Method of operating a multi-particle beam system upon changing the numerical aperture, associated computer program product and multi-particle beam system
By combining a multi-beam generator and a downstream electron beam optics unit, and by independently adjusting the numerical aperture and beam pitch using additional particle optics components, the problem of limited imaging resolution in multi-particle beam systems is solved, and higher imaging quality is achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CARL ZEISS MULTISEM GMBH
- Filing Date
- 2020-07-29
- Publication Date
- 2026-07-21
AI Technical Summary
Existing multi-beam systems have difficulty flexibly adjusting the numerical aperture without changing the beam pitch between the beams, resulting in limited imaging resolution.
By combining a multi-beam generator and a downstream electron beam optics unit, additional particle optics components such as electrostatic or magnetic field lenses can be used to independently adjust the numerical aperture and beam pitch in the intermediate image plane and object plane, avoiding the need to replace the multi-aperture plate.
It enables precise adjustment of numerical aperture without changing the beam pitch, thereby improving imaging resolution, optimizing aberrations of the imaging optics, and enhancing imaging performance.
Smart Images

Figure CN114600221B_ABST