量子点材料、发光器件及其制作方法、显示装置

By configuring the inner and outer groups of quantum dot materials, they break under ultraviolet light and ionize in aqueous solution. The electrostatic repulsion effect is used to pattern the quantum dot materials, which solves the problems of high-resolution patterning and environmental protection, and avoids the use of organic solvents.

CN115088088BActive Publication Date: 2026-07-17BOE TECHNOLOGY GROUP CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BOE TECHNOLOGY GROUP CO LTD
Filing Date
2020-12-25
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing technologies struggle to achieve high-resolution patterning of quantum dot materials, and the use of organic solvent developing solutions generates a large amount of waste liquid, polluting the environment.

Method used

The inner groups are configured to adsorb quantum dot materials onto the surface of the carrier film, while the outer groups break down under ultraviolet light and ionize in an aqueous solution. Patterning is achieved by utilizing electrostatic repulsion. An aqueous solution is used as the developing solution to avoid the use of organic solvents.

Benefits of technology

It has achieved the formation of high-resolution quantum dot patterns, reducing the generation of organic waste liquid and making it environmentally friendly.

✦ Generated by Eureka AI based on patent content.

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Abstract

本公开实施例公开了一种量子点材料、发光器件及其制作方法、显示装置,该量子点材料包括:量子点,以及与量子点表面连接的至少一个第一配体;第一配体包括:与量子点进行连接的内侧基团,与内侧基团连接的第一光敏基团,以及与第一光敏基团连接的外侧基团;其中,内侧基团被配置为使量子点材料吸附于载体膜层表面;第一光敏基团被配置为在紫外光的照射下发生断裂,使外侧基团脱离内侧基团;外侧基团被配置为在水溶液中能够发生电离使量子点材料呈正电性或负电性。
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