HIGH-TEMPERATURE ENDOSCOPY LIGHTS ARE USED TO PREVENT IMPURITIES FROM THE EQUIPMENT FROM DEPOSITING IN THE IRON.

VN10061441BActive Publication Date: 2026-10-01HANWHA SOLUTIONS CORP
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Patent Information

Application Number
VN1202304218
Authority / Receiving Office
VN · VN
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-07-06
Publication Date
2026-10-01
Estimated Expiration
2042-07-06
Patent Text Reader

Abstract

The invention relates to a high-temperature endoscope of a flue gas development device in which the deposition of impurities is prevented by a construction that increases the flow rate of inert gas to prevent the deposition of impurities. The high-temperature endoscope prevents the deposition of impurities of the flue gas development device, according to a design implementation which may include: a frame extending into the chamber of the flue gas development device with an exhaust port located at the end of it through which inert gas is discharged; a lens fitted at the center of the end of the frame and protected by inert gas discharged from the exhaust port; and a guide tube fitted on the outer surface of the frame with a guide extending from the end of the frame to guide the inert gas to prevent the deposition of impurities on the lens by increasing the flow rate of inert gas.
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