Gas treatment facility and gas treatment facility method

Abstract

This gas treatment facility comprises: a dust collection filter device; and a reactant supply machine that can supply, into gas to be recovered, a reactant capable of reacting with the gas while in powder form. The dust collection filter device is provided with: a case in which there are formed an inlet through which gas flows in and an outlet through which gas flows out; and a dust collection filter that partitions the interior of the case into an inlet-side space on the inlet side and an outlet-side space on the outlet side. The reactant supply machine can supply the reactant into the gas line or into the inlet-side space, the reactant having been subjected to desorption treatment in which the gas to be recovered that is adsorbed in response to the reactant is desorbed from the reactant.

Description

Gas treatment facility and gas treatment facility method

[0001] This application claims priority to Japanese Patent Application No. 2024-019352, filed February 13, 2024, the contents of which are incorporated herein by reference.

[0002] In recent years, from the perspective of carbon neutrality, carbon dioxide (CO ２ ) concentration has been attracting attention. From the viewpoint of reducing the concentration of carbon dioxide in the atmosphere, various devices that capture carbon dioxide from exhaust gases are known. One known device for capturing carbon dioxide is DAC (Direct Air Capture). In DAC, carbon dioxide contained in the atmosphere introduced into an adsorption chamber is adsorbed by an adsorbent, and then the adsorption chamber is depressurized or heated, so that the carbon dioxide desorbed from the adsorbent is sucked outside or stored for effective use.

[0003] For example, Patent Document 1 describes a vacuum unit to which DAC is applied. In this vacuum unit, an adsorption structure is disposed in the internal space of a vacuum chamber. In the vacuum chamber, airflow is brought into contact with the adsorption structure, thereby causing carbon dioxide to be adsorbed by the adsorption structure.

[0004] U.S. Pat. No. 10,232,305

[0005] However, in the structure described in Patent Document 1, a block-shaped adsorption structure needs to be formed by coating a substrate such as a honeycomb with a reactant capable of adsorbing carbon dioxide. Therefore, when heating or decompressing, the entire adsorption structure, including the substrate, needs to be heated or decompressed. As a result, the processing time and energy loss required for desorbing carbon dioxide are significant. Thus, it is desirable to reduce the loss caused by desorbing the target gas contained in the gas.

[0006] The present disclosure provides a gas processing facility and a gas processing facility method that can separate a target gas to be recovered from a gas while suppressing loss.

[0007] The gas processing equipment according to the present disclosure comprises a dust collecting filter device, a gas line capable of introducing a gas containing a gas to be collected into the dust collecting filter device, and a reactant supply machine capable of supplying a powdered reactant capable of reacting with the gas to be collected into the gas, wherein the dust collecting filter device comprises a case having an inlet through which the gas flows in and an outlet through which the gas flows out, and a dust collecting filter that divides the inside of the case into an inlet-side space on the inlet side and an outlet-side space on the outlet side, the gas line is connected to the inlet of the dust collecting filter device, and the reactant supply machine is capable of supplying the reactant into the gas line or the inlet-side space, the reactant having been subjected to a desorption process that desorbs the gas to be collected that has reacted with and adsorbed to the reactant.

[0008] Furthermore, the gas processing equipment method according to the present disclosure includes a reactant supply step of supplying a powdered reactant capable of reacting with the gas to be collected to a gas circulating through a gas line and containing the gas to be collected, and a collection step of using a dust collection filter device equipped with a dust collection filter to collect the powdered reactant that has flowed into the dust collection filter device, wherein in the reactant supply step, the reactant is supplied after a desorption process is performed to desorb from the reactant the gas to be collected that has reacted with and adsorbed to the reactant.

[0009] According to the gas processing facility and gas processing facility method of the present disclosure, it is possible to separate the target gas to be recovered from the gas while suppressing loss.

[0010] FIG. 1 is a schematic diagram showing a gas processing facility in a first embodiment according to the present disclosure; FIG. 2 is a flow diagram showing a gas processing facility method in a first embodiment (second embodiment, third embodiment, and sixth embodiment) according to the present disclosure; FIG. 3 is a schematic diagram showing a gas processing facility in a second embodiment according to the present disclosure; FIG. 4 is a schematic diagram showing a gas processing facility in a third embodiment according to the present disclosure; FIG. 5 is a schematic diagram showing a gas processing facility in a fourth embodiment according to the present disclosure; FIG. 6 is a flow diagram showing a gas processing facility method in a fourth embodiment according to the present disclosure; FIG. 7 is a schematic diagram showing a gas processing facility in a fifth embodiment according to the present disclosure; FIG. 8 is a flow diagram showing a gas processing facility method in a fifth embodiment according to the present disclosure; FIG. 9 is a schematic diagram showing a gas processing facility in a sixth embodiment according to the present disclosure.

[0011] Hereinafter, embodiments for carrying out an absorption tower, a gas treatment facility, and a gas treatment facility method according to the present disclosure will be described with reference to the accompanying drawings. However, the present disclosure is not limited to only these embodiments.

[0012] First Embodiment (Gas Treatment Facility) The gas treatment facility 100 is a facility that treats gas EG from a gas generation source 1. Examples of the gas generation source 1 include a waste incinerator, a coal- or natural gas-fired power plant, a gas turbine, a gas engine, a cement plant, a steel plant, and a glass melting plant. The gas EG from the gas generation source 1 contains a gas to be recovered, ash, heavy metals, and the like. The gas to be recovered includes carbon dioxide (CO2), nitrogen oxides (NOx) such as nitric oxide (NO), sulfur oxides (SOx) such as sulfur dioxide (SO2), and hydrogen sulfide (HS). The gas treatment facility 1 may be a facility that is external to the gas treatment facility 100 and that feeds air into the gas treatment facility 100. In other words, the gas treatment facility 100 treats exhaust gases emitted from various facilities and air as gases.

[0013] As shown in FIG. 1 , the gas processing facility 100 in this embodiment includes a dust collection filter device 10, a gas line 2, a treated gas line 2t, a suction blower 4, a reactant supply device 20, a reactant return line 3, a destination switching unit 31, a new reactant supply unit 200, a gas information acquisition unit 7, and a control unit 5.

[0014] The dust collecting filter device 10 includes a case 11, a dust collecting filter 13 capable of collecting powder and solid matter, a backwash device 14, and a discharger 15. Here, the powder includes powdered reactant RS that has passed through the gas line 2 and has already adsorbed the gas to be collected, and unreacted powdered reactant RS. In addition, the solid matter includes clumps of impurities such as dust and PM that have adhered to the dust collecting filter 13 other than the reactant RS, as well as clumps of ash and heavy metals.

[0015] The case 11 is formed with an inlet 11i through which gas flows in and an outlet 11o through which gas flows out. The fibers constituting the dust collecting filter 13 may be, for example, glass fiber, ceramic fiber, polypropylene, nylon, acrylic, polyester, aramid, polyimide, PPS, PTFE, etc. The dust collecting filter 13 is arranged so as to partition the interior of the case 11 into an inlet-side space 12i closer to the inlet 11i relative to the dust collecting filter 13 and an outlet-side space 12o closer to the outlet 11o relative to the dust collecting filter 13.

[0016] The backwashing device 14 sends high-pressure gas (e.g., high-pressure air) to the outlet-side space 12o in the case 11 so that the outlet-side space 12o has a higher pressure than the inlet-side space 12i, thereby making it possible to separate powder and solid matter captured by the dust collecting filter 13 from the dust collecting filter 13. The backwashing device 14 has a backwashing high-pressure gas tank 14a, a high-pressure gas guide pipe 14b that sends the high-pressure gas in the backwashing high-pressure gas tank 14a to the dust collecting filter 13 so that the high-pressure gas flows from the outlet-side space 12o toward the inlet-side space 12i in the case 11, and an on-off valve 14c provided in the high-pressure gas guide pipe 14b.

[0017] The discharger 15 can be detached from the dust collecting filter 13 by the operation of the backwash device 14, and can discharge to the outside the powder and solid matter that has fallen through the inlet side space 12i in the case 11. Examples of such a discharger 15 include a rotary valve and a screw conveyor. The discharger 15 is connected to the reactant return line 3.

[0018] One end of the gas line 2 is connected to the gas generation source 1. The other end of the gas line 2 is connected to an inlet 11i of the dust collecting filter device 10. This gas line 2 makes it possible to introduce the gas EG from the gas generation source 1 into the dust collecting filter device 10.

[0019] One end of the treated gas line 2t is connected to the outlet 11o of the dust collecting filter device 10. The other end of the treated gas line 2t is connected to an external discharge destination. This treated gas line 2t makes it possible to discharge the treated gas EG, which is the gas EG that has passed through the dust collecting filter device 10, to the outside.

[0020] The suction blower 4 is disposed midway along this treated gas line 2t. If the treated gas EG can be exhausted from the dust collecting filter device 10 without the suction blower 4, this suction blower 4 is not necessary. In that case, the treated gas line 2t itself does not have to be disposed. Furthermore, even when the suction blower 4 is disposed, the suction blower 4 is not limited to being disposed on the treated gas line 2t. The suction blower 4 may be disposed on the gas line 2.

[0021] The reactant supply device 20 is capable of supplying a reactant RS capable of reacting with the gas to be recovered into the gas line 2 or the inlet-side space 12i. The reactant supply device 20 supplies the reactant RS that has been subjected to a desorption treatment. The reactant RS is in a powder form with an average particle size of 1 mm or less. Here, the average particle size refers to, for example, the median diameter indicated by d50. Examples of the reactant RS include zeolite, metal organic frameworks (MOFs), amine compounds, alkali metal compounds, and hydrated lime. The desorption treatment is a process in which the gas to be recovered that has reacted with and adsorbed to the reactant RS is desorbed from the reactant RS.

[0022] The reactant supply device 20 of this embodiment has a storage section 21 capable of storing the reactant RS, a supply section 22 capable of supplying the reactant RS stored in the storage section 21 into the gas EG, and a desorption section 23 capable of performing a desorption process on the reactant RS placed in the storage section 21.

[0023] The storage section 21 is a hopper capable of storing the reactant RS. The reactant RS is supplied to the storage section 21 from the reactant return line 3 and the new reactant supply section 200. That is, the reactant RS that has been supplied to the gas line 2 from the reactant return line 3 at least once and passed through the dust collecting filter device 10 is supplied to the storage section 21. Furthermore, new reactant RS is supplied to the storage section 21 from the new reactant supply section 200. Here, the new reactant RS refers to unused reactant RS (which may have adsorbed some of the gas to be recovered via the air), and is reactant RS that has never passed through the gas line 2 or the dust collecting filter device 10. Furthermore, the storage section 21 is connected to a gas discharge line 24 that discharges gas (e.g., carbon dioxide) desorbed from the reactant RS by the desorption process to the outside.

[0024] The supply unit 22 is connected to the gas line 2. The supply unit 22 supplies a fixed amount of the reactant RS from the storage unit 21 into the gas line 2. The supply unit 22 is, for example, a rotary feeder, and is capable of adjusting the supply amount of the reactant RS by changing the rotation speed.

[0025] The desorption unit 23 desorbs the target gas to be collected from the reactant RS arranged in the storage unit 21. The desorption unit 23 of this embodiment desorbs the target gas to be collected from the reactant RS by heating as a desorption process. As a desorption process, the reactant supply device 20 heats the powdered reactant RS to a temperature higher than that of the gas EG flowing through the gas line 2. The desorption unit 23 is, for example, a heater that can be heated from the outside while covering both the exteriors that make up the storage unit 21 and the supply unit 22. As a result, the desorption unit 23 of this embodiment heats not only the storage unit 21 but also the reactant RS arranged in the supply unit 22. In this way, the desorption unit 23 is capable of heating only the powdered reactant RS that does not include other components such as a substrate.

[0026] The new reactant supply unit 200 is capable of supplying new reactant RS to the reactant supplier 20. The new reactant supply unit 200 is connected to the reservoir unit 21.

[0027] The reactant return line 3 connects the discharger 15 and the reactant supply device 20. One end of the reactant return line 3 is connected to the discharger 15. The other end of the reactant return line 3 is connected to the storage section 21. The reactant RS discharged from the discharger 15 can be supplied to the reactant supply device 20 by the reactant return line 3.

[0028] The destination switching unit 31 is disposed midway along the reactant return line 3. The destination switching unit 31 is capable of switching the destination of the reactant RS supplied from the discharger 15 to the reactant return line 3 to either the storage unit 21 or the outside and discharging the reactant RS. The destination switching unit 31 switches the discharge destination of the reactant RS in response to an instruction from the control unit 5.

[0029] The gas information acquisition unit 7 acquires the concentration of the gas to be collected (carbon dioxide in this embodiment) in the gas EG flowing through the gas line 2, the humidity of the gas EG, the flow rate of the gas EG, information on the pressure of the gas EG, and the temperature of the gas EG. The gas information acquisition unit 7 is disposed in a position upstream (closer to the gas generation source 1) of the position where the reactant RS is supplied from the supply unit 22. The gas information acquisition unit 7 measures and acquires the concentration of the gas to be collected in the gas EG flowing through the gas line 2. In addition, the gas information acquisition unit 7 measures and acquires the humidity of the gas EG flowing through the gas line 2. Furthermore, the gas information acquisition unit 7 measures and acquires the gas flow rate of the gas EG flowing through the gas line 2. Furthermore, the gas information acquisition unit 7 measures and acquires the temperature of the gas EG flowing through the gas line 2. Furthermore, the gas information acquisition unit 7 measures and acquires the pressure of the gas EG flowing through the gas line 2. The gas information acquisition unit 7 outputs the acquired concentration of the gas to be collected in the gas EG, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, and information on the temperature of the gas EG to the control unit 5 C. Note that the gas flow rate of the gas EG may be acquired based on the rotation speed or power of the suction blower 4, rather than from the gas information acquisition unit 7.

[0030] The control unit 5 causes the destination switching unit 31 to switch the discharge destination of the reactant RS depending on the adsorption amount of the gas to be recovered adsorbed to the reactant RS discharged by the discharger 15. Information on the concentration of the gas to be recovered in the gas EG, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, and information on the temperature of the gas EG is input to the control unit 5 from the gas information acquisition unit 7. The control unit 5 of this embodiment has an adsorption amount acquisition unit 51 and an adsorption amount determination unit 52.

[0031] The adsorption amount acquisition unit 51 acquires the adsorption amount of the target gas to be collected adsorbed to the reactant RS discharged by the discharger 15. The adsorption amount acquisition unit 51 calculates the adsorption amount of the target gas to be collected based on, for example, the supply amount of the reactant RS, information on the concentration of the target gas to be collected in the gas EG flowing through the gas line 2, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, information on the temperature of the gas EG, and the backwashing time in the backwashing device 14. The backwashing time is the time during which the reactant RS adheres to the dust collecting filter 13 and is the interval until the next backwashing is performed. In other words, the backwashing time determines the frequency at which backwashing is performed. If the backwashing time is long, the dust collecting filter 13 becomes clogged, making it difficult to pass the gas EG through the dust collecting filter 13. The supply amount of reactant RS, information on the concentration of the gas to be recovered in the gas EG flowing through the gas line 2, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, information on the temperature of the gas EG, and information such as the backwash time in the backwash device 14 may be input in advance or may be detected automatically.

[0032] The adsorption amount determination unit 52 determines whether the adsorption amount acquired by the adsorption amount acquisition unit 51 is below a predetermined adsorption amount reference value. Here, the adsorption amount reference value is a value at which it is considered that the reactant RS is not completely regenerated even after the desorption process and is unable to newly react with the target gas to be recovered. In other words, it is a value that represents the deterioration state of the reactant RS. If the adsorption amount exceeds the adsorption amount reference value, it indicates that the reactant RS has not yet completely deteriorated and can be used as the reactant RS. Conversely, if the adsorption amount is below the adsorption amount reference value, it indicates that the reactant RS has deteriorated and cannot be used. If the adsorption amount determination unit 52 determines that the adsorption amount exceeds the adsorption amount reference value, it sends a signal to the destination switching unit 31 to switch the destination so that the reactant RS is transported to the storage unit 21. If the adsorption amount determination unit 52 determines that the adsorption amount is below the adsorption amount reference value, it sends a signal to the destination switching unit 31 to switch the destination so that the reactant RS is discharged to the outside. As a result, when the adsorption amount determination unit 52 determines that the adsorption amount exceeds the adsorption amount reference value, the reactant supply device 20 is supplied with the reactant RS discharged by the discharger 15. Furthermore, when the adsorption amount determination unit 52 determines that the adsorption amount is below the adsorption amount reference value, the reactant supply device 20 is supplied with new reactant RS from the new reactant supply unit 200.

[0033] Next, the gas processing facility method S100 in the gas processing facility 100 described above will be described with reference to the flowchart shown in FIG.

[0034] The reactant supply device 20 supplies a powdered reactant RS having an average particle size of 1 mm or less to the gas EG flowing through the gas line 2 (S1: reactant supply step). Specifically, in the reactant supply step S1, new reactant RS is supplied to the reactant supply device 20 from the new reactant supply unit 200 (S11: new reactant supply step). The supplied new reactant RS is temporarily stored in the storage unit 21 (S12: storage step). The reactant RS stored in the storage unit 21 is heated to a temperature higher than that of the gas EG flowing through the gas line 2 by the desorption unit 23 as a desorption process (S13: desorption process implementation step). As a result, the gas to be recovered is desorbed from the reactant RS. The reactant RS from which the gas to be recovered has been desorbed is supplied from the supply device into the gas EG flowing through the gas line 2 (S14: supply implementation step). This gas EG may contain ash, heavy metals, etc. in addition to the gas to be recovered. When the gas EG is the atmosphere, it does not contain ash, heavy metals, etc.

[0035] The gas EG containing the reactant RS flows through the gas line 2 into the inlet space 12i of the dust collecting filter device 10. As a result, the powdered reactant RS and solid matter in the gas EG are collected by the dust collecting filter 13, and the gas in the gas EG flows out of the dust collecting filter device 10 as treated gas EG (S2: collection step). The treated gas EG that has flowed out of the dust collecting filter device 10 is discharged to the outside through the treated gas line 2t.

[0036] In addition, the gas to be recovered in the gas EG reacts with or is adsorbed onto the reactant RS and is collected as it passes through the gas line 2, the inlet space 12i of the dust collecting filter device 10, and the layer of powder (powdered reactant RS) adhering to the dust collecting filter 13.

[0037] After the dust collecting filter device 10 has been operated for a predetermined period of time, the dust collecting filter 13 is backwashed to remove the powder and solid matter trapped by the dust collecting filter 13 (S3: backwashing step). In the backwashing step S3, the differential pressure between the inlet-side space 12i and the outlet-side space 12o in the dust collecting filter device 10 is determined (S31: differential pressure determination step). Specifically, in the dust collecting filter device 10, as the gas EG is continuously supplied, the layer of powder and solid matter adhering to the dust collecting filter 13 becomes thicker. As a result, the differential pressure between the inlet-side space 12i and the outlet-side space 12o in the dust collecting filter device 10 increases. In the differential pressure determination step S31, it is determined whether this differential pressure is below a predetermined differential pressure reference value. Here, the differential pressure reference value is a value at which it is considered that too much powder and solid matter has adhered to the dust collecting filter 13. In other words, when the differential pressure exceeds the differential pressure reference value, it becomes difficult to pass the gas EG through the particulate collection filter 13. In addition, in the differential pressure determination step S31, it is also determined whether a predetermined backwash time has elapsed since the previous backwash. If it is determined that the differential pressure is below the differential pressure reference value or that the backwash time has not elapsed, backwashing is not performed and the collection step S2 is performed again. If it is determined that the differential pressure is not below the differential pressure reference value or that the backwash time has elapsed, backwashing is performed (S32: backwashing execution step).

[0038] In the backwashing step S3, if the flow rate of the gas EG supplied to the dust collecting filter device 10 and the concentration and temperature of the gas to be collected are stable, the amount of powder supplied will also be constant, so the differential pressure determination step S31 may be omitted. In this case, backwashing is performed at a predetermined backwash interval without determining the differential pressure.

[0039] In the backwashing step S32, the on-off valve 14c of the backwashing device 14 is opened, and the high-pressure gas in the backwashing high-pressure gas tank 14a is sent from the outlet-side space 12o toward the inlet-side space 12i to the dust collecting filter 13. This high-pressure gas causes the powder and solid matter adhering to the dust collecting filter 13 to separate from the dust collecting filter 13, and the powder and solid matter fall within the inlet-side space 12i of the dust collecting filter device 10. The powder and solid matter that have fallen within the inlet-side space 12i are discharged to the outside of the dust collecting filter device 10 by the discharger 15 (S4: discharge step).

[0040] In addition, the adsorption amount of the target gas to be collected that has adsorbed to the reactant RS discharged from the discharger 15 is acquired (S5: adsorption amount acquisition step). In the adsorption amount acquisition step S5, for example, the adsorption amount acquisition unit 51 of the control unit 5 calculates the adsorption amount of the target gas to be collected based on information on the concentration of the target gas to be collected in the gas EG, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, information on the temperature of the gas EG, and the backwashing time in the backwashing device 14.

[0041] It is determined whether the amount of adsorption acquired in the adsorption amount acquisition step S5 is below a predetermined adsorption amount reference value (S6: adsorption amount determination step). If it is determined that the amount of adsorption exceeds the adsorption amount reference value, the destination switching unit 31 is switched to transport the reactant RS to the storage unit 21. If it is determined that the amount of adsorption is below the adsorption amount reference value, the destination switching unit 31 is switched to discharge the reactant RS to the outside.

[0042] The reactant RS transported to the storage section 21 is subjected to the storage step S12 again. That is, the supplied reactant RS is stored, subjected to a desorption process, and then supplied to the gas line 2 and sent to the dust collecting filter device 10. In this way, when it is determined that the adsorption amount exceeds the adsorption amount reference value, the reactant RS continues to circulate through the reactant supply machine 20, the gas line 2, and the dust collecting filter device 10.

[0043] Furthermore, the reactant RS discharged to the outside is discarded (S7: discarding step). Specifically, the discard amount is calculated, and the reactant RS is discarded based on the discard amount. The gas to be recovered adsorbed on the reactant RS may be desorbed before disposal and used separately. A new reactant RS in an amount approximately equal to the amount discarded in the discarding step S7 is newly supplied from the new reactant supply unit 200 to the reactant supply device 20 (S11: new reactant supplying step).

[0044] (Effects) In the gas processing facility 100 and the gas processing facility method S100, the reactant supply device 20 supplies the gas EG with a powdered reactant RS that has been subjected to a desorption process. The supply of the reactant RS causes the target gas in the gas EG to react with the reactant RS to form a reaction product. The supplied reactant RS is in a powdered form with an average particle size of 1 mm or less. This powdered reactant RS has a significantly larger specific surface area than reactants in the form of pellets with larger particle sizes or reactants in the form of large chunks coated on a substrate, such as a honeycomb-coated type. Therefore, supplying the powdered reactant RS to the gas EG allows for effective adsorption and separation of the target gas in the gas EG. Furthermore, when desorbing the target gas from the reactant RS that has adsorbed the target gas, the reactant RS must be heated to perform a desorption process. In contrast, in this embodiment, the desorption process is performed on the powdered reactant RS. Since the desorption treatment is performed while the reactant RS is in powder form, the energy required for the desorption treatment of the reactant RS can be reduced. As a result, the target gas to be recovered in the gas EG can be separated with reduced loss.

[0045] Furthermore, in the desorption process, the powdered reactant RS is heated to a temperature higher than that of the gas EG flowing through the gas line 2. Therefore, the reactant RS that has completed the desorption process is supplied to the gas line 2 and cooled by the flowing gas EG. It is known that the lower the temperature of the reactant RS under the same pressure, the greater the amount of adsorption of the gas to be recovered. Therefore, by cooling the reactant RS that has become so hot that the desorption process is completed, the adsorption effect of the gas to be recovered can be improved. Furthermore, without preparing a new device for cooling the reactant RS, the reactant RS can be cooled simply by supplying it into the gas EG flowing through the gas line 2. This makes it possible to complete the desorption process to the reactant RS with high accuracy, reduce costs, and improve the adsorption performance of the gas to be recovered.

[0046] Furthermore, the reactant RS supplied to the gas line 2 is collected by the dust collecting filter 13, and flows through the gas line 2 and the inlet-side space 12i of the dust collecting filter device 10, adhering to the dust collecting filter 13, where it reacts with the target gas to be collected in the gas EG. This ensures time for the reactant RS to sufficiently adsorb the target gas to be collected. The reactant RS collected by the dust collecting filter 13 can be removed from the dust collecting filter 13 by the backwash device 14. The reactant RS removed from the dust collecting filter 13 is discharged from the discharger 15 and returned to the storage section 21 via the reactant return line 3. This allows the reactant RS, which has sufficiently adsorbed the target gas to be collected, to be collected from the dust collecting filter 13. The reactant RS, which has adsorbed the target gas to be collected and is stored in the storage section 21, is heated in the desorption section 23, where the target gas to be collected is separated. This allows the reactant RS, which has sufficiently desorbed the target gas to be collected, to be supplied again to the gas line 2. This allows the powdered reactant RS to be recycled, and the amount of reactant RS used can be reduced.

[0047] Furthermore, the adsorption amount acquisition unit 51 acquires the amount of adsorption of the gas to be recovered adsorbed to the reactant RS discharged by the discharger 15. Then, the adsorption amount determination unit 52 determines whether the acquired amount of adsorption of the gas to be recovered is below an adsorption amount reference value. If the adsorption amount determination unit 52 determines that the amount of adsorption exceeds the adsorption amount reference value, it causes the destination switching unit 31 to supply the reactant RS discharged by the discharger 15 to the storage unit 21. If the adsorption amount determination unit 52 determines that the amount of adsorption is below the adsorption amount reference value, it causes the destination switching unit 31 to discharge the reactant RS discharged by the discharger 15 to the outside. As a result, new reactant RS is supplied to the storage unit 21 from the new reactant supply unit 200. With this configuration, the performance of the reactant RS can be evaluated based on the amount of adsorption of the gas to be recovered adsorbed to the reactant RS discharged from the discharger 15. Therefore, it is easy to discard the reactant RS with reduced performance and switch the timing of supplying a new reactant RS, thereby enabling continuous operation in which the reactant RS with maintained adsorption performance is always supplied to the gas EG in the waste gas line.

[0048] Second Embodiment Next, a gas processing system 100A according to a second embodiment of the present disclosure will be described. In the second embodiment described below, components common to the first embodiment are denoted by the same reference numerals in the drawings, and descriptions thereof will be omitted. In the second embodiment, the configuration for supplying reactant RS from reactant supply device 20 differs from that of the first embodiment.

[0049] As shown in FIG. 3 , the gas processing facility 100A of the second embodiment further includes a reactant cooling unit 6. The reactant cooling unit 6 cools the powdered reactant RS to a temperature lower than that of the gas EG. Specifically, the reactant cooling unit 6 cools the reactant RS immediately before it is supplied from the supply unit 22 to the gas line 2. The reactant cooling unit 6 cools the reactant RS, for example, by mixing it with outside air or a humidified gas, or by performing heat exchange with a low-temperature fluid such as cold water at the connection portion between the supply unit 22 and the gas line 2. Therefore, in the gas processing facility method S100A of the second embodiment, in the reactant supply step S1A shown in FIG. 2 , the reactant RS is cooled to a temperature lower than that of the gas EG and supplied into the gas EG.

[0050] (Effects) In the gas processing facility 100A and the gas processing facility method S100A of the second embodiment, the reactant RS is cooled by the reactant cooling unit 6 to a temperature lower than that of the gas EG and then supplied to the gas EG. Therefore, when the target to be adsorbed by the reactant RS is carbon dioxide, the adsorption effect of carbon dioxide can be particularly improved by cooling the reactant RS, which has become hot enough to complete the desorption process, to a temperature lower than that of the gas EG. Furthermore, if humidified gas is mixed with the reactant RS during cooling, the amount of water absorption by the reactant RS increases. As a result, the adsorption effect of carbon dioxide can be further improved.

[0051] Third Embodiment Next, a gas processing system 100B according to a third embodiment of the present disclosure will be described. In the third embodiment described below, components common to the first and second embodiments are denoted by the same reference numerals in the drawings, and description thereof will be omitted. In the third embodiment, the configuration for adjusting the high-pressure gas discharged from the backwash device 14 differs from the first and second embodiments.

[0052] As shown in FIG. 4 , the gas treatment system 100B of the third embodiment further includes a backwash gas adjustment unit 141. The backwash gas adjustment unit 141 adjusts the temperature of the high-pressure gas to a temperature lower than that of the gas EG flowing through the gas line 2, or adjusts the humidity of the high-pressure gas to a humidity higher than that of the gas EG flowing through the gas line 2. Specifically, the backwash gas adjustment unit 141 cools and increases the humidity of the high-pressure gas discharged from the backwash high-pressure gas tank 14a to the high-pressure gas guide pipe 14b. As a result, in the third embodiment, the high-pressure gas discharged from the high-pressure gas guide pipe 14b toward the dust collecting filter 13 is lower in temperature and higher in humidity than the gas EG flowing through the gas line 2. Therefore, in the gas treatment system method S100B of the third embodiment, in the backwash step S3B shown in FIG. 2 , the high-pressure gas is supplied at a temperature lower than that of the gas EG flowing through the gas line 2 or at a humidity higher than that of the gas EG.

[0053] The backwash gas adjusting unit 141 is not limited to a configuration that adjusts both the temperature and humidity of the high-pressure gas, but may be configured to adjust only one of the temperature and humidity of the high-pressure gas.

[0054] (Effects) In the gas processing system 100B and the gas processing system method S100B of the third embodiment, the temperature of the high-pressure gas sent to the dust collecting filter 13 for backwashing is lowered to below the gas EG. In addition, the humidity of the high-pressure gas sent to the dust collecting filter 13 is increased above the gas EG. Therefore, the reactant RS adhering to the dust collecting filter 13 is cooled by backwashing, improving the adsorption performance of the reactant RS. Therefore, even during backwashing, the adsorption effect of the target gas to be recovered can be improved. In particular, when the high-pressure gas during backwashing is high-pressure air, the target gas to be recovered contained in the high-pressure air can also be adsorbed. Furthermore, when the reactant RS has a characteristic that its adsorption performance improves in the presence of moisture, such as an amine-based compound, and the target to be adsorbed is carbon dioxide, the reactant RS adhering to the dust collecting filter 13 becomes humid by backwashing, improving the adsorption performance of the reactant RS. Therefore, during backwashing, the adsorption effect of the target gas to be recovered can be further improved.

[0055] In the backwashing device 14, it is sufficient to lower the temperature of the high-pressure gas to below gas EG or to raise the humidity of the high-pressure gas to above gas EG. Therefore, in the backwashing device 14, it is sufficient to simply lower the temperature of the high-pressure gas to below gas EG or to raise the humidity of the high-pressure gas above gas EG. In other words, the backwashing gas adjusting unit 141 is not limited to a structure that adjusts both the temperature and humidity of the high-pressure gas, and may be a structure that adjusts only one of the temperature and humidity of the high-pressure gas.

[0056] Fourth Embodiment Next, a gas processing system 100C according to a fourth embodiment of the present disclosure will be described. In the fourth embodiment described below, components common to the first to third embodiments are denoted by the same reference numerals in the drawings, and description thereof will be omitted. The fourth embodiment differs from the first to third embodiments in the configuration for adjusting operating conditions in accordance with the state of gas EG flowing through gas line 2.

[0057] 5 , the gas processing equipment 100C of the fourth embodiment adjusts the supply state, desorption conditions, and backwash conditions of the reactant RS according to the state of the gas EG flowing through the gas line 2. The gas processing equipment 100C is capable of adjusting the amount of the reactant RS supplied into the gas EG by the reactant supply device 20 according to information on the concentration of the gas to be recovered in the gas EG, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, and information on the temperature of the gas EG. Specifically, the reactant supply device 20 is capable of adjusting the amount of the reactant RS supplied into the gas EG so as to increase the amount of the reactant RS supplied when the concentration of the gas to be recovered in the gas EG increases, the humidity of the gas EG decreases, the gas flow rate increases, the pressure decreases, or the temperature increases. Furthermore, the reactant supply device 20 is capable of adjusting the amount of the reactant RS supplied into the gas EG so as to decrease the amount of the reactant RS supplied when the concentration of the gas to be collected in the gas EG decreases, the humidity of the gas EG increases, the gas flow rate decreases, the pressure increases, or the temperature decreases. Furthermore, the gas processing equipment 100C is capable of adjusting the time for the desorption process of the reactant RS in the reactant supply device 20 according to the concentration of the gas to be collected in the gas EG and the humidity of the gas EG. The gas processing equipment 100C is capable of adjusting the backwash time (frequency) in the backwash device 14 according to the humidity of the gas EG. Specifically, the reactant supply device 20 is capable of adjusting the time for the desorption process so as to increase the time for the desorption process when the amount of adsorption of the gas to be collected and the amount of moisture contained in the reactant RS increase. Furthermore, the reactant supply device 20 is capable of adjusting the time for the desorption process so as to decrease the time for the desorption process when the amount of adsorption of the gas to be collected and the amount of moisture contained in the reactant RS decrease.

[0058] The control unit 5C of the fourth embodiment controls the concentration of the gas to be collected in the gas EG, the humidity (H ２ 0 concentration), the flow rate of the gas EG, the pressure of the gas EG, and the temperature of the gas EG, the control unit 5C controls the reactant supply device 20 and the backwashing device 14. In addition to the adsorption amount acquisition unit 51 and the adsorption amount determination unit 52, the control unit 5C of this embodiment further includes a filter adsorption state acquisition unit 56, a supply condition adjustment unit 57, a desorption condition adjustment unit 58, and a backwashing condition adjustment unit 59.

[0059] The filter adsorption state acquisition unit 56 acquires the amount of adsorption of the target gas to be collected to the reactant RS in the dust collection filter 13 and the moisture (H ２ The filter adsorption state acquisition unit 56 receives information from the gas information acquisition unit 7, such as information on the concentration of the gas to be collected in the gas EG, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, and information on the temperature of the gas EG.

[0060] The filter adsorption state acquisition unit 56 calculates the amount of adsorption of the target gas to be collected to the reactant RS collected on the particulate collection filter 13 based on the input information on the concentration of the target gas to be collected, information on the humidity of the gas EG, information on the gas flow rate of the gas EG, information on the pressure of the gas EG, and information on the temperature of the gas EG. Specifically, the filter adsorption state acquisition unit 56 calculates the filtration rate of the particulate collection filter 13 based on the input information on the gas flow rate of the gas EG. The amount of adsorption of the target gas to be collected to the reactant RS on the particulate collection filter 13 is calculated based on the calculated filtration rate and the input information on the concentration, temperature, pressure, and humidity of the target gas to be collected. The filter adsorption state acquisition unit 56 sends information on the calculated adsorption amount of the target gas to be collected to the supply condition adjustment unit 57 and the desorption condition adjustment unit 58.

[0061] Furthermore, the filter adsorption state acquisition unit 56 calculates the amount of moisture adsorbed to the reactant RS collected on the particulate collection filter 13 (moisture content) based on the input concentration information, humidity information, gas flow rate information of the gas EG, pressure information of the gas EG, and temperature information. Specifically, the filter adsorption state acquisition unit 56 calculates the moisture content of the reactant RS on the particulate collection filter 13 based on the calculated filtration rate and the input concentration, temperature, pressure, and humidity information. The filter adsorption state acquisition unit 56 sends information on the calculated moisture content to the desorption condition adjustment unit 58 and the backwash condition adjustment unit 59.

[0062] The supply condition adjustment unit 57 adjusts the supply amount of the reactant RS from the supply unit 22 into the gas EG based on information on the adsorption amount of the target gas to be collected calculated and acquired by the adsorption state adjustment unit. For example, the supply condition adjustment unit 57 calculates a supply amount of the reactant RS such that the amount of adsorption of the target gas to be collected becomes a predetermined filter target gas reference value. Here, the filter target gas reference value is the limit amount of the target gas to be adsorbed by the reactant RS on the particulate filter 13. The filter target gas reference value is the limit amount of adsorption of the reactant RS that can be regenerated by desorption processing, and is a small value equal to or less than the adsorption amount reference value. The supply condition adjustment unit 57 sends an instruction to the supply unit 22 to supply the calculated supply amount of the reactant RS. As a result, the supply unit 22 increases the supply amount of the reactant RS to the gas line 2 when the concentration of the target gas to be collected in the acquired gas EG increases, the humidity decreases, the flow rate increases, the pressure decreases, or the temperature increases. In addition, the supply unit 22 reduces the amount of reactant RS supplied to the gas line 2 when the concentration of the gas to be recovered in the acquired gas EG decreases, the humidity increases, the flow rate decreases, the pressure increases, or the temperature decreases.

[0063] The desorption condition adjustment unit 58 adjusts the conditions for performing the desorption process based on the information on the adsorption amount and moisture content of the gas to be collected calculated and acquired by the adsorption state adjustment unit. The desorption condition adjustment unit 58 calculates the heating temperature and desorption time when performing the desorption process in the desorbing unit 23 based on the acquired information on the adsorption amount and moisture content of the gas to be collected. The heating temperature is the temperature at which the desorption process is performed in the desorbing unit 23. The desorption time is the time during which the desorption process is performed at a predetermined heating temperature in the desorbing unit 23. For example, a plurality of reference temperatures are set as the heating temperature, and one of these temperatures is selected. The desorption condition adjustment unit 58 then calculates the desorption time at the selected heating temperature.

[0064] Furthermore, the desorption condition adjustment unit 58 of this embodiment determines whether at least one of the adsorption amount and the moisture amount of the acquired gas to be recovered exceeds a standard. For example, the desorption condition adjustment unit 58 determines whether the moisture amount exceeds a standard moisture amount. If the moisture amount exceeds the standard moisture amount, a higher temperature is selected from among a plurality of preset heating temperatures. If the moisture amount does not exceed the standard moisture amount, a lower temperature is selected from among a plurality of preset heating temperatures. Thereafter, the desorption condition adjustment unit 58 calculates the desorption time at the selected heating temperature.

[0065] The desorption condition adjustment unit 58 sends an instruction to the desorption unit 23 to perform the desorption process for the calculated desorption time and at the selected temperature. As a result, when the acquired adsorption amount of the gas to be collected and the amount of moisture contained in the reactant RS increase, the desorption unit 23 increases the desorption time and performs the desorption process. Also, when the acquired adsorption amount of the gas to be collected and the amount of moisture contained in the reactant RS decrease, the desorption unit 23 decreases the desorption time and performs the desorption process.

[0066] The heating temperature, which is one of the desorption conditions, is not limited to being selected and determined from a plurality of preset heating temperatures. The heating temperature may be calculated and determined at an arbitrary temperature. Therefore, the desorption condition adjustment unit 58 may instruct the desorber 23 to change the heating temperature to an arbitrary temperature and the desorption time corresponding to that heating temperature. Furthermore, when the heating temperature is calculated as an arbitrary temperature, it is not necessary to determine whether at least one of the adsorption amount and moisture content of the gas to be collected exceeds the standard. In other words, the heating temperature and desorption time may be calculated directly based on the acquired adsorption amount and moisture content of the gas to be collected, without determining the adsorption amount and moisture content of the gas to be collected.

[0067] Furthermore, when determining at least one of the adsorption amount and moisture amount of the gas to be collected, the desorption condition adjustment unit 58 is not limited to determining only the moisture amount as in this embodiment; the desorption condition adjustment unit 58 may determine only the adsorption amount of the gas to be collected, or may determine both the adsorption amount and moisture amount of the gas to be collected.

[0068] The backwash condition adjustment unit 59 adjusts the backwash conditions for the dust collection filter 13 based on the information on the adsorption amount of the collection target gas calculated and acquired by the adsorption state adjustment unit. For example, the backwash condition adjustment unit 59 calculates the time until the adsorption amount of the collection target gas reaches the filter collection target gas reference value. The backwash condition adjustment unit 59 determines the backwash time (the interval between backwashes) as the backwash condition based on the calculated time. The backwash condition adjustment unit 59 sends an instruction to the backwash device 14 to perform backwashing for the determined backwash time. As a result, the backwash device 14 reduces the backwash time when the concentration of the collection target gas in the acquired gas EG increases. As a result, the number of backwashes is increased. Furthermore, the backwash device 14 increases the backwash time when the concentration of the collection target gas in the acquired gas EG decreases. As a result, the number of backwashes is reduced.

[0069] Next, a gas processing facility method S100C using the above-described gas processing facility 100C will be described. In the gas processing facility method S100C of the fourth embodiment, as shown in FIG. 6 , the gas information acquisition unit 7 acquires the concentration of the gas to be collected in the gas EG flowing through the gas line 2 and the humidity of the gas EG (S81: gas information acquisition step). Specifically, the concentration, humidity, temperature, pressure, and gas flow rate of the gas to be collected in the gas EG before the reactant RS is supplied are measured. The acquired information on the concentration of the gas to be collected in the gas EG, the humidity information of the gas EG, the pressure information of the gas EG, the gas flow rate information of the gas EG, and the temperature information is sent to the control unit 5C.

[0070] The control unit 5C calculates and acquires the amount of the target gas to be collected and the amount of moisture (moisture content) adsorbed to the reactant RS collected on the particulate collection filter 13 based on the concentration information, humidity information, gas flow rate information, gas EG pressure information, and temperature information of the target gas to be collected (S82: filter adsorption state acquisition step). In the filter adsorption state acquisition step S82, information on the concentration of the target gas to be collected in the gas EG, humidity information of the gas EG, pressure information of the gas EG, gas flow rate information of the gas EG, and temperature information are acquired from the gas information acquisition unit 7. In the filter adsorption state acquisition step S82, the filter adsorption state acquisition unit 56 calculates the amount of the target gas to be collected adsorbed to the reactant RS on the particulate collection filter 13 based on the concentration information, humidity information, gas EG pressure information, temperature information, and gas flow rate information of the gas EG. Furthermore, in the filter adsorption state acquisition process S82, the amount of moisture in the reactant RS in the dust collection filter 13 is calculated based on humidity information, gas EG gas flow rate information, gas EG concentration information, gas EG pressure information, and temperature information.

[0071] Based on the information on the adsorption amount of the collection target gas acquired in the filter adsorption state acquisition process S82, the supply amount of the reactant RS supplied from the supply unit 22 to the gas EG in the supply implementation process S14 is adjusted (S83: supply condition adjustment process). In the supply condition adjustment process S83, the supply condition adjustment unit 57 calculates the supply amount of the reactant RS that is the filter collection target gas reference value. Then, an instruction is sent to the supply unit 22 to supply the calculated supply amount of the reactant RS in the supply implementation process S14. As a result, in the supply implementation process S14, the supply amount of the reactant RS to the gas line 2 increases when the concentration of the collection target gas in the acquired gas EG increases, the humidity decreases, the flow rate increases, the pressure decreases, or the temperature increases. Also, in the supply implementation process S14, the supply amount of the reactant RS to the gas line 2 decreases when the concentration of the collection target gas in the acquired gas EG decreases, the humidity increases, the flow rate decreases, the pressure increases, or the temperature decreases.

[0072] Based on the information on the amount of adsorption of the target gas obtained in the filter adsorption state acquisition process S82, the backwash conditions for the particulate collection filter 13 in the backwash implementation process S32 are adjusted (S84: backwash condition adjustment process). In the backwash condition adjustment process S84, the backwash condition adjustment unit 59 calculates the time until the amount of adsorption of the target gas reaches the filter target gas reference value. Then, the backwash time is determined based on the calculated time. In the backwash condition adjustment process S84, an instruction is sent to the backwash device 14 to perform backwashing for the determined backwash time in the backwash implementation process S32. As a result, in the backwash implementation process S32, if the concentration of the target gas in the acquired gas EG increases, the backwash time for performing the next backwash is reduced. Also, in the backwash implementation process S32, if the concentration of the target gas in the acquired gas EG decreases, the backwash time for performing the next backwash is increased.

[0073] Based on the information on the adsorption amount and moisture content of the gas to be recovered acquired in the filter adsorption state acquisition step S82, the conditions for performing the desorption process are adjusted (S85: desorption condition adjustment step). The desorption condition adjustment step S85 is performed after the adsorption amount determination step S6 when it is determined that the adsorption amount exceeds the adsorption amount reference value. In the desorption condition adjustment step S85, the desorption condition adjustment unit 58 calculates the heating temperature and desorption time for performing the desorption process in the desorption process based on the acquired information on the adsorption amount and moisture content of the gas to be recovered. In the desorption condition adjustment step S85, the desorption time at the calculated heating temperature is calculated. In the desorption condition adjustment step S85, an instruction is sent to the desorption unit 23 to perform the desorption process at the calculated desorption time and selected temperature in the desorption process execution steps S13 and S13E. As a result, in the desorption process execution step S13, if the acquired adsorption amount of the gas to be recovered and the moisture content contained in the reactant RS increase, the desorption process time is increased and the desorption process is performed. Furthermore, in the desorption treatment execution step S13, if the amount of adsorption of the acquired gas to be recovered and the amount of moisture contained in the reactant RS decrease, the desorption treatment time is reduced and the desorption treatment is performed.

[0074] In the adsorption state adjusting step, the heating temperature, which is one of the desorption conditions, may be selected from a plurality of preset heating temperatures or calculated and determined at an arbitrary temperature. Therefore, in the desorption condition adjusting step S85, an instruction may be issued to the desorbing unit 23 to change the heating temperature to an arbitrary heating temperature and the desorption time corresponding to that heating temperature. Furthermore, when the heating temperature is selected from a plurality of preset heating temperatures, it may be determined whether at least one of the adsorption amount and moisture content of the gas to be recovered exceeds a standard. Furthermore, when the heating temperature is calculated as an arbitrary temperature, it is not necessary to determine whether at least one of the adsorption amount and moisture content of the gas to be recovered exceeds a standard.

[0075] (Operation and Effect) In the gas processing facility 100C and the gas processing facility method S100C of the fourth embodiment, the gas information acquisition unit 7 acquires information on the concentration of the target gas to be collected in the gas EG flowing through the gas line 2, information on the humidity of the gas EG, information on the pressure of the gas EG, information on the temperature, and information on the gas flow rate of the gas EG. Then, the filter adsorption state acquisition unit 56 acquires the amount of the target gas to be collected and the amount of moisture adsorbed (moisture content) to the reactant RS on the dust collection filter 13 based on the information on the concentration of the target gas to be collected in the gas EG, information on the humidity of the gas EG, information on the pressure of the gas EG, information on the temperature, and information on the gas flow rate of the gas EG. Based on the acquired information on the adsorption amount of the target gas to be collected, the amount of the reactant RS supplied from the supply unit 22 to the gas EG is adjusted. Specifically, the amount of the reactant RS supplied to the gas line 2 is reduced when the acquired concentration of the target gas to be collected in the gas EG decreases, the humidity increases, the flow rate decreases, the pressure increases, or the temperature decreases. Furthermore, when the concentration of the gas to be collected in the acquired gas EG increases, the humidity decreases, the flow rate increases, the pressure decreases, or the temperature increases, the amount of the reactant RS supplied to the gas line 2 is increased. That is, the amount of the reactant RS supplied into the gas EG is adjusted in response to changes in the concentration of the gas to be collected, the humidity of the gas EG, the pressure, the temperature, and the flow rate of the gas EG acquired by the gas information acquisition unit 7. Therefore, it is possible to appropriately supply an amount of the reactant RS into the gas EG that improves the adsorption efficiency in response to changes in the concentration, pressure, temperature, flow rate, and humidity of the gas to be collected in the gas EG flowing through the gas line 2.

[0076] Furthermore, supplying an appropriate amount of reactant RS lengthens the time until the dust collection filter 13 becomes clogged. As a result, it is possible to suppress an increase in the differential pressure between the inlet space 12i and the outlet space 12o with respect to the dust collection filter 13. Therefore, it is possible to reduce the power required by the suction blower 4.

[0077] Furthermore, the backwash conditions for the dust collecting filter 13 are adjusted based on the acquired information on the amount of adsorption of the gas to be collected. Specifically, if the concentration of the gas to be collected in the acquired gas EG increases, the backwash time by the backwash device 14 is reduced. Also, if the concentration of the gas to be collected in the acquired gas EG decreases, the backwash time by the backwash device 14 is increased. Since the amount of adsorption of the gas to be collected corresponds to the supply amount of reactant RS, the frequency of backwashing can be reduced in accordance with the amount of reactant RS supplied. This can improve the life of the dust collecting filter 13.

[0078] Furthermore, the conditions for performing the desorption process are adjusted based on the acquired information on the adsorption amount of the gas to be collected and the information on the moisture content. Specifically, when the acquired adsorption amount of the gas to be collected and the moisture content contained in the reactant RS increase, the time for the desorption process in the desorption unit 23 is increased and the desorption process is performed. When the acquired adsorption amount of the gas to be collected and the moisture content contained in the reactant RS decrease, the time for the desorption process in the desorption unit 23 is decreased and the desorption process is performed. Therefore, the conditions for the desorption process required for the current reactant RS can be appropriately grasped. This allows the energy required for the desorption process of the reactant RS to be kept within an appropriate range.

[0079] Fifth Embodiment Next, a gas processing system 100D according to a fifth embodiment of the present disclosure will be described. In the fifth embodiment described below, components common to the first to fourth embodiments are denoted by the same reference numerals in the drawings, and descriptions thereof will be omitted. The fifth embodiment differs from the first to fourth embodiments in the configuration for separating foreign matter from the gas EG before supplying the reactant RS to the gas EG.

[0080] 7 , gas processing equipment 100D of the fifth embodiment is capable of separating foreign matter from gas EG at a position upstream in the flow direction of gas EG with respect to reactant feeder 20. Gas processing equipment 100D of the fifth embodiment further includes a front-stage dust collecting filter device 10 f and a front-stage gas line 2 f.

[0081] The front-stage dust collecting filter device 10f is disposed at a position upstream in the flow direction of the gas EG with respect to the reactant supplier 20. That is, after the gas EG passes through the front-stage dust collecting filter device 10f, the reactant RS is supplied from the reactant supplier 20 and the gas EG reaches the dust collecting filter device 10. The front-stage dust collecting filter device 10f includes a front-stage case 11f, a front-stage dust collecting filter 13f, a front-stage backwash device 14f, and a front-stage discharger 15f.

[0082] The upstream dust collecting filter device 10f has the same configuration as the dust collecting filter device 10 in the first embodiment. Therefore, the upstream case 11f has the same configuration as the case 11. The upstream case 11f has a upstream inlet 11if through which gas flows in corresponding to the inlet 11i and a upstream outlet 11of through which gas flows out corresponding to the outlet 11o. The upstream dust collecting filter 13f also has the same configuration as the dust collecting filter 13. The upstream dust collecting filter 13f is arranged so as to partition the upstream case 11f into a upstream inlet-side space 12if that is closer to the upstream inlet 11if than the upstream dust collecting filter 13f, and a upstream outlet-side space 12of that is closer to the upstream outlet 11of than the upstream dust collecting filter 13f. The upstream backwashing device 14f has the same configuration as the backwashing device 14. The upstream discharger 15f has the same configuration as the discharger 15.

[0083] One end of the front-stage gas line 2f is connected to the gas generation source 1. The other end of the front-stage gas line 2f is connected to a front-stage inlet 11if of the front-stage dust collecting filter device 10f. Therefore, the front-stage gas line 2f makes it possible to introduce the front-stage gas EGf, which is the gas EG from the gas generation source 1, into the front-stage dust collecting filter device 10f.

[0084] In the fifth embodiment, one end of the gas line 2 is connected to the front-stage outlet 11 of the front-stage dust collecting filter device 10 f. Therefore, the gas line 2 can guide the gas EG that has passed through the front-stage dust collecting filter device 10 f into the dust collecting filter device 10.

[0085] The reactant supply device 20 supplies the reactant RS into the gas EG that has passed through the front-stage dust collecting filter device 10 f. Specifically, the reactant supply device 20 supplies the reactant RS into the gas line 2 between the front-stage dust collecting filter device 10 f and the dust collecting filter device 10.

[0086] Next, a gas processing system method S100C using the gas processing system 100D described above will be described. In the gas processing system method S100D of the fifth embodiment, gas EG sent from the gas generation source 1 flows through the front-stage gas line 2f into the front-stage inlet space 12if of the front-stage dust collecting filter device 10f. As a result, solid matter such as foreign matter in the gas EG is collected by the front-stage dust collecting filter 13f (S20: front-stage collection step). As shown in FIG. 8, the front-stage collection step S20 is performed before the reactant supply step S1. The gas EG flowing out of the front-stage dust collecting filter device 10f is sent to the gas line 2.

[0087] In the fifth embodiment, the reactant RS is supplied from the reactant supply device 20 to the gas line 2, but the reactant RS may also be supplied to the upstream gas line 2f. That is, a reactant supply device 20 connected to the upstream gas line 2f may be further disposed. In this case, it is also possible to separate a specific target gas for recovery by supplying an adsorbent such as activated carbon to the upstream gas line 2f.

[0088] (Operation and Effect) In the gas processing facility 100D and gas processing facility method S100D of the fifth embodiment, the gas EG before being supplied with the reactant RS is supplied to the front-stage dust collecting filter device 10f. Therefore, solid matter, such as foreign matter, contained in the gas EG is captured by the front-stage dust collecting filter device 10f. Therefore, the exhaust gas to which the powdered reactant RS is supplied contains almost no solid matter. By supplying the powdered reactant to such exhaust gas, the target gas to be recovered in the gas EG can be very effectively adsorbed and separated. Furthermore, the exhaust gas to which the reactant RS has been supplied is sent to the dust collecting filter device 10. Therefore, almost no solid matter adheres to the dust collecting filter 13 of the dust collecting filter device 10, and only the powdered reactant RS adheres. Therefore, the reactant RS recovered from the dust collecting filter device 10 by backwashing also contains almost no foreign matter. This avoids apparent performance degradation due to the inclusion of solid matter other than the reactant RS and prevents unnecessary disposal of the reactant RS. Therefore, the powdered reactant RS in good condition can be recycled efficiently.

[0089] Sixth Embodiment Next, a gas processing system 100E according to a sixth embodiment of the present disclosure will be described. In the sixth embodiment described below, components common to the first to fifth embodiments are denoted by the same reference numerals in the drawings, and descriptions thereof will be omitted. The sixth embodiment differs from the first to fifth embodiments in that reactant supply device 20A does not have detachment unit 23.

[0090] As shown in FIG. 9 , the gas processing equipment 100E of the sixth embodiment does not perform desorption treatment on the reactant RS stored in the storage section 21. In the exhaust gas processing equipment, the desorption treatment is performed by heating the reactant RS collected by the dust collecting filter 13 with a desorption gas. The gas processing equipment 100E further includes a desorption gas supply unit 8. The desorption gas supply unit 8 supplies the dust collecting filter 13 with a desorption gas having a higher temperature than the gas EG flowing through the gas line 2. The desorption gas supply unit 8 of this embodiment supplies a desorption gas to the gas line 2 so as to switch the fluid supplied to the gas line 2 from the gas EG to the desorption gas after the reactant RS has been supplied. In other words, the desorption gas supply unit 8 supplies a desorption gas to the gas line 2 between the reactant supply device 20A and the dust collecting filter device 10. In this embodiment, water vapor or the recovered target gas is supplied as the desorption gas. In this embodiment, when gas EG, which is a low-temperature gas, is supplied, powdered reactant RS is supplied from the supply unit 22 to the gas line 2. As a result, gas EG is adsorbed and separated on the surface of the dust collecting filter 13. Thereafter, without backwashing, the system is switched to desorption gas, which is a high-temperature gas, and the desorption gas is supplied from the desorption gas supply unit 8 to the gas line 2 instead of gas EG. As a result, gas EG adsorbed to the reactant RS on the surface of the dust collecting filter 13 is desorbed and recovered in the treated gas line 2t. Thereafter, the supply of desorption gas from the desorption gas supply unit 8 is stopped, backwashing is performed, and the reactant RS is recovered. Then, gas EG is again supplied to the gas line 2, and the reactant RS is supplied. In this manner, a cycle of supplying the reactant RS while switching between the supply of gas EG and the desorption gas is repeated. In this embodiment, the recovered gas to be recovered is obtained via the treated gas line 2t.

[0091] Furthermore, the reactant supply device 20A of the sixth embodiment does not have the desorption section 23. That is, the reactant supply device 20A has only the storage section 21 and the supply section 22. Therefore, in the gas processing equipment method S100E of the sixth embodiment, in the desorption processing execution step, a desorption gas is supplied to the dust collecting filter 13, and the reactant RS collected by the dust collecting filter 13 is heated by the desorption gas.

[0092] (Operation and Effect) In the gas processing facility 100E and the gas processing facility method S100E of the sixth embodiment, the desorption gas supply unit 8 supplies a desorption gas having a higher temperature than the gas EG flowing through the gas line 2. Therefore, the reactant RS collected by the dust collecting filter 13 is heated by the desorption gas and desorbed. Therefore, the desorption process can be directly performed on the reactant RS adhering to the dust collecting filter 13. Furthermore, the reactant supply device 20A does not have the desorption unit 23. Therefore, it is not necessary to heat the reactant supply device 20A, such as the storage unit 21 or the supply unit 22. This makes it possible to reduce the installation cost of heating equipment.

[0093] (Other Embodiments) Although the embodiments of the present disclosure have been described in detail above with reference to the drawings, the specific configuration is not limited to this embodiment, and design changes and the like within the scope that does not deviate from the gist of the present disclosure are also included.

[0094] In addition, the gas processing facility 100 of this embodiment does not limit the type of gas to be recovered, and various gas components can be selectively recovered by changing the type of adsorbent.

[0095] The desorption process performed by the desorbing unit 23 is not limited to heating. The desorbing unit 23 may use any other method as long as it can desorb the target gas from the reactant RS. For example, the desorbing unit 23 may reduce the pressure of the reactant RS to desorb the target gas from the reactant RS.

[0096] Furthermore, even when heating is performed in the desorbing section 23, the desorbing section 23 may have any configuration as long as it can heat the powdered reactant RS. For example, the desorbing section 23 may be configured to be capable of heating by a heat exchanger using exhaust gas heat or a high-temperature fluid such as hot water or steam, by microwave heating, by Joule heating via electrical current, or by dielectric heating. Furthermore, the desorbing section 23 may indirectly heat the powdered reactant RS from outside the storage section 21 or the supply section 22, or may directly heat the powdered reactant RS from within the storage section 21 or the supply section 22. For example, a kiln or a shell-and-tube system can be used as a structure for indirectly heating the powdered reactant RS. For example, a fluidized bed can be used as a structure for directly heating the powdered reactant RS.

[0097] Furthermore, the structure is not limited to one in which the destination of the reactant RS collected by the dust collection filter device 10 is switched by the control units 5, 5C and the destination switching unit 31. For example, the control units 5, 5C may not be provided, and switching may be performed by an operator using the destination switching unit 31.

[0098] Furthermore, in this embodiment, the reactant supply device 20 supplies the reactant RS into the gas line 2, but the supply destination of the reactant RS is not limited to the gas line 2. The reactant supply device 20 may be configured to supply the reactant RS into the gas line 2 or the inlet-side space 12i. Therefore, the reactant supply device 20 may be configured to directly supply the reactant RS into the inlet-side space 12i.

[0099] In addition, in the embodiment, an example is shown in which information on the concentration of the gas to be collected, the humidity of the gas, the flow rate of the gas, the pressure of the gas, and the temperature of the gas is input, but input of all of the information is not necessarily required, and it is sufficient to input at least one of the information. Therefore, for example, one or more of these pieces of information may be input. Furthermore, information other than these pieces of information that contributes to adjusting the supply amount of the reactant may be used as a substitute.

[0100] In addition, in the embodiment, an example was shown in which the adsorption amounts of the target gas and moisture were calculated based on information on the concentration of the gas to be recovered, gas humidity, gas flow rate, gas pressure, and gas temperature, but it is not necessary to input all of the information; it is sufficient to input at least one piece of information. Therefore, for example, one or more pieces of information may be input. Furthermore, information other than the above that contributes to the calculation of the adsorption amounts of the target gas and moisture may be used instead.

[0101] <Additional Notes> Gas processing facilities 100, 100A, 100B, 100C, 100D, and 100E and gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E described in the respective embodiments can be understood, for example, as follows.

[0102] (1) Gas processing facilities 100, 100A, 100B, 100C, 100D, and 100E according to a first aspect include a dust collecting filter device 10, a gas line 2 capable of introducing a gas EG containing a gas to be collected into the dust collecting filter device 10, and a reactant supply device 20 capable of supplying a powdered reactant RS capable of reacting with the gas to be collected into the gas EG, and the dust collecting filter device 10 is a case 1 having an inlet 11i through which the gas flows in and an outlet 11o through which the gas flows out. 1, and a dust collecting filter 13 that divides the inside of the case 11 into an inlet side space 12i on the side of the inlet 11i and an outlet side space 12o on the side of the outlet 11o, the gas line 2 is connected to the inlet 11i of the dust collecting filter device 10, and the reactant supply machine 20 is capable of supplying the reactant RS that has been subjected to a desorption process for desorbing from the reactant RS the gas to be recovered that has reacted with and adsorbed to the reactant RS into the gas line 2 or the inlet side space 12i.

[0103] According to this configuration, the powdered reactant RS has a much larger specific surface area than a reactant RS in the form of pellets with large particle diameters or a reactant RS in the form of large chunks coated on a substrate such as a honeycomb-coated type. Therefore, by supplying the powdered reactant RS to the gas EG, the target gas to be collected in the gas EG can be effectively adsorbed and separated. Furthermore, when desorbing the target gas from the reactant RS that has adsorbed the target gas, a desorption process must be performed on the reactant RS. In contrast, in this embodiment, the desorption process is performed on the powdered reactant RS. Since the desorption process is performed while the reactant RS is in powder form, the energy required for the desorption process on the reactant RS is reduced. As a result, the target gas to be collected in the gas EG can be separated with reduced loss.

[0104] (2) Gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a second aspect are the gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E of (1), in which the reactant supply device 20 heats the powdered reactant RS to a temperature higher than that of the gas EG flowing through the gas line 2 as the desorption treatment.

[0105] According to this configuration, the reactant RS for which the desorption process has been completed is supplied to the gas line 2 and is cooled by the circulating gas EG. Therefore, by cooling the reactant RS, which has become so hot that the desorption process is completed, the adsorption effect of the gas to be recovered can be improved. Furthermore, without preparing a new device for cooling the reactant RS, the reactant RS can be cooled simply by supplying it into the gas EG circulating through the gas line 2. This makes it possible to complete the desorption process to the reactant RS with high accuracy, reduce costs, and improve the adsorption performance of the gas to be recovered.

[0106] (3) The gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a third aspect are the gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E of (1), and further include a desorption gas supply unit 8 that supplies a desorption gas having a temperature higher than that of the gas EG circulating through the gas line 2 to the dust collecting filter 13, and the desorption process heats the reactant RS collected by the dust collecting filter 13 with at least one of the desorption gas and water vapor.

[0107] According to this configuration, the reactant RS collected by the particulate filter 13 is heated by the desorption gas and desorbed. Therefore, the reactant RS adhering to the particulate filter 13 can be directly desorbed.

[0108] (4) Gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a fourth aspect is the gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to any one of (1) to (3), in which the dust collecting filter device 10 has a backwash device 14 that is capable of sending high-pressure gas to the outlet-side space 12o so that the outlet-side space 12o has a higher pressure than the inlet-side space 12i, thereby causing the reactant RS captured by the dust collecting filter 13 to separate from the dust collecting filter 13, and a discharger 15 that is capable of discharging the reactant RS in the inlet-side space 12i that has separated from the dust collecting filter 13 to the outside, and further includes a reactant return line 3 that connects the discharger 15 and the reactant supply device 20 and is capable of supplying the reactant RS discharged from the discharger 15 to the reactant supply device 20.

[0109] According to this configuration, the reactant RS in a state in which the gas to be collected has been sufficiently adsorbed can be collected from the dust collecting filter 13. Then, the reactant RS in a state in which the gas to be collected has been adsorbed is subjected to a desorption process while being stored in the reactant supply device 20, and the gas to be collected is separated. Therefore, the reactant RS in a state in which the gas to be collected has been sufficiently desorbed can be supplied again to the gas line 2. This makes it possible to recycle the powdered reactant RS, and reduce the amount of the reactant RS used.

[0110] (5) Gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a fifth aspect are (4) gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E, and further include an adsorption amount acquisition unit 51 that acquires an adsorption amount of the gas to be recovered adsorbed to the reactant RS discharged by the discharger 15, and an adsorption amount determination unit 52 that determines whether the adsorption amount acquired by the adsorption amount acquisition unit 51 is below a predetermined adsorption amount reference value, and when the adsorption amount determination unit 52 determines that the adsorption amount exceeds the adsorption amount reference value, the reactant RS discharged by the discharger 15 is supplied to the reactant supply unit 20, and when the adsorption amount determination unit 52 determines that the adsorption amount is below the adsorption amount reference value, new reactant RS is supplied.

[0111] According to this configuration, the performance of the reactant RS can be evaluated based on the amount of the gas to be recovered adsorbed to the reactant RS discharged from the discharger 15. Therefore, it is easy to discard the reactant RS with reduced performance and to switch the timing for supplying a new reactant RS. This makes it possible to continue the operation of constantly supplying the reactant RS with maintained adsorption performance into the gas EG in the gas line 2.

[0112] (6) The gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to the sixth aspect are the gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to (4) or (5), in which the backwash device 14 sets the temperature of the high-pressure gas to a temperature lower than that of the gas EG flowing through the gas line 2, or sets the humidity of the high-pressure gas to a humidity higher than that of the gas EG flowing through the gas line 2.

[0113] According to this configuration, the reactant RS adhering to the particulate collection filter 13 is cooled by backwashing, and the adsorption performance of the reactant RS is improved. Therefore, even during backwashing, the adsorption effect of the gas to be collected can be improved. Furthermore, in cases where the reactant RS has a characteristic that its adsorption performance improves in the presence of moisture, such as an amine-based compound, and the target to be adsorbed is the gas to be collected, the reactant RS adhering to the particulate collection filter 13 becomes highly humid by backwashing, and the adsorption performance of the reactant RS is improved. Therefore, during backwashing, the adsorption effect of the gas to be collected can be further improved.

[0114] (7) Gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a seventh aspect is any one of gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to (1) to (6), in which the reactant supply device 20 cools the powdered reactant RS to a temperature lower than that of the gas EG and supplies the cooled reactant RS into the gas EG.

[0115] According to this configuration, when the target to be adsorbed by the reactant RS is a gas to be collected, the adsorption effect of the gas to be collected can be particularly improved by cooling the reactant RS, which has become hot enough to complete the desorption process, to a temperature lower than that of the gas EG. Furthermore, if humidified gas is mixed with the reactant RS during cooling, the humidity of the reactant RS increases. As a result, the adsorption effect of the gas to be collected can be further improved.

[0116] (8) Gas processing equipment 100, 100A, 100B, 100C, 100D, 100E according to an eighth aspect is the gas processing equipment 100, 100A, 100B, 100C, 100D, 100E according to any one of (1) to (7), further comprising a gas information acquisition unit 7 that acquires at least one of the concentration of the gas to be recovered in the gas EG flowing through the gas line 2, the humidity of the gas EG, the flow rate of the gas EG, the pressure of the gas EG, and the temperature of the gas EG, and the reactant supply device 20 acquires the front end of the gas EG that has been acquired. The supply amount of the reactant RS into the gas EG can be adjusted so that the supply amount of the reactant RS is increased when the concentration of the gas to be recovered increases, the humidity of the gas EG decreases, the flow rate of the gas EG increases, the pressure of the gas EG decreases, or the temperature of the gas EG increases, and the supply amount of the reactant RS is decreased when the concentration of the gas to be recovered in the acquired gas EG decreases, the humidity of the gas EG increases, the flow rate of the gas EG decreases, the pressure of the gas EG increases, or the temperature of the gas EG decreases.

[0117] According to this configuration, the amount of the reactant RS supplied into the gas EG is adjusted in response to changes in the concentration of the gas to be collected, the humidity of the gas EG, the flow rate of the gas EG, the pressure of the gas EG, and the temperature of the gas EG. Therefore, it is possible to appropriately supply an amount of the reactant RS into the gas EG that improves the adsorption efficiency in response to changes in the concentration and humidity of the gas to be collected in the gas EG flowing through the gas line 2.

[0118] (9) The gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E according to a ninth aspect are the gas processing equipment 100, 100A, 100B, 100C, 100D, and 100E of (1), and further include a filter adsorption state acquisition unit 56 that acquires the amount of adsorption of the target gas to be collected adsorbed to the reactant RS trapped on the dust collection filter 13 and the amount of moisture contained in the reactant RS based on at least one of the acquired concentration of the target gas to be collected in the gas EG, the humidity of the gas EG, the flow rate of the gas EG, the pressure of the gas EG, and the temperature of the gas EG, and the reactant supply device 20 is capable of adjusting the time of the desorption process so as to increase the time of the desorption process when the acquired adsorption amount of the target gas to be collected and the amount of moisture contained in the reactant RS increase, and to decrease the time of the desorption process when the acquired adsorption amount of the target gas to be collected and the amount of moisture contained in the reactant RS decrease.

[0119] According to this configuration, the conditions for performing the desorption process are adjusted based on the acquired information on the adsorption amount and moisture content of the gas to be recovered. Therefore, the conditions for the desorption process required for the current reactant RS can be appropriately determined. This allows the energy required for the desorption process of the reactant RS to be kept within an appropriate range.

[0120] (10) Gas processing equipment 100, 100A, 100B, 100C, 100D, 100E according to a tenth aspect is gas processing equipment 100, 100A, 100B, 100C, 100D, 100E according to any one of (1) to (9), and includes a front-stage dust collecting filter device 10f arranged at a position upstream of the reactant supply device 20 in the flow direction of the gas EG, and a front-stage gas line 2f that can introduce the gas EG before the reactant RS is supplied to the front-stage dust collecting filter device 10f, and the front-stage dust collecting filter device 10f has a front-stage inlet 11if through which the gas flows in and a front-stage inlet 11if through which the gas flows out. and a heat-resistant front-stage dust collecting filter 13f that divides the interior of the front-stage case 11f into a front-stage inlet-side space 12if on the side of the front-stage inlet 11if of the front-stage dust collecting filter device 10f and a front-stage outlet-side space 12of on the side of the front-stage outlet 11of of the front-stage dust collecting filter device 10f, the front-stage gas line 2f is connected to the front-stage inlet 11if of the front-stage dust collecting filter device 10f, and the reactant supply machine 20 supplies the reactant RS into the gas EG that has passed through the front-stage dust collecting filter device 10f.

[0121] According to this configuration, solids such as foreign matter contained in the gas EG are collected by the pre-stage dust collecting filter device 10f. Therefore, the exhaust gas to which the powdered reactant RS is supplied contains almost no solid matter. By supplying the powdered reactant to such exhaust gas, the target gas to be recovered in the gas EG can be very effectively adsorbed and separated. Furthermore, the exhaust gas to which the reactant RS is supplied is sent to the dust collecting filter device 10. Therefore, almost no solid matter adheres to the dust collecting filter 13 of the dust collecting filter device 10, and only the powdered reactant RS adheres. Therefore, the reactant RS recovered from the dust collecting filter device 10 by backwashing also contains almost no foreign matter. This avoids apparent performance degradation due to the inclusion of solids other than the reactant RS and prevents unnecessary disposal of the reactant RS. Therefore, powdered reactant RS in good condition can be efficiently recycled.

[0122] (11) The gas processing equipment methods S100, S100A, S100B, S100C, S100D, and S100E according to the eleventh aspect include a reactant supply step S1, S1A of supplying a powdered reactant RS capable of reacting with a gas to be recovered to a gas EG that is circulating through a gas line 2 and contains the gas to be recovered, and a collection step S20 of using a dust collecting filter device 10 equipped with a dust collecting filter 13 to collect the powdered reactant RS that has flowed into the dust collecting filter device 10. In the reactant supply steps S1, S1A, a desorption process is performed to desorb from the reactant RS the gas to be recovered that has reacted with and adsorbed to the reactant RS, and then the reactant RS is supplied.

[0123] According to this configuration, the powdered reactant RS has a much larger specific surface area than a reactant RS in the form of pellets with large particle diameters or a reactant RS in the form of large chunks coated on a substrate such as a honeycomb-coated type. Therefore, by supplying the powdered reactant RS to the gas EG, the target gas to be collected in the gas EG can be effectively adsorbed and separated. Furthermore, when desorbing the target gas from the reactant RS that has adsorbed the target gas, a desorption process must be performed on the reactant RS. In contrast, in this embodiment, the desorption process is performed on the powdered reactant RS. Since the desorption process is performed while the reactant RS is in powder form, the energy required for the desorption process on the reactant RS is reduced. As a result, the target gas to be collected in the gas EG can be separated with reduced loss.

[0124] (12) The gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E according to a twelfth aspect are the gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E of (11), in which in the reactant supply steps S1 and S1A, the powdered reactant RS is heated to a temperature higher than that of the gas EG flowing through the gas line 2 as the desorption treatment.

[0125] According to this configuration, the reactant RS for which the desorption process has been completed is supplied to the gas line 2 and is cooled by the circulating gas EG. Therefore, by cooling the reactant RS, which has become so hot that the desorption process is completed, the adsorption effect of the gas to be recovered can be improved. Furthermore, without preparing a new device for cooling the reactant RS, the reactant RS can be cooled simply by supplying it into the gas EG circulating through the gas line 2. This makes it possible to complete the desorption process to the reactant RS with high accuracy, reduce costs, and improve the adsorption performance of the gas to be recovered.

[0126] (13) The gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E according to a thirteenth aspect are the gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E of (12), in which in the reactant supply steps S1 and S1A, as the desorption treatment, a desorption gas having a temperature higher than that of the gas EG circulating through the gas line 2 is supplied to the dust collecting filter 13, and the reactant RS collected by the dust collecting filter 13 is heated by the desorption gas.

[0127] According to this configuration, the reactant RS collected by the particulate filter 13 is heated by the desorption gas and desorbed. Therefore, the reactant RS adhering to the particulate filter 13 can be directly desorbed.

[0128] (14) The gas processing facility method S100, S100A, S100B, S100C, S100D, S100E according to a fourteenth aspect is any one of the gas processing facility methods S100, S100A, S100B, S100C, S100D, S100E according to (11) to (13), further including a backwashing step S3, S3B in which the reactant RS collected by the dust collecting filter 13 of the dust collecting filter device 10 is separated from the dust collecting filter 13 by high-pressure gas, and a discharge step S4 in which the reactant RS separated from the dust collecting filter 13 in the backwashing step S3, S3B is discharged from the dust collecting filter device 10, and the reactant RS discharged in the discharge step S4 is supplied in the reactant supply step S1, S1A.

[0129] According to this configuration, the reactant RS in a state in which the gas to be collected has been sufficiently adsorbed can be collected from the dust collecting filter 13. Then, the reactant RS in a state in which the gas to be collected has been adsorbed is subjected to a desorption process, and the gas to be collected is separated. Therefore, the reactant RS in a state in which the gas to be collected has been sufficiently adsorbed and then desorbed can be supplied again to the gas line 2. This makes it possible to recycle the powdered reactant RS, and reduce the amount of the reactant RS used.

[0130] (15) The gas processing facility method S100, S100A, S100B, S100C, S100D, and S100E according to a fifteenth aspect are the gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E of (14), further comprising: an adsorption amount acquisition step S5 for acquiring an adsorption amount of the gas to be recovered adsorbed to the reactant RS discharged in the discharge step S4; and a step of acquiring the adsorption amount acquired in the adsorption amount acquisition step S5 in advance. and an adsorption amount determination step S6 for determining whether the adsorption amount is below a predetermined adsorption amount reference value. In the reactant supply steps S1 and S1A, if it is determined in the adsorption amount determination step S6 that the adsorption amount exceeds the adsorption amount reference value, the reactant RS discharged in the discharge step S4 is supplied, and if it is determined in the adsorption amount determination step S6 that the adsorption amount is below the adsorption amount reference value, new reactant RS is supplied.

[0131] According to this configuration, the performance of the reactant RS can be evaluated based on the amount of the gas to be recovered adsorbed to the reactant RS discharged in the discharge step S4. Therefore, it is easy to discard the reactant RS with reduced performance and to switch the timing for supplying a new reactant RS. This makes it possible to continue the operation of constantly supplying the reactant RS with maintained adsorption performance into the gas EG in the gas line 2.

[0132] (16) The gas treatment facility method S100, S100A, S100B, S100C, S100D, and S100E according to the sixteenth aspect are the gas treatment facility methods S100, S100A, S100B, S100C, S100D, and S100E according to (14) or (15), in which in the backwashing steps S3 and S3B, the high-pressure gas is adjusted to a temperature equal to or lower than that of the gas EG flowing through the gas line 2, or the high-pressure gas is adjusted to a humidity higher than that of the gas EG flowing through the gas line 2.

[0133] According to this configuration, the reactant RS adhering to the particulate collection filter 13 is cooled by backwashing, and the adsorption performance of the reactant RS is improved. Therefore, even during backwashing, the adsorption effect of the gas to be collected can be improved. Furthermore, in cases where the reactant RS has a characteristic that its adsorption performance improves in the presence of moisture, such as an amine-based compound, and the target to be adsorbed is the gas to be collected, the reactant RS adhering to the particulate collection filter 13 becomes highly humid by backwashing, and the adsorption performance of the reactant RS is improved. Therefore, during backwashing, the adsorption effect of the gas to be collected can be further improved.

[0134] (17) The gas processing facility method S100, S100A, S100B, S100C, S100D, and S100E according to the seventeenth aspect is any one of the gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E according to (11) to (16), in which in the reactant supply step S1, S1A, the powdered reactant RS is cooled to a temperature lower than that of the gas EG and supplied into the gas EG.

[0135] According to this configuration, when the target to be adsorbed by the reactant RS is a gas to be collected, the reactant RS, which has become so hot that the desorption process is completed, is cooled to a temperature lower than that of the gas EG, thereby particularly improving the adsorption effect of the gas to be collected. Furthermore, if humidified gas is mixed with the reactant RS during cooling, the humidity of the reactant RS increases. As a result, the adsorption effect of the gas to be collected can be further improved.

[0136] (18) The gas processing facility method S100, S100A, S100B, S100C, S100D, and S100E according to an eighteenth aspect is any one of the gas processing facility methods S100, S100A, S100B, S100C, S100D, and S100E according to (11) to (17), further comprising a gas information acquisition step S81 for acquiring at least one of the concentration of the gas to be recovered in the gas EG flowing through the gas line 2, the humidity of the gas EG, the flow rate of the gas EG, the pressure of the gas EG, and the temperature of the gas EG, and In 1A, if the concentration of the gas to be recovered in the acquired gas EG increases, the humidity of the gas EG decreases, the flow rate of the gas EG increases, the pressure of the gas EG decreases, or the temperature of the gas EG increases, the supply amount of the reactant RS is increased, and if the concentration of the gas to be recovered in the acquired gas EG decreases, the humidity of the gas EG increases, the flow rate of the gas EG decreases, the pressure of the gas EG increases, or the temperature of the gas EG decreases, the supply amount of the reactant RS into the gas EG is adjusted so as to decrease.

[0137] According to this configuration, the amount of the reactant RS supplied into the gas EG is adjusted in response to changes in the concentration of the gas to be collected, the flow rate of the gas EG, the pressure of the gas EG, the temperature of the gas EG, or the humidity of the gas EG. Therefore, it is possible to appropriately supply an amount of the reactant RS into the gas EG that improves the adsorption efficiency in response to changes in the concentration and humidity of the gas to be collected in the gas EG flowing through the gas line 2.

[0138] (19) The gas processing facility method S100, S100A, S100B, S100C, S100D, and S100E according to a nineteenth aspect is the gas processing facility method S100, S100A, S100B, S100C, S100D, and S100E according to (18), in which a concentration of the target gas to be recovered in the acquired gas EG, a humidity of the gas EG, a flow rate of the gas EG, a pressure of the gas EG, and a temperature of the gas EG are determined based on the reactant RS collected on the dust collecting filter 13. The method further includes a filter adsorption state acquisition step S82 for acquiring the amount of adsorption of the gas to be recovered and the amount of moisture contained in the reactant RS, and in the reactant supply steps S1 and S1A, when the acquired amount of adsorption of the gas to be recovered and the amount of moisture contained in the reactant RS increase, the time of the desorption process is increased, and when the acquired amount of adsorption of the gas to be recovered and the amount of moisture contained in the reactant RS decrease, the time of the desorption process is adjusted so as to decrease.

[0139] According to this configuration, the conditions for performing the desorption process are adjusted based on the acquired information on the adsorption amount and moisture content of the gas to be recovered. Therefore, the conditions for the desorption process required for the current reactant RS can be appropriately determined. This allows the energy required for the desorption process of the reactant RS to be kept within an appropriate range.

[0140] (20) The gas processing facility method S100, S100A, S100B, S100C, S100D, S100E according to the twentieth aspect is any one of the gas processing facility methods S100, S100A, S100B, S100C, S100D, S100E according to (11) to (19), and further includes a front-stage collection step S20, which is performed before the reactant supply step S1, S1A, and which uses a front-stage dust collection filter device 10f equipped with a heat-resistant front-stage dust collection filter 13f to collect solid matter contained in the gas EG that has flowed into the front-stage dust collection filter device 10f, and in the reactant supply step S1, S1A, the reactant RS is supplied into the gas EG after the front-stage collection step S20 has been performed.

[0141] According to this configuration, solids such as foreign matter contained in the gas EG are collected by the pre-stage dust collecting filter device 10f. Therefore, the exhaust gas to which the powdered reactant RS is supplied contains almost no solid matter. By supplying the powdered reactant to such exhaust gas, the target gas to be recovered in the gas EG can be very effectively adsorbed and separated. Furthermore, the exhaust gas to which the reactant RS is supplied is sent to the dust collecting filter device 10. Therefore, almost no solid matter adheres to the dust collecting filter 13 of the dust collecting filter device 10, and only the powdered reactant RS adheres. Therefore, the reactant RS recovered from the dust collecting filter device 10 by backwashing also contains almost no foreign matter. This avoids apparent performance degradation due to the inclusion of solids other than the reactant RS and prevents unnecessary disposal of the reactant RS. Therefore, powdered reactant RS in good condition can be efficiently recycled.

[0142] According to the gas processing facility and gas processing facility method of the present disclosure, it is possible to separate the target gas to be recovered from the gas while suppressing loss.

[0143] 100, 100A, 100B, 100C, 100D, 100E Gas treatment equipment 1 Gas generation source EG Gas RS Reactant 10 Dust collection filter device 11 Case 11i Inlet 12i Inlet side space 11o Outlet 12o Outlet side space 13 Dust collection filter 14 Backwash device 14a Backwash high-pressure gas tank 14b High-pressure gas guide pipe 14c Opening and closing valve 15 Discharger 2 Gas line 2t Treated gas line 4 Suction blower 20 Reactant supply device 21 Storage section 22 Supply section 23 Desorption section 24 Gas discharge line 3 Reactant return line 31 Sending destination switching section 200 New reactant supply section 5, 5C Control section 51 Adsorption amount acquisition section 52 Adsorption amount determination section S100, S100A, S100B, S100C, S100D, S100E Gas treatment facility method S1, S1A Reactant supply step S11 New reactant supply step S12 Storing step S13, S13E Desorption treatment implementation step S14 Supply implementation step S2 Collection step S3, S3B Backwashing step S31 Differential pressure determination step S32 Backwashing implementation step S4 Discharge step S5 Adsorption amount acquisition step S6 Adsorption amount determination step S7 Disposal step 6 Reactant cooling section 141 Backwash gas adjustment section 7 Gas information acquisition section 56 Filter adsorption state acquisition section 57 Supply condition adjustment section 58 Desorption condition adjustment section 59 Backwashing condition adjustment section S81 Gas information acquisition step S82 Filter adsorption state acquisition step S83 Supply condition adjustment step S84 Backwash condition adjustment step S85 Desorption condition adjustment step 10f Pre-stage dust collecting filter device 2f Pre-stage gas line 11f Pre-stage case 11if Pre-stage inlet 12if Pre-stage inlet side space 11of Pre-stage outlet 12of Pre-stage outlet side space 13f Pre-stage dust collecting filter 14f Pre-stage backwash device 15f Pre-stage discharger S20 Pre-stage collection step 8 Desorption gas supply section

Claims

1. A gas treatment facility comprising: a dust collecting filter device; a gas line capable of introducing a gas containing a gas to be collected into the dust collecting filter device; and a reactant supply machine capable of supplying a powdered reactant capable of reacting with the gas to be collected into the gas, wherein the dust collecting filter device comprises a case having an inlet for gas flow in and an outlet for gas flow out, and a dust collecting filter that divides the inside of the case into an inlet-side space on the inlet side and an outlet-side space on the outlet side, the gas line is connected to the inlet of the dust collecting filter device, and the reactant supply machine is capable of supplying, into the gas line or the inlet-side space, the reactant that has been subjected to a desorption process to desorb from the gas to be collected that has reacted with and adsorbed to the reactant.

2. The gas processing facility according to claim 1, wherein the reactant supply device heats the powdered reactant to a temperature higher than that of the gas flowing through the gas line as the desorption treatment.

3. The gas processing facility according to claim 2, further comprising a desorption gas supply unit that supplies to the dust collecting filter a desorption gas having a temperature higher than that of the gas circulating through the gas line, wherein the desorption process heats the reactant captured by the dust collecting filter with at least one of the desorption gas and water vapor.

4. The gas treatment facility according to claim 1 or 2, wherein the dust collecting filter device comprises a backwashing device capable of sending high-pressure gas to the outlet space so that the outlet space has a higher pressure than the inlet space, thereby separating the reactant trapped by the dust collecting filter from the dust collecting filter, and a discharger capable of discharging the reactant in the inlet space that has separated from the dust collecting filter to the outside, and further comprising a reactant return line that connects the discharger and the reactant supply machine and is capable of supplying the reactant discharged from the discharger to the reactant supply machine.

5. The gas processing facility according to claim 4, further comprising: an adsorption amount acquisition unit that acquires an adsorption amount of the target gas adsorbed to the reactant discharged by the discharger; and an adsorption amount determination unit that determines whether the adsorption amount acquired by the adsorption amount acquisition unit is below a predetermined adsorption amount reference value, wherein if the adsorption amount determination unit determines that the adsorption amount exceeds the adsorption amount reference value, the reactant discharged by the discharger is supplied to the reactant supply unit, and if the adsorption amount determination unit determines that the adsorption amount is below the adsorption amount reference value, new reactant is supplied.

6. A gas treatment facility as described in claim 4, wherein the backwash device adjusts the temperature of the high-pressure gas to a temperature lower than that of the gas flowing through the gas line, or adjusts the humidity of the high-pressure gas to a humidity higher than that of the gas flowing through the gas line.

7. A gas processing facility according to claim 1 or 2, wherein the reactant supply device cools the powdered reactant to a temperature lower than that of the gas and supplies the cooled reactant into the gas.

8. The gas processing facility according to claim 1 or 2, further comprising a gas information acquisition unit that acquires at least one of the concentration of the gas to be recovered in the gas circulating through the gas line, the humidity of the gas, the flow rate of the gas, the pressure of the gas, and the temperature of the gas, wherein the reactant supply device is capable of increasing the amount of the reactant supplied when the concentration of the gas to be recovered in the acquired gas increases, the humidity of the gas decreases, the flow rate of the gas increases, the pressure of the gas decreases, or the temperature of the gas increases, and adjusting the amount of the reactant supplied into the gas so as to decrease the amount of the reactant supplied when the concentration of the gas to be recovered in the acquired gas decreases, the humidity of the gas increases, the flow rate of the gas decreases, the pressure of the gas increases, or the temperature of the gas decreases.

9. The gas processing facility according to claim 8, further comprising a filter adsorption state acquisition unit that acquires the amount of the target gas adsorbed to the reactant trapped on the dust collection filter and the amount of moisture contained in the reactant based on at least one of the concentration of the target gas in the acquired gas, the humidity of the gas, the flow rate of the gas, the pressure of the gas, and the temperature of the gas, wherein the reactant supply device is capable of adjusting the time of the desorption process so as to increase the time of the desorption process when the acquired amount of adsorption of the target gas to be collected and the amount of moisture contained in the reactant increase, and to decrease the time of the desorption process when the acquired amount of adsorption of the target gas to be collected and the amount of moisture contained in the reactant decrease.

10. A gas treatment facility as claimed in claim 1 or 2, comprising: a front-stage dust collecting filter device arranged at a position upstream of the reactant supply machine in the direction of gas flow; and a front-stage gas line capable of introducing the gas before the reactant is supplied into the front-stage dust collecting filter device, wherein the front-stage dust collecting filter device comprises a front-stage case in which a front-stage inlet through which gas flows and a front-stage outlet through which gas flows out are formed, and a heat-resistant front-stage dust collecting filter that divides the interior of the front-stage case into a front-stage inlet side space on the front-stage inlet side of the front-stage dust collecting filter device and a front-stage outlet side space on the front-stage outlet side of the front-stage dust collecting filter device, wherein the front-stage gas line is connected to the front-stage inlet of the front-stage dust collecting filter device, and the reactant supply machine supplies the reactant into the gas that has passed through the front-stage dust collecting filter device.

11. A gas treatment system method comprising: a reactant supply step of supplying a powdered reactant capable of reacting with a gas to be recovered to a gas circulating through a gas line and containing the gas; and a collection step of using a dust collection filter device equipped with a dust collection filter to collect the powdered reactant that has flowed into the dust collection filter device, wherein in the reactant supply step, the gas to be recovered that has reacted with and adsorbed to the reactant is desorbed from the reactant, and then the reactant is supplied.

12. The gas processing facility method according to claim 11, wherein in the reactant supply step, the powdered reactant is heated to a temperature higher than that of the gas flowing through the gas line as the desorption treatment.

13. A gas processing facility method as described in claim 12, wherein in the reactant supply step, a desorption gas having a temperature higher than that of the gas circulating through the gas line is supplied to the dust collecting filter as the desorption treatment, and the reactant collected by the dust collecting filter is heated by the desorption gas.

14. A gas processing facility method according to claim 11 or 12, further comprising: a backwashing process in which the reactant captured by the dust collecting filter of the dust collecting filter device is removed from the dust collecting filter by high-pressure gas; and a discharge process in which the reactant removed from the dust collecting filter in the backwashing process is discharged from the dust collecting filter device, wherein the reactant discharged in the discharge process is supplied in the reactant supply process.

15. A gas processing facility method according to claim 14, further comprising: an adsorption amount acquisition process for acquiring an adsorption amount of the gas to be recovered adsorbed to the reactant discharged in the discharge process; and an adsorption amount determination process for determining whether the adsorption amount acquired in the adsorption amount acquisition process is below a predetermined adsorption amount reference value, wherein in the reactant supply process, if it is determined in the adsorption amount determination process that the adsorption amount exceeds the adsorption amount reference value, the reactant discharged in the discharge process is supplied, and if it is determined in the adsorption amount determination process that the adsorption amount is below the adsorption amount reference value, new reactant is supplied.

16. A gas treatment equipment method as described in claim 14, wherein in the backwashing process, the high-pressure gas is cooled to a temperature lower than that of the gas flowing through the gas line, or the high-pressure gas is cooled to a humidity higher than that of the gas flowing through the gas line.

17. A gas processing facility method according to claim 11 or 12, wherein in the reactant supply step, the powdered reactant is cooled to a temperature lower than that of the gas and then supplied into the gas.

18. A gas processing facility method according to claim 11 or 12, further comprising a gas information acquisition step of acquiring at least one of the concentration of the gas to be recovered in the gas circulating through the gas line, the humidity of the gas, the flow rate of the gas, the pressure of the gas, and the temperature of the gas, wherein in the reactant supply step, the amount of the reactant supplied is increased when the concentration of the gas to be recovered in the acquired gas increases, the humidity of the gas decreases, the flow rate of the gas increases, the pressure of the gas decreases, or the temperature of the gas increases, and the amount of the reactant supplied into the gas is adjusted so that the amount of the reactant supplied is decreased when the concentration of the gas to be recovered in the acquired gas decreases, the humidity of the gas increases, the flow rate of the gas decreases, the pressure of the gas increases, or the temperature of the gas decreases.

19. A gas processing facility method as set forth in claim 18, further comprising a filter adsorption state acquisition step of acquiring the amount of the target gas adsorbed to the reactant trapped on the dust collection filter and the amount of moisture contained in the reactant based on at least one of the concentration of the target gas in the acquired gas, the humidity of the gas, the flow rate of the gas, the pressure of the gas, and the temperature of the gas, wherein in the reactant supply step, the time of the desorption process is adjusted so that if the acquired adsorption amount of the target gas to be collected and the amount of moisture contained in the reactant increase, the time of the desorption process is increased, and if the acquired adsorption amount of the target gas to be collected and the amount of moisture contained in the reactant decrease, the time of the desorption process is adjusted so that the time of the desorption process is decreased.

20. A gas processing facility method as described in claim 11 or 12, further comprising a pre-stage collection step, which is carried out before the reactant supply step, using a pre-stage dust collection filter device equipped with a heat-resistant pre-stage dust collection filter to collect solid matter contained in the gas that has flowed into the pre-stage dust collection filter device, and in the reactant supply step, the reactant is supplied into the gas after the pre-stage collection step has been carried out.

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