Method for manufacturing patterned organic film, apparatus for manufacturing patterned organic film, organic semiconductor device manufactured using the same, and integrated circuit including the same
By forming a hydrophobic organic film on a hydrophilic, water-insoluble substrate and using a mold transfer method, the problems of high cost and substrate damage in organic semiconductor film patterning are solved, realizing low-cost and high-efficiency organic film patterning, which is applicable to a variety of organic materials.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- THE UNIV OF TOKYO
- Filing Date
- 2021-03-10
- Publication Date
- 2026-07-10
AI Technical Summary
Existing technologies for patterning organic semiconductor films suffer from high costs, substrate damage, limited material selection, and poor versatility, making it difficult to achieve low-cost, non-destructive patterning.
A hydrophobic organic film is formed on a hydrophilic, water-insoluble substrate using a coating method. The organic film is then transferred to the target substrate using a mold with a raised or recessed pattern. Patterning is achieved through water or aqueous solution interface treatment.
It enables low-cost, non-destructive patterning of organic films, applicable to a wide range of organic materials, especially organic semiconductor materials, while maintaining high-performance electrical properties, simplifying the process and reducing costs.
Smart Images

Figure CN115244667B_ABST