Plasma source and plasma processing device

Abstract

A plasma source and a plasma processing apparatus are provided. The plasma source has: a first chamber configured to form a flat first plasma generation space and having first and second walls that are opposed walls having the largest area among walls configuring the first chamber; a gas supply portion configured to be able to supply a gas into the first chamber; an electromagnetic wave supply portion having a dielectric window disposed facing the first plasma generation space at an opening provided to the first wall and configured to be able to supply an electromagnetic wave into the first chamber via the dielectric window; a plasma supply portion that supplies radicals contained in plasma generated from the gas supplied into the first chamber to the outside of the first chamber; and a plasma ignition source that protrudes from an inner wall of the second wall opposite the dielectric window in the first chamber and is disposed apart from the dielectric window. According to the present application, ignition of plasma can be made easy.

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