A virtual graphics filling method and semiconductor device layout

Abstract

This invention discloses a virtual graphic filling method, comprising: obtaining an unfilled layout; calculating unfillable areas on the layout; arranging virtual graphics along a first boundary and a second boundary of the unfillable areas, the first boundary being opposite to the second boundary; extending the virtual graphics located at the first boundary and the second boundary along a first direction to the boundary of the fillable area, the first direction being parallel to the first boundary; arranging the virtual graphics at intervals in the remaining space of the fillable areas on the layout in a second direction, the second direction being perpendicular to the first direction; and removing the virtual graphics that overlap with the unfillable areas.

Description

Technical Field

[0001] This invention relates to the field of integrated circuit design, and more specifically to a virtual graphic filling method and semiconductor device layout. Background Technology

[0002] In Dynamic Random Access Memory (DRAM) technology, the main capacitor cells are called cell arrays, and the area outside the capacitors is called the peripheral area. During the manufacturing process, for the same layer, the cell array area and the peripheral area require different processes. The process for the cell array area is more complex than that for the peripheral area, requiring more exposures and etching steps. During the intermediate exposure and etching processes, the peripheral area needs to be masked first, leaving only the cell array area exposed. To address the load effect problem during the etching of the cell array, virtual patterns are introduced.

[0003] Etching techniques include wet etching and dry etching. Dry etching is generally used for smaller, critical dimensions, and it typically employs plasma etching technology. Dry etching relies on chemically active free radicals generated by high-glow discharge to react with the material being etched, forming volatile products that continuously corrode the material. The etching load effect occurs because uneven pattern density distribution leads to slower etching rates in denser areas and faster rates in sparser areas, resulting in over-etching in sparse regions. This uneven pattern density distribution is typically addressed by using virtual pattern layers that fill the entire remaining space across a given span. Summary of the Invention

[0004] The purpose of this invention is to provide a virtual graphics filling method and a semiconductor device layout.

[0005] This application provides a virtual graphic filling method, comprising: obtaining an unfilled layout; calculating unfillable areas on the layout; arranging virtual graphics along a first boundary and a second boundary of the unfillable areas, the first boundary being opposite to the second boundary; extending the virtual graphics located at the first boundary and the second boundary along a first direction to the boundary of the fillable area, the first direction being parallel to the first boundary; arranging the virtual graphics at intervals in the remaining space of the fillable areas on the layout in a second direction, the second direction being perpendicular to the first direction; and removing the virtual graphics that overlap with the unfillable areas.

[0006] In some embodiments, the virtual graphic is a strip graphic.

[0007] In some embodiments, arranging virtual graphics along the first boundary and the second boundary of the unfillable region, wherein the first boundary and the second boundary are opposite each other, includes: arranging 1-2 virtual graphics at one end of the first boundary of the unfillable region; and arranging 1-2 virtual graphics at one end of the second boundary of the unfillable region.

[0008] In some embodiments, arranging 1-2 virtual graphics at one end of the first boundary of the unfillable area includes: arranging 1-2 virtual graphics of the same length as the first boundary at one end of the first boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

[0009] In some embodiments, arranging 1-2 virtual graphics at one end of the second boundary of the unfillable area includes: arranging 1-2 virtual graphics of the same length as the second boundary at one end of the second boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

[0010] In some embodiments, the remaining space of the fillable area on the layout is used to arrange the virtual graphics at intervals in the second direction, wherein the second direction is perpendicular to the first direction, which includes arranging the virtual graphics at intervals according to a preset spacing in the second direction.

[0011] In some embodiments, the remaining space of the fillable area on the layout is used to arrange the virtual graphics at intervals in the second direction, wherein the second direction is perpendicular to the first direction and includes arranging the virtual graphics at intervals from the midline position between the first boundary and the second boundary of the unfillable area to both sides.

[0012] In some embodiments, the method further includes: calculating the width of the unfillable region, the width being the distance between the first boundary and the second boundary; and calculating the position of the midline between the first boundary and the second boundary based on the width of the unfillable region.

[0013] In some embodiments, the method further includes: if there are at least two unfillable regions on the layout, when the first boundary and / or the second boundary of two adjacent unfillable regions are not on the same straight line, adding a rectangular region between the two adjacent unfillable regions, the rectangular region serving as the newly added unfillable region.

[0014] In some embodiments, after the virtual graphics are arranged at intervals in the second direction in the remaining space of the fillable area on the layout, the method further includes: removing the virtual graphics that overlap with the newly added unfillable area.

[0015] This application also provides a semiconductor device layout, including: an unfillable region and a fillable region; virtual graphics are respectively arranged on a first boundary and a second boundary of the unfillable region, the first boundary being opposite to the second boundary; the virtual graphics arranged on the first boundary and the second boundary extend along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; in the remaining space of the fillable region on the layout, the virtual graphics are arranged at intervals in a second direction, the second direction being perpendicular to the first direction; if there are at least two unfillable regions on the layout, when the first boundary and / or the second boundary of two adjacent unfillable regions are not on the same straight line, a rectangular region is arranged between the two adjacent unfillable regions, the rectangular region serving as a newly added unfillable region.

[0016] In some embodiments, at least two virtual graphics are arranged on the first and second boundaries of the unfillable region, extending along the first direction to the boundary of the fillable region.

[0017] In some embodiments, the virtual graphic arranged at one end of the first boundary and the second boundary maintains a minimum spacing with respect to the first boundary and the second boundary, the minimum spacing being a minimum spacing that satisfies the manufacturing process conditions.

[0018] In some embodiments, the virtual graphic arranged at one end of the first boundary is attached to the unfillable area; the virtual graphic arranged at one end of the second boundary is attached to the unfillable area.

[0019] In some embodiments, the spacing between the virtual graphics arranged at intervals in the second direction is a preset spacing; the spacing between at least two virtual graphics arranged on the first boundary and the second boundary respectively is a preset spacing.

[0020] This application provides a virtual graphic filling method and a semiconductor device layout, comprising: calculating unfillable regions on the layout; arranging virtual graphics along a first boundary and a second boundary of the unfillable regions, the first boundary being opposite to the second boundary; extending the virtual graphics located at the first boundary and the second boundary along a first direction to the boundary of the fillable regions, the first direction being parallel to the first boundary; arranging the virtual graphics at intervals in the remaining space of the fillable regions on the layout along a second direction, the second direction being perpendicular to the first direction; and removing virtual graphics that overlap with the unfillable regions, thereby achieving a minimum interval between the virtual graphics and the boundary of the unfillable regions. Attached Figure Description

[0021] Figure 1This is a flowchart of a virtual graphic filling method according to an embodiment of this application;

[0022] Figure 2-4 A schematic diagram illustrating the structural changes during the virtual graphic filling process;

[0023] Figure 5 This is a semiconductor device layout according to an embodiment of this application.

[0024] Figure label:

[0025] 201: Unfillable area; 202: Virtual graphic; 203: Rectangular area; 204: Preset spacing. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to specific embodiments and the accompanying drawings. It should be understood that these descriptions are merely exemplary and not intended to limit the scope of the invention. Furthermore, descriptions of well-known structures and techniques are omitted in the following description to avoid unnecessarily obscuring the concept of the invention.

[0027] In existing technologies, filling virtual graphics involves first calculating the unfillable areas, then filling the fillable areas with strip-shaped virtual graphics at intervals, and finally removing any overlap with the unfillable areas. However, because the strip-shaped virtual graphics have a directionality (e.g., the virtual graphics are horizontal), while the left and right sides can have the minimum spacing when filling the unfillable areas, there will be a large, random gap at the top and bottom edges of the unfillable areas.

[0028] This application provides a virtual graphic filling method that satisfies the minimum interval between the virtual graphic and the boundary of the unfillable area. Figure 1 Flowchart of the method for filling virtual graphics, see reference. Figure 1 The method includes the following steps:

[0029] S101, Get the unfilled layout.

[0030] The unfilled map includes an unfillable region 201, and the area surrounding the unfillable region 201 is an fillable region.

[0031] S102, calculate the unfillable region 201 on the layout.

[0032] Calculate the unfillable region 201 on the layout. The unfillable region 201 can be a rectangle. Calculate the length and / or width of the unfillable region 201.

[0033] S103, virtual graphics 202 are arranged along the first and second boundaries of the unfillable region 201, with the first boundary and the second boundary being opposite to each other.

[0034] Optionally, Figure 2-5 This diagram illustrates the structural changes during the virtual graphic filling process. (Reference) Figure 2 One or two virtual graphics 202 are arranged at one end of the first boundary of the unfillable region 201; one or two virtual graphics 202 are arranged at one end of the second boundary of the unfillable region 201. The shape of the virtual graphics 202 can be a strip graphic.

[0035] Optionally, the first boundary can be the upper boundary of the unfillable region 201, and the second boundary can be the lower boundary of the unfillable region 201. Virtual graphics 202 are arranged along the upper boundary of the unfillable region 201 and along the lower boundary of the unfillable region 201.

[0036] Optionally, arranging 1-2 virtual graphics 202 at one end of the first boundary of the unfillable area 201 includes: arranging 1-2 virtual graphics 202 of the same length as the first boundary at one end of the first boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

[0037] Optionally, arranging 1-2 virtual graphics 202 at one end of the second boundary of the unfillable area 201 includes: arranging 1-2 virtual graphics 202 of the same length as the second boundary at one end of the second boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

[0038] S104, a virtual graphic 202 located at the first boundary and the second boundary is arranged along the first direction to the boundary of the fillable area, and the first direction is parallel to the first boundary.

[0039] Optionally, the virtual graphic 202 arranged on the first boundary has the same length as the first boundary, and the virtual graphic 202 arranged on the second boundary has the same length as the second boundary. (Reference) Figure 3 A virtual graphic 202 extending along a first direction from the first boundary to the boundary of the fillable area. The first direction can be parallel to the upper boundary of the non-fillable area 201, and the first direction can be horizontal. A virtual graphic 202 extending along the horizontal direction from the upper boundary to the boundary of the fillable area, and a virtual graphic 202 extending along the horizontal direction from the lower boundary to the boundary of the fillable area.

[0040] S105, in the remaining space of the fillable area on the layout, virtual graphics 202 are arranged at intervals in a second direction, which is perpendicular to the first direction.

[0041] refer to Figure 4 Assuming the first direction is horizontal, the second direction can be vertical. In the remaining space of the fillable area, virtual graphics 202 are arranged at intervals in the vertical direction of the second direction, which can be extended virtual graphics 202 arranged at intervals.

[0042] Optionally, in the remaining space of the fillable area on the map, the virtual graphics 202 are arranged at intervals in the second direction, wherein the second direction is perpendicular to the first direction, including arranging the virtual graphics 202 at intervals of a preset spacing 204 in the second direction.

[0043] Optionally, in the remaining space of the fillable area on the map, the virtual graphics 202 are arranged at intervals in the second direction, the second direction being perpendicular to the first direction, which includes: arranging the virtual graphics 202 at intervals from the midline position between the first boundary and the second boundary of the unfillable area 201 to both sides.

[0044] Starting from the midline between the first and second boundaries of the unfillable region 201, the virtual graphics 202 are arranged at intervals on both sides of the midline, ending at the first and second boundaries, so that the virtual graphics 202 are filled symmetrically.

[0045] Optionally, the width of the unfillable region 201 is calculated, where the width is the distance between the first boundary and the second boundary; the midline position between the first boundary and the second boundary is calculated based on the width of the unfillable region 201.

[0046] S106, Remove the virtual graphic 202 that overlaps with the unfillable area 201.

[0047] refer to Figure 4 Remove the virtual graphic 202 that overlaps with the unfillable area 201.

[0048] Optionally, if there are at least two unfillable regions 201 on the layout, when the first boundary and / or second boundary of two adjacent unfillable regions 201 are not on the same straight line, a rectangular region 203 is added in the area between the two adjacent unfillable regions 201, and the rectangular region 203 is added as a new unfillable region.

[0049] refer to Figure 5When the first and / or second boundaries of two adjacent unfillable regions 201 are not on the same straight line, the virtual graphics 202 arranged on the boundaries of the two adjacent unfillable regions 201 are also not on the same straight line. A rectangular region 203 is added between the two adjacent unfillable regions 201. The rectangular region 203 is also an unfillable region. The rectangular region 203 serves as the newly added unfillable region.

[0050] Optionally, after the virtual graphics 202 are arranged at intervals in the second direction in the remaining space of the fillable area on the layout, the method further includes: removing the virtual graphics 202 that overlap with the newly added non-fillable area.

[0051] Remove the virtual graphics that overlap with the newly added non-fillable area, i.e., the rectangular area 203.

[0052] This application provides a virtual graphic filling method, which involves calculating an unfillable region 201 on a layout; arranging virtual graphics 202 along a first boundary and a second boundary of the unfillable region 201, with the first boundary and the second boundary opposite to each other; extending the virtual graphics 202 located at the first boundary and the second boundary along a first direction to the boundary of the fillable region, with the first direction parallel to the first boundary; arranging the virtual graphics 202 at intervals in the remaining space of the fillable region on the layout in a second direction, with the second direction perpendicular to the first direction; and removing virtual graphics 202 that overlap with the unfillable region 201, thereby achieving a minimum interval between the virtual graphics 202 and the boundary of the unfillable region 201, resulting in a more uniform graphic density distribution and reducing the etching load effect during manufacturing.

[0053] refer to Figure 5 In another aspect, this application provides a semiconductor device layout, including: an unfillable region 201 and a fillable region; virtual graphics 202 are respectively arranged on a first boundary and a second boundary of the unfillable region 201, with the first boundary and the second boundary opposite to each other; the virtual graphics 202 arranged on the first boundary and the second boundary extend along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; in the remaining space of the fillable region on the layout, the virtual graphics 202 are arranged at intervals in a second direction, the second direction being perpendicular to the first direction; if there are at least two unfillable regions 201 on the layout, when the first boundary and / or the second boundary of two adjacent unfillable regions 201 are not on the same straight line, a rectangular region 203 is arranged between the two adjacent unfillable regions 201, the rectangular region 203 serving as a newly added unfillable region.

[0054] In some embodiments, at least two virtual graphics 202 are arranged on the first boundary and the second boundary of the unfillable region 201, extending along the first direction to the boundary of the fillable region.

[0055] In some embodiments, the virtual graphic 202 arranged at one end of the first boundary and the second boundary maintains a minimum spacing with respect to the first boundary and the second boundary, the minimum spacing being a minimum spacing that satisfies the manufacturing process conditions.

[0056] In some embodiments, the virtual graphic 202 arranged at one end of the first boundary is attached to the unfillable area 201; the virtual graphic 202 arranged at one end of the second boundary is attached to the unfillable area 201.

[0057] In some embodiments, the spacing between the virtual graphics 202 arranged at intervals in the second direction in the remaining space of the fillable area on the layout is a preset spacing 204; the spacing between at least two virtual graphics 202 arranged on the first boundary and the second boundary respectively is a preset spacing 204.

[0058] In a semiconductor device layout provided in this application, the boundary between the virtual graphic and the unfillable region 201 is the minimum interval, and a rectangular region 203 is arranged between two adjacent unfillable regions. This avoids the virtual graphics 202 arranged at the boundary of the two adjacent unfillable regions being unevenly staggered when the first boundary and / or the second boundary of the two adjacent unfillable regions 201 are not on the same straight line.

[0059] It should be understood that the specific embodiments described above are merely illustrative or explanatory of the principles of the invention and do not constitute a limitation thereof. Therefore, any modifications, equivalent substitutions, improvements, etc., made without departing from the spirit and scope of the invention should be included within the protection scope of the invention. Furthermore, the appended claims are intended to cover all variations and modifications falling within the scope and boundaries of the appended claims, or equivalent forms of such scope and boundaries.

[0060] The above description does not provide detailed explanations of the technical aspects of each layer's patterning and etching. However, those skilled in the art should understand that various methods existing in the prior art can be used to form layers and regions of the desired shape. Furthermore, to form the same structure, those skilled in the art can also design methods that are not entirely identical to those described above.

[0061] The above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations. However, obvious variations or modifications derived therefrom are still within the scope of protection of this invention.

Claims

1. A method for filling virtual graphics, characterized in that, include: Get the unfilled layout; Calculate the unfillable regions on the layout; Virtual graphics are arranged along the first and second boundaries of the unfillable region, with the first boundary and the second boundary being opposite to each other. The virtual graphic located at the first boundary and the second boundary is arranged along a first direction to the boundary of the fillable area, wherein the first direction is parallel to the first boundary; The virtual graphics are arranged at intervals in the remaining space of the fillable area on the map in a second direction, which is perpendicular to the first direction; Remove the virtual graphics that overlap with the unfillable area; The method further includes: If there are at least two unfillable regions on the map, and the unfillable regions are rectangular, when the first boundaries of two adjacent unfillable regions are not on the same straight line, or the second boundaries of two adjacent unfillable regions are not on the same straight line, a rectangular region is added between the two adjacent unfillable regions, and the rectangular region is the newly added unfillable region; wherein, the first boundary is the upper boundary of the unfillable region, and the second boundary is the lower boundary of the unfillable region. The remaining space of the fillable area on the map is used to arrange the virtual graphics at intervals in the second direction, wherein the second direction is perpendicular to the first direction, including: The virtual graphics are arranged at intervals from the midline between the first and second boundaries of the unfillable area to both sides.

2. The method according to claim 1, characterized in that, The virtual graphic is in the shape of a strip.

3. The method according to claim 1, characterized in that, The virtual graphics are arranged along the first and second boundaries of the unfillable region, wherein the first boundary and the second boundary are opposite to each other, including: One or two virtual graphics are arranged at one end of the first boundary of the unfillable region; One or two virtual graphics are arranged at one end of the second boundary of the unfillable area.

4. The method according to claim 3, characterized in that, Arranging 1-2 virtual graphics at one end of the first boundary of the unfillable region includes: Arrange 1-2 virtual graphics of the same length as the first boundary at one end of the first boundary according to the minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

5. The method according to claim 3, characterized in that, Arranging 1-2 virtual graphics at one end of the second boundary of the unfillable region includes: Arrange 1-2 virtual graphics of the same length as the second boundary at one end of the second boundary according to the minimum spacing, wherein the minimum spacing is the minimum spacing that meets the manufacturing process conditions.

6. The method according to claim 1, characterized in that, The remaining space of the fillable area on the map is used to arrange the virtual graphics at intervals in the second direction, wherein the second direction is perpendicular to the first direction, including: The virtual graphics are arranged at preset intervals in the second direction.

7. The method according to claim 1, characterized in that, The method further includes: Calculate the width of the unfillable region, where the width is the distance between the first boundary and the second boundary; The midline position between the first boundary and the second boundary is calculated based on the width of the unfillable area.

8. The method according to claim 1, characterized in that, After the virtual graphics are arranged at intervals in the second direction, the remaining space of the fillable area on the layout further includes: Remove the virtual graphics that overlap with the newly added unfillable area.

9. A semiconductor device layout, characterized in that, include: Unfillable and fillable regions; The first and second boundaries of the unfillable area are respectively arranged with virtual graphics, and the first boundary is opposite to the second boundary. The virtual graphic arranged on the first boundary and the second boundary extends along a first direction to the boundary of the fillable area, the first direction being parallel to the first boundary; The virtual graphics are arranged at intervals in the remaining space of the fillable area on the map, in a second direction perpendicular to the first direction; the virtual graphics are arranged at intervals on both sides of the midline position between the first boundary and the second boundary of the unfillable area; If there are at least two unfillable regions on the map, and the unfillable regions are rectangular, when the first boundaries of two adjacent unfillable regions are not on the same straight line, or the second boundaries of two adjacent unfillable regions are not on the same straight line, a rectangular region is arranged between the two adjacent unfillable regions, and the rectangular region is a newly added unfillable region; wherein, the first boundary is the upper boundary of the unfillable region, and the second boundary is the lower boundary of the unfillable region.

10. The layout according to claim 9, characterized in that, At least two virtual graphics are arranged on the first and second boundaries of the unfillable region, extending along the first direction to the boundary of the fillable region.

11. The layout according to claim 9, characterized in that, The virtual graphic arranged at one end of the first boundary and the second boundary maintains a minimum spacing with the first boundary and the second boundary, the minimum spacing being the minimum spacing that satisfies the manufacturing process conditions.

12. The layout according to claim 9, characterized in that, The virtual graphic arranged at one end of the first boundary fits into the unfillable area; The virtual graphic arranged at one end of the second boundary fits into the unfillable area.

13. The layout according to claim 9, characterized in that, The spacing between the virtual graphics arranged at intervals in the second direction is a preset spacing; The spacing between at least two virtual graphics arranged on the first boundary and the second boundary is a preset spacing.

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