Polarized light irradiation device, exposure apparatus provided with the same, and polarized light irradiation method

By optimizing the arrangement and adjustment mechanism of the light source group in a large exposure device, the problems of uneven energy distribution and boundary occlusion in polarized light irradiation were solved, achieving a uniform exposure effect on the workpiece surface.

CN115586673BActive Publication Date: 2026-07-14PHOENIX ELECTRIC CO

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
PHOENIX ELECTRIC CO
Filing Date
2022-06-07
Publication Date
2026-07-14

AI Technical Summary

Technical Problem

When using multiple light sources and polarizing elements in large exposure apparatuses, it is difficult to solve the problems of uneven energy distribution of polarized light irradiation and boundary occlusion.

Method used

Multiple light source groups are arranged in the workpiece conveying direction, with the boundary sections overlapping but not overlapping along the workpiece conveying direction. An adjustment mechanism is used to ensure the uniformity of polarized light irradiation.

Benefits of technology

It improves the uniformity of polarized light irradiation energy distribution on the workpiece surface, reduces the occlusion problem at the boundary, and ensures uniform exposure effect of the workpiece.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention provides a polarized light irradiation device capable of improving uniformity of polarized light irradiation energy distribution on a workpiece. A plurality of irradiation heads (110) in which a plurality of light source groups (114) having a light source (120) and a polarization element (122) corresponding to the light source (120) are arranged in a direction orthogonal to the transport direction of the workpiece (X) are provided to constitute the polarized light irradiation device (100). The boundary portions (130) formed between the polarization elements (122) in one irradiation head (110) are arranged in a manner that the boundary portions (130) in another irradiation head (110) adjacent to the irradiation head (110) overlap in the transport direction of the workpiece (X). The irradiation boundary portions (132) formed between the irradiation boundary portions (Z) formed by the polarized light (W) from one irradiation head (110) are arranged in a manner that the irradiation boundary portions (132) in another irradiation head (110) adjacent to the irradiation head (110) do not overlap in the transport direction of the workpiece (X).
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Description

Technical Field

[0001] The present invention relates to a polarized light irradiation apparatus for exposure in the manufacture of liquid crystal panels, an exposure apparatus having the same, and a polarized light irradiation method. Background Technology

[0002] The manufacturing of liquid crystal panels requires liquid crystal alignment treatment. Historically, a friction treatment has been performed by physically rubbing the surface of a glass substrate (for example, Patent Document 1). This friction treatment involves forming an organic polymer film on the glass substrate by rubbing it in a predetermined direction with a long-fiber cloth or the like, thereby creating a film that aligns liquid crystal molecules in a specific direction.

[0003] However, the triboelectric process presents several reliability issues, including a lack of uniformity, the potential for electrostatic damage to the TFTs, and the adhesion of powder and dust generated during the triboelectric process.

[0004] To address the problems associated with this type of friction, an exposure device capable of performing photo-orientation processing has been proposed, in which a long-arc mercury lamp is used as the light source.

[0005] Prior art literature

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2007-17475 Summary of the Invention

[0008] The problem that the invention aims to solve

[0009] However, when a large exposure device is required to correspond to a large workpiece area, it is difficult to use a long-arc mercury lamp as the light source. Instead, multiple light sources and multiple polarization elements corresponding to them are required.

[0010] When using multiple light sources and multiple polarization elements, for example, an irradiation head is formed by multiplexing a light source group consisting of a light source and its corresponding polarization element, and multiple irradiation heads are arranged in the conveying direction of the workpiece to form a polarized light irradiation device.

[0011] When a polarized light irradiation device is configured in this way, a boundary region is created between adjacent light source groups. At this boundary region, the illuminance is lower compared to other areas, thus causing a deterioration in the uniformity of the polarized light irradiation energy distribution on the workpiece. Furthermore, to prevent the erroneous irradiation of unpolarized light, light-shielding measures such as blocking are sometimes taken at this boundary region.

[0012] The present invention was made in view of the above-mentioned problems, and its object is to provide a polarized light irradiation device, an exposure device having the same, and a polarized light irradiation method, which can improve the uniformity of the polarized light irradiation energy distribution on the workpiece when using multiple irradiation heads that are multiplexed to form a light source group having a light source and a corresponding polarized light element to form a polarized light irradiation device.

[0013] Technical solutions for solving the problem

[0014] According to one aspect of the present invention, a polarized light irradiation device is provided, comprising a plurality of irradiation heads having a plurality of light source groups arranged in a direction orthogonal to the conveying direction of the workpiece, each light source group having a light source and a polarizing element corresponding to the light source.

[0015] Multiple irradiation heads are arranged in the conveying direction of the workpiece.

[0016] A boundary portion is formed between the polarizing element in one of the light source groups and the polarizing element in another light source group adjacent to the light source group.

[0017] The boundary portions in one of the irradiation heads are arranged in a manner that overlaps with the boundary portions in another irradiation head adjacent to that irradiation head along the conveying direction of the workpiece.

[0018] An irradiation boundary is formed between the irradiation ranges on the workpiece irradiated by the polarized light from the plurality of light source groups included in the irradiation heads.

[0019] The irradiation boundary formed by each polarized light irradiated from one of the irradiation heads is configured such that it does not overlap with the irradiation boundary formed by each polarized light irradiated from another irradiation head adjacent to the irradiation head along the conveying direction of the workpiece.

[0020] Preferably,

[0021] A light source group consists of a plurality of light sources and a polarizing element.

[0022] Preferably,

[0023] The light source includes a discharge lamp and a reflector that reflects light from the discharge lamp.

[0024] Preferably,

[0025] The light source is equipped with LEDs.

[0026] Preferably,

[0027] The polarized light irradiation device also includes an adjustment mechanism that adjusts the irradiation angle of the polarized light from the light source group relative to the workpiece to a direction orthogonal to the conveying direction of the workpiece.

[0028] Preferably,

[0029] The polarized light irradiation device also includes a second adjustment mechanism, which adjusts the irradiation angle of the polarized light from the light source group relative to the workpiece to the conveying direction of the workpiece.

[0030] Preferably,

[0031] The light source is mounted relative to the irradiation head, or a box containing the light source and the polarizing element is mounted.

[0032] According to another aspect of the invention,

[0033] An exposure apparatus is provided that includes the aforementioned polarized light irradiation device and workpiece conveying device.

[0034] According to another aspect of the present invention, a polarized light irradiation method is provided, wherein polarized light from a polarized light irradiation device is irradiated onto a workpiece.

[0035] The polarized light irradiation device includes multiple irradiation heads with multiple light source groups arranged in a direction orthogonal to the workpiece conveying direction. Each light source group has a light source and a polarizing element corresponding to the light source. The multiple irradiation heads are arranged in the workpiece conveying direction. A boundary portion is formed between the polarizing element in one light source group and the polarizing element in another adjacent light source group. The boundary portion in one irradiation head is arranged in such a way that the boundary portions in another adjacent irradiation head overlap along the workpiece conveying direction.

[0036] An irradiation boundary is formed between the irradiation ranges on the workpiece irradiated by the polarized light from the plurality of light source groups included in each irradiation head.

[0037] The irradiation boundary formed by each polarized light irradiated from one of the irradiation heads is configured such that it does not overlap with the irradiation boundary formed by each polarized light irradiated from another irradiation head adjacent to the irradiation head along the conveying direction of the workpiece.

[0038] Invention Effects

[0039] According to the polarized light irradiation apparatus, the exposure apparatus equipped with the present invention, and the polarized light irradiation method, the boundary portions between polarized light elements in one irradiation head are arranged such that the boundary portions between polarized light elements in another irradiation head adjacent to the irradiation head overlap along the workpiece transport direction, and the irradiation boundary portions formed by each polarized light irradiated from one irradiation head are configured such that they do not overlap with the irradiation boundary portions formed by each polarized light irradiated from another irradiation head adjacent to the irradiation head along the workpiece transport direction.

[0040] Therefore, since it is only necessary to arrange the irradiation heads in such a way that the boundary portions of one irradiation head and the adjacent irradiation head overlap along the conveying direction of the workpiece, the positioning of each irradiation head is easy, and the irradiation boundary portions in the polarized light irradiating the workpiece do not overlap along the conveying direction of the workpiece, thus improving the uniformity of the polarized light irradiation energy distribution on the workpiece. Attached Figure Description

[0041] Figure 1 This is a diagram showing an exposure apparatus 10 that includes the polarized light irradiation apparatus 100 of the present invention.

[0042] Figure 2 This diagram shows the configuration of the polarizing element 122 when viewed from above in the state of the polarizing light irradiation device 100.

[0043] Figure 3 This diagram shows the configuration of the irradiation boundary portion 132 when viewed from above from above.

[0044] Figure 4 This is a diagram showing the configuration of the irradiation boundary portion 132 in the state of the polarized light irradiation device 100 viewed from above, as in another example.

[0045] Figure 5 This is a diagram showing the configuration of the irradiation boundary portion 132 when viewed from above in another example of the polarized light irradiation device 100. Detailed Implementation

[0046] (Structure of exposure device 10)

[0047] The following description pertains to an exposure apparatus 10 equipped with the polarized light irradiation apparatus 100 according to an embodiment of the present invention. The exposure apparatus 10 is primarily used for manufacturing the photoalignment film (workpiece X) used in liquid crystal panels. Figure 1 As shown, the exposure apparatus 10 generally includes a workpiece transport device 20 and a polarized light irradiation device 100.

[0048] The workpiece transport device 20 is a device for transporting the photo-alignment film (workpiece X) exposed by the exposure device 10 in a given direction (the transport direction of workpiece X) substantially horizontally, using a known transport device. Known transport devices include, for example, those that move a worktable holding workpiece X relative to the polarized light irradiation device 100, or those that move workpiece X (photo-alignment film) relative to the polarized light irradiation device 100 by winding workpiece X (photo-alignment film) onto a long strip of film formed into a roller shape using other core materials.

[0049] (Structure of polarized light irradiation device 100)

[0050] The polarized light irradiation apparatus 100 according to this embodiment includes a plurality of (three in the figure) irradiation heads 110 arranged in the conveying direction of the workpiece X.

[0051] The irradiation head 110 generally includes an irradiation head body 112, multiple light source groups 114, and an adjustment mechanism 115.

[0052] The irradiation head body 112 has: a housing 116 that houses a plurality of light source groups 114 extending in a direction orthogonal to the conveying direction of the workpiece X; and a pair of support members 118 that are rotatably mounted at both ends of the housing 116 in the longitudinal direction and support the housing 116 above the workpiece conveying device 20.

[0053] Therefore, the housing 116 can be freely set at an angle relative to the workpiece X (and the workpiece conveying device 20).

[0054] The light source assembly 114 housed in the housing 116 has a light source 120 and a polarizing element 122.

[0055] The light source 120 is a component that emits light of the wavelength required for exposing the workpiece X. In this embodiment, it includes a discharge lamp 124 and a reflector 126 that reflects light from the discharge lamp 124 in a given orientation. Furthermore, the light source 120 is not limited to the discharge lamp 124; other types of light sources, such as LEDs, can be used.

[0056] The polarizing element 122 is a component that polarizes light from the light source 120. In this embodiment, a wire grid type polarizing element 122 is provided at the position of the opening 128 formed on the bottom surface (the surface facing the workpiece X) of the housing 116. Of course, the form of the polarizing element 122 is not limited to wire grid type, and polarization can be performed in any form.

[0057] Such multiple light sources 120 are arranged inside the housing 116 in a direction orthogonal to the conveying direction of the workpiece X. That is, the opening 128 formed on the bottom surface of the housing 116 is also arranged to extend in a direction orthogonal to the conveying direction of the workpiece X.

[0058] In addition, such as Figure 2 As shown, a boundary portion 130 is formed between a polarizing element 122 in one light source group 114 and a polarizing element 122 in another light source group 114 adjacent to the light source group 114.

[0059] Furthermore, the boundary portion 130 in one irradiation head 110 is arranged in such a way that the boundary portion 130 in another irradiation head 110 adjacent to that irradiation head 110 overlaps along the conveying direction of the workpiece X.

[0060] return Figure 1 The adjustment mechanism 115 is used to adjust the irradiation angle of the polarized light W from each light source group 114 relative to the workpiece X to a direction orthogonal to the conveying direction of the workpiece X. In this embodiment, the adjustment mechanisms 115 corresponding to each light source group 114 are housed within each irradiation head body 112. Furthermore, in Figure 1 In the figure, the adjustment mechanism 115 is depicted only on one light source group 114, but in reality, the adjustment mechanism 115 is provided in each light source group 114.

[0061] like Figure 3 As shown, an irradiation boundary portion 132 is formed between each irradiation range Z on the workpiece X irradiated by each polarized light W irradiated by the plurality of light source groups 114 included in each irradiation head 110. Furthermore, by adjusting using an adjustment mechanism 115, the irradiation boundary portion 132 formed by each polarized light W irradiated from one irradiation head 110 is configured such that it does not overlap with the irradiation boundary portion 132 formed by each polarized light W irradiated from another irradiation head 110 adjacent to that irradiation head 110 along the transport direction of the workpiece X. Additionally, the irradiation boundary portion 132 is not limited to having an illuminance of zero (mW / cm²). 2 The portion of the light source 114 that overlaps with the polarized light W from the adjacent light source group 114 and has a lower illuminance than the illuminance within the illumination range Z, or conversely, a portion with a higher illuminance, may also be considered.

[0062] Furthermore, as described above, since the mounting angle of the light source group 114 housed in each irradiation head 110 relative to the workpiece X is pre-adjusted so that the irradiation boundary portion 132 formed by each polarized light W irradiated from one irradiation head 110 does not overlap with the irradiation boundary portion 132 formed by each polarized light W irradiated from another irradiation head 110 adjacent to that irradiation head 110 along the conveying direction of the workpiece X, the adjustment mechanism 115 is not an essential component.

[0063] (Features of the polarized light irradiation device 100 and the exposure device 10)

[0064] According to the polarized light irradiation apparatus 100 and the exposure apparatus 10 provided therein, the boundary portions 130 between the polarized light elements 122 in one irradiation head 110 are arranged such that the boundary portions 130 between the polarized light elements 122 in another irradiation head 110 adjacent to the irradiation head 110 overlap with each other along the transport direction of the workpiece X. Furthermore, the irradiation boundary portions 132 formed by each polarized light W irradiated from one irradiation head 110 are configured such that they do not overlap with the irradiation boundary portions 132 formed by each polarized light W irradiated from another irradiation head 110 adjacent to the irradiation head 110 along the transport direction of the workpiece X.

[0065] Therefore, since the boundary portions 130 in one irradiation head 110 and the adjacent irradiation head 110 can be arranged in an overlapping manner along the conveying direction of the workpiece X, the positioning of each irradiation head 110 is easy, and the irradiation boundary portions 132 in the polarized light W irradiated to the workpiece X do not overlap along the conveying direction of the workpiece X, thus improving the uniformity of the polarized light irradiation energy distribution phase of the workpiece X.

[0066] (Variation Example 1)

[0067] In the above embodiments, the light source assembly 114 can be directly housed relative to the irradiation head body 112, but alternatively, a box smaller than the irradiation head body 112 can be prepared to house the light source assembly 114 and housed in the irradiation head body 112.

[0068] Alternatively, one light source group 114 can be stored in one box, or multiple light source groups 114 can be stored in one box.

[0069] (Variation Example 2)

[0070] As a method to ensure that the irradiation boundary portion 132 formed by each polarized light W irradiated from one irradiation head 110 does not overlap with the irradiation boundary portion 132 formed by each polarized light W irradiated from another irradiation head 110 adjacent to the irradiation head 110 along the conveying direction of the workpiece X, such as Figure 4 As shown, the irradiation boundary portions 132 formed by the polarized light W from each irradiation head 110 can also be made to not overlap with each other along the conveying direction of the workpiece X, such as... Figure 5 As shown, if the irradiation boundary portions 132 formed by the polarized light W from each adjacent irradiation head 110 do not overlap with each other along the conveying direction of the workpiece X, then the irradiation boundary portions 132 formed by the polarized light W from each of the two adjacent irradiation heads 110 can also overlap with each other along the conveying direction of the workpiece X.

[0071] (Variation Example 3)

[0072] In the above embodiment, an adjustment mechanism 115 is provided for adjusting the irradiation angle of the polarized light W from each light source group 114 relative to the workpiece X to a direction orthogonal to the conveying direction of the workpiece X. However, in addition to this, a second adjustment mechanism (not shown) may be provided instead for adjusting the irradiation angle of the polarized light W from each light source group 114 relative to the workpiece X to the conveying direction of the workpiece X.

[0073] The embodiments disclosed herein should be considered illustrative rather than limiting in all respects. The scope of the invention is indicated not by the foregoing description but by the scope of the claims, and is intended to include equivalents to the scope of the claims and all modifications within that scope.

[0074] Label Explanation

[0075] 10… Exposure device, 20… Workpiece conveying device, 100… Polarized light irradiation device, 110… Irradiation head, 112… Irradiation head body, 114… Light source group, 115… Adjustment mechanism, 116… Housing, 118… Support component, 120… Light source, 122… Polarizing element, 124… Discharge lamp, 126… Reflector, 128… (Opening of housing 116), 130… Boundary portion, 132… Irradiation boundary portion, X… Workpiece (photoalignment film), W… Polarized light, Z… (Irradiation range of polarized light W).

Claims

1. A polarized light irradiation device comprising a plurality of irradiation heads with multiple light source groups arranged in a direction orthogonal to the conveying direction of the workpiece, each light source group having a light source and a polarizing element corresponding to the light source. Multiple irradiation heads are arranged in the conveying direction of the workpiece. A boundary portion is formed between the polarizing element in one of the light source groups and the polarizing element in another light source group adjacent to the light source group. The boundary portions in one of the irradiation heads are arranged in a manner that overlaps with the boundary portions in another irradiation head adjacent to that irradiation head along the conveying direction of the workpiece. An irradiation boundary is formed between the irradiation ranges on the workpiece irradiated by the polarized light from the plurality of light source groups included in each irradiation head. The irradiation boundary formed by each polarized light irradiated from one of the irradiation heads is configured such that it does not overlap with the irradiation boundary formed by each polarized light irradiated from another irradiation head adjacent to the irradiation head along the conveying direction of the workpiece.

2. The polarized light irradiation device according to claim 1, wherein, A light source group consists of a plurality of light sources and a polarizing element.

3. The polarized light irradiation device according to claim 1 or 2, wherein, The light source includes a discharge lamp and a reflector that reflects light from the discharge lamp.

4. The polarized light irradiation device according to claim 1 or 2, wherein, The light source is equipped with LEDs.

5. The polarized light irradiation device according to claim 1 or 2, wherein, The polarized light irradiation device also includes an adjustment mechanism that adjusts the irradiation angle of the polarized light from the light source group relative to the workpiece to a direction orthogonal to the conveying direction of the workpiece.

6. The polarized light irradiation device according to claim 1 or 2, wherein, The polarized light irradiation device also includes a second adjustment mechanism, which adjusts the irradiation angle of the polarized light from the light source group relative to the workpiece to the conveying direction of the workpiece.

7. The polarized light irradiation device according to claim 1 or 2, wherein, The light source is mounted relative to the irradiation head, or a box containing the light source and the polarizing element is mounted.

8. An exposure apparatus comprising: The polarized light irradiation device according to claim 1 or 2; and Workpiece conveying device.

9. A polarized light irradiation method, wherein polarized light from a polarized light irradiation device is irradiated onto a workpiece. The polarized light irradiation device includes multiple irradiation heads with multiple light source groups arranged in a direction orthogonal to the workpiece conveying direction. Each light source group has a light source and a polarizing element corresponding to the light source. The multiple irradiation heads are arranged in the workpiece conveying direction. A boundary portion is formed between the polarizing element in one light source group and the polarizing element in another adjacent light source group. The boundary portion in one irradiation head is arranged in such a way that the boundary portions in another adjacent irradiation head overlap along the workpiece conveying direction. An irradiation boundary is formed between the irradiation ranges on the workpiece irradiated by the polarized light from the plurality of light source groups included in each irradiation head. The irradiation boundary formed by each polarized light irradiated from one of the irradiation heads is configured such that it does not overlap with the irradiation boundary formed by each polarized light irradiated from another irradiation head adjacent to the irradiation head along the conveying direction of the workpiece.