A mask processing device

Abstract

The present invention relates to the technical field of mask treatment, and in particular to a mask treatment device, which comprises a housing, a mask treatment area is arranged inside the housing; a pulsed intense light irradiation component, which comprises a pulsed xenon flash tube and a light guiding component, and the light guiding component makes the light emitted by the pulsed xenon flash tube irradiate towards the mask treatment area; a thermal radiation heating component, which comprises a radiation heat source and a thermal back-reflection reflector, and the thermal back-reflection reflector guides the heat generated by the radiation heat source towards the mask treatment area; an electrostatic electret regeneration electric field component, which comprises an electret corona electric field emitter and an electret electric field grounding electrode arranged oppositely, the mask treatment area is located between the electret corona electric field emitter and the electret electric field grounding electrode, and the electret corona electric field emitter comprises a paired glow plasma discharge needle and an induction electrode. This kind of mask treatment device can quickly dehydrate, disinfect, deodorize and efficiently regenerate the mask, so that the mask can be safely regenerated and used.

Description

Technical Field

[0001] The present invention relates to the technical field of mask treatment, and particularly to a mask treatment device. Background Art

[0002] A general protective mask is composed of three layers of materials:

[0003] 1. The surface layer: made of hydrophobic modified PP and PET materials, its main function is to prevent large-diameter water droplets from passing through and attach to them.

[0004] 2. The inner layer: that is, the filter layer, made of electrostatic electret fiber materials. The electrostatic electret modified material (mainly PP material) is melted, hot air-assisted sprayed, and high-voltage electrostatic electretized to form filamentous materials with a diameter of 2 - 5 μm and stacked into a non-woven fabric. Then, through secondary electrostatic electretization, a filter material with an electrostatic field in the inter-filament structure is formed. When particulate matter passes through, it is adsorbed on the surface and captured under the action of electrostatic force.

[0005] 3. The fitting layer: made of hydrophilic spunbond non-woven fabric, soft and non-irritating, used for comfortable facial fitting.

[0006] The main functional layer for the filtration efficiency of the mask is the inner layer, that is, the filter layer.

[0007] The factors that reduce the filtration performance of the mask mainly include external factors: particulate matter, microorganisms, etc. are captured and attached, resulting in a decrease in filtration efficiency; internal factors: water vapor contained in exhaled gas, droplets generated by coughing and sneezing, attach to the filter layer, causing a decrease in the electrostatic field strength, a decrease in filtration efficiency, and an increase in resistance at the same time.

[0008] When each layer of the mask is enriched with infectious bacteria and viruses, especially as the resistance increases due to the increase in the water content of the inner layer and the breathing depth increases, the probability of filtration infection or contact infection will increase. Therefore, it is currently recommended that masks should not be reused multiple times, which is also the main reason for the shortage of masks.

[0009] Using disinfectant, surface active immersion, and washing can remove the enriched particulate matter, but at the same time, it also makes the electret charge of the fibers in the inner layer disappear and loses the filtering effect; using methods such as steam steaming, boiling in hot water, and drying in an oven will all cause the electrostatic electret characteristics to disappear and significantly reduce the filtration performance.

[0010] If it is possible to quickly dehydrate, disinfect, deodorize, and regenerate the efficiency of the mask, and maintain the effectiveness of the mask while ensuring its safety and wearing comfort, enabling it to be reused, it will greatly alleviate the current shortage of masks and meet the usage requirements of the following application scenarios:

[0011] 1. Family: Short-term wearing, going out for shopping, entertainment, etc.;

[0012] 2. Office: After meetings and meetings with guests end; after contact in crowded places for a short time; regular regeneration in centralized office places;

[0013] 3. Services: Supermarket cashiering, restaurant service, entertainment venue service, regular regeneration;

[0014] 4. Medical: Regular regeneration in general occasions;

[0015] 5. Hotels: After dining in the restaurant, temporary meetings with guests, going out, etc.

[0016] However, in the existing technology, there is still no device that can quickly dehydrate, disinfect, deodorize, and efficiently regenerate masks. Therefore, it is difficult to safely regenerate and use masks.

[0017] UVC-band ultraviolet rays have the ability to kill microorganisms. It has been experimentally verified that the ability to kill different viruses, bacteria and other microorganisms and the irradiation dose. Since the mask is a multi-layer fiber stacking structure, UVC ultraviolet rays with strong penetration are required to quickly kill deep-layer microorganisms. A pulsed xenon lamp reasonably designed and equipped with a suitable drive circuit can emit intense ultraviolet light with an instantaneous power of several kilowatts, with strong penetration, suitable for killing deep-layer microorganisms in a short time.

[0018] The infrared absorption peaks of water and polypropylene materials are concentrated in the wavelength range of 2-4um. By using an electric heating device with the ability to emit in this wavelength band and can be quickly started, combined with a thermal radiation back reflection and convergence guiding structure, the water and PP materials can be quickly heated, and the moisture on the surface evaporates, while the air in the treatment area and the metal enclosure components generate less heat. Quartz halogen heating tubes and carbon fiber heating tubes have this characteristic.

[0019] Ozone and negative ions have the ability to eliminate odors and kill microorganisms. Textiles treated with a small amount of ozone have an intuitive feeling of fresh smell.

[0020] The electrostatic electret process is a process of dipole alignment inside polymer materials, which is completed with the assistance of an external electric field. After the PP fiber material is heated, an external electric field is applied, which is more conducive to re-electretizing the electrostatic field lost on the surface. After cooling, the surface electrostatic electret field strength is restored, and then the ability to capture fine particles is restored.

[0021] The exhaust structure composed of an exhaust fan and a filter can form a negative pressure chamber structure in the treatment area, similar to the negative pressure isolation cabin in a medical environment, so that the water vapor, odor, trace ozone, fiber shedding and even microorganisms generated during the treatment process are centrally collected and treated without secondary pollution.

[0022] The above components, in combination with an appropriate drive control circuit, maintenance structure, and safety measures, can quickly dehydrate, disinfect, deodorize, and regenerate the efficiency of a mask in use, making it suitable for effective and comfortable use of the mask in a non-specific environment. However, there is no such device in the prior art. Summary of the Invention

[0023] The object of the present invention is to provide a mask processing device that can quickly dehydrate, disinfect, deodorize, and regenerate the efficiency of a mask, enabling the mask to be safely reused.

[0024] To achieve the above object, the present invention provides a mask processing device, including a housing. A mask processing area is provided inside the housing. It further includes a pulsed intense light irradiation component, which includes a pulsed xenon flash tube and a light guiding component. The light guiding component directs the light emitted by the pulsed xenon flash tube towards the mask processing area; a thermal radiation heating component, which includes a radiation heat source and a thermal back-reflection reflector. The thermal back-reflection reflector directs the heat generated by the radiation heat source towards the mask processing area; an electrostatic electret regeneration electric field component, which includes an electret corona electric field emitter and an electret electric field grounding electrode arranged opposite to each other. The mask processing area is located between the electret corona electric field emitter and the electret electric field grounding electrode. The electret corona electric field emitter includes a paired glow plasma discharge needle and an induction electrode.

[0025] Further, the light guiding component includes a parabolic reflector and a back-reflection mirror and a front-reflection mirror arranged inside the parabolic reflector; the pulsed xenon flash tube is located on the symmetry plane of the parabolic reflector. The distance between the axis of the glass shell of the pulsed xenon flash tube and the focus of the parabolic reflector is 0 to 2r, where r is the radius of the glass shell of the pulsed xenon flash tube; with the direction towards which the light outlet of the parabolic reflector faces being the lower side, the back-reflection mirror is located above the pulsed xenon flash tube, and the front-reflection mirror is located below the pulsed xenon flash tube.

[0026] Further, the back-reflection mirror includes two downward-reflecting surfaces arranged symmetrically, and the mirror angle between the two downward-reflecting surfaces is greater than 90°; the front-reflection mirror includes two upward-reflecting surfaces arranged symmetrically, and the mirror angle between the two upward-reflecting surfaces is greater than 90°.

[0027] Further, the thermal back-reflection reflector includes a thermal radiation reflector. The thermal radiation reflector is arranged inside the parabolic reflector and is located below the front-reflection mirror. The radiation heat source is located below the thermal radiation reflector; the thermal radiation reflector includes two downward-reflecting surfaces arranged symmetrically, and the mirror angle between the two downward-reflecting surfaces is greater than 90°.

[0028] Further, the electret electric field grounding electrode is a metal mesh structure, the electret electric field grounding electrode is arranged at the light outlet of the parabolic reflector, and the area ratio of the metal part of the electret electric field grounding electrode to the light outlet is less than 10%.

[0029] Further, one end of the glow plasma discharge needle is a pointed structure, the induction electrode is a circular hole shape, and the glow plasma discharge needle points to the middle of the induction electrode.

[0030] Further, the housing is provided with an exhaust port communicating with the mask treatment area, and a fan and a filter assembly are arranged in the exhaust port.

[0031] Further, it further includes a conveying chain, the conveying chain is provided with a plurality of mask hanging racks, and the conveying chain passes through the housing and can convey the masks to the mask treatment area.

[0032] Further, with the mask treatment area as the boundary, the pulsed intense light irradiation component, the thermal radiation heating component and the electret electric field grounding electrode are located on the same side and form a first side component, and the electret corona electric field emitting electrode is located on the other side and forms a second side component; on both sides of the conveying path of the conveying chain, multiple groups of the first side component and the second side component are arranged and cross-arranged.

[0033] Further, on both sides of the conveying path of the conveying chain, the high-voltage polarities of all the glow plasma discharge needles on the same side are opposite to those of all the glow plasma discharge needles on the other side.

[0034] When the mask treatment device provided by the present invention is in use, the pulsed intense light irradiation component is used to quickly kill microorganisms such as viruses and bacteria attached to the mask, the thermal radiation heating component is used to quickly remove the moisture adsorbed on the fiber surface, and the electrostatic electret regeneration electric field component is used to supplement and enhance the electrostatic field strength of the electret, so as to restore or improve the filtering efficiency of the mask. Therefore, compared with the prior art, this mask treatment device can quickly dehydrate, disinfect, deodorize and efficiently regenerate the mask, so that the mask can be safely regenerated and used. Brief Description of the Drawings

[0035] Figure 1 is a schematic structural diagram of the mask treatment device of the present invention;

[0036] Figure 2 is a schematic structural diagram of the mask treatment device of the present invention from another angle;

[0037] Figure 3 is a schematic diagram of the pulsed intense light and infrared radiation paths, wherein the dashed line is the pulsed intense light path and the double-dot dash line is the infrared radiation path;

[0038] Figure 4 It is a schematic cross-sectional structure diagram of an electret corona electric field emitter;

[0039] Figure 5 It is a schematic structure diagram of the electret corona electric field emitter from another angle;

[0040] Figure 6 It is a schematic structure diagram of the electret electric field grounding electrode;

[0041] Figure 7 It is a schematic structure diagram of the mask processing device of the present invention when provided with a conveyor chain, two groups of pulsed intense light irradiation components, a thermal radiation heating component, and an electrostatic electret regeneration electric field component.

[0042]

Explanation of the reference numerals

[0043] 01 - Mask;

[0044] 1 - Housing, 11 - Mask processing area;

[0045] 2 - Pulsed intense light irradiation component, 21 - Pulsed xenon flash tube, 22 - Parabolic reflector, 23 - Rear reflection mirror, 24 - Front reflection mirror;

[0046] 3 - Thermal radiation heating component, 31 - Radiation heat source, 32 - Thermal radiation reflector;

[0047] 4 - Electrostatic electret regeneration electric field component, 41 - Electret corona electric field emitter, 411 - Glow plasma discharge needle, 412 - Induction electrode, 42 - Electret electric field grounding electrode;

[0048] 51 - Exhaust port, 52 - Fan, 53 - Filter component;

[0049] 6 - Conveyor chain. Detailed implementation manners

[0050] The following describes the present invention in detail with reference to specific embodiments.

[0051] In the present invention, when directional terms appear, for the directional terms, it is for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and should not be construed as limiting the specific protection scope of the present invention.

[0052] In the present invention, unless otherwise clearly specified and defined, when terms such as "disposed on", "connected to", or "coupled to" appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can also be a mechanical connection; it can be directly connected, or connected through an intermediate medium, and it can be internally connected and communicated between two components. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0053] The present invention provides a mask processing device, as Figures 1 to 7 shown, which includes a housing 1, and a mask processing area 11 is disposed inside the housing 1.

[0054] It further includes a pulsed intense light irradiation component 2, which includes a pulsed xenon flash tube 21 and a light guiding component. The light guiding component makes the light emitted by the pulsed xenon flash tube 21 irradiate towards the mask processing area 11.

[0055] A thermal radiation heating component 3, including a radiation heat source 31 and a thermal back reflection reflector, and the thermal back reflection reflector directs the heat generated by the radiation heat source 31 towards the mask processing area 11.

[0056] An electrostatic electret regeneration electric field component 4, including an electret corona electric field emitter 41 and an electret electric field grounding electrode 42 which are oppositely arranged. The mask processing area 11 is located between the electret corona electric field emitter 41 and the electret electric field grounding electrode 42. The electret corona electric field emitter 41 includes a paired glow plasma discharge needle 411 and an induction electrode 412.

[0057] Based on the above settings, during use, the pulsed intense light irradiation component 2 is used to quickly kill microorganisms such as viruses and bacteria attached to the mask 01, the thermal radiation heating component 3 is used to quickly remove the moisture adsorbed on the fiber surface, and the electrostatic electret regeneration electric field component 4 is used to supplement and enhance the electrostatic field strength of the electret, and restore or improve the filtration efficiency of the mask 01. Therefore, compared with the prior art, this mask processing device can quickly dehydrate, disinfect, deodorize, and regenerate the efficiency of the mask 01, so that the mask 01 can be safely regenerated and used.

[0058] The mask 01 to be processed can be sent to the mask processing area 11 by direct placement or transportation. The housing 1 is provided to prevent the leakage of the emitted ultraviolet rays. At the same time, the exhaust fan forms a negative pressure in the mask processing area 11, and prevents the leakage of viruses, bacteria, odors, and surface exfoliates.

[0059] Next, each functional component in the mask processing device will be described in detail.

[0060] The number of the pulsed intense light irradiation components 2 is at least one group, which is used to quickly kill microorganisms such as viruses and bacteria attached to the mask 01.

[0061] In this embodiment, the pulsed xenon flash tube 21 can emit light including vacuum ultraviolet (VUV), ultraviolet (UVC, UVA), visible light, and infrared bands. Among them, the UVC band emitted by the pulsed xenon flash tube 21 has the effect of quickly killing viruses and bacteria.

[0062] In this embodiment, the light guide assembly includes a parabolic reflector 22, a back-reflecting mirror 23, and a front-reflecting mirror 24 disposed within the parabolic reflector 22; the pulsed xenon flash tube 21 is located on the symmetry plane of the parabolic reflector. The distance between the axis of the glass shell of the pulsed xenon flash tube 21 and the focus of the parabolic reflector is 0 to 2r, where r is the radius of the glass shell of the pulsed xenon flash tube 21; taking the direction towards the light outlet of the parabolic reflector 22 as the downward direction, the back-reflecting mirror 23 is located above the pulsed xenon flash tube 21, and the front-reflecting mirror 24 is located below the pulsed xenon flash tube 21. The back-reflecting mirror 23 includes two downward-reflecting surfaces symmetrically arranged, and the included angle between the mirror surfaces of the two downward-reflecting surfaces is greater than 90°; the front-reflecting mirror 24 includes two upward-reflecting surfaces symmetrically arranged, and the included angle between the mirror surfaces of the two upward-reflecting surfaces is greater than 90°.

[0063] Through the above light guide assembly, the light emitted by the pulsed xenon flash tube 21 is all directed towards the mask treatment area 11, and through the arrangement of the shape and position of the light guide assembly, all the light emitted by the pulsed xenon flash tube 21 is emitted from the light outlet of the parabolic reflector 22 without being blocked by other components within the parabolic reflector 22.

[0064] Preferably, the parabolic reflector 22, the back-reflecting mirror 23, and the front-reflecting mirror 24 are made of polished aluminum alloy and have a coating of aluminum oxide or silicon dioxide on the surface.

[0065] The number of the thermal radiation heating assemblies 3 is at least one group, which is used to quickly remove the moisture adsorbed on the fiber surface.

[0066] In this embodiment, the radiation heat source 31 can adopt a carbon fiber heating tube or a halogen lamp tube, with the main wavelength in the near-infrared region, the wavelength being 1.6 to 4.2 um, and the startup time < 3S. Most preferably, a quartz halogen lamp tube heating heat source is adopted, with a peak wavelength of 2 to 4 um and a near-infrared distribution; at the same time, the back-reflecting surface of the quartz halogen lamp tube is gold-plated to reflect near-infrared rays and improve the irradiation power.

[0067] In this embodiment, the thermal back-reflector includes a thermal radiation mirror 32, which is disposed within the parabolic reflector 22 and below the front projection mirror 24. The thermal radiation mirror 32 and the parabolic reflector 22 form the thermal back-reflector. The radiation heat source 31 is located below the thermal radiation mirror 32; the thermal radiation mirror 32 includes two downward reflecting surfaces symmetrically arranged, and the mirror angle between the two downward reflecting surfaces is greater than 90°. If both the thermal radiation mirror 32 and the radiation heat source 31 are disposed within the parabolic reflector 22, the parabolic reflector 22 can simultaneously reflect pulsed intense light and infrared radiation, and at the same time make the structure of the mask processing device compact. The thermal radiation mirror 32 can be a mirror with a reflective coating formed by coating one or more of aluminum oxide, titanium dioxide, and zirconium oxide on its surface. Most preferably, it is coated with a rutile titanium dioxide nano-coating.

[0068] Based on the above structure, the pulsed intense light and the infrared radiation form a path as Figure 3 shown, and the parabolic reflector 22 serves two purposes.

[0069] The number of the electrostatic electret regeneration electric field assemblies 4 is at least one group, which is used to supplement and enhance the electrostatic field strength of the electret, restore or improve the filtration efficiency of the mask 01, and at the same time can also have the effect of assisting in sterilization and odor removal. For the electrostatic electret regeneration electric field assembly 4, a glow plasma discharge with a relatively high voltage and a large current can be generated in the initial stage of use, thereby generating ion wind, a large amount of negative oxygen ions, and a small amount of ozone to achieve the effect of assisting in sterilization and odor removal; while in the later stage of use, the discharge current is reduced to provide a stable DC electric field to achieve the effect of improving the electrostatic electret effect of the inner layer fibers. Of course, through control, the electrostatic electret regeneration electric field assembly 4 can also always only achieve the effect of improving the electrostatic electret effect of the inner layer fibers.

[0070] In this embodiment, the electret electric field grounding electrode 42 is a metal mesh structure, which is disposed at the light outlet of the parabolic reflector 22, and the area ratio of the metal part of the electret electric field grounding electrode 42 to the light outlet is less than 10%. Preferably, the electret electric field grounding electrode 42 adopts a stainless steel parallel fence structure. After the electret electric field grounding electrode 42 is set as a metal mesh structure and located at the light outlet of the parabolic reflector 22, it can also prevent the mask 01 from contacting the radiation heat source 31 within the parabolic reflector 22, and at the same time make the structure of the entire mask processing device more compact.

[0071] In this embodiment, one end of the glow plasma discharge needle 411 is a pointed structure, the induction electrode 412 is a round hole shape, and the glow plasma discharge needle 411 is located in the middle of the induction electrode 412. Among them, the glow plasma discharge needle 411 can be made of corrosion-resistant stainless steel, tungsten wire, or carbon fiber rod. Most preferably, it is made of a rod-shaped material bonded by multiple carbon fibers.

[0072] Preferably, the glow plasma discharge needle 411 is connected to a high-voltage power supply in series with a resistor to avoid abnormal discharge caused by structural errors, balance the electric field, and the resistance value of the resistor is 1 to 100 MΩ.

[0073] The control and drive assembly is used to control the pulsed xenon flash tube 21, the radiation heat source 31, the high-voltage power supply (which can be external or an interface built into the mask processing device), the fan 52 and the conveyor chain 6 described below, etc., and also includes a working time sequence controller for general surgical masks and high-efficiency special masks 1. For the specific model and control method of the control and drive assembly, those skilled in the art can select according to the disclosure of the prior art, so it will not be described in detail in this application.

[0074] The safety control assembly includes a temperature detection sensor or a thermal temperature fuse for detecting the temperature on the surface of the mask processing area 11 or the mask 01 to ensure emergency shutdown and alarm in a specific state.

[0075] The safety control assembly includes monitoring and alarming of abnormal discharge of the high-voltage power supply to ensure emergency shutdown and alarm in a specific state.

[0076] In this embodiment, the housing 1 is provided with an exhaust port 51 communicating with the mask processing area 11. A fan 52 and a filter assembly 53 are arranged in the exhaust port 51. The above components are used to generate negative pressure in the mask processing area 11 to remove the exfoliates, volatile odors, residual ozone, etc. generated during the mask processing while preventing leakage. Preferably, the filter assembly 53 can be obtained by combining one or more of a particulate filter, an adsorption filter, and a catalytic purification filter.

[0077] In this embodiment, a conveyor chain 6 is further included. The conveyor chain 6 is provided with a plurality of mask hangers. The conveyor chain 6 passes through the housing 1 and can convey the mask 01 to the mask processing area 11. By arranging the conveyor chain 6, a plurality of masks 01 can be processed in sequence to improve the efficiency. At the same time, in order to avoid ultraviolet leakage or virus and bacteria leakage, an inlet door and an outlet door are provided at both ends of the housing 1.

[0078] When the conveyor chain 6 is adopted, in order to improve the processing efficiency of the mask 01, a plurality of groups of pulsed intense light irradiation assemblies 2, thermal radiation heating assemblies 3 and electrostatic electret regeneration electric field assemblies 4 can be arranged in the housing 1. The mask 01 is processed by the above-mentioned assemblies in multiple groups on the path conveyed by the conveyor chain 6.

[0079] Preferably, with the mask treatment area 11 as the demarcation, the pulsed intense light irradiation component 2, the thermal radiation heating component 3, and the electret electric field grounding electrode 42 are located on the same side and form the first side component, and the electret corona electric field emitter 41 is located on the other side and forms the second side component; on both sides of the conveying path of the conveying chain 6, multiple groups of the first side component and the second side component are arranged and cross-arranged. That is, as Figure 7 shown, each group of the first side components is opposite to a group of the second side components (i.e., the electret corona electric field emitter 41). In order to evenly treat both the front and back sides of the mask 01, on both sides of the conveying path of the conveying chain 6, multiple groups of the first side component and the second side component are arranged and cross-distributed.

[0080] Further preferably, on both sides of the conveying path of the conveying chain 6, the high-voltage polarities of all the glow discharge needles 411 on the same side are opposite to those of all the glow discharge needles 411 on the other side. That is, as Figure 7 shown, the glow discharge needles 411 located above are connected to positive high voltage, and the glow discharge needles 411 located below are connected to negative high voltage, which is to ensure the same direction of the electric field.

[0081] Use metal aluminum material to make a reflector including a parabolic structure and a rectangular structure, with an opening width of 80 - 160 mm and a length of 150 - 200 mm.

[0082] Adopt a straight tube type pulsed xenon flash tube with a diameter of 5 mm and a light-emitting length of 180 mm. The central axis of the pulsed xenon flash tube coincides with the focus of the parabolic reflector.

[0083] A back-reflecting mirror is installed above the pulsed xenon flash tube, and a front-reflecting mirror is installed below it. The vertex lines of the back-reflecting mirror and the front-reflecting mirror are parallel to the central axis of the pulsed xenon flash tube and are placed in the same plane. The back-reflecting mirror and the front-reflecting mirror are 2 - 5r away from the central axis of the pulsed xenon flash tube. The reflecting surfaces of the back-reflecting mirror and the front-reflecting mirror are polished and coated with an alumina or silica coating.

[0084] After the single emission of the pulsed xenon flash tube is reflected, the average UVC irradiation intensity at the light exit > 0.5 mJ / cm 2 .

[0085] The radiation heat source adopts a near-infrared straight tube type heat source, with a diameter of 6 - 12 mm, a heat radiation length of 180 mm, a near-infrared wavelength peak of 2 - 5 μm, a power of 500 - 2000 W, and a start-up speed < 3S. The back side of the near-infrared straight tube type heat source is coated with a gold reflective layer on the outer layer.

[0086] The thermal radiation reflector is made of aluminum material, and its surface is coated and sintered with a titanium dioxide coating, with a coating thickness of 1 - 10 μm.

[0087] There is a heat insulation layer between the front projection mirror and the thermal radiation mirror, which uses aluminosilicate fiber material with a thickness of 1 - 5 mm.

[0088] The electret electric field grounding electrode uses stainless steel wire with a diameter of 0.3 - 1.0 mm and is arranged in parallel at equal intervals of 5 - 20 mm on the light outlet.

[0089] The above part constitutes the first side component.

[0090] For the electret corona electric field emitter part, the glow discharge plasma needle is made of a rod-shaped material with a diameter of 0.5 mm, which is bonded by multiple carbon fibers. One end is ground into a sharp shape, with a length of 20 mm, and is arranged at equal intervals of 20 - 70 mm on the insulating material board and is connected to the high-voltage power supply through a 10 MΩ resistor. The induction electrode is made of a stainless steel sheet with a thickness of 0.1 - 1 mm. Openings with a diameter of 10 - 60 mm are made at the positions corresponding to the glow discharge plasma needles on the stainless steel sheet. The glow discharge plasma needle is perpendicular to the induction electrode and points to the center of the opening, and the distance between the tip and the edge of the opening is 10 - 30 mm.

[0091] The induction electrode plane is installed parallel to the low-potential electret electric field electrode, and the projection is centered.

[0092] The above part constitutes the second side component.

[0093] The housing is made of stainless steel sheet and is a rectangular box structure with a length of 120 - 200 mm, a thickness of 80 - 120 mm, and a height of 200 - 300 mm, forming a processing chamber structure. The upper and lower parts are open, forming an upper opening and a lower opening. A frame-shaped stainless steel sheet with the same area as the opening is used to make a mask hanger, and the mask hanger is located in the mask processing area.

[0094] The first side component is installed at the upper opening of the housing, and the second side component is installed at the lower opening.

[0095] An exhaust port is set in the side or bottom area, and a fan and an activated carbon filter component are installed. Specifically, a DC fan with a blade diameter of 60 mm is used, and activated carbon honeycomb material with a thickness of 10 mm and a pore diameter of 1 mm is installed on one side.

[0096] Inside the housing, a thermal temperature fuse is installed outside the projection area of the light outlet, with a melting temperature of 150 - 200 °C, and is connected to the power input of the control drive component. At the same time, a PT100 temperature sensor is installed and connected to the control drive component.

[0097] Make an overall enclosure structure, install the control drive component inside, and set a power switch, a mask type gear selection switch, a start switch, and corresponding indicator lights on the panel. The mask types are divided into ordinary masks and medical protective masks.

[0098] Fix the mask to be processed on the mask hanger, place it in the processing chamber, and start the processing.

[0099] When processing ordinary masks, the total UVC irradiation dose > 20 mJ / cm 2 , the application time of the electret electric field is 5 - 20 s, the temperature in the chamber < 100 °C, and the duration < 30 s.

[0100] When processing medical protective masks, the total UVC irradiation dose > 50 mJ / cm 2 , the application time of the electret electric field is 10 - 30 s, the temperature in the chamber < 120 °C, and the duration < 60 s.

[0101] During the processing, start the exhaust fan at low speed. After the processing timer ends, start the exhaust fan at high speed and operate for 5 - 20 s.

[0102] The above structure is suitable for low-frequency processing use.

[0103] Based on the above-mentioned first-side component and the second-side component, the relatively arranged first-side component and second-side component form a group. Arrange two or more groups on both sides of the chamber. A conveyor belt or a mask hanger moving device with a controllable speed and a hook is installed in the middle, and automatic opening and closing airtight doors are installed on the left and right sides, forming a device as Figure 7 shown. The mask ear straps are fixed to the conveyor belt or the mask hanger. After starting, the automatic timing control device sends the mask into the processing chamber and sequentially starts each processing unit to complete rapid dehydration, disinfection, deodorization, and electret regeneration. It can be used after being taken off at the outlet end, which is simple and fast.

[0104] The above structure is suitable for high-frequency or batch processing use.

[0105] Through the above structural settings, this kind of mask processing device meets the mask processing requirements of the following application scenarios:

[0106] 1. Family: Short-term wearing, going out for shopping, entertainment, etc.;

[0107] 2. Office: After meetings and meetings with guests; After short-term contact in crowded places; Regular regeneration in centralized office places;

[0108] 3. Service: Supermarket cashier, restaurant service, entertainment venue service, regular regeneration;

[0109] 4. Medical: Regular regeneration in general occasions;

[0110] 5. Hotel: After dining in the restaurant, temporary meetings with guests, going out, etc.

[0111] In summary, the mask processing device can quickly dehydrate, disinfect, deodorize, and efficiently regenerate masks, so it is difficult to safely regenerate and reuse masks.

[0112] In the case of no conflict, the above-mentioned embodiments and the features in the embodiments can be combined with each other.

[0113] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than limiting the protection scope of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced without departing from the essence and scope of the technical solutions of the present invention.

Claims

1. A mask processing device, comprising a housing, wherein a mask processing area is arranged inside the housing, and is characterized in that: It further includes a pulsed intense light irradiation component, which includes a pulsed xenon flash tube and a light guiding component, and the light guiding component makes the light emitted by the pulsed xenon flash tube irradiate towards the mask treatment area; a thermal radiation heating component, which includes a radiation heat source and a thermal back-reflection reflector, and the thermal back-reflection reflector directs the heat generated by the radiation heat source towards the mask treatment area; the light guiding component includes a parabolic reflector and a back-reflection mirror and a front-reflection mirror arranged inside the parabolic reflector; taking the direction towards which the light outlet of the parabolic reflector faces as the lower direction, the back-reflection mirror is located above the pulsed xenon flash tube, and the front-reflection mirror is located below the pulsed xenon flash tube; the thermal back-reflection reflector includes a thermal radiation reflector, the thermal radiation reflector is arranged inside the parabolic reflector and is located below the front-reflection mirror, and the radiation heat source is located below the thermal radiation reflector; an electrostatic electret regeneration electric field component, including an electret corona electric field emitter and an electret electric field grounding electrode arranged oppositely, the mask treatment area is located between the electret corona electric field emitter and the electret electric field grounding electrode, and the electret corona electric field emitter includes a paired glow plasma discharge needle and an induction electrode; the electret electric field grounding electrode is a metal mesh structure, and the electret electric field grounding electrode is arranged at the light outlet of the parabolic reflector.

2. The mask treatment device according to claim 1, wherein: the pulsed xenon flash tube is located on the symmetry plane of the parabolic reflector, and the distance between the axis of the glass shell of the pulsed xenon flash tube and the focus of the parabolic reflector is 0 to 2r, where r is the radius of the glass shell of the pulsed xenon flash tube.

3. The mask treatment device according to claim 2, wherein: the back-reflection mirror includes two downward reflection surfaces arranged symmetrically, and the included angle between the mirror surfaces of the two downward reflection surfaces is greater than 90°; the front-reflection mirror includes two upward reflection surfaces arranged symmetrically, and the included angle between the mirror surfaces of the two upward reflection surfaces is greater than 90°.

4. The mask treatment device according to claim 2, wherein: the thermal radiation reflector includes two downward reflection surfaces arranged symmetrically, and the included angle between the mirror surfaces of the two downward reflection surfaces is greater than 90°.

5. The mask processing device according to claim 2, characterized in that: The area ratio of the metal part of the electret electric field grounding electrode relative to the light outlet is less than 10%.

6. The mask processing device according to claim 1, wherein: One end of the glow plasma discharge needle is a pointed structure, the induction electrode is a circular hole shape, and the glow plasma discharge needle points to the middle of the induction electrode.

7. The mask processing device according to any one of claims 1 to 6, characterized in that: The housing is provided with an exhaust port communicating with the mask treatment area, and a fan and a filter assembly are arranged in the exhaust port.

8. The mask processing device according to any one of claims 1 to 6, characterized in that: It further includes a conveying chain, the conveying chain is provided with a plurality of mask hanging racks, and the conveying chain passes through the housing and can convey the masks to the mask treatment area.

9. The mask processing device according to claim 8, wherein: Taking the mask treatment area as the boundary, the pulsed intense light irradiation component, the thermal radiation heating component and the electret electric field grounding electrode are located on the same side and form a first side component, and the electret corona electric field emitter is located on the other side and forms a second side component; On both sides of the conveying path of the conveying chain, multiple groups of the first side components and the second side components are arranged and cross-set.

10. The mask processing device according to claim 9, wherein: On both sides of the conveying path of the conveying chain, the high-voltage polarities of all the glow plasma discharge needles on the same side are opposite to those of all the glow plasma discharge needles on the other side.

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