Support unit and equipment for processing substrates
By designing support units for heating components, reflectors, and cooling plates in the substrate processing equipment, and combining them with inert gas supply and barrier structures, the problems of heat transfer, boiling of cooling fluid, and impurity entry are solved, thereby improving the stability and efficiency of the equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2021-11-19
- Publication Date
- 2026-05-26
AI Technical Summary
In existing substrate processing equipment, the heat radiated by the lamps is transferred to the rotary drive device, causing the temperature to rise, which may lead to drive device failure. The cooling fluid boils severely, and the processing liquid or impurities can easily enter the chuck. The power terminal temperature rises excessively.
A support unit is designed, including a heating element, a reflector, and a cooling plate. The reflector reflects heat energy and forms a cooling flow path in the cooling plate. An inert gas is supplied by a gas supply line. A blocking protrusion prevents impurities from entering. The rotation drive unit is separated from the heating element, and the power terminal is combined with the cooling plate to reduce the temperature.
It effectively reduces the heat transferred to the rotary drive unit, reduces the boiling phenomenon of the cooling fluid, reduces the risk of the processed liquid entering the chuck, avoids excessive temperature rise of the power terminal, and improves the stability and efficiency of the equipment.
Smart Images
Figure CN114520168B_ABST