支撑单元和包括该支撑单元的基板处理设备
By designing a support unit with a central vacuum hole and an edge annular slit in the substrate processing equipment, the problem of unstable adsorption of warped substrates on the support unit is solved, achieving more uniform liquid processing and reducing the deterioration of the warped state, thereby improving processing efficiency and reducing the defect rate.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2022-07-13
- Publication Date
- 2026-07-17
AI Technical Summary
During substrate processing, warping causes unstable adsorption and fixation between the support unit and the substrate, affecting the uniformity of liquid processing. In particular, during coating and development, uneven external airflow and pressure transmission increase the process defect rate.
A support unit is designed, including a main body and a support shaft. The upper surface of the main body has a central part and an edge part. The central part forms a vacuum hole, and the edge part forms an annular slit. The side surface of the slit is designed to reduce the influence of external airflow and uniformly transmit pressure. The substrate is fixed by vacuum adsorption.
It effectively reduces the impact of external airflow on substrate processing, uniformizes the liquid coating and development process, reduces the deterioration of substrate warping, improves processing efficiency, and reduces process defect rate.
Smart Images
Figure CN115642118B_ABST