Active gas generator

CN114982382BActive Publication Date: 2025-09-19TMEIC CORP (100 00)
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Patent Information

Application Number
CN202080091607.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2020-12-24
Publication Date
2025-09-19
Estimated Expiration
2040-12-24

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Abstract

The object of the present invention is to provide an active gas generating device that can improve the insulation resistance in the power supply space without reducing the amount of active gas generated. The housing (7) in the active gas generating device (100) of the present invention has a peripheral step area (79) arranged along the periphery of the central bottom area (78) and formed to be higher than the central bottom area (78). A gas separation structure is provided by a high-voltage electrode dielectric film (1) provided on the peripheral step area (79) to separate the gas flow between the power supply space (8) and the active gas generating space including the discharge space (3). A vacuum pump (15) provided outside the housing (7) sets the power supply space (8) to a vacuum state.
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Citation Information

Patent Citations

  • Active gas generation device

    WO2019138456A1

  • Plasma etching method

    JP2001326211A

  • Active gas generating apparatus

    US20200152424A1