Processing device
Patent Information
- Application Number
- TW114114025
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2025-04-14
- Publication Date
- 2026-10-21
- Estimated Expiration
- 2045-04-13
Smart Images

Figure TWG2TB001917149_001 
Figure TWG2TB001917149_002 
Figure TWG2TB001917149_003
Abstract
Claims
1. A processing apparatus suitable for processing multiple microcrystals, the processing apparatus comprising: A light source is provided, suitable for generating a light beam; an image rotation module is disposed downstream of the light source in the optical path, the image rotation module including a first reflector and a second reflector, the first reflector having a first reflective surface, the second reflector being located downstream of the first reflector in the optical path and having a second reflective surface inclined relative to the first reflective surface; a stage is disposed downstream of the image rotation module in the optical path and is suitable for mounting the micro-granules; and a mirror module is disposed in an optical path between the image rotation module and the stage; the processing apparatus further includes two driving elements, wherein the two driving elements are respectively connected to the first reflector and the second reflector and are suitable for driving the first reflector and the second reflector to rotate.
2. A processing apparatus suitable for processing multiple microcrystals, the processing apparatus comprising: A light source is provided, suitable for generating a light beam; an image rotation module is disposed downstream of the light source in the optical path, the image rotation module including a first reflector and a second reflector, the first reflector having a first reflective surface, the second reflector being located downstream of the first reflector in the optical path and having a second reflective surface inclined relative to the first reflective surface; a stage is disposed downstream of the image rotation module in the optical path and is suitable for mounting the micro-crystals; and a mirror module is disposed in an optical path between the image rotation module and the stage; the processing apparatus further includes a first mirror and a second mirror, wherein the first mirror is located downstream of the optical path of the image rotation module, and the second mirror is located downstream of the optical path of the first mirror.
3. A processing apparatus suitable for processing multiple microcrystals, the processing apparatus comprising: A light source is provided, suitable for generating a light beam; an image rotation module is disposed downstream of the light source in the optical path, the image rotation module including a first reflector and a second reflector, the first reflector having a first reflective surface, the second reflector being located downstream of the first reflector in the optical path and having a second reflective surface inclined relative to the first reflective surface; a stage is disposed downstream of the image rotation module in the optical path and is suitable for mounting the micro-granules; and a mirror module is disposed in an optical path between the image rotation module and the stage; wherein the image rotation module further includes a third reflector, the third reflector being located downstream of the second reflector in the optical path and having a third reflective surface inclined relative to the second reflective surface; the processing apparatus further includes a driving element, wherein the driving element connects the first reflector, the second reflector and the third reflector, and is suitable for driving the first reflector, the second reflector and the third reflector to rotate.
4. The processing apparatus as described in claim 1, 2 or 3, wherein the mirror module is disposed in the optical path between the image rotation module and the stage, and the mirror module includes a scanning galvanometer module.
5. The processing apparatus as described in claim 1, 2 or 3 further includes a spot contour shaping module, wherein the spot contour shaping module is disposed in an optical path between the light source and the image rotation module, and is adapted to convert an incident light beam into a shaped light beam.
6. The processing apparatus as claimed in claim 5, wherein the light spot contour shaping module includes a photomask having a plurality of light-transmitting patterns having different shapes or sizes, the light-transmitting patterns being adapted to allow the light beam to pass through and form the shaped light beam.
7. The processing apparatus as described in claim 1, 2 or 3 further includes a beam shaping element, wherein the beam shaping element is located on the transmission path of the beam and is adapted to change the energy distribution of the beam.
8. The processing apparatus as claimed in claim 7, wherein the beam shaping element is adapted to convert the beam into a flat-top beam.
Citation Information
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