Evaporation mask, evaporation mask device, evaporation device, and method for manufacturing organic device
CN115198230BActive Publication Date: 2026-04-14DAI NIPPON PRINTING CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- DAI NIPPON PRINTING CO LTD
- Filing Date
- 2022-04-08
- Publication Date
- 2026-04-14
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Figure CN115198230B_ABST
Abstract
The present disclosure provides an evaporation mask, an evaporation mask device, an evaporation device, and a method for manufacturing an organic device. The evaporation mask of an embodiment of the present disclosure includes a first surface, a second surface located on the opposite side of the first surface, and two or more through holes. The through holes include a first recess located on the first surface and a second recess located on the second surface. The evaporation mask includes a mask first region having a first surface residual rate representing a ratio of an area of the second surface remaining, and a mask second region having a second surface residual rate representing a ratio of an area of the second surface remaining, the second surface residual rate being greater than the first surface residual rate.
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Citation Information
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