m = 60 / 40. <Preparation of Resist Compositions> (Examples 1 to 13, Comparative Examples 1 to 6) The components shown in Table 1 were mixed and dissolved to prepare the respective resist compositions. In Table 1, the abbreviations have the following meanings. The values ​​in [ ] are the blending amounts (parts by mass). (A)-1 to (A)-9: The aforementioned polymer compounds (A1-1) to (A1-9). (A)-10: The polymer compound represented by the following chemical formula (A1-10). The weight average molecular weight (Mw) of this polymer compound (A1-10) determined by GPC in terms of standard polystyrene was 6900, and the molecular weight dispersion (Mw / Mn) was 1.69. 13 The copolymer composition ratio (the ratio of each structural unit in the structural formula (molar ratio)) determined by C-NMR is l / m=60 / 40. (A)-11: A polymer compound represented by the following chemical formula (A1-11). Regarding this polymer compound (A1-11), the weight average molecular weight (Mw) converted to standard polystyrene determined by GPC measurement is 7200, and the molecular weight dispersion (Mw / Mn) is 1.67. 13The copolymer composition ratio (the ratio of each structural unit in the structural formula (molar ratio)) determined by C-NMR is l / m=60 / 40. (A)-12: A polymer compound represented by the following chemical formula (A1-12). Regarding this polymer compound (A1-12), the weight average molecular weight (Mw) of the standard polystyrene conversion determined by GPC is 6800, and the molecular weight dispersion (Mw / Mn) is 1.73. 13 The copolymer composition ratio (the ratio of each structural unit in the structural formula (molar ratio)) determined by C-NMR is l / m=60 / 40. (A)-13: A polymer compound represented by the following chemical formula (A1-13). Regarding this polymer compound (A1-13), the weight average molecular weight (Mw) converted to standard polystyrene determined by GPC is 6900, and the molecular weight dispersion (Mw / Mn) is 1.74. 13 The copolymer composition ratio (the ratio of each structural unit in the structural formula (molar ratio)) determined by C-NMR is l / m=60 / 40. (A)-14: A polymer compound represented by the following chemical formula (A1-14). Regarding this polymer compound (A1-14), the weight average molecular weight (Mw) converted to standard polystyrene determined by GPC is 6700, and the molecular weight dispersion (Mw / Mn) is 1.74. 13 The copolymer composition ratio (the ratio of each structural unit in the structural formula (molar ratio)) determined by C-NMR is l / m=60 / 40. (A)-15: A polymer compound represented by the following chemical formula (A1-15). Regarding this polymer compound (A1-15), the weight average molecular weight (Mw) converted to standard polystyrene determined by GPC is 6700, and the molecular weight dispersion (Mw / Mn) is 1.77. 13 The copolymer composition ratio (the ratio (molar ratio) of each structural unit in the structural formula) determined by C-NMR was l / m=60 / 40. (B)-1: Acid generator derived from the following compound (B1-1). (B)-2: Acid generator derived from the following compound (B1-2). (B)-3: Acid generator derived from the following compound (B1-3). (B)-4: Acid generator derived from the following compound (B1-4). (B)-5: Acid generator derived from the following compound (B1-5). (D)-1: Acid diffusion controller composed of the following compound (D1-1). (S)-1: A mixed solvent of propylene glycol monomethyl ether acetate / propylene glycol monomethyl ether = 60 / 40 (mass ratio). <Resist Pattern Formation> Each resist composition was applied to an 8-inch silicon substrate treated with hexamethyldisilazane (HMDS) using a spin coater. A pre-bake (PAB) treatment was performed on a hot plate at 110°C for 60 seconds, followed by drying to form a 50nm thick resist film. Next, the resist film was exposed to a 1:1 line and space pattern (hereinafter referred to as the "LS pattern") with a target width of 50nm using an electron beam lithography system (JEOL JBX-9300FS, manufactured by JEOL Ltd.) at an accelerating voltage of 100kV. A post-exposure bake (PEB) treatment was then performed at 100°C for 60 seconds. Subsequently, alkaline development was performed at 23°C for 60 seconds using a 2.38% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), "NMD-3" (trade name, manufactured by Tokyo Ohka Kogyo Co., Ltd.). Afterwards, the film was rinsed with pure water for 15 seconds, resulting in a 1:1 LS pattern with a line width of 50 nm. [Evaluation of Optimal Exposure (Eop)] Determine the optimal exposure Eop (μC / cm) for forming the LS pattern of the target size using the above-mentioned resist pattern formation method. 2 The result is taken as "Eop (μC / cm 2 )" is shown in Table 2. [Evaluation of Film Loss (DL)] In the above "Resist Pattern Formation", the film thickness of the resist film immediately after PAB and the film thickness of the unexposed portion of the resist film after water rinsing were measured to determine the amount of film loss. The results are shown in Table 2 as "DL (nm)". The results shown in Table 2 confirm that the resist compositions of Examples 1 to 13 achieve higher sensitivity than the resist compositions of Comparative Examples 1 to 6. Furthermore, it is confirmed that the resist compositions of Examples 1 to 13 improve film reduction compared to the resist compositions of Comparative Examples 1 to 4. While the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments. Additions, omissions, substitutions, and other modifications may be made without departing from the spirit of the present invention. The present invention is not limited by the foregoing description but only by the scope of the appended claims.

Claims

1. A resist composition that generates acid upon exposure and alters its solubility in a developer solution by the action of the acid, comprising a resin component (A1) whose solubility in a developer solution is altered by the action of the acid, wherein the resin component (A1) has a structural unit (a0) derived from a compound of the following general formula (a0-1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; Rpg is an acid-dissociable group of the following general formula (a0-pg)], [wherein, A is a cyclic olefin having only one carbon-carbon unsaturated bond in the cyclic skeleton; Ra 01 represents a 1-valent hydrocarbon group with 1 to 20 carbon atoms; m1 is an integer from 0 to 20; m2 is an integer from 1 to 20; however, m1 + m2 ≦ (the total number of carbon atoms constituting the cyclic skeleton of the cyclic alkene in A - 1); when m1 is an integer of 2 or more, the complex Ra 01 can be the same or different; * represents the bonding site.

2. The inhibitor composition of claim 1, wherein the aforementioned structural unit (a0) is a structural unit derived from the compound shown in the following general formula (a0-t1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Ct is a tertiary carbon atom; Rat1 is a straight-chain or branched alkyl group having 1 to 12 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m1 is an integer from 0 to 20; m2 is an integer from 1 to 20; however, m1+m2≦(the total number of carbon atoms constituting the cyclic skeleton of the cyclic alkene in A-1); in the case where m1 is an integer of 2 or more, the multiple Ra01s may be the same or different].

3. As claimed in the inhibitor composition of claim 1, wherein the aforementioned structural unit (a0) is a structural unit derived from the compound shown in the following general formula (a0-s1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms constituting the carbon-carbon unsaturated bond in A; Ras1 and Ras2 are each independent hydrogen atom, an iodine atom, or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 20; however, m21 + m22 ≦ (the total number of carbon atoms constituting the cyclic skeleton of A - 3); and, in the case where m22 is 0, Ra At least one of s1 and Ra s2 is an iodine atom; when m21 is an integer of 2 or more, the complex Ra 01 can be the same or different.

4. The inhibitor composition of any one of claims 1 to 3, wherein in the aforementioned general formula (a0-1), at least one of the carbon atoms constituting the carbon-carbon unsaturated bond in the cyclic skeleton of the cyclic olefin in A is bonded with an iodine atom.

5. The inhibitor composition as claimed in claim 2, wherein the aforementioned structural unit (a0) is a structural unit derived from a compound represented by the following general formula (a0-t1-1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Ct is a tertiary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond of the cyclic alkene; Rat1 is a straight-chain or branched alkyl group having 1 to 12 carbon atoms; Rat2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat1 is a linear or branched alkyl group having 1 to 12 carbon atoms; Rat2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat1 is a linear or branched alkyl group having 1 to 12 carbon atoms; Rat2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat1 is a monovalent alkyl group having 1 to 12 carbon atoms; Rat2 is a monovalent alkyl group having 1 to 20 carbon atoms; Rat1 is a monovalent alkyl group having 1 to 12 carbon atoms; Rat2 is a monovalent alkyl group having 1 to 12 carbon atoms; Rat2 is a monovalent alkyl group having 1 to 20 carbon atoms; Rat2 is a monovalent alkyl group having 1 to 12 ... 01 is a 1-valent hydrocarbon group with 1 to 20 carbon atoms; m11 is an integer from 0 to 20; m12 is an integer from 0 to 19; however, m11 + m12 ≦ (the total number of carbon atoms constituting the cyclic skeleton of the cyclic alkene in A - 3); when m11 is an integer of 2 or more, the complex Ra 01 can be the same or different.

6. The inhibitor composition as claimed in claim 3, wherein the aforementioned structural unit (a0) is a structural unit derived from the compound shown in the following general formula (a0-s1-1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms constituting the carbon-carbon unsaturated bond in A; Ras11 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 19; however, m21+m22≦(the total number of carbon atoms constituting the cyclic skeleton of A - 3); in the case where m21 is an integer of 2 or more, the complex Ra 01 can be the same or different.

7. The inhibitor composition as claimed in claim 3, wherein the aforementioned structural unit (a0) is a structural unit derived from the compound shown in the following general formula (a0-s1-2), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms constituting the carbon-carbon unsaturated bond in A; Ras21 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 19; however, m21 + m22 ≦ (the total number of carbon atoms constituting the cyclic skeleton of A - 3); in the case where m21 is an integer of 2 or more, the complex Ras21 is an integer from 0 to 20.] 01 can be the same or different.

8. The inhibitor composition as claimed in claim 3, wherein the aforementioned structural unit (a0) is a structural unit derived from a compound represented by the following general formula (a0-s1-3), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independently carbon atoms of A constituting the carbon-carbon unsaturated bond in the cyclic alkene; Ras31 and Ras32 are each independently hydrogen atoms or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra 01 is a 1-valent hydrocarbon group with 1 to 20 carbon atoms; m31 is an integer from 0 to 20; m32 is an integer from 1 to 20; however, m31 + m32 ≦ (the total number of carbon atoms constituting the cyclic skeleton of the cyclic alkene in A - 3); when m31 is an integer of 2 or more, the complex Ra 01 can be the same or different.

9. A method for forming a resist pattern, comprising: a step of forming a resist film on a support using a resist composition as claimed in claim 1; a step of exposing the resist film; and a step of developing the exposed resist film to form a resist pattern.

10. The method for forming the resist pattern as described in claim 9, wherein, In the step of exposing the aforementioned resist film, the aforementioned resist film is exposed to EUV (extreme ultraviolet light) or EB (electron beam).

11. A compound represented by the following general formula (a0-1), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; Rpg is an acid-dissociable group represented by the following general formula (a0-pg)]; [where A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Ra 01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m1 is an integer from 0 to 20; m2 is an integer from 1 to 20; however, m1+m2≦(the total number of carbon atoms constituting the cyclic skeleton of A - 1); in the case where m1 is an integer of 2 or more, the multiple Ra 01s may be the same or different; * indicates a bond.] 12. The compound of claim 11 is represented by the following general formula (a0-t1), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in the cyclic skeleton; Ct is a tertiary carbon atom; Rat1 is a straight-chain or branched alkyl group having 1 to 12 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m1 is an integer from 0 to 20; m2 is an integer from 1 to 20; however, m1+m2≦(the total number of carbon atoms in A constituting the cyclic skeleton of the cyclic alkene-1); in the case where m1 is an integer of 2 or more, the multiple Ra01s may be the same or different].

13. The compound of claim 11 is represented by the following general formula (a0-s1), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond of the cyclic alkene; Ras1 and Ras2 are each independent hydrogen atom, an iodine atom, or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 20; however, m21 + m22 ≦ (the total number of carbon atoms in A that constitute the cyclic skeleton of the cyclic alkene - 3); and, in the case where m22 is 0, Ras1 and Ras2 are...] At least one of s2 is an iodine atom; when m21 is an integer greater than 2, the complex numbers Ra 01 can be the same or different.

14. A compound of any one of claims 11 to 13, wherein, in the aforementioned general formula (a0-1), at least one of the carbon atoms constituting the carbon-carbon unsaturated bond in the cyclic skeleton of the cyclic alkene in A is bonded with an iodine atom.

15. The compound of claim 12 is represented by the following general formula (a0-t1-1), [wherein, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Ct is a tertiary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond in the cyclic alkene; Rat1 is a straight-chain or branched alkyl group having 1 to 12 carbon atoms; Rat2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rat1 is a hydrogen atom or a haloalkyl group having 1 to 20 carbon atoms; Rat2 is a monovalent hydrocarbon group or a haloalkyl group having 1 to 20 carbon atoms; Rat1 is a hydrogen atom or a haloalkyl group having 1 to 12 ...2 is a monovalent hydrocarbon group or a haloalkyl group having 1 to 20 carbon atoms; Rat2 is a monovalent hydrocarbon group or a haloalkyl group having 1 to 12 carbon atoms; Rat2 is a monovalent hydrocarbon group or a haloalkyl group having 1 to 12 carbon atoms; Rat2 is a monovalent hydrocarbon group or 01 is a 1-valent hydrocarbon group with 1 to 20 carbon atoms; m11 is an integer from 0 to 20; m12 is an integer from 0 to 19; however, m11 + m12 ≦ (the total number of carbon atoms constituting the cyclic skeleton of the cyclic alkene in A - 3); when m11 is an integer of 2 or more, the complex Ra 01 can be the same or different.

16. The compound of claim 13 is represented by the following general formula (a0-s1-1), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond of the cyclic alkene; Ras11 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 19; however, m21 + m22 ≦ (the total number of carbon atoms in A that constitute the cyclic skeleton of the cyclic alkene - 3); in the case where m21 is an integer of 2 or more, the multiple Ra01s may be the same or different].

17. The compound of claim 13 is represented by the following general formula (a0-s1-2), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond in the cyclic alkene; Ras21 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m21 is an integer from 0 to 20; m22 is an integer from 0 to 19; however, m21 + m22 ≦ (the total number of carbon atoms in A that constitute the cyclic skeleton of the cyclic alkene - 3); in the case where m21 is an integer of 2 or more, the multiple Ra01s may be the same or different].

18. The compound of claim 13 is represented by the following general formula (a0-s1-3), [where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a haloalkyl group having 1 to 5 carbon atoms; A is a cyclic alkene having only one carbon-carbon unsaturated bond in its cyclic skeleton; Cs is a secondary carbon atom; C1 and C2 are each independent carbon atoms in A that constitute the carbon-carbon unsaturated bond of the cyclic alkene; Ras31 and Ras32 are each independent hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; Ra01 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; m31 is an integer from 0 to 20; m32 is an integer from 1 to 20; however, m31 + m32 ≦ (the total number of carbon atoms in A that constitute the cyclic skeleton of the cyclic alkene - 3); in the case where m31 is an integer of 2 or more, the multiple Ra01s may be the same or different].