Substrate transport device
By adopting a double-layer sealing belt structure in the substrate conveying device, the problem of particle scattering in the drive section was solved, achieving efficient particle discharge and gas flow, and improving the sealing performance and operating efficiency of the device.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2021-10-09
- Publication Date
- 2026-07-31
AI Technical Summary
Existing substrate conveying devices generate particles that are difficult to discharge efficiently during the drive process, resulting in particle scattering.
It adopts a double-layer sealing strip structure, with the first and second sealing strips forming a ring-shaped path respectively. The through holes do not overlap or partially overlap, and together with the exhaust component, it ensures sealing and gas flow.
It effectively prevents particles from scattering and efficiently discharges particles generated during the drive process, improving the device's sealing performance and gas flow efficiency.
Smart Images

Figure CN114388412B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a substrate transport device. Background Technology
[0002] Patent document 1 discloses a substrate transport device for transporting substrates from one processing module to other processing modules by driving a transport arm.
[0003] Existing technical documents
[0004] Patent documents
[0005] Patent Document 1: Japanese Patent Application Publication No. 2014-36175 Summary of the Invention
[0006] The technical problem that the invention aims to solve
[0007] This invention provides a technology that can efficiently discharge particles generated during the operation of the drive unit.
[0008] Technical solutions for solving technical problems
[0009] One aspect of the present invention is a substrate transport device for transporting substrates, comprising: a substrate holding portion for holding the substrate; a support portion for supporting the substrate holding portion; a drive portion for moving the support portion in one direction; a housing for housing the drive portion and having an opening extending in the moving direction of the support portion; an opening sealing portion fixed within the housing to the support portion in a movable state accompanying the movement of the support portion to seal the opening; and an exhaust portion for venting air from the housing, wherein the opening sealing portion comprises: a first sealing strip having a plurality of through holes and fixed to the support portion; a plurality of second sealing strips having a plurality of through holes; and a third sealing strip having a plurality of through holes; and a fourth sealing strip having a plurality of through holes; and a fifth ... A pulley is provided with the first sealing strip to form a first annular path through the area sealing the opening using the support and the first sealing strip; a second sealing strip having a plurality of through holes and fixed to the support; and a plurality of second pulleys are provided with the second sealing strip to form a second annular path through the area sealing the opening using the support and the second sealing strip at a location on the inner periphery side of the first annular path. The plurality of first pulleys and the plurality of second pulleys are configured such that the plurality of through holes of the first sealing strip and the plurality of through holes of the second sealing strip do not overlap with each other in the area sealing the opening.
[0010] Invention Effects
[0011] According to the present invention, a technique is provided that can efficiently discharge particles generated during the driving of the drive unit. Attached Figure Description
[0012] Figure 1 This is a schematic perspective view illustrating an example of a substrate processing system.
[0013] Figure 2 This is a schematic diagram illustrating an example of a coating and developing apparatus.
[0014] Figure 3 This is a block diagram representing an example of the hardware structure of a control device.
[0015] Figure 4 This is a top view schematically representing an example of a conveyor unit.
[0016] Figure 5 This is a perspective view schematically representing an example of a conveying unit.
[0017] Figure 6 This is a schematic diagram illustrating an example of the internal structure of the drive unit in the Y-axis direction.
[0018] Figure 7 yes Figure 6 An example of a view in direction VII-VII.
[0019] Figure 8 of Figure 8 of (a), Figure 8 (b) Figure 8 Figure (c) illustrates an example of the configuration and combination of the through holes of the first and second sealing strips.
[0020] Figure 9 This is a diagram showing an example of the configuration of the first and second sealing strips in the Y-axis drive section.
[0021] Figure 10 This diagram illustrates an example of a configuration change between the first and second sealing strips.
[0022] Explanation of reference numerals in the attached figures
[0023] 1…Substrate processing system, 20…Holding arm, 30…X-axis drive unit, 40…Y-axis drive unit, 41…Housing, 41a…Opening, 42…Motor, 43…Pulley, 44…Synchronous belt, 45…Slider, 45a…Main body support, 45b…First foot, 45c…Second foot, 45d…Main body, 45e…Main surface, 46a, 46b…Slider guide, 50…Z-axis drive unit, 60…Rotation drive unit, 70…Base, 81…First sealing strip, 81a…Through hole, 82…Second sealing strip, 82a…Through hole, 83, 85…First pulley, 84, 86…Second pulley, 91, 92…Fan, 100…Control device. Detailed Implementation
[0024] The following describes various illustrative implementation methods.
[0025] In one exemplary embodiment, a substrate transport device is provided. The substrate transport device is a substrate transport device for transporting substrates, comprising: a substrate holding portion for holding the substrate; a support portion for supporting the substrate holding portion; a drive portion for moving the support portion in one direction; a housing for housing the drive portion and having an opening extending in the direction of movement of the support portion; an opening sealing portion fixed within the housing to the support portion in a movable state accompanying movement of the support portion to seal the opening; and an exhaust portion for venting air from the housing, the opening sealing portion comprising: a first sealing strip having a plurality of through holes and fixed to the support portion; a plurality of first pulleys; The system includes a first sealing strip, which forms a first annular path through the area sealing the opening using the support and the first sealing strip; a second sealing strip having multiple through holes and fixed to the support; and multiple second pulleys, which are mounted on the second sealing strip to form a second annular path through the area sealing the opening using the support and the second sealing strip at a location closer to the inner periphery than the first annular path. The multiple first pulleys and the multiple second pulleys are configured such that the multiple through holes of the first sealing strip and the multiple through holes of the second sealing strip do not overlap in the area sealing the opening.
[0026] In the aforementioned substrate transport device, the multiple through holes of the first and second sealing strips are arranged in a manner that does not overlap with each other, thereby appropriately sealing the openings using the first and second sealing strips. Therefore, it is possible to prevent particles inside the housing from scattering to the outside through the openings. On the other hand, since both the first and second sealing strips have multiple through holes, exhaust gas from the vent within the housing is not obstructed by the first and second sealing strips. Therefore, a technology is provided that can efficiently discharge particles generated during the operation of the drive unit from inside the housing.
[0027] Alternatively, the plurality of first pulleys and the plurality of second pulleys may be configured such that the plurality of through holes of the first sealing strip and the plurality of through holes of the second sealing strip overlap in at least a portion of the area outside the area sealing the opening.
[0028] As described above, when the plurality of through holes of the first sealing strip overlap with the plurality of through holes of the second sealing strip in at least a portion of the area outside the sealing opening area, the movement of gas using the through holes can be promoted, thus enabling efficient discharge of particles from the housing.
[0029] Alternatively, the first sealing strip and the second sealing strip may contact each other in the area sealing the opening.
[0030] As described above, when the first sealing strip and the second sealing strip are in contact with each other in the area of the sealing opening, the opening can be properly sealed, thus preventing particles from scattering to the outside more reliably.
[0031] Alternatively, the first sealing strip and the second sealing strip may be spaced apart from each other in at least a portion of the area outside the area sealing the opening.
[0032] As described above, when the first sealing strip and the second sealing strip are spaced apart from each other in at least a portion of the area outside the sealed opening, the movement of gas utilizing the plurality of through holes provided in the first sealing strip and the second sealing strip can be facilitated. Therefore, the discharge of particles from the housing can be carried out efficiently.
[0033] Alternatively, at least one of the opposing surfaces of the first sealing strip and the second sealing strip may be provided with an absorbent material.
[0034] As described above, when an absorbent material is provided on at least one of the opposing surfaces of the first and second sealing strips, the adhesion between the first and second sealing strips in the area of the sealed opening can be improved. Therefore, by adopting a structure that seals the opening in this state, the opening can be properly sealed.
[0035] Alternatively, at least one of the opposing surfaces of the first sealing strip and the second sealing strip may have undergone surface treatment to improve the coefficient of friction.
[0036] As described above, when at least one of the opposing surfaces of the first and second sealing strips undergoes a surface treatment to increase the coefficient of friction, the adhesion between the first and second sealing strips in the area of the sealed opening can be improved. Therefore, by employing a structure that seals the opening in this state, the opening can be properly sealed.
[0037] Alternatively, an adsorbent material may be provided on the opposite surface of the second sealing strip to the first sealing strip, or a surface treatment may be performed to improve the coefficient of friction.
[0038] When an absorbent material is provided on the opposite surface of the second sealing strip or a surface treatment is applied to increase the coefficient of friction, the absorbent material or surface treatment can prevent interference with the movement of the second sealing strip relative to the multiple second pulleys. Therefore, according to the above structure, smooth movement of the second sealing strip can be promoted.
[0039] Hereinafter, various exemplary embodiments will be described in detail with reference to the accompanying drawings. Furthermore, in each drawing, the same or corresponding parts are labeled with the same reference numerals.
[0040] [Substrate Processing System]
[0041] Figure 1 The substrate processing system 1 shown is a system for forming a photosensitive coating on a workpiece W, exposing the photosensitive coating, and developing the photosensitive coating. The workpiece W, the object of processing, is, for example, a substrate or a substrate that has been formed into a film or circuit through a prescribed process. The substrate included in the workpiece W is, for example, a silicon-containing wafer. The workpiece W (substrate) can be formed in a circular shape. The workpiece W, the object of processing, can also be a glass substrate, a mask substrate, an FPD (Flat Panel Display), or an intermediate obtained by performing a prescribed process on these substrates. The photosensitive coating is, for example, a resist film.
[0042] The substrate processing system 1 includes a coating and developing apparatus 2 and an exposure apparatus 3. The coating and developing apparatus 2 is used to form a resist film (photosensitive coating) on a workpiece W. The exposure apparatus 3 is used to expose the resist film formed on the workpiece W (substrate). Specifically, the exposure apparatus 3 irradiates the exposed portion of the resist film with energy lines using methods such as immersion exposure. Before exposure by the exposure apparatus 3, the coating and developing apparatus 2 coats the surface of the workpiece W with a resist (solution) to form a resist film, and after exposure, it develops the resist film.
[0043] (Substrate processing device)
[0044] The structure of the coating and developing apparatus 2 will be described below as an example of a substrate processing apparatus. Figure 1 and Figure 2 As shown, the coating and developing apparatus 2 includes a carrier block 4, a processing block 5, an interface block 6, and a control device 100.
[0045] The carrier block 4 handles the introduction of workpiece W into and removal of workpiece W from the coating and developing apparatus 2. For example, the carrier block 4 can support multiple carriers C for workpiece W and includes a built-in conveying unit A1 with a transfer arm. The carriers C, for example, hold multiple circular workpieces W. The conveying unit A1 removes workpiece W from the carriers C and transfers it to the processing block 5, and receives workpiece W from the processing block 5 and returns it to the carriers C. The processing block 5 has processing modules 11, 12, 13, and 14.
[0046] Processing module 11 includes a liquid treatment unit U1, a heat treatment unit U2, and a conveying unit A3 for transporting workpiece W to these units. Processing module 11 uses the liquid treatment unit U1 and the heat treatment unit U2 to form a lower film on the surface of workpiece W. The liquid treatment unit U1 applies a processing liquid for lower film formation to the workpiece W. The heat treatment unit U2 performs various heat treatments accompanying the formation of the lower film.
[0047] Processing module 12 includes a liquid treatment unit U1, a heat treatment unit U2, and a conveying unit A3 for transporting workpiece W to these units. Processing module 12 utilizes the liquid treatment unit U1 and the heat treatment unit U2 to form a resist film on the lower film. The liquid treatment unit U1 applies a processing liquid (resist) for resist film formation onto the lower film. The heat treatment unit U2 performs various heat treatments accompanying the formation of the resist film.
[0048] Processing module 13 includes a liquid treatment unit U1, a heat treatment unit U2, and a conveying unit A3 for transporting the workpiece W to these units. Processing module 13 utilizes the liquid treatment unit U1 and the heat treatment unit U2 to form an upper film on the resist film. The liquid treatment unit U1 applies a processing liquid for upper film formation to the resist film. The heat treatment unit U2 performs various heat treatments accompanying the formation of the upper film.
[0049] Processing module 14 includes a liquid treatment unit U1, a heat treatment unit U2, and a transport unit A3 for conveying workpiece W to these units. Processing module 14 utilizes the liquid treatment unit U1 and the heat treatment unit U2 to perform development treatment of the exposed resist film and accompanying heat treatment. The liquid treatment unit U1 applies a developer to the surface of the exposed workpiece W and then rinses it with a rinsing solution, thereby performing the development treatment of the resist film. The heat treatment unit U2 performs various heat treatments accompanying the development treatment. Specific examples of heat treatment include pre-development heat treatment (PEB: Post Exposure Bake) and post-development heat treatment (PB: Post Bake).
[0050] A shelf unit U10 is provided on the side of the carrier block 4 within the processing block 5. The shelf unit U10 is divided into multiple small chambers arranged in the vertical direction. A conveying unit A7, including a lifting arm, is provided near the shelf unit U10. The conveying unit A7 causes the workpiece W to move up and down between the small chambers of the shelf unit U10.
[0051] A shelf unit U11 is provided on the interface block 6 side within processing block 5. The shelf unit U11 is divided into multiple units arranged in the vertical direction. The shelf units U10 and U11 keep the workpiece W waiting for the next processing step, so these shelf units U10 and U11 are also equivalent to processing units that process the workpiece W.
[0052] Interface block 6 facilitates the transfer of workpiece W between itself and exposure device 3. For example, interface block 6 includes a built-in transport unit A8 with a transfer arm, which is connected to exposure device 3. Transport unit A8 delivers workpiece W, which is disposed in shelf unit U11, to exposure device 3. Transport unit A8 receives workpiece W from exposure device 3 and returns it to shelf unit U11.
[0053] (Control device)
[0054] The control device 100 controls the coating and developing device 2. The control device 100 controls at least the liquid treatment unit U1, the heat treatment unit U2, and the transport unit A3.
[0055] The control device 100 comprises one or more control computers. For example, the control device 100 has... Figure 3 The circuit 110 shown has one or more processors 111, memory 112, storage 113, input / output ports 114, and timers 115. Memory 113 may be a computer-readable storage medium such as a hard disk. The storage medium stores a program for causing the control device 100 to execute the substrate processing method described later. The storage medium may be a retrievable medium such as a non-volatile semiconductor memory, a magnetic disk, or an optical disk. Memory 112 temporarily stores the program loaded from the storage medium of memory 113 and the results of calculations performed by the processor 111.
[0056] The processor 111 and memory 112 work together to execute the aforementioned program. The input / output port 114, according to instructions from the processor 111, performs electrical signal input / output between the liquid processing unit U1, the transport unit A3, etc. The timer 115 measures elapsed time, for example, by counting reference pulses of a certain period. Furthermore, the hardware structure of the control device 100 can be constructed from dedicated logic circuits or from an ASIC (Application Specific Integrated Circuit) integrating these circuits.
[0057] [Conveying Unit]
[0058] Below, refer to Figures 4-7An example of a conveying unit A3 in processing module 12 will be described. Conveying unit A3 conveys workpiece W within processing module 12 while holding it in place. Conveying unit A3 conveys workpiece W between multiple processing units included in processing module 12. Figure 4 In the illustrated processing module 12, two liquid processing units U1 and two heat processing units U2 are arranged sequentially along one horizontal direction.
[0059] In this invention, the direction from the heat treatment unit U2 to the liquid treatment unit U1 is designated as the "positive Y-axis," and the direction from the liquid treatment unit U1 to the heat treatment unit U2 is designated as the "negative Y-axis." The direction from the conveying unit A3 to the liquid treatment unit U1 (or the heat treatment unit U2) is designated as the "positive X-axis," and the direction from the liquid treatment unit U1 (heat treatment unit U2) to the conveying unit A3 is designated as the "negative X-axis." Furthermore, the vertically upward direction is designated as the "positive Z-axis," and the vertically downward direction is designated as the "negative Z-axis." Any direction including either the positive or negative direction of each axis is simply referred to as the "X-axis direction," etc.
[0060] The conveying unit A3 includes, for example, a holding arm 20, an X-axis drive unit 30, a Y-axis drive unit 40, a Z-axis drive unit 50, a rotary drive unit 60, and a base 70. The conveying unit A3 is a device that uses the aforementioned X-axis drive unit 30, Y-axis drive unit 40, Z-axis drive unit 50, and rotary drive unit 60 to move the holding arm 20, thereby conveying the workpiece W to a desired position. The conveying unit A3 can use the aforementioned drive units to move the holding arm 20 in the x-axis, y-axis, z-axis, and θ-axis directions (Mx, My, Mz, and Mθ directions in the figure).
[0061] The holding arm 20 (substrate holding portion) is configured to hold the workpiece W. The holding arm 20 holds the workpiece W with its front side facing upwards. The front side Wa is the surface on which a resist coating is formed in the liquid treatment unit U1. The holding arm 20 may also be configured to surround the periphery of the workpiece W and support the periphery of the back side of the workpiece W opposite to the front side. The conveying unit A3 performs the feeding and unloading of the workpiece W relative to the processing unit such as the liquid treatment unit U1 by shifting the holding arm 20 holding the workpiece W. That is, the conveying unit A3 feeds the workpiece W into a processing unit by shifting the holding arm 20, and unloads the workpiece W from the processing unit by shifting the holding arm 20. The conveying unit A3 may also feed and unload multiple workpieces W into and out of a single processing unit.
[0062] The X-axis drive unit 30 is configured to move the retaining arm 20 in a horizontal direction (the X-axis direction shown in the figure: Mx direction). The X-axis drive unit 30 includes, for example, an actuator configured to reciprocate the retaining arm 20 along the X-axis direction using a power source such as an electric motor. Figures 4-6 In the example shown, the X-axis drive unit 30 is configured on the rotary drive unit 60 to reciprocate the holding arm 20 in the X-axis direction. The X-axis drive unit 30 moves the workpiece W held by the holding arm 20 along the X-axis direction by moving the holding arm 20 in either the positive or negative X-axis direction. The X-axis drive unit 30 is formed to extend along the direction in which the holding arm 20 moves (the X-axis direction). Details regarding the drive mechanism of the X-axis drive unit 30 will be explained later.
[0063] The Y-axis drive unit 40 is configured to move the holding arm 20 in a horizontal direction (the Y-axis direction shown in the figure: the My direction). The Y-axis drive unit 40 includes, for example, an actuator configured to reciprocate the holding arm 20 along the Y-axis direction using a power source such as an electric motor. The Y-axis drive unit 40 supports the Z-axis drive unit 50. Furthermore, the Z-axis drive unit 50 supports the base 70, which supports the X-axis drive unit 30 and the rotary drive unit 60 described later. Therefore, the Y-axis drive unit 40 moves the Z-axis drive unit 50, which indirectly supports the holding arm 20, in the Y-axis direction (either the positive or negative Y-axis direction). As a result, the Y-axis drive unit 40 moves the holding arm 20 in the Y-axis direction, and the workpiece W held by the holding arm 20 moves along the Y-axis direction. The Y-axis drive unit 40 is formed to extend along the direction in which the holding arm 20 moves (the Y-axis direction).
[0064] The Z-axis drive unit 50 is supported, for example, on the Y-axis drive unit 40. Furthermore, the Z-axis drive unit 50 supports the base 70. The Z-axis drive unit 50 includes, for example, an actuator configured to reciprocate the holding arm 20 along the vertical direction (the Z-axis direction shown in the figure: Mz direction) using a power source such as an electric motor. The Z-axis drive unit 50 supports the base 70, which supports the X-axis drive unit 30 and the rotary drive unit 60 described later. Therefore, the Z-axis drive unit 50 moves the base 70, which indirectly supports the holding arm 20, in the Z-axis direction (either the positive or negative Z-axis direction). As a result, the Z-axis drive unit 50 moves the holding arm 20 in the Z-axis direction, and the workpiece W held by the holding arm 20 moves along the Z-axis direction. The Z-axis drive unit 50 is formed to extend along the direction in which the holding arm 20 moves (the Z-axis direction).
[0065] Rotary drive unit 60 Figure 6The rotary drive unit 60 is shown mounted on the base 70. It includes, for example, a rotary actuator configured to rotate the X-axis drive unit 30 about a vertical rotation axis (Mθ direction) using a power source such as an electric motor. By rotating the X-axis drive unit 30 using the rotary drive unit 60, the direction of movement of the holding arm 20 is changed using the X-axis drive unit 30.
[0066] The substrate 70 is formed, for example, in a manner that extends along the X-axis direction. One end of the substrate 70 in the negative X-axis direction (for example, both sides of one end) is connected to the Z-axis direction drive unit 50.
[0067] (Details of the conveyor unit)
[0068] Below, refer to Figures 6-9 The structure of the Y-axis drive unit 40 and its surrounding area, which functions as part of the substrate transport device, will be further described below. In the following embodiments, the Y-axis drive unit 40 will be described, while the structures of the X-axis drive unit 30, Z-axis drive unit 50, and rotation drive unit 60 are basically the same as those of the Y-axis drive unit 40, and therefore will be omitted from the description.
[0069] Figure 6 The diagram shows the Y-axis drive unit 40 and the periphery of the base 70 supporting the Y-axis drive unit 40. The Y-axis drive unit 40 includes, for example, a housing 41, a pair of motors 42, a pair of pulleys 43, a timing belt 44, a slider 45 (support), and two slider guides 46a and 46b. The housing 41 is provided with a double-layered first sealing strip 81 and a second sealing strip 82, as well as a pair of first pulleys 83 supporting the first sealing strip 81 and a pair of second pulleys 84 supporting the second sealing strip 82. The Y-axis drive unit 40 is also equipped with a pair of fans 91 (exhaust units). The pair of motors 42, the pair of pulleys 43, the timing belt 44, the slider 45, and the two slider guides 46a and 46b function as a drive unit and are involved in the movement of the slider 45, which serves as a support.
[0070] The housing 41 houses all the components included in the Y-axis drive unit 40. The housing 41 is formed to extend along the Y-axis direction. An opening (slit) 41a extending along the Y-axis direction is provided on the side (wall) of the housing 41 opposite to the plurality of processing units (see reference). Figure 5 A portion of the slider 45 protrudes from the opening 41a outside the housing 41.
[0071] A pair of motors 42 are disposed at both ends of the housing 41 extending along the Y-axis. Additionally, a pair of pulleys 43 are disposed, for example, at both ends of the housing 41 along the Y-axis. The pair of pulleys 43 are respectively disposed within the housing 41 in a manner rotatable about an axis of rotation along the X-axis. A timing belt 44 is mounted on the pair of pulleys 43. The pair of motors 42, the pair of pulleys 43, and the timing belt 44 are arranged along the side of the housing 41 that extends along the Y-axis, on the side furthest from the processing unit (the side without the opening 41a).
[0072] A pair of fans 91 are located on the side farther from the processing unit (the side without the opening 41a). Alternatively, they could be located at either end of the side extending in the Y-axis direction, near the positions opposite the pair of motors 42 (see also...). Figure 7 The fan 91 exhausts gas from inside the housing 41. The fan 91 is used to expel the gas inside the housing 41 to the outside.
[0073] The aforementioned motor 42 is a power source that generates rotational torque, such as a servo motor. A pair of motors 42 are respectively connected to a pair of pulleys 43, causing the pulleys 43 to rotate. When the torque (driving force) generated by the pair of motors 42 is transmitted to the pulleys 43, the synchronous belt 44 mounted on the pair of pulleys 43 moves along the Y-axis.
[0074] Slider 45, for example Figure 6 As shown, it is formed in a manner that extends in the X-axis direction. The root end of the slider 45 in the X-axis direction (the end farther from the processing unit) is connected to the timing belt 44 inside the housing 41. The front end of the slider 45 in the X-axis direction (the end closer to the processing unit) protrudes out of the housing 52 through the opening 41a. For example, the lower end of the Z-axis drive unit 50 is connected to the front end of the slider 45.
[0075] The slider 45 has a pair of main body support portions 45a extending in the X-axis direction, and a pair of first feet 45b and second feet 45c extending downward from the pair of main body support portions 45a respectively (see reference). Figure 7 Furthermore, the slider 45 has a main body portion 45d extending downward (in the Z-axis direction) from the front end of a pair of main body support portions 45a. The pair of main body support portions 45a extend in the positive X-axis direction at different positions relative to each other in the Y-axis direction of the synchronous belt 44 extending along the Y-axis. Figure 7 As shown, the first foot 45b and the second foot 45c extend downward (negative Z-axis direction) from different positions in the X-axis direction of the main body support 45a.
[0076] Slider guides 46a and 46b are respectively disposed on the bottom surface of housing 41 extending in the Y-axis direction. Slider guides 46a and 46b respectively function to guide the movement of the first foot 45b and the second foot 45c in the Y-axis direction. The structure for guiding the movement of the first foot 45b or the second foot 45c in the Y-axis direction is not particularly limited. For example, the groove receiving the lower end of the first foot 45b in slider guide 46a can be formed along the Y-axis direction, and the groove receiving the lower end of the second foot 45c in slider guide 46b can be formed along the Y-axis direction.
[0077] The main body 45d is a generally flat plate extending downward in the vertical direction (Z-axis direction) from the front end of a pair of main body support portions 45a (the end furthest from the timing belt 44). Furthermore, the main surface 45e of the main body 45d near the processing unit may also be configured to protrude from the opening 41a of the housing 41. The main surface 45e is connected to the housing of the Z-axis drive unit 50. Additionally, two fans 92 are provided in the main body 45d, extending through the main body 45d in the X-axis direction. These fans 92 have the function of exhausting air from the interior of the Z-axis drive unit 50 to the interior of the Y-axis drive unit 40 (the interior of the housing 41). Therefore, the housing of the Z-axis drive unit 50 is provided with an opening communicating with the fans 92 (illustration omitted).
[0078] The slider 45 is connected to the retaining arm 20 via other components and moves together with the retaining arm 20. When the timing belt 44 moves along the Y-axis direction using the torque generated by the motor 42, the slider 45 (Z-axis drive unit 50) connected to the timing belt 44 also reciprocates along the Y-axis direction. As a result, the retaining arm 20 and the workpiece W also move along the Y-axis direction.
[0079] At this time, the Z-axis drive unit 50 also moves together with the slider 45. Therefore, the fan 92 provided on the main body 45d of the slider 45 continuously exhausts air from inside the housing of the Z-axis drive unit 50 into the housing 41. In addition, exhausting air from the fan 91 provided on the housing 41 to the outside of the housing 41 continues. In this way, air is supplied to the housing 41 of the Y-axis drive unit 40 by the fan 92 and exhausted by the fan 91.
[0080] Here, the first sealing strip 81 and the second sealing strip 82 with a double-layer configuration will be described.
[0081] The first sealing strip 81 and the second sealing strip 82 are provided in a manner that closes the opening 41a of the housing 41. That is, the first sealing strip and the second sealing strip 82 are fixed to the slider 45 in a state that allows them to move along with the slider 45, and function as part of the opening sealing portion that seals the opening 41a.
[0082] As described above, the opening 41a is formed as an elongated strip along the Y-axis to allow the slider 45 to move along the Y-axis. Therefore, the area in the opening 41a where the slider 45 is located is closed by the slider 45. The first sealing strip 81 and the second sealing strip 82 are arranged to close the area in the opening 41a where the slider 45 is not located. Therefore, the dimensions (length in the Z-axis direction) of the first sealing strip 81 and the second sealing strip 82 are larger than the dimensions (length in the Z-axis direction) of the opening 41a.
[0083] A pair of first pulleys 83 are disposed at both ends of the housing 41 along the Y-axis direction. Furthermore, the pair of first pulleys 83 are respectively disposed within the housing 41 in a manner rotatable about a rotation axis along the Z-axis direction. A first sealing strip 81 is mounted on the pair of first pulleys 83. However, the first sealing strip 81 is not annular; a portion of it is missing. The two ends of the first sealing strip 81 are connected to the two ends of the main body 45d of the slider 45 in the Y-axis direction. Therefore, when the slider 45 moves in the Y-axis direction, the first sealing strip 81 moves in the Y-axis direction following the movement of the slider 45. That is, the first sealing strip 81 and the main body 45d of the slider 45 form an annular path (first annular path) passing through the outer side of the pair of first pulleys 83.
[0084] A pair of second pulleys 84 are disposed at both ends of the housing 41 along the Y-axis direction. However, the pair of second pulleys 84 are disposed further inward than the pair of first pulleys 83. The pair of second pulleys 84 are disposed within the housing 41 in a manner that allows them to rotate about a rotation axis along the Z-axis direction. A second sealing strip 82 is mounted on the pair of second pulleys 84. Furthermore, the second sealing strip 82 is not annular; a portion of it is missing. The two ends of the second sealing strip 82 are connected to the two ends of the main body portion 45d of the slider 45 in the Y-axis direction. Therefore, when the slider 45 moves in the Y-axis direction, the second sealing strip 82 moves in the Y-axis direction following the movement of the slider 45. That is, the second sealing strip 82 and the main body portion 45d of the slider 45 form an annular path (second annular path) passing through the outer side of the pair of second pulleys 84.
[0085] The first sealing strip 81 and the second sealing strip 82 overlap with the first sealing strip 81 forming the outer periphery of the second sealing strip 82. The first sealing strip 81 and the second sealing strip 82 can contact each other in the region extending in the Y-axis direction (i.e., the region spaced apart from the first pulley 83 and the second pulley 84). Both the first sealing strip 81 and the second sealing strip 82 are fixed to the main body portion 45d. Thus, the first sealing strip 81 and the second sealing strip 82 move simultaneously with the movement of the main body portion 45d of the slider 45 in the Y-axis direction.
[0086] Both the first annular path of the first sealing strip 81 and the second annular path of the second sealing strip 82 form paths along the surface of the housing 41 where the opening 41a is formed in the area where the opening 41a is provided. That is, the first sealing strip 81, the second sealing strip 82, and the main body 45d of the slider 45 form paths in a manner that allows movement along the opening 41a in the Y-axis direction. At this time, the opening 41a is sealed by contact between the end of the opening 41a in the Y-axis direction, the end of the opening 41a in the Z-axis direction (vertical direction), and the first sealing strip 81 provided on the outer periphery. Therefore, the area that seals the opening 41a includes the area where the opening 41a contacts the first sealing strip 81 and the area where the first sealing strip 81 and the second sealing strip 82 move along the opening 41a. In addition, the first pulley 83 and the second pulley 84, which define the movement paths of the first sealing strip 81 and the second sealing strip 82, also function as part of the opening sealing part.
[0087] The materials of the first sealing strip 81 and the second sealing strip 82 are not particularly limited, and can be made of resins such as polyester. Alternatively, they can be made of elastic materials such as rubber. Furthermore, when the first sealing strip 81 and the second sealing strip 82 are in contact (tightly pressed) with each other and abut against the opening 41a, the sealing performance (tightness) of the opening 41a can be improved. For example, a shape and characteristic that allows the first sealing strip 81 and the second sealing strip 82 to easily adhere to each other can be formed. For example, an absorbent material such as rubber (absorbent material) can be provided on the opposing surfaces of at least one of the first sealing strip 81 and the second sealing strip 82. Furthermore, the absorbent material can be provided on the entire surface of the sealing strip or only on a portion thereof. Alternatively, instead of an absorbent material, a process that increases the coefficient of friction, such as surface roughening, can be applied to the opposing surfaces of at least one of the first sealing strip 81 and the second sealing strip 82, thereby forming the characteristic that allows the first sealing strip 81 and the second sealing strip 82 to easily adhere to each other. Examples of processes that increase the coefficient of friction include surface roughening.
[0088] like Figure 6 As shown, the portions of the first sealing strip 81 and the second sealing strip 82 that extend continuously along the Y-axis from the portion connected to the slider 45 are configured to close the opening 41a. That is, the area connected to the slider 45 seals the opening 41a while it is exposed outside the housing 41 via the opening 41a. By moving the slider 45 along the Y-axis, the portions of the first sealing strip 81 and the second sealing strip 82 configured to close the opening 41a can change. In contrast, the first pulley 83 and the second pulley 84 are configured such that double-layered overlapping first sealing strips 81 and second sealing strips 82 are arranged in the area of the opening 41a not closed by the slider 45.
[0089] Two annular paths are provided in this manner, with a double-layered overlapping first sealing strip 81 and second sealing strip 82 configured in the area of the sealing opening 41a using a first pulley 83 and a second pulley 84. Furthermore, the area of the sealing opening 41a, as described above, is the area opposite to the opening 41a and covers the end of the opening 41a.
[0090] The first sealing strip 81 and the second sealing strip 82 described above each have multiple through holes. By adjusting the overlap position of the first sealing strip 81 and the second sealing strip 82 using the first pulley 83 and the second pulley 84, the flow of gas inside the drive unit 40 in the Y-axis direction can be adjusted.
[0091] Figure 8 Figure (a) illustrates the configuration of the through holes 81a and 82a respectively provided in the first sealing strip 81 and the second sealing strip. The first sealing strip 81 and the second sealing strip 82 are provided with through holes of the same shape. The configuration of the through holes on the first sealing strip 81 and the second sealing strip 82 is not particularly limited, but at least the following condition must be met. Specifically, it is required that when the relative positions of the first sealing strip 81 and the second sealing strip 82 are changed in the extension direction (length direction) of the strip, the through holes 81a and 82a can be formed in a state where they do not overlap.
[0092] exist Figure 8 In the example shown in (a), sections with two through holes alternately formed along the width direction of the strip (by... Figure 8 (a) shows the portion indicated by the dashed line P1), and the portion with one through hole along the width direction of the strip (made by... Figure 8 (The portion indicated by the dashed line P2 shown in (a)). In the case of such a through-hole configuration, by changing the relative positions of the first sealing strip 81 and the second sealing strip 82 along the length direction, it is possible to form a state where the through-hole overlaps and a state where it does not overlap.
[0093] exist Figure 8 In the example shown in (b), the configuration of the first sealing strip 81 and the second sealing strip 82 is changed such that the portion of the first sealing strip 81 with the dashed line P1 overlaps with the portion of the second sealing strip 82 with the dashed line P2. When this state is formed, it is possible to form a state in which the through hole 81a of the first sealing strip 81 and the through hole 82a of the second sealing strip 82 do not overlap. In this case, with the first sealing strip 81 and the second sealing strip 82 overlapping, it can be said that no through hole is formed.
[0094] On the other hand, Figure 8In the example shown in (c), the configuration of the first sealing strip 81 and the second sealing strip 82 is changed such that the portion of the first sealing strip 81 with the dashed line P1 overlaps with the portion of the second sealing strip 82 with the dashed line P1. When this state is formed, it is possible to form a state in which the through hole 81a of the first sealing strip 81 overlaps with the through hole 82a of the second sealing strip 82. In this case, even in the state where the first sealing strip 81 and the second sealing strip 82 overlap, a through hole is formed.
[0095] exist Figure 9 The diagram schematically illustrates an example of the relative positions of the through holes 81a and 82a of the double-layered overlapping first sealing strip 81 and second sealing strip 82. For example... Figure 9 As shown, in the Y-axis drive section 40, in the region where the double-layered overlapping first sealing strip 81 and second sealing strip 82 close the opening 41a, a state is formed where gas cannot pass through the through holes 81a and 82a of both (first sealing strip 81 and second sealing strip 82), i.e. Figure 8 The state shown in (b). On the other hand, in the region separated from the opening 41a by the double-layered overlapping first sealing strip 81 and second sealing strip 82, (on the negative side of the X-axis direction of the opening), a state is formed in which gas can pass through the through holes 81a and 82a of both (first sealing strip 81 and second sealing strip 82), i.e. Figure 8 The state shown in (c). The relative positions of the double-overlapping first sealing strip 81 and second sealing strip 82 are adjusted using the positional relationship of the first pulley 83 and the second pulley 84. That is, relative to the first pulley 83 and the second pulley 84 arranged in a row along the Y-axis direction in the region in the positive X-axis direction (the region near the opening 41a), as shown in (c). Figure 8 As shown in (b), the through holes 81a and 82a are formed in a state where they do not overlap. On the other hand, relative to the first pulley 83 and the second pulley 84 arranged in a row along the Y-axis direction, in the region in the negative X-axis direction (the region farther from the opening 41a), as... Figure 8 As shown in (c), the through holes 81a and 82a are formed in a state where they overlap each other.
[0096] The result is, as Figure 9 As shown, the movement of gas inside and outside the housing 41 via the opening 41a is restricted. Therefore, gas is introduced into the housing 41 from the Z-axis drive section 50 only by using the fan 92 provided on the main body 45d of the slider 45. On the other hand, inside the housing 41, especially in the region in the negative X-axis direction (the region farther from the opening 41a) relative to the first pulley 83 and the second pulley 84 arranged in a row along the Y-axis direction, gas can move through the through holes 81a and 82a. Therefore, as Figure 9As shown, gas can be moved from one main surface of the first sealing strip 81 and the second sealing strip 82 in the X-axis direction to the other main surface.
[0097] Used to achieve, for example Figure 9 The configuration of the first pulley 83 and the second pulley 84, as shown in the configuration of the first sealing strip 81 and the second sealing strip 82, varies depending on the configuration of the plurality of through holes provided in each strip. For example, using a... Figure 8 The sealing strip of the through hole configuration shown in (a) is for achieving Figure 9 The structure shown requires adjusting the difference between the amount of belt movement generated by the first pulley 83 and the amount of movement generated by the second pulley 84.
[0098] The through holes 81a and 82a in the first sealing strip 81 and the second sealing strip 82 are respectively shaped to repeat in a period between adjacent dashed lines P1. Figure 9 In the structure shown, the first sealing strip 81 and the second sealing strip 82 pass through the first pulley 83 at intervals, and overlap with the second sealing strip 82 again on the opposite side (the negative X-axis region) to the opening 41a side (the region in the positive X-axis direction). The difference in the amount of movement of the sealing strips between the intervals between the movement of the first sealing strip 81 and the second sealing strip 82 is set to half a period (between dashed lines P1 and P2) or n periods + half a period (n is a natural number) relative to the period of the through hole configuration, thereby forming Figure 9 The structure shown. Depending on the configuration of the first pulley 83 and the second pulley 84, n can be changed, and the above structure can be achieved by configuring the first pulley 83 and the second pulley 84 in a manner that includes a "half-cycle" component in the difference. Furthermore, by forming the above relationship at both ends of the first sealing strip 81 and the second sealing strip 82 extending in the Y-axis direction, the structure can be achieved... Figure 9 The structure shown is such that, when viewed as a whole along the movement path of the sealing strip (including the main body 45d of the slider 45), the difference in the movement paths of the first sealing strip 81 and the second sealing strip 82 is n times the period of the through hole configuration (in this embodiment, between dashed lines P1-P2) (n is a natural number). At this time, by utilizing the path difference generated by the configuration of the pulleys on one side (positive or negative Y-axis), a deviation of half a period of the period of the through hole configuration is generated on each side, and thus a result can be obtained. Figure 9 The structure shown.
[0099] [effect]
[0100] In the Y-axis drive unit 40 of the aforementioned substrate transport device, in the area of the sealed opening (opening 41a), the multiple through holes 81a and 82a of the first sealing strip 81 and the second sealing strip 82 are arranged in a manner that does not overlap with each other. Therefore, even with the through holes 81a and 82a of the first sealing strip 81 and the second sealing strip 82, the opening 41a can be properly sealed. Thus, particles inside the housing 41 can be prevented from scattering to the outside through the opening 41a. On the other hand, since the first sealing strip 81 and the second sealing strip 82 each have multiple through holes 81a and 82a, gas inside the housing 41 can move through the through holes 81a and 82a. Therefore, exhaust by the exhaust unit (fan 91) is not obstructed by the first sealing strip 81 and the second sealing strip 82. Thus, a technique is provided that can efficiently discharge particles generated by the drive unit, including the motor 42, from inside the housing 41 during operation.
[0101] In the Y-axis drive unit 40, the slider 45 is moved in the Y-axis direction to move the holding arm 20 that holds the workpiece W. During this movement, particles are generated inside the housing 41. For example, since the slider 45 moves along the slider guides 46a and 46b, there is a possibility that lubricating oil or the like applied to the slider guides 46a and 46b may become particles and scatter. Furthermore, when the slider 45 moves, the motor 42, pulley 43, timing belt 44, etc., also move, and thus lubricating oil is applied to the contact points between these components. This lubricating oil may become particles and scatter during repeated movement of the slider 45. On the other hand, the Y-axis drive unit 40 includes a fan 91 as an exhaust mechanism. By operating the fan 91, the internal gas containing particles is exhausted to the outside. However, since various components are arranged inside the housing 41, these components may obstruct the formation of the gas flow using the fan 91. In particular, components such as sealing strips that are long and extend in the vertical direction (Z-axis direction) create a shape that significantly divides the space of the housing 41. Furthermore, in the aforementioned Y-axis drive unit 40, gas is introduced into the housing 41 from the fan 92. Since the gas from the housing of the Z-axis drive unit 50 is introduced by the fan 92, it may contain particles. Therefore, it is desirable to properly move the gas introduced from the fan 92 towards the fan 91. In this case, there is a possibility that the sealing strip, especially when disposed inside the housing 41, may hinder gas movement.
[0102] In this regard, the first sealing strip 81 and the second sealing strip 82 are each provided with multiple through holes, thus allowing gas to move through the through holes inside the housing 41. On the other hand, when sealing the opening 41a, these sealing strips are arranged such that the through holes 81a of the first sealing strip 81 and the through holes 82a of the second sealing strip 82 do not overlap, thus enabling proper sealing of the opening 41a. Therefore, the conveying unit A3, which includes the first sealing strip 81 and the second sealing strip 82, can function as a sealing strip for sealing the opening 41a and can achieve a structure inside that does not impede the movement of gas containing particles.
[0103] Furthermore, in the aforementioned conveying unit A3, the plurality of through holes 81a of the first sealing strip 81 and the plurality of through holes 82a of the second sealing strip 82 overlap in at least a portion of the area outside the region of the sealing opening 41a. Additionally, the first pulley 83 and the second pulley 84 are configured in such a way that this structure is achieved. With this structure, since the movement of gas utilizing the through holes is facilitated inside the housing 41, the discharge of particles from within the housing can be performed efficiently.
[0104] Furthermore, in the conveying unit A3, the first sealing strip 81 and the second sealing strip 82 are in contact with each other in the area of the sealing opening 41a. By forming such a structure, the opening 41a can be properly sealed, thus more reliably preventing particles from scattering to the outside. Since the opening 41a is located on the side opposite to other modules, particles may scatter to other modules when the opening 41a is open. Therefore, by forming a structure that reliably seals the opening 41a, particle scattering can be suppressed.
[0105] Alternatively, in the aforementioned conveying unit A3, an absorbent material structure may be provided on at least one of the opposing surfaces of the first sealing strip 81 and the second sealing strip 82. In this case, the adhesion between the first sealing strip 81 and the second sealing strip 82 can be improved in the area of the sealing opening 41a. Therefore, in this state, by forming the structure of the sealing opening 41a, the opening 41a can be properly sealed.
[0106] Furthermore, in the aforementioned conveying unit A3, a structure may be provided for at least one of the opposing surfaces of the first sealing strip 81 and the second sealing strip 82 to improve the coefficient of friction. In this case, the adhesion between the first sealing strip 81 and the second sealing strip 82 can be improved in the area of the sealing opening 41a. Therefore, in this state, by forming the structure of the sealing opening 41a, the opening 41a can be properly sealed.
[0107] Furthermore, the area where the adsorbent material is applied or the surface treatment is performed can be applied to both sides of the opposing surfaces of the first sealing strip 81 and the second sealing strip 82, or only to one side. In this case, the adsorbent material can be applied to the opposing surface of the second sealing strip 82 opposite to the first sealing strip 81, or a surface treatment to increase the coefficient of friction can be performed. The second sealing strip is disposed inside the first sealing strip 81, so the main surface in contact with the second pulley 84 and the opposing surface opposite to the first sealing strip 81 are different from each other. Therefore, the adsorbent material or surface treatment on the opposing surface opposite to the first sealing strip can prevent interference with the movement of the second sealing strip 82 relative to the second pulley 84, thus promoting the smooth movement of the second sealing strip 82.
[0108] [Variation Example]
[0109] The above descriptions illustrate various illustrative embodiments, but the embodiments are not limited to those described above, and various omissions, substitutions, and changes can be made. Furthermore, elements from different embodiments can be combined to form other embodiments.
[0110] For example, the structure of each part of the conveying unit A3 can be appropriately modified. Furthermore, the structure of each part of the Y-axis drive unit 40 is another example, which can be appropriately modified. For example, the structure used to drive the slider 45 can be appropriately modified.
[0111] Furthermore, there is no particular limitation on the number of the first pulley 83 for mounting the first sealing strip 81 and the second pulley 84 for mounting the second sealing strip 82. That is, more than three of each of the first pulley 83 and the second pulley 84 can be provided.
[0112] Furthermore, the number and arrangement of through holes on the first sealing strip 81 and the second sealing strip 82 do not necessarily have to be the same, and they can also be different from each other. As mentioned above, as long as the structure allows the through holes 81a and 82a to reliably close the opening 41a without overlapping in the area of the sealing opening 41a, the shape of the through holes can be appropriately changed. In addition, the through holes do not have to be formed periodically. For example, the number of through holes can be reduced in the area of the sealing strip where the sealing opening 41a can pass through, and the number of through holes can be increased in the area that moves on the back side (inner side of the housing 41).
[0113] Alternatively, the first sealing strip 81 and the second sealing strip 82 may be configured to move in a spaced-apart manner in a region different from the region of the sealing opening 41a.
[0114] Figure 10 This illustrates a portion of the movement paths of the first sealing strip 81 and the second sealing strip 82 being spaced apart from each other. Figure 10The main body of slider 45 is omitted from the diagram. Figure 10 In the example shown, a first pulley 85 and a second pulley 86 are provided as a structure for adjusting the annular path of the first sealing strip 81 and the second sealing strip 82. However, in Figure 10 In the example shown, the first pulley 85 and the second pulley 86 are not arranged in a row; the first pulley 85 is positioned below the second pulley 86. As a result, above the illustration, the first sealing strip 81 and the second sealing strip 82 can move while in contact with each other, thus enabling the area to be used for sealing the opening 41a. Conversely, below the illustration, the first sealing strip 81 and the second sealing strip 82 can move while spaced apart from each other. In this case, with the through holes of the first sealing strip 81 and the second sealing strip 82 not overlapping, gas can also move using the space between the first sealing strip 81 and the second sealing strip 82. Furthermore, as... Figure 10 As shown, when the through holes are configured to overlap each other in the vertical direction as illustrated, the movement of gas within the housing 41 becomes smoother.
[0115] As described above, the first sealing strip 81 and the second sealing strip 82 can also be configured such that, in at least a portion of the area outside the sealing opening 41a, the first sealing strip 81 and the second sealing strip 82 are spaced apart from each other. In this case, the movement of gas utilizing the plurality of through holes provided in the first sealing strip 81 and the second sealing strip 82 can be facilitated. Therefore, the discharge of particles from the housing 41 can be carried out efficiently.
[0116] Furthermore, the structure of the conveying unit A3 described in the above embodiment is just one example. In the above embodiment, the Y-axis drive unit 40 was described; the same structure can also be provided in other X-axis drive units 30, Z-axis drive units 50, rotary drive units 60, etc. In this case, the fan configuration, sealing strip configuration, etc., can be changed depending on each drive unit. However, as a structure for sealing the opening, as described above, by employing a structure consisting of two sealing strips having multiple through holes, the same effect as described above can be obtained.
[0117] Based on the above description, various embodiments of the present invention have been described in this specification for illustrative purposes. It is understood that various changes can be made without departing from the scope and spirit of the invention. Therefore, the various embodiments disclosed in this specification are not intended to be limiting, and the true scope and spirit are given by the appended claims.
Claims
1. A substrate conveying device for conveying substrates, characterized in that, include: The substrate holding portion of the substrate is retained; Support portion supporting the substrate holding portion; A drive unit that moves the support portion in one direction; A housing that houses the drive unit and has an opening extending in the direction of movement of the support unit; An opening sealing part is fixed to the support part within the housing in a movable state that accompanies the movement of the support part, thereby sealing the opening; and An exhaust section for venting air from the housing. The opening sealing part includes: A first sealing strip having multiple through holes is fixed to the support portion; Multiple first pulleys, which support the first sealing strip, to form a first annular path through the area sealing the opening using the support and the first sealing strip; A second sealing strip, having multiple through holes, is fixed to the support portion; and Multiple second pulleys, each supporting a second sealing strip, form a second annular path, via the support and the second sealing strip, at a location more circumferentially inner than the first annular path, through the area sealing the opening. The plurality of first pulleys and the plurality of second pulleys are configured such that the plurality of through holes of the first sealing strip and the plurality of through holes of the second sealing strip do not overlap with each other in the area sealing the opening.
2. The substrate conveying device as described in claim 1, characterized in that: The plurality of first pulleys and the plurality of second pulleys are configured such that a plurality of through holes in the first sealing strip overlap with a plurality of through holes in the second sealing strip in at least a portion of the area outside the area sealing the opening.
3. The substrate conveying device as described in claim 1, characterized in that: The first sealing strip and the second sealing strip are in contact with each other in the area sealing the opening.
4. The substrate conveying device as described in claim 1, characterized in that: The first sealing strip and the second sealing strip are spaced apart from each other in at least a portion of the area outside the area sealing the opening.
5. The substrate transport device as described in claim 1, characterized in that: At least one of the opposing surfaces of the first sealing strip and the second sealing strip is provided with an absorbent material.
6. The substrate conveying device as described in claim 1, characterized in that: At least one of the opposing surfaces of the first sealing strip and the second sealing strip has undergone a surface treatment to improve the coefficient of friction.
7. The substrate transport device as described in claim 1, characterized in that: On the opposite side of the second sealing strip to the first sealing strip, an absorbent material is provided or a surface treatment is performed to improve the coefficient of friction.