Display substrate and manufacturing method thereof, and display device

Abstract

The present disclosure provides a display substrate and a manufacturing method thereof, and a display device. The display substrate includes a display area, the display area includes an opening area, a first pixel area and an isolation area; the isolation area is located between the first pixel area and the opening area, the isolation area surrounds the opening area, and the boundary line between the opening area and the isolation area is a cutting line; the display substrate also includes: a crack blocking structure, a peeling blocking structure and a packaging structure, the crack blocking structure is located in the isolation area, the isolation area includes a reserved cutting transition area located between the crack blocking structure and the opening area; the peeling blocking structure is located in the reserved cutting transition area; the distance L between the side of the peeling blocking structure closest to the opening area and the cutting line satisfies: 0μm≤L≤30μm; the first part of the packaging structure is located on the side of the peeling blocking structure facing away from the substrate; the peeling blocking structure makes the surface of the display substrate in contact with the first part uneven.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display substrate and a manufacturing method thereof, and a display device. Background Art

[0002] With the continuous development of display technology, there are more and more active-matrix organic light-emitting diode (AMOLED) display products with built-in touch screens. At the same time, increasing the screen-to-body ratio of AMOLED display products has also attracted more and more attention. At present, in order to achieve a higher screen-to-body ratio, an opening area is generally reserved on the display screen of the display product to accommodate some additional components (such as cameras, sensors, etc.) included in the display product. Summary of the invention

[0003] The purpose of the present disclosure is to provide a display substrate and a manufacturing method thereof, and a display device.

[0004] In order to achieve the above objectives, the present disclosure provides the following technical solutions:

[0005] A first aspect of the present disclosure provides a display substrate, comprising a display area, wherein the display area comprises an opening area, a first pixel area and an isolation area; the isolation area is located between the first pixel area and the opening area, the isolation area surrounds the opening area, and a boundary line between the opening area and the isolation area is a cutting line; the display substrate further comprises:

[0006] a crack blocking structure, the crack blocking structure being located in the isolation region, the isolation region including a reserved cutting transition region between the crack blocking structure and the opening region;

[0007] A peeling barrier structure, wherein the peeling barrier structure is located in the reserved cutting transition area; a distance L between a side of the peeling barrier structure closest to the opening area and the cutting line satisfies: 0 μm≤L≤30 μm;

[0008] The packaging structure has a first portion located on a side of the stripping barrier structure facing away from the substrate; the stripping barrier structure makes the surface of the display substrate in contact with the first portion uneven.

[0009] Optionally, the peeling blocking structure includes at least one first blocking component, and the first blocking component is arranged around the opening area.

[0010] Optionally, the orthographic projection of the cutting line on the base of the display substrate at least partially overlaps with the orthographic projection of the first blocking component closest to the opening area on the base; or, the orthographic projection of the cutting line on the base does not overlap with the orthographic projection of the first blocking component closest to the opening area on the base.

[0011] Optionally, the peeling blocking structure includes a plurality of first blocking components, and the plurality of first blocking components are nested in sequence.

[0012] Optionally, a distance H2 between adjacent first blocking components satisfies: 10 μm≤H2≤30 μm.

[0013] Optionally, the crack blocking structure includes a plurality of second blocking components, the second blocking components are arranged around the opening area, and the plurality of second blocking components are nested in sequence.

[0014] Optionally, in a direction parallel to the base of the display substrate, the first blocking member and the second blocking member are arranged at equal intervals;

[0015] And / or, in a direction parallel to the base of the display substrate, an arrangement pitch of the first blocking members is greater than an arrangement pitch of the second blocking members.

[0016] Optionally, the first blocking component includes:

[0017] The first barrier pattern has a first notch on a side surface thereof.

[0018] Optionally, the first blocking pattern includes a first sub-pattern, a second sub-pattern and a third sub-pattern stacked in sequence along a direction away from the base of the display substrate, and in a direction parallel to the base, boundaries of the first sub-pattern and the third sub-pattern both exceed boundaries of the second sub-pattern, forming the first recess between the first sub-pattern and the third sub-pattern.

[0019] Optionally, the display substrate further comprises a thin film transistor located in the first pixel area, the thin film transistor comprises a source-drain electrode layer, the source-drain electrode layer comprises a first conductive layer, a second conductive layer and the third conductive layer which are sequentially stacked in a direction away from the substrate; the first sub-pattern is arranged in the same layer and material as the first conductive layer, the second sub-pattern is arranged in the same layer and material as the second conductive layer, and the third sub-pattern is arranged in the same layer and material as the third conductive layer; or,

[0020] The display substrate also includes a second source-drain metal layer located in the first pixel area, and the second source-drain metal layer includes a fourth conductive layer, a fifth conductive layer and the sixth conductive layer which are sequentially stacked in a direction away from the substrate; the first sub-pattern is arranged in the same layer and material as the fourth conductive layer, the second sub-pattern is arranged in the same layer and material as the fifth conductive layer, and the third sub-pattern is arranged in the same layer and material as the sixth conductive layer.

[0021] Optionally, at least part of the first blocking member further includes: a second blocking pattern and a third blocking pattern, the second blocking pattern is located between the first blocking pattern and a base of the display substrate, and the third blocking pattern is located between the second blocking pattern and the base.

[0022] Optionally, in the same first blocking component, the orthographic projection of the second blocking pattern on the substrate is located inside the orthographic projection of the third blocking pattern on the substrate.

[0023] Optionally, the display substrate further includes a sub-pixel driving circuit located in the first pixel area, the sub-pixel driving circuit includes a capacitor structure, the capacitor structure includes a first electrode plate and a second electrode plate that are oppositely arranged, and the first electrode plate is located between the second electrode plate and the base of the display substrate;

[0024] The second barrier pattern is provided in the same layer and material as the second electrode plate; and / or the third barrier pattern is provided in the same layer and material as the first electrode plate.

[0025] Optionally, the plurality of first blocking components are divided into a first portion of first blocking components and a second portion of first blocking components, and the first portion of first blocking components are located between the second portion of first blocking components and the plurality of second blocking components;

[0026] The first portion of the first blocking member includes the second blocking pattern and the third blocking pattern;

[0027] The second portion of the first blocking member does not include the second blocking pattern and the third blocking pattern;

[0028] The second blocking component has the same structure as the first blocking component of the first portion.

[0029] Optionally, the display substrate further includes:

[0030] a retaining wall structure, wherein the retaining wall structure is disposed in the isolation area, and an orthographic projection of the crack blocking structure on the base of the display substrate is located between an orthographic projection of the retaining wall structure on the base and an orthographic projection of the peeling blocking structure on the base;

[0031] The encapsulation structure extends from the first pixel region to the isolation region, and the encapsulation structure includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer stacked in sequence in a direction away from the substrate; the first inorganic encapsulation layer and the second inorganic encapsulation layer both include the first portion; the organic encapsulation layer is located on a side of the retaining wall structure away from the opening region;

[0032] The retaining wall structure includes a first retaining wall and a second retaining wall, wherein the first retaining wall and the second retaining wall are arranged in sequence in a direction close to the opening area, and in a direction perpendicular to the base, a height of the first retaining wall is lower than a height of the second retaining wall.

[0033] Optionally, the display substrate further includes:

[0034] A planar layer, a pixel defining layer and a spacer layer are sequentially stacked in a direction away from the substrate, wherein the planar layer, the pixel defining layer and the spacer layer are all located in the first pixel region;

[0035] The first retaining wall comprises a first retaining wall pattern and a second retaining wall pattern which are sequentially stacked in a direction away from the base;

[0036] The first retaining wall pattern is provided in the same layer and the same material as the pixel defining layer, and the second retaining wall pattern is provided in the same layer and the same material as the spacer layer; or, the first retaining wall pattern is provided in the same layer and the same material as the flat layer, and the second retaining wall pattern is provided in the same layer and the same material as the pixel defining layer;

[0037] The second retaining wall includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern which are sequentially stacked in a direction away from the substrate; the third retaining wall pattern is arranged in the same layer and with the same material as the flat layer, the fourth retaining wall pattern is arranged in the same layer and with the same material as the pixel defining layer, and the fifth retaining wall pattern is arranged in the same layer and with the same material as the spacer layer.

[0038] Optionally, the display substrate further includes:

[0039] A plurality of inner isolation columns, the plurality of inner isolation columns are arranged in the isolation area, the plurality of inner isolation columns are located on a side of the retaining wall structure away from the opening area, the inner isolation columns surround the opening area, the plurality of inner isolation columns are nested in sequence, and the side surface of the inner isolation column has a second notch;

[0040] A light-emitting functional layer includes a portion located in the first pixel area and a portion in the isolation area, and the portion of the light-emitting functional layer located in the isolation area is disconnected at a side of the inner isolation column.

[0041] Optionally, the display substrate further comprises a thin film transistor located in the first pixel area, the thin film transistor comprises a source-drain electrode layer, the source-drain electrode layer comprises a first conductive layer, a second conductive layer and the third conductive layer which are sequentially stacked in a direction away from the substrate; the inner isolation column comprises a first isolation pattern, a second isolation pattern and a third isolation pattern which are sequentially stacked in a direction away from the substrate, the first isolation pattern is arranged in the same layer and material as the first conductive layer, the second isolation pattern is arranged in the same layer and material as the second conductive layer, and the third isolation pattern is arranged in the same layer and material as the third conductive layer; or,

[0042] The display substrate also includes a second source-drain metal layer located in the first pixel area, and the second source-drain metal layer includes a fourth conductive layer, a fifth conductive layer and the sixth conductive layer which are sequentially stacked in a direction away from the substrate; the first isolation pattern is arranged on the same layer and with the same material as the fourth conductive layer, the second isolation pattern is arranged on the same layer and with the same material as the fifth conductive layer, and the third isolation pattern is arranged on the same layer and with the same material as the sixth conductive layer.

[0043] Based on the technical solution of the display substrate, a second aspect of the present disclosure provides a display device, comprising the above-mentioned display substrate.

[0044] Based on the technical solution of the display substrate, the third aspect of the present disclosure provides a method for manufacturing a display substrate, wherein the display substrate comprises a display area, the display area comprises an opening area, a first pixel area and an isolation area; the isolation area is located between the first pixel area and the opening area, the isolation area surrounds the opening area, and a boundary line between the opening area and the isolation area is a cutting line; the method for manufacturing the display substrate comprises:

[0045] manufacturing a crack blocking structure, wherein the crack blocking structure is located in the isolation region;

[0046] A stripping barrier structure is manufactured, wherein the stripping barrier structure is located in the reserved cutting transition area and the sacrificial cutting transition area; a distance L between the side of the stripping barrier structure closest to the opening area and the cutting line satisfies: 0 μm≤L≤30 μm;

[0047] Manufacturing a packaging structure, wherein a first portion of the packaging structure is located on a side of the peeling barrier structure facing away from the substrate; and the peeling barrier structure makes a surface of the display substrate in contact with the first portion uneven;

[0048] The step of forming the opening area and the isolation area includes: cutting the display substrate along the cutting line, the cutting line being the boundary line between the retained cutting transition area and the sacrificial cutting transition area, and removing all structures surrounded by the cutting line to form the opening area. BRIEF DESCRIPTION OF THE DRAWINGS

[0049] The drawings described herein are used to provide a further understanding of the present disclosure and constitute a part of the present disclosure. The illustrative embodiments of the present disclosure and their descriptions are used to explain the present disclosure and do not constitute an improper limitation on the present disclosure. In the drawings:

[0050] Figure 1 A schematic diagram of the structure of a display substrate provided in an embodiment of the present disclosure;

[0051] Figure 2 A first electron microscope image of a cutting transition area at the lower left corner of a via area provided in an embodiment of the present disclosure;

[0052] Figure 3 for Figure 1 A schematic diagram of a first cross section along the N1N2 direction;

[0053] Figure 4 for Figure 1 A second cross-sectional schematic diagram along the N1N2 direction;

[0054] Figure 5 for Figure 4 A schematic diagram of two first blocking components;

[0055] Figure 6 for Figure 4 An electron microscope image of the first blocking component;

[0056] Figure 7 for Figure 1 A schematic diagram of a third cross section along the N1N2 direction;

[0057] Figure 8 for Figure 1 A schematic diagram of a fourth cross section along the N1N2 direction;

[0058] Fig. 9 for Figure 1 A schematic diagram of the fifth cross section along the N1N2 direction;

[0059] Fig.10 for Figure 1 A sixth cross-sectional schematic diagram along the N1N2 direction;

[0060] Fig.11 for Figure 1 A schematic diagram of the seventh cross section along the N1N2 direction;

[0061] Fig.12 for Figure 1 The eighth cross-sectional view along the N1N2 direction;

[0062] Fig.13 for Figure 2 A schematic cross-sectional view of two first blocking components adjacent to the middle cutting line;

[0063] Fig.14 A second electron microscope image of the cut transition area at the lower left corner of the via area provided in an embodiment of the present disclosure;

[0064] Fig.15 for Fig.14 A schematic cross-sectional view of two first blocking components adjacent to the middle cutting line. DETAILED DESCRIPTION

[0065] In order to further illustrate the display substrate and its manufacturing method, and the display device provided by the embodiments of the present disclosure, a detailed description is given below in conjunction with the accompanying drawings.

[0066] like Figure 1 , Figure 3 and Fig. 9 As shown, the present disclosure provides a display substrate, including a display area and a peripheral area surrounding the display area; the display area includes an opening area 20, a first pixel area 10 and an isolation area 30; the isolation area 30 is located between the first pixel area 10 and the opening area 20, and the isolation area 30 surrounds the opening area 20. The isolation area 30 includes a reserved cutting transition area 301 close to the opening area 20, and the minimum width of the reserved cutting transition area 301 in a direction parallel to the substrate 60 includes 50 microns. The reserved cutting transition area 301 is only provided with a stacked organic layer and an inorganic layer, and the organic layer and the inorganic layer are both formed simultaneously with the corresponding film layer in the first pixel area 10. The display substrate is bonded to the cover plate by an adhesive.

[0067] The manufacturing process of the above-mentioned display substrate includes: forming a corresponding functional structure on the base 60, and then performing a punching process to form the opening area 20, then removing the protective film on one side of the provided adhesive, bonding the side of the adhesive without the protective film to the surface of the display substrate with the functional structure formed thereon, and then removing the protective film on the other side of the adhesive, and bonding the side of the adhesive facing away from the display substrate to the cover plate.

[0068] Since the retained cutting transition zone 301 is located at the periphery of the opening zone 20 and the retained cutting transition zone 301 does not include a functional structure, its surface is relatively flat, so that the adhesion between the packaging structure 65 located in the retained cutting transition zone 301 in the display substrate and the film layer thereunder is poor. In this way, in the process of removing the protective film on the other side of the adhesive, the packaging structure 65 located in the retained cutting transition zone 301 is easily peeled off, causing poor reliability of the display substrate.

[0069] Based on the above problems, please refer to Figure 4 , Figure 7 , Figure 8, Figures 10 to 12 The embodiment of the present disclosure provides a display substrate, including a display area, wherein the display area includes an opening area 20, a first pixel area 10 and an isolation area 30; the isolation area 30 is located between the first pixel area 10 and the opening area 20, the isolation area 30 surrounds the opening area 20, and the boundary line between the opening area 20 and the isolation area 30 is a cutting line 90; the display substrate also includes:

[0070] A crack blocking structure 31, wherein the crack blocking structure 31 is located in the isolation region 30, and the isolation region 30 includes a reserved cutting transition region 301 located between the crack blocking structure 31 and the opening region 20;

[0071] A peeling barrier structure 38, wherein the peeling barrier structure 38 is located in the reserved cutting transition area 301; a distance L between a side of the peeling barrier structure 38 closest to the opening area and the cutting line 90 satisfies: 0 μm≤L≤30 μm;

[0072] The packaging structure 65 has a first portion located on a side of the peeling barrier structure 38 facing away from the substrate 60 ; the peeling barrier structure 38 makes the surface of the display substrate in contact with the first portion uneven.

[0073] Exemplarily, the display substrate has a display area and a peripheral area surrounding the display area, wherein the display area includes a first pixel area 10, an opening area 20, and an isolation area 30 located between the first pixel area 10 and the opening area 20. The isolation area 30 is arranged around the opening area 20, and the first pixel area 10 is arranged around the isolation area 30.

[0074] Exemplarily, the display substrate includes a rectangular display area, and the opening area 20 is located at the upper left corner, the upper middle part or the upper right corner of the rectangular display area. There is no special requirement for the specific position and shape of the opening area 20. Exemplarily, the shape of the opening area 20 includes: circular or rectangular shapes.

[0075] The isolation region 30 is provided with an inorganic layer structure located on the substrate 60, and the inorganic layer structure includes multiple inorganic film layers stacked, each of which is formed into an integral structure with the corresponding inorganic film layer in the first pixel region 10 (such as the first gate insulating layer 33, the second gate insulating layer 34, the interlayer insulating layer 35, etc.), and the inorganic film layer can play the role of an insulating layer in the first pixel region 10. The flexibility of the inorganic film layer is poor, and when the opening region 20 is cut to form, the inorganic film layer at the cutting line 90 is prone to brittle fracture, and the crack is easy to use the inorganic film layer as a channel to further extend to the first pixel region 10, which affects the yield of the display substrate.

[0076] Exemplarily, the crack blocking structure 31 surrounds the opening area 20. The crack blocking structure 31 can separate adjacent inorganic film layers, thereby preventing multiple inorganic film layers from being stacked in contact with each other, and blocking the path for the crack to extend to the first pixel area 10.

[0077] For example, Figure 2 As shown, the reserved cutting transition area 301 is arranged around the opening area 20. It is worth noting that the display substrate includes a cutting transition area (such as Figure 2 The cutting transition zone includes a retained cutting transition zone 301 and a sacrificial cutting transition zone 302. The retained cutting transition zone 301 has the same structure as the sacrificial cutting transition zone 302. Both the retained cutting transition zone 301 and the sacrificial cutting transition zone 302 are formed with the stripping blocking structure 38.

[0078] The reserved cutting transition area 301 and the sacrificial cutting transition area 302 are divided by a cutting line 90. After cutting along the cutting line 90, the structure included in the reserved cutting transition area 301 is retained, and the structure included in the sacrificial cutting transition area 302 is removed to form the opening area 20. Since the specific position of the cutting line 90 is selected in the cutting transition area, and the entire cutting transition area is provided with the peeling blocking structure 38, therefore, no matter where the cutting line 90 is specifically selected in the cutting transition area, it can be ensured that the peeling blocking structure 38 is provided on the reserved cutting transition area 301 after cutting. The peeling blocking structure 38 can make the surface of the display substrate in contact with the first part uneven, increase the contact area between the first part and the film layer in contact thereunder, thereby well enhancing the adhesion between the first part and the film layer in contact thereunder, and reducing the risk of the first part peeling off from the display substrate.

[0079] Exemplarily, the distance L between the side of the peeling barrier structure 38 closest to the opening area and the cutting line 90 satisfies: 0 μm≤L≤30 μm; Fig.14 and Fig.15 As shown in FIG. 1 , when the orthographic projection of the side of the peeling barrier structure 38 closest to the opening area on the base of the display substrate coincides with the orthographic projection of the cutting line 90 on the base of the display substrate, L is 0 μm. Figure 2 and Fig.13 As shown, when the orthographic projection of the side of the peeling blocking structure 38 closest to the opening area on the base of the display substrate does not overlap with the orthographic projection of the cutting line 90 on the base of the display substrate, L satisfies: 0μm<L≤30μm.

[0080] Exemplarily, a distance L between a side of the peeling barrier structure 38 closest to the opening area and the cutting line 90 satisfies: 0 μm≤L≤25 μm.

[0081] Exemplarily, the distance between the side of the peeling blocking structure 38 closest to the opening area and the cutting line 90 includes: the distance between the orthographic projection of the side of the peeling blocking structure 38 closest to the opening area on the substrate and the orthographic projection of the cutting line 90 on the substrate of the display substrate.

[0082] At least a portion of the packaging structure 65 can cover the entire area of ​​the display substrate. The packaging structure 65 can effectively block external water vapor and oxygen from invading the interior of the display substrate, which is beneficial to extending the service life of the display substrate.

[0083] According to the specific structure of the display substrate described above, in the display substrate provided by the embodiment of the present disclosure, by providing the crack blocking structure 31 in the isolation area 30, the cracks near the opening area 20 are effectively blocked from extending into the first pixel area 10. At the same time, by providing the peeling blocking structure 38 in the reserved cutting transition area 301, the adhesion between the first part and the film layer in contact therewith is enhanced, the risk of the first part peeling off from the display substrate is reduced, and the reliability yield of the display substrate is ensured.

[0084] It should be noted that the display substrate provided in the embodiments of the present disclosure can be used not only in OLED, but also in display products such as quantum dots.

[0085] like Figures 4 to 12 As shown, in some embodiments, the peeling barrier structure 38 includes at least one first barrier component 381 , and the first barrier component 381 is disposed around the opening area 20 .

[0086] Exemplarily, the peeling blocking structure 38 includes one or more first blocking parts 381. When including one first blocking part 381, the first blocking part 381 should be as close as possible to the boundary of the opening area 20, that is, the cutting line 90; when including multiple first blocking parts 381, multiple first blocking parts 381 can be arranged in sequence at intervals along the direction away from the opening area 20.

[0087] Exemplarily, the first blocking member 381 can form a step difference so as to make the surface of the display substrate in contact with the first portion uneven.

[0088] The first blocking component 381 is arranged around the opening area 20, so that the first part can be well bonded with the film layer in contact therewith at each position around the opening area 20, thereby better reducing the risk of the first part peeling off from the display substrate and ensuring the reliability yield of the display substrate.

[0089] In some embodiments, Fig.14 and Fig.15 As shown, the orthographic projection of the cutting line 90 on the base 60 of the display substrate at least partially overlaps with the orthographic projection of the first blocking member 381 closest to the opening area 20 on the base 60; or Figure 2 and Fig.13 As shown, the orthographic projection of the cutting line 90 on the substrate 60 does not overlap with the orthographic projection of the first blocking component 381 closest to the opening area 20 on the substrate 60 .

[0090] like Figure 2 and Fig.13 As shown, exemplarily, when cutting along the cutting line 90, the cutting line 90 can be located between two adjacent first blocking parts 381, that is, the orthographic projection of the cutting line 90 on the substrate 60 does not overlap with the orthographic projection of the first blocking part 381 closest to the opening area 20 on the substrate 60.

[0091] like Fig.14 and Fig.15 As shown, illustratively, the cutting line 90 may fall on a first blocking component 381 , that is, when cutting is performed along the cutting line 90 , the first blocking component 381 is cut into two parts, one of which is subsequently removed.

[0092] Need to explain, Fig.13 and Fig.15 The portion enclosed by the dotted line is the portion to be removed subsequently, and the position of the portion will subsequently form the opening area 20.

[0093] like Figures 4 to 12 As shown, in some embodiments, the peeling blocking structure 38 includes a plurality of first blocking components 381 , and the plurality of first blocking components 381 are nested in sequence.

[0094] Exemplarily, the number of the first blocking components 381 is between one and ten.

[0095] Exemplarily, the peeling blocking structure 38 includes a plurality of first blocking components 381, each of which is arranged around the opening area 20, and the orthographic projection of each first blocking component 381 on the substrate 60 can be surrounded by the orthographic projection of the adjacent first blocking component 381 on the substrate 60 along the direction from the opening area 20 to the isolation area 30.

[0096] The above configuration further improves the bonding performance between the first part at various positions around the opening area 20 and the film layer in contact therewith, thereby better reducing the risk of the first part peeling off from the display substrate and ensuring the reliability yield of the display substrate.

[0097] like Figure 5 As shown, in some embodiments, the distance H2 between adjacent first blocking components satisfies: 10 μm≤H2≤30 μm.

[0098] Exemplarily, a minimum distance between orthographic projections of adjacent first blocking members 381 on the base 60 of the display substrate comprises 10 micrometers.

[0099] Exemplarily, in a direction parallel to the base 60 of the display substrate, the distances between adjacent first blocking members 381 include: 12 micrometers, 14 micrometers, 28 micrometers, and 30 micrometers.

[0100] For example, Figure 5 As shown, H1 is the width of the first barrier member 381. Exemplarily, the width of the first barrier member 381 is: the width of the third sub-pattern 3810a included in the first barrier pattern 3810 in the first barrier member 381. Exemplarily, the width of the third sub-pattern 3810a included in the first barrier pattern 3810 is the same as the width of the first sub-pattern 3810c. Exemplarily, the value of H1 includes 4.8 microns, but is not limited thereto.

[0101] For example, Figure 5 As shown, H2 is the distance between adjacent first blocking components 381 .

[0102] Exemplarily, the distance between adjacent first blocking members 381 is: the distance between the center lines of the orthographic projections of adjacent first blocking members 381 on the substrate 60. Exemplarily, the center line is located at Figure 5 The positions of the projections of the two left and right longitudinally extending imaginary lines corresponding to H2 on the substrate 60 .

[0103] like Figure 3 , Figure 4 , Figures 7 to 12As shown, in some embodiments, the crack blocking structure 31 includes a plurality of second blocking components 310 , and the second blocking components 310 are arranged around the opening area 20 , and the plurality of second blocking components 310 are nested in sequence.

[0104] Exemplarily, the crack blocking structure 31 includes one or more second blocking components 310. When one second blocking component 310 is provided, the second blocking component 310 should be as close to the opening area 20 as possible. When multiple second blocking components 310 are provided, the multiple second blocking components 310 can be sequentially spaced in a direction away from the opening area 20.

[0105] It should be noted that, according to process conditions and effects, the number of second blocking members 310, the size of the second blocking members 310, and the distance between adjacent second blocking members 310 can be adjusted according to actual needs. Exemplarily, the number of second blocking members 310 is between one and ten, and the distance between adjacent second blocking members 310 can be selected to be more than ten microns. Exemplarily, the distance between adjacent second blocking members 310 is the same as the distance between adjacent first blocking members 381.

[0106] The plurality of second blocking members 310 can separate adjacent inorganic film layers in a direction perpendicular to the substrate 60 , thereby preventing multiple inorganic film layers from being stacked in contact with each other and blocking the path for the cracks to extend to the first pixel region 10 .

[0107] like Figures 4 to 7 , Fig.10 and Fig.11 As shown, in some embodiments, in a direction parallel to the base 60 of the display substrate, the first blocking members 381 and the second blocking members 310 are arranged at equal intervals.

[0108] Exemplarily, the first blocking member 381 and the second blocking member 310 included in the display substrate can be arranged at equal intervals with a minimum distance. Exemplarily, the minimum distance includes a minimum distance that can be achieved by a manufacturing process.

[0109] Exemplarily, there is a first distance between adjacent first blocking components 381 , there is a first distance between adjacent second blocking components 310 , and there is a first distance between adjacent first blocking components 381 and second blocking components 310 .

[0110] The above-mentioned arrangement of the first blocking component 381 and the second blocking component 310 at equal intervals allows the first blocking component 381 and the second blocking component 310 to be evenly arranged in the area of ​​the isolation area 30 close to the via area. This not only better avoids the extension of the crack to the first pixel area 10, but also better ensures the bonding performance of the packaging structure 65 and the film layer thereunder.

[0111] like Figure 5 , Figure 6 , Figure 8 and Fig.12 As shown, in some embodiments, in a direction parallel to the base 60 of the display substrate, the arrangement pitch of the first blocking members 381 is greater than the arrangement pitch of the second blocking members 310 .

[0112] Exemplarily, there is a second spacing between adjacent first blocking members 381, there is a first spacing between adjacent second blocking members 310, and there is a second spacing between adjacent first blocking members 381 and second blocking members 310. Exemplarily, the second spacing is greater than the first spacing.

[0113] The arrangement pitch of the first blocking parts 381 is set larger than the arrangement pitch of the second blocking parts 310, thereby preventing the cracks from extending to the first pixel area 10 and ensuring the bonding performance between the packaging structure 65 and the film layer thereunder, while better saving the manufacturing cost of the display substrate.

[0114] like Figure 5 and Figure 6 As shown, in some embodiments, the first blocking member 381 includes a first blocking pattern 3810, and a side surface of the first blocking pattern 3810 has a first notch.

[0115] Exemplarily, the first portion of the packaging structure 65 can contact the portion of the first barrier pattern 3810 located in the first recess.

[0116] Exemplarily, the display substrate further includes a light-emitting functional layer 61 , and the light-emitting functional layer 61 can extend from the first pixel region 10 to the isolation region 30 , and the light-emitting functional layer 61 can be disconnected at a first notch of the first blocking pattern 3810 .

[0117] The above-mentioned configuration of the first blocking member 381 including the first blocking pattern 3810 effectively increases the contact area between the first portion and the film layer below it, and further improves the bonding performance between the first portion and the film layer below it. In addition, the light-emitting functional layer 61 can be disconnected at the first notch of the first blocking pattern 3810, which better blocks water vapor and oxygen from invading the first pixel area 10 through the light-emitting functional layer 61 as a transmission path.

[0118] like Figure 5 and Figure 6 As shown, in some embodiments, the first blocking pattern 3810 includes a first sub-pattern 3810c, a second sub-pattern 3810b, and a third sub-pattern 3810a which are sequentially stacked in a direction away from the base 60 of the display substrate, and in a direction parallel to the base 60, the boundaries of the first sub-pattern 3810c and the third sub-pattern 3810a both exceed the boundary of the second sub-pattern 3810b, forming the first recess between the first sub-pattern 3810c and the third sub-pattern 3810a.

[0119] Exemplarily, the first sub-graph 3810c and the third sub-graph 3810a are made of the same material, the first sub-graph 3810c and the second sub-graph 3810b are made of different materials, and under the same etching conditions, the etching rate of the second sub-graph 3810b is greater than the etching rate of the first sub-graph 3810c and the third sub-graph 3810a.

[0120] Exemplarily, the first sub-pattern 3810c and the third sub-pattern 3810a are made of metal Ti, and the second sub-pattern 3810b is made of metal Al. Exemplarily, the manufacturing process of the first blocking pattern 3810 includes: forming a Ti metal layer, an Al metal layer, a Ti metal layer and a photoresist layer stacked in sequence in a direction away from the substrate 60; exposing the photoresist layer to form a photoresist removal area and a photoresist retention area, the photoresist retention area corresponds to the area where the first blocking pattern 3810 is located, and the photoresist removal area corresponds to other areas except the area where the first blocking pattern 3810 is located; etching the stacked Ti metal layer, the Al metal layer and the Ti metal layer using the photoresist in the photoresist retention area as a mask, and since the etching rate of the Al metal layer is greater than the etching rate of the Ti metal layer, the first recess can be formed between the first sub-pattern 3810c and the third sub-pattern 3810a.

[0121] The above-mentioned setting of the first blocking pattern 3810 includes the first sub-pattern 3810c, the second sub-pattern 3810b and the third sub-pattern 3810a, so that the first blocking pattern 3810 can be formed in one composition process, thereby greatly simplifying the production process of the display substrate and reducing the production cost of the display substrate.

[0122] like Figure 4 , Figure 7 and Figure 8 As shown, in some embodiments, the display substrate further includes a thin film transistor 63 located in the first pixel area 10, the thin film transistor 63 includes a source-drain electrode layer, and the source-drain electrode layer includes a first conductive layer, a second conductive layer, and the third conductive layer sequentially stacked in a direction away from the substrate 60;

[0123] The first sub-pattern 3810c is provided in the same layer and material as the first conductive layer, the second sub-pattern 3810b is provided in the same layer and material as the second conductive layer, and the third sub-pattern 3810a is provided in the same layer and material as the third conductive layer.

[0124] Exemplarily, the first pixel area 10 includes a sub-pixel driving circuit, the sub-pixel driving circuit includes the thin film transistor 63, the source-drain electrode layer of the thin film transistor 63 is made of a first source-drain metal layer, and the source-drain electrode layer includes a source electrode and a drain electrode.

[0125] Exemplarily, the first conductive layer and the third conductive layer are made of metal Ti, and the second conductive layer is made of metal Al. The source-drain electrode layer is formed in the same manner as the first barrier pattern 3810, which will not be described in detail here.

[0126] The source-drain electrode layer and the first barrier pattern 3810 can be formed simultaneously in the same patterning process, which effectively simplifies the manufacturing process of the display substrate and reduces the manufacturing cost of the display substrate.

[0127] like Figures 9 to 12 As shown, in some embodiments, the display substrate further includes a second source-drain metal layer 66 located in the first pixel area 10, and the second source-drain metal layer 66 includes a fourth conductive layer, a fifth conductive layer and the sixth conductive layer stacked in sequence in a direction away from the substrate 60;

[0128] The first sub-pattern 3810c is provided in the same layer and material as the fourth conductive layer, the second sub-pattern 3810b is provided in the same layer and material as the fifth conductive layer, and the third sub-pattern 3810a is provided in the same layer and material as the sixth conductive layer.

[0129] Exemplarily, the display substrate includes an active layer stacked in sequence along a direction away from the base 60, a first gate insulating layer 33, a first gate metal layer, a second gate insulating layer 34, a second gate metal layer, an interlayer insulating layer 35, a first source-drain metal layer, a first planarizing layer 671, a second source-drain metal layer 66, a second planarizing layer 672, an anode layer 80, a pixel defining layer 81, a light-emitting functional layer 61, a cathode layer 83, a first inorganic encapsulation layer 651, an organic encapsulation layer 652 and a second inorganic encapsulation layer 653.

[0130] Exemplarily, the display substrate further includes a flexible layer located between the active layer and the base 60, the flexible layer including: a first polyimide layer, a first isolation layer, a second polyimide layer, a second isolation layer and a buffer layer 62 which are stacked. The first isolation layer is made of silicon nitride, and the second isolation layer is made of silicon oxide.

[0131] Exemplarily, the insulating layer in the display substrate includes an inorganic insulating layer, and the inorganic insulating layer is made of silicon nitride and / or silicon oxide material.

[0132] Exemplarily, the second source-drain metal layer is used to form some conductive connection parts, and can also be used to form some signal lines and the like.

[0133] Exemplarily, the fourth conductive layer and the sixth conductive layer are made of metal Ti, and the fifth conductive layer is made of metal Al.

[0134] The second source-drain metal layer 66 and the first barrier pattern 3810 can be formed simultaneously in the same patterning process, which effectively simplifies the manufacturing process of the display substrate and reduces the manufacturing cost of the display substrate.

[0135] like Figure 5 and Figure 6 As shown, in some embodiments, at least part of the first blocking component 381 also includes: a second blocking pattern 3811 and a third blocking pattern 3812, the second blocking pattern 3811 is located between the first blocking pattern 3810 and the base 60 of the display substrate, and the third blocking pattern 3812 is located between the second blocking pattern 3811 and the base 60.

[0136] Exemplarily, an insulating layer is provided between the first barrier pattern 3810 and the second barrier pattern 3811 , and an insulating layer is provided between the second barrier pattern 3811 and the third barrier pattern 3812 .

[0137] The above-mentioned setting of the first blocking component 381 also includes the second blocking pattern 3811 and the third blocking pattern 3812, so that the second blocking pattern 3811 and the third blocking pattern 3812 can separate the second gate insulating layer 34 and the interlayer insulating layer 35, thereby preventing cracks from taking the stacked second gate insulating layer 34 and the interlayer insulating layer 35 as a transmission path and extending directly to the display area along the second gate insulating layer 34 and the interlayer insulating layer 35.

[0138] The above-mentioned configuration of the first blocking component 381 further includes the second blocking pattern 3811 and the third blocking pattern 3812, which increases the height of the step difference generated by the first blocking component 381 as a whole, which is conducive to increasing the contact area between the first part and the film layer below it, and reducing the risk of separation of the first part and the film layer below it. Moreover, after increasing the height of the step difference generated by the first blocking component 381 as a whole, the depth of the recessed structure between adjacent first blocking components 381 is increased, which is conducive to improving the packaging effect of the display substrate.

[0139] Need to explain, Figure 3 , Figure 4 , Figures 7 to 12 In the embodiment, the surfaces of the second gate insulating layer 34 and the interlayer insulating layer 35 facing away from the substrate 60 are not flat. The surfaces of the second gate insulating layer 34 and the interlayer insulating layer 35 facing away from the substrate 60 continue the appearance of the step difference covered by them, so that the surfaces of the second gate insulating layer 34 and the interlayer insulating layer 35 facing away from the substrate 60 also have step differences.

[0140] like Figure 5 As shown, in some embodiments, the first blocking component 381 is arranged in the same first blocking component 381 , and the orthographic projection of the second blocking pattern 3811 on the substrate 60 is located inside the orthographic projection of the third blocking pattern 3812 on the substrate 60 .

[0141] The above arrangement enables the second blocking pattern 3811 and the third blocking pattern 3812 to form a trapezoidal structure as a whole, which is beneficial to increase the contact area between the first part and the film layer thereunder and reduce the risk of separation of the first part and the film layer thereunder.

[0142] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the display substrate further includes a sub-pixel driving circuit located in the first pixel area 10, the sub-pixel driving circuit includes a capacitor structure 64, the capacitor structure 64 includes a first electrode plate 641 and a second electrode plate 642 that are oppositely arranged, and the first electrode plate 641 is located between the second electrode plate 642 and the base 60 of the display substrate;

[0143] The second barrier pattern 3811 and the second electrode plate 642 are provided in the same layer and the same material; and / or the third barrier pattern 3812 and the first electrode plate 641 are provided in the same layer and the same material.

[0144] Exemplarily, the first gate metal layer includes the first electrode plate 641, and the second gate metal layer includes the second electrode plate 642. Exemplarily, the first electrode plate 641 and the second electrode plate 642 are made of metal molybdenum.

[0145] The second barrier pattern 3811 and the second electrode plate 642 are arranged in the same layer and with the same material, so that the second barrier pattern 3811 and the second electrode plate 642 can be formed simultaneously in the same patterning process, which is beneficial to simplifying the manufacturing process of the display substrate and reducing the manufacturing cost of the display substrate.

[0146] The third barrier pattern 3812 and the first electrode 641 are arranged in the same layer and material, so that the third barrier pattern 3812 and the first electrode 641 can be formed simultaneously in the same patterning process, which is beneficial to simplifying the manufacturing process of the display substrate and reducing the manufacturing cost of the display substrate.

[0147] like Figure 7 and Fig.11 As shown, in some embodiments, the plurality of first blocking components 381 are divided into a first portion of first blocking components 381 and a second portion of first blocking components 381, and the first portion of first blocking components 381 is located between the second portion of first blocking components 381 and the plurality of second blocking components 310;

[0148] The first portion of the first blocking member 381 includes the second blocking pattern 3811 and the third blocking pattern 3812;

[0149] The second portion of the first blocking member 381 does not include the second blocking pattern 3811 and the third blocking pattern 3812 .

[0150] Exemplarily, the first portion of the first blocking component 381 includes at least one first blocking component 381 , and the second portion of the first blocking component 381 includes at least one first blocking component 381 .

[0151] The above-mentioned setting of the first part first blocking component 381 includes the second blocking pattern 3811 and the third blocking pattern 3812, and the second part first blocking component 381 does not include the second blocking pattern 3811 and the third blocking pattern 3812, which not only ensures the adhesion between the first part of the packaging structure 65 and the film layer thereunder, but also reduces the production cost of the display substrate.

[0152] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the second blocking component 310 has the same structure as the first portion first blocking component 381 .

[0153] For example, Figure 4 , Figures 7 to 12 As shown, the second blocking member 310 includes a first graphic 310a, a second graphic 310b and a third graphic 310c, the first graphic 310a has the same structure as the first blocking graphic 3810 and can be formed in the same patterning process, the second graphic 310b has the same structure as the second blocking graphic 3811 and can be formed in the same patterning process, and the third graphic 310c has the same structure as the third blocking graphic 3812 and can be formed in the same patterning process.

[0154] Exemplarily, the second gate insulating layer 34 is located between the second pattern 310 b and the third pattern 310 c , and the interlayer insulating layer 35 is located between the first pattern 310 a and the second pattern 310 b .

[0155] The above-mentioned setting of the second blocking component 310 has the same structure as the first blocking component 381 of the first part, which not only enables the second blocking component 310 to separate adjacent inorganic film layers, avoid the contact and stacking of multiple inorganic film layers, and block the path for the crack to extend to the first pixel area 10; but also can isolate the light-emitting functional layer 61, and prevent water vapor and oxygen from invading the first pixel area 10 through the light-emitting functional layer 61 as a transmission path.

[0156] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the display substrate further includes:

[0157] A retaining wall structure 37, wherein the retaining wall structure 37 is disposed in the isolation region 30, and an orthographic projection of the crack blocking structure 31 on the base 60 of the display substrate is located between an orthographic projection of the retaining wall structure 37 on the base 60 and an orthographic projection of the peeling blocking structure 38 on the base 60;

[0158] The encapsulation structure 65 extends from the first pixel area 10 to the isolation area 30, and the encapsulation structure 65 includes a first inorganic encapsulation layer 651, an organic encapsulation layer 652 and a second inorganic encapsulation layer 653 which are stacked in sequence in a direction away from the substrate 60; the first inorganic encapsulation layer 651 and the second inorganic encapsulation layer both include the first part; the organic encapsulation layer 652 is located on the side of the retaining wall structure 37 away from the opening area 20.

[0159] Exemplarily, the retaining wall structure 37 is disposed around the opening area 20. Exemplarily, the orthographic projection of the retaining wall structure 37 on the base 60 of the display substrate is located between the orthographic projection of the crack blocking structure 31 on the base 60 of the display substrate and the first pixel area 10.

[0160] Exemplarily, the encapsulation structure 65 includes a first inorganic encapsulation layer 651, an organic encapsulation layer 652, and a second inorganic encapsulation layer 653 which are sequentially stacked in a direction away from the substrate 60; the first inorganic encapsulation layer 651 and the second inorganic encapsulation layer 653 can both be made by chemical vapor deposition. The organic encapsulation layer 652 can be made by inkjet printing.

[0161] Exemplarily, the first inorganic encapsulation layer 651 and the second inorganic encapsulation layer can completely cover all structures of the display substrate disposed in the first pixel region 10, and can completely cover all structures of the display substrate located in the isolation region 30. Exemplarily, the first inorganic encapsulation layer 651 and the second inorganic encapsulation layer both include the first portion, and can completely cover the retaining wall structure 37, the crack blocking structure 31 and the peeling blocking structure 38, and the first inorganic encapsulation layer 651 and the second inorganic encapsulation layer can both extend to the boundary between the opening region 20 and the opening region 20.

[0162] Exemplarily, the organic encapsulation layer 652 can completely cover all structures in the display substrate arranged in the first pixel area 10; the organic encapsulation layer 652 can also cover all structures arranged in the isolation area 30 and located on the side of the retaining wall structure 37 facing the first pixel area 10.

[0163] The retaining wall structure 37 can prevent the organic encapsulation material used to make the organic encapsulation layer 652 from overflowing during the process of making the organic encapsulation layer 652 , thereby limiting the organic encapsulation material to the side of the retaining wall structure 37 facing away from the opening area 20 .

[0164] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the retaining wall structure 37 includes a first retaining wall 370 and a second retaining wall 371, and the first retaining wall 370 and the second retaining wall 371 are arranged in sequence along a direction close to the opening area 20, and in a direction perpendicular to the base 60, the height of the first retaining wall 370 is lower than the height of the second retaining wall 371.

[0165] Specifically, the specific structure of the blocking structure is varied. Exemplarily, the retaining wall structure 37 includes a plurality of retaining walls arranged in sequence along the direction close to the opening area 20, and along the direction close to the opening area 20, the heights of the plurality of retaining walls in the direction perpendicular to the base 60 increase in sequence.

[0166] Exemplarily, the first retaining wall 370 and the second retaining wall 371 both surround the opening area 20 .

[0167] The above-mentioned setting of the retaining wall structure 37 including the first retaining wall 370 and the second retaining wall 371 not only realizes the effective blocking of the organic encapsulation layer 652 , but also makes the retaining wall structure 37 occupy a smaller layout space.

[0168] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the display substrate further includes:

[0169] A flat layer, a pixel defining layer 81 and a spacer layer 82 are sequentially stacked in a direction away from the substrate 60 , wherein the flat layer, the pixel defining layer 81 and the spacer layer 82 are all located in the first pixel region 10 ;

[0170] The first retaining wall 370 includes a first retaining wall pattern 3701 and a second retaining wall pattern 3702 which are sequentially stacked in a direction away from the base 60;

[0171] The first retaining wall pattern 3701 is provided in the same layer and the same material as the pixel defining layer 81, and the second retaining wall pattern 3702 is provided in the same layer and the same material as the spacer layer 82; or, the first retaining wall pattern 3701 is provided in the same layer and the same material as the flat layer, and the second retaining wall pattern 3702 is provided in the same layer and the same material as the pixel defining layer 81;

[0172] The second retaining wall 371 includes a third retaining wall pattern 3710, a fourth retaining wall pattern 3711 and a fifth retaining wall pattern 3712 which are stacked in sequence along a direction away from the substrate 60; the third retaining wall pattern 3710 is arranged in the same layer and with the same material as the flat layer, the fourth retaining wall pattern 3711 is arranged in the same layer and with the same material as the pixel defining layer 81, and the fifth retaining wall pattern 3712 is arranged in the same layer and with the same material as the spacer layer 82.

[0173] Exemplarily, the planar layer includes a first planar layer 671. Exemplarily, the planar layer includes a second planar layer 672.

[0174] Exemplarily, the planar layer includes a first planar layer 671 and a second planar layer 672 which are sequentially stacked in a direction away from the substrate 60 , and a second source-drain metal layer 66 is disposed between the first planar layer 671 and the second planar layer 672 .

[0175] Exemplarily, at least a portion of the planar layer, at least a portion of the pixel defining layer 81 , and at least a portion of the spacer layer 82 are all located in the first pixel region 10 .

[0176] Exemplarily, the first retaining wall pattern 3701 and the first flat layer 671 are provided in the same layer and with the same material; or, the first retaining wall pattern 3701 and the second flat layer 672 are provided in the same layer and with the same material.

[0177] Exemplarily, the third retaining wall pattern 3710 is provided in the same layer and the same material as the first flat layer 671 ; or, the third retaining wall pattern 3710 is provided in the same layer and the same material as the second flat layer 672 .

[0178] The first retaining wall 370 and the second retaining wall 371 are formed in the same process as other film layers included in the display substrate, which effectively simplifies the manufacturing process of the display substrate and reduces the manufacturing cost of the display substrate.

[0179] like Figure 4 , Figures 7 to 12 As shown, in some embodiments, the display substrate further includes:

[0180] A plurality of inner isolation columns 32, the plurality of inner isolation columns 32 are arranged in the isolation area 30, the plurality of inner isolation columns 32 are located on a side of the retaining wall structure 37 away from the opening area 20, the plurality of inner isolation columns 32 surround the opening area 20, the plurality of inner isolation columns 32 are nested in sequence, and the side surface of the inner isolation column 32 has a second notch;

[0181] The light-emitting functional layer 61 includes a portion located in the first pixel region 10 and a portion located in the isolation region 30 . The portion of the light-emitting functional layer 61 located in the isolation region 30 is disconnected at a side of the inner isolation column 32 .

[0182] Exemplarily, the light-emitting functional layer 61 includes at least an organic light-emitting material layer, and the organic light-emitting material layer includes a whole layer of organic light-emitting material layer for emitting white light, or an organic light-emitting material layer pattern for emitting colored light (such as red light, green light, blue light, etc.). Exemplarily, in addition to the organic light-emitting material layer, the light-emitting functional layer 61 may also include a common layer of the whole layer structure such as an electron transport layer, an electron injection layer, a hole transport layer, and a hole injection layer.

[0183] Exemplarily, the light-emitting functional layer 61 can cover the first pixel region 10 and the isolation region 30 , and can extend to the boundary of the opening region 20 .

[0184] Exemplarily, the inner spacer column 32 has the same structure as the first barrier pattern 3810 , and the inner spacer column 32 and the first barrier pattern 3810 can be formed in the same patterning process.

[0185] The above-mentioned arrangement of the display substrate includes the multiple internal isolation columns 32, so that the portion of the light-emitting functional layer 61 located in the isolation area 30 can be disconnected at the side of the internal isolation column 32, further preventing water and oxygen from penetrating into the interior of the display substrate along the light-emitting functional layer 61 at the cutting line 90 of the opening boundary and causing corrosion to the interior of the display substrate.

[0186] like Figure 4 , Figure 7 and Figure 8 As shown, in some embodiments, the display substrate further includes a thin film transistor 63 located in the first pixel area 10, the thin film transistor 63 includes a source-drain electrode layer, and the source-drain electrode layer includes a first conductive layer, a second conductive layer, and the third conductive layer sequentially stacked in a direction away from the substrate 60;

[0187] The inner isolation column 32 includes a first isolation figure 320, a second isolation figure 321 and a third isolation figure 322 which are stacked in sequence along a direction away from the substrate 60, the first isolation figure 320 is arranged on the same layer and with the same material as the first conductive layer, the second isolation figure 321 is arranged on the same layer and with the same material as the second conductive layer, and the third isolation figure 322 is arranged on the same layer and with the same material as the third conductive layer.

[0188] Exemplarily, the first pixel area 10 includes a sub-pixel driving circuit, the sub-pixel driving circuit includes the thin film transistor 63, the source-drain electrode layer of the thin film transistor 63 is made of a first source-drain metal layer, and the source-drain electrode layer includes a source electrode and a drain electrode.

[0189] Exemplarily, the first conductive layer and the third conductive layer are made of metal Ti, and the second conductive layer is made of metal Al. The source-drain electrode layer is formed in the same manner as the first barrier pattern 3810, which will not be described in detail here.

[0190] Exemplarily, the inner isolation column 32 includes a first isolation figure 320, a second isolation figure 321 and a third isolation figure 322 which are stacked in sequence in a direction away from the substrate 60. In a direction parallel to the substrate 60, the boundary of the first isolation figure 320 and the boundary of the third isolation figure 322 both exceed the boundary of the second isolation figure 321, and the second recess is formed between the first isolation figure 320 and the third isolation figure 322.

[0191] The source-drain electrode layer and the inner isolation column 32 can be formed simultaneously in the same patterning process, which effectively simplifies the manufacturing process of the display substrate and reduces the manufacturing cost of the display substrate.

[0192] like Figures 9 to 12 As shown, in some embodiments, the display substrate further includes a second source-drain metal layer 66 located in the first pixel area 10, and the second source-drain metal layer 66 includes a fourth conductive layer, a fifth conductive layer and the sixth conductive layer stacked in sequence in a direction away from the substrate 60;

[0193] The first isolation pattern 320 is provided in the same layer and material as the fourth conductive layer, the second isolation pattern 321 is provided in the same layer and material as the fifth conductive layer, and the third isolation pattern 322 is provided in the same layer and material as the sixth conductive layer.

[0194] Exemplarily, the fourth conductive layer and the sixth conductive layer are made of metal Ti, and the fifth conductive layer is made of metal Al.

[0195] The second source-drain metal layer 66 and the inner spacer 32 can be formed simultaneously in the same patterning process, which effectively simplifies the manufacturing process of the display substrate and reduces the manufacturing cost of the display substrate.

[0196] An embodiment of the present disclosure further provides a display device, comprising the display substrate provided by the above embodiment.

[0197] In the display substrate provided by the above embodiment, by providing the crack blocking structure 31 in the isolation area 30, the cracks near the opening area 20 are effectively blocked from extending into the first pixel area 10. At the same time, by providing the peeling blocking structure 38 in the reserved cutting transition area 301, the adhesion between the first part and the film layer in contact therewith is enhanced, the risk of the first part peeling off from the display substrate is reduced, and the reliability yield of the display substrate is ensured.

[0198] Therefore, when the display device provided by the embodiment of the present disclosure includes the above-mentioned display substrate, it also has the above-mentioned beneficial effects, which will not be described in detail here.

[0199] It should be noted that the display device may be any product or component with a display function, such as a television, a monitor, a digital photo frame, a mobile phone, and a tablet computer.

[0200] The embodiment of the present disclosure further provides a method for manufacturing a display substrate, the manufacturing method is used to manufacture the display substrate provided in the above embodiment, the display substrate comprises a display area, the display area comprises an opening area 20, a first pixel area 10 and an isolation area 30; the isolation area 30 is located between the first pixel area 10 and the opening area 20, the isolation area 30 surrounds the opening area 20, and the boundary line between the opening area 20 and the isolation area 30 is a cutting line 90; the manufacturing method of the display substrate comprises:

[0201] Manufacturing a crack blocking structure 31, wherein the crack blocking structure 31 is located in the isolation region 30;

[0202] A stripping barrier structure 38 is manufactured, and the stripping barrier structure 38 is located in the reserved cutting transition area 301 and the sacrificial cutting transition area 302; the distance L between the side of the stripping barrier structure closest to the opening area and the cutting line satisfies: 0 μm≤L≤30 μm;

[0203] Manufacturing a packaging structure 65, wherein a first portion of the packaging structure 65 is located on a side of the peeling barrier structure 38 facing away from the substrate 60; the peeling barrier structure 38 makes the surface of the display substrate in contact with the first portion uneven;

[0204] The steps of forming the opening area 20 and the isolation area 30 include: cutting the display substrate along the cutting line 90, wherein the cutting line 90 is the boundary between the retained cutting transition area 301 and the sacrificial cutting transition area 302, and removing all structures surrounded by the cutting line 90 to form the opening area 20.

[0205] Exemplarily, the display substrate has a display area and a peripheral area surrounding the display area, wherein the display area includes a first pixel area 10, an opening area 20, and an isolation area 30 located between the first pixel area 10 and the opening area 20. The isolation area 30 is arranged around the opening area 20, and the first pixel area 10 is arranged around the isolation area 30.

[0206] Exemplarily, the display substrate includes a rectangular display area, and the opening area 20 is located at the upper left corner, the upper middle part or the upper right corner of the rectangular display area. There is no special requirement for the specific position and shape of the opening area 20. Exemplarily, the shape of the opening area 20 includes: circular or rectangular shapes.

[0207] The isolation region 30 is provided with an inorganic layer structure located on the substrate 60, and the inorganic layer structure includes multiple inorganic film layers stacked, each of which is formed into an integral structure with the corresponding inorganic film layer in the first pixel region 10 (such as the first gate insulating layer 33, the second gate insulating layer 34, the interlayer insulating layer 35, etc.), and the inorganic film layer can play the role of an insulating layer in the first pixel region 10. The flexibility of the inorganic film layer is poor, and when the opening region 20 is cut to form, the inorganic film layer at the cutting line 90 is prone to brittle fracture, and the crack is easy to use the inorganic film layer as a channel to further extend to the first pixel region 10, which affects the yield of the display substrate.

[0208] Exemplarily, the crack blocking structure 31 surrounds the opening area 20. The crack blocking structure 31 can separate adjacent inorganic film layers, thereby preventing multiple inorganic film layers from being stacked in contact with each other, and blocking the path for the crack to extend to the first pixel area 10.

[0209] Exemplarily, the reserved cutting transition zone 301 is arranged around the opening area 20. It is worth noting that the display substrate includes a cutting transition zone before the opening area 20 is formed, and the cutting transition zone includes a reserved cutting transition zone 301 and a sacrificial cutting transition zone 302. The reserved cutting transition zone 301 has the same structure as the sacrificial cutting transition zone 302, and the peeling blocking structure 38 is formed on both the reserved cutting transition zone 301 and the sacrificial cutting transition zone 302.

[0210] The reserved cutting transition area 301 and the sacrificial cutting transition area 302 are divided by a cutting line 90. After cutting along the cutting line 90, the structure included in the reserved cutting transition area 301 is retained, and the structure included in the sacrificial cutting transition area 302 is removed to form the opening area 20. Since the specific position of the cutting line 90 is selected in the cutting transition area, and the entire cutting transition area is provided with the peeling blocking structure 38, therefore, no matter where the cutting line 90 is specifically selected in the cutting transition area, it can be ensured that the peeling blocking structure 38 is provided on the reserved cutting transition area 301 after cutting. The peeling blocking structure 38 can make the surface of the display substrate in contact with the first part uneven, increase the contact area between the first part and the film layer in contact thereunder, thereby well enhancing the adhesion between the first part and the film layer in contact thereunder, and reducing the risk of the first part peeling off from the display substrate.

[0211] At least a portion of the packaging structure 65 can cover the entire area of ​​the display substrate. The packaging structure 65 can effectively block external water vapor and oxygen from invading the interior of the display substrate, which is beneficial to extending the service life of the display substrate.

[0212] In the display substrate manufactured by the manufacturing method provided by the embodiment of the present disclosure, by providing the crack blocking structure 31 in the isolation area 30, the cracks located near the opening area 20 are effectively blocked from extending into the first pixel area 10. At the same time, by providing the peeling blocking structure 38 in the reserved cutting transition area 301, the adhesion between the first part and the film layer in contact therewith is enhanced, the risk of the first part peeling off from the display substrate is reduced, and the reliability yield of the display substrate is ensured.

[0213] It should be noted that the "same layer" in the embodiment of the present disclosure may refer to a film layer on the same structural layer. Or, for example, a film layer on the same layer may be a film layer for forming a specific pattern formed by the same film forming process, and then the film layer is patterned by the same mask through a single composition process to form a layer structure. Depending on the specific pattern, a single composition process may include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure may be continuous or discontinuous. These specific patterns may also be at different heights or have different thicknesses.

[0214] In the various method embodiments of the present disclosure, the serial numbers of the steps cannot be used to limit the sequence of the steps. For ordinary technicians in this field, without paying any creative work, changes to the sequence of the steps are also within the protection scope of the present disclosure.

[0215] It should be noted that each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the method embodiment, since it is basically similar to the product embodiment, the description is relatively simple, and the relevant parts can be referred to the partial description of the product embodiment.

[0216] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect", "couple" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0217] It will be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” or “under” another element, it can be “directly on” or “under” the other element or intervening elements may be present.

[0218] In the description of the above embodiments, specific features, structures, materials or characteristics may be combined in a suitable manner in any one or more embodiments or examples.

[0219] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art who is familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present disclosure, which should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A display substrate, comprising a display area, wherein the display area comprises an opening area, a first pixel area and an isolation area; the isolation area is located between the first pixel area and the opening area, the isolation area surrounds the opening area, and a boundary line between the opening area and the isolation area is a cutting line; The display substrate further comprises: a crack blocking structure, the crack blocking structure being located in the isolation region, the isolation region including a reserved cutting transition region between the crack blocking structure and the opening region; A peeling barrier structure, wherein the peeling barrier structure is located in the reserved cutting transition area; a distance L between a side of the peeling barrier structure closest to the opening area and the cutting line satisfies: 0 μm≤L≤30 μm; A packaging structure, wherein a first portion of the packaging structure is located on a side of the peeling barrier structure facing away from the base of the display substrate; the peeling barrier structure makes a surface of the display substrate in contact with the first portion uneven; The peeling barrier structure comprises at least one first barrier component, wherein the first barrier component comprises: a first barrier pattern, wherein a side surface of the first barrier pattern has a first notch; At least part of the first barrier member further includes: a second barrier pattern and a third barrier pattern, wherein the second barrier pattern is located between the first barrier pattern and the base of the display substrate, and the third barrier pattern is located between the second barrier pattern and the base; In the same first blocking component, the orthographic projection of the second blocking pattern on the substrate is located inside the orthographic projection of the third blocking pattern on the substrate.

2. The display substrate according to claim 1, wherein: The first blocking component is arranged around the opening area.

3. The display substrate according to claim 2, wherein: The orthographic projection of the cutting line on the base of the display substrate at least partially overlaps with the orthographic projection of the first blocking component closest to the opening area on the base; Alternatively, an orthographic projection of the cutting line on the substrate does not overlap with an orthographic projection of the first blocking component closest to the opening area on the substrate.

4. The display substrate according to claim 2, wherein: The peeling blocking structure includes a plurality of first blocking components, and the plurality of first blocking components are nested in sequence.

5. The display substrate according to claim 4, wherein: A distance H2 between adjacent first blocking members satisfies: 10 μm≤H2≤30 μm.

6. The display substrate according to claim 2, wherein: The crack blocking structure includes a plurality of second blocking components, the second blocking components are arranged around the opening area, and the plurality of second blocking components are nested in sequence.

7. The display substrate according to claim 6, wherein: In a direction parallel to the base of the display substrate, the first blocking member and the second blocking member are arranged at equal intervals; And / or, in a direction parallel to the base of the display substrate, an arrangement pitch of the first blocking members is greater than an arrangement pitch of the second blocking members.

8. The display substrate according to claim 6, wherein: The first blocking pattern includes a first sub-pattern, a second sub-pattern and a third sub-pattern which are stacked in sequence in a direction away from the base of the display substrate. In a direction parallel to the base, boundaries of the first sub-pattern and the third sub-pattern both exceed boundaries of the second sub-pattern, and the first recess is formed between the first sub-pattern and the third sub-pattern.

9. The display substrate according to claim 8, wherein: The display substrate further comprises a thin film transistor located in the first pixel region, the thin film transistor comprises a source-drain electrode layer, the source-drain electrode layer comprises a first conductive layer, a second conductive layer and a third conductive layer which are sequentially stacked in a direction away from the substrate; the first sub-pattern is provided in the same layer and material as the first conductive layer, the second sub-pattern is provided in the same layer and material as the second conductive layer, and the third sub-pattern is provided in the same layer and material as the third conductive layer; or The display substrate also includes a second source-drain metal layer located in the first pixel area, and the second source-drain metal layer includes a fourth conductive layer, a fifth conductive layer and a sixth conductive layer stacked in sequence in a direction away from the substrate; the first sub-pattern is arranged in the same layer and material as the fourth conductive layer, the second sub-pattern is arranged in the same layer and material as the fifth conductive layer, and the third sub-pattern is arranged in the same layer and material as the sixth conductive layer.

10. The display substrate according to claim 8, wherein: The display substrate further comprises a sub-pixel driving circuit located in the first pixel region, the sub-pixel driving circuit comprises a capacitor structure, the capacitor structure comprises a first electrode plate and a second electrode plate arranged opposite to each other, the first electrode plate is located between the second electrode plate and the base of the display substrate; The second barrier pattern is provided in the same layer and material as the second electrode plate; and / or the third barrier pattern is provided in the same layer and material as the first electrode plate.

11. The display substrate according to claim 8, wherein: The peeling barrier structure comprises a plurality of first barrier components, wherein the plurality of first barrier components are divided into a first portion of first barrier components and a second portion of first barrier components, wherein the first portion of first barrier components is located between the second portion of first barrier components and the plurality of second barrier components; The first portion of the first blocking member includes the second blocking pattern and the third blocking pattern; The second portion of the first blocking member does not include the second blocking pattern and the third blocking pattern; The second blocking component has the same structure as the first blocking component of the first portion.

12. The display substrate according to claim 1, wherein: The display substrate further comprises: a retaining wall structure, wherein the retaining wall structure is disposed in the isolation area, and an orthographic projection of the crack blocking structure on the base of the display substrate is located between an orthographic projection of the retaining wall structure on the base and an orthographic projection of the peeling blocking structure on the base; The encapsulation structure extends from the first pixel region to the isolation region, and the encapsulation structure includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer stacked in sequence in a direction away from the substrate; the first inorganic encapsulation layer and the second inorganic encapsulation layer both include the first portion; the organic encapsulation layer is located on a side of the retaining wall structure away from the opening region; The retaining wall structure includes a first retaining wall and a second retaining wall, wherein the first retaining wall and the second retaining wall are arranged in sequence in a direction close to the opening area, and in a direction perpendicular to the base, a height of the first retaining wall is lower than a height of the second retaining wall.

13. The display substrate according to claim 12, wherein: The display substrate further comprises: A planar layer, a pixel defining layer and a spacer layer are sequentially stacked in a direction away from the substrate, wherein the planar layer, the pixel defining layer and the spacer layer are all located in the first pixel region; The first retaining wall comprises a first retaining wall pattern and a second retaining wall pattern which are sequentially stacked in a direction away from the base; The first retaining wall pattern is provided in the same layer and the same material as the pixel defining layer, and the second retaining wall pattern is provided in the same layer and the same material as the spacer layer; or, the first retaining wall pattern is provided in the same layer and the same material as the flat layer, and the second retaining wall pattern is provided in the same layer and the same material as the pixel defining layer; The second retaining wall includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern which are sequentially stacked in a direction away from the substrate; the third retaining wall pattern is arranged in the same layer and with the same material as the flat layer, the fourth retaining wall pattern is arranged in the same layer and with the same material as the pixel defining layer, and the fifth retaining wall pattern is arranged in the same layer and with the same material as the spacer layer.

14. The display substrate according to claim 12, wherein: The display substrate further comprises: A plurality of inner isolation columns, the plurality of inner isolation columns are arranged in the isolation area, the plurality of inner isolation columns are located on a side of the retaining wall structure away from the opening area, the inner isolation columns surround the opening area, the plurality of inner isolation columns are nested in sequence, and the side surface of the inner isolation column has a second notch; A light-emitting functional layer includes a portion located in the first pixel area and a portion in the isolation area, and the portion of the light-emitting functional layer located in the isolation area is disconnected at a side of the inner isolation column.

15. The display substrate according to claim 14, wherein: The display substrate further comprises a thin film transistor located in the first pixel region, the thin film transistor comprises a source-drain electrode layer, the source-drain electrode layer comprises a first conductive layer, a second conductive layer and a third conductive layer sequentially stacked in a direction away from the substrate; the inner isolation column comprises a first isolation pattern, a second isolation pattern and a third isolation pattern sequentially stacked in a direction away from the substrate, the first isolation pattern is arranged in the same layer and material as the first conductive layer, the second isolation pattern is arranged in the same layer and material as the second conductive layer, and the third isolation pattern is arranged in the same layer and material as the third conductive layer; or, The display substrate also includes a second source-drain metal layer located in the first pixel area, and the second source-drain metal layer includes a fourth conductive layer, a fifth conductive layer and a sixth conductive layer stacked in sequence in a direction away from the substrate; the first isolation pattern is arranged on the same layer and with the same material as the fourth conductive layer, the second isolation pattern is arranged on the same layer and with the same material as the fifth conductive layer, and the third isolation pattern is arranged on the same layer and with the same material as the sixth conductive layer.

16. A display device comprising the display substrate according to any one of claims 1 to 15.

17. A method for manufacturing a display substrate, the display substrate comprising a display area, the display area comprising an opening area, a first pixel area and an isolation area; the isolation area is located between the first pixel area and the opening area, the isolation area surrounds the opening area, and a boundary line between the opening area and the isolation area is a cutting line; The manufacturing method of the display substrate comprises: Making a crack blocking structure, wherein the crack blocking structure is located in the isolation region, and the isolation region includes a reserved cutting transition region located between the crack blocking structure and the opening region; A stripping barrier structure is manufactured, wherein the stripping barrier structure is located in the reserved cutting transition area and the sacrificial cutting transition area; a distance L between the side of the stripping barrier structure closest to the opening area and the cutting line satisfies: 0 μm≤L≤30 μm; Manufacturing a packaging structure, wherein the first portion of the packaging structure is located on a side of the peeling barrier structure facing away from the substrate; the peeling barrier structure makes the surface of the display substrate in contact with the first portion uneven; The peeling barrier structure comprises at least one first barrier component, wherein the first barrier component comprises: a first barrier pattern, wherein a side surface of the first barrier pattern has a first notch; At least part of the first barrier member further includes: a second barrier pattern and a third barrier pattern, wherein the second barrier pattern is located between the first barrier pattern and the base of the display substrate, and the third barrier pattern is located between the second barrier pattern and the base; In the same first blocking component, the orthographic projection of the second blocking pattern on the substrate is located inside the orthographic projection of the third blocking pattern on the substrate; The step of forming the opening area and the isolation area includes: cutting the display substrate along the cutting line, the cutting line being the boundary line between the retained cutting transition area and the sacrificial cutting transition area, and removing all structures surrounded by the cutting line to form the opening area.

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