Break-in equipment and break-in method

Abstract

This invention provides a running-in apparatus and method that reliably performs the running-in process of an elastic membrane without reducing the operating rate of the grinding device. The running-in apparatus (50) includes: a platform (54) on which an elastic membrane assembly (7) comprising at least a carrier (8) and an elastic membrane (10) mounted on the carrier is mounted; a running-in determination module (57) opposite to the outermost periphery of the elastic membrane of the elastic membrane assembly mounted on the platform; a fluid supply device (60) for supplying pressurized fluid with a predetermined pressure to a pressure chamber (14a) formed between the outermost periphery of the elastic membrane and the carrier; and a control device (52) for controlling the operation of the running-in determination module and the fluid supply device. The control device determines that the running-in process of the elastic membrane is complete based on the load applied to the running-in determination module by the elastic membrane expanding due to the pressurized fluid supplied to the pressure chamber.

Description

Technical Field

[0001] The present invention relates to an apparatus and method for performing a break-in process on an elastic membrane for use in a substrate holding device for holding a substrate such as a wafer. Background Technology

[0002] A polishing apparatus for CMP (Chemical Mechanical Polishing) holds a substrate, such as a wafer, in a substrate holding device called a top ring or polishing head, and presses the substrate against the polishing surface of a polishing pad held by a polishing table with a specified pressure. At this time, by moving the polishing table relative to the substrate holding device, the substrate and the polishing surface of the polishing pad are brought into sliding contact to polish the surface of the substrate.

[0003] When the relative pressing pressure between the substrate and the grinding surface of the grinding pad is uneven across the entire substrate, under-grinding or over-grinding may occur depending on the pressing pressure applied to different parts of the substrate. Therefore, in order to uniformize the pressing pressure on the substrate, a pressure chamber formed by a soft elastic membrane (diaphragm) is provided at the lower part of the substrate holding device, and a fluid such as air is supplied to the pressure chamber, pressing the substrate through the fluid pressure via the elastic membrane.

[0004] When a polishing apparatus repeatedly polishes a substrate, the elastic membrane ages. The aged elastic membrane needs to be replaced with a new one. Because the new elastic membrane lacks sufficient elasticity (softness), even when a fluid at a specified pressure is supplied to the pressure chamber, the substrate cannot be pressed against the polishing surface of the polishing pad with the desired pressure. Therefore, a fluid (e.g., air) at a specified pressure is supplied to the pressure chamber of the elastic membrane. After a specified time in this state, the pressure chamber is opened to the atmosphere, thereby improving the elasticity of the new elastic membrane (e.g., see Patent Document 1). This specification refers to the stretching treatment (also called the stretching process) of the elastic membrane after replacement as a "run-in process."

[0005] Existing technical documents

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Application Publication No. 2019-77028

[0008] The problem the invention aims to solve

[0009] However, in the past, the break-in process involved attaching a new elastic membrane to the substrate holding device of the polishing apparatus. In this case, the polishing apparatus could not be operated during the break-in process, resulting in a decrease in the operating rate of the polishing apparatus.

[0010] Furthermore, the determination of whether the break-in process has been properly performed is made by examining the polishing profile of the monitoring wafer, which is polished using a new elastic film. Because insufficient break-in requires repeating the process, the operating rate of the polishing equipment is further reduced. Summary of the Invention

[0011] Therefore, the object of the present invention is to provide a running-in device and running-in method that can reliably perform the running-in process of elastic membranes without reducing the operating rate of the grinding device.

[0012] (Solutions)

[0013] One method provides a break-in process apparatus comprising: a platform on which an elastic membrane assembly is mounted, the elastic membrane assembly including at least a carrier and an elastic membrane mounted on the carrier; a break-in determination module opposite to the outermost periphery of the elastic membrane of the elastic membrane assembly mounted on the platform; a fluid supply device supplying a pressurized fluid having a predetermined pressure to a pressure chamber formed between the outermost periphery of the elastic membrane and the carrier; and a control device controlling the operation of the break-in determination module and the fluid supply device, the control device determining that the break-in process of the elastic membrane is complete based on a load applied to the break-in determination module by the elastic membrane expanding due to the pressurized fluid supplied to the pressure chamber.

[0014] In one embodiment, the break-in determination module includes: a load distribution ring opposite to the outermost periphery of the elastic membrane; and a load unit that measures the load applied from the elastic membrane via the load distribution ring.

[0015] In one embodiment, the break-in determination module includes a pressure sensor that measures the distribution of the load applied from the elastic diaphragm in the radial direction of the elastic diaphragm.

[0016] In one embodiment, the break-in determination module further includes a shape measuring device that measures the shape of the lower surface of the outermost periphery of the elastic membrane after the atmosphere is opened. The control device confirms the completion of the break-in process of the elastic membrane based not only on the load applied to the break-in determination module but also on the shape of the lower surface of the outermost periphery of the elastic membrane measured by the shape measuring device.

[0017] In one embodiment, the shape measuring device is a two-dimensional displacement sensor that obtains the shape of the lower surface of the outermost periphery of the elastic membrane by irradiating the lower surface of the outermost periphery of the elastic membrane with a laser.

[0018] In one embodiment, the fluid supply device includes: a fluid supply line communicating with a pressure chamber formed between the elastic membrane and the carrier; and a flow meter and / or pressure gauge disposed in the fluid supply line, wherein the control device supplies the pressurized fluid having a predetermined pressure to the pressure chamber, measures the flow rate and / or pressure of the pressurized fluid, and determines whether to generate a leak detection signal based on the measured values ​​of the flow rate and / or pressure of the pressurized fluid.

[0019] In one embodiment, while supplying the pressurized fluid to the pressurized chamber, the control device adjusts the pressure of the pressurized fluid in the pressurized chamber with a pressure regulator, measures the flow rate of the pressurized fluid, measures the pressure of the pressurized fluid in the pressurized chamber, determines whether the measured flow rate of the pressurized fluid is within a reference range when the pressure variation of the pressurized fluid is within an allowable range, and generates a leak detection signal when the flow rate is outside the reference range.

[0020] One approach provides a break-in process for an elastic membrane mounted on a carrier, characterized in that an elastic membrane assembly comprising at least the carrier and the elastic membrane is mounted on a stage; a pressurized fluid with a predetermined pressure is supplied to a pressure chamber formed between the outermost periphery of the elastic membrane and the carrier; and the break-in process of the elastic membrane is determined to be complete based on the load applied to a break-in determination module opposite to the outermost periphery of the elastic membrane of the elastic membrane assembly mounted on the stage.

[0021] In one approach, the determination of whether the break-in process of the elastic membrane is complete is based on the measurement results of a load unit that measures the load applied from the elastic membrane via a load distribution ring opposite the outermost periphery of the elastic membrane.

[0022] In one approach, the step of determining whether the break-in process of the elastic membrane is complete is based on the measurement results of a pressure sensor that measures the distribution of the load applied from the elastic membrane in the radial direction of the elastic membrane.

[0023] In one approach, the pressure chamber is opened to the atmosphere, and the shape of the lower surface of the outermost periphery of the elastic membrane after the atmosphere is opened is measured. The running-in process of the elastic membrane is confirmed based on the shape of the lower surface of the outermost periphery of the elastic membrane measured by the shape measuring device.

[0024] In one approach, the process of determining the shape of the lower surface of the outermost periphery of the elastic membrane is performed using a two-dimensional displacement sensor, which obtains the shape of the lower surface of the outermost periphery of the elastic membrane by irradiating the lower surface of the outermost periphery of the elastic membrane with a laser.

[0025] In one embodiment, prior to the break-in process, a leak check of the elastic membrane is included. The leak check involves supplying pressurized fluid into a pressure chamber formed between the elastic membrane and the carrier while the elastic membrane is in close contact with the carrier, measuring the flow rate and / or pressure of the pressurized fluid, and determining whether to generate a leak detection signal based on the measured values ​​of the flow rate and / or measured pressure of the pressurized fluid.

[0026] In one embodiment, the leak check involves measuring the flow rate of the pressurized fluid while adjusting the pressure of the pressurized fluid in the pressure chamber using a pressure regulator during the supply of the pressurized fluid to the pressure chamber, measuring the pressure of the pressurized fluid in the pressure chamber, determining whether the measured flow rate of the pressurized fluid is within a reference range when the pressure variation of the pressurized fluid is within an allowable range, and generating a leak detection signal when the flow rate is outside the reference range.

[0027] (The effect of the invention)

[0028] The break-in process of the elastic membrane can be completed before the elastic membrane assembly is installed in the grinding device. Therefore, it is not necessary to perform a break-in process on the elastic membrane after the elastic membrane assembly is installed in the grinding device, nor is it necessary to confirm that the elastic membrane has acquired sufficient elasticity. As a result, a decrease in the operating rate of the grinding device can be prevented. Attached Figure Description

[0029] Figure 1 This is a diagram showing an example of a grinding apparatus.

[0030] Figure 2 It is a schematic cross-sectional view of the grinding head.

[0031] Figure 3 It means from Figure 2 The diagram shows the state of the grinding head being disassembled from the elastic membrane assembly.

[0032] Figure 4 This is a side view of a break-in process apparatus according to one embodiment.

[0033] Figure 5 It means Figure 4 A schematic diagram of an example of a fluid supply device.

[0034] Figure 6 (a) is a schematic top view of a break-in determination module according to one embodiment. Figure 6 (b) is Figure 6 A-A profile of (a).

[0035] Figure 7This is a flowchart illustrating an example of the break-in process.

[0036] Figure 8 It is a schematic diagram showing the expansion state of the outermost periphery of the elastic membrane when pressurized fluid is supplied in the edge pressure chamber.

[0037] Figure 9 (a) is a graph showing a reference distribution of the load pressed on the outermost periphery of the elastic membrane in the radial direction of the elastic membrane, and an example of an allowable range set for that reference distribution. Figure 9 (b) indicates that the measurement result of the pressure sensor remains at [a certain value]. Figure 9 The graph of the permissible range shown in (a) is a curve. Figure 9 (c) indicates that the measurement result of the pressure sensor exceeds... Figure 9 The graph of the permissible range shown in (a) is a curve.

[0038] Figure 10 (a) is a top view of the break-in determination module in another implementation. Figure 10 (b) is Figure 10 (a) is a cross-sectional view of line B-B.

[0039] Figure 11 (a) is a graph showing the measurement results of the lower surface of the outermost periphery of the unused elastic membrane using a two-dimensional displacement sensor. Figure 11 (b) is a graph showing the measurement results of the lower surface of the outermost periphery of the elastic membrane after the break-in process was completed, measured by a two-dimensional displacement sensor.

[0040] Figure 12 This is a flowchart of the confirmation method for verifying the completion of the break-in process of the elastic membrane.

[0041] Figure 13 (a) is a graph representing the target position pre-stored in the control device. Figure 13 (b) is a graph showing an example where the shape measuring instrument's measurement result has reached the target position. Figure 13 (c) is a graph representing an example where the shape measuring instrument's measurement result did not reach the target position.

[0042] Figure 14 It is a graph that shows the pressure change of the pressurized fluid in the pressure chamber when there is no leakage, and the flow rate change of the pressurized fluid flowing in the fluid delivery pipeline connected to the pressure chamber.

[0043] Figure 15 It is a graph that shows an example of the pressure change of the pressurized fluid in the pressure chamber and the flow rate change of the pressurized fluid in the fluid delivery pipeline connected to the pressure chamber when there is a leak in the pressurized fluid.

[0044] Figure 16 This is a flowchart illustrating a leak detection method in one embodiment.

[0045] Symbol Explanation

[0046] 1: Grinding head (substrate holding device)

[0047] 3: Buckle

[0048] 5: Head base

[0049] 7: Elastic membrane assembly

[0050] 8: Carrier

[0051] 10: Elastic membrane (diaphragm)

[0052] 10a~10h: Peripheral wall

[0053] 12: Central Pressure Chamber

[0054] 14a, 14b: Edge pressure chambers

[0055] 16a~16e: Intermediate pressure chamber

[0056] 18: Grinding table

[0057] 19: Grinding pad

[0058] 50: Break-in process device

[0059] 51: Processing Room

[0060] 52: Control device

[0061] 53: Control Box

[0062] 54: Platform

[0063] 55: Link Header

[0064] 56: Monitor

[0065] 57: Break-in period assessment module

[0066] 60: Fluid supply device

[0067] 61: Load Distribution Loop

[0068] 62: Load measuring device

[0069] 63: Shape measuring device

[0070] F1~F8: Fluid transport pipelines

[0071] F11~F18: Atmospheric open pipelines

[0072] G1~G8: Flow meters

[0073] P1~P8: Pressure sensors

[0074] R1~R8: Pressure regulators

[0075] V1~V8: On / off valves

[0076] V11~V18: Atmospheric opening valve Detailed Implementation

[0077] Hereinafter, embodiments of the present invention will be described with reference to the figures.

[0078] Figure 1 This is a diagram illustrating an example of a grinding apparatus. (For example...) Figure 1 As shown, the polishing apparatus includes: a polishing table 18 that supports a polishing pad 19; and a polishing head (substrate holding device) 1 that holds a wafer W, which is an example of a substrate, and presses it onto the polishing pad 19 on the polishing table 18. Figure 1 The grinding apparatus shown has an elastic membrane installed on the grinding head 1 to perform the running-in process described later.

[0079] The polishing table 18 is connected to a stage motor 29 disposed below it via a stage spindle 18a and can rotate around the stage spindle 18a. A polishing pad 19 is attached to the upper surface of the polishing table 18, and the surface 19a of the polishing pad 19 forms the polishing surface of the polishing wafer W. The polishing pad 19 is supported by the polishing table 18.

[0080] A processing fluid supply nozzle 25 is provided above the grinding table 18. The processing fluid supply nozzle 25 can supply grinding fluid or cleaning fluid (e.g., pure water) or processing fluid composed of other liquids to the grinding pad 19 on the grinding table 18.

[0081] The grinding head 1 includes: a head body 2 that presses the wafer W onto the grinding surface 19a; and a retaining ring 3 that holds the wafer W and prevents it from popping out of the grinding head 1. The grinding head 1 is connected to a head shaft 27, which can move up and down relative to the head support arm 64 via a vertical movement device 81. The vertical movement of the head shaft 27 allows the entire grinding head 1 to be positioned relative to the head support arm 64. A rotary joint 82 is mounted at the upper end of the head shaft 27.

[0082] The up-and-down moving device 81 for moving the head shaft 27 and the grinding head 1 up and down includes: a bridge 84 that rotatably supports the head shaft 27 via a bearing 83; a ball screw 88 mounted on the bridge 84; a support platform 85 supported by a support column 86; and a servo motor 90 mounted on the support platform 85. The support platform 85 supporting the servo motor 90 is fixed to the head arm 64 via the support column 86.

[0083] The ball screw 88 includes: a helical shaft 88a connected to the servo motor 90; and a nut 88b for screwing into the helical shaft 88a. The head shaft 27 can be integrated with the bridge 84 and move up and down. Therefore, when the servo motor 90 is driven, the bridge 84 moves up and down via the ball screw 88, thereby moving the head shaft 27 and the grinding head 1 up and down.

[0084] The head shaft 27 is connected to the rotating cylinder 66 via a key (not shown). The rotating cylinder 66 has a timing pulley 67 on its outer periphery. A head motor 68 is fixed in the head support arm 64, and the timing pulley 67 is connected to a timing pulley 70 provided on the head motor 68 via a timing belt 69. Therefore, by rotating the head motor 68, the rotating cylinder 66 and the head shaft 27 rotate as a unit via the timing pulley 70, timing belt 69, and timing pulley 67, and the grinding head 1 rotates. The head support arm 64 is supported by a support arm shaft 80 rotatably supported on a frame (not shown). The grinding apparatus includes a control device 40 that controls the various devices within the apparatus, including the head motor 68, servo motor 90, and up-and-down movement device 81.

[0085] The grinding head 1 is configured to hold the wafer W on its lower surface. The head support arm 64 is connected to the support arm motor 89 disposed below it via the support arm shaft 80 and can rotate around the support arm shaft 80. The control device 40 is electrically connected to the support arm motor 89 and is configured to control the support arm motor 89, which serves as a rotation device for rotating the grinding head 1.

[0086] The head arm 64 is configured to rotate with the arm shaft 80 as the center, and the polishing head 1 holding the wafer W on the lower surface is moved from the receiving position (waiting position) of the wafer W to above the polishing pad 19 by the rotation of the head arm 64.

[0087] The polishing of wafer W is performed as follows: The polishing head 1 and polishing table 18 are rotated, and polishing fluid is supplied to the polishing pad 19 from the processing fluid supply nozzle 25 located above the polishing table 18. In this state, the polishing head 1 is lowered to a predetermined position (predetermined height), and the wafer W is pressed against the polishing surface 19a of the polishing pad 19 at this predetermined position. The wafer W slides into contact with the polishing surface 19a of the polishing pad 19, thereby polishing the surface of the wafer W.

[0088] Secondly, regarding Figure 1 The polishing apparatus shown includes a polishing head (substrate holding device) 1, as shown in the reference. Figure 2 Detailed explanation. Figure 2 This is a schematic cross-sectional view of the grinding head 1. (e.g.) Figure 2 As shown, the grinding head 1 includes: a head base 5 fixed to the lower end of the head shaft 27; and an elastic membrane assembly 7 mounted on the lower end of the head base 5. The elastic membrane assembly 7 is mounted on the head base 5 via a connecting mechanism not shown.

[0089] The elastic membrane assembly 7 is basically composed of: a retaining ring 3 that directly presses against the polishing surface 19a; an elastic membrane (septum) 10 that presses against the polishing surface 19a against the wafer W; and a carrier 8 for mounting the elastic membrane 10. The retaining ring 3 is configured to surround the wafer W and the elastic membrane 10 and is connected to the carrier 8. The elastic membrane 10 is mounted on the carrier 8 to cover the lower surface of the carrier 8.

[0090] The elastic membrane 10 has a plurality of (eight in the illustration) concentrically arranged annular peripheral walls 10a, 10b, 10c, 10d, 10e, 10f, 10g, and 10h. The peripheral wall 10h corresponds to the sidewall located at the outermost periphery of the elastic membrane 10. Through these plurality of peripheral walls 10a to 10h, between the upper surface of the elastic membrane 10 and the lower surface of the carrier 8, the following are formed: a central circular pressure chamber 12 located at the center; annular edge pressure chambers 14a and 14b located at the outermost periphery; and five annular intermediate pressure chambers (first to fifth intermediate pressure chambers) 16a, 16b, 16c, 16d, and 16e located between the central pressure chamber 12 and the edge pressure chambers 14a and 14b. In this embodiment, the number of pressure chambers formed in the elastic membrane 10 is eight; however, the number of pressure chambers is not limited to this embodiment. The number of pressure chambers can also be increased or decreased depending on the structure of the elastic membrane 10.

[0091] The carrier 8 contains: a flow path 20 connected to the central pressure chamber 12; a flow path 22 connected to the edge pressure chamber 14a; a flow path 24f connected to the edge pressure chamber 14b; and flow paths 24a, 24b, 24c, 24d, and 24e respectively connected to the intermediate pressure chambers 16a, 16b, 16c, 16d, and 16e. Flow paths 20, 22, 24a, 24b, 24c, 24d, 24e, and 24f are respectively connected to fluid lines 26, 28, 30a, 30b, 30c, 30d, 30e, and 30f, which are connected to the pressure regulating device 65 via a rotary joint 82. The pressure regulating device 65 is electrically connected to the control device 40, which controls the operation of the pressure regulating device 65.

[0092] A fixing chamber 34 is formed directly above the buckle 3. The fixing chamber 34 is connected to the pressure regulating device 65 via a flow path 36 and a fluid line 38 formed in the carrier 8.

[0093] Adopting such Figure 2When the polishing head 1 is configured as shown, with the wafer W held in the polishing head 1, the pressure of the pressure fluid supplied to each pressure chamber 12, 14a, 14b, 16a-16e can be controlled to apply different pressures to multiple regions of the elastic membrane 10 along the radial direction of the wafer W. Thus, in the polishing head 1, by adjusting the fluid pressure supplied to each pressure chamber 12, 14a, 14b, 16a-16e formed between the carrier 8 and the elastic membrane 10, the pressing force applied to each region of the wafer W can be adjusted. Simultaneously, by controlling the pressure of the pressure fluid supplied to the fixing chamber 34, the pressing force of the retaining ring 3 on the polishing pad 19 can be adjusted.

[0094] The carrier 8 is formed, for example, from a resin such as an engineering plastic (e.g., PEEK), and the elastic membrane 10 is formed, for example, from a rubber material with excellent strength and durability such as ethylene propylene rubber (EPDM), polyurethane rubber, or silicone rubber.

[0095] When the elastic diaphragm 10 needs to be replaced for maintenance, the new elastic diaphragm 10 lacks sufficient elasticity (flexibility). Therefore, even when fluid with a specified pressure is supplied to each pressure chamber 12, 14a, 14b, 16a-16e, the wafer W cannot be pressed against the polishing surface 19a of the polishing pad 19 with the desired pressure. Therefore, it is necessary to supply pressurized fluid to each pressure chamber 12, 14a, 14b, 16a-16e of the elastic diaphragm 10 and open the pressure chambers to the atmosphere to perform a break-in process that improves the elasticity of the elastic diaphragm 10. Since the elasticity (flexibility) of the elastic diaphragm 10 is improved by this break-in process, the wafer W can be pressed against the polishing surface 19a of the polishing pad 19 with the desired pressure. As a result, the surface of the wafer W can be polished stably.

[0096] When replacing the elastic membrane 10, that is, when performing the break-in process, the elastic membrane assembly 7 is removed from the grinding head 1. Figure 3 It means from Figure 2 The diagram shows the state of the grinding head 1 being disassembled from the elastic membrane assembly 7. Next, the elastic membrane 10 is removed from the carrier 8 of the disassembled elastic membrane assembly 7, and a new elastic membrane 10 is then installed on the carrier 8 of the elastic membrane assembly 7.

[0097] Next, the elastic membrane assembly 7 with the new elastic membrane 10 installed is installed in the running-in treatment device described later, and the running-in treatment of the elastic membrane 10 is performed.

[0098] Figure 4 This is a side view of a break-in process apparatus according to one embodiment. Figure 4The break-in process apparatus 50 shown includes: a platform 54 on which the elastic membrane assembly 7 is mounted; a fluid supply device 60 that supplies pressurized fluid (e.g., compressed air) to the elastic membrane 10 of the elastic membrane assembly 7 mounted on the platform 54; a break-in determination module 57 that determines that the break-in process of the elastic membrane 10 is completed; and a control device 52 that controls at least the operation of the fluid supply device 60 and the break-in determination module 57.

[0099] Furthermore, Figure 4 The break-in apparatus 50 shown includes: a processing chamber 51 for performing break-in treatment on the elastic membrane 10; a control box 53 housing a fluid supply device 60 and a control device 52; a connector 55 for connecting the fluid supply device 60 to the elastic membrane assembly 7; and a display 56 for displaying the break-in treatment plan and break-in treatment results. The display 56 is connected to the control device 52, allowing operators to confirm the break-in treatment plan pre-stored in the control device 52 using the display 56. Furthermore, operators can use a non-illustrated input device (e.g., a keyboard and mouse) to change the break-in treatment plan displayed on the display 56, and can also create new break-in treatment plans.

[0100] The stage 54 in this embodiment includes a main stage 54a, an elastic membrane stage 54b, and a retaining ring stage 54c. The elastic membrane stage 54b and the retaining ring stage 54c are fixed to the upper surface of the main stage 54a. The elastic membrane stage 54b is formed into a disk shape and has a diameter smaller than the outer diameter of the elastic membrane 10. The retaining ring stage 54c has a ring shape and is configured such that its upper surface supports the lower surface of the retaining ring 3. The elastic membrane stage 54b and the retaining ring stage 54c are arranged concentrically.

[0101] When the retaining ring 3 is mounted on the retaining ring stage 54c, the center of the elastic membrane 10 is located on a straight line extending vertically through the center of the elastic membrane stage 54b, and the lower surface of the elastic membrane 10 is in contact with or separated from the upper surface of the elastic membrane stage 54b by a small gap. Therefore, when the elastic membrane assembly 7 is mounted on the stage 54, the outer periphery of the elastic membrane 10 is located above the annular gap formed between the elastic membrane stage 54b and the retaining ring stage 54c.

[0102] The break-in treatment device 50 may also have a platform 54 located inside and outside the treatment chamber 51 (see reference). Figure 4 A sliding mechanism (not shown) moves between the dashed lines. The sliding mechanism pulls the stage 54 outside the processing chamber 51, allowing the operator to easily mount the elastic membrane assembly 7 onto the stage. The sliding mechanism consists, for example, of a track connected to the main stage 54a and a moving mechanism that moves the stage 54 along the track. Examples of moving mechanisms include piston-cylinder mechanisms and ball screw mechanisms. In one embodiment, the moving mechanism may be omitted. In this case, the stage 54 is moved manually.

[0103] The break-in determination module 57 is disposed in the annular gap formed between the elastic membrane stage 54b and the retaining ring stage 54c. Break-in treatment is typically required for the outermost periphery of the elastic membrane 10. In the outermost periphery of the elastic membrane 10, the gap between the elastic membrane 10 and the carrier 8 is sealed by the sidewalls of the elastic membrane 10, i.e., the peripheral wall 10h, and its inner peripheral wall 10g. Because the pressure outside the peripheral wall 10h is atmospheric, when pressurized fluid is supplied to the edge pressure chamber 14a divided by the peripheral walls 10g and 10h, the peripheral wall 10h expands outward. When the peripheral wall 10h expands outward, the downward pressing force of the edge pressure chamber 14a against the polishing surface 19a of the polishing pad 19 is reduced, so the elasticity of the outermost periphery of the elastic membrane 10 has the greatest impact on polishing the wafer W.

[0104] On the other hand, the pressure chambers outside the outermost periphery of the elastic membrane 10 are divided by adjacent peripheral walls 10a to 10g, and the pressure of the pressurized fluid also acts on the outside of these peripheral walls. Therefore, the elasticity of the elastic membrane 10 outside the outermost periphery has almost no impact on the polishing of the wafer W. Therefore, by determining the elasticity of the outermost periphery of the elastic membrane 10, it can be determined whether the break-in process of the elastic membrane 10 is complete. In this embodiment, the elasticity of the outermost periphery of the elastic membrane 10 is measured using the break-in determination module 57, and the control device 52 determines whether the break-in process of the elastic membrane 10 is complete based on the measurement results of the break-in determination module 57.

[0105] The connector 55 is disposed in the processing chamber 51 and can move vertically via a vertical moving mechanism (not shown). During the break-in process, the connector 55 is connected to the elastic membrane assembly 7 mounted on the stage 54 in such a way that pressurized fluid from the fluid supply device 60 (described later) can be independently supplied to the pressure chambers 12, 14a, 14b, 16a~16e of the elastic membrane 10.

[0106] Figure 5 It means Figure 4 A schematic diagram of an example of the fluid supply device 60 shown. Figure 5 The fluid supply device 60 shown has fluid delivery lines F1, F2, F3, F4, F5, F6, F7, and F8 corresponding to pressure chambers 12, 14a, 14b, and 16a-16e. One end of each fluid delivery line F1, F2, F3, F4, F5, F6, F7, and F8 is connected to a fluid supply source. This fluid supply source is, for example, a public pressurized fluid supply source located in a factory equipped with a grinding device. The other end of each fluid delivery line F1, F2, F3, F4, F5, F6, F7, and F8 is connected to a connector 55 located in the processing chamber 51.

[0107] The connector 55 has internal flow paths (not shown) that connect fluid delivery lines F1 to F8 to the carrier 8 when the elastic membrane assembly 7 is installed in the connector 55, respectively. Pressurized fluids such as compressed air can be supplied to pressure chambers 12, 14a, 14b, and 16a to 16e through the fluid delivery lines F1, F2, F3, F4, F5, F6, F7, F8 of the fluid supply device 60 and the internal flow paths of the connector 55.

[0108] Pressure regulators R1, R2, R3, R4, F5, F6, F7, and R8 are respectively installed in fluid delivery pipelines F1, F2, F3, F4, R5, R6, R7, and R8. Pressurized fluid from the pressurized fluid supply source is independently supplied to pressure chambers 12, 14a, 14b, and 16a-16e through pressure regulators R1 to R8. Pressure regulators R1 to R8 are configured to independently adjust the pressure of the pressurized fluid in pressure chambers 12, 14a, 14b, and 16a-16e.

[0109] Fluid transport pipelines F1, F2, F3, F4, F5, F6, F7, and F8 are respectively connected to atmospheric opening pipelines F11, F12, F13, F14, F15, F16, F17, and F18 for opening the interior of pressure chambers 12, 14a, 14b, and 16a~16e to the atmosphere. Atmospheric opening pipelines F11, F12, F13, F14, F15, F16, F17, and F18 are equipped with atmospheric opening valves V11, V12, V13, V14, V15, V16, V17, and V18.

[0110] Fluid transport pipelines F1, F2, F3, F4, F5, F6, F7, and F8 are equipped with on / off valves V1, V2, V3, V4, V5, V6, V7, and V8, respectively. Atmospheric open pipelines F11, F12, F13, F14, F15, F16, F17, and F18 are connected to fluid transport pipelines F1, F2, F3, F4, F5, F6, F7, and F8, respectively, downstream of the on / off valves V1, V2, V3, V4, V5, V6, V7, and V8. On-off valves V1, V2, V3, V4, V5, V6, V7, V8 and atmospheric open valves V11, V12, V13, V14, V15, V16, V17, V18 are connected to control device 52. Control device 52 can independently control the opening and closing actions of each on-off valve V1 to V8 and each atmospheric open valve V11 to V18.

[0111] The on / off valves V1-V8 and the atmospheric venting valves V11-V18 are normally closed. When the control device 52 opens the on / off valves V1-V8, pressurized fluid is supplied from the pressurized fluid supply source to the pressure chambers 12, 14a, 14b, and 16a-16e, causing the elastic diaphragm 10 to expand. In this state, when the control device 52 closes the on / off valves V1-V8 and opens the atmospheric venting valves V11-V18, the pressure chambers 12, 14a, 14b, and 16a-16e are opened to the atmosphere, and the elastic diaphragm 10 contracts. Thus, by causing the elastic diaphragm 10 to expand and contract, the break-in process of the elastic diaphragm 10 is performed.

[0112] Figure 6 (a) is a schematic top view of a break-in determination module according to one embodiment. Figure 6 (b) is Figure 6 A-A profile of (a). Figure 6 (a) and Figure 6 The break-in determination module 57 shown in (b) includes: a load distribution ring 61 opposite to the outermost periphery of the elastic membrane 10; and at least one load measuring device 62.

[0113] The load distribution ring 61 is a clamp that, when pressurized fluid is supplied from the fluid supply device 60 to the edge pressure chamber 14a of the elastic diaphragm 10, contacts the lower surface of the outermost periphery of the elastic diaphragm 10, thereby applying load evenly to at least one load measuring device 62. Furthermore, the outermost periphery of the elastic diaphragm 10 opposite to the load distribution ring 61 includes the region of the edge pressure chamber 14a, and may further extend to the region of the inner edge pressure chamber 14b, or may be a part of the region of the edge pressure chamber 14a.

[0114] In order to accurately measure the load applied from the elastic membrane 10 to the load distribution ring 61, it is advisable to arrange multiple load measuring instruments 62 at equal intervals along the circumferential direction of the load distribution ring 61. Figure 6 (a) and Figure 6 In the break-in determination module 57 shown in (b), three load measuring devices 62 of the load unit are arranged at equal intervals along the circumferential direction of the load distribution ring 61.

[0115] In one embodiment, the load measuring device 62 may also be a pressure sensor capable of measuring the distribution of the load applied to the outermost periphery of the elastic membrane 10 in the radial direction of the elastic membrane 10. When the load measuring device 62 is a pressure sensor, the load distribution ring 61 is omitted. Examples of such pressure sensors include the Tactile Sensor manufactured by NITTA Corporation and the tactile pressure sensor manufactured by PPS Corporation. When the load measuring device 62 of the break-in determination module 57 is a pressure sensor, the break-in determination module 57 may have multiple pressure sensors arranged along the circumferential direction of the elastic membrane 10, or it may have only one pressure sensor. When the break-in determination module 57 has only one pressure sensor as the load measuring device 62, the shape of the pressure sensor in the horizontal direction is preferably the same as the shape of the outermost periphery of the elastic membrane 10 in the horizontal direction.

[0116] In one embodiment, the control device 52 of the running-in processing apparatus 50 can also calculate correction coefficients and / or correction formulas for the grinding scheme of the grinding process performed by the grinding apparatus based on the pressure of the pressurized fluid supplied to the edge pressure chamber 14a and the load (pressure) distribution obtained by the pressure sensor of the load measuring device 62. More specifically, the control device 52 of the running-in processing apparatus 50 calculates correction coefficients and / or correction formulas for the grinding load of the grinding scheme pre-stored in the control device 40 of the grinding apparatus, in a manner that the load distribution obtained by the pressure sensor is close to the reference distribution described later. At this time, the correction coefficients and / or correction formulas calculated by the control device 52 of the running-in processing apparatus 50 are input into the control device 40 of the grinding apparatus, and the control device 40 of the grinding apparatus corrects the grinding load of the grinding scheme based on the input correction coefficients and / or correction formulas. Through this operation, optimal grinding of the wafer W can be performed, taking into account individual differences in the elastic membrane 10 before and after replacement (e.g., some size differences, some hardness differences in the material, etc.).

[0117] When the retaining ring 3 is mounted on the retaining ring carrier 54c, the lower surface of the outermost periphery of the elastic diaphragm 10 (in this embodiment, the lower surface of the elastic diaphragm 10 forming the edge pressure chamber 14a) is opposite to the load distribution ring 61 (or pressure sensor). A small gap is formed between the elastic diaphragm 10 and the load distribution ring 61 (or pressure sensor). During the break-in process, pressurized fluid is supplied to the edge pressure chamber 14a from at least the pressurized fluid source. More specifically, the control device 40 at least opens the on / off valve V8 (see...). Figure 5 The pressurized fluid, adjusted to a specified pressure by the pressure regulator R8, is supplied to the edge pressure chamber 14a.

[0118] In one embodiment, pressurized fluid can be supplied to all pressure chambers 12, 14a, 14b, 16a-16e, or pressurized fluid can be supplied to several pressure chambers, including the edge pressure chamber 14a, among the pressure chambers 12, 14a, 14b, 16a-16e. In recent years, to improve the controllability of the membrane pressure profile of the polished wafer W, there has been a trend towards increasing the number of pressure chambers in the elastic membrane 10. However, in this case, it is not possible to adequately ensure the ease of shape extension of the partition walls dividing each pressure chamber. Therefore, even outside the outermost peripheral area, the elasticity of the elastic membrane 10 must be increased by stretching and contracting it. The control device 52 can supply pressurized fluid with a specified pressure to the desired pressure chamber by opening the on / off valve of the fluid delivery line configured to communicate with the corresponding pressure chamber.

[0119] Next, a method for performing a break-in process using the break-in process apparatus 50 of the above-described embodiment will be explained.

[0120] Figure 7 This is a flowchart illustrating an example of the break-in process. For example... Figure 7 As shown, firstly, the elastic membrane assembly 7 with the new elastic membrane 10 installed is installed on the break-in treatment device 50 (S101). More specifically, the elastic membrane assembly 7 is mounted on the stage 54, and in this state, the connecting head 55 is installed in the elastic membrane assembly 7. Through this action, the outermost periphery of the elastic membrane assembly 7 is opposite to the break-in determination module 57, and pressurized fluid with a specified pressure can be supplied to each pressure chamber 12, 14a, 14b, 16a~16e of the elastic membrane 10.

[0121] Next, pressurized fluid with a predetermined pressure adjusted by pressure regulator R8 is supplied to edge pressure chamber 14a (S102). At this time, pressurized fluid with a predetermined pressure can also be supplied to any or all of the pressure chambers 12, 14b, 16a-16e other than edge pressure chamber 14a. In one embodiment, pressurized fluid is repeatedly supplied to edge pressure chamber 14a and any or all of the pressure chambers 12, 14b, 16a-16e other than edge pressure chamber 14a, and then the chambers 14a and any or all of the pressure chambers 12, 14b, 16a-16e other than edge pressure chamber 14a can be supplied with pressurized fluid and then opened to the atmosphere (depressurization). Then, pressurized fluid can also be supplied to edge pressure chamber 14a and any or all of the pressure chambers 12, 14b, 16a-16e other than edge pressure chamber 14a. Next, control device 52 confirms whether a predetermined time has elapsed (S103). After the predetermined time has elapsed, the load measuring device 62 of the break-in determination module 57 measures the load on the outermost periphery of the elastic membrane 10 pressing the load distribution ring 61 (or the load distribution in the radial direction of the elastic membrane 10) (S104).

[0122] Figure 8This is a schematic diagram showing the expansion state of the outermost periphery of the elastic diaphragm 10 when pressurized fluid is supplied in the edge pressure chamber 14a. The outermost periphery of the elastic diaphragm 10, expanded by the pressurized fluid, presses against the load measuring device 62 of the load unit via the load distribution ring 61. When the load measuring device 62 is a pressure sensor, the outermost periphery of the elastic diaphragm 10, expanded by the pressurized fluid, directly presses against the pressure sensor. The load measuring device 62 measures the load (or the load distribution in the radial direction of the elastic diaphragm 10) of the outermost periphery of the elastic diaphragm 10 pressing against the load distribution ring 61 and transmits the measurement result to the control device 52.

[0123] The control device 52 compares the measurement result of the load measuring device 62 with the preset allowable range of the reference value, and determines whether the measurement result of the load measuring device 62 is within the allowable range (S105). The control device 52 stores the above-mentioned reference value and the allowable range set for the reference value in advance.

[0124] When the elastic membrane 10 lacks sufficient elasticity (softness), it cannot stretch fully. Therefore, the measured value of the load tester 62 is lower than the measured value when the outermost periphery of the elastic membrane 10 with appropriate elasticity is pressed against the load tester 62. The control device 52 determines whether the break-in process of the elastic membrane 10 is complete by comparing the measured result of the load tester 62 with a preset allowable range relative to a reference value.

[0125] When the break-in determination module 57 has multiple load testers 62, the average measured value of these load testers 62 can be used as the measurement result for comparison with the allowable range. In one embodiment, the maximum or minimum measured value of the multiple load testers 62 can also be used as the measurement result for comparison with the allowable range. Alternatively, if any one of the measured values ​​of the multiple load testers 62 exceeds the allowable range, the break-in process is determined to be incomplete.

[0126] Furthermore, the sum of the measured values ​​of multiple load testers 62 can also be used as the measurement result for comparison with the allowable range. In this case, the value obtained by multiplying the reference value set for one load tester 62 by the number of load testers 62 is used as the reference value for comparison with the measurement result, and an allowable range is set for this reference value.

[0127] When the load measuring device 62 is a load unit, if the elastic membrane 10 lacks sufficient elasticity, the measurement result of the load measuring device 62 will be lower than the reference value. Therefore, in this case, if the measurement result of the load measuring device 62 is within the allowable range, it corresponds to the measurement result of the load measuring device 62 being greater than the reference value.

[0128] When the load measuring device 62 is the aforementioned pressure sensor, the reference value is the reference distribution of the load applied to the outermost periphery of the elastic membrane 10 in the radial direction of the elastic membrane 10.

[0129] Figure 9 (a) is a graph showing a reference distribution of the load applied to the outermost periphery of the elastic membrane 10 in the radial direction of the elastic membrane 10, and an example of the allowable range set for this reference distribution. Figure 9 (b) indicates that the measurement result of the pressure sensor remains at [a certain value]. Figure 9 The graph of the permissible range shown in (a) is a curve. Figure 9 (c) indicates that the measurement result of the pressure sensor exceeds... Figure 9 The graph shows the state of the allowable range as shown in (a). Control device 52 pre-stores data such as... Figure 9 The curve shown in (a) determines whether the load distribution obtained by the pressure sensor remains within the allowable range.

[0130] When the load measuring device 62, which functions as a load unit, measures a value greater than a reference value, or when the load measuring device 62, which functions as a pressure sensor ... Figure 9 When the elastic membrane 10 is kept within the allowable range as shown in (b) (S105 YES), the control device 52 determines that the elastic membrane 10 has acquired sufficient elasticity and ends the break-in process of the elastic membrane. At this time, the elastic membrane assembly 7 can be removed from the break-in process device (S106).

[0131] In contrast, when the load measuring device 62, which serves as a load unit, measures a value lower than the reference value, or when the load measuring device 62, which serves as a pressure sensor, measures a value lower than the reference value,... Figure 9 When the condition shown in (c) exceeds the permissible range (NO in S105), the control device 52 determines that the elastic membrane 10 has insufficient elasticity and repeatedly performs the break-in operation shown in S102 to S105. At this time, the control device 52 opens the pressure chambers 12, 14a, 14b, 16a~16e, which are supplied with pressurized fluid, to the atmosphere (S107). Through this operation, the elastic membrane 10 can repeatedly expand by pressurized fluid and contract by opening to the atmosphere before obtaining sufficient elasticity.

[0132] In this embodiment, the break-in process of the elastic membrane 10 can be reliably completed before the elastic membrane assembly 7 is installed in the grinding apparatus. Therefore, after the elastic membrane assembly 7 is installed in the grinding apparatus, it is not necessary to perform a break-in process on the elastic membrane 10, nor is it necessary to confirm that the elastic membrane 10 has acquired sufficient elasticity. As a result, a decrease in the operating rate of the grinding apparatus can be prevented.

[0133] Furthermore, a spare elastic membrane assembly 7 can be prepared in advance, which is equipped with an elastic membrane 10 that has been confirmed to have undergone break-in treatment by the break-in treatment device 50. At this time, by exchanging the elastic membrane assembly 7 in use with the spare elastic membrane assembly 7, the grinding device can operate more quickly.

[0134] Figure 10 (a) is a top view of the break-in determination module 57 in another embodiment. Figure 10 (b) is Figure 10 (a) is a cross-sectional view along line B-B. Since the configuration of this embodiment other than the break-in determination module 57 is the same as that of the above embodiment, repeated descriptions are omitted.

[0135] Figure 10 (a) and Figure 10 The break-in determination module 57 shown in (b) differs from the break-in determination module 57 of the above embodiment in that it further has at least one shape measuring device 63 for determining whether the break-in process of the elastic membrane 10 is completed.

[0136] In this embodiment, the break-in determination module 57 has three shape measuring devices 63. Each shape measuring device 63 is a two-dimensional displacement sensor that obtains the two-dimensional shape of the lower surface of the outermost periphery of the elastic membrane 10 by irradiating the lower surface of the outermost periphery with a laser. However, the type of shape measuring device 63 is not limited to this embodiment. For example, the shape measuring device 63 may also be a camera device that obtains the shape of the lower surface of the outermost periphery of the elastic membrane 10 using image data.

[0137] During the break-in process, the elasticity of the elastic membrane 10 increases. As a result, with the pressure chambers 12, 14a, 14b, 16a~16e of the elastic membrane 10 installed on the carrier 8 open to the atmosphere, the lower surface of the outermost periphery of the elastic membrane 10 after the break-in process is displaced downward by its own weight compared to the lower surface of the outermost periphery of the elastic membrane 10 before the break-in process (i.e., the unused elastic membrane 10).

[0138] Figure 11 (a) is a graph showing the measurement results of the lower surface of the outermost periphery of the unused elastic membrane 10 measured by a two-dimensional displacement sensor. Figure 11 (b) is a graph showing the measurement results of the lower surface of the outermost periphery of the elastic membrane 10 after the break-in process, measured using a two-dimensional displacement sensor. Figure 11 As shown in (a), the lower surface of the outermost periphery of the insufficiently elastic membrane 10 extends approximately horizontally. Through a break-in process, the lower surface of the outermost periphery of the fully elastic membrane 10 is displaced downward by its own weight.

[0139] In addition to determining the load applied to the load measuring device 62, this embodiment also determines the completion of the break-in process based on the determination of the shape change of the elastic membrane 10 obtained by the shape measuring device 63. In other words, the completion of the break-in process determined based on the load applied to the load measuring device 62 is confirmed by determining the shape change of the elastic membrane 10 obtained by the shape measuring device 63.

[0140] The following is for reference Figure 12 Instructions for use Figure 10 (a) and Figure 10 The break-in process of the break-in determination module 57 shown in (b). Figure 12 This is a flowchart of a method for confirming the completion of the break-in process for the elastic membrane 10. Before determining the completion of the break-in process using a load measuring device 62 (such as a load cell), [the process is described in the original text]. Figure 7 The flowcharts described are the same. Therefore, they are omitted. Figure 7 The process description before S105 is shown.

[0141] In this embodiment, the load measuring device 62 determines when the break-in process is complete (i.e., Figure 7 If S105 is "YES", the control device 52 opens the pressure chambers 12, 14a, 14b, and 16a-16e, which are supplied with pressurized fluid, to the atmosphere (S201). Next, the control device 52 uses the shape measuring device 63 to measure the shape of the lower surface of the outermost periphery of the elastic membrane 10 and obtains the measurement result. The control device 52 determines whether the measurement result of the shape measuring device 63 has reached the target position. The control device 52 stores the target position in advance.

[0142] Figure 13 (a) is a graph representing the target position pre-stored in the control device 52. Figure 13 (b) is a graph showing an example where the shape measuring device 63 has reached the target position. Figure 13 (c) is a graph representing an example where the shape measuring device 63 failed to reach the target position.

[0143] like Figure 13 As shown in (b), when the shape measuring device 63 has reached the target position, the control device 52 determines that the break-in process has indeed been completed. At this time, the elastic membrane assembly 7 is removed from the break-in process device (see reference). Figure 7 (S106).

[0144] like Figure 13 As shown in (c), when the measurement result of the shape measuring device 63 has not yet reached the target position, the control device 52 determines that the break-in process is not yet complete, and repeats the process. Figure 7 The break-in process is shown in S102 to S105.

[0145] Thus, this embodiment determines the completion of the break-in process not only based on the load applied to the load measuring device 62, but also based on the shape change of the elastic membrane 10 obtained by the shape measuring device 63. Therefore, it is possible to determine more accurately whether the break-in process has been completed.

[0146] In one embodiment, the load measuring device 62 may be omitted, and the measurement results of the shape measuring device 63 may be used only to determine the completion of the break-in process of the elastic membrane 10.

[0147] In the break-in apparatus 50 of the above embodiment, pressurized fluid can be supplied from a pressurized fluid supply source to each pressure chamber 12, 14a, 14b, 16a-16e using a fluid supply device 60. Therefore, the break-in apparatus 50 can be used to check for leaks in the new elastic membrane 10 installed on the carrier 8. That is, the break-in apparatus 50 can be used to confirm whether there is fluid leakage from the gap between the carrier 8 and the elastic membrane 10.

[0148] return Figure 5 In order to confirm fluid leakage between the elastic membrane 10 and the carrier 8 through the break-in treatment device 50, the fluid supply device 60 has pressure sensors P1, P2, P3, P4, P5, P6, P7, and P8 respectively installed in the fluid delivery lines F1 to F8. The pressure sensors P1 to P8 can respectively measure the pressure of the pressurized fluid present inside the fluid delivery lines F1 to F8.

[0149] Since pressure sensors P1 to P8 are connected to pressure chambers 12, 14a, 14b, and 16a to 16e via fluid delivery lines F1 to F8, they can measure the pressure of the pressurized fluid within these chambers. In this embodiment, pressure sensors P1 to P8 are positioned on the secondary side (downstream side) of on / off valves V1 to V8, that is, between the on / off valves V1 to V8 and pressure chambers 12, 14a, 14b, and 16a to 16e. Pressure sensors P1 to P8 are connected to control device 52, and the measured pressure values ​​of the pressurized fluid present in fluid delivery lines F1 to F8 are transmitted from pressure sensors P1 to P8 to control device 52.

[0150] like Figure 5 As shown, the fluid supply device 60 further includes flow meters G1, G2, G3, G4, G5, G6, G7, and G8 for measuring the flow rate of the pressurized fluid flowing inside the fluid delivery lines F1 to F8. Flow meters G1 to G8 are disposed between pressure regulators R1 to R8 and on / off valves V1 to V8. Flow meters G1 to G8 are connected to the control device 52, and the measured flow rate of the pressurized fluid flowing in the fluid delivery lines F1 to F8 is transmitted from the flow meters G1 to G8 to the control device 52.

[0151] The control device 52 is configured to detect fluid leakage from the elastic diaphragm assembly 7 based on changes in the pressure measurement value and the flow rate measurement value of the pressurized fluid. Leakage checks are performed sequentially on pressure chambers 12, 14a, 14b, and 16a-16e. Hereinafter, one embodiment of the leakage check for pressure chamber 12 will be described. Furthermore, during the leakage check, the elastic diaphragm 10 is brought into close contact with the elastic diaphragm stage 54b of the stage 54. To bring the elastic diaphragm 10 into close contact with the elastic diaphragm stage 54b, a vertical movement mechanism (not shown) can be used to lower the connecting head 55.

[0152] Figure 14 This is a graph illustrating, for example, the pressure change of the pressurized fluid in the pressure chamber 12 when there is no leakage, and the flow rate change of the pressurized fluid flowing in the fluid delivery pipeline F1 connected to the pressure chamber 12. Figure 15 This is a graph illustrating, for example, the pressure change of the pressurized fluid within pressure chamber 12 and the flow rate change of the pressurized fluid flowing in the fluid delivery line F1 connected to pressure chamber 12 when a leak occurs. Pressurized fluid is supplied to pressure chamber 12 via fluid delivery line F1. Pressure regulator R1 operates to maintain the pressure of the pressurized fluid within pressure chamber 12 at a preset target pressure value. The pressure of the pressurized fluid within pressure chamber 12 is measured by pressure sensor P1, and the flow rate of the pressurized fluid flowing in fluid delivery line F1 is measured by flow meter G1. The measured values ​​of the pressurized fluid's pressure and flow rate are sent to control device 52.

[0153] like Figure 14 As shown, pressure fluctuations occur in the initial stage when pressurized fluid is supplied to pressure chamber 12. The pressure of the pressurized fluid gradually stabilizes over time. As the pressure stabilizes, the flow rate of the pressurized fluid gradually decreases, eventually reaching almost zero. However, in the event of a pressurized fluid leak, such as... Figure 15 As shown, although the pressure of the pressurized fluid has stabilized, the flow rate of the pressurized fluid is not close to 0. In other words, because as long as there is a leak in the pressurized fluid, the flow rate of the pressurized fluid corresponding to the amount of leakage will continue to flow in the fluid delivery line F1, so the flow rate will not become 0.

[0154] Therefore, in this embodiment, leak detection is performed based on the pressure and flow rate of the pressurized fluid. Specifically, the flow meter G1 measures the flow rate of the pressurized fluid while it is supplied to the pressure chamber 12 via the pressure regulator R1, and the pressure sensor P1 measures the pressure of the pressurized fluid within the pressure chamber 12. The control device 52 is configured to determine whether the measured flow rate of the pressurized fluid when the pressure of the pressurized fluid is stable is within a preset reference range (±f1). The control device 52 is configured to generate a leak detection signal when the flow rate is outside the reference range.

[0155] The control device 52 has pre-stored within it the allowable range of variation for determining whether the pressure of the pressurized fluid has stabilized. Figure 14 and Figure 15 The symbol FW indicates the permissible variation range. In one embodiment, the center of the permissible variation range FW coincides with the target pressure value. The control device 52 detects leakage of the pressurized fluid based on the flow rate measured when the pressure variation of the pressurized fluid is within the permissible variation range FW, that is, when the pressure of the pressurized fluid has stabilized.

[0156] The control device 52 determines the time t1 when the pressure change of the pressurized fluid is within the allowable variation range FW, and determines whether the flow rate of the pressurized fluid (i.e., the measured value of the flow meter G1) after a predetermined time interval from that time t1 is within a preset reference range (±f1). In one embodiment, the control device 52 can also count the elapsed time of the pressure change of the pressurized fluid within the allowable variation range FW, and determine the time when the elapsed time exceeds the set time as time t1.

[0157] Figure 14 and Figure 15 In the example shown, time t1 is the moment when the elapsed time of the pressure change of the pressurized fluid within the allowable variation range FW exceeds a set time TD. Specifically, the control device 52 pre-stores the set time TD and counts the elapsed time of the pressure change of the pressurized fluid within the allowable variation range FW from the instant the pressure of the pressurized fluid reaches the allowable variation range FW. When the elapsed time of the pressure change of the pressurized fluid within the allowable variation range FW exceeds the set time TD, the control device 52 determines the moment exceeding the set time TD as time t1. If the pressure change of the pressurized fluid exceeds the allowable variation range FW before the elapsed time reaches the set time TD, the control device 52 stops counting the elapsed time. When the pressure change of the pressurized fluid reaches the allowable variation range FW again, the control device 52 resumes counting the elapsed time.

[0158] The control device 52 may also pre-store the maximum monitoring time for monitoring pressure changes in the pressurized fluid, but this is not illustrated. In this case, the control device 52 counts the gas supply time for supplying pressurized fluid to the pressure chamber 12. When the time elapsed within the allowable fluctuation range FW of the pressurized fluid has not yet reached the set time TD, but the gas supply time has reached the maximum monitoring time, the control device 52 determines the moment when the maximum monitoring time is reached as time t1.

[0159] in this way, Figure 14 and Figure 15In the example shown, the control device 52 determines the time t1 at which the pressure variation of the pressurized fluid is within the allowable variation range FW. Furthermore, the control device 52 is configured to determine whether the flow rate of the pressurized fluid, measured before time t1 and within a predetermined time range Ta, is within a reference range. In this embodiment, the time range Ta is smaller than the aforementioned set time TD; however, the time range Ta can also be the same as the set time TD. In this embodiment, the flow rate measured before time t1 is reached is used to check for leaks. Therefore, after time t1 is reached, the control device 52 can determine whether to generate a leak detection signal (i.e., whether a pressurized fluid leak has occurred) based on the measured flow rate obtained from the flow meter G1.

[0160] In one embodiment, the control device 52 can also be configured to determine whether the pressure variation of the pressurized fluid is within the allowable variation range FW at a time t1, and whether the flow rate of the pressurized fluid measured after that time t1 and within a predetermined time range Tb is within the reference range. Figure 13 and Figure 14 In the example shown, the time amplitude Tb is smaller than the set time TD mentioned above, but the time amplitude Tb can also be the same as the set time TD.

[0161] Secondly, refer to Figure 15 The flowchart shown illustrates one implementation of the leak detection method. Figure 16 This is a flowchart illustrating a leakage inspection method according to one embodiment. In S301, the elastic diaphragm 10 is brought into close contact with the elastic diaphragm stage 54b. The purpose of bringing the elastic diaphragm 10 into contact with the elastic diaphragm stage 54b is to stabilize the volume of the pressure chamber when it is filled with pressurized fluid. In S302, the control device 52 starts supplying pressurized fluid to the pressure chamber 12 through the fluid delivery line F1 by opening the on / off valve V1 and closing the on / off valves V2 to V8.

[0162] In S303, during the supply of pressurized fluid to pressure chamber 12 via fluid delivery line F1, flow meter G1 measures the flow rate of the pressurized fluid flowing in fluid delivery line F1, and pressure regulator R1 adjusts the pressure of the pressurized fluid to maintain the pressure of the pressurized fluid in pressure chamber 12 at a target pressure value. The measured flow rate is sent to control device 52 and stored in the storage device of control device 52. During the supply of pressurized fluid to pressure chamber 12, pressure sensor P1 measures the pressure of the pressurized fluid in fluid delivery line F1 (i.e., the pressure in pressure chamber 12). The measured pressure is sent to control device 52 and stored in the storage device of control device 52. During the supply of pressurized fluid to pressure chamber 12, control device 52 monitors the measured flow rate and pressure.

[0163] In S304, the control device 52 determines the time t1 when the pressure fluctuation of the pressurized fluid is within the allowable fluctuation range FW (i.e., the time when the pressure of the pressurized fluid in the pressure chamber 12 stabilizes). In S305, the control device 52 determines whether the flow rate measured before the determined time t1 and within a predetermined time range Ta is within the reference range (±f1). Alternatively, the control device 52 may also determine whether the flow rate measured after the determined time t1 and within a predetermined time range Tb is within the reference range. When the flow rate is outside the reference range, the control device 52 generates a leak detection signal (S306). The leak detection signal is also a trigger signal for issuing an alarm. For example, the leak detection signal may also be used to activate the display 56 (see reference). Figure 4 This indicates that a leak has been detected, or an electrical signal that is used to activate an alarm device.

[0164] After generating a leak detection signal, or when the flow rate is within the reference range, control device 52 executes S307. In S307, control device 52 determines whether a leak check has been performed on all pressure chambers 12, 14a, 14b, and 16a-16e. Control device 52 repeatedly executes S302 to S306 before performing a leak check on all pressure chambers 12, 14a, 14b, and 16a-16e. For example, when performing a leak check on pressure chamber 16a, control device 52 opens the on / off valve V2 and closes the on / off valves V1, V3-V8. S303 to S306 are executed similarly.

[0165] In this embodiment, pressure sensors P1-P8 and flow meters G1-G8 installed in the fluid supply device 60 can be used to perform leak checks on the pressurized fluid supplied to the elastic diaphragm assembly 7. Therefore, leak checks can be performed automatically before the elastic diaphragm assembly 7 is installed in the grinding apparatus. As a result, the workload of personnel performing leak checks can be reduced, and furthermore, the operating rate of the grinding apparatus can be prevented from decreasing.

[0166] In one embodiment, pressure sensors P1-P8 or flow meters G1-G8 provided in the fluid supply device 60 can be used to perform a leak check on the pressurized fluid supplied to the elastic diaphragm assembly 7. For example, when performing a leak check on the pressurized fluid using pressure sensors P1-P8, the control device 52 supplies pressurized fluid with a predetermined pressure to the pressure chamber 12 and closes the on / off valve V1. When performing a leak check on the pressurized fluid using flow meters G1-G8, the control device 52 supplies pressurized fluid with a predetermined pressure to the pressure chamber 12 and keeps the on / off valve V1 open. The control device 52 measures (monitors) the pressure of the pressurized fluid or the flow rate of the pressurized fluid and maintains this state until a predetermined check time has elapsed. When performing a leak check on the pressurized fluid using flow meters G1-G8, the flow rate can also be measured after a predetermined time has elapsed since the pressurized fluid is started being supplied to the pressure chamber 12.

[0167] Next, the control device 52 determines whether to generate a leak detection signal based on the pressure measurement value or the flow rate measurement value of the pressurized fluid. More specifically, when performing a leak check on the pressurized fluid using pressure sensors P1 to P8, the control device 52 generates a leak detection signal when the fluctuation range of the pressure measurement value of the pressurized fluid exceeds a reference value. When performing a leak check on the pressurized fluid using flow meters G1 to G8, the control device 52 compares the flow rate measurement value of the pressurized fluid with a reference range (e.g., referring to...). Figure 16 (The ±f mentioned above). The control device 52 generates a leak detection signal when the measured flow rate of the pressurized fluid is outside the reference range. The control device 52 pre-stores a reference value set for the variation range of the pressure measured value of the pressurized fluid, or a reference range set for the measured flow rate of the pressurized fluid.

[0168] When the elastic diaphragm 10 leaks, the pressure gauge P1 reading gradually decreases. Therefore, when the fluctuation of the pressure gauge P1 reading exceeds the reference value, the control device 52 determines that the elastic diaphragm 10 is leaking and generates a leak detection signal. Furthermore, when the elastic diaphragm 10 leaks, the flow meter G1 detects the flow rate of the pressurized fluid. Therefore, when the flow sensor G1 reading is outside the reference range, the control device 52 determines that the elastic diaphragm 10 is leaking and generates a leak detection signal. The control device 52 repeatedly performs the same leak check until all pressure chambers 12, 14a, 14b, and 16a-16e have undergone leak checks.

[0169] Such leak checks should be performed before the aforementioned break-in process. More specifically, leak checks should be performed before... Figure 7 It is performed between S101 and S102.

[0170] The above embodiments are described with the aim of enabling those skilled in the art to implement the present invention. Those skilled in the art can naturally make various modifications to the above embodiments, and the technical concept of the present invention can be applied to other embodiments. Therefore, the present invention is not limited to the described embodiments, but is interpreted within the broadest scope of the technical concept defined by the claims.

Claims

1. A running-in treatment device, characterized in that, have: A stage on which an elastic membrane assembly is mounted, the elastic membrane assembly comprising at least a carrier and an elastic membrane mounted on the carrier; A break-in determination module, which is opposite to the outermost periphery of the elastic membrane of the elastic membrane assembly mounted on the platform; A fluid supply device that supplies pressurized fluid at a predetermined pressure to a pressure chamber formed between the outermost periphery of the elastic membrane and the carrier; and A control device that controls the operation of the break-in determination module and the fluid supply device. The break-in determination module includes a load measuring device for measuring the load applied when pressing the outermost periphery of the elastic membrane. The control device determines that the break-in process of the elastic membrane is complete based on the load applied to the load measuring device by the elastic membrane, which expands due to the pressurized fluid supplied to the pressure chamber.

2. The break-in treatment apparatus as described in claim 1, characterized in that, The break-in determination module includes a load distribution ring, which is opposite to the outermost periphery of the elastic membrane. The load measuring device is a load unit that measures the load applied from the elastic membrane via the load distribution ring.

3. The break-in treatment apparatus as described in claim 1, characterized in that, The load measuring device is a pressure sensor that measures the distribution of the load applied from the elastic membrane in the radial direction of the elastic membrane.

4. The break-in treatment apparatus according to any one of claims 1 to 3, characterized in that, The break-in determination module further includes a shape measuring device, which can measure the shape of the lower surface of the outermost periphery of the elastic membrane after the atmosphere is opened. The control device confirms the completion of the break-in process of the elastic membrane not only based on the load applied to the break-in determination module, but also based on the shape of the lower surface of the outermost periphery of the elastic membrane measured by the shape measuring device.

5. The break-in treatment apparatus as described in claim 4, characterized in that, The shape measuring device is a two-dimensional displacement sensor, which obtains the shape of the lower surface of the outermost periphery of the elastic membrane by irradiating the lower surface of the outermost periphery of the elastic membrane with a laser.

6. The break-in treatment apparatus according to any one of claims 1 to 3, characterized in that, The fluid supply device has: A fluid supply line communicating with a pressure chamber formed between the elastic membrane and the carrier; and A flow meter and / or pressure gauge, wherein the flow meter and / or pressure gauge is disposed in the fluid supply line. The control device supplies the pressurized fluid with a specified pressure to the pressure chamber, measures the flow rate and / or pressure of the pressurized fluid, and determines whether to generate a leak detection signal based on the measured values ​​of the flow rate and / or pressure of the pressurized fluid.

7. The break-in treatment apparatus as described in claim 6, characterized in that, While supplying the pressurized fluid into the pressure chamber, the control device adjusts the pressure of the pressurized fluid in the pressure chamber using a pressure regulator, and simultaneously measures the flow rate of the pressurized fluid. The pressure of the pressurized fluid in the pressure chamber is measured. The flow rate of the pressurized fluid is measured to determine whether it is within a reference range when the pressure variation of the pressurized fluid is within an allowable range. A leak detection signal is generated when the flow rate is outside the reference range.

8. A break-in treatment method, which is a break-in treatment method for an elastic membrane installed on a carrier, characterized in that, An elastic membrane assembly, comprising at least the carrier and the elastic membrane, is mounted on a platform. The elastic membrane is expanded by supplying a pressurized fluid at a predetermined pressure into a pressure chamber formed between the outermost periphery of the elastic membrane and the carrier. A break-in determination module is configured to oppose the outermost periphery of the elastic membrane of the elastic membrane assembly mounted on the platform. This break-in determination module includes a load measuring device. The break-in process of the elastic membrane is determined to be complete based on the load applied to the load measuring device by the expanded elastic membrane.

9. The break-in process method as described in claim 8, characterized in that, The load measuring device is a load unit. In the process of determining whether the break-in process of the elastic membrane is complete, the load applied from the elastic membrane to the load unit via the load distribution ring opposite the outermost periphery of the elastic membrane is measured, and a determination is made based on the measurement results of the load unit.

10. The break-in process method as described in claim 8, characterized in that, The load measuring device is a pressure sensor. In the process of determining whether the break-in process of the elastic membrane is complete, the distribution of the load applied from the elastic membrane to the pressure sensor in the radial direction of the elastic membrane is measured, and a determination is made based on the measurement results of the pressure sensor.

11. The break-in process method according to any one of claims 8 to 10, characterized in that, Open the pressure chamber to the atmosphere. The shape of the lower surface of the outermost periphery of the elastic membrane after the atmosphere is opened is determined by a shape measuring device. The completion of the break-in process of the elastic membrane is confirmed based on the shape of the lower surface of the outermost periphery of the measured elastic membrane.

12. The break-in process method as described in claim 11, characterized in that, The process of determining the shape of the lower surface of the outermost periphery of the elastic membrane is performed using a two-dimensional displacement sensor, which obtains the shape of the lower surface of the outermost periphery of the elastic membrane by irradiating the lower surface of the outermost periphery of the elastic membrane with a laser.

13. The break-in process method according to any one of claims 8 to 10, characterized in that, Prior to the break-in process, a step of checking for leaks in the elastic membrane is included. The leak detection involves supplying pressurized fluid into a pressure chamber formed between the elastic membrane and the carrier while the elastic membrane is in close contact with the stage, measuring the flow rate and / or pressure of the pressurized fluid, and determining whether to generate a leak detection signal based on the measured values ​​of the flow rate and / or measured pressure of the pressurized fluid.

14. The break-in process method as described in claim 13, characterized in that, The leak check is performed while the pressurized fluid is supplied to the pressure chamber, and the flow rate of the pressurized fluid is measured while the pressure of the pressurized fluid in the pressure chamber is regulated by a pressure regulator. The pressure of the pressurized fluid in the pressure chamber is measured. The flow rate of the pressurized fluid is measured to determine whether it is within a reference range when the pressure variation of the pressurized fluid is within an allowable range. A leak detection signal is generated when the flow rate is outside the reference range.

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