衬底表面的原位监测
By using an eddy current sensor system in the vacuum pretreatment module for in-situ measurement, the problem of electroplating defects caused by seed layer oxidation was solved, and real-time monitoring and quantitative evaluation of the thin-layer resistance of the seed layer were achieved, thus improving production efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- LAM RES CORP
- Filing Date
- 2020-09-29
- Publication Date
- 2026-07-17
AI Technical Summary
During substrate processing, oxidation of the seed layer alters surface wetting properties, leading to electroplating defects. This effect is particularly pronounced in high-tech nanoscale structures, and existing technologies struggle to quantitatively assess the performance of vacuum pretreatment modules in real time.
An eddy current sensor system is used for in-situ measurement, including a transmitter sensor and a receiver sensor. The thin-film resistance of the seed layer is evaluated by measuring the change of eddy current. The system is integrated next to the outbound loading lock of the vacuum pretreatment module to realize online thin-film resistance measurement.
It enables real-time monitoring and quantitative assessment of seed layer oxidation, reducing electroplating defects and improving production yield and equipment reliability.
Smart Images
Figure CN114556096B_ABST