Systems for monitoring and controlling substrate chemical processing

Abstract

This invention relates to a system for monitoring and controlling chemical processing of a substrate, comprising: a housing having at least one protective door at the front; a sealed module door; a wet parts cabinet constructed between the at least one protective door and the sealed module door; multiple analytical modules, each having multiple workstations and devices, and configured for different types of analysis, the analytical modules being mounted on the sealed module door, and components of the multiple workstations and devices located within the wet parts cabinet; an electrical cabinet disposed behind the sealed module door, the electrical cabinet being configured to include electrical components for controlling the operation of the workstations and devices; one or more chemical cabinets for storing and supplying chemicals required for analysis performed via the workstations; and a user interface for connecting to one or more computing devices, enabling monitoring and control of the analysis via the computing devices. The system is modular, flexible, and scalable.

Description

Systems for monitoring and controlling substrate chemical processing Technical Field

[0001] This invention relates to a system for monitoring and controlling the chemical processing of substrates, and more particularly to a system for controlling the manufacturing of microelectronic substrates. Specifically, this invention describes a system for monitoring and controlling substrate processing using electrolysis, chemical, and electrochemical techniques, particularly suitable for applications in the semiconductor industry for analyzing or controlling the concentration of components in the processing solution. Prior Technology

[0002] Microelectronic devices are fabricated by applying and removing multiple material layers on a substrate (e.g., a silicon wafer), thereby generating a large number of individual devices. Thus, layers composed of photoresist, conductive materials, and dielectric materials are configured, structured, etched, planarized, etc., to form features in and / or on the substrate. These features are configured to form integrated circuits (ICs), microelectromechanical systems (MEMS), and other microelectronic structures.

[0003] Wet chemical processes are typically used to form features on microelectronic substrates. These processes are usually performed in wet chemical processing tools with multiple processing chambers for a combination of cleaning, etching, electrochemical deposition, and rinsing. The electrochemical deposition process includes electrolytic deposition where an external current is applied to the substrate, and currentless deposition where no external current is supplied to the substrate.

[0004] Common applications include schemes for monitoring the chemical composition or chemical activity of the electrolyte used in one of the processes mentioned above. This is done to control the concentration of the electrolyte's chemical composition, ensuring uniform processing of multiple substrates throughout the electrolyte's lifespan. Typically, analytical techniques must be developed specifically for each component of the electrolyte in the corresponding combination and concentration of the components present in the particular electrolyte. Methods for monitoring the composition of electrolytes relate to electroanalytical methods. A range of known methods for monitoring the composition of electrolytes relate to electroanalytical methods. Titration (also known as titration and volumetric analysis) is an absolutely very common method in quantitative chemical analysis, by which the concentration of identified / known substances can be determined with very good accuracy. Potential / current is used in electrochemical analysis to reduce / electroplate and oxidize / strip the metallic components of / on a rotating disk electrode (RDE). Absorption spectrophotometry utilizes the different photophysical properties of different chemical substances. By transmitting light through the sample and analyzing the intensity of the transmission over a wide wavelength range, the concentration of a specific substance can be determined. High-performance liquid chromatography (HPLC) works by separating and confirming individual bath components. High-performance liquid chromatography analyzes organic additives, complexing agents, degradation products, and stored photoresist.

[0005] Traditionally, individual electroanalytical methods have been used to represent the concentration of each known component in an electrolyte. Designing analytical techniques or methods for each component of an electrolyte using electroanalytical techniques, high-performance liquid chromatography, titration, near-infrared spectroscopy, etc., can be time-consuming and expensive. Furthermore, some commercial additives contain two or more components that may be impossible to separate without prior knowledge of the chemicals. Monitoring the individual chemical components of an electrolyte is highly complex due to the numerous interactions that can occur between them, especially as the concentrations of the corresponding chemical components change and as the electrolyte ages. Electrolyte aging can result from the degradation of one or more of its components due to oxidative, reductive, or catalytic activity, or from interactions with the hardware or substrate or other impurities that come into contact with the electrolyte during its service life.

[0006] Therefore, there is a need for a device or system capable of monitoring and controlling electrochemical techniques in a cleanroom environment and during high-volume manufacturing (HVM) within a single structure. Furthermore, this device or system should be adaptable to different electrochemical techniques. The invention described herein fulfills these needs. Summary of the Invention

[0007] This invention discloses, in one aspect, a system for monitoring and controlling the processing of microelectronic substrates. The system is modular, flexible, and scalable, and configured to connect with similar systems to form a larger system. The system provides full access to data collected and generated through measurement and analysis methods. This enables better tagging, fault finding, and process improvement.

[0008] This invention proposes a system for monitoring and controlling substrate chemical processing, comprising a housing having at least one protective door at the front, the system further comprising: a sealed module door; a wet component cabinet constructed between at least one of the protective doors and the sealed module door; a plurality of analytical modules, each having a plurality of workstations and devices and configured for different types of analysis, the analytical modules being mounted on the sealed module door, and components of the plurality of workstations and devices being located in the wet component cabinet; an electrical cabinet disposed behind the sealed module door, the electrical cabinet being configured to include electrical components for controlling the operation of the workstations and devices; one or more chemical cabinets for storing and providing chemicals required for the analysis performed through the workstations; and a user interface for connecting to one or more computing devices, enabling monitoring and control of the analysis through the computing devices.

[0009] Furthermore, it is proposed that negative pressure be maintained in the wet component cabinet and positive pressure be maintained in the electrical cabinet. Furthermore, it is proposed that the system for monitoring and controlling the chemical processing of the substrate also includes one or more chemical buffer cabinets configured to control the amount of chemicals supplied for the analysis. Furthermore, it is proposed that the wet component cabinet, the chemical cabinet, and the chemical buffer cabinet are interconnected and share a common negative pressure environment. Furthermore, it is proposed that the chemical cabinet and the chemical buffer cabinet have one or more common protective doors or individual protective doors. Furthermore, it is proposed that one or more analytical modules in the analytical modules have a predetermined configuration and / or are pre-assembled before being installed on the sealing module door. Furthermore, it is proposed that the analytical module comprises a Lego-like structure with standard workstations and equipment mounted on it. Furthermore, it is proposed that each analytical module includes a sealing plate, and multiple workstations and equipment are mounted on the sealing plate. Furthermore, it is proposed that the sealing plate is made of metal. Furthermore, it is proposed that the sealing module door consists of a frame and the sealing plate.

[0010] Furthermore, it is proposed that: at least one of the analytical modules has one or more handles. Furthermore, it is proposed that: at least a portion of the handle is configured to be detachable. Furthermore, it is proposed that: the electrical terminals of the plurality of workstations and the devices are located in the electrical cabinet. Furthermore, it is proposed that: the sealed module door also has a blank plate. Furthermore, it is proposed that: the blank plate has the same dimensions as the plate of the analytical module. Furthermore, it is proposed that: the blank plate is configured to be replaceable by a customized analytical module. Furthermore, it is proposed that: the plurality of workstations includes one or more of a titration workstation, an electrochemical analysis loop voltammetric stripping workstation, a high-performance liquid chromatography workstation, and a spectrophotometric workstation. Furthermore, it is proposed that: the plurality of devices has one or more sampling valves configured to provide the workstation with a chemical sample for performing the analysis. Furthermore, it is proposed that: the sampling valve includes a switching mechanism for switching to a desired chemical source, the switching being performed automatically or manually by a trained operator. Furthermore, it is proposed that: the sampling valve includes a multi-way valve configured to provide the chemical sample to the workstation by means of a dispensing device and / or a pump or via pressurized liquid. Furthermore, it is stated that the multi-way valve is a six-way valve.

[0011] Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes a storage unit configured to store the configuration and parameters of the analysis performed via the workstation. Furthermore, it is proposed that the chemical buffer cabinet includes one or more chemical buffer containers storing the chemicals, which are automatically refilled from a chemical reserve container by a peristaltic pump, the reserve container being stored in the chemical cabinet. Furthermore, it is proposed that the chemical reserve container is housed in a retractable shelf. Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes a chemical batch container connected to an external chemical supply line, and the batch container is configured to reduce the effects of temperature by providing freshly filled original constituent solutions. Furthermore, it is proposed that the electrical cabinet is also configured to provide interconnectivity between the workstations for performing the analysis. Furthermore, it is proposed that the workstation also includes a dispensing device configured to dispense the chemicals required for the analysis. Furthermore, it is proposed that the dispensing device includes a bubble sensor configured to monitor the chemicals for bubbles. Furthermore, it is proposed that each sealing module door has a sealing strip around its frame, the sealing strip being used to seal the wet component cabinet relative to the electrical cabinet when the sealing module door is closed. Furthermore, it is proposed that the sealing strip is configured to maintain different pressure conditions in the wet component cabinet and the corresponding electrical cabinet. Furthermore, it is proposed that a negative pressure be maintained in the wet component cabinet to prevent chemicals from leaking from the system for monitoring and controlling substrate chemical processing into the electrical cabinet. Furthermore, it is proposed that a positive pressure be maintained in the electrical cabinet to prevent the intrusion of chemical vapors and dust. Furthermore, it is proposed that the positive pressure in the electrical cabinet be maintained by a fan provided on the upper side of the system for monitoring and controlling substrate chemical processing.

[0012] Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes an exhaust device for extracting air from the wet component cabinet and the chemical cabinet. Furthermore, it is proposed that at least one of the protective doors is equipped with a gap that allows air circulation through the suction of ambient air into the wet component cabinet. Furthermore, it is proposed that at least one of the protective doors is transparent, semi-transparent, or opaque. Furthermore, it is proposed that the protective door is designed as a foldable two-section door to reduce the space required when open. Furthermore, it is proposed that the protective door is configured to open 90 degrees. Furthermore, it is proposed that the protective door is equipped with a stop for securing the protective door in the open position. Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes a pressure sensor configured to detect pressure values ​​in the wet component cabinet and the chemical cabinet. Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes an operating indicator for displaying the pressure sensor value in a color-coded format. Furthermore, it is proposed that the wet component cabinet includes a leak sensor configured to detect leaks of chemicals from the wet component cabinet. Furthermore, it is proposed that the leakage status be displayed in a color-coded format via an optical indicator on the leakage sensor. It is also proposed that the system for monitoring and controlling substrate chemical processing further includes a safety locking mechanism for locking multiple different parts of the system, including the wet parts cabinet, the electrical cabinet, the chemical buffer cabinet, and the chemical cabinet. Furthermore, it is proposed that, to provide minimal space during operation of the system for monitoring and controlling substrate chemical processing, the computing device includes a foldable keyboard and a rotatable display. Furthermore, it is proposed that the system for monitoring and controlling substrate chemical processing also includes a slip valve block configured to externally protect the system by regulating and adjusting the flow rate in the slip valve input and output lines. The slip valve of the slip valve block has a means for measuring the flow rate to ensure that a defined flow rate value is maintained for optimal system performance. Furthermore, it is proposed that the slip valve block includes a pneumatic controller connected to the actuator circuitry and configured to automatically shut off in the event of cessation of operation.

[0013] In one aspect of this invention, the system includes: a housing having at least one protective door at a front side; a sealed module door and a wet components cabinet constructed between the at least one protective door and the sealed module door. The system also includes multiple analytical modules, each comprising multiple workstations and devices configured for different types of analysis, wherein the analytical modules are mounted at the sealed module door, and wherein components of the multiple workstations and devices are located within the wet components cabinet. The system further includes an electrical cabinet disposed behind the sealed module door, wherein the electrical cabinet is configured such that it includes electrical components for controlling the operation of the workstations and devices. The system also includes one or more chemical cabinets for storing and providing chemicals that need to be analyzed by the workstations. A user interface is configured for connection to one or more computing devices, wherein the analysis can be monitored and controlled via the computing devices.

[0014] Alternatively, negative pressure can be maintained in the wet components cabinet and positive pressure can be maintained in the electrical cabinet.

[0015] Optionally, different types of analysis include inorganic bath composition analysis and organic composition analysis.

[0016] Alternatively, different types of analysis can be characterized by different sampling rates.

[0017] In another aspect of this invention, the system also includes one or more chemical buffer cabinets configured such that the chemical buffer cabinets are controlled to analyze the amount of chemicals delivered.

[0018] Optionally, wet component cabinets, chemical cabinets, and chemical buffer cabinets can be interconnected and share a common negative pressure environment.

[0019] Optionally, chemical cabinets and chemical buffer cabinets may have one or more common or separate protective doors.

[0020] Optionally, one or more analysis modules have a predetermined configuration and / or are pre-assembled at the module door prior to installation.

[0021] Optionally, the analysis module includes a Lego-like structure and standard workstations and devices mounted on said structure.

[0022] Optionally, each analysis module includes a sealing plate and multiple workstations and devices are mounted on the sealing plate.

[0023] Alternatively, the sealing plate may be made of metal.

[0024] Optionally, the sealing module door is formed by a frame and a sealing plate.

[0025] Optionally, at least one of the analysis modules includes one or more handles, wherein at least a portion of the handle is configured such that the portion can be detached.

[0026] Optionally, the electrical terminals of multiple workstations and devices are located in an electrical cabinet.

[0027] Optionally, the sealing module door also includes a blank plate, wherein the blank plate has substantially the same dimensions as the analysis module plate, and the blank plate is configured such that it can be replaced by a custom analysis module.

[0028] Optionally, the multiple workstations include one or more of a titration workstation, an electrochemical analysis loop voltammetric stripping (CVS) workstation, a high-performance liquid chromatography (HPLC) workstation, and a spectrophotometric workstation.

[0029] According to another aspect of this invention, the multiple devices also include one or more sampling valves configured to provide chemical samples to the workstation for analysis.

[0030] Optionally, the sampling valve includes a switching mechanism for switching to the desired chemical source, wherein the switching is performed automatically or manually by a trained operator.

[0031] Optionally, the sampling valve includes a multi-way valve configured to supply a chemical sample to the workstation by means of a dispensing device, a pump, or via a pressurized liquid, wherein the multi-way valve is a six-way valve.

[0032] According to another aspect of this invention, the system also includes a storage unit configured to store configurations and parameters of an analysis performed by a workstation.

[0033] Optionally, the chemical buffer cabinet includes one or more chemical buffer containers in which chemicals are stored, wherein the chemical buffer containers are automatically refilled from chemical reserve containers stored in the chemical cabinet by a peristaltic pump.

[0034] Optionally, chemical storage containers are included in retractable shelving.

[0035] In another aspect of this invention, the system also includes a chemical bulk container connected to an external chemical supply line and configured such that the chemical bulk container reduces the effects of temperature by providing freshly filled Virgin Makeup Solution (VMS).

[0036] Optionally, the electrical cabinet is configured to control the power supplied to the workstation to ensure controlled execution of inorganic bath composition analysis and organic composition analysis.

[0037] Optionally, the electrical cabinet is also configured to provide interconnectivity between workstations for performing analysis.

[0038] Optionally, the workstation also includes a dispensing device configured to dispense small to medium quantities of chemicals required for analysis with high precision.

[0039] Optionally, the dosing device includes a bubble sensor configured to monitor the chemicals used for bubbles.

[0040] Optionally, each sealing module door includes a sealing strip around its frame to seal the wet components cabinet relative to the electrical cabinet when the sealing door is closed.

[0041] Optionally, the sealing strip is configured to maintain different pressure conditions in the wet component cabinet and the corresponding electrical cabinet.

[0042] Optionally, negative pressure can be maintained in the wet components cabinet to prevent chemicals from leaking into the electrical cabinet and from leaking out of the system.

[0043] Optionally, positive pressure is maintained in the electrical cabinet to prevent the intrusion of chemical vapors and dust, wherein the positive pressure in the electrical cabinet is maintained by a fan provided at the top of the system.

[0044] In another aspect of this invention, the system also includes an exhaust system for drawing air from wet parts cabinets and chemical cabinets.

[0045] Optionally, at least one protective door is fitted with a gap that allows ambient air to be drawn into the wet component cabinet for air circulation.

[0046] Optionally, at least one protective door is transparent, semi-transparent, or opaque.

[0047] Alternatively, the security door can be designed as a foldable two-section door to reduce the space required when open.

[0048] Optionally, the protective door is configured such that it can be opened to approximately 90 degrees.

[0049] Optionally, a stop is provided for the protective door to secure it in the open position.

[0050] According to another aspect of this invention, the system also includes a pressure sensor configured to detect pressure values ​​in the wet parts cabinet and the chemical cabinet. The system also includes an operation indicator for displaying the pressure sensor values ​​in a color-coded format.

[0051] Optionally, the wet parts cabinet includes a leak sensor configured to detect leaks of chemicals from the wet parts cabinet.

[0052] Alternatively, the leakage condition can be indicated in a color-coded format by an optical indicator on the leakage sensor.

[0053] In another aspect of this invention, the system also includes a safety locking mechanism for locking different parts of the system, including a wet parts cabinet, an electrical cabinet, a chemical buffer cabinet, and a chemical cabinet.

[0054] Optionally, the computing device includes a foldable keyboard and a rotatable display to provide a minimum space size during system operation.

[0055] In another aspect of this invention, the system also includes a slid valve block configured to protect the system from external forces, allowing the slid valve block to regulate and adjust the flow rate in the slid input and output lines, wherein the slid valve of the slid valve block has a means for measuring the flow rate to maintain a specific flow rate value for optimal system performance.

[0056] Optionally, the slid valve block includes a pneumatic controller connected to the actuator wiring and configured to automatically shut down when the pneumatic controller stops operating. Simple Explanation of the Diagram

[0057] To better understand the implementation methods and to illustrate the implementation, reference is now made to the accompanying drawings, which are purely exemplary.

[0058] With particular emphasis attached to the accompanying drawings: the details shown are merely exemplary and chosen embodiments for illustrative purposes, and are presented to provide a description of principles and concepts that is as useful and easily understood as possible. In this regard, no attempt is made to present structural details in more detail than necessary for a basic understanding; the description, taken in conjunction with the drawings, makes it clear to those skilled in the art how the different chosen embodiments can be put into practice. In the accompanying drawings:

[0059] Figure 1 shows a front view of a first system 100 for monitoring and controlling electrochemical engineering according to one aspect of the present invention;

[0060] Figure 2A shows the external dimensions of a first dual-cluster device 200a according to an embodiment of the present invention;

[0061] Figure 2B shows a schematic diagram of the second dual-cluster device 200b according to other aspects of this invention;

[0062] Figure 2C shows a schematic diagram of a third dual-cluster device 200c according to other aspects of this invention;

[0063] Figure 2D shows a schematic diagram of a single cluster device 200d according to another aspect of this invention;

[0064] Figure 3A shows an open structural diagram of the dual-cluster program control device, which illustrates the retractable shelving;

[0065] Figure 3B shows different chemical storage containers;

[0066] Figure 4 shows an open structural diagram of a program control device with an open module door;

[0067] Figure 5 shows a schematic front view of the fifth program control device 500, illustrating the different structural components;

[0068] Figure 6A shows a workstation in a wet component cabinet according to one embodiment of the present invention;

[0069] Figure 6B shows the location of the workstation sampling device at the module door in a wet component cabinet according to another embodiment of the present invention;

[0070] Figure 6C shows an exemplary location of the acidic copper workstation at the module door in the wet component cabinet;

[0071] Figure 7A shows a device in a drawer of a seventh chemical buffer cabinet 700 according to another embodiment of the present invention;

[0072] Figure 7B shows a schematic front view of the chemical buffer tank in the seventh program control unit 710;

[0073] Figure 7C shows a device in a drawer of a seventh chemical buffer cabinet 700 according to another embodiment of the present invention;

[0074] Figure 8 shows the eighth electrical cabinet 800 behind the module door of the program control device;

[0075] Figures 9A and 9B illustrate a six-way valve used in a program control device according to an embodiment of the present invention;

[0076] Figure 10 shows the operation indicator at the program control unit;

[0077] Figures 11 and 12 show the leak sensor in the wet components cabinet;

[0078] Figure 13A shows a chemical bulk container 1300;

[0079] Figure 13B shows a dispensing device including a bubble sensor for monitoring bubble liquid;

[0080] Figure 14A shows the titration workstation;

[0081] Figure 14B shows the electrochemical analysis loop voltammetric stripping workstation;

[0082] Figure 14C shows a high-performance liquid chromatography workstation;

[0083] Figures 15A and 15B illustrate the locking of different parts of the tenth program control device 1500;

[0084] Figures 16A and 16B show a foldable keyboard and a rotatable human-machine interface;

[0085] Figures 17A and 17B show the first front side 1700 and the first interface side 1710 of the slide valve block for an external protection program control device; and

[0086] Figure 18 illustrates an exemplary system for implementing various aspects of this work. Implementation

[0087] This disclosure relates to a device or system capable of monitoring and controlling electrochemical techniques within a unique structure. The system is flexible, scalable, and tailored to specific applications. It comprises a Lego-like structure on which different chemical analysis modules can be mounted. Different measurement units can be installed as modular workstations for performing different electrochemical methods. Each workstation can perform specific tasks, such as analysis, sampling, and standard creation. Therefore, the workstations can be equipped with as many identical devices and components as possible to simplify maintenance. The system can be a highly adaptable wafer-level packaging (WLP) platform supporting multiple metals.

[0088] In specific implementations of the system, process control can be achieved through liquid replenishment, solid replenishment (direct metal replenishment), discharge, and feeding to maintain degradation products and / or contaminants below a desired range, and the system can be used for the discharge and replenishment of electrochemical plating chemicals.

[0089] In other implementations of the system, the system may include software for storing workstation configurations and parameters. Workstation processes can be synchronized based on applications. The software also enables workstations to be updated, repaired, and maintained independently of each other without compromising the operation of other modules.

[0090] As required, detailed embodiments of the invention are disclosed herein. However, it should be understood that the disclosed embodiments are merely examples of the invention, and these examples can be implemented in different and alternative forms. The drawings are not necessarily to scale; some features may be exaggerated or reduced to show details of particular components. Therefore, the specific structural and functional details disclosed herein should not be construed as limiting, but rather as representative examples to teach those skilled in the art how to use the invention in different ways.

[0091] It is particularly important to note that the systems and methods disclosed herein are not limited to the construction details and arrangements of the elements or methods described in the specification or shown in the drawings and examples. The systems and methods disclosed herein can also be implemented and performed in other embodiments or in different ways and with the aid of different techniques.

[0092] Alternative methods and materials similar or equivalent to those described herein may be used in practice or in testing the embodiments disclosed herein. Therefore, the specific methods and materials described herein are for illustrative purposes only. The materials, methods, and examples are not necessarily to be construed as limiting. Therefore, different methods or components may be omitted, substituted, or added in different embodiments, as is appropriate. For example, methods may be performed in a different order than described, and different steps may be added, omitted, or combined. Furthermore, aspects and components described with respect to a particular embodiment may be combined in different other embodiments.

[0093] Referring now to Figure 1, a front view is shown of a first system 100 for monitoring and controlling electrochemical engineering, particularly for monitoring and controlling substrate chemical processing, according to one aspect of the present invention. The first system 100 includes a program control device having a housing 101 or frame divided into multiple compartments or cabinets and including (analytical) clusters (in this example, a dual-cluster configuration). The housing 101 has a first protective door 102 and a second protective door 102' with a transparent, translucent, or opaque (made of metal) exterior. The protective doors may be designed as foldable two-section doors, including a first two-section door 102a, a second two-section door 102b, a third two-section door 102'a, and a fourth two-section door 102'b, to reduce the space dimensions when open. The first protective door 102 and the second protective door 102' are preferably not sealed and allow for limited air circulation from the environment. The first protective door 102 and the second protective door 102' are equipped with gaps that allow for air circulation by drawing ambient air into the cabinet. Each cluster is configured to accommodate multiple modular workstations for performing different electrochemical methods, as described below. Housing 101 is flexible and scalable, and can accommodate fewer or more analytical clusters (additional clusters). Protective doors can be removed from hinges for servicing or maintenance work. The protective doors can be equipped with open detectors (switches) to completely or partially shut off system operation for safety reasons.

[0094] Figure 2A shows the external dimensions of the housing of a first dual-cluster device 200a according to one embodiment of the present invention. The first dual-cluster device 200a shown has structural dimensions of 1.27 × 0.56 m. Figures 2B and 2C show schematic diagrams of a second dual-cluster device 200b and a third dual-cluster device 200c with open external protective doors according to other aspects of the present invention. Figure 2D shows a schematic diagram of a single-cluster device 200d according to another aspect of the present invention. These cluster devices include buffer layers configured for process control of nested processes. It should be understood that the above dimensions and structural components are exemplary in nature and are not intended to limit the scope of the present invention. The cluster devices are flexible and occupy the required number of clusters depending on the application.

[0095] Returning to Figure 1, the program control device is connected to the human-machine interface 103 via connection medium 104. The human-machine interface 103 can be a communication device, such as a personal computer, laptop, mobile phone, tablet computer, paging device, etc. The communication device can be connected to the program control device via wired or wireless connection medium 104. Wired media can include Ethernet cables, fiber optic cables, etc. Wireless media can include one or more of the following: the Internet, Bluetooth network, wired LAN (local area network), wireless LAN, WiFi network, Zigbee network, Z-Wave network, or Ethernet. The human-machine interface 103 can be positioned near the program control device and physically fixed via a pivot handle 105, as shown in Figure 1. Alternatively, the human-machine interface 103 can be positioned away from the program control device. The human-machine interface can be connected to more than one program control device, allowing the user to control different program control devices via the same communication device. In another embodiment, two or more personal computer interfaces can be connected to a single program control device, allowing multiple operators to monitor and control the operation of the program control device.

[0096] Data on different electrochemical and analytical processes executed at the workstations, including their chemical composition and concentration, target and actual ranges, operating conditions (including operational and failure states), supplementary requirements, process times (elapsed and remaining time), and analytical results, are transmitted from the program control device to the communication device. The communication device can be configured to include a display that provides the operator with full access to data collected and generated by the measurement and analytical methods running at different workstations within the program control device. For example, the display may provide information about the liquids used in the electrochemical processes, including their lower and upper current limits, deviations from the desired range, and contamination levels. The communication device also enables process control via commands from the communication device itself or by accessing the workstations within the program control device. Furthermore, the communication device can facilitate display, troubleshooting, and process improvement.

[0097] According to one aspect of this invention, the first system 100 offers the advantage of a smaller space requirement because it can be installed close to a wall and is fully accessible from the front during operation. All internal compartments or modules of the unit are accessible from the front. The rear of the unit can be closed after assembly or repair at the workstation. The unit can also be maintained or inspected from the front, which provides convenient access for the operator.

[0098] Referring to Figure 4, an open structural image 400 of the fourth program control device 401 with an open fourth module door 402 is shown. Behind the fourth module door 402, which includes the wet component cabinet compartment for the chemical module, lies a fourth electrical cabinet 407, which mainly comprises electronic / electrical low-voltage modules (controllers, etc.). Partially assembled low-voltage modules are shown here.

[0099] The fourth module door 402 has a (rubber / silicone) sealing strip 409 around its frame 409', which provides a seal between the wet components cabinet and the electrical cabinet when the fourth module door 402 is closed.

[0100] The sealing strip 409 prevents contamination of the electronic or electrical modules by chemicals by creating different pressure conditions in the two compartments: negative pressure (relative to ambient pressure) in the wet component cabinet and positive pressure (relative to ambient pressure) in the electrical cabinet.

[0101] The fourth electrical cabinet 407 includes electronic or electrical low-voltage modules (controllers, etc.), electrical connections in the form of copper or fiber optic cables, voltage or current stabilizers, regulators, protection circuits, switches, temperature and pressure regulators, etc. The fourth electrical cabinet 407 is configured to interconnect different clusters of workstations. The fourth electrical cabinet 407 also provides connections between different workstations for performing applications. The fourth electrical cabinet 407 controls the power supplied to the different workstations to ensure controlled execution of the application. The electrical terminals of the different workstations and devices are located within the fourth electrical cabinet 407.

[0102] The wet components cabinet may preferably contain negative pressure relative to the environment to prevent chemical leaks into the electrical cabinet and from the system into the environment. During operation, the operator is protected from chemical leaks via a monitored fifth protective door 502. In the event of a leak, the liquid is collected in a monitored secondary safety container in a fifth chemical cabinet 503 for further evacuation, as shown in Figure 5.

[0103] Air in the wet parts cabinet is continuously extracted and exchanged with outside air through an outlet located at the device. Referring to Figure 5, an exhaust device 506 can be positioned on top of the fifth program control device 500 (arrows in Figure 10 indicate the locations of the outlets on the side and bottom). The outlet of this system can be connected to an external outlet system. The exhaust device 506 is connected to the fifth wet parts cabinet 501 and the fifth chemical cabinet 503. In a preferred embodiment, the air in the cabinet is exchanged at least three times per minute. The pressure in the outlet line of the exhaust device 506 is detected by a pressure sensor. In a particular embodiment, a pressure of 75 m³ / h–120 m³ / h (60–150 Pascals) is typically maintained at the sensor. If the pressure difference between the ambient pressure and the pressure in the outlet line of the exhaust device 506 exceeds the range, this is detected by the pressure sensor and displayed on the fifth operation indicator 505.

[0104] Workstations can be clustered on different sub-clusters to perform various electrochemical and analytical processes, as shown in Figures 14A, 14B, and 14C. Each workstation performs specific tasks depending on the application, such as analysis, sampling, standard creation, etc. For example, a titration workstation 1400A can be formed by clusters on module gates. Titration is an extremely common method of quantitative chemical analysis to determine the concentration (25 ml) of identified or known substances with very good accuracy. Different titration workstations can include acid-base titration workstations, photometric titration (PHT) workstations, stability indexing workstations, reduction / oxidation workstations, etc.

[0105] In an alternative implementation, the 1400B loop voltammetric stripping workstation for electrochemical analysis can be formed by clusters on module gates. In electrochemical analysis techniques, potential or current is used to reduce, coat, oxidize, or strip metallic components on or from a rotating disk electrode. Current-voltage curves (NTCs) are measured and evaluated to obtain analytical results (5 ml). Different electrochemical analysis workstations may include accelerator or leveler workstations, suppressor workstations, inorganic stability workstations, etc.

[0106] In another embodiment, the high-performance liquid chromatography (HPLC) workstation 1400C can be formed by clusters on module gates. The HPLC workstation can be used to separate and confirm individual bath components (5 ml). The workstation analyzes organic additives, complexing agents, degradation products, and stored photoresist.

[0107] During operation, depending on the workstation, liquids (chemicals, water, etc.) move within or out of a wet components cabinet. Liquids can be temporarily stored, mixed, heated, or cooled in containers as needed. All liquids can be monitored and analyzed via various sensors within the program control unit. Different workstations can be equipped with the same standard devices and components as frequently as possible to simplify maintenance. The program control unit may also include software for executing, controlling, and switching processes on the program control unit. Device configurations or parameters are stored in the program control unit's memory. The software also synchronizes processes within the cluster of workstations and between different workstations. The software also allows operators to add, remove, and modify sequences executed in workstations. The software allows operators to add, remove, and modify applications executed in workstations.

[0108] Returning to Figure 5, which shows a schematic diagram of a fifth process control device 500 with different structural components, a fifth wet component cabinet 501 is located behind the front door. This cabinet includes chemical modules (workstations), wiring, etc., mounted on a frame divided into standard sub-compartments. The fifth process control device 500 includes a fifth chemical cabinet 503, which stores different chemicals required for different processes. These chemicals are manipulated and / or refilled at the workstations. The fifth chemical cabinet 503 supplies chemicals to the workstations according to the required application and time schedule. The fifth chemical cabinet 503 stores the required chemicals in a fifth reserve container 504 (e.g., a container, bottle). The fifth reserve container can be formed of a suitable material, including but not limited to plastics, glass, steel, or other metals that do not react with or are contaminated by the stored chemicals. The fifth process control device 500 also includes a fifth buffer cabinet 507, configured to control the amount of chemicals delivered for analyzing inorganic (bath) components and for analyzing organic components. Figure 3B illustrates an exemplary first chemical storage container 303a, a second chemical storage container 303b, and a third chemical storage container 303c. For simplified and convenient loading and unloading, the chemical cabinet is preferably equipped with one or more retractable first shelves 301 and second shelves 302, as shown in Figure 3A. The first chemical storage container 303a, the second chemical storage container 303b, and the third chemical storage container 303c are located within the retractable first shelves 301 and second shelves 302. The fifth chemical cabinet 503 and the fifth buffer cabinet 507 have one or more common or separate protective doors to prevent chemical leakage and mixing. In a particular embodiment of this invention, the wet parts cabinet, the chemical cabinet, and the chemical buffer cabinet can be interconnected and share a common negative pressure environment.

[0109] Figure 6A illustrates the workstations and equipment at the sixth module door 600 of a sixth wet component cabinet according to one embodiment of the present invention. In a preferred embodiment, the sixth wet component cabinet includes two pre-assembled fourth workstations 604 and sixth workstations 606 for inorganic and organic analyses. Blank sections 608 or blank plates 608' may also be provided at the sixth module door 600 for user-customized options, allowing users to install additional modules from a list of provided modules. Blank sections 608 or blank plates 608' have substantially the same dimensions as the analytical module plates. Additional modules can be provided to support ongoing inorganic or organic analyses. Furthermore, additional modules can perform applications different from the inorganic and organic analyses being conducted in the fourth workstation 604 and sixth workstation 606.

[0110] The fourth workstation 604 and the sixth workstation 606 may have a predetermined configuration (third contact ③ and fourth contact ④) and are pre-assembled and installed at the sixth module door 600. Each fourth workstation 604 or sixth workstation 606 may have one or more chemical analysis modules 610. The division between modules is usually virtual. The sixth module door 600 may have handles 612 on both sides of the door to mount the workstation modules in the door frame. After the chemical analysis modules 610 are installed, the handles are removed from the door, leaving only the single, retained handle 612 for opening and closing the door. The workstations and equipment may be mounted on metal fourth sealing plates 604' and sixth sealing plates 606', which are less expensive than specialized clean plastic. The fourth sealing plates 604' and sixth sealing plates 606' may be made of metal cladding. The outer door may also be made of metal, smaller in size, and can be opened 90 degrees by means of a stop to allow access to the system.

[0111] Each fourth workstation 604 or sixth workstation 606 may include one or more first sampling valves 614a and second sampling valves 614b, the sampling valves being configured to provide chemical samples to the workstation. For sampling, the sampling valve is switched to the desired sample source. Switching of the sampling valves can be performed manually by a user trained in the operating procedures. Switching can be performed via a switch or lever provided in the workstation. Alternatively, switching can also be performed via a communication device (see Figure 1). Furthermore, the switching of the sampling valves can be an automatic process, which is related to the chemical sample required for the application to be performed. Figure 6B shows the first sampling valve position 616a and the second sampling valve position 616b for analyzing inorganic or organic additives.

[0112] Figures 9A and 9B illustrate a six-way valve (and nineteenth contact A and twentieth contact B) used in a programmable control device for transferring liquid via a dispensing device, pump, or pressurized liquid. The six-way valve can serve as a sampling valve for sampling from different sources, distributing water to different targets, etc. In one embodiment, the ninth valve 902 has an upright, 1 / 4-port valve type, and the tenth valve 904 has a laterally assembled 1 / 8-port valve type. Depending on the application, the valves can be used in combination or as standalone devices. Furthermore, different wiring and port sizes are used at the input terminals depending on the expected flow rate. The output terminals are connected via wiring, for example, 2 / 3 mm wiring. The six-way valve is controlled by its own control board, which is integrated into the Controller Area Network (CAN) bus.

[0113] Returning to Figure 6A, chemical samples can be provided from chemical storage containers stored in a chemical cabinet. Samples can be provided to workstations 604 and 606 at different sampling rates for inorganic and organic analysis. In this scenario, two separate lines can be provided from the chemical source to control sample delivery to the inorganic and organic workstations. In one embodiment, inorganic analysis is faster than organic analysis, with samples taken from the source every 5 minutes. Alternatively, organic analysis can be faster than inorganic analysis. Furthermore, sampling rates are required for both inorganic and organic analyses. In this case, a single line can be used to direct samples from the chemical source to workstations 604 and 606.

[0114] Figure 6C shows an exemplary acidic copper workstation device location 618 on the module door in a wet component cabinet. The concentration of copper(II) in the copper plating bath is determined by spectrometry. The concentration of sulfuric acid in the copper plating bath is determined by conductivity measurement. Table 1 below shows exemplary devices in the acidic copper workstation: Table 1: Acidic copper workstation device. Name in program control device Device type Function Stepper pump sampling peristaltic pump The sample is fed into the cuvette using a conductivity cell. Distribution valve Three-way valve Provide deionized water, samples, or air. conductivity cells Equipped with conductivity and temperature sensors - Conductivity measurement unit - - Spectrometer Spectrometer - cuvette holder Holder with flowable cuvette and LED light source - water valve Six-way valve Provide deionized water to rinse the pool

[0115] In an alternative implementation, the workstation device may be a chloride workstation device, an accelerator and leveler device, a suppressor device, or other devices required for inorganic or organic analysis.

[0116] Figure 7A shows a seventh chemical buffer cabinet 700 (and first contact ①, third contact ③, fourth contact ④, sixth contact ⑥, twelfth contact 2a and thirteenth contact 2b, fifteenth contact 5a and sixteenth contact 5b) that controls the amount of chemicals to be delivered. The seventh chemical buffer container 702 of the seventh chemical buffer cabinet 700 is a temporary storage container for chemicals used in inorganic and organic analysis. The seventh chemical buffer container 702 is automatically filled from the chemical reserve container in the fifth chemical cabinet 503 (see Figure 5) by a peristaltic pump. Figure 7C shows an eighth chemical buffer container 722 and container pumps 724 and connecting lines 726 for each container (and first contact ①, second contact ② and third contact ③).

[0117] The seventh chemical buffer container 702 includes one or more of the following features: - Associated waste and fill ports, -250ml capacity, - Precise volume control is achieved by monitoring material level points using ultrasonic sensors. - No mixer.

[0118] If no chemicals are available in the seventh chemical buffer container 702, the relevant workstation is blocked and the operator is notified via alarm. A minimum level or minimum quantity of chemicals (e.g., 1000 ml or 250 ml) should be created in the seventh chemical buffer container 702 to allow sufficient time to switch to a container containing the chemicals.

[0119] Chemical container 704 with magnetic stirrer may include one or more of the following features: -1000ml capacity, - Filling and draining from above via lines, - A mixer for homogenizing mixtures, up to 400 rpm.

[0120] Figure 7B shows the eighth chemical buffer tank 712 of the seventh program control device 710.

[0121] Figure 8 shows the eighth electrical cabinet 800 (and the eighth contact ⑧ and the ninth contact ⑨) behind the module door of the program control device. The eighth electrical cabinet 800 includes electronic or electrical low-voltage modules (regulators, etc.), electrical connections in the form of copper or fiber optic cables, voltage or current stabilizers, regulating mechanisms, protection circuits, switches, temperature and pressure regulators, etc. The eighth electrical cabinet 800 is configured to interconnect different clusters of workstations. The eighth electrical cabinet 800 also provides connections between different workstations to execute applications. The eighth electrical cabinet 800 controls the power supplied to the different workstations to ensure controlled execution of applications.

[0122] Figure 10 shows information about the outlet value on the tenth operating indicator 1001, which can display information in a color-coded format. Outlet values ​​within this range are shown, for example, in green (1002), while outlet values ​​outside this range are shown in red (1003). Negative pressure monitoring (1000) is achieved by a pressure sensor installed in the outlet line.

[0123] Figure 11 shows the first leak sensor 1101 in the tenth wet parts cabinet 1100. The first leak sensor 1101 detects leaks of liquid (chemicals, water, etc.) from the wet parts cabinet. A green light signal is displayed as long as the first leak sensor 1101 does not detect any liquid. As shown in Figure 12, a red light signal 1201 is displayed if the second leak sensor 1200 reacts. When the red light signal is displayed, one or more of the following actions can be performed automatically: - Immediately disconnect the actuator circuit; - No chemicals were pumped into the workstation with the wet components cabinet; - External supply lines for filling bulk containers are shut down; - All ongoing analysis and repopulation tasks were interrupted; - The traffic light turns red and the horn sounds; - A signal output notifies the external receiver that the program control device is no longer available. The signal output can be displayed on the connected communication device.

[0124] Figure 13A shows a bulk chemical container 1300. The bulk chemical container 1300 is a buffer container connected to an external chemical supply line 1306. The primary function of the buffer container is to reduce the effects of temperature by providing freshly filled original constituent solutions. The buffer container does not need to be manually filled or replaced; instead, it is filled via the chemical supply line 1306 provided by the operating company. The bulk chemical container 1300 is directly connected to the external facility supply unit via a dry contact signal, which includes: - Request the original solution composition to be refilled. - There is an external original composition solution supply device.

[0125] The chemical bulk container 1300, filled via pressurized line 1308, is secured by a first valve block 1302, similar to a slip-through bypass. The chemical bulk container 1300 is permanently fixed in the program control unit and cannot be removed without tools. The chemical bulk container 1300 is monitored by ultrasonic sensor 1304 for precise volume control.

[0126] Figure 13B illustrates a first dispensing device 1310 used in a programmable control device to dispense small to medium volumes with high precision. The first dispensing device 1310 includes a first bubble sensor 1312 to monitor the liquid for bubbles.

[0127] Figures 15A and 15B illustrate the security locking of different parts of the tenth program control device 1500. Figure 15A shows access to the first chemical cabinet 1502 via a first cabinet key 1508 for chemical replacement. The first cabinet key 1508 is inserted into the first key portion 1510 and / or the second key portion 1512 of the first chemical cabinet 1502 for access. A fifth key 1506 may also be provided for accessing and controlling the operating mode of the workstation in the first wet parts cabinet 1504. The fifth key 1506 is inserted into the third key portion 1514 of the first wet parts cabinet 1504 for access. Figure 15B shows access to the second wet parts cabinet 1520 and the electrical cabinet via a second cabinet key 1522. The second cabinet key 1522 is inserted into (1.) the fourth key portion 1524 of the second wet parts cabinet 1520 and / or placed into (2.) the fifth key portion 1526 for access (3.). The second cabinet key 1522 also provides access to the electrical cabinet, as the electrical cabinet is located behind the module door of the second wet parts cabinet 1520.

[0128] Figure 16A shows a first keyboard 1602 connected to the human-machine interface (HMI). The first keyboard 1602 is configured to be foldable to require minimal space during system operation. A folded second keyboard 1604 provides the operator with more workspace. Figure 16B shows a rotatable HMI, such as a desktop computer, laptop computer, etc. The HMI is shown in a first operating position 1606 with the keyboard touchpad unit extended. This first operating position is a standard position used in different operating types. In the second operating position 1608, the HMI is shown in a resting position with the folded keyboard touchpad unit. When not in use, the HMI must be in a resting position to maintain a minimal work area in front of the electrical cabinet containing components with pilot voltage. For this purpose, the keyboard touchpad unit is folded and the display arm is positioned such that the HMI is arranged parallel to the front of the program control unit. This ensures unobstructed access to the mains voltage operation panel of the program control unit. In the third operating position 1610, the HMI is shown in a maintenance position.

[0129] Figures 17A and 17B show the first front side 1700 and the first interface side 1710 of a slid valve block (as well as first contact ①, second contact ②, third contact ③, fourth contact ④, fifth contact ⑤, sixth contact ⑥, seventh contact ⑦, and eighth contact ⑧). The slid valve block is used to protect the programmable control unit by regulating and adjusting the flow rate in the slid input and output lines. The slid valve of the slid valve block provides a flow measurement device to ensure that the flow rate value determined for optimal system performance is maintained. The slid valve block includes a pneumatic controller connected to the actuator line and automatically closes in the event of cessation of operation (e.g., in the event of a leak). A manual shut-off valve 1702 in an open position is shown on the first front side 1700. The manual shut-off valve 1702 allows the system operator to close the valve if a part of the system fails. External flow setting is achieved by a needle valve 1704 when needed.

[0130] The first interface side 1710 includes one or more of the following components: -First internal interface 1712; -Second internal interface 1714; -Input-side pneumatic valve 1716; - Input line 1718 from production equipment; - Output line 1720 to production tools; and - Output side pneumatic valve 1722.

[0131] Figure 18 illustrates an exemplary second system for implementing different aspects of this invention. The second system includes a data processor 1802, system memory 1804, and a system bus 1816. The system bus 1816 includes, but is not limited to, the coupling connection between system components of the system memory 1804 and the data processor 1802. The data processor 1802 can be one of different available processors. The data processor 1802 relates to an integrated circuit or other electronic device (or set of devices) capable of performing operations with at least one instruction, including but not limited to a Reduced Instruction Set Computing (RISC) processor, a Complex Instruction Set Computer (CISC) microprocessor, a microcontroller unit, a CISC-based central processing unit, and a digital signal processor. Furthermore, different functional aspects of the data processor 1802 can be implemented solely as software or firmware integrated with the processor. Dual microprocessors and other multiprocessor architectures can also be used as the data processor 1802.

[0132] The system bus 1816 can be one of a variety of bus structures, including a memory bus or memory controller, a peripheral bus or external bus, and / or a region bus using a variety of available bus architectures known to those skilled in the art.

[0133] System memory 1804 may include computer-readable storage media, including volatile memory and non-volatile memory. Non-volatile memory stores the underlying input / output system, which includes low-level protocols for transferring information between components within the second system. Non-volatile memory may include, but is not limited to, read-only memory, programmable read-only memory, electrically programmable read-only memory, electrically erasable programmable read-only memory, or flash memory. Volatile memory includes random access memory (RAM) that acts as an external cache memory. RAM is available in various forms, such as static random access memory (SRAM), dynamic random access memory (DRAM), synchronous dynamic random access memory (DRAM), double data rate SRAM, extended SRAM, synchronous linked DRAM, direct bus RAM, direct bus DRAM, and bus DRAM.

[0134] System storage 1804 includes operating system 1806, which performs functions such as managing the resources of the second system, establishing user interfaces, and executing and providing services for application software. System applications 1808, system modules 1810, and system data 1812 provide different functions to the second system.

[0135] The second system also includes a disk drive 1814. The disk drive 1814 includes, but is not limited to, devices such as disk drives, floppy disk drives, magnetic tape drives, Jaz drives, Zip drives, LS-100 drives, flash memory cards, or memory sticks. Additionally, the disk drive 1814 may include a standalone storage medium or a storage medium combined with other storage media, including, but not limited to, optical disc drives such as mini-CD read-only drives, writeable CD drives, rewritable CD drives, or digital multifunction disk read-only drives.

[0136] Users input commands or information into the second system via input devices(s) 1824. Input devices 1824 include, but are not limited to, pointing devices (e.g., mouse, trackball, pen, etc.), keyboards, microphones, joysticks, satellite antennas, scanners, TV tuners, digital cameras, digital video cameras, webcams, and / or other similar devices. Input devices 1824 are connected to data processor 1802 via system bus 1816 and via one or more interface ports 1822. The one or more interface ports 1822 include, for example, serial ports, parallel ports, game connection ports, and general serial buses.

[0137] Output devices 1820, such as monitors, speakers, and printers, are used to provide output from data processor 1802 to a user. Alternatively, a general-purpose serial bus port can be used as an input device 1824 to provide input to a second system and output information from the second system to output device 1820. Output device 1820 is connected to data processor 1802 via output adapter 1818 of system bus 1816. The output adapter may include, for example, video and audio cards, which provide a connection mechanism between output device 1820 and system bus 1816.

[0138] The second system can communicate with the remote communication device 1828 to exchange information. The remote communication device 1828 can be a personal computer, server, router, network PC, workstation, microprocessor-based device, cellular phone, laptop, tablet computer, paging device, peer-to-peer device, or other public network node, etc.

[0139] Network interface 1826 includes wired and / or wireless communication networks, such as local area networks (LANs) and wide area networks (WANs). LAN technologies include fiber optic distributed data interfaces (DGAs), copper distributed data interfaces (CGAs), Ethernet, scepter rings, etc. WAN technologies include, but are not limited to, point-to-point connections, line-switched networks such as Integrated Services Digital Networks (ISDN) and its variants, packet-switched networks, and digital subscriber lines.

[0140] Although the preferred embodiments and advantages of this invention have been disclosed in the detailed description above, this invention is not limited to the preferred embodiments.

[0141] As will be apparent to those skilled in the art, this invention can be readily made in other specific forms without departing from its essential characteristics. Therefore, this embodiment should be considered illustrative only and not restrictive, and all variations derived therefrom are intended to be incorporated into the embodiment.

[0142] 100: System 101: Shell 102, 102', 502: Protective doors 102a, 102b, 102'a, 102'b: Two-section doors 103: Human-Computer Interface 104: Connection Medium 105: Handle 200a, 200b, 200c, 200d: Dual-cluster devices 301, 302: Shelves 400: Structural Image 401, 500, 710, 1500: Programmable control devices 402, 600: Module door 407, 800: Electrical cabinets 409: Sealing strip 409': Frame 501, 1100, 1504, 1520: Wet Components Cabinet 503, 1502: Chemical cabinets 303a, 303b, 303c, 504: Storage containers 505, 1001: Operation Indicators 506: Exhaust system 507, 700, 712: Buffer cabinets 604, 606: Workstations 604', 606': Sealing plate 608: Blank Section 608': Blank board 610: Chemical Analysis Module 612 controller 614a, 614b: Sampling valves 616a, 616b: Sampling valve position 702, 722: Buffer containers 704: Chemical Containers 724: Container Pump 726: Connecting cable 902, 904: Valves 1000: Negative pressure monitoring 1002: Display 1003: Illustration 1101, 1200, 1304, 1312: Sensors 1201:Light signal 1300: Batch Container 1302: Valve block Routes 1306, 1308, 1718, and 1720: 1310: Measuring device 1400A: Titration Workstation 1400B: Loop Voltammetric Stripping Workstation 1400C: High-performance liquid chromatography workstation 1506, 1508, 1522: Keys 1510, 1512, 1514, 1524, 1526: Key parts 1602, 1604: Keyboard 1606, 1608, 1610: Running position 1700: Front 1702: Gate Valve 1704: Needle Valve 1710: Interface Side 1712, 1714: Internal Interface 1716, 1722: Pneumatic valves 1802: Data Processor 1804: System Storage 1806: Operating System 1808: System Application 1810: System Module 1812: System Data 1814: Disk Storage 1816: System Bus 1818: Adapter 1820: Output device 1822: Interface Port 1824: Input device 1826: Network Interface 1828: Communication device ①、③、④、⑤、⑥、⑦、⑧、⑨、2a、2b、5a、5b: Contact points

Claims

1. A system for monitoring and controlling a substrate chemical process, comprising a housing, the substrate chemical process being a microelectronic substrate chemical process, the housing having at least one protective door on a front side, the at least one protective door being non-sealed and allowing limited air circulation from the environment, wherein the system for monitoring and controlling the substrate chemical process further comprises: Sealed module door; A wet component cabinet, the wet component cabinet being constructed between at least one of the protective doors and the sealing module door; Multiple analytical modules, each having multiple workstations and devices, and configured for different types of analysis, are mounted on the sealed module door, with components of the multiple workstations and devices located within the wet components cabinet; an electrical cabinet disposed behind the sealed module door, comprising electrical components for controlling the operation of the workstations and devices; and one or more chemical cabinets for storing and supplying chemicals required for the analysis performed via the workstations. A user interface for connecting to one or more computing devices, enabling monitoring and control of the analysis via the computing devices; maintaining a negative pressure relative to ambient pressure in the wet components cabinet and a positive pressure relative to ambient pressure in the electrical cabinet.

2. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein at least one of the protective doors is transparent.

3. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein at least one of the protective doors is semi-transparent.

4. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein at least one of the protective doors is opaque.

5. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the system for monitoring and controlling chemical processing of a substrate further comprises one or more chemical buffer cabinets configured to control the amount of chemicals supplied for the analysis.

6. The system for monitoring and controlling chemical processing of a substrate according to claim 5, wherein the wet component cabinet, the chemical cabinet, and the chemical buffer cabinet are interconnected and have a common negative pressure environment.

7. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein each of the analytical modules includes a sealing plate, and a plurality of the workstations and the device are mounted on the sealing plate.

8. The system for monitoring and controlling chemical processing of a substrate according to claim 7, wherein the sealing plate is made of a metal cladding.

9. The system for monitoring and controlling substrate chemical processing according to claim 1, wherein the system for monitoring and controlling substrate chemical processing further includes a pressure sensor configured to detect pressure values ​​in the wet parts cabinet and the chemical cabinet.

10. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the wet component cabinet includes a leak sensor configured to detect leaks of chemicals from the wet component cabinet.

11. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the protective door on the front side of the housing is designed as a foldable two-section door to reduce the space required when open.

12. The system for monitoring and controlling chemical processing of a substrate according to claim 11, wherein the protective door is configured to open 90 degrees.

13. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the protective door is equipped with a stop for securing the protective door in an open position.

14. The system for monitoring and controlling the chemical processing of a substrate according to claim 1, wherein the sealing module door further comprises a blank plate that can be replaced by a customized analysis module.

15. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the workstation includes a dispensing device configured to dispense the chemicals required for the analysis, the dispensing device including a bubble sensor for monitoring the chemicals for bubbles.

16. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein the plurality of said workstations includes one or more of a titration workstation, an electrochemical analysis loop voltammetric stripping workstation, a high-performance liquid chromatography workstation, and a spectrophotometric workstation.

17. The system for monitoring and controlling chemical processing of a substrate according to claim 1, wherein a plurality of said devices have one or more sampling valves configured to provide the workstation with a chemical sample for performing said analysis.

18. The system for monitoring and controlling chemical processing of a substrate according to claim 17, wherein the sampling valve includes a switching mechanism for switching to a desired chemical source, the switching being performed automatically or manually by a trained operator.

19. The system for monitoring and controlling chemical processing of a substrate according to claim 17, wherein the sampling valve includes a multi-way valve configured to provide a chemical sample to the workstation by means of a dosing device and / or a pump or via a pressurized liquid.

20. The system for monitoring and controlling chemical processing of a substrate according to claim 19, wherein the multi-way valve is a six-way valve.

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