摄像装置和电子设备

By setting a light-shielding film between the photoelectric conversion unit and the charge retention unit and optimizing the optical system, the light leakage problem was solved, the imaging performance of the camera device was improved and the noise was reduced, and higher imaging quality was achieved.

CN114600448BActive Publication Date: 2026-07-17SONY SEMICON SOLUTIONS CORP

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SONY SEMICON SOLUTIONS CORP
Filing Date
2020-12-05
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In existing global shutter mode camera devices, there is a light leakage problem in the horizontal light-shielding film between the photoelectric conversion unit and the charge retention unit, which leads to a decrease in imaging performance and an increase in noise.

Method used

A first light-shielding film is provided between the photoelectric conversion unit and the charge retention unit, and an opening is provided in part of it to ensure the signal charge transmission path. At the same time, the arrangement of the focusing optical system and the photoelectric conversion unit is optimized to reduce unnecessary light entering the charge retention unit.

Benefits of technology

It effectively reduces parasitic light sensitivity, improves imaging performance, reduces image noise, and enhances image quality.

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Abstract

提供一种能够实现更优成像性能的摄像装置。该摄像装置在沿第一表面延伸的有效像素区域中包括:聚光光学系统,其会聚入射光;光电转换单元,其能够通过光电转换产生电荷,所述电荷对应于通过所述聚光光学系统的所述入射光的量;电荷保持单元,其能够保持从所述光电转换单元传输的所述电荷;和第一遮光膜,其在与所述第一表面正交的厚度方向上设置在所述光电转换单元和所述电荷保持单元之间,并阻挡所述入射光。所述聚光光学系统将所述入射光会聚在所述有效像素区域中在所述厚度方向上与所述第一遮光膜重叠的位置。
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