Display device and method of manufacturing the same

Abstract

Disclosed herein are a display apparatus and a manufacturing method thereof. The display apparatus includes a first substrate; and a display unit, wherein the display unit includes a display area and a transmissive area, the display unit includes an auxiliary layer disposed to correspond to the transmissive area, and a second electrode disposed to correspond to only the display area, the auxiliary layer includes a first material and a third material, the second electrode includes a second material, the first material and the second material satisfy the following Equation 1, the auxiliary layer includes a first region and a second region between the first region and the first substrate, and a concentration of the first material in the first region is different from a concentration of the first material in the second region: <Equation 1> ST2 - ST1 > 0 mJ / m 2 wherein in Equation 1, ST1 is a surface energy of the first material at 25℃, and ST2 is a surface energy of the second material at 25℃. According to embodiments of the present disclosure, since a common electrode is not substantially formed in the transmissive area, a display apparatus having a relatively high transmittance can be provided.

Description

[0001] Cross-reference to related applications Technical Field

[0002] One or more embodiments relate to display devices, and more particularly, to display devices having a transmissive region and methods of manufacturing the same. Background Technology

[0003] In recent years, the use of display devices has diversified. Moreover, as display devices become thinner and lighter, their applications are expanding.

[0004] As an example, research into achieving higher transmittance or greater transparency in display devices is ongoing. Specifically, attempts are being made to create transparent display devices by making the thin-film transistors or display panels within the display device transparent.

[0005] To achieve transparent display devices, various variables must be optimized, such as the composition, arrangement, and thickness of various components (e.g., substrate, electrodes, insulating films, and capping films). For example, in the case of organic light-emitting display devices, multiple conductive and insulating films made of different materials are stacked. As a result, optical performance may deteriorate, and therefore, it may be difficult to obtain the desired transmittance or transparency. Summary of the Invention

[0006] One or more embodiments provide a display device with high external light transmittance and a method of manufacturing the same, wherein the display device substantially does not include a common electrode in the transmission region.

[0007] The technical objectives to be achieved by this disclosure are not limited to those mentioned above, and those skilled in the art will clearly understand from the description of this disclosure other technical objectives not mentioned.

[0008] Additional aspects will be set forth in part in the description which follows, and in part will be apparent from the description or may be learned by practice of the embodiments of this disclosure presented.

[0009] According to an embodiment, the display device includes: a first substrate; and a display unit.

[0010] The display unit includes a display area and a transmission area.

[0011] The display unit includes an auxiliary layer configured to correspond to the transmission region, and a second electrode configured to correspond only to the display region.

[0012] The auxiliary layer includes a first material and a third material.

[0013] The second electrode comprises a second material.

[0014] The first material and the second material satisfy the following formula 1.

[0015] The auxiliary layer includes a first region and a second region between the first region and the first substrate, and

[0016] The concentration of the first material in the first region is different from the concentration of the first material in the second region:

[0017] <Formula 1>

[0018] ST2 -ST1 > 0 mJ / m 2

[0019] In Formula 1,

[0020] ST1 is the surface energy of the first material at 25°C, and

[0021] ST2 is the surface energy of the second material at 25°C.

[0022] In some implementations, the second electrode may not be present in the transmission region.

[0023] In an implementation, the first region may include a location with the highest first material concentration.

[0024] In an implementation, the auxiliary layer may further include a third region.

[0025] The third region may be located between the second region and the first substrate, and

[0026] The concentration of the first material in the second region may differ from the concentration of the first material in the third region.

[0027] In the implementation, ST1 can be greater than about 0 mJ / m 2 And less than or equal to approximately 30 mJ / m 2 .

[0028] In an embodiment, the first material may have a molecular weight of about 1500 or less.

[0029] In an embodiment, the second material may include magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or a combination thereof.

[0030] In an embodiment, the third material may have a molecular weight of about 1500 or less.

[0031] According to another embodiment, the display device includes: a first substrate; and a display unit.

[0032] The display unit includes a display area and a transmission area.

[0033] The display unit includes an auxiliary layer configured to correspond to the transmission region, and a second electrode configured to correspond to both the display region and the transmission region.

[0034] The auxiliary layer includes a first material and a third material.

[0035] The second electrode comprises a second material.

[0036] The first material and the second material satisfy the following formula 1.

[0037] The auxiliary layer includes a first region and a second region between the first region and the first substrate, and

[0038] The concentration of the first material in the first region is different from the concentration of the first material in the second region:

[0039] <Formula 1>

[0040] ST2 -ST1 > 0 mJ / m 2

[0041] In Formula 1,

[0042] ST1 is the surface energy of the first material at approximately 25°C, and

[0043] ST2 is the surface energy of the second material at approximately 25°C.

[0044] In one embodiment, the first portion of the second electrode may be configured to correspond to the display area.

[0045] The second part of the second electrode can be configured to correspond to the transmission region, and

[0046] The thickness T1 of the first part and the thickness T2 of the second part can satisfy the following formula 2:

[0047] <Formula 2>

[0048] T1 > T2.

[0049] In an implementation, T2 can be greater than about 0 nm and less than or equal to 1 nm.

[0050] In an implementation, the first region may include a location with the highest first material concentration.

[0051] In an implementation, the auxiliary layer may further include a third region.

[0052] The third region may be located between the second region and the first substrate, and

[0053] The concentration of the first material in the second region may differ from the concentration of the first material in the third region.

[0054] In the implementation, ST1 can be greater than about 0 mJ / m 2 And less than or equal to approximately 30 mJ / m 2 .

[0055] In an embodiment, the first material may have a molecular weight of about 1500 or less.

[0056] In an embodiment, the second material may include magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or a combination thereof.

[0057] In an embodiment, the third material may have a molecular weight of about 1500 or less.

[0058] According to an embodiment, a method for manufacturing a display device includes: providing a first substrate; and

[0059] A display unit including a display area and a transmission area is provided on a first substrate.

[0060] The display unit includes:

[0061] A first material is provided on the display area and the transmission area, a third material is provided only on the transmission area, and then the first material on the display area is removed to provide an auxiliary layer positioned corresponding to the transmission area; and a second electrode is provided.

[0062] The auxiliary layer includes a first material and a third material.

[0063] The second electrode includes a second material, and

[0064] The first material and the second material satisfy the following formula 1:

[0065] <Formula 1>

[0066] ST2 -ST1 > 0 mJ / m 2

[0067] In Formula 1,

[0068] ST1 is the surface energy of the first material at approximately 25°C, and

[0069] ST2 is the surface energy of the second material at approximately 25°C.

[0070] In one implementation, the third material can be provided by deposition using a fine metal mask.

[0071] In one implementation, the second electrode can be provided by depositing a second material using an open mask. Attached Figure Description

[0072] The above and other aspects, features and advantages of certain embodiments of this disclosure will become more apparent from the following description taken in conjunction with the accompanying drawings, wherein:

[0073] Figure 1 A structural diagram of a display device according to an embodiment of the present disclosure is shown for illustrative purposes.

[0074] Figure 2 A cross-sectional view of a display device according to an embodiment of the present disclosure is shown for illustrative purposes.

[0075] Figure 3 A plan view of a display device according to an embodiment of the present disclosure is shown for illustrative purposes.

[0076] Figure 4 To illustrate, according to Figure 2 A cross-sectional view of a display device according to another embodiment of the display device;

[0077] Figure 5 To show more specifically Figure 4 A cross-sectional view of the display unit;

[0078] Figure 6 A cross-sectional view of a display device according to another embodiment of the present disclosure is shown for illustrative purposes.

[0079] Figure 7 A plan view of a display device according to another embodiment of the present disclosure is shown for illustrative purposes.

[0080] Figure 8 To illustrate, according to Figure 6 A cross-sectional view of a display device according to another embodiment of the display device;

[0081] Figures 9 to 16 A cross-sectional view illustrating a method for manufacturing a display device according to an embodiment;

[0082] Figure 17 A block diagram illustrating the construction of an electronic device according to an embodiment of the present disclosure is provided for illustrative purposes.

[0083] Figure 18A and Figure 18B A perspective view of an electronic appliance according to an embodiment of the present disclosure is shown for illustrative purposes.

[0084] Figure 19 To show the transmittance versus wavelength curves of Example 1, Comparative Example 1, and Comparative Example 2;

[0085] Figure 20 To display the transmittance versus wavelength graphs for Example 2, Comparative Examples 3 and 4; and

[0086] Figure 21A graph showing the elemental analysis results relative to depth for Example 2 and Comparative Example 3 based on X-ray photoelectron analysis (XPS). Detailed Implementation

[0087] Reference will now be made in detail to embodiments, examples of which are illustrated in the accompanying drawings, wherein similar reference numerals throughout the description denote similar elements. In this regard, embodiments may take different forms and should not be construed as limited to the description set forth herein. Therefore, the following description of embodiments with reference to the accompanying drawings is merely for the purpose of explaining aspects of this description. As used herein, the term “and / or” includes any one and all combinations of one or more of the associated enumerated items. For example, the expression “at least one,” when preceding a column of elements, modifies the entire column of elements without modifying any individual element within that column.

[0088] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. Throughout the drawings, the same reference numerals will refer to the same or similar parts, and redundant descriptions will be omitted.

[0089] In the following embodiments, although the terms "first," "second," etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another.

[0090] In the following implementation, the singular forms “a”, “an”, and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0091] In the following embodiments, the terms “comprising,” “including,” “having,” etc., when used in this specification, indicate the presence of the described features, integers, steps, operations, elements, components, and / or combinations thereof, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or combinations thereof.

[0092] In the following embodiments, when layers, films, regions, plates, etc. are referred to as being "on" or "above" another part throughout the specification, this includes not only cases where they are directly above another part, but also cases where another part exists in between.

[0093] In the accompanying drawings, the dimensions of the components may be enlarged or reduced for ease of explanation. For example, the dimensions and thicknesses of each component shown in the drawings are arbitrarily depicted for ease of explanation, and therefore this disclosure is not necessarily limited thereto.

[0094] Where implementation methods can differ, the specific process sequence can be performed in a different order than that described. For example, two consecutively described processes can be performed substantially simultaneously or in the reverse order of their description.

[0095] In the following embodiments, when a membrane, region, element, etc., is referred to as "coupled" or "connected" to another membrane, another region, another element, etc., it may be directly coupled or directly connected to another membrane, another region, another element, etc., or there may be an intermediate membrane, another region, another element, etc. between them. For example, as used herein, when a membrane, region, element, etc., is referred to as "electrically coupled" or "electrically connected" to another membrane, another region, another element, etc., it may be directly electrically coupled or directly electrically connected to another membrane, another region, another element, etc., or there may be an intermediate membrane, another region, another element, etc. between them.

[0096] Figure 1 A structural diagram of a display device 1 according to an embodiment of the present disclosure is shown for illustrative purposes.

[0097] refer to Figure 1 According to an embodiment, the display device 1 includes a first substrate 10 and a display unit 20. The display unit 20 may include a display area 100 in which an image is implemented and a transmission area 200 through which external light is transmitted. In the display device 1, external light is incident through the first substrate 10 and the display unit 20.

[0098] In display device 1, an image is displayed through display area 100, and external light is transmitted through transmission area 200. User U can see the external image through transmission area 200. That is, display device 1 can be implemented as a display in which the transmittance of display area 100 and the transmittance of transmission area 200 are different from each other.

[0099] In one embodiment, as an example, a front-emitting display device is described, through which a user U located on the side where the image is implemented can observe an image on the outer side of the first substrate 10; however, the display device disclosed herein is not limited to this. In another embodiment, a rear-emitting display device can be used, wherein the image is implemented in the direction from the display unit 20 toward the first substrate 10.

[0100] Since thin-film transistors, capacitors, etc. are not disposed in the transmission region 200, the transmittance of external light in the transmission region 200 can be increased, thereby increasing the transmittance of external light in the display device 1, and it is possible to prevent the transmitted image from being interfered with by the thin-film transistors, capacitors, etc.

[0101] The display device 1 may further include a second substrate 30 facing the first substrate 10 (see [reference]). Figure 16 In this case, the display unit 20 may be located between the first substrate 10 and the second substrate 30.

[0102] The second substrate 30 is made of transparent glass or plastic to realize the image from the display unit 20 and to prevent external air and moisture from penetrating into the display unit 20. The edges of the first substrate 10 and the second substrate 30 can be attached to each other by a sealing material to seal the space between the first substrate 10 and the second substrate 30. Absorbents, fillers, etc., can be disposed in the space. Alternatively, the space can be sealed by forming a second substrate 30 as a thin film on the first substrate 10 and the display unit 20. In this case, both the first substrate 10 and the second substrate 30 can be flexible.

[0103] In the following description, an organic light-emitting display device will be used as an example of display device 1 according to an embodiment of the present disclosure. However, the display device of the present disclosure is not limited thereto. In another embodiment, various display devices, such as inorganic light-emitting display devices and quantum dot light-emitting display devices, may be used.

[0104] Figure 2 A cross-sectional view of a display device 1A according to an embodiment of the present disclosure is shown for illustrative purposes. Figure 3 A plan view of a display device 1A according to an embodiment of the present disclosure is shown for illustrative purposes. Specifically, Figure 3 To illustrate a planar view of the first pixels PX1 that are adjacent to each other (e.g., the first red pixel Pr, the first green pixel Pg, and the first blue pixel Pb), and Figure 2 For along Figure 3 A cross-sectional view taken from line A-A'.

[0105] refer to Figure 2 The display unit 20 may include a display area 100 in which an image is displayed and a transmissive area 200 adjacent to the display area 100 and through which external light is transmitted. Here, the external light is external light that is distinct from the light emitted by the light-emitting element EL1 of the first pixel PX1. The external light may be ambient light or light emitted by another electronic device.

[0106] In the transmission area 200, elements containing opaque materials may not be provided; instead, only a substantially transparent auxiliary layer, insulating film, etc., may be provided, and images outside the display device 1A may be directly transmitted.

[0107] The first external light 61 and the second external light 62 can be transmitted through the transmission region 200. The first external light 61 is external light transmitted from the outside of the display unit 20 to the outside of the first substrate 10. The second external light 62 is external light transmitted from the outside of the first substrate 10 to the outside of the display unit 20. Components and wiring may be arranged to bypass the transmission region 200, and therefore components and wiring may not be provided in the transmission region 200. At least the fourth insulating film 15 may not be provided in the transmission region 200. The third insulating film 14 provided in the transmission region 200 may include a transparent insulating material.

[0108] Display area 100 may include light-emitting area 102 and circuit area 101. A first pixel PX1 may be disposed in display area 100. The light-emitting element EL1 of the first pixel PX1 may be disposed in light-emitting area 102. The pixel circuit of the first pixel PX1, electrically connected to the light-emitting element EL1 and including a thin-film transistor TR1, may be disposed in circuit area 101. Circuit area 101 and light-emitting area 102 do not overlap each other, and therefore the light-emitting element EL1 and pixel circuit may be configured to be adjacent to each other so as not to overlap each other. As shown in the figures, a thin-film transistor TR1 is disposed in circuit area 101, but the present disclosure is not limited thereto. Circuit area 101 may include a plurality of thin-film transistors and a plurality of capacitors, and may further include scan lines, data lines and power lines connected to the plurality of thin-film transistors and the plurality of capacitors.

[0109] The thin-film transistor TR1 may include a semiconductor layer 111 on a buffer film 11, a gate electrode 112, a source electrode 113, and a drain electrode 114. A first insulating film 12 between the semiconductor layer 111 and the gate electrode 112 may be used as a gate insulating film, and a second insulating film 13 between the gate electrode 112 and the drain electrode 114 and between the source electrode 113 and the gate electrode 112 may be used as an interlayer insulating film.

[0110] The light-emitting element EL1 may include a first electrode 116 on a third insulating film 14 covering the thin-film transistor TR1, a second electrode 130 facing the first electrode 116, and an intermediate layer 117 between the first electrode 116 and the second electrode 130.

[0111] The edge of the first electrode 116 may be covered by the fourth insulating film 15, and the central portion of the first electrode 116 may be exposed. The fourth insulating film 15 may be provided to cover the display area 100. However, the fourth insulating film 15 is not necessarily provided to cover the entire display area 100, but is sufficient to cover at least a portion of the display area 100, particularly the edge of the first electrode 116.

[0112] An auxiliary layer 118 is provided on the third insulating film 14 to correspond to the transmission region 200 exposed through the fourth insulating film 15. That is, the auxiliary layer 118 may be configured not to overlap with the intermediate layer 117.

[0113] The thickness of the auxiliary layer 118 can be from about 1 nm to about 2,000 nm. Specifically, the thickness of the auxiliary layer 118 can be from about 1 nm to about 50 nm, but is not limited thereto. When its thickness meets the above range, as will be described later, it may be sufficient to achieve the effect of patterning the second electrode 130 and to ensure a relatively high transmittance of the transmission region 200.

[0114] The auxiliary layer 118 includes a first material and a third material.

[0115] The second electrode 130 is provided on the intermediate layer 117. The second electrode 130 may be provided only in the display area 100 and may not be provided in the transmission area 200.

[0116] The second electrode 130 includes a second material.

[0117] The first material and the second material satisfy the following formula 1:

[0118] <Formula 1>

[0119] ST2 -ST1 > 0 mJ / m 2

[0120] In Formula 1,

[0121] ST1 is the surface energy of the first material at approximately 25°C, and

[0122] ST2 is the surface energy of the second material at approximately 25°C.

[0123] A first material is applied to the entire surface (i.e., both the display area 100 and the transmission area 200) using a dry process and / or a wet process to form a first layer. Specifically, in the case of a dry process, the first material can be deposited on the entire surface using an open mask, and in the case of a wet process, the material can be applied to the entire surface by coating.

[0124] Then, a third material is deposited using a fine metal mask to correspond only to the transmission region 200, thereby forming a second layer.

[0125] Then, the first material provided corresponding to the display area 100 can be removed. Specifically, the first material exposed on the surface can be removed by performing plasma treatment (e.g., plasma heat treatment) over the entire surface, thereby forming the auxiliary layer 118. Since the third material is deposited corresponding to the transmission area 200, the transmission area 200 remains in a state where the first and third materials have not been removed, even when plasma treatment is performed. During this process, the first material diffuses in the direction from the first layer to the second layer, and thus the interface between the first and second layers disappears. At the same time, the concentration of the first material on one surface of the auxiliary layer 118, specifically, the concentration of the first material on the surface further away from the first substrate 10, increases.

[0126] Then, an open mask is used to deposit a second material on the display area 100 and the transmission area 200. In this case, since the surface energies of the first and second materials are controlled differently, the second material can be controlled such that it is essentially not disposed in the area where the first material is disposed. That is, the second material is relatively well deposited on the intermediate layer 117, but relatively poorly deposited on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is configured to correspond to the transmission area 200, the second electrode 130 including the second material can be configured to correspond only to the display area 100 and is essentially not provided to the transmission area 200.

[0127] like Figure 2 and Figure 3 As shown, the auxiliary layer 118 is disposed in the area where the second electrode 130 should not be disposed, and the auxiliary layer 118 is not disposed in the area where the second electrode 130 should be disposed. Then, during the process of depositing the second material, even when the second material is deposited on both the display area 100 and the transmission area 200 of all pixels using an open mask, the metal is essentially deposited only on the surface of the exposed intermediate layer 117, and essentially not deposited on the surface of the auxiliary layer 118, thereby achieving the effect of patterning the second electrode 130.

[0128] The second electrode 130 should be substantially not disposed in the transmission region 200 to improve the transmittance of the transmission region 200. For this purpose, when a fine metal mask is used to form the second electrode 130 disposed only in the display region 100, the fine metal mask can deform over long-term use because the deposition temperature is very high. This can lead to very unstable processes, such as problems like shadowing. However, the display device 1A according to the embodiments of this disclosure can automatically achieve the effect of patterning the second electrode 130 as described above, which is advantageous in this process.

[0129] Furthermore, since the second electrode 130 is essentially not disposed in the transmission region 200, the transmittance of the transmission region 200 can be improved. In other words, the second electrode 130 can be configured to correspond only to the display region 100, and the second electrode 130 is not present in the transmission region 200, thereby improving the transmittance of the transmission region 200.

[0130] In this embodiment, the auxiliary layer 118 may include a first region and a second region. The second region may be located between the first region and the first substrate 10. That is, the second region and the first region may be arranged sequentially along the direction from the first substrate 10 to the display unit 20.

[0131] The concentration of the first material in the first region may differ from the concentration of the first material in the second region. Specifically, the concentration of the first material in the first region may be higher than the concentration of the first material in the second region. More specifically, the first region may include the location of the highest concentration of the first material.

[0132] In another embodiment, the auxiliary layer 118 may further include a third region. The third region may be located between the second region and the first substrate 10. That is, the third region, the second region, and the first region may be arranged sequentially along the direction from the first substrate 10 to the display unit 20.

[0133] The concentration of the first material in the second region may differ from the concentration of the first material in the third region. Specifically, the concentration of the first material in the second region may be lower than each of the concentrations of the first material in the first region and the concentration of the first material in the third region. More specifically, the concentration of the first material may gradually decrease from one surface of the auxiliary layer 118 toward its other surface opposite to that surface, and then gradually increase. However, this disclosure is not limited thereto.

[0134] A first material is provided to form a first layer, and then a third material is provided on top of the first layer to form a second layer, thereby forming an auxiliary layer 118. Immediately after the formation of the auxiliary layer 118, an interface may exist between the first and second layers. However, over time, the first material diffuses in the direction from the first layer to the second layer, and thus the interface between the first and second layers disappears. Finally, the auxiliary layer 118 exhibits a state in which the first and third materials are uniformly or non-uniformly mixed. Therefore, as described above, the concentration distribution of the first material is shown.

[0135] In the implementation method, ST2-ST1 can be approximately 30 mJ / m 2 Or even higher, specifically, at least about 50 mJ / m 2 Or larger. When the above range is met, the second material may not be deposited on the first material substantially.

[0136] Specifically, ST1 can be greater than approximately 0 mJ / m 2 And less than or equal to approximately 30 mJ / m 2 When the above range is met, the second material may not deposit substantially on the first material. Specifically, ST1 may be approximately 20 mJ / m 2 Or smaller, but not limited to this.

[0137] In this embodiment, the first material may include an organic compound. Specifically, the first material may include a fluorinated organic compound. More specifically, the first material may be an organic compound with a relatively high fluorine content.

[0138] For example, the first material may contain about 20 at% or more fluorine. When the above range is met, the surface energy of the first material can be reduced to such an extent that the second material can be substantially not deposited on the first material. The fluorine content of the first material can be obtained by analyzing the first material using X-ray photoelectron spectroscopy (XPS). Specifically, the first material may contain about 50 at% or more fluorine, but is not limited thereto.

[0139] For example, as described above, the first material may include an organic compound. The first material may include fluorosilane compounds, fluorinated polymer compounds, or any combination thereof.

[0140] Fluorosilane compounds may include, but are not limited to, trichloro(1H,1H,2H,2H-perfluorodecyl)silane, trichloro(1H,1H,2H,2H-perfluoro-n-octyl)silane, triethoxy-1H,1H,2H,2H-perfluorodecylsilane, 1H,1H,2H,2H-nonafluorohexyltriethoxysilane, 1H,1H,2H,2H-tetrafluoro-n-octyltriethoxysilane, 1H,1H,2H,2H-heptafluorodecyltrimethoxysilane, and 1H,1H,2H,2H-nonafluorohexyl Trimethoxysilane, trimethoxy(1H,1H,2H,2H-perfluoro-n-octyl)silane, 1,1,1-trifluoro-3-(trimethoxysilyl)propane, (triethylsilyl)trifluoromethane, triethoxy[5,5,6,6,7,7,7-heptafluoro-4,4-bis(trifluoromethyl)heptyl]silane, trichloro(3,3,3-trifluoropropyl)silane, dimethoxy(methyl)(3,3,3-trifluoropropyl)silane, dichloro(methyl)(3,3,3-trifluoropropyl)silane, or any combination thereof.

[0141] Fluorinated polymer compounds may include, but are not limited to, poly(hexafluoropropylene oxide), poly(tetrafluoroethylene-co-hexafluoropropylene), poly(octyl decafluoroacrylate), poly(tetrafluoro-3-(heptafluoropropoxy)acrylate), poly(tetrafluoro-3-(heptafluoroethoxy)acrylate), poly(tetrafluoroethylene), tetrafluoroethylene hexafluoropropylene vinylidene fluoride, poly(hexyl undecanoate), poly(pentafluoroacrylate), poly(tetrafluoro-3-(trifluoromethoxy)acrylate), poly(vinyl pentafluoropropionate), and poly(butyl heptafluoroacrylate). Poly(vinyl trifluoroacetate), poly(1,1,1,3,3,3-hexafluoroacrylate isopropyl acrylate), poly(pentyl octafluoroacrylate), poly(methyl-3,3,3-trifluoropropylsiloxane), poly(2,2,3,3,4,4,4-heptafluoromethacrylate butyl acrylate), poly(propyl pentafluoroacrylate), poly(2,2,3,3,3-pentafluoroacrylate propyl acrylate), poly(2-heptafluorobutoxy) ethyl acrylate, poly(chlorotrifluoroethylene), poly(1,1,1,3,3,3-hexafluoromethacrylate isopropyl acrylate), or any combination thereof.

[0142] More specifically, the molecular weight of the first material may be about 1500 or less, but is not limited to this.

[0143] As the difference between ST2 and ST1 increases, it becomes possible to prevent the second material from being deposited substantially on the first material. For this purpose, ST2 can be greater than about 30 mJ / m 2 Alternatively, ST2 can be approximately 100 mJ / m 2 Or larger, but not limited to this.

[0144] In this embodiment, the second material may include an inorganic compound. Specifically, the second material may include a metal-containing inorganic compound.

[0145] For example, the second material may include magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof. Specifically, the second material may include Mg, Ag, Al, or any combination thereof.

[0146] In this embodiment, the third material may have a molecular weight of about 1500 or less, and the third material may include an organic compound.

[0147] For example, the third material may be selected from organic compounds used to form the various functional layers included in the intermediate layer 117, but is not limited thereto.

[0148] Specifically, the third material may include compounds typically used in hole transport layers or hole injection layers. For example, the third material may include aromatic amine compounds or conductive polymer compounds.

[0149] More specifically, the third material may include, but is not limited to, m-MTDATA, TDATA, 2-TNATA, NPB (NPD), β-NPB, TPD, spiro-TPD, spiro-NPB, methylated NPB, TAPC, HMTPD, TCTA (4,4',4”-tris(N-carbazolyl)triphenylamine), PANI / DBSA (polyaniline / dodecylbenzenesulfonic acid), PEDOT / PSS (poly(3,4-ethylenedioxythiophene) / poly(4-styrenesulfonate)), PEDOT / PSS / PFI (poly(3,4-ethylenedioxythiophene) / poly(4-styrenesulfonate) / perfluorinated ionomer), PANI / CSA (polyaniline / camphor sulfonic acid), PANI / PSS (polyaniline / poly(4-styrenesulfonate)) or combinations thereof.

[0150]

[0151]

[0152] The first pixel PX1 can be, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb. However, this disclosure is not limited to this, and any combination of colors can be used, as long as white light can be achieved through the combination.

[0153] Figure 4 For illustrative purposes only Figure 2 A cross-sectional view of a display device 1B according to another embodiment of the display device 1A. Figure 5 To show more specifically Figure 4 A cross-sectional view of the display unit 20.

[0154] As described above, the auxiliary layer 118 may be disposed only in the transmission region 200. Conversely, unlike... Figure 2 As shown, the second electrode 130 can be configured to correspond to both the display area 100 and the transmission area 200.

[0155] When a second material is deposited through an open mask, such as Figure 5 As shown, a first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 to correspond to the display area 100, and a second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 to correspond to the transmission area 200. The thickness T1 of the first portion 130a and the thickness T2 of the second portion 130b satisfy the following formula 2:

[0156] <Formula 2>

[0157] T1 > T2.

[0158] Since Formula 2 above is satisfied, it is possible to reduce the decrease in transmittance caused by the second part 130b.

[0159] Here, T1 refers to the average thickness of the second electrode 130 in all the first portions 130a, and T2 refers to the average thickness of the second electrode 130 in all the second portions 130b. Here, the region where the second material is deposited by the open mask is constituted by the sum of all the first portions 130a and all the second portions 130b.

[0160] However, the above does not preclude the possibility that the second electrode 130 may be aggregated in a portion of the transmission region 200 to form a film, and the second electrode 130 may be formed in the transmission region 200 as an island-shaped film.

[0161] Specifically, T2 can be greater than about 0 nm and less than or equal to 1 nm. More specifically, T2 can be greater than about 0 nm and less than or equal to about 0.1 nm. When the above range is met, the second electrode 130 is considered to be substantially not disposed in the transmission region 200.

[0162] Because each component has and Figure 2 and Figure 3 The corresponding components of the above embodiments have the same or similar functions, so their detailed description will be omitted.

[0163] Figure 6 A cross-sectional view of a display device 2A according to another embodiment of the present disclosure is shown for illustrative purposes. Figure 7 A plan view of a display device 2A according to another embodiment of the present disclosure is shown for illustrative purposes. Specifically, Figure 7 This is a planar diagram showing the first pixels PX1 that are adjacent to each other, such as the first red pixel Pr, the first green pixel Pg, and the first blue pixel Pb. Figure 6 For along Figure 7 A cross-sectional view taken from line A-A'.

[0164] Unlike Figure 2 and Figure 3 The display device 1A shown in the middle, Figure 6 and Figure 7 The display device 2A shown in the middle can be configured such that the circuit area 101 and the light-emitting area 102 included in the display area 100 overlap each other.

[0165] Transmissive regions 200 adjacent to multiple first pixels PX1 (e.g., first red pixel Pr, first green pixel Pg, and first blue pixel Pb) can be connected to each other to form a common transmissive region 200. Therefore, the transmittance of the display device 2A can be increased.

[0166] Because each component has and Figure 2 and Figure 3 The corresponding components of the above embodiments have the same or similar functions, so their detailed description will be omitted.

[0167] Figure 8 To illustrate, according to Figure 6 A cross-sectional view of a display device 2B according to another embodiment of the display device 2A.

[0168] As described above, the auxiliary layer 118 may be disposed only in the transmission region 200. Conversely, unlike... Figure 6 As shown, the second electrode 130 can be configured to correspond to both the display area 100 and the transmission area 200.

[0169] When the second material is deposited through an open mask, a first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 to correspond to the display area 100, and a second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 to correspond to the transmission area 200. The thickness of the first portion 130a is represented by a first thickness T1, and the thickness of the second portion 130b is represented by a second thickness T2, and the second thickness T2 and the first thickness T1 satisfy the following formula 2:

[0170] <Formula 2>

[0171] T1 > T2

[0172] In formula 2 above,

[0173] T1 is the thickness of the second electrode in the display area, and

[0174] T2 is the thickness of the second electrode in the transmission region.

[0175] Since Formula 2 above is satisfied, it is possible to reduce the decrease in transmittance caused by the second part 130b.

[0176] Specifically, T2 can be greater than about 0 nm and less than or equal to 1 nm. More specifically, T2 can be greater than about 0 nm and less than or equal to 0.1 nm. When the above range is met, the second electrode 130 is considered to be substantially not disposed in the transmission region 200.

[0177] Because each component has and Figure 2 and Figure 3 The corresponding components of the above embodiments have the same or similar functions, so their detailed description will be omitted.

[0178] Figures 9 to 16 A cross-sectional view illustrating a method for manufacturing a display device 1A according to an embodiment.

[0179] refer to Figures 9 to 16 A method for manufacturing a display device 1A according to an embodiment includes: providing a first substrate 10; and providing a display unit 20 on the first substrate 10, comprising a display area 100 and a transmissive area 200, wherein providing the display unit 20 includes: providing a first material on the display area 100 and the transmissive area 200, providing a third material only on the transmissive area 200, and then removing the first material on the display area 100 to provide an auxiliary layer 118 configured to correspond to the transmissive area 200; and providing a second electrode 130, the auxiliary layer 118 comprising the first material and the third material, and the second electrode 130 comprising a second material. The description of the first material and the second material refers to the description above.

[0180] Hereinafter, a method for manufacturing a display device 1A according to an embodiment of the present disclosure will be described in detail with reference to the accompanying drawings.

[0181] refer to Figure 9 A buffer film 11 is provided on the first substrate 10, and a pixel circuit including a thin-film transistor TR1 is provided on the buffer film 11.

[0182] The first substrate 10 may include glass, ceramic, metal, plastic or other materials with flexible or bendable properties.

[0183] The buffer film 11 can be used to block impurity elements from penetrating through the first substrate 10 and to planarize the surface of the first substrate 10. The buffer film 11 can be made of inorganic materials (such as silicon nitride (SiN)). x ) and / or silicon dioxide (SiO2) x It is formed by a single layer or multiple layers. The buffer membrane 11 can be omitted.

[0184] A semiconductor layer 111 for the first pixel PX1 of the display device 1A is provided on the buffer film 11. The semiconductor layer 111 may contain various materials. For example, the semiconductor layer 111 may contain inorganic semiconductor materials, such as amorphous silicon or crystalline silicon. As another example, the semiconductor layer 111 may contain oxide semiconductor or organic semiconductor materials.

[0185] A first insulating film 12 may be provided on the buffer film 11 to cover the semiconductor layer 111, and a gate electrode 112 of the first pixel PX1 may be provided on the first insulating film 12.

[0186] The first insulating film 12 may be made of materials selected from SiO2 and SiN. x It is formed by a single layer or multiple layers of at least one of SiON, Al2O3, TiO2, Ta2O5, HfO2, ZrO2, BST and PZT. The first insulating film 12 may be an inorganic insulating film.

[0187] The gate electrode 112 can be formed of various conductive materials. For example, the gate electrode 112 can be formed of a single layer or multiple layers including at least one selected from aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu). For example, the gate electrode 112 can be formed of three layers of Mo / Al / Mo or Ti / Al / Ti.

[0188] A second insulating film 13 may be provided on the first insulating film 12 to cover the gate electrode 112, and the source electrode 113 and drain electrode 114 of the first pixel PX1 may be provided on the second insulating film 13 to be electrically connected to the semiconductor layer 111 through contact holes, respectively.

[0189] The second insulating film 13 may be an inorganic insulating film. The second insulating film 13 may be made of materials selected from SiO2, SiN, etc. x It is formed of a single layer or multiple layers of at least one of SiON, Al2O3, TiO2, Ta2O5, HfO2, ZrO2, BST, and PZT. In another embodiment, the second insulating film 13 may be an organic insulating film.

[0190] Each of the source electrode 113 and the drain electrode 114 may be formed of various conductive materials. For example, each of the source electrode 113 and the drain electrode 114 may be formed of a single layer or multiple layers including at least one selected from aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu). For example, each of the source electrode 113 and the drain electrode 114 may be formed of two or more layers.

[0191] The structure of the thin-film transistor TR1 is not limited to the structure shown in the attached figure, and various structures of the thin-film transistor TR1 can be applied.

[0192] A third insulating film 14 is provided to cover the thin-film transistor TR1 of the first pixel PX1.

[0193] The third insulating film 14 may be an organic film formed from a single organic insulating layer or multiple organic insulating layers having a flat upper surface. The third insulating film 14 may include general-purpose polymers (PMMA or PS), polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorinated polymers, p-xylene polymers, vinyl alcohol polymers, or blends thereof. For example, the third insulating film 14 may include polyimide, polyamide, or acrylic resin.

[0194] Generally, the surface energy of the compound included in the third insulating film 14 is 100 mJ / m. 2 Or even larger. Therefore, when the second material is deposited directly on both the display area 100 and the transmission area 200 of the third insulating film 14 using an open mask without forming the auxiliary layer 118 in the transmission area 200, the effect of patterning the second electrode 130 may not be achieved at all, because the surface energy of the compound included in the third insulating film 14 is the same as or similar to the surface energy of the second material.

[0195] A first electrode 116 is provided on the third insulating film 14 for a light-emitting element EL1 that is electrically connected to a thin-film transistor TR1 of the first pixel PX1. The first electrode 116 may be provided to correspond to the display area 100.

[0196] When the light-emitting element EL1 is a front-emitting element, the first electrode 116 may be formed as a reflective electrode. The reflective electrode may include a reflective layer comprising Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr or compounds thereof, and a transparent or translucent electrode layer formed on the reflective layer. When the light-emitting element EL1 is a back-emitting element, the first electrode 116 may include a transparent material, such as ITO, IZO, ZnO or In2O3, and may be formed as a transparent or translucent electrode.

[0197] like Figure 9 As shown, each of the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 can be provided to cover both the display area 100 and the transmission area 200. However, embodiments of this disclosure are not limited thereto, and at least one of the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 can be provided to have an opening at a location corresponding to the transmission area 200, thereby further increasing the external light transmission efficiency of the transmission area 200.

[0198] External light passes through the transmission region 200 and is recognized by the user. Therefore, only a transparent insulating film or the like can be provided in the transmission region 200, and the reflection that occurs at the interface of the film provided in the transmission region 200 can be minimized, thereby increasing the transmittance of the transmission region 200.

[0199] Interface reflection can increase with the increase of the refractive index difference between the films in contact with each other. According to the embodiment, all the buffer films 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 can be monolayer films each having substantially the same refractive index. Since all the buffer films 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 provided in the transmission region 200 are formed to have the same refractive index, interface reflection occurring between the films can be minimized, thereby increasing the transmittance of the transmission region 200.

[0200] refer to Figure 10 A fourth insulating film 15 may be provided on the third insulating film 14 to cover the edge of the first electrode 116. The fourth insulating film 15 may be an inorganic or organic insulating film formed of a single layer or multiple layers as described above.

[0201] A fourth insulating film 15 may be provided to cover the display area 100 of the display device 1A. In this case, the fourth insulating film 15 is not necessarily provided to cover the entire display area 100, but is sufficient to cover at least a portion of the display area 100, in particular, the edge of the first electrode 116 of the first pixel PX1.

[0202] The fourth insulating film 15 may include a first opening 15a that exposes at least a portion of the first electrode 116 of the first pixel PX1 and a second opening 15b at a location corresponding to the transmission region 200. Since the fourth insulating film 15 is not disposed in the transmission region 200, the external light transmission efficiency of the transmission region 200 can be further increased.

[0203] refer to Figure 11 A first layer 118a comprising a first material may be provided on the entire surface of the first substrate 10 (i.e., the fourth insulating film 15, the first electrode 116 of the first pixel PX1 exposed through the first opening 15a, and the third insulating film 14 exposed through the second opening 15b).

[0204] In one embodiment, the first material can be provided by depositing the first material on the entire surface of the first substrate 10 using a dry process (e.g., an open mask).

[0205] In another embodiment, a wet process can be used to apply the first material to the entire surface of the first substrate 10.

[0206] refer to Figure 12 A second layer 118b comprising a third material may be provided on the first layer 118a exposed through the second opening 15b.

[0207] In an implementation, a mask may be used, for example, a fine metal mask (FMM) having an opening M11 corresponding to the transmissive region 200 of the display device 1A, providing the third material only in the transmissive region 200. Specifically, the third material may be deposited using an FMM.

[0208] refer to Figure 13 An auxiliary layer 118 can be formed by removing the first layer 118a that corresponds to the display area 100.

[0209] In this embodiment, the first layer 118a can be removed by plasma treatment (e.g., plasma heat treatment) over its entire surface. The auxiliary layer 118 is completed by removing the first layer 118a. Since the third material is deposited to correspond to the transmission region 200, the transmission region 200 remains in a state where the first and third materials are not removed, even when plasma treatment is performed. During the process, the first material diffuses in the direction from the first layer 118a to the second layer 118b, and thus the interface between the first layer 118a and the second layer 118b disappears. At the same time, the concentration of the first material on one surface of the auxiliary layer 118, specifically, the concentration of the first material on the surface further away from the first substrate 10, increases. Therefore, even when the second electrode 130 is formed immediately without removing the second layer 118b, patterning is possible through the difference in surface energy between the first and second materials.

[0210] refer to Figure 14 An intermediate layer 117 may be provided on the first electrode 116 of the first pixel PX1 exposed through the first opening 15a.

[0211] The intermediate layer 117 includes a light-emitting layer for emitting light, and may further include at least one functional layer selected from the hole injection layer (HIL), hole transport layer (HTL), electron transport layer (ETL), and electron injection layer (EIL). However, this embodiment is not limited to this, and various functional layers may be further provided on the first electrode 116.

[0212] The light-emitting layer can be a red, green, or blue light-emitting layer. The light-emitting layer can have a multilayer structure in which the red, green, and blue light-emitting layers are stacked to emit white light, or it can have a single-layer structure including red, green, and blue light-emitting materials.

[0213] In an implementation, a mask may be used, for example, a fine metal mask (FMM) having an opening M21 corresponding to the light-emitting area 102 of the display device 1A, providing an intermediate layer 117 only in the light-emitting area 102.

[0214] In another embodiment, a mask may be used, for example, a fine metal mask (FMM) having an opening M21 corresponding to the light-emitting area 102 of the display device 1A, providing the light-emitting layer of the intermediate layer 117 only in the light-emitting area 102, and other functional layers may be provided on the entire surface of the first substrate 10.

[0215] In embodiments of this disclosure, at least in the transmissive region 200 of the display device 1A, no light-emitting layer is provided.

[0216] refer to Figure 15In one embodiment, a second electrode 130 may be provided on the intermediate layer 117 or on the intermediate layer 117 and the auxiliary layer 118.

[0217] The second electrode 130 can be provided by depositing a second material using an open mask. In this case, the surface energy of the first material of the auxiliary layer 118 and the surface energy of the second material of the second electrode 130 can be controlled to be different from each other, and therefore the second material can be substantially not provided in the transmission region 200 where the first material is provided. That is, the second material can be deposited on the intermediate layer 117, but not on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is configured to correspond to the transmission region 200, the second electrode 130 including the second material can be provided only to correspond to the display region 100 and is substantially not provided in the transmission region 200.

[0218] refer to Figure 16 After the second substrate 30 is further aligned on the first substrate 10, the first substrate 10 and the second substrate 30 can be coupled to each other.

[0219] The second substrate 30 may include glass, ceramic, metal, plastic or other materials with flexible or bendable properties.

[0220] The black matrix BM and the color filter CF can be disposed on the surface of the second substrate 30 (the surface facing the first substrate 10). The color filter CF can be disposed corresponding to the light-emitting area 102 of the display device 1A. The black matrix BM can be disposed corresponding to the area other than the light-emitting area 102 and the transmissive area 200 of the display device 1A. That is, the black matrix BM is not disposed in the transmissive area 200 of the display device 1A.

[0221] Although not shown, a protective layer may be further disposed on the second electrode 130 before the second substrate 30 is coupled to the first substrate 10. The protective layer may be a single layer or multiple layers of inorganic and / or organic films.

[0222] Furthermore, although not shown, various functional layers may be provided on the second substrate 30. For example, the functional layer may be an anti-reflective layer that minimizes reflections on the upper surface of the second substrate 30, or a stain-resistant layer that prevents contamination (such as a user's fingerprint).

[0223] In another embodiment, a thin-film encapsulation layer may be disposed on the first substrate 10 instead of the second substrate 30 described above. The thin-film encapsulation layer may include at least one inorganic encapsulation layer comprising inorganic materials and at least one organic encapsulation layer comprising organic materials. In some embodiments, the thin-film encapsulation layer may have a structure in which the first inorganic encapsulation layer, the organic encapsulation layer, and the second inorganic encapsulation layer are stacked.

[0224] After the auxiliary layer 118 is formed, various modifications to the process are possible once the second electrode 130 is formed.

[0225] Display devices can be implemented as electronic devices 1000, such as mobile phones, video phones, smartphones, smart panels, smartwatches, tablet PCs, laptops, computer monitors, televisions, digital broadcasting terminals, personal digital assistants (PDAs), portable multimedia players (PMPs), head-mounted displays (HMDs), or vehicle navigation systems.

[0226] Figure 17 A block diagram illustrating the construction of an electronic device according to an embodiment of the present disclosure is shown for illustrative purposes. Figure 18A and Figure 18B A perspective view of an electronic appliance according to an embodiment of the present disclosure is shown for illustrative purposes.

[0227] refer to Figure 17 The electronic device 1000 may include a processor 1010, a memory device 1020, a storage device 1030, an input / output device 1040, a power supply 1050, and a display device 1060. In this case, the display device 1060 may correspond to... Figure 1 The display device 1. The electronic device 1000 may further include various ports capable of communicating with video cards, sound cards, memory cards, USB devices, etc., or with other systems.

[0228] In the implementation method, such as Figure 18A The document shows that the electronic appliance 1000 can be implemented as a television. In the implementation method, such as... Figure 18B As shown, the electronic appliance 1000 can be implemented as a smartphone. However, these appliances are exemplary, and the electronic appliance 1000 is not limited thereto.

[0229] Next, we will refer to Figure 19 The formation of the second electrode 130 is described based on the presence or absence of the first layer 118a.

[0230] The graph indicated by Comparative Example 1 is the transmittance graph of Sample 1. Sample 1 is a glass substrate with a thickness of 0.5 mm. The graph indicated by Comparative Example 2 is the transmittance graph of Sample 2. Sample 2 is a substrate formed by depositing Ag-Mg (weight ratio = 10:1) on a glass substrate with a thickness of 0.5 mm to form an Ag-Mg film with a thickness of 9 nm. The graph indicated by Example 1 is the transmittance graph of Sample 3. Sample 3 is a substrate prepared by forming a first layer 118a including the first material and having a thickness of 10 nm on a glass substrate with a thickness of 0.5 mm, and then depositing Ag-Mg on the first layer 118a to a thickness of 9 nm. Since it is closer to the transmittance graph of Comparative Example 1, this means that the second electrode 130 was not formed.

[0231] refer to Figure 19 It can be observed that the graph of Example 1 is significantly closer to that of Comparative Example 1 than the graph of Comparative Example 2. Therefore, it can be seen that by forming the auxiliary layer 118, the second electrode 130 is essentially not formed.

[0232] Next, we will refer to Figure 20 The formation of the second electrode 130 is described with or without the second layer 118b.

[0233] The graph indicated by Comparative Example 3 is the transmittance graph of Sample 4. Sample 4 is a substrate prepared by forming a second layer 118b, comprising a third material and having a thickness of 152 nm, on a glass substrate having a thickness of 0.5 mm. The graph indicated by Comparative Example 4 is the transmittance graph of Sample 5. Sample 5 is a substrate prepared by forming a first layer 118a, comprising a first material and having a thickness of 10 nm, on a glass substrate having a thickness of 0.5 mm, and then forming a second layer 118b, comprising a third material and having a thickness of 152 nm, on the first layer 118a. The graph indicated by Example 2 is the transmittance graph of Sample 6. Sample 6 is a substrate in which an Ag-Mg thin film with a thickness of 9 nm is formed. It is prepared by forming a first layer 118a, comprising a first material and having a thickness of 10 nm, on a glass substrate with a thickness of 0.5 mm; forming a second layer 118b, comprising a third material and having a thickness of 152 nm, on the first layer 118a; and then depositing Ag-Mg (weight ratio = 10:1) to a thickness of 9 nm on the second layer 118b. Since it is closer to the transmittance curve of Comparative Example 4, this means that the second electrode 130 was not formed.

[0234] refer to Figure 20It can be observed that the graph of Example 2 is almost similar to that of Comparative Example 4. Therefore, it can be seen that the second electrode 130 is not formed on the auxiliary layer 118 without the separation process of removing the second layer 118b.

[0235] Next, we will refer to Figure 21 Describe the distribution of the first material in the auxiliary layer 118.

[0236] exist Figure 21 In the figures, (a) shows the XPS results for sample 4, and (b) shows the XPS results for sample 6. Comparing (a) and (b), it can be observed that the concentration of fluorine is higher on one surface of the auxiliary layer 118, specifically on one surface further away from the first substrate 10. The fluorine originates from the first material. From (b), it can be anticipated that although the first layer 118a is first formed on the glass substrate using the first material and then the second layer 118b is formed using the third material, the first material diffuses, and therefore the concentration of the first material increases on one surface of the auxiliary layer 118 further away from the first substrate 10. Since the first material is present at a sufficiently high concentration on the surface of the auxiliary layer 118, it can be observed that the second electrode 130 is patterned.

[0237] According to various embodiments of this disclosure, since the common electrode is not substantially formed in the transmission region, a display device with relatively high transmittance and a method for manufacturing the same can be provided.

[0238] However, the above effects are exemplary, and the effects according to the embodiments will be described in detail below with reference to the following.

[0239] It should be understood that the embodiments described herein should be considered in a descriptive sense only and not for limiting purposes. The description of features or aspects in each embodiment should generally be considered applicable to other similar features or aspects in other embodiments. While one or more embodiments have been described with reference to the accompanying drawings, those skilled in the art will understand that various changes in form and detail may be made therein without departing from the spirit and scope defined by the appended claims.

Claims

1. A display device, comprising: First substrate; and display unit, The display unit includes a display area and a transmission area. The display unit includes an auxiliary layer configured to correspond to the transmissive region, and a second electrode configured to correspond only to the display region. The auxiliary layer comprises a mixture of a first material and a third material. The second electrode comprises a second material. The first material and the second material satisfy the following formula 1, The auxiliary layer includes a first region and a second region between the first region and the first substrate, and The concentration of the first material in the first region is higher than the concentration of the first material in the second region: <Formula 1> ST2 -ST1 > 0 mJ / m 2 In formula 1, ST1 is the surface energy of the first material at 25°C, and ST2 is the surface energy of the second material at 25°C.

2. The display device according to claim 1, wherein the second electrode is not present in the transmission region.

3. The display device according to claim 1, wherein the first region includes a location having a maximum first material concentration.

4. The display device according to claim 1, wherein: The auxiliary layer further includes a third region. The third region is located between the second region and the first substrate, and The concentration of the first material in the second region is different from the concentration of the first material in the third region.

5. The display device according to claim 1, wherein ST1 is greater than 0 mJ / m 2 And less than or equal to 30 mJ / m 2 .

6. The display device according to claim 1, wherein the first material has a molecular weight of 1500 or less.

7. The display device according to claim 1, wherein the second material comprises magnesium, silver, aluminum, lithium, calcium, indium, or a combination thereof.

8. The display device according to claim 1, wherein the third material has a molecular weight of 1500 or less.

9. A display device, comprising: First substrate; and display unit, The display unit includes a display area and a transmission area. The display unit includes an auxiliary layer configured to correspond to the transmissive region, and a second electrode configured to correspond to both the display region and the transmissive region. The auxiliary layer comprises a mixture of a first material and a third material. The second electrode comprises a second material. The first material and the second material satisfy the following formula 1, The auxiliary layer includes a first region and a second region between the first region and the first substrate, and The concentration of the first material in the first region is higher than the concentration of the first material in the second region: <Formula 1> ST2 -ST1 > 0 mJ / m 2 In formula 1, ST1 is the surface energy of the first material at 25°C, and ST2 is the surface energy of the second material at 25°C.

10. The display device according to claim 9, wherein: The first portion of the second electrode is configured to correspond to the display area. The second portion of the second electrode is configured to correspond to the transmission region, and The thickness T1 of the first part and the thickness T2 of the second part satisfy the following formula 2: <Formula 2> T1 > T2.

11. The display device of claim 10, wherein the thickness of the second portion is greater than 0 nm and less than or equal to 1 nm.

12. The display device of claim 9, wherein the first region includes a location having a maximum first material concentration.

13. The display device according to claim 9, wherein: The auxiliary layer further includes a third region. The third region is located between the second region and the first substrate, and The concentration of the first material in the second region is different from the concentration of the first material in the third region.

14. The display device according to claim 9, wherein ST1 is greater than 0 mJ / m 2 And less than or equal to 30 mJ / m 2 .

15. The display device of claim 9, wherein the first material has a molecular weight of 1500 or less.

16. The display device of claim 9, wherein the second material comprises magnesium, silver, aluminum, lithium, calcium, indium, or a combination thereof.

17. The display device of claim 9, wherein the third material has a molecular weight of 1500 or less.

18. A method of manufacturing a display device, the method comprising: Provide a first substrate; and A display unit including a display area and a transmissive area is provided on the first substrate. The display unit includes: A first material is provided on the display area and the transmission area, a third material is provided only on the transmission area, and then plasma treatment is performed on the display area and the transmission area to remove the first material on the display area to provide an auxiliary layer configured to correspond to the transmission area; and a second electrode is provided. The auxiliary layer comprises a first material and a third material. The second electrode comprises a second material, and The first material and the second material satisfy the following formula 1: <Formula 1> ST2 -ST1 > 0 mJ / m 2 In formula 1, ST1 is the surface energy of the first material at 25°C, and ST2 is the surface energy of the second material at 25°C.

19. The method of claim 18, wherein the third material is provided by deposition using a fine metal mask.

20. The method of claim 18, wherein the second electrode is provided by depositing the second material using an open mask.

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