Active gas generator
CN114982382BActive Publication Date: 2025-09-19TMEIC CORP (100 00)
Patent Information
- Application Number
- CN202080091607.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-12-24
- Publication Date
- 2025-09-19
- Estimated Expiration
- 2040-12-24
Smart Images

Figure CN114982382B_ABST
Abstract
The object of the present invention is to provide an active gas generating device that can improve the insulation resistance in the power supply space without reducing the amount of active gas generated. The housing (7) in the active gas generating device (100) of the present invention has a peripheral step area (79) arranged along the periphery of the central bottom area (78) and formed to be higher than the central bottom area (78). A gas separation structure is provided by a high-voltage electrode dielectric film (1) provided on the peripheral step area (79) to separate the gas flow between the power supply space (8) and the active gas generating space including the discharge space (3). A vacuum pump (15) provided outside the housing (7) sets the power supply space (8) to a vacuum state.
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Active gas generation device
WO2019138456A1
Plasma etching method
JP2001326211A
Active gas generating apparatus
US20200152424A1