Apparatus comprising a multi-coloured film structure

Abstract

The application discloses a device comprising a multi-color film structure, which is selected from consumer electronics, household appliances, buildings, vehicles, shoes, hats or clothing, etc.; and the device comprises a base body, and the multi-color film structure is connected to or integrally formed on the base body; the multi-color film structure comprises at least one dielectric layer, each dielectric layer cooperates with a first reflecting surface and a second reflecting surface to form an optical cavity, the first reflecting surface is a first surface of the dielectric layer, the second reflecting surface is a combined interface of a second surface of the dielectric layer and a second optical structure layer, and the first surface and the second surface are oppositely arranged; and the second optical structure layer adopts a metal material layer with a thickness of less than 20 nm. The device presents rich and colorful color changes, and can fully meet the requirements of practical applications, especially the individualized requirements of different groups of people.

Description

[0001] This application is a divisional application of the patent application filed on July 3, 2019, with application number 2019105940374 and invention title "Device comprising a multicolored thin film structure". Technical Field

[0002] This invention relates to a multi-color optical structure, specifically to a device comprising a multi-color thin film structure, such as consumer electronics, home appliances, buildings, vehicles, clothing, etc. Background Technology

[0003] As living standards improve, people have increasingly higher demands for color-changing features in various devices in their daily lives and work environments, such as consumer electronics, home appliances, buildings, vehicles, and clothing. For example, for consumer electronics like mobile phones, the industry has proposed various color-changing phone cases to meet different personalized needs. Existing color-changing phone cases generally achieve this through the following methods: spraying or printing a layer of color-changing material on the phone case. However, this method is prone to wear and tear or peeling, and the color-changing effect is relatively limited. Alternatively, a multi-layer structure can be used, such as forming a multi-layer composite structure with a photosensitive color-changing layer, a primer layer, a heat dissipation layer, a wear-resistant layer, and a transparent coating. However, this method is difficult to process, has low color-changing efficiency, and also suffers from limited color-changing effects.

[0004] In recent years, color-changing optical structures based on electrochromic materials have been increasingly widely used. For example, the industry has tried to apply electrochromic optical structures to commercially available mobile phone cases, household appliance casings, and windows of buildings or vehicles. However, the color modulation of existing electrochromic structures is chemically tinted, and its color depends on the intrinsic properties of the material, which is relatively monotonous and difficult to meet practical needs. Summary of the Invention

[0005] The main objective of this invention is to provide a device comprising a colorful thin film structure to overcome the shortcomings of the prior art.

[0006] To achieve the aforementioned objectives, the technical solution adopted by this invention includes:

[0007] This invention provides a device comprising a multicolor thin film structure, including a substrate on which a multicolor thin film structure is connected or integrally formed. The multicolor thin film structure includes at least one dielectric layer, wherein each dielectric layer cooperates with a first reflective surface and a second reflective surface to form an optical cavity. The first reflective surface is a first surface of the dielectric layer, and the second reflective surface is a bonding interface between a second surface of the dielectric layer and a second optical structure layer. The first surface and the second surface are disposed opposite to each other.

[0008] When incident light enters the optical cavity, the phase shift of the reflected light formed at the first reflecting surface and the reflected light formed at the second reflecting surface... d is the thickness of the dielectric layer. Let λ be the refractive index of the dielectric layer, and λ be the wavelength of the incident light. The angle of refraction of the incident light as it passes through the first reflecting surface is denoted as ...

[0009] Furthermore, if the refractive index of the medium material on the first surface of the medium layer is defined as... Then the reflection coefficient of the first reflecting surface in Let be the angle of incidence of the incident light; and, if the refractive index of the medium material on the second surface of the dielectric layer is defined as... Then the reflection coefficient of the second reflecting surface in The angle of refraction of incident light as it passes through the second reflecting surface; the reflectance coefficient of the multicolored thin film structure, mainly composed of the dielectric layer and the second optical structure layer, is expressed as: Reflectivity is expressed as:

[0010] Furthermore, the material of the dielectric layer is selected from organic or inorganic materials, preferably electrochromic materials.

[0011] Furthermore, the first reflective surface is the interface between the first surface of the dielectric layer and the first optical structure layer, and the refractive index of the first optical structure layer is [missing information]. The refractive index of the second optical structure layer is

[0012] Furthermore, the transmittance coefficient of the first optical structure layer in The incident angle of the incident light on the first surface, and the transmission coefficient of the second optical structure layer. in The refraction angle of incident light as it passes through the second surface is given by the following formula: The transmittance coefficient of the multicolored thin film structure, mainly composed of the first optical structure layer, the dielectric layer, and the second optical structure layer, is expressed as: Transmittance is expressed as:

[0013] Furthermore, the multicolor thin film structure, mainly composed of the first optical structure layer, the dielectric layer, and the second optical structure layer, has an optical transmission working mode, an optical reflection working mode, or an optical transmission and reflection working mode; wherein, in the optical reflection working mode, the multicolor thin film structure has a double-sided asymmetric structural color, while in the optical transmission working mode, the multicolor thin film structure has a transparent structural color.

[0014] Furthermore, the multicolored thin film structure includes a working electrode, a counter electrode, and an electrolyte distributed between the working electrode and the counter electrode, wherein the working electrode includes a dielectric layer formed of an electrochromic material.

[0015] Furthermore, the device is a consumer electronics product or a home appliance, and the colorful thin film structure is connected to and / or integrally formed on the housing and / or display screen of the device.

[0016] Furthermore, the device is a building, and the colorful film structure is connected to and / or integrally formed on any of the building's interior walls, exterior walls, and windows.

[0017] Furthermore, the device is a vehicle, and the colorful film structure is connected to and / or integrally formed on any one of the vehicle's outer shell, inner wall, and windows.

[0018] Furthermore, the device is a shoe, hat, or garment, and the surface of the device is connected to and / or integrally formed with the colorful thin film structure.

[0019] Furthermore, the colorful thin film structure presents a predetermined graphic structure.

[0020] Compared with existing technologies, this invention applies an improved multicolor thin film structure to devices such as consumer electronics, home appliances, buildings, vehicles, and clothing. Because the multicolor thin film structure has the characteristics of electrochromic and physical color fusion, that is, it organically combines the advantages of adjustable electrochromic colors and wide range of physical colors, it can achieve multicolor control with good controllability. This makes the aforementioned devices exhibit a rich variety of color changes, which can fully meet the needs of practical applications, especially the personalized needs of different groups of people. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the structure of a mobile phone according to Embodiment 1 of the present invention;

[0022] Figure 2 It is formed Figure 1 A schematic diagram of the structure of the colorful thin film of the logo. Detailed Implementation

[0023] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Furthermore, it should be noted that in this specification, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising at least one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0025] One aspect of the present invention provides an apparatus comprising a multicolor thin film structure, including a substrate on which a multicolor thin film structure is connected or integrally formed, the multicolor thin film structure including at least one dielectric layer, wherein each dielectric layer cooperates with a first reflective surface and a second reflective surface to form an optical cavity, the first reflective surface being a first surface of the dielectric layer, the second reflective surface being a bonding interface between a second surface of the dielectric layer and a second optical structure layer, the first surface and the second surface being disposed opposite to each other;

[0026] When incident light enters the optical cavity, the phase shift of the reflected light formed at the first reflecting surface and the reflected light formed at the second reflecting surface... d is the thickness of the dielectric layer. Let λ be the refractive index of the dielectric layer, and λ be the wavelength of the incident light. The angle of refraction of the incident light as it passes through the first reflecting surface is denoted as ...

[0027] Furthermore, if the refractive index of the medium material on the first surface of the medium layer is defined as... Then the reflection coefficient of the first reflecting surface in Let be the angle of incidence of the incident light; and, if the refractive index of the medium material on the second surface of the dielectric layer is defined as... Then the reflection coefficient of the second reflecting surface in The angle of refraction of incident light as it passes through the second reflecting surface; the reflectance coefficient of the multicolored thin film structure, mainly composed of the dielectric layer and the second optical structure layer, is expressed as: Reflectivity is expressed as:

[0028] In some embodiments, the second optical structure layer is a metal material layer with a thickness of 20 nm or more; preferably, the thickness of the metal reflective layer is 50–3000 nm. That is, the second optical structure layer can be considered a metal reflective layer. In this case, the reflected light formed by the incident light on the first surface of the dielectric layer (i.e., the first reflecting surface) and the reflected light formed by the incident light passing through the dielectric layer on the surface of the metal layer (i.e., the second reflecting surface) interfere and superimpose.

[0029] Furthermore, the material of the metal reflective layer can be selected from non-reactive metals, such as chromium, gold, silver, copper, tungsten, titanium or their alloys, and is not limited thereto.

[0030] In some embodiments, if the dielectric layer in the multicolor thin film structure is formed of an electrochromic material, making the multicolor thin film structure an electrochromic structure, then the metal reflective layer also serves as a current collector for the dielectric layer. Therefore, the metal reflective layer can preferably be formed of a metal material with high conductivity, such as silver (Ag) or copper (Cu).

[0031] In some embodiments, the second optical structure layer is a metal material layer with a thickness greater than 0 and less than 20 nm.

[0032] In some embodiments, the first reflective surface is the interface between the first surface of the dielectric layer and the first optical structure layer, and the refractive index of the first optical structure layer is... The refractive index of the second optical structure layer is

[0033] Furthermore, the reflectivity and reflectance of the colorful thin film structure also apply to the case where incident light enters the optical cavity from the second optical structure layer.

[0034] Furthermore, the first optical structure layer and the second optical structure layer are arranged in parallel and have optical reflectivity and / or optical transmissivity.

[0035] Furthermore, for the aforementioned multicolored thin film structure, the reflected light formed on the first surface by incident light incident from the first optical structure layer and the reflected light formed on the second surface by incident light transmitted through the dielectric layer interfere and superimpose. Conversely, the reflected light formed on the second surface by incident light incident from the second optical structure layer and the reflected light formed on the first surface by incident light transmitted through the dielectric layer interfere and superimpose.

[0036] Specifically, the transmission coefficient of the first optical structure layer in The incident angle of the incident light on the first surface, and the transmission coefficient of the second optical structure layer. in The refraction angle of incident light as it passes through the second surface is given by the following formula: The transmittance coefficient of the multicolored thin film structure, mainly composed of the first optical structure layer, the dielectric layer, and the second optical structure layer, is expressed as: Transmittance is expressed as:

[0037] Furthermore, the transmission coefficient and transmittance of the colorful thin film structure also apply to the case where incident light enters the optical cavity from the second optical structure layer.

[0038] In some embodiments, the colorful thin film structure includes one or more first optical structure layers, one or more dielectric layers, and one or more second optical structure layers.

[0039] In some embodiments, the colorful thin film structure includes a plurality of first optical structure layers and / or a plurality of second optical structure layers as well as a plurality of dielectric layers.

[0040] In some implementations, the first optical structure layer is a metallic material layer or is composed of gas.

[0041] Furthermore, the thickness of the first optical structure layer is preferably 0 to 20 nm, and more preferably greater than 0 and less than 20 nm.

[0042] In some implementations, the first optical structure layer is a metal layer.

[0043] In some implementations, the first optical structure layer is formed of air.

[0044] In some implementations, the first or second optical structure layer is absent.

[0045] Furthermore, the material of the metal layer includes any one or more combinations of tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium, and palladium, but is not limited thereto.

[0046] Furthermore, an optimized dielectric layer can be added between the first or second optical structure layer and the dielectric layer to optimize the color of the multicolor thin film structure.

[0047] Furthermore, an optimization medium layer can be added to the first or second optical structure layer, or the first or second optical structure layer can be disposed on the optimization medium layer to optimize the color of the multicolor thin film structure.

[0048] Furthermore, the material of the optimized dielectric layer includes, but is not limited to, WO3, NiO, TiO2, Nb2O5, Fe2O3, V2O5, Co2O3, Y2O3, Cr2O3, MoO3, Al2O3, SiO2, MgO, ZnO, MnO2, CaO, ZrO2, Ta2O5, and Y3Al5O. 12 Er₂O₃, ZnS, MgF₂, SiN x (Silicon nitride), etc., but not limited to these.

[0049] For example, in certain materials or thicknesses of multicolored thin films in the embodiments of the present invention, adding a semiconductor material of appropriate thickness can improve the intensity difference of the reflectivity curve, thereby improving the color saturation.

[0050] Furthermore, the thickness of the optimized dielectric layer is preferably 0–2000 nm, preferably 0–500 nm, preferably 0–300 nm, and especially preferably 1–100 nm.

[0051] Furthermore, the colorful thin film structure has an optical transmission working mode, an optical reflection working mode, or an optical transmission and reflection working mode.

[0052] In the optical reflection mode, the multicolored thin film structure has a double-sided asymmetrical structural color. In the optical transmission mode, the multicolored thin film structure has a transparent structural color.

[0053] In some embodiments, the thickness of the dielectric layer is greater than 0 and less than or equal to 2000 nm, preferably 50 to 2000 nm, and more preferably 100 to 500 nm, so as to make the color saturation of the multicolor thin film structure higher.

[0054] In some implementations, the material of the dielectric layer is selected from organic or inorganic materials.

[0055] Furthermore, the inorganic material includes any one or more combinations of metallic or non-metallic elements, inorganic salts, and oxides, but is not limited thereto.

[0056] Furthermore, the non-metallic element includes any one or more combinations of monocrystalline silicon, polycrystalline silicon, and diamond, but is not limited thereto.

[0057] Furthermore, the inorganic salt includes any one or more combinations of fluorides, sulfides, selenides, chlorides, bromides, iodides, arsenides, or tellurides, but is not limited thereto.

[0058] Furthermore, the oxides include WO3, NiO, TiO2, Nb2O5, Fe2O3, V2O5, Co2O3, Y2O3, Cr2O3, MoO3, Al2O3, SiO2, MgO, ZnO, MnO2, CaO, ZrO2, Ta2O5, and Y3Al5O. 12 Any one or more of Er2O3 and IrO2, but not limited to these.

[0059] Furthermore, the sulfide includes any one or more combinations of ZnS, GeS, MoS2, and Bi2S3, but is not limited thereto.

[0060] Furthermore, the selenide includes any one or more combinations of ZnSe, GeSe, MoSe2, PbSe, and Ag2Se, but is not limited thereto.

[0061] Furthermore, the chloride includes, but is not limited to, AgCl, etc.

[0062] Furthermore, the bromide includes any one or more combinations of AgBr and TlBr, but is not limited thereto.

[0063] Furthermore, the iodide includes, but is not limited to, AgI, etc.

[0064] Furthermore, the arsenides include, but are not limited to, GaAs, etc.

[0065] Furthermore, the antimonide includes, but is not limited to, GdTe, etc.

[0066] Furthermore, the material of the dielectric layer includes SrTiO3 and Ba3Ta4O. 15 The following are any one or more combinations of Prussian blue, Prussian black, Prussian white, and Prussian green, but not limited to these.

[0067] Furthermore, the material of the dielectric layer includes liquid crystal material or MOF material, but is not limited to these.

[0068] Furthermore, the organic material includes, but is not limited to, small organic molecule compounds and / or polymers.

[0069] Furthermore, the organic material includes any one or more combinations of violetin, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, terephthalic acid, dimethyl diphenylamine, tetrathiofenene, alkyl bipyridine, phenothiazole, polyamide, epoxy resin, and polydiyne, but is not limited thereto.

[0070] In some embodiments, the dielectric layer may primarily consist of an electrochromic material. The electrochromic material may be selected from inorganic, organic, liquid crystal, and MOF materials. For example, the inorganic material may include, but is not limited to, WO3, NiO, TiO2, Nb2O5, Fe2O3, V2O5, Co2O3, Y2O3, MoO3, IrO2, Prussian blue, Prussian black, Prussian white, and Prussian green. The organic material may include, but is not limited to, violetin, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, dimethyl diphenylamine, tetrathiofene, alkyl bipyridine, phenthiazole, and polydiyne.

[0071] In some implementations, the thickness and / or material of the first optical structure layer, the second optical structure layer, and the dielectric layer can be adjusted to adjust the color of the multicolor thin film structure.

[0072] In some embodiments, the multicolor thin film structure includes a working electrode, a counter electrode, and an electrolyte distributed between the working electrode and the counter electrode, wherein the working electrode includes a dielectric layer formed of an electrochromic material.

[0073] Furthermore, the electrochromic material can be selected from organic or inorganic electrochromic materials. Inorganic electrochromic materials can be oxides of Co, Rh, Ir, Ni, Cr, Mn, Fe, Ti, V, Nb, Ta, Mo, and W, such as LiNiO2 (lithium nickel oxide), IrO2, NiO, V2O5, LixCoO2 (lithium cobalt oxide), Rh2O3, CrO3, WO3, MoO3, Nb2O5, Ta2O5, or TiO2, and are not limited thereto. Organic electrochromic materials can be organic polymers, small organic molecules, metal supramolecular polymers, organometallic compounds, such as methyl viologen, violarin, polyaniline, polythiophene, polypyrrole, Prussian blue, organometallic chelates (e.g., titanine compounds), polydiyne, and are not limited thereto.

[0074] Furthermore, there are no particular restrictions on the type of electrolyte; liquid electrolytes, gel polymer electrolytes, or inorganic solid electrolytes can be used.

[0075] In some embodiments, the electrolyte is in contact with the dielectric layer and provides a material for the movement of ions, such as hydrogen ions or lithium ions, that cause the electrochromic material to change or decolorize.

[0076] In some embodiments, the electrolyte may contain one or more compounds, such as H+. + Li + Al 3+ Na + K +、Rb + Ca 2+ Zn 2+ Mg 2+ or Cs + The electrolyte layer may contain lithium salt compounds, such as LiClO4, LiBF4, LiAsF6, or LiPF6. Ions contained in the electrolyte can influence the color change or light transmittance of the device as they are inserted into or removed from the dielectric layer according to the polarity of the applied voltage.

[0077] In some embodiments, the electrolyte can be a mixed electrolyte, such as a mixed electrolyte composed of two or more salts from aqueous systems, including LiCl, AlCl3, HCl, MgCl2, and ZnCl2. Using an electrolyte containing two or more ions allows for richer color variations and higher color saturation in the multi-colored thin film structure of the foregoing embodiments of the present invention compared to using an electrolyte containing only a single ion.

[0078] In some embodiments, the electrolyte may be a liquid electrolyte, such as aqueous solutions of LiCl, AlCl3, HCl, or H2SO4.

[0079] In some embodiments, the electrolyte may also comprise a carbonate compound. Since carbonate-based compounds have high dielectric constants, they can increase the ionic conductivity provided by the lithium salt. At least one of the following can be used as a carbonate-based compound: PC (propylene carbonate), EC (ethylene carbonate), DMC (dimethyl carbonate), DEC (diethyl carbonate), and EMC (ethyl methyl carbonate). For example, organic electrolytes such as LiClO4 or Na(ClO4)3 propylene carbonate electrolytes can be used.

[0080] In some embodiments, the electrolyte may be a gel electrolyte, such as PMMA-PEG-LiClO4, PVDF-PC-LiPF6, LiCl / PVA, H2SO4 / PVA, etc., but is not limited thereto.

[0081] In some preferred embodiments, when an inorganic solid electrolyte is used as the electrolyte, the electrolyte may contain LiPON or Ta₂O₅. For example, the electrolyte may be, but is not limited to, a Li-containing metal oxide film, such as LiTaO or LiPO. Furthermore, the inorganic solid electrolyte may be an electrolyte in which LiPON or Ta₂O₅ is supplemented with components such as B, S, and W, for example, LiBO₂+Li₂SO₄, LiAlF₄, LiNbO₃, Li₂O-B₂O₃, etc.

[0082] Preferably, the device further includes an ion storage layer.

[0083] Furthermore, the ion storage layer is in contact with the electrolyte.

[0084] Furthermore, the counter electrode may include a substrate, a transparent conductive layer, and an ion storage layer.

[0085] Furthermore, the material of the ion storage layer can be selected from, but is not limited to, NiO, Fe2O3, TiO2, Prussian blue, IrO2, etc.

[0086] In some embodiments, the counter electrode is transparent or translucent.

[0087] In some embodiments, the working electrode may also include a transparent conductive electrode. The transparent conductive electrode can be formed using a material with high light transmittance and low sheet resistance, for example, it can be formed using any of the following: a transparent conductive oxide selected from ITO (indium tin oxide), FTO (fluorine-doped tin oxide), AZO (aluminum-doped zinc oxide), GZO (gallium-doped zinc oxide), ATO (antimony-doped tin oxide), IZO (indium-doped zinc oxide), NTO (niobium-doped titanium oxide), ZnO, OMO (oxide / metal / oxide), and CTO; silver (Ag) nanowires; a metal mesh; or OMO (oxide-metal oxide).

[0088] There are no particular limitations on the method for forming the transparent conductive electrode or transparent conductive layer; any known method can be used without restriction. For example, a thin film electrode layer containing transparent conductive oxide particles can be formed on a glass base layer by methods such as sputtering or printing (screen printing, gravure printing, inkjet printing, etc.). In the case of a vacuum method, the thickness of the electrode layer thus prepared can be in the range of 10 nm to 500 nm, while in the case of a printing method, the thickness can be in the range of 0.1 μm to 20 μm. In one example, the visible light transmittance of the transparent conductive electrode layer can be from 70% to 95%.

[0089] In some preferred embodiments, the electrolyte is an all-solid-state electrolyte, which can be combined to form an all-solid-state multicolor thin film structure, comprising a solid dielectric layer, a first optical structure layer, a second optical structure layer, and a counter electrode. For example, the all-solid-state electrolyte within the all-solid-state multicolor thin film structure can be presented as a solid ion-conducting layer. The color-changing principle of this type of all-solid-state multicolor thin film structure is as follows: the metal reflective layer and other layer materials constitute a metal-dielectric structure, and may also include other layers, such as an ion-conducting layer, an ion storage layer, and a transparent conductive layer. By adjusting the thickness of each layer to a suitable range, an electrochromic structure with structural color can be prepared. Furthermore, by applying a voltage, the refractive index of the electrochromic material can be adjusted, and the color of the all-solid-state multicolor thin film structure can be further adjusted.

[0090] In some implementations, besides adjusting the color (structural color) of the multicolor thin film structure by adjusting the thickness and / or material of the first optical structural layer, the second optical structural layer, and the dielectric layer, the color of the multicolor thin film structure can also be controlled by adjusting the potential difference applied between the aforementioned working electrode and the counter electrode to at least change the refractive index of the electrochromic material in the dielectric layer. This control process can be dynamic, thus achieving the fusion of multicolor structural color and electrochromism, greatly enriching the color modulation of the multicolor thin film structure.

[0091] Of course, the device may also include components such as a control module and a power module that work in conjunction with the colorful thin film structure. These accessory components may be included with the device or added separately.

[0092] In some embodiments of the present invention, at least one of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, chemical vapor deposition, and electrochemical deposition can be used to fabricate the aforementioned first optical structure layer, second optical structure layer, dielectric layer, etc.

[0093] More specifically, the dielectric layer can be prepared by methods such as magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, chemical vapor deposition, and electrochemical deposition, but is not limited to these methods. For example, the dielectric layer can be formed by treating metallic materials using methods such as laser direct writing and chemical etching.

[0094] More specifically, the first optical structural layer, the second optical structural layer, etc., can be prepared by magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, chemical vapor deposition, etc.

[0095] In addition, the first or second optical structure layer, dielectric layer, etc., can also be formed by coating, printing, casting, atomic force deposition, sol-gel technology, etc., and are not limited thereto.

[0096] Furthermore, the device is a consumer electronics product or a home appliance, and the colorful thin film structure is connected to and / or integrally formed on the housing and / or display screen of the device.

[0097] The consumer electronics products mentioned include, but are not limited to, mobile phones, smart bracelets, tablets or laptops.

[0098] The household appliances mentioned include, but are not limited to, televisions, refrigerators, electric fans, or air conditioners.

[0099] Furthermore, the device is a building, and the colorful film structure is connected to and / or integrally formed on any one of the building's interior walls, exterior walls, ceiling, and windows.

[0100] Furthermore, the device is a vehicle, and the colorful film structure is connected to and / or integrally formed on any one of the vehicle's outer shell, inner wall, and windows.

[0101] The means of transportation can be any type of motor vehicle such as a car, motorcycle, or electric vehicle, or it can be a yacht, an airplane, etc., and is not limited to these.

[0102] Furthermore, the device is a shoe, hat, or garment (including but not limited to clothing, belts, scarves, wristbands, headbands, etc.), and the surface of the device is connected to and / or integrally formed with the colorful thin film structure.

[0103] Furthermore, the colorful thin film structure can be presented as a set graphic structure, such as patterns, text, etc., and is not limited to this.

[0104] The technical solution of the present invention will be further described in detail below through several embodiments and in conjunction with the accompanying drawings. However, the selected embodiments are only for illustrating the present invention and do not limit the scope of the present invention.

[0105] See Example 1 Figures 1-2As shown, this embodiment discloses a mobile phone, including a mobile phone body 1 and a mobile phone case 2, which includes a housing 10. A logo 3 formed by a multi-colored thin film structure is integrally formed on the housing. This multi-colored thin film structure is an all-solid-state electrochromic structure, which includes a working electrode, an electrolyte layer, and a counter electrode. The electrolyte layer is disposed between the working electrode and the counter electrode. The working electrode includes a tungsten metal layer 11 with a thickness of approximately 100 nm and a tungsten oxide dielectric layer 12 with a thickness of approximately 150 nm to 400 nm, sequentially deposited on the mobile phone case housing by magnetron sputtering. The electrolyte 13 is LiNbO3 with a thickness of approximately 600 nm. The counter electrode 15 is ITO with a thickness of approximately 200 nm. An ion storage layer NiO 14 with a thickness of approximately 200 nm is disposed between the counter electrode and the electrolyte. Of course, the aforementioned tungsten film and tungsten oxide layer can also be prepared using industry-known methods such as electron beam evaporation, thermal evaporation, and ion plating.

[0106] When the logo is not powered on, it displays a single color. However, when the power is connected (to the phone's power supply), the logo's color can change between various colors by adjusting the voltage (either through the phone's built-in voltage control function or by adding a voltage control element). For example, it can change from red to yellow, then from yellow to green, or it can display blue, purple, etc. Furthermore, the hue, saturation, and brightness can all be adjusted in real time.

[0107] Example 2: This example discloses a refrigerator panel, which includes a transparent cover plate covering the front side of the refrigerator body. A multi-colored thin film structure is coated on the inner wall of the transparent cover plate. This multi-colored thin film structure is an all-solid-state electrochromic structure, which includes a working electrode, an electrolyte layer, and a counter electrode, with the electrolyte layer disposed between the working electrode and the counter electrode. The working electrode includes a Cr layer with a thickness of approximately 50 nm deposited sequentially on the phone casing by magnetron sputtering. A Prussian blue layer with a thickness of approximately 100 nm is electrochemically deposited on the Cr layer. A ZnS layer with a thickness of approximately 1 nm to 15 nm is magnetron sputtered on the Prussian blue layer. A LiAlF4 electrolyte layer with a thickness of approximately 300 nm is formed on the ZnS layer. An Fe2O3 layer with a thickness of approximately 100 nm is formed on the electrolyte layer. An AZO layer with a thickness of approximately 80 nm is disposed on the Fe2O3 layer as a counter electrode.

[0108] When the multi-colored thin film structure is not powered, it presents a single color. However, after the power is turned on (by the power module of the refrigerator), the color of the multi-colored thin film structure can be switched between red, yellow, and blue by adjusting the voltage (which can be achieved through an added voltage control element).

[0109] Example 3: This example discloses a building having one or more windows, some of which include window frames and glass fixed to the window frames. The glass is covered with a multicolored thin film structure, which includes a first dielectric layer, a second optical structure layer, a second dielectric layer, and a first optical structure layer formed sequentially on the glass. The first optical structure layer is air, the second optical structure layer is a tungsten film, and the first and second dielectric layers are formed of tungsten oxide layers.

[0110] The tungsten oxide layer, serving as the first dielectric layer, can be formed by methods such as magnetron sputtering, and has a thickness of approximately 1 nm to 400 nm. The thickness of the tungsten metal film is approximately 10 nm. The tungsten oxide layer, serving as the second dielectric layer, has a thickness of approximately 100 nm to 400 nm, and can be formed on the tungsten metal film by magnetron sputtering.

[0111] Viewed from the first optical structure layer, a multi-colored thin film structure reflecting a rich array of vibrant colors is observed. Viewed from the glass side, the corresponding reflected colors also exhibit a rich and vibrant array, distinct from those seen from the thin film side. Furthermore, transmitted structural colors can be obtained through this multi-colored thin film structure, also displaying a rich and vibrant array of colors. The transmittance of both reflected and transmitted colors in the multi-colored thin film structure is determined by the thickness of the tungsten metal layer and the tungsten oxide layer.

[0112] Example 4: This example discloses an automobile, on which a reflective / transmittance dual-mode multicolor thin film structure is conformally covered on the window glass, which includes a working electrode, an electrolyte layer and a counter electrode, with the electrolyte layer disposed between the working electrode and the counter electrode.

[0113] The working electrode includes a first optical structure layer, a second optical structure layer, and a dielectric layer. The first optical structure layer is a tungsten film with a thickness of approximately 5 nm, the second optical structure layer is a silver film with a thickness of approximately 10 nm, and the dielectric layer is a titanium oxide layer with a thickness of 100 nm to 400 nm. A transparent conductive layer formed of silver nanowires is also formed on the car window glass, and the first or second optical structure layer is formed on this transparent conductive layer.

[0114] The window glass in this embodiment appears in different colors when viewed from both sides, and also has a transmissive structural color.

[0115] The aforementioned working electrode is then paired with a pair of electrodes (e.g., NiO counter electrode), and a LiCl / PVA gel electrolyte is placed between them. A lead wire is then led out and connected to the vehicle's power supply. By applying voltage to the multicolored thin film structure and adjusting the voltage range, the color of the multicolored thin film structure can be further modulated, allowing it to change between more colors. In particular, the color changes on both sides of the car window are not exactly the same.

[0116] Example 5: This example discloses a sun hat, wherein a portion of the hat body is made of PET film, on which a multicolored pattern with a multicolored film structure is formed. This multicolored film structure includes a working electrode, an electrolyte layer, and a counter electrode, with the electrolyte layer disposed between the working electrode and the counter electrode. The working electrode and the counter electrode are also electrically connected to an organic photovoltaic cell disposed on the sun hat via a voltage control module.

[0117] The working electrode comprises a tungsten film with a thickness of approximately 500 nm magnetron sputtered onto a PET film. Each pixel of this tungsten film (corresponding to the multi-colored pattern) is oxidized using laser direct writing to form tungsten oxide layers of varying thicknesses as dielectric layers. The thickness of these dielectric layers is approximately 0-300 nm. The laser direct writing process conditions include: the tungsten film can be placed on an XY computer-controlled stage with a moving speed of 15 mm / s, a continuous laser power of 100 W, a laser rectangular spot size of 1.4 mm × 1.4 mm, a defocusing amount of 5 mm, a spot overlap rate of 40%, and a laser treatment time of 0-5 s. The aforementioned counter electrode can be a NiO counter electrode layer. A LiBO2+Li2SO4 solid electrolyte is encapsulated between the working electrode and the counter electrode, and then wires are led out. By applying voltage to this multi-colored thin film structure using an organic photovoltaic cell, its colors can be further modulated. At a voltage of -2.5V to +2.5V, the red region of the working electrode will change between red, orange, and yellow in real time; the blue region will change between blue, purple, and red in real time.

[0118] It should be understood that the above embodiments are merely illustrative of the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the content of the present invention and implement it accordingly. They should not be construed as limiting the scope of protection of the present invention. All equivalent changes or modifications made in accordance with the spirit and essence of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A device comprising a multicolored thin film structure, the device being selected from consumer electronics, home appliances, buildings, vehicles, shoes, hats, or clothing, and the device comprising a substrate on which the multicolored thin film structure is connected or integrally formed, the multicolored thin film structure comprising a working electrode, a counter electrode, and an electrolyte, the electrolyte being distributed between the working electrode and the counter electrode; characterized in that: The working electrode includes at least one dielectric layer and a second optical structure layer; each dielectric layer, together with a first reflective surface and a second reflective surface, forms an optical cavity, wherein the first reflective surface is a first surface of the dielectric layer, and the second reflective surface is the interface between the second surface of the dielectric layer and the second optical structure layer, and the first surface and the second surface are disposed opposite to each other; the material of the dielectric layer is selected from inorganic electrochromic materials and / or organic electrochromic materials; the second optical structure layer is a metal material layer with a thickness greater than 0 and less than 20 nm; When incident light enters the optical cavity, the phase shift of the reflected light formed at the first reflecting surface and the reflected light formed at the second reflecting surface... d is the thickness of the dielectric layer. Let λ be the refractive index of the dielectric layer, and λ be the wavelength of the incident light. The angle of refraction of the incident light as it passes through the first reflecting surface; By adjusting the potential difference applied between the working electrode and the counter electrode, the refractive index of the electrochromic material within the dielectric layer is changed, thereby dynamically controlling the color of the multicolor thin film structure.

2. The apparatus according to claim 1, characterized in that: The thickness of the dielectric layer is greater than 0 and less than or equal to 2000 nm.

3. The apparatus according to claim 2, characterized in that: The thickness of the dielectric layer is 50–2000 nm.

4. The apparatus according to claim 3, characterized in that: The thickness of the dielectric layer is 100–500 nm.

5. The apparatus according to claim 1, characterized in that: The inorganic electrochromic material includes oxides of Co, Rh, Ir, Ni, Cr, Mn, Fe, Ti, V, Nb, Ta, Mo, or W; the organic electrochromic material includes organic polymers, small organic molecules, metal supramolecular polymers, or organometallic compounds.

6. The apparatus according to claim 1, characterized in that: The material of the dielectric layer is selected from one or more combinations of Prussian blue, Prussian black, Prussian white, and Prussian green; or the material of the dielectric layer is selected from liquid crystal material or MOF material. Alternatively, the material of the dielectric layer may be selected from any one or more combinations of violet, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, dimethyl diphenylamine, tetrathiofenene, alkyl bipyridine, phenthiazole, and polydiyne.

7. The apparatus according to claim 1, characterized in that: The multicolored thin film structure further includes a first optical structure layer, wherein the first reflective surface is the junction surface between the first surface of the dielectric layer and the first optical structure layer, and the first optical structure layer is a metal material layer.

8. The apparatus according to claim 7, characterized in that: The first optical structure layer is a metal material layer with a thickness greater than 0 and less than or equal to 20 nm.

9. The apparatus according to any one of claims 1, 7-8, characterized in that: The material of the metal layer is selected from any one or more combinations of tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium, and palladium.

10. The apparatus according to claim 1, characterized in that: An optimized dielectric layer is also distributed between the dielectric layer and the first optical structure layer or the second optical structure layer.

11. The apparatus according to claim 10, characterized in that: The optimized dielectric layer is made of materials selected from WO3, NiO, TiO2, Nb2O5, Fe2O3, V2O5, Co2O3, Y2O3, Cr2O3, MoO3, Al2O3, SiO2, MgO, ZnO, MnO2, CaO, ZrO2, Ta2O5, and Y3Al5O. 12 Any one or more combinations of Er2O3, ZnS, MgF2, and silicon nitride.

12. The apparatus according to claim 10, characterized in that: The thickness of the optimized dielectric layer is greater than 0 and less than or equal to 2000 nm.

13. The apparatus according to claim 12, characterized in that: The thickness of the optimized dielectric layer is greater than 0 and less than or equal to 300 nm.

14. The apparatus according to claim 13, characterized in that: The thickness of the optimized dielectric layer is 1~100 nm.

15. The apparatus according to claim 1, characterized in that: The counter electrode includes a transparent conductive electrode and an ion storage layer, wherein the ion storage layer is distributed between the transparent conductive electrode and the dielectric layer; the electrolyte is selected from liquid electrolyte, gel electrolyte or solid electrolyte.

16. The apparatus according to claim 15, characterized in that: The electrolyte is a solid electrolyte, and the colorful thin film structure is an all-solid-state structure.

17. The apparatus according to claim 1, characterized in that: The device is a consumer electronics product or a home appliance, and the colorful thin film structure is connected and / or integrally formed on the housing and / or display screen of the device. Alternatively, the device may be a building, on which the colorful film structure is connected and / or integrally formed with any of the building’s interior walls, exterior walls, and windows; Alternatively, the device is a vehicle, and the colorful film structure is connected to and / or integrally formed on any one of the vehicle's outer shell, inner wall, and windows; Alternatively, the device may be a shoe, hat, or garment, and the surface of the device may be connected to and / or integrally formed with the colorful thin film structure.

18. The apparatus according to claim 17, characterized in that: The consumer electronics products include mobile phones, smartwatches, tablets, or laptops; the home appliances include televisions, refrigerators, electric fans, or air conditioners.

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