phase-contrast imaging method

Abstract

Disclosed herein is a method comprising: for i = 1,..., M, sending a pencil-shaped radiation beam (i) towards an image sensor, wherein the pencil-shaped radiation beam (i) is incident on an incident region (i) on an active region of the image sensor, wherein the pencil-shaped radiation beam (i) is aligned to a target region (i) on the active region, wherein M is a positive integer, determining, for i = 1,..., M, an offset (i) between the incident region (i) and the target region (i). A radiation detector (100) comprises an array of pixels (150), an absorption layer (110), and an electronics layer (120).

Description

[Technical Field]

[0002] This disclosure relates to imaging methods using radiation detectors. [Background Technology]

[0004] A radiation detector is a device for measuring the characteristics of radiation. Examples of these characteristics may include the spatial distribution of the intensity, phase, and polarization of the radiation. The radiation may be radiation that interacts with an object. For example, the radiation measured by the radiation detector may be radiation that has already passed through or been reflected from the object. The radiation may be electromagnetic radiation, such as infrared light, visible light, ultraviolet light, X-rays, or gamma rays. The radiation may also be other types, such as alpha rays and beta rays. An image sensor may include multiple radiation detectors. [Summary of the Invention]

[0006] This document discloses a method comprising: sending a pencil-shaped radiation beam (i) toward an image sensor for i = 1, ..., M, wherein the pencil-shaped radiation beam (i) is incident on an incident region (i) on an active region of the image sensor, wherein the pencil-shaped radiation beam (i) is aligned with a target region (i) on the active region, wherein M is a positive integer, and determining an offset (i) between the incident region (i) and the target region (i) for i = 1, ..., M.

[0007] In one respect, the active region is the only active region of the image sensor, and the active region is spatially continuous.

[0008] In one aspect, the method further includes determining the refractive index of a point (i) of the object, i = 1, ..., M, based on the offset (i); wherein the pencil-shaped radiation beam (i) is incident on the point (i).

[0009] In some respects, each of the target regions (i), i = 1, ..., M, is not smaller than the size of one pixel of the image sensor.

[0010] In one respect, any two of the target regions (i), i = 1, ..., M, are simultaneously spaced at least 10 times the width of a pixel of the image sensor.

[0011] In one aspect, the pencil-shaped radiation beam (i), i = 1, ..., M, is formed by guiding radiation through at least one aperture of a filter, and the method further includes moving the filter relative to the image sensor between multiple exposures.

[0012] In one aspect, the method further includes capturing an image of the pencil-shaped radiation beam (i), i = 1, ..., M, and determining the position (i) of the incident region (i) based on the captured image of the pencil-shaped radiation beam (i), wherein the determination of the offset (i) is based on the position (i) of the incident region (i).

[0013] In one aspect, the method further includes: for i = 1, ..., M, transmitting an additional pencil-shaped radiation beam B. ij , j = 1, ..., Ni, where Ni is a positive integer, and where each of the additional pencil-shaped radiation beams (i, j), j = 1, ..., Ni, is parallel to and overlaps with the pencil-shaped radiation beam (i); the pencil-shaped radiation beam (i), i = 1, ..., M, and the additional pencil-shaped radiation beam B are photographed. ij Images of i = 1, ..., M and j = 1, ..., Ni; and for i = 1, ..., M, images of the pencil-shaped radiation beam (i) and the additional pencil-shaped radiation beam B. ij The image of j = 1, ..., Ni is used to apply a super-resolution algorithm to obtain an enhanced image (i) of the pencil-shaped radiation beam (i), and the position (i) of the incident region (i) is determined based on the enhanced image (i), wherein the determination of the offset (i) is based on the position (i) of the incident region (i).

[0014] This paper describes a method comprising: sending a first sector-shaped radiation beam and a second sector-shaped radiation beam toward an image sensor, wherein, for i = 1, ..., M, a pair (i) of one of the first sector-shaped radiation beams and one of the second sector-shaped radiation beams are respectively incident on two incident regions on an active region of the image sensor, the two incident regions sharing a common incident region (i) on the active region, where M is a positive integer, wherein, for i = 1, ..., M, the pair (i) is respectively aligned with two target regions on the active region, the two target regions sharing a common target region (i) on the active region, and for i = 1, ..., M, determining an offset (i) between the common incident region (i) and the common target region (i).

[0015] In one respect, the active region is the only active region of the image sensor, and the active region is spatially continuous.

[0016] In one aspect, the method further includes determining the refractive index of a point (i) of the object, i = 1, ..., M, based on the offset (i), wherein both fan-shaped radiation beams of the pair (i) are incident on the point (i).

[0017] In some respects, each of the common target regions (i), i = 1, ..., M, is not smaller than the size of one pixel of the image sensor.

[0018] In one respect, any two target regions on the active region simultaneously aligned with any two radiation beams of the first fan-shaped radiation beam are spaced at least 10 times the width of a pixel of the image sensor.

[0019] In one respect, the target regions on the active region aligned with the first sector-shaped radiation beam are parallel to each other.

[0020] In one aspect, the first fan-shaped radiation beam is formed by guiding radiation through at least one slit in the filter, and the method further includes moving the filter relative to the image sensor between multiple exposures.

[0021] In one respect, the target region on the active region aligned with the first sector radiation beam is not parallel to the target region on the active region aligned with the second sector radiation beam.

[0022] In one respect, the first fan-shaped radiation beam is formed by guiding radiation through a first slit of the filter, and the second fan-shaped radiation beam is formed by guiding radiation through a second slit of the filter, wherein the first slits are parallel to each other, the second slits are parallel to each other, and the first slits are not parallel to the second slits.

[0023] In one aspect, the method further includes capturing images of the first sector radiation beam and the second sector radiation beam, and determining the position (i) of the common incident region (i) based on the captured images of the two radiation beams of the pair (i), wherein the determination of the offset (i) is based on the position (i) of the common incident region (i).

[0024] In one aspect, the method further includes: for each of the first and second sector-shaped radiation beams, transmitting an additional sector-shaped radiation beam parallel to and overlapping the first and second sector-shaped radiation beams; capturing images of the first and second sector-shaped radiation beams and the additional sector-shaped radiation beams associated therewith; and for each of the first and second sector-shaped radiation beams, applying a super-resolution algorithm to the images of the radiation beams and the additional sector-shaped radiation beams associated therewith to obtain an enhanced image of the radiation beams, and determining the position (i) of the common incident region (i) based on the enhanced images of the two radiation beams of the pair (i), wherein the determination of the offset (i) is based on the position (i) of the common incident region (i).

[0025] In one respect, the second sector radiation beam is transmitted after the first sector radiation beam is transmitted. [Attached Image Description]

[0027] Figure 1 This illustration shows a radiation detector according to an embodiment.

[0028] Figure 2A A simplified cross-sectional view of the radiation detector according to an embodiment is shown.

[0029] Figure 2B A detailed cross-sectional view of the radiation detector according to an embodiment is shown schematically.

[0030] Figure 2C An alternative detailed cross-sectional view of the radiation detector according to an embodiment is shown.

[0031] Figure 3 This schematically illustrates a top view of a package including a radiation detector and a printed circuit board (PCB) according to an embodiment.

[0032] Figure 4 A schematic cross-sectional view of an image sensor according to an embodiment is shown, wherein Figure 3 Multiple of the aforementioned packages are mounted onto the system printed circuit board.

[0033] Figures 5A-5D The illustrations depict imaging systems according to different embodiments and their operation using pencil-shaped radiation beams.

[0034] Figures 6A-6F The illustrations depict imaging systems according to different embodiments and their operation using fan-shaped radiation beams.

[0035] Figures 7A-7G Different embodiments with filters are shown. Figures 6A-6FThe operation of the imaging system.

[0036] Figures 8A-8C The illustration shows the imaging system 500 according to different embodiments and its operation using the image sensor.

[0037] Figures 9A-9C The illustration shows the imaging system 600 according to different embodiments and its operation using the image sensor.

[0038] Figure 9D and Figure 9E Two flowcharts are shown, respectively, summarizing and generalizing the operation of the imaging system 500 and the imaging system 600 using the image sensor according to different embodiments.

Detailed Implementation Methods

[0040] Figure 1 The diagram schematically illustrates a radiation detector 100 as an example. The radiation detector 100 may include an array of pixels 150 (also referred to as sensing elements 150). This array may be a rectangular array (such as...) Figure 1 (As shown), a cellular array, a hexagonal array, or any other suitable array. Figure 1 The pixel array of 150 in the example has 4 rows and 7 columns. However, typically the pixel array of 150 can have any number of rows and any number of columns.

[0041] Each pixel 150 can be configured to detect radiation incident upon it from a radiation source (not shown) and can be configured to measure characteristics of the radiation (e.g., particle energy, wavelength, radiant flux, and frequency). The radiation can include particles such as photons (electromagnetic waves) and subatomic particles. Each pixel 150 can be configured to count the number of radiant particles incident upon it over a period of time, whose energy falls into multiple energy chambers. All pixels 150 can be configured to count the number of radiant particles incident upon it in multiple energy chambers within the same time period. When the incident radiant particles have similar energies, the pixel 150 can be simply configured to count the number of radiant particles incident upon it over a period of time without measuring the energy of each individual radiant particle.

[0042] Each pixel 150 may have its own analog-to-digital converter (ADC) configured to digitize an analog signal representing the energy of an incident radiating particle into a digital signal, or to digitize an analog signal representing the total energy of multiple incident radiating particles into a digital signal. The pixels 150 may be configured to operate in parallel. For example, while one pixel 150 is measuring an incident radiating particle, another pixel 150 may be waiting for the radiating particle to arrive. The pixels 150 need not be individually addressable.

[0043] The radiation detector 100 described herein can be used for applications such as X-ray telescopes, mammography, industrial X-ray defect detection, X-ray microscopy or photomicrography, X-ray casting inspection, X-ray non-destructive testing, X-ray welding inspection, and X-ray digital subtraction angiography. The radiation detector 100 can also be used in place of photographic film, photographic film, photoexcited phosphorescent plate, X-ray image intensifier, scintillator, or X-ray detector.

[0044] Figure 2A Schematic illustration according to an embodiment Figure 1 A simplified cross-sectional view of a radiation detector 100 along line 2A-2A. More specifically, the detector 100 may include a radiation-absorbing layer 110 and an electronics layer 120 (e.g., an application-specific integrated circuit) for processing or analyzing electrical signals of incident radiation generated in the radiation-absorbing layer 110. The radiation detector 100 may or may not include a scintillator (not shown). The radiation-absorbing layer 110 may include a semiconductor material such as silicon, germanium, gallium arsenide, cadmium telluride, zinc cadmium telluride, or combinations thereof. The semiconductor material may have a high mass attenuation coefficient for the radiation of interest.

[0045] Figure 2B This is illustrated as an example. Figure 1 A detailed cross-sectional view of the radiation detector 100 along line 2A-2A. More specifically, the radiation absorption layer 110 may include one or more diodes (e.g., pin or pn) consisting of one or more discrete regions 114 of a first doped region 111 and a second doped region 113. The second doped region 113 may be separated from the first doped region 111 by an optional intrinsic region 112. The discrete regions 114 are separated from each other by the first doped region 111 or the intrinsic region 112. The first doped region 111 and the second doped region 113 have opposite types of doping (e.g., region 111 is p-type and region 113 is n-type, or region 111 is n-type and region 113 is p-type). Figure 2B In the example, each discrete region 114 of the second doped region 113, together with the first doped region 111 and the optional intrinsic region 112, forms a diode. That is, in Figure 2B In the example, the radiation-absorbing layer 110 includes a plurality of diodes (more specifically, seven diodes corresponding to...). Figure 1 The array consists of 7 pixels (150) per row, for simplicity. Figure 2B Only two pixels 150 are marked in the image. The plurality of diodes have electrical contacts 119A as a shared electrode. The first doped region 111 may also have discrete portions.

[0046] The electronics layer 120 may include an electronic system 121 adapted to process or interpret signals generated by radiation incident on the radiation-absorbing layer 110. The electronic system 121 may include analog circuitry such as filter networks, amplifiers, integrators, comparators, or digital circuitry such as microprocessors and memory. The electronic system 121 may include one or more analog-to-digital converters. The electronic system 121 may include components shared by the pixels 150 or components dedicated to a single pixel 150. For example, the electronic system 121 may include an amplifier dedicated to each pixel 150 and a microprocessor shared across all pixels 150. The electronic system 121 may be electrically connected to the pixels 150 via vias 131. The space between the vias may be filled with a filler material 130, which may increase the mechanical stability of the connection between the electronics layer 120 and the radiation-absorbing layer 110. Other bonding techniques may allow the electronic system 121 to be connected to the pixels 150 without using the vias 131.

[0047] When radiation from the radiation source (not shown) impacts the radiation-absorbing layer 110 of the diode, the radiation particles can be absorbed and generate one or more charge carriers (e.g., electrons, holes) through several mechanisms. These charge carriers can drift toward an electrode of one of the diodes under an electric field. The electric field can be an external electric field. The electrical contact 119B may include discrete portions, each of which is in electrical contact with the discrete region 114. The term "electrical contact" is used interchangeably with the term "electrode." In an embodiment, the charge carriers can drift in different directions such that the charge carriers generated by a single radiation particle are substantially not shared by the two different discrete regions 114 ("substantially not shared" here means less than 2%, less than 0.5%, less than 0.1%, or less than 0.01% of these charge carriers flow toward a discrete region 114 different from the remaining charge carriers). Charge carriers generated by radiation particles incident around the footprint of one of the discrete regions 114 are substantially not shared by the other discrete region 114. A pixel 150 associated with a discrete region 114 can be a region surrounding the discrete region 114 into which substantially all (more than 98%, more than 99.5%, more than 99.9%, or more than 99.99%) of the charge carriers generated by a radiating particle incident therein flow. That is, less than 2%, less than 1%, less than 0.1%, or less than 0.01% of the charge carriers flow outside the pixel 150.

[0048] Figure 2C Schematic illustration according to an embodiment Figure 1An alternative detailed cross-sectional view of the radiation detector 100 along line 2A-2A. More specifically, the radiation absorbing layer 110 may comprise a resistor, but not a diode, of a semiconductor material such as silicon, germanium, gallium arsenide, cadmium telluride, zinc cadmium telluride, or a combination thereof. The semiconductor material may have a high mass attenuation coefficient for the radiation of interest. In an embodiment, Figure 2C The electronic device layer 120 described therein is similar in structure and function to Figure 2B The electronic device layer 120 in the middle.

[0049] When the radiation impacts the radiation-absorbing layer 110, which includes the resistor but not the diode, the radiation can be absorbed and generate one or more charge carriers through several mechanisms. A single radiating particle can generate 10 to 100,000 charge carriers. These charge carriers can drift towards electrical contacts 119A and 119B under an electric field. The electric field can be an external electric field. Electrical contact 119B includes discrete portions. In an embodiment, the charge carriers can drift in different directions such that the charge carriers generated by a single radiating particle are substantially not shared by the two different discrete portions of electrical contact 119B (“substantially not shared” here means that less than 2%, less than 0.5%, less than 0.1%, or less than 0.01% of these charge carriers flow to discrete portions of a different group than the remaining charge carriers). Charge carriers generated by radiating particles incident on the footprint of one of the discrete portions of electrical contact 119B are substantially not shared by the other discrete portion of electrical contact 119B. A pixel 150 associated with one of the discrete portions of the electrical contact 119B can be a region surrounding the discrete portion into which substantially all (more than 98%, more than 99.5%, more than 99.9%, or more than 99.99%) of the charge carriers generated by incident radiating particles flow. That is, less than 2%, less than 0.5%, less than 0.1%, or less than 0.01% of the charge carriers flow outside the pixel associated with one of the discrete portions of the electrical contact 119B.

[0050] Figure 3 This schematic diagram shows a top view of a package 200 including the radiation detector 100 and the printed circuit board 400 according to an embodiment. The term "printed circuit board" as used herein is not limited to a particular material. For example, a printed circuit board may include semiconductors. The radiation detector 100 is mounted to the printed circuit board 400. For clarity, the wiring between the radiation detector 100 and the printed circuit board 400 is not shown. The printed circuit board 400 may have one or more radiation detectors 100. The printed circuit board 400 may have an area 405 not covered by the radiation detector 100 (e.g., an area for accommodating bonding wires 410). The radiation detector 100 may have an active region 190, which is the pixel 150 (e.g., ...). Figure 1 The location of the radiation detector 100. The radiation detector 100 may have a peripheral region 195 near its edge. The peripheral region 195 has no pixels, and the radiation detector 100 does not detect radiation particles incident on the peripheral region 195.

[0051] Figure 4 A schematic cross-sectional view of an image sensor 490 according to an embodiment is shown. The image sensor 490 may include components mounted to a system printed circuit board 450. Figure 3 Multiple packages of 200. Figure 4 Only two packages 200 are shown as examples. The electrical connection between the printed circuit board 400 and the system printed circuit board 450 can be achieved via bonding wires 410. To accommodate the bonding wires 410 on the printed circuit board 400, the printed circuit board 400 has an area 405 not covered by the radiation detector 100. To accommodate the bonding wires 410 on the system printed circuit board 450, the packages 200 have gaps between them. These gaps can be approximately 1 mm or larger. Radiation particles incident on the peripheral area 195, on the area 405, or on the gaps cannot be detected by the packages 200 on the system printed circuit board 450. A blind zone of a radiation detector (e.g., the radiation detector 100) refers to the area of ​​the radiation-receiving surface of the radiation detector where incident radiation particles cannot be detected by the radiation detector. A blind zone of a package (e.g., the package 200) refers to the area of ​​the radiation-receiving surface of the package where incident radiation particles cannot be detected by the radiation detector or by a radiation detector within the package. Figure 3 and Figure 4 In the example shown, the dead zone of the package 200 includes the peripheral region 195 and the region 405. The dead zone (e.g., 488) of an image sensor (e.g., image sensor 490) has a set of packages (e.g., packages mounted on the same printed circuit board, packages arranged in the same layer) including a combination of the dead zones of the packages in that set and the gaps between the packages.

[0052] The image sensor 490, including the radiation detector 100, may have a blind zone 488 in which incident radiation cannot be detected. However, the image sensor 490 can capture images of all parts of an object (not shown), and these captured images can then be stitched together to form a complete image of the entire object.

[0053] Figure 5AThis diagram schematically illustrates a perspective view of an imaging system 500 according to an embodiment. In this embodiment, the imaging system 500 may include a radiation source system 510 + 520 and an image sensor 490. For simplicity, only one radiation detector 100 of the image sensor 490 is shown. In this embodiment, the radiation source system 510 + 520 may include a radiation source 510 and a filter 520. In this embodiment, the filter 520 may include a small aperture 522. The small aperture 522 may have a circular, rectangular, or elliptical shape. In this embodiment, the filter 520 may include a silicon substrate (not shown) with a metal layer (not shown) on its surface. The metal layer may have holes that function as the small aperture 522. The silicon substrate does not necessarily have physical holes.

[0054] For simplicity, Figure 5A Only the active region 190 of the radiation detector 100 is shown (i.e., other parts of the radiation detector 100 are not shown). In an embodiment, an object 530 may be placed between the radiation source system 510 + 520 and the radiation detector 100.

[0055] In an embodiment, the imaging system 500 can operate with multiple exposures as follows. During the first exposure, a pencil-shaped radiation beam 513a can be emitted from the aperture 522 of the filter 520 and aligned with a target region 513at on the active region 190. If the entire region or point is exposed to the radiation beam in a vacuum, the radiation beam is said to be aligned with the region or point (i.e., in the absence of object 530). In this case, it can also be said that the region or point is aligned with the radiation beam, or that the radiation beam is aligned with the region or point. Assume that the pencil-shaped radiation beam 513a intersects with the object 530 and then incident on the incident region 513ai on the active region 190.

[0056] In one embodiment, during the first exposure, the radiation detector 100 can capture an image of the pencil-shaped radiation beam 513a. Next, in another embodiment, the radiation detector 100 can determine the position of the incident region 513ai based on the captured image of the pencil-shaped radiation beam 513a. Next, in yet another embodiment, the radiation detector 100 can determine an offset 513ax between the incident region 513ai and the target region 513at based on the determined position of the incident region 513ai.

[0057] In one embodiment, the pencil-shaped radiation beam 513a can be generated by sending a tapered radiation beam 513.1 from the radiation source 510 to the aperture 522 of the filter 520. In another embodiment, only the portion of the tapered radiation beam 513.1 incident on the aperture 522 is allowed to pass through the filter 520, thereby generating the pencil-shaped radiation beam 513a.

[0058] Next, in the embodiments, reference will be made to Figure 5B During the second exposure, a pencil-shaped radiation beam 513b can be emitted from the aperture 522 of the filter 520 and aligned with the target region 513bt on the active region 190. It is assumed that the pencil-shaped radiation beam 513b intersects the object 530 and is then incident on the incident region 513bi on the active region 190. In this disclosure, the terms "first," "second," and other ordinal numbers are used for ease of reference only and do not imply any arbitrary temporal order or location of occurrence. For example, the mere use of "first" and "second" does not imply that a second exposure is performed after a first exposure. For another example, the mere use of "first" and "second" does not imply that the first and second exposures are performed within the same imaging system (e.g., imaging system 500).

[0059] In one embodiment, during the second exposure, the radiation detector 100 can capture an image of the pencil-shaped radiation beam 513b. Next, in another embodiment, the radiation detector 100 can determine the position of the incident region 513bi based on the captured image of the pencil-shaped radiation beam 513b. Next, in yet another embodiment, the radiation detector 100 can determine an offset 513bx between the incident region 513bi and the target region 513bt based on the determined position of the incident region 513bi.

[0060] In an embodiment, the pencil-shaped radiation beam 513b can be created as follows. After the first exposure is performed and before the second exposure is performed (i.e., between the first and second exposures), the filter 520 can be positioned relative to the radiation detector 100, the radiation source 510, and the object 530 (while the radiation detector 100, the radiation source 510, and the object 530 are stationary relative to each other) from... Figure 5A The position shown was moved to Figure 5B Another position shown (i.e., the right side). Then, in an embodiment, during the second exposure, a cone-shaped radiation beam 513.2 can be sent from the radiation source 510 to the aperture 522 of the filter 520, thereby producing a pencil-shaped radiation beam 513b.

[0061] Next, in this embodiment, after performing the second exposure, an additional exposure similar to the first and second exposures can be performed. Specifically, during the additional exposure, an additional pencil-shaped radiation beam (similar to pencil-shaped radiation beams 513a and 513b) can be emitted from the aperture 522. The filter 520 can be moved relative to the radiation detector 100 between the additional exposures. The associated offsets (similar to offsets 513ax and 513bx) can be determined in a similar manner.

[0062] Each pencil-shaped radiation beam, as described above, may intersect with or miss the object 530. The case where the pencil-shaped radiation beam intersects with the object 530 has been described above (e.g., the case of pencil-shaped radiation beam 513a described with reference to FIG5A). If the pencil-shaped radiation beam does not hit the object 530, the associated offset will be determined to be zero (because the associated incident area is the same as the associated target area).

[0063] Figure 5C A flowchart 580 summarizing the operation of the imaging system 500 according to an embodiment is shown. In step 582, in the embodiment, for i = 1, ..., M, a pencil-shaped radiation beam (i) can be transmitted onto an incident region (i) on the active region 190 of the radiation detector 100, wherein the pencil-shaped radiation beam (i) is aligned with a target region (i) on the active region 190, and where M is a positive integer. For example, refer to... Figure 5A The pencil-shaped radiation beam 513a can be sent and incident on the incident region 513ai of the active region 190 of the radiation detector 100, wherein the pencil-shaped radiation beam 513a can be aligned with the target region 513at on the active region 190.

[0064] In step 584, in an embodiment, for i = 1, ..., M, the offset (i) between the incident region (i) and the target region (i) can be determined. For example, refer to... Figure 5A The offset 513ax between the incident region 513ai and the target region 513at can be determined.

[0065] In summary, for any target region on the active region 190, the position of the associated incident region is determined based on the offset between the incident region and the target region. For example, in Figure 5A In this context, for the target region 513at, the position of the associated incident region 513ai is determined according to the offset 513ax. Similarly, in Figure 5BIn the context of the target region 513bt, the position of the associated incident region 513bi is determined based on the offset 513bx.

[0066] In an embodiment, the pencil-shaped radiation beam (i), i = 1, ..., M, can be an X-ray beam. In an embodiment, each point of the object 530 can be targeted by at least one of the pencil-shaped radiation beams (i), i = 1, ..., M. In other words, the pencil-shaped radiation beam (i), i = 1, ..., M, scans the entire object 530.

[0067] In an embodiment, when the entire object 530 is scanned as described above by the pencil-shaped radiation beam (i), i = 1, ..., M, the radiation detector 100 can determine the refractive index of each point of the object 530 based on all the determined offsets (i), i = 1, ..., M. In an embodiment, the size of each target region (i), i = 1, ..., M, can be at least the size of a pixel 150 of the radiation detector 100.

[0068] In the above embodiments, reference is made to Figure 5A and Figure 5B Only one pencil-shaped radiation beam is emitted during each exposure. For example, only the pencil-shaped radiation beam 513a is emitted during the first exposure. Similarly, only the pencil-shaped radiation beam 513b is emitted during the second exposure. In alternative embodiments, such as Figure 5D As shown, the pencil-shaped radiation beams (e.g., pencil-shaped radiation beams 513a and 513b) can be simultaneously transmitted from the filter 520 during the first exposure.

[0069] In one embodiment, during the first exposure, the radiation detector 100 can capture images of the pencil-shaped radiation beams 513a and 513b. Then, in another embodiment, the radiation detector 100 can determine the positions of the incident regions 513ai and 513bi based on the captured images. Then, in yet another embodiment, the radiation detector 100 can determine the offsets 513ax and 513bx based on the determined positions of the incident regions 513ai and 513bi.

[0070] In an embodiment, during the first exposure, pencil-shaped radiation beams 513a and 513b can be simultaneously generated by sending the conical radiation beam 513.1 from the radiation source 510 toward two apertures 522 and 522' of the filter 520. (That is, the filter 520 may have additional apertures 522' in addition to the apertures 522). In an embodiment, only the portion of the conical radiation beam 513.1 incident on the apertures 522 and 522' can be allowed to pass through the filter 520, thereby generating the pencil-shaped radiation beams 513a and 513b, respectively.

[0071] Typically, the filter 520 may have one or more apertures (similar to aperture 522). The more apertures the filter 520 has, the more pencil-shaped radiation beams (similar to pencil-shaped radiation beam 513a) can be simultaneously emitted from the filter 520 during each exposure, and therefore the object 530 can be scanned faster with the generated pencil-shaped radiation beams.

[0072] In the embodiment, reference Figure 5C Flowchart 580 shows that the radiation detector 100 can be used to capture images of the pencil-shaped radiation beam (i), i = 1, ..., M. In an embodiment, the offset (i) in the determination step 584 may include (A) determining the position (i) of the incident region (i) based on the captured images of the pencil-shaped radiation beam (i), and (B) determining the offset (i) based on the position (i) of the incident region (i).

[0073] For example, refer to Figure 5A The position of the incident region 513ai can be determined by (A) based on the captured image of the pencil-shaped radiation beam 513, and the offset 513ax can be determined by (B) based on the position of the incident region 513ai.

[0074] In the embodiment, reference Figure 5D The minimum distance 513d between the target region 513at and the target region 513bt can be at least one specified distance to avoid confusion about which pencil-shaped radiation beam is incident on which incident region. In an embodiment, typically, when the filter 520 has multiple apertures, (A) the minimum distance between any two points in any two target regions of any two radiation beams (i), i = 1, ..., M, and (B) those transmitted during any exposure in the imaging system 500 can be at least one specified distance.

[0075] In one embodiment, the specified distance can be expressed in absolute length units (e.g., micrometers). In an alternative embodiment, the specified distance can be expressed in the size of a pixel 150 of the radiation detector 100. For example, the specified distance could be 10 times the size of pixel 150.

[0076] In an embodiment, the incident region can be determined (e.g., Figure 5A The position of the incident region 513ai is improved, especially when the size of the incident region is smaller than the size of the pixel 150 of the radiation detector 100. Specifically, refer to Figure 5A For the pencil-shaped radiation beam 513a, additional pencil-shaped radiation beams (not shown) can be sent one after another to the active region 190, wherein each additional pencil-shaped radiation beam is parallel to and overlaps with the pencil-shaped radiation beam 513a. In an embodiment, these additional pencil-shaped radiation beams can be generated by moving the filter 520 with a small displacement relative to the radiation detector 100 and sending different conical radiation beams (similar to the conical radiation beam 513.1) from the radiation source 510 to the aperture 522. In an embodiment, these additional pencil-shaped radiation beams can be generated by moving the radiation detector 100 with a small displacement relative to the filter 520. Then, in an embodiment, a super-resolution algorithm can be applied to the images of the pencil-shaped radiation beam 513a and the additional pencil-shaped radiation beams (captured by the radiation detector 100) to obtain an enhanced image of the pencil-shaped radiation beam 513a. Then, in an embodiment, the position of the incident region 513ai can be determined based on the enhanced image of the pencil-shaped radiation beam 513a. Then, in an embodiment, the offset 513ax can be determined based on the determined position of the incident region 513ai.

[0077] Typically, reference Figure 5A – Figure 5D In the embodiment, for i = 1, ..., M, an additional pencil-shaped radiation beam B is added. ij j = 1, ..., Ni, where Ni is a positive integer, and each additional pencil-shaped radiation beam B ij j = 1, ..., Ni, parallel to and overlapping with the pencil-shaped radiation beam (i). In an embodiment, the pencil-shaped radiation beam (i), i = 1, ..., M, and the additional pencil-shaped radiation beam B ij Images of i = 1, ..., M and j = 1, ..., Ni can be captured using the radiation detector 100.

[0078] In an embodiment, for i = 1, ..., M, the super-resolution algorithm can be applied to the image of the pencil-shaped radiation beam (i) and the additional pencil-shaped radiation beam B. ij Images of j = 1, ..., Ni are used to generate an enhanced image (i) of the pencil-shaped radiation beam (i). In an embodiment, determining the offset (i) includes (A) determining the position (i) of the incident region (i) based on the enhanced image (i), and (B) determining the offset (i) based on the position (i) of the incident region (i).

[0079] Figure 6A This diagram schematically illustrates a perspective view of the imaging system 600 according to an embodiment. In this embodiment, the imaging system 600 may be similar to [other systems described in the previous section], except that the filter 520 is replaced by a filter 620. Figure 5A The imaging system 500. In an embodiment, the filter 620 may include a slit 622. In an embodiment, except for shape, the slit 622 may be structurally and functionally similar to the aperture 522 ( Figure 5A ).

[0080] In this embodiment, the imaging system 600 can be operated by performing multiple exposures as follows.

[0081] During the third exposure, a fan-shaped radiation beam 613a can be emitted from the slit 622 of the filter 620 and aligned with the target region 613 on the active region 190. Assume that the fan-shaped radiation beam 613a intersects the object 530 (partially shown in the figure for simplicity) and then incident on the incident region 613ai on the active region 190. In an embodiment, the radiation detector 100 can capture an image of the fan-shaped radiation beam 613a during the third exposure.

[0082] In an embodiment, the fan-shaped radiation beam 613a can be generated by sending a conical radiation beam 613.1 from the radiation source 510 to the slit 622 of the filter 620. In an embodiment, only the portion of the conical radiation beam 613.1 incident on the slit 622 is allowed to pass through the filter 620, thereby generating the fan-shaped radiation beam 613a. In an embodiment, as... Figure 6A As shown, the entire target region 613at can be located on the active region 190.

[0083] In the embodiment, reference Figure 6B After performing the third exposure, a first additional exposure similar to the third exposure can be performed sequentially. In an embodiment, such as... Figure 6BAs shown, the target area associated with the third exposure and the first additional exposure can cover the entire active region 190. In an embodiment, as... Figure 6B As shown, the target areas associated with the third exposure and the first additional exposure can be parallel to each other.

[0084] For example, refer to Figure 6A and Figure 6B After performing the third exposure, the filter 620 can be moved to the right (i.e., in a direction perpendicular to the slit 622) by a distance equal to the width 622w of the slit 622 relative to the radiation detector 100 and the object 530, and then one of the first additional exposures can be performed. The associated target area is as follows: Figure 6B The area shown is 613at.1. Subsequently, for example, the filter 620 may be moved further to the right relative to the radiation detector 100 by a distance equal to the width 622w of the slit 622, and then a next first additional exposure can be performed. The associated target area is as follows: Figure 6B The area shown is 613at.2.

[0085] Next, in the embodiments, reference will be made to Figure 6C After the first additional exposure, during the fourth exposure, a fan-shaped radiation beam 613b can be emitted from the slit 622 and aligned with a target region 613bt on the active region 190. Assume that the fan-shaped radiation beam 613b intersects the object 530 (partially shown in the figure for simplicity) and then incident on the incident region 613bi on the active region 190. In an embodiment, during the fourth exposure, the radiation detector 100 can capture an image of the fan-shaped radiation beam 613b.

[0086] In an embodiment, the fan-shaped radiation beam 613b can be generated as follows. After performing the first additional exposure, the filter 620 can be rotated relative to the radiation detector 100 such that the slit 622 rotates relative to the radiation detector 100 about an axis perpendicular to the filter 620. In an embodiment, the rotation angle can be greater than 0° and less than 180°. In an embodiment, the rotation angle can be 90° as shown. Then, a fourth exposure can be performed.

[0087] In one embodiment, during the fourth exposure, a conical radiation beam 613.2 can be sent from the radiation source 510 to the slit 622 of the filter 620. In another embodiment, only the portion of the conical radiation beam 613.2 incident on the slit 622 can be allowed to pass through the filter 620, thereby generating the fan-shaped radiation beam 613b.

[0088] In the embodiment, reference Figure 6D After performing the fourth exposure, a second additional exposure similar to the fourth exposure can be performed sequentially. In an embodiment, such as... Figure 6D As shown, the target area associated with the fourth exposure and the second additional exposure can cover the entire active region 190. In an embodiment, as... Figure 6D As shown, the target areas associated with the fourth exposure and the second additional exposure can be parallel to each other.

[0089] For example, refer to Figure 6C and Figure 6D After performing the fourth exposure, the filter 620 can be moved relative to the radiation detector 100 and the object 530 toward the observer (i.e., in a direction perpendicular to the slit 622) by a distance equal to the width 622w of the slit 622, and then one of the second additional exposures can be performed. The associated target area is as follows: Figure 6D The region shown is 613bt.1. Thereafter, for example, the filter 620 may be moved further toward the observer relative to the radiation detector 100 by a distance equal to the width 622w of the slit 622, and then a second additional exposure can be performed. The associated target region is as follows: Figure 6D The area shown is 613bt.2.

[0090] In an embodiment, after performing the second additional exposure, a common target region, wherein each common target region is (A) a target region associated with the third exposure and the first additional exposure (i.e., Figure 6B (a) and (b) are target areas that can be identified as being associated with the fourth exposure and the second additional exposure (i.e., Figure 6D The target area), and the offset associated with the identified common target area can be determined. For example, refer to Figure 6E The radiation detector 100 can identify a common target area 613ct, which is the common area of ​​(A) the target area 613at of the third exposure and (B) the target area 613bt of the fourth exposure.

[0091] Then, the offset 613cx associated with the identified common target region 613ct can be determined as follows. First, in an embodiment, the radiation detector 100 can determine the position of the common incident region 613ci (which is the common region of (A) the incident regions 613ai and (B) the incident regions 613bi of the fan-shaped radiation beam 613a) based on the images of the fan-shaped radiation beam 613a and the fan-shaped radiation beam 613b captured by the radiation detector 100 during the third and fourth exposures, respectively. Next, in an embodiment, the radiation detector 100 can determine the offset 613cx between the common incident region 613ci and the common target region 613ct based on the determined position of the common incident region 613ci.

[0092] Figure 6F A flowchart 680 illustrates a summary of the operation of the imaging system 600 according to an embodiment. In step 682, in an embodiment, the first sector radiation beam (e.g., the third exposure and its target area are as follows) Figure 6B The first additional exposure fan-shaped radiation beam shown) and the second fan-shaped radiation beam (e.g., the fourth exposure and its target area are as shown) Figure 6D The second additional exposure fan-shaped radiation beam shown can be incident on the active region 190 of the radiation detector 100, wherein for i = 1, ..., M, a pair (i) of a first fan-shaped radiation beam (e.g., fan-shaped radiation beam 613a) and a second fan-shaped radiation beam (e.g., fan-shaped radiation beam 613b) is incident on two incident regions (e.g., two incident regions 613ai and 613bi) on the active region 190, the two incident regions sharing a common incident region (i) (e.g., the common incident region 613ci) on the active region 190, where M is a positive integer, and where for i = ... 1, ..., M, the pair (i) (e.g., the fan-shaped radiation beams 613a and 613b) is aligned with two target regions (e.g., two target regions 613at and 613bt) on the active region 190, which share a common target region (i) (e.g., the common target region 613ct) on the active region 190.

[0093] In step 684, for i = 1, ..., M, the offset (i) between the common incident region (i) and the common target region (i) can be determined. For example, refer to Figure 6E The offset 613cx between the common incident region 613ci and the common target region 613ct can be determined.

[0094] In an embodiment, the first and second sector-shaped radiation beams used in the imaging system 600 may be X-ray beams. In an embodiment, each point of the object 530 may be aligned by each radiation beam of at least one pair of the pairs (i), i = 1, ..., M. In other words, each point of the object 530 is aligned by at least one radiation beam of the first sector-shaped radiation beam and at least one radiation beam of the second sector-shaped radiation beam.

[0095] In an embodiment, where each point of the object 530 is aligned with each radiation beam of at least one pair of the pairs (i), i = 1, ..., M, the radiation detector 100 of the imaging system 600 can be based on step 684 ( Figure 6F The refractive index of each point of the object 530 is determined by all the offsets (i), i = 1, ..., M, as determined in the [missing information]. In an embodiment, the size of each common target region (i), i = 1, ..., M, (e.g., the common target region 613ct) is at least the size of one pixel 150 of the radiation detector 100.

[0096] The above references Figures 6A-6E In one embodiment, only one fan-shaped radiation beam is sent to the filter 620 during each exposure. For example, as... Figure 6A As shown, only the fan-shaped radiation beam 613a is emitted during the third exposure. For example, as... Figure 6C As shown, only the fan-shaped radiation beam 613b is emitted during the fourth exposure. This is because the filter 620 has only one slit 622.

[0097] In an alternative embodiment, reference Figure 7A and Figure 7B The filter 620 may have an additional slit 622' in addition to the slit 622. Therefore, during the third exposure, in this embodiment, two fan-shaped radiation beams can be simultaneously emitted from the two slits 622 and 622' respectively aligned with the two target regions 613at and 613at'. Thus, as seen, the active region 190 is scanned by the fan-shaped radiation beams ( Figure 6B and Figure 6D The scanning of the object 530 by the fan-shaped radiation beam will be twice as fast.

[0098] Typically, the filter 620 may have one slit (e.g., slit 622) or multiple slits (similar to slit 622). The more slits the filter 620 has, the more fan-shaped radiation beams (similar to fan-shaped radiation beam 613a) can be simultaneously emitted from the slits during each exposure in the imaging system 600, and therefore the scanning of the object 530 can be performed faster.

[0099] In an embodiment, when multiple fan-shaped radiation beams are simultaneously transmitted from the filter 620 during exposure, to avoid confusion about which fan-shaped radiation beam is incident on which incident region, the minimum distance between any two points in any two target regions on the active region 190 of any two radiation beams transmitted during any exposure in the imaging system 600 (e.g., respectively at...) is specified. Figure 7B The distance 613d between two points A and B in the target regions 613at and 613at' can be at least one specified distance.

[0100] In an embodiment, the specified distance can be expressed in absolute length units (e.g., micrometers) or in the size of pixels 150 of the radiation detector 100. In an embodiment, the specified distance can be 10 times the size of pixels 150 of the radiation detector 100.

[0101] like Figure 7A As shown, in this embodiment, the two slits 622 and 622' can be parallel to each other. Therefore, as... Figure 7B As shown, during the third exposure, the two fan-shaped radiation beams (not shown) emitted from the two slits 622 and 622' are aligned with the two parallel target regions 613at and 613at'.

[0102] In an embodiment, the filter 620, having the two parallel slits 622 and 622', can be moved relative to the radiation detector 100 between multiple exposures (e.g., a third exposure, a first additional exposure, a fourth exposure, and a second additional exposure). Thus, as in Figure 6B and Figure 6D The active region 190 is scanned twice as seen in the image, with the fan-shaped radiation beams from the slits 622 and 622' scanning the object 530 twice during the multiple exposures.

[0103] In alternative embodiments, such as Figure 7C and Figure 7EAs shown, the two slits 622 and 622' of the filter 620 may not be parallel to each other. In an embodiment, the two slits 622 and 622' may be perpendicular to each other. In an embodiment, between two exposures, the filter 620 may move relative to the radiation detector 100 in a direction not parallel to either of the non-parallel slits 622 and 622'.

[0104] According to an embodiment, Figure 7D This is shown as the use of [something] during the third exposure and the first additional exposure. Figure 7C The result of the first scan of the imaginary plane by the fan-shaped radiation beams of the two non-parallel slits 622 and 622' is the two target regions 613at and 613at' and other target regions on the imaginary plane containing the active region 190 (not shown in the figure for simplicity).

[0105] Similarly, according to the embodiments, Figure 7F This is shown as the use of [source] during the fourth exposure and the second additional exposure. Figure 7E The result of a second scan of the imaginary plane by the fan-shaped radiation beams of the two non-parallel slits 622 and 622' is the two target regions 613bt and 613bt' on the imaginary plane, as well as other target regions. More specifically, in an embodiment, after the first additional exposure is performed, the... Figure 7C The filter 620 is obtained by rotating it 180°. Figure 7E The filter 620. Then, the filter 620 can be used to perform a second scan (which in embodiments can be similar to the first scan), thereby producing... Figure 7F The target area shown.

[0106] Figure 7G The target region on the imaginary plane is shown as a result of a first and second scan of the imaginary plane using the fan-shaped radiation beams from the slits 622 and 622'. In an embodiment, as... Figure 7G As shown, each point of the active region 190 can be (A) in at least one target region of the first scan and (B) in at least one target region of the second scan.

[0107] In the embodiment, reference Figure 6FFlowchart 680 shows that the radiation detector 100 can be used to capture images of the first sector radiation beam and the second sector radiation beam. In an embodiment, the offset (i) in the determination step 684 may include (A) determining the position (i) of the common incident region (i) based on the images of the two radiation beams of the two captured pairs (i), and (B) determining the offset (i) based on the position (i) of the common incident region (i).

[0108] For example, refer to Figure 6E The offset 613cx can be determined by (A) determining the position of the common incident region 613ci based on two captured images of the two radiation beams corresponding to the pair of fan-shaped radiation beams 613a and 613b, and (B) determining the offset 613cx based on the position of the common incident region 613ci.

[0109] In an embodiment, the common incident area can be determined (e.g., Figure 6E Improvements are made to the position of the common incident area 613ci, especially when the size of the common incident area is smaller than the size of the pixel 150 of the radiation detector 100.

[0110] Specifically, refer to Figure 6F Flowchart 680, in an embodiment, for each of the first and second sector radiation beams (e.g., Figure 6A The fan-shaped radiation beam 613a) can be supplemented with additional fan-shaped radiation beams, each parallel to and overlapping the first and second fan-shaped radiation beams (i.e., radiation beam 613a). In an embodiment, the radiation detector 100 can be used to capture images of the first and second fan-shaped radiation beams and their associated additional fan-shaped radiation beams.

[0111] In an embodiment, for each of the first and second sector-shaped radiation beams (e.g., Figure 6A The fan-shaped radiation beam 613a can be super-resolution algorithms applied to the image of the radiation beam (i.e., the radiation beam 613a) and the image of the additional fan-shaped radiation beam associated with the radiation beam, thereby producing an enhanced image of the radiation beam.

[0112] In an embodiment, determining the offset (i) in step 684 may include (A) determining the position (i) of the common incident region (i) based on two enhanced images of the two radiation beams of the pair, and (B) determining the offset (i) based on the position (i) of the common incident region (i). For example, refer to Figure 6EThe determination of the offset 613cx in step 684 may include (A) determining the position of the common incident region 613ci based on the two enhanced images of the two radiation beams 613a and 613b, and (B) determining the offset 613cx based on the position of the common incident region 613ci.

[0113] In the embodiment, reference Figure 6F In flowchart 680, the first sector-shaped radiation beams can be parallel to each other (e.g., as shown in the flowchart 680). Figures 6A-6B The third exposure and the first additional exposure (shown as the fan-shaped radiation beam 613a and other fan-shaped radiation beams), and the fourth exposure and the second additional exposure (shown as the second fan-shaped radiation beam and other fan-shaped radiation beams), but the first fan-shaped radiation beam and the second fan-shaped radiation beam may not be parallel to each other.

[0114] In the above embodiments, reference is made to Figures 5A-7G In the imaging system 500 / 600, between two exposures, when the radiation detector 100, the radiation source 510, and the object 530 are stationary relative to each other, the filter 520 / 620 is moved relative to the radiation detector 100, the radiation source 510, and the object 530.

[0115] In an alternative embodiment, between two exposures, the filters 520 / 620 may be moved in the same way as described in the above embodiments, but the radiation detector 100 may also move with the filters 520 / 620 relative to the object 530 and the radiation source 510, such that during each exposure in the imaging system 500 / 600, the radiation beam from the filters 520 / 620 is aligned with the same target area on the active region 190.

[0116] For example, refer to Figure 5A and Figure 5B In the imaging system 500, between the first and second exposures, the radiation detector 100 can be moved relative to the object 530 along with the filter 520, such that the target area 513at (e.g., Figure 5A As shown in the image (aligned by the pencil-shaped radiation beam 513a during the first exposure) and the target region 513bt (as shown in the image). Figure 5B (As shown, during the second exposure, the pencil-shaped radiation beam 513b is aligned with the target area 513at.)

[0117] For example, refer to Figure 5D In the imaging system 500, between two exposures, the radiation detector 100 can be moved relative to the object 530 along with the filter 520, such that the two pencil-shaped radiation beams from the two apertures 522 and 522' are aligned with two identical target regions (i.e., target regions 513at and 513bt) on the active region 190 during each exposure in the imaging system 500.

[0118] For example, refer to Figure 6A , Figure 6B , Figure 6C and Figure 6D In the imaging system 600, between two exposures, the radiation detector 100 and the filter 620 can be moved relative to the object 530 such that the fan-shaped radiation beam from the slit 622 is aligned with the same target region (i.e., target region 613at) on the active region 190 during each exposure in the imaging system 600.

[0119] For example, refer to Figure 7A and Figure 7B In the imaging system 600, between two exposures, the radiation detector 100 and the filter 620 can be moved relative to the object 530, such that the two pencil-shaped radiation beams from the two apertures 622 and 622' are aligned with two identical target areas on the active region 190 during each exposure in the imaging system 600 (i.e., Figure 7B Target areas 613at and 613at').

[0120] In the above embodiments, reference is made to Figures 5A-7G In the imaging system 500 / 600, the radiation detector 100 and the filter 520 / 620 are moved relative to the object 530 such that the radiation beam from the filter 520 / 620 is aligned with the same target area on the active area 190 during each exposure in the imaging system 500 / 600, wherein the radiation detector 100 has only one active area 190.

[0121] In alternative embodiments, in addition to using Figure 4 Except for the image sensor 490 replacing the radiation detector 100 in the imaging system 500 / 600, everything else (e.g., structure and function) can remain the same as described above. In an embodiment, the imaging system 500 / 600 including the image sensor 490 may operate as follows.

[0122] In one embodiment, during the initial exposure (i.e., the initial exposure), the target region may be on the active region 190 of the image sensor 490. Then, between two exposures in the imaging system 500 / 600, the image sensor 490 may be moved relative to the object 530 with the filters 520 / 620 such that the radiation beam from the filters 520 / 620 is aligned with the same target region on the active region 190 of the image sensor 490 during each exposure in the imaging system 500 / 600.

[0123] like Figure 8A As shown, in an embodiment, during the initial exposure, the pencil-shaped radiation beam 513a from the aperture 522 can be aligned with the target region 513at on the active region 190A of the image sensor 490 (assuming the image sensor 490 includes four active regions 190A, 190B, 190C, and 190D, which are spatially discontinuous through the blind zone 488). After the initial exposure, the image sensor 490 can be moved relative to the object 530 with the filter 520 such that during the next exposure, the pencil-shaped radiation beam 513b from the aperture 522 is aligned with the target region 513at. Figure 8B The same target region (i.e., target region 513at) on the active region 190A shown.

[0124] like Figure 8C As shown, in an embodiment, during the initial exposure, the two pencil-shaped radiation beams from the apertures 522 and 522' can be aligned with two target regions 513at and 513bt on the active regions 190A and 190B of the image sensor 490.

[0125] In one embodiment, after the initial exposure, the image sensor 490 may be moved relative to the object 530 along with the filter 520, such that during the next exposure, the two pencil-shaped radiation beams from the two pinholes 522 and 522' are aligned with the two identical target regions (i.e., the target regions 513at and 513bt) on the active regions 190A and 190B. In an alternative embodiment, during each exposure, the two pencil-shaped radiation beams from the pinholes 522 and 522' may be aligned with the two target regions 513at and 513bt on the same active region 190 (e.g., the active region 190A).

[0126] like Figure 9AAs shown, in one embodiment, during the initial exposure, the fan-shaped radiation beam from the slit 622 can be aligned with the target region 613at on the active region 190A of the image sensor 490. In another embodiment, after the initial exposure, the image sensor 490 can be moved with the filter 620 such that during the next exposure (not shown), the fan-shaped radiation beam from the slit 622 is aligned with the same target region (i.e., the target region 613at) on the active region 190A.

[0127] like Figure 9B As shown, in one embodiment, during the initial exposure, the two fan-shaped radiation beams from the two slits 622 and 622' can be aligned with two target regions on the active regions 190A and 190B of the image sensor 490. In another embodiment, after the initial exposure, the image sensor 490 and the filter 620 can be moved relative to the object 530 such that during the next exposure (not shown), the two fan-shaped radiation beams from the two slits 622 and 622' can be aligned with the same two target regions on the active regions 190A and 190B.

[0128] In an alternative embodiment, reference Figure 9B During the initial exposure, the two fan-shaped radiation beams from the two slits 622 and 622' can be aligned with two target regions on the same active region 190 (e.g., active region 190A). In another alternative embodiment (not shown in the figures), the filter 620 may include four parallel slits (similar to slits 622 and 622'), and during the initial exposure, four fan-shaped radiation beams from the four parallel slits of the filter 620 can be aligned with four target regions on four corresponding active regions 190A, 190B, 190C, and 190D of the image sensor 490.

[0129] like Figure 9C As shown, in an embodiment, during the initial exposure, the two fan-shaped radiation beams from the two slits 622 and 622' can be aligned with two target regions on the active region 190A of the image sensor 490.

[0130] In one embodiment, after the initial exposure, the image sensor 490 can be moved relative to the filter 620 such that during the next exposure (not shown), the two fan-shaped radiation beams from the two slits 622 and 622' are aligned with the same two target regions on the active region 190A. In an alternative embodiment (not shown), during the initial exposure, the two fan-shaped radiation beams from the slits 622 and 622' can be aligned with two target regions respectively on the two active regions 190 (e.g., active regions 190A and 190B).

[0131] Figure 9D A flowchart 980 is shown according to an embodiment, which summarizes and concludes the following: Figures 8A-8C The operation of the imaging system 500, wherein the image sensor 490 is used in place of the radiation detector 100.

[0132] In step 982, in an embodiment, for i = 1, ..., M, incident light can be sent into the incident region (i) (e.g., Figure 8A The pencil-shaped radiation beam (i) on the incident region 513ai) (e.g., Figure 8A The pencil-shaped radiation beam 513a), wherein the pencil-shaped radiation beam (i) is aligned with a target region (i) (e.g., the target region 513at) on the image sensor 490, wherein M is a positive integer, wherein the image sensor 490 includes P spatially discontinuous active regions 190 (e.g., active regions 190A-D), wherein P is an integer greater than 1, and wherein the incident region (i), i = 1, ..., M, and the target region (i), i = 1, ..., M, are on the P active regions 190.

[0133] In step 984, in an embodiment, for i = 1, ..., M, the offset (i) between the incident region (i) and the target region (i) can be determined. For example, refer to... Figure 8A The offset 513ax between the incident region 513ai and the target region 513at can be determined.

[0134] Typically, in embodiments, Figures 8A-8C The operation of the imaging system 500 can be similar to Figures 5A-5D The operation of the imaging system 500.

[0135] Figure 9E A flowchart 990 is shown according to an embodiment, which summarizes and concludes the following: Figures 9A-9CThe operation of the imaging system 600, wherein the image sensor 490 is used instead of the radiation detector 100.

[0136] In step 992, in an embodiment, the first fan-shaped radiation beam (e.g., the fan-shaped radiation beam of the third exposure and the first additional exposure, such as...) Figure 6A The fan-shaped radiation beam 613a) and the second fan-shaped radiation beam (e.g., the fan-shaped radiation beam of the fourth exposure and the second additional exposure, such as...) Figure 6C The fan-shaped radiation beam 613b can be sent incident on the image sensor 490, wherein for i = 1, ..., M, one of the first fan-shaped radiation beams (e.g., Figure 6A The fan-shaped radiation beam 613a) and one of the second fan-shaped radiation beams (e.g., Figure 6C A pair (i) of the fan-shaped radiation beams 613b) are incident on two incident regions (e.g., on the image sensor 490) of the image sensor 490. Figure 6E The two incident regions 613ai and 613bi share a common incident region (i) on the sensor 490 in the image (e.g., Figure 6E The common incident region 613ci), where M is a positive integer, and for i = 1, ..., M, the pair (i) aligns with two target regions on the image sensor 490 (e.g., Figure 6E The two target regions 613at and 613bt share a common target region (i) on the image sensor 490 (e.g., the common target region 613ct), wherein the image sensor 490 includes P spatially discontinuous active regions 190 (e.g., the four active regions 190A-D), where P is an integer greater than 1, wherein the common incident region (i), i = 1, ..., M, and the common target region (i), i = 1, ..., M, are on the P active regions 190.

[0137] In step 994, the offset (i) between the common incident region (i) and the common target region (i) can be determined. For example, refer to Figure 6E and Figure 9A The offset 613cx between the common incident region 613ci and the common target region 613ct can be determined. Typically, in embodiments, Figures 9A-9C The operation of the imaging system 600 can be similar to Figures 6A-7G The operation of the imaging system 600.

[0138] In the embodiment, reference Figures 8A-9CIn the imaging system 500 / 600, where the image sensor 490 is used instead of the radiation detector 100, the refractive index of each point of the object 530 can be determined as follows. For the imaging system 500 with the image sensor 490 ( Figures 8A-8C In an embodiment, the refractive index of each point of the object 530 can be based on (A) in Figure 9D The offset (i), i = 1, ..., M, determined in step 984, and the position of the target region (i), i = 1, ..., M, relative to the object 530 are used to determine the position. This is for the imaging system 600 having the image sensor 490. Figures 9A-9C In an embodiment, the refractive index of each point of the object 530 can be based on (A) in Figure 9E The offset (i), i = 1, ..., M, determined in step 994, and the position of the target region (i), i = 1, ..., M, relative to the object 530 are used to determine the position.

[0139] While various aspects and embodiments have been disclosed herein, other aspects and embodiments will be apparent to those skilled in the art. The various aspects and embodiments disclosed herein are for illustrative purposes and not restrictive, and their true scope and spirit should be determined by the claims herein.

Claims

1. An imaging method, comprising: Send M pencil-shaped radiation beams B toward the image sensor i i = 1, ..., M The pencil-shaped radiation beam B i Incident region R on the active region of the image sensor i superior, The pencil-shaped radiation beam B i Align the target region T on the active region i Where M is a positive integer, and i is a positive integer less than or equal to M. For pencil-shaped radiation beam B i Determine the incident region R i and the target region T i offset S between i .

2. The method of claim 1, wherein the active region is the only active region of the image sensor, and the active region is spatially continuous.

3. The method of claim 1, further comprising: Based on the offset S i Determine point P of the object. i The refractive index, i = 1, ..., M; The pencil-shaped radiation beam B i Incident at point P i superior.

4. The method of claim 1, wherein each of the target regions T i Not smaller than the size of one pixel of the image sensor.

5. The method as described in claim 1, The target area T i Any two of them, i = 1, ..., M, are spaced at least 10 times the width of a pixel of the image sensor.

6. The method as described in claim 1, The pencil-shaped radiation beam B i It is formed by guiding radiation through at least one small hole in the filter, and The method further includes moving the filter relative to the image sensor between multiple exposures.

7. The method of claim 1, further comprising: The pencil-shaped radiation beam B was photographed. i The image, i = 1, ..., M, Based on the captured pencil-shaped radiation beam B i The image determines the incident region R i Position L i , The determination of the offset S mentioned above i Based on the incident region R i The position L i .

8. The method of claim 1, further comprising: For the pencil-shaped radiation beam B i Send additional pencil-shaped radiation beam B ij , i = 1,...,M, j = 1,...,N i , where N i It is a positive integer, j is less than or equal to N. i A positive integer, and wherein each of the additional pencil-shaped radiation beams B ij With the pencil-shaped radiation beam B i Parallel and overlapping; The pencil-shaped radiation beam B was photographed. i and the additional pencil-shaped radiation beam B ij The image; and For the pencil-shaped radiation beam B i For the pencil-shaped radiation beam B i The image and the additional pencil-shaped radiation beam B ij The image is processed using a super-resolution algorithm to obtain the pencil-shaped radiation beam B. i Enhanced image A i , Based on the enhanced image A i Determine the incident region R i Position L i , The determination of the offset S mentioned above i Based on the incident region R i The position L i .

9. An imaging method, comprising: M fan-shaped radiation beams are sent toward the image sensor to the BP. i Each of the fan-shaped radiation beams is paired with BP. i It includes one of the first sector radiation beams and one of the second sector radiation beams, where i = 1, ..., M, where M is a positive integer and i is a positive integer less than or equal to M. Among them, one of the first sector-shaped radiation beams and one of the second sector-shaped radiation beams are paired with BP. i The light is incident on two incident areas on the active region of the image sensor, respectively, and the two incident areas share a common incident area R on the active region. i , Among them, for the fan-shaped radiation beam pair BP i , i = 1, ..., M, the fan-shaped radiation beam for BP i Two target regions are respectively aligned with the active region, and these two target regions share a common target region T on the active region. i , For the fan-shaped radiation beam pair BP i Let i = 1, ..., M, and determine the common incident region R. i and the aforementioned public target area T i offset S between i .

10. The method of claim 9, wherein the active region is the only active region of the image sensor, and the active region is spatially continuous.

11. The method of claim 9, further comprising: Based on the offset S i Determine point P of the object i The refractive index, i = 1, ..., M, wherein one of the fan-shaped radiation beams is for BP i Both fan-shaped radiation beams are incident on point P. i superior.

12. The method of claim 9, wherein each of the said common target regions T i The size is not less than one pixel of the image sensor, i = 1, ..., M.

13. The method as described in claim 9, Wherein, any two target regions on the active region simultaneously aligned by any two radiation beams of the first fan-shaped radiation beam are spaced apart by at least 10 times the width of one pixel of the image sensor.

14. The method as described in claim 9, The target regions on the active region that are aligned with the first sector-shaped radiation beam are parallel to each other.

15. The method of claim 9, The first sector-shaped radiation beam is formed by guiding radiation through at least one slit in the filter, and The method further includes moving the filter relative to the image sensor between multiple exposures.

16. The method of claim 9, The target region on the active region aligned with the first sector-shaped radiation beam is not parallel to the target region on the active region aligned with the second sector-shaped radiation beam.

17. The method of claim 9, The first fan-shaped radiation beam is formed by guiding radiation through a first slit in the filter, and the second fan-shaped radiation beam is formed by guiding radiation through a second slit in the filter. The first slits are parallel to each other, the second slits are parallel to each other, and the first slits are not parallel to the second slits.

18. The method of claim 9, further comprising: Images of the first and second fan-shaped radiation beams were captured. Based on the image of the fan-shaped radiation beam, the BP i Images of the two fan-shaped radiation beams were used to determine the common incident region R. i Position L i , The determination of the offset S mentioned above i Based on the common incident region R i The position L i .

19. The method of claim 9, further comprising: For the aforementioned fan-shaped radiation beam to BP i The first sector-shaped radiation beam, and a first additional sector-shaped radiation beam that is parallel to and overlaps with the first sector-shaped radiation beam; For the aforementioned fan-shaped radiation beam to BP i The second sector-shaped radiation beam, and a second additional sector-shaped radiation beam that is parallel to and overlaps with the second sector-shaped radiation beam; Images of the first sector radiation beam and the second sector radiation beam, as well as the first and second additional sector radiation beams associated with them, are captured; For the aforementioned fan-shaped radiation beam to BP i The first sector radiation beam is subjected to a super-resolution algorithm, which is applied to the image of the first sector radiation beam and the first additional sector radiation beam associated with the first sector radiation beam, thereby obtaining a first enhanced image of the first sector radiation beam. as well as For the aforementioned fan-shaped radiation beam to BP i The super-resolution algorithm is applied to the image of the second sector-shaped radiation beam and the second additional sector-shaped radiation beam associated with the second sector-shaped radiation beam to obtain a second enhanced image of the second sector-shaped radiation beam. Based on the aforementioned fan-shaped radiation beam, BP i The first and second enhanced images of the two fan-shaped radiation beams determine the common incident region R. i Position L i , The determination of the offset S mentioned above i Based on the common incident region R i The position L i .

20. The method of claim 9, wherein the second sector radiation beam is transmitted after the first sector radiation beam is transmitted.

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