Display device

Abstract

A display device is provided. The display device comprises: a display substrate; a pixel defining layer located on the display substrate and comprising a plurality of light-emitting regions; a plurality of light-emitting devices located in the plurality of light-emitting regions, respectively, wherein each of the plurality of light-emitting devices comprises a pixel electrode, a common electrode, and an organic light-emitting portion located between the pixel electrode and the common electrode, wherein the pixel defining layer comprises a first inner side surface and a second inner side surface facing each other in each of the plurality of light-emitting regions, the pixel electrode being located on the first inner side surface, and the common electrode being located on the second inner side surface.

Description

[0001] This application claims the benefit of Korean Patent Application No. 10-2018-0119308 filed on October 5, 2018, in the Korean Intellectual Property Office, the contents of which are incorporated herein in their entirety by reference. Technical Field

[0002] One or more embodiments relate to a display device. Background Art

[0003] With the rapid development of the display field that visually expresses various electrical signal information, various flat panel display devices having excellent characteristics such as thinness, light weight, and low power consumption have been introduced. Since the organic light emitting display device does not require a separate light source, the organic light emitting display device can be driven at a low voltage and can exhibit excellent characteristics including a wide viewing angle, a high contrast ratio, and a fast response speed. Therefore, the organic light emitting display device is attracting attention as a next-generation display device.

[0004] The organic light emitting display device includes an organic light emitting device having an organic emission layer between a pair of electrodes, and emits light as excitons generated by electrons and holes provided from the pair of electrodes are combined in the organic emission layer and drop from an excited state to a ground state. At the same time, in addition to including a metal electrode, the pair of electrodes may also include a functional layer for injecting and transporting electrons or holes. Such a functional layer may be formed by an inkjet method.

[0005] However, because conventional organic light-emitting devices have a structure in which a pair of electrodes and an organic emission layer therebetween are sequentially stacked, when a functional layer is formed by an inkjet method, it is difficult to form the functional layer with a uniform thickness in the light-emitting area due to a difference in surface tension between the ink and another insulating layer defining the light-emitting area or a difference in drying speed of the ink between the central portion and the outer portion of the light-emitting area, and thus uneven brightness occurs in the light-emitting area. Summary of the invention

[0006] One or more embodiments include a display apparatus including an organic light emitting device having a new structure in which brightness uniformity of a light emitting region is improved.

[0007] Additional aspects will be set forth in part in the description which follows and, in part, will be apparent from the description, or may be learned by practice of the presented embodiments.

[0008] According to one or more embodiments, a display device includes: a display substrate; a pixel defining layer located on the display substrate and including a plurality of light-emitting areas; and a plurality of light-emitting devices located in the plurality of light-emitting areas, respectively, wherein each of the plurality of light-emitting devices includes a pixel electrode, a common electrode, and an organic light-emitting portion located between the pixel electrode and the common electrode, wherein the pixel defining layer includes a first inner surface and a second inner surface facing each other in each of the plurality of light-emitting areas, the pixel electrode being located on the first inner surface, and the common electrode being located on the second inner surface.

[0009] The display device may further include: a barrier rib located in each of the plurality of light-emitting areas, dividing each of the plurality of light-emitting areas into a first area and a second area, and having a height less than a thickness of the pixel defining layer, wherein the pixel electrode is located in the first area and the common electrode is located in the second area.

[0010] In each of the plurality of light emitting regions, the pixel defining layer may further include a third inner surface and a fourth inner surface connecting the first inner surface to the second inner surface and facing each other, the barrier rib extending from the third inner surface to the fourth inner surface.

[0011] The common electrode may extend on an upper surface of the pixel defining layer and be integrally formed with the plurality of light emitting devices.

[0012] The common electrode may include a plurality of openings overlapping the plurality of light emitting regions and being larger than the plurality of light emitting regions. Each of the plurality of openings may be spaced apart from the first inner side surface, the third inner side surface, and the fourth inner side surface at the upper surface of the pixel defining layer.

[0013] The display device may further include: a first functional layer located between the pixel electrode and the organic light emitting portion, and a second functional layer located between the common electrode and the organic light emitting portion.

[0014] The first functional layer may be located in the first region, the second functional layer may be located in the second region, and the organic light emitting portion may be continuously located on the first region and the second region.

[0015] The first functional layer may include a hole injection layer and a hole transport layer, and the second functional layer may include an electron injection layer and an electron transport layer.

[0016] Each of the first functional layer and the second functional layer may have a constant thickness at a height equal to or greater than that of the barrier ribs.

[0017] The display substrate may include a base substrate, a thin film transistor located on the base substrate, and a passivation layer located on the thin film transistor, wherein the pixel defining layer may be located on the passivation layer, and the pixel electrode extends on the bottom surface of the first region and is electrically connected to the thin film transistor through a contact hole.

[0018] According to one or more embodiments, a display device includes: a display substrate; a pixel defining layer, which is located on the display substrate and includes a plurality of light-emitting areas; barrier ribs, which are located in each of the plurality of light-emitting areas and divide each of the plurality of light-emitting areas into a first area and a second area; and a plurality of light-emitting devices, which are respectively located in the plurality of light-emitting areas, wherein each of the plurality of light-emitting devices includes a first electrode and a second electrode arranged to face each other, the first electrode is located in the first area, and the second electrode is located in the second area.

[0019] In each of the multiple light-emitting areas, the pixel defining layer may also include a first inner surface and a second inner surface facing each other, and a third inner surface and a fourth inner surface connecting the first inner surface to the second inner surface and facing each other, and the barrier ribs may extend from the third inner surface to the fourth inner surface.

[0020] The first electrode may be located on the first inner surface, and the second electrode may be located on the second inner surface.

[0021] The display device may further include: a first functional layer located on the first electrode, a second functional layer located on the second electrode, and an organic light emitting portion located between the first functional layer and the second functional layer.

[0022] The height of the barrier ribs may be smaller than the thickness of the pixel defining layer, and each of the first and second functional layers may have a constant thickness at a height equal to or greater than the height of the barrier ribs.

[0023] The first functional layer may cover the surface of the first electrode and the first side of the surface of the barrier rib facing the first electrode, the second functional layer may cover the surface of the second electrode and the second side of the surface of the barrier rib facing the second electrode, the first functional layer and the second functional layer may be separated from each other by the barrier ribs, and the organic light-emitting portion may be continuously located on the first region and the second region.

[0024] The display substrate may include a base substrate, a thin film transistor on the base substrate, and a passivation layer on the thin film transistor, and the pixel defining layer may be on the passivation layer.

[0025] The first electrode may extend on a bottom surface of the first region, and may be electrically connected to the thin film transistor through a contact hole of the first region.

[0026] The second electrode may extend on the upper surface of the pixel defining layer, and may be integrally formed with the plurality of light emitting devices.

[0027] The second electrode may include a plurality of openings overlapping the plurality of light emitting regions, and each of the plurality of openings may be separated from the first, third, and fourth inner side surfaces at an upper surface of the pixel defining layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] These and / or other aspects will become clear and more readily understood through the following description of the embodiments in conjunction with the accompanying drawings, in which:

[0029] Figure 1 is a plan view schematically showing an embodiment of a display device according to an embodiment;

[0030] Figure 2 It is schematically shown Figure 1 A plan view of an example of a light emitting area in a display device;

[0031] Figure 3 is schematically shown along Figure 2 A cross-sectional view of an example of a cross-section taken along line II';

[0032] Figure 4 It is schematically shown Figure 1 A plan view of another example of a light emitting area in a display device of ; and

[0033] Figure 5 is schematically shown along Figure 4 A cross-sectional view of an example of a cross-section taken along line II-II'. DETAILED DESCRIPTION

[0034] Embodiments will now be mentioned in detail, examples of which are shown in the accompanying drawings, wherein the same reference numerals always represent the same elements. In this regard, the present embodiment may have different forms and should not be construed as being limited to the description set forth herein. Therefore, embodiments are described below with reference to the accompanying drawings only to explain the various aspects of this specification. When a statement such as "at least one (kind / person) of ... " is after a column of elements (elements), the elements (elements) of the entire column are modified, rather than the individual elements (elements) in the column.

[0035] It will be understood that, although the terms "first", "second", etc. may be used herein to describe various components, these components should not be limited by these terms.

[0036] An expression used in the singular includes the expression in the plural unless it has an obviously different meaning in the context.

[0037] It will also be understood that the terms “comprises” and / or “comprising” used herein specify the presence of stated features or components, but do not preclude the presence or addition of one or more other features or components.

[0038] It will be understood that when a layer, region or component is referred to as being “formed on” another layer, region or component, it may be directly or indirectly formed on the other layer, region or component. That is, for example, there may be an intervening layer, region or component.

[0039] For the convenience of explanation, the sizes of the components in the drawings may be exaggerated. In other words, since the sizes and thicknesses of the components in the drawings are arbitrarily shown for the convenience of explanation, the following embodiments are not limited thereto.

[0040] When a specific embodiment can be implemented differently, a specific process order can be performed in a different order than described. For example, two processes described in succession can be performed substantially simultaneously, or can be performed in an order opposite to the order described.

[0041] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. The same reference numerals are used to represent the same elements.

[0042] Figure 1 is a plan view schematically showing an embodiment of a display device according to the embodiment.

[0043] Reference Figure 1 , the display device 10 according to the embodiment has a display area DA in which an image is displayed and a peripheral area PA located outside the display area DA.

[0044] A plurality of light emitting areas EA may be located in the display area DA. The plurality of light emitting areas EA may be separated from each other in the first direction X and the second direction Y, and light emitting devices may be located in the plurality of light emitting areas EA. The plurality of light emitting areas EA may be included in the pixel defining layer 100.

[0045] The peripheral area PA includes a pad area, which is an area where various electronic devices or a printed circuit board are electrically connected, and a plurality of wirings for transmitting electrical signals to be applied to the light emitting devices located in the light emitting area EA may be located in the peripheral area PA.

[0046] Figure 2 It is schematically shown Figure 1 A plan view of an example of a light emitting area in the display device 10, Figure 3 is schematically shown along Figure 2 This is a cross-sectional view of an example of a cross section taken along line II'. Figure 2 and Figure 3One light emitting region is shown, but multiple light emitting regions may all have the same structure.

[0047] Reference Figure 2 and Figure 3 , the pixel defining layer 100 is disposed on the display substrate 12. The pixel defining layer 100 may include at least one organic insulating material of polyimide, polyamide, acrylic resin, benzocyclobutene (BCB), and phenolic resin, and may be formed by spin coating.

[0048] The light emitting area EA surrounded by the pixel defining layer 100 has a concave shape. The light emitting device may be located in the light emitting area EA having a concave shape. The light emitting device may be, for example, an organic light emitting device OLED including an organic light emitting portion 140. Meanwhile, the display substrate 12 may include a thin film transistor electrically connected to the organic light emitting device OLED.

[0049] When viewed in a plan view, the light emitting area EA may, for example, have a substantially rectangular shape. To this end, the pixel defining layer 100 may include a first inner surface S1 and a second inner surface S2 facing each other in the light emitting area EA. In addition, the pixel defining layer 100 may include a third inner surface S3 and a fourth inner surface S4 connecting the first inner surface S1 to the second inner surface S2 and facing each other in the light emitting area EA. That is, the light emitting area EA may be defined as an area divided by the first inner surface S1 to the fourth inner surface S4. At the same time, the light emitting area EA may have rounded corners. For example, the first inner surface S1 and the third inner surface S3 do not intersect vertically, and the intersection of the first inner surface S1 and the third inner surface S3 may be rounded.

[0050] The barrier ribs 110 may be located in the emission area EA to divide the emission area EA into a first area A1 and a second area A2. The barrier ribs 110 may extend from the third inner surface S3 of the pixel defining layer 100 to the fourth inner surface S4, and may have a height less than the thickness of the pixel defining layer 100 (e.g., a height less than the thickness of the pixel defining layer 100 by a height L). The barrier ribs 110 may include the same material as that of the pixel defining layer 100, and may be formed simultaneously with the pixel defining layer 100.

[0051] The organic light emitting device OLED may include a first electrode 120, a second electrode 130, and an organic light emitting portion 140 between the first electrode 120 and the second electrode 130. The organic light emitting device OLED may also include first functional layers 122 and 124 between the first electrode 120 and the organic light emitting portion 140, and second functional layers 132 and 134 between the second electrode 130 and the organic light emitting portion 140.

[0052] The first electrode 120 and the second electrode 130 are arranged to face each other. The first electrode 120 is located in the first area A1, and the second electrode 130 is located in the second area A2. For example, the first electrode 120 is located on the first inner surface S1 and the second electrode 130 is located on the second inner surface S2, so that they can face each other in the horizontal direction. Therefore, the first electrode 120 and the second electrode 130 do not need to have transparent properties. For example, the first electrode 120 and the second electrode 130 may include silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), palladium (Pd), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr) or a mixture thereof.

[0053] The first functional layers 122 and 124 may be on the first electrode 120. For example, the first electrode 120 may be a pixel electrode, and the first functional layers 122 and 124 may include a hole injection layer 122 and a hole transport layer 124. The first functional layers 122 and 124 may be formed by, for example, an inkjet method. Therefore, the first functional layers 122 and 124 may cover the surface of the first electrode 120 and the first side of the surface of the barrier ribs 110 facing the first electrode 120. The central portion between the first electrode 120 and the barrier ribs 110 may have a concave shape while being dried.

[0054] The second functional layers 132 and 134 may be on the second electrode 130. For example, the second electrode 130 may be a common electrode, and the second functional layers 132 and 134 may include an electron injection layer 132 and an electron transport layer 134. The second functional layers 132 and 134 may be formed by an inkjet method in the same manner as the first functional layers 122 and 124. Thus, the second functional layers 132 and 134 may cover the surface of the second electrode 130 and the second side of the surface of the barrier ribs 110 facing the second electrode 130. The center portion between the second electrode 130 and the barrier ribs 110 may have a concave shape.

[0055] That is, the first functional layers 122 and 124 and the second functional layers 132 and 134 may be separated from each other by the barrier ribs 110 so that the first functional layers 122 and 124 may be located in the first area A1 and the second functional layers 132 and 134 may be located in the second area A2.

[0056] The organic light emitting portion 140 may include a low molecular weight organic material or a high molecular weight organic material and may be continuously located on the first area A1 and the second area A2 . Therefore, the organic light emitting portion 140 is also located on the barrier ribs 110 .

[0057] Meanwhile, as described above, the first functional layers 122 and 124 are formed by the inkjet method and may have a uniform thickness on the first electrode 120. In more detail, since the first functional layers 122 and 124 may have a concave shape at the central portion of the first area A1, at least the first functional layers 122 and 124 may have a constant thickness at a height equal to or greater than the barrier ribs 110. Likewise, the second functional layers 132 and 134 may have a constant thickness at a height equal to or greater than the barrier ribs 110.

[0058] That is, the first functional layers 122 and 124 and the second functional layers 132 and 134 have a constant thickness at a height equal to or greater than the barrier ribs 110 in the horizontal direction, and holes and electrons are injected into the organic light emitting portion 140 from the first electrode 120 and the second electrode 130 having the constant thickness of the first functional layers 122 and 124 and the second functional layers 132 and 134, respectively. The total thickness of the first functional layers 122 and 124 and the second functional layers 132 and 134 contacting the barrier ribs 110 may have a thickness less than the height of the barrier ribs 110. Therefore, the organic light emitting device OLED may have uniform brightness throughout the entire emission area EA.

[0059] Figure 4 It is schematically shown Figure 1 A plan view of another example of a light emitting area in the display device 10, Figure 5 is schematically shown along Figure 4 A cross-sectional view of an example of a cross-section taken along line II-II'.

[0060] Reference Figure 4 and Figure 5 , the display substrate 12 may include a base substrate 200 and a thin film transistor TFT located on the base substrate 200. The thin film transistor TFT may be electrically connected to the organic light emitting device OLED. Figure 3 The display substrate 12 may be connected to the display substrate 12 described below. Figure 5 The display substrate 12 has the same structure.

[0061] The base substrate 200 may include transparent glass, which mainly includes silicon oxide (SiO 2 ) film. However, the base substrate 200 is not limited thereto, but may include a transparent plastic material. The plastic material forming the base substrate 200 may be an insulating organic material selected from a group consisting of organic materials such as polyethersulfone (PES), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyarylate (PAR), polyimide (PI), polycarbonate (PC), cellulose triacetate (CTA), and cellulose acetate propionate (CAP).

[0062] Meanwhile, when the type of the image is a bottom emission type generated in the direction of the base substrate 200, the base substrate 200 may include a transparent material. However, when the type of the image is a top emission type generated in the direction opposite to the base substrate 200, the base substrate 200 does not necessarily include a transparent material. In this case, the base substrate 200 may include a metal. When the base substrate 200 includes a metal, the base substrate 200 may include, but is not limited to, at least one selected from the group consisting of carbon (C), iron (Fe), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and stainless steel (SUS).

[0063] The buffer layer 202 may be formed on the base substrate 200 to prevent impurities from penetrating into the active layer 203 of the thin film transistor TFT. The buffer layer 202 may include a material such as silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiON), aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), titanium oxide (TiO 2 ) or titanium nitride (TiON), an organic material such as polyimide, polyester or acryl, or a plurality of laminates of organic and inorganic materials.

[0064] The thin film transistor TFT may include an active layer 203, a gate electrode 205, a source electrode 207, and a drain electrode 208. Hereinafter, it is assumed that the type of the thin film transistor TFT is a top gate type, in which the active layer 203, the gate electrode 205, the source electrode 207, and the drain electrode 208 are sequentially formed in the order of the statement. However, the present exemplary embodiment is not limited thereto, and the thin film transistor TFT may be various types such as a bottom gate type.

[0065] The active layer 203 may include a semiconductor material such as amorphous silicon or polycrystalline silicon. However, the present embodiment is not limited thereto, and the active layer 203 may include various materials. As an alternative embodiment, the active layer 203 may include an organic semiconductor material. As another alternative embodiment, the active layer 203 may include an oxide semiconductor material. For example, the active layer 203 may include an oxide of a material selected from metal elements of Groups 12, 13, and 14 (such as zinc (Zn), indium (In), gallium (Ga), tin (Sn), cadmium (Cd), and germanium (Ge), and mixtures thereof).

[0066] The first insulating layer 204 may be formed on the active layer 203. The first insulating layer 204 is a layer for insulating the active layer 203 from the gate electrode 205, and may be a gate insulating layer. The first insulating layer 204 may include silicon oxide or silicon nitride.

[0067] The gate electrode 205 is located on the first insulating layer 204. The gate electrode 205 can be connected to a gate line (not shown) that applies an on / off signal to the thin film transistor TFT. The gate electrode 205 may include a low resistance metal. The gate electrode 205 may include at least one of a material selected from Al, Pt, Pd, Ag, Mg, Au, Ni, Nd, Ir, Cr, lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu), and may include a single layer or a multilayer.

[0068] The second insulating layer 206 may be formed on the gate electrode 205. The second insulating layer 206 insulates the source electrode 207 and the drain electrode 208 from the gate electrode 205. The second insulating layer 206 may include an inorganic material, and may include a single layer or multiple layers. For example, the inorganic material may be a metal oxide or a metal nitride. In detail, the inorganic material may include SiO x 、SiN x 、SiON、Al 2 O 3 、TiO 2 Tantalum oxide (Ta 2 O 5 ) or hafnium oxide (HfO 2 ).

[0069] The source electrode 207 and the drain electrode 208 are formed on the second insulating layer 206. The source electrode 207 and the drain electrode 208 may be respectively in contact with the source region and the drain region of the active layer 203 through contact holes formed in the first insulating layer 204 and the second insulating layer 206. The source electrode 207 and the drain electrode 208 may include at least one of materials selected from Al, Pt, Pd, Ag, Mg, Au, Ni, Nd, Ir, Cr, Li, Ca, Mo, Ti, W, and Cu, and may include a single layer or multiple layers. For example, the source electrode 207 and the drain electrode 208 may have a three-layer structure of Ti / Al / Ti.

[0070] The passivation layer 209 may be formed to cover the thin film transistor TFT. The passivation layer 209 may have a flat upper surface, and thus may prevent defects in the organic light emitting device OLED due to a step caused by the thin film transistor TFT.

[0071] The passivation layer 209 may include SiO 2 、Silicon Nitride (SiN x )、SiON、Al 2 O 3 、TiO 2 、 2 O 5 , HfO 2、ZrO 2 )、(Ba, Sr)TiO 3 The passivation layer 209 may be an inorganic insulating layer of lead zirconate titanate (BST) or lead zirconate titanate (PZT). The passivation layer 209 may be an organic insulating layer including a general polymer such as polymethyl methacrylate (PMMA) or polystyrene (PS), a polymer derivative including a phenolic group, an acrylic polymer, an imide polymer, an aromatic ether polymer, an amide polymer, a fluorine polymer, a paraxylene polymer, a vinyl alcohol polymer, or a mixture thereof. In addition, the passivation layer 209 may be a composite laminate of an inorganic insulating layer and an organic insulating layer.

[0072] The pixel defining layer 100 is located on the passivation layer 209. The pixel defining layer 100 may define a plurality of emission areas EA, and the organic light emitting device OLED may be located on the plurality of emission areas EA. Figure 2 and Figure 3 The pixel defining layer 100 and the organic light emitting device OLED are described, so a description of the pixel defining layer 100 and the organic light emitting device OLED will not be given here, and only differences will be described below.

[0073] The first electrode 120 on the first inner side surface S1 of the pixel defining layer 100 may extend on the bottom surface of the first area A1 and may be electrically connected to the thin film transistor TFT through a contact hole formed on the bottom surface of the first area A1. The bottom surface of the first area A1 may be a portion of the upper surface of the passivation layer 209, and the contact hole may be formed in the passivation layer 209.

[0074] The second electrode 130 on the second inner surface S2 of the pixel defining layer 100 extends in a direction intersecting the extension direction of the first electrode 120, that is, extends on the upper surface of the pixel defining layer 100. In addition, the second electrode 130 may be a common electrode and may be formed integrally with a plurality of organic light emitting devices OLED. In more detail, as Figure 4 As shown, the second electrode 130 extending from the second inner surface S2 to the upper surface of the pixel defining layer 100 may be integrally formed to cover ( Figure 1 The entire display area DA may be formed by covering the entire display area DA, and may include an opening OP overlapping the light emitting area EA. The opening OP may be larger than the light emitting area EA, thereby exposing the light emitting area EA. In more detail, as Figure 4 As shown, the second electrode 130 may prevent a short circuit between the second electrode 130 and the first electrode 120 by being separated from the first inner surface S1 , the third inner surface S3 , and the fourth inner surface S4 on the upper surface of the pixel defining layer 100 .

[0075] The display device according to the present disclosure can improve the brightness uniformity of the light emitting area. However, the scope of the present disclosure is not limited to this effect.

[0076] It should be understood that the embodiments described herein should be considered in a descriptive sense only and not for limiting purposes. Descriptions of features or aspects within each embodiment should generally be considered as available for other similar features or aspects in other embodiments.

[0077] Although one or more embodiments have been described with reference to the drawings, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the claims.

Claims

1. A display device, comprising: Display substrate; A pixel defining layer, located on the display substrate and comprising a plurality of light emitting areas; A plurality of light-emitting devices are respectively located in the plurality of light-emitting areas; as well as barrier ribs located in each of the plurality of light emitting regions and dividing each of the plurality of light emitting regions into a first region and a second region, Each of the plurality of light emitting devices comprises a pixel electrode, a common electrode and an organic light emitting portion located between the pixel electrode and the common electrode. wherein the pixel defining layer includes a first inner side surface and a second inner side surface facing each other in each of the plurality of light emitting regions, wherein the pixel electrode is located on the first inner surface, the common electrode is located on the second inner surface, and The pixel electrode is located in the first region, and the common electrode is located in the second region.

2. The display device according to claim 1, wherein: The barrier ribs have a height smaller than a thickness of the pixel defining layer.

3. The display device according to claim 2, wherein: In each of the plurality of light emitting regions, the pixel defining layer further includes a third inner surface and a fourth inner surface connecting the first inner surface to the second inner surface and facing each other, and, The barrier ribs extend from the third inner surface to the fourth inner surface.

4. The display device according to claim 3, wherein: The common electrode extends on an upper surface of the pixel defining layer and is integrally formed with the plurality of light emitting devices.

5. The display device according to claim 4, wherein: The common electrode includes a plurality of openings overlapping the plurality of light emitting regions and being larger than the plurality of light emitting regions, and Each of the plurality of openings is spaced apart from the first, third, and fourth inner side surfaces at the upper surface of the pixel defining layer.

6. The display device according to claim 2, further comprising: A first functional layer is located between the pixel electrode and the organic light emitting portion, and a second functional layer is located between the common electrode and the organic light emitting portion.

7. The display device according to claim 6, wherein: The first functional layer is located in the first region, the second functional layer is located in the second region, and the organic light emitting portion is continuously located on the first region and the second region.

8. The display device according to claim 6, wherein: The first functional layer includes a hole injection layer and a hole transport layer, and the second functional layer includes an electron injection layer and an electron transport layer.

9. The display device according to claim 6, wherein: Each of the first functional layer and the second functional layer has a constant thickness at a height equal to or greater than that of the barrier ribs.

10. The display device according to claim 2, wherein: The display substrate includes a base substrate, a thin film transistor located on the base substrate, and a passivation layer located on the thin film transistor. Wherein, the pixel defining layer is located on the passivation layer, and The pixel electrode extends on a bottom surface of the first region and is electrically connected to the thin film transistor through a contact hole.

11. A display device, comprising: Display substrate; A pixel defining layer, located on the display substrate and comprising a plurality of light emitting areas; barrier ribs located in each of the plurality of light emitting regions and dividing each of the light emitting regions into a first region and a second region; as well as A plurality of light emitting devices are respectively located in the plurality of light emitting areas, wherein each of the plurality of light emitting devices includes a first electrode and a second electrode arranged to face each other, and The first electrode is located in the first region, and the second electrode is located in the second region.

12. The display device according to claim 11, wherein: In each of the plurality of light emitting regions, the pixel defining layer further includes a first inner side surface and a second inner side surface facing each other, and a third inner side surface and a fourth inner side surface connecting the first inner side surface to the second inner side surface and facing each other, and The barrier ribs extend from the third inner surface to the fourth inner surface.

13. The display device according to claim 12, wherein: The first electrode is located on the first inner surface, and the second electrode is located on the second inner surface.

14. The display device according to claim 13, further comprising: A first functional layer is located on the first electrode, a second functional layer is located on the second electrode, and an organic light emitting portion is located between the first functional layer and the second functional layer.

15. The display device according to claim 14, wherein: The height of the barrier ribs is smaller than the thickness of the pixel defining layer, and Each of the first functional layer and the second functional layer has a constant thickness at a height equal to or greater than that of the barrier ribs.

16. The display device according to claim 15, wherein: The first functional layer covers a surface of the first electrode and a first side of a surface of the barrier rib facing the first electrode, The second functional layer covers a surface of the second electrode and a second side of a surface of the barrier rib facing the second electrode, The first functional layer and the second functional layer are separated from each other by the barrier ribs, and The organic light emitting portion is continuously located on the first region and the second region.

17. The display device according to claim 13, wherein: The display substrate comprises a base substrate, a thin film transistor located on the base substrate, and a passivation layer located on the thin film transistor, and The pixel defining layer is located on the passivation layer.

18. The display device according to claim 17, wherein: The first electrode extends on a bottom surface of the first region and is electrically connected to the thin film transistor through a contact hole in the first region.

19. The display device according to claim 13, wherein: The second electrode extends on an upper surface of the pixel defining layer and is integrally formed with the plurality of light emitting devices.

20. The display device according to claim 19, wherein: The second electrode includes a plurality of openings overlapping the plurality of light emitting regions, and Each of the plurality of openings is separated from the first, third, and fourth inner side surfaces at the upper surface of the pixel defining layer.

Images