Substrate liquid processing apparatus and substrate liquid processing method

Abstract

This invention provides a substrate liquid treatment apparatus and method that facilitate the detection of adverse conditions such as leakage of the treatment liquid. The substrate liquid treatment apparatus includes: a liquid piping for supplying the treatment liquid; a release nozzle for releasing the treatment liquid supplied via the liquid piping; a valve mechanism for regulating the flow of the treatment liquid in the liquid piping; and a liquid detection sensor for detecting the presence of treatment liquid in the liquid piping. With the valve mechanism activated such that the treatment liquid in the liquid piping is located upstream of a first measurement point on the liquid piping, the liquid detection sensor detects the presence of treatment liquid at the first measurement point on the liquid piping.

Description

Technical Field

[0001] This invention relates to a substrate liquid treatment apparatus and a substrate liquid treatment method. Background Technology

[0002] In the device disclosed in Patent Document 1, the flow rate of the processing liquid flowing through the supply path is measured based on the response time, and when the measured flow rate is greater than a threshold, it is determined that a leakage of the processing liquid has occurred in the valve installed in the supply path.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent No. 6059087 Summary of the Invention

[0006] The technical problem that the invention aims to solve

[0007] This invention provides a technique that facilitates the detection of adverse conditions such as leakage of treatment fluid.

[0008] Technical solutions for solving technical problems

[0009] One aspect of the present invention relates to a substrate liquid treatment apparatus, comprising: a liquid piping for supplying the liquid to be treated; a release nozzle for releasing the liquid to be treated supplied via the liquid piping; a piping valve mechanism for regulating the flow of the liquid to be treated in the liquid piping; and a liquid detection sensor for detecting the presence of the liquid to be treated in the liquid piping, wherein the liquid detection sensor detects the presence of the liquid to be treated at a first piping measurement location located at a first measurement point when the piping valve mechanism is operated such that the liquid to be treated in the liquid piping is located upstream of a first piping measurement location.

[0010] Invention Effects

[0011] According to the present invention, it is beneficial to detect adverse conditions such as leakage of the treatment fluid. Attached Figure Description

[0012] Figure 1 This is a diagram that shows a summary of an example of a processing system.

[0013] Figure 2 This is a diagram showing a summary of an example of a processing unit.

[0014] Figure 3 This is a top view illustrating the state of a portion of the inner side of the processing chamber.

[0015] Figure 4 This is a schematic diagram illustrating the first piping measurement location of the supply pipeline and the first measurement point of the liquid detection sensor.

[0016] Figure 5 This is a diagram that schematically illustrates the relative positions of the liquid detection sensor, the supply line, and the swing arm.

[0017] Figure 6 This is a graph showing an example of the relationship between the relative position of the liquid detection sensor, the supply line, and the swing arm (horizontal axis) and the amount of light received by the detection light measured by the light-receiving part (vertical axis).

[0018] Figure 7 This is a block diagram illustrating an example of the functional structure of the control unit.

[0019] Figure 8 This is a diagram illustrating an example of a leak detection process.

[0020] Figure 9 This is a diagram illustrating an example of the threshold determination process.

[0021] Figure 10 This is a diagram illustrating an example of a substrate solution processing flow.

[0022] Figure 11 This is a diagram illustrating an example of a substrate solution processing flow.

[0023] Figure 12 This is a diagram used to illustrate the anomaly detection method of the first modified example.

[0024] Figure 13 This is a diagram used to illustrate the anomaly detection method of the first modified example.

[0025] Figure 14 This is a diagram used to illustrate the anomaly detection method of the first modified example.

[0026] Explanation of reference numerals in the attached figures

[0027] 10 processing units

[0028] 15. Release mouth

[0029] 16 Supply lines

[0030] 17 Drainage pipeline

[0031] 28 Valve Mechanism

[0032] 35 Liquid Detection Sensor

[0033] 93 Control Department

[0034] M1 First Measurement Point

[0035] Q treatment fluid

[0036] R1 First Pipeline Measurement Point

[0037] W substrate. Detailed Implementation

[0038] Figure 1 This is a diagram showing an example of a processing system 80. Figure 1 The processing system 80 shown has an infeed / outfeed station 91 and a processing station 92. The infeed / outfeed station 91 includes a loading section 81 having multiple carriers C; and a transport section 82 having a first transport mechanism 83 and a transfer section 84. In each carrier C, multiple substrates W are stored in a horizontal position. The processing station 92 has multiple processing units 10 disposed on both sides of a transport path 86; and a second transport mechanism 85 that reciprocates in the transport path 86.

[0039] The substrate W is removed from the carrier C by the first transport mechanism 83 and placed in the transfer section 84, and then removed from the transfer section 84 by the second transport mechanism 85. The substrate W is then fed into the corresponding processing unit 10 by the second transport mechanism 85, where it undergoes a prescribed liquid treatment (e.g., chemical treatment). Afterwards, the substrate W is removed from the corresponding processing unit 10 by the second transport mechanism 85 and placed in the transfer section 84, and then returned to the carrier C of the placement section 81 by the first transport mechanism 83.

[0040] The processing system 80 includes a control unit 93. The control unit 93, for example, is a computer and includes an arithmetic processing unit and a storage unit. The storage unit of the control unit 93 stores programs and data for various processes executed in the processing system 80. The arithmetic processing unit of the control unit 93 controls various devices of the processing system 80 to perform various processes by appropriately reading and executing the programs stored in the storage unit.

[0041] The programs and data stored in the storage unit of the control unit 93 can be programs and data recorded on a computer-readable storage medium, which are then installed into the storage unit. Examples of computer-readable storage media include hard disks (HD), floppy disks (FD), optical disks (CD), magneto-optical disks (MO), and memory cards.

[0042] Figure 2 This is a diagram showing a summary of an example of the processing unit 10.

[0043] Processing unit 10 includes a substrate liquid treatment device for supplying processing liquid to substrate W for liquid treatment and a control unit 93 (see reference). Figure 1 There are no restrictions on the specific composition and uses of the treatment solution; for example, pharmaceutical solutions, pure water, and cleaning solutions can be used as treatment solutions.

[0044] The processing unit 10 of this embodiment includes a substrate holding part 11, a rotation drive part 12, a liquid supply part 14, a cup-shaped structure 21, an inactive gas supply part 22, a rectifier plate 23, an FFU (Fan Filter Unit) 24, and a processing chamber 25. At least a portion of the substrate holding part 11, the rotation drive part 12, the liquid supply part 14, the cup-shaped structure 21, and the rectifier plate 23 are disposed inside the processing chamber 25. At least a portion of the inactive gas supply part 22 and the FFU 24 are disposed outside the processing chamber 25.

[0045] The substrate holding section 11 is held by the second transport mechanism 85 (see reference). Figure 1 The substrate W is supplied. Although the illustrated substrate holding part 11 uses a vacuum method to hold the back side of the substrate W by adsorption, the substrate holding part 11 can hold the substrate W by other means (e.g., a mechanical chuck). The rotation drive part 12 applies rotational power to the substrate holding part 11 to cause the substrate W held by the substrate holding part 11 to rotate together with the substrate holding part 11. The illustrated rotation drive part 12 includes a rotation drive shaft and a rotation drive body, wherein the rotation drive shaft extends on the rotation axis A1, and the substrate holding part 11 is fixedly mounted at its front end, and the rotation drive body causes the rotation drive shaft to rotate about the rotation axis A1. In this way, the substrate holding part 11 and the rotation drive part 12 constitute at least a part of the rotation mechanism 13 that causes the substrate W to rotate about the rotation axis A1.

[0046] The cup-shaped structure 21 has an annular planar shape and is arranged to surround the substrate W held by the substrate holding part 11. The cup-shaped structure 21 receives liquid splashed from the substrate W and guides it to a drain pipe (not shown), and regulates the flow of gas to prevent gas diffusion around the substrate W. The specific structure of the cup-shaped structure 21 is not limited. For example, the cup-shaped structure 21 may be divided into a cup-shaped body mainly for guiding liquid and a cup-shaped body mainly for regulating the flow of gas.

[0047] The inactive gas supply unit 22 supplies an inactive gas (e.g., nitrogen) into the processing chamber 25. The FFU 24 generates a downward-flowing airflow within the processing chamber 25. The rectifier plate 23 has multiple holes (see through holes described later). Figure 4 The reference numeral "23a" is located directly below the outlet of the FFU 24 to regulate the airflow and optimize the downward airflow within the processing chamber 25.

[0048] The liquid supply unit 14 has a supply line 16 connected to the processing liquid supply source 31 and a discharge nozzle 15 connected to the supply line 16. Processing liquid from the processing liquid supply source 31 flows through the supply line 16. The discharge nozzle 15 releases the processing liquid supplied via the supply line 16.

[0049] A release head 18, a swing arm 19, and a swing device 20 are provided inside the processing chamber 25. A release nozzle 15 is installed on the release head 18. The release head 18 is installed at one end of the swing arm 19, and the swing device 20 is installed at the other end of the swing arm 19. The swing device 20 has a rotary drive shaft 20a extending on the rotation axis A2 and a rotating body portion 20b fixed to the upper end of the rotary drive shaft 20a and the swing arm 19, and rotates around the rotation axis A2. The release nozzle 15, the release head 18, and the swing arm 19 swing around the rotation axis A2 as the swing device 20 rotates.

[0050] A supply line 16 extends both outside and inside the processing chamber 25. Inside the processing chamber 25, the supply line 16 is arranged to pass through each of the swing device 20, the swing arm 19, and the release head 18, and is connected to the release nozzle 15. Outside the processing chamber 25, one end of the supply line 16 is connected to a drain line 17. The other end of the drain line 17 is connected to a discharge section 32, to which the processing liquid flowing from the supply line 16 into the drain line 17 is conveyed. Thus, in this embodiment, the liquid piping through which the processing liquid flows includes the supply line 16 and the drain line 17.

[0051] The valve mechanism for regulating the flow of the treated fluid in the regulating fluid piping includes a supply on / off valve 26 and a drain on / off valve 27. Specifically, a supply on / off valve 26 is installed on the supply line 16, and a drain on / off valve 27 is installed on the drain line 17. The supply on / off valve 26 regulates the flow of the treated fluid in the supply line 16, and the drain on / off valve 27 regulates the flow of the treated fluid in the drain line 17. Specifically, the supply line 16 is opened by opening the supply on / off valve 26, and the supply line 16 is closed by closing the supply on / off valve 26. Similarly, the drain line 17 is opened by opening the drain on / off valve 27, and the drain line 17 is closed by closing the drain on / off valve 27.

[0052] In the illustrated example, the drain line 17 branches off from the supply line 16 at a location outside the processing chamber 25, and is positioned lower than each of the release nozzle 15, release head 18, swing arm 19, and swing device 20. The supply on / off valve 26 and the drain on / off valve 27 are located outside the processing chamber 25, particularly the supply on / off valve 26, which is located upstream of the branch point of the drain line 17 in the supply line 16. Therefore, based on the siphon principle, by opening the drain on / off valve 27, the processed liquid in the supply line 16 (particularly downstream of the branch point of the drain line 17) flows into the drain line 17 and towards the discharge section 32. Thus, by adjusting the opening and closing of the drain on / off valve 27 while the supply line 16 is closed with the supply on / off valve 26, the position of the processed liquid in the supply line 16 (particularly downstream of the branch point of the drain line 17) can be changed (particularly to the most downstream position). In particular, in order to ensure that the treatment fluid in the supply line 16 is at a position higher than the first piping measurement point (see reference 16) as described later, Figure 4 At the upstream end of the attached drawing (marked "R1"), the drain valve 27 of this embodiment operates to open the drain line 17, allowing the treatment liquid to flow from the supply line 16 to the drain line 17.

[0053] Furthermore, regarding the terms "upstream" and "downstream," unless otherwise specified, the flow of liquid during normal operation shall be used as the basis. For example, regarding the supply line 16, unless otherwise specified, the side closer to the treatment fluid supply source 31 is the "upstream side," and the side closer to the discharge nozzle 15 is the "downstream side." Regarding the discharge line 17, unless otherwise specified, the side closer to the connection with the supply line 16 is the "upstream side," and the side closer to the discharge section 32 is the "downstream side."

[0054] Figure 3 This is a top view illustrating the state of a portion of the inner side of the processing chamber 25.

[0055] In this embodiment, multiple swing arms 19 and multiple release heads 18 are provided. In the illustrated example, three swing arms 19a, 19b, and 19c and three release heads 18a, 18b, and 18c are provided, and all swing arms 19a, 19b, and 19c are mounted on a rotating main body 20b (swing device 20). Multiple supply lines 16 (liquid pipes) are also provided. In the illustrated example, the three supply lines 16a, 16b, and 16c are respectively configured to pass through the corresponding swing arms 19a, 19b, and 19c and the release heads 18a, 18b, and 18c, and are connected to the corresponding release nozzles 15a, 15b, and 15c.

[0056] Furthermore, when referring to multiple swing arms 19 without distinguishing them from each other, they are simply referred to as "swing arms 19". When referring to them separately, "a", "b", and "c" are added to the end of the reference numeral "19" to indicate this. The release nozzle 15, supply line 16, and release head 18 are also referred to in the same way as the swing arms 19.

[0057] The release nozzle 15, supply line 16, release head 18, and swing arm 19 move integrally along the rotation direction D1 with the rotation axis A2 as the swing device 20 rotates. Figure 3 In the diagram, solid lines indicate the position (original position) in which the release nozzle 15, supply line 16, release head 18, and swing arm 19 are positioned to avoid contact with the substrate W from above. Each release nozzle 15 in its original position is positioned opposite the liquid-receiving portion 39 fixedly disposed within the processing chamber 25. Furthermore, in... Figure 3 In the image, dashed lines represent an example of the configuration of the release nozzle 15, supply line 16, release head 18, and swing arm 19 above the substrate W.

[0058] A liquid detection sensor 35 is provided within the processing chamber 25 to detect the presence of processing liquid in each supply line 16. In this embodiment, the liquid detection sensor 35 is fixedly installed, and the wiring connected to the liquid detection sensor 35 is less prone to breakage. Each supply line 16 (partially the portion formed in the swing arm 19 and the release head 18) is configured to be movable relative to the liquid detection sensor 35. In particular, the portions of each swing arm 19 and supply line 16 located on each swing arm 19 traverse the first measuring point of the liquid detection sensor 35. In this embodiment, the swing device 20 is rotated so that the plurality of swing arms 19a, 19b, 19c continuously pass through the first measuring point. During this rotation, the liquid detection sensor 35 continuously detects the portions of the supply lines 16a, 16b, 16c that pass through the first measuring point (i.e., the first piping measurement portion described later). Figure 4 The reference numeral "R1" indicates whether the pipeline is filled with processing fluid. In this way, according to this embodiment, the presence or absence of processing fluid in multiple supply lines 16 can be easily and quickly detected with a single rotation.

[0059] Figure 4 This is a schematic diagram illustrating the first piping measurement point R1 of the supply line 16 and the first measurement point M1 of the liquid detection sensor 35.

[0060] The liquid detection sensor 35 of this embodiment has a light-emitting part 36 and a light-receiving part 37 fixedly disposed inside the processing chamber 25. The light-emitting part 36 emits detection light L to the light-receiving part 37, and the light-receiving part 37 is configured to receive the detection light L. In this embodiment, the presence of processing liquid Q at the first piping measurement point R1 of the supply line 16 is detected based on the amount of light received by the detection light L measured by the light-receiving part 37.

[0061] In the illustrated example, the light-emitting part 36 is positioned directly below the light-receiving part 37, and the detection light L emitted from the light-emitting part 36 travels upwards in the direction exactly opposite to the vertical direction in which gravity acts. The light-emitting part 36 is covered by the detection cover 41, and the detection light L emitted from the light-emitting part 36 passes through the through hole 41a formed in the detection cover 41. The light-receiving part 37 is located above the rectifier plate 23, and the detection light L heading towards the light-receiving part 37 passes through the through hole 23a formed in the rectifier plate 23. In this way, the light-emitting part 36 and the light-receiving part 37 are covered by the detection cover 41 and the rectifier plate 23, preventing the adhesion of processing liquids, etc. Furthermore, gas (e.g., inactive gas) can be blown into the detection cover 41 by a gas ejection device (not shown) to maintain a positive pressure. In this case, it is possible to effectively suppress droplets from entering the detection cover 41, and it is possible to more reliably prevent processing liquids, etc., from adhering to the light-emitting part 36.

[0062] Each supply line 16 (particularly the first piping measurement section R1) is configured to move relative to the liquid detection sensor 35 as the swing device 20 rotates, traversing the optical path of the detection light L from the liquid detection sensor 35 to the light source 36 (particularly the first measurement point M1). When the first piping measurement section R1 of each supply line 16 passes the first measurement point M1, the liquid detection sensor 35 detects whether the processing liquid Q is present at the first piping measurement section R1 of each supply line 16.

[0063] In this embodiment, each swing arm 19 and each supply line 16 (particularly the portion corresponding to the first piping measurement section R1) is made of a material (e.g., PFA (perfluoroalkoxyalkane)) that allows the detection light L to pass through. The detection light L can pass through portions of each supply line 16 formed in each swing arm 19 (including the first piping measurement section R1). However, due to the influence of light scattering, the amount of detection light L received by the light receiving unit 37 varies depending on whether the detection light L passes through each swing arm 19 and each supply line 16, and depending on whether the processing liquid Q is present in the portion through which the detection light L passes in the supply line 16.

[0064] For example, compared to the case where the detection light L passes through each supply line 16 and each swing arm 19, when the detection light L reaches the light receiving unit 37 without passing through each supply line 16 and each swing arm 19, the amount of detection light L received by the light receiving unit 37 is greater. Furthermore, compared to the case where the measurement target area (i.e., the first piping measurement area R1) of the supply line 16 is not filled with processing liquid Q, when the first piping measurement area R1 is filled with processing liquid Q, the amount of detection light L received by the light receiving unit 37 is greater. Therefore, by comparing the amount of detection light L received by the light receiving unit 37 with a threshold set for each supply line 16, it is possible to detect whether processing liquid Q is present in the first piping measurement area R1 of each supply line 16.

[0065] Specifically, in this embodiment, such as Figure 4 As shown, the valve mechanism (i.e., Figure 2 The supply on / off valve 26 and drain on / off valve 27 shown operate to position the treatment fluid Q in each supply line 16 upstream of the first piping measurement point R1 of each supply line 16. In this state, the liquid detection sensor 35 can detect whether a leak of treatment fluid Q or other malfunction has occurred in the valve mechanism by detecting whether treatment fluid Q is present at the first piping measurement point R1 of each supply line 16 located at the first measurement point M1.

[0066] For example, when no malfunction occurs in the valve mechanism, the processing fluid Q in each supply line 16 is properly positioned upstream of the first piping measurement section R1 as the valve mechanism operates. Therefore, the detection light L passes through the first piping measurement section R1, which is not filled with processing fluid Q, resulting in a relatively smaller amount of light received by the light-receiving unit 37. On the other hand, when a leak of processing fluid Q occurs in the supply on / off valve 26, even if the drain on / off valve 27 operates properly, the processing fluid Q in each supply line 16 is not properly positioned, sometimes resulting in the first piping measurement section R1 being filled with processing fluid Q. In this case, the detection light L passes through the first piping measurement section R1 filled with processing fluid Q, resulting in a relatively larger amount of light received by the light-receiving unit 37. Thus, the amount of light received by the light-receiving unit 37 changes depending on whether a malfunction such as a leak exists in the valve mechanism; therefore, by comparing this amount of light with a threshold, the occurrence of a malfunction can be detected.

[0067] The threshold is set to a value that is greater than the amount of light received by the detection light L measured by the light-receiving unit 37 when the first piping measurement section R1 is filled with processing liquid Q, and less than the amount of light received by the detection light L measured by the light-receiving unit 37 when the first piping measurement section R1 is not filled with processing liquid Q. In this case, by comparing the amount of light actually received by the detection light L by the light-receiving unit 37 with this threshold, it is possible to detect whether the first piping measurement section R1 is filled with processing liquid Q.

[0068] Furthermore, when multiple supply lines 16 are provided as in this embodiment, a unique threshold can be set for each supply line 16. Depending on the material of each supply line 16 and each swing arm 19, the composition of the processing liquid flowing through each supply line 16, or individual differences between each supply line 16 and each swing arm 19, the amount of detection light L received by the light-receiving unit 37 may not be the same among the supply lines 16. For example, when the processing liquid Q is a solution used for BEOL (Back End of Line), the processing liquid Q usually has a high coloring concentration. Therefore, by determining the threshold for each supply line 16, it is possible to detect with high precision whether the first piping measurement section R1 of each supply line 16 is filled with processing liquid Q.

[0069] Figure 5 This is a schematic diagram illustrating the relative positions (first relative position P1 to seventh relative position P7) between the liquid detection sensor 35 and the supply lines 16a, 16b, 16c and the swing arms 19a, 19b, 19c. Figure 5 In the diagram, a cross-section of the first piping measurement section R1 is shown, relating to the first supply pipeline 16a to the third supply pipeline 16c and the first swing arm 19a to the third swing arm 19c. According to... Figure 5 It can be seen that the first piping measurement section R1 of the first supply line 16a and the third supply line 16c is not filled with treatment fluid Q, while the first piping measurement section R1 of the second supply line 16b is filled with treatment fluid Q.

[0070] Figure 6 This is a graph showing an example of the relationship between the relative position (horizontal axis) of the liquid detection sensor 35, the supply line 16, and the swing arm 19, and the amount of light received by the detection light L measured by the light receiving part 37 (vertical axis). Figure 6 The chart shown represents the process of making Figure 5 Example of the relationship obtained when the first supply line 16a to the third supply line 16c moves relative to the liquid detection sensor 35, as shown in the diagram.

[0071] When the supply lines 16, swing arms 19, and liquid detection sensors 35 are positioned such that the detection light L does not pass through the relative positions of each supply line 16 and each swing arm 19, the detection light L received by the light-receiving unit 37 exhibits a maximum light-receiving amount V0 (refer to...). Figure 5 and Figure 6 (P1, P3, P5, and P7). On the other hand, when the supply lines 16, swing arms 19, and liquid detection sensors 35 are positioned relative to each supply line 16 and each swing arm 19 through which the detection light L passes, the detection light L received by the light-receiving unit 37 exhibits a light intensity smaller than the maximum light intensity V0. In particular, when the detection light L passes through an empty first piping measurement section R1 (first supply line 16a and third supply line 16c) that is not filled with processing liquid Q, the detection light L received by the light-receiving unit 37 exhibits a relatively small light intensity V2 (see reference). Figure 5 and Figure 6 (P2 and P6). On the other hand, when the detection light L passes through the first piping measurement section R1 (second supply line 16b) filled with the processing liquid Q, the detection light L received by the light receiving section 37 exhibits a relatively large light receiving amount V1 (V1 > V2) (see reference). Figure 5 and Figure 6 (P4).

[0072] Therefore, by setting the threshold T to a value less than the light received amount V1 and greater than the light received amount V2, it is possible to detect with high precision whether the first piping measurement section R1 of each of the first supply lines 16a to the third supply lines 16c is filled with processing liquid Q. Furthermore, based on control data indicating the rotational position, rotational distance, and / or rotational time of the swing device 20, the relative position between the liquid detection sensor 35 and the supply lines 16 and the swing arm 19 can be determined. Therefore, by comparing the light received by the detection light L measured by the light receiving unit 37 at the preset relative positions (first relative position P1 to seventh relative position P7) between the liquid detection sensor 35 and the supply lines 16 and the swing arm 19, with the threshold T, high-precision detection is possible.

[0073] The processing unit 10 may also include other devices not mentioned above. For example, it may be provided with an exhaust device for discharging gas from the processing chamber 25 and a drain device for discharging liquid that has fallen (spread) from the substrate W from the processing chamber 25. In addition, it may be provided with a heating device for heating the liquid on the substrate W to promote liquid treatment of the substrate W.

[0074] Figure 7 This is a block diagram illustrating an example of the functional configuration of the control unit 93. Specifically, Figure 7 A functional configuration example for detecting adverse conditions such as leakage of processing liquid Q based on the measurement results of liquid detection sensor 35 is shown in summary.

[0075] The control unit 93 includes a device drive unit 95 and an anomaly detection unit 96. The device drive unit 95 controls the drive of various devices connected to the control unit 93. The anomaly detection unit 96 detects the presence of leaks or other malfunctions based on the measurement results of the liquid detection sensor 35.

[0076] The control unit 93 is connected to the liquid detection sensor 35 (light-emitting part 36 and light-receiving part 37), the valve mechanism 28 (supply opening and closing valve 26 and drain opening and closing valve 27), the swing device 20, and the alarm device 45. The drive of these liquid detection sensors 35, valve mechanism 28, swing device 20, and alarm device 45 is controlled by the device drive unit 95.

[0077] The liquid detection sensor 35 sends the measurement result to the control unit 93. In this embodiment, the light receiving unit 37 sends data representing the amount of light received by the actual measured detection light L to the control unit 93 (specifically, the anomaly detection unit 96). The anomaly detection unit 96 compares the amount of light received by the detection light L from the light receiving unit 37 with a threshold T to determine whether the first piping measurement section R1 of each supply line 16 is filled with processing liquid Q. In this embodiment, the anomaly detection unit 96 obtains the relative position between the liquid detection sensor 35 and the supply line 16 and the swing arm 19 (refer to the pre-set "relative position between the liquid detection sensor 35 and the supply line 16 and the swing arm 19") based on the drive information of the swing device 20. Figure 5 and Figure 6 The information is related to the first relative position P1 to the seventh relative position P7. Then, the anomaly detection unit 96 compares the amount of light received by the light receiving unit 37 with the threshold T, based on the preset relative position between the liquid detection sensor 35 and the supply line 16 and the swing arm 19.

[0078] When the valve mechanism 28 is activated such that the processing fluid is positioned upstream of the first piping measurement point R1, and the liquid detection sensor 35 indicates that the first piping measurement point R1 is not filled with processing fluid Q, the anomaly detection unit 96 determines that no abnormality, such as leakage, has occurred in the valve mechanism 28. Conversely, when the valve mechanism 28 is activated such that the processing fluid is positioned upstream of the first piping measurement point R1, and the liquid detection sensor 35 indicates that the first piping measurement point R1 is filled with processing fluid Q, the anomaly detection unit 96 determines that an abnormality, such as leakage, has occurred in the valve mechanism 28.

[0079] If the anomaly detection unit 96 determines that an anomaly such as a leak has occurred in the valve mechanism 28, it controls the alarm device 45 to issue an alarm, notifying the user of the anomaly. The form of the alarm issued by the alarm device 45 is not limited; typically, it is issued through sound or display. If the anomaly detection unit 96 determines that no anomaly such as a leak has occurred in the valve mechanism 28, it can notify the user of the absence of an anomaly via the alarm device 45.

[0080] The following describes an example of a substrate solution treatment method (including a leak detection method). The methods described below are executed by appropriately driving the various devices constituting the substrate solution treatment apparatus under the control of the control unit 93.

[0081] Figure 8 This is a diagram illustrating an example of a leak detection process.

[0082] First, the control unit 93 controls the swing device 20 to position each swing arm 19 in its original position (see reference). Figure 3 (the solid line portion) Figure 8 S1).

[0083] Then, the control unit 93 controls the valve mechanism 28. The first piping measurement section R1 of each supply line 16 is filled with the treatment fluid Q (S2). Specifically, the supply on / off valve 26 is opened and the drain on / off valve 27 is closed to prevent the treatment fluid Q from flowing from the supply line 16 into the drain line 17, and to allow the treatment fluid to flow from the treatment fluid supply source 31 to the release nozzle 15. Then, at the moment when the first piping measurement section R1 of each supply line 16 is filled with the treatment fluid Q, the drain on / off valve 27 is kept closed, and the supply on / off valve 26 is closed. In this step S2, from the viewpoint of reliably filling the first piping measurement section R1 of each supply line 16 with the treatment fluid Q, it is preferable to release the treatment fluid Q from each release nozzle 15. The treatment fluid released from each release nozzle 15, which is positioned in its original location, falls into the receiving section 39 (see reference). Figure 3 It was later recycled.

[0084] Then, the control unit 93 controls the valve mechanism 28 to move the processing fluid Q upstream of the first piping measurement point R1 of each supply line 16, so that the first piping measurement point R1 is not filled with processing fluid Q (S3). Specifically, the supply on / off valve 26 is closed and the drain on / off valve 27 is opened, allowing the processing fluid Q to flow from the supply line 16 into the drain line 17. Then, when it is considered that the processing fluid Q of each supply line 16 has moved upstream of the first piping measurement point R1, the supply on / off valve 26 is kept closed, and the drain on / off valve 27 is closed. At this time, the closing time of the drain on / off valve 27 can be determined based on the time elapsed since the drain on / off valve 27 was opened. In this way, the flow of the processing fluid Q in the supply line 16 is regulated by the valve mechanism 28 so that the processing fluid Q in the supply line 16 connected to the release nozzle 15 is located upstream of the first piping measurement point R1 of the supply line 16.

[0085] Then, the control unit 93 controls the swing device 20 to swing each swing arm 19 so that the first piping measurement section R1 of each supply line 16 passes through the first measurement point M1, and the light-receiving section 37 of the liquid detection sensor 35 measures the amount of light received by the detection light L (S4). The measurement result of the light-receiving section 37 is sent to the control unit 93 (especially the abnormality detection unit 96). In addition, in this step S4, the supply on / off valve 26 and the drain on / off valve 27 are kept closed.

[0086] Then, the anomaly detection unit 96 determines, based on the amount of light received by the detection light L sent from the light receiving unit 37 and the threshold T, whether the processing liquid Q is present in the first piping measurement section R1 of each supply line 16 (S5). In this embodiment, "whether the first piping measurement section R1 is filled with processing liquid Q" corresponds to "whether the processing liquid Q is present in the first piping measurement section R1". In this way, the liquid detection sensor 35 detects whether the processing liquid Q is present in the first piping measurement section R1 located at the first measurement point M1.

[0087] Then, the anomaly detection unit 96 determines whether there is a leak in the valve mechanism 28 (particularly the supply on / off valve 26) based on whether the processing fluid Q is filled at the first piping measurement point R1 of each supply line 16 (S6). When a leak is determined to have occurred in the valve mechanism 28, the anomaly detection unit 96 activates the alarm device 45 (see reference). Figure 7 (Issue an alarm.)

[0088] Below is an example illustrating the method for determining the threshold T. The determination of the threshold T is crucial in implementing the leak detection process (see [reference]). Figure 8 The threshold T determined before the process is executed is used in the leak detection process.

[0089] Figure 9 This is a diagram illustrating an example of the process for determining the threshold T.

[0090] First, the control unit 93 controls the valve mechanism 28 to discharge the treatment fluid Q from each supply line 16, causing the treatment fluid Q to be positioned upstream of the first piping measurement point R1. Figure 9 (S11). Specifically, the supply on / off valve 26 is closed and the drain on / off valve 27 is opened, so that the processing liquid Q flows from each supply line 16 into the drain line 17.

[0091] Then, the control unit 93 controls the swing device 20 to swing each swing arm 19 so that the first piping measurement section R1 of each supply line 16 passes through the first measurement point M1, and the light-receiving section 37 of the liquid detection sensor 35 measures the amount of light received by the detection light L (S12: first light amount measurement). The measurement result of the light-receiving section 37 is sent to the control unit 93 (especially the abnormality detection unit 96). In addition, in this step S12, the supply on / off valve 26 is kept closed, but the drain on / off valve 27 can be closed or opened.

[0092] Then, the control unit 93 controls the valve mechanism 28 to release the processing fluid Q supplied via each supply line 16 from each release nozzle 15, filling the first piping measurement section R1 of each supply line 16 with the processing fluid Q (S13). Specifically, with each supply line 16 in its original position, the supply on / off valve 26 is opened and the drain on / off valve 27 is closed. This prevents the processing fluid Q from flowing from each supply line 16 into the drain line 17, and allows the processing fluid Q to flow from the processing fluid supply source 31 to each release nozzle 15. The processing fluid Q released from each release nozzle 15 is collected by the liquid receiving unit 39. Then, when the first piping measurement section R1 of each supply line 16 is filled with processing fluid Q, the drain on / off valve 27 is kept closed, and the supply on / off valve 26 is closed.

[0093] Then, the control unit 93 controls the swing device 20 to swing each swing arm 19 so that the first piping measurement section R1 of each supply line 16 passes through the first measurement point M1, and the light-receiving part 37 of the liquid detection sensor 35 measures the amount of light received by the detection light L (S14: second light quantity measurement). The measurement result of the light-receiving part 37 is sent to the control unit 93 (especially the abnormality detection unit 96). In addition, in this step S14, the supply on / off valve 26 and the drain on / off valve 27 are kept closed, and the first piping measurement section R1 of each supply line 16 is kept filled with the processing liquid Q.

[0094] Then, the anomaly detection unit 96 determines a threshold T (S15) based on the results of the first light intensity measurement (S12) and the second light intensity measurement (S14). The specific calculation method for the threshold T is not limited; for example, half the sum of "the amount of light received by the detection light L measured by the first light intensity" and "the amount of light received by the detection light L measured by the second light intensity" can be set as the threshold T. The anomaly detection unit 96 can pre-store the determined threshold T in the storage unit (not shown) of the control unit 93, and appropriately read it from the storage unit and use it as needed.

[0095] In the process of determining the threshold T mentioned above, a step to check whether an anomaly has occurred can be performed appropriately.

[0096] For example, the anomaly detection unit 96 can check the amount of light emitted from the light-emitting unit 36 ​​before step S11 (see reference). Figure 9 (S16). Specifically, when there are no obstacles such as the swing arm 19 between the light-emitting unit 36 ​​and the light-receiving unit 37 (for example, when the swing arm 19a is in its original position), the detection light L is emitted from the light-emitting unit 36. At this time, the amount of detection light L is checked based on whether the amount of detection light L actually received by the light-receiving unit 37 is within the allowable range of the amount of detection light L that is expected to be emitted from the light-emitting unit 36.

[0097] The same check of the light intensity of the detection light L can be performed at other times, for example, between steps S11 and S12 above (see reference). Figure 9 (S17).

[0098] Furthermore, the anomaly detection unit 96 can check whether an anomaly has occurred based on the results of the first light intensity measurement (S12) and the second light intensity measurement (S14) (see reference). Figure 9 (S18). For example, an anomaly in the detection of the detection light L can be checked based on whether the difference between "the amount of light received by the detection light L measured by the first light intensity" and "the amount of light received by the detection light L measured by the second light intensity" deviates from the expected range. If the difference between "the amount of light received by the detection light L measured by the first light intensity" and "the amount of light received by the detection light L measured by the second light intensity" is much larger or much smaller than the specified expected value, it is considered that some anomaly may have occurred in the measurement system of the detection light L.

[0099] If no abnormality is detected in the anomaly check steps (S16-S18), the threshold T determination process (S11-S15) can continue. On the other hand, if an abnormality is detected in the anomaly check steps, an anomaly recovery process is performed. In the anomaly recovery process, any processing to eliminate the abnormal state can be performed. For example, the anomaly detection unit 96 may prompt the user to readjust the various devices of the processing unit 10 (e.g., the liquid detection sensor 35) by means of the alarm device 45, or drive a cleaning device (not shown) to clean the liquid detection sensor 35. The specific method for cleaning the liquid detection sensor 35 is not limited; the cleaning device may blow liquids such as water or gases onto the liquid detection sensor 35. After the anomaly recovery process, the anomaly check step can be performed again, either from the beginning of the threshold T determination process or as a step in the threshold T determination process that is to be performed after the anomaly check step.

[0100] The following describes an example of a substrate liquid treatment method in which a treatment solution Q is supplied to the substrate W for liquid treatment while a leak check is being performed.

[0101] Figure 10 and Figure 11 This is a diagram illustrating an example of a substrate solution processing flow. Specifically, Figure 10 This illustrates an example of the processing flow before the substrate W is sent into the processing chamber 25. Figure 11 This represents an example of the processing flow after the substrate W is sent into the processing chamber 25.

[0102] exist Figure 10 and Figure 11 In the substrate liquid treatment method shown, a leak check is performed before the substrate W is sent into the treatment chamber 25. Figure 10 (S21). Leakage checks, although, for example, can be performed according to... Figure 8 The process shown can be implemented, but it can also be implemented according to other processes.

[0103] When the leak inspection results (refer to) Figure 8 When the result of the leak check indicates "no leakage has occurred in the valve mechanism 28" (S22 "No"), the substrate W is sent into the processing chamber 25 (S27). On the other hand, when the leak check result indicates "a leak has occurred in the valve mechanism 28" (S22 "Yes"), a cleaning device (not shown) is driven under the control of the control unit 93 to clean the liquid detection sensor 35 (light-emitting part 36 and / or light-receiving part 37) (S23). After that, a leak check is performed again (S25). When the result of this leak check indicates "no leakage has occurred in the valve mechanism 28" (S25 "No"), the substrate W is sent into the processing chamber 25 (S27). On the other hand, when the result of this leak check indicates "a leak has occurred in the valve mechanism 28" (S25 "Yes"), the alarm device 45 is driven under the control of the control unit 93 to issue this alarm and notify the user of the leak (S26).

[0104] After the substrate W is fed into the processing chamber 25 in step S27, the substrate W is processed by the processing unit 10 (S28). The substrate processing performed in this step S28 includes liquid processing using processing liquid Q, and may include other processing as needed.

[0105] Next, a leak check is performed again (S29). When the leak check result indicates "no leak occurred in valve mechanism 28" (S30 "No"), the processed substrate W is sent out of processing chamber 25 (S31), and control unit 93 confirms whether there is a next substrate W to be sent into processing chamber 25. When there is a next substrate W to be sent into processing chamber 25 (S32 "Yes"), the next substrate W is sent into processing chamber 25 (S27). When there is no next substrate W to be sent into processing chamber 25 (S32 "No"), processing ends.

[0106] On the other hand, when the leak check (S29) results in "a leak has occurred in the valve mechanism 28" (S30 "Yes"), the alarm device 45 is activated under the control of the control unit 93 to issue a pre-alarm (S33). Afterwards, the processed substrate W is removed from the processing chamber 25 (S34), the liquid detection sensor 35 is cleaned using a cleaning device (S35), and the leak check is performed again (S36). When the leak check results in "a leak has occurred in the valve mechanism 28" (S37 "Yes"), the alarm device 45 is activated under the control of the control unit 93 to issue this alarm, notifying the user of the leak (S38).

[0107] On the other hand, when the result of the leak check (S36) indicates "no leakage occurred in valve mechanism 28" ("No" in S37), an optical quantity check is performed (S39; see reference). Figure 9 (S16 and S17). When the result of the light quantity check indicates that "the light quantity of the liquid detection sensor 35 (especially the light quantity of the light-emitting part 36) is not incorrect" (S40 "No"), the control unit 93 confirms whether there is a next substrate W to be sent into the processing chamber 25. When there is a next substrate W to be sent into the processing chamber 25 (S32 "Yes"), the next substrate W is sent into the processing chamber 25 (S27). When there is no next substrate W to be sent into the processing chamber 25 (S32 "No"), the processing ends.

[0108] On the other hand, when the light intensity check result indicates that "the light intensity of the liquid detection sensor 35 is incorrect" (S40 "Yes"), the light intensity of the liquid detection sensor 35 is reset under the control of the control unit 93 (S41). Thus, even if the light intensity in the light-emitting unit 36 ​​decreases over time, proper leak checks can continue. Afterwards, the control unit 93 confirms whether there is a next substrate W to be sent to the processing chamber 25. If there is a next substrate W (S32 "Yes"), the next substrate W is sent to the processing chamber 25 (S27); if there is no next substrate W (S32 "No"), the processing ends.

[0109] As explained above, the apparatus and method of this embodiment can detect with high precision the occurrence of adverse conditions such as leakage of the processing fluid Q in the valve mechanism 28.

[0110] If leakage in the valve mechanism 28 cannot be properly detected, various problems can arise in the liquid treatment of the substrate W performed in the processing unit 10. For example, if leakage of the processing liquid Q in the supply on / off valve 26 is allowed to occur, the processing liquid Q may accidentally drip from the release nozzle 15 onto the substrate W, causing an unexpected change in the concentration of the solution on the substrate W and resulting in poor drying of the substrate W. On the other hand, according to the apparatus and method of this embodiment, leakage in the supply on / off valve 26 can be properly detected, thereby allowing appropriate measures to eliminate the leakage. As a result, problems such as accidental dripping of the processing liquid Q can be prevented before they occur, and the liquid treatment of the substrate W in the processing unit 10 can be performed stably.

[0111] In addition, the apparatus and method of this embodiment can also detect the occurrence of leakage of a very small amount (e.g., less than 10 ml / min) of the processing liquid Q, and the leakage detection accuracy is very high.

[0112] Furthermore, the apparatus and method according to this embodiment can also detect whether the valve mechanism 28 (especially the drain valve 27) is malfunctioning or whether there is unexpected foaming of the treatment fluid Q in the supply line 16. For example, if the drain valve 27 does not work properly during draining, even if the control unit 93 controls the drain valve 27, it may not be possible to move the treatment fluid in the supply line 16 upstream of the first piping measurement point R1. Furthermore, if the treatment fluid Q foams at the first piping measurement point R1 of the supply line 16, even if the control unit 93 controls the drain valve 27, it may not be possible to move the foamed portion of the treatment fluid Q upstream of the first piping measurement point R1. In these cases, the liquid detection sensor 35 can also detect the presence of treatment fluid Q at the first piping measurement point R1.

[0113] Furthermore, according to the apparatus and method of this embodiment, anomalies related to each of the plurality of supply lines 16 can be detected using a single liquid detection sensor 35. This simplifies the apparatus structure in the processing unit 10.

[0114] [First Variation]

[0115] The liquid detection sensor 35 can detect whether there is processing liquid Q in a second pipe measurement part in the supply line 16 (liquid piping) that is different from the first pipe measurement part R1. The second pipe measurement part is located at a second measurement point that is different from the first measurement point M1.

[0116] Figures 12-14 This is a diagram used to illustrate the anomaly detection method of the first modified example.

[0117] exist Figures 12-14 In the example shown, multiple liquid detection sensors are provided (specifically, first to third liquid detection sensors 35a, 35b, and 35c). These liquid detection sensors 35a, 35b, and 35c detect the presence of processing liquid Q at different locations in each supply line 16 (specifically, first to third piping measurement locations R1, R2, and R3). The first piping measurement location R1, the second piping measurement location R2, and the third piping measurement location R3 are arranged sequentially from the downstream side to the upstream side of the supply line 16 (particularly the portion located in the swing arm 19).

[0118] The first liquid detection sensor 35a has a first light-emitting part 36a and a first light-receiving part 37a, and detects whether the processing liquid Q is present at the first piping measurement section R1 located at the first measurement point M1. The second liquid detection sensor 35b has a second light-emitting part 36b and a second light-receiving part 37b, and detects whether the processing liquid Q is present at the second piping measurement section R2 located at the second measurement point M2. The third liquid detection sensor 35c has a third light-emitting part 36c and a third light-receiving part 37c, and detects whether the processing liquid Q is present at the third piping measurement section R3 located at the third measurement point M3.

[0119] For example, in Figure 12 In the case shown, the third light-emitting unit 36c detects the presence of processing liquid Q at the third piping measurement location R3, but the first light-emitting unit 36a and the second light-emitting unit 36b detect the absence of processing liquid Q at the first piping measurement location R1 and the second piping measurement location R2. Figure 13 In the case shown, the first light-emitting unit 36a to the third light-emitting unit 36c detected that the processing liquid Q was not present at the first piping measurement location R1 to the third piping measurement location R3. Figure 14 In the case shown, the first light-emitting unit 36a to the third light-emitting unit 36c detects the presence of processing liquid Q in the first piping measurement section R1 to the third piping measurement section R3.

[0120] The control unit 93 (especially the anomaly detection unit 96) can accurately determine the position of the processing fluid Q in the supply line 16 based on the detection results of multiple liquid detection sensors 35a, 35b, and 35c. In this way, the anomaly detection unit 96 of this modified example can detect the deviation of the pull-back position of the processing fluid Q in the supply line 16 in a graded (segment-by-segment) manner. Therefore, for example, the anomaly detection unit 96 can not only detect whether there is an anomaly such as leakage of the processing fluid Q, but also detect the degree of the anomaly if it occurs.

[0121] [Other variations]

[0122] The liquid detection sensor 35 for detecting the presence of processing liquid in the liquid piping is not limited to the optical sensor described above (i.e., the light-emitting part 36 and the light-receiving part 37), and can employ any detection method and any structure. For example, a sensor that can be used as the liquid detection sensor 35 is one that can detect the position and filling amount of processing liquid in the supply line 16 by measuring the electrostatic capacitance or magnetic field in the supply line 16 (especially the part including the measurement target).

[0123] Leakage checks can be performed at any time other than those mentioned above in the substrate solution treatment process, and there is no limit to the number of leak checks. Leakage checks can be performed at any time before, after, and / or during product treatment.

[0124] The relative position between the liquid detection sensor 35 and the supply line 16 and the swing arm 19 (refer to) Figure 5 and Figure 6 Information regarding the "first relative position P1 to seventh relative position P7" can be obtained based on the change in the amount of light received by the detection light L measured by the light-receiving unit 37. For example, such as Figure 6 As shown, the amount of light received by the detection light L, measured by the light-receiving unit 37, is... Figure 6 The vertical axis represents a common trend (i.e., peak-valley variation trend) corresponding to the relative position between the liquid detection sensor 35, the supply line 16, and the swing arm 19. Therefore, based on the variation trend of the amount of light received by the detection light L measured by the light receiving unit 37, the relative position between the liquid detection sensor 35, the supply line 16, and the swing arm 19 (refer to the vertical axis) can be obtained. Figure 5 and Figure 6 The information pertains to the first relative position P1 to the seventh relative position P7. In this case, the detection accuracy of the leak inspection is not easily affected by changes in the amount of light emitted by the liquid detection sensor 35 (especially the light-emitting part 36) due to the passage of time or external factors, nor by changes in the amount of light received by the liquid detection sensor 35 (especially the light-receiving part 37) due to positional deviations of the device.

[0125] The processing unit 10 may have only one liquid distribution line (i.e., a supply line 16 and a drain line 17) and a release nozzle 15.

[0126] In the above embodiment, the liquid piping used to supply the processing liquid Q to the front side (i.e., the upper surface) of the substrate W is inspected for abnormalities such as leakage. However, the same inspection can be performed on the liquid piping (not shown) used to supply the processing liquid Q to the back side (i.e., the lower surface) of the substrate W for abnormalities.

[0127] It should be noted that the embodiments disclosed in this specification are exemplary in all respects and are not intended to be limiting. The above embodiments and modifications may be omitted, substituted, or changed in various ways without departing from the scope and spirit of the appended claims. For example, the above embodiments and modifications may be combined; furthermore, embodiments other than those described above may be combined with the above embodiments or modifications.

[0128] Furthermore, the type of technology used to realize the above-described technical idea is not limited. For example, the aforementioned substrate liquid treatment apparatus can be applied to other apparatuses. Additionally, the above-described technical idea can be realized using a computer program that enables a computer to execute one or more steps (procedures) included in the aforementioned substrate liquid treatment method (including leak detection method and anomaly detection method). Furthermore, the above-described technical idea can be realized using a computer-readable non-transitory storage medium storing such a computer program.

Claims

1. A substrate liquid processing apparatus characterized by comprising: include: Liquid piping for the flow of the treatment fluid; A release nozzle that releases the treatment fluid supplied via the liquid piping; A valve mechanism that regulates the flow of the treatment fluid in the liquid piping; and A liquid detection sensor detects the presence of the processing liquid in the liquid piping. With the valve mechanism operating so that the treated liquid in the liquid piping is located upstream of the first piping measurement point of the liquid piping, the liquid detection sensor detects whether the treated liquid is present at the first piping measurement point located at the first measurement point. A release head, a swing arm, and a swing device are provided inside the processing chamber of the substrate liquid treatment apparatus. The release head is equipped with a release nozzle, the release head is installed at one end of the swing arm, and the swing device is installed at the other end of the swing arm. The liquid piping is provided in multiple locations, and the first piping measurement section of each of the multiple liquid piping is configured to move relative to the liquid detection sensor as the oscillating device rotates. When the liquid flow passes through the first measurement point at the first pipe measurement location of each of the plurality of liquid pipes, the liquid detection sensor detects whether the processing liquid is present at the first pipe measurement location of each of the plurality of liquid pipes. When the swing device rotates, the liquid detection sensor continuously detects whether the processing liquid is present at the first pipe measurement point in the plurality of liquid pipes passing through the first measurement point.

2. The substrate liquid treatment apparatus as described in claim 1, characterized in that: The liquid piping includes: a supply line having the first piping measurement section; and a drain line connected to the supply line and positioned lower than the release nozzle. The valve mechanism includes: a supply on / off valve that regulates the flow of the treatment liquid in the supply pipeline; and a drain on / off valve that regulates the flow of the treatment liquid in the drain pipeline. When the treatment fluid in the supply line is located upstream of the first piping measurement point, the drain valve operates to allow the treatment fluid to flow from the supply line to the drain line.

3. The substrate liquid treatment apparatus as described in claim 1, characterized in that: The liquid detection sensor has a light-receiving part capable of receiving detection light and a light-emitting part capable of emitting the detection light. The liquid distribution tube is configured to move relative to the liquid detection sensor in a manner that traverses the optical path of the detection light traveling from the light-emitting part to the light-receiving part. The presence of the processing liquid at the first piping measurement location is detected by comparing the magnitude of the detection light received by the light-receiving unit with a threshold value.

4. The substrate liquid treatment apparatus as described in claim 1, characterized in that: The liquid detection sensor has a light-receiving part capable of receiving detection light and a light-emitting part capable of emitting the detection light. The plurality of liquid distribution tubes are respectively configured to move relative to the liquid detection sensor in a manner that traverses the optical path of the detection light traveling from the light-emitting part to the light-receiving part. The presence of the processing liquid is detected at the first pipe measurement location of each of the plurality of liquid pipes by comparing the magnitude of the detection light received by the light-receiving unit with a threshold set for each of the plurality of liquid pipes.

5. The substrate liquid treatment apparatus according to any one of claims 1 to 4, characterized in that: The liquid detection sensor detects whether the processing liquid is present in a second pipe measurement point that is different from the first pipe measurement point in the liquid piping. The second pipe measurement point is located at a second measurement point that is different from the first measurement point.

6. A substrate liquid processing method characterized by comprising: include: The step of adjusting the flow of the treatment fluid in the liquid piping using a valve mechanism so that the treatment fluid in the liquid piping connected to the release nozzle is located upstream of the first piping measurement point of the liquid piping; and The step of using a liquid detection sensor to detect whether the processing liquid is present at the first piping measurement point located at the first measurement point. A release head, a swing arm, and a swing device are provided inside the processing chamber of the substrate liquid processing apparatus for performing the substrate liquid processing method. The release head is equipped with the release nozzle, the release head is installed at one end of the swing arm, and the swing device is installed at the other end of the swing arm. The liquid piping is provided in multiple locations, and the first piping measurement section of each of the multiple liquid piping is configured to move relative to the liquid detection sensor as the oscillating device rotates. When the liquid flow passes through the first measurement point at the first pipe measurement location of each of the plurality of liquid pipes, the liquid detection sensor detects whether the processing liquid is present at the first pipe measurement location of each of the plurality of liquid pipes. When the swing device rotates, the liquid detection sensor continuously detects whether the processing liquid is present at the first pipe measurement point in the plurality of liquid pipes passing through the first measurement point.

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