An exposure device suitable for contact photolithography machine
CN113176712BActive Publication Date: 2024-12-31SHANGHAI TUSHUANG PRECISION EQUIP CO LTD
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Patent Information
- Application Number
- CN202110449124.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2021-04-25
- Publication Date
- 2024-12-31
- Estimated Expiration
- 2041-04-25
AI Technical Summary
Technical Problem
Existing exposure devices for contact lithography machines are limited in their ability to project onto the corners of substrates due to immovable side baffles and inability to withdraw completely, restricting omnidirectional exposure capabilities.
Method used
An exposure device with a rotatable and adjustable exposure shielding body, equipped with a walking structure, gears, racks, and motors for positional adjustment, and adjustable exposure holes, allowing full substrate coverage and size adjustment.
Benefits of technology
Enables omnidirectional exposure and adjustable area projection, overcoming the limitations of prior devices by allowing complete substrate coverage and precise area control.
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Smart Images
Figure CN113176712B_ABST
Abstract
The present invention discloses an exposure device suitable for a contact photolithography machine, comprising a substrate and a track arranged on one side of the substrate, a mounting seat is arranged above the track, a walking structure is arranged between the mounting seat and the track, a connecting frame is rotatably installed above the mounting seat, an exposure shielding body is installed on the side of the connecting frame close to the substrate, an exposure hole is opened on the exposure shielding body, and an adjustment structure for adjusting the size of the exposure hole is installed on the exposure shielding body. The position of the exposure shielding body of the present invention can be adjusted by the walking structure and the rotating mounting frame to realize that the exposure shielding body can reach all positions on the substrate and can make the exposure shielding body evacuate the substrate, so that the device can be in two states of regional exposure and all-round exposure, and the exposure hole can be moved to the corner of the substrate to realize corner exposure.
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