Display substrate and preparation method thereof, display panel, and display device

CN114530462BActive Publication Date: 2025-04-15BOE TECHNOLOGY GROUP CO LTD +1
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Patent Information

Application Number
CN202210152147.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-02-18
Publication Date
2025-04-15
Estimated Expiration
2042-02-18

AI Technical Summary

Technical Problem

In the peripheral areas of the camera area, transparent electrode wiring is prone to disconnection or thinning.

Method used

A display substrate is designed, including a first area corresponding to the under-screen imaging device and a second area located around the first area. A substrate, a first source and drain layer, a first planar layer, a transparent electrode layer, and a photoresist layer are provided in the second region. By designing a flat layer groove structure in the first flat layer and ensuring that the orthogonal projection of the first source and drain layer overlaps at least partially with the metal structure, an electrode layer groove structure of a transparent electrode layer that is shaped with the flat layer groove structure is prepared. At the same time, the thickness of the photoresist layer is increased to ensure that its thickness is greater than the thickness of the photoresist reflected by the metal structure.

Benefits of technology

By increasing the thickness of the photoresist layer and designing a flat layer groove structure, the transparent electrode layer is protected, avoiding the problems of trace breakage and thinning, extending the service life of the transparent electrode trace, and ensuring its integrity and uniformity.

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Abstract

The present application provides a display substrate and a preparation method thereof, a display panel, and a display device, wherein the display substrate includes a first area corresponding to an under-screen camera device and a second area located around the first area, and the second area includes a substrate, a first source and drain electrode layer, a first flat layer, a transparent electrode layer, and a photoresist layer. The present application increases the thickness of the first photoresist structure of the photoresist layer at the groove structure of the electrode layer to ensure that the thickness of the first photoresist structure is greater than the thickness of the light reflected by the metal structure penetrating the photoresist. Since the thickness of the first photoresist structure is relatively thick, it will not be penetrated by the reflected light and will be retained after the subsequent development process. The retained first photoresist structure plays the role of a mask structure in the etching process of the transparent electrode layer, and can protect the transparent electrode layer below the retained first photoresist structure, thereby ensuring the integrity and uniformity of the transparent electrode wiring and extending the service life of the transparent electrode wiring.
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Citation Information

Patent Citations

  • Display panel, display device, array substrate and manufacturing method of array substrate

    CN106158883A

  • Display panel and display device

    CN110610968A