Photomask assembly

Abstract

A photomask assembly is provided. The photomask assembly includes a transparent substrate, a first insulating layer on the transparent substrate and having a hydrophilic property, a first metal layer on the first insulating layer and having a first opening, a second insulating layer on the first metal layer and having a hydrophobic property, and a lens unit in the first opening.

Description

[0001] Cross-references to related applications

[0002] This application claims priority and benefit to Korean Patent Application No. 10-2020-0171344, filed with the Korean Intellectual Property Office on December 9, 2020, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This disclosure relates to photomask components. Background Technology

[0004] In the manufacturing process of display devices, photolithography is used to form signal wiring. In photolithography, a photomask assembly is used to transfer a desired pattern onto a substrate. As the linewidth of signal wiring decreases, the importance of using photomask assemblies in the photolithography process to achieve this (e.g., to form signal wiring) increases.

[0005] The information disclosed in this background section is provided only to enhance the understanding of the background of this disclosure, and therefore may contain information that does not form prior art. Summary of the Invention

[0006] Various aspects of embodiments of this disclosure relate to photomask assemblies capable of forming signal wiring with fine linewidths.

[0007] The photomask assembly according to the embodiment includes: a transparent substrate, a first insulating layer on the transparent substrate and having a hydrophilicity, a first metal layer on the first insulating layer and having a first opening, a second insulating layer on the first metal layer and having a hydrophobicity, and a lens unit in the first opening.

[0008] The photomask assembly may include a thin film overlapping a transparent substrate, and the lens unit may have a surface protruding toward the thin film.

[0009] The lens unit may include multiple sub-lens units in the first opening.

[0010] The photomask assembly may also include a polymer layer covering multiple sub-lens units.

[0011] Multiple sub-lens units may each differ from the polymer layer in terms of refractive index (e.g., multiple sub-lens units and the polymer layer may have different refractive indices from each other).

[0012] According to an embodiment, a photomask assembly includes: a transparent substrate, a first insulating layer on the transparent substrate, a first metal layer on the first insulating layer and having a first opening, a second insulating layer on the first metal layer and having a second opening, and a lens unit in the first opening and the second opening, wherein the lens unit includes two or more sub-lens units.

[0013] The photomask assembly may also include a polymer layer covering two or more sub-lens units.

[0014] The polymer layer may overlap with the first opening and the second opening.

[0015] The first insulating layer may be hydrophilic.

[0016] The first metal layer may include (for example) chromium (Cr) and / or molybdenum (Mo).

[0017] The second insulating layer may be hydrophobic.

[0018] Two or more sub-lens units may include (for example,) a first polymer having hydrophilicity.

[0019] The first polymer may include (e.g., a polyester-based compound). The polymer layer may include (e.g., a second polymer), and the polymer layer may differ in refractive index from each of the two or more sub-lens units (e.g., the polymer layer and the two or more sub-lens units may have different refractive indices from each other).

[0020] The photomask assembly may also include a thin film overlapping the transparent substrate.

[0021] The photomask assembly according to the embodiment includes: a transparent substrate, a first insulating layer on the transparent substrate, a first metal layer on the first insulating layer and having a first opening, a second insulating layer on the first metal layer and having a second opening, a lens unit in the first opening and the second opening, and a polymer layer covering the lens unit, wherein the lens unit is different from the polymer layer in terms of refractive index.

[0022] Each of the lens unit and the polymer layer may include, for example, a polyester-based compound.

[0023] The first insulating layer may be hydrophilic, and the second insulating layer may be hydrophobic.

[0024] The first insulating layer may include (for example) silicon oxide, and the second insulating layer may include (for example) silicon nitride.

[0025] The first metal layer may include (for example) chromium (Cr) and / or molybdenum (Mo).

[0026] According to the implementation method, the photomask assembly can easily manufacture display devices with fine linewidths. Attached Figure Description

[0027] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the present disclosure. The drawings, together with the specification, are used to better explain various aspects and principles of the present disclosure.

[0028] Figure 1 This is a cross-sectional view of a photomask assembly according to an embodiment.

[0029] Figure 2 and Figure 3 These are cross-sectional views of the photomask assembly according to the implementation method.

[0030] Figure 4A , Figure 5A , Figure 6A , Figure 7A , Figure 8A , Figure 9A , Figure 10A , Figure 11A , Figure 12A and Figure 13A These are 3D images of photomask components based on their manufacturing processes.

[0031] Figure 4B , Figure 5B , Figure 6B , Figure 7B , Figure 8B , Figure 9B , Figure 10B , Figure 11B , Figure 12B and Figure 13B These are cross-sectional views of the photomask assembly based on the manufacturing process.

[0032] Explanation of reference numerals in the attached figures

[0033] 11: Transparent substrate

[0034] 12: First insulating layer; 13: First metal layer

[0035] 14: Second insulating layer 15: Lens unit

[0036] 15a: Sub-lens unit; 15b: Polymer layer Detailed Implementation

[0037] In the following, the present disclosure will be described more fully with reference to the accompanying drawings, which illustrate embodiments of the present disclosure. As those skilled in the art will recognize, the described embodiments can be modified in various suitable and different ways without departing from the spirit or scope of the present disclosure.

[0038] To clearly explain this disclosure, parts not directly related to this disclosure may be omitted, and the same reference numerals may be used throughout the specification for the same or similar constituent elements.

[0039] Furthermore, for better understanding and convenience of description, the dimensions and thicknesses of each configuration shown in the accompanying drawings may be exaggerated or arbitrarily depicted, and this disclosure is not limited thereto. In the drawings, for clarity, the thicknesses of layers, films, panels, regions, etc., may be exaggerated. In the drawings, for better understanding and convenience of description, the thicknesses of some layers and regions may be exaggerated.

[0040] It will be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” another element, it can be directly on the other element, or one or more intervening elements may be present. Conversely, when an element is referred to as being “directly” on another element, there are no intervening elements. Furthermore, the words “on,” “above,” and similar phrasing can indicate a position on or below an object, and do not necessarily indicate a position on the upper side of the object based on the direction of gravity.

[0041] Furthermore, unless explicitly stated otherwise, the word “comprise” and variations such as “comprises” or “comprising” will be understood to imply inclusion of the stated element without excluding any other element.

[0042] In addition, in the specification, the phrase "in a plan view" may indicate a view from above and / or below the object, and the phrase "in a sectional view" may indicate a side view of a section taken by cutting the object vertically.

[0043] As used herein, the use of the term "may" when describing embodiments of this disclosure indicates "one or more embodiments of this disclosure." As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. As used herein, the terms "substantially," "about," "approximately," and similar terms are used as approximate terms rather than terms of degree and are intended to take into account the inherent biases of measurements or calculations that would be recognized by one of ordinary skill in the art.

[0044] In the following text, refer to Figure 1 A photomask assembly according to an embodiment is described. Figure 1 This is a cross-sectional view of a photomask assembly according to an embodiment.

[0045] The photomask assembly according to the embodiments may include a transparent substrate 11, a first insulating layer 12, a first metal layer 13, a second insulating layer 14, and a lens unit 15.

[0046] The transparent substrate 11 is able to transmit all incident light. The transparent substrate 11 may include, for example, a glass substrate made of quartz.

[0047] The first insulating layer 12 may be located on (e.g., cover) the surface (e.g., the entire surface) of the transparent substrate 11. The first insulating layer 12 may be hydrophilic. The first insulating layer 12 may include (e.g., be) any material that is hydrophilic, but this disclosure is not limited thereto. In some embodiments, as an example, the first insulating layer 12 may include (e.g., be) silicon oxide (e.g., silicon dioxide).

[0048] The first metal layer 13 may be a light-blocking pattern that blocks illumination light. For example, the first metal layer 13 may absorb and / or reflect incident light illuminating the first metal layer 13. The first metal layer 13 may include (for example,) chromium (Cr) and / or molybdenum (Mo). For example, the first metal layer 13 may include (for example,) chromium (Cr) or a chromium compound. As an example, the chromium compound may include (for example,) one or more selected from chromium nitride (CrN), chromium oxide (CrO), chromium carbide (CrC), chromium carbonate (CrCO), chromium carbonitride (CrCN), chromium nitride (CrON), chromium carbonitride (CrCON), chromium fluoride (CrF), chromium fluoride nitride (CrNF), chromium fluoride (CrOF), chromium carbonitride (CrCF), chromium carbonitride fluoride (CrCNF), chromium fluoride nitride (CrONF), and chromium carbonitride oxyfluoride (CrCONF).

[0049] The first metal layer 13 may have a pattern substantially the same as the transfer pattern. The first metal layer 13 has a first opening op13 for pattern removal.

[0050] The second insulating layer 14 may be located on the first metal layer 13. The second insulating layer 14 may be hydrophobic. The second insulating layer 14 may include (e.g.) any material that is hydrophobic, but this disclosure is not limited thereto. In some embodiments, as an example, the second insulating layer 14 may include (e.g.) a silicon nitride.

[0051] The second insulating layer 14 may have a substantially the same planar shape as the first metal layer 13 (e.g., the same shape in a plan view). The second insulating layer 14 may have a pattern substantially the same as the transfer pattern. The edges of the second insulating layer 14 may be aligned with the edges of the first metal layer 13. The second insulating layer 14 may have a second opening op14 aligned with the first opening op13. For example, in a plan view, the second opening op14 may overlap with the first opening op13. In some embodiments, the sidewalls of the second insulating layer 14 forming the second opening op14 may be aligned with the sidewalls of the first metal layer 13 forming the first opening op13.

[0052] Lens unit 15 may be located within the first opening op13 and the second opening op14. Lens unit 15 may focus or diffuse incident light (e.g., incident light). Lens unit 15 may have a convex lens shape. For example, the surface of lens unit 15 (e.g., the surface of lens unit 15 facing away from transparent substrate 11) may protrude away from transparent substrate 11 and / or toward thin film layer 21. The lens shape (shape of lens unit 15) is not limited thereto, and the lens shape may be any suitable lens shape that is generally available or obvious to those skilled in the art, such as a concave lens shape or an aspherical lens shape.

[0053] For example, the lens unit 15 may be manufactured using (e.g., inkjet printing and / or screen printing processes).

[0054] Because lens unit 15 has a convex lens shape, light passing through lens unit 15 can be concentrated into a predetermined area. Accordingly, the exposure area A' reached by light transmitted through lens unit 15 from the photoresist layer can be smaller than the exposure area A reached by light transmitted through transparent substrate 11 from the photoresist layer without lens unit 15. For example, exposure area A' can indicate the area (e.g., a planar area) where light transmitted through the photomask assembly including lens unit 15 is incident on a surface (e.g., the surface of the substrate where wiring (e.g., signal wiring) will be formed), and exposure area A can indicate the area (e.g., a planar area) where light transmitted through the photomask assembly without lens unit 15 is incident on a surface. Accordingly, exposure area A can substantially correspond to the planar areas of the first opening op 13 and the second opening op 14. The size of exposure area A' can be adjusted by adjusting the curvature and / or radius of curvature of the convex lens of lens unit 15. This can be applied even when lens unit 15 has different lens shapes. For example, even when the lens shape of the lens unit 15 is other than a convex lens shape, the size of the exposure area A' can be adjusted by adjusting the curvature of the lens unit 15. The lens unit 15 can easily adjust the width of the signal wiring formed on the substrate, and it is possible to easily achieve fine lines and fine patterns through the lens unit 15.

[0055] Lens unit 15 may include, for example, a material with high transmittance. For example, lens unit 15 may include, for example, a polymer-based material. The polymer-based material is appropriately selected and utilizes, for example, acryloyl polymers, silicone polymers, polyesters, polyurethanes, polyamides, polyethylene ethers, vinyl acetate and / or vinyl chloride copolymers, modified polyolefins, epoxy polymers, fluoropolymers, natural rubber, rubber-based polymers such as synthetic rubber, etc., as the base polymer. In some embodiments, lens unit 15 may include, for example, one or more of the materials listed above.

[0056] The photomask assembly according to the embodiment may further include a thin film layer 21 overlapping the transparent substrate 11. The thin film layer 21 can protect the stacked structure on the transparent substrate 11 from external contamination materials such as dust and / or resist during the photolithography process. The thin film layer 21 may have high light transmittance, excellent heat dissipation characteristics, strength, durability and / or stability.

[0057] In some embodiments, a protective layer for protecting the thin film layer 21, an adhesive layer for bonding the thin film layer 21 and the transparent substrate 11, and / or similar materials may also be included.

[0058] Next, refer to Figure 2 and Figure 3 A photomask assembly according to an embodiment is described. Figure 2 and Figure 3 These are cross-sectional views of the photomask assembly according to the embodiment. Descriptions of constituent elements identical to those described above may not be provided.

[0059] Reference Figure 2 According to the embodiment, the lens unit 15 may include a plurality of sub-lens units 15a. Two or more sub-lens units 15a may be arranged within the first opening op13 and the second opening op14.

[0060] Each of the plurality of sub-lens units 15a may have a convex lens shape, and thus, light passing through the sub-lens unit 15a can be concentrated onto a predetermined area. The size of the exposure area of ​​the irradiated light can be controlled by adjusting the curvature or radius of curvature of the convex lens shape of the sub-lens unit 15a. The width of the signal wiring formed on the substrate can be easily adjusted by the sub-lens unit 15a, and fine lines and fine patterns can be easily realized by the sub-lens unit 15a.

[0061] Reference Figure 3The photomask assembly according to the embodiments may further include a polymer layer 15b covering a plurality of sub-lens units 15a. The polymer layer 15b may be disposed inside the edges of the first opening op 13 and the second opening op 14. In some embodiments, the polymer layer 15b may cover the side of the sub-lens unit 15a facing away from the transparent substrate 11, and the polymer layer 15b may fill the gap or space between the sub-lens unit 15a and the sidewall of the first metal layer 13 forming the first opening op 13 and / or the sidewall of the second insulating layer 14 forming the second opening op 14.

[0062] According to an embodiment, the sub-lens unit 15a may include (e.g., a first polymer), and the polymer layer 15b may include (e.g., a second polymer). The first polymer and the second polymer may have different refractive indices. Accordingly, as... Figure 3 As shown, the illumination light can be focused along a parallel path using a combination of two convex lenses. This reduces diffraction of the illumination light. When using (e.g., employing) a photomask assembly according to an embodiment, the illumination light can be easily adjusted to have the width of the signal wiring required for the manufacturing process. In some embodiments, the first polymer may be hydrophilic.

[0063] Next, refer to Figures 4A to 13B A method for manufacturing a photomask assembly according to an embodiment is described. Figure 4A , Figure 5A , Figure 6A , Figure 7A , Figure 8A , Figure 9A , Figure 10A , Figure 11A , Figure 12A and Figure 13A These are three-dimensional images of photomask components based on manufacturing processes, and Figure 4B , Figure 5B , Figure 6B , Figure 7B , Figure 8B , Figure 9B , Figure 10B , Figure 11B , Figure 12B and Figure 13B These are cross-sectional views of the photomask assembly based on the manufacturing process.

[0064] First, refer to Figure 4A and Figure 4B A transparent substrate 11 is prepared. The transparent substrate 11 may include (e.g., a) a glass substrate made of quartz. The transparent substrate 11 is able to transmit all (e.g., substantially all) incident light.

[0065] Next, refer to Figure 5A and Figure 5B A first insulating material layer 12a is formed that overlaps with the surface (e.g., the entire surface) of the transparent substrate 11. As an example, the first insulating material layer 12a can be formed using a chemical vapor deposition method. The first insulating material layer 12a may be hydrophilic. The first insulating material layer 12a may comprise any material that is hydrophilic. In some embodiments, as an example, the first insulating layer 12a may comprise silicon oxide (e.g., silicon dioxide).

[0066] Next, as Figure 6A and Figure 6B As shown, a first metallic material layer 13a is formed on the first insulating material layer 12a, overlapping the surface (e.g., the entire surface) of the transparent substrate 11. The first metallic material layer 13a may include (e.g., any metal that blocks light), and may include, for example, chromium and / or molybdenum.

[0067] like Figure 7A and Figure 7B As shown, a second insulating material layer 14a is formed on the first metallic material layer 13a. As an example, the second insulating material layer 14a can be formed using a chemical vapor deposition method. The second insulating material layer 14a can overlap the surface (e.g., the entire surface) of the transparent substrate 11. The second insulating layer 14a can be hydrophobic. The second insulating layer 14a can include any material that is hydrophobic. In some embodiments, as an example, the second insulating layer 14a can include, for example, silicon nitride.

[0068] Next, as Figure 8A and Figure 8B As shown, the photoresist layer PR is formed on the second insulating material layer 14a to cover the surface (e.g., the entire surface) of the transparent substrate 11.

[0069] Next, as Figure 9A and Figure 9B As shown, a mask can be used (e.g., to form a first region PR-a (e.g., a first region of the photoresist layer PR) that is photocured (e.g., cured by light irradiation) and an uncured second region PR-b (e.g., a second region of the photoresist layer PR). For example, in some embodiments, when light is irradiated onto the first region PR-a to cure it, the mask overlaps with the second region PR-b in a plan view to prevent light from irradiating the second region PR-b. Subsequently, the second region PR-b is removed by a development process, and as... Figure 10A and Figure 10BAs shown, a photoresist pattern PR-c is formed. The photoresist pattern PR-c can expose a portion of the second insulating material layer 14a.

[0070] Next, as Figure 11A and Figure 11B As shown, the second insulating layer 14 and the first metal layer 13 are formed by using (e.g., using) a photoresist pattern PR-c as a mask. The second insulating layer 14 can be formed by etching the second insulating material layer 14a, and the first metal layer 13 can be formed by etching the first metal material layer 13a. The first insulating layer 12 can be formed to overlap the surface (e.g., the entire surface) of the transparent substrate 11 without separate etching. Next, as... Figure 12A and Figure 12B As shown, the photoresist pattern PR-c is removed.

[0071] Then, as Figure 13A and Figure 13B As shown, a lens unit 15 can be formed in a first opening op13 in the first metal layer 13 and a second opening op14 in the second insulating layer 14. As an example, the lens unit 15 can be manufactured using (for example, inkjet printing) and / or screen printing processes.

[0072] Because the second insulating layer 14 is hydrophobic, the lens unit 15 can be easily arranged within the first opening op 13 and the second opening op 14. Next, a thin film layer 21 can be added to provide... Figure 1 The photomask component shown.

[0073] By utilizing (e.g., using) a similar method, a plurality of sub-lens units 15a can be formed in the first opening op13 in the first metal layer 13 and the second opening op14 in the second insulating layer 14, thereby providing, as Figure 2 The photomask component shown.

[0074] Multiple sub-lens units 15a can be formed by performing multiple processes of injecting and curing a first polymer. Furthermore, a polymer layer 15b disposed on the multiple sub-lens units 15a can also be formed, thereby providing, for example... Figure 3 The photomask component shown.

[0075] The photomask assembly according to the embodiment can easily adjust the width of the signal wiring formed on the substrate, and accordingly, it is possible to easily realize fine lines and fine patterns.

[0076] Although this disclosure has been described in conjunction with some embodiments, it will be understood that this disclosure is not limited to the disclosed embodiments. Rather, this disclosure is intended to cover various suitable modifications and equivalent arrangements included within the spirit and scope of the appended claims and their equivalents.

Claims

1. A photomask assembly, comprising: Transparent substrate; A first insulating layer is provided on the transparent substrate and is hydrophilic. A first metal layer, which is on the first insulating layer and has a first opening; A second insulating layer is on the first metal layer and is hydrophobic; A lens unit is located in the first opening; as well as A polymer layer is provided on the lens unit.

2. The photomask assembly according to claim 1, further comprising a thin film overlapping the transparent substrate. in, The lens unit has a surface that protrudes toward the thin film.

3. The photomask assembly according to claim 1, wherein, The lens unit includes a plurality of sub-lens units in the first opening.

4. The photomask assembly according to claim 3, wherein, The polymer layer covers the plurality of sub-lens units.

5. The photomask assembly according to claim 4, wherein, Each of the plurality of sub-lens units differs from the polymer layer in terms of refractive index.

6. A photomask assembly, comprising: Transparent substrate; A first insulating layer is provided on the transparent substrate; A first metal layer, which is on the first insulating layer and has a first opening; A second insulating layer is on the first metal layer and has a second opening; Lens unit, the lens unit being located in the first opening and the second opening; as well as A polymer layer is provided on the lens unit. The lens unit includes two or more sub-lens units.

7. The photomask assembly according to claim 6, wherein, The polymer layer covers the two or more sub-lens units.

8. The photomask assembly according to claim 7, wherein, The polymer layer overlaps with the first opening and the second opening.

9. The photomask assembly according to claim 6, wherein, The first insulating layer is hydrophilic, and the first metal layer comprises chromium and / or molybdenum. The second insulating layer is hydrophobic.

10. The photomask assembly according to claim 7, wherein, The two or more sub-lens units comprise a first polymer that is hydrophilic.

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