Foreign matter drop prevention member and substrate processing apparatus

Abstract

The present invention provides a foreign matter falling prevention member and a substrate processing apparatus which can prevent a protective net provided on an upstream side of a vacuum pump or a pressure control valve from being clogged by foreign matter. The foreign matter falling prevention member is disposed at an exhaust port of a processing container in which the protective net is provided, and includes a first plate, a second plate disposed at the exhaust port side in such a manner as to have a first gap with respect to the first plate, and a first link bar linking the first plate and the second plate, the first plate having a first wall provided so as to extend along an end portion of the first plate to an opposite side of the exhaust port.

Description

Technical Field

[0001] This invention relates to foreign object landing prevention components and substrate processing apparatus. Background Technology

[0002] In vacuum pumps used in semiconductor manufacturing equipment, a protective mesh is provided to prevent foreign objects from entering the pump (for example, Patent Document 1). Furthermore, when a pressure control valve is provided upstream of the vacuum pump, a protective mesh is provided upstream of the pressure control valve.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 11-247790 Summary of the Invention

[0006] The technical problem that the invention aims to solve

[0007] In this invention, a technique is provided to prevent a protective mesh installed on the upstream side of a vacuum pump from being blocked by foreign objects.

[0008] Technical solutions for solving technical problems

[0009] According to one aspect of the present invention, a foreign object landing prevention component is provided, which is disposed at the exhaust port of a processing container provided with a protective net, comprising: a first plate; a second plate disposed on the exhaust port side with a first gap relative to the first plate; and a first connecting rod connecting the first plate and the second plate, wherein the first plate has a first wall disposed extending along the end of the first plate toward the opposite side of the exhaust port.

[0010] Invention Effects

[0011] In this invention, a technique is provided to prevent a protective mesh installed on the upstream side of a vacuum pump from being blocked by foreign objects. Attached Figure Description

[0012] Figure 1 This is an overall structural diagram of a substrate processing device according to one implementation method.

[0013] Figure 2 This is an enlarged view of the vicinity of the exhaust port of a substrate processing apparatus according to one embodiment.

[0014] Figure 3 This is a perspective view of the foreign object landing prevention component according to the first embodiment.

[0015] Figure 4 This is a top view of the foreign object landing prevention component according to the first embodiment.

[0016] Figure 5 This is an enlarged view of the area near the exhaust port where the foreign object landing prevention component of the second embodiment is installed.

[0017] Figure 6 This is a perspective view of the foreign object landing prevention component according to the second embodiment.

[0018] Figure 7 This is a top view of the foreign object landing prevention component according to the second embodiment.

[0019] Figure 8 This is a perspective view of the foreign object landing prevention component according to the third embodiment.

[0020] Figure 9 This is an enlarged view of the area near the exhaust port of the foreign object landing prevention component of the fourth embodiment.

[0021] Figure 10 This is a perspective view of the foreign object landing prevention component according to the fourth embodiment.

[0022] Figure 11 This is a top view of the foreign object landing prevention component according to the fourth embodiment.

[0023] Figure 12 This is a top view of the area where the foreign object landing prevention component of the fourth embodiment is provided.

[0024] Figure 13 This diagram illustrates the installation method of the foreign object landing prevention component according to the fourth embodiment.

[0025] Figure 14 This diagram illustrates the installation method of the foreign object landing prevention component according to the fourth embodiment.

[0026] Figure 15 This diagram illustrates the installation method of the foreign object landing prevention component according to the fourth embodiment.

[0027] Explanation of reference numerals in the attached figures

[0028] 1. Substrate processing device

[0029] 20A Exhaust Port

[0030] 26. Flange portion

[0031] 27 Pressure regulating valve

[0032] 28. Exhaust system

[0033] 29. Opening

[0034] 33 wall

[0035] 200, 200a, 200b, 200c, 200d Foreign object landing prevention components

[0036] 201, 211, 217 First board

[0037] 201w, 211w, 217w wall

[0038] 202, 212, 218 Second board

[0039] 212w1, 212w2, 218w wall

[0040] 203, 213, 219 First connecting rod

[0041] 204 protection net

[0042] 210, 216 Upper-layer components

[0043] 220 Middle Layer Components

[0044] 221 Third Board

[0045] 222 Fourth Board

[0046] 223 Second connecting rod

[0047] 230 Lower layer components

[0048] 231 Fifth Board

[0049] 232 Sixth Board

[0050] 233 Third connecting rod

[0051] 240 First lower layer component

[0052] 241 Seventh Board

[0053] 242 Eighth Board

[0054] 243 Fourth connecting rod

[0055] 246 Second Lower Layer Component

[0056] 247 Ninth Board

[0057] 248 Tenth Board

[0058] 249 Fifth connecting rod

[0059] 250, 255 Support components. Detailed Implementation

[0060] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In this specification and the drawings, constituent elements having substantially the same functional structure are designated by the same reference numerals, thereby omitting repeated descriptions of these constituent elements.

[0061] [Overall structure of substrate processing device 1]

[0062] First, refer to Figure 1 and Figure 2 The overall structure of a substrate processing apparatus 1 equipped with a foreign object landing prevention component 200 according to one embodiment of the present invention will be described.

[0063] Figure 1 This shows the overall structure of a substrate processing apparatus 1 according to one embodiment. Figure 2 This indicates an enlarged view of the area near the exhaust port 20A of the substrate processing apparatus 1 in one embodiment. Additionally, regarding... Figure 2 In the explanation, the upper part of the figure is referred to as the "upper side" and the lower part of the figure is referred to as the "lower side".

[0064] Figure 1 The substrate processing apparatus 1 shown is configured as a reactive ion etching (RIE) type substrate processing apparatus 1. The substrate processing apparatus 1 has, for example, a cylindrical cavity (processing container 10) made of a metal such as aluminum or stainless steel, which is grounded. Plasma treatment, such as etching, is performed on the substrate within the processing container 10. The processing container 10 has a cylindrical wall 13 with a defined outer shape. The wall 13 is formed by extending downwards.

[0065] A mounting stage 12, on which a semiconductor wafer (hereinafter referred to as wafer W) is placed as a substrate, is disposed within the processing container 10. The mounting stage 12 is made of aluminum, for example, and is supported by a cylindrical support 16 extending vertically upward from the bottom of the processing container 10 via an insulating cylindrical holding portion 14. A focusing ring 18, made of, for example, silicon or quartz, is disposed on the upper surface of the cylindrical holding portion 14 and surrounds the upper surface of the mounting stage 12 in an annular shape.

[0066] An exhaust passage 20 is formed between the inner side of the wall 13 of the processing container 10 and the outer side of the cylindrical support 16. An annular baffle 22 is installed in the exhaust passage 20. An exhaust port 20A located at the bottom of the exhaust passage 20 is connected to an exhaust device 28.

[0067] like Figure 2 As shown, a flange 26 is connected to the exhaust port 20A. Furthermore, the flange 26 has an opening 29 with an inner diameter A. A pressure regulating valve 27, such as an automatic pressure controller (APC) valve, is provided between the flange 26 and the exhaust device 28. The pressure regulating valve 27 is provided in communication with the opening 29 and controls the exhaust speed of the exhaust device 28. Furthermore, in Figure 2 The detailed structure of the pressure regulating valve 27 is omitted in the text.

[0068] Additionally, a protective mesh 204 is disposed on the upper surface of the flange 26 such that it covers the opening 29 of the flange 26. The protective mesh 204 may also be disposed on the lower surface of the flange 26. The protective mesh 204 prevents foreign objects such as threaded parts used for maintenance from entering (falling into) the venting device 28. The diameter of the protective mesh 204 is set to be larger than the inner diameter A of the opening 29 of the flange 26.

[0069] The foreign object falling prevention component 200 of this embodiment, described later, is disposed at the exhaust port 20A. The foreign object falling prevention component 200 is disposed, for example, on the protective net 204 or on the flange portion 26.

[0070] The exhaust device 28 can, for example, use an exhaust pump such as a turbo-molecular pump (TMP).

[0071] When using a turbomolecular pump, by causing the rotating blade 28b to rotate at high speed around the rotating shaft 28a, the gas on the upper side of the turbomolecular pump is discharged to the lower side of the turbomolecular pump.

[0072] A gate 30 is installed on the side wall of the processing container 10, which is opened and closed when the wafer W is fed in or when the wafer W is discharged.

[0073] The stage 12 is connected to a high-frequency power supply 32 for plasma generation via a power supply rod 36 and a matching device 34. The high-frequency power supply 32 supplies, for example, 60 MHz of high-frequency electrical power to the stage 12. In this way, the stage 12 also functions as a lower electrode.

[0074] A nozzle 38 is provided on the top of the processing container 10 as the upper electrode of the ground potential. High-frequency electrical power for plasma generation from the high-frequency power supply 32 is capacitively supplied between the stage 12 and the nozzle 38.

[0075] An electrostatic chuck 40 is provided on the upper surface of the stage 12 for holding the wafer W by means of electrostatic adsorption force.

[0076] The top nozzle 38 includes: an electrode plate 56 having multiple gas vents 56a; and an electrode support 58 that detachably supports the electrode plate 56. A buffer chamber 60 is provided inside the electrode support 58. The gas inlet 60a of the buffer chamber 60 is connected to a gas supply source 62 via a gas supply pipe 64. Using this structure, the desired gas can be supplied from the nozzle 38 into the processing container 10.

[0077] Inside the processing container 10, in the plasma generation space between the nozzle 38 and the stage 12, a vertical RF electric field is formed using a high-frequency power supply 32, and a high-density plasma is generated near the surface of the stage 12 through high-frequency discharge.

[0078] The control device 100 controls various components installed in the substrate processing apparatus 1, such as the gas supply source 62, the matching device 34, and the high-frequency power supply 32. Furthermore, the control device 100 is also connected to a main control computer (not shown).

[0079] The control device 100 includes a CPU (Central Processing Unit), ROM (Read Only Memory), and RAM (Random Access Memory) (not shown). The CPU executes plasma processing according to various schemes stored in the ROM, RAM, and other storage areas.

[0080] The scheme contains control information for the device corresponding to the processing conditions, namely processing time, temperature inside the processing container 10 (temperature of the upper electrode, temperature of the side wall of the processing container 10, temperature of the electrostatic chuck, etc.), pressure (gas exhaust), high-frequency power and / or voltage, and flow rate of various processing gases, etc.

[0081] [First Implementation Method]

[0082] In etching or film-forming apparatuses, deposits sometimes form on the chamber walls due to the use of film-forming gases. As these deposits grow, they sometimes detach from the chamber walls and fall as foreign matter due to their own weight. A protective mesh can prevent these detached deposits from entering the vacuum pump or pressure control valves. However, because the detached deposits are larger than the mesh size of the protective mesh, they can clog a portion of it. This reduces conductivity.

[0083] The foreign object landing prevention component of the present invention prevents a decrease in fluidity by preventing the detached deposits (sediments) from falling onto the protective net.

[0084] Next, refer to Figure 2 , Figure 3 and Figure 4 The foreign object landing prevention member 200a of the first embodiment will be described. Furthermore, the foreign object landing prevention member 200a is provided in the extended portion at the lower part of the exhaust passage 20.

[0085] Figure 3 and Figure 4 The figures show a perspective view and a top view of the foreign object landing prevention component 200a according to the first embodiment.

[0086] like Figure 3 and Figure 4As shown, the foreign object landing prevention component 200a of the first embodiment has a first plate 201 and a second plate 202 (see reference). Figure 2 The second plate 202 has an opening 202h and is disposed on the exhaust device 28 side with a first gap L1 relative to the first plate 201.

[0087] The first plate 201 has a wall 201w that extends along the end of the first plate 201 to the opposite side relative to the exhaust device 28. The wall 201w prevents deposits (sludge) that fall and accumulate on the first plate 201 from falling toward the exhaust device 28.

[0088] In addition, such as Figure 4 As shown, the opening 202h of the second plate 202 is covered by the first plate 201 when viewed from above.

[0089] Here, "top view" refers to the direction perpendicular to the side of the processing container 10 of the first plate 201. Figure 2 (Observe the foreign object landing prevention component 200a on the upper side)

[0090] The first plate 201 and the second plate 202 are preferably formed of a material that is heat-resistant and resistant to corrosion by plasma and acid. Furthermore, the first plate 201 and the second plate 202 are preferably formed of a material that has sufficient rigidity even when used as a thin plate, can be easily welded, and is not prone to arcing.

[0091] The specific materials used for the first plate 201 and the second plate 202 include, for example, stainless steel, aluminum, or ceramics.

[0092] Furthermore, it is preferable to coat the above-mentioned materials with a coating agent containing nickel and fluorine. This further improves heat resistance, resistance to plasma and acid corrosion, and rigidity.

[0093] In addition, the first plate 201 and the second plate 202 can be formed from the same material or from different materials.

[0094] As the first plate 201, a circular plate component that appears circular when viewed from above can be used, but it is not limited to a circular plate component that appears circular when viewed from above. For example, depending on the shape of the part where the foreign object falling prevention component 200a is disposed, a plate component that appears rectangular or elliptical when viewed from above can also be used as the first plate 201.

[0095] As the second plate 202, a ring member having a circular opening 202h when viewed from above can be used, but it is not limited to this. As the second plate 202, it can be selected according to the shape of the part where the foreign object falling prevention member 200a is disposed; for example, a plate member that is rectangular when viewed from above can be used.

[0096] Furthermore, the second plate 202 can be a structure with one opening 202h or a structure with multiple openings 202h. In the case where multiple openings 202h are formed, all openings 202h are covered by the first plate 201 when viewed from above.

[0097] Furthermore, the shape of the opening 202h of the second plate 202 is... Figure 3 and Figure 4 The example shown is a circle, but it is not limited to circles; it can also be a rectangle or an ellipse.

[0098] As described above, the opening 202h of the second plate 202 is covered by the first plate 201 when viewed from above. That is, the diameter d of the opening 202h of the second plate 202 is set to be smaller than the diameter D of the first plate 201. In addition, the diameter D of the first plate 201 is set to be larger than the inner diameter A of the opening 29 of the flange 26.

[0099] Furthermore, in the first embodiment, the foreign object landing prevention member 200a is arranged, for example, with the first plate 201 and the second plate 202 parallel to each other. The foreign object landing prevention member 200a also has, for example, a first connecting rod 203 extending perpendicularly from the surface of the first plate 201 facing the second plate 202, and vice versa. The first connecting rod 203 connects the first plate 201 and the second plate 202, and when the second plate 202 is mounted on the flange portion 26, it serves to support the first plate 201.

[0100] The first connecting rod 203 can be a structure with a predetermined length or a structure that can extend. The degree of change in exhaust efficiency caused by the installation of the foreign object landing prevention component 200a also depends on the length of the first connecting rod 203 (first gap L1), the shape of the exhaust passage 20 of the substrate processing device 1, etc. However, by making the first connecting rod 203 a structure that can extend, various substrate processing devices 1 can be accommodated.

[0101] Furthermore, the first plate 201 and the second plate 202 can be connected by one first connecting rod 203 or by multiple first connecting rods 203. That is, multiple first connecting rods 203 can also be provided. When connected by multiple first connecting rods 203, the rigidity of the foreign object falling prevention component 200a can be improved.

[0102] Like the first plate 201 and the second plate 202, the first connecting rod 203 preferably has heat resistance and resistance to plasma and acid corrosion. Furthermore, the first connecting rod 203 is preferably formed of a material that has sufficient rigidity even when used as a thin plate, is easy to weld, and is not prone to arcing.

[0103] The specific material for the first connecting rod 203 can be, for example, stainless steel, aluminum, or ceramic. Alternatively, a material obtained by coating the aforementioned component with a coating agent containing nickel and fluorine can also be used. This further improves heat resistance, resistance to plasma and acid corrosion, and rigidity.

[0104] When the foreign object landing prevention component 200a of the first embodiment is applied to the substrate processing apparatus 1, such as Figure 2 As shown, it is positioned on the protective mesh 204. At this time, the side of the second plate 202 opposite to the side of the first plate 201 is positioned in contact with the protective mesh 204. That is, the second plate 202 is positioned on the exhaust device 28 side with a first gap L1 relative to the first plate 201.

[0105] Next, the effects of the foreign object falling prevention member 200a of the first embodiment will be explained. The foreign object falling prevention member 200a of the first embodiment is provided such that it covers the opening 29 of the flange portion 26 when viewed from above. Therefore, the deposits falling from the upper part of the exhaust passage 20 fall onto the first plate 201. By having the deposits fall onto the first plate 201, it prevents them from falling onto the protective net 204 and clogging the protective net 204.

[0106] The foreign object falling prevention component 200a of the first embodiment is provided with the first plate 201 and the second plate 202 separated by a first gap L1, so it does not obstruct the exhaust of the exhaust device 28 and can prevent the accumulation (deposits) from clogging the protective net 204.

[0107] Wall 201w is an example of the first wall.

[0108] [Second Implementation]

[0109] Next, refer to Figure 5 , Figure 6 and Figure 7 The foreign object landing prevention member 200b of the second embodiment will be described. The foreign object landing prevention member 200b of the second embodiment includes the structure of the foreign object landing prevention member 200a of the first embodiment, and differs in that it includes a support member 250 disposed on the exhaust device 28 side relative to the second plate 202 and supporting the second plate 202. In addition, the foreign object landing prevention member 200b is provided in the extended portion of the lower part of the exhaust passage 20.

[0110] Figure 5 This indicates that the foreign object landing prevention component 200b of the second embodiment is disposed in... Figure 1 The image shows an enlarged view of the area near the exhaust port 20A of the substrate processing apparatus 1. Figure 6 and Figure 7 The figures show a perspective view and a top view of the foreign object landing prevention component 200b according to the second embodiment. Furthermore, regarding... Figure 5 In the explanation, the upper part of the figure is referred to as the "upper side" and the lower part of the figure is referred to as the "lower side".

[0111] like Figure 5 and Figure 6 As shown, the foreign object landing prevention component 200b of the second embodiment has an upper component 210, a middle component 220, and a lower component 230, which are arranged in this order from the processing container 10 side ( Figure 5 (The upper side) configuration.

[0112] The upper component 210 has a first plate 211, a second plate 212, and a first connecting rod 213. The first plate 211 and the first connecting rod 213 have the same structure as the first plate 201 and the first connecting rod 203 of the foreign object falling prevention component 200a in the first embodiment.

[0113] The second plate 212 has a wall 212w1 along its inner end. Additionally, the second plate 212 has a wall 212w2 along its outer end. Walls 201w and 201w2 prevent deposits (sludge) falling and accumulating on the second plate 212 from falling toward the exhaust device 28.

[0114] The middle layer component 220 and the lower layer component 230 are support components 250 that support the upper layer component 210.

[0115] The middle layer component 220 includes: a third plate 221 having an opening; and a fourth plate 222 having an opening and disposed on the exhaust device 28 side with a predetermined gap relative to the third plate 221. Furthermore, the middle layer component 220 has a second connecting rod 223 connecting the third plate 221 and the fourth plate 222.

[0116] The third plate 221, the fourth plate 222, and the second connecting rod 223 can be made of the same materials as the components constituting the upper component 210. Furthermore, these components can be formed from the same material or from different materials.

[0117] As the third plate 221, for example, a ring member with a circular opening when viewed from above can be used, but it is not limited to this. As the third plate 221, it can be selected according to the shape of the part where the foreign object falling prevention member 200b is disposed; for example, a plate member that is rectangular when viewed from above can be used.

[0118] As the fourth plate 222, for example, a ring member with a circular opening when viewed from above can be used, but it is not limited to this. As the fourth plate 222, it can be selected according to the shape of the part where the foreign object falling prevention member 200b is disposed; for example, a plate member that is rectangular when viewed from above can be used.

[0119] In addition, it is preferable that the diameter of the openings of the third plate 221 and the fourth plate 222 is larger than that of the opening 212h.

[0120] The foreign object falling prevention component 200b of the second embodiment, for example, has a second connecting rod 223 extending perpendicularly from the surface of the third plate 221 facing the fourth plate 222 and the surface of the fourth plate 222 facing the fourth plate 222. The second connecting rod 223 is provided in a manner that connects the third plate 221 and the fourth plate 222.

[0121] The lower component 230 includes a fifth plate 231 having an opening, and a sixth plate 232 having an opening and disposed on the exhaust device 28 side with a predetermined gap relative to the fifth plate 231. Furthermore, the lower component 230 has a third connecting rod 233 connecting the fifth plate 231 and the sixth plate 232.

[0122] The structure of the lower component 230 can be the same as that of the middle component 220, but it is not limited to this. The plate components constituting the middle component and the plate components constituting the lower component can also be composed of different shapes and components.

[0123] When the foreign object landing prevention component 200b of the second embodiment is applied to the substrate processing apparatus 1, such as Figure 5 As shown, the foreign object landing prevention component 200b is disposed on the protective net 204. At this time, the side of the sixth plate 232 opposite to the side of the fifth plate 231 is disposed in contact with the protective net 204.

[0124] Next, the effects of the foreign object falling prevention member 200b in the second embodiment will be explained. The foreign object falling prevention member 200b in the first embodiment is provided such that it covers the opening 29 of the flange portion 26 when viewed from above. Therefore, deposits falling from the upper part of the exhaust passage 20 fall onto the first plate 211 or the second plate 212. By having the deposits fall onto the first plate 211 or the second plate 212, it prevents them from falling onto the protective net 204 and clogging the protective net 204.

[0125] The foreign object falling prevention component 200b of the second embodiment is provided with the first plate 211 and the second plate 212 separated by a first gap L1, so it does not obstruct the exhaust of the exhaust device 28 and can prevent the accumulation (deposits) from clogging the protective net 204.

[0126] Furthermore, in the foreign object landing prevention component 200b, the first plate 211 and the second plate 212 are arranged with a first gap L1. Therefore, by utilizing the foreign object landing prevention component 200b, the exhaust efficiency of the exhaust device 28 is hardly reduced. Thus, it also has the advantage that the arrangement of the foreign object landing prevention component 200b has almost no impact on the substrate processing process.

[0127] Furthermore, the foreign object falling prevention component 200b utilizes a support component 250 composed of a middle layer component 220 and a lower layer component 230 to form a second gap L2 between the lower surface of the second plate 212 and the upper surface of the protective net 204. This further suppresses the reduction in exhaust efficiency of the exhaust device 28.

[0128] Furthermore, the foreign object landing prevention component 200b includes an upper component 210, a middle component 220, and a lower component 230, which can be stacked separately at the installation location of the foreign object landing prevention component 200b. Therefore, it can be easily installed even in narrow spaces communicating with the installation location. As a result, maintenance time caused by the installation and removal of the foreign object landing prevention component 200b can be shortened.

[0129] Furthermore, in the second embodiment, the configuration of the foreign object landing prevention member 200b, which consists of one upper layer member 210, one middle layer member 220, and one lower layer member 230, has been described, but it is not limited to this. For example, the foreign object landing prevention member 200b may include only one upper layer member 210, or it may have multiple middle layer members 220 and multiple lower layer members 230.

[0130] Wall 211w is an example of the first wall. Wall 212w1 and Wall 212w2 are examples of the second wall.

[0131] [Third Implementation Method]

[0132] Next, refer to Figure 8 The foreign object landing prevention member 200c of the third embodiment will be described. The foreign object landing prevention member 200c of the third embodiment differs from the lower component 230 of the foreign object landing prevention member 200b of the second embodiment in that the lower component is composed of a first lower component 240 and a second lower component 246. Furthermore, a support member 255 is composed of a middle component 220, the first lower component 240, and the second lower component 246. Additionally, the foreign object landing prevention member 200c is provided in the extended portion at the lower part of the exhaust passage 20.

[0133] Figure 8 A perspective view showing the foreign object landing prevention component 200c according to the third embodiment.

[0134] like Figure 8 As shown, the foreign object landing prevention component 200c of the third embodiment has an upper component 210, a middle component 220, a first lower component 240, and a second lower component 246. The foreign object landing prevention component 200c prevents foreign objects from falling from the processing container 10 side ( Figure 5 The upper component 210 and the middle component 220 are arranged sequentially on the upper side of the middle component 220, and the first lower component 240 and the second lower component 246 are arranged on the opposite side of the processing container 10 of the middle component 220.

[0135] The upper component 210 and the middle component 220 have the same structure as the foreign object falling prevention component 200b in the second embodiment, so the description is omitted.

[0136] The first lower component 240 includes a seventh plate 241 having an arcuate shape and an eighth plate 242 having an arcuate shape, which are disposed on the exhaust device 28 side with a predetermined gap relative to the seventh plate 241. Furthermore, the first lower component 240 has a fourth connecting rod 243 connecting the seventh plate 241 and the eighth plate 242.

[0137] When the foreign object falling prevention member 200c of the third embodiment is applied to the substrate processing apparatus 1, it is disposed on the protective net 204. At this time, the side of the eighth plate 242 opposite to the side opposite to the seventh plate 241 is disposed in contact with the protective net 204.

[0138] The second lower component 246 includes a ninth plate 247 having an arcuate shape and a tenth plate 248 having an arcuate shape, which is disposed on the exhaust device 28 side with a predetermined gap relative to the ninth plate 247. Furthermore, the second lower component 246 has a fifth connecting rod 249 connecting the ninth plate 247 and the tenth plate 248.

[0139] Next, the effects of the foreign object landing prevention member 200c according to the third embodiment will be explained. Unlike the foreign object landing prevention member 200b of the second embodiment, the lower component of the foreign object landing prevention member 200c in the third embodiment is divided into a first lower component 240 and a second lower component 246. Therefore, it can be easily installed even in narrow spaces communicating with the installation location of the foreign object landing prevention member 200c. As a result, maintenance time caused by the installation and removal of the foreign object landing prevention member 200c can be shortened.

[0140] In addition, the third plate 221 is an example of the first annular component, and the fourth plate 222 is an example of the second annular component. The seventh plate 241 is an example of the first arc component, the eighth plate 242 is an example of the second arc component, the ninth plate 247 is an example of the third arc component, and the tenth plate 248 is an example of the fourth arc component.

[0141] [Fourth Implementation Method]

[0142] Next, refer to Figure 9 , Figure 10 and Figure 11 The foreign object landing prevention member 200d of the fourth embodiment will be described. The foreign object landing prevention member 200d of the fourth embodiment includes an upper component 216 that is different from the upper component 210 of the foreign object landing prevention member 200c of the third embodiment. In addition, the foreign object landing prevention member 200d is provided from the middle of the extension of the lower part of the exhaust passage 20.

[0143] Figure 9 This indicates that the foreign object landing prevention component 200d of the fourth embodiment is disposed in... Figure 1 An enlarged view of the vicinity of the foreign object landing prevention component 200d in the substrate processing apparatus 1 shown. Figure 10 and Figure 11 The figures show a perspective view and a top view of the foreign object landing prevention component 200b according to the second embodiment. Furthermore, regarding... Figure 9 In the explanation, the upper part of the diagram is referred to as the "upper side," and the lower part as the "lower side." Furthermore, Figure 12 This is a top view of the area where the foreign object landing prevention component 200d of the fourth embodiment is provided.

[0144] like Figure 9 and Figure 10 As shown, the foreign object landing prevention component 200d of the fourth embodiment has an upper component 216, a middle component 220, a first lower component 240, and a second lower component 246. The foreign object landing prevention component 200d is located from the processing container 10 side ( Figure 9 The upper component 216 and the middle component 220 are arranged sequentially on the upper side of the middle component 220, and the first lower component 240 and the second lower component 246 are arranged on the opposite side of the processing container 10 of the middle component 220.

[0145] The upper component 216 has a first plate 217, a second plate 218, and a first connecting rod 219. The first plate 217 has a semi-circular shape when viewed from above. In addition, the second plate 218 has an annular shape when viewed from above.

[0146] Viewed from above, the first plate 217 and the second plate 218 are positioned below the upper opening H2. Specifically, the first plate 217 and the second plate 218 are positioned outside the line L of the inner wall of the processing container 10 that forms the exhaust passage 20. The opening H2 indicates the opening 29 in the top view. Figure 12 The portion of A exposed in the plasma processing space (substrate processing space).

[0147] Deposits fall from the opening H2. Therefore, a first plate 217 and a second plate 218 are provided above the opening 29 of the flange 26 where the deposit falls. That is, in the top view of the opening 29 (… Figure 12 When A), the portion exposed in the plasma processing space (substrate processing space) is covered by either the first plate 217 or the second plate 218.

[0148] The first plate 217 has a wall 217w that extends along the end of the first plate 217 to the opposite side relative to the exhaust device 28. The wall 217w prevents deposits (sludge) that fall and accumulate on the first plate 217 from falling toward the exhaust device 28.

[0149] The second plate 218 has a wall 218w along its end. The wall 218w prevents the deposits (sediments) that fall and accumulate on the second plate 218 from falling toward the exhaust device 28.

[0150] The middle layer component 220, the first lower layer component 240, and the second lower layer component 246 have the same structure as in the third embodiment, so the description is omitted.

[0151] Next, the effects of the foreign object landing prevention member 200d according to the fourth embodiment will be explained. Based on the effects of the foreign object landing prevention member 200c according to the third embodiment, the foreign object landing prevention member 200d of the fourth embodiment improves mobility by reducing the size of the upper component 216. Furthermore, it can be easily installed even in narrower spaces communicating with the installation location. As a result, maintenance time caused by the installation and removal of the foreign object landing prevention member 200d can be shortened.

[0152] In addition, wall 217w is an example of the first wall, and 217w2 is an example of the second wall.

[0153] [Installation method for foreign object landing prevention components]

[0154] The installation method of the foreign object landing prevention component 200 will be described. Here, the foreign object landing prevention component 200d of the fourth embodiment will be used for description. Figure 13 , Figure 14 and Figure 15This figure illustrates the installation method of the foreign object landing prevention component 200d according to the fourth embodiment.

[0155] When installing the foreign object landing prevention component 200d, the first lower component 240 and the second lower component 246 are installed, followed by the installation of the middle component 220 and the upper component 216 in sequence.

[0156] Figure 13 This diagram illustrates the installation of the first lower component 240 and the second lower component 246. The first lower component 240 is inserted along arrow A1 between the protective mesh 204 provided on the flange 26 and the lower end of the lower surface 10S of the processing container 10. Furthermore, the second lower component 246 is inserted along arrow A2 between the protective mesh 204 provided on the flange 26 and the lower surface 10S70 of the processing container 10.

[0157] Next, as Figure 14 As shown, the middle layer component 220 is mounted on the first lower layer component 240 and the second lower layer component 246. Next, as... Figure 15 As shown, an upper layer component 216 is mounted on a middle layer component 220 that is mounted on a first lower layer component 240 and a second lower layer component 246. As described above, the foreign object landing prevention component 200d is mounted to the substrate processing apparatus 1.

[0158] The foreign object landing prevention component 200 and the substrate processing apparatus 1 equipped with the foreign object landing prevention component 200 have been described above through embodiments and examples. However, the present invention is not limited to the above embodiments and examples, and various modifications and improvements can be made within the scope of the present invention.

[0159] In the above embodiments, the substrate processing apparatus 1 is described as an etching processing apparatus that serves as a semiconductor device manufacturing apparatus, but it is not limited to this. The substrate processing apparatus 1 may also be other semiconductor device manufacturing apparatuses, such as film forming processing apparatuses using CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition), etc.

[0160] In addition, in the above embodiments, a semiconductor wafer W is used as the substrate, but it is not limited to this. For example, it can also be a glass substrate for FPD, a substrate for solar cells, etc.

Claims

1. A foreign object landing prevention component, characterized in that: The foreign object landing prevention component is located at the exhaust port of the processing container equipped with a protective net, and includes: First board; A second plate, which is disposed on the exhaust port side with a first gap relative to the first plate; and The first connecting rod connects the first plate and the second plate. The first plate has a first wall extending along the end of the first plate toward the opposite side of the exhaust port. The foreign object landing prevention component includes: A first annular component supporting the second plate; a second annular component; a second connecting rod connecting the first annular component and the second annular component; A first arcuate component supporting the second ring component; a second arcuate component; a third connecting rod connecting the first arcuate component and the second arcuate component; A third arcuate component supporting the second annular component; a fourth arcuate component; and a fourth connecting rod connecting the third arcuate component and the fourth arcuate component.

2. The foreign object landing prevention component as described in claim 1, characterized in that: The first plate and the second plate are arranged parallel to each other. The first connecting rod extends perpendicularly from the first plate to the second plate to the side of the first plate opposite to the second plate.

3. The foreign object landing prevention component as described in claim 1 or 2, characterized in that: The first connecting rod is provided in multiple ways.

4. The foreign object landing prevention component as described in claim 1 or 2, characterized in that: The first plate is a circular plate. The second plate is a ring with a circular opening that appears circular when viewed from above.

5. The foreign object landing prevention component as described in claim 1 or 2, characterized in that: The second plate has a second wall that extends along the end of the second plate toward the opposite side of the exhaust port.

6. The foreign object landing prevention component as described in claim 1, characterized in that: The second plate has an arc-shaped form that covers a portion of the first annular component when viewed from above. The first plate covers a portion of the opening of the first annular component.

7. A substrate processing apparatus, characterized in that, include: Exhaust pump; A processing container having an exhaust port in communication with the exhaust pump; A protective net is installed at the exhaust port; and Foreign object landing prevention component configured at the exhaust port The foreign object landing prevention component includes: First board; A second plate, which is disposed on the exhaust port side with a first gap relative to the first plate; and The first connecting rod connects the first plate and the second plate. The first plate has a first wall extending along the end of the first plate toward the opposite side of the exhaust port. The foreign object landing prevention component includes: A first annular component supporting the second plate; a second annular component; a second connecting rod connecting the first annular component and the second annular component; A first arcuate component supporting the second ring component; a second arcuate component; a third connecting rod connecting the first arcuate component and the second arcuate component; A third arc component supporting the second annular component; a fourth arc component; and a fourth connecting rod connecting the third arc component and the fourth arc component.

8. The substrate processing apparatus as described in claim 7, characterized in that: The second arc component and the fourth arc component are disposed between the exhaust port and the flange connected to the exhaust port.

9. The substrate processing apparatus as described in claim 7 or 8, characterized in that: A portion of the exhaust port is covered by either the first plate or the second plate when viewed from above, while a portion is exposed from both the first plate and the second plate when viewed from above.

10. The substrate processing apparatus as described in claim 7 or 8, characterized in that: The portion of the exhaust port exposed in the substrate processing space when viewed from above is covered by either the first plate or the second plate.

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