Method for improving precision of integrated circuit and chip
By determining the current value of the metal wire and adjusting the connection point position, the process deviation problem caused by the metal wire wiring method was solved, the precision of integrated circuits was improved, and the high precision requirements in the chip manufacturing process were achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SG MICRO CORP
- Filing Date
- 2022-07-19
- Publication Date
- 2026-05-29
AI Technical Summary
In existing high-precision chip manufacturing technologies, process deviations caused by metal wire routing methods result in increased layout area and unreasonable arrangement, affecting chip precision.
By collecting the current values of multiple metal lines, the chip error source is identified, and the connection points of other metal lines connected to the error source are adjusted so that they are directly connected to the component port, thereby reducing process deviations caused by metal line resistance.
It improves the precision of integrated circuits, reduces process deviations caused by metal line resistance, avoids mutual interference between metal lines, and improves chip output accuracy. At the same time, it does not require changes to the width, length, or shape of the metal lines, saving layout area.
Smart Images

Figure CN115346978B_ABST