A sputter-resistant optical system adapted to the vacuum plasma characteristics of an electric thruster

By using a lens rotation device and a sputter-resistant baffle in a sputter-resistant optical system, clear observation of the plasma characteristics of an electric thruster was achieved, solving the problems of poor observation results and low efficiency caused by plasma coating, and improving observation results and work efficiency.

CN115711759BActive Publication Date: 2026-06-12LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
Filing Date
2022-11-16
Publication Date
2026-06-12

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Abstract

The application relates to the field of aerospace testing technology, in particular to a sputtering-resistant optical system adapting to the vacuum plasma characteristics of an electric thruster, which comprises a mounting platform, an optical camera mounting box, a lens rotating device and a sputtering-resistant baffle, wherein: a fixed support is arranged below the mounting platform; the optical camera mounting box is fixed on the mounting platform and comprises a camera box body and a camera lens barrel; the lens rotating device is fixed on the mounting platform through a rotating shaft support; and the sputtering-resistant baffle is fixedly connected with the lens rotating device. The application can realize multiple optical observations without frequent replacement of optical lenses, can effectively resist plasma sputtering, greatly increases the observable time, solves the problem of reduced observation performance caused by plasma coating in a short time of a conventional optical observation system, improves the observation effect and work efficiency, and guarantees the definition of imaging resolution.
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