量子点材料、发光器件及其制作方法、显示装置
By configuring the inner and outer groups of quantum dot materials, they break under ultraviolet light and ionize in aqueous solution. The electrostatic repulsion effect is used to pattern the quantum dot materials, which solves the problems of high-resolution patterning and environmental protection, and avoids the use of organic solvents.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BOE TECHNOLOGY GROUP CO LTD
- Filing Date
- 2020-12-25
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies struggle to achieve high-resolution patterning of quantum dot materials, and the use of organic solvent developing solutions generates a large amount of waste liquid, polluting the environment.
The inner groups are configured to adsorb quantum dot materials onto the surface of the carrier film, while the outer groups break down under ultraviolet light and ionize in an aqueous solution. Patterning is achieved by utilizing electrostatic repulsion. An aqueous solution is used as the developing solution to avoid the use of organic solvents.
It has achieved the formation of high-resolution quantum dot patterns, reducing the generation of organic waste liquid and making it environmentally friendly.
Smart Images

Figure CN115088088B_ABST