干燥单元及包括干燥单元的基板处理装置
By using a drying unit inside the engineering cavity to emit ultraviolet light to remove moisture and gas, the problem of moisture and gas introduced by newly installed components is solved, improving the reliability and productivity of integrated circuits and display devices.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2021-11-12
- Publication Date
- 2026-07-17
AI Technical Summary
In the prior art, newly installed components in the engineering cavity will introduce moisture and unwanted gases after being exposed to the atmospheric environment, leading to poor engineering within the engineering cavity and affecting the reliability and productivity of integrated circuits and display devices.
A drying unit, including at least one light source and control components, is used to quickly and effectively remove moisture and unwanted gases by emitting ultraviolet light. The shape and size of the drying unit are matched with the engineering cavity, and it can replace the substrate position when loading or unloading the substrate. It uses deuterium gas in a transparent container to emit ultraviolet light in the wavelength range of 100nm to 400nm.
It can quickly and effectively remove moisture and gas without the need for additional drying equipment, preventing engineering defects in the engineering cavity and improving the reliability and productivity of integrated circuits and display devices.
Smart Images
Figure CN114639613B_ABST