Mold member for processing amorphous alloy sheet and method for processing amorphous alloy sheet

Abstract

Provided is a mold member for processing of an amorphous alloy sheet and a method for processing of an amorphous alloy sheet, for shearing or breaking processing of an amorphous alloy sheet, capable of improving wear of a blade and increasing the life. The mold member has a base material formed of a metal and a hard metal compound, a hard coating film formed on a region for processing on the surface of the base material, the hard coating film having a first hard layer containing Ti, Si, and N. The hard coating film can also be multilayered, and a second hard layer can sometimes be present between the first hard layer and the base material. The metal compound of the base material can have tungsten carbide as a main component.

Description

Technical Field

[0001] This invention relates to mold components for processing amorphous alloy sheets and a method for processing amorphous alloy sheets. Background Technology

[0002] Rotary motors used in electric and hybrid vehicles require efficient operation by minimizing losses from high-frequency alternating magnetic flux due to high-speed rotation to ensure optimal output. While progress has been made in increasing the efficiency of rotary motors through the use of inverters, the application of rare-earth magnets, and optimized structural design, further improvements in efficiency require reducing iron losses in the multilayer cores used for the magnetic poles. Therefore, there is a growing demand for low-loss magnetic materials such as amorphous alloys, Fe crystalline phases with micro-bcc structures, FeSi crystalline phases, and amorphous nanocrystalline soft magnetic alloys to replace the silicon steel sheets currently used in multilayer cores.

[0003] As amorphous alloys, Fe-Si-B series soft magnetic alloys are known to be used to prepare amorphous ribbons by ultra-rapid cooling of molten metal of a predetermined composition through methods such as single-roll quenching. Metglas (registered trademark) 2605HB1M, 2605SA1, and Fe-Si-B-Cr series 2605SA3, manufactured by METGLAS Inc., are all commercially available products.

[0004] In addition, nanocrystalline soft magnetic alloys are materials obtained by heat-treating amorphous thin strips similar to amorphous alloys, causing the precipitation of Fe crystalline and FeSi crystalline phases (nanocrystallineization). Examples include, for instance, the Fe-Si-B-Cu-Nb based Finemet (registered trademark) FT-3M manufactured by Hitachi Metals Corporation, the VITROPERM (registered trademark) 800 manufactured by VACUUM SCHMELZE GmbH & Co. KG, and the Fe-B-Zr-Cu based MAGNETEC-GESELLSCHAFT. NANOPERM (registered trademark) is manufactured by MAGNETTECHNOLOGIE MBH.

[0005] Any type of material, typically supplied in the form of long strips with a thickness of ten to tens of μm, is also referred to as a strip, shred, film, or foil. In the following description, in addition to such single-layer strips, multilayer materials obtained by stacking multiple layers of strips, composite materials containing adhesive layers, and multilayer materials with other materials such as electromagnetic steel sheets are collectively referred to as amorphous alloy sheets.

[0006] Amorphous alloys are generally known to be ideal elasto-plastic materials that do not induce strain hardening, possessing high plastic deformation energy and toughness. However, they are clearly difficult to elongate under uniaxial stress conditions, such as tensile tests. Amorphous alloy sheets with these properties are very hard and have poor machinability compared to crystalline silicon steel sheets, which is the main reason for their limited application in laminated iron cores where the sheets need to be machined into predetermined shapes.

[0007] Against this backdrop, various processing techniques are being researched to obtain thin plates and iron cores of predetermined shapes from amorphous alloy sheets. One such technique involves punching holes using a stamping device consisting of a punch and a die. However, existing die components suffer from issues such as wear and chipping of the cutting edges, leading to frequent edge maintenance and die component replacement, resulting in low productivity and hindering its application in mass production.

[0008] The wear of the die-cutting edge is presumably caused by fatigue damage due to repeated impacts and shearing processes, as well as friction with the sheared sheet metal. As a countermeasure, hard films such as DLC (Diamond-Like Carbon), AlCrN, CrN, and TiN are formed on the cutting edge. Patent Document 1 discloses a punching die-cutting component with a hard film containing Al, Cr, and N on its surface.

[0009] Existing technical documents

[0010] Patent documents

[0011] Patent Document 1: Japanese Patent Application Publication No. 2018-164936 Summary of the Invention

[0012] The problem that the invention aims to solve

[0013] However, the mold component in Patent Document 1 is made of a material suitable for punching electromagnetic soft iron. In the punching of amorphous alloy plates, there is still room for improvement in the wear of the cutting edge. It is also desirable to improve the mold component with other hard films formed on it.

[0014] Therefore, the present invention aims to provide a mold part that improves the cutting edge wear and extends the service life during shearing or fracture processing of amorphous alloy sheets, and also to provide a method for processing amorphous alloy sheets that improves the cutting edge wear and extends the service life of the mold part.

[0015] Methods for solving problems

[0016] The mold component of the present invention is a mold component for shearing or fracture processing of amorphous alloy plates. The mold component has a substrate formed of metal and hard metal compounds and a hard film formed on its surface for the processing area. The hard film has a first hard layer containing Ti, Si and N.

[0017] In this invention, preferably, the hard film is multilayered, and a second hard layer containing Ti, Al, and N is further provided between the first hard layer and the substrate.

[0018] In addition, in this invention, preferably, the metal compound is mainly composed of tungsten carbide with an average particle size of less than 5 μm.

[0019] In addition, in this invention, preferably, the mold component has a punch portion and a die portion having a hole for inserting the punch portion, and the hard film is formed on the portion of the punch portion into the die portion.

[0020] In addition, in this invention, preferably, the side of the punch portion has a portion with a hard film formed and a portion without a hard film formed, and at least the portion inserted into the die portion has a hard film formed.

[0021] In addition, in this invention, preferably, the hard film is not formed on the surface of the punch that contacts the amorphous alloy plate.

[0022] In addition, in this invention, preferably, the hard film is formed on the surface of the hole in the concave die portion that is inserted into the convex die portion.

[0023] In addition, in this invention, preferably, the surface of the hole in the concave mold portion has a portion where the hard film is not formed.

[0024] Furthermore, the processing method of the amorphous alloy sheet of the present invention is a processing method for punching amorphous alloy sheet disposed in the die portion using a die component having a punch portion and a die portion having a hole for inserting the punch portion. The punch portion has a substrate formed of metal and a hard metal compound and a hard film formed on its surface. The hard film has a first hard layer containing Ti, Si and N. The hard film is formed in the portion of the punch portion that is inserted into the die portion.

[0025] In this invention, preferably, the side of the punch portion has a portion with a hard film formed and a portion without a hard film formed, and at least the portion inserted into the die portion has a hard film formed.

[0026] In addition, in this invention, preferably, the hard film is not formed on the surface of the punch that contacts the amorphous alloy plate.

[0027] In addition, in this invention, preferably, the concave die portion has a substrate formed of metal and hard metal compound and a hard film formed on its surface, the hard film having a first hard layer containing Ti, Si and N, and the hard film is formed on the surface of the hole in the concave die portion into which the convex die portion is inserted.

[0028] In addition, in this invention, preferably, the surface of the hole in the concave mold portion has a portion where the hard film is not formed.

[0029] In addition, in this invention, preferably, the hard film is multilayered, and a second hard layer containing Ti, Al, and N is further provided between the first hard layer and the substrate.

[0030] In addition, in this invention, preferably, the metal compound is mainly composed of tungsten carbide with an average particle size of less than 5 μm.

[0031] Invention Effects

[0032] According to the present invention, a mold component in which the wear of the cutting edge is improved and the service life is extended during shearing or fracture processing of amorphous alloy sheets can be provided. Furthermore, a method for processing amorphous alloy sheets in which the wear of the cutting edge of the mold component is improved and the service life is extended can be provided. Attached Figure Description

[0033] Figure 1 This is a schematic diagram of a mold component (punch) according to an embodiment of the present invention.

[0034] Figure 2 This is a schematic diagram of a mold component (die) according to an embodiment of the present invention.

[0035] Figure 3 This is a schematic cross-sectional view of a mold component according to an embodiment of the present invention.

[0036] Figure 4 This is a schematic diagram showing the cross-sectional structure of an amorphous alloy sheet.

[0037] Figure 5 This is a schematic diagram illustrating a punching process according to an embodiment of the present invention.

[0038] Figure 6 This is a schematic diagram of punched material obtained by punching amorphous alloy sheet through a mold component.

[0039] Figure 7 This is a partial cross-sectional view of the punched material obtained by punching a mold component according to an embodiment of the present invention.

[0040] Figure 8These are images of perforated materials observed using a laser microscope.

[0041] Figure 9 It is a graph showing a comparison of the shift in the deformation height of the punched material relative to the number of punching cycles.

[0042] Figure Labels

[0043] 1: Mold component (punch), 2: Mold component (die), 11: Amorphous alloy sheet, 12: Amorphous alloy thin sheet, 13: Thin sheet of different materials, 14: Adhesive layer, 20: Substrate, 21: Hard film, 22: First hard layer, 23: Second hard layer, 24: Cutting edge of punch, 25: Cutting edge of die, 40: Deformation height, 41: Burr, 42: Fracture surface, 43: Shear surface, 44: Collapsed edge, 110-123: Shooting position, 130: Correction range, 131: Section line. Detailed Implementation

[0044] The embodiments of the present invention will now be described in detail, but the present invention is not limited thereto. Furthermore, in some or all of the figures, parts that do not need to be explained are omitted, and some parts are shown in the figures in a scaled-down manner for ease of explanation. In this specification, the numerical range indicated by “~” means that the values ​​before and after the “~” are included within the range as both the lower and upper limits.

[0045] Figure 1 and Figure 2 A schematic diagram of a mold component according to an embodiment of the present invention is shown. Figure 1 The mold component 1 shown has a hard film 21 on the surface of a right-angled prism-shaped substrate 20. The hard film 21 has a first hard layer containing Ti, Si, and N. The hard film 21 is formed on the entire surface including the bottom surface (not shown) and the side surface. In the illustrated example, the hard film 21 is only formed on the underside of the substrate 20, but it is sufficient to form it in at least the area used for processing. Figure 2 The mold component 2 shown can be used as a paired die when the mold component 1 is used, for example, as a punching punch. In the substrate 20 having a rectangular hole (through hole) through which the mold component 1 (punch) can be inserted, at least on the upper surface of the through hole, there is a hard film 21, which has a first hard layer containing Ti, Si, and N.

[0046] exist Figure 1 In the mold component 1 (punch portion) shown, a hard film 21 is formed on the lower side, while no hard film 21 is formed on the upper side. The portion on the lower side where the hard film 21 is formed has an insertion... Figure 2It shows the hole portion of the mold component 2 (die cavity). In this way, by forming the hard film 21 only on a part of the punch portion, the man-hours and raw materials for forming the hard film 21 can be reduced, which is efficient. This is also the same for the mold component 2 (die cavity).

[0047] The hard film 21 having a first hard layer containing Ti, Si and N is preferably provided on both of the mold components 1 and 2. Alternatively, at least one mold component may be provided with the hard film 21, and the other mold component may be provided with the above-mentioned existing hard film. In addition, the mold component includes a mold composed of a combination of separate components.

[0048] Figure 3 shows a schematic cross-sectional view of a mold component according to an embodiment of the present invention. On a base material 20, the hard film 21 has a two-layer structure, and the outermost surface of the hard film 21 has a first hard layer 22 containing Ti, Si and N.

[0049] According to the present invention, the first hard layer contains at least Ti, Si and N as a hard film excellent in wear resistance and durability to protect the base material 20, prevent wear and prolong the service life. When the first hard layer 22 is formed by vapor deposition using a Ti-Si target in a chamber introduced with nitrogen gas, the hardness increases as the Si content increases. Therefore, when x is taken as the atomic ratio in the case of only considering metal elements and expressed by Ti x Si 1-x , it is preferable that x<0.90. It should be noted that the first hard layer preferably has a nanocrystalline structure with an average particle diameter of 25 nm or less.

[0050] In addition, a second hard layer 23 is provided between the base material 20 and the first hard layer 22. The second hard layer 23 contains at least Ti, Al and N. The second hard layer 23 functions as a base that improves adhesion and peeling strength. Therefore, it is preferable to provide the second hard layer 23, but it may not be provided. For the second hard layer 23, when y is taken as the atomic ratio in the case of only considering metal elements and expressed by Ti y Al 1-y , it is preferably 0.25<y<0.75, and more preferably 0.30<y<0.50.

[0051] In addition, as long as the hard film 21 has a structure in which the surface layer has the first hard layer containing Ti, Si and N, it may further include multiple hard layers. For example, it may also be a hard film in which hard layers mainly composed of Ti, Si and N and hard layers mainly composed of Ti, Al and N are alternately formed into a multilayer hard film with three or more stacked layers, and a hard layer with other components may also be provided. In addition, the case where the first hard layer 22 is formed as a temporary protective film is also included in the present invention.

[0052] The first hard layer 22 and the second hard layer 23 can be formed using known film-forming methods. For example, they can be formed using liquid phase methods such as electroplating and electroless plating, vacuum evaporation, molecular beam epitaxy, sputtering, and physical vapor deposition methods such as ion plating, as well as chemical vapor deposition methods such as thermal CVD, photochemical CVD, and plasma CVD. Furthermore, before the hard film 21 is formed, the substrate 20 can be subjected to nitriding or carburizing treatment. The film-forming method can be selected based on the composition of the amorphous alloy sheet, its thickness, whether it is a single layer or multiple layers, and whether there is an adhesive layer.

[0053] When the hard coating 21 is a single layer of the first hard layer 22, considering wear costs and peel strength, the coating thickness is preferably in the range of 0.1 to 60 μm. It should be noted that the coating thickness of the hard coating 21 is more preferably 0.2 to 20 μm, and even more preferably 0.5 to 10 μm. However, the optimal coating thickness can be selected according to the composition and thickness of the amorphous alloy sheet, and is not limited to this range.

[0054] When the hard film 21 is multilayered, the thickness of the first hard layer 22 on the surface is preferably in the range of 0.1 to 30 μm. Furthermore, the thickness of the second hard layer 23 is preferably in the range of 0.1 to 30 μm. It should be noted that the thickness of the first hard layer 22 is more preferably 0.2 to 10 μm, and even more preferably 0.5 to 5 μm. Furthermore, the thickness of the second hard layer 23 is more preferably 0.2 to 10 μm, and even more preferably 0.5 to 5 μm.

[0055] The substrate 20 is made of a material formed from a metal and a hard metal compound. The substrate 20 may, for example, be a material classified as HW, HF, or HT in the material classifications described in JIS B4053 2013. When using a material classified as HW or HF, it is preferable, for example, to be a material formed from a hard phase mainly composed of tungsten carbide and a bonding phase mainly composed of iron group metals such as Co. It may also contain a solid solution formed from at least one transition metal element selected from groups 4a, 5a, and 6a of the periodic table and at least one element selected from carbon, nitrogen, oxygen, and boron. When using a material classified as HT, a material may be used, for example, formed from a solid solution phase formed from at least one transition metal element selected from groups 4a, 5a, and 6a of the periodic table and at least one element selected from carbon, nitrogen, oxygen, and boron, a bonding phase formed from one or more iron group metals, and unavoidable impurities. Furthermore, the metal compound is mainly composed of tungsten carbide with an average particle size of 5 μm or less, which can improve the strength of the substrate 20 and further enhance its wear resistance. More preferably, the average particle size of the metal compound is 2 μm or less. Additionally, in order to suppress chipping by reducing the toughness of the substrate 20, the average particle size of the metal compound is preferably 0.5 μm or more, more preferably 0.7 μm or more.

[0056] Figure 4 An example of an amorphous alloy sheet subjected to shearing or fracture processing using the mold component of the present invention is shown. The amorphous alloy sheet 11 has at least one layer of amorphous alloy sheet 12. The amorphous alloy sheet 12 can be, for example, an Fe-based amorphous alloy, a Co-based amorphous alloy, a Ni-based amorphous alloy, etc. In addition, it also contains an amorphous alloy as a precursor for a nanocrystalline soft magnetic alloy.

[0057] As amorphous alloy sheets 12 are widely used, each layer is typically tens of μm thick. When the amorphous alloy sheet 11 is composed of a single layer of amorphous alloy sheet 12, its operability for shearing or fracture processing is poor. Furthermore, it suffers from low production efficiency per punch during punching and difficulty in adjusting the minute gaps between dies when processing multiple mold components together. Therefore, the amorphous alloy sheet 11 can also be a material obtained by stacking multiple amorphous alloy sheets 12. Multiple amorphous alloy sheets 12 can be formed by combining amorphous alloys with different compositions and thicknesses. Alternatively, it can be a material obtained by stacking sheets 13 of different materials. The sheets 13 of different materials can be, for example, soft magnetic materials such as electromagnetic steel, electromagnetic soft iron, Permalloy, and Permendur iron-cobalt alloy. The optimal material can be selected based on the production process, and is not limited to the examples mentioned above.

[0058] The amorphous alloy sheet 11 may also have adhesive layers 14 between the layers of the multiple amorphous alloy sheets 12 and between the sheet 13 of different materials. The adhesive layer 14 can be made of engineering plastics such as PPS (polyphenylene sulfide), PC (polycarbonate), and PET (polyethylene terephthalate) as thermoplastic resins, or epoxy resins and unsaturated polyesters as thermosetting resins, but is not limited to the examples mentioned above. Furthermore, the adhesive layer 14 may be uncured when processed by a mold component.

[0059] Figure 5 An example is shown of punching an amorphous alloy sheet 11 using die component 1 as the punching punch and die component 2 as the punching die. For example, in the case of punching, shearing and fracture typically occur at the machining section. Depending on the gap between the punch and die, the cutting edge shape, and the structure of the amorphous alloy sheet 11, the shearing and fracture patterns will differ, but are not limited to punching; they can be applied to all machining processes that produce at least one of shearing or fracture.

[0060] In this invention, the amorphous alloy sheet 11 is preferably a material obtained by stacking one amorphous alloy strip or two to six amorphous alloy sheets 12.

[0061] In addition, in this invention, the amorphous alloy plate 11 preferably has a thickness of 10μm to 200μm, and more preferably a thickness of 14μm to 150μm.

[0062] In addition, in this invention, the thickness of the amorphous alloy sheet 12 constituting the amorphous alloy sheet 11 is preferably 10 to 50 μm, and more preferably 14 to 40 μm.

[0063] In addition, in this invention, the gap between the punch and the die is preferably 2% to 10% of the thickness of the amorphous alloy sheet.

[0064] Example

[0065] Metglas (registered trademark) 2605HB1M was prepared as the amorphous alloy sheet. The amorphous alloy sheet is a long, single-layer thin strip, 25μm thick and 30mm wide. A suitable punching die was used for this amorphous alloy sheet. Figure 5 Mold components 1 and 2) are sheared and broken to prepare... Figure 6 The punched material shown is of the shape shown (punchable material for amorphous alloy sheet). The punched material is a rectangle with dimensions of 15mm × 5mm, and the radius of curvature (R) of the corners is 0.3mm.

[0066] The base material of the punching die component according to the present invention is mainly tungsten carbide. The punch uses an ultrafine particle superhard alloy with an average particle size of 0.7 μm, and the die uses a coarse-grained mixed superhard alloy with an average particle size of 0.5 μm and 5.0 μm. The punch is a cuboid with dimensions of 5 mm × 15 mm × 44 mm, and the die has a rectangular cavity of 5 mm × 15 mm on a cuboid with dimensions of 75 mm × 40 mm × 8 mm. Other components of the punching die according to the present invention, besides the die components (punch and die), are mainly made of high-speed tool steel, etc.

[0067] The hard layer of the hard coating was formed in a nitrogen-filled chamber using BALIQ (registered trademark) TISINOS from OC Oerlikon Balzers AG as the TiSi target. The hard layer of this hard coating was formed using HiPIMS (High Power Impulse Magnetron Sputtering), a sputtering method. This method generates high-density plasma by applying a high-output pulsed voltage to the target, resulting in a dense, uniform, and smooth film.

[0068] First, for both the punch and die, a TiAlN film is formed on the substrate as an intermediate layer (equivalent to a second hard layer), followed by a TiSiN film (equivalent to a first hard layer) on the outermost surface. The film-forming portion is the end with a 5mm × 15mm perimeter in a punched shape, approximately 1cm from the cutting edge 24 of the punch and the cutting edge 25 of the die. This film is formed relative to the sliding direction of the punch (…). Figure 5 The process involves grinding both the vertical and parallel surfaces (equivalent to the up-down direction). After film formation, the punch and die are simultaneously ground on the surface perpendicular to the sliding direction, leaving a hard film only on the surface parallel to the punch's sliding direction (the side of the punch and the surface of the die's cavity). While it's possible to use the punch and die without grinding the surface perpendicular to the sliding direction, grinding the surface perpendicular to the sliding direction allows for a sharper cutting edge. During punching, the sliding length from contact with the amorphous alloy sheet is 105 μm from the cutting edge, ensuring the amorphous alloy sheet does not come into contact with the unformed hard film on the surface parallel to the punch's sliding direction.

[0069] It should be noted that the hard film will wear down due to repeated punching with the punch and die. While the hard film of this invention has higher durability than existing hard films, it will still wear down with increasing punching cycles. As the wear of the hard film increases, its effectiveness diminishes. To address this, the cutting edges of the punch and die can be sharpened by grinding the surfaces perpendicular to the sliding direction. This allows the punch and die to be reused. The width of the film-forming portion can be determined by considering the number of grinding operations. Preferably, the width of the film-forming portion is at least three times the sliding length. More preferably, it is at least ten times the sliding length.

[0070] The total thickness of the hard coating formed on the punch and die, from the substrate to the outermost surface, is approximately 2 μm, wherein the second hard layer of TiAlN and the first hard layer of TiSiN are each approximately 1 μm thick. The thickness of the hard coating is calculated using photographs obtained from an optical microscope. Furthermore, the components are assembled such that, with the hard coating in place, the gap between the punch and die is 10% of the sheet thickness, i.e., 2.5 μm.

[0071] The second hard layer is composed of Ti in atomic ratio. 0.20 Al 0.25 N 0.55 The composition of the first hard layer is Ti in atomic ratio. 0.34 Si 0.12 N 0.54 These compositions were determined by removing unavoidable impurities through compositional analysis using wavelength dispersive X-ray spectroscopy.

[0072] The press used in this embodiment is an MPS405UD manufactured by the Electrical Discharge Machining Laboratory, Inc. In addition to the 25μm thickness of the amorphous alloy sheet, considering the elongation until fracture, a position 80μm below the height of the punch tip and the die top is set as the bottom dead center. That is, the bottom dead center is the point where the punch surface begins to slide 105μm after contacting the amorphous alloy sheet. The punching speed is 31mm / s. The punching speed is calculated by using linear scale values ​​read by a sequencer with a sampling rate of 0.2ms mounted on a 4-axis servo press to calculate the speed at which the punch contacts the amorphous alloy sheet. Considering productivity, the punching speed is preferably 10mm / s or more, more preferably 30mm / s or more. Furthermore, to avoid rapid heating of components due to friction, the punching speed is preferably 800mm / s or less, more preferably 600mm / s or less.

[0073] As a method for evaluating the shape of punched materials, 14 points at the ends of the punched material were first photographed using a VK-X1000 laser microscope manufactured by KEYENCE. Regarding the photographing locations, [the text abruptly ends here]. Figure 6 Points 110 to 123 were observed at fixed points, with a 270μm × 202μm area defined as the imaging range for each point. The lens magnification was 50x. The observation was performed vertically relative to the surface of the punching material contacting the die. That is, from... Figure 7 When the image is taken from the negative z-axis direction to the positive z-axis direction, a deformation height of 40 is detected in the negative z-axis direction.

[0074] Figure 8 For example, in the observation of the image, at least 50% of the shooting area is perforated material 11. The position is adjusted to allow for the capture of the deformation height 40. The tilt is calculated within the correction range 130, and the entire image is subjected to a planar correction so that the flat portion, except for the ends of the perforated material, serves as the reference plane. For the corrected image, five profile lines 131, perpendicular to the ends of the perforated material, are drawn at 60 μm intervals. The deformation height 40 is calculated from each profile line. That is, for one shooting position, five deformation height 40 data points are obtained. This measurement is performed at 14 shooting positions, resulting in 5 × 14 = 70 profiles. In other words, for a specific number of perforations in perforated material, 70 deformation height 40 data points can be obtained. The average, maximum, and minimum values ​​of these 70 deformation height 40 data points are calculated. The above evaluation is performed on perforated material with 100,000 perforations.

[0075] The cross-section of the punched material is typically as follows: Figure 7 As shown in the schematic diagram, the collapsed edge 44, shear surface 43, fracture surface 42, and burr 41 can be identified. Under suitable punching conditions, a cross-section containing both shear surface 43 and fracture surface 42 can usually be observed. As the die wears down, the shear surface decreases, the ratio of fracture surface increases, and the height of collapsed edge 44 and burr 41 increases.

[0076] As Comparative Example 1, a die with a hard AlCrSiN film was prepared for punching an amorphous alloy sheet. In Comparative Example 1, the film was formed by arc ion plating. The conditions, such as the substrate, sheet material, and punching speed, remained unchanged compared to the Example.

[0077] The differences in the configurations of Example 1 and Comparative Example 1 are shown in Table 1. Figure 9 This graph shows the number of punching passes for the punched material on the horizontal axis and the deformation height of the punched material on the vertical axis. The graph is plotted using average values, and the range between the maximum and minimum values ​​is displayed as the error range.

[0078] Table 1

[0079]

[0080] In Comparative Example 1, a maximum deformation of approximately 23 μm occurred after only 20,000 punching cycles. In Example 1, the substrate of the mold was protected by a hard film containing TiSiN as the first hard layer, and the deformation height 40 did not exceed 20 μm within the implementation range. Therefore, it can be determined that the hard film of Example 1 is advantageous for processing amorphous alloys and can improve lifespan.

Claims

1. A mold component for processing amorphous alloy sheet, the mold component having a punch and a die, the punch being inserted into a hole in the die and performing shearing or fracture processing on the amorphous alloy sheet, characterized in that... The punch portion has: The substrate, wherein the substrate is formed of a metal and a hard metal compound, and A rigid film formed on the surface of the substrate in an area for the processing; The rigid film has a first rigid layer with Ti, Si, and N as the main components, and a second rigid layer with Ti, Al, and N as the main components between the first rigid layer and the substrate. The hard film is formed on a surface parallel to the sliding direction of the punch, but not on a surface perpendicular to the sliding direction of the punch.

2. The mold component for processing amorphous alloy sheets according to claim 1, characterized in that, The hard film is multilayered, wherein a first hard layer with Ti, Si, and N as the main components and a second hard layer with Ti, Al, and N as the main components are alternately formed.

3. The mold component for processing amorphous alloy sheets according to claim 1 or 2, characterized in that, The metal compound is mainly composed of tungsten carbide with an average particle size of less than 5 μm.

4. The mold component for processing amorphous alloy sheets according to claim 1, characterized in that, The hard film is formed on the surface of the hole in the concave part that is inserted into the convex part.

5. The mold component for processing amorphous alloy sheets according to claim 4, characterized in that, The surface of the hole in the concave mold portion has a portion where the hard film has not been formed.

6. A method for processing amorphous alloy sheet, comprising using a die component having a punch portion and a die portion having a hole for inserting the punch portion, wherein the punch portion is used to punch amorphous alloy sheet disposed in the die portion, characterized in that, The punch portion has a substrate formed of metal and a hard metal compound, and a hard film formed on the surface of the substrate. The hard film has a first hard layer mainly composed of Ti, Si, and N, and a second hard layer mainly composed of Ti, Al, and N between the first hard layer and the substrate. The hard film is formed at the portion of the punch portion that inserts into the die portion. The processing method of the amorphous alloy sheet includes: The process of grinding the surface perpendicular to the sliding direction of the punch, and The process of punching holes in the amorphous alloy sheet using a punch portion with a surface ground perpendicular to the sliding direction.

7. The processing method for amorphous alloy sheet according to claim 6, characterized in that, The concave part has a substrate formed of metal and hard metal compound and a hard film formed on the surface of the substrate. The hard film has a first hard layer containing Ti, Si and N. The hard film is formed on the surface of the hole in the concave part into which the convex part is inserted.

8. The processing method of the amorphous alloy sheet according to claim 7, characterized in that, The surface of the hole in the concave mold portion has a portion where the hard film has not been formed.

9. The processing method of the amorphous alloy sheet according to claim 6, characterized in that, The hard film is multilayered, wherein a first hard layer with Ti, Si, and N as the main components and a second hard layer with Ti, Al, and N as the main components are alternately formed.

10. The processing method of the amorphous alloy sheet according to claim 6, characterized in that, The metal compound is mainly composed of tungsten carbide with an average particle size of less than 5 μm.

Images