Exposure light source, light irradiation device, exposure device, and exposure method

Abstract

To provide an exposure light source, a light irradiation apparatus, an exposure apparatus, and an exposure method, by which an initiator-containing resist can be more uniformly exposed by not only irradiating light of a longer wavelength but also sufficiently irradiating light of a shorter wavelength. An exposure light source (12) is composed of a first light source (20) having an LED (30) and a second light source (22) composed of a light source (32) that radiates light of a wavelength shorter than that of LED light radiated from the LED (30) in the first light source (20).

Description

Technical Field

[0001] This invention relates to an exposure light source, an exposure apparatus, and an exposure method primarily used for exposure in semiconductor manufacturing. Background Technology

[0002] Traditionally, exposure equipment used in semiconductor manufacturing and other applications has employed one or more large mercury lamps rated at 12kW as light sources. However, when an exposure equipment uses a limited number of mercury lamps, even a single lamp failing to illuminate can immediately result in insufficient light, forcing the exposure equipment to shut down. Consequently, exposure equipment using large mercury lamps presents challenges in terms of production continuity.

[0003] Furthermore, in the event of a large mercury lamp breaking, depending on the magnitude of the impact, even optical system components such as reflectors or mirrors may be damaged, potentially resulting in high repair costs, including replacement fees.

[0004] To avoid such problems, in recent years, multi-lamp systems have been practically implemented, which arrange a large number (e.g., 240) of smaller discharge lamps (e.g., 300W) into a single light source. By forming a multi-lamp system as described above, even if multiple discharge lamps are not lit, the overall light output of the device can be prevented from decreasing significantly, thus avoiding continuous production stoppages caused by the cessation of exposure equipment.

[0005] Furthermore, even in the unlikely event that a small discharge lamp breaks, the impact is relatively small, thus reducing the likelihood of damage to even the optical system components.

[0006] Because of these advantages, most of the exposure equipment used in the production of color filters for LCD panels currently uses multi-lamp exposure equipment. Existing technical documents Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2020-43012 Summary of the Invention The problem that the invention aims to solve

[0008] Thus, when pursuing continuous production based on exposure equipment, a longer lifespan for the light source is required in order to reduce the frequency of light source replacement.

[0009] As one method to extend the lifespan of light sources, there is the method of extending the lifespan of discharge lamps, which can be extended from the previous average lifespan of 1250 hours to 1900 hours.

[0010] As another method to extend the lifespan of light sources, the use of LEDs (light-emitting diodes) can be considered. Since LEDs have a very long average lifespan of 20,000 to 30,000 hours, the frequency of light source replacement is obviously reduced dramatically by using LEDs as the light source.

[0011] However, light emitted from existing discharge lamps exhibits a spectral dispersion characteristic with peaks across multiple wavelength regions, while light emitted from LEDs exhibits a single-wavelength spectral dispersion characteristic with a peak at only one specific wavelength. Therefore, when manufacturing liquid crystal panels or similar devices using resists with exposure sensitivity characteristics matching those of discharge lamps, it is necessary to mix multiple LEDs emitting light of different wavelengths to achieve the same exposure characteristics as discharge lamps by utilizing LEDs that emit light of a single wavelength.

[0012] In particular, based on the reasons why discharge lamps have been used as the light source for exposure so far, light with shorter wavelengths (e.g., 302nm or 313nm) plays an important role as follows.

[0013] Exposure to the photoresist is performed by irradiating the photoresist coated on the glass substrate with ultraviolet light through a mask corresponding to the formation. However, irradiating only with ultraviolet light will preferentially initiate the reaction from the side closest to the surface of the photoresist, resulting in uneven reaction. To avoid this unevenness, an "initiator" that initiates the reaction with light of shorter wavelengths (e.g., 302 nm or 313 nm) that can easily penetrate the interior of the photoresist is uniformly dispersed throughout the photoresist, thereby ensuring uniform exposure of the entire photoresist.

[0014] However, it is known that when it is possible to use LEDs for practical applications such as discharge lamps which have peaks in multiple wavelength regions, it is difficult to change the type of light source from discharge lamps to LEDs, even if only LEDs that emit light of different wavelengths are mixed together.

[0015] In other words, while LEDs can emit the necessary amount of light for longer wavelengths (e.g., 365nm), LEDs capable of fully emitting shorter wavelengths (e.g., 302nm or 313nm) have not yet been developed. For instance, currently, the amount of light emitted by LEDs emitting shorter wavelengths (e.g., 365nm) is only about 1 / 10 of that emitted by LEDs emitting 365nm light. Therefore, when multiple LEDs emitting different wavelengths are mixed together, the amount of shorter wavelength light is reduced, making it difficult to uniformly expose the resist containing the "initiator."

[0016] The present invention was made in view of the above-mentioned problems, and its object is to provide an exposure light source, a light irradiation device, an exposure device and an exposure method, which can expose the photoresist containing the initiator more uniformly by irradiating not only light with a longer wavelength but also light with a shorter wavelength. Methods for solving problems

[0017] According to one aspect of the present invention, an exposure light source is provided, comprising: The first light source has an LED; and The second light source is composed of a light source that emits light with a wavelength shorter than that of the LED light emitted from the LED in the first light source.

[0018] Preferably, the light from the second light source supplements the amount of light in the insufficient wavelength region of the light from the first light source.

[0019] According to another aspect of the present invention, a light irradiation device is provided, comprising: The aforementioned light source for exposure; and The optical system apparatus includes at least an integrating lens that guides light from the first light source and the second light source to the exposure surface. During the emission of light from the first light source, the second light source is located at a position deviating from the optical path of the optical system. When the second light source emits light, the second light source illuminates the integrating lens alone.

[0020] According to another aspect of the present invention, a light irradiation device is provided, comprising: The aforementioned light source for exposure; and The optical system apparatus includes at least an integrating lens that guides light from the first light source and the second light source to the exposure surface. The first light source is located at a position deviating from the optical path of the optical system apparatus. The second light source is located in the optical path of the optical system device. When the first light source emits light, the first light source illuminates the integrating lens alone.

[0021] According to another aspect of the present invention, a light irradiation device is provided, comprising: The aforementioned light source for exposure; and The optical system guides light from the first and second light sources to the exposure surface. During the emission of light from the first light source, the second light source is located at a position deviating from the optical path of the optical system. When the second light source emits light, the second light source directly and alone illuminates the exposure surface.

[0022] According to another aspect of the present invention, a light irradiation device is provided, comprising: The aforementioned light source for exposure; and The optical system guides light from the first and second light sources to the exposure surface. During the emission of light from the first light source, the second light source is located at a position deviating from the optical path of the optical system. When the second light source emits light, the second light source replaces the first light source and is located in the optical path of the optical system device.

[0023] According to another aspect of the present invention, an exposure apparatus is provided which includes the above-described light irradiation device.

[0024] According to another aspect of the present invention, an exposure method is provided, comprising the following processing: Prepare a first light source having LEDs and a second light source consisting of a light source that emits light with a wavelength shorter than the wavelength of the LED light emitted from the first light source. Depending on the properties of the photoresist being exposed, the photoresist undergoes a photoreaction using LED light from the first light source or light from the second light source.

[0025] According to another aspect of the present invention, an exposure method is provided, comprising the following processing: Prepare a first light source having LEDs and a second light source consisting of a light source that emits light with a wavelength shorter than the wavelength of the LED light emitted from the first light source. The resist is then irradiated with light of the wavelength required to induce a photoreaction in the resist, using light from the second light source. The photoresist is subjected to a photoreaction using light from the first light source. Invention Effects

[0026] According to the light source for exposure of the present invention, since the light quantity in the insufficient wavelength region of the LED light from the first light source having an LED is supplemented by light emitted from the second light source with a wavelength shorter than that of the LED light, not only the longer wavelength LED light is irradiated, but also the shorter wavelength light is fully irradiated, thereby enabling the resist containing the initiator to be exposed more uniformly. Attached Figure Description

[0027] Figure 1 This is a diagram showing the application of the light irradiation device 10 of the present invention. Figure 2This is a graph showing the relationship between the sensitivity characteristics of the resist applied to the workpiece and the spectral characteristics of light emitted from an existing mercury lamp. Figure 3 This is a graph showing the relationship between the sensitivity characteristics of the resist applied to the workpiece and the spectroscopic characteristics of the light emitted from the exposure light source 12. Figure 4 This is a graph showing the relationship between the sensitivity characteristics of the resist applied to the workpiece and the spectroscopic characteristics of the light emitted from the exposure light source 12. Figure 5 This is a graph showing the relationship between the sensitivity characteristics of the resist applied to the workpiece and the spectroscopic characteristics of the light emitted from the exposure light source 12. Figure 6 This is a diagram showing the light irradiation device 10 involved in Modification Example 1. Figure 7 This is a diagram showing the light irradiation device 10 involved in Modification Example 2. Figure 8 This is a diagram showing the light irradiation device 10 involved in Modification Example 3. Figure 9 This is a diagram showing the light irradiation device 10 involved in Modification Example 7. Figure 10 This is a diagram showing the light irradiation device 10 involved in Modification Example 8. Detailed Implementation

[0028] (Structure of the light irradiation device 10) The light irradiation apparatus 10 according to an embodiment of the present invention will be described below. The light irradiation apparatus 10 is mainly assembled into an exposure apparatus for use during the exposure process in manufacturing liquid crystal panels. For example... Figure 1 As shown, the light irradiation device 10 generally includes an exposure light source 12 and an optical system device 14.

[0029] The exposure light source 12 is a component that irradiates the exposure surface A of a workpiece (exposed object) X coated with photoresist with exposure light L. In this embodiment, it includes a first light source 20 and a second light source 22. Alternatively, the exposure light source 12 may be composed of three or more light sources (e.g., a third light source or a fourth light source).

[0030] The first light source 20 is a light source in which multiple LEDs 30 are arranged in an array, and the wavelength of the light emitted by these LEDs 30 (LED light) has a peak value of, for example, 365 nm. The number of LEDs 30 constituting the first light source 20 is not particularly limited, and the first light source 20 may also be constituted by a single LED 30.

[0031] In addition, the radiation angle of the light emitted from the first light source 20 is not particularly limited. It can be light within a specified angle, parallelized light, or focused light.

[0032] The second light source 22 is arranged with multiple light sources 32, which emit light to supplement the light in wavelength regions (mainly wavelength regions shorter than LED light) that are insufficient for the light from the first light source 20 (LED light). In addition, the number of light sources 32 constituting the second light source 22 is not particularly limited, and the second light source 22 may also be constituted by a single light source 32.

[0033] Furthermore, the type of light source 32 is not particularly limited. For example, it can be an LED, just like the first light source 20, or it can be a long-life discharge lamp (or a multi-lamp type), a strip discharge lamp, or a laser-emitting lamp. In the case of a discharge lamp, the short wavelength range required to initiate the material reaction can be fully output, thus reducing the power consumption of the light source 32 used by the second light source 22. Even with a discharge lamp, a lifespan comparable to that of an LED can be ensured. However, the output of longer wavelengths for photoreaction requires a certain amount of light and cannot be used with the first light source 20.

[0034] In addition, the radiation angle of the light emitted from the second light source 22 is not particularly limited. It can be light within a specified angle, parallelized light, or focused light.

[0035] A specific example of the wavelength region of light emitted from the second light source 22 will be given. First, a graph showing the relationship between the sensitivity characteristics of the resist applied to the workpiece and the spectral characteristics of light emitted from a conventional mercury lamp will be presented. Figure 2 .

[0036] When observing the spectroscopic characteristics of existing mercury lamps, it can be seen that peaks exist at, for example, 436nm, 405nm, 365nm, 334nm, 313nm and 302nm.

[0037] Furthermore, the exposure of color filters in LCD panels typically requires approximately 20 mw / cm. 2 Up to 70mw / cm 2 With the exposure surface illuminance managed at a wavelength of 365nm, even when using existing mercury lamps to expose the resist, the amount of light at wavelengths shorter than 313nm or 302nm is also output to the level required for resist exposure, thus enabling resist exposure without problems.

[0038] Secondly, focusing on LEDs, in recent years, LEDs capable of emitting ultraviolet light have also been made with higher output. Even short wavelengths, as long as they are below 365nm, can achieve an illuminance of 20mw / cm² on the exposure surface, as mentioned above. 2 Up to 70mw / cm 2 However, as Figure 3 As shown, the spectral characteristics of light emitted from an LED (LED light) are different from those of a mercury lamp. In most cases, it has a single peak (e.g., only 365nm). If you want to expose the resist at multiple wavelengths, you need to use other types of light sources to supplement the wavelengths that cannot be covered by one type of LED.

[0039] However, LEDs capable of sufficiently emitting light with shorter wavelengths (e.g., 302nm, 313nm, or 340nm) have not yet been developed. For example, currently, the light output of LEDs emitting shorter wavelengths compared to LEDs emitting 365nm light is only about 1 / 10 of that of LEDs emitting 365nm light. Therefore, it is difficult to configure the first light source 20 with a number of LEDs emitting short-wavelength light to supplement only a small amount of light.

[0040] Therefore, by preparing a second light source 22 that can fully illuminate the shorter wavelength light, the resist can be exposed more evenly.

[0041] Figure 3 The examples illustrate the use of a second light source 22 to supplement light with wavelengths of 302 nm, 313 nm, and 340 nm, respectively. However, the wavelength of the light supplemented by the second light source 22 is not particularly limited; for example, in... Figure 4 In the process, a second light source 22 is used to supplement light with wavelengths of 254nm, 280nm, and 308nm respectively. Additionally, in... Figure 5 The text shows the use of... Figures 2 to 4 Compared to the case of a photoresist with spectral intensity characteristics on the long wavelength side, the first light source 20 emits light with wavelengths of 365 nm and 405 nm, while the second light source 22 supplements the light with wavelengths of 308 nm and 340 nm, respectively. Thus, light with multiple peak wavelengths can also be emitted from the first light source 20 as needed.

[0042] return Figure 1 The optical system device 14 is an assembly of components for guiding light from the first light source 20 and the second light source 22 to the exposure surface A. In this embodiment, an integrating lens 40, a first reflecting mirror 42 for guiding light from the first light source 20 or the second light source 22 to the integrating lens 40, a parallelizing mirror 44 for parallelizing light from the integrating lens 40, and a second reflecting mirror 46 for guiding the parallelized light to the exposure surface A are used.

[0043] In this embodiment, the position of the first light source 20 is fixed relative to the optical system apparatus 14. The light emitted from the first light source 20 is guided to the integrating lens 40 by a first reflecting mirror 42 composed of two mirrors. Then, the light from the integrating lens 40 is reflected by the parallelizing mirror 44 and the second reflecting mirror 46 and illuminates the exposure surface A.

[0044] In addition, the second light source 22 is installed on the light source moving device 48 that moves the position of the second light source 22 relative to the optical system device 14. During the emission of light by the first light source 20, the second light source 22 is located at a position deviating from the optical path of the optical system device 14. Conversely, when the second light source 22 emits light, the second light source 22 moves to a position that can directly illuminate the integrating lens 40.

[0045] That is, in this embodiment, regarding the optical path up to the integrating lens 40, the first light source 20 illuminates the integrating lens 40 via the first reflecting mirror 42, but the second light source 22 illuminates the integrating lens 40 independently without passing through the first reflecting mirror 42. For the optical path of the light exiting the integrating lens 40, the light from the first light source 20 and the light from the second light source 22 are the same.

[0046] Furthermore, throughout this specification, the term "isolated illumination" is defined as follows: it includes not only cases where light from the first light source 20 or the second light source 22 directly illuminates the integrating lens 40 (e.g., using the light source moving device 48 to move the first light source 20 or the second light source 22 to a necessary position on the optical path of the optical system device 14 when necessary, or fixing the first light source 20 or the second light source 22 to directly illuminate the integrating lens 40 without using the light source moving device 48), but also cases where the integrating lens 40 is illuminated by a mirror or optical filter other than the optical system device 14 (e.g., a filter that allows light of wavelength from the first light source 20 to pass through and light of wavelength from the second light source 22 to reflect).

[0047] (The exposure sequence of the exposure light source 12 and the light irradiation device 10 involved in this embodiment) The exposure sequence of the exposure light source 12 and the light irradiation device 10 will be briefly explained. First, the second light source 22 is lit, and the integrating lens 40 is irradiated by the light from the second light source 22. The light is then used to irradiate the resist with light of the wavelength required to induce a photoreaction in the workpiece X.

[0048] When the necessary amount of light irradiation ends, the second light source 22 is extinguished. With the second light source 22 positioned off the optical path from the optical system device 14, the first light source 20 located on the optical path of the optical system device 14 is illuminated. Then, the integrating lens 40 is irradiated with light from the first light source 20, and the photoresist reaction is carried out using this light to complete the exposure.

[0049] (The effect of the exposure light source 12 and the light irradiation device 10 involved in this embodiment) According to the exposure light source 12 and light irradiation device 10 of this embodiment, since the light from the second light source 22 with a wavelength shorter than that of the LED light is used to supplement the light amount in the wavelength region that is insufficient for the LED light from the first light source 20 with LED 30, not only is the longer wavelength LED light irradiated, but the shorter wavelength light is also fully irradiated, thereby enabling the photoresist containing the initiator to be exposed more uniformly.

[0050] (Variation Example 1) In the above embodiment, the first light source 20 is located on the optical path of the optical system device 14 (the position where the integrating lens 40 is illuminated via the first reflecting mirror 42), and the second light source 22, located at a position offset from this optical path, illuminates the integrating lens 40 independently. However, it can also be as follows: Figure 6 As shown, the positions of the first light source 20 and the second light source 22 are reversed, so that the second light source 22 is located in the optical path of the optical system device 14, and the first light source 20, located at a position deviated from the optical path, illuminates the integrating lens 40 alone.

[0051] (Variation Example 2) Furthermore, in the above embodiment, the second light source 22, located at a position offset from the optical path of the optical system device 14, illuminates the integrating lens 40 independently, but it can also be as follows: Figure 7 As shown, the light from the second light source 22 does not pass through the optical path of the optical system device 14, but directly illuminates the exposure surface A independently. Furthermore, in Figure 7 In this configuration, the first light source 20 is positioned to illuminate the integrating lens 40 via the first reflecting mirror 42. Alternatively, the first light source 20 can be positioned to directly illuminate the integrating lens 40.

[0052] Furthermore, the positions of the first light source 20 and the second light source 22 in this modified example can be reversed, so that the second light source 22 is located in the optical path of the optical system device 14 (the position where it illuminates the integrating lens 40 via the first reflecting mirror 42), and the first light source 20, located at a position deviated from this optical path, directly and independently illuminates the exposure surface A. When the first light source 20 is thus positioned to directly and independently illuminate the exposure surface A, the second light source 22 can be positioned to illuminate the integrating lens 40 via the first reflecting mirror 42, or it can be positioned to directly illuminate the integrating lens 40.

[0053] (Variation Example 3) Furthermore, in the above embodiment, a light source moving device 48 is installed on the second light source 22. When the second light source 22 emits light, it moves to a position where it can directly illuminate the integrating lens 40. However, it can also be as follows: Figure 8 As shown, a light source moving device 48 is also installed on the first light source 20. When the first light source 20 emits light, it is located at a position that can directly illuminate the integrating lens 40. The second light source 22 is located at a position that deviates from the optical path of the optical system device 14. When the second light source 22 emits light, the first light source 20 moves to a position that deviates from the optical path of the optical system device 14, and the second light source 22 moves to a position that can directly illuminate the integrating lens 40.

[0054] In addition, Figure 8 In this case, the first light source 20 and the second light source 22 are moved to positions that can directly illuminate the integrating lens 40. Alternatively, the first light source 20 and the second light source 22 can be moved to positions that can illuminate the integrating lens 40 via the first reflecting mirror 42 or positions that can directly illuminate the exposure surface A.

[0055] Furthermore, in the case of the manner described in this modified example 3, it is preferable to set the distance between each light source 20, 22 and the integrating lens 40 to be 10 mm or more and 100 mm or less, and to make the divergence angle Z of the light emitted from each light source 20, 22 20° or less.

[0056] Moreover, in Figure 8 The first light source 20 and the second light source 22 are depicted as separate from each other, but of course, the first light source 20 and the second light source 22 can also be integrated into one.

[0057] (Variation Example 4) Furthermore, in the above embodiment, as the exposure sequence of the exposure light source 12 and the light irradiation device 10, firstly, light from the second light source 22 is used to irradiate the resist with light of the wavelength required to induce a photoreaction in the workpiece X. Then, light from the first light source 20 is used to induce a photoreaction in the resist to complete the exposure. However, it is also possible to first irradiate the resist with light from the first light source 20 and then irradiate the resist with light from the second light source 22. As long as there is no interference with the light from the other light source, the first light source 20 and the second light source 22 can be lit simultaneously to expose the resist using light from both light sources.

[0058] (Variation Example 5) Furthermore, the wavelengths of the light from the first light source 20 and the light from the second light source 22 may overlap in at least a portion of one of them. For example, when the peak wavelength of the light from the first light source 20 is 365 nm, the peak wavelengths of the light from the second light source 22 may be 365 nm and 340 nm. More specifically, when the peak wavelengths of the light from the first light source 20 are 365 nm and 308 nm, the peak wavelengths of the light from the second light source 22 may be 340 nm and 308 nm.

[0059] (Variation Example 6) Furthermore, the first light source 20 and the second light source 20 only need to have different average wavelengths of the light emitted from each. Here, the term "average wavelength" can refer to either of the following two cases, but it can be the average wavelength under either condition. Of course, when using three or more light sources (e.g., a third or fourth light source), it is preferable that the average wavelengths of the light from each of the light sources 20 and 22 do not overlap.

[0060] The first case involves using the arithmetic mean of the peak wavelengths, regardless of the number of LEDs 30 or light sources 32 constituting each light source 20 or 22. For example, if the first light source 20 is composed of two LEDs 30 with a peak wavelength of 365 nm and four LEDs 30 with a peak wavelength of 340 nm, then in this first case, (365 nm + 340 nm) ÷ 2 = 352.5 nm becomes the average wavelength.

[0061] The second approach is to take into account the number of LEDs 30 or light sources 32 constituting each light source 20, 22 and set the peak wavelength as an arithmetic average. For example, similarly, in the case where the first light source 20 is composed of two LEDs 30 with a peak wavelength of 365nm and four LEDs 30 with a peak wavelength of 340nm, in this second case, (365nm×2+340nm×4)÷6=348.3nm becomes the average wavelength.

[0062] (Variation Example 7) Furthermore, regarding the aforementioned variation 3, for example, as... Figure 9 As shown, by integrating the first light source 20, the second light source 22, and the third light source 23 into a single unit and mounting them on the light source moving device 48, it is possible not only to use the light of the average wavelength of each of the light sources 20, 22, and 23 to illuminate the integrating lens 40, but also to illuminate the integrating lens 40 in a state where light from the first light source 20 and light from the second light source 22 are mixed, or in a state where light from the second light source 22 and light from the third light source 23 are mixed. Figure 9 The diagram shows the state in which the integrating lens 40 is illuminated by a mixture of light from the first light source 20 and light from the second light source 22. That is, the average wavelength of the light illuminating the integrating lens 40 can be of more types than the number of light sources.

[0063] (Variation Example 8) Furthermore, in variation 7, multiple light sources 20, 22, and 23 are arranged in a row and formed as a single unit, but as... Figure 10 As shown, the light source moving device 48 can also be formed in the shape of a disk, and multiple light sources 20, 22, and 23 can be arranged at positions symmetrical with respect to the center C of the light source moving device 48. By rotating the light source moving device 48, the light sources 20, 22, and 23 located in the optical path of the optical system device 14 can be selected, and the integrating lens 40 can be illuminated using the light of the average wavelength of each light source 20, 22, and 23. Of course, as described above, the integrating lens 40 can also be illuminated in a state where light from the first light source 20 and light from the second light source 22 are mixed, or in a state where light from the second light source 22 and light from the third light source 23 are mixed.

[0064] (Variation Example 9) Alternatively, one of the photoresists in workpiece X may not be irradiated with LED light from the first light source 20 and light from the second light source 22, but workpiece X coated with a certain photoresist may be irradiated with LED light from the first light source 20, and workpiece X coated with other types of photoresists may be irradiated with light from the second light source 22.

[0065] For example, for resist A, a second light source 22 with a single wavelength of 365 nm or a mixture of multiple wavelengths with a peak at 365 nm is used; for another resist B, a first light source 20 with a single wavelength of 380 nm or a mixture of multiple wavelengths with a peak at 380 nm is used; and for another resist C, a light source (e.g., a third light source) with a single wavelength of 405 nm or a mixture of multiple wavelengths with a peak at 405 nm is used.

[0066] Of course, in the case of this variation 9, the device structure described in the above embodiments and various variations can also be used.

[0067] The embodiments disclosed herein should be considered illustrative in all respects, not limiting. The scope of the invention is not shown by the foregoing description, but by the claims, and is intended to include all modifications within the meaning and scope equivalent to the claims. Symbol Explanation

[0068] 10…Light Irradiation Device 12… Exposure light source, 14… Optical system equipment 20…First light source, 22…Second light source, 23…Third light source 30…LED, 32…(the second light source 22) light source 40…Integrating lens, 42…First reflecting mirror, 4…Parsing mirror, 46…Second reflecting mirror, 48…Light source moving device X…workpiece (object to be exposed), A…exposure surface, L…exposure light.

Claims

1. A light irradiation device, comprising an exposure light source, an optical path, and a light source moving device. The exposure light source comprises: a first light source having a plurality of LEDs; and a second light source consisting of a plurality of light sources emitting light with wavelengths shorter than the wavelengths of the LED light emitted from the plurality of LEDs in the first light source, and independent of the first light source. The light from the second light source supplements the amount of light in the insufficient wavelength regions of the light from the first light source. The optical path guides light from the first light source and / or the second light source to the exposure surface. The light source moving device moves at least one of the first light source and the second light source. In one exposure process, when the second light source emits light, the light source moving device moves the second light source, which was located at a position deviated from the optical path during the emission of the first light source, to a position on the optical path closer to the exposure surface than the first light source, or... In one exposure process, when the second light source emits light, the light source moving device moves the second light source, which was located at a position deviated from the light path during the emission of the first light source, to a position on the light path at the same distance from the exposure surface as the first light source.

2. The light irradiation device according to claim 1, wherein, The light source moving device causes the second light source to move in a straight line.

3. The light irradiation device according to claim 1, wherein, The light source moving device causes the second light source point to move symmetrically.

4. A light irradiation device, comprising an exposure light source, an optical path, and a light source moving device. The exposure light source comprises: a first light source having a plurality of LEDs; and a second light source consisting of a plurality of light sources emitting light with wavelengths shorter than the wavelengths of the LED light emitted from the plurality of LEDs in the first light source, and independent of the first light source. The light from the second light source supplements the amount of light in the insufficient wavelength regions of the light from the first light source. The optical path guides light from the first light source and / or the second light source to the exposure surface. The light source moving device causes at least one of the first light source and the second light source to move. In one exposure process, when the first light source emits light, the light source moving device moves the first light source, which was located at a position deviated from the optical path during the emission of the second light source, to a position on the optical path closer to the exposure surface than the second light source, or... In one exposure process, when the first light source emits light, the light source moving device moves the first light source, which is located at a position deviated from the light path during the emission of the second light source, to a position on the light path at the same distance from the exposure surface as the second light source.

5. The light irradiation device according to claim 4, wherein, The light source moving device causes the first light source to move in a straight line.

6. The light irradiation device according to claim 4, wherein, The light source moving device causes the first light source point to move symmetrically.

7. An exposure apparatus comprising the light irradiation apparatus of claim 1 or 4.

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