Organic light emitting display device

CN114420738BActive Publication Date: 2026-10-20SAMSUNG DISPLAY CO LTD
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Patent Information

Application Number
CN202210089389.6
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2015-10-23
Filing Date
2016-10-12
Publication Date
2026-10-20
Estimated Expiration
2036-10-12

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Abstract

Provided is an organic light emitting display device including: a substrate including a light emitting area and a reflection area; a first sensing electrode sensing a touch position, disposed in the reflection area, and including a material having a first reflectance; and a second sensing electrode sensing a touch position, disposed in the light emitting area and the reflection area, including a material having a second reflectance, and overlapping a portion of the first sensing electrode.
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Description

[0001] This application is a divisional application of the invention patent application filed on October 12, 2016, with application number "201610890130.6" and invention title "Organic Light Emitting Display Device". Technical Field

[0002] Exemplary embodiments of the present invention relate to an organic light-emitting display device and a method for manufacturing the organic light-emitting display device. More specifically, exemplary embodiments relate to an organic light-emitting display device having a mirror function and a touch function, and a method for manufacturing the organic light-emitting display device. Background Technology

[0003] Flat panel display (“FPD”) devices are widely used as display devices in electronic devices due to their lighter weight and thinner profile compared to cathode ray tube (“CRT”) display devices. Typical examples of flat panel display devices include liquid crystal display (“LCD”) devices and organic light-emitting diode (“OLED”) display devices. Compared to LCDs, OLEDs offer many advantages such as higher brightness and wider viewing angles. Furthermore, because OLED displays do not require backlighting, they can be manufactured to be thinner than LCDs. In OLED displays, electrons and holes are injected into a thin organic layer through the cathode and anode, where they recombine to generate excitons, thereby emitting light of a specific wavelength.

[0004] Recently, mirror-finish OLED devices have been developed, which reflect images of objects (or targets) located in front of the OLED device by including reflective components. In addition, OLEDs with both mirror and touch functions have been developed. Summary of the Invention

[0005] To manufacture an organic light-emitting diode (“OLED”) device with both mirror and touch functionality, additional processes may be required to form the electrode layer with touch functionality, increasing manufacturing costs.

[0006] An exemplary embodiment of the present invention provides an organic light-emitting display device having a mirror function and a touch function.

[0007] An exemplary embodiment of the present invention also provides a method for manufacturing the organic light-emitting display device.

[0008] In an exemplary embodiment of the organic light-emitting display device according to the present invention, the organic light-emitting display device includes: a substrate including a light-emitting region and a reflective region; a first sensing electrode for sensing a touch position, disposed in the reflective region, and comprising a material having a first reflectivity; and a second sensing electrode for sensing a touch position, disposed in the light-emitting region and the reflective region, comprising a material having a second reflectivity, and superimposed on a portion of the first sensing electrode.

[0009] In an exemplary embodiment, the organic light-emitting display device may further include a counter substrate facing the substrate. A first sensing electrode may be disposed on a first surface of the counter substrate, and a second sensing electrode may be disposed on a second surface opposite to the first surface of the counter substrate. The first sensing electrode may be disposed in the reflective region and outside the light-emitting region.

[0010] In an exemplary embodiment, the organic light-emitting display device may further include a counter substrate facing the substrate. A first sensing electrode may be disposed on the substrate, and a second sensing electrode may be disposed on a first surface of the counter substrate, or the second sensing electrode may be disposed between the substrate and the counter substrate.

[0011] In an exemplary embodiment, the organic light-emitting display device may further include a counter substrate facing the substrate. A first sensing electrode may be disposed on a first surface of the counter substrate, and the first sensing electrode may be disposed between the substrate and the counter substrate. A second sensing electrode may be disposed on the first sensing electrode. The organic light-emitting display device may further include an insulating layer disposed between the first sensing electrode and the second sensing electrode, and including an adhesive material.

[0012] In an exemplary embodiment, the organic light-emitting display device may further include a counter substrate facing the substrate. A second sensing electrode may be disposed on a first surface of the counter substrate, or between the substrate and the counter substrate, and a first sensing electrode may be disposed on the second sensing electrode.

[0013] In an exemplary embodiment, the organic light-emitting display device may further include a thin film encapsulation layer disposed on a substrate. A second sensing electrode may be disposed on the thin film encapsulation layer, and a first sensing electrode may be disposed on the second sensing electrode. The organic light-emitting display device may further include an insulating layer disposed between the first sensing electrode and the second sensing electrode, and comprising an adhesive material.

[0014] In an exemplary embodiment, the organic light-emitting display device may further include a first thin-film encapsulation layer disposed on a substrate. A second sensing electrode may be disposed on the first thin-film encapsulation layer, and the first sensing electrode may be disposed on the second sensing electrode. The organic light-emitting display device may further include a second thin-film encapsulation layer disposed between the first sensing electrode and the second sensing electrode.

[0015] In an exemplary embodiment, the first sensing electrode may include a plurality of first patterns extending along a first direction, and the second sensing electrode may include a plurality of second patterns extending along a second direction intersecting the first direction.

[0016] In an exemplary embodiment, the first pattern may include: a plurality of first sensing patterns for sensing a touch position; and a plurality of first dummy patterns disposed between the plurality of first sensing patterns. The plurality of second patterns may include: a plurality of second sensing patterns for sensing a touch position; and a plurality of second dummy patterns disposed between the plurality of second sensing patterns.

[0017] In an exemplary embodiment, the plurality of first sensing patterns may have a grid shape. The width of the plurality of second patterns in the second direction may be the same as the width of the first patterns in the first direction.

[0018] In an exemplary embodiment, the first sensing electrode may include: a plurality of first sensing patterns having a rhombus shape and sequentially connected to each other in a first direction; and a plurality of first dummy patterns having a rhombus shape disposed between the plurality of first sensing patterns and spaced apart from each other. The second sensing electrode may include: a plurality of second sensing patterns having a rhombus shape and sequentially connected to each other in a second direction intersecting the first direction; and a plurality of second dummy patterns having a rhombus shape disposed between the plurality of second sensing patterns and spaced apart from each other.

[0019] In an exemplary embodiment of a method for manufacturing an organic light-emitting display device, wherein the organic light-emitting display device includes a substrate comprising a light-emitting region and a reflective region, the method includes: forming a first sensing electrode comprising a material having a first reflectivity on the reflective region; forming a second sensing electrode on the light-emitting region and the reflective region, wherein the second sensing electrode comprises a material having a second reflectivity and is superimposed on a portion of the first sensing electrode.

[0020] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming the first sensing electrode on a first surface of the opposing substrate facing the substrate; and forming the second sensing electrode on a second surface of the opposing substrate opposite to the first surface. The first sensing electrode may be disposed in the reflective region and outside the emitting region.

[0021] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming the first sensing electrode on a substrate; and forming the second sensing electrode on a first surface of an opposing substrate facing the substrate. The second sensing electrode may be disposed between the substrate and the opposing substrate.

[0022] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming the first sensing electrode on a first surface of a counter substrate facing the substrate, the first sensing electrode being disposed between the substrate and the counter substrate; forming an insulating layer comprising an adhesive material on the first sensing electrode; and forming the second sensing electrode on the insulating layer.

[0023] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming the second sensing electrode on a first surface of a opposing substrate facing the substrate, the second sensing electrode being disposed between the substrate and the opposing substrate; forming an insulating layer comprising an adhesive material on the second sensing electrode; and forming the first sensing electrode on the insulating layer.

[0024] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming a thin film encapsulation layer on a substrate; forming the second sensing electrode on the thin film encapsulation layer; forming an insulating layer on the second sensing electrode; and forming the first sensing electrode on the insulating layer.

[0025] In an exemplary embodiment, forming the first sensing electrode and the second sensing electrode may include: forming a first thin film encapsulation layer on a substrate; forming the second sensing electrode on the first thin film encapsulation layer; forming a second thin film encapsulation layer on the second sensing electrode comprising the same material as the first thin film encapsulation layer; and forming the first sensing electrode on the second thin film encapsulation layer.

[0026] In an exemplary embodiment, the first sensing electrode may include a plurality of first patterns extending along a first direction, and the second sensing electrode may include a plurality of second patterns extending along a second direction intersecting the first direction.

[0027] In an exemplary embodiment, the first sensing electrode may include: a plurality of first sensing patterns having a rhombus shape and sequentially connected to each other in a first direction; and a plurality of first dummy patterns having a rhombus shape disposed between the plurality of first sensing patterns and spaced apart from each other. The second sensing electrode may include: a plurality of second sensing patterns having a rhombus shape and sequentially connected to each other in a second direction intersecting the first direction; and a plurality of second dummy patterns having a rhombus shape disposed between the plurality of second sensing patterns and spaced apart from each other.

[0028] According to the exemplary embodiment shown, the organic light-emitting display device includes a reflective member having both mirror and touch functionality. Therefore, the additional process for forming the electrode layer with touch functionality can be omitted. This reduces manufacturing costs.

[0029] Furthermore, the organic light-emitting display device includes a first reflective member disposed in the reflective region and a second reflective member disposed in both the light-emitting region and the reflective region. Therefore, scattering and reflection occurring at the edges of the first reflective member can be reduced.

[0030] In addition, organic light-emitting display devices include a thin-film encapsulation layer. Therefore, it is possible to manufacture flexible organic light-emitting display devices with mirror and touch functions. Attached Figure Description

[0031] The above and other features and advantages of the present invention will become clearer from the detailed description of exemplary embodiments of the invention with reference to the accompanying drawings, in which:

[0032] Figure 1 This is a plan view illustrating an exemplary embodiment of the organic light-emitting display device according to the present invention;

[0033] Figure 2 It is along Figure 1 A sectional view taken from line II′;

[0034] Figures 3 to 9 It shows the manufacturing process. Figure 2 A cross-sectional view of a method for creating an organic light-emitting display device;

[0035] Figure 10 It is shown Figure 2 A plan view of the first sensing electrode;

[0036] Figure 11 It is shown Figure 2 A plan view of the second sensing electrode;

[0037] Figure 12 It is shown Figure 10 The first sensing electrode and Figure 11 A plan view of the second sensing electrode;

[0038] Figure 13 It is shown Figure 2 A plan view of the first sensing electrode;

[0039] Figure 14 It is shown Figure 2 A plan view of the second sensing electrode;

[0040] Figure 15 It is shown Figure 13 The first sensing electrode and Figure 14 A plan view of the second sensing electrode;

[0041] Figure 16 It is shown Figure 2 A plan view of the first sensing electrode;

[0042] Figure 17 It is shown Figure 2 A plan view of the second sensing electrode;

[0043] Figure 18 It is shown Figure 16The first sensing electrode and Figure 17 A plan view of the second sensing electrode;

[0044] Figure 19 It is shown Figure 2 A plan view of the first sensing electrode;

[0045] Figure 20 It is magnification Figure 19 A plan view of part A';

[0046] Figure 21 It is shown Figure 2 A plan view of the second sensing electrode;

[0047] Figure 22 It is magnification Figure 21 A plan view of part B;

[0048] Figure 23 It is shown Figure 19 The first sensing electrode and Figure 21 A plan view of the second sensing electrode;

[0049] Figure 24 It is magnification Figure 23 A plan view of part C';

[0050] Figure 25 This is a plan view illustrating an exemplary embodiment of the organic light-emitting display device according to the present invention;

[0051] Figure 26 It is along Figure 25 A sectional view taken by line IV-IV′;

[0052] Figures 27 to 33 It shows the manufacturing process. Figure 26 A cross-sectional view of a method for creating an organic light-emitting display device;

[0053] Figure 34 It is shown Figure 26 A plan view of the first sensing electrode;

[0054] Figure 35 It is shown Figure 26 A plan view of the second sensing electrode;

[0055] Figure 36 It is shown Figure 34 The first sensing electrode and Figure 35 A plan view of the second sensing electrode;

[0056] Figure 37 It is shown Figure 26 A plan view of the first sensing electrode;

[0057] Figure 38 It is shown Figure 26 A plan view of the second sensing electrode;

[0058] Figure 39 It is shown Figure 37 The first sensing electrode and Figure 38 A plan view of the second sensing electrode;

[0059] Figure 40 It is shown Figure 26 A plan view of the first sensing electrode;

[0060] Figure 41 It is shown Figure 26 A plan view of the second sensing electrode;

[0061] Figure 42 It is shown Figure 40 The first sensing electrode and Figure 41 A plan view of the second sensing electrode;

[0062] Figure 43 It is shown Figure 26 A plan view of the first sensing electrode;

[0063] Figure 44 It is magnification Figure 43 A plan view of part D;

[0064] Figure 45 It is shown Figure 26 A plan view of the second sensing electrode;

[0065] Figure 46 It is magnification Figure 45 A plan view of part E';

[0066] Figure 47 It is shown Figure 43 The first sensing electrode and Figure 45 A plan view of the second sensing electrode;

[0067] Figure 48 It is magnification Figure 47 A plan view of part F';

[0068] Figure 49 This is a plan view illustrating an exemplary embodiment of the organic light-emitting display device according to the present invention;

[0069] Figure 50 It is along Figure 49 A cross-sectional view taken by line VV′;

[0070] Figures 51 to 58 It shows the manufacturing process. Figure 50 A cross-sectional view of a method for creating an organic light-emitting display device;

[0071] Figure 59It is shown Figure 50 A plan view of the first sensing electrode;

[0072] Figure 60 It is shown Figure 50 A plan view of the second sensing electrode;

[0073] Figure 61 It is shown Figure 59 The first sensing electrode and Figure 60 A plan view of the second sensing electrode;

[0074] Figure 62 It is shown Figure 50 A plan view of the first sensing electrode;

[0075] Figure 63 It is shown Figure 50 A plan view of the second sensing electrode;

[0076] Figure 64 It is shown Figure 62 The first sensing electrode and Figure 63 A plan view of the second sensing electrode;

[0077] Figure 65 It is shown Figure 50 A plan view of the first sensing electrode;

[0078] Figure 66 It is shown Figure 50 A plan view of the second sensing electrode;

[0079] Figure 67 It is shown Figure 65 The first sensing electrode and Figure 66 A plan view of the second sensing electrode;

[0080] Figure 68 It is shown Figure 50 A plan view of the first sensing electrode;

[0081] Figure 69 It is magnification Figure 68 A plan view of the 'G' section;

[0082] Figure 70 It is shown Figure 50 A plan view of the second sensing electrode;

[0083] Figure 71 It is magnification Figure 70 A plan view of the 'H' section;

[0084] Figure 72 It is shown Figure 68 The first sensing electrode and Figure 70 A plan view of the second sensing electrode;

[0085] Figure 73 It is magnification Figure 72 A floor plan of the 'I' section;

[0086] Figure 74 This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention;

[0087] Figure 75 It is along Figure 74 A sectional view taken by line VI-VI';

[0088] Figures 76 to 83 It shows the manufacturing process. Figure 75 A cross-sectional view of a method for creating an organic light-emitting display device;

[0089] Figure 84 It is shown Figure 75 A plan view of the first sensing electrode;

[0090] Figure 85 It is shown Figure 75 A plan view of the second sensing electrode;

[0091] Figure 86 It is shown Figure 84 The first sensing electrode and Figure 85 A plan view of the second sensing electrode;

[0092] Figure 87 It is shown Figure 75 A plan view of the first sensing electrode;

[0093] Figure 88 It is shown Figure 75 A plan view of the second sensing electrode;

[0094] Figure 89 It is shown Figure 87 The first sensing electrode and Figure 88 A plan view of the second sensing electrode;

[0095] Figure 90 It is shown Figure 75 A plan view of the first sensing electrode;

[0096] Figure 91 It is shown Figure 75 A plan view of the second sensing electrode;

[0097] Figure 92 It is shown Figure 90 The first sensing electrode and Figure 91 A plan view of the second sensing electrode;

[0098] Figure 93 It is shown Figure 75 A plan view of the first sensing electrode;

[0099] Figure 94 It is magnification Figure 93 A plan view of the 'J' section;

[0100] Figure 95 It is shown Figure 75 A plan view of the second sensing electrode;

[0101] Figure 96 It is magnification Figure 95 A plan view of the 'K' section;

[0102] Figure 97 It is shown Figure 93 The first sensing electrode and Figure 95 A plan view of the second sensing electrode;

[0103] Figure 98 It is magnification Figure 97 A plan view of the 'L' portion;

[0104] Figure 99 This is a plan view illustrating an exemplary embodiment of the organic light-emitting display device according to the present invention;

[0105] Figure 100 It is along Figure 99 A sectional view taken by line VII-VII′;

[0106] Figures 101 to 108 It shows the manufacturing process. Figure 100 A cross-sectional view of a method for creating an organic light-emitting display device;

[0107] Figure 109 It is shown Figure 100 A plan view of the first sensing electrode;

[0108] Figure 110 It is shown Figure 100 A plan view of the second sensing electrode;

[0109] Figure 111 It is shown Figure 109 The first sensing electrode and Figure 110 A plan view of the second sensing electrode;

[0110] Figure 112 It is shown Figure 100 A plan view of the first sensing electrode;

[0111] Figure 113 It is shown Figure 100 A plan view of the second sensing electrode;

[0112] Figure 114 It is shown Figure 112 The first sensing electrode and Figure 113A plan view of the second sensing electrode;

[0113] Figure 115 It is shown Figure 100 A plan view of the first sensing electrode;

[0114] Figure 116 It is shown Figure 100 A plan view of the second sensing electrode;

[0115] Figure 117 It is shown Figure 115 The first sensing electrode and Figure 116 A plan view of the second sensing electrode;

[0116] Figure 118 It is shown Figure 100 A plan view of the first sensing electrode;

[0117] Figure 119 It is magnification Figure 118 A plan view of the 'M' section;

[0118] Figure 120 It is shown Figure 100 A plan view of the second sensing electrode;

[0119] Figure 121 It is magnification Figure 120 A plan view of the 'N' part;

[0120] Figure 122 It is shown Figure 118 The first sensing electrode and Figure 120 A plan view of the second sensing electrode;

[0121] Figure 123 It is magnification Figure 122 A plan view of the 'O' part;

[0122] Figure 124 This is a plan view illustrating an exemplary embodiment of the organic light-emitting display device according to the present invention;

[0123] Figure 125 It is along Figure 124 A sectional view taken by line VIII-VIII′;

[0124] Figures 126 to 133 It shows the manufacturing process. Figure 125 A cross-sectional view of a method for creating an organic light-emitting display device;

[0125] Figure 134 It is shown Figure 125 A plan view of the first sensing electrode;

[0126] Figure 135 It is shown Figure 125A plan view of the second sensing electrode;

[0127] Figure 136 It is shown Figure 134 The first sensing electrode and Figure 135 A plan view of the second sensing electrode;

[0128] Figure 137 It is shown Figure 125 A plan view of the first sensing electrode;

[0129] Figure 138 It is shown Figure 125 A plan view of the second sensing electrode;

[0130] Figure 139 It is shown Figure 137 The first sensing electrode and Figure 138 A plan view of the second sensing electrode;

[0131] Figure 140 It is shown Figure 125 A plan view of the first sensing electrode;

[0132] Figure 141 It is shown Figure 125 A plan view of the second sensing electrode;

[0133] Figure 142 It is shown Figure 140 The first sensing electrode and Figure 141 A plan view of the second sensing electrode;

[0134] Figure 143 It is shown Figure 125 A plan view of the first sensing electrode;

[0135] Figure 144 It is magnification Figure 143 A plan view of the 'P' part;

[0136] Figure 145 It is shown Figure 125 A plan view of the second sensing electrode;

[0137] Figure 146 It is magnification Figure 145 A plan view of the 'Q' part;

[0138] Figure 147 It is shown Figure 143 The first sensing electrode and Figure 145 A plan view of the second sensing electrode; and

[0139] Figure 148 It is magnification Figure 147 Plan view of the 'R' part. Detailed Implementation

[0140] The invention will be explained in detail below with reference to the accompanying drawings. However, the invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that the invention will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. The same reference numerals throughout denote the same elements.

[0141] What will be understood is that when a component is referred to as being "on" another component, the component can be directly on the other component, or there can be intermediate components in between. Conversely, when a component is referred to as being "directly on" another component, there are no intermediate components.

[0142] It will be understood that while the terms “first,” “second,” “third,” etc., may be used herein to describe various elements, components, regions, layers, and / or parts, these elements, components, regions, layers, and / or parts should not be limited by these terms. These terms are used only to distinguish one element, component, region, layer, or part from another. Therefore, without departing from the teaching herein, the terms “first element,” “first component,” “first region,” “first layer,” or “first part” discussed below may be designated as a second element, second component, second region, second layer, or second part.

[0143] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used herein, unless the context clearly indicates otherwise, the singular forms “a” and “the” (including “at least one”) are intended to include the plural forms. “Or” means “and / or”. As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. It will also be understood that the terms “comprising” or “including” as used in this specification indicate the presence of the stated features, regions, integrals, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, regions, integrals, steps, operations, elements, components, and / or groups thereof.

[0144] Furthermore, relative terms such as “down” or “bottom” and “up” or “top” may be used here to describe the relationship between one element and another, as shown in the figures. It will be understood that relative terms are intended to include different orientations besides those depicted in the figures. In an exemplary embodiment, when the device in a figure is flipped, an element described as being “below” the other element will then be positioned “above” the other element. Depending on the specific orientation of the figure, the exemplary term “down” can therefore include both “below” and “up” orientations. Similarly, when the device in a figure is flipped, an element described as being “below” or “under” the other element will then be positioned “above” the other element. The exemplary terms “below” or “under” can therefore include both “above” and “below” orientations.

[0145] As used herein, “approximately” includes the stated value and means: within an acceptable range of deviation from the specific value as determined by one of ordinary skill in the art, taking into account the measurement being discussed and the errors associated with the measurement of the specific quantity (i.e., the limitations of the measurement system). For example, “approximately” may mean within one or more standard deviations, or within ±30%, ±20%, ±10%, ±5% of the stated value.

[0146] Unless otherwise defined, all terms used herein (including technical and scientific terms) shall have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. It will also be understood that, unless expressly defined herein, terms (such as those defined in a common dictionary) shall be interpreted as having a meaning consistent with their meaning in the context of the relevant field and in this invention, and not as having an idealized or overly formal meaning.

[0147] Exemplary embodiments are described herein with reference to cross-sectional views, which are schematic representations of idealized embodiments. Thus, variations in the illustrated shape are expected, for example, due to manufacturing techniques and / or tolerances. Therefore, the embodiments described herein should not be construed as limited to the specific shapes of the regions shown herein, but will include, for example, deviations in shape due to manufacturing processes. In exemplary embodiments, regions shown or described as flat generally have rough and / or non-linear characteristics. Furthermore, acute angles shown may be rounded. Therefore, the regions shown in the figures are purely schematic, and their shapes are not intended to represent the precise shapes of the regions, nor are they intended to limit the scope of the claims.

[0148] Figure 1 This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 2 It is along Figure 1 The sectional view taken from line II′.

[0149] Reference Figure 1 and Figure 2 An organic light-emitting display device according to an exemplary embodiment of the present invention may include a light-emitting region II and a reflective region III. Pixels 60, 70, and 80 may be located in the light-emitting region II, and a transparent window may be located in the reflective region III. In an exemplary embodiment, for example, pixel 60 may be a pixel emitting red, pixel 70 may be a pixel emitting green, and pixel 80 may be a pixel emitting blue.

[0150] A reflective member may be disposed in the light-emitting region II and the reflective region III. The reflective member may include a first reflective member disposed in the reflective region III and a second reflective member disposed in both the light-emitting region II and the reflective region III. The first reflective member may have a different reflectivity than the second reflective member. When the reflective member only includes the first reflective member, scattered reflection occurs at the edge of the first reflective member. However, the organic light-emitting display device according to an exemplary embodiment of the present invention includes a second reflective member disposed in both the light-emitting region II and the reflective region III. Therefore, scattered reflection occurring at the edge of the first reflective member can be reduced. In other exemplary embodiments, the first reflective member may be superimposed on a portion of pixels 60, 70, and 80. The first reflective member is disposed outside pixels 60, 70, and 80, such that the first reflective member can be superimposed on a portion of pixels 60, 70, and 80.

[0151] According to an exemplary embodiment of the present invention, the first reflective member may be a first sensing electrode 370 comprising a material having a predetermined reflectivity. Additionally, according to an exemplary embodiment of the present invention, the second reflective member may be a second sensing electrode 390 comprising a material having a predetermined reflectivity and sensing a touch position. The first sensing electrode 370 may be stacked with the second sensing electrode 390.

[0152] The first sensing electrode 370 and the second sensing electrode 390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 370 and the second sensing electrode 390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0153] The first sensing electrode 370 may have a different thickness than the second sensing electrode 390. In an exemplary embodiment, the thickness of the first sensing electrode 370, measured along the cross-sectional direction, may be, for example, approximately 1000 angstroms. When the thickness of the first sensing electrode 370 is approximately At this time, the transmittance of the first sensing electrode 370 can be approximately 0% (0%), and the reflectance of the first sensing electrode 370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 390, measured along the cross-sectional direction, can be approximately... When the thickness of the second sensing electrode 390 is approximately At this time, the transmittance of the second sensing electrode 390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 390 can perform a mirror function.

[0154] An organic light-emitting display device according to an exemplary embodiment of the present invention includes a first substrate 110, a buffer layer 115, a first insulating layer 150, a second insulating layer 190, a third insulating layer 270, a light-emitting structure, a pixel defining layer 310, a first sensing electrode 370, a second sensing electrode 390, and a second substrate 350. Here, the light-emitting structure includes a semiconductor element 250, a first electrode 290, a light-emitting layer 330, and a second electrode 340. The semiconductor element 250 includes an active pattern (active layer) 130, a gate electrode 170, a source electrode 210, and a drain electrode 230. An opening 380 is defined in the first sensing electrode 370.

[0155] Organic light-emitting display device 100 may include multiple pixel regions Px (refer to...) Figure 12 A pixel region may include a light-emitting region II and a reflective region III. The reflective region III may substantially surround the light-emitting region II. A portion of the semiconductor element 250, the first electrode 290, the light-emitting layer 330, and the second electrode 340 may be disposed in the light-emitting region II. However, the invention is not limited thereto, and the semiconductor element 250 may also be disposed in the reflective region III. Additionally, the first sensing electrode 370 may be disposed in the reflective region III and outside the light-emitting region II, and the second sensing electrode 390 may be disposed in both the light-emitting region II and the reflective region III.

[0156] The image can be displayed in the luminescent area II. The image of an object located in front of the organic light-emitting display device 100 can be reflected in the reflective area III.

[0157] A light-emitting structure can be disposed on a first substrate 110. The first substrate 110 may include a transparent material. In an exemplary embodiment, the first substrate 110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, the polyimide substrate may be disposed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is disposed on the second polyimide layer, the light-emitting structure (e.g., semiconductor element 250, capacitor, first electrode 290, light-emitting layer 330, second electrode 340, etc.) can be disposed on the insulating layer.

[0158] After the light-emitting structure is disposed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to directly dispose of the light-emitting structure on it. Therefore, the light-emitting structure is disposed on a rigid glass substrate, and then, after removing the glass substrate, the polyimide substrate can be used as the first substrate 110. Because the organic light-emitting display device 100 includes a light-emitting region II and a reflective region III, the first substrate 110 may also include a light-emitting region II and a reflective region III.

[0159] A buffer layer 115 may be disposed on the first substrate 110. The buffer layer 115 may extend from the light-emitting region II into the reflective region III. The buffer layer 115 may prevent metal atoms and / or impurities from diffusing from the first substrate 110 (e.g., venting). In addition, the buffer layer 115 may control the heat transfer rate in the crystallization process used to form the active pattern 130, thereby obtaining a substantially uniform active pattern 130. Furthermore, when the surface of the first substrate 110 is relatively irregular, the buffer layer 115 may improve the surface flatness of the first substrate 110. Depending on the type of the first substrate 110, at least two buffer layers may be disposed on the first substrate 110, or no buffer layer may be disposed.

[0160] Semiconductor element 250 may include an active pattern 130, a gate electrode 170, a source electrode 210, and a drain electrode 230. In an exemplary embodiment, for example, the active pattern 130 may be disposed on a first substrate 110. In an exemplary embodiment, the active pattern 130 may include, for example, an oxide semiconductor, an inorganic semiconductor (e.g., amorphous silicon, polycrystalline silicon, etc.), an organic semiconductor, etc.

[0161] A first insulating layer 150 may be disposed on the active pattern 130. The first insulating layer 150 may cover the active pattern 130 in the light-emitting region II and may extend along a first direction on the first substrate 110. That is, the first insulating layer 150 may be disposed on the entire surface of the first substrate 110. In an exemplary embodiment, the first insulating layer 150 may include, for example, a silicon compound, a metal oxide, etc.

[0162] The gate electrode 170 may be disposed on a portion of the first insulating layer 150 beneath which the active pattern 130 is disposed. In an exemplary embodiment, the gate electrode 170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0163] The second insulating layer 190 may be disposed on the gate electrode 170. The second insulating layer 190 may cover the gate electrode 170 in the light-emitting region II and may extend along a first direction on the first substrate 110. That is, the second insulating layer 190 may be disposed on the entire surface of the first substrate 110. In an exemplary embodiment, the second insulating layer 190 may include, for example, a silicon compound, a metal oxide, etc.

[0164] Source electrode 210 and drain electrode 230 may be disposed on the second insulating layer 190. By removing a portion of the first insulating layer 150 and the second insulating layer 190, source electrode 210 may contact a first side of active pattern 130. By removing a second portion of the first insulating layer 150 and the second insulating layer 190, drain electrode 230 may contact a second side of active pattern 130. In an exemplary embodiment, each of source electrode 210 and drain electrode 230 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0165] A third insulating layer 270 may be disposed on the source electrode 210 and the drain electrode 230. The third insulating layer 270 may cover the source electrode 210 and the drain electrode 230 in the sub-pixel region II and may extend along a first direction on the first substrate 110. That is, the third insulating layer 270 may be disposed on the entire surface of the first substrate 110. In an exemplary embodiment, the third insulating layer 270 may include, for example, a silicon compound, a metal oxide, etc.

[0166] The first electrode 290 may be disposed on the third insulating layer 270. By removing a portion of the third insulating layer 270, the first electrode 290 may come into contact with the drain electrode 230. Additionally, the first electrode 290 may be electrically connected to the semiconductor element 250. In an exemplary embodiment, the first electrode 290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0167] In the exemplary embodiment shown, the gate electrode 170 is disposed on the active pattern 130. However, the invention is not limited thereto, and the gate electrode 170 may be disposed below the active pattern 130.

[0168] The pixel defining layer 310 may be disposed on the third insulating layer 270 to expose a portion of the first electrode 290. The pixel defining layer 310 may comprise an organic or inorganic material. In this case, the light-emitting layer 330 may be disposed on the portion of the first electrode 290 exposed by the pixel defining layer 310.

[0169] The light-emitting layer 330 can be disposed on the exposed first electrode 290. The light-emitting layer 330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 330 can be stacked with light-emitting materials capable of producing different colors of light to emit white light.

[0170] The second electrode 340 can be disposed on the pixel defining layer 310 and the light-emitting layer 330. The second electrode 340 can cover the pixel defining layer 310 and the light-emitting layer 330 in the light-emitting region II and the reflective region III, and can extend along a first direction on the first substrate 110. That is, the second electrode 340 can be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 340 can include, for example, metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These materials can be used individually or in combination. The first substrate 110 can be bonded to the second substrate 350 using a sealing member. Additionally, a filler can be disposed between the first substrate 110 and the second substrate 350.

[0171] The first sensing electrode 370 may be disposed on the first surface of the second substrate 350. The first surface of the first sensing electrode 370 may face the second electrode 340, and the second surface of the first sensing electrode 370 opposite to the first surface may be in contact with the second substrate 350. However, the present invention is not limited thereto, and an insulating layer may be disposed between the second substrate 350 and the first sensing electrode 370.

[0172] The first sensing electrode 370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 370 may include, for example, an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x ), Strontium ruthenium oxide (SRO), zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0173] The second substrate 350 and the first substrate 110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 350 may comprise, for example, a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 100, the second substrate 350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0174] The second sensing electrode 390 can be disposed on the second surface of the second substrate 350 opposite to the first surface. The second sensing electrode 390 can be disposed in the light-emitting region II and the reflective region III. However, the present invention is not limited thereto, and an insulating layer can be disposed between the second substrate 350 and the second sensing electrode 390.

[0175] The second sensing electrode 390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0176] A fifth insulating layer 392 may be disposed on the second sensing electrode 390. In an exemplary embodiment, the fifth insulating layer 392 may include, for example, a silicon compound, a metal oxide, etc.

[0177] In the exemplary embodiment shown, the first sensing electrode 370 may be disposed on the first surface of the second substrate 350, and the second sensing electrode 390 may be disposed on the second surface of the second substrate 350 opposite to the first surface. However, the present invention is not limited thereto; the first sensing electrode 370 may be disposed on the second surface of the second substrate 350, and the second sensing electrode 390 may be disposed on the first surface of the second substrate 350.

[0178] Figures 3 to 9 It shows the manufacturing process. Figure 2 A cross-sectional view of a method for developing an organic light-emitting display device.

[0179] Reference Figure 3 A buffer layer 115 is disposed on the first substrate 110. Then, an active pattern 130 and a first insulating layer 150 are disposed on the buffer layer 115.

[0180] In an exemplary embodiment, the first substrate 110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0181] A light-emitting structure can be formed on a first substrate 110. The first substrate 110 may include a transparent material. In an exemplary embodiment, the first substrate 110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after an insulating layer is formed on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 250, capacitor, first electrode 290, light-emitting layer 330, second electrode 340, etc.) may be formed on the insulating layer.

[0182] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 110 after the glass substrate is removed. Because the organic light-emitting display device 100 includes a light-emitting region II and a reflective region III, the first substrate 110 can also include a light-emitting region II and a reflective region III.

[0183] A buffer layer 115 can be disposed on the first substrate 110. The buffer layer 115 can extend from the light-emitting region II into the reflective region III. The buffer layer 115 can prevent metal atoms and / or impurities from diffusing from the first substrate 110 (e.g., venting). In addition, the buffer layer 115 can control the heat transfer rate in the crystallization process used to form the active pattern 130, thereby obtaining a substantially uniform active pattern 130. Furthermore, when the surface of the first substrate 110 is relatively irregular, the buffer layer 115 can improve the surface flatness of the first substrate 110. Depending on the type of the first substrate 110, at least two buffer layers can be disposed on the first substrate 110, or no buffer layer may be disposed.

[0184] In an exemplary embodiment, the active pattern 130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0185] A first insulating layer 150 may be disposed on the active pattern 130. The first insulating layer 150 may cover the active pattern 130 in the light-emitting region II and may extend along a first direction on the first substrate 110. That is, the first insulating layer 150 may be disposed on the entire surface of the first substrate 110. In an exemplary embodiment, the first insulating layer 150 may include, for example, a silicon compound, a metal oxide, etc.

[0186] Reference Figure 4 A gate electrode 170 and a second insulating layer 190 are disposed on a first substrate 110 on which a first insulating layer 150 is disposed.

[0187] The gate electrode 170 may be disposed on a portion of the first insulating layer 150 beneath which the active pattern 130 is disposed. In an exemplary embodiment, the gate electrode 170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0188] A second insulating layer 190 may be disposed on the gate electrode 170. The second insulating layer 190 may cover the gate electrode 170 in the light-emitting region II and may extend along a first direction on the first substrate 110. That is, the second insulating layer 190 may be disposed on the entire surface of the first substrate 110. In an exemplary embodiment, the second insulating layer 190 may include, for example, a silicon compound, a metal oxide, etc.

[0189] Reference Figure 5 A source electrode 210 and a drain electrode 230 are disposed on a first substrate 110 on which a second insulating layer 190 is disposed.

[0190] A source electrode 210 and a drain electrode 230 may be disposed on the second insulating layer 190. By removing a portion of the first insulating layer 150 and the second insulating layer 190, the source electrode 210 may contact a first side of the active layer 130. By removing a second portion of the first insulating layer 150 and the second insulating layer 190, the drain electrode 230 may contact a second side of the active layer 130. In an exemplary embodiment, each of the source electrode 210 and the drain electrode 230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0191] In the exemplary embodiment shown, a gate electrode 170 is disposed on the active pattern 130. However, the invention is not limited thereto, and the gate electrode 170 may be disposed below the active pattern 130.

[0192] Reference Figure 6 A third insulating layer 270 and a first electrode 290 are disposed on a first substrate 110 on which an active electrode 210 and a drain electrode 230 are disposed.

[0193] A third insulating layer 270 may be formed on the source electrode 210 and the drain electrode 230. The third insulating layer 270 may cover the source electrode 210 and the drain electrode 230 in the sub-pixel region II and may extend along a first direction on the first substrate 110. That is, the third insulating layer 270 may be formed on the entire surface of the first substrate 110. In an exemplary embodiment, the third insulating layer 270 may include, for example, a silicon compound, a metal oxide, etc.

[0194] A first electrode 290 may be disposed on the third insulating layer 270. By removing a portion of the third insulating layer 270, the first electrode 290 may come into contact with the drain electrode 230. Additionally, the first electrode 290 may be electrically connected to the semiconductor element 250. In an exemplary embodiment, the first electrode 290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0195] Reference Figure 7A pixel defining layer 310, a light emitting layer 330, and a second electrode 340 are disposed on a first substrate 110 on which a first electrode 290 is disposed.

[0196] A pixel defining layer 310 may be formed on the third insulating layer 270 to expose a portion of the first electrode 290. The pixel defining layer 310 may comprise an organic or inorganic material. In this case, a light-emitting layer 330 may be formed on the portion of the first electrode 290 exposed by the pixel defining layer 310.

[0197] A light-emitting layer 330 can be disposed on the exposed first electrode 290. The light-emitting layer 330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0198] A second electrode 340 can be disposed on the pixel defining layer 310 and the light-emitting layer 330. The second electrode 340 can cover the pixel defining layer 310 and the light-emitting layer 330 in the light-emitting region II and the reflective region III, and can extend along a first direction on the first substrate 110. That is, the second electrode 340 can be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 340 may include, for example, metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These materials can be used alone or in combination. The first substrate 110 and the second substrate 350 can be bonded together by using a sealing member. In addition, a filler can be disposed between the first substrate 110 and the second substrate 350.

[0199] Reference Figure 8 A first sensing electrode 370 is disposed on the second substrate 350.

[0200] A first sensing electrode 370 may be disposed on a first surface of a second substrate 350. The first surface of the first sensing electrode 370 may face the second electrode 340, and the second surface of the first sensing electrode 370 opposite to the first surface may contact the second substrate 350.

[0201] The first sensing electrode 370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 370 may include, for example, an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0202] The second substrate 350 and the first substrate 110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 350 may comprise quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 350 may comprise a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 100, the second substrate 350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0203] Reference Figure 9 A second sensing electrode 390 is disposed on a second surface of the second substrate 350 opposite to the first surface. A fifth insulating layer 392 is disposed on the second sensing electrode 390.

[0204] The second sensing electrode 390 can be disposed on the second surface of the second substrate 350 opposite to the first surface. The second sensing electrode 390 can be disposed in the light-emitting region II and the reflective region III. However, the present invention is not limited thereto, and an insulating layer can be disposed between the second substrate 350 and the second sensing electrode 390.

[0205] The second sensing electrode 390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) xIndium oxide (InO) x Gallium oxide (GaO) x )wait.

[0206] Figure 10 It is shown Figure 2 A plan view of the first sensing electrode. Figure 11 It is shown Figure 2 A plan view of the second sensing electrode. Figure 12 It is shown Figure 10 The first sensing electrode and Figure 11 A plan view of the second sensing electrode.

[0207] Reference Figure 2 as well as Figures 10 to 12 The first sensing electrode 370 and the second sensing electrode 390 are shown.

[0208] The first sensing electrode 370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 370 is disposed in the reflective region III. The first sensing electrode 370 can be connected to the sensing drive component via a first connecting line 375. The first connecting line 375 can include the same material as the first sensing electrode 370. The first connecting line 375 can be disposed on the same layer as the layer on which the first sensing electrode 370 is disposed.

[0209] The second sensing electrode 390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 390 can be connected to a sensing drive component via a second connecting line 395. The second connecting line 395 can comprise the same material as the second sensing electrode 390. The second connecting line 395 can be disposed on the same layer as the layer on which the second sensing electrode 390 is disposed.

[0210] The first sensing electrode 370 may include a material having a predetermined reflectivity. The second sensing electrode 390 may include a material having a predetermined reflectivity. The first sensing electrode 370 may be partially stacked with the second sensing electrode 390.

[0211] The first sensing electrode 370 may be disposed on the first surface of the second substrate 350. The second sensing electrode 390 may be disposed on the second surface of the second substrate 350 opposite to the first surface.

[0212] The first sensing electrode 370 and the second sensing electrode 390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 370 and the second sensing electrode 390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0213] The first sensing electrode 370 may have a different thickness than the second sensing electrode 390. In an exemplary embodiment, the thickness of the first sensing electrode 370 may be, for example, approximately... When the thickness of the first sensing electrode 370 is approximately At this time, the transmittance of the first sensing electrode 370 can be approximately 0%, and the reflectance of the first sensing electrode 370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 390 can be approximately... When the thickness of the second sensing electrode 390 is approximately At this time, the transmittance of the second sensing electrode 390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 390 can perform a mirror function.

[0214] Figure 13 It is shown Figure 2 A plan view of the first sensing electrode. Figure 14 It is shown Figure 2 A plan view of the second sensing electrode. Figure 15 It is shown Figure 13 The first sensing electrode and Figure 14 A plan view of the second sensing electrode.

[0215] Reference Figure 2 as well as Figures 13 to 15 The first sensing electrode 370 and the second sensing electrode 390 are shown.

[0216] The first sensing electrode 370 may include a plurality of first sensing patterns 371 extending along the second direction D2 and a plurality of first dummy patterns 373 disposed between the first sensing patterns 371. The first sensing electrode 370 is disposed in the reflection region III. The spacing of the first sensing patterns 371 may be adjusted according to the number of first dummy patterns 373. The first sensing electrode 370 may be connected to a sensing drive component via a first connecting line 375. The first connecting line 375 may include the same material as the first sensing electrode 370. The first connecting line 375 may be disposed on the same layer as the layer on which the first sensing electrode 370 is disposed.

[0217] The second sensing electrode 390 can be configured as a plurality of second sensing patterns 391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 393 disposed between the second sensing patterns 391. The second sensing electrode 390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 390 can be adjusted according to the number of second dummy patterns 393. The second sensing electrode 390 can be connected to the sensing drive component via a second connecting line 395. The second connecting line 395 can include the same material as the second sensing electrode 390. The second connecting line 395 can be disposed on the same layer as the layer on which the second sensing electrode 390 is disposed.

[0218] The first sensing electrode 370 may include a material having a predetermined reflectivity. The second sensing electrode 390 may include a material having a predetermined reflectivity. The first sensing electrode 370 may be partially stacked with the second sensing electrode 390.

[0219] The first sensing electrode 370 may be disposed on the first surface of the second substrate 350. The second sensing electrode 390 may be disposed on the second surface of the second substrate 350 opposite to the first surface.

[0220] The first sensing electrode 370 may have a different thickness than the second sensing electrode 390. In an exemplary embodiment, the thickness of the first sensing electrode 370 may be, for example, approximately... When the thickness of the first sensing electrode 370 is approximately At this time, the transmittance of the first sensing electrode 370 can be approximately 0%, and the reflectance of the first sensing electrode 370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 390 can be approximately... When the thickness of the second sensing electrode 390 is approximately At this time, the transmittance of the second sensing electrode 390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 390 can perform a mirror function.

[0221] The first sensing electrode 370 and the second sensing electrode 390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 370 and the second sensing electrode 390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0222] Figure 16 It is shown Figure 2 A plan view of the first sensing electrode. Figure 17It is shown Figure 2 A plan view of the second sensing electrode. Figure 18 It is shown Figure 16 The first sensing electrode and Figure 17 A plan view of the second sensing electrode.

[0223] Reference Figure 2 as well as Figures 16 to 18 The first sensing electrode 370 and the second sensing electrode 390 are shown.

[0224] The first sensing electrode 370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 370 can be configured as a grid shape. The first sensing electrode 370 is disposed in the reflective region III. The first sensing electrode 370 can be connected to a sensing drive component via a first connecting line 375. The first connecting line 375 can include the same material as the first sensing electrode 370. The first connecting line 375 can be disposed on the same layer as the layer on which the first sensing electrode 370 is disposed.

[0225] The second sensing electrode 390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 390 in the second direction D2 is the same as the width of the first sensing electrode 370 in the first direction D1. The second sensing electrode 390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 390 can be connected to a sensing driving component via a second connecting line 395. The second connecting line 395 can include the same material as the second sensing electrode 390. The second connecting line 395 can be disposed on the same layer as the layer on which the second sensing electrode 390 is disposed.

[0226] The first sensing electrode 370 may include a material having a predetermined reflectivity. The second sensing electrode 390 may include a material having a predetermined reflectivity. The first sensing electrode 370 may be partially stacked with the second sensing electrode 390.

[0227] The first sensing electrode 370 may be disposed on the first surface of the second substrate 350. The second sensing electrode 390 may be disposed on the second surface of the second substrate 350 opposite to the first surface.

[0228] The first sensing electrode 370 and the second sensing electrode 390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 370 and the second sensing electrode 390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0229] The first sensing electrode 370 may have a different thickness than the second sensing electrode 390. In an exemplary embodiment, the thickness of the first sensing electrode 370 may be, for example, approximately... When the thickness of the first sensing electrode 370 is approximately At this time, the transmittance of the first sensing electrode 370 can be approximately 0%, and the reflectance of the first sensing electrode 370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 390 can be approximately... When the thickness of the second sensing electrode 390 is approximately At this time, the transmittance of the second sensing electrode 390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 390 can perform a mirror function.

[0230] Figure 19 It is shown Figure 2 A plan view of the first sensing electrode. Figure 20 It is magnification Figure 19 Plan view of part A'. Figure 21 It is shown Figure 2 A plan view of the second sensing electrode. Figure 22 It is magnification Figure 21 Plan view of part 'B'. Figure 23 It is shown Figure 19 The first sensing electrode and Figure 21 A plan view of the second sensing electrode. Figure 24 It is magnification Figure 23 Plan view of part C'.

[0231] Reference Figure 2 as well as Figures 19 to 24 The first sensing electrode 370 and the second sensing electrode 390 are shown.

[0232] The first sensing electrode 370 may include a plurality of first sensing patterns 371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 373 having a rhomboid shape and disposed between the first sensing patterns 371. The first dummy patterns 373 are spaced apart from each other. The first sensing electrode 370 is disposed in the reflection region III. The first sensing electrode 370 may be connected to a sensing drive component via a first connecting line 375. The first connecting line 375 may include the same material as the first sensing electrode 370. The first connecting line 375 may be disposed on the same layer as the layer on which the first sensing electrode 370 is disposed.

[0233] The second sensing electrode 390 may include a plurality of second sensing patterns 391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 393 having a rhomboid shape and disposed between the second sensing patterns 391. The second dummy patterns 393 are spaced apart from each other. The second sensing electrode 390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 390 may be connected to a sensing driving component via a second connecting line 395. The second connecting line 395 may include the same material as the second sensing electrode 390. The second connecting line 395 may be disposed on the same layer as the layer on which the second sensing electrode 390 is disposed.

[0234] The first sensing electrode 370 may include a material having a predetermined reflectivity. The second sensing electrode 390 may include a material having a predetermined reflectivity. The first sensing electrode 370 may be partially stacked with the second sensing electrode 390.

[0235] The first sensing electrode 370 may be disposed on the first surface of the second substrate 350. The second sensing electrode 390 may be disposed on the second surface of the second substrate 350 opposite to the first surface.

[0236] The first sensing electrode 370 and the second sensing electrode 390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 370 and the second sensing electrode 390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0237] The first sensing electrode 370 may have a different thickness than the second sensing electrode 390. In an exemplary embodiment, the thickness of the first sensing electrode 370 may be, for example, approximately... When the thickness of the first sensing electrode 370 is approximately At this time, the transmittance of the first sensing electrode 370 can be approximately 0%, and the reflectance of the first sensing electrode 370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 390 can be approximately... When the thickness of the second sensing electrode 390 is approximately At this time, the transmittance of the second sensing electrode 390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 390 can perform a mirror function.

[0238] Figure 25 This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 26 It is along Figure 25 A sectional view taken from line IV-IV′.

[0239] In addition to the first sensing electrode 1370 and the second sensing electrode 1390, the organic light-emitting display device according to the illustrated exemplary embodiment and Figure 1 and Figure 2 The organic light-emitting display devices are basically the same, therefore similar reference numerals are used for the same elements and repeated explanations will be omitted.

[0240] Reference Figure 25 and Figure 26 The first sensing electrode 1370 is disposed on the second electrode 1340. The first sensing electrode 1370 is disposed on the first substrate 1110. The first sensing electrode 1370 may be disposed in the reflective region III and outside the light-emitting region II.

[0241] The first sensing electrode 1370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 1370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 1370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 1370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0242] The second substrate 1350 and the first substrate 1110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 1350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 1350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 1350 may comprise, for example, a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 1100, the second substrate 1350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0243] The second sensing electrode 1390 may be disposed on the second substrate 1350. The second sensing electrode 1390 may be disposed in the light-emitting region II and the reflective region III. However, the present invention is not limited thereto, and an insulating layer may be disposed between the second substrate 1350 and the second sensing electrode 1390.

[0244] The second sensing electrode 1390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 1390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 1390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 1390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0245] The first sensing electrode 1370 may have a different thickness than the second sensing electrode 1390. In an exemplary embodiment, the thickness of the first sensing electrode 1370 may be, for example, approximately When the thickness of the first sensing electrode 1370 is approximately At this time, the transmittance of the first sensing electrode 1370 can be approximately 0%, and the reflectance of the first sensing electrode 1370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 1390 can be approximately... When the thickness of the second sensing electrode 1390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 1390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 1390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 1390 can perform a mirror function.

[0246] Figures 27 to 33 It shows the manufacturing process. Figure 26 A cross-sectional view of a method for developing an organic light-emitting display device.

[0247] Reference Figure 27A buffer layer 1115 is disposed on the first substrate 1110. Then, an active pattern 1130 and a first insulating layer 1150 are disposed on the buffer layer 1115.

[0248] In an exemplary embodiment, the first substrate 1110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0249] A light-emitting structure can be formed on a first substrate 1110. The first substrate 1110 may include a transparent material. In an exemplary embodiment, the first substrate 1110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 1110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 1110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 1110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is provided on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 1250, capacitor, first electrode 1290, light-emitting layer 1330, second electrode 1340, etc.) can be provided on the insulating layer.

[0250] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 1110 after the glass substrate is removed. Because the organic light-emitting display device 1100 includes a light-emitting region II and a reflective region III, the first substrate 1110 can also include a light-emitting region II and a reflective region III.

[0251] A buffer layer 1115 can be disposed on the first substrate 1110. The buffer layer 1115 can extend from the light-emitting region II into the reflective region III. The buffer layer 1115 can prevent metal atoms and / or impurities from diffusing from the first substrate 1110 (e.g., venting). In addition, the buffer layer 1115 can control the heat transfer rate in the crystallization process used to form the active pattern 1130, thereby obtaining a substantially uniform active pattern 1130. Furthermore, when the surface of the first substrate 1110 is relatively irregular, the buffer layer 1115 can improve the surface flatness of the first substrate 1110. Depending on the type of the first substrate 1110, at least two buffer layers can be disposed on the first substrate 1110, or no buffer layer may be disposed.

[0252] In an exemplary embodiment, the active pattern 1130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0253] A first insulating layer 1150 may be disposed on the active pattern 1130. The first insulating layer 1150 may cover the active pattern 1130 in the light-emitting region II and may extend along a first direction on the first substrate 1110. That is, the first insulating layer 1150 may be disposed on the entire surface of the first substrate 1110. In an exemplary embodiment, the first insulating layer 1150 may include, for example, a silicon compound, a metal oxide, etc.

[0254] Reference Figure 28 A gate electrode 1170 and a second insulating layer 1190 are disposed on a first substrate 1110 on which a first insulating layer 1150 is disposed.

[0255] A gate electrode 1170 may be disposed on a portion of the first insulating layer 1150 on which the active pattern 1130 is disposed. In an exemplary embodiment, the gate electrode 1170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0256] A second insulating layer 1190 may be disposed on the gate electrode 1170. The second insulating layer 1190 may cover the gate electrode 1170 in the light-emitting region II and may extend along a first direction on the first substrate 1110. That is, the second insulating layer 1190 may be disposed on the entire surface of the first substrate 1110. In an exemplary embodiment, the second insulating layer 1190 may include, for example, a silicon compound, a metal oxide, etc.

[0257] Reference Figure 29 A source electrode 1210 and a drain electrode 1230 are disposed on a first substrate 1110 on which a second insulating layer 1190 is disposed.

[0258] A source electrode 1210 and a drain electrode 1230 may be disposed on the second insulating layer 1190. By removing a portion of the first insulating layer 1150 and the second insulating layer 1190, the source electrode 1210 may contact a first side of the active layer 1130. By removing a second portion of the first insulating layer 1150 and the second insulating layer 1190, the drain electrode 1230 may contact a second side of the active layer 1130. In an exemplary embodiment, each of the source electrode 1210 and the drain electrode 1230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0259] In the exemplary embodiment shown, a gate electrode 1170 is provided on the active pattern 1130. However, the invention is not limited thereto, and the gate electrode 1170 may be provided below the active pattern 1130.

[0260] Reference Figure 30 A third insulating layer 1270 and a first electrode 1290 are disposed on a first substrate 1110 on which an active electrode 1210 and a drain electrode 1230 are disposed.

[0261] A third insulating layer 1270 may be formed on the source electrode 1210 and the drain electrode 1230. The third insulating layer 1270 may cover the source electrode 1210 and the drain electrode 1230 in the sub-pixel region II, and may extend along a first direction on the first substrate 1110. That is, the third insulating layer 1270 may be formed on the entire surface of the first substrate 1110. In an exemplary embodiment, the third insulating layer 1270 may include, for example, a silicon compound, a metal oxide, etc.

[0262] A first electrode 1290 may be disposed on the third insulating layer 1270. By removing a portion of the third insulating layer 1270, the first electrode 1290 may come into contact with the drain electrode 1230. Additionally, the first electrode 1290 may be electrically connected to the semiconductor element 1250. In an exemplary embodiment, the first electrode 1290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0263] Reference Figure 31 A pixel defining layer 1310, a light emitting layer 1330, and a second electrode 1340 are disposed on a first substrate 1110 on which a first electrode 1290 is disposed.

[0264] A pixel defining layer 1310 may be formed on the third insulating layer 1270 to expose a portion of the first electrode 1290. The pixel defining layer 1310 may comprise an organic or inorganic material. In this case, a light-emitting layer 1330 may be formed on the portion of the first electrode 1290 exposed by the pixel defining layer 1310.

[0265] A light-emitting layer 1330 can be disposed on the exposed first electrode 1290. The light-emitting layer 1330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 1330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0266] A second electrode 1340 can be disposed on the pixel defining layer 1310 and the light-emitting layer 1330. The second electrode 1340 can cover the pixel defining layer 1310 and the light-emitting layer 1330 in the light-emitting region II and the reflective region III, and can extend along a first direction on the first substrate 1110. That is, the second electrode 1340 can be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 1340 may include, for example, metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These materials can be used alone or in combination. The first substrate 1110 and the second substrate 1350 can be bonded together by using a sealing member. In addition, a filler can be disposed between the first substrate 1110 and the second substrate 1350.

[0267] Reference Figure 32 A first sensing electrode 1370 is disposed on a first substrate 1110 on which a second electrode 1340 is disposed.

[0268] A first sensing electrode 1370 is disposed on a first substrate 1110. The first sensing electrode 1370 may be disposed in the reflective region III and outside the light-emitting region II.

[0269] The first sensing electrode 1370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 1370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 1370 may include, for example, an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 1370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0270] Reference Figure 33 A second sensing electrode 1390 is disposed on the second substrate 1350.

[0271] A second sensing electrode 1390 can be disposed on a second substrate 1350. The second sensing electrode 1390 can be disposed in the light-emitting region II and the reflective region III.

[0272] The second sensing electrode 1390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 1390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 1390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 1390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0273] However, the present invention is not limited thereto, and an insulating layer may be provided between the second substrate 1350 and the second sensing electrode 1390.

[0274] Figure 34 It is shown Figure 26 A plan view of the first sensing electrode. Figure 35 It is shown Figure 26 A plan view of the second sensing electrode. Figure 36 It is shown Figure 34 The first sensing electrode and Figure 35 A plan view of the second sensing electrode.

[0275] Reference Figure 26 as well as Figures 34 to 36 The first sensing electrode 1370 and the second sensing electrode 1390 are shown.

[0276] The first sensing electrode 1370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 1370 is disposed in the reflective region III. The first sensing electrode 1370 can be connected to a sensing drive component via a first connecting line 1375. The first connecting line 1375 can include the same material as the first sensing electrode 1370. The first connecting line 1375 can be disposed on the same layer as the layer on which the first sensing electrode 1370 is disposed.

[0277] The second sensing electrode 1390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 1390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 1390 can be connected to a sensing drive component via a second connecting line 1395. The second connecting line 1395 can comprise the same material as the second sensing electrode 1390. The second connecting line 1395 can be disposed on the same layer as the layer on which the second sensing electrode 1390 is disposed.

[0278] The first sensing electrode 1370 may include a material having a predetermined reflectivity. The second sensing electrode 1390 may include a material having a predetermined reflectivity. The first sensing electrode 1370 may be partially stacked with the second sensing electrode 1390.

[0279] The first sensing electrode 1370 can be disposed on the first substrate 1110. The second sensing electrode 1390 can be disposed on the second substrate 1350.

[0280] The first sensing electrode 1370 and the second sensing electrode 1390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 1370 and the second sensing electrode 1390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0281] The first sensing electrode 1370 may have a different thickness than the second sensing electrode 1390. In an exemplary embodiment, the thickness of the first sensing electrode 1370 may be, for example, approximately When the thickness of the first sensing electrode 1370 is approximately At this time, the transmittance of the first sensing electrode 1370 can be approximately 0%, and the reflectance of the first sensing electrode 1370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 1390 can be approximately... When the thickness of the second sensing electrode 1390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 1390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 1390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 1390 can perform a mirror function.

[0282] Figure 37 It is shown Figure 26 A plan view of the first sensing electrode. Figure 38 It is shown Figure 26 A plan view of the second sensing electrode. Figure 39 It is shown Figure 37 The first sensing electrode and Figure 38 A plan view of the second sensing electrode.

[0283] Reference Figure 26 as well as Figures 37 to 39 The first sensing electrode 1370 and the second sensing electrode 1390 are shown.

[0284] The first sensing electrode 1370 may include a plurality of first sensing patterns 1371 extending along the second direction D2 and a plurality of first dummy patterns 1373 disposed between the first sensing patterns 1371. The first sensing electrode 1370 is disposed in the reflection region III. The spacing of the first sensing patterns 1371 may be adjusted according to the number of first dummy patterns 1373. The first sensing electrode 1370 may be connected to a sensing drive component via a first connecting line 1375. The first connecting line 1375 may include the same material as the first sensing electrode 1370. The first connecting line 1375 may be disposed on the same layer as the layer on which the first sensing electrode 1370 is disposed.

[0285] The second sensing electrode 1390 can be configured as a plurality of second sensing patterns 1391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 1393 disposed between the second sensing patterns 1391. The second sensing electrode 1390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 1390 can be adjusted according to the number of second dummy patterns 1393. The second sensing electrode 1390 can be connected to a sensing drive component via a second connecting line 1395. The second connecting line 1395 can include the same material as the second sensing electrode 1390. The second connecting line 1395 can be disposed on the same layer as the layer on which the second sensing electrode 1390 is disposed.

[0286] The first sensing electrode 1370 may include a material having a predetermined reflectivity. The second sensing electrode 1390 may include a material having a predetermined reflectivity. The first sensing electrode 1370 may be partially stacked with the second sensing electrode 1390.

[0287] The first sensing electrode 1370 can be disposed on the first substrate 1110. The second sensing electrode 1390 can be disposed on the second substrate 1350.

[0288] The first sensing electrode 1370 and the second sensing electrode 1390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 1370 and the second sensing electrode 1390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0289] The first sensing electrode 1370 may have a different thickness than the second sensing electrode 1390. In an exemplary embodiment, the thickness of the first sensing electrode 1370 may be, for example, approximately When the thickness of the first sensing electrode 1370 is approximately At this time, the transmittance of the first sensing electrode 1370 can be approximately 0%, and the reflectance of the first sensing electrode 1370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 1390 can be approximately... When the thickness of the second sensing electrode 1390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 1390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 1390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 1390 can perform a mirror function.

[0290] Figure 40 It is shown Figure 26 A plan view of the first sensing electrode. Figure 41 It is shown Figure 26 A plan view of the second sensing electrode. Figure 42 It is shown Figure 40 The first sensing electrode and Figure 41 A plan view of the second sensing electrode.

[0291] Reference Figure 26 and Figures 40 to 42 The first sensing electrode 1370 and the second sensing electrode 1390 are shown.

[0292] The first sensing electrode 1370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 1370 can be configured as a grid shape. The first sensing electrode 1370 is disposed in the reflective region III. The first sensing electrode 1370 can be connected to a sensing drive component via a first connecting line 1375. The first connecting line 1375 can comprise the same material as the first sensing electrode 1370. The first connecting line 1375 can be disposed on the same layer as the layer on which the first sensing electrode 1370 is disposed.

[0293] The second sensing electrode 1390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 1390 in the second direction D2 is the same as the width of the first sensing electrode 1370 in the first direction D1. The second sensing electrode 1390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 1390 can be connected to a sensing driving component via a second connecting line 1395. The second connecting line 1395 can include the same material as the second sensing electrode 1390. The second connecting line 1395 can be disposed on the same layer as the layer on which the second sensing electrode 1390 is disposed.

[0294] The first sensing electrode 1370 may include a material having a predetermined reflectivity. The second sensing electrode 1390 may include a material having a predetermined reflectivity. The first sensing electrode 1370 may be partially stacked with the second sensing electrode 1390.

[0295] The first sensing electrode 1370 can be disposed on the first substrate 1110. The second sensing electrode 1390 can be disposed on the second substrate 1350.

[0296] The first sensing electrode 1370 and the second sensing electrode 1390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 1370 and the second sensing electrode 1390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0297] The first sensing electrode 1370 may have a different thickness than the second sensing electrode 1390. In an exemplary embodiment, the thickness of the first sensing electrode 1370 may be, for example, approximately When the thickness of the first sensing electrode 1370 is approximately At this time, the transmittance of the first sensing electrode 1370 can be approximately 0%, and the reflectance of the first sensing electrode 1370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 1390 can be approximately... When the thickness of the second sensing electrode 1390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 1390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 1390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 1390 can perform a mirror function.

[0298] Figure 43 It is shown Figure 26 A plan view of the first sensing electrode. Figure 44 It is magnification Figure 43 Plan view of part D. Figure 45 It is shown Figure 26 A plan view of the second sensing electrode. Figure 46 It is magnification Figure 45 Plan view of part 'E'. Figure 47 It is shown Figure 43 The first sensing electrode and Figure 45 A plan view of the second sensing electrode. Figure 48 It is magnification Figure 47 Plan view of part F'.

[0299] Reference Figure 26 as well as Figures 43 to 48 The first sensing electrode 1370 and the second sensing electrode 1390 are shown.

[0300] The first sensing electrode 1370 may include a plurality of first sensing patterns 1371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 1373 having a rhomboid shape and disposed between the first sensing patterns 1371. The first dummy patterns 1373 are spaced apart from each other. The first sensing electrode 1370 is disposed in the reflection region III. The first sensing electrode 1370 may be connected to a sensing drive component via a first connecting line 1375. The first connecting line 1375 may include the same material as the first sensing electrode 1370. The first connecting line 1375 may be disposed on the same layer as the layer on which the first sensing electrode 1370 is disposed.

[0301] The second sensing electrode 1390 may include a plurality of second sensing patterns 1391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 1393 having a rhomboid shape and disposed between the second sensing patterns 1391. The second dummy patterns 1393 are spaced apart from each other. The second sensing electrode 1390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 1390 may be connected to a sensing driving component via a second connecting line 1395. The second connecting line 1395 may include the same material as the second sensing electrode 1390. The second connecting line 1395 may be disposed on the same layer as the layer on which the second sensing electrode 1390 is disposed.

[0302] The first sensing electrode 1370 may include a material having a predetermined reflectivity. The second sensing electrode 1390 may include a material having a predetermined reflectivity. The first sensing electrode 1370 may be partially stacked with the second sensing electrode 1390.

[0303] The first sensing electrode 1370 can be disposed on the first substrate 1110. The second sensing electrode 1390 can be disposed on the second substrate 1350.

[0304] The first sensing electrode 1370 and the second sensing electrode 1390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 1370 and the second sensing electrode 1390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0305] The first sensing electrode 1370 may have a different thickness than the second sensing electrode 1390. In an exemplary embodiment, the thickness of the first sensing electrode 1370 may be, for example, approximately When the thickness of the first sensing electrode 1370 is approximately At this time, the transmittance of the first sensing electrode 1370 can be approximately 0%, and the reflectance of the first sensing electrode 1370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 1390 can be approximately... When the thickness of the second sensing electrode 1390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 1390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 1390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 1390 can perform a mirror function.

[0306] Figure 49 This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 50 It is along Figure 49 A cross-sectional view taken by line VV′.

[0307] In addition to the first sensing electrode 2370, the fourth insulating layer 2385, and the second sensing electrode 2390, the organic light-emitting display device according to the illustrated exemplary embodiment and Figure 1 and Figure 2 The organic light-emitting display devices are basically the same, therefore similar reference numerals are used for the same elements and repeated explanations will be omitted.

[0308] Reference Figure 49 and Figure 50 A first sensing electrode 2370 is disposed on a second substrate 2350. The first sensing electrode 2370 may be disposed in the reflective region III and outside the light-emitting region II. A fourth insulating layer 2385 is disposed on the first sensing electrode 2370. A second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0309] The first sensing electrode 2370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 2370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 2370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 2370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0310] The second substrate 2350 and the first substrate 2110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 2350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 2350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 2350 may comprise, for example, a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 2100, the second substrate 2350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0311] A fourth insulating layer 2385 is disposed on the first sensing electrode 2370. The fourth insulating layer 2385 may include an adhesive material.

[0312] The second sensing electrode 2390 is disposed on the fourth insulating layer 2385. The second sensing electrode 2390 may be disposed in the light-emitting region II and the reflective region III.

[0313] The second sensing electrode 2390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 2390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 2390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 2390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0314] The first sensing electrode 2370 may have a different thickness than the second sensing electrode 2390. In an exemplary embodiment, the thickness of the first sensing electrode 2370 may be, for example, approximately... When the thickness of the first sensing electrode 2370 is approximately At this time, the transmittance of the first sensing electrode 2370 can be approximately 0%, and the reflectance of the first sensing electrode 2370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 2390 can be approximately... When the thickness of the second sensing electrode 2390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 2390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 2390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 2390 can perform a mirror function.

[0315] Figures 51 to 58 It shows the manufacturing process. Figure 50 A cross-sectional view of a method for developing an organic light-emitting display device.

[0316] Reference Figure 51 A buffer layer 2115 is disposed on the first substrate 2110. Then, an active pattern 2130 and a first insulating layer 2150 are disposed on the buffer layer 2115.

[0317] In an exemplary embodiment, the first substrate 2110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0318] A light-emitting structure can be formed on a first substrate 2110. The first substrate 2110 may include a transparent material. In an exemplary embodiment, the first substrate 2110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 2110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 2110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 2110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is provided on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 2250, capacitor, first electrode 2290, light-emitting layer 2330, second electrode 2340, etc.) can be provided on the insulating layer.

[0319] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 2110 after the glass substrate is removed. Because the organic light-emitting display device 2100 includes a light-emitting region II and a reflective region III, the first substrate 2110 can also include a light-emitting region II and a reflective region III.

[0320] A buffer layer 2115 can be disposed on the first substrate 2110. The buffer layer 2115 can extend from the light-emitting region II into the reflective region III. The buffer layer 2115 can prevent metal atoms and / or impurities from diffusing from the first substrate 2110 (e.g., venting). In addition, the buffer layer 2115 can control the heat transfer rate in the crystallization process used to form the active pattern 2130, thereby obtaining a substantially uniform active pattern 2130. Furthermore, when the surface of the first substrate 2110 is relatively irregular, the buffer layer 2115 can improve the surface flatness of the first substrate 2110. Depending on the type of the first substrate 2110, at least two buffer layers can be disposed on the first substrate 2110, or no buffer layer may be disposed.

[0321] In an exemplary embodiment, the active pattern 2130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0322] A first insulating layer 2150 may be disposed on the active pattern 2130. The first insulating layer 2150 may cover the active pattern 2130 in the light-emitting region II and may extend along a first direction on the first substrate 2110. That is, the first insulating layer 2150 may be disposed on the entire surface of the first substrate 2110. In an exemplary embodiment, the first insulating layer 2150 may include, for example, a silicon compound, a metal oxide, etc.

[0323] Reference Figure 52 A gate electrode 2170 and a second insulating layer 2190 are disposed on a first substrate 2110 on which a first insulating layer 2150 is disposed.

[0324] A gate electrode 2170 may be disposed on a portion of the first insulating layer 2150 on which the active pattern 2130 is disposed. In an exemplary embodiment, the gate electrode 2170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0325] A second insulating layer 2190 may be disposed on the gate electrode 2170. The second insulating layer 2190 may cover the gate electrode 2170 in the light-emitting region II and may extend along a first direction on the first substrate 2110. That is, the second insulating layer 2190 may be disposed on the entire surface of the first substrate 2110. In an exemplary embodiment, the second insulating layer 2190 may include, for example, a silicon compound, a metal oxide, etc.

[0326] Reference Figure 53 A source electrode 2210 and a drain electrode 2230 are disposed on a first substrate 2110 on which a second insulating layer 2190 is disposed.

[0327] A source electrode 2210 and a drain electrode 2230 may be disposed on the second insulating layer 2190. By removing a portion of the first insulating layer 2150 and the second insulating layer 2190, the source electrode 2210 may contact a first side of the active layer 2130. By removing a second portion of the first insulating layer 2150 and the second insulating layer 2190, the drain electrode 2230 may contact a second side of the active layer 2130. In an exemplary embodiment, each of the source electrode 2210 and the drain electrode 2230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0328] In the exemplary embodiment shown, a gate electrode 2170 is disposed on the active pattern 2130. However, the invention is not limited thereto, and the gate electrode 2170 may be disposed below the active pattern 2130.

[0329] Reference Figure 54 A third insulating layer 2270 and a first electrode 2290 are disposed on a first substrate 2110 on which an active electrode 2210 and a drain electrode 2230 are disposed.

[0330] A third insulating layer 2270 may be disposed on the source electrode 2210 and the drain electrode 2230. The third insulating layer 2270 may cover the source electrode 2210 and the drain electrode 2230 in the sub-pixel region II, and may extend along a first direction on the first substrate 2110. That is, the third insulating layer 2270 may be disposed on the entire surface of the first substrate 2110. In an exemplary embodiment, the third insulating layer 2270 may include, for example, a silicon compound, a metal oxide, etc.

[0331] A first electrode 2290 may be disposed on the third insulating layer 2270. By removing a portion of the third insulating layer 2270, the first electrode 2290 may come into contact with the drain electrode 2230. Additionally, the first electrode 2290 may be electrically connected to the semiconductor element 2250. In an exemplary embodiment, the first electrode 2290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0332] Reference Figure 55 A pixel limiting layer 2310, a light-emitting layer 2330, and a second electrode 2340 are disposed on a first substrate 2110 on which a first electrode 2290 is disposed.

[0333] A pixel defining layer 2310 may be formed on the third insulating layer 2270 to expose a portion of the first electrode 2290. The pixel defining layer 2310 may comprise an organic or inorganic material. In this case, a light-emitting layer 2330 may be formed on the portion of the first electrode 2290 exposed by the pixel defining layer 2310.

[0334] A light-emitting layer 2330 can be disposed on the exposed first electrode 2290. The light-emitting layer 2330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 2330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0335] A second electrode 2340 can be disposed on the pixel defining layer 2310 and the light-emitting layer 2330. The second electrode 2340 can cover the pixel defining layer 2310 and the light-emitting layer 2330 in the light-emitting region II and the reflective region III, and can extend along a first direction on the first substrate 2110. That is, the second electrode 2340 can be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 2340 may include, for example, metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These materials can be used alone or in combination. The first substrate 2110 and the second substrate 2350 can be bonded together by using a sealing member. In addition, a filler can be disposed between the first substrate 2110 and the second substrate 2350.

[0336] Reference Figure 56 A first sensing electrode 2370 is disposed on the second substrate 2350.

[0337] A first sensing electrode 2370 can be disposed on a first surface of the second substrate 2350. The first surface of the first sensing electrode 2370 can face the second electrode 2340, and the second surface of the first sensing electrode 2370 opposite to the first surface can be in contact with the second substrate 2350. The first sensing electrode 2370 can be disposed in the reflection region III and outside the light-emitting region II. However, the present invention is not limited thereto, and an insulating layer can be disposed between the second substrate 2350 and the first sensing electrode 2370.

[0338] The first sensing electrode 2370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 2370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 2370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 2370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO)x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0339] The second substrate 2350 and the first substrate 2110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 2350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0340] Reference Figure 57 A fourth insulating layer 2385 is disposed on a second substrate 2350 on which a first sensing electrode 2370 is disposed.

[0341] The fourth insulating layer 2385 prevents oxidation of the first sensing electrode 2370. The fourth insulating layer 2385 may include an adhesive material. The fourth insulating layer 2385 prevents the first sensing electrode 2370 and the second sensing electrode 2390 from separating from the second substrate 2350. The fourth insulating layer 2385 provides insulation between the first sensing electrode 2370 and the second sensing electrode 2390.

[0342] Reference Figure 58 A second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0343] A second sensing electrode 2390 can be provided in the light-emitting region II and the reflection region III.

[0344] The second sensing electrode 2390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 2390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 2390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 2390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0345] Figure 59It is shown Figure 50 A plan view of the first sensing electrode. Figure 60 It is shown Figure 50 A plan view of the second sensing electrode. Figure 61 It is shown Figure 59 The first sensing electrode and Figure 60 A plan view of the second sensing electrode.

[0346] Reference Figure 50 and Figures 59 to 61 The first sensing electrode 2370 and the second sensing electrode 2390 are shown.

[0347] The first sensing electrode 2370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 2370 is disposed in the reflective region III. The first sensing electrode 2370 can be connected to the sensing drive component via a first connecting line 2375. The first connecting line 2375 can include the same material as the first sensing electrode 2370. The first connecting line 2375 can be disposed on the same layer as the layer on which the first sensing electrode 2370 is disposed.

[0348] The second sensing electrode 2390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 2390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 2390 can be connected to a sensing drive component via a second connecting line 2395. The second connecting line 2395 can comprise the same material as the second sensing electrode 2390. The second connecting line 2395 can be disposed on the same layer as the layer on which the second sensing electrode 2390 is disposed.

[0349] The first sensing electrode 2370 may include a material having a predetermined reflectivity. The second sensing electrode 2390 may include a material having a predetermined reflectivity. The first sensing electrode 2370 may be partially stacked with the second sensing electrode 2390.

[0350] The first sensing electrode 2370 may be disposed on the first surface of the second substrate 2350. The fourth insulating layer 2385 is disposed on the first sensing electrode 2370. The second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0351] The first sensing electrode 2370 and the second sensing electrode 2390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 2370 and the second sensing electrode 2390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0352] The first sensing electrode 2370 may have a different thickness than the second sensing electrode 2390. In an exemplary embodiment, the thickness of the first sensing electrode 2370 may be, for example, approximately... When the thickness of the first sensing electrode 2370 is approximately At this time, the transmittance of the first sensing electrode 2370 can be approximately 0%, and the reflectance of the first sensing electrode 2370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 2390 can be approximately... When the thickness of the second sensing electrode 2390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 2390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 2390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 2390 can perform a mirror function.

[0353] Figure 62 It is shown Figure 50 A plan view of the first sensing electrode. Figure 63 It is shown Figure 50 A plan view of the second sensing electrode. Figure 64 It is shown Figure 62 The first sensing electrode and Figure 63 A plan view of the second sensing electrode.

[0354] Reference Figure 50 and Figures 62 to 64 The first sensing electrode 2370 and the second sensing electrode 2390 are shown.

[0355] The first sensing electrode 2370 may include a plurality of first sensing patterns 2371 extending along the second direction D2 and a plurality of first dummy patterns 2373 disposed between the first sensing patterns 2371. The first sensing electrode 2370 is disposed in the reflection region III. The spacing of the first sensing patterns 2371 may be adjusted according to the number of first dummy patterns 2373. The first sensing electrode 2370 may be connected to a sensing drive component via a first connecting line 2375. The first connecting line 2375 may include the same material as the first sensing electrode 2370. The first connecting line 2375 may be disposed on the same layer as the layer on which the first sensing electrode 2370 is disposed.

[0356] The second sensing electrode 2390 can be configured as a plurality of second sensing patterns 2391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 2393 disposed between the second sensing patterns 2391. The second sensing electrode 2390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 2390 can be adjusted according to the number of second dummy patterns 2393. The second sensing electrode 2390 can be connected to the sensing driving component via a second connecting line 2395. The second connecting line 2395 can include the same material as the second sensing electrode 2390. The second connecting line 2395 can be disposed on the same layer as the layer on which the second sensing electrode 2390 is disposed.

[0357] The first sensing electrode 2370 may include a material having a predetermined reflectivity. The second sensing electrode 2390 may include a material having a predetermined reflectivity. The first sensing electrode 2370 may be partially stacked with the second sensing electrode 2390.

[0358] The first sensing electrode 2370 may be disposed on the first surface of the second substrate 2350. The fourth insulating layer 2385 is disposed on the first sensing electrode 2370. The second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0359] The first sensing electrode 2370 and the second sensing electrode 2390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 2370 and the second sensing electrode 2390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0360] The first sensing electrode 2370 may have a different thickness than the second sensing electrode 2390. In an exemplary embodiment, the thickness of the first sensing electrode 2370 may be, for example, approximately... When the thickness of the first sensing electrode 2370 is approximately At this time, the transmittance of the first sensing electrode 2370 can be approximately 0%, and the reflectance of the first sensing electrode 2370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 2390 can be approximately... When the thickness of the second sensing electrode 2390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 2390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 2390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 2390 can perform a mirror function.

[0361] Figure 65 It is shown Figure 50 A plan view of the first sensing electrode. Figure 66 It is shown Figure 50 A plan view of the second sensing electrode. Figure 67 It is shown Figure 65 The first sensing electrode and Figure 66 A plan view of the second sensing electrode.

[0362] Reference Figure 50 and Figures 65 to 67 The first sensing electrode 2370 and the second sensing electrode 2390 are shown.

[0363] The first sensing electrode 2370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 2370 can be configured as a grid shape. The first sensing electrode 2370 is disposed in the reflective region III. The first sensing electrode 2370 can be connected to a sensing drive component via a first connecting line 2375. The first connecting line 2375 can comprise the same material as the first sensing electrode 2370. The first connecting line 2375 can be disposed on the same layer as the layer on which the first sensing electrode 2370 is disposed.

[0364] The second sensing electrode 2390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 2390 in the second direction D2 is the same as the width of the first sensing electrode 2370 in the first direction D1. The second sensing electrode 2390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 2390 can be connected to the sensing driving component via a second connecting line 2395. The second connecting line 2395 can include the same material as the second sensing electrode 2390. The second connecting line 2395 can be disposed on the same layer as the layer on which the second sensing electrode 2390 is disposed.

[0365] The first sensing electrode 2370 may be disposed on the first surface of the second substrate 2350. The fourth insulating layer 2385 is disposed on the first sensing electrode 2370. The second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0366] The first sensing electrode 2370 and the second sensing electrode 2390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 2370 and the second sensing electrode 2390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0367] The first sensing electrode 2370 may have a different thickness than the second sensing electrode 2390. In an exemplary embodiment, the thickness of the first sensing electrode 2370 may be, for example, approximately... When the thickness of the first sensing electrode 2370 is approximately At this time, the transmittance of the first sensing electrode 2370 can be approximately 0%, and the reflectance of the first sensing electrode 2370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 2390 can be approximately... When the thickness of the second sensing electrode 2390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 2390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 2390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 2390 can perform a mirror function.

[0368] Figure 68 It is shown Figure 50 A plan view of the first sensing electrode. Figure 69 It is magnification Figure 68 Plan view of part 'G'. Figure 70 It is shown Figure 50 A plan view of the second sensing electrode. Figure 71 It is magnification Figure 70 A plan view of the H' portion. Figure 72 It is shown Figure 68 The first sensing electrode and Figure 70 A plan view of the second sensing electrode. Figure 73 It is magnification Figure 72 Plan view of part 'I'.

[0369] Reference Figure 50 as well as Figures 68 to 73 The first sensing electrode 2370 and the second sensing electrode 2390 are shown.

[0370] The first sensing electrode 2370 may include a plurality of first sensing patterns 2371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 2373 having a rhomboid shape and disposed between the first sensing patterns 2371. The first dummy patterns 2373 are spaced apart from each other. The first sensing electrode 2370 is disposed in the reflection region III. The first sensing electrode 2370 may be connected to a sensing drive component via a first connecting line 2375. The first connecting line 2375 may include the same material as the first sensing electrode 2370. The first connecting line 2375 may be disposed on the same layer as the layer on which the first sensing electrode 2370 is disposed.

[0371] The second sensing electrode 2390 may include a plurality of second sensing patterns 2391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 2393 having a rhomboid shape and disposed between the second sensing patterns 2391. The second dummy patterns 2393 are spaced apart from each other. The second sensing electrode 2390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 2390 may be connected to a sensing driving component via a second connecting line 2395. The second connecting line 2395 may include the same material as the second sensing electrode 2390. The second connecting line 2395 may be disposed on the same layer as the layer on which the second sensing electrode 2390 is disposed.

[0372] The first sensing electrode 2370 may include a material having a predetermined reflectivity. The second sensing electrode 2390 may include a material having a predetermined reflectivity. The first sensing electrode 2370 may be partially stacked with the second sensing electrode 2390.

[0373] The first sensing electrode 2370 may be disposed on the first surface of the second substrate 2350. The fourth insulating layer 2385 is disposed on the first sensing electrode 2370. The second sensing electrode 2390 is disposed on the fourth insulating layer 2385.

[0374] The first sensing electrode 2370 and the second sensing electrode 2390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 2370 and the second sensing electrode 2390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0375] The first sensing electrode 2370 may have a different thickness than the second sensing electrode 2390. In an exemplary embodiment, the thickness of the first sensing electrode 2370 may be, for example, approximately... When the thickness of the first sensing electrode 2370 is approximately At this time, the transmittance of the first sensing electrode 2370 can be approximately 0%, and the reflectance of the first sensing electrode 2370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 2390 can be approximately... When the thickness of the second sensing electrode 2390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 2390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 2390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 2390 can perform a mirror function.

[0376] Figure 74This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 75 It is along Figure 74 A sectional view taken from line VI-VI′.

[0377] In addition to the first sensing electrode 3370, the fourth insulating layer 3385, and the second sensing electrode 3390, the organic light-emitting display device according to the illustrated exemplary embodiment and Figure 1 and Figure 2 The organic light-emitting display devices are basically the same, therefore similar reference numerals are used for the same elements and repeated explanations will be omitted.

[0378] Reference Figure 74 and Figure 75 A second sensing electrode 3390 is disposed on a second substrate 2350. The second sensing electrode 3390 may be disposed in the reflection region III and the light-emitting region II. A fourth insulating layer 3385 is disposed on the second sensing electrode 3390. A first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0379] The second sensing electrode 3390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 3390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 3390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 3390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0380] The second substrate 3350 and the first substrate 3110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 3350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 3350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 3350 may comprise, for example, a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 3100, the second substrate 3350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0381] A fourth insulating layer 3385 is disposed on the second sensing electrode 3390. The fourth insulating layer 3385 may include an adhesive material.

[0382] The first sensing electrode 3370 is disposed on the fourth insulating layer 3385. The first sensing electrode 3370 may be disposed in the light-emitting region II and outside the reflective region III.

[0383] The first sensing electrode 3370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 3370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 3370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 3370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0384] The first sensing electrode 3370 may have a different thickness than the second sensing electrode 3390. In an exemplary embodiment, the thickness of the first sensing electrode 3370 may be, for example, approximately... When the thickness of the first sensing electrode 3370 is approximately At this time, the transmittance of the first sensing electrode 3370 can be approximately 0%, and the reflectance of the first sensing electrode 3370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 3390 can be approximately... When the thickness of the second sensing electrode 3390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 3390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 3390 can perform a mirror function.

[0385] Figures 76 to 83 It shows the manufacturing process. Figure 75 A cross-sectional view of a method for developing an organic light-emitting display device.

[0386] Reference Figure 76 A buffer layer 3115 is disposed on the first substrate 3110. Then, an active pattern 3130 and a first insulating layer 3150 are disposed on the buffer layer 3115.

[0387] In an exemplary embodiment, the first substrate 3110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0388] A light-emitting structure can be formed on a first substrate 3110. The first substrate 3110 may include a transparent material. In an exemplary embodiment, the first substrate 3110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 3110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 3110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 3110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is provided on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 3250, capacitor, first electrode 3290, light-emitting layer 3330, second electrode 3340, etc.) can be provided on the insulating layer.

[0389] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 3110 after the glass substrate is removed. Because the organic light-emitting display device 3100 includes a light-emitting region II and a reflective region III, the first substrate 3110 can also include a light-emitting region II and a reflective region III.

[0390] A buffer layer 3115 can be disposed on the first substrate 3110. The buffer layer 3115 can extend from the light-emitting region II into the reflective region III. The buffer layer 3115 can prevent metal atoms and / or impurities from diffusing from the first substrate 3110 (e.g., venting). In addition, the buffer layer 3115 can control the heat transfer rate in the crystallization process used to form the active pattern 3130, thereby obtaining a substantially uniform active pattern 3130. Furthermore, when the surface of the first substrate 3110 is relatively irregular, the buffer layer 3115 can improve the surface flatness of the first substrate 3110. Depending on the type of the first substrate 3110, at least two buffer layers can be disposed on the first substrate 3110, or no buffer layer may be disposed.

[0391] In an exemplary embodiment, the active pattern 3130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0392] A first insulating layer 3150 may be disposed on the active pattern 3130. The first insulating layer 3150 may cover the active pattern 3130 in the light-emitting region II and may extend along a first direction on the first substrate 3110. That is, the first insulating layer 3150 may be disposed on the entire surface of the first substrate 3110. In an exemplary embodiment, the first insulating layer 3150 may include, for example, a silicon compound, a metal oxide, etc.

[0393] Reference Figure 77 A gate electrode 3170 and a second insulating layer 3190 are disposed on a first substrate 3110 on which a first insulating layer 3150 is disposed.

[0394] A gate electrode 3170 may be disposed on a portion of the first insulating layer 3150 on which the active pattern 3130 is disposed. In an exemplary embodiment, the gate electrode 3170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0395] A second insulating layer 3190 may be disposed on the gate electrode 3170. The second insulating layer 3190 may cover the gate electrode 3170 in the light-emitting region II and may extend along a first direction on the first substrate 3110. That is, the second insulating layer 3190 may be disposed on the entire surface of the first substrate 3110. In an exemplary embodiment, the second insulating layer 3190 may include, for example, a silicon compound, a metal oxide, etc.

[0396] Reference Figure 78 A source electrode 3210 and a drain electrode 3230 are disposed on a first substrate 3110 on which a second insulating layer 3190 is disposed.

[0397] A source electrode 3210 and a drain electrode 3230 may be disposed on the second insulating layer 3190. By removing a portion of the first insulating layer 3150 and the second insulating layer 3190, the source electrode 3210 may contact a first side of the active layer 3130. By removing a second portion of the first insulating layer 3150 and the second insulating layer 3190, the drain electrode 3230 may contact a second side of the active layer 3130. In an exemplary embodiment, each of the source electrode 3210 and the drain electrode 3230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0398] In the exemplary embodiment shown, a gate electrode 3170 is disposed on the active pattern 3130. However, the invention is not limited thereto, and the gate electrode 3170 may be disposed below the active pattern 3130.

[0399] Reference Figure 79 A third insulating layer 3270 and a first electrode 3290 are disposed on a first substrate 3110 on which an active electrode 3210 and a drain electrode 3230 are disposed.

[0400] A third insulating layer 3270 may be disposed on the source electrode 3210 and the drain electrode 3230. The third insulating layer 3270 may cover the source electrode 3210 and the drain electrode 3230 in the sub-pixel region II, and may extend along a first direction on the first substrate 3110. That is, the third insulating layer 3270 may be disposed on the entire surface of the first substrate 3110. In an exemplary embodiment, the third insulating layer 3270 may include, for example, a silicon compound, a metal oxide, etc.

[0401] A first electrode 3290 may be disposed on the third insulating layer 3270. By removing a portion of the third insulating layer 3270, the first electrode 3290 may come into contact with the drain electrode 3230. Additionally, the first electrode 3290 may be electrically connected to the semiconductor element 3250. In an exemplary embodiment, the first electrode 3290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0402] Reference Figure 80 A pixel defining layer 3310, a light emitting layer 3330, and a second electrode 3340 are disposed on a first substrate 3110 on which a first electrode 3290 is disposed.

[0403] A pixel defining layer 3310 may be formed on the third insulating layer 3270 to expose a portion of the first electrode 3290. The pixel defining layer 3310 may comprise an organic or inorganic material. In this case, a light-emitting layer 3330 may be formed on the portion of the first electrode 3290 exposed by the pixel defining layer 3310.

[0404] A light-emitting layer 3330 can be disposed on the exposed first electrode 3290. The light-emitting layer 3330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 3330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0405] A second electrode 3340 can be disposed on the pixel defining layer 3310 and the light-emitting layer 3330. The second electrode 3340 can cover the pixel defining layer 3310 and the light-emitting layer 3330 in the light-emitting region II and the reflective region III, and can extend along a first direction on the first substrate 3110. That is, the second electrode 3340 can be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 3340 may include, for example, metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These materials can be used alone or in combination. The first substrate 3110 and the second substrate 3350 can be bonded together by using a sealing member. In addition, a filler can be disposed between the first substrate 3110 and the second substrate 3350.

[0406] Reference Figure 81 A second sensing electrode 3390 is disposed on the second substrate 3350.

[0407] A second sensing electrode 3390 can be disposed on the first surface of the second substrate 3350. The first surface of the second sensing electrode 3390 can face the second electrode 3340, and the second surface of the second sensing electrode 3390 opposite to the first surface can contact the second substrate 3350.

[0408] The second sensing electrode 3390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 3390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 3390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 3390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x)wait.

[0409] The second substrate 3350 and the first substrate 3110 may comprise substantially the same material. In an exemplary embodiment, the second substrate 3350 may comprise, for example, quartz, synthetic quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an exemplary embodiment, the second substrate 3350 may comprise a transparent inorganic material or a flexible plastic. In an exemplary embodiment, the second substrate 3350 may comprise, for example, a flexible transparent resin substrate. In this case, to increase the flexibility of the organic light-emitting display device 3100, the second substrate 3350 may comprise a stacked structure in which at least one organic layer and at least one inorganic layer are alternately stacked.

[0410] Reference Figure 82 A fourth insulating layer 3385 is disposed on a second substrate 3350 on which a second sensing electrode 3390 is disposed.

[0411] The fourth insulating layer 3385 prevents oxidation of the second sensing electrode 3390. The fourth insulating layer 3385 may include an adhesive material. The fourth insulating layer 3385 prevents the first sensing electrode 3370 and the second sensing electrode 3390 from separating from the second substrate 3350. The fourth insulating layer 3385 provides insulation between the first sensing electrode 3370 and the second sensing electrode 3390.

[0412] Reference Figure 83 A first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0413] The first sensing electrode 3370 can be disposed in the light-emitting region II and outside the reflection region III.

[0414] The first sensing electrode 3370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 3370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 3370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 3370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) xGallium oxide (GaO) x )wait.

[0415] Figure 84 It is shown Figure 75 A plan view of the first sensing electrode. Figure 85 It is shown Figure 75 A plan view of the second sensing electrode. Figure 86 It is shown Figure 84 The first sensing electrode and Figure 85 A plan view of the second sensing electrode.

[0416] Reference Figure 75 and Figures 84 to 86 The first sensing electrode 3370 and the second sensing electrode 3390 are shown.

[0417] The first sensing electrode 3370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 3370 is disposed in the reflective region III. The first sensing electrode 3370 can be connected to the sensing drive component via a first connecting line 3375. The first connecting line 3375 can include the same material as the first sensing electrode 3370. The first connecting line 3375 can be disposed on the same layer as the layer on which the first sensing electrode 3370 is disposed.

[0418] The second sensing electrode 3390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 3390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 3390 can be connected to a sensing drive component via a second connecting line 3395. The second connecting line 3395 can comprise the same material as the second sensing electrode 3390. The second connecting line 3395 can be disposed on the same layer as the layer on which the second sensing electrode 3390 is disposed.

[0419] The first sensing electrode 3370 may include a material having a predetermined reflectivity. The second sensing electrode 3390 may include a material having a predetermined reflectivity. The first sensing electrode 3370 may be partially stacked with the second sensing electrode 3390.

[0420] The second sensing electrode 3390 is disposed on the second substrate 3350. The fourth insulating layer 3385 is disposed on the second sensing electrode 3390. The first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0421] The first sensing electrode 3370 and the second sensing electrode 3390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 3370 and the second sensing electrode 3390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0422] The first sensing electrode 3370 may have a different thickness than the second sensing electrode 3390. In an exemplary embodiment, the thickness of the first sensing electrode 3370 may be, for example, approximately... When the thickness of the first sensing electrode 3370 is approximately At this time, the transmittance of the first sensing electrode 3370 can be approximately 0%, and the reflectance of the first sensing electrode 3370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 3390 can be approximately... When the thickness of the second sensing electrode 3390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 3390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 3390 can perform a mirror function.

[0423] Figure 87 It is shown Figure 75 A plan view of the first sensing electrode. Figure 88 It is shown Figure 75 A plan view of the second sensing electrode. Figure 89 It is shown Figure 87 The first sensing electrode and Figure 88 A plan view of the second sensing electrode.

[0424] Reference Figure 75 and Figures 87 to 89 The first sensing electrode 3370 and the second sensing electrode 3390 are shown.

[0425] The first sensing electrode 3370 may include a plurality of first sensing patterns 3371 extending along the second direction D2 and a plurality of first dummy patterns 3373 disposed between the first sensing patterns 3371. The first sensing electrode 3370 is disposed in the reflection region III. The spacing of the first sensing patterns 3371 may be adjusted according to the number of first dummy patterns 3373. The first sensing electrode 3370 may be connected to a sensing drive component via a first connecting line 3375. The first connecting line 3375 may include the same material as the first sensing electrode 3370. The first connecting line 3375 may be disposed on the same layer as the layer on which the first sensing electrode 3370 is disposed.

[0426] The second sensing electrode 3390 can be configured as a plurality of second sensing patterns 3391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 3393 disposed between the second sensing patterns 3391. The second sensing electrode 3390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 3390 can be adjusted according to the number of second dummy patterns 3393. The second sensing electrode 3390 can be connected to a sensing driving component via a second connecting line 3395. The second connecting line 3395 can include the same material as the second sensing electrode 3390. The second connecting line 3395 can be disposed on the same layer as the layer on which the second sensing electrode 3390 is disposed.

[0427] The first sensing electrode 3370 may include a material having a predetermined reflectivity. The second sensing electrode 3390 may include a material having a predetermined reflectivity. The first sensing electrode 3370 may be partially stacked with the second sensing electrode 3390.

[0428] The second sensing electrode 3390 is disposed on the second substrate 3350. The fourth insulating layer 3385 is disposed on the second sensing electrode 3390. The first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0429] The first sensing electrode 3370 and the second sensing electrode 3390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 3370 and the second sensing electrode 3390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0430] The first sensing electrode 3370 may have a different thickness than the second sensing electrode 3390. In an exemplary embodiment, the thickness of the first sensing electrode 3370 may be, for example, approximately... When the thickness of the first sensing electrode 3370 is approximately At this time, the transmittance of the first sensing electrode 3370 can be approximately 0%, and the reflectance of the first sensing electrode 3370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 3390 can be approximately... When the thickness of the second sensing electrode 3390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 3390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 3390 can perform a mirror function.

[0431] Figure 90 It is shown Figure 75 A plan view of the first sensing electrode. Figure 91 It is shown Figure 75 A plan view of the second sensing electrode. Figure 92 It is shown Figure 90 The first sensing electrode and Figure 91 A plan view of the second sensing electrode.

[0432] Reference Figure 75 and Figures 90 to 92 The first sensing electrode 3370 and the second sensing electrode 3390 are shown.

[0433] The first sensing electrode 3370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 3370 can be configured as a grid shape. The first sensing electrode 3370 is disposed in the reflection region III. The first sensing electrode 3370 can be connected to a sensing drive component via a first connecting line 3375. The first connecting line 3375 can include the same material as the first sensing electrode 3370. The first connecting line 3375 can be disposed on the same layer as the layer on which the first sensing electrode 3370 is disposed.

[0434] The second sensing electrode 3390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 3390 in the second direction D2 is the same as the width of the first sensing electrode 3370 in the first direction D1. The second sensing electrode 3390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 3390 can be connected to the sensing driving component via a second connecting line 3395. The second connecting line 3395 can include the same material as the second sensing electrode 3390. The second connecting line 3395 can be disposed on the same layer as the layer on which the second sensing electrode 3390 is disposed.

[0435] The first sensing electrode 3370 may include a material having a predetermined reflectivity. The second sensing electrode 3390 may include a material having a predetermined reflectivity. The first sensing electrode 3370 may be partially stacked with the second sensing electrode 3390.

[0436] The second sensing electrode 3390 is disposed on the second substrate 3350. The fourth insulating layer 3385 is disposed on the second sensing electrode 3390. The first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0437] The first sensing electrode 3370 and the second sensing electrode 3390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 3370 and the second sensing electrode 3390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0438] The first sensing electrode 3370 may have a different thickness than the second sensing electrode 3390. In an exemplary embodiment, the thickness of the first sensing electrode 3370 may be, for example, approximately... When the thickness of the first sensing electrode 3370 is approximately At this time, the transmittance of the first sensing electrode 3370 can be approximately 0%, and the reflectance of the first sensing electrode 3370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 3390 can be approximately... When the thickness of the second sensing electrode 3390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 3390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 3390 can perform a mirror function.

[0439] Figure 93 It is shown Figure 75 A plan view of the first sensing electrode. Figure 94 It is magnification Figure 93 Plan view of the 'J' section. Figure 95 It is shown Figure 75 A plan view of the second sensing electrode. Figure 96 It is magnification Figure 95 Plan view of part 'K'. Figure 97 It is shown Figure 93 The first sensing electrode and Figure 95 A plan view of the second sensing electrode. Figure 98 It is magnification Figure 97 Plan view of the L' portion.

[0440] Reference Figure 75 as well as Figures 93 to 98 The first sensing electrode 3370 and the second sensing electrode 3390 are shown.

[0441] The first sensing electrode 3370 may include a plurality of first sensing patterns 3371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 3373 having a rhomboid shape and disposed between the first sensing patterns 3371. The first dummy patterns 3373 are spaced apart from each other. The first sensing electrode 3370 is disposed in the reflection region III. The first sensing electrode 3370 may be connected to a sensing drive component via a first connecting line 3375. The first connecting line 3375 may include the same material as the first sensing electrode 3370. The first connecting line 3375 may be disposed on the same layer as the layer on which the first sensing electrode 3370 is disposed.

[0442] The second sensing electrode 3390 may include a plurality of second sensing patterns 3391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 3393 having a rhomboid shape and disposed between the second sensing patterns 3391. The second dummy patterns 3393 are spaced apart from each other. The second sensing electrode 3390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 3390 may be connected to a sensing driving component via a second connecting line 3395. The second connecting line 3395 may include the same material as the second sensing electrode 3390. The second connecting line 3395 may be disposed on the same layer as the layer on which the second sensing electrode 3390 is disposed.

[0443] The first sensing electrode 3370 may include a material having a predetermined reflectivity. The second sensing electrode 3390 may include a material having a predetermined reflectivity. The first sensing electrode 3370 may be partially stacked with the second sensing electrode 3390.

[0444] The second sensing electrode 3390 is disposed on the second substrate 3350. The fourth insulating layer 3385 is disposed on the second sensing electrode 3390. The first sensing electrode 3370 is disposed on the fourth insulating layer 3385.

[0445] The first sensing electrode 3370 and the second sensing electrode 3390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 3370 and the second sensing electrode 3390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0446] The first sensing electrode 3370 may have a different thickness than the second sensing electrode 3390. In an exemplary embodiment, the thickness of the first sensing electrode 3370 may be, for example, approximately... When the thickness of the first sensing electrode 3370 is approximately At this time, the transmittance of the first sensing electrode 3370 can be approximately 0%, and the reflectance of the first sensing electrode 3370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 3390 can be approximately... When the thickness of the second sensing electrode 3390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 3390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 3390 can perform a mirror function.

[0447] Figure 99 This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 100 It is along Figure 99 A sectional view taken from line VII-VII′.

[0448] In addition to the first sensing electrode 4370, the thin film encapsulation layer 4410, the fourth insulating layer 4420, and the second sensing electrode 4390, the organic light-emitting display device according to the illustrated exemplary embodiment and Figure 1 and Figure 2 The organic light-emitting display devices are basically the same, therefore similar reference numerals are used for the same elements and repeated explanations will be omitted.

[0449] Reference Figure 99 and Figure 100 A thin film encapsulation layer 4410 is disposed on the second electrode 4340. The thin film encapsulation layer 4410 can be provided by stacking (e.g., sequentially stacking) a first inorganic layer, an organic layer, and a second inorganic layer.

[0450] In exemplary embodiments, the organic layer may include a polymer and may be a single layer or multiple layers (e.g., stacked layers) comprising, for example, polyethylene terephthalate, polyimide, polycarbonate, epoxy resin, polyethylene, and polyacrylate. The organic layer may also include polyacrylates; for example, the organic layer may include a polymeric monomer component comprising a diacrylate monomer or a triacrylate monomer. The monomer component may also include a monoacrylate monomer. In exemplary embodiments, the monomer component may also include, but is not limited to, a suitable photoinitiator such as a thermoplastic polyolefin (“TPO”).

[0451] The first and second inorganic layers can be monolayers or stacked layers comprising metal oxides or metal nitrides. In an exemplary embodiment, the first and second inorganic layers may include, for example, silicon nitride (e.g., SiN). xThe second inorganic layer is one of aluminum oxide (e.g., Al2O3), silicon oxide (e.g., SiO2), and titanium oxide (e.g., TiO2). In this case, the second inorganic layer can prevent or reduce moisture penetration into the light-emitting structure.

[0452] However, the present invention is not limited thereto, and the thin film encapsulation layer 4410 can be provided by stacking (e.g., sequentially stacking) a first inorganic layer, a first organic layer, a second inorganic layer, a second organic layer and a third inorganic layer.

[0453] The second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. The second sensing electrode 4390 may be disposed in the light-emitting region II and the reflective region III.

[0454] The second sensing electrode 4390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 4390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 4390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 4390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0455] A fourth insulating layer 4420 is disposed on the second sensing electrode 4390. The fourth insulating layer 4420 may include an adhesive material.

[0456] The first sensing electrode 4370 is disposed on the fourth insulating layer 4420. The first sensing electrode 4370 may be disposed in the reflective region III and outside the light-emitting region II.

[0457] The first sensing electrode 4370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 4370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 4370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 4370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0458] A fifth insulating layer 4392 may be disposed on the first sensing electrode 4370. In an exemplary embodiment, the fifth insulating layer 4392 may include, for example, a silicon compound, a metal oxide, etc.

[0459] In the illustrated exemplary embodiment, the second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. A fourth insulating layer 4420 is disposed on the second sensing electrode 4390, and the first sensing electrode 4370 is disposed on the fourth insulating layer 4420. However, the invention is not limited thereto; the first sensing electrode 4370 may be disposed on the thin film encapsulation layer 4410. Alternatively, the fourth insulating layer 4420 may be disposed on the first sensing electrode 4370, and the second sensing electrode 4390 may be disposed on the fourth insulating layer 4420.

[0460] Figures 101 to 108 It shows the manufacturing process. Figure 100 A cross-sectional view of a method for developing an organic light-emitting display device.

[0461] Reference Figure 101 A buffer layer 4115 is disposed on the first substrate 4110. Then, an active pattern 4130 and a first insulating layer 4150 are disposed on the buffer layer 4115.

[0462] In an exemplary embodiment, the first substrate 4110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0463] A light-emitting structure can be formed on a first substrate 4110. The first substrate 4110 may include a transparent material. In an exemplary embodiment, the first substrate 4110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 4110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 4110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 4110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is provided on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 4250, capacitor, first electrode 4290, light-emitting layer 4330, second electrode 4340, etc.) can be provided on the insulating layer.

[0464] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 4110 after the glass substrate is removed. Because the organic light-emitting display device 4100 includes a light-emitting region II and a reflective region III, the first substrate 4110 can also include a light-emitting region II and a reflective region III.

[0465] A buffer layer 4115 can be disposed on the first substrate 4110. The buffer layer 4115 can extend from the light-emitting region II into the reflective region III. The buffer layer 4115 can prevent metal atoms and / or impurities from diffusing from the first substrate 4110 (e.g., venting). In addition, the buffer layer 4115 can control the heat transfer rate in the crystallization process used to form the active pattern 4130, thereby obtaining a substantially uniform active pattern 4130. Furthermore, when the surface of the first substrate 4110 is relatively irregular, the buffer layer 4115 can improve the surface flatness of the first substrate 4110. Depending on the type of the first substrate 4110, at least two buffer layers can be disposed on the first substrate 4110, or no buffer layer may be disposed.

[0466] In an exemplary embodiment, the active pattern 4130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0467] A first insulating layer 4150 may be disposed on the active pattern 4130. The first insulating layer 4150 may cover the active pattern 4130 in the light-emitting region II and may extend along a first direction on the first substrate 4110. That is, the first insulating layer 4150 may be disposed on the entire surface of the first substrate 4110. In an exemplary embodiment, the first insulating layer 4150 may include, for example, a silicon compound, a metal oxide, etc.

[0468] Reference Figure 102 A gate electrode 4170 and a second insulating layer 4190 are disposed on a first substrate 4110 on which a first insulating layer 4150 is disposed.

[0469] A gate electrode 4170 may be disposed on a portion of the first insulating layer 4150 on which the active pattern 4130 is disposed. In an exemplary embodiment, the gate electrode 4170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0470] A second insulating layer 4190 may be disposed on the gate electrode 4170. The second insulating layer 4190 may cover the gate electrode 4170 in the light-emitting region II and may extend along a first direction on the first substrate 4110. That is, the second insulating layer 4190 may be disposed on the entire surface of the first substrate 4110. In an exemplary embodiment, the second insulating layer 4190 may include, for example, a silicon compound, a metal oxide, etc.

[0471] Reference Figure 103 A source electrode 4210 and a drain electrode 4230 are disposed on a first substrate 4110 on which a second insulating layer 4190 is disposed.

[0472] A source electrode 4210 and a drain electrode 4230 may be disposed on the second insulating layer 4190. By removing a portion of the first insulating layer 4150 and the second insulating layer 4190, the source electrode 4210 may contact a first side of the active layer 4130. By removing a second portion of the first insulating layer 4150 and the second insulating layer 4190, the drain electrode 4230 may contact a second side of the active layer 4130. In an exemplary embodiment, each of the source electrode 4210 and the drain electrode 4230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0473] In the exemplary embodiment shown, a gate electrode 4170 is disposed on the active pattern 4130. However, the invention is not limited thereto, and the gate electrode 4170 may be disposed below the active pattern 4130.

[0474] Reference Figure 104A third insulating layer 4270 and a first electrode 4290 are disposed on a first substrate 4110 on which an active electrode 4210 and a drain electrode 4230 are disposed.

[0475] A third insulating layer 4270 may be disposed on the source electrode 4210 and the drain electrode 4230. The third insulating layer 4270 may cover the source electrode 4210 and the drain electrode 4230 in the sub-pixel region II, and may extend along a first direction on the first substrate 4110. That is, the third insulating layer 4270 may be disposed on the entire surface of the first substrate 4110. In an exemplary embodiment, the third insulating layer 4270 may include, for example, a silicon compound, a metal oxide, etc.

[0476] A first electrode 4290 may be disposed on the third insulating layer 4270. By removing a portion of the third insulating layer 4270, the first electrode 4290 may come into contact with the drain electrode 4230. Additionally, the first electrode 4290 may be electrically connected to the semiconductor element 4250. In an exemplary embodiment, the first electrode 4290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0477] Reference Figure 105 A pixel defining layer 4310, a light emitting layer 4330, and a second electrode 4340 are disposed on a first substrate 4110 on which a first electrode 4290 is disposed.

[0478] A pixel defining layer 4310 may be formed on the third insulating layer 4270 to expose a portion of the first electrode 4290. The pixel defining layer 4310 may comprise an organic or inorganic material. In this case, a light-emitting layer 4330 may be formed on the portion of the first electrode 4290 exposed by the pixel defining layer 4310.

[0479] A light-emitting layer 4330 can be disposed on the exposed first electrode 4290. The light-emitting layer 4330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 4330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0480] A second electrode 4340 may be disposed on the pixel defining layer 4310 and the light-emitting layer 4330. The second electrode 4340 may cover the pixel defining layer 4310 and the light-emitting layer 4330 in the light-emitting region II and the reflective region III, and may extend along a first direction on the first substrate 4110. That is, the second electrode 4340 may be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 4340 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc. These materials may be used alone or in combination.

[0481] Reference Figure 106 A thin film encapsulation layer 4410 is disposed on a first substrate 4110 on which a second electrode 4340 is disposed.

[0482] The thin film encapsulation layer 4410 can be provided by stacking (e.g., sequentially stacking) a first inorganic layer, an organic layer, and a second inorganic layer.

[0483] In exemplary embodiments, the organic layer may include a polymer and may be a single layer or multiple layers (e.g., stacked layers) comprising, for example, polyethylene terephthalate, polyimide, polycarbonate, epoxy resin, polyethylene, and polyacrylate. The organic layer may also include polyacrylates; for example, the organic layer may include a polymeric monomer component comprising a diacrylate monomer or a triacrylate monomer. The monomer component may also include a monoacrylate monomer. The monomer component may also include, but is not limited to, a suitable photoinitiator such as TPO.

[0484] The first and second inorganic layers can be monolayers or stacked layers comprising metal oxides or metal nitrides. In an exemplary embodiment, the first and second inorganic layers may include, for example, silicon nitride (e.g., SiN). x The second inorganic layer is one of aluminum oxide (e.g., Al2O3), silicon oxide (e.g., SiO2), and titanium oxide (e.g., TiO2). In this case, the second inorganic layer can prevent or reduce moisture penetration into the light-emitting structure.

[0485] Reference Figure 107 A second sensing electrode 4390 is disposed on a first substrate 4110 on which a thin film encapsulation layer 4410 is disposed.

[0486] A second sensing electrode 4390 can be set in the light-emitting region II and the reflection region III.

[0487] The second sensing electrode 4390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 4390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 4390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 4390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) xSRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0488] Reference Figure 108 A fourth insulating layer 4420 is disposed on a first substrate 4110 on which a second sensing electrode 4390 is disposed.

[0489] The fourth insulating layer 4420 can prevent oxidation of the second sensing electrode 4390. The fourth insulating layer 4420 may include an adhesive material. The fourth insulating layer 4420 can insulate between the first sensing electrode 4370 and the second sensing electrode 4390.

[0490] Reference Figure 100 A first sensing electrode 4370 is disposed on a first substrate 4110 on which a fourth insulating layer 4420 is disposed. A fifth insulating layer 4392 is disposed on the first sensing electrode 4370.

[0491] The first sensing electrode 4370 can be disposed in the reflection region III and outside the light-emitting region II.

[0492] The first sensing electrode 4370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 4370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 4370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 4370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0493] Figure 109 It is shown Figure 100 A plan view of the first sensing electrode. Figure 110 It is shown Figure 100 A plan view of the second sensing electrode. Figure 111 It is shown Figure 109 The first sensing electrode and Figure 110 A plan view of the second sensing electrode.

[0494] Reference Figure 100 and Figures 109 to 111 The first sensing electrode 4370 and the second sensing electrode 4390 are shown.

[0495] The first sensing electrode 4370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 4370 is disposed in the reflective region III. The first sensing electrode 4370 can be connected to the sensing drive component via a first connecting line 4375. The first connecting line 4375 can include the same material as the first sensing electrode 4370. The first connecting line 4375 can be disposed on the same layer as the layer on which the first sensing electrode 4370 is disposed.

[0496] The second sensing electrode 4390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 4390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 4390 can be connected to a sensing driving component via a second connecting line 4395. The second connecting line 4395 can comprise the same material as the second sensing electrode 4390. The second connecting line 4395 can be disposed on the same layer as the layer on which the second sensing electrode 4390 is disposed.

[0497] The first sensing electrode 4370 may include a material having a predetermined reflectivity. The second sensing electrode 4390 may include a material having a predetermined reflectivity. The first sensing electrode 4370 may be partially stacked with the second sensing electrode 4390.

[0498] The second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. The fourth insulating layer 4420 is disposed on the second sensing electrode 4390, and the first sensing electrode 4370 is disposed on the fourth insulating layer 4420.

[0499] The first sensing electrode 4370 and the second sensing electrode 4390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 4370 and the second sensing electrode 4390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0500] The first sensing electrode 4370 may have a different thickness than the second sensing electrode 4390. In an exemplary embodiment, the thickness of the first sensing electrode 4370 may be, for example, approximately... When the thickness of the first sensing electrode 4370 is approximately At this time, the transmittance of the first sensing electrode 4370 can be approximately 0%, and the reflectance of the first sensing electrode 4370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 4390 can be approximately... When the thickness of the second sensing electrode 4390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 4390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 4390 can perform a mirror function.

[0501] Figure 112 It is shown Figure 100 A plan view of the first sensing electrode. Figure 113 It is shown Figure 100 A plan view of the second sensing electrode. Figure 114 It is shown Figure 112 The first sensing electrode and Figure 113 A plan view of the second sensing electrode.

[0502] Reference Figure 100 and Figures 112 to 114 The first sensing electrode 4370 and the second sensing electrode 4390 are shown.

[0503] The first sensing electrode 4370 may include a plurality of first sensing patterns 4371 extending along the second direction D2 and a plurality of first dummy patterns 4373 disposed between the first sensing patterns 4371. The first sensing electrode 4370 is disposed in the reflection region III. The spacing of the first sensing patterns 4371 may be adjusted according to the number of first dummy patterns 4373. The first sensing electrode 4370 may be connected to a sensing drive component via a first connecting line 4375. The first connecting line 4375 may include the same material as the first sensing electrode 4370. The first connecting line 4375 may be disposed on the same layer as the layer on which the first sensing electrode 4370 is disposed.

[0504] The second sensing electrode 4390 can be configured as a plurality of second sensing patterns 4391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 4393 disposed between the second sensing patterns 4391. The second sensing electrode 4390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 4390 can be adjusted according to the number of second dummy patterns 4393. The second sensing electrode 4390 can be connected to the sensing driving component via a second connecting line 4395. The second connecting line 4395 can include the same material as the second sensing electrode 4390. The second connecting line 4395 can be disposed on the same layer as the layer on which the second sensing electrode 4390 is disposed.

[0505] The first sensing electrode 4370 may include a material having a predetermined reflectivity. The second sensing electrode 4390 may include a material having a predetermined reflectivity. The first sensing electrode 4370 may be partially stacked with the second sensing electrode 4390.

[0506] The second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. The fourth insulating layer 4420 is disposed on the second sensing electrode 4390, and the first sensing electrode 4370 is disposed on the fourth insulating layer 4420.

[0507] The first sensing electrode 4370 and the second sensing electrode 4390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 4370 and the second sensing electrode 4390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0508] The first sensing electrode 4370 may have a different thickness than the second sensing electrode 4390. In an exemplary embodiment, the thickness of the first sensing electrode 4370 may be, for example, approximately... When the thickness of the first sensing electrode 4370 is approximately At this time, the transmittance of the first sensing electrode 4370 can be approximately 0%, and the reflectance of the first sensing electrode 4370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 4390 can be approximately... When the thickness of the second sensing electrode 4390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 4390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 4390 can perform a mirror function.

[0509] Figure 115 It is shown Figure 100 A plan view of the first sensing electrode. Figure 116 It is shown Figure 100 A plan view of the second sensing electrode. Figure 117 It is shown Figure 115 The first sensing electrode and Figure 116 A plan view of the second sensing electrode.

[0510] Reference Figure 100 as well as Figures 115 to 117 The first sensing electrode 4370 and the second sensing electrode 4390 are shown.

[0511] The first sensing electrode 4370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 4370 can be configured as a grid shape. The first sensing electrode 4370 is disposed in the reflective region III. The first sensing electrode 4370 can be connected to a sensing drive component via a first connecting line 4375. The first connecting line 4375 can comprise the same material as the first sensing electrode 4370. The first connecting line 4375 can be disposed on the same layer as the layer on which the first sensing electrode 4370 is disposed.

[0512] The second sensing electrode 4390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 4390 in the second direction D2 is the same as the width of the first sensing electrode 4370 in the first direction D1. The second sensing electrode 4390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 4390 can be connected to the sensing driving component via a second connecting line 4395. The second connecting line 4395 can include the same material as the second sensing electrode 4390. The second connecting line 4395 can be disposed on the same layer as the layer on which the second sensing electrode 4390 is disposed.

[0513] The first sensing electrode 4370 may include a material having a predetermined reflectivity. The second sensing electrode 4390 may include a material having a predetermined reflectivity. The first sensing electrode 4370 may be partially stacked with the second sensing electrode 4390.

[0514] The second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. The fourth insulating layer 4420 is disposed on the second sensing electrode 4390, and the first sensing electrode 4370 is disposed on the fourth insulating layer 4420.

[0515] The first sensing electrode 4370 and the second sensing electrode 4390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 4370 and the second sensing electrode 4390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0516] The first sensing electrode 4370 may have a different thickness than the second sensing electrode 4390. In an exemplary embodiment, the thickness of the first sensing electrode 4370 may be, for example, approximately... When the thickness of the first sensing electrode 4370 is approximately At this time, the transmittance of the first sensing electrode 4370 can be approximately 0%, and the reflectance of the first sensing electrode 4370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 4390 can be approximately... When the thickness of the second sensing electrode 4390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 4390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 4390 can perform a mirror function.

[0517] Figure 118 It is shown Figure 100 A plan view of the first sensing electrode. Figure 119 It is magnification Figure 118 Plan view of the 'M' section. Figure 120 It is shown Figure 100 A plan view of the second sensing electrode. Figure 121 It is magnification Figure 120 Plan view of the 'N' part. Figure 122 It is shown Figure 118 The first sensing electrode and Figure 120 A plan view of the second sensing electrode. Figure 123 It is magnification Figure 122 A plan view of the 'O' part.

[0518] Reference Figure 100 as well as Figures 118 to 123 The first sensing electrode 4370 and the second sensing electrode 4390 are shown.

[0519] The first sensing electrode 4370 may include a plurality of first sensing patterns 4371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 4373 having a rhomboid shape and disposed between the first sensing patterns 4371. The first dummy patterns 4373 are spaced apart from each other. The first sensing electrode 4370 is disposed in the reflection region III. The first sensing electrode 4370 may be connected to a sensing drive component via a first connecting line 4375. The first connecting line 4375 may include the same material as the first sensing electrode 4370. The first connecting line 4375 may be disposed on the same layer as the layer on which the first sensing electrode 4370 is disposed.

[0520] The second sensing electrode 4390 may include a plurality of second sensing patterns 4391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 4393 having a rhomboid shape and disposed between the second sensing patterns 4391. The second dummy patterns 4393 are spaced apart from each other. The second sensing electrode 4390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 4390 may be connected to a sensing driving component via a second connecting line 4395. The second connecting line 4395 may include the same material as the second sensing electrode 4390. The second connecting line 4395 may be disposed on the same layer as the layer on which the second sensing electrode 4390 is disposed.

[0521] The first sensing electrode 4370 may include a material having a predetermined reflectivity. The second sensing electrode 4390 may include a material having a predetermined reflectivity. The first sensing electrode 4370 may be partially stacked with the second sensing electrode 4390.

[0522] The second sensing electrode 4390 is disposed on the thin film encapsulation layer 4410. The fourth insulating layer 4420 is disposed on the second sensing electrode 4390, and the first sensing electrode 4370 is disposed on the fourth insulating layer 4420.

[0523] The first sensing electrode 4370 and the second sensing electrode 4390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 4370 and the second sensing electrode 4390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0524] The first sensing electrode 4370 may have a different thickness than the second sensing electrode 4390. In an exemplary embodiment, the thickness of the first sensing electrode 4370 may be, for example, approximately... When the thickness of the first sensing electrode 4370 is approximately At this time, the transmittance of the first sensing electrode 4370 can be approximately 0%, and the reflectance of the first sensing electrode 4370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 4390 can be approximately... When the thickness of the second sensing electrode 4390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 4390 can display an image in the light-emitting area II. When the organic light-emitting display device does not emit light, the second sensing electrode 4390 can perform a mirror function.

[0525] Figure 124This is a plan view illustrating an organic light-emitting display device according to an exemplary embodiment of the present invention. Figure 125 It is along Figure 124 A sectional view taken from line VIII-VIII′.

[0526] In addition to the first sensing electrode 5370, the first thin film encapsulation layer 5410, the second thin film encapsulation layer 5420, and the second sensing electrode 5390, the organic light-emitting display device according to the illustrated exemplary embodiment and Figure 1 and Figure 2 The organic light-emitting display devices are basically the same, therefore similar reference numerals are used for the same elements and repeated explanations will be omitted.

[0527] Reference Figure 124 and Figure 125 A thin film encapsulation layer is disposed on the second electrode 5340. The thin film encapsulation layer can be provided by stacking (e.g., sequentially stacking) a first inorganic layer, an organic layer, and a second inorganic layer.

[0528] In exemplary embodiments, the organic layer may include a polymer and may be a single layer or multiple layers (e.g., stacked layers) comprising, for example, polyethylene terephthalate, polyimide, polycarbonate, epoxy resin, polyethylene, and polyacrylate. The organic layer may also include polyacrylates; for example, the organic layer may include a polymeric monomer component comprising a diacrylate monomer or a triacrylate monomer. The monomer component may also include a monoacrylate monomer. The monomer component may also include, but is not limited to, a suitable photoinitiator such as TPO.

[0529] The first and second inorganic layers can be monolayers or stacked layers comprising metal oxides or metal nitrides. In an exemplary embodiment, the first and second inorganic layers may include, for example, silicon nitride (e.g., SiN). x The second inorganic layer is one of aluminum oxide (e.g., Al2O3), silicon oxide (e.g., SiO2), and titanium oxide (e.g., TiO2). In this case, the second inorganic layer can prevent or reduce moisture penetration into the light-emitting structure.

[0530] However, the present invention is not limited thereto, and the film encapsulation layer can be provided by stacking (e.g., sequentially stacking) a first inorganic layer, a first organic layer, a second inorganic layer, a second organic layer, and a third inorganic layer.

[0531] In the exemplary embodiments shown, the film encapsulation layer may include a first film encapsulation layer 5410 and a second film encapsulation layer 5420. In the exemplary embodiments, the first film encapsulation layer 5410 may include, for example, a first inorganic layer and an organic layer. The second film encapsulation layer 5420 may include a second inorganic layer. However, the invention is not limited thereto.

[0532] The second sensing electrode 5390 is disposed on the first thin film encapsulation layer 5410. The second sensing electrode 5390 may be disposed in the light-emitting region II and the reflective region III.

[0533] The second sensing electrode 5390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 5390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 5390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 5390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0534] The second thin-film encapsulation layer 5420 is disposed on the second sensing electrode 5390. The first sensing electrode 5370 is disposed on the second thin-film encapsulation layer 5420. The first sensing electrode 5370 may be disposed in the reflection region III and outside the light-emitting region II.

[0535] The first sensing electrode 5370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 5370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 5370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 5370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x Alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO)x )wait.

[0536] A fifth insulating layer 5392 may be disposed on the first sensing electrode 5370. In an exemplary embodiment, the fifth insulating layer 5392 may include, for example, a silicon compound, a metal oxide, etc.

[0537] In the illustrated exemplary embodiment, a second sensing electrode 5390 is disposed on a first thin-film encapsulation layer 5410. A second thin-film encapsulation layer 5420 is disposed on the second sensing electrode 5390, and a first sensing electrode 5370 is disposed on the second thin-film encapsulation layer 5420. However, the present invention is not limited thereto; the first sensing electrode 5370 may be disposed on the first thin-film encapsulation layer 5410. Furthermore, the second thin-film encapsulation layer 5420 may be disposed on the first sensing electrode 5370, and the second sensing electrode 5390 may be disposed on the second thin-film encapsulation layer 5420.

[0538] Figures 126 to 133 It shows the manufacturing process. Figure 125 A cross-sectional view of a method for developing an organic light-emitting display device.

[0539] Reference Figure 126 A buffer layer 5115 is disposed on the first substrate 5110. Then, an active pattern 5130 and a first insulating layer 5150 are disposed on the buffer layer 5115.

[0540] In an exemplary embodiment, the first substrate 5110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc.

[0541] A light-emitting structure can be formed on a first substrate 5110. The first substrate 5110 may include a transparent material. In an exemplary embodiment, the first substrate 5110 may include, for example, quartz, artificial quartz, calcium fluoride, fluorine-doped quartz, soda-lime glass, alkali-free glass, etc. In an alternative exemplary embodiment, the first substrate 5110 may include a flexible transparent resin substrate. Here, the flexible transparent resin substrate for the first substrate 5110 may include a polyimide substrate. In an exemplary embodiment, the polyimide substrate may include, for example, a first polyimide layer, a barrier film layer, a second polyimide layer, etc. When the polyimide substrate is thin and flexible, a polyimide substrate may be formed on a rigid glass substrate to help support the formation of the light-emitting structure. That is, in an exemplary embodiment, the first substrate 5110 may have a structure in which a first polyimide layer, a barrier film layer, and a second polyimide layer are stacked on a glass substrate. Here, after the insulating layer is provided on the second polyimide layer, a light-emitting structure (e.g., semiconductor element 5250, capacitor, first electrode 5290, light-emitting layer 5330, second electrode 5340, etc.) can be provided on the insulating layer.

[0542] After the light-emitting structure is formed on the insulating layer, the glass substrate can be removed. Because the polyimide substrate is thin and flexible, it may be difficult to form the light-emitting structure directly on the polyimide substrate. Therefore, the light-emitting structure is formed on a rigid glass substrate, and then the polyimide substrate can be used as the first substrate 5110 after the glass substrate is removed. Because the organic light-emitting display device 5100 includes a light-emitting region II and a reflective region III, the first substrate 5110 can also include a light-emitting region II and a reflective region III.

[0543] A buffer layer 5115 may be disposed on the first substrate 5110. The buffer layer 5115 may extend from the light-emitting region II into the reflective region III. The buffer layer 5115 may prevent the diffusion (e.g., venting) of metal atoms and / or impurities from the first substrate 5110. In addition, the buffer layer 5115 may control the heat transfer rate in the crystallization process used to form the active pattern 5130, thereby obtaining a substantially uniform active pattern 5130. Furthermore, when the surface of the first substrate 5110 is relatively irregular, the buffer layer 5115 may improve the surface flatness of the first substrate 5110. Depending on the type of the first substrate 5110, at least two buffer layers may be disposed on the first substrate 5110, or no buffer layer may be disposed.

[0544] In an exemplary embodiment, the active pattern 5130 may include, for example, oxide semiconductors, inorganic semiconductors (e.g., amorphous silicon, polycrystalline silicon, etc.), organic semiconductors, etc.

[0545] A first insulating layer 5150 may be disposed on the active pattern 5130. The first insulating layer 5150 may cover the active pattern 5130 in the light-emitting region II and may extend along a first direction on the first substrate 5110. That is, the first insulating layer 5150 may be disposed on the entire surface of the first substrate 5110. In an exemplary embodiment, the first insulating layer 5150 may include, for example, a silicon compound, a metal oxide, etc.

[0546] Reference Figure 127 A gate electrode 5170 and a second insulating layer 5190 are disposed on a first substrate 5110 on which a first insulating layer 5150 is disposed.

[0547] A gate electrode 5170 may be disposed on a portion of the first insulating layer 5150 on which the active pattern 5130 is disposed. In an exemplary embodiment, the gate electrode 5170 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0548] A second insulating layer 5190 may be disposed on the gate electrode 5170. The second insulating layer 5190 may cover the gate electrode 5170 in the light-emitting region II and may extend along a first direction on the first substrate 5110. That is, the second insulating layer 5190 may be disposed on the entire surface of the first substrate 5110. In an exemplary embodiment, the second insulating layer 5190 may include, for example, a silicon compound, a metal oxide, etc.

[0549] Reference Figure 128 A source electrode 5210 and a drain electrode 5230 are disposed on a first substrate 5110 on which a second insulating layer 5190 is disposed.

[0550] A source electrode 5210 and a drain electrode 5230 may be disposed on the second insulating layer 5190. By removing a portion of the first insulating layer 5150 and the second insulating layer 5190, the source electrode 5210 may contact a first side of the active layer 5130. By removing a second portion of the first insulating layer 5150 and the second insulating layer 5190, the drain electrode 5230 may contact a second side of the active layer 5130. In an exemplary embodiment, each of the source electrode 5210 and the drain electrode 5230 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc.

[0551] In the exemplary embodiment shown, a gate electrode 5170 is provided on the active pattern 5130. However, the invention is not limited thereto, and the gate electrode 5170 may be provided below the active pattern 5130.

[0552] Reference Figure 129 A third insulating layer 5270 and a first electrode 5290 are disposed on a first substrate 5110 on which an active electrode 5210 and a drain electrode 5230 are disposed.

[0553] A third insulating layer 5270 may be disposed on the source electrode 5210 and the drain electrode 5230. The third insulating layer 5270 may cover the source electrode 5210 and the drain electrode 5230 in the sub-pixel region II, and may extend along a first direction on the first substrate 5110. That is, the third insulating layer 5270 may be disposed on the entire surface of the first substrate 5110. In an exemplary embodiment, the third insulating layer 5270 may include, for example, a silicon compound, a metal oxide, etc.

[0554] A first electrode 5290 may be disposed on the third insulating layer 5270. By removing a portion of the third insulating layer 5270, the first electrode 5290 may come into contact with the drain electrode 5230. Additionally, the first electrode 5290 may be electrically connected to the semiconductor element 5250. In an exemplary embodiment, the first electrode 5290 may include, for example, a metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc.

[0555] Reference Figure 130 A pixel defining layer 5310, a light emitting layer 5330, and a second electrode 5340 are disposed on a first substrate 5110 on which a first electrode 5290 is disposed.

[0556] A pixel defining layer 5310 may be formed on the third insulating layer 5270 to expose a portion of the first electrode 5290. The pixel defining layer 5310 may comprise an organic or inorganic material. In this case, a light-emitting layer 5330 may be formed on the portion of the first electrode 5290 exposed by the pixel defining layer 5310.

[0557] A light-emitting layer 5330 can be disposed on the exposed first electrode 5290. The light-emitting layer 5330 can be provided using a light-emitting material capable of producing different colors of light (e.g., red, blue, and green light). However, the invention is not limited thereto; the light-emitting layer 5330 can be constructed by stacking light-emitting materials capable of producing different colors of light to emit white light.

[0558] A second electrode 5340 may be disposed on the pixel defining layer 5310 and the light-emitting layer 5330. The second electrode 5340 may cover the pixel defining layer 5310 and the light-emitting layer 5330 in the light-emitting region II and the reflective region III, and may extend along a first direction on the first substrate 5110. That is, the second electrode 5340 may be electrically connected to the first to third pixels. In an exemplary embodiment, the second electrode 5340 may include, for example, a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc. These materials may be used alone or in combination.

[0559] Reference Figure 131 A first thin film encapsulation layer 5410 is disposed on a first substrate 5110 on which a second electrode 5340 is disposed.

[0560] The film encapsulation layer according to the illustrated exemplary embodiment may include a first film encapsulation layer 5410 and a second film encapsulation layer 5420. The film encapsulation layer may be provided by stacking (e.g., sequentially stacking) a first inorganic layer, an organic layer, and a second inorganic layer.

[0561] In exemplary embodiments, the organic layer may include a polymer and may be a single layer or multiple layers (e.g., stacked layers) comprising, for example, polyethylene terephthalate, polyimide, polycarbonate, epoxy resin, polyethylene, and polyacrylate. The organic layer may also include polyacrylates; for example, the organic layer may include a polymeric monomer component comprising a diacrylate monomer or a triacrylate monomer. The monomer component may also include a monoacrylate monomer. The monomer component may also include, but is not limited to, a suitable photoinitiator such as TPO.

[0562] The first and second inorganic layers can be monolayers or stacked layers comprising metal oxides or metal nitrides. In an exemplary embodiment, the first and second inorganic layers may include, for example, silicon nitride (e.g., SiN). x The second inorganic layer is one of aluminum oxide (e.g., Al2O3), silicon oxide (e.g., SiO2), and titanium oxide (e.g., TiO2). In this case, the second inorganic layer can prevent or reduce moisture penetration into the light-emitting structure.

[0563] The first thin film encapsulation layer 5410 may include a first inorganic layer. However, the present invention is not limited thereto, and the first thin film encapsulation layer 5410 may include a first inorganic layer and an organic layer.

[0564] Reference Figure 132 A second sensing electrode 5390 is disposed on a first substrate 5110 on which a first thin film encapsulation layer 5410 is disposed.

[0565] A second sensing electrode 5390 can be set in the light-emitting region II and the reflection region III.

[0566] The second sensing electrode 5390 may include a material having a predetermined reflectivity. In an exemplary embodiment, the second sensing electrode 5390 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the second sensing electrode 5390 may include alloys, metal nitrides, conductive metal oxides, etc. In an exemplary embodiment, the second sensing electrode 5390 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0567] Reference Figure 133 A second thin film encapsulation layer 5420 is disposed on a first substrate 5110 on which a second sensing electrode 5390 is disposed.

[0568] The second thin film encapsulation layer 5420 may include a second inorganic layer. However, the present invention is not limited thereto; the second thin film encapsulation layer 5420 may include an organic layer and a second inorganic layer.

[0569] In the illustrated exemplary embodiment, the thin-film encapsulation layer may include a first thin-film encapsulation layer 5410 and a second thin-film encapsulation layer 5420. A second sensing electrode 5390 is disposed between the first thin-film encapsulation layer 5410 and the second thin-film encapsulation layer 5420. That is, the second sensing electrode 5390 is disposed between the thin-film encapsulation layers.

[0570] Reference Figure 125 A first sensing electrode 5370 is disposed on a first substrate 5110 on which a second thin film encapsulation layer 5420 is disposed. A fifth insulating layer 5392 is disposed on the first sensing electrode 5370.

[0571] The first sensing electrode 5370 can be disposed in the reflective region III and outside the luminescent region II.

[0572] The first sensing electrode 5370 may include a material having a predetermined reflectivity. In an exemplary embodiment, the first sensing electrode 5370 may include, for example, gold (Au), silver (Ag), aluminum (Al), magnesium (Mg), platinum (Pt), nickel (Ni), titanium (Ti), etc. In an alternative exemplary embodiment, the first sensing electrode 5370 may include an alloy, a metal nitride, a conductive metal oxide, etc. In an exemplary embodiment, the first sensing electrode 5370 may include, for example, an alloy containing aluminum, aluminum nitride (AlN), etc. x ), alloys containing silver, tungsten nitride (WN) x ), alloys containing copper, chromium nitride (CrN) x ), alloys containing molybdenum, titanium nitride (TiN) x ), Tantalum nitride (TaN) x SRO, zinc oxide (ZnO) x ), Tin oxide (SnO) x Indium oxide (InO) x Gallium oxide (GaO) x )wait.

[0573] Figure 134 It is shown Figure 125 A plan view of the first sensing electrode. Figure 135 It is shown Figure 125 A plan view of the second sensing electrode. Figure 136 It is shown Figure 134 The first sensing electrode and Figure 135 A plan view of the second sensing electrode.

[0574] Reference Figure 125 and Figures 134 to 136 The first sensing electrode 5370 and the second sensing electrode 5390 are shown.

[0575] The first sensing electrode 5370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 5370 is disposed in the reflective region III. The first sensing electrode 5370 can be connected to the sensing drive component via a first connecting line 5375. The first connecting line 5375 can include the same material as the first sensing electrode 5370. The first connecting line 5375 can be disposed on the same layer as the layer on which the first sensing electrode 5370 is disposed.

[0576] The second sensing electrode 5390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The second sensing electrode 5390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 5390 can be connected to a sensing drive component via a second connecting line 5395. The second connecting line 5395 can comprise the same material as the second sensing electrode 5390. The second connecting line 5395 can be disposed on the same layer as the layer on which the second sensing electrode 5390 is disposed.

[0577] The first sensing electrode 5370 may include a material having a predetermined reflectivity. The second sensing electrode 5390 may include a material having a predetermined reflectivity. The first sensing electrode 5370 may be partially stacked with the second sensing electrode 5390.

[0578] The second sensing electrode 5390 is disposed on the first thin film encapsulation layer 5410. The second thin film encapsulation layer 5420 is disposed on the second sensing electrode 5390. The first sensing electrode 5370 is disposed on the second thin film encapsulation layer 5420.

[0579] The first sensing electrode 5370 and the second sensing electrode 5390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 5370 and the second sensing electrode 5390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0580] The first sensing electrode 5370 may have a different thickness than the second sensing electrode 5390. In an exemplary embodiment, the thickness of the first sensing electrode 5370 may be, for example, approximately... When the thickness of the first sensing electrode 5370 is approximately At this time, the transmittance of the first sensing electrode 5370 can be approximately 0%, and the reflectance of the first sensing electrode 5370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 5390 can be approximately... When the thickness of the second sensing electrode 5390 is approximately At this time, the transmittance of the second sensing electrode 5390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 5390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 5390 can perform a mirror function.

[0581] Figure 137 It is shown Figure 125 A plan view of the first sensing electrode. Figure 138 It is shown Figure 125 A plan view of the second sensing electrode. Figure 139 It is shown Figure 137 The first sensing electrode and Figure 138 A plan view of the second sensing electrode.

[0582] Reference Figure 125 as well as Figures 137 to 139 The first sensing electrode 5370 and the second sensing electrode 5390 are shown.

[0583] The first sensing electrode 5370 may include a plurality of first sensing patterns 5371 extending along the second direction D2 and a plurality of first dummy patterns 5373 disposed between the first sensing patterns 5371. The first sensing electrode 5370 is disposed in the reflection region III. The spacing of the first sensing patterns 5371 may be adjusted according to the number of first dummy patterns 5373. The first sensing electrode 5370 may be connected to a sensing drive component via a first connecting line 5375. The first connecting line 5375 may include the same material as the first sensing electrode 5370. The first connecting line 5375 may be disposed on the same layer as the layer on which the first sensing electrode 5370 is disposed.

[0584] The second sensing electrode 5390 can be configured as a plurality of second sensing patterns 5391 extending along a first direction D1 intersecting the second direction D2, and a plurality of second dummy patterns 5393 disposed between the second sensing patterns 5391. The second sensing electrode 5390 is disposed in the light-emitting region II and the reflective region III. The spacing of the second sensing electrodes 5390 can be adjusted according to the number of second dummy patterns 5393. The second sensing electrode 5390 can be connected to the sensing driving component via a second connecting line 5395. The second connecting line 5395 can include the same material as the second sensing electrode 5390. The second connecting line 5395 can be disposed on the same layer as the layer on which the second sensing electrode 5390 is disposed.

[0585] The first sensing electrode 5370 may include a material having a predetermined reflectivity. The second sensing electrode 5390 may include a material having a predetermined reflectivity. The first sensing electrode 5370 may be partially stacked with the second sensing electrode 5390.

[0586] The second sensing electrode 5390 is disposed on the first thin film encapsulation layer 5410. The second thin film encapsulation layer 5420 is disposed on the second sensing electrode 5390. The first sensing electrode 5370 is disposed on the second thin film encapsulation layer 5420.

[0587] The first sensing electrode 5370 and the second sensing electrode 5390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 5370 and the second sensing electrode 5390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0588] The first sensing electrode 5370 may have a different thickness than the second sensing electrode 5390. In an exemplary embodiment, the thickness of the first sensing electrode 5370 may be, for example, approximately... When the thickness of the first sensing electrode 5370 is approximately At this time, the transmittance of the first sensing electrode 5370 can be approximately 0%, and the reflectance of the first sensing electrode 5370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 5390 can be approximately... When the thickness of the second sensing electrode 5390 is approximately At this time, the transmittance of the second sensing electrode 5390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 5390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 5390 can perform a mirror function.

[0589] Figure 140 It is shown Figure 125 A plan view of the first sensing electrode. Figure 141 It is shown Figure 125 A plan view of the second sensing electrode. Figure 142 It is shown Figure 140 The first sensing electrode and Figure 141 A plan view of the second sensing electrode.

[0590] Reference Figure 125 as well as Figures 140 to 142 The first sensing electrode 5370 and the second sensing electrode 5390 are shown.

[0591] The first sensing electrode 5370 can be configured as a plurality of patterns extending along the second direction D2. The first sensing electrode 5370 can be configured as a grid shape. The first sensing electrode 5370 is disposed in the reflective region III. The first sensing electrode 5370 can be connected to a sensing drive component via a first connecting line 5375. The first connecting line 5375 can comprise the same material as the first sensing electrode 5370. The first connecting line 5375 can be disposed on the same layer as the layer on which the first sensing electrode 5370 is disposed.

[0592] The second sensing electrode 5390 can be configured as a plurality of patterns extending along a first direction D1 intersecting the second direction D2. The width of the second sensing electrode 5390 in the second direction D2 is the same as the width of the first sensing electrode 5370 in the first direction D1. The second sensing electrode 5390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 5390 can be connected to the sensing driving component via a second connecting line 5395. The second connecting line 5395 can include the same material as the second sensing electrode 5390. The second connecting line 5395 can be disposed on the same layer as the layer on which the second sensing electrode 5390 is disposed.

[0593] The first sensing electrode 5370 may include a material having a predetermined reflectivity. The second sensing electrode 5390 may include a material having a predetermined reflectivity. The first sensing electrode 5370 may be partially stacked with the second sensing electrode 5390.

[0594] The second sensing electrode 5390 is disposed on the first thin film encapsulation layer 5410. The second thin film encapsulation layer 5420 is disposed on the second sensing electrode 5390. The first sensing electrode 5370 is disposed on the second thin film encapsulation layer 5420.

[0595] The first sensing electrode 5370 and the second sensing electrode 5390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 5370 and the second sensing electrode 5390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0596] The first sensing electrode 5370 may have a different thickness than the second sensing electrode 5390. In an exemplary embodiment, the thickness of the first sensing electrode 5370 may be, for example, approximately... When the thickness of the first sensing electrode 5370 is approximately At this time, the transmittance of the first sensing electrode 5370 can be approximately 0%, and the reflectance of the first sensing electrode 5370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 5390 can be approximately... When the thickness of the second sensing electrode 5390 is approximately When the organic light-emitting display device emits light, the second sensing electrode 5390 can have a transmittance greater than approximately 50% and less than approximately 95%. When the organic light-emitting display device emits light, the second sensing electrode 5390 can display an image in the light-emitting area II, and when the organic light-emitting display device does not emit light, the second sensing electrode 5390 can perform a mirror function.

[0597] Figure 143 It is shown Figure 125 A plan view of the first sensing electrode. Figure 144 It is magnification Figure 143 Plan view of part 'P'. Figure 145 It is shown Figure 125 A plan view of the second sensing electrode. Figure 146 It is magnification Figure 145 A plan view of the 'Q' part. Figure 147 It is shown Figure 143 The first sensing electrode and Figure 145 A plan view of the second sensing electrode. Figure 148 It is magnification Figure 147 Plan view of the 'R' part.

[0598] Reference Figure 125 as well as Figures 143 to 148 The first sensing electrode 5370 and the second sensing electrode 5390 are shown.

[0599] The first sensing electrode 5370 may include a plurality of first sensing patterns 5371 having a rhomboid shape and sequentially connected to each other in a first direction D1, and a plurality of first dummy patterns 5373 having a rhomboid shape and disposed between the first sensing patterns 5371. The first dummy patterns 5373 are spaced apart from each other. The first sensing electrode 5370 is disposed in the reflection region III. The first sensing electrode 5370 may be connected to a sensing drive component via a first connecting line 5375. The first connecting line 5375 may include the same material as the first sensing electrode 5370. The first connecting line 5375 may be disposed on the same layer as the layer on which the first sensing electrode 5370 is disposed.

[0600] The second sensing electrode 5390 may include a plurality of second sensing patterns 5391 having a rhomboid shape and sequentially connected to each other in the second direction D2, and a plurality of second dummy patterns 5393 having a rhomboid shape and disposed between the second sensing patterns 5391. The second dummy patterns 5393 are spaced apart from each other. The second sensing electrode 5390 is disposed in the light-emitting region II and the reflective region III. The second sensing electrode 5390 may be connected to a sensing driving component via a second connecting line 5395. The second connecting line 5395 may include the same material as the second sensing electrode 5390. The second connecting line 5395 may be disposed on the same layer as the layer on which the second sensing electrode 5390 is disposed.

[0601] The first sensing electrode 5370 may include a material having a predetermined reflectivity. The second sensing electrode 5390 may include a material having a predetermined reflectivity. The first sensing electrode 5370 may be partially stacked with the second sensing electrode 5390.

[0602] The second sensing electrode 5390 is disposed on the first thin film encapsulation layer 5410. The second thin film encapsulation layer 5420 is disposed on the second sensing electrode 5390. The first sensing electrode 5370 is disposed on the second thin film encapsulation layer 5420.

[0603] The first sensing electrode 5370 and the second sensing electrode 5390 can be implemented as sensing electrodes of a mutual capacitance type touchscreen panel. In an exemplary embodiment, for example, when an electrical conductor is touched, the capacitance of the first sensing electrode 5370 and the second sensing electrode 5390 around the intersection point of the touch position changes. Therefore, the touch panel sensor (not shown) can determine the touch position based on the capacitance sensing signal corresponding to the change in capacitance.

[0604] The first sensing electrode 5370 may have a different thickness than the second sensing electrode 5390. In an exemplary embodiment, the thickness of the first sensing electrode 5370 may be, for example, approximately... When the thickness of the first sensing electrode 5370 is approximately At this time, the transmittance of the first sensing electrode 5370 can be approximately 0%, and the reflectance of the first sensing electrode 5370 can be greater than approximately 95%. Additionally, the thickness of the second sensing electrode 5390 can be approximately... When the thickness of the second sensing electrode 5390 is approximately At this time, the transmittance of the second sensing electrode 5390 can be greater than about 50% and less than about 95%. When the organic light-emitting display device emits light, light is emitted through the second sensing electrode 5390 in the light-emitting region II. When the organic light-emitting display device does not emit light, the second sensing electrode 5390 can perform a mirror function.

[0605] According to the exemplary embodiment shown, the organic light-emitting display device includes a reflective member having both mirror and touch functionality. Therefore, the additional process for forming the electrode layer with touch functionality can be omitted. This reduces manufacturing costs.

[0606] Furthermore, the organic light-emitting display device includes a first reflective member disposed in the reflective region and a second reflective member disposed in both the light-emitting region and the reflective region. Therefore, scattering and reflection occurring at the edges of the first reflective member can be reduced.

[0607] In addition, organic light-emitting display devices include a thin-film encapsulation layer. Therefore, it is possible to manufacture flexible organic light-emitting display devices with mirror and touch functions.

[0608] The foregoing description is illustrative of the invention and should not be construed as limiting it. While some exemplary embodiments of the invention have been described, those skilled in the art will readily understand that many changes can be made to the illustrated exemplary embodiments without substantially departing from the novel teachings and advantages of the invention. Therefore, all such changes are intended to be included within the scope of the invention as defined in the claims. The invention is defined by the claims, and equivalents of the claims will be included in the claims.

Claims

1. An organic light-emitting display device, the organic light-emitting display device comprising: The substrate includes the light-emitting region and the reflective region; The lower electrode is disposed on the substrate in the light-emitting region; An emission layer is disposed on the lower electrode; An upper electrode is disposed on the emitting layer in the light-emitting region and the reflective region; A first electrode is disposed on the upper electrode only in the reflective region, and the first electrode comprises a first material having a first reflectivity; as well as A second electrode is disposed on the upper electrode in the light-emitting region and the reflective region. The second electrode comprises a second material having a second reflectivity. The second electrode is substantially superimposed on the first electrode throughout the reflective region. The second reflectivity is less than the first reflectivity. Wherein, the first electrode and the second electrode define a touch sensor, which senses the touch position based on the capacitance change between the first electrode and the second electrode, and The second electrode comprises at least one selected from metals, alloys, metal nitrides, and conductive metal oxides.

2. The organic light-emitting display device according to claim 1, further comprising: Facing the substrate, The first electrode is disposed on a first surface of the opposing substrate, and the second electrode is disposed on a second surface of the opposing substrate opposite to the first surface. The first electrode is disposed in the reflective region and outside the luminescent region.

3. The organic light-emitting display device according to claim 1, further comprising: Facing the substrate, in, The first electrode is disposed on the substrate, and The second electrode is disposed on the first surface of the opposing substrate and between the substrate and the opposing substrate.

4. The organic light-emitting display device according to claim 1, further comprising: Facing the substrate; as well as An insulating layer is disposed between the first electrode and the second electrode, and includes an adhesive material. in, The first electrode is disposed on the first surface of the opposing substrate and between the substrate and the opposing substrate. The second electrode is disposed on the first electrode.

5. The organic light-emitting display device according to claim 1, further comprising: Facing the substrate; as well as An insulating layer is disposed between the first electrode and the second electrode, and includes an adhesive material. in, The second electrode is disposed on the first surface of the opposing substrate and between the substrate and the opposing substrate. The first electrode is disposed on the second electrode.

6. The organic light-emitting display device according to claim 1, further comprising: A thin film encapsulation layer is disposed on the substrate; as well as An insulating layer is disposed between the first electrode and the second electrode, and includes an adhesive material. in, The second electrode is disposed on the thin film encapsulation layer, and The first electrode is disposed on the second electrode.

7. The organic light-emitting display device according to claim 1, further comprising: A first thin film encapsulation layer is disposed on the substrate; as well as A second thin-film encapsulation layer is disposed between the first electrode and the second electrode. in, The second electrode is disposed on the first thin film encapsulation layer, and The first electrode is disposed on the second electrode.

8. The organic light-emitting display device according to claim 1, wherein, The first electrode includes a plurality of first patterns extending along a first direction, and The second electrode includes a plurality of second patterns extending along a second direction intersecting the first direction.

9. The organic light-emitting display device according to claim 8, in, The plurality of first patterns include: Multiple first sensing patterns are used to sense the touch location; and Multiple first dummy patterns are disposed between the multiple first sensing patterns. The plurality of second patterns include: Multiple second sensing patterns are used to sense the touch location; and Multiple second dummy patterns are disposed between the multiple second sensing patterns.

10. The organic light-emitting display device according to claim 9, in, The plurality of first sensing patterns have a grid shape, and The width of the plurality of second patterns in the second direction is the same as the width of the plurality of first patterns in the first direction.

11. The organic light-emitting display device according to claim 1, in, The first electrode further includes: Multiple first sensing patterns, having a rhomboid shape; and Multiple first dummy patterns, having a rhombus shape, are disposed between the multiple first sensing patterns and spaced apart from each other. The second electrode further includes: Multiple second sensing patterns, having a rhomboid shape; and Multiple second dummy patterns, having a rhomboid shape, are disposed between the multiple second sensing patterns and spaced apart from each other, and Among them, the first sensing patterns arranged along the first direction of the plurality of first sensing patterns are connected to each other, and the second sensing patterns arranged along the second direction that intersects the first direction of the plurality of second sensing patterns are connected to each other.

12. The organic light-emitting display device according to claim 1, wherein, The first material may be the same as or different from the second material.

13. An organic light-emitting display device, the organic light-emitting display device comprising: The substrate includes the light-emitting region and the reflective region; The lower electrode is disposed on the substrate in the light-emitting region; An emission layer is disposed on the lower electrode; An upper electrode is disposed on the emitting layer in the light-emitting region and the reflective region; A first electrode is disposed only on the upper electrode in the reflective region, and the first electrode has a first thickness such that the first electrode has a first reflectivity; as well as A second electrode is disposed on the upper electrode in the light-emitting region and the reflective region. The second electrode has a second thickness such that it has a second reflectivity. The second electrode is substantially superimposed on the first electrode throughout the reflective region, wherein the second reflectivity is less than the first reflectivity. The first electrode and the second electrode define a touch sensor, which senses the touch position based on the capacitance change between the first electrode and the second electrode. Wherein, the first thickness of the first electrode is greater than the second thickness of the second electrode, and, The second electrode comprises at least one selected from metals, alloys, metal nitrides, and conductive metal oxides.

14. The organic light-emitting display device according to claim 13, wherein, The first electrode comprises a first material having the first reflectivity, and the second electrode comprises a second material having the second reflectivity.

15. The organic light-emitting display device according to claim 14, wherein, The first material may be the same as or different from the second material.

16. The organic light-emitting display device according to claim 14, wherein, The first material is different from the second material.

17. The organic light-emitting display device according to claim 14, wherein, The first material is different from the second material.

18. An organic light-emitting display device, the organic light-emitting display device comprising: A thin film encapsulation layer on a substrate, the substrate including a light-emitting region and a reflective region; Touch-sensing patterns are applied to the thin-film encapsulation layer. A dummy pattern is placed between the touch-sensing patterns; A connecting line is attached to the touch sensing pattern; as well as Sensing drive components, The touch sensing pattern is electrically connected to the sensing driving component. The touch sensing pattern, the dummy pattern, and the connecting lines are formed of aluminum and titanium. The touch sensing pattern, the dummy pattern, and the connecting line are on the same layer. The substrate comprises: a first polyimide layer; a barrier film layer disposed on the first polyimide layer; and a second polyimide layer disposed on the barrier film layer. The thin film encapsulation layer consists of a first inorganic layer, an organic layer, and a second inorganic layer stacked sequentially. The touch-sensing pattern and the dummy pattern have reflectivity for performing a mirror function, and Some of the touch sensing patterns and some of the dummy patterns are disposed on the substrate in the light-emitting area and the reflective area.

19. An organic light-emitting display device, the organic light-emitting display device comprising: A thin film encapsulation layer on a substrate, the substrate including a light-emitting region and a reflective region; A first touch sensing pattern is arranged on the thin film encapsulation layer along a first direction; A first dummy pattern is placed between the first touch-sensing patterns; An insulating layer is applied to the first touch sensing pattern and the first dummy pattern. A second touch sensing pattern is arranged on the insulating layer along a second direction; A second dummy pattern is placed between the second touch-sensing patterns; A first connecting line is connected to the first touch sensing pattern; The second connecting line is connected to the second touch sensing pattern; as well as Sensing drive components, The first touch sensing pattern and the second touch sensing pattern are electrically connected to the sensing driving component. The first touch sensing pattern, the second touch sensing pattern, the first dummy pattern, the second dummy pattern, the first connecting line, and the second connecting line are formed of aluminum and titanium. The first touch sensing pattern, the first dummy pattern, and the first connecting line are on the same layer. The second touch sensing pattern, the second dummy pattern, and the second connecting line are on the same layer. The substrate comprises: a first polyimide layer; a barrier film layer disposed on the first polyimide layer; and a second polyimide layer disposed on the barrier film layer. The thin film encapsulation layer consists of a first inorganic layer, an organic layer, and a second inorganic layer stacked sequentially. The first touch sensing pattern and the first dummy pattern are disposed on the substrate in the light-emitting area and the reflective area, respectively. Wherein, the second touch sensing pattern and the second dummy pattern are disposed only in the reflective area on the insulating layer, and Wherein, the first touch sensing pattern and the first dummy pattern have a first reflectivity, the second touch sensing pattern and the second dummy pattern have a second reflectivity, and the first reflectivity is less than the second reflectivity.

20. The organic light-emitting display device according to claim 19, wherein, The first touch sensing pattern, the second touch sensing pattern, the first dummy pattern, and the second dummy pattern have reflectivity for performing mirror functions.

21. An organic light-emitting display device, the organic light-emitting display device comprising: A first substrate, wherein a plurality of pixel regions are defined, each pixel region including an emission region and a reflection region; Multiple pixels, including multiple light-emitting layers, the multiple light-emitting layers being disposed on the first substrate between multiple lower electrodes and upper electrodes; A second substrate is disposed on the light-emitting layer, wherein the second substrate has a side facing the first substrate, and the light-emitting layer is disposed between the second substrate and the first substrate; A touch-sensing pattern is located on one side of the second substrate, wherein the touch-sensing pattern is located between the first substrate and the second substrate; Multiple connecting lines are connected to the touch sensing pattern; and Sensing drive components, The touch sensing pattern is electrically connected to the sensing driving component. The touch sensing pattern and the connecting lines are made of metal. The touch sensing pattern and the connecting lines are on the same layer. Each of the touch sensing patterns is connected to the connecting line. The touch sensing pattern has a reflectivity for performing a mirror function, and some of the touch sensing pattern are disposed in the emitting region and the reflecting region.

22. An organic light-emitting display device, the organic light-emitting display device comprising: A substrate, which defines multiple pixel regions, each pixel region including an emission region and a reflection region; Multiple light-emitting layers are present on the substrate; A touch-sensing pattern is applied to the substrate. Multiple connecting lines are respectively connected to the touch sensing pattern; Sensing drive components; as well as A dummy pattern is placed between the touch-sensing patterns. The touch sensing pattern is electrically connected to the sensing driving component. The touch sensing pattern, the dummy pattern, and the connecting lines are formed of aluminum and titanium. The touch sensing pattern, the dummy pattern, and the connecting line are on the same layer. The touch sensing pattern is connected to the connecting line, and The touch sensing pattern and the dummy pattern have reflectivity for performing a mirror function, and some of the touch sensing pattern and some of the dummy patterns are disposed in the emission area and the reflection area.

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