Scrubbing apparatus

Abstract

This invention relates to a washing apparatus for improving space efficiency by incorporating multiple washers. The washing apparatus includes: a first washer for performing a first wash on a gas; and a second washer connected to the first washer for performing a second wash on the gas after passing through the first washer. The first washer includes: a first chamber forming a first washing space in which a portion of impurities contained in the gas is washed; a first washing plate disposed within the first chamber, at least a portion of which is fixed to the inner wall of the first chamber; a first solution supply nozzle for supplying a first washing solution to the upper surface of the first washing plate; and a plurality of first washing holes formed through the first washing plate. The second washer includes: a second chamber forming a second washing space in which another portion of the impurities contained in the gas is washed; a second washing plate disposed within the second chamber, at least a portion of which is fixed to the inner wall of the second chamber; a second solution supply nozzle for supplying a second washing solution to the upper surface of the second washing plate; and a plurality of second washing holes formed through the second washing plate.

Description

[Technical Field]

[0001] This invention relates to a washing apparatus. Specifically, it relates to a washing apparatus that utilizes multiple washers to improve washing efficiency and space efficiency. [Previous Technology]

[0002] Modern industries generate a variety of air pollutants. In particular, many chemical substances are used in the manufacturing process of semiconductor devices. Most of these are harmful to human health. Therefore, removing air pollutants from gases emitted from the semiconductor industry is an extremely important issue.

[0003] Currently used air pollution prevention facilities include dust collectors and scrubbers. The effectiveness of these facilities should be considered when setting them up, depending on the type of pollutants. Among them, scrubbers can simultaneously handle dust, exhaust gas, and high-temperature gases, and are therefore more commonly used.

[0004] Specifically, depending on the treatment method of the exhaust gas, the scrubber is divided into dry type, wet type, plasma type, etc. The use of wet scrubber is to contact the exhaust gas with the liquid phase so that the water-soluble components in the gas dissolve in the liquid phase.

[0005] In wet scrubbers, a washing solution is used to effectively remove harmful components from the normally discharged gas. When the washing solution comes into contact with the harmful components, the harmful components are removed through chemical reactions such as neutralization. Therefore, a washing solution that reacts well with the harmful components in the discharged gas is required. The performance of a wet scrubber depends on whether the washing solution effectively contacts the discharged gas. Therefore, in existing methods, not only is it necessary to install a packing material to ensure sufficient contact between the washing solution and the discharged gas, but also to install spray nozzles to supply the washing solution in the form of small particles.

[0006] Recently, other technologies are being researched to increase the contact area between the washing solution and the exhaust gas. [Summary of the Invention]

[0007] The technical problem to be solved by the present invention is to provide a washing device that improves washing efficiency by increasing the contact area between the washing solution and the gas, and to provide a washing device that improves space efficiency by utilizing multiple washers.

[0008] The technical problem to be solved by the present invention is not limited to the problems mentioned above. Those skilled in the art to which the present invention pertains can clearly understand other technical problems not mentioned through the following description.

[0009] To solve the above-mentioned technical problems, the washing apparatus of various embodiments of the present invention includes: a first washer for performing a first wash on gas; and a second washer connected to the first washer for performing a second wash on the gas that has passed through the first washer. The first washer includes: a first chamber forming a first washing space, in which a portion of the impurities contained in the gas is washed; a first washing plate disposed in the first chamber, at least a portion of which is fixed to the inner wall of the first chamber; a first solution supply nozzle for supplying a first washing solution to the upper surface of the first washing plate; and a plurality of first washing holes formed through the first washing plate. The second washer includes: a second chamber forming a second washing space, in which another portion of the impurities contained in the gas is washed; a second washing plate disposed in the second chamber, at least a portion of which is fixed to the inner wall of the second chamber; a second solution supply nozzle for supplying a second washing solution to the upper surface of the second washing plate; and a plurality of second washing holes formed through the second washing plate.

[0010] In the washing apparatus of the present invention, the first washer and the second washer are connected. Since the first washer washes the gas for the first time and the second washer washes the gas for the second time, the washing efficiency and space efficiency can be improved.

[0011] In several embodiments, in the first chamber, a portion of the impurities contained in the gas rises through the plurality of first washing holes and dissolves in the first washing solution, and in the second chamber, another portion of the impurities contained in the gas rises through the plurality of second washing holes and dissolves in the second washing solution.

[0012] As the gas rises and passes through the washing hole, bubbles can be generated in the washing solution to increase the contact area between the gas and the washing solution. Therefore, the efficiency of the washing process can be improved.

[0013] The washing apparatus of several embodiments of the present invention further includes a third washer connected to the second washer for a third washing of the gas that has passed through the second washer. The third washer includes: a third chamber forming a third washing space for washing the remaining portion of the impurities contained in the gas; a third washing plate disposed in the third chamber, at least a portion of which is fixed to the inner wall of the third chamber; a third solution supply nozzle for supplying a third washing solution to the upper surface of the third washing plate; and a plurality of third washing holes formed through the third washing plate. The first washer, the second washer, and the third washer are arranged in one direction.

[0014] The washing apparatus of various embodiments of the present invention further includes a fourth washer, which is connected to the third washer and is used to wash the gas that has passed through the third washer for a fourth time. The first washer, the second washer, the third washer and the fourth washer are arranged along one direction or arranged in a "┕" shape.

[0015] The washing apparatus of several embodiments of the present invention further includes a third washer connected to the second washer for a third washing of the gas that has passed through the second washer. The third washer includes: a third chamber forming a third washing space for washing the remaining portion of the impurities contained in the gas; a third washing plate disposed in the third chamber, at least a portion of which is fixed to the inner wall of the third chamber; a third solution supply nozzle for supplying a third washing solution to the upper surface of the third washing plate; and a plurality of third washing holes formed through the third washing plate. The first washer, the second washer, and the third washer are arranged in a "┕" shape.

[0016] In several embodiments, the first scrubber includes: a first gas inlet for injecting the gas into the first chamber; and a first gas outlet for discharging the gas to the outside of the first chamber, wherein the first gas inlet is formed on one side wall of the first chamber and the gas outlet is formed on another side wall opposite to the first side wall.

[0017] In several embodiments, the first gas injection port and the first gas discharge port are formed at the same vertical height.

[0018] In several embodiments, the second scrubber includes a second gas inlet for injecting the gas into the second chamber, and the first gas outlet is connected to the second gas inlet.

[0019] In multiple embodiments, the vertical height of the above-mentioned first gas outlet is higher than the vertical height of the above-mentioned second gas inlet.

[0020] In multiple embodiments, the above-mentioned first scrubber includes: a first gas inlet for introducing the above-mentioned gas into the interior of the above-mentioned first chamber; and a first gas outlet for discharging the above-mentioned gas to the outside of the above-mentioned first chamber. The above-mentioned first gas inlet is formed on one side wall of the above-mentioned first chamber, and the above-mentioned first gas outlet is formed on another side wall intersecting with the above-mentioned one side wall.

[0021] In multiple embodiments, the above-mentioned first scrubber includes a first solution storage tank for storing the above-mentioned first scrubbing solution in which the first impurity among the above-mentioned impurities is dissolved, and the above-mentioned first scrubber includes a second solution storage tank for storing the above-mentioned second scrubbing solution in which the second impurity among the above-mentioned impurities is dissolved.

[0022] In multiple embodiments, the concentration of the above-mentioned first impurity in the solution stored in the above-mentioned first solution storage tank is higher than the concentration of the above-mentioned second impurity in the solution stored in the above-mentioned second solution storage tank.

[0023] Specific matters of other embodiments are included in the description and drawings of the present invention.

[0024] The scrubbing device of the present invention includes at least one scrubbing plate. A scrubbing hole penetrating the above-mentioned scrubbing plate is formed inside the above-mentioned scrubbing plate. As the gas rises through the above-mentioned scrubbing hole, bubbles can be formed in the scrubbing solution flowing on the upper surface of the above-mentioned scrubbing plate.

[0025] As the above-mentioned bubbles are formed, the contact area between the above-mentioned scrubbing solution and the above-mentioned gas can be increased. Due to the increase in the contact area, more hydrophilic impurities in the above-mentioned gas can be effectively dissolved in the above-mentioned scrubbing solution. Therefore, the gas from which the pollutant substances (impurities) have been removed can be discharged to the outside of the scrubbing device.

[0026] Moreover, the scrubbing device of the present invention includes at least one scrubber. Multiple scrubbers can be connected along one direction or connected in a "┕" shape or a "匚" shape. Therefore, a scrubbing device with improved space efficiency can be provided.

Embodiment

[0028] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The advantages, features, and methods of implementing the present invention will become more apparent from the embodiments described in detail below together with the accompanying drawings. However, the present invention is not limited to the embodiments described below, but can be embodied in many different forms. These embodiments are provided to complete the disclosure of the present invention and to inform those skilled in the art of the full scope of the present invention. The present invention is defined by the scope of the claims, and throughout the specification, the same structural elements are given the same reference numerals.

[0029] Furthermore, the terminology used in this specification is for describing embodiments and is not intended to limit and / or define the disclosed invention. Unless explicitly stated in the context, singular expressions include plural expressions. In this specification, terms such as "comprising" or "having" specify the presence of features, numbers, steps, actions, structural elements, components, or combinations thereof described in the specification, and do not presuppose the presence or additional possibilities of one or more other features, numbers, steps, actions, structural elements, components, or combinations thereof.

[0030] Furthermore, the terms "first," "second," and other ordinal terms used in this specification can be used for various structural elements, but the aforementioned structural elements are not limited to the aforementioned terms; the terms are only used to distinguish between two structural elements. For example, without departing from the scope of the invention's patent application, a first structural element can be named a second structural element, and similarly, a second structural element can be named a first structural element. Terms such as "and / or" include a combination of multiple related described items or one of multiple related described items.

[0031] On the other hand, the terms “front,” “rear,” “upper,” “lower,” “front end,” and “lower end,” etc., used in the following description will be defined based on the accompanying drawings, and the shape and position of each structural element are not limited to the above terms.

[0032] The terminology used in this specification is for illustrative purposes and is not intended to limit the invention. In this specification, singular forms include plural forms unless specifically stated in the context. The terms "comprises" and / or "comprising" as used in this specification mean that the mention of a structural element, step, action, and / or device does not exclude the presence or addition of more than one other structural element, step, action, and / or device.

[0033] Unless otherwise defined, all terms (including technical and scientific terms) used in this specification have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. Unless explicitly defined, commonly used dictionary definitions of terms should not be interpreted ideally or excessively.

[0034] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the process of describing with reference to the accompanying drawings, the same reference numerals will be assigned to structural elements that are identical or corresponding regardless of the reference numerals, and repeated descriptions of them will be omitted.

[0035] Hereinafter, a washing system 1000 including a washing apparatus 20 according to several embodiments of the present invention will be described first with reference to FIG1. ​​FIG1 is a diagram for briefly describing a washing system including a washing apparatus according to several embodiments of the present invention.

[0036] Referring to FIG1, the washing system 1000 of various embodiments of the present invention may include a program chamber 10, a washing device 20, an exhaust gas discharge chamber 30, a first washing solution discharge chamber 40a and a second washing solution discharge chamber 40b.

[0037] The washing device 20 may include at least one washer. As an example, the washing device 20 may include a first washer 20a and a second washer 20b, but the present invention is not limited thereto.

[0038] The process chamber 10 can be a chamber applicable to various industrial sectors. These various industrial sectors can include the industrial sector, battery sector, thermal power generation sector, steel sector, semiconductor sector, chemical sector, and / or oil and gas plant sector.

[0039] If the cleaning system 1000 is applied in the semiconductor field, the aforementioned process chamber 10 can be a chamber for performing semiconductor processes. To fabricate a semiconductor device, a film needs to be deposited on a wafer (evaporation process), and the film needs to be etched (etching process) to form the pattern included in the semiconductor device. Furthermore, after performing the evaporation process and / or the etching process, a cleaning process needs to be performed to clean the wafer and / or the process chamber 10.

[0040] For example, the above-mentioned vapor deposition process may include physical vapor deposition (PVD), chemical vapor deposition (CVD), and / or atomic layer deposition (ALD). The above-mentioned etching process may include dry etching process, wet etching process, and / or ashing process. The above-mentioned cleaning process may include wet cleaning process, dry cleaning process, and / or vapor cleaning process.

[0041] If the washing system 1000 is applied to the oil and gas plant industry, the above-mentioned process chamber 10 can be a chamber for performing processing procedures.

[0042] If multiple programs are executed within the program chamber 10, byproducts may be generated. These byproducts may contain substances harmful to the human body, and when such byproducts contain substances harmful to the human body, they must be removed and discharged. The washing device 20 can be used to remove harmful substances from the byproducts generated in the program chamber 10.

[0043] A first conduit 11 may be provided between the program chamber 10 and the washing device 20. One end of the first conduit 11 may be connected to the program chamber 10, and the other end of the first conduit 11 may be connected to the washing device 20. Specifically, the other end of the first conduit 11 may be connected to the first washer 20a. Gas G discharged from the program chamber 10 through the first conduit 11 may be supplied to the washing device 20 (refer to reference numeral 50 in the figure). The gas G may contain impurities. The impurities may be substances harmful to the human body. The impurities may include hydrophilic gases.

[0044] A first piping 11 may be provided between the program chamber 10 and the washing device 20.

[0045] In several embodiments, the first piping 11 may be connected to the first valve 12. The first valve 12 may regulate the pressure and flow rate of the gas G supplied to the washing device 20 through the first piping 11.

[0046] The washing device 20 can wash the gas G supplied from the program chamber 10. Impurities contained in the gas G can be dissolved in the washing solution and stored in the first washing solution discharge chamber 40a and the second washing solution discharge chamber 40b.

[0047] Specifically, gas G is supplied to the first scrubber 20a. The first scrubber 20a can scrub gas G, and a portion of the impurities contained in gas G can be dissolved in a first washing solution and stored in the first washing solution discharge chamber 40a. The first washing solution may include the first washing solution 225a and the first washing solution 227a described below.

[0048] The gas G' washed for the first time by the first scrubber 20a is supplied to the second scrubber 20b (refer to reference numeral 55). The second scrubber 20b can perform a second wash on the gas G' washed for the first time, and another portion of the impurities contained in the gas G' washed for the first time can be dissolved in the second washing solution and stored in the second washing solution discharge chamber 40b. The second washing solution may include the second-first washing solution 225b and the second-second washing solution 227b described below.

[0049] The gas G” after impurities have been removed can be stored in the exhaust gas discharge chamber 30. Hereinafter, the washing device 20 will be described in detail with reference to Figures 2 to 12.

[0050] The first washing solution discharge chamber 40a can be connected to the first scrubber 20a. The first washing solution discharge chamber 40a and the first scrubber 20a can be connected via a second pipe 21a. One end of the second pipe 21a is connected to the first scrubber 20a, and the other end of the second pipe 21a can be connected to the first washing solution discharge chamber 40a. The washing solution S1 containing the first impurity can move from the first scrubber 20a to the first washing solution discharge chamber 40a via the second pipe 21a (refer to reference numeral 60 in the attached drawing).

[0051] In several embodiments, the second piping 21a may be connected to the second valve 22a. The second valve 22a may regulate the pressure and flow rate of the washing solution S1 containing the first impurity supplied to the first washing solution discharge chamber 40a through the second piping 21a.

[0052] The second washing solution discharge chamber 40b can be connected to the second scrubber 20b. The second washing solution discharge chamber 40b and the second scrubber 20b can be connected via a third pipe 21b. One end of the third pipe 21b is connected to the second scrubber 20b, and the other end of the third pipe 21b can be connected to the second washing solution discharge chamber 40b. The washing solution S2 containing the second impurity can move from the second scrubber 20b to the second washing solution discharge chamber 40b via the third pipe 21b (refer to reference numeral 65 in the attached drawing).

[0053] In several embodiments, the third piping 21b may be connected to the third valve 22b. The third valve 22b may regulate the pressure and flow rate of the washing solution S2 containing the second impurity supplied to the second washing solution discharge chamber 40b through the third piping 21b.

[0054] The exhaust gas discharge chamber 30 can be connected to the scrubbing device 20. Specifically, the exhaust gas discharge chamber 30 can be connected to the second scrubbing device 20b. The exhaust gas discharge chamber 30 and the scrubbing device 20 can be connected via a fourth pipe 23. One end of the fourth pipe 23 is connected to the scrubbing device 20, and the other end of the fourth pipe 23 can be connected to the exhaust gas discharge chamber 30. The gas "G" that has had impurities removed can move from the scrubbing device 20 to the exhaust gas discharge chamber 30 (refer to reference numeral 70) via the fourth pipe 23.

[0055] In several embodiments, the fourth piping 23 may be connected to the fourth valve 24. The fourth valve 24 may regulate the pressure and flow rate of the gas G”, which has been purified of impurities, supplied to the exhaust chamber 30 through the fourth piping 23.

[0056] In several embodiments, the first scrubber 20a may further include a first gas inlet 25a and a first gas outlet 26a. Gas G can be introduced into the first scrubber 20a through the first gas inlet 25a. Gas G', after some impurities have been removed, can be discharged to the outside of the first scrubber 20a through the first gas outlet 26a. The second scrubber 20b may further include a second gas inlet 25b and a second gas outlet 26b. Gas G', after some impurities have been removed, can be introduced into the second scrubber 20b through the second gas inlet 25b. Gas G, after some impurities have been removed, can be discharged to the outside of the second scrubber 20b through the second gas outlet 26b.

[0057] In several embodiments, the impurities washed by the first washer 20a may be the same as or different from the impurities washed by the second washer 20b.

[0058] When the washing apparatus 20 of the various embodiments of the present invention is applied to the above-mentioned industrial fields, it can effectively separate and remove pollutants generated after the execution of the process. Therefore, environmental pollution problems can be reduced.

[0059] Hereinafter, the washing apparatus of several embodiments of the present invention will be described in detail with reference to FIGS. 2 to 4.

[0060] Figure 2 is an exemplary perspective view for illustrating the washing apparatus of Figure 1. Figure 3 is an exemplary cross-sectional view for illustrating the washing apparatus of Figure 1. Figure 4 is an enlarged view showing region P of Figure 3.

[0061] Referring to Figures 2 to 4, the washing apparatus 20 of various embodiments of the present invention may include a first washer 20a and a second washer 20b. In fact, the first washer 20a may be the same as the second washer 20b.

[0062] The first scrubber 20a can be connected to the second scrubber 20b. Specifically, the first gas outlet 26a of the first scrubber 20a and the second gas inlet 25b of the second scrubber 20b can be connected by piping. Therefore, the gas scrubbed by the first scrubber 20a for the first time (G' in FIG. 1) can be supplied to the second scrubber 20b through the first gas outlet 26a and the second gas inlet 25b.

[0063] The first scrubber 20a may include a first chamber 210a, a first partition 220a, a first washing plate 230a, a first washing plate 240a, a first washing plate 250a, a first spray nozzle 221a, a first solution supply nozzle 223a and a first demister 260a.

[0064] First, a first chamber 210a may be provided. The first chamber 210a may be the outer housing of the first scrubber 20a. Gas (G in FIG. 1) may be supplied to the interior of the first chamber 210a. The gas may contain impurities. The impurities may include a first impurity and a second impurity. The first impurity may be washed for the first time by the first scrubber 20a. The second impurity may be washed for the second time by the second scrubber 20b.

[0065] Specifically, the aforementioned gas can be supplied to the interior of the first chamber 210a through the first gas injection port 25a. The first gas injection port 25a may be formed on the side wall of the first chamber 210a or on the upper wall of the first chamber 210a. Furthermore, the first gas injection port 25a may be formed on the upper part or the lower part of the side wall of the first chamber 210a.

[0066] Inside the first chamber 210a, the first impurity can be dissolved in the first washing solution. A first washing space 215a may be formed in the first chamber 210a. The first washing space 215a can be a space for performing a first washing procedure, which refers to the procedure of dissolving the first impurity for the first time by the first washing solution.

[0067] In several embodiments, the first washing space 215a may include a first subspace 215_1a and a first subspace 215_2a. The first subspace 215_1a and the first subspace 215_2a may be separated by a first partition 220a.

[0068] A first partition 220a may be disposed inside the first chamber 210a. In several embodiments, the first partition 220a may be attached to the upper wall of the first chamber 210a. The first partition 220a may extend from the upper wall of the first chamber 210a along a second direction D2. The second direction D2 refers to the vertical direction to the ground.

[0069] In the first_1 subspace 215_1a, the first_1 washing procedure can be performed. In the first_2 subspace 215_2a, the first_2 washing procedure can be performed. The first_1 washing procedure mentioned above refers to the procedure of dissolving a portion of the first impurity by the first_1 washing solution 225a.

[0070] The first and second washing procedures mentioned above refer to the procedure of dissolving another portion of the first impurity mentioned above using the first and second washing solution 227a. The first and second washing procedures mentioned above can constitute the first washing procedure mentioned above.

[0071] In several embodiments, the first washing solution 225a may be the same as the first washing solution 227a, or they may be different from each other.

[0072] In this specification, the first direction D1 and the third direction D3 may intersect each other. The first direction D1 and the second direction D2 may intersect each other. The second direction D2 and the third direction D3 may intersect each other. That is, in this specification, in substance, the first direction D1, the second direction D2, and the third direction D3 may be perpendicular to each other.

[0073] In several embodiments, a first washing plate 230a, a first washing plate 240a and a first washing plate 250a may be provided inside the first washing space 215a.

[0074] In Figures 2 to 4, the first washer 20a of the present invention includes three washing plates; however, the technical concept of the present invention is not limited to this. Washers in various embodiments of the present invention may include at least one washing plate. That is, one or two washing plates may be provided inside the washer, and of course, four or more may also be provided.

[0075] Among the multiple washing plates disposed within the first_2 subspace 215_2a, the first_1 washing plate 230a may be disposed at the lowest position. One end of the first_1 washing plate 230a may be connected to and fixed to the first partition 220a. The first_1 washing plate 230a is connected to the first partition 220a and may extend along a first direction D1 intersecting the first partition 220a. More specifically, the first_1 washing plate 230a may be placed on a plane extending along the first direction D1 and a third direction D3.

[0076] In several embodiments, another portion of the first washing plate 230a may be connected to and fixed to the inner wall of the first chamber 210a. Specifically, the first washing plate 230a may be connected to the inner wall of the first chamber 210a that intersects with the first partition 220a.

[0077] However, the first washing plate 230a may also be unconnected and fixed to one side wall of the first chamber 210a facing the first partition 220a. The first washing plate 230a may be separated from the aforementioned side wall of the first chamber 210a along the first direction D1. The space between the other end of the first washing plate 230a and the aforementioned side wall of the first chamber 210a may be a space for the first washing solution 227b to flow downward (e.g., in the second direction D2).

[0078] The first washer 20a in several embodiments of the present invention may further include a first washing hole 230H_a and a first washing wall 235a.

[0079] A first washing hole 230H_a may be formed inside the first washing plate 230a. The first washing hole 230H_a may extend from the lower surface of the first washing plate 230a to the upper surface of the first washing plate 230a. That is, the first washing hole 230H_a may penetrate the first washing plate 230a along the second direction D2. Gas (G in FIG. 1) may rise along the second direction D2 through the first washing hole 230H_a (refer to reference numeral 230u in the attached drawing).

[0080] The upper surface of the first washing plate 230a may face the first demister 260a described below, and the lower surface of the first washing plate 230a may face the first solution storage tank 270a described below.

[0081] The first washing wall 235a may be attached to the other end of the first washing plate 230a. The first washing wall 235a may be formed between the first washing plate 230a and the side wall of the first chamber 210a. The first washing wall 235a may extend along the second direction D2. In several embodiments, a portion of the first washing wall 235a may protrude from the upper surface of the first washing plate 230a along the second direction D2. Another portion of the first washing wall 235a may protrude from the lower surface of the first washing plate 230a along the second direction D2.

[0082] In the first washing wall 235a, the length of the portion protruding from the upper surface of the first washing plate 230a along the second direction D2 in the second direction D2 may be less than the length of the portion protruding from the lower surface of the first washing plate 230a along the second direction D2 in the second direction D2. However, the technical concept of the present invention is not limited thereto.

[0083] In several embodiments, at least a portion of the first washing wall 235a protruding from the lower surface of the first washing plate 230a along the second direction D2 may be disposed within the washing solution 275a containing the first impurity; however, the technical concept of the present invention is not limited thereto.

[0084] The first and second washing plates 240a may be disposed on the first and first washing plates 230a. Specifically, the first and second washing plates 240a may be disposed on the upper surface of the first and first washing plates 230a. One end of the first and second washing plates 240a may be connected to and fixed to the aforementioned side wall of the first chamber 210a. The first and second washing plates 240a are connected to the aforementioned side wall of the first chamber 210a and may extend along a first direction D1 intersecting the aforementioned side wall of the first chamber 210a. More specifically, the first and second washing plates 240a may be placed on a plane extending along the first direction D1 and a third direction D3.

[0085] Similarly, the first and second washing plates 240a can be connected and fixed to the side wall of other first chambers 210a that intersect with the first partition 220a.

[0086] However, the other end of the first-second washing plate 240a may not be connected to and fixed to the first partition 220a. The other end of the first-second washing plate 240a may be separated from the side wall of the first partition 220a along the first direction D1. The space between the other end of the first-second washing plate 240a and the first partition 220a may be a space for the first-second washing solution 227b to flow downward (e.g., in the second direction D2).

[0087] The first washer 20a in several embodiments of the present invention may further include a first and second washer hole 240H_a and a first and second washer wall 245a.

[0088] The first and second washing holes 240H_a may be formed inside the first and second washing plates 240a. The first and second washing holes 240H_a may extend from the lower surface of the first and second washing plates 240a to the upper surface of the first and second washing plates 240a. The first and second washing holes 240H_a may penetrate the first and second washing plates 240a along the second direction D2. Gas (G in FIG. 1) can rise along the second direction D2 through the first and second washing holes 240H_a.

[0089] The upper surface of the first-second washing plate 240a may face the first demister 260a described below, and the lower surface of the first-second washing plate 240a may face the upper surface of the first-first washing plate 230a.

[0090] The first and second washing wall 245a may be attached to the other end of the first and second washing plate 240a. The first and second washing wall 245a may be formed between the first and second washing plate 240a and the first partition 220a. The first and second washing wall 245a may extend along the second direction D2. In several embodiments, a portion of the first and second washing wall 245a may protrude from the upper surface of the first and second washing plate 240a along the second direction D2. Another portion of the first and second washing wall 245a may protrude from the lower surface of the first and second washing plate 240a along the second direction D2.

[0091] In the first and second washing wall 245a, the length of the portion protruding from the upper surface of the first and second washing plate 240a along the second direction D2 in the second direction D2 may be less than the length of the portion protruding from the lower surface of the first and second washing plate 240a along the second direction D2 in the second direction D2. However, the technical concept of the present invention is not limited thereto.

[0092] In several embodiments, the first washing plate 230a and the first washing plate 240a do not completely overlap along the second direction D2. The first washing plate 230a and the first washing plate 240a can be arranged in a zigzag pattern. Thus, the first washing solution 227a flowing downwards through the first washing wall 245a can be discharged to the upper surface of the first washing plate 230a. In other words, the center of the first washing plate 230a and the center of the first washing plate 240a can be offset from each other.

[0093] The first and third washing plates 250a may be disposed on the first and second washing plates 240a. Specifically, the first and third washing plates 250a may be disposed on the upper surface of the first and second washing plates 240a. One end of the first and third washing plates 250a may be connected to and fixed to the first partition 220a. The first and third washing plates 250a are connected to the first partition 220a and may extend along a first direction D1 intersecting the first partition 220a.

[0094] More specifically, the first and third washing plates 250a may be placed on a plane extending along the first direction D1 and the third direction D3. Similarly, the first and third washing plates 250a may be connected to and fixed to the side wall of the first chamber 210a that intersects with the first partition 220a.

[0095] However, the other end of the first-third washing plate 250a may not be connected to and fixed to the aforementioned side wall of the first chamber 210a. The other end of the first-third washing plate 250a may be separated from the aforementioned side wall of the first chamber 210a along the first direction D1. The space between the aforementioned other end of the first-third washing plate 250a and the aforementioned side wall of the first chamber 210a may be a space for the first-second washing solution 227b to flow downward (e.g., in the second direction D2).

[0096] The first washer 20a in several embodiments of the present invention may further include a first-third washer hole 250H_a and a first-third washer wall 255a.

[0097] The first and third washing holes 250H_a may be formed inside the first and third washing plates 250a. The first and third washing holes 250H_a may extend from the lower surface of the first and third washing plates 250a to the upper surface of the first and third washing plates 250a. The first and third washing holes 250H_a may penetrate the first and third washing plates 250a along the second direction D2. Gas (G in FIG. 1) can rise along the second direction D2 through the first and third washing holes 250H_a.

[0098] The upper surface of the first-third washing plate 250a may face the first demister 260a described below, and the lower surface of the first-third washing plate 250a may face the upper surface of the first-second washing plate 240a.

[0099] The first and third washing wall 255a may be attached to the other end of the first and third washing plate 250a. The first and third washing wall 255a may be formed between the first and third washing plate 250a and the aforementioned side wall of the first chamber 210a. The first and third washing wall 255a may extend along the second direction D2.

[0100] In several embodiments, a portion of the first-third washing wall 255a may protrude from the upper surface of the first-third washing plate 250a along the second direction D2. Another portion of the first-third washing wall 255a may protrude from the lower surface of the first-third washing plate 250a along the second direction D2.

[0101] In the first-third washing wall 255a, the length of the portion protruding from the upper surface of the first-third washing plate 250a along the second direction D2 in the second direction D2 may be less than the length of the portion protruding from the lower surface of the first-third washing plate 250a along the second direction D2 in the second direction D2. However, the technical concept of the present invention is not limited thereto.

[0102] In several embodiments, the first and third washing plates 250a and the first and second washing plates 240a do not completely overlap along the second direction D2. The first and third washing plates 250a and the first and second washing plates 240a can be arranged in a zigzag pattern. Thus, the first and second washing solution 227a flowing downwards through the first and third washing wall 255a can be discharged to the upper surface of the first and second washing plate 240a. In other words, the center of the first and third washing plates 250a and the center of the first and second washing plates 240a can be offset from each other.

[0103] However, the first-third washing plate 250a and the first-first washing plate 230a can completely overlap along the second direction D2. That is, the center of the first-third washing plate 250a and the center of the first-first washing plate 230a can overlap along the second direction D2.

[0104] In several embodiments, the first washing hole 230H_a, the first washing hole 240H_a, and the first washing hole 250H_a may completely overlap along the second direction D2. However, the technical concept of the present invention is not limited thereto. The first washing hole 230H_a, the first washing hole 240H_a, and the first washing hole 250H_a may not completely overlap along the second direction D2, or they may only partially overlap.

[0105] A first solution supply nozzle 223a may be disposed inside the first chamber 210a. The first solution supply nozzle 223a is connected to the upper part of the first chamber 210a and may extend along the second direction D2. The first solution supply nozzle 223a may be connected to a pipe (not shown) disposed outside the first chamber 210a. The first solution supply nozzle 223a may supply a first-second washing solution 227a to the first-second subspace 215-2a. The first-second washing solution 227a may be supplied from the first solution supply nozzle 223a and discharged to the upper surface of the first-third washing plate 250a.

[0106] For example, the first and second washing solutions 227a can be water. However, the technical concept of the present invention is not limited thereto.

[0107] After the first washing solution 227a is discharged onto the upper surface of the first washing plate 250a, during the execution of the first washing procedure described above, the first washing solution 227a may flow from the upper surface of the first washing plate 250a to the first washing wall 255a. In this case, the first washing solution 227a does not flow downward through the first washing hole 250H_a. The first washing solution 227a may flow through the first washing wall 255a to the lower part of the first chamber 210a.

[0108] The first-second washing solution 227a, after passing through the first-third washing wall 255a, is discharged again to the upper surface of the first-second washing plate 240a. During the execution of the first-second washing procedure described above, the first-second washing solution 227a may flow from the upper surface of the first-second washing plate 240a to the first-second washing wall 245a. In this case, the first-second washing solution 227a does not flow downward through the first-second washing hole 240H_a. The first-second washing solution 227a may flow through the first-second washing wall 245a to the lower part of the first chamber 210a.

[0109] Similarly, the first-second washing solution 227a, after passing through the first-second washing wall 245a, is discharged again to the upper surface of the first-first washing plate 230a. During the execution of the first-second washing procedure described above, the first-second washing solution 227a may flow from the upper surface of the first-first washing plate 230a to the first-first washing wall 235a. In this case, the first-second washing solution 227a does not flow downward through the first-first washing hole 230H_a. The first-second washing solution 227a may flow through the first-first washing wall 235a to the lower part of the first chamber 210a.

[0110] Finally, the first-second washing solution 227a, after passing through the first-first washing wall 235a, can be stored in the first solution storage tank 270a formed in the lower part of the first chamber 210a. The first solution storage tank 270a can store the washing solution 275a from which the first impurity has been removed. For example, the washing solution 275a containing the first impurity can be a solution in which the first impurity is dissolved in the first-first washing solution 225a and the first-second washing solution 227a. For example, the first impurity can be a hydrophilic gas.

[0111] In several embodiments, the hydrophilic gas may be isopropyl alcohol (IPA) and / or ammonia; however, the technical concept of the present invention is not limited thereto.

[0112] The first demister 260a may be disposed in the upper part of the first chamber 210a. After performing the first 1_1 washing procedure and the first 1_2 washing procedure described above, the first demister 260a can be used to remove moisture from the gas. After performing the first 1_1 washing procedure and the first 1_2 washing procedure described above, gas with some impurities removed (G' in FIG1) can be provided. That is, after performing the first 1_1 washing procedure and the first 1_2 washing procedure described above, moisture can be removed from the gas with some impurities removed (G' in FIG1) using the first demister 260a.

[0113] In several embodiments, the first scrubber 20a may not include the first demister 260a. That is, the first scrubber 20a for the first scrubber of the gas does not include a demister, and only the second scrubber 20b for the last scrubber of the gas includes a demister.

[0114] The first demister 260a can be connected to the first gas outlet 26a. The gas filtered by the first demister 260a can be discharged to the outside of the first chamber 210a through the first gas outlet 26a.

[0115] In several embodiments, the first_1 subspace 215_1a may be formed by the inner wall of the first chamber 210a and the first partition 220a. The first_1 washing procedure described above can be performed in the first_1 subspace 215_1a.

[0116] In several embodiments, a first washing solution 225a may be provided to the interior of the first chamber 210a via a first spray nozzle 221a. The first washing solution 225a may also be provided to the first subspace 215_1a via the first spray nozzle 221a.

[0117] The first washing solution 225a can be provided from the upper part to the lower part of the first subspace 215_1a. During the flow of gas (G in FIG. 1) from the upper part to the lower part of the first subspace 215_1a, at least a portion of the impurities contained in the gas can dissolve in the first washing solution 225a. In several embodiments, the first washing solution 225a may include water. However, the technical concept of the present invention is not limited thereto.

[0118] In several embodiments, the first spray nozzle 221a may be a spray nozzle. The first spray nozzle 221a may supply the first washing solution 225a containing small particles to the first subspace 215_1a. Therefore, the contact area of ​​the first washing solution 225a with the gas can be increased. Thus, a washing apparatus 20 with improved washing efficiency can be provided.

[0119] The first spray nozzle 221a may be disposed in the upper part of the first chamber 210a. Although not shown, the first spray nozzle 221a may be connected to a piping disposed outside the first chamber 210a.

[0120] In several embodiments, a first gas injection port 25a may be provided on one side of the first_1 subspace 215_1a. Gas (G in FIG. 1) injected into the first chamber 210a can be injected into the interior of the first chamber 210a through the first gas injection port 25a. The first gas injection port 25a can be connected to a first piping 11, and the other side of the first piping 11 is connected to the program chamber (10 in FIG. 1). Therefore, the gas (G in FIG. 1) injected through the gas injection port can be provided from the program chamber.

[0121] In several embodiments, the first gas injection port 25a and the first gas discharge port 26a may be formed on opposite sidewalls. That is, the vertical height of the first gas injection port 25a may be the same as the vertical height of the first gas discharge port 26a. However, the technical concept of the present invention is not limited thereto.

[0122] In another embodiment, the first gas injection port 25a may be formed on one side wall of the first chamber 210a. The first gas outlet port 26a may be formed on another side wall that intersects with the aforementioned side wall of the first chamber 210a. That is, the first gas injection port 25a and the first gas outlet port 26a may be formed on side walls that intersect each other. However, the technical concept of the present invention is not limited thereto.

[0123] By arranging the first gas injection port 25a and the first gas discharge port 26a in various ways, the space efficiency of the washing device 20 in various embodiments of the present invention can be improved.

[0124] In several embodiments, negative pressure can be provided to the first washing space 215a through the first gas inlet 25a and the first gas outlet 26a. For example, the pressure in the first gas inlet 25a and the pressure in the first gas outlet 26a may be different. Therefore, gas (G in FIG. 1) can flow from the first gas inlet 25a to the first gas outlet 26a. The pressure difference between the first gas inlet 25a and the first gas outlet 26a can be used to perform the first 1 washing procedure and the first 1 2 washing procedure.

[0125] In several embodiments, the first subspace 215_1a and the first subspace 215_2a may be connected to each other at the lower part of the first chamber 210a. The first subspace 215_1a and the first subspace 215_2a may be connected to each other on the first solution storage tank 270a.

[0126] That is, the gas introduced into the first subspace 215_1a can flow from the upper part of the first subspace 215_1a to the lower part of the first subspace 215_1a, and can be introduced into the first subspace 215_2a from the lower part of the first chamber 210a. In the first subspace 215_2a, the gas (G in FIG1) can rise along the second direction D2.

[0127] When the washing apparatus 20 of the various embodiments of the present invention is used, the contact area between the gas and the washing solution can be increased. Specifically, bubbles can be formed in the washing solution to increase the contact area between the washing solution and the gas.

[0128] For example, in FIG4, gas (G in FIG1) can rise along the second direction D2 through the first washing hole 230H_a (refer to reference numeral 230u).

[0129] After the gas (G in FIG. 1) rises through the first washing hole 230H_a, bubbles BBL can be formed on the upper surface of the first washing plate 230a. Bubbles BBL can be formed inside the first washing solution 227a. In the portion where bubbles BBL come into contact with the first washing solution 227a, impurities contained in the gas can dissolve in the first washing solution 227a.

[0130] Although not illustrated, after rising through the first washing hole 230H_a, the gas (G in FIG1) can rise through the first washing hole 240H_a and rise along the second direction D2. After the gas (G in FIG1) rises through the first washing hole 240H_a, bubbles can form on the upper surface of the first washing plate 240a. Similarly, after rising through the first washing hole 240H_a, the gas (G in FIG1) can rise through the first washing hole 250H_a and rise along the second direction D2. After the gas (G in FIG1) rises through the first washing hole 250H_a, bubbles can form on the upper surface of the first washing plate 250a.

[0131] When bubbles BBL are formed in the first and second washing solutions 227a, the contact area between the gas and the washing solution can be increased. Therefore, a washing apparatus 20 with improved washing efficiency can be provided.

[0132] Hereinafter, the second washing machine 20b will be described. In fact, the second washing machine 20b may be the same as the first washing machine 20a, therefore, repeated content will be briefly described or omitted.

[0133] The second scrubber 20b may include a second chamber 210b, a second partition 220b, a second washing plate 230b, a second washing plate 240b, a second washing plate 250b, a second spray nozzle 221b, a second solution supply nozzle 223b, and a second demister 260b.

[0134] First, a second chamber 210b may be provided. The second chamber 210b may be the outer housing of the second scrubber 20b. A first scrubbing gas (G' in FIG. 1) may be provided to the second chamber 210b. The gas that has been first scrubbed through the first chamber 210a may be in a state in which some impurities have been removed.

[0135] For example, the first-stage washing gas can be supplied to the interior of the second chamber 210b through the second gas injection port 25b. The second gas injection port 25b may also be formed on the side wall of the second chamber 210b. The second gas injection port 25b may be formed at the same vertical height as the first gas outlet 26a. For example, with the bottom surface of the first chamber 210a as a reference, the height of the first gas outlet 26a may be the same as the height of the second gas injection port 25b, but the technical concept of the present invention is not limited thereto.

[0136] Inside the second chamber 210b, the second impurity contained in the gas from the first washing process can be dissolved in the second washing solution. A second washing space 215b may be formed in the second chamber 210b. The second washing space 215b can be a space for performing a second washing procedure, which refers to the procedure of dissolving the second impurity a second time using the washing solution. Of course, the first impurity may be the same as the second impurity, or they may be different.

[0137] In several embodiments, the second washing space 215b may include a second_1 subspace 215_1b and a second_2 subspace 215_2b. The second_1 subspace 215_1b and the second_2 subspace 215_2b may be separated by a second partition 220b. The second_1 subspace 215_1b and the second_2 subspace 215_2b may be divided by the second partition 220b.

[0138] The second partition 220b may be disposed inside the second chamber 210b. In several embodiments, the second partition 220b may be attached to the upper wall of the second chamber 210b. The second partition 220b may extend from the upper wall of the second chamber 210b along a second direction D2. The second direction D2 refers to the vertical direction to the ground.

[0139] In the 2_1 subspace 215_1b, the 2_1 washing procedure can be executed. In the 2_2 subspace 215_2b, the 2_2 washing procedure can be executed. The aforementioned 2_1 washing procedure refers to the procedure of dissolving a portion of the second impurity by the 2_1 washing solution 225b. The aforementioned 2_2 washing procedure refers to the procedure of dissolving another portion of the second impurity by the 2_2 washing solution 227b. The aforementioned 2_1 washing procedure and the aforementioned 2_2 washing procedure can constitute the aforementioned second washing procedure.

[0140] In several embodiments, the second washing solution 225b may be the same as or different from the second washing solution 227b.

[0141] A second washing plate 230b, a second washing plate 240b and a second washing plate 250b may be provided inside the second washing space 215b.

[0142] In Figures 2 to 4, the second washer 20b of the present invention includes three washing plates; however, the technical concept of the present invention is not limited to this. Washers in various embodiments of the present invention may include at least one washing plate. That is, one or two washing plates may be provided inside the washer, and of course, four or more may also be provided.

[0143] In several embodiments, the number of washing plates provided in the first scrubber 20a and the number of washing plates provided in the second scrubber 20b may be different. As an example, the number of washing plates provided in the first scrubber 20a may be greater than the number of washing plates provided in the second scrubber 20b. Compared to the first scrubber 20a which washes the gas for the first time, more washing plates can be provided to improve washing efficiency and space efficiency.

[0144] In essence, the second-first washing plate 230b, the second-second washing plate 240b and the second-third washing plate 250b are the same as the first-first washing plate 230a, the first-second washing plate 240a and the first-third washing plate 250a, respectively. Therefore, detailed descriptions will be omitted.

[0145] The second washer 20b in several embodiments of the present invention may further include a second-first washer hole 230H_b, a second-first washer wall 235b, a second-second washer hole 240H_b, a second-second washer wall 245b, a second-third washer hole 250H_b, and a second-third washer wall 255b.

[0146] In essence, the second-first washing hole 230H_b, the second-first washing wall 235b, the second-second washing hole 240H_b, the second-second washing wall 245b, the second-third washing hole 250H_b, and the second-third washing wall 255b are the same as the first-first washing hole 230H_a, the first-first washing wall 235a, the first-second washing hole 240H_a, the first-second washing wall 245a, the first-third washing hole 250H_a, and the first-third washing wall 255a, respectively. Therefore, detailed descriptions will be omitted.

[0147] The second solution supply nozzle 223b may be disposed inside the second chamber 210b. The second solution supply nozzle 223b is connected to the upper part of the second chamber 210b and may extend along the second direction D2. The second solution supply nozzle 223b may be connected to a pipe (not shown) disposed outside the second chamber 210b. The second solution supply nozzle 223b may supply the second-second washing solution 227b to the second-second subspace 215-2b. The second-second washing solution 227b may be supplied from the second solution supply nozzle 223b and discharged to the upper surface of the second-third washing plate 250b.

[0148] For example, the second washing solution 227b can be water. However, the technical concept of the present invention is not limited thereto.

[0149] After the second washing solution 227b is discharged onto the upper surface of the second-third washing plate 250b, during the execution of the second-second washing procedure described above, the second washing solution 227b may flow from the upper surface of the second-third washing plate 250b to the second-third washing wall 255b. In this case, the second washing solution 227b does not flow downward through the second-third washing hole 250H_b. The second washing solution 227b may flow through the second-third washing wall 255b to the lower part of the second chamber 210b.

[0150] The second-second washing solution 227b, after passing through the second-third washing wall 255b, is discharged again to the upper surface of the second-second washing plate 240b. During the execution of the above-described second-second washing procedure, the second-second washing solution 227b may flow from the upper surface of the second-second washing plate 240b to the second-second washing wall 245b. In this case, the second-second washing solution 227b does not flow downward through the second-second washing hole 240H_b. The second-second washing solution 227b may flow through the second-second washing wall 245b to the lower part of the second chamber 210b.

[0151] Similarly, the second-second washing solution 227b, after passing through the second-second washing wall 245b, is discharged again to the upper surface of the second-first washing plate 230b. During the execution of the above-described second-second washing procedure, the second-second washing solution 227b may flow from the upper surface of the second-first washing plate 230b to the second-first washing wall 235b. In this case, the second-second washing solution 227b does not flow downward through the second-first washing hole 230H_b. The second-second washing solution 227b may flow through the second-first washing wall 235b to the lower part of the second chamber 210b.

[0152] Finally, the second-second washing solution 227b, after passing through the second-first washing wall 235b, can be stored in the second solution storage tank 270b formed in the lower part of the second chamber 210b. The second solution storage tank 270b can store the washing solution 275b from which the second impurity has been removed. For example, the washing solution 275b containing the second impurity can be a solution in which the second impurity is dissolved in the second-first washing solution 225b and the second-second washing solution 227b. For example, the second impurity can be a hydrophilic gas.

[0153] In several embodiments, the concentration of the first impurity stored in the first solution storage tank 270a is higher than the concentration of the second impurity stored in the second solution storage tank 270b. This is because the first washer 20a washes away a greater amount of impurities than the second washer 20b washes away.

[0154] The second demister 260b may be disposed in the upper part of the second chamber 210b. In essence, the second demister 260b may be identical to the first demister 260a. The second demister 260b may be connected to the second gas outlet 26b. The gas filtered by the second demister 260b may be discharged to the outside of the second chamber 210b through the second gas outlet 26b.

[0155] In several embodiments, the second_1 subspace 215_1b may be formed by the inner wall of the second chamber 210b and the second partition 220b. The above-described second_1 washing procedure may be performed in the second_1 subspace 215_1b.

[0156] In several embodiments, the second_1 washing solution 225b can be provided to the interior of the second chamber 210b via the second spray nozzle 221b. The second_1 washing solution 225b can also be provided to the second_1 subspace 215_1b via the second spray nozzle 221b.

[0157] The second washing solution 225b can be provided from the upper part to the lower part of the second subspace 215_1b. During the flow of gas (G' in FIG. 1) from the upper part to the lower part of the second subspace 215_1b, at least a portion of the second impurities contained in the gas can dissolve in the second washing solution 225b. In several embodiments, the second washing solution 225b may include water. However, the technical concept of the present invention is not limited thereto.

[0158] In several embodiments, the second spray nozzle 221b may be a spray nozzle. The second spray nozzle 221b may supply the second washing solution 225b containing small particles to the second_1 subspace 215_1b. Therefore, the contact area of ​​the second_1 washing solution 225b with the gas can be increased. Thus, a washing apparatus 20 with improved washing efficiency can be provided.

[0159] The second spray nozzle 221b may be disposed in the upper part of the second chamber 210b. Although not shown, the second spray nozzle 221b may be connected to a piping disposed outside the second chamber 210b.

[0160] In several embodiments, the second spray nozzle 221b and the second solution supply nozzle 223b can be connected to the second solution storage tank 270b via piping (not shown) connected to the second solution storage tank 270b.

[0161] The solution stored in the second solution storage tank 270b can be recycled using the above-described piping. For example, the second-first washing solution 225b supplied to the second-first subspace 215_1b via the second spray nozzle 221b can be a washing solution 275b containing dissolved second impurities stored in the second solution storage tank 270b. Similarly, the second-second washing solution 227b supplied to the second-second subspace 215_2b via the second solution supply nozzle 223b can be a washing solution 275b containing dissolved second impurities stored in the second solution storage tank 270b.

[0162] In several embodiments, the solution stored in the second solution storage tank 270b can also be recycled for the first scrubber 20a.

[0163] The concentration of impurities in the solution stored in the second solution storage tank 270b is relatively low, therefore, the solution stored in the second solution storage tank 270b can be recycled. In this way, if the washing apparatus 20 of the present invention is used, the washing solution can be recycled, thereby reducing the amount of washing solution used in the washing process.

[0164] In several embodiments, a second gas injection port 25b may be provided on one side of the second_1 subspace 215_1b. Gas (G' in FIG. 1) that has had some impurities removed and is introduced into the second chamber 210b can be introduced into the interior of the second chamber 210b through the second gas injection port 25b.

[0165] In several embodiments, negative pressure can be provided to the second washing space 215b through the second gas inlet 25b and the second gas outlet 26b. For example, the pressure in the second gas inlet 25b and the pressure in the second gas outlet 26b may be different. Therefore, gas with some impurities removed (G' in FIG. 1) can flow from the second gas inlet 25b to the second gas outlet 26b. The pressure difference between the second gas inlet 25b and the second gas outlet 26b can be used to perform the second_1 washing procedure and the second_2 washing procedure described above.

[0166] In several embodiments, the second_1 subspace 215_1b and the second_2 subspace 215_2b may be connected to each other at the lower part of the second chamber 210b. The second_1 subspace 215_1b and the second_2 subspace 215_2b may be connected to each other on the second solution storage tank 270b.

[0167] That is, the gas introduced into the second_1 subspace 215_1b can flow from the upper part of the second_1 subspace 215_1b to the lower part of the second_1 subspace 215_1b, and can be introduced into the second_2 subspace 215_2b from the lower part of the second chamber 210b. In the second_2 subspace 215_2b, the gas (G' in FIG1) that has had some impurities removed can rise along the second direction D2.

[0168] When the washing apparatus 20 of the various embodiments of the present invention is used, the contact area between the gas and the washing solution can be increased. Specifically, bubbles can be formed in the washing solution to increase the contact area between the washing solution and the gas.

[0169] When the washing apparatus 20 of various embodiments of the present invention is used, harmful gases (e.g., impurities) can be dissolved in the washing solution. Thus, harmful gases can be removed from byproducts generated after performing various processes in various industrial fields and discharged to the outside of the washing apparatus 20.

[0170] Furthermore, when using the washing apparatus 20 of the present invention, two washers can be used to wash secondary impurities. Therefore, a washing apparatus 20 with improved washing efficiency and space efficiency can be provided.

[0171] Hereinafter, washing apparatuses of other embodiments of the present invention will be described with reference to FIGS. 5 to 12. For ease of explanation, content that is repeated with the content described with reference to FIGS. 2 to 4 will be briefly described or omitted.

[0172] For reference, Figures 5, 6, 10, 11 and 12 are exemplary cross-sectional views of the washing apparatus of various embodiments of the present invention, and Figures 7 to 9 are top views of the washing apparatus of various embodiments of the present invention.

[0173] First, referring to FIG5, the washing apparatus of various embodiments of the present invention may further include a third washer 20c.

[0174] The first washer 20a, the second washer 20b, and the third washer 20c may be arranged along one direction. For example, the first washer 20a, the second washer 20b, and the third washer 20c may be arranged in a straight line along the first direction D1.

[0175] The third scrubber 20c may include a third chamber 210c, a third partition 220c, a third-first scrubbing plate 230c, a third-second scrubbing plate 240c, a third-third scrubbing plate 250c, a third spray nozzle 221c, a third solution supply nozzle 223c, a third-first scrubbing hole 230H_c, a third-second scrubbing hole 240H_c, a third-third scrubbing hole 250H_c, a third-first scrubbing wall 235c, a third-second scrubbing wall 245c, a third-third scrubbing wall 255c, and a third demister 260c.

[0176] The descriptions of the third chamber 210c, the third partition 220c, the third-1 washing plate 230c, the third-2 washing plate 240c, the third-3 washing plate 250c, the third spray nozzle 221c, the third solution supply nozzle 223c, the third-1 washing hole 230H_c, the third-2 washing hole 240H_c, the third-3 washing hole 250H_c, the third-1 washing wall 235c, the third-2 washing wall 245c, the third-3 washing wall 255c, and the third demister 260c are the same as those of the first scrubber 20a, therefore, their detailed descriptions will be omitted.

[0177] In several embodiments, the third scrubber 20c may include a third gas inlet 25c and a third gas outlet 26c. Gases used for the first and second scrubbing processes by the first scrubber 20a and the second scrubber 20b, respectively, can be supplied to the third scrubber 20c. The aforementioned gas can be supplied to the third scrubber 20c through the third gas inlet 25c. The third gas inlet 25c may be formed at the same vertical height as the second gas outlet 26b. For example, with the bottom surface of the third chamber 210c as a reference, the height of the second gas outlet 26b may be the same as the height of the third gas inlet 25c; however, the technical concept of the present invention is not limited thereto.

[0178] Inside the third chamber 210c, the third impurity contained in the gas can be dissolved in the third washing solution. The third washing solution may include the third-first washing solution 225c and the third-second washing solution 227c. A third washing space 215c may be formed in the third chamber 210c. The third washing space 215c can be a space for performing a third washing procedure, which refers to the procedure of dissolving the third impurity for the third time using the third washing solution.

[0179] In several embodiments, the third washing space 215c may include a third subspace 215_1c and a third subspace 215_2c. The third subspace 215_1c and the third subspace 215_2c may be separated by a third partition 220c.

[0180] In the 3_1 subspace 215_1c, the 3_1 washing procedure can be executed. In the 3_2 subspace 215_2c, the 3_2 washing procedure can be executed. The aforementioned 3_1 washing procedure refers to the procedure of dissolving a portion of the aforementioned third impurity using the 3_1 washing solution 225c. The aforementioned 3_2 washing procedure refers to the procedure of dissolving another portion of the aforementioned third impurity using the 3_2 washing solution 227c. The aforementioned 3_1 washing procedure and the aforementioned 3_2 washing procedure can constitute the aforementioned third washing procedure. The 3_1 washing solution 225c can be the same as the 3_2 washing solution 227c, or they can be different from each other.

[0181] The third solution supply nozzle 223c may be disposed inside the third chamber 210c. The third solution supply nozzle 223c may supply the third-second washing solution 227c to the third-second subspace 2152c. The third-second washing solution 227c may be discharged to the upper surface of the third-third washing plate 250c. For example, the third-second washing solution 227c may be water. However, the technical concept of the present invention is not limited thereto.

[0182] The third solution storage tank 270c can store the washing solution 275c containing the third impurity. For example, the washing solution 275c containing the third impurity can be a solution in which the third impurity is dissolved in the third-1 washing solution 225c and the third-2 washing solution 227c. For example, the third impurity can be a hydrophilic gas.

[0183] In several embodiments, the concentration of the third impurity stored in the third solution storage tank 270c is higher than the concentration of the second impurity stored in the second solution storage tank 270b. This is because the amount of impurities washed by the second scrubber 20b is greater than the amount of impurities washed by the second scrubber 20b.

[0184] In several embodiments, the third washing solution 225c can be provided to the third subspace 2151c via the third spray nozzle 221c.

[0185] The third-first washing solution 225c can be provided from the upper part to the lower part of the third-first subspace 215_1c. During the process of the gas flowing from the upper part to the lower part of the third-first subspace 215_1c, at least a portion of the impurities contained in the gas can dissolve in the third-first washing solution 225c. In several embodiments, the third-first washing solution 225c may include water. However, the technical concept of the present invention is not limited thereto.

[0186] In several embodiments, negative pressure can be provided to the third washing space 215c through the third gas inlet 25c and the third gas outlet 26c. The pressure difference between the third gas inlet 25c and the third gas outlet 26c can be used to perform the washing procedure 3_1 and the washing procedure 3_2 described above.

[0187] Thus, when using the washing apparatus 20 of the present invention, impurities can be washed three times using three washers. Therefore, a washing apparatus 20 with improved washing efficiency and space efficiency can be provided.

[0188] Referring to FIG6, the washing apparatus of various embodiments of the present invention may further include a third washer 20c and a fourth washer 20d.

[0189] The first washer 20a, the second washer 20b, the third washer 20c, and the fourth washer 20d can be arranged along one direction. For example, the first washer 20a, the second washer 20b, the third washer 20c, and the fourth washer 20d can be arranged in a straight line along the first direction D1.

[0190] The relevant content of the third washing machine 20c is the same as that described with reference to Figure 5, therefore, its detailed description will be omitted.

[0191] The fourth scrubber 20d may include a fourth chamber 210d, a fourth partition 220d, a fourth-first scrubbing plate 230d, a fourth-second scrubbing plate 240d, a fourth-third scrubbing plate 250d, a fourth spray nozzle 221d, a fourth solution supply nozzle 223d, a fourth-first scrubbing hole 230H_d, a fourth-second scrubbing hole 240H_d, a fourth-third scrubbing hole 250H_d, a fourth-first scrubbing wall 235d, a fourth-second scrubbing wall 245d, a fourth-third scrubbing wall 255d, and a fourth demister 260d.

[0192] In essence, the description of the fourth washer 20d is the same as that of the third washer 20c described with reference to FIG5.

[0193] For example, a third washing gas may be supplied to the fourth chamber 210d. A fourth impurity contained in the gas may be washed in the fourth washing space 215d. The fourth washing space 215d includes a 4_1 subspace 215_1d and a 4_2 subspace 215_2d. A portion of the aforementioned fourth impurity may be washed in the 4_1 subspace 215_1d, and another portion of the aforementioned fourth impurity may be washed in the 4_2 subspace 215_2d.

[0194] In subspace 4_1 215_1d, a portion of the aforementioned fourth impurity dissolves in washing solution 4_1 225d. In subspace 4_2 215_2d, another portion of the aforementioned fourth impurity dissolves in washing solution 4_2 227d.

[0195] The fourth solution storage tank 270d can store the washing solution 275d containing the fourth impurity. For example, the washing solution 275d containing the fourth impurity can be a solution in which the fourth impurity is dissolved in washing solution 225d and washing solution 227d (4_1). For example, the aforementioned fourth impurity can be a hydrophilic gas.

[0196] In several embodiments, the concentration of the fourth impurity stored in the fourth solution storage tank 270d is lower than the concentration of the third impurity stored in the third solution storage tank 270c. This is because the amount of impurities washed by the third scrubber 20c is greater than the amount of impurities washed by the fourth scrubber 20d.

[0197] In several embodiments, negative pressure can be provided to the fourth washing space 215d through the fourth gas injection port 25d and the fourth gas discharge port 26d. The pressure difference between the fourth gas injection port 25d and the fourth gas discharge port 26d can be used to perform the washing procedure 4_1 and the washing procedure 4_2 described above.

[0198] Thus, when using the washing apparatus 20 of the present invention, impurities can be washed four times using four washers. Therefore, a washing apparatus 20 with improved washing efficiency and space efficiency can be provided.

[0199] Referring to FIG7, the washing apparatus of various embodiments of the present invention may further include a third washer 20c. In a planar view, the first washer 20a, the second washer 20b, and the third washer 20c may be arranged in a "┕" shape.

[0200] First, the first washer 20a and the second washer 20b can be arranged along a first direction D1. The second washer 20b and the third washer 20c can be arranged along a third direction D3.

[0201] In the second scrubber 20b, the sidewall with the second inlet 25b and the sidewall with the second gas outlet 26b may intersect each other. For example, the sidewall with the second gas inlet 25b extends along a third direction D3, and the sidewall with the second gas outlet 26b extends along a first direction D1.

[0202] Furthermore, the extension direction of the second_1 subspace 215_1b and the extension direction of the third_1 subspace 215_1c may intersect each other. For example, the second_1 subspace 215_1b extends along a third direction D3, and the third_1 subspace 215_1c may extend along a first direction D1.

[0203] When using the washing apparatus 20 of various embodiments of the present invention, the three washers can be arranged in a "┕" or "┓" shape. Therefore, a washing apparatus 20 with improved space efficiency can be provided.

[0204] Referring to FIG8, the washing apparatus of various embodiments of the present invention may further include a third washer 20c and a fourth washer 20d. In a planar view, the first washer 20a, the second washer 20b, the third washer 20c, and the fourth washer 20d may be arranged in a "┕" or "┓" shape.

[0205] First, the first washer 20a, the second washer 20b, and the third washer 20c can be arranged along the first direction D1. The third washer 20c and the fourth washer 20d can be arranged along the third direction D3.

[0206] That is, in the third scrubber 20c, the sidewall with the third gas inlet 25c and the sidewall with the third gas outlet 26c may intersect each other. For example, the sidewall with the third gas inlet 25c extends along a third direction D3, and the sidewall with the third gas outlet 26c may extend along a first direction D1.

[0207] Furthermore, the extension direction of the third_1 subspace 215_1c and the extension direction of the fourth_1 subspace 215_1d may intersect each other. For example, the third_1 subspace 215_1c extends along a third direction D3, and the fourth_1 subspace 215_1d may extend along a first direction D1.

[0208] Unlike the accompanying drawings, the first scrubber 20a and the second scrubber 20b may be arranged along a first direction D1. The second scrubber 20b, the third scrubber 20c, and the fourth scrubber 20d may be arranged along a third direction D3. In this case, in the second scrubber 20b, the sidewall with the second gas inlet 25b and the sidewall with the second gas outlet 26b may intersect each other. For example, the sidewall with the second gas inlet 25b extends along a third direction D3, and the sidewall with the second gas outlet 26b extends along the first direction D1.

[0209] When using the cleaning device 20 of multiple embodiments of the present invention, four cleaners can be arranged in an "L" shape or a "┓" shape. Therefore, a cleaning device 20 with improved space efficiency can be provided.

[0210] Referring to FIG. 9, the cleaning device of multiple embodiments of the present invention may further include a third cleaner 20c and a fourth cleaner 20d. The first cleaner 20a, the second cleaner 20b, the third cleaner 20c, and the fourth cleaner 20d can be arranged in a "匚" shape or a chessboard shape.

[0211] For example, the first cleaner 20a and the second cleaner 20b are arranged along the first direction D1, the second cleaner 20b and the third cleaner 20c are arranged along the third direction D3, the fourth cleaner 20d and the third cleaner 20c are arranged along the first direction D1, and the first cleaner 20a and the fourth cleaner 20d can be arranged along the first direction D1.

[0212] The first cleaner 20a and the third cleaner 20c can be separated from each other along the diagonal direction, and the second cleaner 20b and the fourth cleaner 20d can be separated from each other along the diagonal direction.

[0213] In multiple embodiments, the 2_1 sub-space 215_1b can extend along the third direction D3. The 3_1 sub-space 215_1c can extend along the first direction D1. The 4_1 sub-space 215_1d can extend along the third direction D3. That is, the extension direction of the 2_1 sub-space 215_1b intersects with the extension direction of the 3_1 sub-space 215_1c, and the extension direction of the 3_1 sub-space 215_1c and the extension direction of the 4_1 sub-space 215_1d can intersect with each other.

[0214] When using the cleaning device 20 of multiple embodiments of the present invention, four cleaners can be arranged in a "匚" shape or a chessboard shape. Therefore, a cleaning device 20 with improved space efficiency can be provided.

[0215] Referring to FIG. 10, the cleaning device 20 of multiple embodiments of the present invention may not include the 2_1 sub-space (215_1b in FIG. 3) either. The second cleaning space 215b may only include the 2_2 sub-space.

[0216] In this case, the gas passing through the first cleaner 20a can be introduced into the lower part of the second cleaner 20b. That is, the vertical height of the first gas discharge port 26a and the vertical height of the second gas injection port 25b may be different from each other. Based on the bottom surface of the first chamber 210a, the height of the first gas discharge port 26a may be greater than the height of the second gas injection port 25b.

[0217] Since the second washing space 215b does not include the second_1 subspace 215_1b, space efficiency can be improved.

[0218] Referring to FIG11, in the washing apparatus 20 of various embodiments of the present invention, the first solution storage tank 270a and the second solution storage tank 270b are connected by a tank connection pipe 290. Therefore, the washing solution 275a containing the first impurity and the washing solution 275b containing the second impurity stored in the first solution storage tank 270a can be mixed with each other. Since the washing solution 275a containing the first impurity and the washing solution 275b containing the second impurity are mixed with each other, the impurity concentration in the solution can be adjusted.

[0219] Referring to FIG12, the first washer 20a and the second washer 20b of various embodiments of the present invention may each include two washing plates. That is, the first washer 20a may include a first washing plate 230a and a first washing plate 240a. The second washing plate 20b may include a second washing plate 230b and a second washing plate 240b.

[0220] In this case, the shape of the first washing plate 230a and the shape of the first washing plate 240a may be different from each other. Similarly, the shape of the second washing plate 230b and the shape of the second washing plate 240b may also be different from each other. In fact, the first washing plate 230a and the second washing plate 230b are the same, therefore, only the first washing plate 230a and the first washing plate 240a will be described below.

[0221] In several embodiments, the two ends of the first washing plate 230a may be separated from the first partition 220a and the inner wall of the first washer 20a facing the first partition 220a, respectively. Specifically, the first washing plate 230a may not be in contact with the first partition 220a and the inner wall of the first washer 20a facing the first partition 220a.

[0222] A pair of first washing walls 235a may be disposed at one end and the other end of the first washing plate 230a. A portion of the pair of first washing walls 235a may be formed between the first washing plate 230a and the first partition 220a. Another portion of the pair of first washing walls 235a may be formed between the inner sidewalls of the first washer 20a facing the first partition 220a and the first washing plate 230a.

[0223] The space between the first washing wall 235a and the first partition 220a and the space between the inner wall of the first washer 20a facing the first partition 220a can be the space for the first washing solution 227a to flow downward (e.g., in the second direction D2).

[0224] The two ends of the first and second washing plates 240a can respectively contact and connect with the inner sidewalls of the first partition 220a and the first washer 20a facing the first partition 220a. The first and second washing plates 240a may have a structure with a central portion penetrating. That is, an opening may be formed in the first and second washing plates 240a. The opening is formed in the central portion of the first and second washing plates 240a and may extend along a third direction D3. The opening may expose at least a portion of the upper surface of the first washing plate 230a. That is, the opening may overlap with at least a portion of the upper surface of the first washing plate 230a along the second direction D2.

[0225] A pair of first and second washing walls 245a may be respectively provided in the aforementioned central portion of the first and second washing plates 240a. A pair of first and second washing walls 245a may be respectively provided in the aforementioned opening.

[0226] A pair of first and second washing walls 245a may be spaced apart from each other along a first direction D1. The space between the pair of first and second washing walls 245a may be a space for the first and second washing solution 227a to flow downward (e.g., in a second direction D2).

[0227] In several embodiments, the first and second washing solutions 227a may be discharged to both ends of the first and second washing plates 240a. For example, the first and second washing solutions 227a may be discharged to the area of ​​the first and second washing plates 240a adjacent to the first partition 220a and the area of ​​the first and second washing plates 240a adjacent to the inner wall of the first washer 20a.

[0228] The first washing solution 227a discharged onto the upper surface of the first and second washing plates 240a can flow toward the central portion of the first and second washing plates 240a. The first washing solution 227a discharged onto the upper surface of the first and second washing plates 240a can flow toward the aforementioned opening.

[0229] As the first and second washing solutions 227a flow toward the center of the first and second washing plates 240a, impurities can dissolve in the first and second washing solutions 227a. The first and second washing solutions 227a can pass through the first and second washing wall 245a and be discharged to the upper surface of the first and first washing plates 230a. The first and second washing solutions 227a discharged to the upper surface of the first and first washing plates 230a can flow to both ends of the first and first washing plates 230a.

[0230] In Figure 12, the first washer 20a and the second washer 20b may each include two washing plates; however, the technical concept of the present invention is not limited thereto. If the first washer 20a includes three washing plates, the shape of the first-third washing plate may be the same as the shape of the first-first washing plate 230a. The first-third washing plate may be disposed on the first-second washing plate 240a.

[0231] If the first washer 20a includes four washing plates, then the shape of the 1st and 3rd washing plates is the same as the shape of the 1st and 1st washing plates 230a, and the shape of the 1st and 4th washing plates can be the same as the shape of the 1st and 2nd washing plates 240a. The 1st and 3rd washing plates are disposed on the 1st and 2nd washing plates 240a, and the 1st and 4th washing plates can be disposed on the 1st and 3rd washing plates.

[0232] Hereinafter, the operation method of the washing apparatus according to several embodiments of the present invention will be described with reference to FIGS. 13 and 14. For reference, FIG. 13 is an exemplary flowchart for illustrating the operation method of the washing apparatus according to several embodiments of the present invention.

[0233] Figures 13 and 14 are diagrams illustrating the operation of the washing apparatus according to several embodiments of the present invention.

[0234] First, referring to FIG13, the operation method of the washing apparatus of various embodiments of the present invention may include: step S100, providing a gas containing impurities to a first washer; step S200, inside the first washer, causing the gas to rise through a first washing hole and perform a first wash on a portion of the impurities contained in the gas; step S300, providing a gas with some impurities removed to a second washer; and step S400, inside the second washer, causing the gas to rise through a second washing hole and perform a second wash on another portion of the impurities contained in the gas.

[0235] Specifically, referring to Figures 1 and 14, the gas G containing impurities can be supplied from the program chamber 10 to the first scrubber 20a. The gas G containing impurities can be introduced into the interior of the first scrubber 20a through the first pipe 11 via the first gas injection port 25a (refer to reference numeral 310).

[0236] Gas G containing impurities may be introduced into the first_1 subspace 215_1a. As an example, gas G containing impurities may be moved to the lower part of the first_1 subspace 215_1a (refer to reference numeral 310 in the figure).

[0237] In several embodiments, the first washing procedure may be performed in the first_1 subspace 215_1a.

[0238] Specifically, a first washing solution 225a (refer to reference numeral 410) can be supplied to the first subspace 215_1a through the first spray nozzle 221a. The first washing solution 225a can be water, but the technical concept of the present invention is not limited thereto.

[0239] In Figure 14, the first washing solution 225a is sprayed vertically along the second direction D2, but the technical concept of the present invention is not limited thereto.

[0240] The first spray nozzle 221a can supply the first 1st washing solution 225a for small particles. As the gas G containing impurities moves to the lower part of the first 1st subspace 215_1a, the first impurities contained in the gas G can dissolve in the first 1st washing solution 225a. The gas can be supplied to the first 2nd subspace 215_2a (refer to reference numeral 310). The first 2nd washing procedure can be performed in the first 2nd subspace 215_2a.

[0241] During the execution of the first and second washing procedures described above, the first solution supply nozzle 223a can supply the first and second washing solution 227a to the upper surface of the first and third washing plate 250a. The first supplied first and second washing solution 227a can flow downward through the first and third washing holes 250H_a, the first and second washing holes 240H_a, and the first and first washing holes 230H_a. That is, in the initial state, the first and second washing solution 227a can flow downward through multiple washing holes 250H_a, 240H_a, and 230H_a.

[0242] During the execution of the above-described first and second washing procedures, gas G may rise along the second direction D2. Gas G may pass through the first washing hole 230H_a and rise along the second direction D2.

[0243] Specifically, referring to FIG4, gas G can rise through the first washing hole 230H_a. As gas G rises along the second direction D2, bubbles BBL can be formed in the first washing solution 227a. On the contact surface where the bubbles BBL contact the first washing solution 227a, impurities contained in gas G can be dissolved in the first washing solution 227a.

[0244] During the execution of the first and second washing procedures described above, the first and second washing solution 227a may flow downwards without passing through the multiple washing holes 250H_a, 240H_a, and 230H_a (refer to reference numeral 420 in the attached drawing). This is because it may be subject to the pressure of the gas G rising through the multiple washing holes 250H_a, 240H_a, and 230H_a.

[0245] During the execution of the first and second washing procedures described above, the first and second washing solution 227a flows from the upper surface of the first and third washing plate 250a to the first and third washing wall 255a, and can flow through the first and third washing wall 255a to the upper surface of the first and second washing plate 240a (refer to reference numeral 420). Furthermore, the first and second washing solution 227a flows from the upper surface of the first and second washing plate 240a to the first and second washing wall 245a, and can flow through the first and second washing wall 245a to the upper surface of the first and first washing plate 230a (refer to reference numeral 420). Furthermore, the first and second washing solution 227a flows from the upper surface of the first and first washing plate 230a to the first and first washing wall 235a, and can flow through the first and first washing wall 235a to the lower part of the first chamber 210a (refer to reference numeral 420).

[0246] During the flow of the first and second washing solutions 227a in the aforementioned direction, gas G can rise along the second direction D2 through multiple washing holes 250H_a, 240H_a, and 230H_a. As gas G passes through the multiple washing holes 250H_a, 240H_a, and 230H_a, bubbles can be formed within the first and second washing solutions 227a.

[0247] Specifically, gas G can rise through the first washing hole 230H_a (refer to reference numeral 320). Then, gas G can rise through the first washing hole 240H_a (refer to reference numeral 330). Subsequently, gas G can rise through the first washing hole 250H_a (refer to reference numeral 340).

[0248] As gas G rises and passes through multiple washing holes 250H_a, 240H_a, and 230H_a, impurities can be dissolved by the first and second washing solutions 227a.

[0249] Then, the partially impurity-removed gas G' can be discharged to the outside of the first chamber 210a through the first demister 260a (refer to reference numeral 350). The gas G' discharged through the first gas outlet 26a can be provided to the second chamber 210b (refer to reference numeral 350).

[0250] Impurities contained in the gas can be removed in the second chamber 210b. For example, the gas supplied to the second chamber 210b can be provided to the second_1 subspace 215_1b and can flow from the upper part to the lower part of the second_1 subspace 215_1b (refer to reference numeral 360). The second_1 washing procedure can be performed in the second_1 subspace 215_1b.

[0251] Specifically, a second-first washing solution 225b (refer to reference numeral 430) can be supplied to the second-first subspace 215_1b through the second spray nozzle 221b. The first-first washing solution 225a can be water, but the technical concept of the present invention is not limited thereto.

[0252] Specifically, a second-first washing solution 225b (refer to reference numeral 430) can be supplied to the second-first subspace 215_1b through the second spray nozzle 221b. The second-first washing solution 225b can be water, but the technical concept of the present invention is not limited thereto.

[0253] The gas described above can be supplied to the second-second subspace 215-2b (refer to reference numeral 360 in the attached drawing). The second-second washing procedure can be performed in the second-second subspace 215-2b.

[0254] During the execution of the above-described 2_2 washing procedure, the second solution supply nozzle 223b can supply the 2_2 washing solution 227b to the upper surface of the 2_3 washing plate 250b. The first supplied 2_2 washing solution 227b can flow downward through the 2_3 washing hole 250H_b, the 2_2 washing hole 240H_b, and the 2_1 washing hole 230H_b. That is, in the initial state, the 2_2 washing solution 227b can flow downward through multiple washing holes 250H_b, 240H_b, and 230H_b.

[0255] During the execution of the above-described 2_2 washing procedure, gas G may rise along the second direction D2. Gas G may pass through the 2_1 washing hole 230H_b and rise along the second direction D2.

[0256] During the execution of the above-described washing procedure 2_2, the washing solution 227b may flow downwards without passing through the multiple washing holes 250H_b, 240H_b, and 230H_b (refer to reference numeral 440 in the attached drawing). This is because it may be subject to the pressure of the gas G rising through the multiple washing holes 250H_b, 240H_b, and 230H_b.

[0257] During the execution of the above-described 2_2 washing procedure, the 2_2 washing solution 227b flows from the upper surface of the 2_3 washing plate 250b to the 2_3 washing wall 255b, and can flow through the 2_3 washing wall 255b to the upper surface of the 2_2 washing plate 240b (refer to reference numeral 440). Furthermore, the 2_2 washing solution 227b flows from the upper surface of the 2_2 washing plate 240b to the 2_2 washing wall 245b, and can flow through the 2_2 washing wall 245b to the upper surface of the 2_1 washing plate 230b (refer to reference numeral 440). Also, the 2_2 washing solution 227b flows from the upper surface of the 2_1 washing plate 230b to the 2_1 washing wall 235b, and can flow through the 2_1 washing wall 235b to the lower part of the second chamber 210b (refer to reference numeral 440).

[0258] During the flow of the second washing solution 227b in the aforementioned direction, gas G can rise along the second direction D2 through multiple washing holes 250H_b, 240H_b, and 230H_b. As gas G passes through the multiple washing holes 250H_b, 240H_b, and 230H_b, bubbles can be formed within the second washing solution 227b.

[0259] Specifically, gas G can rise through the 2_1 scrubbing hole 230H_b (refer to reference numeral 370). Then, gas G can rise through the 2_2 scrubbing hole 240H_b (refer to reference numeral 380). Subsequently, gas G can rise through the 2_3 scrubbing hole 250H_b (refer to reference numeral 390).

[0260] As gas G rises and passes through multiple washing holes 250H_b, 240H_b, and 230H_b, impurities can be dissolved by the second washing solution 227b.

[0261] Then, the gas G that has been cleaned of impurities can be discharged to the outside of the second chamber 210b through the second demister 260b (see reference numeral 400 in the figure).

[0262] Thus, by using the washing apparatus 20 of the present invention, the first washer 20a can be used to wash the impurities contained in the gas for the first time, and the second washer 20b can be used for the second wash. As a result, not only can the washing efficiency be improved, but also the space efficiency can be improved since multiple washers are included.

[0263] Although embodiments of the present invention have been described above with reference to the accompanying drawings, it should be understood that the present invention is not limited to the above embodiments and can be made in many different forms. Those skilled in the art can implement the invention according to different methods without changing the technical concept or essential features of the invention. Therefore, the embodiments described above are merely examples at all levels and should not be construed as limiting. [Simplified Explanation of the Diagram]

[0027] FIG1 is a diagram for briefly illustrating a washing system including a washing apparatus of several embodiments of the present invention. FIG2 is an exemplary perspective view for illustrating the washing apparatus of FIG1. ​​FIG3 is an exemplary cross-sectional view for illustrating the washing apparatus of FIG1. ​​FIG4 is an enlarged view showing region P of FIG3. FIG5 to FIG12 are diagrams for illustrating washing apparatus of other several embodiments of the present invention. FIG13 and FIG14 are diagrams for illustrating the operation method of the washing apparatus of several embodiments of the present invention.

Claims

1. A washing device, wherein, include: The first scrubber is used to perform the initial scrubbing of the gas. A second scrubber, connected to the first scrubber, is used to perform a second scrubbing on the gas that has passed through the first scrubber. The first scrubber includes: a first chamber forming a first scrubbing space, in which a portion of the impurities contained in the gas are scrubbed; a first scrubbing plate disposed in the first chamber, at least a portion of which is fixed to the inner wall of the first chamber; a first solution supply nozzle supplying a first scrubbing solution to the upper surface of the first scrubbing plate; and a plurality of first scrubbing holes formed through the first scrubbing plate. The second scrubber includes: a second chamber forming a second scrubbing space, in which another portion of the impurities contained in the gas are scrubbed; a second scrubbing plate disposed in the second chamber, at least a portion of which is fixed to the inner wall of the second chamber; a second solution supply nozzle supplying a second scrubbing solution to the upper surface of the second scrubbing plate; and a plurality of second scrubbing holes formed through the second scrubbing plate. Each of the first and second scrubbing plates includes a plurality of scrubbing plates, and the plurality of scrubbing plates are arranged in a zigzag pattern.

2. The washing apparatus as described in claim 1, wherein, In the first chamber, a portion of the impurities contained in the gas rises through the plurality of first washing holes and dissolves in the first washing solution. In the second chamber, another portion of the impurities contained in the gas rises through the plurality of second washing holes and dissolves in the second washing solution.

3. The washing apparatus as described in claim 1, wherein, It also includes a third scrubber connected to the second scrubber for performing a third scrubbing on the gas that has passed through the second scrubber. The third scrubber includes: a third chamber forming a third scrubbing space for scrubbing the remaining portion of the impurities contained in the gas; a third scrubbing plate disposed in the third chamber, at least a portion of which is fixed to the inner wall of the third chamber; a third solution supply nozzle for supplying a third scrubbing solution to the upper surface of the third scrubbing plate; and a plurality of third scrubbing holes formed through the third scrubbing plate. The first scrubber, the second scrubber, and the third scrubber are arranged in one direction.

4. The washing apparatus as described in claim 3, wherein, It also includes a fourth scrubber, which is connected to the third scrubber and is used to perform a fourth scrubbing on the gas that has passed through the third scrubber. The first scrubber, the second scrubber, the third scrubber and the fourth scrubber are arranged in one direction or in a "┕" shape.

5. The washing apparatus as described in claim 1, wherein, It also includes a third scrubber, connected to the second scrubber, for performing a third scrubbing on the gas that has passed through the second scrubber. The third scrubber includes: a third chamber forming a third scrubbing space, in which the remaining portion of the impurities contained in the gas is scrubbed; a third scrubbing plate disposed in the third chamber, at least a portion of which is fixed to the inner wall of the third chamber; a third solution supply nozzle for supplying a third scrubbing solution to the upper surface of the third scrubbing plate; and a plurality of third scrubbing holes formed through the third scrubbing plate. The first scrubber, the second scrubber, and the third scrubber are arranged in a "┕" shape.

6. The washing apparatus as described in claim 1, wherein, The first scrubber includes: a first gas inlet for injecting the gas into the first chamber; and a first gas outlet for discharging the gas to the outside of the first chamber. The first gas inlet is formed on one side wall of the first chamber, and the first gas outlet is formed on another side wall opposite to the first side wall.

7. The washing apparatus as described in claim 6, wherein, The aforementioned first gas injection port and the aforementioned first gas discharge port are formed at the same vertical height.

8. The washing apparatus as described in claim 6, wherein, The second scrubber includes a second gas inlet for introducing the gas into the second chamber, and the first gas outlet is connected to the second gas inlet.

9. The washing apparatus as described in claim 8, wherein, The vertical height of the first gas outlet is higher than the vertical height of the second gas injection port.

10. The washing apparatus as described in claim 1, wherein, The first scrubber includes: a first gas inlet for injecting the gas into the first chamber; and a first gas outlet for discharging the gas to the outside of the first chamber. The first gas inlet is formed on one side wall of the first chamber, and the first gas outlet is formed on another side wall that intersects with the first side wall.

11. The washing apparatus as described in claim 1, wherein, The first scrubber includes a first solution storage tank for storing the first scrubbing solution containing the first impurity of the aforementioned impurities, and the second scrubber includes a second solution storage tank for storing the second scrubbing solution containing the second impurity of the aforementioned impurities.

12. The washing apparatus as described in claim 11, wherein, The concentration of the first impurity in the solution stored in the first solution storage tank is higher than the concentration of the second impurity in the solution stored in the second solution storage tank.

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