Display device

Abstract

A display device is provided. The display device can include a first transistor, a second transistor, a first electrode, a second electrode, a first filter, and a second filter. No intervening transistor can be located between the first transistor and the second transistor. The first electrode can be electrically connected to the first transistor. The second electrode can be electrically connected to the second transistor. The first filter can overlap the first electrode and can have a first circular perimeter in a plan view of the display device. The second filter can overlap the second electrode, can have a polygonal perimeter in the plan view of the display device, and can be spaced apart from the first filter.

Description

Technical Field

[0001] This technical field relates to display devices. Background Technology

[0002] Display devices can display images based on input signals. Current display devices include liquid crystal displays (LCDs) and organic light-emitting diode (OLED) displays.

[0003] Display devices may include components that undesirably block light. To achieve satisfactory image quality and / or energy efficiency of the display device, undesirably blocked light should be minimized. Summary of the Invention

[0004] Some embodiments may relate to display devices that include filters and color filters.

[0005] According to an embodiment, the display device includes a first substrate, a pixel structure, a first filter, and a second filter. The pixel structure is disposed on the first substrate. The first filter has a circular shape and is disposed on the pixel structure. The second filter has a polygonal shape and is disposed on the pixel structure while being spaced apart from the first filter.

[0006] In an embodiment, when viewed in a plan view of the display device, the area of ​​the first filter may be larger than the area of ​​the second filter.

[0007] In an embodiment, the display device may further include a third filter disposed on the pixel structure and spaced apart from each of the first and second filters, and the third filter may have a circular shape when viewed in a plan view of the display device.

[0008] In an embodiment, when viewed in a plan view of the display device, the area of ​​the third filter may be larger than the area of ​​the second filter.

[0009] In one embodiment, the second filter can be configured to transmit a first light of a first color. The first filter can be configured to convert a second light of the first color into light of a second color. The third filter can be configured to convert a third light of the first color into light of a third color.

[0010] In an embodiment, the pixel structure can be configured to emit a fourth light of the first color.

[0011] In an embodiment, the display device may further include a light-blocking member disposed on the pixel structure, and the light-blocking member may include a first opening having a circular shape when viewed in a plan view of the display device and a second opening having a rectangular shape when viewed in a plan view of the display device.

[0012] In one embodiment, a first filter may be disposed in a first opening, and a second filter may be disposed in a second opening.

[0013] In an embodiment, when viewed in a plan view of the display device, the area of ​​the first opening may be larger than the area of ​​the second opening.

[0014] In one embodiment, a portion of the second filter may be disposed on the bottom surface of the light-blocking member.

[0015] In an embodiment, the level of the bottom surface of the first filter and the level of the bottom surface of the second filter can be different from each other.

[0016] In an embodiment, the display device may further include a first protective insulating layer disposed on the bottom surface of the light-blocking member.

[0017] In one embodiment, the first protective insulating layer may be disposed on the bottom surface of the first filter but not on the bottom surface of the second filter.

[0018] In one embodiment, the first protective insulating layer may be disposed inside the second opening instead of inside the first opening.

[0019] In an embodiment, the display device may further include a second substrate disposed on the first filter and the second filter, a first color filter disposed between the second substrate and the first filter, and a second color filter disposed between the second substrate and the second filter.

[0020] In one embodiment, the second color filter may overlap with a second filter on the bottom surface of the second substrate, and may include an opening that overlaps with a portion therein where the first filter is disposed.

[0021] In one embodiment, the first color filter may be disposed in an opening of the second color filter, and may include an opening that overlaps with the portion of which the second color filter is disposed below the second color filter.

[0022] In an embodiment, the display device may further include a second protective insulating layer disposed between the first color filter and the second color filter and the first light filter and the second light filter.

[0023] In one embodiment, the first protective insulating layer and the second protective insulating layer may be spaced apart from each other by the first filter, and may be in contact with each other between the second filter and the second filter.

[0024] In an embodiment, the pixel structure may include a first lower electrode disposed under a first filter, a second lower electrode disposed under a second filter, a light-emitting layer disposed on the first lower electrode and the second lower electrode, and an upper electrode disposed on the light-emitting layer.

[0025] In an embodiment, when viewed in a plan view of the display device, the first lower electrode may have a circular shape, and when viewed in a plan view of the display device, the second lower electrode may have a rectangular shape.

[0026] In an embodiment, when viewed in a plan view of the display device, the first filter and the first lower electrode may overlap each other, and the second filter and the second lower electrode may overlap each other.

[0027] In an embodiment, when viewed in a plan view of the display device, the area of ​​the first lower electrode may be larger than the area of ​​the second lower electrode.

[0028] In one embodiment, the first filter can be formed using an inkjet process, and the second filter can be formed using a photolithography process.

[0029] The embodiments may relate to a display device. The display device may include a first transistor, a second transistor, a first electrode, a second electrode, a first filter, and a second filter. No intermediate transistor may be located between the first and second transistors. The first electrode may be electrically connected to the first transistor. The second electrode may be electrically connected to the second transistor. The first filter may overlap with the first electrode and have a first circular perimeter in a plan view of the display device. The second filter may overlap with the second electrode, may have a polygonal perimeter in a plan view of the display device, and is spaced apart from the first filter.

[0030] In the plan view of the display device, the area of ​​the first filter can be larger than the area of ​​the second filter.

[0031] The display device may further include a third transistor, a third electrode, and a third filter. No intermediate transistor may be located between the second and third transistors. The third electrode may be electrically connected to the third transistor. The third filter may overlap with the third electrode, may be spaced apart from each of the first and second filters, and may have a second circular perimeter in the plan view of the display device.

[0032] In the plan view of the display device, the area of ​​the third filter can be larger than the area of ​​the second filter.

[0033] The second filter allows the first light of the first color to pass through. The first filter converts the second light of the first color into light of the second color. The third filter converts the third light of the first color into light of the third color. The first, second, and third colors can be different from each other.

[0034] The pixels of the display device may include a first filter, a second filter, and a third filter. The pixels may emit a fourth light of a first color.

[0035] The display device may include a light-blocking member. The light-blocking member may include at least one opening. At least one of a first filter and a second filter may be at least partially disposed inside the at least one opening.

[0036] At least one opening may include a first opening and a second opening. A first filter may be at least partially disposed inside the first opening. A second filter may be at least partially disposed inside the second opening.

[0037] In the plan view of the display device, the area of ​​the first opening can be larger than the area of ​​the second opening.

[0038] The light-blocking component may include a light-blocking portion located between the first opening and the second opening. A portion of the second filter may be disposed outside the second opening and may overlap with the light-blocking portion.

[0039] The display device may further include a first substrate. Each of the first filter and the second filter may overlap with the first substrate. The surface of the first filter may face the first substrate. The surface of the second filter may face the first substrate and may be located closer to or further away from the first substrate than the surface of the first filter.

[0040] The display device may further include a first substrate and a first protective insulating layer. Each of the first and second filters may overlap the first substrate. The surface of the light-blocking member may face the first substrate and may directly contact the first protective insulating layer.

[0041] A portion of the first protective insulating layer may be disposed between the first filter and the first substrate, and may directly contact the first filter. The first protective insulating layer is not disposed between the second filter and the first substrate, and a portion of the first protective insulating layer overlaps with the second filter in a direction perpendicular to the first substrate.

[0042] The first protective insulation layer may be partially disposed inside the second opening.

[0043] The display device may further include the following elements: a second substrate overlapping each of the first filter and the second filter; a first color filter disposed between the second substrate and the first filter; and a second color filter disposed between the second substrate and the second filter.

[0044] The second color filter may overlap with the second light filter and may include an opening in the first color filter. The first color filter opening may expose a portion of the second substrate. This portion of the second substrate may overlap with the first light filter.

[0045] A first color filter may be partially disposed inside a first color filter opening, and may include a second color filter opening. The second color filter opening may expose a portion of the second color filter. This portion of the second color filter may be disposed between the second color filter opening and the second substrate.

[0046] The display device may further include a second protective insulating layer. The second protective insulating layer may be disposed between the first color filter and the first light filter, and may also be disposed between the second color filter and the second light filter.

[0047] The first portion of the first protective insulating layer and the first portion of the second protective insulating layer may overlap each other and may be spaced apart from each other by the first filter. The second portion of the first protective insulating layer and the second portion of the second protective insulating layer may be in direct contact with each other and may be located between the second color filter and the second filter.

[0048] The display device may further include a light-emitting layer and a common electrode. The light-emitting layer may overlap with each of the first electrode and the second electrode, may be disposed between the first electrode and the first filter, and may be disposed between the second electrode and the second filter. The common electrode may overlap with the light-emitting layer, may be disposed between the light-emitting layer and the first filter, and may be disposed between the light-emitting layer and the second filter.

[0049] In the plan view of the display device, the first electrode may have a circular boundary. In the plan view of the display device, the second electrode may have a polygonal boundary.

[0050] In the plan view of the display device, the first circular perimeter may surround the circular boundary, and the polygonal perimeter may surround the polygonal boundary.

[0051] In the plan view of the display device, the area of ​​the first electrode can be larger than the area of ​​the second electrode.

[0052] The first filter may include ink material.

[0053] The display device includes a first filter and a third filter, each having a circular shape in a plan view of the display device. Since the circumference of a circle based on a predetermined area is shorter than the circumference of a polygon (e.g., an asymmetrical polygon), the light-blocking member accommodating the first and third filters can result in relatively small light loss. A relatively small amount of light emitted from the light-emitting layer of the display device can be blocked by the light-blocking member. Advantageously, the display device can have satisfactory light transmittance and / or energy efficiency.

[0054] In an embodiment, the display device includes a circular first filter and a third filter, and a rectangular second filter. The first, second, and third openings of the light-blocking member accommodating the first, second, and third filters can be sufficiently separated from each other, allowing the light-blocking portion of the light-blocking member to be sufficiently wide. Advantageously, the contact area of ​​the light-blocking member can be sufficient, and the light-blocking member can be robust and not peel off.

[0055] In the manufacturing method of the display device, color filters can be overlapped to form light-blocking components. Therefore, there is no need to add additional light-blocking patterns. Advantageously, the manufacturing cost of the display device can be minimized.

[0056] The portion of the color filter located between the openings can be sufficiently wide. Therefore, the manufacturing allowance for the light-blocking component can be ample. Advantageously, manufacturing defects in the light-blocking component can be minimized or substantially prevented.

[0057] The second filter can be formed using a photolithography process that utilizes a relatively inexpensive negative photoresist. Advantageously, this minimizes the manufacturing cost of the display device. Attached Figure Description

[0058] Figure 1 This is a perspective view illustrating a display device according to an embodiment.

[0059] Figure 2 This is an illustration based on an embodiment. Figure 1 A plan view of the display device.

[0060] Figure 3 As shown in the embodiment Figure 1 A plan view of the pixel-defining layer included in a display device.

[0061] Figure 4 As shown in the embodiment Figure 1 A plan view of the pixel defining layer and pixel electrodes included in the display device.

[0062] Figure 5 As shown in the embodiment Figure 1 A plan view of the light-blocking component included in the display device.

[0063] Figure 6 As shown in the embodiment Figure 1 A plan view of the light-blocking component, the first filter, the second filter, and the third filter included in the display device.

[0064] Figure 7 This is an illustration based on an embodiment. Figure 5 A floor plan of area 'A'.

[0065] Figure 8 According to the embodiments along Figure 2 The cross-sectional view taken from line I-I'.

[0066] Figure 9 , Figure 10 , Figure 11 , Figure 12 , Figure 13 , Figure 14 , Figure 15 , Figure 16 , Figure 17 , Figure 18 , Figure 19 and Figure 20 This is a cross-sectional view showing a structure formed in a method of manufacturing a display device according to an embodiment.

[0067] Figure 21 This is a cross-sectional view of a display device according to an embodiment.

[0068] Figure 22 This is a cross-sectional view of a display device according to an embodiment.

[0069] Figure 23 , Figure 24 , Figure 25 , Figure 26 , Figure 27 and Figure 28 This is a cross-sectional view showing a structure formed in a method of manufacturing a display device according to an embodiment.

[0070] Figure 29 This is a perspective view illustrating a display device according to an embodiment.

[0071] Figure 30 As shown in the embodiment Figure 29 A plan view of the pixel-defining layer included in a display device.

[0072] Figure 31 As shown in the embodiment Figure 29 A plan view of the pixel defining layer and pixel electrodes included in the display device.

[0073] Figure 32 As shown in the embodiment Figure 29 A plan view of the light-blocking component included in the display device.

[0074] Figure 33 As shown in the embodiment Figure 29 A plan view of the light-blocking component, the first filter, the second filter, and the third filter included in the display device.

[0075] Figure 34 This is an illustration based on an embodiment. Figure 32 Plan view of area 'B'. Detailed Implementation

[0076] Example embodiments are described with reference to the accompanying drawings. The same or similar reference numerals may refer to the same or similar elements.

[0077] While the terms "first," "second," etc., can be used to describe various elements, these elements should not be limited by these terms. These terms can be used to distinguish one element from another. Without departing from the teachings of one or more embodiments, a first element may be referred to as a second element. Describing an element as a "first" element does not require or imply the existence of a second element or other elements. The terms "first," "second," etc., can be used to distinguish different categories or sets of elements. For brevity, the terms "first," "second," etc., may respectively represent "first category (or first set)," "second category (or second set)," etc.

[0078] The term "connection" can mean "electrical connection" or "electrical connection without an intermediate transistor." The term "insulation" can mean "electrical insulation" or "electrical isolation." The term "conduction" can mean "conductivity." The expression "transmitting the first color" can mean "transmitting light of the first color." The expression "converting the first color to the second color" can mean "converting light of the first color to light of the second color." The terms "lower" and "upper" can indicate two relative positions without requiring the "lower" element to be below the "upper" element. The terms "bottom" and "top" can indicate two relative positions without requiring the "bottom" element to be below the "top" element. The term "semiconductor element" can mean "transistor." The term "pattern" can mean "component" or "element." The term "width" can mean "maximum width." The term "distance" can mean "minimum distance." The term "surface" can mean "surface." A list of materials can mean at least one of the listed materials. The expression "opening overlaps with object" can mean that the opening is located at the same position as the object and / or that the opening (at least partially) exposes the object.

[0079] Figure 1 This is a perspective view illustrating a display device according to an embodiment. Figure 2 This is an illustration based on an embodiment. Figure 1 A plan view of the display device. Figure 3 As shown in the embodiment Figure 1 A plan view of the pixel-defining layer included in a display device. Figure 4 As shown in the embodiment Figure 1 A plan view of the pixel defining layer and pixel electrodes included in the display device. Figure 5 As shown in the embodiment Figure 1 A plan view of the light-blocking component included in the display device. Figure 6 As shown in the embodiment Figure 1 A plan view of the light-blocking component, the first filter, the second filter, and the third filter included in the display device.

[0080] refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 and Figure 6 The display device 100 may include a lower structure 500 and an upper structure 600. The lower structure 500 and the upper structure 600 may be in direct contact with each other and may be hermetically coupled to each other by a sealing member disposed on the outermost periphery of the display device 100. The lower structure 500 and the upper structure 600 may be manufactured independently of each other, and after the upper structure 600 is placed on the lower structure 500, the upper structure 600 and the lower structure 500 may be hermetically coupled to each other by the sealing member.

[0081] like Figure 2 As shown, the display device 100 may include a display area 10 and a peripheral area 20. The display area 10 may include a plurality of pixel areas 30. The pixel areas 30 may be arranged in a matrix throughout the display area 10. Each of the pixel areas 30 may include a first sub-pixel area 31, a second sub-pixel area 32, and a third sub-pixel area 33.

[0082] In an embodiment, within a pixel region 30, a first sub-pixel region 31 and a second sub-pixel region 32 may be located in a first direction D1 parallel to the top surface of the display device 100. The first sub-pixel region 31 may be spaced apart from the second sub-pixel region 32 in a second direction D2 opposite to the first direction D1. A third sub-pixel region 33 may be spaced apart from the second sub-pixel region 32 in a third direction D3 orthogonal to the first direction D1 and the second direction D2. A pixel region 30 may include two second sub-pixel regions 32. One of the two second sub-pixel regions 32 may be spaced apart from the first sub-pixel region 31 in the first direction D1 (and spaced apart from the third sub-pixel region 33 in a fourth direction D4 opposite to the third direction D3), and the remaining one of the two second sub-pixel regions 32 may be spaced apart from the first sub-pixel region 31 in the third direction D3 (and spaced apart from the third sub-pixel region 33 in the second direction D2). In this embodiment, the positions of the first sub-pixel region 31 and the third sub-pixel region 33 can be interchanged, and the positions of the first sub-pixel region 31 and the third sub-pixel region 33 can be interchanged with the position of the second sub-pixel region 32.

[0083] In the plan view of the display device 100, the area of ​​the first sub-pixel region 31 may be larger than the area of ​​the second sub-pixel region 32, and the area of ​​the third sub-pixel region 33 may be larger than the area of ​​the second sub-pixel region 32. The area of ​​the first sub-pixel region 31 may be larger than the area of ​​the third sub-pixel region 33. Each of the first sub-pixel region 31 and the third sub-pixel region 33 may have a circular shape in the plan view, and the second sub-pixel region 32 may have a rectangular shape in the plan view. One of the first sub-pixel region 31 and the third sub-pixel region 33 may have a circular shape in the plan view, and the remaining one may have a polygonal shape that is substantially close to a circle in the plan view. One of the first sub-pixel region 31 and the third sub-pixel region 33 may have a circular shape in the plan view, and the remaining one may have a rectangular shape in the plan view.

[0084] Pixel structures (including semiconductor elements) can be disposed in the first sub-pixel region 31, the second sub-pixel region 32, and the third sub-pixel region 33 in the display area 10, and light-blocking components can be disposed in the remaining areas of the display area 10 other than the first sub-pixel region 31, the second sub-pixel region 32, and the third sub-pixel region 33. Sealing components, signal lines, and power lines can be disposed in the peripheral area 20.

[0085] A pixel region 30 may have one second sub-pixel region 32 or at least three second sub-pixel regions 32.

[0086] Each of the first sub-pixel region 31 and the third sub-pixel region 33 can have an orbital shape or an elliptical shape in the planar diagram.

[0087] Each of the display area 10, the surrounding area 20, and the second sub-pixel area 32 can have a triangular shape, a rhombus shape, a polygon shape, a circular shape, an orbital shape, or an elliptical shape in the planar view.

[0088] like Figure 3 and Figure 4As shown, the lower structure 500 may include a first substrate 110, a pixel defining layer 310, a first pixel electrode 290a, a second pixel electrode 290b, and a third pixel electrode 290c. The first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c may be disposed on the first substrate 110, and the pixel defining layer 310 may partially overlap with each of the first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c. The pixel defining layer 310 may partially expose each of the first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c. The pixel defining layer 310 may include a first circular opening 310a, a rectangular opening 310b, and a second circular opening 310c. The first circular opening 310a may expose a portion of the first pixel electrode 290a, the rectangular opening 310b may expose a portion of the second pixel electrode 290b, and the second circular opening 310c may expose a portion of the third pixel electrode 290c. A first circular opening 310a can correspond to a first sub-pixel region 31, a rectangular opening 310b can correspond to a second sub-pixel region 32, and a second circular opening 310c can correspond to a third sub-pixel region 33. The size of the first circular opening 310a can be substantially the same as the size of the first sub-pixel region 31, the size of the rectangular opening 310b can be substantially the same as the size of the second sub-pixel region 32, and the size of the second circular opening 310c can be substantially the same as the size of the third sub-pixel region 33. A first pixel electrode 290a exposed by the pixel defining layer 310 can correspond to the first sub-pixel region 31, a second pixel electrode 290b exposed by the pixel defining layer 310 can correspond to the second sub-pixel region 32, and a third pixel electrode 290c exposed by the pixel defining layer 310 can correspond to the third sub-pixel region 33.

[0089] In the plan view of the display device 100, each of the first pixel electrode 290a and the third pixel electrode 290c may have a circular shape, and the second pixel electrode 290b may have a rectangular shape. One of the first pixel electrode 290a and the third pixel electrode 290c may have a circular shape, and the remaining one may have a polygonal shape that is substantially close to a circle.

[0090] like Figure 5 and Figure 6As shown, the upper structure 600 may include a second substrate 410, a light-blocking member 420, and a filter 530 including a first filter 531, a second filter 532, and a third filter 533. The light-blocking member 420 may be disposed on the bottom surface of the second substrate 410, and the light-blocking member 420 may include a first opening 420a, a second opening 420b, and a third opening 420c.

[0091] In a plan view of the display device 100 (or viewed from a direction perpendicular to the top surface of the second substrate 410), each of the first opening 420a and the third opening 420c may be circular, and the second opening 420b may be rectangular. A first filter 531 may be disposed in the first opening 420a, a second filter 532 may be disposed in the second opening 420b, and a third filter 533 may be disposed in the third opening 420c. Since each of the first opening 420a and the third opening 420c is circular, and the second opening 420b is rectangular, each of the first filter 531 and the third filter 533 may also be circular, and the second filter 532 may also be rectangular.

[0092] One of the first opening 420a and the third opening 420c may be circular, and the remaining one may be a polygonal shape that is substantially close to a circle. One of the first opening 420a and the third opening 420c may be circular, and the remaining one may be rectangular.

[0093] One of the first filter 531 and the third filter 533 may have a circular shape, and the remaining one may have a polygonal shape that is substantially close to a circle. Alternatively, one of the first filter 531 and the third filter 533 may have a circular shape, and the remaining one may have a rectangular shape.

[0094] In the plan view of the display device 100, the area of ​​the first filter 531 (or the first opening 420a) may be larger than the area of ​​the second filter 532 (or the second opening 420b), and the area of ​​the third filter 533 (or the third opening 420c) may be larger than the area of ​​the second filter 532 (or the second opening 420b). The area of ​​the first filter 531 (or the first opening 420a) may be larger than the area of ​​the third filter 533 (or the third opening 420c).

[0095] The first opening 420a, the second opening 420b, and the third opening 420c can overlap (or correspond to) the first sub-pixel region 31 (or the first circular opening 310a), the second sub-pixel region 32 (or the rectangular opening 310b), and the third sub-pixel region 33 (or the second circular opening 310c), respectively, and the sizes of the first opening 420a, the second opening 420b, and the third opening 420c can be larger than the sizes of the first sub-pixel region 31 (or the first circular opening 310a), the second sub-pixel region 32 (or the rectangular opening 310b), and the third sub-pixel region 33 (or the second circular opening 310c), respectively.

[0096] The light-emitting layer can be disposed in the first circular opening 310a, the rectangular opening 310b, and the second circular opening 310c of the pixel limiting layer 310. Light emitted from the light-emitting layer can pass through the filters 530 disposed in the first opening 420a, the second opening 420b, and the third opening 420c of the light-blocking member 420 to be visible from the outside of the display device 100.

[0097] Figure 7 It is shown Figure 5 A floor plan of area 'A', and Figure 8 It is along Figure 2 The cross-sectional view taken from line I-I'.

[0098] refer to Figure 7 , Figure 8 , Figure 12 and Figure 19 The display device 100 may include a lower structure 500 and an upper structure 600.

[0099] The lower structure 500 may include a first substrate 110, a first semiconductor element 250_1, a second semiconductor element 250_2, a third semiconductor element 250_3, a gate insulating layer 150, an interlayer insulating layer 190, a planarization layer 270, a pixel structure 200, a pixel defining layer 310, and a thin-film encapsulation structure 450, etc. The pixel structure 200 may include a first lower electrode 290_1, a second lower electrode 290_2, a third lower electrode 290_3, a light-emitting layer 330, and an upper electrode 340. The first lower electrode 290_1, the light-emitting layer 330, and the upper electrode 340 are defined as a first sub-pixel structure; the second lower electrode 290_2, the light-emitting layer 330, and the upper electrode 340 are defined as a second sub-pixel structure; and the third lower electrode 290_3, the light-emitting layer 330, and the upper electrode 340 are defined as a third sub-pixel structure. The first semiconductor element 250_1 may include a first active layer 130_1, a first gate electrode 170_1, a first source electrode 210_1, and a first drain electrode 230_1; the second semiconductor element 250_2 may include a second active layer 130_2, a second gate electrode 170_2, a second source electrode 210_2, and a second drain electrode 230_2; and the third semiconductor element 250_3 may include a third active layer 130_3, a third gate electrode 170_3, a third source electrode 210_3, and a third drain electrode 230_3. The thin-film encapsulation structure 450 may include a first inorganic thin-film encapsulation layer 451, an organic thin-film encapsulation layer 452, and a second inorganic thin-film encapsulation layer 453. For example... Figure 3 As shown, the pixel defining layer 310 may include a first circular opening 310a, a rectangular opening 310b, and a second circular opening 310c.

[0100] The upper structure 600 may include a first protective insulating layer 495, a second protective insulating layer 490, a filter 530, an intermediate layer 497, a color filter 510, a light-blocking member 420, and a second substrate 410, etc. The filter 530 may include a first filter 531 (e.g., a first quantum dot pattern), a second filter 532 (e.g., a scattering pattern), and a third filter 533 (e.g., a second quantum dot pattern). The color filter 510 may include a first color filter 511, a second color filter 512, and a third color filter 513.

[0101] refer to Figure 2 The first subpixel structure can be disposed in the first subpixel region 31, the second subpixel structure can be disposed in the second subpixel region 32, and the third subpixel structure can be disposed in the third subpixel region 33. The display device 100 can use the first to third subpixel structures to display an image.

[0102] Refer again Figure 8The first substrate 110 may include a transparent or opaque material. The first substrate 110 may include at least one of the following: a quartz substrate, a synthetic quartz substrate, a calcium fluoride substrate, a fluorine-doped quartz (F-doped quartz) substrate, a soda-lime glass substrate, and an alkali-free glass substrate.

[0103] The first substrate 110 may be a flexible transparent resin substrate. The transparent resin substrate may include a polyimide substrate. The polyimide substrate may have a stacked structure including a first polyimide layer, a barrier film layer, and a second polyimide layer.

[0104] A buffer layer may be disposed on the first substrate 110. The buffer layer may be disposed over the entire first substrate 110. The buffer layer can prevent metal atoms or impurities from diffusing from the first substrate 110 into the semiconductor elements and sub-pixel structures, and can control the heat transfer rate during the crystallization process used to form the active layer to obtain a substantially uniform active layer. If the surface of the first substrate 110 is not uniform, the buffer layer can provide a flat surface on the first substrate 110. Depending on the type of the first substrate 110, at least two buffer layers may be provided on the first substrate 110, or no buffer layer may be provided. The buffer layer may comprise an organic insulating material and / or an inorganic insulating material.

[0105] The first to third active layers 130_1, 130_2 and 130_3 may be disposed on the first substrate 110 and may be spaced apart from each other. Each of the first to third active layers 130_1, 130_2 and 130_3 may include a metal oxide semiconductor, an inorganic semiconductor (e.g., amorphous silicon or polycrystalline silicon) or an organic semiconductor, and may include a source region and a drain region.

[0106] A gate insulating layer 150 may be disposed on the first to third active layers 130_1, 130_2, and 130_3. The gate insulating layer 150 may cover the first to third active layers 130_1, 130_2, and 130_3 on the first substrate 110, and may be disposed over the entire first substrate 110. The gate insulating layer 150 may sufficiently cover the first to third active layers 130_1, 130_2, and 130_3 on the first substrate 110, and may have a substantially flat top surface without creating steps around the first to third active layers 130_1, 130_2, and 130_3. The gate insulating layer 150 may be disposed with a uniform thickness along the contours of the first active layer to the third active layers 130_1, 130_2, and 130_3, to cover the first active layers to the third active layers 130_1, 130_2, and 130_3 on the first substrate 110. The gate insulating layer 150 may include silicon compounds or metal oxides, etc. The gate insulating layer 150 may include silicon oxide (SiO2). x ), silicon nitride (SiN)x ), silicon oxynitride (SiO) x N y ), silicon dioxide (SiO2) x C y ), silicon carbonitride (SiC) x N y ), aluminum oxide (AlO) x ), aluminum nitride (AlN) x ), tantalum oxide (TaO) x ), hafnium oxide (HfO) x Zirconium oxide (ZrO) x ) or titanium dioxide (TiO) x The gate insulating layer 150 may have a multilayer structure comprising multiple insulating layers. The insulating layers may have different thicknesses and / or may comprise different materials.

[0107] The first to third gate electrodes 170_1, 170_2, and 170_3 can be disposed on the gate insulating layer 150 and can be spaced apart from each other. The first gate electrode 170_1 can be disposed on the gate insulating layer 150 and can overlap with the first active layer 130_1; the second gate electrode 170_2 can be disposed on the gate insulating layer 150 and can overlap with the second active layer 130_2; and the third gate electrode 170_3 can be disposed on the gate insulating layer 150 and can overlap with the third active layer 130_3. Each of the first to third gate electrodes 170_1, 170_2, and 170_3 may include a metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material, etc. These can be used individually or in combination with each other. In other embodiments, each of the first to third gate electrodes 170_1, 170_2, and 170_3 may have a multilayer structure including multiple metal layers. Each metal layer may have a different thickness and / or may include different materials.

[0108] An interlayer insulating layer 190 may be disposed on the first to third gate electrodes 170_1, 170_2, and 170_3. The interlayer insulating layer 190 may cover the first to third gate electrodes 170_1, 170_2, and 170_3, and may be disposed on the entire surface of the gate insulating layer 150. The interlayer insulating layer 190 may sufficiently cover the first to third gate electrodes 170_1, 170_2, and 170_3, and may have a substantially flat top surface without creating steps around the first to third gate electrodes 170_1, 170_2, and 170_3. The interlayer insulating layer 190 may be disposed with a uniform thickness along the contours of the first to third gate electrodes 170_1, 170_2, and 170_3 to cover the first to third gate electrodes 170_1, 170_2, and 170_3 on the gate insulating layer 150. The interlayer insulating layer 190 may include silicon compounds or metal oxides, etc. The interlayer insulating layer 190 may have a multilayer structure comprising multiple insulating layers. The insulating layers may have different thicknesses and / or may include different materials.

[0109] The first source electrode 210_1, the first drain electrode 230_1, the second source electrode 210_2, the second drain electrode 230_2, the third source electrode 210_3, and the third drain electrode 230_3 can be disposed on the interlayer insulating layer 190 and can be spaced apart from each other. The first source electrode 210_1 can be connected to the source region of the first active layer 130_1 through a contact hole formed by removing a first portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the first drain electrode 230_1 can be connected to the drain region of the first active layer 130_1 through a contact hole formed by removing a second portion of the gate insulating layer 150 and the interlayer insulating layer 190. The second source electrode 210_2 can be connected to the source region of the second active layer 130_2 through a contact hole formed by removing a third portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the second drain electrode 230_2 can be connected to the drain region of the second active layer 130_2 through a contact hole formed by removing a fourth portion of the gate insulating layer 150 and the interlayer insulating layer 190. The third source electrode 210_3 can be connected to the source region of the third active layer 130_3 through a contact hole formed by removing a fifth portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the third drain electrode 230_3 can be connected to the drain region of the third active layer 130_3 through a contact hole formed by removing a sixth portion of the gate insulating layer 150 and the interlayer insulating layer 190. Each of the first to third source electrodes 210_1, 210_2, and 210_3 and the first to third drain electrodes 230_1, 230_2, and 230_3 may include a metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material, etc. These may be used individually or in combination with each other. Each of the first to third source electrodes 210_1, 210_2, and 210_3 and the first to third drain electrodes 230_1, 230_2, and 230_3 may have a multilayer structure comprising multiple metal layers. The metal layers may have different thicknesses and / or may include different materials.

[0110] The first semiconductor element 250_1 may include a first active layer 130_1, a first gate electrode 170_1, a first source electrode 210_1, and a first drain electrode 230_1. The second semiconductor element 250_2 may include a second active layer 130_2, a second gate electrode 170_2, a second source electrode 210_2, and a second drain electrode 230_2. The third semiconductor element 250_3 may include a third active layer 130_3, a third gate electrode 170_3, a third source electrode 210_3, and a third drain electrode 230_3.

[0111] The display device 100 may have a configuration in which each pixel includes multiple transistors and multiple capacitors.

[0112] Each of the first to third semiconductor elements 250_1, 250_2 and 250_3 may have a bottom gate structure and / or a dual gate structure.

[0113] The gate insulating layer 150 and the interlayer insulating layer 190 may be included in each of the first semiconductor element to the third semiconductor element 250_1, 250_2 and 250_3.

[0114] A planarization layer 270 may be disposed on the interlayer insulating layer 190 and the first to third semiconductor elements 250_1, 250_2, and 250_3. The planarization layer 270 may be sufficiently thick to fully cover the first to third source electrodes 210_1, 210_2, and 210_3 and the first to third drain electrodes 230_1, 230_2, and 230_3 on the interlayer insulating layer 190. The planarization layer 270 may have a substantially flat top surface. To achieve the flat top surface of the planarization layer 270, a planarization process may be performed on the planarization layer 270. The planarization layer 270 may include organic insulating materials or inorganic insulating materials, etc. The planarization layer 270 may include organic insulating materials.

[0115] The first to third lower electrodes 290_1, 290_2, and 290_3 can be disposed on the planarization layer 270 and can be spaced apart from each other. For example... Figure 3 and Figure 4 As shown, a first pixel electrode 290a can be disposed on the planarization layer 270 and can overlap with the first circular opening 310a of the pixel defining layer 310; a second pixel electrode 290b can be disposed on the planarization layer 270 and can overlap with the rectangular opening 310b; and a third pixel electrode 290c can be disposed on the planarization layer 270 and can overlap with the second circular opening 310c. In the plan view of the display device 100, the first pixel electrode 290a can have a circular shape, the second pixel electrode 290b can have a rectangular shape, and the third pixel electrode 290c can have a circular shape. In the plan view of the display device 100, the area of ​​each of the first pixel electrode 290a and the third pixel electrode 290c can be larger than the area of ​​the second pixel electrode 290b. The area of ​​the first pixel electrode 290a can be larger than the area of ​​the third pixel electrode 290c.

[0116] The first to third lower electrodes 290_1, 290_2, and 290_3 may protrude into the planarization layer 270 to connect to the first to third drain electrodes 230_1, 230_2, and 230_3, respectively. The first to third lower electrodes 290_1, 290_2, and 290_3 may be electrically connected to the first to third semiconductor elements 250_1, 250_2, and 250_3, respectively. Each of the first to third lower electrodes 290_1, 290_2, and 290_3 may include a metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material, etc. For example, each of the first to third lower electrodes 290_1, 290_2, and 290_3 may include gold (Au), silver (Ag), aluminum (Al), platinum (Pt), nickel (Ni), titanium (Ti), palladium (Pd), magnesium (Mg), calcium (Ca), lithium (Li), chromium (Cr), tantalum (Ta), tungsten (W), copper (Cu), molybdenum (Mo), scandium (Sc), neodymium (Nd), iridium (Ir), aluminum-containing alloys, and aluminum nitride (AlN). x ), silver alloys, tungsten nitride (WN) x Copper-containing alloys, molybdenum-containing alloys, titanium nitride (TiN) x ), Chromium nitride (CrN) x ), Tantalum nitride (TaN) x ), SrRuO x O y ), zinc oxide (ZnO) x Indium tin oxide (ITO), tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x Or indium zinc oxide (IZO), etc. These can be used alone or in combination with each other. Each of the first to third lower electrodes 290_1, 290_2 and 290_3 can have a multilayer structure comprising multiple metal layers. Each metal layer can have a different thickness and / or can include different materials.

[0117] The pixel defining layer 310 may partially cover each of the first to third lower electrodes 290_1, 290_2, and 290_3 and the planarization layer 270. The pixel defining layer 310 may cover the outer periphery of each of the first to third lower electrodes 290_1, 290_2, and 290_3, and may expose a portion of the top surface of each of the first to third lower electrodes 290_1, 290_2, and 290_3. The pixel defining layer 310 may include a first circular opening 310a, a rectangular opening 310b, and a second circular opening 310c, respectively exposing portions of the top surfaces of the first to third lower electrodes 290_1, 290_2, and 290_3. In a plan view of the display device 100, as shown... Figure 3 As shown, the first circular opening 310a can be circular, the rectangular opening 310b can be rectangular, and the second circular opening 310c can be circular. In the plan view of the display device 100, the area of ​​the first circular opening 310a and the area of ​​the second circular opening 310c can each be larger than the area of ​​the rectangular opening 310b. The area of ​​the first circular opening 310a can be larger than the area of ​​the second circular opening 310c.

[0118] In the plan view of the display device 100, one of the first circular opening 310a and the second circular opening 310c may have a circular shape, and the remaining one may have a polygonal shape that is substantially close to a circle. In the plan view of the display device 100, one of the first circular opening 310a and the second circular opening 310c may have a circular shape, and the remaining one may have a rectangular shape.

[0119] The pixel defining layer 310 can be formed of an organic insulating material or an inorganic insulating material. The pixel defining layer 310 may include an organic insulating material. The pixel defining layer 310 may include photoresist, polyacrylic resin, polyimide resin, polyamide resin, siloxane resin, acrylic resin, or epoxy resin, etc.

[0120] The light-emitting layer 330 can be disposed on the pixel defining layer 310 and on the top surface portion exposed by the pixel defining layer 310 of each of the first to third lower electrodes 290_1, 290_2, and 290_3. The light-emitting layer 330 can be continuously disposed on the first substrate 110 and can be integrally formed. The light-emitting layer 330 can be formed of a light-emitting material for emitting blue light. Since the light-emitting layer 330 emits blue light, the light loss rate of the blue light emitted to the outside through the second filter 532 and the second color filter 512 can be substantially small. Therefore, the size of the rectangular opening 310b can be minimized.

[0121] The light-emitting layer 330 can be formed by stacking multiple light-emitting material layers used to generate different colors of light (such as red, green and blue light) to emit white light as a whole.

[0122] The upper electrode 340 can be disposed on the pixel defining layer 310 and the light-emitting layer 330. The upper electrode 340 may include metals, alloys, metal nitrides, conductive metal oxides, or transparent conductive materials, etc. These can be used individually or in combination with each other. The upper electrode 340 may have a multilayer structure including multiple metal layers. The metal layers may have different thicknesses and / or may include different materials.

[0123] The first sub-pixel structure may include a first lower electrode 290_1, a light-emitting layer 330, and an upper electrode 340; the second sub-pixel structure may include a second lower electrode 290_2, a light-emitting layer 330, and an upper electrode 340; and the third sub-pixel structure may include a third lower electrode 290_3, a light-emitting layer 330, and an upper electrode 340. Pixel structure 200 may include a first lower electrode 290_1, a second lower electrode 290_2, a third lower electrode 290_3, a light-emitting layer 330, and an upper electrode 340.

[0124] A first inorganic thin-film encapsulation layer 451 may be disposed on the upper electrode 340. The first inorganic thin-film encapsulation layer 451 may be disposed with a uniform thickness along the contour of the upper electrode 340 to cover the upper electrode 340. The first inorganic thin-film encapsulation layer 451 can prevent potential degradation of the pixel structure 200 due to the penetration of moisture and oxygen, etc. The first inorganic thin-film encapsulation layer 451 can also protect the pixel structure 200 from external impacts. The first inorganic thin-film encapsulation layer 451 may include a flexible inorganic insulating material.

[0125] An organic thin-film encapsulation layer 452 may be disposed on the first inorganic thin-film encapsulation layer 451. The organic thin-film encapsulation layer 452 can improve the flatness of the display device 100 and protect the pixel structure 200. The organic thin-film encapsulation layer 452 may include a flexible organic insulating material.

[0126] A second inorganic thin-film encapsulation layer 453 may be disposed on the organic thin-film encapsulation layer 452. The second inorganic thin-film encapsulation layer 453 may be disposed along the contour of the organic thin-film encapsulation layer 452 with a uniform thickness to cover the organic thin-film encapsulation layer 452. The second inorganic thin-film encapsulation layer 453 can prevent potential degradation of the pixel structure 200 due to the penetration of moisture and oxygen, etc. Together with the first inorganic thin-film encapsulation layer 451 and the organic thin-film encapsulation layer 452, the second inorganic thin-film encapsulation layer 453 can also protect the pixel structure 200 from external impacts. The second inorganic thin-film encapsulation layer 453 may include a flexible inorganic insulating material.

[0127] A thin-film encapsulation structure 450, comprising a first inorganic thin-film encapsulation layer 451, an organic thin-film encapsulation layer 452, and a second inorganic thin-film encapsulation layer 453, can be disposed between an intermediate layer 497 and an upper electrode 340. The thin-film encapsulation structure 450 can have a five-layer structure in which the first to fifth thin-film encapsulation layers are stacked, or a seven-layer structure in which the first to seventh thin-film encapsulation layers are stacked.

[0128] The lower structure 500 may include a first substrate 110, a first semiconductor element 250_1, a second semiconductor element 250_2, a third semiconductor element 250_3, a gate insulating layer 150, an interlayer insulating layer 190, a planarization layer 270, a pixel structure 200, a pixel defining layer 310, and a thin film encapsulation structure 450.

[0129] The second substrate 410 may be disposed on the thin-film encapsulation structure 450. The second substrate 410 may face the first substrate 110 (i.e., may be opposite to the first substrate 110). The second substrate 410 and the first substrate 110 may comprise substantially the same material. The second substrate 410 may comprise a quartz substrate, a synthetic quartz substrate, a calcium fluoride substrate, a fluorine-doped quartz substrate, a soda-lime glass substrate, or an alkali-free glass substrate, etc.

[0130] The second color filter 512 can be disposed on the bottom surface of the second substrate 410. The second color filter 512 can be disposed between the second substrate 410 and the second filter 532, and can overlap with the second filter 532. Figure 13 As shown, the second color filter 512 may have openings 512a and 512b. The second color filter 512 may be disposed in the second sub-pixel region 32, extending in the first to fourth directions D1, D2, D3, and D4, and may include openings 512a and 512b that respectively expose the first filter 531 and the third filter 533. The portion of the second color filter 512 overlapping with the second pixel electrode 290b may transmit blue light and may have a first color (e.g., blue).

[0131] The first color filter 511 can be disposed below the second substrate 410 and the second color filter 512. The first color filter 511 can be disposed between the second substrate 410 and the first filter 531, and can overlap with the first filter 531. Figure 14As shown, the first color filter 511 may have openings 511a and 511b. The first color filter 511 may be disposed in the opening 512a of the second color filter 512 (or may overlap with the first filter 531) and may extend in the first to fourth directions D1, D2, D3, and D4. The opening 511a may expose the opening 512b of the second color filter 512 and may partially expose or accommodate the third filter 533. The opening 511b may expose a portion of the bottom surface of the second color filter 512 and may partially expose or accommodate the second filter 532. The portion of the first color filter 511 that overlaps with the first pixel electrode 290a may transmit red light and may have a second color (e.g., red).

[0132] The third color filter 513 may be disposed below the second substrate 410 and the first color filter 511. The third color filter 513 may be disposed between the second substrate 410 and the third filter 533, and may overlap with the third filter 533. The third color filter 513 may be disposed in the opening 511a of the first color filter 511 (or may overlap with the third filter 533), and may extend in the first to fourth directions D1, D2, D3, and D4. It may include exposing the opening 511b of the first color filter 511 and partially exposing or accommodating the first opening of the second filter 532, and may include exposing a portion of the bottom surface of the first color filter 511 and partially exposing or accommodating the second opening of the first filter 531. The portion of the third color filter 513 that overlaps with the third pixel electrode 290c may transmit green light and may have a third color (e.g., green).

[0133] Color filter 510 may include a first color filter 511, a second color filter 512, and a third color filter 513. (See reference) Figure 13 , Figure 14 and Figure 15 The opening 512a of the second color filter 512 and the second opening of the third color filter 513 are defined as the first opening 510a of the color filter 510; the opening 511b of the first color filter 511 and the first opening of the third color filter 513 are defined as the second opening 510b of the color filter 510; and the opening 512b of the second color filter 512 and the opening 511a of the first color filter 511 are defined as the third opening 510c of the color filter 510. The color filter 510 may include a photosensitive resin or a color photoresist.

[0134] The first opening 510a, the second opening 510b, and the third opening 510c can be defined by a portion of a first color filter 511, a portion of a second color filter 512, and a portion of a third color filter 513 disposed on the sides of the first opening 510a, the second opening 510b, and the third opening 510c. Since a portion of the first color filter 511, a portion of the second color filter 512, and a portion of the third color filter 513 can overlap to block light, it is not necessary to add a light-blocking pattern defining the first opening 510a, the second opening 510b, and the third opening 510c.

[0135] The color filter 510 may include a yellow color filter, a cyan color filter, and a magenta color filter.

[0136] The arrangement and / or sequence of the color filters 510 can be configured according to the embodiments.

[0137] like Figure 7 and Figure 15 As shown, the first opening 510a may have a fourth width a2, the second opening 510b may have a fifth width b2, and the third opening 510c may have a sixth width c2. The fourth width a2 may be greater than the fifth width b2, and the sixth width c2 may be greater than the fifth width b2. The fourth width a2 may be greater than the sixth width c2. The fourth width a2 may be approximately 77 micrometers, the fifth width b2 may be approximately 38 micrometers, and the sixth width c2 may be approximately 73 micrometers. The distance d1 from the first opening 510a to the third opening 510c may be approximately 56 micrometers, the distance from the first opening 510a to the second opening 510b may be greater than approximately 40 micrometers, and the distance from the third opening 510c to the second opening 510b may be greater than approximately 40 micrometers.

[0138] A second protective insulating layer 490 may be disposed below the color filter 510. The second protective insulating layer 490 may cover the color filter 510 on the bottom surface of the second substrate 410. The second protective insulating layer 490 may be disposed with a uniform thickness along the contour of the color filter 510 to cover the color filter 510 on the bottom surface of the second substrate 410. The second protective insulating layer 490 may sufficiently cover the color filter 510 on the bottom surface of the second substrate 410 and may have a substantially flat top surface without creating steps around the color filter 510. The second protective insulating layer 490 may comprise an inorganic insulating material or an organic insulating material. The second protective insulating layer 490 may comprise an inorganic insulating material such as silicon nitride. The second protective insulating layer 490 may have a multilayer structure comprising multiple insulating layers. The insulating layers may have different thicknesses and / or may comprise different materials.

[0139] A refractive index conversion layer may be disposed between the second protective insulating layer 490 and the filter 530. Light that has passed through the filter 530 can pass through the refractive index conversion layer before passing through the color filter 510, and the refractive index of the light can be changed. The refractive index conversion layer may comprise hollow silicon dioxide having a predetermined refractive index.

[0140] The light-blocking member 420 can be disposed on the bottom surface of the second protective insulating layer 490. The light-blocking member 420 can also be disposed on the pixel structure 200. For example... Figure 16 As shown, the light-blocking member 420 may include a first opening 420a, a second opening 420b, and a third opening 420c. The light-blocking member 420 may include a light-blocking portion and an opening portion including the first opening 420a, the second opening 420b, and the third opening 420c. The light-blocking portion may overlap with portions of a first color filter 511, a second color filter 512, and a third color filter 513 that define the first opening 510a, the second opening 510b, and the third opening 510c. In the plan view of the display device 100, as shown... Figure 5 and Figure 6 As shown, the first opening 420a can be circular, the second opening 420b can be rectangular, and the third opening 420c can be circular. The area of ​​each of the first opening 420a and the third opening 420c can be larger than the area of ​​the second opening 420b. The area of ​​the first opening 420a can be larger than the area of ​​the third opening 420c. The light-blocking member 420 can have a planar shape including the first opening 420a, the second opening 420b, and the third opening 420c. The first opening 510a, the second opening 510b, and the third opening 510c of the color filter 510 can overlap with the first opening 420a, the second opening 420b, and the third opening 420c of the light-blocking member 420, respectively.

[0141] like Figure 7 and Figure 16As shown, the first opening 420a may have a first width a1, the second opening 420b may have a second width b1, and the third opening 420c may have a third width c1. The first width a1 may be greater than the second width b1, and the third width c1 may be greater than the second width b1. The first width a1 may be greater than the third width c1. The first width a1 may be approximately 113 micrometers, the second width b1 may be greater than approximately 38 micrometers, and the third width c1 may be approximately 109 micrometers. The spacing d3 from the first opening 420a to the third opening 420c may be approximately 20 micrometers, the spacing d4 from the first opening 420a to the second opening 420b may be approximately 22 micrometers, and the spacing from the third opening 420c to the second opening 420b may be approximately 22 micrometers. The spacing d2 from the third opening 420c to the second opening 420b may be greater than approximately 40 micrometers.

[0142] The light-blocking member 420 can block or absorb light incident from the outside. The light-blocking member 420 can prevent color mixing that may occur in the filter 530. For example, if the display device 100 does not include the light-blocking member 420, a portion of the light incident on the third filter 533 can incident on the first filter 531, and the remainder of that light can incident on the second filter 532. Color mixing may occur.

[0143] The light-blocking component 420 may include organic materials such as photoresists, polyacrylic resins, polyimide resins, polyamide resins, siloxane resins, acrylic resins, or epoxy resins. The light-blocking component 420 may be substantially opaque. The light-blocking component 420 may further include a light-blocking material for absorbing light. The light-blocking material may include carbon black, titanium oxynitride, titanium black, phenylene black, aniline black, anthocyanin black, aniline black acid black, or black resin, etc.

[0144] The first filter 531 can be disposed on the bottom surface of the second protective insulating layer 490 and in the first opening 420a of the light-blocking member 420. The first filter 531 can be disposed on the pixel structure 200 and can overlap with the first pixel electrode 290a. (See reference) Figure 6Since the first filter 531 is disposed in a first opening 420a having a circular shape in the plan view, the first filter 531 can also have a circular shape in the plan view. The area of ​​the first filter 531 can be larger than the area of ​​the second filter 532. The first filter 531 can overlap with the first color filter 511. The first filter 531 can be spaced apart from each of the second filter 532 and the third filter 533 by the light-blocking portion of the light-blocking member 420. The first filter 531 can convert blue light into red light. The first filter 531 may include a plurality of quantum dots configured to absorb blue light and emit red light.

[0145] The third filter 533 can be disposed on the bottom surface of the second protective insulating layer 490 and in the third opening 420c of the light-blocking member 420. The third filter 533 can be disposed on the pixel structure 200 and can overlap with the third pixel electrode 290c. (Reference) Figure 6 Since the third filter 533 is disposed in the third opening 420c, which has a circular shape in the plan view, the third filter 533 can also have a circular shape in the plan view. The area of ​​the third filter 533 can be larger than the area of ​​the second filter 532. The third filter 533 can overlap with the third color filter 513. The third filter 533 can be spaced apart from each of the first filter 531 and the second filter 532 by the light-blocking portion of the light-blocking member 420. The third filter 533 can convert blue light into green light. The third filter 533 may include a plurality of quantum dots configured to absorb blue light and emit green light.

[0146] The first filter 531 and the third filter 533 can be disposed on the same layer (e.g., each directly contacting the bottom surface of the second protective insulating layer 490). The horizontal surfaces of the bottom surfaces of the first filter 531 and the third filter 533 can be coplanar.

[0147] The quantum dots included in each of the first filter 531 and the third filter 533 may include one or a mixture of silicon (Si) nanocrystals, group II-VI compound semiconductor nanocrystals, group III-V compound semiconductor nanocrystals and group IV-VI compound semiconductor nanocrystals. II-VI class compound semiconductor nanocrystals can be selected from the group consisting of: CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe. Group III-V compound semiconductor nanocrystals can be selected from the group consisting of: GaN, GaP, GaAs, AlN, AlP, AlAs, InN, InP, InAs, GaNP, GaNAs, GaPAs, AlNP, AlNAs, AlPAs, InNP, InNAs, InPAs, GaAlNP, GaAlNAs, GaAlPAs, GaInNP, GaInNAs, GaInPAs, InAlNP, InAlNAs, and InAlPAs. Group IV-VI compound semiconductor nanocrystals can be SbTe.

[0148] Even when the quantum dots included in each of the first filter 531 and the third filter 533 are made of the same material, the emission wavelength can be varied depending on the size of the quantum dots. As the size of the quantum dots decreases, shorter wavelengths of light can be emitted. Light in the desired visible light region can be emitted by adjusting the size of the quantum dots included in each of the first filter 531 and the third filter 533.

[0149] The quantum dots included in the first filter 531 and the third filter 533 may be formed of the same material, and the (average, maximum or minimum) size of the quantum dots included in the first filter 531 may be larger than the (average, maximum or minimum) size of the quantum dots included in the third filter 533.

[0150] The first protective insulating layer 495 can be directly disposed below the first filter 531, the third filter 533, the light-blocking member 420, and a portion of the second protective insulating layer 490. The first protective insulating layer 495 can cover the first filter 531, the third filter 533, and the light-blocking member 420. The second protective insulating layer 490 and the first protective insulating layer 495 can be spaced apart from each of the first filter 531 and the third filter 533, and the second protective insulating layer 490 and the first protective insulating layer 495 can be in direct contact with each other through the second opening 420b. The first protective insulating layer 495 can be disposed inside the second opening 420b, so that the first protective insulating layer 495 is not disposed on the bottom surface of the second filter 532, and the first protective insulating layer 495 is not disposed inside the first opening 420a and the third opening 420c, so that the first protective insulating layer 495 is not disposed on the top surface of each of the first filter 531 and the third filter 533. The first protective insulating layer 495 may be disposed with a uniform thickness along the contours of the first filter 531, the third filter 533, and the light-blocking member 420 to cover the first filter 531, the third filter 533, and the light-blocking member 420. The first protective insulating layer 495 may comprise an inorganic insulating material or an organic insulating material. The first protective insulating layer 495 may comprise an inorganic insulating material such as silicon nitride. The first protective insulating layer 495 may have a multilayer structure comprising multiple insulating layers. The insulating layers may have different thicknesses and / or may comprise different materials.

[0151] The second filter 532 can be disposed on the bottom surface of the first protective insulating layer 495 and in the second opening 420b of the light-blocking member 420. The second filter 532 can be disposed on the pixel structure 200 and can overlap with the second pixel electrode 290b. (Reference) Figure 6Since the second filter 532 is disposed in the second opening 420b, which has a rectangular shape in the plan view, the second filter 532 can also have a rectangular shape in the plan view. In the plan view of the display device 100, the area of ​​the second filter 532 can be smaller than the area of ​​each of the first filter 531 and the third filter 533. The second filter 532 can overlap with the second color filter 512. The second filter 532 can be spaced apart from each of the first filter 531 and the third filter 533 by the light-blocking portion of the light-blocking member 420. The second filter 532 can transmit blue light. The second filter 532 may include a scattering material that emits blue light without significant color change. The second filter 532 may not include quantum dots. Each of the first filter 531 and the third filter 533 may further include a scattering material. In the plan view of the display device 100, the circular perimeter of the first filter 531 may surround the circular boundary of the first pixel electrode 290a, and the polygonal perimeter of the second filter 532 may surround the polygonal boundary of the second pixel electrode 290b.

[0152] Since the second filter 532 is disposed on the bottom surface of the first protective insulating layer 495, the top surface of the second filter 532 may not be coplanar with either the top surface of the first filter 531 or the top surface of the third filter 533. The horizontal plane of the bottom surface of the second filter 532 may not be coplanar with either the horizontal plane of the bottom surface of the first filter 531 or the horizontal plane of the bottom surface of the third filter 533. The bottom surface of the second filter 532 may be closer to the top surface of the thin-film encapsulation structure 450 than the bottom surface of either the first filter 531 or the third filter 533.

[0153] The second filter 532 may include materials such as TiO, ZrO, AlO3, In2O3, ZnO, SnO2, Sb2O3, or ITO. The second filter 532 may include materials that scatter blue light without significantly changing the color of the blue light.

[0154] The arrangement or sequence of the first filter 531, the third filter 533, and the second filter 532 can be configured according to the embodiments.

[0155] The filter 530 may include a first filter 531, a second filter 532 and a third filter 533.

[0156] Intermediate layer 497 can be disposed below the first protective insulating layer 495 and the second filter 532. Intermediate layer 497 can be disposed on the bottom surface of the first protective insulating layer 495 and can cover the second filter 532. Intermediate layer 497 can be thick enough to fully cover the second filter 532. Intermediate layer 497 can be disposed on the thin-film encapsulation structure 450. Intermediate layer 497 can include organic insulating materials or inorganic insulating materials, etc.

[0157] A sealing member may be disposed in a peripheral region 20 between the first substrate 110 and the second substrate 410. The sealing member may substantially surround the display region 10. The sealing member may contact the bottom surface of the second substrate 410 and the top surface of the first substrate 110. At least one insulating layer (e.g., gate insulating layer 150, interlayer insulating layer 190, first inorganic thin film encapsulation layer 451, second inorganic thin film encapsulation layer 453, etc.) may be located between the bottom surface of the sealing member and the top surface of the first substrate 110.

[0158] The sealing component may include a non-conductive material. The sealing component may include glass frit, etc. The sealing component may additionally include a light-curing material. The sealing component may include a mixture of organic materials and light-curing materials, and this mixture may be cured by irradiation with ultraviolet (UV), laser, or visible light, thereby obtaining the sealing component. The light-curing material included in the sealing component may include epoxy acrylate resins, polyester acrylate resins, polyurethane acrylate resins, polybutadiene acrylate resins, silicone acrylate resins, or alkyl acrylate resins, etc.

[0159] A laser can irradiate a mixture of organic and photocurable materials. When irradiated with a laser, the mixture can change from a solid to a liquid state, and the liquid mixture can solidify into a solid state after a predetermined time. The second substrate 410 can be coupled to the first substrate 110 and can be sealed relative to the first substrate 110 according to the state of the mixture.

[0160] The upper structure 600 may include a second protective insulating layer 490, a first protective insulating layer 495, a filter 530, an intermediate layer 497, a color filter 510, a light-blocking member 420, and a second substrate 410. The display device 100 may include... Figure 8 The lower structure 500 and the upper structure 600 are shown in the diagram.

[0161] The display device 100 may be or include a liquid crystal display (LCD), a field emission display (FED), a plasma display panel (PDP), or an electrophoretic display (EPD). The second substrate 410, on which filters 530 and color filters 510 are disposed, may be the second substrate of the liquid crystal display device, the field emission display device, the plasma display device, or the electrophoretic display device.

[0162] In display devices, filters (e.g., quantum dot layers) can be formed in openings of light-blocking members using an inkjet process. Because a minimum volume margin is required for setting the ink, the openings of the light-blocking member can be polygonal. The filters can also be polygonal. Considering the predetermined area in which the filters are formed, the light-blocking member can result in undesirable large light loss. Because the perimeter of a polygon of the same area is relatively long, a relatively large amount of light emitted from the emissive layer can be blocked by the light-blocking portion surrounding the polygonal opening. If the display device has high resolution, the size of the sub-pixel region can be substantially small, and the size of each of the filters and light-blocking members can be substantially small. In this case, the linewidth of the light-blocking portion of the light-blocking member (e.g., the width of the light-blocking member between adjacent openings) can be substantially small, allowing the light-blocking member to have a small contact area and potentially peel off.

[0163] The display device 100 includes a first filter 531 and a third filter 533 having circular shapes in a plan view. Because the circumference of a circle based on a predetermined area is shorter than the circumference of a polygon (e.g., an asymmetrical polygon), the light-blocking member 420, which includes a first opening 420a and a third opening 430c with circular shapes, results in relatively small light loss. Only a relatively small amount of light emitted from the light-emitting layer 330 can be blocked by the light-blocking member 420. Advantageously, the display device 100 can have high light transmittance.

[0164] Since the display device 100 includes a first filter 531 and a third filter 533 with circular shapes and a second filter 532 with rectangular shapes, the first opening 420a, the second opening 420b, and the third opening 420c of the light-blocking member 420 can be sufficiently separated from each other, allowing the light-blocking portion of the light-blocking member 420 to be sufficiently wide. Advantageously, the contact area of ​​the light-blocking member 420 can be sufficiently large, and the light-blocking member 420 can remain intact without peeling off.

[0165] Figures 9 to 20 This is a cross-sectional view showing a structure formed in a method of manufacturing a display device according to an embodiment.

[0166] refer to Figure 9 A first substrate 110 comprising transparent or opaque materials may be provided. The first substrate 110 may be or include a quartz substrate, a synthetic quartz substrate, a calcium fluoride substrate, a fluorine-doped quartz substrate, a soda-lime glass substrate, or an alkali-free glass substrate, etc.

[0167] The first substrate 110 may be a flexible transparent resin substrate. Examples of transparent resin substrates that can be used as the first substrate 110 may include a polyimide substrate. The polyimide substrate may include a first polyimide layer, a barrier film layer, and a second polyimide layer, etc. The polyimide substrate may have a configuration in which the first polyimide layer, the barrier film layer, and the second polyimide layer are sequentially stacked on a rigid glass substrate. In a method of manufacturing a display device, after forming an insulating layer (e.g., a buffer layer) on the second polyimide layer of the polyimide substrate, semiconductor elements and sub-pixel structures, etc., can be formed on the insulating layer. After forming the semiconductor elements and sub-pixel structures, the rigid glass substrate can be removed. In other words, since the polyimide substrate is thin and flexible, it may be difficult to directly form semiconductor elements and sub-pixel structures on the polyimide substrate. Considering this, after forming the semiconductor elements and sub-pixel structures using a rigid glass substrate, the rigid glass substrate can be removed, allowing the polyimide substrate to be used as the first substrate 110.

[0168] A buffer layer may be formed on the first substrate 110. The buffer layer may be disposed over the entire first substrate 110. Depending on the type of the first substrate 110, at least two buffer layers may be provided on the first substrate 110, or no buffer layer may be formed. The buffer layer may be formed using organic or inorganic materials.

[0169] The first to third active layers 130_1, 130_2, and 130_3 can be formed on the first substrate 110 and can be spaced apart from each other. Each of the first to third active layers 130_1, 130_2, and 130_3 can be formed using oxide semiconductors, inorganic semiconductors, or organic semiconductors, and can include a source region and a drain region. The first to third active layers 130_1, 130_2, and 130_3 can be formed simultaneously on the same layer using the same material.

[0170] A gate insulating layer 150 may be formed on the first active layers to the third active layers 130_1, 130_2, and 130_3. The gate insulating layer 150 may cover the first active layers to the third active layers 130_1, 130_2, and 130_3 on the first substrate 110, and may be formed over the entire first substrate 110. The gate insulating layer 150 may sufficiently cover the first active layers to the third active layers 130_1, 130_2, and 130_3 on the first substrate 110, and may have a substantially flat top surface without creating steps around the first active layers to the third active layers 130_1, 130_2, and 130_3. The gate insulating layer 150 may be formed with a uniform thickness along the contours of the first active layer to the third active layers 130_1, 130_2, and 130_3 to cover the first active layers to the third active layers 130_1, 130_2, and 130_3 on the first substrate 110. The gate insulating layer 150 may be formed of silicon compound or metal oxide, etc. The gate insulating layer 150 may include SiO2. x SiN x SiO x N y SiO x C y SiC x N y AlO x AlN x TaO x HfO x ZrO x or TiO x wait.

[0171] The first to third gate electrodes 170_1, 170_2, and 170_3 can be formed on the gate insulating layer 150 and can be spaced apart from each other. The first gate electrode 170_1 can be formed on a portion of the gate insulating layer 150 below the first active layer 130_1 thereunder, the second gate electrode 170_2 can be formed on a portion of the gate insulating layer 150 below the second active layer 130_2 thereunder, and the third gate electrode 170_3 can be formed on a portion of the gate insulating layer 150 below the third active layer 130_3 thereunder. Each of the first to third gate electrodes 170_1, 170_2, and 170_3 can be formed using a metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material, etc. These can be used individually or in combination with each other. The first to third gate electrodes 170_1, 170_2, and 170_3 can be formed simultaneously on the same layer using the same material.

[0172] An interlayer insulating layer 190 may be formed on the first to third gate electrodes 170_1, 170_2, and 170_3. The interlayer insulating layer 190 may cover the first to third gate electrodes 170_1, 170_2, and 170_3 on the gate insulating layer 150, and may be formed over the entire gate insulating layer 150. The interlayer insulating layer 190 may sufficiently cover the first to third gate electrodes 170_1, 170_2, and 170_3 on the gate insulating layer 150, and may have a substantially flat top surface without creating steps around the first to third gate electrodes 170_1, 170_2, and 170_3. The interlayer insulating layer 190 may be formed with a uniform thickness along the contours of the first to third gate electrodes 170_1, 170_2, and 170_3 to cover the first to third gate electrodes 170_1, 170_2, and 170_3 on the gate insulating layer 150. The interlayer insulating layer 190 can be formed of silicon compounds or metal oxides, etc.

[0173] The first source electrode 210_1, the first drain electrode 230_1, the second source electrode 210_2, the second drain electrode 230_2, the third source electrode 210_3, and the third drain electrode 230_3 can be formed on the interlayer insulating layer 190 and can be spaced apart from each other. The first source electrode 210_1 can be connected to the source region of the first active layer 130_1 through a contact hole formed by removing a first portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the first drain electrode 230_1 can be connected to the drain region of the first active layer 130_1 through a contact hole formed by removing a second portion of the gate insulating layer 150 and the interlayer insulating layer 190. The second source electrode 210_2 can be connected to the source region of the second active layer 130_2 through a contact hole formed by removing a third portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the second drain electrode 230_2 can be connected to the drain region of the second active layer 130_2 through a contact hole formed by removing a fourth portion of the gate insulating layer 150 and the interlayer insulating layer 190. The third source electrode 210_3 can be connected to the source region of the third active layer 130_3 through a contact hole formed by removing a fifth portion of the gate insulating layer 150 and the interlayer insulating layer 190, and the third drain electrode 230_3 can be connected to the drain region of the third active layer 130_3 through a contact hole formed by removing a sixth portion of the gate insulating layer 150 and the interlayer insulating layer 190. Each of the first to third source electrodes 210_1, 210_2, and 210_3, and the first to third drain electrodes 230_1, 230_2, and 230_3, can be formed of a metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material. These can be used individually or in combination with each other. The first to third source electrodes 210_1, 210_2, and 210_3, and the first to third drain electrodes 230_1, 230_2, and 230_3 can be formed simultaneously on the same layer using the same material.

[0174] Therefore, a first semiconductor element 250_1 can be formed, including a first active layer 130_1, a first gate electrode 170_1, a first source electrode 210_1, and a first drain electrode 230_1; a second semiconductor element 250_2 can be formed, including a second active layer 130_2, a second gate electrode 170_2, a second source electrode 210_2, and a second drain electrode 230_2; and a third semiconductor element 250_3 can be formed, including a third active layer 130_3, a third gate electrode 170_3, a third source electrode 210_3, and a third drain electrode 230_3.

[0175] refer to Figure 10A planarization layer 270 can be formed on the interlayer insulating layer 190 and the first to third semiconductor elements 250_1, 250_2, and 250_3. The planarization layer 270 can have a relatively thick thickness to sufficiently cover the first to third source electrodes 210_1, 210_2, and 210_3 and the first to third drain electrodes 230_1, 230_2, and 230_3 on the interlayer insulating layer 190. The planarization layer 270 can have a substantially flat top surface. To achieve such a flat top surface, a planarization process can be further performed on the planarization layer 270. The planarization layer 270 can be formed of an organic material.

[0176] The first to third lower electrodes 290_1, 290_2, and 290_3 can be formed on the planarization layer 270 and can be spaced apart from each other. For example... Figure 4 As shown, the first pixel electrode 290a can have a circular shape, the second pixel electrode 290b can have a rectangular shape, and the third pixel electrode 290c can have a circular shape. The area of ​​each of the first pixel electrode 290a and the third pixel electrode 290c can be larger than the area of ​​the second pixel electrode 290b. The first to third lower electrodes 290_1, 290_2, and 290_3 can pass through the planarization layer 270 to be connected to the first to third drain electrodes 230_1, 230_2, and 230_3, respectively. Each of the first to third lower electrodes 290_1, 290_2, and 290_3 can be formed of metal, alloy, metal nitride, conductive metal oxide, or transparent conductive material, etc. For example, each of the first to third lower electrodes 290_1, 290_2, and 290_3 may include Au, Ag, Al, Pt, Ni, Ti, Pd, Mg, Ca, Li, Cr, Ta, W, Cu, Mo, Sc, Nd, Ir, aluminum-containing alloys, and AlN. x Silver alloy, WN x Copper alloys, molybdenum alloys, TiN x CrN x TaN x 、SrRu x O y ZnO x ITO, SnO x InO x GaO x Or IZO, etc. These can be used individually or in combination with each other. The first to third lower electrodes 290_1, 290_2 and 290_3 can be formed simultaneously on the same layer using the same material.

[0177] refer to Figure 3 , Figure 4 and Figure 11 The pixel defining layer 310 may be formed on a portion of each of the first to third lower electrodes 290_1, 290_2, and 290_3 and on the planarization layer 270. The pixel defining layer 310 may cover two sides (e.g., outer peripheries) of the first to third lower electrodes 290_1, 290_2, and 290_3, and may expose a portion of the top surface of each of the first to third lower electrodes 290_1, 290_2, and 290_3. The pixel defining layer 310 may have a first circular opening 310a, a rectangular opening 310b, and a second circular opening 310c that respectively expose portions of the top surfaces of the first to third lower electrodes 290_1, 290_2, and 290_3. The first circular opening 310a may have a circular shape, the rectangular opening 310b may have a rectangular shape, and the second circular opening 310c may have a circular shape. The area of ​​each of the first circular opening 310a and the second circular opening 310c may be larger than the area of ​​the rectangular opening 310b. The pixel defining layer 310 may be formed of an organic insulating material. The pixel defining layer 310 may include photoresist, polyacrylic resin, polyimide resin, polyamide resin, siloxane resin, acrylic resin, or epoxy resin, etc.

[0178] refer to Figure 12 The light-emitting layer 330 can be formed on the first lower electrode to the third lower electrode 290_1, 290_2, and 290_3 exposed by the pixel defining layer 310. The light-emitting layer 330 can be formed continuously (or integrally) on the first substrate 110. The light-emitting layer 330 can be formed of a light-emitting material for emitting blue light. The light-emitting layer 330 can be formed by stacking multiple light-emitting materials used to generate different colors of light, such as red, green, and blue, to emit white light overall.

[0179] The upper electrode 340 can be formed in the display area 10 on the pixel defining layer 310 and the light-emitting layer 330. The upper electrode 340 can be formed of metal, alloy, metal nitride, conductive metal oxide or transparent conductive material, etc. These can be used alone or in combination with each other.

[0180] Therefore, a first sub-pixel structure including a first lower electrode 290_1, a light-emitting layer 330, and an upper electrode 340 can be formed; a second sub-pixel structure including a second lower electrode 290_2, a light-emitting layer 330, and an upper electrode 340 can be formed; and a third sub-pixel structure including a third lower electrode 290_3, a light-emitting layer 330, and an upper electrode 340 can be formed. A pixel structure 200 including a first lower electrode 290_1, a second lower electrode 290_2, a third lower electrode 290_3, a light-emitting layer 330, and an upper electrode 340 can be formed.

[0181] A first inorganic thin-film encapsulation layer 451 may be formed on the upper electrode 340. The first inorganic thin-film encapsulation layer 451 may be formed with a uniform thickness along the contour of the upper electrode 340 to cover the upper electrode 340. The first inorganic thin-film encapsulation layer 451 may be formed of a flexible inorganic insulating material.

[0182] The organic thin-film encapsulation layer 452 can be formed on the first inorganic thin-film encapsulation layer 451. The organic thin-film encapsulation layer 452 can be formed of a flexible organic insulating material.

[0183] The second inorganic thin-film encapsulation layer 453 can be formed on the organic thin-film encapsulation layer 452. The second inorganic thin-film encapsulation layer 453 can be formed with a uniform thickness along the contour of the organic thin-film encapsulation layer 452 to cover the organic thin-film encapsulation layer 452. The second inorganic thin-film encapsulation layer 453 can be formed of a flexible inorganic insulating material.

[0184] Therefore, a thin-film encapsulation structure 450 comprising a first inorganic thin-film encapsulation layer 451, an organic thin-film encapsulation layer 452, and a second inorganic thin-film encapsulation layer 453 can be formed, and a lower structure 500 comprising a first substrate 110, a first semiconductor element 250_1, a second semiconductor element 250_2, a third semiconductor element 250_3, a gate insulating layer 150, an interlayer insulating layer 190, a planarization layer 270, a pixel structure 200, a pixel defining layer 310, and the thin-film encapsulation structure 450 can be provided.

[0185] refer to Figure 13 A second substrate 410 may be provided. The second substrate 410 and the first substrate 110 may comprise substantially the same material. The second substrate 410 may be or include a quartz substrate, a synthetic quartz substrate, a calcium fluoride substrate, a fluorine-doped quartz substrate, a soda-lime glass substrate, or an alkali-free glass substrate, etc.

[0186] The second color filter 512 can be formed on the bottom surface of the second substrate 410. The second color filter 512 can have openings 512a and 512b. The second color filter 512 can transmit blue light and can be a blue color filter.

[0187] refer to Figure 14 The first color filter 511 can be formed on the bottom surface of the second substrate 410 and below the second color filter 512. The first color filter 511 can have openings 511a and 511b. The first color filter 511 can transmit red light and can be a color filter with a red color.

[0188] refer to Figure 15The third color filter 513 can be formed on the bottom surface of the second substrate 410 and below the first color filter 511. The third color filter 513 can have a first opening exposing the opening 511b of the first color filter 511 and a second opening below the first color filter 511 exposing a portion of the bottom surface of the first color filter 511. The third color filter 513 can transmit red light and can be a color filter with a red color.

[0189] Therefore, a color filter 510 can be formed, comprising a first color filter 511, a second color filter 512, and a third color filter 513. The opening 512a of the second color filter 512 and the second opening of the third color filter 513 are defined as the first opening 510a of the color filter 510, the opening 511b of the first color filter 511 and the first opening of the third color filter 513 are defined as the second opening 510b of the color filter 510, and the opening 512b of the second color filter 512 and the opening 511a of the first color filter 511 are defined as the third opening 510c of the color filter 510. The first opening 510a may have a fourth width a2, the second opening 510b may have a fifth width b2, and the third opening 510c may have a sixth width c2. The fourth width a2 may be greater than the fifth width b2, and the sixth width c2 may be greater than the fifth width b2. The color filter 510 can be formed from a photosensitive resin or a color photoresist.

[0190] refer to Figure 5 and Figure 16 A second protective insulating layer 490 may be formed beneath the color filter 510. The second protective insulating layer 490 may cover the color filter 510 on the bottom surface of the second substrate 410. The second protective insulating layer 490 may be formed with a uniform thickness along the contour of the color filter 510 to cover the color filter 510 on the bottom surface of the second substrate 410. The second protective insulating layer 490 may sufficiently cover the color filter 510 on the bottom surface of the second substrate 410 and may have a substantially flat top surface without creating steps around the color filter 510. The second protective insulating layer 490 may be formed of an inorganic insulating material such as silicon nitride.

[0191] A light-blocking member 420 may be formed on the bottom surface of the second protective insulating layer 490. The light-blocking member 420 may have a first opening 420a, a second opening 420b, and a third opening 420c. The first opening 420a may be circular, the second opening 420b may be rectangular, and the third opening 420c may be circular. The area of ​​each of the first opening 420a and the third opening 420c may be larger than the area of ​​the second opening 420b. The light-blocking member 420 may have a planar shape including the first opening 420a, the second opening 420b, and the third opening 420c. The first opening 510a, the second opening 510b, and the third opening 510c of the color filter 510 may overlap with the first opening 420a, the second opening 420b, and the third opening 420c of the light-blocking member 420, respectively. The first opening 420a may have a first width a1, the second opening 420b may have a second width b1, and the third opening 420c may have a third width c1. The first width a1 can be greater than the second width b1, and the third width c1 can be greater than the second width b1.

[0192] The light-blocking component 420 may be formed of organic materials such as photoresists, polyacrylic resins, polyimide resins, polyamide resins, siloxane resins, acrylic resins, or epoxy resins. The light-blocking component 420 may be substantially opaque. The light-blocking component 420 may further include a light-blocking material for absorbing light. The light-blocking material may include carbon black, titanium oxynitride, titanium black, phenylene black, aniline black, anthocyanin black, aniline black acid black, or black resin, etc.

[0193] refer to Figure 17 The first filter 531 can be formed on the bottom surface of the second protective insulating layer 490 and in the first opening 420a of the light-blocking member 420. Since the first filter 531 is formed in the first opening 420a, which has a circular shape, the first filter 531 can also have a circular shape. The first filter 531 can overlap with the first color filter 511. The first filter 531 can convert blue light into red light. The first filter 531 can include a plurality of quantum dots configured to absorb blue light and emit red light. The first filter 531 can be formed using an inkjet process.

[0194] refer to Figure 18The third filter 533 can be formed on the bottom surface of the second protective insulating layer 490 and in the third opening 420c of the light-blocking member 420. Since the third filter 533 is formed in the third opening 420c, which has a circular shape, the third filter 533 can also have a circular shape. The third filter 533 can overlap with the third color filter 513. The third filter 533 can convert blue light into green light. The third filter 533 may include a plurality of quantum dots configured to absorb blue light and emit green light. The third filter 533 can be formed using an inkjet process.

[0195] The quantum dots included in each of the first filter 531 and the third filter 533 may be formed from one of the following nanocrystals: silicon (Si) nanocrystals, group II-VI compound semiconductor nanocrystals, group III-V compound semiconductor nanocrystals and group IV-VI compound semiconductor nanocrystals, or a mixture of some of the above materials.

[0196] A first protective insulating layer 495 may be formed beneath a portion of the second protective insulating layer 490, the first filter 531, the third filter 533, and the light-blocking member 420. The first protective insulating layer 495 may cover the first filter 531, the third filter 533, and the light-blocking member 420 on the bottom surface of the second protective insulating layer 490. The second protective insulating layer 490 and the first protective insulating layer 495 may be spaced apart from each of the first filter 531 and the third filter 533, and the second protective insulating layer 490 and the first protective insulating layer 495 may contact each other through a second opening 420b. The first protective insulating layer 495 may be formed with a uniform thickness along the contour of the first filter 531, the third filter 533, and the light-blocking member 420 to cover the first filter 531, the third filter 533, and the light-blocking member 420 on the bottom surface of the second protective insulating layer 490. The first protective insulating layer 495 may be formed of an inorganic insulating material such as silicon nitride.

[0197] refer to Figure 19The second filter 532 can be formed on the bottom surface of the first protective insulating layer 495 and in the second opening 420b of the light-blocking member 420. Since the second filter 532 is formed in the second opening 420b, which has a rectangular shape, the second filter 532 can also have a rectangular shape. The area of ​​the second filter 532 can be smaller than the area of ​​each of the first filter 531 and the third filter 533. The second filter 532 can overlap with the second color filter 512. The second filter 532 can be spaced apart from each of the first filter 531 and the third filter 533 by the light-blocking member 420. The second filter 532 can transmit blue light. The second filter 532 may include a scattering material that emits blue light without significant color change. The second filter 532 may not include quantum dots.

[0198] The second filter 532 can be formed using a photolithography process utilizing a negative photoresist. The second filter 532 can be formed by forming a negative photoresist over the entire area of ​​the bottom surface of the first protective insulating layer 495 and then irradiating a portion of the negative photoresist with light. The bottom surface of the second filter 532 can be aligned with the lowest surface of the first protective insulating layer 495. Therefore, the horizontal plane of the bottom surface of the second filter 532 may not be coplanar with either the horizontal plane of the bottom surface of the first filter 531 or the horizontal plane of the bottom surface of the third filter 533.

[0199] The second filter 532 can be formed from TiO, ZrO, AlO3, In2O3, ZnO, SnO2, Sb2O3 or ITO, etc.

[0200] Therefore, a filter 530 can be formed that includes a first filter 531, a second filter 532, and a third filter 533.

[0201] Intermediate layer 497 may be formed beneath the first protective insulating layer 495 and the second filter 532. Intermediate layer 497 may be formed on the bottom surface of the first protective insulating layer 495 to cover the second filter 532. Intermediate layer 497 may have a relatively thick thickness to fully cover the second filter 532 on the bottom surface of the first protective insulating layer 495. Intermediate layer 497 may be formed of organic insulating material or inorganic insulating material, etc.

[0202] Therefore, an upper structure 600 can be provided, comprising a second protective insulating layer 490, a first protective insulating layer 495, a filter 530, an intermediate layer 497, a color filter 510, a light blocking member 420, and a second substrate 410.

[0203] A sealing member may be formed in a peripheral region 20 on the first substrate 110. A sealing member may also be formed in a peripheral region 20 on the second substrate 410. The sealing member may be formed of a non-conductive material. The sealing member may include glass frit, etc. The sealing member may additionally include a photocurable material. The sealing member may include a mixture of organic materials and photocurable materials. The photocurable material included in the sealing member may include epoxy acrylate resins, polyester acrylate resins, polyurethane acrylate resins, polybutadiene acrylate resins, silicone acrylate resins, or alkyl acrylate resins, etc.

[0204] refer to Figure 8 and Figure 20 After the sealing member is formed, the bottom surface of the second substrate 410 can contact the sealing member. The lower structure 500 and the upper structure 600 can be coupled to each other.

[0205] Then, ultraviolet light, laser light, or visible light can be irradiated onto the sealing member. Laser light can be irradiated onto the sealing member. When irradiated with laser light, the mixture can change from a solid state to a liquid state, and the liquid mixture can solidify into a solid state after a predetermined time. The second substrate 410 can be coupled to the first substrate 110 and can be sealed relative to the first substrate 110 according to the state change of the mixture.

[0206] Therefore, it is possible to manufacture Figures 1 to 8 The display device 100 shown is shown.

[0207] In the manufacturing method of the display device 100, the first opening 510a, the second opening 510b, and the third opening 510c can be defined by a portion of a first color filter 511, a portion of a second color filter 512, and a portion of a third color filter 513 respectively formed on two sides of each of the first opening 510a, the second opening 510b, and the third opening 510c. In other words, since a portion of the first color filter 511, a portion of the second color filter 512, and a portion of the third color filter 513 are respectively formed on two sides of each of the first opening 510a, the second opening 510b, and the third opening 510c to define the first opening 510a, the second opening 510b, and the third opening 510c, it is not necessary to add a light-blocking pattern defining the first opening 510a, the second opening 510b, and the third opening 510c to the display device 100 according to the present invention. Therefore, the manufacturing cost of the display device 100 can be reduced.

[0208] Furthermore, since the width of each of the portions of the first color filter 511, the second color filter 512, and the third color filter 513 formed on the two sides of each of the first opening 510a, the second opening 510b, and the third opening 510c is relatively wider than the width of the light-blocking pattern, the process allowance of the light-blocking member 420 can be relatively increased. Therefore, process defects of the light-blocking member 420 can be minimized or substantially prevented.

[0209] By using a photolithography process that utilizes a relatively inexpensive negative photoresist to form the second filter 532, the manufacturing cost of the display device 100 can be minimized.

[0210] Figure 21 This is a cross-sectional view of the display device according to an embodiment. Except for the shape of the second filter 532, Figure 21 The display device 700 shown may have the same characteristics as the reference. Figures 1 to 8 The structure of the described display device 100 is substantially the same as or similar to that of the device.

[0211] refer to Figure 21 The display device 700 may include a lower structure 500 and an upper structure 600.

[0212] The lower structure 500 may include a first substrate 110, a first semiconductor element 250_1, a second semiconductor element 250_2, a third semiconductor element 250_3, a gate insulating layer 150, an interlayer insulating layer 190, a planarization layer 270, a pixel structure 200, a pixel limiting layer 310, and a thin film encapsulation structure 450, etc.

[0213] The upper structure 600 may include a first protective insulating layer 495, a second protective insulating layer 490, a filter 530, an intermediate layer 497, a color filter 510, a light-blocking member 420, and a second substrate 410, etc. The filter 530 may include a first filter 531, a second filter 532, and a third filter 533. The color filter 510 may include a first color filter 511, a second color filter 512, and a third color filter 513.

[0214] The second filter 532 can be disposed on the bottom surface of the first protective insulating layer 495 and in the second opening 420b of the light-blocking member 420. The second filter 532 can be disposed on the pixel structure 200 to overlap with the second pixel electrode 290b. (See reference) Figure 6Since the second filter 532 is disposed in the second opening 420b having a rectangular shape, the second filter 532 can also have a rectangular shape. The area of ​​the second filter 532 can be smaller than the area of ​​each of the first filter 531 and the third filter 533. The second filter 532 can overlap with the second color filter 512. The second filter 532 can be spaced apart from each of the first filter 531 and the third filter 533 by the light-blocking portion of the light-blocking member 420. The second filter 532 can transmit blue light. The second filter 532 can include a scattering material that emits blue light without significant color change. The second filter 532 may not include quantum dots. Each of the first filter 531 and the third filter 533 may further include a scattering material.

[0215] Since the second filter 532 is disposed on the bottom surface of the first protective insulating layer 495, the top surface of the second filter 532 may not be coplanar with either the top surface of the first filter 531 or the top surface of the third filter 533.

[0216] A portion of the second filter 532 can be disposed on the bottom surface of the light-blocking member 420. The second filter 532 can be formed using a photolithography process utilizing a negative photoresist. The second filter 532 can be formed by forming a negative photoresist over the entire area of ​​the bottom surface of the first protective insulating layer 495 and then irradiating a portion of the negative photoresist with light. In this case, light can be irradiated over a relatively wide area, allowing a portion of the second filter 532 to be formed on the bottom surface of the light-blocking member 420. The level of the bottom surface of the second filter 532 can differ from the level of the bottom surface of the first filter 531 and the bottom surface of the third filter 533. The bottom surface of the second filter 532 can be closer to the top surface of the thin-film encapsulation structure 450 than each of the bottom surfaces of the first filter 531 and the third filter 533.

[0217] The second filter 532 may include TiO, ZrO, AlO3, In2O3, ZnO, SnO2, Sb2O3, or ITO, etc.

[0218] Figure 22 This is a cross-sectional view of the display device according to an embodiment. Except for the shape of the second filter 532, Figure 22 The display device 800 shown may have the same characteristics as the reference. Figures 1 to 8 The structure of the described display device 100 is substantially the same as or similar to that of the device.

[0219] refer to Figure 22 The display device 800 may include a lower structure 500 and an upper structure 600.

[0220] The lower structure 500 may include a first substrate 110, a first semiconductor element 250_1, a second semiconductor element 250_2, a third semiconductor element 250_3, a gate insulating layer 150, an interlayer insulating layer 190, a planarization layer 270, a pixel structure 200, a pixel limiting layer 310, and a thin film encapsulation structure 450, etc.

[0221] The upper structure 600 may include a first protective insulating layer 495, a second protective insulating layer 490, a filter 530, an intermediate layer 497, a color filter 510, and a second substrate 410, etc. The filter 530 may include a first filter 531, a second filter 532, and a third filter 533. The color filter 510 may include a first color filter 511, a second color filter 512, and a third color filter 513.

[0222] A first filter 531 may be disposed on the bottom surface of the second protective insulating layer 490 and in the first opening 510a of the color filter 510. The first filter 531 may be disposed on the pixel structure 200 to overlap with the first pixel electrode 290a. The first filter 531 may have a circular shape. The first filter 531 may overlap with the first color filter 511. The first filter 531 may be spaced apart from each of the second filter 532 and the third filter 533. The first filter 531 can convert blue light into red light. The first filter 531 may include a plurality of quantum dots configured to absorb blue light and emit red light.

[0223] The third filter 533 can be disposed on the bottom surface of the second protective insulating layer 490 and in the third opening 510c of the color filter 510. The third filter 533 can be disposed on the pixel structure 200 to overlap with the third pixel electrode 290c. The third filter 533 can have a circular shape. The third filter 533 can overlap with the third color filter 513. The third filter 533 can be spaced apart from each of the first filter 531 and the second filter 532. The third filter 533 can convert blue light into green light. The third filter 533 may include a plurality of quantum dots configured to absorb blue light and emit green light.

[0224] A first protective insulating layer 495 may be disposed below the first filter 531, the third filter 533, and the second protective insulating layer 490. The first protective insulating layer 495 may cover the first filter 531 and the third filter 533 on the bottom surface of the second protective insulating layer 490. The first protective insulating layer 495 may contact the second protective insulating layer 490 in the space between the first filter 531 and the third filter 533, and the second protective insulating layer 490 and the first protective insulating layer 495 may contact each other through the second opening 510b of the color filter 510. The first protective insulating layer 495 may be disposed with a uniform thickness along the contours of the first filter 531 and the third filter 533 to cover the first filter 531 and the third filter 533 on the bottom surface of the second protective insulating layer 490. The first protective insulating layer 495 may comprise an inorganic insulating material such as silicon nitride.

[0225] The second filter 532 can be disposed on the bottom surface of the first protective insulating layer 495 and in the second opening 510b of the color filter 510. The second filter 532 can be disposed on the pixel structure 200 to overlap with the second pixel electrode 290b. The second filter 532 can cover each of the two sides of the first filter 531 and each of the two sides of the third filter 533, and can have openings that respectively expose a portion of the first filter 531 and a portion of the third filter 533. Light emitted from the light-emitting layer 330 can enter each of the first filter 531 and the third filter 533 through the openings. The second filter 532 can also be disposed in the space between the first filter 531 and the third filter 533. The second filter 532 can also perform... Figure 8 The light-blocking component 420 functions as described above. The second filter 532 may overlap with the second color filter 512. The second filter 532 may transmit blue light. The second filter 532 may include a scattering material that emits blue light without significant color change. The second filter 532 may not include quantum dots. Each of the first filter 531 and the third filter 533 may further include a scattering material.

[0226] Since the second filter 532 is disposed on the bottom surface of the first protective insulating layer 495, the first protective insulating layer 495 can be disposed on a layer different from the layers of each of the first filter 531 and the third filter 533. The level of the bottom surface of the second filter 532 can be different from the level of the bottom surface of the first filter 531 and the bottom surface of the third filter 533. Compared with the bottom surfaces of each of the first filter 531 and the third filter 533, the bottom surface of the second filter 532 can be closer to the top surface of the thin-film encapsulation structure 450.

[0227] The second filter 532 may include TiO, ZrO, AlO3, In2O3, ZnO, SnO2, Sb2O3, or ITO, etc.

[0228] Because the display device 800 includes a first filter 531 and a third filter 533, both having circular shapes, a relatively small amount of light emitted from the light-emitting layer 330 can be blocked. Advantageously, the display device 800 can have high light transmittance.

[0229] Figures 23 to 28 This is a cross-sectional view showing a structure formed in a method of manufacturing a display device according to an embodiment. Figures 23 to 28 The manufacturing method of the display device shown can have the same characteristics as the reference. Figures 9 to 20 The steps in the manufacturing method of the described display device are substantially the same or similar.

[0230] refer to Figure 15 and Figure 23 A first filter 531 may be formed on the bottom surface of the second protective insulating layer 490 and in the first opening 510a of the color filter layer 510. The first filter 531 may have a circular shape. The first filter 531 may overlap with the first color filter 511. The first filter 531 can convert blue light into red light. The first filter 531 may include a plurality of quantum dots configured to absorb blue light and emit red light. The first filter 531 may be formed by using a photolithography process utilizing a negative photoresist. The first filter 531 may be formed by forming a negative photoresist over the entire area of ​​the bottom surface of the second protective insulating layer 490 and irradiating a portion of the negative photoresist with light.

[0231] refer to Figure 24 The third filter 533 can be formed on the bottom surface of the second protective insulating layer 490 and in the third opening 510c of the color filter 510. The third filter 533 can have a circular shape. The third filter 533 can overlap with the third color filter 513. The third filter 533 can be spaced apart from the first filter 531 in the first direction D1. The third filter 533 can convert blue light into green light. The third filter 533 can include a plurality of quantum dots configured to absorb blue light and emit green light. The third filter 533 can be formed by using a photolithography process utilizing a negative photoresist. The third filter 533 can be formed by forming a negative photoresist over the entire area of ​​the bottom surface of the second protective insulating layer 490 and irradiating a portion of the negative photoresist with light.

[0232] refer to Figure 25A first protective insulating layer 495 may be formed beneath the first filter 531, the third filter 533, and the second protective insulating layer 490. The first protective insulating layer 495 may cover the first filter 531 and the third filter 533 on the bottom surface of the second protective insulating layer 490. The first protective insulating layer 495 may contact the second protective insulating layer 490 in the space between the first filter 531 and the third filter 533, and the second protective insulating layer 490 and the first protective insulating layer 495 may contact each other through the second opening 510b of the color filter 510. The first protective insulating layer 495 may be formed with a uniform thickness along the contours of the first filter 531 and the third filter 533 to cover the first filter 531 and the third filter 533 on the bottom surface of the second protective insulating layer 490. The first protective insulating layer 495 may be formed of an inorganic insulating material such as silicon nitride.

[0233] The negative photoresist 534 can be formed over the entire area of ​​the bottom surface of the first protective insulating layer 495. After the negative photoresist 534 is formed, a portion of the negative photoresist 534 can be irradiated with light.

[0234] refer to Figure 26 The second filter 532 may be formed on the bottom surface of the first protective insulating layer 495 and in the second opening 510b of the color filter 510. The second filter 532 may cover each of the two sides of the first filter 531 and each of the two sides of the third filter 533, and may have openings that respectively expose a portion of the first filter 531 and a portion of the third filter 533. The second filter 532 may also be formed in the space between the first filter 531 and the third filter 533. The second filter 532 may overlap with the second color filter 512. The second filter 532 may transmit blue light. The second filter 532 may include a scattering material that emits blue light without significant color change. The second filter 532 may not include quantum dots.

[0235] Therefore, a filter 530 can be formed that includes a first filter 531, a second filter 532, and a third filter 533.

[0236] refer to Figure 27 An intermediate layer 497 may be formed beneath the first protective insulating layer 495 and the second filter 532. The intermediate layer 497 may be formed on the bottom surface of the first protective insulating layer 495 to cover the second filter 532. The intermediate layer 497 may have a relatively thick thickness to fully cover the second filter 532 on the bottom surface of the first protective insulating layer 495. The intermediate layer 497 may be formed of an organic insulating material or an inorganic insulating material, etc.

[0237] Therefore, an upper structure 600 can be provided, comprising a second protective insulating layer 490, a first protective insulating layer 495, a filter 530, an intermediate layer 497, a color filter 510, and a second substrate 410.

[0238] A sealing member may be formed in a peripheral region 20 on the first substrate 110. A sealing member may also be formed in a peripheral region 20 on the second substrate 410. The sealing member may be formed of a non-conductive material. The sealing member may include glass frit, etc. The sealing member may additionally include a photocurable material. The sealing member may include a mixture of organic materials and photocurable materials. The photocurable material included in the sealing member may include epoxy acrylate resins, polyester acrylate resins, polyurethane acrylate resins, polybutadiene acrylate resins, silicone acrylate resins, or alkyl acrylate resins, etc.

[0239] refer to Figure 22 and Figure 28 After the sealing member is formed, the bottom surface of the second substrate 410 can contact the sealing member. The lower structure 500 and the upper structure 600 can be coupled to each other.

[0240] Then, ultraviolet light, laser light, or visible light can be irradiated onto the sealing member. Laser light can be irradiated onto the sealing member. When irradiated with laser light, the mixture can change from a solid state to a liquid state, and the liquid mixture can solidify into a solid state after a predetermined time. The second substrate 410 can be coupled to the first substrate 110 and can be sealed relative to the first substrate 110 according to the state change of the mixture.

[0241] Therefore, it is possible to manufacture Figure 22 The display device 800 shown is shown.

[0242] In the manufacturing method of the display device 800, the manufacturing cost of the display device 800 can be reduced by using a photolithography process that utilizes a relatively inexpensive negative photoresist to form the filter 530.

[0243] In addition, when with Figure 8 Compared to the display device 100, the light-blocking member 420 is not formed, which allows for a further reduction in the manufacturing cost of the display device 800.

[0244] Figure 29 This is a perspective view of the display device according to an embodiment, and Figure 30 It is shown in Figure 29 A plan view of the pixel-defining layer included in a display device. Figure 31 It is shown that in Figure 29 A plan view of the pixel defining layer and pixel electrodes in a display device, showing their overlapping state. Figure 32 It is shown in Figure 29 A plan view of the light-blocking component included in the display device. Figure 33 It is shown that in Figure 29 A plan view of the light-blocking component, the first filter, the second filter, and the third filter included in the display device, showing their overlapping states. Figure 34 It is shown Figure 32 A magnified plan view of region 'B'.

[0245] Apart from the shape of the opening in the pixel limiting layer 310, the shape of the pixel electrodes 290a, 290b and 290c, the shape of the opening in the light blocking member 420 and the shape of the filter 530, Figures 29 to 34 The display device 900 shown may have the same characteristics as the reference. Figures 1 to 8 The structure of the described display device 100 is substantially the same as or similar to that of the device.

[0246] refer to Figure 29 , Figure 30 , Figure 31 , Figure 32 and Figure 33 The display device 900 may include a lower structure 500 and an upper structure 600. The lower structure 500 and the upper structure 600 may be in direct contact with each other and may be hermetically coupled to each other through a sealing member disposed on the outermost periphery of the display device 900.

[0247] like Figure 30 and Figure 31 As shown, the lower structure 500 may include a first substrate 110, a pixel defining layer 310, a first pixel electrode 290a, a second pixel electrode 290b, and a third pixel electrode 290c. The first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c may be disposed on the first substrate 110, and the pixel defining layer 310 may overlap a portion of each of the first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c. The pixel defining layer 310 may have an opening that exposes a portion of each of the first pixel electrode 290a, the second pixel electrode 290b, and the third pixel electrode 290c. The pixel defining layer 310 may include a first polygonal opening 310a, a rectangular opening 310b, and a second polygonal opening 310c. The first polygonal opening 310a may expose a portion of the first pixel electrode 290a, the rectangular opening 310b may expose a portion of the second pixel electrode 290b, and the second polygonal opening 310c may expose a portion of the third pixel electrode 290c.

[0248] In the plan view of the display device 900, each of the first pixel electrode 290a and the third pixel electrode 290c may have a polygonal shape, and the second pixel electrode 290b may have a rectangular shape. The polygon may include a polygon that is centrally symmetric about the polygon or substantially close to a circle (e.g., a regular octagon, etc.).

[0249] One of the first pixel electrode 290a and the third pixel electrode 290c may have the shape of a first polygon, and the remaining one may have the shape of a second polygon different from the first polygon. One of the first pixel electrode 290a and the third pixel electrode 290c may have a polygonal shape, and the remaining one may have a rectangular shape.

[0250] like Figure 32 and Figure 33 As shown, the upper structure 600 may include a second substrate 410, a light-blocking member 420, and a filter 530 (including a first filter 531, a second filter 532, and a third filter 533). The light-blocking member 420 may be disposed on the bottom surface of the second substrate 410, and the light-blocking member 420 may include a first opening 420a, a second opening 420b, and a third opening 420c.

[0251] In a plan view of the display device 900 (or viewed from a direction perpendicular to the top surface of the second substrate 410), each of the first opening 420a and the third opening 420c may have a polygonal shape, and the second opening 420b may have a rectangular shape. A first filter 531 may be disposed in the first opening 420a, a second filter 532 may be disposed in the second opening 420b, and a third filter 533 may be disposed in the third opening 420c. Since each of the first opening 420a and the third opening 420c has a polygonal shape, and the second opening 420b has a rectangular shape, each of the first filter 531 and the third filter 533 may also have a polygonal shape, and the second filter 532 may also have a rectangular shape. The polygon may include a polygon that is centrally symmetric about a polygonal point or substantially close to a circle (e.g., a regular octagon, etc.).

[0252] The first opening 420a, the second opening 420b, and the third opening 420c can overlap (or correspond to) the first polygonal opening 310a, the rectangular opening 310b, and the second polygonal opening 310c, respectively, and the dimensions of the first opening 420a, the second opening 420b, and the third opening 420c can be larger than the dimensions of the first polygonal opening 310a, the rectangular opening 310b, and the second polygonal opening 310c, respectively.

[0253] The light-emitting layer can be disposed in the first polygonal opening 310a, the rectangular opening 310b and the second polygonal opening 310c of the pixel limiting layer, and the light emitted from the light-emitting layer can pass through the filter 530 disposed in each of the first opening 420a, the second opening 420b and the third opening 420c of the light blocking member 420 to be emitted to the outside of the display device 900.

[0254] One of the first opening 420a and the third opening 420c may have the shape of a first polygon, and the remaining one may have the shape of a second polygon, which is different from the first polygon. One of the first opening 420a and the third opening 420c may have a polygonal shape, and the remaining one may have a rectangular shape.

[0255] One of the first filter 531 and the third filter 533 may have the shape of a first polygon, and the remaining one may have the shape of a second polygon, which is different from the first polygon. One of the first filter 531 and the third filter 533 may have a polygonal shape, and the remaining one may have a rectangular shape.

[0256] refer to Figure 8 , Figure 15 , Figure 16 and Figure 34 The first opening 420a may have a first width a1, the second opening 420b may have a second width b1, and the third opening 420c may have a third width c1. The first width a1 may be greater than the second width b1, and the third width c1 may be greater than the second width b1. The first width a1 may be greater than the third width c1. The first width a1 may be approximately 113 micrometers, the second width b1 may be approximately 38 micrometers, and the third width c1 may be approximately 109 micrometers. The spacing d3 from the first opening 420a to the third opening 420c may be approximately 20 micrometers, the spacing d4 from the first opening 420a to the second opening 420b may be approximately 22 micrometers, and the spacing from the third opening 420c to the second opening 420c may be approximately 22 micrometers.

[0257] The first opening 510a may have a fourth width a2, the second opening 510b may have a fifth width b2, and the third opening 510c may have a sixth width c2. The fourth width a2 may be greater than the fifth width b2, and the sixth width c2 may be greater than the fifth width b2. The fourth width a2 may be approximately 77 micrometers, the fifth width b2 may be approximately 38 micrometers, and the sixth width c2 may be approximately 73 micrometers. The distance d1 from the first opening 510a to the third opening 510c may be approximately 56 micrometers, the distance from the first opening 510a to the second opening 510b may be approximately 40 micrometers, and the distance from the third opening 510c to the second opening 510b may be approximately 40 micrometers.

[0258] Since the display device 900 includes a first filter 531 and a third filter 533 having a substantially near-circular polygonal shape, the perimeter of the near-circular polygon with a predetermined area is shorter than that of a symmetrical polygon. This results in a relatively small light loss due to the light-blocking member 420 (where the first filter 531 and the third filter 533 are respectively disposed in the first opening 420a and the third opening 430c) having a substantially near-circular polygonal shape. A relatively small amount of light emitted from the light-emitting layer 330 can be blocked by the light-blocking member 420. Advantageously, the display device 900 can have high light transmittance.

[0259] The embodiments can be applied to various electronic devices.

[0260] While exemplary embodiments have been described, many modifications are possible within these exemplary embodiments. Therefore, it is intended that all such modifications be included within the scope defined by the claims.

Claims

1. A display device, comprising: First transistor; Second transistor; Third transistor; The first electrode is electrically connected to the first transistor; The second electrode is electrically connected to the second transistor; The third electrode is electrically connected to the third transistor; A first filter overlaps with the first electrode and has a first circular perimeter in the plan view of the display device; The second filter overlaps with the second electrode, has a polygonal perimeter in the plan view of the display device, and is spaced apart from the first filter; as well as A third filter overlaps with the third electrode, is spaced apart from each of the first and second filters, and has a second circular perimeter in the plan view of the display device. The second filter is configured to transmit a first light of a first color. The first filter is configured to convert the second light of the first color into light of the second color. The third filter is configured to convert the third light of the first color into light of the third color, and The first color, the second color, and the third color are different from each other.

2. The display device according to claim 1, wherein, In the plan view of the display device, the area of ​​the first filter is larger than the area of ​​the second filter.

3. The display device according to claim 1 or 2, wherein, In the plan view of the display device, the area of ​​the third filter is larger than the area of ​​the second filter.

4. The display device according to claim 1, further comprising: A light-emitting layer, overlapping each of the first electrode and the second electrode, is disposed between the first electrode and the first filter, and between the second electrode and the second filter; as well as A common electrode, overlapping the light-emitting layer, is disposed between the light-emitting layer and the first filter, and also between the light-emitting layer and the second filter. The first electrode, the second electrode, the light-emitting layer, and the common electrode are defined as a pixel structure, and the pixel structure is configured to emit a fourth light of the first color.

5. The display device according to claim 4, wherein, In the plan view of the display device, the first electrode has a circular boundary, and In the plan view of the display device, the second electrode has a polygonal boundary.

6. The display device according to claim 5, wherein, In the plan view of the display device, the first circular perimeter surrounds the circular boundary, and The perimeter of the polygon surrounds the boundary of the polygon.

7. The display device according to claim 6, wherein, In the plan view of the display device, the area of ​​the first electrode is larger than the area of ​​the second electrode.

8. The display device according to claim 1 or 2, further comprising: A light-blocking component, including at least one opening. Wherein, at least one of the first filter and the second filter is at least partially disposed inside the at least one opening.

9. The display device according to claim 8, wherein, The at least one opening includes a first opening and a second opening. Wherein, the first filter is at least partially disposed inside the first opening, and The second filter is at least partially disposed inside the second opening.

10. The display device according to claim 9, wherein, In the plan view of the display device, the area of ​​the first opening is larger than the area of ​​the second opening.

11. The display device according to claim 9, wherein, The light-blocking component includes a light-blocking portion placed between the first opening and the second opening, and A portion of the second filter is disposed outside the second opening and overlaps with the light-blocking portion.

12. The display device according to claim 9, further comprising: First substrate, Each of the first filter and the second filter overlaps with the first substrate. Wherein, the surface of the first filter faces the first substrate, and The second filter faces the first substrate and is placed closer to the first substrate than the face of the first filter.

13. The display device according to claim 9, further comprising: A first substrate, wherein each of the first filter and the second filter overlaps with the first substrate; and A first protective insulating layer, wherein the surface of the light-blocking member faces the first substrate and is in direct contact with the first protective insulating layer.

14. The display device according to claim 13, wherein, A portion of the first protective insulating layer is disposed between the first filter and the first substrate, and directly contacts the first filter. Wherein, the first protective insulating layer is not disposed between the second filter and the first substrate, and in the direction perpendicular to the first substrate, a portion of the first protective insulating layer overlaps with the second filter.

15. The display device according to claim 13, wherein, The first protective insulating layer is partially disposed inside the second opening.

16. The display device according to claim 15, further comprising: The second substrate overlaps with each of the first filter and the second filter; A first color filter is disposed between the second substrate and the first color filter; as well as The second color filter is disposed between the second substrate and the second filter.

17. The display device according to claim 16, wherein, The second color filter overlaps with the second light filter and includes the first color filter opening. Wherein, the first color filter opening exposes a portion of the second substrate, and The portion of the second substrate overlaps with the first filter.

18. The display device according to claim 17, wherein, The first color filter is partially disposed inside the first color filter opening, and includes a second color filter opening. The second color filter opening exposes a portion of the second color filter, and The portion of the second color filter is disposed between the opening of the second color filter and the second substrate.

19. The display device according to claim 18, further comprising: A second protective insulating layer is disposed between the first color filter and the first optical filter, and also between the second color filter and the second optical filter.

20. The display device according to claim 19, wherein, The first portion of the first protective insulating layer and the first portion of the second protective insulating layer overlap each other and are spaced apart by the first filter. The second portion of the first protective insulating layer and the second portion of the second protective insulating layer are in direct contact with each other and are located between the second color filter and the second light filter.

21. The display device according to claim 1 or 2, wherein, The first filter is formed using an inkjet printing process, and The second filter is formed using a photolithography process.

Images