wafer support frame

Abstract

A wafer support frame includes a base and a plurality of support arms. The base includes a base top surface. The support arms are spaced apart on the base top surface. Each support arm includes a main arm body, a limiting block disposed on the main arm body, and a top support block disposed on the main arm body. The main arm body has a top surface. The limiting block is disposed on the top surface and has a limiting slope inclined to the top surface and a clearance surface connecting the limiting slope and the top surface. The limiting slope extends downward and inward relative to the top surface. The limiting slope has a bottom edge adjacent to the top surface. The clearance surface connects the bottom edge of the slope and the top surface. A first included angle can be defined between the limiting slope and the clearance surface. The first included angle is less than 180°. The top support block is disposed on the top surface and is located radially inside the limiting block.

Claims

1. A wafer support frame, comprising: a base including a base top surface; and a plurality of support arms spaced apart on the base top surface, each support arm including a main arm body, a limiting block disposed on the main arm body, and a top support block disposed on the main arm body, the main arm body having an arm top surface, the limiting block being disposed on the arm top surface and having a limiting inclined surface inclined to the arm top surface, and a clearance surface connecting the limiting inclined surface and the arm top surface, the limiting inclined surface extending downward and inward relative to the arm top surface, the limiting inclined surface having a bottom edge adjacent to the arm top surface, the clearance surface connecting the bottom edge of the inclined surface and the arm top surface, a first included angle being defined between the limiting inclined surface and the clearance surface, the first included angle being less than 180°, and the top support block being disposed on the arm top surface and located radially inside the limiting block.

2. The wafer support as described in claim 1, wherein, A second included angle can be defined between the avoidance surface and the top surface of the arm, and the second included angle is not greater than 90°.

3. The wafer support as described in claim 2, wherein, The avoidance surface and the top surface of the arm can be used to define an avoidance space.

4. The wafer support as described in claim 2, wherein, The main arm includes a vertical arm extending upward from the top surface of the base, and a horizontal arm connected to the top of the vertical arm and extending radially inward, the horizontal arm having the top surface of the arm.

5. The wafer support as described in claim 1, wherein, The top support block has a support surface that is hemispherical.

6. The wafer support frame as claimed in claim 1, comprising three support arms disposed at equal angular intervals on the top surface of the base.

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