Display device and method for manufacturing the same

Abstract

An embodiment of the present invention discloses a display device and a manufacturing method thereof. In a specific embodiment, the display device includes: a display panel and a lens array disposed on the light-emitting side of the display panel. The display panel includes a substrate and first sub-pixels, second sub-pixels, and third sub-pixels arranged in an array on the substrate. The lens array includes a first lens corresponding to each first sub-pixel, a second lens corresponding to each second sub-pixel, and a third lens corresponding to each third sub-pixel; the first, second, and third lenses are plano-convex lenses respectively; in a direction perpendicular to the substrate, the minimum distances between the first, second, and third lenses and the display panel are the first, second, and third distances respectively; the first distance, the second distance, and the third distance are different from each other. This embodiment can enable the lens array to achieve a uniform gain effect on light of different wavelength bands emitted by the display panel.

Description

Technical Field

[0001] The present invention relates to the field of display technology. More specifically, it relates to a display device and a manufacturing method thereof. Background Art

[0002] Currently, in display devices such as Micro OLED that are provided with lenses, display color deviation often occurs. For example, the display screen of the display device is bluish or reddish. Summary of the Invention

[0003] The purpose of the present invention is to provide a display device and a manufacturing method thereof to solve at least one of the problems existing in the prior art.

[0004] To achieve the above purpose, the present invention adopts the following technical solutions:

[0005] In a first aspect of the present invention, a display device is provided, including a display panel and a lens array disposed on the light-emitting side of the display panel. The display panel includes a substrate and first sub-pixels, second sub-pixels, and third sub-pixels arranged in an array on the substrate. The lens array includes a first lens corresponding to each first sub-pixel, a second lens corresponding to each second sub-pixel, and a third lens corresponding to each third sub-pixel;

[0006] The first lens, the second lens, and the third lens are respectively plano-convex lenses; in a direction perpendicular to the substrate, the minimum distance between the first lens and the display panel is a first distance, the minimum distance between the second lens and the display panel is a second distance, and the minimum distance between the third lens and the display panel is a third distance; the first distance, the second distance, and the third distance are different from each other.

[0007] Optionally, in a direction perpendicular to the substrate, the maximum distance between the surface of the first lens away from the display panel and the display panel is a fourth distance, the maximum distance between the surface of the second lens away from the display panel and the display panel is a fifth distance, and the maximum distance between the surface of the third lens away from the display panel and the display panel is a sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same.

[0008] Optionally, the display device further includes a substrate layer on the light-emitting side of the display panel. The lens array is formed in the substrate layer. The curved surface of the first lens is closer to the display panel than the plane of the first lens, the curved surface of the second lens is closer to the display panel than the plane of the second lens, and the curved surface of the third lens is closer to the display panel than the plane of the third lens.

[0009] Optionally, the substrate layer exposes the planes of the first lens, the second lens, and the third lens respectively.

[0010] Optionally, the first sub-pixel is a red sub-pixel, the second sub-pixel is a green sub-pixel, and the third sub-pixel is a blue sub-pixel; the refractive indices of the first lens, the second lens, and the third lens are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer is less than the refractive index of the first lens.

[0011] Optionally, the first distance is greater than the second distance, and the second distance is greater than the third distance.

[0012] Optionally, the material of the substrate layer is an isotropic material.

[0013] Optionally, the materials of the first lens, the second lens, and the third lens are the same, and are each one or any combination of silicon nitride, silicon oxide, and silicon oxynitride.

[0014] A second aspect of the present invention provides a method for manufacturing a display device, including:

[0015] Providing a display panel, the display panel including a substrate and first sub-pixels, second sub-pixels, and third sub-pixels arranged in an array on the substrate;

[0016] Forming a lens array on the light-emitting side of the display panel, the lens array including a first lens corresponding to each first sub-pixel, a second lens corresponding to each second sub-pixel, and a third lens corresponding to each third sub-pixel; the first lens, the second lens, and the third lens are plano-convex lenses respectively; in a direction perpendicular to the substrate, the minimum distance between the first lens and the display panel is a first distance, the minimum distance between the second lens and the display panel is a second distance, and the minimum distance between the third lens and the display panel is a third distance; the first distance, the second distance, and the third distance are different from each other.

[0017] Optionally, the forming a lens array on the light-emitting side of the display panel includes:

[0018] Forming a substrate layer on the light-emitting side of the display panel;

[0019] Forming a lens array in the substrate layer, wherein the curved surface of the first lens is closer to the display panel than the plane of the first lens, the curved surface of the second lens is closer to the display panel than the plane of the second lens, and the curved surface of the third lens is closer to the display panel than the plane of the third lens.

[0020] Optionally, the first sub-pixel is a red sub-pixel, the second sub-pixel is a green sub-pixel, and the third sub-pixel is a blue sub-pixel; the refractive index of the first lens, the refractive index of the second lens, and the refractive index of the third lens are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer is less than the refractive index of the first lens.

[0021] Optionally, in the direction perpendicular to the substrate, the distance between the plane of the first lens and the display panel is a fourth distance, the distance between the plane of the second lens and the display panel is a fifth distance, and the distance between the plane of the third lens and the display panel is a sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same.

[0022] Optionally, the method further includes:

[0023] Designing to obtain the minimum distance between the first lens and the display panel, the minimum distance between the second lens and the display panel, and the minimum distance between the third lens and the display panel in the direction perpendicular to the substrate, including:

[0024] Setting the minimum distance between the third lens and the display panel to be L 3 , and calculating the distance H between the third lens and the light-emitting layer in the display panel 3 = L 3 + H 0 , where H 0 is the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer of the display panel;

[0025] Substituting the distance H between the third lens and the light-emitting layer in the display panel 3 into the formula H 3 = n 0,B * r 3 / (n B - n 0,B ) to obtain the arch height r of the third lens 3 , where n 0,B is the refractive index of the substrate layer corresponding to the blue light band, and n B is the refractive index of the third lens corresponding to the blue light band;

[0026] According to the distance H between the third lens and the light-emitting layer in the display panel 3 and the arch height r of the third lens 3 to obtain the distance T between the plane of the third lens and the light-emitting layer in the display panel = H 3 + r 3 ;

[0027] Substituting the distance T between the plane of the third lens and the light-emitting layer in the display panel into the formula r respectively1 = T * (1 - n 0,R / n R ) and r 2 = T * (1 - n 0,G / n G ) to obtain the sag r of the first lens 1 and the sag r of the second lens 2 , where n 0,R is the refractive index of the substrate layer corresponding to the red light band, n 0,G is the refractive index of the substrate layer corresponding to the green light band, n R is the refractive index of the first lens corresponding to the red light band, n G is the refractive index of the second lens corresponding to the green light band;

[0028] According to the sum H of the film layer thicknesses on the light-emitting side of the light-emitting layer of the display panel 0 , the distance T between the plane of the third lens and the light-emitting layer in the display panel, the sag r of the first lens 1 and the sag r of the second lens 2 , obtain the minimum distance L between the first lens and the display panel 1 = T - r 1 - H 0 , and the minimum distance L between the second lens and the display panel 2 = T - r 2 - H 0 .

[0029] Optionally, the minimum distance L between the third lens and the display panel 3 has a value of 0.35 μm - 0.4 μm.

[0030] Optionally, the thickness of the substrate layer is T - H 0 .

[0031] Optionally, forming the lens array in the substrate layer includes:

[0032] Patternwise forming first openings corresponding to each first sub-pixel, which match the sag r of the first lens 1 and have a plano-convex lens shape, second openings corresponding to each second sub-pixel, which match the sag r of the second lens 2 and have a plano-convex lens shape, and third openings corresponding to each third sub-pixel, which match the sag r of the third lens 3 and have a plano-convex lens shape, on the side of the substrate layer away from the display panel in sequence;

[0033] Deposit a lens material layer on the side of the substrate layer away from the display panel, and perform an etching process on the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel.

[0034] Optionally, the material of the substrate layer is an isotropic material.

[0035] Pattern the side of the substrate layer away from the display panel to form an arch height r that matches the first lens. 1 And the plano-convex lens-shaped first openings corresponding to each first sub-pixel include:

[0036] Coat a first photoresist layer with a thickness that matches the arch height r of the first lens on the side of the substrate layer away from the display panel. 1 of the first photoresist layer;

[0037] Pattern the positions of the first photoresist layer corresponding to each first sub-pixel to form fourth openings that expose the substrate layer and match the planar dimensions corresponding to the shape of the plano-convex lens.

[0038] Perform an isotropic dry etching process to obtain the arch height r of the substrate layer that matches the first lens. 1 And the plano-convex lens-shaped first openings corresponding to each first sub-pixel;

[0039] Pattern the side of the substrate layer away from the display panel to form an arch height r that matches the second lens. 2 And the plano-convex lens-shaped second openings corresponding to each second sub-pixel include:

[0040] Coat a second photoresist layer with a thickness that matches the arch height r of the second lens on the side of the substrate layer away from the display panel. 2 of the second photoresist layer;

[0041] Pattern the positions of the second photoresist layer corresponding to each second sub-pixel to form fifth openings that expose the substrate layer and match the planar dimensions corresponding to the shape of the plano-convex lens.

[0042] Perform an isotropic dry etching process to obtain the arch height r of the substrate layer that matches the second lens. 2 And the plano-convex lens-shaped second openings corresponding to each second sub-pixel;

[0043] Pattern the side of the substrate layer away from the display panel to form an arch height r that matches the third lens. 3 And the plano-convex lens-shaped third openings corresponding to each third sub-pixel include:

[0044] Coat a third photoresist layer with a thickness that matches the arch height r of the third lens on the side of the substrate layer away from the display panel.3 The third photoresist layer;

[0045] At the positions corresponding to each of the third sub-pixels in the third photoresist layer, a sixth opening is patterned to expose the substrate layer and match the planar dimension corresponding to the shape of the plano-convex lens.

[0046] An isotropic dry etching process is performed to obtain the arch height r of the third lens matching the substrate layer 3 And the third opening corresponding to each of the third sub-pixels in the shape of a plano-convex lens.

[0047] Optionally, depositing a lens material layer on the side of the substrate layer away from the display panel, and performing an etching process on the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel, including:

[0048] Depositing a lens material layer on the side of the substrate layer away from the display panel;

[0049] Coating a fourth photoresist layer to planarize the lens material layer;

[0050] Performing a dry etching process on the fourth photoresist layer and the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel.

[0051] Optionally, the material of the lens material layer is one or any combination of silicon nitride, silicon oxide, and silicon oxynitride.

[0052] The beneficial effects of the present invention are as follows:

[0053] In the technical solution of the present invention, by setting the lenses corresponding to the sub-pixels that emit light of different wavelength bands at different placement heights, the lens array can achieve a uniform gain effect or a uniform improvement for the light of different wavelength bands emitted by the display panel. For example, a maximum gain effect can be achieved for the light of different wavelength bands emitted by the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0054] The following further describes in detail the specific embodiments of the present invention with reference to the accompanying drawings.

[0055] Figure 1 Showing a cross-sectional schematic diagram of an OLED display device provided by an embodiment of the present invention.

[0056] Figure 2 Showing a refractive index curve diagram of the first lens, the second lens, and the third lens made of silicon nitride material.

[0057] Figure 3 Schematic flow chart showing a method for manufacturing an OLED display device provided by an embodiment of the present invention.

[0058] Figures 4 - 13 Cross-sectional schematic diagrams corresponding to each stage in the manufacturing process of the OLED display device provided by an embodiment of the present invention. Detailed implementation manners

[0059] In the present invention, the terms "on...", "formed on...", and "disposed on..." may mean that one layer is directly formed or disposed on another layer, or may also mean that one layer is indirectly formed or disposed on another layer, that is, there are other layers between the two layers.

[0060] It should be noted that although terms such as "first", "second", etc. may be used herein to describe various components, members, elements, regions, layers, and / or parts, these components, members, elements, regions, layers, and / or parts should not be limited by these terms. Instead, these terms are used to distinguish one component, member, element, region, layer, and / or part from another. Thus, for example, the first component, first member, first element, first region, first layer, and / or first part discussed below may be referred to as the second component, second member, second element, second region, second layer, and / or second part without departing from the teachings of the present invention.

[0061] In the present invention, unless otherwise specified, the term "co-layer setting" means that two layers, components, members, elements, or parts can be formed by the same preparation process (such as a patterning process, etc.), and generally, these two layers, components, members, elements, or parts are formed of the same material. For example, the co-layer setting of two or more functional layers means that these co-layered functional layers can be formed using the same material layer and the same preparation process, thereby simplifying the preparation process of the display substrate.

[0062] In the present invention, unless otherwise specified, the expression "patterning process" generally includes steps such as coating of photoresist, exposure, development, etching, stripping of photoresist, etc. The expression "one patterning process" means a process of forming a patterned layer, component, member, etc. using one mask.

[0063] Currently, in display devices such as Micro OLEDs provided with lenses, display color deviation usually occurs, for example, the display screen of the display device is bluish or reddish. The inventor found that the reason is:

[0064] On the one hand, the refractive indices of the lenses in existing RGB trichromatic display devices for lights of different wavelengths are different, and the refractive index of the lens affects the focal length of the lens (the larger the refractive index, the smaller the focal length). Therefore, the focal length f of the lens corresponding to the red sub-pixel 1The focal length f of the lens corresponding to the green sub-pixel 2 and the focal length f of the lens corresponding to the blue sub-pixel 3 are different from each other, that is, f 1 ≠f 2 ≠f 3 .

[0065] On the other hand, currently, the general optical design principle in the display industry holds that when the relationship between the placement height H of the lens (the placement height is the distance between the lens and the light-emitting device of the display panel (such as the light-emitting layer of the OLED display panel)) and the focal length f of the lens is H / f = 1 (that is, the placement height value of the lens is equal to the focal length value of the lens), the light output gain effect of the lens will reach the maximum.

[0066] Based on the current design and manufacturing process, the lenses in the display device are set to have a unified refractive index (the refractive index of each lens itself is different in each wavelength band. For example, the refractive index n m，R corresponding to the red light band of the m-th lens is different from the refractive index n m，G corresponding to the green light; but the refractive indices of each lens in each wavelength band are the same. For example, the refractive indices n 1，R of the 1st to M-th lenses corresponding to the red light band 2，R = n M，R , that is, the refractive index curves of each lens are the same) and the placement height H. For the red light, green light, and blue light with three different wavelengths respectively emitted by the red sub-pixel, green sub-pixel, and blue sub-pixel of the display device, due to the different values of H / f, the gain effect of the lens on some wavelengths of light will be greater than that on other wavelengths of light, which results in color deviation in the display of the display device. For example, the display screen of the display device is bluish or reddish.

[0067] In view of this, an embodiment of the present invention provides an OLED display device, as Figure 1 shown, the OLED display device includes a display panel 100 and a lens array disposed on the light output side of the display panel 100.

[0068] Among them,

[0069] the display panel 100 includes a substrate 101 and red sub-pixels, green sub-pixels, and blue sub-pixels arranged in an array on the substrate 101.

[0070] In a specific example, the display panel 100 includes a substrate 101 and a barrier layer, a buffer layer, a driving circuit layer (or a thin film transistor layer), a planarization layer, a light-emitting device layer, a packaging layer 106, and a color filter layer 107 formed in sequence on the substrate 101. The following briefly introduces each film layer of the display panel 100 and its manufacturing method. Among them, it should be noted that Figure 1 ​Figure 1 Only the parts of these film layers that facilitate the manifestation of sub-pixels are shown.

[0071] For the substrate 101, it can be a silicon-based substrate such as silicon nitride (SiN x ).

[0072] For the barrier layer and the buffer layer, for example, the barrier layer and the buffer layer can be formed over the entire surface of the substrate. For example, the barrier layer can be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride, and the buffer layer can also be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride. The barrier layer is beneficial for blocking water and oxygen from entering the subsequent formed film layers from the bottom. The buffer layer is beneficial for the quality of subsequent material deposition.

[0073] For the driving circuit layer, a patterning process can be used to form an active layer on the buffer layer; a gate insulating layer can be formed on the active layer by deposition or the like; a gate electrode can be formed on the gate insulating layer by a patterning process; an interlayer dielectric layer can be formed on the gate electrode by deposition or the like; then, the interlayer dielectric layer is etched to form a via hole exposing the active layer. After the via hole in the interlayer dielectric layer is formed, a source electrode, a drain electrode, and a signal line electrically connected to one of the source electrode or the drain electrode are formed. Among them, the active layer can be made of materials such as polysilicon and metal oxides, the gate insulating layer can be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride, and the interlayer dielectric layer can be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride. The gate electrode material includes metals or alloy materials such as aluminum, titanium, and cobalt. During manufacturing, first, a layer of gate electrode material layer is formed by sputtering or evaporation or the like, and then a patterning process is performed on the gate electrode material layer to form a patterned gate electrode. Those skilled in the art can understand that the above thin-film transistor takes the top-gate structure as an example, but the present invention is not limited thereto, and the bottom-gate structure is also included within the scope of the present invention.

[0074] For the planarization layer, a layer of planarization layer material, such as an organic material, with a thickness of about 1 μm - 3 μm, can be deposited to cover the driving circuit layer, and then, using a patterning process, it is patterned to form an opening at the position corresponding to the other one of the above source electrode and drain electrode (the source electrode in the figure).

[0075] For the light-emitting device layer, the anode layer metal of the OLED can be first deposited in the opening of the planarization layer and patterned to form the anode 102 (the anode 102 is connected to the source electrode). Among them, by way of example, the material of the anode 102 includes metal oxides such as ITO and IZO, or metals such as Ag, Al, and Mo, or their alloys. Then, the pixel defining layer 103 surrounding the anode 102 can be formed by a patterning process. Specifically, a layer of pixel defining layer material is deposited, for example, about 1 μm - 2 μm thick, and the pixel defining layer 103 is formed by a patterning process. By way of example, the material of the pixel defining layer 103 can include organic insulating materials such as negative photoresist, polyimide, and epoxy resin. Then, the light-emitting layer 104 covering the anode 102, the pixel defining layer 103, and the exposed planarization layer is formed by printing or evaporation, etc., where the material of the light-emitting layer is an organic material; finally, the cathode 105 is formed. The cathode 105 is formed, for example, over the entire surface, and the material of the cathode 105 can include metals such as Mg, Ca, Li, or Al, or their alloys, or metal oxides such as IZO and ZTO, or organic materials with conductive properties such as PEDOT / PSS (poly(3,4-ethylenedioxythiophene) / polystyrene sulfonate). Among them, the anodes corresponding to each sub-pixel are isolated from each other, while the cathodes corresponding to each sub-pixel are connected to each other. An auxiliary light-emitting layer that helps the light-emitting layer 104 emit light can also be formed between the anode 102 and the light-emitting layer 104, and between the light-emitting layer 104 and the cathode 105, for example, including one or more of an electron transport layer, an electron injection layer, a hole transport layer, and a hole injection layer. The auxiliary light-emitting layer is, for example, an organic material layer.

[0076] For the encapsulation layer 106, after the light-emitting device layer is formed, the encapsulation layer 106 can be formed. For example, the encapsulation layer 106 can include a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. For example, the first inorganic encapsulation layer and the second inorganic encapsulation layer are formed by deposition or the like. The organic encapsulation layer is formed by inkjet printing. For example, the first inorganic encapsulation layer and the second inorganic encapsulation layer can be formed of inorganic materials such as silicon nitride, silicon oxide, and silicon oxynitride, and the organic encapsulation layer can be formed of organic materials such as polyimide (PI) and epoxy resin. Thus, the first inorganic encapsulation layer, the organic encapsulation layer, and the second inorganic encapsulation layer are formed into a composite encapsulation layer, and the composite encapsulation layer can provide multiple protections for the functional structures in the display area and has a better encapsulation effect.

[0077] For the color filter layer 107, its black matrix 1071, and a plurality of filter layers 1072 defined by the black matrix 1071 and corresponding one-to-one to the anodes 102 arranged in an array. For example, the light-emitting layer corresponding to the anode 102 emits white light, and the filter layers 1072 in the color filter layer 107 are used to form colored light from the incident white light. The filter layers 1072 in the color filter layer 107 generally include a red light filter layer, a green light filter layer, and a blue light filter layer, for example Figure 1As shown, from left to right are the red light filter layer, the green light filter layer, and the blue light filter layer. White light is incident on the color film layer 107, and after RGB filtering, RGB monochromatic light is formed, realizing the color display function of the OLED display panel. In practical applications, in order to avoid interference between adjacent filter layers 1072, that is, to avoid interference between different monochromatic lights, a black matrix (BM) 1071 is provided between adjacent filter layers 1072 in the color film layer 107. Intuitively, the projection area of a filter layer 1072 in the direction perpendicular to the substrate 101 is a sub-pixel area of the display panel 100.

[0078] In addition, for the display panel 100, other necessary functional film layers can also be formed, such as storage capacitors, etc. These film layers can be formed by conventional methods and will not be elaborated here.

[0079] The following introduces the structure of the lens array.

[0080] The lens array includes a first lens 201 corresponding to each red sub-pixel, a second lens 202 corresponding to each green sub-pixel, and a third lens 203 corresponding to each blue sub-pixel; among them, taking the correspondence between the first lens 201 and the red sub-pixel as an example, this correspondence means that the orthographic projection of the first lens 201 on the substrate 101 overlaps with the orthographic projection of the red sub-pixel on the substrate 101, and further, the orthographic projection of the red sub-pixel on the substrate 101 covers the orthographic projection of the first lens 201 on the substrate 101.

[0081] Among them, the first lens 201, the second lens 202, and the third lens 203 are respectively plano-convex lenses; in the direction perpendicular to the substrate 101, the minimum distance between the first lens 201 and the display panel 100 is the first distance L 1 , the minimum distance between the second lens 202 and the display panel 100 is the second distance L 2 , the minimum distance between the third lens 203 and the display panel is the third distance L 3 ; the first distance L 1 , the second distance L 2 and the third distance L 3 are different from each other, that is, L 1 ≠ L 2 ≠ L 3 .

[0082] Furthermore, let the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer 104 of the display panel 100 (that is, the sum of the thicknesses of the cathode 105, the encapsulation layer 106, and the color film layer 107) be H 0 , it can be understood that the sum of the film layer thicknesses H on the light-emitting side of the light-emitting layer 104 of the display panel 100 0is uniform, that is, for the red sub-pixels, green sub-pixels, and blue sub-pixels, the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer 104 of the display panel 100 is the same, all being H 0 . Then, due to the first distance L 1 , the second distance L 2 , and the third distance L 3 being different from each other respectively, in the direction perpendicular to the substrate 101, the minimum distance between the first lens 201 and the light-emitting layer 104 (i.e., the placement height of the first lens 201) H 1 (H 1 = L 1 + H 0 ), the minimum distance between the second lens 202 and the light-emitting layer 104 (i.e., the placement height of the second lens 202) H 2 (H 2 = L 2 + H 0 ), and the minimum distance between the third lens 203 and the light-emitting layer 104 (i.e., the placement height of the third lens 203) H 3 (H 3 = L 3 + H 0 ) are also different from each other respectively, that is, H 1 ≠ H 2 ≠ H 3 .

[0083] Thus, in the OLED display device provided in this embodiment, by setting the first lens corresponding to the red sub-pixels that emit red light, the second lens corresponding to the green sub-pixels that emit green light, and the third lens corresponding to the blue sub-pixels that emit blue light to different placement heights, the lens array can achieve a uniform gain effect or a uniform enhancement for the red light, green light, and blue light emitted by the display panel 100. For example, a maximum gain effect corresponding to H / f = 1 (i.e., the lens placement height value is equal to the lens focal length value) can be achieved for the red light, green light, and blue light emitted by the display panel 100, solving the display color deviation problem of the OLED display device.

[0084] In a possible implementation manner, as Figure 1 shown, the first distance L 1 (L 1 = H 1 - H 0 ) is greater than the second distance L 2 (L 2 = H 2 - H 0 ), and the second distance L 2 is greater than the third distance L 3 (L 3 = H 3 - H 0 ), that is, L1 > L 2 > L 3 That is, in the direction perpendicular to the substrate 101, the placement height of the first lens 201 > the placement height of the second lens 202 > the placement height of the third lens 203.

[0085] In a possible implementation, as Figure 1 shown, the OLED display device provided in this embodiment further includes a substrate layer 204 located on the light-emitting side of the display panel 100. The lens array is formed in the substrate layer 204. The curved surface of the first lens 201 is closer to the display panel 100 than the plane of the first lens 201, the curved surface of the second lens 202 is closer to the display panel 100 than the plane of the second lens 202, and the curved surface of the third lens 203 is closer to the display panel 100 than the plane of the third lens 203. That is, as Figure 1 shown, the first lens 201, the second lens 202, and the third lens 203 are all arranged in an inverted manner with the plane on top and the curved surface on the bottom. This inverted arrangement has advantages such as being easy to manufacture. It can be understood that the first lens, the second lens, and the third lens can also be arranged in a normal manner with the curved surface on top and the plane on the bottom.

[0086] In a possible implementation, as Figure 1 shown, in the direction perpendicular to the substrate 101, the maximum distance between the surface of the first lens 201 away from the display panel 100 and the display panel 100 is the fourth distance, the maximum distance between the surface of the second lens 202 away from the display panel 100 and the display panel 100 is the fifth distance, and the maximum distance between the surface of the third lens 203 away from the display panel 100 and the display panel 100 is the sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same. That is, for Figure 1 the first lens 201, the second lens 202, and the third lens 203 shown, which are all arranged in an inverted manner with the plane on top and the curved surface on the bottom, the planes (light-emitting surfaces) of the first lens 201, the second lens 202, and the third lens 203 are located in the same plane parallel to the substrate 101. This arrangement of emitting light from the same plane has advantages such as being beneficial to ensuring the display effect and being easy to manufacture.

[0087] Furthermore, as Figure 1 shown, the substrate layer 204 exposes the planes of the first lens 201, the second lens 202, and the third lens 203 respectively.

[0088] In a possible implementation, the curved surfaces of the first lens 201, the second lens 202, and the third lens 203 are part of a spherical surface, part of an ellipsoidal surface, or part of a conical surface. For example Figure 1As shown, the first lens 201, the second lens 202, and the third lens 203 are all such that the side facing away from the display panel 100 is a plane, and the side facing the display panel 100 is a curved surface that bulges towards the display panel 100. For example Figure 1 As shown, this curved surface is a hemispherical curved surface. Thus, the first lens 201, the second lens 202, and the third lens 203, which are plano-convex lenses respectively, are specifically hemispherical lenses. The arch height thereof is the radius of the hemispherical body, and the planar dimension is, for example, the diameter of a circular plane (or the diameter of the hemispherical body).

[0089] In a possible implementation, the refractive index of the first lens 201, the refractive index of the second lens 202, and the refractive index of the third lens 203 are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer 204 is less than the refractive index of the first lens 201. That is, for each interval of the entire band, the refractive index of the first lens 201, the refractive index of the second lens 202, and the refractive index of the third lens 203 are all the same (the refractive index of the first lens 201 is different in each wavelength band. For example, the refractive index n R of the first lens 201 for the red light band is not equal to the refractive index n G of the first lens 201 for the green light band, and the same applies to the second lens 202 and the third lens 203; but the refractive indices of the first lens 201, the second lens 202, and the third lens 203 are the same in each wavelength band. For example, the refractive index of the first lens 201 for the red light band and the refractive index of the third lens 203 for the red light band are both n R ); and for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer 204 is less than the refractive index of the first lens 201. It can be understood that for the three wavelength bands of red, green, and blue, the refractive indices of the first lens 201, the second lens 202, and the third lens 203 are the same in any one of the three wavelength bands. That is, "for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer 204 is less than the refractive index of the first lens 201" means that: for the red light band, the refractive index of the substrate layer 204 is less than the refractive index of the first lens 201 corresponding to the red sub-pixel; for the green light band, the refractive index of the substrate layer 204 is less than the refractive index of the second lens 202 corresponding to the green sub-pixel; for the blue light band, the refractive index of the substrate layer 204 is less than the refractive index of the third lens 203 corresponding to the blue sub-pixel.

[0090] In a possible implementation, the material of the substrate layer 204 is an isotropic material. In this way, it is convenient to form the first lens 201, the second lens 202, and the third lens 203 such as hemispheres. Among them, in this embodiment, there is no specific limitation on whether the material of the substrate 204 is an organic material or an inorganic material, as long as it satisfies properties such as low refractive index, high transmittance, and isotropy.

[0091] In a possible implementation, the materials of the first lens 201, the second lens 202, and the third lens 203 are the same, and are all silicon nitride (SiN x ), silicon oxide (SiO 2 ), silicon oxynitride (SiON x ) or any combination thereof.

[0092] The materials of the first lens 201, the second lens 202, and the third lens 203 are the same. Coupled with limitations such as the same process parameters, etc., in each interval of the full wavelength band, the refractive index of the first lens 201, the refractive index of the second lens 202, and the refractive index of the third lens 203 are all the same, that is, the refractive index curves of the first lens 201, the second lens 202, and the third lens 203 are the same. Taking the materials of the first lens 201, the second lens 202, and the third lens 203 all being silicon nitride (SiN x ) as an example, the refractive index curves of the first lens 201, the second lens 202, and the third lens 203 made of silicon nitride (SiN x ) material under the same process parameters are as shown in Figure 2 . It can be seen that their refractive indices in the red light band, green light band, and blue light band are relatively high respectively. In addition, the reason for selecting one or any combination of silicon nitride (SiN x ), silicon oxide (SiO 2 ), and silicon oxynitride (SiON x ) as the materials of the first lens 201, the second lens 202, and the third lens 203 is also that the extinction coefficient of one or any combination of silicon nitride (SiN x ), silicon oxide (SiO 2 ), and silicon oxynitride (SiON x ) is relatively low, which can be less than 0.0001 and can meet the high transmittance requirements of the lens.

[0093] Another embodiment of the present invention provides a manufacturing method of an OLED display device, and this manufacturing method can manufacture the OLED display device provided in the above embodiment.

[0094] As shown in Figure 3 , this manufacturing method includes the following steps:

[0095] S310, manufacture the display panel 100 to obtain as shown inFigure 3 The structure shown. Among them, the obtained display panel 100 includes a substrate 101 and red sub-pixels, green sub-pixels, and blue sub-pixels arranged in an array on the substrate 101. Regarding the specific manufacturing process of each film layer in the display panel 100, reference can be made to the brief introduction part of each film layer and its manufacturing method of the display panel 100 in the foregoing embodiments, which will not be elaborated here.

[0096] S320. Design the size parameters of the lens array to be formed. Among them, the lens array to be formed includes a first lens corresponding to each red sub-pixel, a second lens corresponding to each green sub-pixel, and a third lens corresponding to each blue sub-pixel; the main size parameters obtained by design are: in the direction perpendicular to the substrate 101, the minimum distance between the first lens to be formed and the display panel 100, the minimum distance between the second lens to be formed and the display panel 100, and the minimum distance between the third lens to be formed and the display panel 100. It should be noted that the relevant parameters of the above size parameters are directly applied in the subsequent manufacturing process.

[0097] In a possible implementation manner,

[0098] The setting conditions for designing the size parameters of the lens array to be formed are:

[0099] (1) The first lens, the second lens, and the third lens to be formed are plano-convex lenses such as hemispheres, for example.

[0100] (2) The curved surface of the first lens to be formed is closer to the display panel 100 than the plane, the curved surface of the second lens to be formed is closer to the display panel 100 than the plane, and the curved surface of the third lens to be formed is closer to the display panel 100 than the plane. That is, the first lens, the second lens, and the third lens to be formed are all arranged in an inverted manner with the plane on top and the curved surface on the bottom.

[0101] (3) In the direction perpendicular to the substrate 101, the distance between the plane of the first lens to be formed and the display panel 100 is the fourth distance, the distance between the plane of the second lens to be formed and the display panel 100 is the fifth distance, and the distance between the plane of the third lens to be formed and the display panel 100 is the sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same. That is, the planes (light-emitting surfaces) of the first lens, the second lens, and the third lens to be formed are located in the same plane parallel to the substrate 101.

[0102] (4) For the red light band, the refractive index of the substrate layer to be formed is less than the refractive index of the first lens to be formed; for the green light band, the refractive index of the substrate layer to be formed is less than the refractive index of the second lens to be formed; for the blue light band, the refractive index of the substrate layer to be formed is less than the refractive index of the third lens to be formed. Or based on the design of process optimization, it can be directly defined that the refractive indices of the first lens to be formed, the second lens to be formed, and the third lens to be formed are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer to be formed is less than the refractive index of the first lens to be formed.

[0103] The calculation formulas for designing the size parameters of the lens array to be formed include:

[0104] Formula 1: f = n 0 *r / (n - n 0 ), where f is the focal length of the lens to be formed, n 0 is the refractive index of the substrate layer to be formed for the incident light, r is the arch height of the lens to be formed (i.e., the maximum distance between the plane and the curved surface of the hemispherical lens in the direction perpendicular to the substrate 101, which is also the radius of the hemisphere), and n is the refractive index of the lens to be formed for the incident light.

[0105] Formula 2: The ratio for maximizing the light output gain effect of the corresponding lens, H / f = 1 (i.e., the lens placement height value is equal to the lens focal length value).

[0106] Formula 3: H + r = T, where H is the minimum distance between the lens to be formed and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101 (i.e., the placement height of the lens to be formed), and T is the minimum distance between the plane of the lens to be formed and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101.

[0107] Formula 4: H = f = n 0 *r / (n - n 0 ), where Formula 5 is obtained by combining Formula 1 and Formula 2.

[0108] Formula 5: r = T * (1 - n 0 / n), where Formula 5 is obtained by combining Formula 4 and Formula 3 to get T - r = n 0 *r / (n - n 0 ) and then arranging it.

[0109] The size parameters for designing the lens array to be formed include:

[0110] First, set the minimum distance between the third lens to be formed and the display panel 100 in the direction perpendicular to the substrate 101 (i.e., the minimum linear distance between the center of the hemispherical surface of the inverted hemispherical third lens and the display panel 100) as L 3 , and calculate the minimum distance between the third lens to be formed and the light-emitting layer 104 in the display panel 100 (i.e., the placement height of the third lens to be formed) H 3 = L 3 + H 0 , where H 0 is the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer 104 of the display panel 100 (i.e., the sum of the thicknesses of the cathode 105, the encapsulation layer 106, and the color filter layer 107. It can be understood that the sum of the film layer thicknesses H 0 on the light-emitting side of the light-emitting layer 104 of the display panel 100 is uniform. That is, for the red sub-pixels, green sub-pixels, and blue sub-pixels, the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer 104 of the display panel 100 is the same, all being H 0 ); for example, the value of the minimum distance L3 between the third lens to be formed and the display panel 100 is set to be 0.35μm - 0.4μm.

[0111] Then, substitute the placement height H 3 of the third lens to be formed into the formula H 3 = n 0,B * r 3 / (n B - n 0,B ), and calculate the arch height r 3 of the third lens to be formed, where n 0,B is the refractive index of the substrate layer to be formed corresponding to the blue light band, and n B is the refractive index of the third lens to be formed corresponding to the blue light band.

[0112] Then, according to the placement height H 3 of the third lens to be formed and the arch height r 3 of the third lens to be formed, calculate the distance T between the plane of the third lens to be formed and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101 as T = H 3 + r 3 . It can be understood that since the planes (light-emitting surfaces) of the first lens, second lens, and third lens to be formed are located in the same plane parallel to the substrate 101, this T value is applicable to the first lens and second lens to be formed.

[0113] Then, substitute the distance T between the plane of the third lens to be formed and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101 into the formula r based on Formula Five respectively1 = T * (1 - n 0,R / n R ), and r 2 = T * (1 - n 0,G / n G ), the sag r of the first lens to be formed is calculated 1 and the sag r of the second lens 2 , where n 0,R is the refractive index of the substrate layer to be formed corresponding to the red light band, n 0,G is the refractive index of the substrate layer to be formed corresponding to the green light band, n R is the refractive index of the first lens to be formed corresponding to the red light band, n G is the refractive index of the second lens to be formed corresponding to the green light band.

[0114] Finally, based on the sum H of the film layer thicknesses on the light-emitting side of the light-emitting layer 104 of the display panel 100 0 , the distance T between the plane of the third lens to be formed in the direction perpendicular to the substrate 101 and the light-emitting layer 104 in the display panel 100, the sag r of the first lens to be formed 1 and the sag r of the second lens 2 , according to Formula Three, the minimum distance L between the first lens to be formed and the display panel 100 in the direction perpendicular to the substrate 101 is obtained 1 = T - r 1 - H 0 and the minimum distance L between the second lens to be formed and the display panel 100 2 = T - r 2 - H 0 .

[0115] Thus, the minimum distance L, sag r, placement height H, and the distance T between the plane and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101 of the first lens, second lens, and third lens to be formed are obtained. Among them, the sag r and the distance T between the plane and the light-emitting layer 104 in the display panel 100 in the direction perpendicular to the substrate 101 are directly applied in the subsequent manufacturing process.

[0116] S330. Form a substrate layer 204 on the light-emitting side of the display panel 100.

[0117] For example, coat an isotropic material with a low refractive index and high transmittance on the color filter layer 107 of the display panel 100 to obtain the substrate layer 204. Among them, the thickness of the substrate layer 204 can be obtained according to the design of step S200, and the specific thickness is taken as T - H 0 .

[0118] S340, forming a lens array in the substrate layer 204, the lens array comprising a first lens 201 corresponding to each red sub-pixel one-to-one, a second lens 202 corresponding to each green sub-pixel one-to-one, and a third lens 203 corresponding to each blue sub-pixel one-to-one.

[0119] In a possible implementation, step S340 includes the following steps:

[0120] First, a pattern is formed on the side of the substrate layer 402 away from the display panel 100 to match the arch height r of the first lens to be formed. 1 and a first opening in the shape of a hemispherical plano-convex lens corresponding to each red sub-pixel, specifically comprising:

[0121] A coating having a thickness matching the arch height r of the first lens to be formed is applied on the side of the substrate layer 204 away from the display panel 100. 1 The first photoresist layer 301 is obtained as Figure 4 The structure shown;

[0122] The first photoresist layer 301 is patterned at positions corresponding to each red sub-pixel to expose the substrate layer 204 and match the plane size corresponding to the plano-convex lens shape (for example, equal to the arch height r 1 The fourth opening (e.g., a circular opening) is formed by exposing and developing the fourth opening using a yellow light process, and the fourth opening is obtained as follows: Figure 5 The structure shown;

[0123] An isotropic dry etching process is performed under high pressure conditions, for example, to obtain a base layer 204 having a height r that matches the first lens to be formed. 1 and a plano-convex lens shape (e.g., radius r 1 The first opening of the hemisphere) corresponding to each red sub-pixel is obtained as follows Figure 6 In the structure shown, the first opening provides a reserved space for the first lens to be formed.

[0124] Then, a pattern is formed on the side of the substrate layer 204 away from the display panel 100 to match the arch height r of the second lens to be formed. 2 and second openings in the shape of a hemispherical plano-convex lens corresponding to each green sub-pixel one by one, specifically comprising:

[0125] A coating having a thickness matching the arch height r of the second lens to be formed is applied on the side of the substrate layer 204 away from the display panel 100. 2 A second photoresist layer 302;

[0126] The second photoresist layer 302 is patterned at positions corresponding to each green sub-pixel to expose the substrate layer 204 and match the plane size corresponding to the plano-convex lens shape (e.g., equal to the arch height r 2a fifth opening (e.g., a circular opening) with a radius of the hemisphere), for example, exposing and developing the fifth opening using a yellow light process to obtain a structure as shown in Figure 7 shown;

[0127] Perform an isotropic dry etching process under high pressure conditions, for example, to obtain the arch height r of the second lens to be formed that matches the substrate layer 204 2 and a plano-convex lens shape (e.g., a hemisphere with a radius of r 2 ), and a second opening corresponding to each green sub-pixel, to obtain a structure as shown in Figure 8 shown.

[0128] Then, pattern and form an arch height r of the third lens to be formed that matches on the side of the substrate layer 402 away from the display panel 100 3 and a third opening corresponding to each blue sub-pixel in the shape of a plano-convex lens such as a hemisphere, specifically including:

[0129] Coat a third photoresist layer 303 with a thickness that matches the arch height r of the third lens to be formed on the side of the substrate layer 204 away from the display panel 100 3 ;

[0130] Pattern and form a sixth opening (e.g., a circular opening) that exposes the substrate layer 204 and matches the planar size corresponding to the plano-convex lens shape (e.g., equal to the radius of the hemisphere with an arch height of r 3 ) at the positions of the third photoresist layer 303 corresponding to each third sub-pixel. For example, expose and develop the sixth opening using a yellow light process to obtain a structure as shown in Figure 9 shown;

[0131] Perform an isotropic dry etching process under high pressure conditions, for example, to obtain the arch height r of the third lens to be formed that matches the substrate layer 204 3 and a third opening corresponding to each blue sub-pixel in the shape of a plano-convex lens (e.g., a hemisphere with a radius of r 3 ), to obtain a structure as shown in Figure 10 shown. It can be understood that in the process of three openings and subsequent one-time filling of lens materials adopted in this embodiment, as shown in Figure 10 shown, after this (third) isotropic dry etching process, the first opening and the second opening are also filled with photoresist. Etching processes such as a dry etching process with a high selectivity ratio can be used to etch the photoresist filled in the first opening and the second opening completely, so as to obtain a structure as shown in Figure 11 shown.

[0132] Finally, a lens material layer 200 is deposited on the side of the substrate layer 204 away from the display panel 100, and an etching process is performed on the lens material layer 200 to obtain a first lens 201, a second lens 202, and a third lens 203 whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer 204 away from the display panel 100. Specifically, it includes:

[0133] Deposit a lens material layer 200 such as silicon nitride (SiN x ) on the side of the substrate layer 204 away from the display panel 100 to obtain a structure as shown in Figure 12 . Since the first opening, the second opening, and the third opening have been formed on the side of the substrate layer 204 away from the display panel 100, depressions will appear at the corresponding openings of the lens material layer 200.

[0134] Coat a fourth photoresist layer 304 to planarize the lens material layer 200, that is, fill the above-mentioned depressions through the fourth photoresist layer 304 to obtain a structure as shown in Figure 13 .

[0135] Use a dry etching process with an etching rate ratio of 1:1 for the fourth photoresist layer 304 and the lens material layer 200, for example, to etch away the fourth photoresist layer 304 and the lens material layer 200 above the non-opening areas of the substrate layer 204, so as to obtain a first lens 201, a second lens 202, and a third lens 203 whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer 204 away from the display panel 100, and obtain a structure as shown in Figure 1 . Among them, the arch height r 1 and the placement height H 1 of the obtained first lens 201, the arch height r 2 and the placement height H 2 of the second lens 202, the arch height r 3 and the placement height H 3 of the third lens 203 are as indicated in the markings shown in Figure 1 .

[0136] In summary, in the manufacturing method of the OLED display device provided in this embodiment, by using an isotropic dry etching process in the substrate layer (low refractive index transition layer), a hemispherical opening is etched, and then a high refractive index material such as silicon nitride (SiN x)'s lens material layer, so that inverted lenses with different arch heights and placement heights can be made for lights emitted in different bands, enabling the lens array to achieve a maximum gain effect for lights of different bands emitted by the display panel and solving the problem of display color deviation.

[0137] Those skilled in the art should understand that although the above steps are described in the order of S100 - S400, it does not necessarily mean that they are executed in this order. For example, S200 can be executed first and then S100, as long as the logic is not violated. Another example is that when forming the first opening, the second opening, and the third opening on the substrate layer in sequence, the formation order of the first opening, the second opening, and the third opening can also be adjusted.

[0138] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, rather than limitations on the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes or variations can be made based on the above description. It is impossible to list all the implementation manners here. Any obvious changes or variations derived from the technical solutions of the present invention still fall within the protection scope of the present invention.

Claims

1. A display device, characterized in that, it includes a display panel and a lens array disposed on the light-emitting side of the display panel. The display panel includes a substrate and first sub-pixels, second sub-pixels, and third sub-pixels arranged in an array on the substrate. The lens array includes first lenses corresponding to each first sub-pixel one by one, second lenses corresponding to each second sub-pixel one by one, and third lenses corresponding to each third sub-pixel one by one; the first lens, the second lens, and the third lens are respectively plano-convex lenses; in a direction perpendicular to the substrate, the minimum distance between the first lens and the display panel is a first distance, the minimum distance between the second lens and the display panel is a second distance, and the minimum distance between the third lens and the display panel is a third distance; the first distance, the second distance, and the third distance are different from each other; the display panel includes a substrate and a driving circuit layer, a light-emitting device layer, a packaging layer, and a color filter layer formed in sequence on the substrate; the display device further includes a substrate layer located on the light-emitting side of the display panel, and the lens array is formed in the substrate layer; the substrate layer exposes the plane of the first lens, the plane of the second lens, and the plane of the third lens respectively.

2. The display device according to claim 1, characterized in that, in a direction perpendicular to the substrate, the maximum distance between the surface of the first lens away from the display panel and the display panel is a fourth distance, the maximum distance between the surface of the second lens away from the display panel and the display panel is a fifth distance, and the maximum distance between the surface of the third lens away from the display panel and the display panel is a sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same.

3. The display device according to claim 1 or 2, characterized in that, the curved surface of the first lens is closer to the display panel than the plane of the first lens, the curved surface of the second lens is closer to the display panel than the plane of the second lens, and the curved surface of the third lens is closer to the display panel than the plane of the third lens.

4. The display device according to claim 3, characterized in that, the first sub-pixel is a red sub-pixel, the second sub-pixel is a green sub-pixel, and the third sub-pixel is a blue sub-pixel; the refractive indices of the first lens, the second lens, and the third lens are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer is less than the refractive index of the first lens.

5. The display device according to claim 4, characterized in that, the first distance is greater than the second distance, and the second distance is greater than the third distance.

6. The display device according to claim 3, characterized in that, the material of the substrate layer is an isotropic material.

7. The display device according to claim 3, characterized in that, the materials of the first lens, the second lens, and the third lens are the same, and are each one or any combination of silicon nitride, silicon oxide, and silicon oxynitride.

8. A manufacturing method of a display device, characterized in that, Comprising: A display panel is provided, the display panel including a substrate and a driving circuit layer, a light-emitting device layer, a packaging layer, and a color filter layer sequentially formed on the substrate. The display panel includes first sub-pixels, second sub-pixels, and third sub-pixels arranged in an array on the substrate; A lens array is formed on the light-emitting side of the display panel. The lens array includes a first lens corresponding to each first sub-pixel, a second lens corresponding to each second sub-pixel, and a third lens corresponding to each third sub-pixel; the first lens, the second lens, and the third lens are respectively plano-convex lenses; in a direction perpendicular to the substrate, the minimum distance between the first lens and the display panel is a first distance, the minimum distance between the second lens and the display panel is a second distance, and the minimum distance between the third lens and the display panel is a third distance; the first distance, the second distance, and the third distance are different from each other; The forming of the lens array on the light-emitting side of the display panel includes: Forming a substrate layer on the light-emitting side of the display panel; Forming a lens array in the substrate layer; The substrate layer exposes the plane of the first lens, the plane of the second lens, and the plane of the third lens respectively.

9. According to the method described in claim 8, It is characterized in that The curved surface of the first lens is closer to the display panel than the plane of the first lens, the curved surface of the second lens is closer to the display panel than the plane of the second lens, and the curved surface of the third lens is closer to the display panel than the plane of the third lens.

10. According to the method described in claim 9, It is characterized in that The first sub-pixel is a red sub-pixel, the second sub-pixel is a green sub-pixel, and the third sub-pixel is a blue sub-pixel; the refractive indices of the first lens, the second lens, and the third lens are the same; for each of the red light band, the green light band, and the blue light band, the refractive index of the substrate layer is less than the refractive index of the first lens.

11. According to the method described in claim 10, It is characterized in that In a direction perpendicular to the substrate, the distance between the plane of the first lens and the display panel is a fourth distance, the distance between the plane of the second lens and the display panel is a fifth distance, and the distance between the plane of the third lens and the display panel is a sixth distance; the fourth distance, the fifth distance, and the sixth distance are the same.

12. According to the method described in claim 11, It is characterized in that The method further includes: Designing to obtain, in a direction perpendicular to the substrate, the minimum distance between the first lens and the display panel, the minimum distance between the second lens and the display panel, and the minimum distance between the third lens and the display panel, including: Set the minimum distance between the third lens and the display panel as L 3 , and calculate the distance H between the third lens and the light-emitting layer in the display panel 3 = L 3 + H 0 , where H 0 is the sum of the film layer thicknesses on the light-emitting side of the light-emitting layer of the display panel; The distance H between the third lens and the light-emitting layer in the display panel 3 Substitute into the formula H 3 = n 0,B * r 3 / (n B - n 0,B ) to obtain the sagitta r of the third lens 3 , where n 0,B is the refractive index of the substrate layer corresponding to the blue light band, and n B is the refractive index of the third lens corresponding to the blue light band; According to the distance H between the third lens and the light-emitting layer in the display panel 3 and the arch height r of the third lens 3 the distance T between the plane of the third lens and the light-emitting layer in the display panel is obtained as T = H 3 + r 3 ; Substitute the distance T between the plane of the third lens and the light-emitting layer in the display panel into the formula r 1 = T * (1 - n 0,R / n R ) and r 2 = T * (1 - n 0,G / n G ) to obtain the sag r 1 of the first lens and the sag r 2 of the second lens, where n 0,R is the refractive index of the substrate layer corresponding to the red light band, n 0,G is the refractive index of the substrate layer corresponding to the green light band, n R is the refractive index of the first lens corresponding to the red light band, and n G is the refractive index of the second lens corresponding to the green light band; According to the sum of the film layer thicknesses H on the light-emitting side of the light-emitting layer of the display panel 0 , the distance T between the plane of the third lens and the light-emitting layer in the display panel, the arch height r of the first lens 1 and the arch height r of the second lens 2 , the minimum distance L between the first lens and the display panel is obtained 1 = T - r 1 - H 0 , and the minimum distance L between the second lens and the display panel 2 = T - r 2 - H 0 .

13. According to the method described in claim 12, It is characterized in that The minimum distance L between the third lens and the display panel 3 ranges from 0.35 μm to 0.4 μm.

14. According to the method described in claim 12, It is characterized in that The thickness of the substrate layer is T - H 0 .

15. According to the method described in claim 14, It is characterized in that The forming of the lens array in the substrate layer includes: On the side of the substrate layer away from the display panel, an arch height r matching the first lens is sequentially patterned 1 and a plano-convex lens-shaped first opening corresponding to each first sub-pixel, an arch height r matching the second lens 2 and a plano-convex lens-shaped second opening corresponding to each second sub-pixel, and an arch height r matching the third lens 3 and a plano-convex lens-shaped third opening corresponding to each third sub-pixel; Deposit a lens material layer on the side of the substrate layer away from the display panel, and perform an etching process on the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel.

16. The method according to claim 15, wherein, the material of the substrate layer is an isotropic material, Patterning is performed on a side of the substrate layer away from the display panel to form an arch height r matching the first lens 1 The plano-convex lens-shaped first openings corresponding to the first sub-pixels one by one include: Coat a first photoresist layer with a thickness matching the sagitta r of the first lens on the side of the substrate layer away from the display panel 1 ; pattern a fourth opening exposing the substrate layer and matching the planar dimension corresponding to the shape of the plano-convex lens at the positions of the first sub-pixels corresponding to the first photoresist layer; An isotropic dry etching process is performed to obtain the arch height r of the first lens that matches the substrate layer. 1 And a first opening in the shape of a plano-convex lens corresponding to each of the first sub-pixels one by one; Patterning is performed on a side of the substrate layer away from the display panel to form a sagitta r that matches the second lens 2 The plano-convex lens-shaped second openings corresponding to the second sub-pixels one by one include: Coat a second photoresist layer with a thickness matching the sagitta r of the second lens on the side of the substrate layer away from the display panel 2 ; pattern a fifth opening exposing the substrate layer and matching the planar dimension corresponding to the shape of the plano-convex lens at the positions of the second sub-pixels corresponding to the second photoresist layer; Perform an isotropic dry etching process to obtain the arch height r of the second lens that matches the substrate layer 2 and a plano-convex lens-shaped second opening corresponding to each second sub-pixel; Pattern a height r of an arch matching a third lens on a side of the substrate layer away from the display panel. 3 The plano-convex lens-shaped third openings corresponding to each of the third sub-pixels include: Coat a third photoresist layer with a thickness matching the sagitta r of the third lens on the side of the substrate layer away from the display panel 3 ; pattern a sixth opening exposing the substrate layer and matching the planar dimension corresponding to the shape of the plano-convex lens at the positions of the third sub-pixels corresponding to the third photoresist layer; Perform an isotropic dry etching process to obtain the sag r of the matching third lens of the substrate layer 3 and third openings in the shape of plano-convex lenses, each corresponding to a third sub-pixel 17. The method according to claim 15, wherein, the depositing a lens material layer on the side of the substrate layer away from the display panel and performing an etching process on the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel includes: deposit a lens material layer on the side of the substrate layer away from the display panel; coat a fourth photoresist layer to planarize the lens material layer; perform a dry etching process on the fourth photoresist layer and the lens material layer to obtain a first lens, a second lens, and a third lens whose planes formed in the first opening, the second opening, and the third opening are flush with the side of the substrate layer away from the display panel.

18. The method according to claim 15, wherein, the material of the lens material layer is one or any combination of silicon nitride, silicon oxide, and silicon oxynitride.

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