Semiconductor process apparatus and method of controlling the same

By designing wind pressure detection components with high-pressure and low-pressure detection ports in semiconductor process equipment and combining them with fan power adjustment, the problem of low wind pressure detection accuracy was solved, achieving higher detection accuracy and process stability.

CN114242619BActive Publication Date: 2025-11-11BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Application Number
CN202111524293.X
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2021-12-14
Publication Date
2025-11-11
Estimated Expiration
2041-12-14

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Abstract

This invention discloses a semiconductor process equipment and its control method, relating to the field of semiconductor manufacturing technology. The semiconductor process equipment includes at least one lamp box, a process gas circulation pipeline, and at least one wind pressure detection component corresponding to each lamp box. The lamp box has a lamp cavity and an air inlet and an air outlet communicating with the lamp cavity. The first end of the process gas circulation pipeline is connected to the air inlet, and the second end of the process gas circulation pipeline is connected to the air outlet. The process gas circulation pipeline is provided with a first detection port. The wind pressure detection component includes a high-pressure detection port and a low-pressure detection port. The high-pressure detection port is connected to the corresponding lamp cavity interior, and the low-pressure detection port is connected to the first detection port. This solution can solve the problem of low wind pressure detection accuracy within semiconductor process equipment.
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Citation Information

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